Stage device, exposure device, and method of manufacturing an article

Abstract

Provided is a stage device for an exposure device of a scanning type that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, scans the substrate in the scanning direction, and is characterized by including: a stage that holds and moves the substrate; a first unit that includes a first electromagnet and applies a force generated by the first electromagnet to the stage as a force that accelerates the stage in the scanning direction; a second unit that includes a second electromagnet and applies a force generated by the second electromagnet to the stage as a force that accelerates the stage in a direction that intersects the scanning direction; and a moving section that moves a configuration body in which the first unit and the second unit are provided, and in which a projected area of a core of the second electromagnet, obtained by projecting the core onto a plane that has the direction that intersects the scanning direction as a normal line, is larger than a projected area of a core of the first electromagnet, obtained by projecting the core onto a plane that has the scanning direction as a normal line.

Description

TECHNICAL FIELD

[0001] The present application relates to a stage device, an exposure apparatus, and a method of manufacturing an article. BACKGROUND

[0002] When manufacturing an article such as a semiconductor device, a liquid crystal display device, an imaging device, a magnetic head, or the like using a lithography technique, an exposure apparatus of a step-and-scan method (scanning type) is used. The exposure apparatus, which is also called a scanner, transfers a pattern of a reticle to an exposure area while scanning the reticle and a substrate relative to each other, and moves the substrate stepwise after the scanning exposure of one exposure area ends in order to perform scanning exposure of the next exposure area.

[0003] Further, as disclosed in Japanese Patent Application Laid-Open No. 2005-109522 and Japanese Patent Application Laid-Open No. 8-130179, in an exposure apparatus, as a stage device that holds a substrate and is movable, a stage device including a fine movement stage and a coarse movement stage is provided. With this stage device, in scanning exposure, the substrate is moved in a first direction in synchronization with a reticle, and after the scanning exposure ends, the substrate is moved stepwise in a third direction orthogonal to the first direction and a second direction opposite to the first direction while making a U-turn in the second direction. Further, for the fine movement stage, acceleration is performed by an electromagnet, and position control is performed by a linear motor, so that high-precision position control and low heat generation are both achieved.

[0004] In the exposure apparatus of the scanning type, in order to achieve high productivity, it is necessary to end the stepwise movement of the substrate during the U-turn of the substrate after the scanning exposure of one exposure area ends. Therefore, in the stage device, for the acceleration of the fine movement stage, it is required that the acceleration in a direction orthogonal to the scanning direction (hereinafter referred to as an X direction) be greater than the acceleration in the scanning direction (hereinafter referred to as a Y direction).

[0005] The acceleration of the fine movement stage depends on the force (maximum generated force) generated by the electromagnet, and the maximum generated force of the electromagnet is determined by the projected area of the attraction area of the electromagnet projected onto a plane that is normal to the thrust direction. Therefore, in order to increase the acceleration in the X direction, it is necessary to increase the projected area of the attraction area of the electromagnet (X electromagnet) that generates the force in the X direction. However, conventionally, the X electromagnet and the electromagnet (Y electromagnet) that generates the force in the Y direction are configured so that the projected area of the attraction area of the X electromagnet is equal to the projected area of the attraction area of the Y electromagnet. Therefore, the size of the Y electromagnet increases due to the increase in the size of the X electromagnet, and the overall mass also increases. SUMMARY

[0006] The present invention provides a stage device that is advantageous in improving the productivity of a scanning-type exposure apparatus without increasing the size and mass of the entire apparatus.

[0007] [Technical Solution for Solving the Problem]

[0008] A stage device according to one aspect of the present invention is a stage device for a scanning-type exposure apparatus that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, the stage device scanning the substrate in the scanning direction, characterized by comprising: a stage that holds and moves the substrate; a first unit including a first electromagnet, and applying a force generated by the first electromagnet to the stage as a force that accelerates the stage in the scanning direction; a second unit including a second electromagnet, and applying a force generated by the second electromagnet to the stage as a force that accelerates the stage in a direction intersecting the scanning direction; and a moving section that moves a structure in which the first unit and the second unit are provided, the projected area of a core of the second electromagnet projected onto a plane having a direction intersecting the scanning direction as a normal being larger than the projected area of a core of the first electromagnet projected onto a plane having the scanning direction as a normal.

[0009] A stage device according to another aspect of the present invention is a stage device for a scanning-type exposure apparatus that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, the stage device scanning the substrate in the scanning direction, characterized by comprising: a stage that holds and moves the substrate; a first unit including a first linear motor, and applying a force generated by the first linear motor to the stage as a force that accelerates the stage in the scanning direction; a second unit including a second linear motor, and applying a force generated by the second linear motor to the stage as a force that accelerates the stage in a direction intersecting the scanning direction; and a moving section that moves a structure in which the first unit and the second unit are provided, the sum of the volumes of the coil and the magnet of the second linear motor each being larger than the sum of the volumes of the coil and the magnet of the first linear motor each.

[0010] A stage device according to another aspect of the present invention is a stage device for an exposure device of a scanning type that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, the stage device scanning the substrate in the scanning direction, characterized by comprising: a stage that holds and moves the substrate; a first actuator that generates a pushing force that moves the stage in the scanning direction; and a second actuator that generates a pushing force that moves the stage in a direction intersecting the scanning direction, the maximum pushing force generated by the second actuator being larger than the maximum pushing force generated by the first actuator.

[0011] A stage device according to another aspect of the present invention is a stage device for an exposure device of a scanning type that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, the stage device scanning the substrate in the scanning direction, characterized by comprising: a stage that holds and moves the substrate; a first actuator that generates a pushing force that moves the stage in the scanning direction; and a second actuator that generates a pushing force that moves the stage in a direction intersecting the scanning direction, a value obtained by dividing the maximum pushing force generated by the second actuator by a movable mass in the direction intersecting the scanning direction being larger than a value obtained by dividing the maximum pushing force generated by the first actuator by a movable mass in the scanning direction.

[0012] A stage device according to another aspect of the present invention is a stage device for an exposure device of a scanning type that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, the stage device scanning the substrate in the scanning direction, characterized by comprising: a stage that holds and moves the substrate; a first unit that applies a force that accelerates the stage in the scanning direction to the stage; a second unit that applies a force that accelerates the stage in a direction intersecting the scanning direction to the stage; and a moving section that moves a structure in which the first unit and the second unit are provided, the second unit being larger in size than the first unit.

[0013] An exposure device according to another aspect of the present invention is an exposure device of a scanning type that exposes a substrate while relatively scanning a master and the substrate in a scanning direction, characterized by comprising: the above-described stage device that scans the substrate in the scanning direction; and a projection optical system that projects a pattern of the master onto the substrate scanned in the scanning direction by the stage device.

[0014] A manufacturing method of an article according to another aspect of the present application is characterized by comprising: a process of exposing a substrate using the exposure apparatus described above; a process of developing the substrate after the exposure; and a process of manufacturing an article from the substrate after the development.

[0015] Further objects or other aspects of the present application will become apparent from the following embodiments with reference to the attached drawings.

[0016] [Effects of Invention]

[0017] According to the present application, it is possible to provide a stage device that is advantageous in improving the productivity of a scanning exposure apparatus, for example, without increasing the size and mass of the entire device. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is a schematic diagram showing the structure of an exposure apparatus according to an aspect of the present application.

[0019] Figure 2 is a diagram showing the overall structure of a substrate stage in the first embodiment.

[0020] Figure 3 is a diagram showing Figure 2 the details of the micro electromagnetic iron shown in

[0021] Figure 4 is a plan view of the micro electromagnetic iron of each of the comparative example and the first embodiment.

[0022] Figure 5 is a diagram showing the overall structure of a substrate stage in the second embodiment.

[0023] Figure 6 is a diagram showing Figure 5 the details of the micro stage shown in

[0024] Figure 7 is a diagram showing Figure 5 the details of the modified example of the micro stage shown in

[0025] Figure 8 is a diagram showing the Y speed, Y acceleration, X acceleration, and X position during U-turn of the substrate stage.

[0026] Figure 9 is a diagram showing the relationship between the Y acceleration of the substrate stage and the necessary X acceleration of the substrate stage.

[0027] Figure 10 is a diagram showing the overall structure of a substrate stage according to the comparative example.

[0028] Figure 11 is a view showing the entire structure of a substrate stage as a comparative example.

[0029] Figure 12 is a view showing Figure 10 and Figure 11 is a view showing the structure of a micro-motion stage.

[0030] Figure 13 is a view showing Figure 12 is a view showing details of a micro-motion YLM and a micro-motion ZLM.

[0031] Figure 14 is a view showing Figure 11 is a view showing details of a micro-motion electromagnet.

[0032] Figure 15 is a view showing Figure 10 is a view showing details of an X slider, a Y slider, and an XY slider.

[0033] Figure 16 is a view showing Figure 11 is a view showing details of a coarse-motion linear motor.

[0034] Figure 17 is a view showing an exposure arrangement of a substrate. DETAILED DESCRIPTION

[0035] Hereinafter, embodiments will be described in detail with reference to the drawings. Note that the embodiments below do not limit the application covered by the claims. In the embodiments, a plurality of features can be combined as long as they are not inconsistent with each other. In addition, the same portions or like portions are denoted by the same reference numerals in different drawings, and repeated description is omitted.

[0036] Figure 1 is a view showing the entire structure of a substrate stage as a comparative example.

[0037] As shown in Figure 1 , the exposure apparatus 1 has a stage platform 692, a substrate stage 500, a lens barrel platform 696, a vibration damper 698, a projection optical system 697, an illumination optical system 699, a reticle platform 694, and a reticle stage 695. In the present embodiment, the exposure apparatus 1 is a scanner that exposes a substrate W by relatively scanning a reticle R and the substrate W in a scanning direction (scan exposure) and transfers a pattern of the reticle R to the substrate.Figure 1 Set the direction perpendicular to the paper as the scanning direction, and... Figure 1 The horizontal direction within the plane of the paper is defined as the stepping direction. Additionally, a coordinate system is defined with the scanning direction as the Y-axis, the direction intersecting the scanning direction, especially the stepping direction orthogonal to the scanning direction, as the X-axis, and the direction orthogonal to both the X-axis and Y-axis as the Z-axis.

[0038] The stage platform 692 is supported on the base plate 691 via a bracket (not shown). A substrate mounting stage 500 is mounted on the stage platform 692. The lens barrel platform 696 is supported on the base plate 691 via a vibration damper 698. A projection optics system 697 and a master plate platform 694 are mounted on the lens barrel platform 696. A master plate mounting stage 695 is mounted on the master plate platform 694 in a movable (sliding) manner. An illumination optics system 699 is mounted above the master plate mounting stage 695.

[0039] During exposure, light emitted from a light source (not shown) illuminates the original image R through an illumination optical system 699. The pattern of the original image R is projected (imaged) onto the substrate W through a projection optical system 697. At this time, each of the original image stage 695 and the substrate stage 500 scans the original image R and the substrate W relative to each other in the scanning direction. As will be described later, the substrate stage 500 used in the exposure apparatus 1 is capable of having an acceleration in the step direction orthogonal to the scanning direction greater than the acceleration in the scanning direction. Therefore, the exposure apparatus 1 can provide devices (semiconductor devices, liquid crystal display devices, imaging devices, magnetic heads, etc.) with high productivity and good economic efficiency.

[0040] The following details the substrate mounting stage 500. Before describing the first and second embodiments, the structure and issues of a general substrate mounting stage 500A will be described as a comparative example.

[0041] [Comparative Example]

[0042] Figure 10 This diagram shows the overall structure of the substrate mounting stage 500A as a comparative example. The XY slider 504 is mounted on the mounting stage base 505 in a manner that allows it to move freely in both the X and Y directions. The X slider 502 is mounted on the XY slider 504 in a manner that allows it to move freely in the X direction. The Y slider 503 is mounted on the X slider 502 in a manner that allows it to move freely in the Y direction. Furthermore, coarse linear motors 506 are provided on both sides of the X slider 502 and the Y slider 503. The coarse linear motors 506 move the X slider 502 and the Y slider 503 in the X and Y directions, respectively. The X slider 502, Y slider 503, XY slider 504, and coarse linear motors 506 function as moving parts that move the micro-motion base 501-2, which is the structure itself.

[0043] Figure 11 is a view showing the overall structure of the substrate table 500A from the lower side of the front side toward the depth side of the Y axis. Figure 12 is a schematic view showing the structure of the micro stage 501, showing a state in which the micro stage top plate 501-1 is detached. The micro stage base 501-2 is provided on the XY slide 504. On the micro stage base 501-2, four micro ZLMs (linear motors) 501-6 that perform fine positioning in the Z direction are provided. Further, on the micro stage base 501-2, two micro XLMs 501-4 that perform fine positioning in the directions of rotation around the X axis and the Y axis, and two micro YLMs 501-5 that perform fine positioning in the directions of rotation around the Y axis and the Z axis are provided. In other words, the micro XLM 501-4 functions as a unit (fourth unit) that controls the position of the micro stage 501 in the X direction, and the micro YLM 501-5 functions as a unit (third unit) that controls the position of the micro stage 501 in the Y direction. In addition, a micro electromagnet 501-3 for generating an acceleration force in the X direction and the Y direction is provided in the central portion of the micro stage base 501-2.

[0044] Figure 13 is a view showing the details of the micro YLM 501-5 and the micro ZLM 501-6, showing a state in which a portion of a magnetic yoke is detached. The micro YLM 501-5 is composed of a micro YLM coil base 501-52, a micro YLM coil 501-51, a micro YLM magnet 501-53, a micro YLM magnetic yoke 501-54, and a micro LM spacer 501-70. In this structure, the micro YLM coil base 501-52 is fixed on the micro stage base 501-2, and the micro YLM coil 501-51 is fixed on the micro YLM coil base 501-52.

[0045] The micro YLM coil 501-51 is an oblong coil having a straight portion extending in the vertical direction, and four micro YLM magnets 501-53 are provided facing the straight portion with a gap. Two micro YLM magnetic yokes 501-54 for passing magnetic flux are provided on the back surface of the micro YLM magnet 501-53. The magnetization direction of the micro YLM magnet 501-53 is the X direction, and the micro YLM magnets 501-53 adjacent in the Y direction have opposite polarities, and the micro YLM magnets 501-53 arranged in the X direction have the same polarity. The micro LM spacer 501-70 is used to maintain the positions of a pair of magnets and a magnetic yoke against the attractive force acting thereon.

[0046] The micro YLM magnet 501-53, the micro YLM yoke 501-54, and the micro LM spacer 501-70 are provided to the micro top plate 501-1. By flowing a current in the micro YLM coil 501-51, a force proportional to the current can be generated in a direction orthogonal to the straight portion, i.e., the Y direction. In addition, by flowing a current in the two micro YLM coils 501-51 in opposite directions, respectively, a torque that rotates around the Z axis can be generated.

[0047] On the other hand, the micro ZLM 501-6 is composed of a micro ZLM coil base 501-62, a micro ZLM coil 501-61, a micro ZLM magnet 501-63, a micro ZLM yoke 501-64, and the micro LM spacer 501-70. In this structure, the micro ZLM coil base 501-62 is fixed on the micro base 501-2, and the micro ZLM coil 501-61 is fixed on the micro ZLM coil base 501-62.

[0048] The micro ZLM coil 501-61 is an oblong coil having a straight portion extending in the horizontal direction, and four micro ZLM magnets 501-63 are provided facing the straight portion with a gap. Two micro ZLM yokes 501-64 for passing magnetic flux are provided on the back surface of the micro ZLM magnet 501-63. The magnetization direction of the micro ZLM magnet 501-63 is the X direction, and the micro ZLM magnets 501-63 adjacent in the Z direction have opposite polarities, and the micro ZLM magnets 501-63 arranged in the X direction have the same polarity. The micro LM spacer 501-70 is used to maintain the positions of a pair of magnets and yokes against the attractive force acting thereon.

[0049] The micro ZLM magnet 501-63, the micro ZLM yoke 501-64, and the micro LM spacer 501-70 are provided to the micro top plate 501-1. By flowing a current in the micro ZLM coil 501-61, a force proportional to the current can be generated in a direction orthogonal to the straight portion, i.e., the Z direction. In addition, the micro ZLM coil 501-61 is provided with four, and thus by the combination of the current directions, a torque that rotates around the X axis and a torque that rotates around the Y axis can be generated.

[0050] The micro XLM 501-4 has the same structure as the micro YLM 501-5, and is arranged at 90 degrees with respect to the micro YLM 501-5. The micro XLM 501-4 can generate a force in the X direction and a torque that rotates around the Z axis.

[0051] Figure 14is a view showing details of the fine movement electromagnet 501-3. The fine movement electromagnet 501-3 is composed of a first unit and a second unit that apply a force to the fine movement stage 501. The first unit is a unit that includes a first electromagnet and applies a force generated by the first electromagnet to the fine movement stage 501 as a force that accelerates the fine movement stage 501 in the Y direction. In addition, the second unit is a unit that includes a second electromagnet and applies a force generated by the second electromagnet to the fine movement stage 501 as a force that accelerates the fine movement stage 501 in the X direction. Specifically, the fine movement electromagnet 501-3 includes an E-shaped core support member 501-30, an I-shaped core support member 501-31, and an I-shaped core 501-32. In addition, the fine movement electromagnet 501-3 includes an E-shaped core X 501-33, an E-shaped core X coil 501-34, an E-shaped core Y 501-35, and an E-shaped core Y coil 501-36.

[0052] The E-shaped core support member 501-30 is fixed on the fine movement base 501-2. On the four inner sides of the E-shaped core support member 501-30, two E-shaped core Xs 501-33 and an E-shaped core X coil 501-34, and two E-shaped core Ys 501-35 and an E-shaped core Y coil 501-36 are fixed. With respect to these E-shaped cores, the I-shaped core 501-32 is provided with a slight gap. The I-shaped core 501-32 is provided on the fine movement top plate 501-1 via the I-shaped core support member 501-31. The four E-shaped cores and the I-shaped core have the same size, and the maximum forces that they can generate are the same.

[0053] Figure 15 is a view showing details of the X slider 502, the Y slider 503, and the XY slider 504. The XY slider 504 is composed of an XY slider lower portion 504-3, an XY slider middle portion 504-2, and an XY slider upper portion 504-1. The XY slider lower portion 504-3 is supported on the stage base 505 so as to be movable (slidable) in the X direction and the Y direction. The XY slider middle portion 504-2 is provided on the XY slider lower portion 504-3, and the XY slider upper portion 504-1 is provided on the XY slider middle portion 504-2.

[0054] The X slider 502 is composed of an X beam 502-1, X feet 502-2, and X yaw guides 502-3. The two X yaw guides 502-3 are fixed to the two sides of the stage base 505, and the two X feet 502-2 are connected by the X beam 502-1.

[0055] One of the X feet 502-2 faces the side surface of one of the X yaw guides 502-3 and the upper surface of the stage base 505 with a gap therebetween, and is supported so as to be movable (slidable) in the X direction. The other of the X feet 502-2 faces the side surface of the other of the X yaw guides 502-3 and the upper surface of the stage base 505 with a gap therebetween, and is supported so as to be movable (slidable) in the X direction. Thus, the unit of the X beam 502-1 and the two X feet 502-2 is movable (slidable) in the X direction. In addition, the two side surfaces of the X beam 502-1 face the inner side surfaces of the XY slider middle portion 504-2 with a slight space therebetween so as to be movable (slidable), and the XY slider 504 is restricted so as to be movable (slidable) in the X direction and the Y direction.

[0056] The Y slider 503 is composed of a Y beam 503-1, Y feet 503-2, and Y yaw guides 503-3. The two Y yaw guides 503-3 are fixed to the two side surfaces of the stage base 505, and the two Y feet 503-2 are connected by the Y beam 503-1.

[0057] One of the Y feet 503-2 faces the side surface of one of the Y yaw guides 503-3 and the upper surface of the stage base 505 with a gap therebetween, and is supported so as to be movable (slidable) in the Y direction. The other of the Y feet 503-2 faces the side surface of the other of the Y yaw guides 503-3 and the upper surface of the stage base 505 with a gap therebetween, and is supported so as to be movable (slidable) in the Y direction. Thus, the unit of the Y beam 503-1 and the two Y feet 503-2 is movable (slidable) in the Y direction. In addition, the two side surfaces of the Y beam 503-1 face the inner side surfaces of the XY slider 504-1 with a slight space therebetween so as to be movable (slidable), and the XY slider 504 is restricted so as to be movable (slidable) in the X direction and the Y direction.

[0058] Figure 16 is a diagram showing details of the coarse linear motor 506. The coarse linear motor 506 includes a coil 506-1, a coil support plate 506-2, a coil support post 506-3, and a coil base 506-4. The coarse linear motor 506 includes a magnet 506-5, a yoke 506-6, a spacer 506-7, and an arm 506-8.

[0059] The coil 506-1 is a 2-phase coil unit in which the phases of adjacent coils are shifted by 90 degrees. The coil 506-1 is integrally fixed to a coil support plate 506-2, and is fixed to a coil base 506-4 via a coil support 506-3. The coil base 506-4 can be fixed to the stage platform 692, or can be supported so as to be movable (slidable) in the coil arrangement direction with respect to the stage platform 692. In this way, by supporting the coil base 506-4 so as to be movable, the reaction force of acceleration can be absorbed.

[0060] The magnet 506-5 is a pair of 4-pole magnet units. The magnet 506-5 is arranged so as to sandwich the coil from above and below with a gap therebetween, and a yoke 506-6 is provided on the back surface thereof. A spacer 506-7 is used to maintain the gap of the pair of magnets in order to overcome the attractive force. The magnet 506-5, the yoke 506-6, and the spacer 506-7 are integrally fixed to the X leg 502-2 or the Y leg 503-2 via an arm 506-8. Thus, it is possible to apply a pushing force in the X direction to the integral body of the X beam 502-1 and the two X leg portions 502-2, and to apply a pushing force in the Y direction to the integral body of the Y beam 503-1 and the two Y leg portions 503-2. In this structure, by causing the coils facing the magnets among the 2-phase coils to flow a sinusoidal wave current corresponding to the position, it is possible to continuously generate a force.

[0061] Figure 17 is a diagram showing the exposure arrangement of the substrate W. On the substrate W, an exposure region 701 having an X dimension of Sx and a Y dimension of Sy is arranged (laid out), and the substrate stage is caused to scan along the Figure 17 The scanning exposure is performed along the scan (Y direction) and step (X direction) tracks shown by the arrows. At this time, the stage is caused to scan move at a speed of 1 / numerical aperture (exposure magnification) of the projection optical system in the Y direction in synchronization with the reticle stage during the scanning exposure, and is caused to step move in the X direction while turning in a U shape in the Y direction at the end of the scanning exposure in order to perform the scanning exposure of the next exposure region.

[0062] Figure 8 is a diagram showing the speed in the Y direction (Y speed), the acceleration in the Y direction (Y acceleration), the acceleration in the X direction (X acceleration), and the position in the X direction (X position) of the stage during the U-turn (U-turn period) of the stage. In Figure 8 In the drawing, a case where the exposure magnification is 4 times, the Y acceleration of the stage is 30 G, and the scan speed of the stage is 5 m / s is shown. Referring to Figure 8 In order to end the step movement of 26 mm, which is equivalent to the X dimension Sx of the exposure region 701, during the U-turn of the stage, an X acceleration of less than 10 G is required. 10 G indicates a value larger than 30 G / exposure magnification, i.e., 7.5 G, which indicates that the X acceleration is larger than the Y acceleration in the stage.

[0063] Figure 9 is a graph showing the relationship of the Y acceleration of the substrate placement stage with the X acceleration of the necessary substrate placement stage using a solid line. In addition, in Figure 9 , the relationship in the case where the X acceleration of the substrate placement stage is the same as the Y acceleration is shown using a broken line. Referring to Figure 9 , it is shown that from the vicinity where the Y acceleration of the substrate placement stage exceeds 7 G, the X acceleration of the necessary substrate placement stage is higher than the broken line, that is, in the substrate placement stage, it is required to make the X acceleration larger than the Y acceleration.

[0064] Therefore, in the present embodiment, a substrate placement stage (substrate placement stage 500) is provided in which the X acceleration is made larger than the Y acceleration without increasing the size and mass of the entire, which is advantageous in improving the productivity of the scanning-type exposure apparatus.

[0065] [First Embodiment]

[0066] The substrate placement stage 500 of the first embodiment will be described with reference to Figure 2 , Figure 3 and Figure 4 . Figure 2 is a graph showing the overall structure of the substrate placement stage 500 of the first embodiment, and shows the state after the micro-motion top plate 101-1 is removed. Referring to Figure 2 , a micro-motion electromagnet 101-3 is provided in the central portion of the substrate placement stage 500. In the substrate placement stage 500 of the first embodiment, the structure other than the micro-motion electromagnet 101-3 is the same as the comparative example, and therefore in the first embodiment, the micro-motion electromagnet 101-3 will be described.

[0067] Figure 3 is a graph showing the details of the micro-motion electromagnet 101-3. The micro-motion electromagnet 101-3 includes an E-shaped core support member 101-30, an I-shaped core support member 101-31, an I-shaped core X 101-38, and an I-shaped core Y 101-37. In addition, the micro-motion electromagnet 101-3 includes an E-shaped core X 101-33, an E-shaped core X coil 101-34, an E-shaped core Y 101-35, and an E-shaped core Y coil 101-36.

[0068] An E-shaped core support member 101-30 is fixed on the micro-motion base 101-2. On the four inner sides of the E-shaped core support member 101-30, two E-shaped cores X 101-33 and E-shaped core X coils 101-34, and two E-shaped cores Y 101-35 and E-shaped core Y coils 101-36 are fixed. With respect to the four E-shaped cores, I-shaped cores X 101-38 and I-shaped cores Y 101-37 are provided with a slight gap therebetween, and are fixed to the micro-motion top plate 101-1 via an I-shaped core support member 101-31.

[0069] Figure 4 is a plan view of each of the micro-motion electromagnetic iron 501-3 in the comparative example and the micro-motion electromagnetic iron 101-3 in the first embodiment. As shown in Figure 4 , the E-shaped core support member 101-30 has the same size (size) as the E-shaped core support member 501-30.

[0070] Referring to Figure 4 , the E-shaped core X 101-33 has a different size from the E-shaped core X 501-33, and in the present embodiment, has a larger size than the size of the E-shaped core X 501-33. In other words, the projected area of the E-shaped core X 101-33 (lateral width) projected onto a plane having the X direction as a normal line is larger than the projected area of the E-shaped core X 501-33 projected onto a plane having the X direction as a normal line. Therefore, in the present embodiment, a large acceleration force can be generated in the X direction, and the X acceleration of the substrate placement stage 500 can be made larger than the comparative example.

[0071] On the other hand, the E-shaped core Y 101-35 has the same size as the E-shaped core Y 501-35. In other words, the projected area of the E-shaped core Y 101-35 (lateral width) projected onto a plane having the Y direction as a normal line is the same as the projected area of the E-shaped core Y 501-35 projected onto a plane having the Y direction as a normal line. Therefore, in the present embodiment, the same acceleration force as the comparative example can be generated in the Y direction, and the X acceleration of the substrate placement stage 500 can be made larger than the comparative example without sacrificing the Y acceleration of the substrate placement stage 500.

[0072] Thus, in the present embodiment, the projected area of the E-shaped core X101-33 (core of the second electromagnet) projected onto a plane having the X direction as a normal line is larger than the projected area of the E-shaped core Y101-35 (core of the first electromagnet) projected onto a plane having the Y direction as a normal line. Thus, it is possible to make the X acceleration larger than the Y acceleration in the stage 500 without increasing the size and mass of the entire stage 500. Therefore, even if the acceleration in the scanning direction (Y direction) of the stage 500 is increased in order to increase the throughput of the exposure apparatus 1, it is possible to complete the step-and-scan movement (movement in the X direction) during the U-turn of the stage 500.

[0073] In addition, from the viewpoint of making the X acceleration larger than the Y acceleration, the projected area of the E-shaped core X101-33 can have a size of 1.1 times or more the projected area of the E-shaped core Y101-35. Thus, it is advantageous to increase the throughput of the exposure apparatus 1.

[0074] [Second Embodiment]

[0075] Referring to Figure 5 , Figure 6 and Figure 7 , the stage 500 of the second embodiment will be described. Figure 5 is a view showing the entire structure of the stage 500 of the second embodiment, and shows a state after the micro-motion top plate is removed. Referring to Figure 5 , the micro-motion stage 201 is provided in the central portion of the stage 500. In the stage 500 of the second embodiment, the structure other than the micro-motion stage 201 is the same as that of the comparative example, and thus the micro-motion stage 201 will be described in the second embodiment.

[0076] Figure 6is a view showing details of the micro stage 201. The micro stage 201 is composed of a micro top plate (not shown), a micro base 201-2, one micro XLM (linear motor) 201-4, two micro YLMs 201-5, and four micro ZLMs 201-6. In the present embodiment, acceleration of the substrate stage 500 in the X direction and the Y direction is not performed by an electromagnet, but by linear motors, i.e., the micro XLM 201-4 and the micro YLM 201-5. The micro XLM 201-4 (second linear motor) constitutes a second unit that applies a force to the micro stage 201 to accelerate the micro stage 201 in the X direction. In addition, the micro YLM 201-5 (first linear motor) constitutes a first unit that applies a force to the micro stage 201 to accelerate the micro stage 201 in the Y direction. Furthermore, in the present embodiment, the position of the substrate stage 500 in the XY plane and the position around the Z axis are also controlled by the micro XLM 201-4 and the micro YLM 201-5. In other words, the micro XLM 201-4 and the micro YLM 201-5 also function as a fourth unit that controls the position of the micro stage 201 in the X direction and a third unit that controls the position of the micro stage 201 in the Y direction, respectively.

[0077] In the present embodiment, the micro YLM 201-5 and the micro ZLM 201-6 have the same structure as the comparative example. On the other hand, in the micro XLM 201-4, the combination of the micro XLM coil 201-41 and the micro XLM magnet 201-43 is arranged in the X direction with three (three in a row). In this way, in the present embodiment, the sum of the volumes of the micro XLM coil 201-41 and the micro XLM magnet 201-43 of the micro XLM 201-4 is larger than the sum of the volumes of the micro YLM coil and the micro YLM magnet of the micro YLM 201-5, respectively. Thereby, it is possible to make the X acceleration larger than the Y acceleration in the substrate stage 500 without increasing the size and the mass of the whole. Therefore, in order to improve the throughput of the exposure apparatus 1, even if the acceleration in the scanning direction (Y direction) of the substrate stage 500 is increased, it is possible to complete the step-and-scan movement (movement in the X direction) during the U-turn of the substrate stage 500.

[0078] In addition, the sum of the volumes of the micro XLM coil 201-41 and the micro XLM magnet 201-43 of the micro XLM 201-4 can be more than 1.1 times the sum of the volumes of the micro YLM coil and the micro YLM magnet of the micro YLM 201-5, respectively. Thereby, it is advantageous in terms of making the X acceleration larger than the Y acceleration, and it is possible to improve the throughput of the exposure apparatus 1. In addition, as shown in FIG. 8, it is also possible to arrange three Figure 7 Figure 6 ​The micro movement XLM 201-4 is shown. Thus, in the substrate stage 500, the X acceleration can be further increased.

[0079] In the first and second embodiments, when the acceleration of the substrate stage 500 is set as SA [G] and the scan speed of the substrate stage 500 is set as SV [m / s], SA / SV > 4.5 is satisfied. In other words, in a case where such a relationship is established between the acceleration of the substrate stage 500 and the scan speed of the substrate stage 500, the X acceleration needs to be made larger than the Y acceleration.

[0080] In the first and second embodiments, the acceleration transmission mechanism of the micro movement stage of the substrate stage 500 is described. However, it is important that the step movement is completed during the U-turn of the substrate stage 500 in the scan type exposure apparatus 1. For this reason, in the substrate stage 500, it is sufficient that the X acceleration > the Y acceleration is achieved, regardless of whether the substrate stage 500 is of the coarse movement / micro movement separation type or the coarse movement / micro movement integrated type. In other words, it is sufficient that the maximum thrust generated by the second actuator that applies a thrust for moving the substrate stage 500 in the X direction (non-scan direction) is made larger than the maximum thrust generated by the first actuator that applies a thrust for moving the substrate stage 500 in the Y direction (scan direction). In addition, it is also possible to make the value obtained by dividing the maximum thrust in the X direction by the movable mass in the X direction larger than the value obtained by dividing the maximum thrust in the Y direction by the movable mass in the Y direction.

[0081] Specifically, it is sufficient that the volume of the coarse movement linear motor in the X direction is made larger than the volume of the coarse movement linear motor in the Y direction. In addition, if the volume of the coarse movement linear motor in the X direction is the same as the volume of the coarse movement linear motor in the Y direction, it is sufficient that the number of the coarse movement linear motors in the X direction is increased (can be increased) than the number of the coarse movement linear motors in the Y direction. However, in these cases, since the movable mass increases, it is necessary to confirm that the maximum thrust in the X direction / the movable mass in the X direction satisfies the maximum thrust in the Y direction / the movable mass in the Y direction.

[0082] In addition, in a case where the volume and the number are the same between the coarse movement linear motor in the X direction and the coarse movement linear motor in the Y direction, it is also possible to make the capacity of the current driver in the X direction larger than the capacity of the current driver in the Y direction, and thus a large current can be supplied to the coarse movement linear motor in the X direction. In this case, as a countermeasure against heat generation, it is possible to make the refrigerant flow rate of the cooling mechanism of the coarse movement linear motor in the X direction larger than the refrigerant flow rate of the cooling mechanism of the coarse movement linear motor in the Y direction.

[0083] In addition, the volume of the X-direction coarse movement linear motor can be made smaller than the volume of the Y-direction coarse movement linear motor, the capacity of the X-direction current driver can be made larger than the capacity of the Y-direction current driver, and thus a large current can be supplied to the X-direction coarse movement linear motor. Further, as a countermeasure against heat generation, the refrigerant flow rate of the cooling mechanism of the X-direction coarse movement linear motor can be made larger than the refrigerant flow rate of the cooling mechanism of the Y-direction coarse movement linear motor. In this case, by making the movable mass in the X direction smaller than the movable mass in the Y direction, the X-direction acceleration can be further increased.

[0084] The manufacturing method of the article in the embodiment of the present application is suitable for manufacturing, for example, an article such as a semiconductor device, a liquid crystal display device, an imaging device, a magnetic head, a MEMS, and the like. The manufacturing method includes a process of exposing a substrate coated with a photosensitive agent using the exposure apparatus 1 described above and a process of developing the photosensitive agent after exposure. In addition, the pattern of the developed photosensitive agent is used as a mask, and a substrate is subjected to a etching process, an ion implantation process, and the like to form a circuit pattern on the substrate. These exposure, development, etching, and the like are repeated to form a circuit pattern composed of a plurality of layers on the substrate. In a subsequent process, the substrate on which the circuit pattern is formed is cut (processed), and a chip mounting, bonding, and inspection process is performed. In addition, the manufacturing method can include other known processes (oxidation, film formation, evaporation, doping, planarization, resist peeling, and the like). The manufacturing method of the article in the embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article compared to the past.

[0085] The present application is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the application. Therefore, the appended claims are added in order to disclose the scope of the present application.

Claims

1. A stage device, the stage device is used for an exposure device that performs a scanning exposure on a substrate, characterized by the stage device has: a stage that holds and moves the substrate; a first unit that includes a first electromagnet that generates a force for accelerating the stage in a scanning direction; a second unit that includes a second electromagnet that generates a force for accelerating the stage in a cross direction that intersects the scanning direction; and a moving section that moves a structure in which the first unit and the second unit are provided, an area of a core of the second electromagnet in a plane that is normal to the cross direction is larger than an area of a core of the first electromagnet in a plane that is normal to the scanning direction.

2. The stage device according to claim 1, characterized by the area of the core of the second electromagnet in the plane that is normal to the cross direction is 1.1 times or more larger than the area of the core of the first electromagnet in the plane that is normal to the scanning direction.

3. The stage device according to claim 1, characterized by the stage device further has: a third unit that controls a position of the stage in the scanning direction; and a fourth unit that controls a position of the stage in the cross direction.

4. The stage device according to claim 1, characterized by if an acceleration of the stage is set as SA [G] and a scanning speed of the stage is set as SV [m / s], the stage device satisfies SA / SV > 4.

5.

5. The stage device according to claim 1, characterized by the cross direction is a direction that is orthogonal to the scanning direction.

6. A stage device, the stage device is used for an exposure device that performs a scanning exposure on a substrate, characterized by the stage device has: a stage that holds and moves the substrate; a first unit that includes a first linear motor that generates a force for accelerating the stage in a scanning direction; a second unit that includes a second linear motor that generates a force for accelerating the stage in a cross direction that intersects the scanning direction; and a moving section that moves a structure in which the first unit and the second unit are provided, a sum of volumes of a coil and a magnet of the second linear motor is larger than a sum of volumes of a coil and a magnet of the first linear motor.

7. The stage device according to claim 6, characterized by the sum of the volumes of the coil and the magnet of the second linear motor is 1.1 times or more larger than the sum of the volumes of the coil and the magnet of the first linear motor.

8. The stage device according to claim 6, characterized by the stage device further has: a third unit that controls a position of the stage in the scanning direction; and a fourth unit that controls a position of the stage in the cross direction.

9. The stage device according to claim 6, characterized by ​ ​ If an acceleration of the stage is set as SA [G] and a scanning speed of the stage is set as SV [m / s], the stage apparatus satisfies SA / SV > 4.

5.

10. The stage apparatus according to claim 6, wherein the cross direction is a direction orthogonal to the scanning direction.

11. A stage apparatus, the stage apparatus is used for an exposure apparatus that performs scanning exposure of a substrate, characterized by the stage apparatus has: a stage that holds and moves the substrate; a first actuator that generates a thrust force that moves the stage in a scanning direction; a second actuator that generates a thrust force that moves the stage in a cross direction that crosses the scanning direction, a value obtained by dividing a maximum thrust force generated by the second actuator by a mass of a movable object of the second actuator, which is a second movable mass, is larger than a value obtained by dividing a maximum thrust force generated by the first actuator by a mass of a movable object of the first actuator, which is a first movable mass, and the first movable mass and the second movable mass each include a mass of the stage.

12. The stage apparatus according to claim 11, wherein the cross direction is a direction orthogonal to the scanning direction.

13. A stage apparatus, the stage apparatus is used for an exposure apparatus that performs scanning exposure of a substrate, characterized by the stage apparatus has: a stage that holds and moves the substrate; a first unit that applies a force to the stage that accelerates the stage in a scanning direction; a second unit that applies a force to the stage that accelerates the stage in a cross direction that crosses the scanning direction; and a moving section that moves a structure in which the first unit and the second unit are provided, a size of the second unit is larger than a size of the first unit.

14. The stage apparatus according to claim 13, wherein the cross direction is a direction orthogonal to the scanning direction.

15. An exposure apparatus that performs scanning exposure of a substrate, characterized by the exposure apparatus has: the stage apparatus according to claim 1 that scans the substrate in a scanning direction; and a projection optical system that projects a pattern of a reticle onto the substrate scanned by the stage apparatus in the scanning direction.

16. A method of manufacturing an article, characterized by the method of manufacturing the article has: a process of exposing a substrate using the exposure apparatus according to claim 15; a process of developing the substrate after exposure; and a process of manufacturing the article from the substrate after development. ​ ​

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