Analytical device and control method of analytical device

Abstract

The present invention provides an analysis device and a control method for the analysis device that can improve the efficiency of analysis operations. The analysis device includes: an irradiation device that irradiates electron beams to the surface of a sample; a plurality of detectors that respectively detect a plurality of detection signals emitted from the surface of the sample; a display unit that displays a plurality of observation images corresponding to the plurality of detection signals; and a control unit that controls the irradiation device and the display unit. The analysis device has a simultaneous display mode that displays at least two of the plurality of observation images in a simultaneous arrangement on the display unit. The analysis device also includes a storage unit that is used to store observation condition data including display conditions for at least two observation images. In the simultaneous display mode, the control unit displays at least two observation images on the display unit based on the observation condition data stored in the storage unit.

Description

Technical Field

[0001] The present disclosure relates to an analysis device and a control method of the analysis device. Background Art

[0002] Japanese Patent Application Laid-Open No. 8-320298 (Patent Document 1) discloses a display method for displaying an image (observation image) representing two-dimensional information of surface concavity and convexity of a sample and elemental analysis obtained by performing surface analysis of the sample using an X-ray analysis device such as an electron microanalyzer. In Patent Document 1, a plurality of observation images of the same analysis area obtained in one surface analysis process are displayed in a superimposed manner.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 8-320298 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] By displaying a plurality of observation images simultaneously on the same screen, the analyst can easily compare a plurality of observation images of the same analysis region, thereby enabling the analyst to appropriately and efficiently determine analysis conditions for performing a more detailed analysis.

[0008] On the other hand, the analyst needs to perform an operation for setting observation conditions so that each of the multiple observation images becomes an image suitable for the observation target. The observation conditions include multiple conditions such as the irradiation conditions and scanning conditions of the electron beam irradiated to the sample, and the display conditions of each image. The analyst sets these multiple conditions while referring to each of the multiple images displayed on the display unit. The observation condition setting operation needs to be performed every time multiple images are displayed simultaneously, so there is a concern that the efficiency of the analysis operation will be reduced.

[0009] The present disclosure is made to solve the above-mentioned problems, and an object of the present disclosure is to provide an analysis device and a control method of the analysis device that can improve the efficiency of analysis work.

[0010] Solutions for solving problems

[0011] An analysis device according to one embodiment of the present disclosure is an analysis device for observing and analyzing the surface of a sample, and comprises: an irradiation device for irradiating electron beams onto the surface of the sample; a plurality of detectors for respectively detecting a plurality of detection signals emitted from the surface of the sample; a display unit for displaying a plurality of observation images corresponding to the plurality of detection signals; and a control unit for controlling the irradiation device and the display unit. The analysis device has a simultaneous display mode for displaying at least two of the plurality of observation images in a simultaneous arrangement on the display unit. The analysis device also comprises a storage unit for storing observation condition data including display conditions for at least two observation images. In the simultaneous display mode, the control unit displays at least two observation images on the display unit based on the observation condition data stored in the storage unit.

[0012] Effects of the Invention

[0013] According to the present disclosure, it is possible to provide an analysis device and a control method of the analysis device that can improve the efficiency of analysis work. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is an overall configuration diagram of an electron probe microanalyzer as an example of an analysis device according to the embodiment.

[0015] Figure 2 It is a diagram showing an example of a display screen of the display unit in the simultaneous display mode.

[0016] Figure 3 This is a schematic diagram showing an observation condition list stored in the database.

[0017] Figure 4 This is a flowchart for explaining the procedure of the process of setting the observation conditions of the simultaneous display mode of EPMA.

[0018] Figure 5 This is a diagram for explaining a configuration example of observation condition data.

[0019] Figure 6 It is shown Figure 4 The flowchart of the details of the processing of S06 and S08 is shown in FIG.

[0020] Description of Reference Numerals

[0021] 1: electron gun; 2: deflection coil; 3: objective lens; 4: sample stage; 5: sample stage drive unit; 6, 6a, 6b: spectrometer; 7: secondary electron detector; 8: reflected electron detector; 9: deflection coil control unit; 10: control unit; 11: data processing unit; 12: CPU; 13: memory; 14: communication I / F; 15: operation unit; 16: display unit; 18: database; 100: analysis device; I1~I6: observation image; S: sample; E: electron beam. DETAILED DESCRIPTION

[0022] Hereinafter, the embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. In addition, the same reference numerals are attached to the same or corresponding parts in the drawings, and their description will not be repeated.

[0023] [Structure of the analysis device]

[0024] Figure 1 This is an overall structural diagram of an electron probe microanalyzer (EPMA) as an example of an analysis device involved in the embodiment. The analysis device involved in the present embodiment is a device that irradiates electron beams to a sample and uses an electron beam microanalysis method that detects and analyzes various signals generated from the sample to observe the surface of the sample and analyze the composition. The analysis device involved in the present embodiment is not limited to EPMA, and may also be a scanning electron microscope (SEM: Scanning Electron Microscope) equipped with an energy dispersive X-ray analyzer (EDS: Energy Dispersive Spectrometer).

[0025] Reference Figure 1 EPMA 100 includes an electron gun 1, a deflection coil 2, an objective lens 3, a sample stage 4, a sample stage driving unit 5, a plurality of spectrometers 6a, 6b, a secondary electron detector 7, and a reflected electron detector 8. In addition, EPMA 100 also includes a control unit 10, a data processing unit 11, a deflection coil control unit 9, an operation unit 15, and a display unit 16. The electron gun 1, the deflection coil 2, the objective lens 3, the sample stage 4, the spectrometers 6a, 6b, and the detectors 7, 8 are disposed in a measurement chamber not shown in the figure, and during the measurement of X-rays, the measurement chamber is exhausted to a vacuum state.

[0026] The electron gun 1 is an excitation source for generating electron beams E to be irradiated to the sample S on the sample stage 4. The irradiation current of the electron beams E can be adjusted by controlling a focusing lens (not shown). The deflection coil 2 forms a magnetic field by a driving current supplied from the deflection coil control unit 9. The electron beams E can be deflected by the magnetic field formed by the deflection coil 2.

[0027] The objective lens 3 is provided between the deflection coil 2 and the sample S placed on the sample stage 4, and is used to reduce the electron beam E that has passed through the deflection coil 2 to a small diameter. The electron gun 1, the deflection coil 2, and the objective lens 3 constitute an "irradiation device" for irradiating the electron beam toward the sample. The sample stage 4 is a stage for placing the sample S, and is configured to be movable in a horizontal plane by the sample stage driving unit 5.

[0028] By driving the sample stage 4 by the sample stage driving unit 5 and / or driving the deflection coil 2 by the deflection coil control unit 9, it is possible to two-dimensionally scan the irradiation position of the electron beam E on the sample S. When the scanning range is relatively narrow, the deflection coil 2 is used for scanning, and when the scanning range is relatively wide, the sample stage 4 is moved for scanning.

[0029] The spectrometers 6a and 6b are devices for detecting characteristic X-rays emitted from the sample S irradiated with the electron beam E. Figure 1 In the example of FIG. 1 , two spectrometers 6a and 6b are shown, but the number of spectrometers is not limited thereto and may be one or more than three. The structure of each spectrometer is the same except for the spectrometer crystal, and each spectrometer is sometimes referred to as "spetrometer 6" hereinafter.

[0030] The spectrometer 6a includes a spectroscopic crystal 61a, a detector 63a, and a slit 64a. The irradiation position of the electron beam E on the sample S, the spectroscopic crystal 61a, and the detector 63a are located on a Rowland circle not shown in the figure. Through a driving mechanism not shown in the figure, the spectroscopic crystal 61a moves on the straight line 62a while tilting, and the detector 63a rotates as shown in the figure in accordance with the movement of the spectroscopic crystal 61a, so that the incident angle of the characteristic X-ray to the spectroscopic crystal 61a and the emission angle of the diffracted X-ray meet the Bragg diffraction condition. In this way, the wavelength scanning of the characteristic X-ray emitted from the sample S can be performed.

[0031] The spectrometer 6b includes a spectroscopic crystal 61b, a detector 63b, and a slit 64b. The structure of the spectrometer 6b is the same as that of the spectrometer 6a except for the spectroscopic crystal, so it will not be described again. In addition, the structure of each spectrometer is not limited to the above structure, and various known structures can be adopted.

[0032] The secondary electron detector 7 is a device for detecting secondary electrons emitted from the sample S irradiated with the electron beam E.

[0033] The reflected electron detector 8 is a device for detecting reflected electrons emitted from the sample S irradiated with the electron beam E.

[0034] The control unit 10 includes a CPU (central processing unit) 12, a memory 13, and a communication interface (I / F) 14. The memory 13 includes a ROM (read only memory) and a RAM (random access memory) not shown. The CPU 12 expands the program stored in the ROM in the RAM or the like and executes the program. The program stored in the ROM is a program that records the processing procedures of the control unit 10. Various tables (mappings) for various operations are also stored in the ROM. The control unit 10 performs various processes in the EPMA 100 according to these programs and tables. Regarding the processing, it is not limited to software-based processing, and the processing can also be performed using dedicated hardware (electronic circuits). The communication I / F 14 is connected to a communication network such as the Internet, and the EPMA 100 exchanges data with external devices via the communication I / F 14.

[0035] Although not shown in the figure, the data processing unit 11 also includes a CPU, a memory, and an input / output buffer. The data processing unit 11 produces an observation image (secondary electron image, reflected electron image, characteristic X-ray image) of the surface of the sample S based on various signals emitted from the sample S. The data processing unit 11 also produces a characteristic X-ray spectrum of the analysis object. In addition, the data processing unit 11 can also be integrally formed with the control unit 10.

[0036] The deflection yoke controller 9 controls the drive current supplied to the deflection yoke 2 according to the instruction from the controller 10. By controlling the drive current according to a predetermined drive current pattern (magnitude and change speed), the irradiation position of the electron beam E can be scanned on the sample S at a desired scanning speed.

[0037] The operation unit 15 is an input device for the analyst to provide various instructions to the EPMA 100, and is composed of, for example, a mouse, a keyboard, etc. The display unit 16 is an output device for providing various information to the analyst, and is composed of, for example, a display having a touch panel that the analyst can operate. In addition, the touch panel can also be used as the operation unit 15.

[0038] <Simultaneous display mode>

[0039] EPMA 100 is configured to irradiate electron beams onto the surface of a sample S, and to observe the structure and morphology of the surface of the sample S and to perform local element analysis using various signals emitted from the surface. EPMA 100 displays an observed image (characteristic X-ray image, secondary electron image, reflected electron image) of the surface of the sample S on the display unit 16 while scanning the electron beam E on the sample S. Thus, the analyst can observe the surface of the sample S in real time.

[0040] The EPMA 100 has a mode for displaying at least two observation images among a plurality of observation images in a row at the same time as an observation image display mode. In the present specification, such a display mode is also referred to as a "simultaneous display mode."

[0041] Figure 2 FIG. 1 is a diagram showing an example of a display screen of the display unit in the simultaneous display mode. Figure 2 In the example, six observation images I1 to I6 are displayed in a row on the display screen of the display unit 16. Observation image I1 is a secondary electron image of the irradiation position of the electron beam E on the sample S. The shape of the surface of the sample S is reflected in the secondary electron image. Observation image I2 is a reflected electron image of the irradiation position. The composition of the surface of the sample S is reflected in the reflected electron image. Observation images I3 to I6 are characteristic X-ray images of the irradiation position. The distribution of the target elements contained in the sample S is reflected in the characteristic X-ray image. In addition, the elements of the observation objects of observation images I3 to I6 are different from each other.

[0042] In the simultaneous display mode, the analyst can compare multiple observation images I1 to I6 and obtain the following insights in a short time: what kind of elements are distributed in the area of ​​interest of the secondary electron image and / or the reflected electron image, or how the area where a specific element is distributed is observed in the secondary electron image and / or the reflected electron image. As a result, the analyst can appropriately and efficiently determine the analysis conditions for performing a more detailed analysis.

[0043] On the other hand, when executing the simultaneous display mode, the analyst needs to perform an operation for setting observation conditions so that each of the plurality of observation images I1 to I6 becomes an image suitable for the observation target. The observation conditions include the irradiation conditions of the electron beam E, the scanning conditions of the electron beam E, and the display conditions of each observation image. The display conditions of each observation image include the contrast / brightness conditions of the secondary electron image and the reflected electron image, the brightness conversion conditions of the characteristic X-ray image, and the layout conditions of each observation image in the display unit 16.

[0044] The analyst sets these multiple conditions while referring to each of the multiple observation images I1 to I6 displayed on the display unit 16. Since the observation condition setting operation needs to be performed every time the simultaneous display mode is performed, there is a concern that the efficiency of the analysis operation may be reduced.

[0045] Therefore, in the EPMA 100 according to the present embodiment, the observation conditions set in the simultaneous display mode are collected as one piece of data, so that the data can be stored and reused. In the following description, data related to observation conditions is also referred to as "observation condition data."

[0046] Specifically, EPMA 100 is configured to store the observation condition data generated by the analyst performing the above-mentioned setting operation in a database 18. The database 18 can be set in a non-volatile storage area in the memory of the control unit 10. Alternatively, the database 18 can be set in an external device (for example, a storage device, etc.), which is connected to EPMA 100 via a network in a communicable manner. The storage device can be composed of a non-volatile storage device such as a HDD (Hard Disk Drive) or an SSD (Solid State Drive). The database 18 corresponds to an embodiment of the "storage unit".

[0047] A plurality of observation condition data are stored in the database 18. The database lists the plurality of observation condition data stored therein to create an observation condition list. Figure 3 1 is a schematic diagram showing an observation condition list stored in the database 18 .

[0048] like Figure 3 As shown in FIG. 1 , the observation condition list lists the file names of the observation condition data generated in the past by the analyst. In addition, the analyst can arbitrarily set the file name of the observation condition data.

[0049] In the observation condition list, information indicating the observation target can be annotated for each observation condition data. The information indicating the observation target can include, for example, information related to the sample being observed and information related to the element of the observation object. As information related to the sample, for example, identification information of the sample such as the sample name or the material name of the sample can be included. As information related to the element of the observation object, for example, identification information of the element such as the element symbol or element name of the observation object can be included. However, the information indicating the observation target is not limited to this information, and the analyst can arbitrarily set it in a way that the analyst can uniquely grasp the observation target.

[0050] EPMA 100 is configured to operate in accordance with the operation of the analyst. Figure 3 The observation condition list shown is displayed on the display unit 16. When the analyst executes the simultaneous display mode, he can select the observation condition data he wants to use from the displayed observation condition list. Specifically, the analyst can select the observation condition data that is consistent with or similar to his own observation target by referring to the observation target annotated to each observation condition data. The EPMA 100 sets the operation of each part of the EPMA 100 based on the observation conditions included in the observation condition data selected by the analyst.

[0051] Thus, the analyst can reuse observation condition data that is identical or similar to the sample to be observed and / or observation condition data that is identical or similar to the element to be observed, thereby omitting or simplifying the observation condition setting operation that the analyst needs to perform. As a result, the efficiency of the analysis operation can be improved.

[0052] Furthermore, when observing a plurality of samples of the same type, the analyst can observe the plurality of samples under the same observation conditions by repeatedly using the common observation condition data, thereby making it possible to compare the observation results between the plurality of samples easily and accurately.

[0053] <Observation Condition Setting Process>

[0054] Next, a description will be given of a process of setting observation conditions in the simultaneous display mode of the EPMA 100 according to the present embodiment.

[0055] Figure 4 1 is a flowchart for explaining the process of setting the observation conditions of the simultaneous display mode of the EPMA 100. This can be realized by the control unit 10 reading and executing the program stored in the memory 13. Figure 4 Flowchart of the process.

[0056] Reference Figure 4 When the EPMA 100 is started, the control unit 10 starts scanning the irradiation position of the electron beam E on the sample S through step (hereinafter simply recorded as "S") 01. In S01, the control unit 10 controls the driving of the irradiation device based on the preset initial conditions. Specifically, the control unit 10 controls the driving of the sample stage 4 by the sample stage driving unit 5 and / or the driving of the deflection coil 2 by the deflection coil control unit 9. Under the initial conditions, the irradiation conditions and scanning conditions of the electron beam E are set to default values. The spectrometers 6a, 6b, the secondary electron detector 7 and the reflected electron detector 8 respectively detect the characteristic X-rays, secondary electrons and reflected electrons emitted from the sample S irradiated with the electron beam E.

[0057] The control unit 10 determines whether the simultaneous display mode is set to ON in S02. When the operation unit 15 receives an operation input for turning on the simultaneous display mode, the control unit 10 determines "YES" in S02 and starts the processing after S03.

[0058] In S03, the control unit 10 displays a plurality of observation images in parallel on the display unit 16 based on preset initial conditions. Under the initial conditions, the display conditions of each observation image (layout conditions of the observation images and display conditions of the detection signals) are set to default values.

[0059] The control unit 10 uses step S04 to make the observation condition list stored in the database 18 (see Figure 3 ) is displayed on the display unit 16. The observation condition list lists the file names of the observation condition data generated by the analyst in the past. Information indicating the observation target is annotated to each observation condition data. When the observation condition list is displayed, the control unit 10 can accept the selection of the observation condition data by the analyst.

[0060] When the operation unit 15 accepts an operation of selecting one observation condition data from the observation condition list, the control unit 10 determines "yes" in S05 and starts the process of S06. In S06, the control unit 10 sets the operation of each unit of the EPMA 100 based on the observation condition included in the selected observation condition data. Figure 5 This is a diagram for explaining a configuration example of observation condition data.

[0061] like Figure 5 As shown, the observation conditions include electron beam irradiation conditions, electron beam scanning conditions, observation image layout conditions, and detection signal display conditions. Each condition includes at least one setting item.

[0062] Specifically, the electron beam irradiation conditions include, as setting items, the acceleration voltage and irradiation current of the electron beam E. The electron beam scanning conditions include, as setting items, the scanning magnification and scanning speed of the electron beam E.

[0063] The layout conditions of the observation images include the number of observation images to be simultaneously displayed on the display unit 16 and the type of detection signal used to display the observation images as setting items. The analyst can set at least two observation images corresponding to at least two detection signals among the plurality of detection signals (secondary electrons, reflected electrons, and characteristic X-rays) acquired by the EPMA 100 as display objects.

[0064] In addition, when the observation image of characteristic X-rays is set as the display object, the analyst can Figure 1 ) specifies the number of the spectrometer 6 for detecting the characteristic X-ray of the element of the observation target, and the spectral wavelength of the spectrometer 6 with the specified number can be set to the wavelength of the characteristic X-ray of the element of the observation target. In the specified spectrometer 6, the spectral crystal 61 and the detector 63 are driven by the driving mechanism so that the spectral wavelength becomes the set wavelength. In this way, the characteristic X-ray image of the element of the observation target can be displayed. The types of detection signals for displaying the observation image mentioned above can include information related to the number of the spectrometer 6 and the spectral wavelength of the spectrometer 6.

[0065] The setting items of the layout conditions of the observation images may also include the ratio of the display area of ​​each observation image on the screen of the display unit 16 and the display color of each observation image. Figure 2 In the example of FIG. 1 , six observation images I1 to I6 are displayed in the same size. However, the analyst can display multiple observation images in different sizes by changing the ratio of the display area of ​​each observation image according to the observation target. In addition, the analyst can display multiple observation images in different colors by setting the display color for each observation image.

[0066] The display conditions of the detection signal include the contrast / brightness conditions of the secondary electron image and the reflected electron image as setting items. The secondary electron image has a brightness distribution corresponding to the surface shape of the sample S. The reflected electron image has a brightness distribution corresponding to the composition distribution of the sample S. In addition, the larger the atomic number of the elements constituting the sample, the more reflected electrons are generated. The analyst can set the contrast and brightness for the secondary electron image and the reflected electron image respectively to make the brightness distribution appropriate.

[0067] The display conditions of the detection signal also include the brightness conversion conditions of the characteristic X-ray image. In real-time observation, since the measurement time of the characteristic X-ray of each pixel of the observation image is short, there is a tendency that the X-ray intensity (count value) that can be measured becomes smaller. The data processing unit 11 can obtain a two-dimensional characteristic X-ray image by binarizing the count value of each pixel using a threshold value. The analyst can set the threshold value in the binarization process so that the characteristic X-ray image appropriately reflects the concentration distribution of the target element.

[0068] Return to Figure 4 If no observation condition data is selected from the observation condition list, the control unit 10 determines "No" in S05 and starts the processing after S07. In S07, the control unit 10 can accept the setting input of the observation condition data by the analyst. The analyst can use the operation unit 15 to adjust the observation condition data while referring to each observation image displayed on the display unit 16. Figure 5 Set each setting item included in the observation conditions shown.

[0069] In S08, the control unit 10 sets the operation of each unit of the EPMA 100 based on the observation conditions set by the analyst in S07. In S09, the control unit 10 further collects the observation conditions set by the analyst in S07 into one data, thereby generating observation condition data.

[0070] The control unit 10 saves the generated observation condition data in the database 18. When saving the observation condition data, the analyst can give the observation condition data an arbitrary file name. In addition, the analyst can add information indicating the observation target (e.g., sample name, element name of the observation object, etc.) to the observation condition data. The database 18 adds the generated observation condition data to the observation condition list (see Figure 5 ).

[0071] In S09, the observation conditions set by the analyst are stored as new observation condition data, but the control unit 10 can also overwrite and update the observation condition data already stored in the database 18 with the observation conditions set by the analyst. The analyst can instruct the control unit 10 through the operation unit 15 whether to store the set observation conditions in the database 18 as new observation condition data or to overwrite and update the existing observation condition data already stored in the database 18.

[0072] Figure 6 It is shown Figure 4 The flowchart of the details of the processing of S06 and S08 is shown in FIG.

[0073] Reference Figure 6 The control unit 10 first stops the driving of the sample stage 4 by the sample stage driving unit 5 and the driving of the deflection coil 2 by the deflection coil control unit 9 in S10 , thereby stopping the scanning of the electron beam E.

[0074] Next, in S11, the control unit 10 sets the irradiation conditions of the electron beam E based on the observation conditions selected or set by the analyst. The control unit 10 sets the acceleration voltage and irradiation current of the electron beam E to the acceleration voltage and irradiation current set in the observation conditions, respectively.

[0075] In S12, the control unit 10 sets the scanning conditions of the electron beam E based on the observation conditions selected or set by the analyst. The control unit 10 sets the scanning magnification and scanning speed of the electron beam E to the scanning magnification and scanning speed set in the observation conditions, respectively.

[0076] The control unit 10 sets the layout conditions of the observation images based on the observation conditions selected or set by the analyst through S13. Specifically, the control unit 10 sets the number of observation images displayed simultaneously on the display unit 16 and the type of detection signal used to display the observation images to the number and type set in the observation conditions. In the case where the detection signal contains characteristic X-rays, the control unit 10 sets the spectroscopic wavelength of the spectrometer 6 specified in the layout conditions to the wavelength set in the conditions (the wavelength of the characteristic X-rays of the element of the observation object) through the driving mechanism. The control unit 10 also sets the ratio of the display area of ​​each observation image on the screen of the display unit 16 and the display color of each observation image to the ratio and display color set in the observation conditions.

[0077] In S14, the control unit 10 sets the display conditions of the detection signal based on the observation conditions selected or set by the analyst. The control unit 10 sets the contrast and brightness of the secondary electron image and the reflected electron image to the contrast and brightness set in the observation conditions, respectively. In addition, the control unit 10 sets the threshold value for the brightness conversion process (binarization process) of the characteristic X-ray image to the threshold value set in the observation conditions.

[0078] When the operation of each part of the EPMA 100 is set through the processing of S11 to S14, the control unit 10 starts scanning the irradiation position of the electron beam E on the sample S through S15. In S15, the control unit 10 controls the driving of the irradiation device so that the irradiation position of the electron beam E is scanned on the sample S under the irradiation conditions and scanning conditions of the electron beam E set in S11 and S12.

[0079] When scanning of the irradiation position of the electron beam E starts, the spectrometers 6a and 6b, the secondary electron detector 7 and the reflected electron detector 8 detect characteristic X-rays, secondary electrons and reflected electrons emitted from the sample S irradiated with the electron beam E, respectively, through S16.

[0080] In S17, the control unit 10 displays the plurality of observation images in a row on the display unit 16. At this time, the control unit 10 displays the plurality of observation images based on the display conditions of the observation images set in S13 and S14. Thus, the plurality of observation images having the luminance distribution set in S14 are displayed in a row on the display unit 16 in the layout set in S13.

[0081] The control unit 10 determines whether the simultaneous display mode is set to off in S18. When the operation unit 15 accepts the operation input for turning off the simultaneous display mode, the control unit 10 determines "yes" in S18 and ends the processing of S17. When the operation unit 15 does not accept the operation input for turning off the simultaneous display mode, the control unit 10 determines "no" in S18 and continues the processing of S15 to S17.

[0082] Furthermore, when the observation conditions are changed during the simultaneous display mode, the analyst can instruct the control unit 10 via the operation unit 15 whether to store the changed observation conditions as new observation condition data in the database 18 or to overwrite and update the existing observation condition data stored in the database 18 .

[0083] In addition, in the above-mentioned embodiment, a configuration example in which observation condition data is stored in the database 18 built in the control unit 10 of the EPMA 100 is described, but the database can be set in an external device (for example, a storage device, etc.), and the external device is connected to the EPMA 100 via a network in a communicable manner. In this case, observation condition data generated by other analysis devices connected via network communication can also be stored in the database. As a result, the analyst can also reuse the observation condition data of other analysis devices, so that the efficiency of the analysis work can be promoted.

[0084] [Way]

[0085] Those skilled in the art will appreciate that the above-described multiple exemplary embodiments are specific examples of the following aspects.

[0086] (Item 1) An analysis device according to one embodiment observes and analyzes the surface of a sample. The analysis device includes: an irradiation device that irradiates electron beams onto the surface of the sample; a plurality of detectors that respectively detect a plurality of detection signals emitted from the surface of the sample; a display unit that displays a plurality of observation images corresponding to the plurality of detection signals; and a control unit that controls the irradiation device and the display unit. The analysis device has a simultaneous display mode in which at least two of the plurality of observation images are displayed in a simultaneous arrangement on the display unit. The analysis device also includes a storage unit for storing observation condition data including display conditions for at least two observation images. In the simultaneous display mode, the control unit displays at least two observation images on the display unit based on the observation condition data stored in the storage unit.

[0087] According to the analysis device described in the first item, the analyst can use the observation condition data stored in the storage unit, so that the setting operation of the observation condition to be performed by the analyst can be omitted or simplified. As a result, the efficiency of the analysis operation can be improved. In addition, when observing multiple samples of the same type, the analyst can observe the multiple samples under the same observation conditions by repeatedly using the common observation condition data. As a result, the observation results can be compared simply and accurately between the multiple samples.

[0088] (Item 2) The analysis device described in Item 1 further includes an operation unit for accepting settings related to observation conditions of a plurality of observation images. When the operation unit accepts settings related to observation conditions of at least two observation images in the simultaneous display mode, the control unit generates observation condition data of the at least two observation images and stores the data in the storage unit.

[0089] According to the analysis device described in the second aspect, the analyst can repeatedly use the observation condition data stored in the storage unit, thereby omitting or simplifying the operation of setting the observation conditions that the analyst needs to perform. As a result, the efficiency of the analysis operation can be improved.

[0090] (Item 3) In the analysis device according to Item 2, the control unit adds information related to the observation target of the sample to the observation condition data of at least two observation images and stores the data in the storage unit.

[0091] According to the analysis device described in the third item, the analyst can select observation condition data that is consistent or similar to the sample to be observed and / or observation condition data that is consistent or similar to the element of the observation object by referring to the annotated information, and reuse them. In addition, when observing multiple samples of the same type, the analyst can reuse the common observation condition data.

[0092] (Item 4) In the analysis device described in Item 2 or Item 3, when the operation unit accepts the setting of the synchronous display mode, the control unit causes the display unit to display the list of observation condition data stored in the storage unit. When the operation unit accepts the operation of selecting one observation condition data from the list, the control unit causes the display unit to display at least two observation images based on the selected observation condition data.

[0093] According to the analysis device described in the fourth item, when executing the simultaneous display mode, the analyst can select the observation condition data he wants to use from the displayed observation condition list. Thus, the analyst can select observation condition data that is consistent or similar to the sample to be observed and / or observation condition data that is consistent or similar to the element of the observation object to be observed for repeated use. In addition, when observing multiple samples of the same type, the analyst can reuse the common observation condition data.

[0094] (Item 5) In the analysis device described in Items 1 to 4, the display conditions of at least two observation images include conditions related to the layout of at least two observation images in the display unit and display conditions of at least two detection signals corresponding to the at least two observation images.

[0095] According to the analysis device described in the fifth aspect, the analyst can omit or simplify the setting of the layout of at least two or more observation images displayed simultaneously and the display conditions of the detection signals.

[0096] (Item 6) In the analysis device described in Items 1 to 5, the observation condition data further includes electron beam irradiation conditions and electron beam scanning conditions.

[0097] According to the analysis device described in item 6, the analyst can omit or simplify the setting of the electron beam irradiation conditions and the scanning conditions for at least two or more observation images displayed simultaneously.

[0098] (Item 7) A control method for an analysis device according to one embodiment is a control method for an analysis device for observing and analyzing a sample surface. The analysis device includes: an irradiation device for irradiating electron beams onto the surface of the sample; a plurality of detectors for respectively detecting a plurality of detection signals emitted from the surface of the sample; and a display unit for displaying a plurality of observation images corresponding to the plurality of detection signals. The analysis device has a simultaneous display mode for displaying at least two of the plurality of observation images in a display unit in a simultaneous manner. The control method includes the following steps: storing observation condition data including display conditions for at least two or more observation images in a storage unit; and in the simultaneous display mode, displaying at least two observation images on the display unit based on the observation condition data stored in the storage unit.

[0099] According to the control method described in the seventh item, the analyst can use the observation condition data stored in the storage unit, thereby omitting or simplifying the setting operation of the observation condition to be performed by himself. As a result, the efficiency of the analysis operation can be improved. In addition, when observing multiple samples of the same type, the analyst can observe the multiple samples under the same observation conditions by repeatedly using the common observation condition data. As a result, the observation results can be compared easily and accurately between the multiple samples.

[0100] (Item 8) The control method of the analysis device described in Item 7 further includes the following steps: when settings related to observation conditions of at least two observation images are accepted in the simultaneous display mode, observation condition data of at least two observation images are generated and saved in the storage unit.

[0101] According to the control method of the analyzer described in the eighth aspect, the analyst can reuse the observation condition data stored in the storage unit, thereby omitting or simplifying the operation of setting the observation conditions that the analyst needs to perform. As a result, the efficiency of the analysis operation can be improved.

[0102] In addition, regarding the above-mentioned embodiment and modification examples, it is planned from the time of filing the application that the configurations described in the embodiment may be appropriately combined within a range that does not cause problems or contradictions, including combinations not mentioned in the specification.

[0103] The embodiments disclosed this time should be considered as illustrative in all aspects and not restrictive. The scope of the present invention is indicated by the claims rather than the above description, and is intended to include all modifications within the meaning and scope equivalent to the claims.

Claims

1. An analysis device for observing and analyzing a sample surface, the analysis device comprising: an irradiation device for irradiating electron beams toward the surface of the sample; A plurality of detectors, each of which detects a plurality of detection signals emitted from the surface of the sample; a display unit that displays a plurality of observation images corresponding to the plurality of detection signals, respectively; as well as a control unit that controls the irradiation device and the display unit, The analysis device has a simultaneous display mode for arranging and displaying at least two of the plurality of observation images on the display unit at the same time, and the analysis device further comprises a storage unit for storing observation condition data including display conditions of the at least two observation images. In the simultaneous display mode, the control unit sets the operation of the irradiation device, the plurality of detectors, and the display unit based on the observation condition data stored in the storage unit, and displays the at least two observation images on the display unit. The plurality of detectors include at least one spectrometer for detecting characteristic X-rays emitted from the surface of the sample irradiated with the electron beam, and the plurality of detection signals include at least one characteristic X-ray respectively detected by the at least one spectrometer. The display conditions of the at least two observation images include a first condition related to the layout of the at least two observation images on the display unit, and the first condition includes a condition related to the spectroscopic wavelength of a spectrometer for detecting the characteristic X-rays.

2. The analysis device according to claim 1, wherein further comprising an operation unit for accepting settings related to observation conditions of the plurality of observation images, When the operation unit accepts a setting related to observation conditions of the at least two observation images in the simultaneous display mode, the control unit generates the observation condition data of the at least two observation images and stores the data in the storage unit.

3. The analysis device according to claim 2, wherein: The control unit adds information related to an observation target of the sample to the observation condition data of the at least two observation images and stores the data in the storage unit.

4. The analysis device according to claim 2 or 3, wherein: When the operation unit accepts the setting of the simultaneous display mode, The control unit causes the display unit to display the list of the observation condition data stored in the storage unit, When the operation unit accepts an operation of selecting one observation condition data from the list, the control unit causes the display unit to display the at least two observation images based on the selected observation condition data.

5. The analysis device according to claim 1, wherein The display conditions of the at least two observation images further include display conditions of at least two detection signals corresponding to the at least two observation images.

6. The analysis device according to claim 1, wherein The observation condition data further includes irradiation conditions of the electron beam and scanning conditions of the electron beam.

7. A method for controlling an analysis device, wherein the analysis device observes and analyzes a sample surface. The analysis device comprises: an irradiation device for irradiating electron beams toward the surface of the sample; A plurality of detectors, each of which detects a plurality of detection signals emitted from the surface of the sample; as well as a display unit that displays a plurality of observation images corresponding to the plurality of detection signals, respectively; The analyzing device has a simultaneous display mode for arranging and displaying at least two of the plurality of observation images on the display unit at the same time. The control method comprises the following steps: storing observation condition data including display conditions of the at least two observation images in a storage unit; as well as In the simultaneous display mode, the operations of the irradiation device, the plurality of detectors, and the display unit are set based on the observation condition data stored in the storage unit, and the at least two observation images are displayed on the display unit. The plurality of detectors include at least one spectrometer for detecting characteristic X-rays emitted from the surface of the sample irradiated with the electron beam, and the plurality of detection signals include at least one characteristic X-ray respectively detected by the at least one spectrometer. The display conditions of the at least two observation images include a first condition related to the layout of the at least two observation images on the display unit, and the first condition includes a condition related to the spectroscopic wavelength of a spectrometer for detecting the characteristic X-rays.

8. The control method of the analysis device according to claim 7, wherein: The following steps are also included: When the setting related to the observation conditions of the at least two observation images is accepted in the simultaneous display mode, observation condition data of the at least two observation images is generated and stored in the storage unit.

Images