A kind of puzzle structure filter and its manufacturing method

Abstract

The jigsaw structure filter provided by the present invention comprises a plurality of filter monomers, and the plurality of filter monomers are arranged at intervals along the width direction of the filter monomers. By arranging a plurality of long strip isolation paths between adjacent filter monomers, the isolation paths are extended along the length direction of the filter monomers and penetrate the jigsaw structure filter along the thickness direction of the filter monomers. The isolation paths can be used to isolate adjacent filter monomers to avoid signal interference, thereby achieving the technical effect of producing a plurality of filter monomers by opening and closing a mold at one time, with high production efficiency, good consistency and low cost, and also reducing the weight of the jigsaw structure filter and enhancing its strength. Due to the existence of the isolation paths, an avoidance space is formed between adjacent filter monomers, which can absorb the volume change during firing, improve the yield rate, facilitate alignment during patching, and have high patching efficiency and high yield rate. The production method provided by the present invention is simple to operate, easy to implement and has a high yield rate.

Description

Technical Field

[0001] The present application relates to the field of electronic communication equipment, and in particular to a panel structure filter and a manufacturing method thereof. Background Art

[0002] Dielectric waveguide filter is a type of filter. Due to the characteristics of dielectric materials, at the same resonant frequency, dielectric waveguide filter has a higher dielectric constant, smaller volume, and a wider range of applications. With the continuous expansion of 5G base stations, the demand for this type of dielectric waveguide filter is even greater. During the production of traditional dielectric filters, the mold can only produce one dielectric filter product at a time, and the production efficiency is low. In mass production, the consistency of dielectric filters is poor. After production, dielectric filters need to be SMT patched before they can be used. Since dielectric filters exist in monomer form, only one dielectric filter can be SMT patched at a time, and the patch efficiency is low. The size of the dielectric filter monomer is small, and it is difficult to align during SMT patching. The patch yield is low, and it is difficult to meet market demand. Summary of the invention

[0003] The purpose of the present invention is to overcome the defects of the prior art and provide a patchwork structure filter with high production efficiency, good consistency, low cost, high patch efficiency and high patch yield. The present invention also provides a method for making a patchwork structure filter, which is simple to operate, easy to implement and has a high yield.

[0004] In order to achieve the above-mentioned purpose, the product in the technical solution provided by the present invention is a patchwork structure filter, including multiple filter monomers, the multiple filter monomers are arranged at intervals along the width direction of the filter monomer, and an isolation path is arranged between adjacent filter monomers. The isolation path penetrates the patchwork structure filter along the thickness direction of the filter monomer. The isolation path is in the shape of a long strip and extends along the length direction of the filter monomer. There are multiple isolation paths.

[0005] Preferably, the length of the isolation path is greater than or equal to 2 mm and less than or equal to 30% of the length of the filter monomer.

[0006] Preferably, an isolation hole is provided between adjacent isolation paths, and the isolation hole penetrates the patchwork structure filter along the thickness direction of the filter monomer.

[0007] Further preferably, the two isolation paths close to the isolation hole are symmetrically distributed on both sides of the isolation hole.

[0008] Further preferably, the diameter of the isolation hole is less than or equal to the width of the isolation diameter.

[0009] Preferably, there are two filter monomers, and the two filter monomers are symmetrically distributed on both sides of the isolation path.

[0010] Preferably, there are at least three filter monomers, and the filter monomers are arranged in sequence along the width direction of the filter monomers.

[0011] Preferably, a coupling through slot, a negative coupling blind slot and a resonance hole are provided on the upper surface of the filter monomer.

[0012] Further preferably, the coupling through slot is T-shaped, the coupling through slot comprises a first slot extending along the length direction of the filter monomer and a second slot extending along the width direction of the filter monomer, the negative coupling blind slot extends along the width direction of the filter monomer, the negative coupling blind slot is connected to the coupling through slot and aligned with the second slot, there are multiple resonant holes, each of which is a blind hole, and the lower surface of the filter monomer is provided with input and output electrodes.

[0013] In order to achieve the above object, the method in the technical solution provided by the present invention is a method for manufacturing the above-mentioned puzzle structure filter, characterized in that the filter monomer and the isolation diameter are pressed by a mold and then fired into shape at one time.

[0014] Due to the application of the above technical solution, the present invention has the following advantages compared with the prior art:

[0015] The jigsaw structure filter provided by the present invention comprises a plurality of filter monomers, and the plurality of filter monomers are arranged at intervals along the width direction of the filter monomers. By arranging a plurality of long strip isolation paths between adjacent filter monomers, the isolation paths are extended along the length direction of the filter monomers and penetrate the jigsaw structure filter along the thickness direction of the filter monomers. The isolation paths can be used to isolate adjacent filter monomers to avoid signal interference, thereby achieving the technical effect of producing a plurality of filter monomers by opening and closing a mold at one time, with high production efficiency, good consistency and low cost, and also reducing the weight of the jigsaw structure filter and enhancing its strength. Due to the existence of the isolation paths, an avoidance space is formed between adjacent filter monomers, which can absorb the volume change during firing, improve the yield rate, facilitate alignment during patching, and have high patching efficiency and high yield rate. The production method provided by the present invention is simple to operate, easy to implement and has a high yield rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0017] Figure 1 It is a top view schematic diagram of the first embodiment of the puzzle structure filter in the present invention.

[0018] Figure 2 yes Figure 1 Schematic diagram from top view.

[0019] Figure 3 It is a top view schematic diagram of the second embodiment of the mosaic structure filter in the present invention.

[0020] Figure 4 yes Figure 3 Schematic diagram from top view.

[0021] Among them: 10a. first filter monomer; 10b. second filter monomer; 10c. third filter monomer; 11. coupling through slot; 12. negative coupling blind slot; 13. resonant hole; 14. first slot; 15. second slot; 16. input electrode; 17. output electrode; 20. isolation path; 30. isolation hole. DETAILED DESCRIPTION

[0022] The following will describe the technical solutions in the embodiments of the present invention in detail in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0023] Embodiment 1

[0024] like Figure 1-2 As shown, the panel structure filter provided by the present invention includes two filter monomers, namely a first filter monomer 10a and a second filter monomer 10b. The two filter monomers are connected along the width direction of the first filter monomer 10a ( Figure 1 The first filter monomer 10a and the second filter monomer 10b are arranged at intervals, and an isolation path 20 is arranged between the first filter monomer 10a and the second filter monomer 10b. The isolation path 20 penetrates the mosaic structure filter along the thickness direction of the first filter monomer 10a. The isolation path 20 is in the shape of a long strip. The isolation path 20 is along the length direction of the first filter monomer 10a ( Figure 1 There are two isolation paths 20, the center lines of the two isolation paths 20 are located on the same straight line, and the two isolation paths 20 are arranged at intervals.

[0025] The advantage of such a setting is that the isolation path can be used to isolate the first filter monomer and the second filter monomer to avoid signal interference between the first filter monomer and the second filter monomer, and the technical effect of producing multiple filter monomers by opening and closing the mold at one time can be achieved, thereby improving production efficiency, improving product consistency and reducing costs, and reducing the weight of the puzzle structure filter and enhancing the strength of the puzzle structure filter. Due to the existence of the isolation path, an avoidance space is formed between the first filter monomer and the second filter monomer, which can absorb the volume change generated when firing the filter monomer and improve the yield rate. When performing SMT patching, due to the large size of the puzzle structure filter, it can be easily aligned, thereby improving the patch efficiency and yield rate.

[0026] The width of the isolation path 20 needs to be set according to the installation interval of adjacent filter monomers so as to keep it consistent with the interval size on the PCB board. The length of the isolation path 20 is comprehensively considered to avoid signal interference between filter monomers and to maximize the strength of the panel structure filter. In this embodiment, the length of the isolation path 20 is greater than or equal to 2 mm and less than or equal to 30% of the length of the first filter monomer 10a.

[0027] In some cases, it is difficult to form a signal isolation effect that meets the requirements between adjacent filter monomers by only setting the isolation diameter 20, and it is necessary to add an isolation hole 30 for auxiliary isolation, and the isolation hole 30 is located at the position where the signal interference between adjacent filter monomers is most serious. After the position of the isolation hole 30 is determined by simulation, the isolation hole 30 is processed, or the isolation hole 30, the isolation diameter 20 and the filter monomer are processed at one time. In this embodiment, an isolation hole 30 is provided between adjacent isolation diameters 20, and the isolation hole 30 passes through the puzzle structure filter along the thickness direction of the first filter monomer 10a. The diameter of the isolation hole 30 is equal to the width of the isolation diameter 20, and the two isolation diameters 20 close to the isolation hole 30 are symmetrically distributed on both sides of the isolation hole 30.

[0028] In this embodiment, the first filter monomers 10 a and the second filter monomers 10 b are symmetrically distributed on both sides of the isolation path 20 .

[0029] In this embodiment, the first filter monomer 10a and the second filter monomer 10b have the same structure, and the following description will be made taking the first filter monomer 10a as an example.

[0030] like Figure 1-2As shown, a coupling through slot 11, a negative coupling blind slot 12, and a resonant hole 13 are provided on the upper surface of the first filter monomer 10a. The projection of the coupling through slot 11 in the up and down directions is T-shaped. The coupling through slot 11 includes a first slot 14 extending along the length direction of the first filter monomer 10a and a second slot 15 extending along the width direction of the first filter monomer 10a. The negative coupling blind slot 12 extends along the width direction of the first filter monomer 10a. The negative coupling blind slot 12 is connected to the coupling through slot 11 and aligned with the second slot 15. There are eight resonant holes 13, and the resonant holes 13 are blind holes. An input electrode 16 and an output electrode 17 are provided on the lower surface of the first filter monomer 10a.

[0031] In order to avoid damage or breakage at the edge during firing, in the present embodiment, the coupling through slot 11, the negative coupling blind slot 12, the resonance hole 13, the isolation diameter 20 and the isolation hole 30 are provided with chamfers at the edge of the upper surface of the puzzle structure filter, and the coupling through slot 11, the resonance hole 13, the isolation diameter 20 and the isolation hole 30 are also provided with chamfers at the edge of the lower surface of the puzzle structure filter.

[0032] Embodiment 2

[0033] like Figure 3-4 As shown, the second embodiment is basically the same as the first embodiment, except that in the second embodiment, there are N filter monomers (N≥3), and the N filter monomers are arranged in sequence along the width direction of the filter monomer, that is, the filter monomers located on both sides of the isolation path 20 are not symmetrical.

[0034] The advantage of this setting is that it can easily arrange the plates and facilitate the processing and production of the mold.

[0035] The present invention also provides a method for manufacturing the above-mentioned panel structure filter, which is characterized in that a plurality of filter monomers and isolation diameters are pressed by a mold and then fired into shape at one time.

[0036] The advantages of this setting are simple operation, easy implementation and high yield rate.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0038] The above is only a specific implementation of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. A panel structure filter, comprising a plurality of filter monomers, wherein the plurality of filter monomers are arranged at intervals along the width direction of the filter monomers, and an isolation path is arranged between adjacent filter monomers, wherein the isolation path penetrates the panel structure filter along the thickness direction of the filter monomers, the isolation path is in the shape of a long strip, and the isolation path extends along the length direction of the filter monomers, characterized in that: There are multiple isolation diameters, and the length of each isolation diameter is greater than or equal to 2 mm and less than or equal to 30% of the length of the filter monomer; an isolation hole is arranged between adjacent isolation diameters, and the isolation hole penetrates the patchwork structure filter along the thickness direction of the filter monomer, and the two isolation diameters close to the isolation hole are symmetrically distributed on both sides of the isolation hole, and the diameter of the isolation hole is less than or equal to the width of the isolation diameter, and the isolation hole is located at the position where the signal interference between adjacent filter monomers is the most serious.

2. The patchwork structure filter according to claim 1, characterized in that: There are two filter monomers, and the two filter monomers are symmetrically distributed on both sides of the isolation path.

3. The patchwork structure filter according to claim 1, characterized in that: There are at least three filter monomers, and the filter monomers are arranged in sequence along the width direction of the filter monomers.

4. The patchwork structure filter according to claim 1, characterized in that: The upper surface of the filter monomer is provided with a coupling through slot, a negative coupling blind slot and a resonance hole.

5. The patchwork structure filter according to claim 4, characterized in that: The coupling through slot is T-shaped, and includes a first slot extending along the length direction of the filter monomer and a second slot extending along the width direction of the filter monomer. The negative coupling blind slot extends along the width direction of the filter monomer, and the negative coupling blind slot is connected with the coupling through slot and aligned with the second slot. There are multiple resonant holes, and the resonant holes are blind holes. The lower surface of the filter monomer is provided with input and output electrodes.

6. A method for manufacturing a patchwork structure filter according to any one of claims 1 to 5, characterized in that: The filter unit and the isolation path are pressed and formed at one time by a mold.

Images