Substrate processing device and injector installation method

Abstract

The present application provides a substrate processing apparatus and a mounting method of an injector. A technology capable of suppressing inclination of an injector is provided. A substrate processing apparatus according to an aspect of the present disclosure includes a processing container having a substantially cylindrical shape, an injector extending in a vertical direction along an inner side of an inner wall of the processing container, and a holding portion that holds the injector by pushing the injector toward the inner side of the inner wall.

Description

Technical Field

[0001] The present disclosure relates to a substrate processing apparatus and an installation method of an injector. Background Art

[0002] A known substrate processing apparatus includes a processing container that accommodates a boat carrying substrates, and an injector located near the processing container, extending vertically along the inner wall of the processing container and having a plurality of gas holes along its length (see, for example, Patent Document 1). In this substrate processing apparatus, the gas holes face the inner wall of the processing container near the injector.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 2019-186335 Summary of the Invention

[0006] Problems to be solved by the invention

[0007] The present disclosure provides a technology capable of suppressing the tilt of an injector.

[0008] Solutions for solving problems

[0009] A substrate processing apparatus according to a technical solution of the present disclosure includes: a processing container having a substantially cylindrical shape; an injector extending in a vertical direction along an inner wall of the processing container; and a holding portion that pushes the injector toward the inner wall to hold the injector.

[0010] Effects of the Invention

[0011] According to the present disclosure, it is possible to suppress the inclination of the injector. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 This is a schematic diagram showing an example of a substrate processing apparatus according to an embodiment.

[0013] Figure 2 It is magnified Figure 1 A three-dimensional view of a portion of the upper portion of a substrate processing apparatus.

[0014] Figure 3 It is magnified Figure 1 A partial cross-sectional view of the upper portion of a substrate processing device (1).

[0015] Figure 4 It is magnified Figure 1A partial cross-sectional view of the upper portion of a substrate processing device (2).

[0016] Figure 5 It is magnified Figure 1 A three-dimensional view of a portion of the lower portion of a substrate processing apparatus.

[0017] Figure 6 It will Figure 5 A magnified view of area A in .

[0018] Figure 7 It is a diagram showing a modified example of the pressing portion.

[0019] Figure 8 Yes Figure 7 FIG. 1 is a diagram showing an example of the operation of the pushing portion. DETAILED DESCRIPTION

[0020] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding components or parts are denoted by the same or corresponding reference numerals, and repeated descriptions will be omitted.

[0021] [Substrate processing equipment]

[0022] Reference Figures 1 to 6 An example of a substrate processing apparatus according to the embodiment will be described. Figure 1 This is a schematic diagram showing an example of a substrate processing apparatus according to an embodiment. Figure 2 It is magnified Figure 1 A three-dimensional view of a portion of the upper portion of a substrate processing apparatus. Figure 3 It is magnified Figure 1 A partial cross-sectional view of the upper portion of the substrate processing apparatus shows a cross section taken above the height at which the injector is installed and cut along a horizontal plane passing through the inner tube. Figure 4 It is magnified Figure 1 A partial cross-sectional view of the upper portion of the substrate processing apparatus shows a cross section taken along a horizontal plane passing through the injector. Figure 5 It is magnified Figure 1 A three-dimensional view of a portion of the lower portion of a substrate processing apparatus. Figure 6 It will Figure 5 A magnified view of area A in .

[0023] The substrate processing apparatus 1 includes a processing container 10 , a gas supply unit 20 , an exhaust unit 30 , a heating unit 40 , a holding unit 100 , and a control unit 90 .

[0024] The processing container 10 accommodates a boat (not shown). The boat holds a plurality of substrates at predetermined intervals in the height direction. The substrates may be, for example, semiconductor wafers. The processing container 10 includes an inner tube 11 and an outer tube 12. The inner tube 11 is also referred to as an inner cylinder, and is formed into a generally cylindrical shape with a top that is open at the lower end. The top of the inner tube 11 is formed, for example, to be flat. The outer tube 12 is also referred to as an outer cylinder, and is formed into a generally cylindrical shape with a top that is open at the lower end and covers the outside of the inner tube 11. That is, the upper portion of the outer tube 12 is closed. The inner tube 11 and the outer tube 12 are coaxially arranged to form a double-tube structure. The inner tube 11 and the outer tube 12 are formed of a heat-resistant material such as quartz.

[0025] An injector receiving portion 13 for receiving an injector is formed on one side of the inner tube 11 along its longitudinal direction (vertical direction). Figure 2 As shown, a convex portion 14 is formed by partially protruding the side wall of the inner tube 11 outward, and an injector housing 13 is formed within the convex portion 14. A rectangular opening (not shown) is formed along the longitudinal direction (vertical direction) of the inner tube 11 on the side wall opposite to the injector housing 13. The opening serves as a gas outlet to allow gas within the inner tube 11 to be discharged. The opening is formed by extending vertically so that the vertical length of the opening is equal to or longer than the vertical length of the boat.

[0026] A gas outlet 15 is formed on the side wall of the outer tube 12. A lid (not shown) is attached to an opening 16 at the lower end of the outer tube 12 via a sealing member such as an O-ring. The lid can open and close the opening 16, sealing it airtightly.

[0027] The gas supply unit 20 includes a plurality of gas supply sources (not shown) and a plurality of (eg, seven) injectors 21 to 27 .

[0028] A plurality of gas supply sources supply various process gases to the plurality of injectors 21 to 27. The various process gases include, for example, a film forming gas for forming a film, an etching gas for etching and removing a film, a cleaning gas for cleaning the interior of the process container 10, and a purge gas for purging the interior of the process container 10.

[0029] The injectors 21 to 27 are located in the injector housing 13 on the inner side of the inner wall of the inner tube 11, and are arranged at intervals from each other in a row along the circumferential direction. Each injector 21 to 27 is formed of a quartz tube with a circular cross-section, and ejects various processing gases supplied from multiple gas supply sources into the inner tube 11. Each injector 21 to 27 is located on the inner side of the inner wall of the inner tube 11, and is arranged along the longitudinal direction (vertical direction) of the inner tube 11. Each injector 21 to 27 is bent in an L shape at the lower part and passes through the side wall of the outer tube 12 and extends to the corresponding gas supply source. Each injector 21 to 27 is folded back in a U shape at the upper part and then extends downward. That is, each injector 21 to 27 is configured as a folded-back injector. Hereinafter, the portion of each ejector 21 to 27 disposed along the longitudinal direction of the inner tube 11 is referred to as the introduction portion 21a to 27a, and the portion extending downward after bending back is referred to as the discharge portion 21b to 27b. Furthermore, the portion connecting the introduction portion 21a to 27a and the discharge portion 21b to 27b is referred to as the curved portion 21c to 27c, and the portion disposed horizontally and penetrating the outer tube 12 is referred to as the horizontal portion 21d to 27d.

[0030] The injectors 21 to 27 include injectors having different lengths in the vertical direction.

[0031] The inlet portions 21a-23a, 27a of the injectors 21-23, 27 have the same vertical length. Furthermore, the discharge portions 21b-23b, 27b of the injectors 21-23, 27 have the same vertical length. The discharge portions 21b-23b, 27b are formed by extending vertically so that their vertical lengths are equal to or longer than the vertical length of the boat. Multiple gas holes are provided at predetermined intervals along the length of the discharge portions 21b-23b, 27b, enabling the supply of various process gases to the entire vertical area of ​​the boat.

[0032] In the injectors 24-26, the vertical lengths of the inlet portions 24a-26a increase in this order, and the discharge portions 24b-26b are disposed at the lower, central, and upper portions of the processing container 10, respectively. Multiple gas holes are formed in the discharge portions 24b-26b at predetermined intervals along their lengths, enabling the supply of various process gases to the lower, central, and upper portions of the processing container 10, respectively. The vertical lengths of the injectors 21-27 are not limited to these.

[0033] Multiple gas holes are directed toward the inner wall of the inner tube 11 near the injector (hereinafter sometimes referred to as "the inner wall near the inner tube 11"). Each ejection portion 21b-27b ejects various process gases horizontally toward the inner wall near the inner tube 11 via the gas holes. The ejected process gases are reflected by the inner wall near the inner tube 11 and then supplied while diffusing horizontally toward the center of the inner tube 11 (the substrate side).

[0034] Here, refer to Figure 4 The orientation angle of the gas hole 22h opened in the ejection portion 22b of the ejector 22 is described. Figure 4 As shown, when viewing the substrate processing apparatus 1 from above, the gas holes 22h are arranged at an angle θ on the side of the introduction portion 22a relative to a radial line L4 passing through the center of the inner tube 11 and the center C of the ejection portion 22b of the injector 22. Consequently, the various process gases ejected horizontally through the gas holes 22h are reflected by the inner wall of the inner tube 11 and then supplied while diffusing horizontally toward the center of the inner tube 11. Furthermore, the various process gases ejected horizontally through the gas holes 22h are reflected by the inner wall of the inner tube 11 and then further reflected toward the injector 22 itself, adjacent injectors 21 and 23, and so on, and then supplied while diffusing horizontally toward the center of the inner tube 11. The angle θ can be, for example, in the range of 0 to 60 degrees. Alternatively, the gas holes 22h can be arranged at an angle relative to the radial line L4 on the side opposite the introduction portion 22a when viewing the substrate processing apparatus 1 from above. In this case, the angle can be, for example, in the range of 0 to 60 degrees. Furthermore, the gas holes opened in the ejection portions 21 b and 23 b to 26 b of the injectors 21 and 23 to 26 may have the same orientation angle as that of the gas hole 22 h .

[0035] The exhaust section 30 includes an exhaust passage 31, a pressure regulating valve 32, and a vacuum pump 33. The exhaust passage 31 is connected to the gas outlet 15. The pressure regulating valve 32 and the vacuum pump 33 are provided in the exhaust passage 31 to exhaust the gas in the inner tube 11 from the opening through the space between the inner tube 11 and the outer tube 12.

[0036] The heating unit 40 heats the substrates housed within the processing container 10. For example, the heating unit 40 is formed in a generally cylindrical shape around the outer circumference of the outer tube 12 so as to cover the outer tube 12. To enable independent temperature control in the vertical direction, the heating unit 40 preferably includes a plurality of vertically divided heaters. However, the heating unit 40 may also consist of a single, undivided heater.

[0037] The holding portion 100 is provided corresponding to each of the injectors 21 to 27, and suppresses the inclination of each of the injectors 21 to 27 by holding each of the injectors 21 to 27. The holding portion 100 will be described in detail later.

[0038] The control unit 90 controls the overall operation of the substrate processing device 1. The control unit 90 has a CPU (Central Processing Unit), a ROM (Read Only Memory) and a RAM (Random Access Memory). The CPU performs the desired heat treatment according to the process stored in the storage area such as the RAM. The process is set with control information for the processing conditions of the device. The control information can be, for example, gas flow, pressure, temperature, and processing time. In addition, the program used by the process and the control unit 90 can also be stored in a hard disk or a semiconductor memory. In addition, the process, etc. can also be installed in a specified location in a state of being stored in a portable storage medium that can be read by a computer, such as a CD-ROM or DVD, and read out. In addition, the control unit 90 can also be set separately from the substrate processing device 1.

[0039] 〔Maintenance Department〕

[0040] Reference Figures 2 to 6 An example of a holding portion provided in the substrate processing apparatus 1 and holding the injectors 21 to 27 will be described.

[0041] The holding portion 100 is provided for each of the plurality of injectors 21 to 27. The holding portion 100 holds the injectors 21 to 27 by pressing the injectors 21 to 27 toward the inner wall of the inner tube 11. The holding portion 100 includes a restricting portion 110, a protruding portion 120, and a pressing portion 130.

[0042] The restriction portion 110 is provided at a first height position to restrict the movement of the injectors 21 to 27 relative to the processing container 10. Figure 2 As shown, the first height position may be the upper portion of the processing container 10. The restricting portion 110 includes a first hook 111 and an engaging portion 112.

[0043] The first hook 111 is located at the first height position and has an L-shaped shape extending from the inner wall near the inner tube 11 toward the center of the inner tube 11 and curving toward the ejectors 21 to 27 (ejection portions 21b to 27b) at the center. The first hook 111 is formed of the same material as the inner tube 11, such as quartz, and is welded to the inner wall near the inner tube 11.

[0044] The engaging portion 112 is located at a first height position and is extended from the ejectors 21 to 27 toward the first hook 111 and is engageable with the first hook 111. Figure 3 and Figure 4As shown, the engaging portion 112 has a tapered surface 112a that slopes toward the inner side of the L-shaped shape of the first hook 111 as it approaches the first hook 111. Consequently, when the injectors 21-27 are pressed toward the first hook 111, the engaging portion 112 engages with the first hook 111, pressing the injectors 21-27 toward the inner wall near the inner tube 11. The protrusion 120, described later, contacts the inner wall near the inner tube 11. This allows the inner tube 11 and the injectors 21-27 to contact at two locations: a contact point P1 between the first hook 111 and the engaging portion 112, and a contact point P2 between the inner wall near the inner tube 11 and the protrusion 120. This restricts the movement of the injectors 21-27. As a result, the ejectors 21 to 27 can be prevented from tilting due to reaction force generated by gas ejection from the gas holes opened in the ejection portions 21 b to 27 b of the ejectors 21 to 27 or rotation of the ejectors 21 to 27 due to their own weight.

[0045] The protrusion 120 is located at a position higher than the first height position, for example, at the inner wall side of the curved portions 21c-27c of the injectors 21-27 near the inner tube 11. However, the protrusion 120 may also be located at the first height position or at a position lower than the first height position. In this case, the protrusion 120 may be located at either the inlet portion 21a-27a or the outlet portion 21b-27b, or at both the inlet portion 21a-27a and the outlet portion 21b-27b. The protrusion 120 has a hemispherical shape protruding from the surface of the injectors 21-27 and contacts the inner wall near the inner tube 11. When the engaging portion 112 engages with the first hook 111 and the injectors 21-27 are pressed toward the inner wall near the inner tube 11, the protrusion 120 contacts the inner wall near the inner tube 11. For example, the L-shaped curved portion at the lower end of the injectors 21-27 (the connection between the introduction portions 21a-27a and the horizontal portions 21d-27d) is bent at an angle slightly less than 90 degrees (an acute angle). Furthermore, the injectors 21-27 are attached to the inner tube 11 by securing the horizontal portions 21d-27d with nuts or the like while pressing the protrusions 120 against the inner wall near the inner tube 11. This secures the injectors 21-27 at two points, preventing them from tilting. Furthermore, the presence of the protrusions 120 creates point contact between the injectors 21-27 and the inner tube 11, preventing adhesion between the injectors 21-27 and the inner tube 11 due to film formation. In the absence of the protrusions 120, the injectors 21-27 would be in line contact or surface contact with the inner tube 11, potentially causing adhesion due to film formation.

[0046] The pressing portion 130 is provided at a second height position below the first height position, and presses the injectors 21 to 27 in the direction in which their movement relative to the processing container 10 is restricted by the restricting portion 110. The pressing portion 130 includes a second hook 131 and a stopper 132.

[0047] The second hook 131 is located at the second height position and has an L-shaped shape extending from the inner wall near the inner tube 11 toward the center of the inner tube 11. It bends toward the ejectors 21 to 27 (introduction portions 21a to 27a) at the center. The second hook 131 is formed from the same material as the inner tube 11, such as quartz, and is welded to the inner wall near the inner tube 11. The second hook 131 is located on the opposite side of the inner tube 11 from the first hook 111 in the circumferential direction of the inner tube 11, across the ejectors 21 to 27. The second hook 131 bends in the opposite direction to the first hook 111.

[0048] The stopper 132 is inserted between the injectors 21 to 27 (introduction portions 21a to 27a) and the second hook 131, and presses the injectors 21 to 27 in a direction away from the second hook 131. Figure 6 As shown, the stopper 132 includes a wide portion 132a, a narrow portion 132b, and a tapered portion 132c.

[0049] The wide portion 132 a has a constant width W61 that is longer than the length L6 between the injectors 21 to 27 and the inner side of the L-shaped second hook 131 when the injectors 21 to 27 are mounted in the processing container 10 .

[0050] The narrow portion 132 b has a constant width W62 that is shorter than the length L6 between the injectors 21 to 27 and the inner side of the L-shape of the second hook 131 when the injectors 21 to 27 are mounted in the processing container 10 .

[0051] The tapered portion 132c is formed between the wide portion 132a and the narrow portion 132b. The tapered portion 132c is formed so that its width continuously decreases from the width W61 of the wide portion 132a to the width W62 of the narrow portion 132b. In other words, the tapered portion 132c is formed so that it becomes thinner from the top toward the bottom tip.

[0052] When the stopper 132 is inserted downward between the ejectors 21 to 27 and the second hook 131 from a position above the second height position, a force is applied to the ejectors 21 to 27 in a direction away from the second hook 131. As a result, the engaging portion 112 engages with the first hook 111 at the first height position. Figure 5 and Figure 6, a state is shown in which the stopper 132 is inserted between the ejectors 21 to 23 , 26 , and 27 and the second hook 131 , and the stopper 132 is not inserted between the ejectors 24 and 25 and the second hook 131 .

[0053] As described above, the substrate processing apparatus 1 according to the embodiment includes the holding portion 100 including the limiting portion 110 and the pressing portion 130. The limiting portion 110 is located at a first height position to limit the movement of the injectors 21 to 27 relative to the processing container 10. The pressing portion 130 is located at a second height position, which is lower than the first height position, and presses the injectors 21 to 27 in the direction in which their movement relative to the processing container 10 is limited by the limiting portion 110. Thus, the pressing portion 130 presses the injectors 21 to 27 in the direction in which their movement relative to the processing container 10 is limited by the limiting portion 110, thereby limiting the movement of the injectors 21 to 27 relative to the processing container 10 by the limiting portion 110. As a result, the ejectors 21 to 27 can be prevented from tilting due to reaction force generated by gas ejection from the gas holes opened in the ejection portions 21 b to 27 b of the ejectors 21 to 27 or rotation of the ejectors 21 to 27 due to their own weight.

[0054] Reference Figure 7 and Figure 8 , describing a modification example of the pushing portion. Figure 7 It is a diagram showing a modified example of the pressing portion. Figure 8 Yes Figure 7 FIG. 1 is a diagram showing an example of the operation of the pushing portion.

[0055] The pressing portion 230 is provided at a second height position below the first height position, and presses the injectors 21 to 27 in the direction in which their movement relative to the processing container 10 is restricted by the restricting portion 110. The pressing portion 230 includes a second hook 231 and a stopper 232.

[0056] The second hook 231 is located at the second height position and has an L-shaped shape extending from the inner wall near the inner tube 11 toward the center of the inner tube 11. It bends toward the ejectors 21 to 27 (introduction portions 21a to 27a) at the center. The second hook 231 is formed from the same material as the inner tube 11, such as quartz, and is welded to the inner wall near the inner tube 11. The second hook 231 is located on the opposite side of the inner tube 11 from the first hook 111 in the circumferential direction of the inner tube 11, sandwiching the ejectors 21 to 27. The second hook 231 bends in the opposite direction to the first hook 111.

[0057] The stopper 232 is inserted between the injectors 21 to 27 (introduction portions 21a to 27a) and the second hook 231 to push the injectors 21 to 27 away from the second hook 231. The stopper 232 includes a tapered portion 232a, a narrow portion 232b, a notch portion 232c, and a drop prevention portion 232d. Figure 8 As shown in FIG. 2( a ), when the stopper 232 is inserted between the ejectors 21 to 27 and the second hook 231 , the center of gravity G is located below the lower end of the second hook 231 , for example, at the narrow portion 232 b .

[0058] The tapered portion 232a is formed so that its width continuously decreases from a first width W81 to a second width W82. In other words, the tapered portion 232a is formed so that it tapers from the top toward the bottom tip. The first width W81 is longer than the first length L81, which is the length between the injectors 21-27 and the inner side of the L-shaped second hook 231 when the injectors 21-27 are installed in the processing container 10. The second width W82 is shorter than the first length L81.

[0059] The narrow portion 232b is formed below the tapered portion 232a and is continuous with the tapered portion 232a. The narrow portion 232b is formed with a constant width W82.

[0060] The notch 232c is formed below the narrow portion 232b and is continuous with the narrow portion 232b. The notch 232c is formed with a certain width W83. The width W83 of the notch 232c is shorter than the second length L82, which is the length between the injectors 21 to 27 and the top of the L-shaped second hook 231 when the injectors 21 to 27 are installed in the processing container 10. The height H83 of the notch 232c is higher than the height H81 of the second hook 231. Therefore, as Figure 8 As shown in FIG. 2( b ), by raising the notch portion 232 c to a height position overlapping with the second hook 231 , the stopper 232 can be moved toward the front side (toward the center of the inner tube 11 ), thereby enabling attachment and detachment of the stopper 232 .

[0061] The anti-drop portion 232d is formed below the notch portion 232c and is continuous with the notch portion 232c. The anti-drop portion 232d is formed with a certain width W84. The width W84 of the anti-drop portion 232d is shorter than the first length L81 and longer than the second length L82. Figure 8 As shown in (c), when the stopper 232 is raised to the upper limit position, the second hook 231 overlaps the anti-drop portion 232d when viewed from the center of the inner tube 11, thereby restricting the stopper 232 from moving toward the center of the inner tube 11. Therefore, even if the stopper 232 is raised to the upper limit position due to gas flow or the like during processing in the substrate processing apparatus 1, the stopper 232 is prevented from detaching and falling toward the center of the inner tube 11.

[0062] When the stopper 232 is inserted downward between the ejectors 21 to 27 and the second hook 231 from a position above the second height position, a force is applied to the ejectors 21 to 27 in a direction away from the second hook 231. As a result, the engaging portion 112 engages with the first hook 111 at the first height position.

[0063] The embodiments disclosed herein are to be considered in all respects as illustrative and non-restrictive. The embodiments described above may be omitted, replaced, or modified in various forms without departing from the scope of the appended claims and the gist thereof.

[0064] In the above embodiment, the injectors 21 to 27 are folded-back injectors, but the present disclosure is not limited thereto. For example, some or all of the multiple injectors 21 to 27 may be non-folded-back injectors that do not fold back at the top.

[0065] In the above embodiment, a substrate processing apparatus 1 having seven injectors 21 to 27 is described as an example, but the present disclosure is not limited thereto. For example, a substrate processing apparatus having only one injector may also be used. Furthermore, a substrate processing apparatus having two to six, or eight or more, injectors may also be used.

Claims

1. A substrate processing device, wherein: The substrate processing device comprises: a processing vessel having a generally cylindrical shape; an ejector extending in a vertical direction along an inner side of an inner wall of the processing container; and a holding portion that pushes the injector toward the inner side of the inner wall to hold it, The holding portion includes: a limiting portion provided at a first height position to limit movement of the injector relative to the processing container; and a pressing portion provided at a second height position lower than the first height position, and pressing the injector in a direction in which movement of the injector relative to the processing container is restricted by the restricting portion; The pressing portion is provided on a side opposite to the restricting portion across the ejector in the circumferential direction of the inner wall.

2. The substrate processing apparatus according to claim 1, wherein: The limiting portion includes: a first hook extending from the inner wall of the processing container toward the center of the processing container and having an L-shape bent toward the injector at the center side; and An engaging portion is extended from the ejector toward the first hook and is engageable with the first hook.

3. The substrate processing apparatus according to claim 2, wherein: The engaging portion has a tapered surface that engages with the first hook.

4. The substrate processing apparatus according to any one of claims 1 to 3, wherein: The pushing portion includes: a second hook extending from the inner wall of the processing container toward the center of the processing container and having an L-shape bent toward the injector at the center side; and A stopper is inserted between the ejector and the second hook to press the ejector in a direction away from the second hook.

5. The substrate processing apparatus according to claim 4, wherein: The stopper includes a tapered portion that tapers from the top toward the bottom. The tapered portion is inserted between the ejector and the second hook.

6. The substrate processing apparatus according to claim 5, wherein: The stopper includes a fall-preventing portion located below the tapered portion, the fall-preventing portion restricting movement of the stopper toward the center of the processing container.

7. The substrate processing apparatus according to any one of claims 1 to 3, wherein: The ejector is a folded ejector that extends upward and folds back at the upper portion and then extends downward. The limiting portion is provided on a portion of the ejector extending downward. The pressing portion is provided at a portion of the ejector extending upward.

8. The substrate processing apparatus according to any one of claims 1 to 3, wherein: The injector is provided with a plurality of gas holes opened along the length direction. The plurality of gas holes face an inner wall side of the processing container near the injector.

9. A method for installing an injector in a processing container having a substantially cylindrical shape, wherein: The installation method of the injector includes the following steps: disposing an ejector so as to extend in a vertical direction along an inner side of an inner wall of the processing container; and The ejector is pressed against the inner side of the inner wall by the holding portion to hold it. The holding portion includes: a limiting portion provided at a first height position to limit movement of the injector relative to the processing container; and a pressing portion provided at a second height position lower than the first height position, and pressing the injector in a direction in which movement of the injector relative to the processing container is restricted by the restricting portion; The pressing portion is provided on a side opposite to the restricting portion across the ejector in the circumferential direction of the inner wall.

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