Filter systems for reactor systems

Abstract

A filter system for a reactor system may include: a filter container including an outer wall; a filter plate disposed in the filter container; and a filter disposed on the filter plate. The filter plate may include: a first plate surface and a second plate surface, wherein a plate body spans between the first plate surface and the second plate surface; a first plate hole, wherein the first plate hole is disposed through the plate body spanning between the first plate surface and the second plate surface; and / or a plate hole rim protruding from the first plate surface. The plate hole rim may be disposed at or near a plate hole edge defining the first plate hole and / or at least partially surround the first plate hole. A first filter may be disposed on the first plate surface, and the first filter may engage with the plate hole rim such that the plate hole rim positions the first filter in a desired position.

Description

Technical Field

[0001] The present disclosure relates generally to semiconductor processing or reactor systems and components included therein, and particularly to preventing contamination of reactor system components with other components. Background Art

[0002] A reaction chamber can be used to deposit various layers of material onto a semiconductor substrate. The semiconductor can be placed on a susceptor within the reaction chamber. Both the substrate and the susceptor can be heated to a desired substrate temperature set point. In an example substrate processing process, one or more reactant gases can be passed over the heated substrate, causing thin films of material to be deposited on the substrate surface. Throughout subsequent deposition, doping, photolithography, etching, and other processes, these layers are fabricated into integrated circuits.

[0003] For any given process, the reactant gases and / or any byproduct gases can then be evacuated and / or purged from the reaction chamber via vacuum. The reactant gases and other gases or materials from the reaction chamber can be passed through a filter system, where the reactant gases or other materials (e.g., reaction products and / or byproducts) are captured to prevent contamination of reactor system components downstream of the filter system. However, materials from the filter system may outgas under certain conditions, which may cause contamination of the reaction chamber or a substrate disposed therein. Summary of the Invention

[0004] This summary is provided to introduce a series of concepts in a simplified form. These concepts are described in more detail below in the detailed description of the exemplary embodiments of the present disclosure. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter.

[0005] In some embodiments, a filter system for a reactor system is provided. The filter system disclosed herein can allow for the collection of material from a reaction chamber of the reactor system to reduce or prevent contamination of reactor system components downstream of the filter system. The filter system disclosed herein can also reduce or prevent potential contaminants from traveling to and contaminating the reaction chamber or a substrate disposed therein.

[0006] In various embodiments, a filter system for a reactor system may include: a filter container including an outer wall; a filter plate disposed in the filter container; and a filter disposed on the filter plate. The filter plate may include: a first plate surface and a second plate surface, wherein a plate body spans between the first plate surface and the second plate surface; a first plate hole, wherein the first plate hole is disposed through the plate body spanning between the first plate surface and the second plate surface; and / or a plate hole rim protruding from the first plate surface. The plate hole rim may be disposed at or near a plate hole edge defining the first plate hole and / or at least partially surround the first plate hole. A first filter may be disposed on the first plate surface, and the first filter may engage with the plate hole rim such that the plate hole rim positions the first filter in a desired position. In various embodiments, the outer wall may include at least one protrusion extending from the outer wall into the interior space of the filter container, the interior space of the filter container including the first filter.

[0007] In various embodiments, the first filter can include a filter opening extending through at least a portion of the length of the first filter, wherein the filter opening can be in fluid communication with the first plate aperture. In various embodiments, the filter opening can be disposed through a first end of the filter, the first end of the filter being opposite a second end of the filter. In various embodiments, the shape of the plate aperture edge can complement the shape of the filter opening at the first end of the filter. The first end of the filter can contact the first plate surface, such that the plate aperture edge is disposed within the filter opening.

[0008] In various embodiments, the first filter can include filter material surrounding a filter opening and spanning between a first filter end and a second filter end, wherein the first filter end can include a first filter end cap disposed thereon, and the second filter end can include a second filter end cap disposed thereon. The first filter end cap and / or the second filter end cap can be coupled to a support rod spanning between the first filter end cap and the second filter end cap, wherein the support rod can be integral or unitary with the first filter end cap and / or the second filter end cap.

[0009] In various embodiments, the filter system may further include a baffle disposed on the second end of the filter, wherein the filter opening is disposed through the second end of the filter, and the baffle prevents or reduces the flow of fluid into the filter opening through the second end of the filter. The baffle may facilitate the flow of fluid through one side of the first filter between the first end of the filter and the second end of the filter. In various embodiments, the filter system may further include a plurality of filters disposed in the filter container, including the first filter, wherein the baffle may include baffle holes disposed through the baffle to facilitate the flow of a portion of the fluid between the plurality of filters. In various embodiments, the filter system may further include a plurality of plate holes disposed through the plate body, including the first plate hole, each plate hole having a corresponding plate hole edge disposed at or near the corresponding plate hole edge of each of the plurality of plate holes. Each of the plurality of filters may include a corresponding filter opening, wherein each corresponding plate hole edge of the plurality of plate holes may be disposed within the corresponding filter opening of one of the plurality of filters.

[0010] In various embodiments, the filter container may include a container bottom surface including a container bottom hole disposed therethrough, wherein the filter plate may be disposed on the container bottom surface such that the first plate hole and the filter opening may be in fluid communication with the container bottom hole. In various embodiments, the container bottom surface may include a container bottom rim protruding from the container bottom surface and at least partially surrounding the container bottom hole, wherein the container bottom rim may engage with the filter plate to control a position of the filter plate.

[0011] In various embodiments, the filter panel can include a filter panel recess extending through the second panel surface into the panel body, wherein the filter panel recess can have a shape complementary to a shape of a container bottom rim. In various embodiments, the container bottom rim can be disposed in the filter panel recess. In various embodiments, the filter panel recess can at least partially surround the first panel aperture.

[0012] In various embodiments, a method may include flowing a fluid from a reaction chamber into a filter system; flowing the fluid into a filter container and through a first filter included therein; collecting contaminants from the fluid contained in filter material of the first filter as the fluid flows through the filter; and / or flowing the fluid through a first plate aperture disposed through a filter plate. In various embodiments, the filter may include filter material and a first filter aperture disposed through the filter material, wherein the filter material may span the length of the filter between a first end of the filter and a second end of the filter. The first filter aperture may be disposed at least through the first end of the filter, and the fluid may flow through the filter material and then through the first filter aperture. In various embodiments, the filter plate may include a first plate surface and a second plate surface, wherein the plate body spans between the first plate surface and the second plate surface, and a plate aperture edge protruding from the first plate surface, the plate aperture edge engaging the first filter to maintain the first filter in a desired position. The first filter aperture and the first plate aperture may be in fluid communication through the first end of the filter. The filter plate may be disposed on a bottom surface of the filter container.

[0013] In various embodiments, the method may further include flowing the fluid through a container bottom hole disposed through the container bottom surface, wherein the first plate hole may be in fluid communication with the container bottom hole. In various embodiments, the method may further include collecting a portion of the contaminants on an inner surface of an outer wall of the filter container, wherein the inner surface may include at least one protrusion extending into the interior space of the filter container.

[0014] For the purpose of summarizing the present disclosure and the advantages achieved over the prior art, certain objects and advantages of the present disclosure have been described above. Of course, it should be understood that not all such objects or advantages may be achieved according to any particular embodiment of the present disclosure. Thus, for example, those skilled in the art will recognize that the present disclosure may be practiced in a manner that achieves or optimizes one advantage or group of advantages taught or indicated herein without necessarily achieving other objects or advantages that may be taught or indicated herein.

[0015] All of these embodiments are intended to be within the scope of this disclosure. These and other embodiments will be apparent to those skilled in the art from the following detailed description of certain embodiments with reference to the accompanying drawings; this disclosure is not limited to any particular embodiment described. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Although the specification concludes with the claims particularly pointing out and distinctly claiming what are considered to be embodiments of the present disclosure, advantages of the embodiments of the present disclosure may be more readily ascertained from the description of certain examples of the embodiments of the present disclosure when read in conjunction with the accompanying drawings. Elements having similar element numbers in the various figures are intended to be identical.

[0017] Figure 1 shows a schematic diagram of an exemplary reactor system according to various embodiments;

[0018] Figure 2 shows an exploded view of an exemplary filter system according to various embodiments;

[0019] Figure 3A and 3B shows a perspective view of an exemplary filter included in a filter system according to various embodiments;

[0020] Figure 4A shows a top perspective view of an exemplary filter panel included in a filter system according to various embodiments;

[0021] Figure 4B shows along the Figure 4A The axis XY is shown in Figure 4A A cross-sectional view of a filter plate;

[0022] Figure 4C shows a bottom perspective view of an exemplary filter panel included in a filter system according to various embodiments;

[0023] Figure 5 illustrates an exemplary top baffle disposed on a filter of a filter system according to various embodiments;

[0024] Figure 6 shows a perspective view of an exemplary filter receptacle of a filter system according to various embodiments;

[0025] Figures 7A-7C Exemplary filter containers having various configurations according to various embodiments are shown;

[0026] Figure 8 shows an exemplary filter receptacle including a top baffle, a filter, and a filter plate, and a cross section of fluid flow through the filter receptacle according to various embodiments; and

[0027] Figure 9 Methods of flowing a fluid through a filter system of a reactor system are shown according to various embodiments. DETAILED DESCRIPTION

[0028] Although certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the present disclosure extends beyond the specifically disclosed embodiments and / or uses of the present disclosure and obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the present disclosure should not be limited by the specific embodiments described herein.

[0029] The illustrations presented herein are not meant to be actual views of any particular material, apparatus, structure, or device, but are merely representations used to describe embodiments of the present disclosure.

[0030] As used herein, the term "substrate" may refer to any underlying material or materials that may be used or upon which a device, circuit, or film may be formed.

[0031] As used herein, the term "atomic layer deposition" (ALD) may refer to a vapor deposition process in which deposition cycles, preferably multiple consecutive deposition cycles, are performed in a process chamber. Typically, during each cycle, a precursor is chemisorbed onto a deposition surface (e.g., a substrate surface or a previously deposited bottom layer surface, such as material from a previous ALD cycle), thereby forming a monolayer or sub-monolayer that is not susceptible to reaction with additional precursors (i.e., a self-limiting reaction). Thereafter, if necessary, a reactant (e.g., another precursor or a reactive gas) may be subsequently introduced into the process chamber for converting the chemisorbed precursor into the desired material on the deposition surface. Typically, this reactant is capable of further reacting with the precursor. Additionally, a purge step may be utilized during each cycle to remove excess precursor from the process chamber following conversion of the chemisorbed precursor and / or to remove excess reactant and / or reaction byproducts from the process chamber. In addition, as used herein, the term "atomic layer deposition" is also intended to include processes designated by related terms such as "chemical vapor atomic layer deposition," "atomic layer epitaxy" (ALE), molecular beam epitaxy (MBE), gas source MBE or organometallic MBE and chemical beam epitaxy when performed using alternating pulses of one or more precursor compositions, reactive gases, and purge gases (e.g., inert carrier gases).

[0032] As used herein, the term "chemical vapor deposition (CVD)" may refer to any process in which a substrate is exposed to one or more volatile precursors that react and / or decompose on the substrate surface to produce the desired deposit.

[0033] As used herein, the terms "film" and "thin film" may refer to any continuous or non-continuous structure and material deposited by the methods disclosed herein. For example, "film" and "thin film" may comprise 2D materials, nanorods, nanotubes, or nanoparticles, or even partial or complete molecular layers or partial or complete atomic layers or clusters of atoms and / or molecules. "Film" and "thin film" may include materials or layers that have pinholes but are still at least partially continuous.

[0034] As used herein, the term "contaminant" may refer to any unwanted material disposed within a reaction chamber that may affect the purity of a wafer disposed within the reaction chamber, or any unwanted material in any component of a reaction system. The term "contaminant" may refer to, but is not limited to, unwanted deposits, metallic and non-metallic particles, impurities, and waste products disposed within a reaction chamber or other components of a reaction system.

[0035] Reactor systems for ALD, CVD, and the like can be used for various applications, including depositing and etching materials on substrate surfaces. In various embodiments, the reactor system 50 may include a reaction chamber 4, a susceptor 6 for holding a substrate 30 during processing, a fluid distribution system 8 (e.g., a showerhead) for distributing one or more reactants to the surface of the substrate 30, one or more reactant sources 10, 12, and / or a carrier gas source and / or a purge gas source 14 fluidly coupled to the reaction chamber 4 via lines 16-20 and valves or controllers 22-26. Reactive gases or other materials from the reactant sources 10, 12 may be applied to the substrate 30 in the reaction chamber 4. Purge gas from the purge gas source 14 may flow to and through the reaction chamber 4 to remove any excess reactants or other undesirable materials from the reaction chamber 4. The system 50 may also include a vacuum source 28 fluidly coupled to the reaction chamber 4, which may be configured to draw reactants, purge gases, or other materials out of the reaction chamber 4. The system 50 may include a filter system 40 disposed between the reaction chamber 4 and the vacuum source 28 to capture (i.e., accumulate) material (e.g., contaminants) from the reaction chamber 4 to reduce or prevent contamination of reactor system 50 components downstream of the filter system 40.

[0036] refer to Figure 2 , shows a filter system 100 (an exploded view thereof) according to various embodiments. The filter system 100 can be the same as or similar to the filter system 40. In various embodiments, the filter system 100 may include an outer filter housing 103, which may include multiple components (e.g., an upper outer housing 103A and a lower outer housing 103B). In various embodiments, the upper outer housing 103A and the lower outer housing 103B can be coupled to enclose the other components of the filter system 100. The upper outer housing 103A may include a fluid inlet 101A, and the interior of the outer filter housing 103 can be fluidically coupled to a reaction chamber (e.g., reaction chamber 4) through the fluid inlet. Gases and other materials can flow from the reaction chamber into the filter system 100 through the fluid inlet 101A and can exit the filter system 100 through the fluid outlet 101B.

[0037] In various embodiments, the filter system 100 may include a filter container 130. The filter container 130 may be disposed in one or more components of the outer filter housing 103. For example, the filter container 130 may be disposed in the lower outer housing 103B and / or the upper outer housing 103A. In various embodiments, the upper outer housing 103A may be coupled to the filter container 130 to enclose and / or seal the filter container interior space of the filter container 130. Thus, the filter container 130 may include a shape (e.g., an exterior shape) that complements the interior shape of the upper outer housing 103A and / or the lower outer housing 103B.

[0038] Additional references Figure 6 , filter container 600( Figure 2 ) may include a filter container outer wall 610 having an inner wall surface 615. The inner wall surface 615 may define and / or enclose an interior space of the filter container 600. In various embodiments, the outer wall 610 may be engaged and / or coupled to an upper outer housing (e.g., upper outer housing 103A) to enclose and / or seal the interior space of the filter container 600.

[0039] In various embodiments, the lower boundary of the interior space of the filter container 600 can be the container bottom spanning between the outer wall 610 or a portion thereof. The container bottom can include a container bottom surface 605. The container bottom surface can include one or more container bottom holes 620 disposed through the container bottom. The interior space of the filter container 600 can be in fluid communication with the fluid outlet 101B via the container bottom holes 620. In various embodiments, the container bottom hole 620 can be defined by a container bottom hole edge. The container bottom hole 620 can include any suitable shape.

[0040] In various embodiments, the container bottom surface 605 can include a container bottom rim 630 protruding from the container bottom surface 605. The container bottom rim 630 can be disposed at or near an edge of a corresponding container bottom hole. In various embodiments, each container bottom hole 620 can include a container bottom rim 630 disposed at or near an edge of the corresponding container bottom hole. The container bottom rim 630 can at least partially surround the corresponding container bottom hole 620, forming the shape of the container bottom rim 630.

[0041] In various embodiments, the filter container 600 may include a coupling rod 650 protruding from the container bottom surface 605. The coupling rod 650 may include any suitable shape, length, and / or cross-sectional shape. In various embodiments, the coupling rod 650 may protrude from the container bottom surface 605 above a plane defined by the upper edge of the container outer wall 610 (wherein the height of the container outer wall 610 spans between the container bottom surface and the upper edge of the container outer wall 610). The coupling rod 650 may be configured to engage and / or couple with other components of the filter system 100. In various embodiments, at least a portion of the coupling rod 650 may include threads.

[0042] Reference again Figure 2 In various embodiments, the filter system 100 can include a filter panel 200. The filter panel 200 can be disposed in the filter container 130, for example, adjacent to and / or coupled to a bottom surface of the filter container (e.g., Figure 6 Filter container bottom surface 605 of filter container 600 in FIG.

[0043] Additional references Figures 4A-4C , filter plate 400( Figure 2 ) may include a first plate surface 405, a second plate surface 410, and a plate body 415 spanning between the first plate surface 405 and the second plate surface 410. The first plate surface 405 and / or the second plate surface 410 may include any suitable configuration, such as substantially flat, concave, or convex. In various embodiments, the filter plate 400 may include at least one plate hole 420, the at least one plate hole being disposed through the first plate surface 405, the second plate surface 410, and the plate body 415 spanning therebetween. In various embodiments, the plate hole 420 may be defined by a plate hole edge 422. The plate hole 420 may include any suitable shape.

[0044] In various embodiments, the first plate surface 405 can include a plate hole rim 430 protruding from the first plate surface 405. The plate hole rim 430 can be disposed at or near the corresponding plate hole rim 422. In various embodiments, each plate hole 420 can include a plate hole rim 430 disposed at or near the corresponding plate hole rim 422. The plate hole rim 430 can at least partially surround the corresponding plate hole 420, forming the shape of the plate hole rim 430. In various embodiments, the plate hole rim can be any protrusion from the first plate surface 405 (e.g., that is at least used to position the filter in a desired position on the first plate surface 405).

[0045] In various embodiments, the filter plate 400 may include a coupling hole 455. The coupling hole 455 may include Figure 6The shape of the cross section of the coupling rod 650 of the filter container 600 is complementary to that of the coupling rod 650. Therefore, the coupling rod 650 can be disposed through the coupling hole 455 so that the coupling rod 650 maintains the desired position of the filter plate 400 within the interior space of the filter container 600.

[0046] Combination Reference Figure 4A -C and 6, in various embodiments, the filter plate 400 can be positioned adjacent to the bottom surface 605 of the filter container 600. The second plate surface 410 can contact the bottom surface 605 of the filter container 600. The shape of the filter plate 400 can complement the cross-sectional shape of the interior space of the filter container 600, so that the filter plate 400 can be positioned therein. Therefore, the outer edge of the filter plate 400 can be positioned adjacent to and / or contact the outer wall inner surface 615 of the filter container outer wall 610. The filter plate 400 can fit within the interior space of the filter container 600 so that little or no fluid can pass between the outer edge of the filter plate 400 and the outer wall inner surface 615 of the filter container outer wall 610, and / or between the second plate surface 410 and the filter container bottom surface 605.

[0047] In various embodiments, the container bottom rim 630 can engage and / or couple with the filter plate 400 to maintain the filter plate 400 in a desired position on or relative to the filter container bottom surface 605 and / or the container bottom aperture 620. In various embodiments, the container bottom rim 630 can include a shape that is complementary to the shape of the plate aperture 420, such that each container bottom rim 630 can be disposed in a corresponding container bottom aperture 620. For example, Figure 6 Each of the four container bottom rims 630 can be disposed within a corresponding one of the four plate holes 420. In such embodiments, each container bottom rim 630 can be disposed adjacent to or against the plate hole edge 422 of the corresponding plate hole 420.

[0048] In various embodiments, the filter panel 400 can include a filter panel recess 425 disposed in the panel body 415 through the second panel surface 410. The filter panel recess 425 can be disposed not completely through the filter panel 400 but only partially into the panel body 415 through the second panel surface 410 toward the first panel surface 405. The filter panel recess 425 can be disposed on the filter panel 400 near and / or adjacent to the panel aperture 420. In various embodiments, the filter panel recess 425 can be disposed at least partially around the corresponding panel aperture 420. For example, Figure 4C , there may be a plate recess 425 disposed around each respective plate hole 420 .

[0049] Each filter panel recess 425 can include any suitable shape. In various embodiments, the filter panel recess 425 can include a shape that complements the shape of the container bottom rim 630, such that the container bottom rim 630 can be disposed in the corresponding filter panel recess 425. In such embodiments, the container bottom rim 630 can engage and / or couple with the corresponding filter panel recess 425. For example, the container bottom aperture 620 can be larger than the panel aperture 420. The container bottom rim 630, which at least partially surrounds the container bottom aperture 620, can be disposed in the corresponding filter panel recess 425, which at least partially surrounds the corresponding panel aperture 420. In various embodiments, the container bottom rim 630 can be disposed adjacent to and / or in contact with the outer edge of the corresponding filter panel recess 425, such that there is little or no space between the container bottom rim 630 and the outer edge of the corresponding filter panel recess 425. The engagement and / or coupling of the container bottom rim 630 with the corresponding filter panel recess 425 can be configured to maintain the filter panel 400 in a desired position on or relative to the filter container bottom surface 605 and / or container bottom hole 620.

[0050] The filter plate 400, engaged and / or coupled to the container bottom surface 605 via the container bottom rim 630, can align each plate hole 420 with a corresponding container bottom hole 620, allowing fluid to pass therethrough. Relatedly, in various embodiments, the filter plate recesses 425 provided in the filter plate 400 and / or the container bottom rim 630 provide a self-aligning quality to the filter plate 400 as it is positioned into the filter container 600 and abuts the filter container bottom surface 605. That is, in response to the filter plate 400 being correctly positioned within the filter container 600, the container bottom rim 630 of the filter container can only engage corresponding and / or complementary portions of the filter plate 400 (e.g., the plate holes 420 and / or the filter plate recesses 425).

[0051] Return Reference Figure 2 , the filter system 100 may include one or more filters 120. The filters 120 may be disposed on the filter panel 200 and within the filter container 130.

[0052] Additional references Figure 3A and 3B , filter 300( Figure 2120 in the example of FIG. 120 ) may include a filter first end 310, a filter second end 320, and a filter body therebetween. The filter body 340 may include a filter material configured to accumulate or capture material flowing through the filter material. The filter material may include any suitable material, such as a wire mesh and / or any material including a geometry that provides a surface area (e.g., a high surface area to volume ratio) on which contaminants (e.g., material traveling from the reaction chamber 4) may be deposited. The filter body 340 may include a filter wall 345 surrounding the filter material. The filter wall 345 may include any suitable construction, such as a mesh, a screen, or any other permeable or perforated material (i.e., a material and / or construction through which a fluid may flow).

[0053] In various embodiments, the filter 300 can include end caps on one or more of the filter first end 310 and the filter second end 320. For example, the filter first end 310 can include a first filter end cap 312, and the filter second end 320 can include a second filter end cap 322. The end caps can be disposed over the ends of the filter wall 345. The end caps can be configured such that fluid cannot pass therethrough.

[0054] In various embodiments, the filter 300 can include at least one support rod 330 spanning between the first filter end cap 312 and the second filter end cap 322. The support rod 330 can provide structure to the filter body 340, the filter material, and / or the filter wall 345. The support rod 330 can be coupled to the first filter end cap 312 and / or the second filter end cap 322. In various embodiments, the support rod 330 can be integral and / or monolithic with the first filter end cap 312 and / or the second filter end cap 322 such that no seams exist between such components.

[0055] In various embodiments, the support rods 330 may be coupled to the first filter end cap 312 and / or the second filter end cap 322 without the use of an adhesive or other coupling material. The absence of an adhesive, epoxy, or other coupling material mitigates the risk of such coupling material outgassing and traveling into the reaction chamber (where it becomes a contaminant). Additionally, in the absence of such a coupling material, the filter 300 may not be susceptible to degradation at high temperatures, such as greater than 120° C. Thus, a filter system including the filter 300 (e.g., Figure 2 The filter system 100 in FIG. 1 may be closer to the reactor system (e.g., Figure 1 Thus, the reactor system having a filter system including the filter 300 can be more compact and / or have a more feasible construction and special arrangement.

[0056] In various embodiments, the filter 300 may include a filter opening 350 disposed in and / or surrounded by the filter body 340 and / or filter material. A portion of the filter wall (or the same / similar material) may surround the filter opening 350. The filter opening 350 may span at least a portion of the filter length of the filter 300 between the first filter end 310 and the second filter end 320. In various embodiments, the filter opening 350 may span the first filter end 310 and / or the second filter end 320. In various embodiments, the filter opening 350 may span the first filter end 310 and / or the second filter end 320. In various embodiments, the filter opening 350 may span the first filter end cap 312 and / or the second filter end cap 322. In various embodiments, the filter opening 350 may span the entire length of the filter 300, including through the first filter end 310 and the second filter end 320, and, if the filter 300 includes end caps, through the first filter end cap 312 and the second filter end cap 322.

[0057] In various embodiments, a portion of the filter opening 350 disposed through the filter first end 310 and / or the first filter end cap 312 can be configured to mate with a filter panel (e.g., Figures 4A-4C Filter plate 400) is joined and / or connected. Figures 4A-4C 6, the filter openings 350 can be configured to be in fluid communication with corresponding plate holes 420 and bottom surface holes 620d of the filter receptacle 600. The filter openings 350 disposed through the filter first end 310 (and / or the first filter end cap 312) can include a cross-sectional shape, at least a portion of which is complementary to the shape of the plate hole rim 430. Thus, the plate hole rim 430 can be partially engaged and / or coupled to the filter openings 350 through the filter first end 310 (and / or the first filter end cap 312). For example, the plate hole rim 430 associated with a corresponding plate hole 420 can be disposed within a portion of the filter opening 350 disposed through the filter first end 310 (and / or the first filter end cap 312), such that the filter openings 350 are in fluid communication with the corresponding plate holes 420. In various embodiments, the plate hole rim 430 can be disposed adjacent to and / or in contact with the filter opening outer edge 352, such that there is little or no space between the plate hole rim 430 and the filter opening outer edge 352.

[0058] The shape of the filter openings 350 proximate the filter first end 310 complements the shape of the plate hole rim 430, allowing for easy alignment and placement of the filter 300 on the filter plate 400 in the filter receptacle 600. That is, the plate hole rim 430 of the plate hole 420 may engage the filter openings 350 of the corresponding filter 300 merely in response to the filter 300 being properly positioned on the filter plate 400 within the filter receptacle 600, thereby facilitating alignment of the corresponding filter openings 350, the plate hole 420, and / or the receptacle bottom hole 620.

[0059] In various embodiments, a filter system of a reactor system (e.g., filter system 100) may include a plurality of filters 300. For example, Figure 3A 、 3B , 4A-4C, 5 and 6, the filter system may include four filters 300 in a filter container 600. As described herein, the four plate holes 420 on the filter plate 400 can be aligned with the four container bottom holes 620. Similarly, the filter opening 350 of each of the four filters 300 can be aligned with the corresponding four plate holes 420, so that each container bottom hole 620 is aligned with and in fluid communication with the corresponding plate hole 420 and the filter opening 350. The four filters 300 disposed on the filter plate 400 and in the filter container 600 may include Figures 7A-7C (It draws Figure 2 120 in a top perspective view) Figure 5 In the configuration shown, the filter system and / or filter receptacle may include any suitable number of filters in any suitable arrangement.

[0060] In various embodiments, referring back to Figure 2 , the filter system 100 may include a baffle 110. Also refer to Figure 3A 、 3B , 5 and 6, baffle 500 ( Figure 2 110 in the example) can be provided on the filter 300 (with respect to Figure 3A, B). In various embodiments, the baffle 500 can encourage fluid flow entering the interior of the filter receptacle 600 to take a specific path (e.g., a path that maximizes fluid flow through the filter 300 and / or allows for maximum removal of contaminants from the fluid flow by the filter system and its components). The baffle 500 can reduce or prevent fluid flow from traveling around or through the filter second end 320, the second filter end cap 322, and / or through a portion of the filter opening 350 provided at the filter second end 320 and / or the second filter end cap 322. In other words, the baffle 500 can form at least a partial seal between the baffle 500 and the filter second end 320 and / or the second filter end cap 322. The baffle 500 can be configured to encourage at least a portion of the fluid flow within the filter receptacle to flow around the baffle edge 520 toward and through the filter 300, as well as portions of the filter that are closer to the inner wall surface 615 than other portions of the filter 300. In various embodiments, the baffle 500 can include one or more baffle apertures 530 located near the center of the baffle 500. The baffle holes 530 can be configured to encourage fluid flow therethrough, toward and through the filter 300 and portions of the filter 300 that are closer to the center of the interior space of the filter receptacle 600 than other portions of the filter 300 (e.g., between the filters 300 disposed below the baffle 500). The baffle holes in the baffle can be in any suitable location or configuration to achieve the desired fluid flow toward and through the filter.

[0061] In various embodiments, Figure 2 The coupling system 105 shown in FIG. 1 can connect the baffle 110 and / or the filter plate 200 to each other, for example, by connecting the baffle 110 and / or the filter plate 200 to the baffle 110 and / or the filter plate 200. Figure 6 650 in FIG. 1 ) is coupled to the filter container 130 by engaging and / or coupling. For example, at least one component of the coupling system 105 can engage with threads on the coupling rod 132.

[0062] In various embodiments, the components of the filter system 100 can be clamped and / or sealed together via a sealing ring 142 and / or a clamping ring 144. The sealing ring 142 can be disposed between the filter receptacle 130 and the upper outer housing 103A, between the upper outer housing 103A and the lower outer housing 103B, between the filter receptacle 130 and the lower outer housing 103B, and / or at any other suitable location. The sealing ring 142 can be constructed of any suitable material, such as rubber, a polymeric material, etc., to at least partially seal the filter system components around the interior space of the filter receptacle 130. The clamping ring 144 can be disposed around the upper outer housing 103A and / or the lower outer housing 103B and can be configured to be tightened to hold the components of the filter system 100 together.

[0063] Figure 9A method 900 of flowing a fluid through a filter system of a reaction system is shown according to various embodiments. Figures 3A-3B , 4A-4C, 5, 6 and 8, the fluid can be removed from the reaction chamber (e.g., Figure 1 reaction chamber 4) to a filter system (e.g., Figure 2 Filter system 100 or Figure 8 Filter system 800 in (step 902). Figure 8 The filter system 800 in FIG. 1 may include a fluid inlet 801A and a fluid outlet 801B of an external filter housing (similar to Figure 2 1A and a fluid outlet 101B of an outer filter housing 103 in FIG. 8 . A fluid 880 may flow into the filter system 800 through the fluid inlet 801A. The fluid 880 may include materials (eg, contaminants) that the filter system is configured to remove from the fluid 880.

[0064] In various embodiments, fluid may flow into a filter container (e.g., Figure 2 600 or filter container 130 in the filter container and passes through the filter 820 (similar to Figure 2 Filter 300 or filter 120) (Step 904). In various embodiments, the filter receptacle can be coupled to an external filter housing of the filter system and / or a portion of an external filter housing. In various embodiments, the upper external housing (e.g., Figure 2 The upper outer housing 103A) can be coupled and / or engaged with the filter container to surround the interior space of the filter container and / or the outer filter housing, which accommodates and surrounds the filter.

[0065] After entering the filter vessel, the fluid 880 may contact the baffle 810 ( Figure 2 500 and 110 in FIG. 2 ). Baffle 810 can direct at least a portion of fluid 880 (e.g., fluid 880A) around outer edge 812 (an example of outer edge 520 of baffle 500) to contact wall inner surface 805 (an example of wall inner surface 615 of filter receptacle 600) and / or to contact and / or pass through a portion of filter 820 that is closer to wall inner surface 805 than other portions of filter 820 (e.g., portions of filter 820 that face each other). In various embodiments, baffle 810 can direct at least a portion of fluid 880 (e.g., fluid 880B) through baffle aperture 814 (an example of baffle aperture 530) to contact and / or pass through a portion of filter 820 that is closer to the center of the interior space of the filter receptacle than other portions of filter 820 (e.g., portions of filter 820 that face wall inner surface 805), or closer to other filters 820.

[0066] Fluids 880A and 880B may pass through the filter material 828 of the filter 820 and enter the filter openings 826 (an example of filter openings 350) in each filter 820. As the fluid 880 flows through the filter material, the filter material may collect contaminants from the fluid 880 (step 906). As an additional part of collecting contaminants from the fluid 880 at step 906, the contaminants may be deposited on surfaces within the filter system, such as on the wall interior surface 805, the filter wall (e.g., filter wall 345), the filter end caps, and / or any other components of the filter 820 or filter system 800. Thus, reference is made to Figures 7A-7C In various embodiments, the filter container outer wall of the illustrated filter container may include one or more protrusions extending from an inner surface of the wall into the interior space of the filter container (i.e., from the inner surface of the wall toward a filter disposed in the interior space of the filter container). Such protrusions may include any suitable shape and may provide additional surface area on which contaminants may settle or collect.

[0067] The filter container and / or filter system may include any suitable number of projections in any suitable shape, arrangement and / or configuration. Figure 7A The filter container 700A may include a filter container outer wall 710A (an example of the filter container outer wall 610) surrounding the filter container inner space, and the filter 120 may be disposed in the filter container inner space ( Figure 2 120 in a top perspective view). The filter container outer wall 710A may include one or more protrusions 745A extending from the wall inner surface 715A into the container interior space. The protrusions 745A may include a substantially rectangular shape. As another example, in Figure 7B The filter container 700B may include a filter container outer wall 710B (an example of the filter container outer wall 610) surrounding the filter container inner space, and the filter 120 may be disposed in the filter container inner space ( Figure 2 120 in a top perspective view). The filter container outer wall 710B may include one or more protrusions 745B extending from the wall inner surface 715B into the container interior space. The protrusions 745B may include a substantially triangular shape. As another example, in Figure 7C , the filter container 700C may include a filter container outer wall 710B, which may include one or more protrusions 745B extending from the wall inner surface 715B into the container interior space. In various embodiments, the bottom surface of the container interior space (e.g., Figures 4A-4CThe first panel 405 of the filter panel 400 in FIG. 4 may include a protrusion 735C extending from the bottom surface into the interior space of the container. The protrusion 735C may be an alternative or supplement to the protrusion 745B from the inner wall surface 715B. The protrusions 745A, B, and 735C may provide additional surface area on which contaminants in the fluid flowing through the corresponding filter container and / or system may be deposited, thereby removing such contaminants from the fluid.

[0068] In various embodiments, continuing with method 900, fluid 880 may flow through filter opening 826, including through filter first end 824 of filter 820, and through filter plate 840 ( Figure 2 840 ). The fluid 880 flowing through the filter plate 840 may include minimal or no contaminants. The filter plate 840 may include a plate hole 842 disposed between a first plate surface (e.g., first plate surface 405) and a second plate surface (e.g., second plate surface 410) of the filter plate 840. For example, as described herein with respect to the filter plate 400 and the filter 300, the filter plate 840 may further include a plate hole edge 844 (an example of the plate hole edge 430 of the filter plate 400) that engages and / or couples with the filter 820 and / or the filter opening 826. Thus, the filter opening 826 may be aligned with and / or in fluid communication with the plate hole 842. Thus, the fluid 880 may flow from the filter opening 826 through the filter plate 840 via the plate hole 842. The filter plate 840 may further include a filter plate recess 846 disposed in the filter plate 840 through the second plate surface.

[0069] In various embodiments, fluid 880 can flow through filter container bottom surface 860 (an example of filter container bottom surface 605 of filter container 600) and the filter container bottom (step 910). Filter container bottom surface 860 can include container bottom apertures 862 disposed through the container bottom. Filter container bottom surface 860 can further include a container bottom rim 864 (an example of container bottom rim 630 of filter container 600) that engages and / or couples with filter plate 840, for example, engaging and / or coupling with plate apertures 842 and / or plate recesses 846, and / or as described herein with respect to filter plate 400 and filter container 600. Thus, plate apertures 842 can be aligned with and / or fluidically connected to container bottom apertures 862. Thus, fluid 880 can flow from filter opening 826 through filter plate 840 via plate apertures 842 and through filter container bottom surface 860 via container bottom apertures 862.

[0070] Fluid 880 may then flow through fluid outlet 801B and out of filter system 800 .

[0071] The components of the systems discussed herein may be constructed of any suitable material, such as a metal or metal alloy (eg, steel, aluminum, aluminum alloy, etc.).

[0072] Although exemplary embodiments of the present disclosure are described herein, it should be understood that the present disclosure is not limited thereto. For example, although reactor and filter systems have been described with reference to various specific configurations, the present disclosure is not necessarily limited to these examples. Various modifications, variations, and enhancements may be made to the systems and methods described herein without departing from the spirit and scope of the present disclosure.

[0073] The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various systems, components and configurations, and other features, functions, acts, and / or properties disclosed herein, as well as any and all equivalents thereof.

Claims

1. A filter system for a reactor system, comprising: a filter container comprising an outer wall, the outer wall surrounding an inner space of the filter container, the filter being disposed within the inner space of the filter container; A filter plate is provided in the filter container, the filter plate comprising: a first plate surface and a second plate surface, wherein the plate body spans between the first plate surface and the second plate surface; a plurality of plate holes, the plurality of plate holes being provided through the plate body spanning between the first plate surface and the second plate surface; and a plurality of plate hole edges protruding from the first plate surface, wherein each of the plate hole edges is disposed at or near a plate hole edge defining a corresponding plate hole and at least partially surrounds the corresponding plate hole; and a plurality of filters disposed on the first panel surface, wherein each filter engages the panel aperture rim such that the panel aperture rim positions the filter at a desired location, wherein each filter is configured to filter gas; One or more projections extending from an inner wall surface into the filter container interior space; and A baffle is disposed on a second end of the filter opposite the filter plate, the baffle including baffle holes disposed therethrough to facilitate flow of a portion of the gas between the plurality of filters.

2. The filter system of claim 1 , wherein each of the filters includes a filter opening extending through at least a portion of the length of the filter, wherein the filter opening is in fluid communication with one of the plurality of plate holes.

3. The filter system of claim 2, wherein the filter opening is disposed through a first filter end, the first filter end being opposite a second filter end.

4. The filter system of claim 3 , wherein the shape of the plate hole edge is complementary to at least a portion of the shape of the filter opening at the first end of the filter, wherein the first end of the filter contacts the first plate surface such that the plate hole edge is disposed within the filter opening.

5. The filter system of claim 3 , wherein each filter comprises filter material surrounding the filter opening and spanning between the first filter end and the second filter end, wherein the first filter end comprises a first filter end cap disposed on the first filter end, and the second filter end comprises a second filter end cap disposed on the second filter end, wherein the first filter end cap and the second filter end cap are connected to a support rod spanning between the first filter end cap and the second filter end cap, wherein the support rod is integral or unitary with the first filter end cap and the second filter end cap.

6. The filter system of claim 3 , wherein the filter opening is disposed through the second end of the filter, wherein the baffle at least one of: prevents or reduces gas from entering the filter opening through the second end of the filter, and facilitates passage of the gas through one side of the filter between the first end of the filter and the second end of the filter.

7. The filter system of claim 3 , wherein the filter container comprises a container bottom surface, the container bottom surface comprising a container bottom hole disposed through the container bottom surface, wherein the filter plate is disposed on the container bottom surface such that the plate hole and the filter opening are in fluid communication with the container bottom hole.

8. The filter system of claim 7, wherein the container bottom surface includes a container bottom rim protruding from the container bottom surface and at least partially surrounding the container bottom hole, wherein the container bottom rim engages the filter panel to control the position of the filter panel.

9. The filter system of claim 8, wherein the filter panel comprises a filter panel recess extending into the panel body through the second panel surface, wherein the shape of the filter panel recess is complementary to the shape of the container bottom edge, wherein the container bottom edge is disposed in the filter panel recess.

10. A reactor system comprising: reaction chamber; as well as A filter system is provided downstream of the reaction chamber, the filter system comprising: a filter container comprising an outer wall, the outer wall surrounding an inner space of the filter container, the filter being disposed within the inner space of the filter container; A filter plate is provided in the filter container, the filter plate comprising: a first plate surface and a second plate surface, wherein the plate body spans between the first plate surface and the second plate surface; a plate hole, the plate hole being provided through the plate body spanning between the first plate surface and the second plate surface; and a plate hole edge protruding from the first plate surface; and a filter disposed on the first panel surface, wherein the filter engages the panel aperture rim such that the panel aperture rim positions the filter in a desired position, wherein the filter is configured to filter gas; One or more projections extending from an inner wall surface into the filter container interior space; and A baffle is disposed on a second end of the filter opposite the filter plate, the baffle including baffle holes disposed therethrough to facilitate flow of a portion of the gas between the plurality of filters.

11. The reactor system of claim 10, wherein the filter comprises filter openings extending through at least a portion of the length of the filter, wherein the filter openings are in fluid communication with the plate holes.

12. The reactor system of claim 11 , wherein the filter opening is disposed through a first filter end, the first filter end being opposite a second filter end, wherein the plate hole edge has a shape that is complementary to at least a portion of the shape of the filter opening at the first filter end, wherein the plate hole edge is disposed within the filter opening.

Images