A doping safety processing system in a vacuum furnace

Abstract

The present invention provides a system for safely handling doping in a vacuum furnace, comprising a vacuum furnace, a first vacuum pumping subsystem and a second vacuum pumping subsystem for evacuating gas from the vacuum furnace, and a water-gas separator for treating the evacuated gas; the air inlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the air outlet end of the vacuum furnace via a first three-way pipe, and the air outlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the water-gas separator via a second three-way pipe. The system for safely handling doping in a vacuum furnace described in the present invention has two sets of vacuum control systems. The existence of the two sets of processing systems can meet production needs at a lower cost; and in the event of an emergency, the two units can be quickly switched. Even if one unit cannot guarantee production due to special circumstances, switching to the other unit can ensure the normal operation of the equipment production, thus providing double insurance and providing two sets of system guarantees for production safety.

Description

Technical Field

[0001] The invention belongs to the technical field of crystal pulling furnaces, and in particular relates to a doping safety processing system in a vacuum furnace. Background Art

[0002] During the production process, the crystal pulling furnace will dope various trace elements such as phosphorus and arsenic to improve product quality. During production, phosphorus, arsenic and other elements are extracted by the vacuum pump and discharged through the exhaust pipe.

[0003] 1. Red phosphorus and arsenic in impurities can enter the human body through inhalation, ingestion, and skin contact. Frequent ingestion of red phosphorus and arsenic dust can cause poisoning;

[0004] 2. After the vacuum pump is used to evacuate the air, red phosphorus and arsenic will remain in the centralized exhaust pipe. The ignition temperature of red phosphorus is 260°C, and it is very sensitive to heat, friction and impact, which poses a great safety hazard during use.

[0005] 3. During the production process, regular cleaning of residues also wastes manpower and increases costs to a certain extent.

[0006] During the production process, a vacuum furnace uses a vacuum system (consisting of a carefully assembled vacuum pump, vacuum measuring device, vacuum valve, and other components) to expel some of the material from the furnace cavity, reducing the pressure inside the cavity to less than one standard atmospheric pressure. This creates a vacuum state within the furnace cavity. Because the furnace requires a vacuum environment, a vacuum pump is required to continuously evacuate the space. The exhaust gas is pumped through the vacuum pump, through the exhaust pipe, into the centralized exhaust pipe, and finally into the treatment system.

[0007] During the production process, various trace elements such as phosphorus and arsenic are added to meet product quality requirements. Some of these trace elements will volatilize in high-temperature environments or during the production process. Due to the adsorption and discharge properties of the vacuum pump, the volatile elements pass through the pipeline, then pass through the vacuum pump, and finally are discharged through the pipeline. This is the current production process.

[0008] Current hidden dangers: Red phosphorus can pass through pipes and pumps during discharge, particularly through the centralized exhaust pipes behind the pumps, and remain there. Due to the excessive number of production furnaces and long pipelines, and the high temperatures of the vacuum oil pumps, oil vapor, red phosphorus, arsenic, and other elements are generated, forming an oil-gas mixture. These factors, combined with the flammable and explosive properties of red phosphorus and the toxicity of arsenic, can cause fires, violent explosions, toxic gases, and other dangerous hazards, resulting in serious risks to life and property. Prevention is imperative, and eliminating these hidden dangers during production has become a top priority.

[0009] After analyzing the characteristics of the doped trace elements and the working production environment, safe production can be achieved by controlling the temperature and decomposing the trace elements.

[0010] The plan is as follows:

[0011] Currently, the main methods for producing silicon single crystals are the Czochralski (CZ) and the flux-zone (FZ) methods. Czochralski accounts for 70% to 80% of the world's silicon single crystal production. The commonly used Czochralski process for producing silicon single crystals uses a reduced-pressure pulling process that resembles both a vacuum process and a flowing atmosphere process.

[0012] During the silicon single crystal pulling process, the vacuum pulling process continuously and evenly introduces an inert gas (generally high-purity argon) into the furnace chamber. Simultaneously, a vacuum pump continuously extracts air from the furnace chamber to maintain a stable vacuum level of (2.7-5.3) × 103 Pa. This process combines the characteristics of a vacuum process (maintaining a negative pressure in the furnace chamber) with those of a flowing atmosphere process (continuous filling and exhaust).

[0013] This process allows high-purity argon gas to flow from top to bottom throughout the entire silicon single crystal growth area during silicon single crystal growth, promptly removing silicon oxides and volatile impurities generated by the high temperature, thereby ensuring the quality of the silicon single crystal. The vacuum system for the most commonly used Czochralski method of pulling silicon single crystals is generally equipped with a sliding valve vacuum pump. However, with the increasing demand for silicon single crystals with special requirements, such as large diameter and heavily doped crystals, the requirements for single crystal furnace equipment are becoming increasingly stringent, and the shortcomings of sliding valve vacuum pumps are becoming increasingly apparent.

[0014] The shortcomings of the vacuum system of the vertical single crystal furnace using a sliding valve vacuum pump are eliminated. By transforming the vacuum system, a water ring vacuum pump is applied to the vertical single crystal furnace equipment, thereby improving the overall performance of the vertical single crystal furnace. Summary of the Invention

[0015] In view of this, the present invention aims to propose a doping safety treatment system in a vacuum furnace to solve the problem of direct discharge of gas extracted by a vacuum pump in a crystal pulling furnace during production, causing harm to the human body.

[0016] To achieve the above object, the technical solution of the present invention is achieved as follows:

[0017] A doping safety treatment system in a vacuum furnace comprises a vacuum furnace, a first vacuum pumping subsystem for pumping gas in the vacuum furnace, a second vacuum pumping subsystem, and a water-gas separator for processing the pumped gas;

[0018] The air inlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the air outlet end of the vacuum furnace through a first tee pipe, and the air outlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the water-gas separator through a second tee pipe;

[0019] The first vacuum pumping subsystem includes a first vacuum pump;

[0020] The second vacuum pumping subsystem includes a water ring vacuum pump.

[0021] Furthermore, the first vacuum pumping subsystem also includes a centralized exhaust pipe and a second vacuum pump. The air inlet end of the first vacuum pump is connected to a first pneumatic valve, the air inlet end of the first pneumatic valve is connected to a first three-way pipe, the air outlet end of the first pneumatic valve is connected to the air inlet end of the first vacuum pump, the air outlet end of the first vacuum pump is connected to the air inlet of the centralized exhaust pipe, the air outlet of the exhaust pipe is connected to the air inlet end of the second vacuum pump, the air outlet end of the second vacuum pump is connected to a second pneumatic valve, and the other end of the second pneumatic valve is connected to one end of the second three-way pipe.

[0022] Furthermore, the air inlet end of the water ring hollow pump is connected to a third pneumatic valve, the air inlet end of the third pneumatic valve is connected to the first three-way pipe, the air outlet end of the third pneumatic valve is connected to the air inlet end of the water ring vacuum pump, the air outlet end of the water ring vacuum pump is connected to a fourth pneumatic valve, the air inlet end of the fourth pneumatic valve is connected to the air outlet end of the water ring vacuum pump, and the air outlet end of the fourth pneumatic valve is connected to the second three-way pipe.

[0023] Furthermore, the liquid outlet of the water-gas separator is connected to a sewage treatment tank.

[0024] Furthermore, the gas outlet of the water-gas separator is connected to a gas filtering device.

[0025] Furthermore, the gas filtration device comprises: a box body, a filter plate detachably mounted in the box body, and an ultraviolet disinfection lamp;

[0026] A first cavity is provided in the box body, a mounting groove is provided on the top of the first cavity, a slot is provided in the mounting groove, the width of the slot corresponds to the thickness of the filter plate, and the filter plate is installed in the slot;

[0027] A rectangular opening is also provided on the top of the first cavity, and an ultraviolet disinfection lamp is installed at the rectangular opening and extends into the first cavity.

[0028] Furthermore, a sealing cover is hingedly installed at one end of the mounting groove, the thickness of the sealing cover corresponds to the depth of the mounting groove, a first mounting plate is provided at the other end of the mounting groove, and a second mounting plate corresponding to the first mounting plate is provided at one end of the sealing cover. The first mounting plate and the second mounting plate are fixed by bolts, and the sealing cover seals the filter plate in the first cavity.

[0029] Furthermore, a plurality of first bolt holes are provided in the rectangular opening, a plurality of second bolt holes corresponding to the first bolt holes are provided on the ultraviolet disinfection lamp, and the ultraviolet disinfection lamp is fixed to the box body by bolts.

[0030] Furthermore, a second cavity, a third cavity, and a fourth cavity are provided in the box body. A first blower is installed in the second cavity, an air inlet of the first blower extends into the first cavity, and an air outlet of the first blower extends into the third cavity.

[0031] A plurality of nozzles are installed in the third cavity, and a liquid dispensing box is installed on the top of the third cavity, and the liquid dispensing box is connected to the nozzles;

[0032] A second blower is installed in the fourth cavity, an air inlet of the second blower extends into the third cavity, and an air outlet of the second blower is connected to the air outlet of the box body.

[0033] Compared with the prior art, the vacuum furnace doping safety processing system described in the present invention has the following beneficial effects:

[0034] (1) The invention discloses a vacuum furnace doping safety processing system, which has two vacuum control systems. The existence of the two processing systems can meet production needs at a relatively low cost. In addition, the two units can be quickly switched in an emergency. Even if one unit cannot guarantee production due to special circumstances, the normal operation of the equipment production can be guaranteed by switching to the other unit. In this way, there is a double layer of insurance, providing two sets of system protection for production safety.

[0035] (2) In the vacuum furnace doping safety treatment system described in the present invention, the first vacuum pumping subsystem extracts the toxic gas, separates the gas from the water vapor, and then filters the gas through a gas filter device, making the air fresher and reducing harm to the human body.

[0036] (3) In the vacuum furnace doping safety treatment system described in the present invention, the second vacuum pumping subsystem reacts and disinfects the gas through a water ring vacuum pump, and then separates it through a water-gas separator and filters it through a filtering device, thereby performing double-layer filtration on the toxic gas and making the gas treatment more appropriate. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] The accompanying drawings, which constitute part of the present invention, are intended to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are intended to explain the present invention and do not constitute an undue limitation of the present invention. In the accompanying drawings:

[0038] Figure 1 This is a schematic diagram of a doping safety processing system in a vacuum furnace according to an embodiment of the present invention;

[0039] Figure 2Schematic diagram of the structure of the gas filtering device according to the embodiment of the present invention Figure 1 ;

[0040] Figure 3 Schematic diagram of the structure of the gas filtering device according to the embodiment of the present invention Figure 2 ;

[0041] Figure 4 This is a structural diagram of the gas filter box according to an embodiment of the present invention.

[0042] Description of reference numerals:

[0043] 1. Vacuum furnace; 2. First vacuum pump; 3. Centralized exhaust pipe; 4. Sewage treatment tank; 5. Water-gas separator; 6. Water ring vacuum pump; 7. Second vacuum pump; 8. Air filter; 11. First three-way pipe; 12. First pneumatic valve; 13. Third pneumatic valve; 61. Fourth pneumatic valve; 62. Second three-way pipe; 71. Second pneumatic valve; 81. Box; 82. Sealing cover; 83. Filter plate; 84. UV disinfection Poison lamp; 85. Liquid preparation box; 86. Second blower; 87. First blower; 88. Nozzle; 831. Pull ring; 801. First cavity; 802. Second cavity; 803. Third cavity; 804. Fourth cavity; 821. Groove; 841. Wick; 811. Observation port; 812. Box air inlet; 813. Mounting slot; 814. Rectangular slot; 815. Rectangular opening; 816. First mounting plate. DETAILED DESCRIPTION

[0044] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0045] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0046] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0047] The present invention will be described in detail below with reference to the accompanying drawings and in conjunction with embodiments.

[0048] like Figures 1 to 4 As shown, a doping safety treatment system in a vacuum furnace comprises a vacuum furnace 1, a first vacuum pumping subsystem and a second vacuum pumping subsystem for pumping gas in the vacuum furnace 1, and a water-gas separator 5 for processing the pumped gas;

[0049] The air inlet of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the air outlet of the vacuum furnace 1 through a first three-way pipe 11, and the air outlet of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the water-gas separator 5 through a second three-way pipe 62;

[0050] The first vacuum pumping subsystem includes a first vacuum pump 2;

[0051] The second vacuum pumping subsystem includes a water ring vacuum pump 6 .

[0052] like Figure 1 As shown, the first vacuum pumping subsystem also includes a centralized exhaust pipe 3 and a second vacuum pump 7. The air inlet end of the first vacuum pump 2 is connected to a first pneumatic valve 12, the air inlet end of the first pneumatic valve 12 is connected to the first three-way pipe 11, the air outlet end of the first pneumatic valve 12 is connected to the air inlet end of the first vacuum pump 2, the air outlet end of the first vacuum pump 2 is connected to the air inlet of the centralized exhaust pipe 3, the air outlet end of the exhaust pipe is connected to the air inlet end of the second vacuum pump 7, the air outlet end of the second vacuum pump 7 is connected to a second pneumatic valve 71, and the other end of the second pneumatic valve 71 is connected to one end of the second three-way pipe 62;

[0053] The air inlet end of the water ring hollow pump is connected to the third pneumatic valve 13, the air inlet end of the third pneumatic valve 13 is connected to the first three-way pipe 11, the air outlet end of the third pneumatic valve 13 is connected to the air inlet end of the water ring vacuum pump 6, the air outlet end of the water ring vacuum pump 6 is connected to the fourth pneumatic valve 61, the air inlet end of the fourth pneumatic valve 61 is connected to the air outlet end of the water ring vacuum pump 6, and the air outlet end of the fourth pneumatic valve 61 is connected to the second three-way pipe 62.

[0054] The water ring hollow pump adopts 2BW series liquid ring vacuum pump, and the first vacuum pump 2 and the second vacuum pump 7 adopt slide valve vacuum pump.

[0055] The first vacuum pumping subsystem and the second vacuum pumping subsystem can select the first vacuum pumping subsystem or the second vacuum pumping subsystem by switching the first pneumatic valve 12 and the third pneumatic valve 13. When the first pneumatic valve 12 is opened and the third pneumatic valve 13 is closed, the first vacuum pumping subsystem works, and the first vacuum pump 2 absorbs the gas in the vacuum furnace 1. After the vacuum value in the vacuum furnace 1 reaches the requirement, the first pneumatic valve 12 can be closed. The first vacuum pump 2 transmits the extracted gas to the centralized exhaust pipe 3, and the gas in the centralized exhaust pipe is extracted by the second vacuum pump 7 and transmitted to the water-gas separator 5 for separation and treatment.

[0056] When the first pneumatic valve 12 is closed, the third pneumatic valve 13 is opened, the second vacuum pumping subsystem is opened, the preparation is loaded into the water ring vacuum pump 6, and the water ring vacuum pump 6 sucks the gas in the vacuum furnace 1 to react in the pump. The reacted gas is transmitted to the water-gas separator 5 for water-gas separation.

[0057] Preparation: This is a specially formulated formulation for red phosphorus and arsenic. Product Name: Flame Retardant (Phosphide Digestion Solution). Product Features: It can decompose elemental phosphorus and phosphides, causing them to undergo oxidative decomposition into metaphosphoric acid, etc. Product Chemical Properties: It is weakly acidic and non-flammable and non-explosive. Precautions for Use: Avoid direct contact with skin or eyes. In case of accidental contact, rinse with plenty of water and then with soap or seek medical attention. After neutralization with carbohydrates, the product can be used directly as tree fertilizer. The agent safely digests the red phosphorus and arsenic volatilized in the furnace and enters a centralized, custom-designed treatment circulation system through specialized pipelines. The preparation in the treatment system can be recycled, significantly saving costs. Maintenance is simple and safe, requiring only regular adjustment of the concentration.

[0058] The vacuum control system consists of two systems: a normal vacuum pumping subsystem, which pumps the furnace to the required vacuum level to ensure normal production; and a switchover system, which switches to the water circulation system to ensure that any hazards arising from the production process are safely handled and eliminated. This means that there are two vacuum pumping subsystems in production, capable of quickly pumping the furnace to the required vacuum level. A valve disconnects the pipeline, shuts off the vacuum pump, and then activates the water circulation system. The check valve opens, and then the unit valve opens, completing the unit switchover and allowing normal production. Using the water circulation system directly for vacuuming is slow and requires a separate, large water circulation unit, which would be prohibitively expensive and hinder production cost control. Having two units allows for faster production. Crucially, the two units can be quickly switched in the event of an emergency. Even if one unit is unable to operate due to a special situation, switching to the other unit can ensure normal operation. This provides a double layer of insurance, providing a safe, dual-system guarantee for production.

[0059] Because the selection of a liquid ring vacuum pump / compressor requires careful calculation based on detailed operating conditions, the 2BW series liquid ring vacuum pump closed-circuit system is a complete set consisting of a 2BV or 2BE series liquid ring vacuum pump, a steam-water separator, a heat exchanger, and various piping accessories. Compared to a single liquid ring vacuum pump, this system offers greater ease of installation. Because the working fluid can be recycled, this system significantly reduces working fluid consumption and environmental pollution. This system is particularly advantageous in applications involving toxic gases or those containing organic solvents. A liquid ring vacuum pump closed-circuit system can be used in most applications.

[0060] The working fluid of the closed-circuit system of the liquid ring vacuum pump can adopt a variety of media: water, organic solvents such as methanol, ethanol, xylene, aniline, acetone, transformer oil, etc.

[0061] 2BV type water ring vacuum pump 6 uses:

[0062] 2BV type water ring vacuum pump 6 is used to draw in air and other non-corrosive, water-insoluble, solid particle-free gases, so that vacuum is formed in a closed container, and a small amount of liquid is allowed to be contained in the inhaled gas. Since the compression process of the gas in the 2BV type water ring vacuum pump 6 working process is isothermal, it is difficult to explode when compressing and drawing inflammable and explosive gases, so its application is more extensive. 2BV type water ring vacuum pump 6 can also be used for the water diversion of large water pumps. When used as a compressor, its pressure is up to 0.26MPa (absolute pressure), which can replace a reciprocating vacuum pump fully. So after research, the 2BV type water ring vacuum pump 6 was selected for use.

[0063] like Figure 1 As shown, the liquid outlet of the water-gas separator 5 is connected to the sewage treatment tank 4; the sewage treatment tank 4 adopts existing sewage treatment equipment, which will not be described in detail here.

[0064] The gas outlet of the water-gas separator 5 is connected to a gas filtering device; the water-gas separator 5 adopts the existing water-gas separator 5, which will not be described in detail here.

[0065] like Figures 2 to 4 As shown, the gas filtering device includes: a box body 81, a filter plate 83 detachably mounted in the box body 81, and an ultraviolet disinfection lamp 84;

[0066] A first cavity 801 is provided in the box body 81. A mounting groove 813 is provided at the top of the first cavity 801. A slot is provided in the mounting groove 813. The width of the slot corresponds to the thickness of the filter plate 83. The filter plate 83 is installed in the slot.

[0067] A rectangular opening 815 is further provided at the top of the first cavity 801 , and the ultraviolet disinfection lamp 84 is installed at the rectangular opening and extends into the first cavity 801 .

[0068] A sealing cover 82 is hingedly installed at one end of the mounting groove 813. The thickness of the sealing cover 82 corresponds to the depth of the mounting groove 813. A first mounting plate 816 is provided at the other end of the mounting groove 813. A second mounting plate corresponding to the first mounting plate 816 is provided at one end of the sealing cover 82. The first mounting plate 816 and the second mounting plate are fixed by bolts. The sealing cover 82 seals the filter plate 83 in the first cavity 801.

[0069] A pull ring 831 is provided on the top of the filter plate 83 to facilitate removal of the filter plate 83. A groove 821 corresponding to the pull ring 831 is provided at the bottom of the sealing cover 82. When the sealing cover 82 is closed, the pull ring 831 is located in the groove 821 to prevent poor sealing of the sealing cover 82 due to the support of the pull ring 831, and to prevent a gap between the filter plate 83 and the sealing cover 82 from being detrimental to gas filtration.

[0070] The bottom of the sealing cover 82 here is provided with a rubber seal, which fits tightly with the top of the filter plate 83 to prevent gas from flying out from the top.

[0071] A plurality of first bolt holes are provided in the rectangular opening 815 , and a plurality of second bolt holes corresponding to the first bolt holes are provided on the ultraviolet disinfection lamp 84 . The ultraviolet disinfection lamp 84 is fixed to the box body 81 by bolts.

[0072] The ultraviolet disinfection lamp 84 is an integrated disinfection lamp, but the shape is rectangular. The rectangle can be made according to actual use and the relevant mold can be manufactured. All of them adopt existing technology, and the internal structure of the ultraviolet disinfection lamp 84 also adopts existing technology.

[0073] A handle is provided on the top of the ultraviolet disinfection lamp 84 to facilitate the disassembly of the ultraviolet disinfection lamp 84.

[0074] The box body 81 is further provided with a second cavity 802, a third cavity 803, and a fourth cavity 804. A first blower 87 is installed in the second cavity 802. The air inlet of the first blower 87 extends into the first cavity 801, and the air outlet of the first blower 87 extends into the third cavity 803.

[0075] A plurality of nozzles 88 are installed in the third cavity 803, and a liquid dispensing box 85 is installed on the top of the third cavity. The liquid dispensing box 85 is connected to the nozzles 88;

[0076] A second blower 86 is installed in the fourth cavity 804 . An air inlet of the second blower 86 extends into the third cavity 803 , and an air outlet of the second blower 86 is connected to an air outlet of the box body 81 .

[0077] When the gas enters the air inlet of the box 81, it is filtered by the filter and then sterilized by the ultraviolet disinfection lamp 84. Then, the first blower 87 sucks the sterilized gas into the third cavity 803. The nozzle 88 in the third cavity 803 is opened, and the spray contains the agent. After reacting with the gas, the second blower 86 sucks the reacted gas out of the box 81. This process has completely sterilized the gas, and the discharged gas is purified gas.

[0078] A drainage hole is provided at the bottom of the third cavity 803, which is not shown in the figure, and the preparation sprayed into the third cavity is discharged through the drainage hole.

[0079] Introduction to the characteristics of red phosphorus and arsenic to facilitate the preparation of formulations and develop solutions:

[0080] Arsenic's physical and chemical properties: Arsenic (As) exists in three allotropes: gray, yellow, and black. It is brittle, hard, and possesses metallic properties. Its atomic weight is 74.92, density is 5.73 g / cm³ (14°C), melting point is 817°C, boiling point is 615°C, and it sublimes but is insoluble in water. Arsenic readily oxidizes in humid air to form arsenic trioxide (As₂O₃), which readily sublimes (193°C). Upon heating in air, it oxidizes to produce highly toxic arsenic trioxide (arsenic trioxide), a white powder slightly soluble in water. The lethal dose is 0.1 g.

[0081] Arsenic and its compounds are used in pesticides, herbicides, insecticides, and many kinds of alloys. In particular, the compound arsenic trioxide is called arsenic, which is a very toxic substance.

[0082] Arsenic and its compounds are listed as toxic and hazardous water pollutants. Therefore, the protection and treatment of arsenic is very important.

[0083] 2.2.2 Physical and chemical properties of red phosphorus:

[0084] Red phosphorus (Phosphorus red) is also known as red phosphorus.

[0085] Appearance and properties: Purple-red amorphous powder, odorless, with metallic luster, no light in dark places.

[0086] Melting point (℃): 590 (4357kPa)

[0087] Boiling point (℃): 280

[0088] Relative density (water = 1): 2.34

[0089] Relative vapor density (air = 1): 4.77 Saturated vapor pressure (kPa): 4357 (590℃)

[0090] Critical pressure (MPa): 8.1

[0091] Octanol / water partition coefficient (log Pow): -0.27

[0092] Ignition temperature (℃): 260

[0093] Upper explosion limit% (V / V): No data

[0094] Lower explosion limit% (V / V): 48~64mg / m3

[0095] Solubility: insoluble in water and carbon disulfide, slightly soluble in anhydrous ethanol, soluble in alkali solution.

[0096] 2.2.3 Main uses: Red phosphorus can be used as a diffusion source in the semiconductor industry, in organic synthesis and in the manufacture of matches. It is also used as an insecticide, rodenticide, fireworks and smoke bombs.

[0097] Understanding these characteristics plays a decisive role in addressing the source of hazards, handling them promptly, and eliminating hidden dangers. The ultimate goal is to eliminate or decompose these hazardous sources into safe and harmless liquid or solid forms.

[0098] The specific processing process is as follows:

[0099] During operation, when the first pneumatic valve 12 is opened and the third pneumatic valve 13 is closed, the first vacuum pumping subsystem starts working, and the first vacuum pump 2 absorbs the gas in the vacuum furnace 1. After the vacuum value in the vacuum furnace 1 reaches the requirement, the first pneumatic valve 12 is closed. The first vacuum pump 2 transmits the extracted gas to the centralized exhaust pipe 3, and the gas in the centralized exhaust pipe is extracted by the second vacuum pump 7 and transmitted to the water-gas separator 5 for separation and treatment.

[0100] When the first pneumatic valve 12 is closed, the third pneumatic valve 13 is opened, the second vacuum pumping subsystem is opened, the preparation is loaded into the water ring vacuum pump 6, the water ring vacuum pump 6 sucks the gas in the vacuum furnace 1 to react in the pump, and the reacted gas is transmitted to the water-gas separator 5 for water-gas separation;

[0101] After the gas enters the water-gas separator 5, water and gas are separated, and the moisture flows out through the water outlet at the bottom of the water-gas separator 5 to the sewage treatment tank 4 for treatment. The gas enters the gas filter device through the air outlet of the water-gas separator 5 for filtration. The gas enters the box body 81 through the air inlet of the box body 81, passes through the filter plate 83 and enters the first cavity 801. After the ultraviolet disinfection lamp 84 disinfects the gas, the filtered gas is sucked into the third cavity 803 through the first blower 87. After the spray reacts with the gas, the dripping water droplets are discharged through the bottom drain outlet of the third cavity 803, and the gas is sucked away and discharged by the second blower 86.

[0102] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A doping safety treatment system in a vacuum furnace, characterized by: It comprises a vacuum furnace (1), a first vacuum pumping subsystem and a second vacuum pumping subsystem for pumping gas from the vacuum furnace (1), and a water-gas separator (5) for processing the pumped gas; The air inlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the air outlet end of the vacuum furnace (1) via a first three-way pipe (11), and the air outlet ends of the first vacuum pumping subsystem and the second vacuum pumping subsystem are connected to the water-gas separator (5) via a second three-way pipe (62); The first vacuum pumping subsystem includes a first vacuum pump (2); The second vacuum pumping subsystem includes a water ring vacuum pump (6); The gas outlet of the water-gas separator (5) is connected to a gas filtering device (8); The gas filtering device (8) comprises: a box (81), a filter plate (83) detachably mounted in the box (81), and an ultraviolet disinfection lamp (84); A first cavity (801) is provided in the box body (81), a mounting groove (813) is provided on the top of the first cavity (801), a slot is provided in the mounting groove (813), the width of the slot corresponds to the thickness of the filter plate (83), and the filter plate (83) is installed in the slot; A rectangular opening (815) is also provided at the top of the first cavity (801), and an ultraviolet disinfection lamp (84) is installed at the rectangular opening and extends into the first cavity (801).

2. The doping safety processing system in a vacuum furnace according to claim 1, characterized in that: The first vacuum pumping subsystem further comprises a centralized exhaust pipe (3) and a second vacuum pump (7); the air inlet of the first vacuum pump (2) is connected to a first pneumatic valve (12); the air inlet of the first pneumatic valve (12) is connected to a first three-way pipe (11); the air outlet of the first pneumatic valve (12) is connected to the air inlet of the first vacuum pump (2); the air outlet of the first vacuum pump (2) is connected to the air inlet of the centralized exhaust pipe (3); the air outlet of the exhaust pipe is connected to the air inlet of the second vacuum pump (7); and the air outlet of the second vacuum pump (7).

3. The doping safety processing system in a vacuum furnace according to claim 1, characterized in that: The liquid outlet of the water-gas separator (5) is connected to a sewage treatment tank (4).

4. The doping safety processing system in a vacuum furnace according to claim 1, characterized in that: A sealing cover (82) is hingedly mounted on one end of the mounting groove (813). The thickness of the sealing cover (82) corresponds to the depth of the mounting groove (813). A first mounting plate (816) is provided at the other end of the mounting groove (813). A second mounting plate corresponding to the first mounting plate (816) is provided at one end of the sealing cover (82). The first mounting plate (816) and the second mounting plate are fixed by bolts. The sealing cover (82) seals the filter plate (83) in the first cavity (801).

5. The doping safety processing system in a vacuum furnace according to claim 1, characterized in that: A plurality of first bolt holes are provided in the rectangular opening (815), a plurality of second bolt holes corresponding to the first bolt holes are provided on the ultraviolet disinfection lamp (84), and the ultraviolet disinfection lamp (84) is fixed to the box body (81) by bolts.

6. The doping safety processing system in a vacuum furnace according to claim 4, characterized in that: The box body (81) is further provided with a second cavity (802), a third cavity (803), and a fourth cavity (804). A first blower (87) is installed in the second cavity (802). The air inlet of the first blower (87) extends into the first cavity (801), and the air outlet of the first blower (87) extends into the third cavity (803).

7. The doping safety processing system in a vacuum furnace according to claim 6, characterized in that: A plurality of nozzles (88) are installed in the third cavity (803), and a liquid dispensing box (85) is installed on the top of the third cavity. The liquid dispensing box (85) is connected to the nozzles (88).

8. The doping safety processing system in a vacuum furnace according to claim 7, characterized in that: A second blower (86) is installed in the fourth cavity (804), an air inlet of the second blower (86) extends into the third cavity (803), and an air outlet of the second blower (86) is connected to an air outlet of the box (81).

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