Target material control in an EUV light source

Abstract

An apparatus is provided that includes a first reservoir system including a first reservoir configured to be in flow communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second reservoir configured to be in flow communication with the first reservoir system for at least a portion of time during operation of the nozzle supply system, an injection system configured to generate a fluid target material from a solid material, and a fluid control system fluidically connected to the injection system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate the at least one reservoir and the nozzle supply system from the injection system, and maintain a fluid flow path between the at least one reservoir and the nozzle supply system.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority to U.S. Application No. 62 / 819,366, filed March 15, 2019, entitled “Continuous drops while manufacturing EUV with inline target material refills”. This application also claims priority to U.S. Application No. 62 / 842,453, filed May 2, 2019, entitled “Method and system for EUV production with concurrent droplet strand and inline target material refill”. This application also claims priority to U.S. Application No. 62 / 951,577, filed December 20, 2019, entitled “Target material control in an EUV light source”. All of these applications are incorporated herein by reference in their entirety. Technical Field

[0003] The disclosed subject matter relates to an apparatus and method for controlling the supply of target materials in an extreme ultraviolet (EUV) light source. Background Technology

[0004] Extreme ultraviolet (“EUV”) light (e.g., electromagnetic radiation with wavelengths of about 50 nanometers (nm) or less (sometimes also called soft X-rays), and including light with wavelengths of about 13 nm) is used in photolithography processes to create extremely small features in and on substrates, such as silicon wafers used to produce integrated circuits and various other microelectronic devices.

[0005] Methods for generating EUV light include, but are not limited to, changing the physical state of a source material to a plasma state. Source materials include compounds or elements such as xenon, lithium, or tin, whose emission lines are in the EUV range. In one such method (commonly referred to as laser-generated plasma (“LPP”)), the desired plasma is generated by irradiating the source material (e.g., in the form of droplets, streams, or clusters of the source material) with an amplified beam of light (which may be referred to as a driving laser). For this process, the plasma is typically generated in a sealed container (e.g., a vacuum chamber) and monitored using various types of measurement equipment. Source materials (such as xenon, lithium, or tin) that emit in the EUV range when in a plasma state are often referred to as target materials because they are aimed at and irradiated by the driving laser. Summary of the Invention

[0006] In some general aspects, an apparatus is configured to supply a target material. The apparatus includes: a first storage system, a second storage system, an injection system, and a fluid control system. The first storage system includes a first reservoir configured to be in flow communication with the nozzle supply system during operation of the nozzle supply system, the first reservoir being maintained at a first pressure. The second storage system includes a second reservoir configured to be in flow communication with the first storage system for at least a portion of the time during operation of the nozzle supply system. The injection system is configured to receive a solid substance comprising the target material and to generate a fluid target material from the solid substance, the injection system being maintained at an injection pressure less than the first pressure. The fluid control system is flowably connected to the injection system, the first storage system, the second storage system, and the nozzle supply system. The fluid control system is configured to: isolate at least one reservoir and the nozzle supply system from the injection system during operation of the nozzle supply system, and maintain a fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system.

[0007] The implementation may include one or more of the following features. For example, the injection pressure may be less than about 600 kPa. The first pressure may be at least 6000 kPa, at least 10,000 kPa, at least 25,000 kPa, or in the range of about 6000 kPa to 60,000 kPa.

[0008] While the second reservoir is being refilled with the fluid target material from the injection system, the injection system and the second reservoir can be maintained at the injection pressure and can be positioned relative to each other so that the second reservoir is prevented from being overfilled with the fluid target material.

[0009] The fluid control system can be configured to maintain a fluid flow path between the second reservoir and the nozzle supply system during operation of the nozzle supply system, while the second reservoir is being refilled with the target fluid material from the injection system. The fluid control system can also be configured to remove the target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system, and the nozzle supply system.

[0010] The fluid control system can be configured to maintain a fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system by: maintaining fluid flow paths between a first reservoir and the nozzle supply system and between a second reservoir and the nozzle supply system during operation of the nozzle supply system, while simultaneously maintaining the nozzle supply system and the second reservoir at a first pressure. The fluid control system can also be configured to maintain a fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system and to achieve a fluid flow path between the first reservoir and the second reservoir.

[0011] The device may also include environmental control equipment configured to independently and separately control a first pressure in the first reservoir and a second pressure in the second reservoir, and to independently and separately control the temperature of the first reservoir and the second reservoir. The environmental control equipment may also be configured to adjust or reset the second pressure of the second reservoir based on a measured amount of fluid target material within the second reservoir. The environmental control equipment may include a pressurized reservoir configured to contain inert gas and to transfer inert gas from the pressurized reservoir through an orifice to one or more of the first and second reservoirs.

[0012] The fluid control system may include a reservoir fluid control valve between a first reservoir and a second reservoir, and a refill fluid control valve between the second reservoir and the injection system. The fluid control system may be configured to independently control the reservoir fluid control valve and the refill fluid control valve. The reservoir fluid control valve may include a refrigeration valve, and the refill fluid control valve may also include a refrigeration valve.

[0013] The fluid control system can also be configured to maintain a fluid flow path between the first reservoir and the second reservoir during operation of the nozzle supply system.

[0014] The second reservoir can also be configured to be in flow communication with the nozzle supply system for at least a portion of the time during operation of the nozzle supply system.

[0015] The injection system may include a first chamber, a second chamber, and a flow-blocking device. The first chamber includes a door configured to open so that a solid substance can be received within a first volume defined by the first chamber. The second chamber defines a second volume and is in flow communication with a fluid control system. The flow-blocking device is formed in a previously unobstructed fluid path between the first and second chambers. The flow-blocking device may be a refrigeration valve, wherein when the solid substance is held at a temperature below its melting point, the fluid flow path is blocked by the solid substance within the refrigeration valve.

[0016] The device may further include a sensing system configured to estimate the volume of a fluid target material in one or more of the first reservoir, the second reservoir, and the injection system, and / or the presence of solid matter within the injection system. The device may include a control system in communication with the sensing system, configured to determine the consumption rate of the fluid target material in the second reservoir based on an output from a high-pressure transducer, the consumption rate being the amount of fluid target material used per time interval. The sensing system may include a high-pressure transducer associated with one or more of the first and second reservoirs.

[0017] The fluid control system can be configured to maintain a fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system by maintaining a fluid flow path between a first reservoir and the nozzle supply system during operation of the nozzle supply system, while simultaneously maintaining the nozzle supply system at a first pressure.

[0018] In other general aspects, a method for continuously supplying a target material in an uninterrupted manner is implemented. The method includes: receiving a solid substance comprising the target material in an injection system maintained at an injection pressure, and generating a fluid target material from the solid substance. The method includes maintaining flow communication between the first reservoir and the nozzle supply system during operation of the nozzle supply system while maintaining a first reservoir at a first pressure greater than the injection pressure. The method includes transferring the fluid target material between the first reservoir and a second reservoir at the first pressure for at least a portion of the time during operation of the nozzle supply system, while the fluid target material is generated in the injection system under the injection pressure.

[0019] The implementation may include one or more of the following features. For example, the method may include maintaining a first pressure in the first reservoir while enabling the transfer of the fluid target material between the injection system and the second reservoir. The method may include achieving the transfer of the fluid target material to the nozzle supply system throughout its operation by causing the fluid target material to flow from the first reservoir to the nozzle supply system; from the second reservoir to the nozzle supply system; or simultaneously from both the first and second reservoirs to the nozzle supply system. The method may include preventing the fluid target material from being transferred to the second reservoir and / or the first reservoir for at least some time during the operation of the nozzle supply system. The method may include reloading a solid substance comprising the target material into the injection system only when the injection system is at injection pressure. Reloading of a solid substance comprising the target material into the injection system may occur while the nozzle supply system is at the first pressure.

[0020] The method may further include refilling a second reservoir with fluid target material from the injection system while maintaining a first pressure in the first reservoir, and separating the second reservoir from the injection system fluid after sufficient fluid target material has been transferred from the injection system into the second reservoir. The method may include maintaining the injection system and the second reservoir at the injection pressure while refilling the second reservoir with fluid target material from the injection system, and preventing the second reservoir from being overfilled with fluid target material.

[0021] The method may include removing the target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system, and the nozzle supply system before stopping operation of the nozzle supply system and stopping the flow communication between the first reservoir and the nozzle supply system. The method may also include melting the solid form of the target material in the injection system into the target fluid material.

[0022] The operation of the nozzle supply system may include delivering droplets of fluid target material to an extreme ultraviolet (EUV) light source, in which the droplets are configured to be irradiated by radiation to generate plasma that emits EUV light.

[0023] The method may include controlling the temperature and pressure of the fluid target material in each of the first reservoir, the second reservoir, and the injection system in an independent and separate manner.

[0024] In other general aspects, a method includes: receiving a solid substance comprising a target material in an injection system maintained at an injection pressure, and generating a fluid target material from the solid substance; maintaining flow communication between the first reservoir and the nozzle supply system during operation of the nozzle supply system while maintaining a first reservoir at a first pressure greater than the injection pressure; and transferring the fluid target material between the injection system and a second reservoir while flow isolating the first reservoir and the nozzle supply system from the injection system.

[0025] The implementation may include one or more of the following features. For example, the operation of the nozzle supply system may include delivering droplets of fluid target material to an extreme ultraviolet (EUV) light source, in which the droplets are configured to be irradiated by radiation to generate plasma that emits EUV light.

[0026] The method may include maintaining a first pressure in the first reservoir while enabling the transfer of a fluid target material between the injection system and the second reservoir. The method may also include achieving the transfer of the fluid target material between the second reservoir and the first reservoir while flow-isolating the first reservoir, the second reservoir, and the nozzle supply system from the injection system.

[0027] The method may include transferring the fluid target material to the nozzle supply system throughout its operation by causing the fluid target material to flow from a first reservoir to the nozzle supply system; from a second reservoir to the nozzle supply system; or from both the first and second reservoirs to the nozzle supply system simultaneously.

[0028] The method may include preventing the fluid target material from being transferred to the second reservoir and / or the first reservoir for at least some time during the operation of the nozzle supply system. The method may also include reloading solid material comprising the target material into the injection system only when the injection system is under injection pressure. Reloading solid material comprising the target material into the injection system can occur while the nozzle supply system is under a first pressure.

[0029] The method may include refilling a second reservoir with fluid target material from an injection system while maintaining a first pressure in the first reservoir. The method may also include maintaining the injection system and the second reservoir at injection pressure while refilling the second reservoir with fluid target material from the injection system, and preventing the second reservoir from being overfilled with fluid target material. The method may further include dissociating the second reservoir from the injection system fluid after sufficient fluid target material has been transferred from the injection system into the second reservoir.

[0030] The method may further include melting the solid form of the target material in the injection system into a target fluid material. The method may also include controlling the temperature and pressure of the fluid target material in the first reservoir, the second reservoir, and each of the injection systems in an independent and separate manner.

[0031] The method may further include removing the target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system, and the nozzle supply system before stopping the operation of the nozzle supply system and stopping the flow communication between the first reservoir and the nozzle supply system. Attached Figure Description

[0032] Figure 1 This is a block diagram of an apparatus that includes a first storage system, a second storage system, an injection system, and a fluid control system, and is configured to supply fluid target material to the nozzle supply system during continuous operation of the nozzle supply system.

[0033] Figure 2 yes Figure 1 A block diagram of the implementation of the device, which includes an environmental control device, is shown, and an implementation of the fluid control system is also illustrated.

[0034] Figure 3 yes Figure 1A block diagram of the device, in which a nozzle supply system emits a target stream of fluid target material used by an EUV light source;

[0035] Figure 4 It is possible Figure 1 A block diagram of the implementation of the injection system used in the device;

[0036] Figure 5 It is possible Figure 1 A block diagram illustrating the implementation of the nozzle supply system used in the equipment;

[0037] Figure 6 It is by Figure 1 The flowchart of the process performed by the device.

[0038] Figure 7 It is by Figure 1 A flowchart of another process performed by the device;

[0039] Figure 8A It shows Figure 1 A block diagram of the moments during the normal operating mode of the equipment;

[0040] Figure 8B It shows Figure 1 A block diagram of the moments during the supplementary operation mode of the equipment;

[0041] Figure 9A It shows Figure 1 A block diagram of a moment during the normal operating mode of the equipment, in which the fluid target material has been replenished into the injection system;

[0042] Figure 9B It shows Figure 1 A block diagram of the moment during the supplementary operation mode of the device, wherein the fluid flow path between the first storage system and the second storage system is blocked and the fluid flow path between the second storage system and the injection system is blocked;

[0043] Figure 9C It shows Figure 1 A block diagram of the moment during the supplementary operation mode of the device, wherein the fluid flow path between the first storage system and the second storage system is blocked and the fluid flow path between the second storage system and the injection system is open;

[0044] Figure 9D It shows Figure 1 A block diagram of the moment during the device’s supplemental operation mode, wherein the fluid flow path between the first storage system and the second storage system is blocked, and the fluid flow path between the second storage system and the injection system is blocked after the second storage system has been refilled with fluid target material from the injection system.

[0045] Figure 9E It shows Figure 1 A block diagram of the moment during the supplementary operation mode of the device, wherein the fluid flow path between the first storage system and the second storage system is open and the fluid flow path between the second storage system and the injection system is blocked;

[0046] Figure 9F It shows Figure 1 A block diagram of a moment during the device’s supplemental operation mode, wherein the fluid flow path between the first storage system and the second storage system is open and the fluid flow path between the second storage system and the injection system is blocked, and the first storage system has been refilled with fluid target material from the second storage system.

[0047] Figure 9G It shows Figure 1 A block diagram of a moment during the normal operating mode of the device, wherein the fluid flow path between the first storage system and the second storage system is open and the fluid flow path between the second storage system and the injection system is blocked;

[0048] Figure 10 yes Figure 1 A block diagram of another implementation of the device, which includes a level sensing device configured to estimate the volume of a fluid target material in a second storage system;

[0049] Figure 11 yes Figure 1 Another implementation of the device is shown in the block diagram, wherein the environmental control device is fluidly connected to the first storage system and the second storage system via a fluid connectivity connection;

[0050] Figure 12 yes Figure 1 A block diagram of another implementation of the injection system; and

[0051] Figures 13A-13D During the injection of solid material to form fluid target material Figure 12 The injection system is illustrated in the block diagram at each stage. Detailed Implementation

[0052] refer to Figure 1 The device 100 is configured to supply fluid target material 120 to the nozzle supply system 140 during continuous operation of the nozzle supply system 140. The nozzle supply system 140 can be configured to supply fluid target material 120 in the form of target flow 121 for use by system 124. Fluid target material 120 is a target material in a fluid state (such as a liquid state).

[0053] The device 100 includes a first storage system 102, a second storage system 103, an injection system 104, and a fluid control system 190. The fluid control system 190 is fluidly connected to the injection system 104, the first storage system 102, the second storage system 103, and the nozzle supply system 140. In some implementations, the fluid control system 190 includes a flow communication device 116 and a fluid controller 106 operable to regulate one or more aspects of the flow communication device 116.

[0054] Injection system 104 is configured to receive solid substance 122 comprising the target material. Flow communication device 116 is an adjustable fluid flow path capable of flow communication with first storage system 102, second storage system 103, injection system 104, and nozzle supply system 140. For example, flow communication device 116 includes a fluid transport line 115 and one or more regulating devices 118 and 119 configured to regulate, guide, or control the flow of fluid through the fluid transport line by, for example, opening, closing, or partially blocking various channels within the fluid transport line. Flow communication device 116 may also include a regulating device 117 along the fluid flow path toward nozzle supply system 140, the regulating device 117 being used to control the flow of fluid toward nozzle supply system 140.

[0055] Because the device 100 includes two storage systems 102 and 103 in addition to the injection system 104 (which enables the refilling of the target material into the entire device 100), the fluid target material 120 can be transferred between the first storage system 102 and the second storage system 103 while the solid substance 122 of the target material 120 is added to the injection system 104. Specifically, during the operation of the nozzle supply system 140 for supplying the target flow 121, the fluid control system 190 controls the flow communication between the first storage system 102, the second storage system 103, and the injection system 104 to maintain a continuous supply of the fluid target material 120 to the nozzle supply system 140 so that the target flow 121 supplied to the system 124 is not interrupted.

[0056] Furthermore, the actions occurring within device 100 do not adversely affect the performance of nozzle supply system 140, which might otherwise be due to disturbances in fluid pressure. Additionally, in some implementations, while fluid is supplied to nozzle supply system 140, first reservoir system 102 is in flow communication with nozzle supply system 140 and is also maintained at high pressure, and first reservoir system 102 can provide nozzle supply system 140 with a primary source of fluid target material 120.

[0057] Fluid control between each of the first storage system 102, the second storage system 103, the injection system 104, and the nozzle supply system 140 can be independently controlled by the fluid control system 190, and in this way, at least one of the storage systems 102 or 103 in fluid communication with the nozzle supply system 140 can always provide a source of fluid target material 120 to the nozzle supply system 140 during operation of the nozzle supply system 140.

[0058] As described above, the flow communication device 116 includes a fluid transmission line 115 and one or more regulating devices 117, 118, 119, which are configured to regulate, guide, or control the flow of fluid through the fluid transmission line 115 by, for example, opening, closing, or partially blocking various channels within the fluid transmission line 115. The fluid transmission line 115 may include, for example, one or more interconnecting pipes formed of tantalum-tungsten (TaW) or other suitable materials that may contain the fluid target material 120 under varying pressures. The pipes may be flexible. The flow communication device 116 may include various other fluid control devices (not shown) configured to provide a controllable fluid flow path between the various parts of the device 100. The flow communication device 116 may include (in addition to the mentioned fluid transmission line 115 and one or more regulating devices 117, 118, 119) one or more valves, pipes, fluid flow regulating devices, and tanks.

[0059] Each of the regulating devices 117, 118, and 119 may include a valve control device. In this way, the fluid flow rate through a particular regulating device 117, 118, or 119 can be regulated by opening or closing a valve within its valve control device. Each valve control device may include a fluid valve, which may be, for example, a thermally controlled valve, a manual valve, and / or an electric motor. In a thermally controlled valve (also known as a refrigeration valve), the passage is heated to maintain the fluid within the fluid path in a liquid state, and the passage is allowed to cool or actively cool to convert the fluid into a solid state. Therefore, in some implementations discussed herein, the valve control device within regulating devices 118 and 119 includes a refrigeration valve. Each valve control device of regulating devices 117, 118, and 119 may have any suitable shape, such as a 90° bend, a confined passage, or a cylindrical tube.

[0060] In addition, such as Figure 2As shown, device 100 may include an environmental control device 236 configured to independently control the environment (such as temperature and pressure) of each of the first storage system 102 and the second storage system 103. Environmental control of the first storage system 102 and the second storage system 103 can be performed independently of environmental control of the injection system 104. Specifically, reloading of solid material 122 into the injection system 104 can be performed at temperatures and atmospheric pressures below the melting point of the fluid target material 120. Simultaneously, one or more of the storage systems 102 or 103 supply the fluid target material to the nozzle supply system 140. This is achieved in part due to the fact that the injection system 104 can be environmentally isolated from each of the storage systems 102, 103. Following a detailed description of the components of device 100, other advantages and features of device 100 will be discussed below.

[0061] During operation of the nozzle supply system 140, one or more of the first storage system 102 and the second storage system 103 contain the fluid target material 120. At least one of the first storage system 102 and the second storage system 103 can thus deliver the fluid target material 120 to the nozzle supply system 140 during operation of the nozzle supply system 140. Simultaneously, the injection system 104 is configured to generate the fluid target material 120 from a solid substance 122 comprising the target material (and store the fluid target material 120 in an injection tank 114). The injection system 104 supplies the fluid target material 120 to the second storage system 103 at different times and stages during operation of the nozzle supply system 140; specifically, when the second storage system 103 is flow-isolated from the nozzle supply system 140, the first storage system 102 and the second storage system 103 can be at a lower pressure and in flow communication with the injection tank 114 of the injection system 104. In some implementations where the injection tank 114 operates at the same pressure as the first reservoir 112, the injection system 104 may additionally or alternatively supply the fluid target material 120 to the first reservoir system 102.

[0062] The nozzle supply system 140 is configured to receive fluid target material 120 from device 100 and supply fluid target material 120 to system 124 in the form of target flow 121. For example, as Figure 3As shown, if system 124 is an EUV light source 324, nozzle supply system 140 can emit a target stream 121 made of fluid target material 120, such that target 321p is delivered to plasma formation position 326 in vacuum chamber 328. Plasma formation position 326 can receive at least one beam 342, which has been generated by light source 344 and delivered to vacuum chamber via optical path 346. The interaction between beam 342 and target material in target 321p generates plasma that emits EUV light 348, which is collected 350 and supplied to photolithography exposure apparatus 352. In this example, fluid target material 120 can be any material that emits EUV light 348 when in a plasma state. For example, fluid target material 120 can include water, tin, lithium, and / or xenon.

[0063] The first reservoir system 102 includes a first reservoir 112, which is a container configured to contain fluid target material 120 and to be in continuous flow communication with the nozzle supply system 140 during operation of the nozzle supply system 140. The first reservoir 112 is defined by a structure formed, filled, or reinforced with molybdenum (Mo), forged Mo, or any material that remains stable and solid above the melting point of the fluid target material 120 and does not chemically react with it. The first reservoir 112 is in flow communication with the nozzle supply system 140 via a flow communication device 116, which is fluidly coupled and controlled by a fluid controller 106.

[0064] The first reservoir 112 is maintained at a first pressure P during operation of the nozzle supply system 140. 112 In some implementations, the first pressure P 112 Adjustable by environmental control device 236. At certain times during operation, for other implementations, the first pressure P... 112 The pressure can be, for example, at least 6000 kPa, at least 10000 kPa, at least 25000 kPa, or in the range of 6000 kPa to 60000 kPa. During operation of the nozzle supply system 140, and when the first reservoir 112 supplies the fluid target material 120 to the nozzle supply system 140, the first pressure P... 112 For example, it could be any suitable pressure greater than the pressure within the nozzle supply system 140.

[0065] The second reservoir system 103 includes a second reservoir 113, which is a container configured to contain the fluid target material 120 and to be in flow communication with the first reservoir system 102 for at least a portion of the time during operation of the nozzle supply system 140. The second reservoir 113 is defined by a structure formed, filled, or reinforced with molybdenum (Mo), forged Mo, or any material that remains stable and solid above the melting point of the fluid and does not chemically react with the fluid target material 120. The second reservoir 113 is in flow communication with the first reservoir system 102 via a flow communication device 116 under the control of a fluid controller 106.

[0066] In some implementations, the internal volume of the second reservoir 113 is the same as the internal volume of the first reservoir 112, allowing both reservoirs to hold / retain the same amount of fluid target material 120. In other implementations, the internal volume of the second reservoir 113 may be larger than the internal volume of the first reservoir 112. In these implementations, the second reservoir 113 will be able to hold / retain a larger amount of fluid target material 120 than the first reservoir 112.

[0067] The second reservoir 113 is maintained at the second pressure P during operation of the nozzle supply system 140. 113 Second pressure P 113 Adjustable by environmental control device 236. Second pressure P 113 The value at any given time can depend on the current operation of device 100. For example, at some point, the second pressure P of the second reservoir 113... 113 The injection pressure P can be maintained with the injection system 104. 114 The same. As another example, at other times, the second pressure P of the second reservoir 113 is... 113 The first pressure P that can be maintained with the first reservoir 112 112 The same. Furthermore, at other times, when the second reservoir 113 is in flow communication with the injection system 104 (also maintained at atmospheric pressure), the second pressure P of the second reservoir 113... 113 It could be atmospheric pressure.

[0068] The injection system 104 includes an injection tank 114, which is a container configured to contain a fluid target material 120 (generated from solid material 122). During at least a portion of the time during operation of the nozzle supply system 140, the injection tank 114 is in flow communication with one or more of a first reservoir system 102 and a second reservoir system 103. The injection system 104 is configured to generate the fluid target material 120 from the solid material 122 and can perform one or more of the following: flow communication with the second reservoir system 103 to refill the second reservoir system 103 with the fluid target material 120 and flow communication with the first reservoir system 102 to refill the first reservoir system 102 with the fluid target material 120. The injection system 104 may also include an injection chamber 130, configured to receive the solid material 122 containing the target material. The injection chamber 130 may include, for example, a removable cover allowing the solid material 122 to be replaced within the injection chamber 130.

[0069] The injection system 104 and the second reservoir 103 can be positioned relative to each other such that when the injection system 104 refills the second reservoir system 103, the second reservoir 103 is prevented from being overfilled with the fluid target material 120.

[0070] At different times during the operation of the nozzle supply system 140, the injection tank 114 is in flow communication with one or more of the first storage system 102 and the second storage system 103 via the flow communication device 116, and this flow communication is under the control of the fluid controller 106 of the fluid control system 190. The injection chamber 130 is in flow communication with the injection tank 114 so that the fluid target material 120 generated from the solid material 122 in the injection chamber 130 can be supplied to the injection tank 114 in an environmentally controlled manner.

[0071] Injection pressure P 114 This is the pressure maintained in injection tank 114. Injection pressure P 114 It is adjustable, depending on whether the fluid target material 120 is being supplied to one or more of the first storage system 102 and the second storage system 103. For example, when the injection tank 114 is refilled with solid material 122 from the injection chamber 130, the injection pressure P... 114 It can be kept at low pressure (such as atmospheric pressure) (approximately 101 kPa).

[0072] As described above, the fluid control system 190 is configured to control the flow communication between the first storage system 102, the second storage system 103, and the injection system 104 to maintain a continuous supply of the fluid target material 120 to the nozzle supply system 140. Specifically, the fluid controller 106 is configured to determine the current fluid state of one or more regulating devices 117, 118, 119; receive input regarding desired flow communication within the device 100; and regulate the fluid state of one or more of the regulating devices 117, 118, 119 based on the desired flow communication within the device 100.

[0073] The fluid controller 106 may include or have access to one or more programmable processors, each of which can execute instructions to perform a desired action by manipulating input data and generating appropriate outputs to one or more regulating devices 117, 118, 119. The fluid controller 106 may be implemented as any of a digital electronic circuit system, computer hardware, firmware, or software. In another implementation, the fluid controller 106 may access memory, which may be read-only memory and / or random access memory and may provide a storage device suitable for tangibly representing computer program instructions and data. The fluid controller 106 may also include one or more input devices (such as a keyboard, a touch-enabled device, or an audio input device) and one or more output devices (such as audio output or video output). The fluid controller 106 may communicate with one or more actuating elements within each of the regulating devices 117, 118, 119.

[0074] During operation of the nozzle supply system 140, the fluid controller 106 may be instructed to isolate the first reservoir 112 and the nozzle supply system 140 from the second reservoir 113 and the injection tank 114 (during replenishment of the fluid target material 120 in the second reservoir 113). This isolation may be achieved at least partially by the fluid controller 106 instructing the regulating device 118 to close (which causes the regulating device 118 to close and block the passage of the fluid target material 120). At other times (e.g., when both the first reservoir system 102 and the second reservoir system 103 have sufficient fluid target material 120), the fluid controller 106 is instructed to isolate the first reservoir 112, the second reservoir 113, and the nozzle supply system 140 from the injection tank 114 during operation of the nozzle supply system 140. This isolation may be achieved at least partially by the fluid controller 106 instructing the regulating device 119 to close (which causes the regulating device 119 to close and block the passage of the fluid target material 120).

[0075] Furthermore, the fluid controller 106 can be instructed to maintain a continuous fluid flow path between the first reservoir 112 and the nozzle supply system 140 during operation of the nozzle supply system 140. This continuous fluid flow path can be achieved at least in part by the fluid controller 106 sending instructions to the regulating device 117 of the flow communication device 116 to open or remain open. During at least a portion of the time during operation of the nozzle supply system 140, the fluid controller 106 can be instructed to maintain a fluid flow path between the first reservoir 112, the second reservoir 113, and the nozzle supply system 140. This continuous fluid flow path can be achieved at least in part by the fluid controller 106 sending instructions to the regulating devices 117 and 118 of the flow communication device 116 to open or remain open.

[0076] refer to Figure 2 This illustrates an implementation 216 of the mobile communication device 116 and an implementation 200 of the device 100. In the mobile communication device 216, ( Figure 1 The regulating device 118 corresponds to the storage valve system 218, and ( Figure 1 The regulating device 119 corresponds to the refill valve system 219. The reservoir valve system 218 and the refill valve system 219 are controlled by the fluid controller 106. The reservoir valve system 218 is located between the first reservoir 112 and the second reservoir 113 and is configured to flow-isolate the first reservoir 112 and the nozzle supply system 140 from the second reservoir 113 and the injection tank 114 for at least a portion of the time during operation of the nozzle supply system 140. The refill valve system 219 is located between the second reservoir 113 and the injection tank 114 and is configured to flow-isolate the first reservoir 112, the nozzle supply system 140, and the second reservoir 113 from the injection tank 114 for at least a portion of the time during operation of the nozzle supply system.

[0077] In some implementations, the reservoir valve system 218 and the refill valve system 219 include a reservoir freezer valve 218F and a refill freezer valve 219F, respectively. The reservoir freezer valve 218F and the refill freezer valve 219F are controlled by a fluid controller 106. The freezer valve includes a pipe section (which contains the target fluid material 120 and allows the target fluid material 120 to pass through either side of the freezer valve) and a temperature regulating device in thermal communication with the pipe section. The temperature regulating device is configured to change the temperature of the pipe section within a temperature range near the melting point of the target fluid material 120. For example, the temperature regulating device could be a cylinder heater in thermal communication with the pipe section. If the temperature of the pipe section remains substantially below the melting point of the target fluid material 120, any liquid within the pipe section will solidify (become frozen), and this solid matter will block the fluid passage through the pipe section, thereby preventing further flow of the target fluid material 120 through the freezer valve. When the temperature regulating device heats the pipe section above the melting point of the solid material, the solid material can melt, and if the temperature is high enough, i.e., appropriately exceeding the melting point of the solid material, the solid material in the plug will melt to form the fluid target material 120, which can now flow freely through the flow channel of the pipe section.

[0078] For example, when the temperature regulating device of the reservoir refrigeration valve 218F cools the pipe section of the reservoir refrigeration valve 218F to a temperature appropriately below the melting point of the fluid target material 120, the reservoir refrigeration valve 218F isolates the flow of the first reservoir 112 and the nozzle supply system 140 from the second reservoir 113 and the injection system 104. Furthermore, when the temperature regulating device within the refill refrigeration valve 219F cools the pipe section of the refill refrigeration valve 219F to a temperature appropriately below the melting point of the fluid target material 120, the refill refrigeration valve 219F isolates the flow of the injection system 104 from the nozzle supply system 140, the first reservoir 112, and the second reservoir 113.

[0079] In some implementations, such as Figure 2 As shown, the nozzle supply system 240 includes a capillary 241 that extends generally along a longitudinal direction (i.e., parallel to the X direction) and defines an opening 243. The opening 243 is located at one end of the capillary 241 and opens to the system 124 at one end. The capillary 241 may be made of glass in the form of, for example, fused silica, borosilicate, aluminosilicate, or quartz. The fluid target material 120 flows through the capillary 241 and is ejected through the opening 243. The Laplace pressure is the pressure difference between the interior and exterior of the curved surface forming the boundary between the gas and liquid regions. This pressure difference is caused by the surface tension of the interface between the liquid and gas. When the first pressure P of the first reservoir 112... 112When the pressure is greater than the Laplace pressure, the fluid target material 120 leaves the opening 243 as the target flow 121.

[0080] Nozzle supply system 140 is configured to supply fluid target material 120 to system 124. The pressure P of system 124 outside nozzle supply system 140 is... 124 It can be equal to or lower than the pressure P applied to the first storage system 102 112 This causes the fluid target material 120 to be affected by pressure P. 112 (The pressure P applied to the nozzle supply system 140) and system 124 124 The pressure difference between them forces them to leave the nozzle supply system 140. In some implementations, the first pressure P of the first reservoir 112... 112 The system pressure P is greater than atmospheric pressure and is 124. 124 Less than atmospheric pressure.

[0081] As described above, the environmental control device 236 is configured to independently control the temperature and pressure of each of the first reservoir 112 and the second reservoir 113. The environmental control device 236 is configured to independently and separately control the first pressure P of the first reservoir 112. 112 The second pressure P of the second reservoir 113 113 The environmental control device 236 is also configured to independently and separately control the first temperature T of the first reservoir 112. 112 The second temperature T of the second reservoir 113 113 .like Figure 2 As shown, the environmental control device 236 can be configured to independently control one or more aspects of the temperature and pressure of the nozzle supply system 240. Furthermore, the fluid controller 106 can control one or more aspects of the fluid flow within the nozzle supply system 240. These controls refer to... Figure 5 The nozzle supply system 540 will be discussed in more detail.

[0082] The environmental control device 236 may include multiple components, each configured to independently and separately control the temperature or pressure of either the first reservoir 112 or the second reservoir 113. For example, the environmental control device 236 may include a first pressure P for controlling the first reservoir 112. 112 The components for controlling the second pressure P of the second reservoir 113 113 The components for controlling the first temperature T of the first reservoir 112 112 The components and the second temperature T for controlling the second reservoir 113 113 The components. The first pressure P of the first reservoir 112 is controlled independently and separately. 112 The second pressure P of the second reservoir 113113 Each of the components can be a pressure control component that is in flow communication with the first reservoir 112 or the second reservoir 113, respectively. In some implementations, a pressurized gas can be applied to the chambers of the first reservoir 112 and the second reservoir 113, and a corresponding first pressure P can be adjusted by regulating the pressure of the respective pressurized gas. 112 Second pressure P 113 An inert or non-reactive pressurized gas should be used. For example, the pressurized gas could be a mixture of hydrogen and argon, such as a mixture of 2% hydrogen in argon. Furthermore, the environmental control device 236 may include a controller that analyzes data from various sensors / measuring devices within the device 200 and determines, based on such analysis, how to regulate the components within the device 200.

[0083] In another example, the first temperature T of the first reservoir 112 is controlled independently and separately. 112 The second temperature T of the second reservoir 113 113 Each of the components may include an oven, a thermocouple device, or be configured to measure and maintain a first temperature T. 112 Second temperature T 113 Another device for each of the following. For example, environmental control device 236 may include a pressure sensor on each of the first reservoir 112, the second reservoir 113, and the injection tank 114. Environmental control device 236 may include one or more thermocouple devices for each zone or area within device 200 where temperature monitoring is required.

[0084] Refer again Figure 1 In some implementations, solid material 122 is an ingot (such as a block or disc) made primarily of tin. The ingot may be at least 99% (or at least 99.9%) pure by weight. This means that trace amounts of other non-tin materials (such as lead and antimony) may be present in solid material 122. In this example where solid material 122 is a tin ingot, injection system 104 includes one or more means for heating solid material 122 to a temperature above 450ºF (the melting point of tin). After melting, solid tin becomes liquid tin and other non-tin materials (such as lead and antimony, or molecules or other components). Non-tin materials may include one or more molecules, atoms, compounds, or other components, each of which is in a solid or liquid state depending on the melting point of the component. Liquid tin (in this case, becoming fluid target material 120) is thus supplied to injection tank 114. For example, during operation of nozzle supply system 140, 5 kg of tin ingots may be placed into injection chamber 130 in injection system 104 every 400 hours. In other examples, different ingot sizes can be placed into injection chamber 130 at different replacement frequencies.

[0085] refer to Figure 4 Inject into system 104 (e.g.) Figure 1 The implementation (shown) is illustrated as an injection system 404. The injection system 404 includes an injection tank 414 (for storing the fluid target material 120 and supplying the fluid target material 120 to a first storage system 102 and / or a second storage system 130), an injection chamber 430 (for reloading the solid material 122), and a fluid transfer system 461. The injection chamber 430 includes a main cavity 425, which is large enough to receive a removable carrier 428. The solid material 122 is received within a second cavity 429 of the removable carrier 428. The injection chamber 430 includes a removable cover 430L, which serves as an airtight seal for the main cavity 425 and also enables the removal of the removable carrier 428 when replacement of the solid material 122 is required. The injection chamber 430 may include, for example, a pipe segment having a central fluid flow channel, which is part of the fluid flow path between the injection chamber 430 and the fluid transfer system 461. The tube segment can extend from the injection chamber 430 and the removable carrier 428, and the interior of the tube segment can flow in communication with the transfer opening defined by the second cavity 429, and can also flow in communication with the fluid transfer system 461 via the flow channel.

[0086] For example, the fluid transfer system 461 may include a regulating device that controls the flow of fluid from the injection chamber. In this way, the regulating device can control the fluid flow path between the injection chamber 430 and the injection tank 414. The regulating device may include, for example, a valve arrangement comprising one or more valves that interact with a central fluid flow channel of the pipe section, such that the flow of the fluid target material 120 within the central fluid flow channel is controlled by the operation of one or more valves in the valve arrangement.

[0087] In some implementations, the valve arrangement of the fluid transport system 461 may include a refrigeration valve. The refrigeration valve may include a pipe section and a temperature regulating device in thermal communication with the pipe section. The temperature regulating device is configured to change the temperature of the pipe section within a temperature range near the melting point of the solid material 122. The temperature regulating device may be a cylindrical heater in thermal communication with the pipe section. For example, if the temperature of the pipe section is maintained substantially below the melting point of the solid material 122, any liquid that has flowed out of the carrier 428 (due to gravity) will solidify upon reaching the central fluid flow channel, and this solid material will block the central fluid flow channel to prevent further fluid from flowing through it. Therefore, when the temperature regulating device heats the pipe section to a temperature above the melting point of the solid material 122, the solid material 122 can melt, and if the temperature is high enough (i.e., above the melting point), the solid material 122 in the plug will melt and flow freely through the central fluid flow channel.

[0088] In some implementations, the valve arrangement of the fluid transfer system 461 may include a gate valve in addition to the refrigeration valve, and the gate valve may be placed between the refrigeration valve and the injection tank 414. The gate valve may be opened before the section of pipe for heating the refrigeration valve so that the molten fluid does not come into contact with the actual gate of the gate valve.

[0089] Any component of device 100 (including first reservoir system 102, second reservoir system 103, injection system 104, and flow communication device 116) that comes into contact with any fluid flow path or fluid cavity shall be made of a material that is compatible with and does not react with the solid substance 122, the fluid target material 120, and any non-target material (whether in solid, fluid, or liquid form) that may be present in the solid substance 122. For example, the structure of the first reservoir 112; the structure of the second reservoir 113; the injection chamber 430, the removable carrier 428, the regulating device, or other components in the fluid transport system 461; the regulating devices 117, 118, 119 of the flow communication device 116, and the fluid transport line may be made of various rigid metals or metal alloys.

[0090] In addition, refer to Figure 5 In some implementations, the nozzle supply system 540 includes a dedicated component 531 configured to operate under the control of the environmental control device 236 and the fluid controller 106 to remove fluid targets from within the nozzle supply system 540 and from interfaces within the device 100.

[0091] In this implementation, the nozzle supply system 540 includes a nozzle assembly 542 having a capillary 541 extending generally in its longitudinal direction and defining an opening 543 through which the fluid target material 120 exits as a target flow 121. A dedicated component 531 includes a gas line 532 fluidly coupled at one end to a flow communication device 116 between a regulating device 117 of the device 200 and the nozzle assembly 542. At the other end, the gas line 532 is fluidly coupled to a gas source. The dedicated component 531 also includes a fluid valve 533, such as a maintenance refrigeration valve for opening and closing the fluid flow path of the gas line 532, the fluid flow path being defined between the gas source at one end and the nozzle assembly 542 and the device 200 at the other end.

[0092] Environmental control device 236 includes a temperature regulating device and a pressure regulating device. The temperature regulating device is thermally connected to flow communication device 116 and gas line 532 along the path between regulating device 117 and nozzle assembly 542. The pressure regulating device can pressurize gas line 532. At certain times, such as when nozzle assembly 542 needs to be replaced, and before replacing nozzle assembly 542, fluid controller 106 instructs fluid valve 533 to open. For example, if fluid valve 533 is a refrigeration valve, it can then be heated or heated to a temperature above the melting point of fluid target material 120. Environmental control device 236 can control the pressure P applied to gas line 532. 531 Increase to a pressure greater than the first pressure P applied to the first reservoir 112 112 The pressure thus pushes the fluid target material 120 remaining in the nozzle assembly 542 and / or in the flow path between the nozzle assembly 542 and the first reservoir 112 back to the first reservoir 112.

[0093] The nozzle supply system 540 may also include a nozzle valve system 545 located between the capillary 541 and the gas line 532. The nozzle valve system 545 may be configured to flow-isolate the nozzle assembly 542 from the device 200 after the fluid target material 120 has been removed from the flow communication device 116.

[0094] refer to Figure 6 While the nozzle supply system 140 operates to generate fluid target material 120 to the system 124, the device 100 executes process 670 to control the flow of fluid target material 120 to the nozzle supply system 140 (e.g., ...). Figure 1 The transfer (as shown). See also the steps in process 670 for further details. Figure 8A . Figure 8A The relevant components for the implementation of device 100 are described through the various steps in process 670.

[0095] Initially, such as Figure 8A As shown, the injection system 104 receives a solid substance 122 comprising the target material. The injection system 104 is maintained at an injection pressure P. 114 For example, refer to Figure 4 The cover 430L on the injection chamber 430 can be opened or removed from the body of the injection chamber 430 to allow solid material 122 to be received within the injection chamber 430 (or removable carrier 428). During this process, the injection chamber 130 is thus exposed to atmospheric pressure. Solid material 122 may have dimensions and weight based on the dimensions of the injection chamber 430. Furthermore, the process of opening the cover 430L and inserting solid material 122 into the injection chamber 430 can be automated without human intervention.

[0096] In addition, the injection chamber 430 (or removable carrier 428) may be equipped with a sensor system that can detect when the cover 430L is closed or when the solid substance 122 is present in the injection chamber 430.

[0097] During this period (where injection system 104 receives solid material 122

[671] ), because of injection pressure P 114 At atmospheric pressure, the injection system 104 can be flow-isolated from the rest of the device 100. For example, before opening the injection system 104 to receive solid material 122, the fluid controller 106 can instruct the regulating device 119 to close, thereby flow-isolating the injection system 104 from the second reservoir 113, the first reservoir 112, and the nozzle supply system 140. In this way, during this period, the fluid target material 120 is prevented from being transferred from the main tank 114 via the flow communication connection 116 to any of the second reservoir 113, the first reservoir 112, and the nozzle supply system 140.

[0098] The injection system 104 generates a fluid target material 120 from the solid substance 122

[673] . See next for reference. Figure 4 An example is provided of how the injection system 104 generates a fluid target material 120 from a solid substance 122. Initially, the main cavity 425 of the injection chamber 430 can be sealed, for example, by securing a cap 430L to the remainder of the injection chamber 430. The cavity of the injection tank 414 and the main cavity 425 can be in flow communication with each other to allow pressure equalization and also to allow the final target material fluid 120 to flow freely from the injection chamber 430 to the injection tank 414. At this time, the main cavity 425, at least a portion of the transfer system 461, and the cavity of the injection tank 414 can be maintained at an injection pressure P below atmospheric pressure. 114 Next, the inserted solid material 122 is heated to a temperature above the melting point of the solid material 122 until the solid material 122 becomes the fluid target material 120.

[0099] During the time that the fluid target material 120 is generated by the solid substance 122 within the injection system 104

[673] , the regulating device 119 continues to isolate the injection system 104 from the second reservoir 113, the first reservoir 112, and the nozzle supply system 140. In this way, the operation of the nozzle supply system 140 supplying the fluid target material 120 to the system 124 can be maintained.

[0100] Furthermore, during the period when the nozzle supply system 140 supplies the fluid target material 120 to the system 124, the fluid control system 190 maintains flow communication between the first reservoir 112 and the nozzle supply system 140

[675] . For example, the fluid controller 106 may instruct the regulating device 117 to remain open during this period to facilitate the transfer of the fluid target material 120 from the first reservoir 112 to the nozzle supply system 140 via the flow communication connection 116. Additionally, the environmental control device 236 ( Figure 2 The first reservoir 112 is maintained at a first pressure P. 112 And the first pressure P 112 Greater than the injection pressure P 114 Environmental control equipment 236 ( Figure 2 It can also ensure the first pressure P of the first reservoir 112 112 Greater than pressure P 124 To achieve efficient and continuous transfer of fluid target material 120 from the first reservoir 112 to the nozzle supply system 140 during operation of the nozzle supply system 140.

[0101] When the fluid target material 120 is in the injection system 104 at an injection pressure P 114 When the next is generated, refer to Figure 8A The fluid control system 190 enables the fluid target material 120 to be transferred between the first reservoir 112 and the second reservoir 113 for at least a portion of the time during the operation of the nozzle supply system 140

[677] . For example, the fluid controller 106 may instruct the regulating device 118 to open to allow the fluid target material 120 to be transferred between the first reservoir 112 and the second reservoir 113 via the flow communication connection 116.

[0102] refer to Figure 7 While the nozzle supply system 140 operates to generate fluid target material 120 to the system 124, the device 100 executes process 780 to control the flow of fluid target material 120 to the nozzle supply system 140 (e.g., ...). Figure 1 The transfer (as shown). Refer to the discussion of steps 780 for further details. Figure 8B . Figure 8B The relevant components for the implementation of device 100 are described through the various steps in process 780.

[0103] Initially, such as Figure 8B As shown and as described above, the injection system 104 receives a solid substance 122 comprising the target material

[781] . The injection system 104 is maintained at an injection pressure P. 114 For example, refer to Figure 4As described above, solid material 122 can be received within injection chamber 430. During this time, injection chamber 130 is thus exposed to atmospheric pressure, and injection system 104 can be flow-isolated from the rest of device 100. For example, before opening injection system 104 to receive solid material 122, fluid controller 106 can instruct regulating device 119 to close, thereby flow-isolating injection system 104 from second reservoir 113, first reservoir 112, and nozzle supply system 140. In this way, during this time, fluid target material 120 is prevented from being transferred from main tank 114 via flow communication connection 116 to any of the second reservoir 113, first reservoir 112, and nozzle supply system 140.

[0104] The injection system 104 generates a fluid target material 120 from the solid material 122

[783] . For example, and as described above, the inserted solid material 122 is heated to a temperature above the melting point of the solid material 122 until the solid material 122 becomes the fluid target material 120. During this period, the regulating device 119 continues to isolate the injection system 104 from the second reservoir 113, the first reservoir 112, and the nozzle supply system 140.

[0105] In this way, the operation of the nozzle supply system 140 supplying fluid target material 120 to the system 124 can be maintained.

[0106] Additionally, during the period when the nozzle supply system 140 supplies the fluid target material 120 to the system 124, the fluid control system 190 maintains flow communication between the first reservoir 112 and the nozzle supply system 140

[785] . For example, and as described above, the fluid controller 106 may instruct the regulating device 117 to remain open during this period to facilitate the transfer of the fluid target material 120 from the first reservoir 112 to the nozzle supply system 140 via the flow communication connection 116. Furthermore, the environmental control device 236 ( Figure 2 The first reservoir 112 is maintained at a first pressure P. 112 First pressure P 112 Greater than the injection pressure P 114 Environmental control equipment 236 ( Figure 2 It can also ensure the first pressure P of the first reservoir 112 112 Greater than pressure P 124 To achieve efficient and continuous transfer of fluid target material 120 from the first reservoir 112 to the nozzle supply system 140 during operation of the nozzle supply system 140.

[0107] When the first reservoir 112 and the nozzle supply system 140 are flow-isolated from the injection system, reference Figure 8BThe fluid control system 190 enables the fluid target material 120 to be transferred between the injection system 104 and the second reservoir 113 for at least a portion of the time during the operation of the nozzle supply system 140

[787] . For example, the fluid controller 106 may instruct the regulating device 119 to open or remain open (if already open) to facilitate the transfer of the fluid target material 120 between the injection system 104 and the second reservoir 113 via the flow communication connection 116. Additionally, during this period, the fluid controller 106 may instruct the regulating device 118 to close or remain closed (if already closed) to isolate the second reservoir 113 and the injection system 104 from the first reservoir 112 and the nozzle supply system 140. In this way, the operation of the nozzle supply system 140 supplying the fluid target material 120 to the system 124 can be maintained.

[0108] Any one or both of processes 670 and 780 can also ensure that while the fluid target material 120 is made possible to be transferred between the injection system 104 and the second reservoir 113, the first pressure P of the first reservoir 112 remains constant. 112 Maintained at a pressure greater than the second pressure P 113 and injection pressure P 114 Levels, such as in Figure 8B middle.

[0109] In some implementations, the transfer of fluid target material 120 to nozzle supply system 140 during the entire operation of nozzle supply system 140 can be achieved by causing fluid target material 120 to flow from first reservoir 112 to nozzle supply system 140, from second reservoir 113 to nozzle supply system 140, or from both first reservoir 112 and second reservoir 113 to nozzle supply system 140.

[0110] In addition, the environmental control device 236 can independently and separately control the temperature and pressure of the fluid target material 120 in each of the first reservoir 112, the second reservoir 113 and the injection system 104 during any one or both of processes 670 and 780.

[0111] During normal operation of device 100, each of the first reservoir 112 and the second reservoir 113 has sufficient fluid target material 120 to supply the fluid target material 120 to the nozzle supply system 140 without interrupting the operation of the nozzle supply system 140 in providing the target flow 121 to system 124. In normal operation, as... Figure 8A As shown, the first pressure P 112 (Applied to the first reservoir 112) and the second pressure P 113 (Applied to the second reservoir 113) is maintained at a high value. For example, the first pressure P 112 Second pressure P113 Each can be maintained at or above 6000 kPa, at least 10,000 kPa, at least 25,000 kPa, or within the range of 6000 kPa to 60,000 kPa. First pressure P 112 Second pressure P 113 It can be maintained at a pressure greater than the system pressure P 124 The value is adjusted so that the fluid target material 120 can be pushed through the nozzle supply system 140 and reach the system 124. In this case, both the first reservoir 112 and the second reservoir 113 can supply the fluid target material 120 to the nozzle supply system 140. Additionally, during normal operation, the temperature T applied to the first reservoir 112 and the second reservoir 113 is adjusted. 112 and T 113 They can be kept at a level higher than the melting point of the fluid target material 120 to ensure that the fluid target material 120 is kept in a fluid state.

[0112] During normal operation mode, such as Figure 8A As shown, regulating device 119 is closed to isolate the first reservoir 112, the second reservoir 113, and the nozzle supply system 114 from the injection system 104. Because the injection system 104 is completely isolated from the rest of the device 100, the fluid target material 120 can be injected (i.e., prepared) into the injection system 104 during normal operation without affecting the normal operation mode. In particular, the injection of the fluid target material 120 into the injection system 104 requires the injection system 104 to operate at different pressures and temperatures than the other components of the device 100 (e.g., the first reservoir system 102 and the second reservoir system 103). Because the injection system 104 is flow-isolated and environmentally isolated from the rest of the device 100 during normal operation, the process of injecting the fluid target material 120 into the injection system 104 can be carried out in parallel with the normal operation mode.

[0113] The fluid target material 120 can be described as follows and referenced. Figure 4Preparation takes place in injection system 104. Specifically, solid material 122 is inserted into injection chamber 430. While solid material 122 is inserted into injection chamber 430, the temperature of injection system 104 can be maintained at room temperature. Alternatively, if a removable carrier 428 is used, solid material 122 can be inserted into removable carrier 428 first, then removable carrier 428 can be inserted into injection chamber 430, and then cap 430L can seal injection chamber 430. Once solid material 122 is in injection chamber 430, the temperature of injection chamber 430 is raised until solid material 122 melts into fluid target material 120. At this point, fluid transfer system 461 controls fluid target material 120 to flow into injection tank 414, which is maintained at a temperature above the melting point of fluid target material 120. Therefore, fluid target material 120 can be stored in injection tank 414 for later use by device 100.

[0114] During normal operation, as the fluid target material 120 is used by the nozzle supply system 140 to generate the target flow 121, the amount of fluid target material 120 is gradually depleted from either or both of the first reservoir 112 and the second reservoir 113, such as Figure 8A As shown. At some point during normal operation, such as Figure 9A As shown, the amount of fluid target material 120 in the first reservoir 112 and the second reservoir 113 becomes so low that it is necessary to switch from the normal operating mode of the device 100 to the supplementary operating mode of the device 100.

[0115] At the start of supplementary mode, such as Figure 9B As shown, regulating device 118 is closed, thus isolating the flow between the first reservoir 112 and the nozzle supply system 140 on one side and the second reservoir 113 on the other side. Once regulating device 118 is closed, environmental control device 236 depressurizes the second reservoir 113, meaning that the pressure P applied to the second reservoir 113 is reduced. 113 It is brought to a suitable low pressure that is close to or at atmospheric pressure. For example, pressure P 113 It can be depressurized to equal to or below 600 kPa. At this time, the pressure P applied to the first reservoir 112 is... 112 Maintain a high pressure (such as equal to or higher than 6000 kPa or equal to a value between 6000 kPa and 60,000 kPa) to ensure that the fluid target material 120 can continue to be supplied to the nozzle supply system 140. Next, as... Figure 9C As shown, once the pressure P applied to the second reservoir 113 113Once a suitable low pressure has been reached, the fluid controller 106 instructs the regulating device 119 to open, thereby allowing fluid flow between the injection system 104 (specifically, the injection tank 114) and the second reservoir 113. Once the regulating device 119 is open, the target fluid 120 flows freely from the injection tank 114 to the second reservoir 113, as shown. The target fluid 120 continues to flow into the second reservoir 113 until the target fluid 120 in the injection tank 114 drops below a threshold (or until the target fluid 120 is depleted from the injection tank 114). In some implementations, the injection tank 114 is capable of storing a volume of target fluid 120 exceeding the volume within the second reservoir 113. In these implementations, overfilling of the second reservoir 113 with target fluid 120 can be prevented by appropriately positioning the second reservoir 113 and the injection tank 114 relative to each other along the Z-direction such that the minimum level of target fluid 120 in the injection tank 114 is always below the top of the second reservoir 113.

[0116] As described above, in some implementations, the regulating device 119 is a refrigeration valve. In these implementations, to open the regulating device 119, a temperature regulating device heats a section of the regulating device 119 to a value higher than the melting point of the fluid target material 120 to melt any solid material 122 previously formed as a plug within the section of the regulating device 119 (when the regulating device 119 is closed). Thus, the solid material 122 is melted, and the fluid target material 120 can flow through the section.

[0117] Next, as Figure 9D As shown, fluid controller 106 instructs regulating device 119 to close. In the implementation of regulating device 119 as a refrigeration valve, the regulating temperature regulating device within regulating device 119 cools the regulating area of ​​regulating device 119 until the pipe section reaches a temperature below the melting point of fluid target material 120. Ultimately, fluid target material 120 solidifies within the pipe section and forms a plug preventing fluid target material 120 from flowing through regulating device 119. Once regulating device 119 is fully closed, environmental control device 236 repressurizes second reservoir 113, meaning that the pressure P applied to second reservoir 113 is... 113 It is brought to a suitable high pressure, which can be at or above 6000 kPa, or in the range of 6000 kPa to 60,000 kPa. In some implementations, the pressure P applied to the second reservoir 113 is then... 113 It can be used with the pressure P applied to the first reservoir 112 112 Same. Next, once the pressure P... 113 To achieve the appropriate high pressure, such as Figure 9EAs shown, the fluid controller 106 instructs the regulating device 118 to open. The fluid target material 120 can flow from the second reservoir 113 to the first reservoir 112, as... Figure 9F As shown.

[0118] The supplementary mode ends and device 100 resumes normal operation. In some implementations, such as... Figure 9G As shown, in the normal operating mode, the fluid target material 120 can also be delivered from the second reservoir 113 to the nozzle supply system 140 and from the first reservoir 112 to the nozzle supply system 140.

[0119] In normal operating mode, injection system 104 can be used to inject (prepare) fluid target material 120 from solid material 122. Injection system 104 can inject fluid target material 120 from solid material 122 at a fixed frequency, or every few hours, every tens of hours, or every hundreds of hours. In some implementations, injection system 104 can inject fluid target material 120 from solid material 122 when instructed to do so.

[0120] Throughout the entire period of normal operating mode and supplementary operating mode (throughout) Figure 9A-9G (As shown in the steps), fluid target material 120 is supplied from the first reservoir 112 to the nozzle supply system 140 so that the nozzle supply system 140 can continuously generate target flow 121 for use by system 124.

[0121] The above is for reference only. Figure 9A-9G The described cycle can be repeated during operation of the nozzle supply system 140 to continuously supply the fluid target material 120 to the nozzle supply system 140.

[0122] At some point during the operation of device 100, it may be necessary to replace the nozzle assembly 542 of the nozzle supply system 540. To do this, excess fluid target material 120 within the flow communication device 116 should be drained back into the first reservoir 112 (or the second reservoir 113) from the flow path extending to the nozzle assembly 542. Specifically, refer to... Figure 5 Fluid valve 533 opens (and nozzle valve system 545 opens simultaneously), and under the control of environmental control device 236, pressure P... 531 The gas applied to gas line 532 and the fluid path extending from nozzle assembly 542 back to first reservoir 112 (or second reservoir 113). If fluid valve 533 is a refrigeration valve, the temperature inside the valve rises to a level higher than the melting point of the fluid target material 120, thereby opening fluid valve 533. The pressure P of the gas applied to gas line 532. 531 Greater than the pressure P applied to the first reservoir 112 112(or greater than the pressure P applied to the second reservoir 113) 113 Higher pressure P 531 This causes the fluid target material 120 to be pushed away from the nozzle assembly 542 and back into the first reservoir 112 or the second reservoir 113 (when the regulating device 117 is open). At this time, the nozzle valve system 545 can be closed, the fluid valve 533 can be closed (e.g., by cooling), and the nozzle assembly 542 can be removed and replaced with a new nozzle assembly.

[0123] In this way, the nozzle assembly 542 can be replaced without replacing any of the first reservoir 112, the second reservoir 113, or the injection tank 114.

[0124] Apply pressure P to gas line 532 531 The high temperature T534 can be large enough to remove the fluid target material 120 from the flow path of the flow communication device 116, even beyond the first reservoir 112, provided that the regulating devices 117, 118, and 119 are all open and the flow communication device 116 is maintained at a temperature higher than the melting point of the fluid target material 120.

[0125] In summary, the aforementioned devices 100, 200, 300, processes, and operating modes enable the nozzle supply system 140 to operate continuously to supply the target flow 121 to the system 124, thereby achieving the performance specifications desired by the system 124, without interruption to reload the solid material 122 and inject / prepare the fluid target material 120 from the solid material 122.

[0126] Because the first reservoir 112 and the second reservoir 113, as well as the injection system 104, can be separated from the fluid and environment of the nozzle supply system 140, the time spent replacing any component within the device 100 can be significantly reduced. This can also occur even while the nozzle supply system 140 is generating the target flow 121, as long as one of the first reservoir 112 or the second reservoir 113 is supplying the fluid target material 120 to the nozzle supply system 140.

[0127] The newly added solid material 122 is added to the injection system 104, which includes an injection chamber 130, which can be maintained at a low pressure during this period. Furthermore, the solid material 122 melts simultaneously within the original high vacuum environment of the injection chamber 130 to prevent or reduce oxidation within the fluid target material 120.

[0128] If any of the fluid transmission line 115 or regulating devices 117, 118, 119 within the flow communication device 116 needs to be disconnected for maintenance or repair, such disconnection can be performed after the fluid target material 120 has been first removed from the flow communication device 116 by controlling the pressure at different locations along the path toward the nozzle supply system 140. As described above, for example, to clear the fluid flow path from the nozzle supply system 140 to the first reservoir 112, the gas line 532 can be pressurized (to a pressure greater than P) while the regulating device 117 is open. 112 (Pressure).

[0129] As another example, in order to clear the fluid flow path from the first reservoir 112 to the second reservoir 113, pressure P is applied while regulating device 118 is open (and regulating device 117 is closed). 112 It can be increased to a pressure greater than P. 113 The value. Finally, in order to clear the fluid flow path from the second reservoir 113 to the injection system 104, the pressure P is adjusted while the regulating device 119 is open (and the regulating device 118 is closed). 113 It can be increased to a pressure greater than P. 114 The value. Similar to the gas interface provided by the fluid valve 533 at the nozzle supply system 540, another gas interface can be provided between the injection tank 114 and the second reservoir 113 to push the fluid target material 120 from the injection tank 114 into the second reservoir 113 (while keeping the regulating device 119 open and the regulating device 118 closed). Once the injection tank 114 has been emptied of the fluid target material 120, the regulating device 119 can be closed, and then the injection tank 114 can be replaced.

[0130] The removal of the target fluid material 120 from the fluid transfer lines 115 and regulating devices 117, 118, and 119 enables a modular architecture within the device 100. In this way, when only one component within the device 100 malfunctions, it is not necessary to replace all components within the device 100 and the nozzle supply system 140. For example, only the malfunctioning nozzle supply system 140 needs to be replaced (without replacing any other components within the device 100). As another example, only the malfunctioning reservoir (first reservoir 112 or second reservoir 113) needs to be replaced, without replacing other reservoirs or the injection system 104 or the nozzle supply system 140 (or even interfering with the operation of the nozzle supply system 140).

[0131] Any components operating at low pressure (e.g., approximately or close to atmospheric pressure) can also be kept in a relatively cold environment (such as near room temperature). Furthermore, reloading of the solid material 122 may occur even when the first reservoir 112 is operating at high pressure to supply the fluid target material 120 to the nozzle supply system 140.

[0132] The equipment 100, 200, 300, processes, and operating modes enable the nozzle supply system 140 to operate and supply the target flow 121 at least 80%, at least 90%, or at least 99% of the time (e.g., 99.2% of the time). Compared to previously achievable times, the average time required to replace the nozzle assembly 542 is reduced to less than 6 hours, less than 5 hours, or approximately 4.5 hours. This results in lower ownership costs over time and reduced service hours for maintaining the equipment or nozzle supply system 140.

[0133] In some implementations, and referencing Figure 10 The device 100 is a device 1000 that also includes a level sensing device 1035, which is configured to estimate the volume of the fluid target material 120 in the second reservoir 113 at different time points during normal operation or replenishment operation. The level sensing device 1035 may utilize one or more of electrical, magnetic, and ultrasonic components to estimate the volume or level of the fluid target material 120. The level sensing device 1035 may be capable of withstanding a pressure P applied to the second reservoir 113. 113 Any device. In addition, in some implementations, device 1000 may include another level sensing device 1035 configured to estimate the volume of fluid target material 120 in the first reservoir 112.

[0134] In some implementations, the level sensing device 1035 may include one or more high-pressure transducers. Although the following discussion refers to only one high-pressure transducer, the level sensing device 1035 is not limited to having only one high-pressure transducer. The level sensing device 1035 may include transducers that can operate under high pressure (such as at a pressure at which the second reservoir 113 can operate) and are included in the second reservoir 113.

[0135] A high-pressure transducer is a pressure sensor that measures the pressure of the gas within the second reservoir 113. The high-pressure transducer 1035 generates a signal as a function of the pressure applied thereto. The high-pressure transducer 1035 can measure the pressure of the gas within the second reservoir 113 such that when the volume of the fluid target material 120 in the second reservoir 113 changes, the pressure of the gas within the second reservoir 113 (and above the fluid target material 120) also changes. For example, when the second reservoir 113 is filled with the fluid target material 120, causing an increase in the volume of the fluid target material 120 (such as in… Figure 9C and 9D During the supplementary mode shown, the gas in the second reservoir 113 (and above the fluid target material 120) is slowly compressed within the second reservoir 113.

[0136] High-pressure transducer 1035 can be useful, as follows. Specifically, environmental control device 236 can establish a pressure differential between the second reservoir 113 and the injection tank 114 to facilitate faster transfer of the fluid target material 120 from the injection tank 114 to the second reservoir 113. Specifically, in the execution Figure 9C Prior to the steps shown, environmental control device 236 can ensure that the pressure P applied to injection tank 114 is [not specified]. 114 The pressure P applied to the second reservoir 113 is higher than the pressure P. 113 For example, the pressure P in injection tank 114 114 The pressure P in the second reservoir 113 can be compared to 113 The pressure difference is 100-200 kPa. Because the environmental control device 236 is applying this pressure difference, the second reservoir 113 is filled more quickly, and importantly, it ensures that the second reservoir 113 is not overfilled by the fluid target material 120.

[0137] In this way, the high-pressure transducer 1035 enables the control system 1092 within the device 1000 (which may include aspects or components of the environmental control device 236 and / or the fluid controller 106) to track or monitor changes in the volume of the fluid target material 120 in the second reservoir 113. The output of the high-pressure transducer 1035 may be an electrical signal representing the amount of fluid target material 120 in the second reservoir 113. Furthermore, this output can be analyzed by the control system 1092 to determine when to shut down the regulating device 119 or when the fluid target material 120 needs to be refilled or replenished. For example, whenever the level of the fluid target material 120 in the second reservoir 113 drops below a certain level, the control system 1092 may instruct the fluid controller 106 to reload the injection tank 114.

[0138] The control system 1092 can use the following equation to estimate the volume of the fluid target material 120 in the second reservoir 113:

[0139]

[0140] in The initial pressure of the second reservoir (exist Figure 9C (known before the refill begins in V); 113 It is the total volume of the second reservoir (known); The initial volume of the fluid target material 120 retained in the second reservoir (in Figure 9C (before the refill begins). Vt is the current pressure in the second reservoir 113, which is the output from the high-pressure transducer 1035; and Vt is the volume of the fluid target material 120 that has been transferred from the injection tank 114 to the second reservoir 113. Vt can be determined from a level sensor in the injection tank 114. In other implementations, other relationships and parameters can be used to estimate the volume of the fluid target material 120 in the second reservoir 113.

[0141] As the fluid target material 120 flows from the injection tank 114 to the second reservoir 113 (such as... Figure 9C As shown), the output of the high-voltage transducer 1035 The pressure P is constantly changing, and the control system 1092 obtains the pressure P based on each new value. 113 A series of measurements are taken, and this information can be used to understand, for example, the volume Vt of the fluid target material 120 that has been transferred to the second reservoir 113 and / or the initial volume of the fluid target material 120 retained in the second reservoir 113. By understanding before refilling (in Figure 9C Before the steps shown, the control system 1092 can determine the amount of fluid target material 120 used per time period (the consumption rate of fluid target material 120) and the amount of fluid target material 120 retained in the second reservoir 113 and the first reservoir 112, respectively. The control system 1092 can use the determined consumption rate to determine when to instruct the fluid controller 106 to trigger refilling in the second reservoir 113. In this way, the first reservoir 112 can continuously supply a source of fluid target material 120 to the nozzle supply system 140 during operation. Information from the pressure transducer 1035 can also be used to estimate the total amount of fluid target material 120 retained in the first reservoir 112 and the second reservoir 113.

[0142] Furthermore, in the described implementation, when the high-pressure transducer 1035 monitors the volume of the fluid target material 120 in the second reservoir 113, it can prevent the second reservoir 113 from being overfilled with the fluid target material 120 from the injection tank 114. For example, when the high-pressure transducer 1035 reaches a steady state, the compression of the gas in the second reservoir 113 has reached its upper limit. Thus, the second reservoir 113 has been completely filled with the fluid target material 120. The fluid control system 1092 can then prevent the fluid target material 120 from continuing to flow between the injection system 104 and the second reservoir 113. In this way, overfilling of the second reservoir 113 with the fluid target material 120 can be prevented.

[0143] In these implementations, after the fluid target material 120 has been transferred from the injection tank 114 to the second reservoir 113 (i.e., in Figure 9C After the steps shown are completed), and before the first reservoir 112 and the second reservoir 113 are connected by opening the regulating device 118 (i.e., before... Figure 9E Before the steps shown begin, calculations can be performed by the control system 1092. The calculations include using the above equation ( Figure 10 The control system 1092 estimates the volume Vt of the fluid target material 120 that has been transferred from the injection tank 114 to the second reservoir 113. Furthermore, the control system 1092 can calculate the total volume of the fluid target material 120 contained in the second reservoir 113 based on the flow equation. :

[0144]

[0145] The total volume of the fluid target material 120 in the second reservoir 113 The initial volume of the fluid target material 120 retained in the second reservoir 113 was calculated. The total volume Vt of the fluid target material 120 that has been transferred from the injection tank 114 to the second reservoir. The control system 1092 can also be based on the total volume Vt of the fluid target material 120 in the second reservoir. The height of the fluid target material 120 in the second reservoir 113 is estimated by using the known dimensions inside the second reservoir 113.

[0146] In the described implementation, the control system 1092 can also perform these same calculations for the first reservoir 112.

[0147] Once the height of the fluid target material 120 is known or estimated in both the first reservoir 112 and the second reservoir 113, the control system 1092 can estimate or calculate the height difference Δh. The height difference Δh is the height of the fluid target material 120 in the second reservoir 113 minus the height of the fluid target material 120 in the first reservoir 112. The control system 1092 can calculate the head pressure ΔPh based on the estimated height difference Δh using the following equation:

[0148]

[0149] Where ρ120 equals the density of fluid target material 120, and g is the gravitational constant.

[0150] The control system 1092 can instruct the environmental control device 236 to control the second pressure P of the second reservoir 113 based on the calculated head pressure ΔPh. 113 For example, environmental control device 236 can pressurize the second reservoir 113, causing its pressure P to be... 113 Equal to the first pressure P of the first reservoir 112 112 The difference between the head pressure ΔPh and the water head pressure. All of this can occur during the operation of the nozzle supply system 140, and the control system 1092 can repeat this calculation and instruct the environmental control device 236 to adjust or reset the second pressure P of the second reservoir 113. 113 In this way, while the fluid target material 120 is continuously supplied to the nozzle supply system 140, the liquid level (or height) of the fluid target material 120 in the first reservoir 112 and the second reservoir 113 can be maintained.

[0151] In addition, the control system 1092 can calculate the total amount of fluid target material 120 available in the device 1100 before replenishment is required by analyzing the following: the amount of fluid target material 120 in each of the first reservoir 112 and the second reservoir 113; the amount of time that the first reservoir 112 has supplied fluid target material 120 to the nozzle supply system 140; and the amount of fluid target material 120 transferred from the injection tank 114.

[0152] like Figure 11As shown, in another implementation 1100 of the device, the environmental control device 236 is an environmental control device 1136 including a pressurized reservoir 1193. The environmental control device 1136 is flowably connected to a first reservoir 112 and a second reservoir 113 via a flow communication connection 1194. The pressurized reservoir 1193 contains an inert gas, which can be transferred from the pressurized reservoir 1193 to the first reservoir 112 and / or the second reservoir via an open orifice 1195 through the flow communication connection 1194. The orifice 1195 may have a defined size such that when the orifice 1195 is open, it allows gas in the pressurized reservoir 1193 to be slowly transferred from the pressurized reservoir 1193 to the first reservoir 112 and / or the second reservoir 113.

[0153] In this implementation, and refer to Figure 11 The liquid level (or height) of the fluid target material 120 can be indirectly measured by releasing a certain volume of gas from the pressurized reservoir 1193 through the open orifice 1195 into the first reservoir 112 and the second reservoir 113. The pressure drop of the pressurized reservoir 1193 can be measured, and the volume of gas that has been transferred from the pressurized reservoir 1193 to the first reservoir 112 and the second reservoir 113 can be estimated. The volume of gas that has been transferred from the pressurized reservoir 1193 can be used to estimate the volume of the fluid target material 120 retained in the first reservoir 112 and the second reservoir 113. For example, the volume of gas that has been transferred from the pressurized reservoir 1193 can be estimated based on the total pressure drop in the first reservoir 112 and / or the second reservoir 113 and the measured final pressure (at the first reservoir 112 and / or the second reservoir 113). The volume of the fluid target material 120 retained in the first reservoir 112 and the second reservoir 113 can then be calculated as the difference between the volume of gas that has been transferred from the pressurized reservoir 1193 and the total volume of the combined first reservoir 112 and the second reservoir 113.

[0154] In the described implementation, the gas pressure P applied to the second reservoir 113 113 It can be lower than the gas pressure P applied to the first reservoir 112 112 This causes the second pressure P 113 Less than the first pressure P 112 .

[0155] In addition, the head pressure (PH) of the fluid target material 120 in the first reservoir 112 112 The pressure applied from the column of fluid target material 120 to the base of the first reservoir 112, and the head pressure (PH) of the fluid target material 120 within the second reservoir 113. 113This is the pressure applied from the column of fluid target material 120 to the base of the second reservoir 113. Before opening orifice 1195, the total pressure in the first reservoir 112 (by P) 112 +PH 112 (Given) equal to the total pressure in the second reservoir 113 (given by P) 113 +PH 113 (Given). However, because of the gas pressure P in the first reservoir 112 112 The gas pressure P is higher than that in the second reservoir 113 113 Inert gas leaks into the second reservoir 113, and once the environmental control device 1136 opens the orifice 1195, the column of fluid target material 120 in the second reservoir 113 flows into the first reservoir 112.

[0156] The gas pressure difference between the first liquid reservoir 112 and the second liquid reservoir 113 (i.e., P) 112 -P 113 The system allows the fluid target material 120 to flow from the second reservoir 113 to the first reservoir 112 at a specific rate. The flow rate of the fluid target material 120 from the second reservoir 113 to the first reservoir 112 is controlled by the flow rate of the inert gas transferred from the pressurized reservoir 1193 to the first reservoir 112 (because this controls the pressure of the gas within the first reservoir 112). When the inert gas is transferred to the second reservoir 113, it remains at a higher pressure than the gas pressure within the second reservoir 113, and this pressure difference is discharged by the gas control system connected to the second reservoir 113, so that the gas pressure in the second reservoir 113 is maintained and the fluid target material 120 can continue to be delivered to the nozzle supply system 140, while the fluid target material 120 can also be supplied to the first reservoir 112. In this way, the flow rate of the fluid target material 120 from the second reservoir 113 to the first reservoir 112 can be controlled to ensure that the formation of the target flow 121 from the nozzle supply system 140 is not adversely affected by the upstream instability of the flow of the fluid target material 120.

[0157] refer to Figure 12 The injection system 104 is designed as injection system 1204. Injection system 1204 effectively functions as a phase change vacuum channel and a single flow-blocking device 1261. This channel comprises only two volumes: one defined by injection chamber 1230 (which receives solid material 122), and one defined by injection tank 1214. The single flow-blocking device 1261 may, in some implementations, be a refrigeration valve. Flow-blocking device 1261 acts as a fluid transfer system 461 between injection chamber 1230 and injection tank 1214.

[0158] The injection system 1204 may also include an environmental control device 1205. In some implementations, the environmental control device 1205 includes a pressure system 1205p, configured to regulate the relative pressure or pressure difference between the two volumes, such that the fluid target material 120 is propelled from the injection chamber 1230 into the injection tank 1214. In other implementations, the injection chamber 1230 is positioned above the injection tank 1214 and gravity causes any fluid target material 120 to fall from the injection chamber 1230 into the injection tank 1214. The environmental control device 1205 also includes a temperature system 1205t, configured to regulate the temperature of the refrigeration valve 1261 and the injection chamber 1230 and the injection tank 1214.

[0159] The injection system 1204 has no other internal valves between the injection chamber 1230 and the injection tank 1214. However, the injection system 1204 uses a phase change (between liquid and solid) to transfer material into a vacuum environment. In this case, the fluid target material 120 is transferred into the vacuum environment of the injection tank 1214. Despite its simple design, the injection system 1204 is configured to avoid exposing the fluid target material 120 to ambient air, which could introduce unwanted contaminants into the fluid target material 120.

[0160] refer to Figures 13A-13D The execution process. Initially, as... Figure 13A As shown, the door or cover 1230L on the injection chamber 1230 is opened and the solid material 122 is inserted into the volume of the injection chamber 1230. At this time, the pressure system 1205p of the environmental control device 1205 maintains the pressure of the injection tank 1214 at the vacuum level P. V (Below atmospheric pressure), while the pressure in chamber 1230 is directed to air / atmosphere P. A Furthermore, the temperature system 1205t of the injection chamber 1230 and the refrigeration valve 1261 is at a temperature lower than the melting point of the solid substance 122.

[0161] like Figure 13B As shown, once the solid material 122 is within the volume of the injection chamber 1230, the cover 1230L is closed. Then, the pressure system 1205p pumps the volume of the injection chamber 1230 to a level P below atmospheric pressure. V The pressure P in the injection chamber is 1230. V 'It can be at a pressure P greater than that of the injection tank 1214 V The level, or the pressure P of the injection chamber 1230. V 'Can be used with the pressure P of injection tank 1214' V Same (if gravity is used to affect flow).

[0162] like Figure 13CAs shown, the temperature system 1205t heats the solid material 122 in the injection chamber 1230 to a temperature sufficient to melt the solid material 122 and form the fluid target material 120.

[0163] Then, as Figure 13D As shown, the temperature system 1205t heats the refrigeration valve 1261 to a temperature sufficient to melt the solid material within the refrigeration valve 1261 into the fluid target material 120. If necessary, the temperature system 1205t can additionally heat the injection tank 1214 to ensure it is at a sufficiently high temperature to maintain the fluid target material 120 in a fluid state. This is because the pressure P within the injection chamber 1230... V 'The pressure P in injection tank 1214 is greater than the pressure P V (With a sufficiently large amount to overcome any competing forces such as gravity and surface tension), the fluid target material 120 flows out of the injection chamber 1230 and into the injection tank 1214. Alternatively, if the injection chamber 1230 is located above the injection tank 1214 and the pressure in the injection chamber 1230 is equal to the pressure in the injection tank 1214, this flow can occur by gravity.

[0164] Once all the target fluid material 120 has flowed into the injection tank 1214, the temperature system 1205t cools the refrigeration valve 1261 to a temperature below the melting point of the target fluid material 120, and any remaining target fluid material 120 in the refrigeration valve 1261 solidifies and forms a fluid (and pressure) barrier, allowing the process to proceed as planned. Figure 13A As shown, restart.

[0165] For example, and refer again Figure 1 In some implementations, the injection tank 114 of the injection system 104 can be configured to operate under high pressure in various states. For example, after the injection system 104 has generated sufficient fluid target material 120, the injection tank 114 can begin to operate under a high pressure corresponding to the high pressure applied to the second reservoir 113, and while operating under this high pressure, a fluid flow path can be established between the second reservoir 113 and the injection tank 114.

[0166] Other aspects of the invention are set forth in the following numbered clauses.

[0167] 1. An apparatus for supplying a target material, the apparatus comprising:

[0168] A first reservoir system includes a first reservoir configured to be in flow communication with the nozzle supply system during operation of the nozzle supply system, the first reservoir being held at a first pressure.

[0169] The second storage system includes a second reservoir, which is configured to be in flow communication with the first storage system for at least a portion of the time during operation of the nozzle supply system.

[0170] An injection system configured to receive a solid substance comprising a target material and to generate a fluid target material from the solid substance, the injection system being maintained at an injection pressure less than the first pressure; and

[0171] A fluid control system is fluidly connected to the injection system, the first reservoir system, the second reservoir system, and the nozzle supply system, wherein the fluid control system is configured to:

[0172] During operation of the nozzle supply system, at least one reservoir and the nozzle supply system are isolated from the injection system, and

[0173] A fluid flow path is maintained between at least one reservoir and the nozzle supply system during operation of the nozzle supply system.

[0174] 2. The device according to Clause 1, wherein the injection pressure is less than about 600 kPa.

[0175] 3. The device according to Clause 1, wherein the first pressure is at least 6000 kPa, at least 10,000 kPa, at least 25,000 kPa, or in the range of about 6000 kPa to 60,000 kPa.

[0176] 4. The device according to Clause 1, wherein while the second reservoir is being refilled with fluid target material from the injection system, the injection system and the second reservoir are maintained at the injection pressure, and the injection system and the second reservoir are positioned relative to each other such that the second reservoir is prevented from being overfilled with the fluid target material.

[0177] 5. The device according to Clause 1, wherein the fluid control system is configured to maintain the fluid flow path between the second reservoir and the nozzle supply system during operation of the nozzle supply system while the second reservoir is refilled with fluid target material from the injection system.

[0178] 6. The device according to Clause 1, wherein the fluid control system is configured to remove target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system and the nozzle supply system.

[0179] 7. The device according to Clause 1, wherein the fluid control system is configured to maintain the fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system by: maintaining the fluid flow path between the first reservoir and the nozzle supply system and between the second reservoir and the nozzle supply system during operation of the nozzle supply system, and simultaneously maintaining the nozzle supply system and the second reservoir at the first pressure.

[0180] 8. The device according to Clause 7, wherein the fluid control system is further configured to maintain a fluid flow path between the at least one reservoir and the nozzle supply system during operation of the nozzle supply system and to realize the fluid flow path between the first reservoir and the second reservoir.

[0181] 9. The apparatus according to Clause 1 further includes environmental control equipment, said environmental control equipment being configured to:

[0182] The first pressure in the first reservoir and the second pressure in the second reservoir are controlled independently and separately.

[0183] The temperatures of the first and second reservoirs are controlled independently and separately.

[0184] 10. The device according to Clause 9, wherein the environmental control device is further configured to adjust or reset the second pressure of the second reservoir based on the measured amount of fluid target material within the second reservoir.

[0185] 11. The apparatus according to Clause 9, wherein the environmental control apparatus includes a pressurized reservoir configured to contain an inert gas and to transfer the inert gas from the pressurized reservoir through an orifice to one or more of the first reservoir and the second reservoir.

[0186] 12. The device according to Clause 1, wherein the fluid control system includes a reservoir fluid control valve between the first reservoir and the second reservoir and a refill fluid control valve between the second reservoir and the injection system, wherein the fluid control system is configured to independently control the reservoir fluid control valve and the refill fluid control valve.

[0187] 13. The device according to Clause 12, wherein the reservoir fluid control valve includes a refrigeration valve, and the refill fluid control valve includes a refrigeration valve.

[0188] 14. The device according to Clause 1, wherein the fluid control system is further configured to maintain the fluid flow path between the first reservoir and the second reservoir during operation of the nozzle supply system.

[0189] 15. The device according to Clause 1, wherein the second reservoir is further configured to be in flow communication with the nozzle supply system for at least a portion of the time during operation of the nozzle supply system.

[0190] 16. The device according to Clause 1, wherein the injection system comprises:

[0191] A first chamber includes a door configured to open so that solid material can be received within a first volume defined by the first chamber.

[0192] A second chamber, defining a second volume and in flow communication with the fluid control system; and

[0193] A flow-blocking device is formed in the originally unobstructed fluid path between the first chamber and the second chamber.

[0194] 17. The device according to Clause 16, wherein the flow obstruction device is a refrigeration valve, wherein when the solid material is held at a temperature below the melting point of the solid material, the fluid flow path is blocked in the refrigeration valve by the solid material.

[0195] 18. The device according to Clause 1 further includes a sensing system configured to estimate the volume of the fluid target material in one or more of the first reservoir, the second reservoir, and the injection system, and / or the presence of solid matter within the injection system.

[0196] 19. The device according to Clause 18 further includes a control system in communication with the sensing system, the control system being configured to determine the consumption rate of the fluid target material in the second reservoir based on the output from the high-pressure transducer, the consumption rate being the amount of the fluid target material used per time period.

[0197] 20. A method for continuously supplying a target material in an uninterrupted manner, the method comprising:

[0198] A solid substance comprising the target material is received in an injection system maintained at an injection pressure, and a fluid target material is generated from the solid substance.

[0199] While maintaining the first reservoir at a first pressure greater than the injection pressure, flow communication between the first reservoir and the nozzle supply system is maintained during operation of the nozzle supply system; and

[0200] While the fluid target material is being generated in the injection system under the injection pressure, at least a portion of the time during the operation of the nozzle supply system is achieved, the fluid target material is transferred between the first reservoir and the second reservoir under the first pressure.

[0201] 21. The method according to Clause 20 further includes maintaining the first pressure in the first reservoir while the fluid target material is made capable of being transferred between the injection system and the second reservoir.

[0202] 22. The method according to Clause 20 further comprises achieving the transfer of the fluid target material to the nozzle supply system throughout its operation by causing the fluid target material to flow as follows:

[0203] From the first reservoir to the nozzle supply system;

[0204] From the second reservoir to the nozzle supply system; or

[0205] The liquid is supplied from both the first reservoir and the second reservoir to the nozzle supply system simultaneously.

[0206] 23. The method according to Clause 20 further comprises: preventing fluid target material from being transferred to the second reservoir and / or the first reservoir for at least some time during the operation of the nozzle supply system.

[0207] 24. The method according to Clause 20 further comprises: reloading a solid substance comprising the target material into the injection system only when the injection system is at the injection pressure, wherein the reloading of the solid substance comprising the target material into the injection system occurs simultaneously with the nozzle supply system being at the first pressure.

[0208] 25. The method according to Clause 20 further includes refilling the second reservoir with fluid target material from the injection system while maintaining the first pressure of the first reservoir, and fluidly separating the second reservoir from the injection system after sufficient fluid target material has been transferred from the injection system into the second reservoir.

[0209] 26. The method according to Clause 25 further comprises maintaining the injection system and the second reservoir at the injection pressure while refilling the second reservoir with fluid target material from the injection system, and preventing the second reservoir from being overfilled with fluid target material.

[0210] 27. The method according to Clause 20 further includes removing the target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system, and the nozzle supply system before stopping operation of the nozzle supply system and stopping flow communication between the first reservoir and the nozzle supply system.

[0211] 28. The method according to Clause 20 further comprises: melting the solid substance of the target material in the injection system into the target fluid material.

[0212] 29. The method according to Clause 20, wherein operation of the nozzle supply system includes delivering droplets of the fluid target material to an extreme ultraviolet (EUV) light source, wherein the droplets are configured to be irradiated by radiation to generate a plasma emitting EUV light.

[0213] 30. A method comprising:

[0214] A solid substance comprising the target material is received in an injection system maintained at an injection pressure, and a fluid target material is generated from the solid substance.

[0215] While maintaining the first reservoir at a first pressure greater than the injection pressure, flow communication is maintained between the first reservoir and the nozzle supply system during operation of the nozzle supply system; and

[0216] While isolating the first reservoir and the nozzle supply system from the injection system, the transfer of the fluid target material between the injection system and the second reservoir is achieved.

[0217] 31. The method according to Clause 30, wherein operation of the nozzle supply system includes delivering droplets of the fluid target material to an extreme ultraviolet (EUV) light source, wherein the droplets are configured to be irradiated by radiation to generate a plasma emitting EUV light.

[0218] 32. The method according to Clause 30 further includes maintaining the first pressure in the first reservoir while the fluid target material is able to transfer between the injection system and the second reservoir.

[0219] 33. The method according to Clause 30 further includes transferring the fluid target material between the second reservoir and the first reservoir while isolating the first reservoir, the second reservoir and the nozzle supply system from the injection system.

[0220] 34. The method according to clause 30 further comprises achieving the transfer of the fluid target material to the nozzle supply system throughout its operation by causing the fluid target material to flow as follows:

[0221] From the first reservoir to the nozzle supply system;

[0222] From the second reservoir to the nozzle supply system; or

[0223] The liquid is supplied from both the first reservoir and the second reservoir to the nozzle supply system simultaneously.

[0224] 35. The method according to Clause 30 further comprises: preventing fluid target material from being transferred to the second reservoir and / or the first reservoir for at least some time during the operation of the nozzle supply system.

[0225] 36. The method according to Clause 30 further includes reloading a solid substance comprising the target material into the injection system only when the injection system is at the injection pressure, wherein the reloading of the solid substance comprising the target material into the injection system occurs simultaneously with the nozzle supply system being at the first pressure.

[0226] 37. The method according to Clause 30 further comprises: while maintaining the first pressure in the first reservoir, refilling the second reservoir with fluid target material from the injection system.

[0227] 38. The method according to Clause 37 further comprises maintaining the injection system and the second reservoir at the injection pressure while refilling the second reservoir with fluid target material from the injection system, and preventing the second reservoir from being overfilled with fluid target material.

[0228] 39. The method according to Clause 30 further comprises, after sufficient fluid target material has been transferred from the injection system to the second reservoir, fluidly separating the second reservoir from the injection system.

[0229] 40. The method according to Clause 30 further includes melting the solid substance of the target material in the injection system into the target fluid material.

Claims

1. An apparatus for supplying a target material, the apparatus comprising: A first storage system includes a first reservoir configured to be in flow communication with the nozzle supply system during operation of the nozzle supply system, the first reservoir being held at a first pressure, wherein the nozzle supply system is configured to supply a fluid target material during the operation. The second storage system includes a second reservoir, which is configured to be in flow communication with the first storage system for at least a portion of the time during operation of the nozzle supply system. An injection system is configured to receive a solid substance comprising a target material and to generate the fluid target material from the solid substance, the injection system being maintained at an injection pressure less than the first pressure; as well as A fluid control system is fluidly connected to the injection system, the first reservoir system, the second reservoir system, and the nozzle supply system, wherein the fluid control system is configured to: During operation of the nozzle supply system, at least one reservoir and the nozzle supply system are isolated from the injection system, and A fluid flow path is maintained between at least one reservoir and the nozzle supply system during operation of the nozzle supply system.

2. The device according to claim 1, wherein the injection pressure is less than 600 kPa.

3. The device according to claim 1, wherein the first pressure is at least 6000 kPa.

4. The device of claim 1, wherein while the second reservoir is being refilled with fluid target material from the injection system, the injection system and the second reservoir are maintained at the injection pressure, and the injection system and the second reservoir are positioned relative to each other such that the second reservoir is prevented from being overfilled with the fluid target material.

5. The device of claim 1, wherein the fluid control system is configured to maintain a fluid flow path between the first reservoir and the nozzle supply system during operation of the nozzle supply system while the second reservoir is refilled with fluid target material from the injection system.

6. The apparatus of claim 1, wherein the fluid control system is configured to remove target fluid material from each interface defined between the first reservoir, the second reservoir, the injection system and the nozzle supply system.

7. The device of claim 1, wherein the fluid control system is configured to maintain a fluid flow path between at least one reservoir and the nozzle supply system during operation of the nozzle supply system by: maintaining a fluid flow path between the first reservoir and the nozzle supply system and between the second reservoir and the nozzle supply system during operation of the nozzle supply system, and simultaneously maintaining the nozzle supply system and the second reservoir at the first pressure.

8. The apparatus of claim 7, wherein the fluid control system is further configured to maintain a fluid flow path between the at least one reservoir and the nozzle supply system during operation of the nozzle supply system and to realize the fluid flow path between the first reservoir and the second reservoir.

9. The apparatus of claim 1, further comprising an environmental control device, wherein the environmental control device is configured to: The first pressure in the first reservoir and the second pressure in the second reservoir are controlled independently and separately. The temperatures of the first and second reservoirs are controlled independently and separately.

10. The device of claim 9, wherein the environmental control device is further configured to adjust or reset the second pressure of the second reservoir based on the measured amount of fluid target material within the second reservoir.

11. The apparatus of claim 9, wherein the environmental control apparatus includes a pressurized reservoir configured to contain an inert gas and to transfer the inert gas from the pressurized reservoir through an orifice to one or more of the first reservoir and the second reservoir.

12. The device of claim 1, wherein the fluid control system includes a reservoir fluid control valve between the first reservoir and the second reservoir and a refill fluid control valve between the second reservoir and the injection system, wherein the fluid control system is configured to independently control the reservoir fluid control valve and the refill fluid control valve.

13. The device of claim 12, wherein the reservoir fluid control valve comprises a refrigeration valve, and the refill fluid control valve comprises a refrigeration valve.

14. The device of claim 1, wherein the fluid control system is further configured to maintain a fluid flow path between the first reservoir and the second reservoir during operation of the nozzle supply system.

15. The device of claim 1, wherein the second reservoir is further configured to be in flow communication with the nozzle supply system for at least a portion of the time during operation of the nozzle supply system.

16. The apparatus of claim 1, wherein the injection system comprises: A first chamber includes a door configured to open so that solid material can be received within a first volume defined by the first chamber. The second chamber defines a second volume and is in flow communication with the fluid control system. as well as A flow-blocking device is formed in the originally unobstructed fluid path between the first chamber and the second chamber.

17. The device of claim 16, wherein the flow obstruction device is a refrigeration valve, wherein when the solid material is held at a temperature below the melting point of the solid material, the fluid flow path is blocked in the refrigeration valve by the solid material.

18. The device of claim 1, further comprising a sensing system configured to estimate the volume of a fluid target material in one or more of the first reservoir, the second reservoir, and the injection system, and / or the presence of solid matter within the injection system.

19. The device of claim 18, further comprising a control system in communication with the sensing system, the control system being configured to determine, based on an output from a high-pressure transducer, the consumption rate of the fluid target material in the second reservoir being the amount of fluid target material used per time interval.

20. The device of claim 1, wherein the first pressure is at least 10,000 kPa.

21. The device of claim 1, wherein the first pressure is at least 25,000 kPa.

22. The device of claim 1, wherein the first pressure is in the range of 6000 kPa to 60,000 kPa.

23. A method for continuously supplying a target material in an uninterrupted manner, the method comprising: A solid substance comprising the target material is received in an injection system maintained at an injection pressure, and a fluid target material is generated from the solid substance. While maintaining the first reservoir at a first pressure greater than the injection pressure, flow communication between the first reservoir and the nozzle supply system is maintained during operation of the nozzle supply system, wherein the nozzle supply system is configured to supply fluid target material during the operation. as well as While the fluid target material is being generated in the injection system under the injection pressure, at least a portion of the time during the operation of the nozzle supply system is achieved, the fluid target material is transferred between the first reservoir and the second reservoir under the first pressure.

24. The method of claim 23, further comprising maintaining the first pressure in the first reservoir while the fluid target material is made transferable between the injection system and the second reservoir.

25. The method of claim 23, further comprising transferring the fluid target material to the nozzle supply system throughout operation of the nozzle supply system by causing the fluid target material to flow in the following manner: From the first reservoir to the nozzle supply system; From the second reservoir to the nozzle supply system; or The liquid is supplied from both the first reservoir and the second reservoir to the nozzle supply system simultaneously.

26. The method of claim 23, further comprising: For at least some time during the operation of the nozzle supply system, the fluid target material is prevented from being transferred to the second reservoir and / or the first reservoir.

27. The method of claim 23, further comprising: Solid material comprising the target material is reloaded into the injection system only when the injection system is at the injection pressure, wherein the reloading of solid material comprising the target material into the injection system occurs simultaneously with the nozzle supply system being at the first pressure.

28. The method of claim 23, further comprising: While maintaining the first pressure in the first reservoir, the second reservoir is refilled with fluid target material from the injection system, and the second reservoir is fluidly separated from the injection system after sufficient fluid target material has been transferred from the injection system into the second reservoir.

29. The method of claim 28, further comprising: While refilling the second reservoir with the fluid target material from the injection system, the injection system and the second reservoir are maintained at the injection pressure, and the second reservoir is prevented from being overfilled with the fluid target material.

30. The method of claim 23, further comprising: Before stopping the operation of the nozzle supply system and ceasing the flow communication between the first reservoir and the nozzle supply system, the target fluid material is removed from each interface defined between the first reservoir, the second reservoir, the injection system, and the nozzle supply system.

31. The method of claim 23, further comprising: The solid material of the target material in the injection system is melted into the fluid target material.

32. The method of claim 23, wherein operation of the nozzle supply system comprises: A droplet of the fluid target material is delivered to an extreme ultraviolet (EUV) light source, in which the droplet is configured to be irradiated by radiation to generate a plasma that emits extreme ultraviolet (EUV) light.

33. A method comprising: A solid substance comprising the target material is received in an injection system maintained at an injection pressure, and a fluid target material is generated from the solid substance. While maintaining the first reservoir at a first pressure greater than the injection pressure, flow communication is maintained between the first reservoir and the nozzle supply system during operation of the nozzle supply system, wherein the nozzle supply system is configured to supply fluid target material during the operation. as well as While isolating the first reservoir and the nozzle supply system from the injection system, the transfer of the fluid target material between the injection system and the second reservoir is achieved.

34. The method of claim 33, wherein operation of the nozzle supply system comprises: A droplet of the fluid target material is delivered to an extreme ultraviolet (EUV) light source, in which the droplet is configured to be irradiated by radiation to generate a plasma that emits extreme ultraviolet (EUV) light.

35. The method of claim 33, further comprising: The first pressure in the first reservoir is maintained while the fluid target material can be transferred between the injection system and the second reservoir.

36. The method of claim 33 further comprises, while isolating the first reservoir, the second reservoir and the nozzle supply system from the injection system, transferring the fluid target material between the second reservoir and the first reservoir.

37. The method of claim 33, further comprising transferring the fluid target material to the nozzle supply system throughout operation of the nozzle supply system by causing the fluid target material to flow in the following manner: From the first reservoir to the nozzle supply system; From the second reservoir to the nozzle supply system; or The liquid is supplied from both the first reservoir and the second reservoir to the nozzle supply system simultaneously.

38. The method of claim 33, further comprising: For at least some time during the operation of the nozzle supply system, the fluid target material is prevented from being transferred to the second reservoir and / or the first reservoir.

39. The method of claim 33, further comprising reloading a solid substance comprising the target material into the injection system only when the injection system is at the injection pressure, wherein the reloading of the solid substance comprising the target material into the injection system occurs simultaneously with the nozzle supply system being at the first pressure.

40. The method of claim 33, further comprising: While maintaining the first pressure in the first reservoir, the second reservoir is refilled using fluid target material from the injection system.

41. The method of claim 40, further comprising: While refilling the second reservoir with the fluid target material from the injection system, the injection system and the second reservoir are maintained at the injection pressure, and the second reservoir is prevented from being overfilled with the fluid target material.

42. The method of claim 33, further comprising, after sufficient fluid target material has been transferred from the injection system to the second reservoir, fluidly separating the second reservoir from the injection system.

43. The method of claim 33, further comprising melting the solid substance of the target material in the injection system into the fluid target material.

Images