Light enhancement processing method

Abstract

The present invention relates to a method for treating skin and scalp, the method comprising: applying a composition on the scalp or skin, the composition comprising a scalp care active selected from the group consisting of 2-pyridinol-N-oxide, pyridinethione or a polyvalent metal salt of pyridinethione, one or more iron chelating agents having an AlogP value greater than or equal to 0.4, and mixtures thereof; exposing the scalp and skin to a radiation having a wavelength of about 350 nm to about 500 nm and a temperature of about 0.1 mW / cm 2 About 1000 mW / cm 2 The invention relates to an antimicrobial treatment comprising applying electromagnetic radiation of a power of 100 μm to a dark color sample for a period of time from about 2 seconds to about 5 minutes; wherein the antimicrobial treatment results in at least a 50% reduction in fungal growth as measured by a fungal growth susceptibility test compared to a dark color sample.

Description

Technical Field

[0001] The present invention relates to a method of treating the scalp or skin using a composition comprising an effective amount of an antimicrobial active such as a metal salt of pyrithione or octopirox olamine and a chelating agent, and exposing the portion of the scalp or skin to which the composition is applied to electromagnetic radiation corresponding to the ultraviolet visible spectrum at wavelengths of 350 nm to 500 nm. More specifically, the treatment method of the present invention relates to treating microbial and fungal infections on the skin or scalp. Even more specifically, the present invention relates to a method for treating dandruff and provides improved anti-dandruff activity. Background Art

[0002] A variety of antimicrobial compositions (including anti-dandruff compositions) and methods are commercially available or otherwise known in the shampoo art. These methods use compositions that typically include particulate crystalline antimicrobial agents dispersed and suspended throughout the composition or surfactant-soluble antimicrobial agents that are soluble in the product. During application of the product to the skin or scalp, the antimicrobial active is deposited on the skin or scalp. Despite the available options, consumers still need hair and skin methods and products that provide excellent antimicrobial efficacy relative to currently commercially available methods and products, as well as further anti-dandruff efficacy; because such consumers have found that dandruff is still prevalent and that excellent efficacy may be difficult to achieve.

[0003] The present invention has surprisingly been found that applying to the scalp or skin a composition comprising an antimicrobial active, which may include an antifungal active or an anti-dandruff active, and a chelating agent, followed by exposing the skin or scalp to electromagnetic radiation corresponding to the ultraviolet visible spectrum at wavelengths of 350 nm to 500 nm, provides superior efficacy compared to that achieved by treatment methods that do not include such exposure to electromagnetic radiation. Summary of the invention

[0004] The present invention relates to a method for treating skin and scalp, the method comprising: applying a composition to the scalp or skin, the composition comprising a scalp care active selected from the group consisting of 2-pyridinol-N-oxide, pyridinethione or a polyvalent metal salt of pyridinethione, one or more iron chelating agents having an AlogP value greater than or equal to 0.4, and mixtures thereof; exposing the scalp and skin to a radiation having a wavelength of about 350 nm to about 500 nm and a radiation intensity of about 0.1 mW / cm 2 About 1000 mW / cm 2 The invention relates to an antimicrobial treatment comprising applying electromagnetic radiation of a power of 100 μm to a dark color sample for a period of time from about 2 seconds to about 5 minutes; wherein the antimicrobial treatment results in at least a 50% reduction in fungal growth as measured by a fungal growth susceptibility test compared to a dark color sample. DETAILED DESCRIPTION

[0005] Unless otherwise indicated, all percentages and ratios used herein are by weight of the total composition. Unless otherwise indicated, all measurements are understood to be made under ambient conditions, wherein "ambient conditions" means conditions at about 25°C, at about one atmosphere of pressure, and at about 50% relative humidity. All numerical ranges are inclusive of narrower ranges; the upper and lower limits of the ranges described are combinable to form additional ranges not explicitly described.

[0006] The compositions of the present invention may comprise, consist essentially of, or consist of the essential components and optional ingredients described herein. As used herein, "consisting essentially of" means that the composition or component may include additional ingredients as long as the additional ingredients do not materially change the basic and novel characteristics of the claimed composition or method.

[0007] As used herein, "comprising" means that other steps and other ingredients which do not affect the end result can be added. The term encompasses the terms "consisting of" and "consisting essentially of."

[0008] As used herein, "mixture" is intended to include a simple combination of substances as well as any compounds that may result from their combination.

[0009] As used herein, "molecular weight" refers to weight average molecular weight, unless otherwise indicated.Molecular weight is measured using the industry standard method, gel permeation chromatography ("GPC").

[0010] Where content ranges are given, these should be understood to be the total amount of the ingredient in the composition, or where more than one material falls within an ingredient definition, the total amount of all ingredients in the composition that meet the definition.

[0011] Unless otherwise specified, all percentages, parts and ratios are based upon the total weight of the compositions of the present invention. All such weights as they pertain to listed ingredients are based on the active level, and, therefore, do not include carriers or by-products that may be included in commercially available materials.

[0012] Unless otherwise indicated, all component or composition levels are in terms of the active portion of that component or composition and are exclusive of impurities, for example, residual solvents or by-products, which may be present in commercially available sources of such component or composition.

[0013] It should be understood that each maximum numerical limit given throughout this specification includes each lower numerical limit, as if such lower numerical limits were expressly written herein. Each minimum numerical limit given throughout this specification will include each higher numerical limit, as if such higher numerical limits were expressly written herein. Each numerical range given throughout this specification will include each narrower numerical range falling within such wider numerical range, as if such narrower numerical ranges were all expressly written herein.

[0014] Scalp Care Actives

[0015] a) Pyridinethione or polyvalent metal salt of pyridinethione

[0016] In one embodiment, the present invention may comprise pyrithione or a polyvalent metal salt of pyrithione. Any form of polyvalent metal pyrithione salt may be used, including flake and needle structures. In one embodiment, salts useful herein include those formed by polyvalent metals magnesium, barium, bismuth, strontium, copper, zinc, cadmium, zirconium, and mixtures thereof, and in another embodiment, by zinc. In another embodiment, useful herein is the zinc salt of 1-hydroxy-2-thiopyridinium salt (referred to as "zinc pyrithione" or "ZPT"); in yet another embodiment, the ZPT is in the form of flake particles, wherein the particles have an average size of up to about 20 μm, and in one embodiment have an average size of up to about 5 μm, and in yet another embodiment have an average size of up to about 2.5 μm.

[0017] Pyrithione salt antimicrobial and anti-dandruff agents are described, for example, in U.S. Patent 2,809,971; U.S. Patent 3,236,733; U.S. Patent 3,753,196; U.S. Patent 3,761,418; U.S. Patent 4,345,080; U.S. Patent 4,323,683; U.S. Patent 4,379,753; and U.S. Patent 4,470,982.

[0018] When ZPT is used as the antimicrobial particle in the antimicrobial composition herein, additional benefits are further envisioned such that hair growth or regrowth may be stimulated or regulated or both stimulated and regulated, or hair loss may be reduced or inhibited, or hair may appear thicker or fuller.

[0019] Zinc pyrithione can be prepared by reacting 1-hydroxy-2-thiopyrithione (ie, pyrithione acid) or a soluble salt thereof with a zinc salt (eg, zinc sulfate) to form a zinc pyrithione precipitate as shown in US Pat. No. 2,809,971.

[0020] Embodiments include from about 0.01% to about 5% of pyrithione or a polyvalent metal salt of pyrithione; and from about 0.01% to about 5% of an iron chelator; and in one embodiment, from about 0.1% to about 2% of each.

[0021] In embodiments having pyrithione or a polyvalent metal salt of pyrithione, the ratio of iron chelator to pyrithione or a polyvalent metal salt of pyrithione may be in the range of 1:10 to 10:1.

[0022] b) Iron chelators

[0023] In the present invention, the iron chelator may have but is not limited to the following characteristics:

[0024] 1. Affinity for iron ions in the form of ferrous iron (Iron II) or ferric iron (III);

[0025] 2. The material of description 1 (above), which has a ligand denticity of 2 or more (ligand denticity is the number of molecular groups that bind to iron ions);

[0026] 3. Chemical description of the description 2 subsets:

[0027] a. Natural or synthetic (e.g. DFO, DFT) materials;

[0028] b. Materials of the following chemical categories:

[0029] i. Catechol and phenol

[0030] ii. Hydroxamate (deferoxamine (DFO))

[0031] iii. Thiohydroxamate

[0032] iv. Hydroxypyridone (CP20, octopirox, ciclopirox, HP-101)

[0033] v. Hydroxythiopyranone

[0034] vi. Hydroxypyrithione

[0035] vii. Aminocarboxylates (EDTA, DTPA)

[0036] viii. Pyridine (2,2'-bipyridine, 1,10-phenylphenol, TPEN)

[0037] ix. Hydroxycarboxylates

[0038] x. Aroylhydrazone (PIH)

[0039] xi. Hydroxyquinoline (8-hydroxyquinoline)

[0040] xii. Hydroxypyrone (maltol, ethyl maltol)

[0041] xiii. Hydroxythiopyranone

[0042] and molecules representing combinations of these chemical classes.

[0043] N-Hydroxy-6-octyloxypyridin-2(1H)one ethanolamine salt (HP-101) provided by Arch Chemicals, Inc. is a portion of N-hydroxypyridinone. N-Hydroxypyridinone has an alkyl ether substituent at the 6-position as a free acid, ethanolamine salt, and a metal salt such as zinc, N-Hydroxy-6-octyloxypyridin-2(1H)one zinc salt. The alkyl ether substituent has a length of 2-22 carbons and can be straight or branched.

[0044] For substances such as zinc salts of EDDHA and EDDHMA from Akzo-Nobel, the stoichiometric ratio of zinc to ligand may be 1:1 or 2:1. The chelating agents EDDHA and EDDHMA are intended to encompass all their isomeric forms. Non-limiting examples of chelating agents encompassed by the term EDDHA include o,o-EDDHA (ethylenediamine-N,N'-bis(2-hydroxyphenylacetic acid)) and o,p-EDDHA-ethylenediamine-N-(2-hydroxyphenylacetic acid)-N'-(4-hydroxyphenylacetic acid), and examples of chelating agents EDDHMA include o,o-EDDHMA-ethylenediamine-N,N'-bis(2-hydroxy-4-methylphenylacetic acid) and o,o'-EDDHMA-ethylenediamine-N-(2-hydroxy-4-methylphenylacetic acid)-N'-(2-hydroxy-6-methylphenylacetic acid).

[0045] c) 2-Pyridinol-N-oxide materials

[0046] 2-pyridinol-N-oxide materials suitable for use in the present invention include substituted or unsubstituted 2-pyridinol-N-oxide materials or salts thereof. Tautomers of the material, such as 1-hydroxy-2 (1H)-pyridone, are included within the scope of the present invention. Substituted or unsubstituted 2-pyridinol-N-oxide materials and their corresponding tautomeric forms 1-hydroxy-2 (1H)-pyridone are shown below:

[0047]

[0048] Where R 1 , R 2 , R 3 , R 4 The groups are independently selected from H, Cl, Br, I, F, NO, NO2 and (CH2) n G, wherein each G is independently selected from (O) m SO3M3 、(O) m CO2M 3 、(O) m C(O)(R 5 )、(O) m C(O)N(R 5 R 6 )、(O) m CN, (O) m (R 5 ) and N(R 5 R 6 ), wherein m is 0 or 1, n is an integer from 0 to 4, R 5 and R 6 are independently selected from H and substituted or unsubstituted C1-C 12 organic group, and M 3 is selected from H, substituted or unsubstituted C1-C 12 Organic groups, + N(R 7 R 8 R 9 R 10 ) and 1 / q M' q+ , wherein M' is selected from an alkali metal with a charge q and an alkaline earth metal with a charge q, wherein R7, R8, R9 and R10 are independently selected from H and substituted or unsubstituted C1-C 12 An organic group, and any pair of adjacent groups R 1 With R 2 , R 2 With R 3 , R 3 With R 4 can be combined together to form a radical optionally selected from Cl, Br, I, F, NO, NO2, CN, (CH2) n G, and mixtures thereof, and another five- or six-membered aromatic or aliphatic ring substituted with one or more groups selected from the group consisting of (C1-C 12 )alkyl, (C2-C 12 )alkenyl and (C2-C 12 ) alkynyl. The organic group may optionally be substituted, and suitable substituents include hydroxyl groups, carboxyl groups and amino groups. 2-pyridinol-N-oxide is also known as, for example, 2-hydroxypyridine-N-oxide, 2-pyridinol-1-oxide, or 2-hydroxypyridine-1-oxide.

[0049] In certain aspects, the 2-pyridinol-N-oxide material is a 2-pyridinol-N-oxide material according to the above formula, or a tautomer thereof, wherein R 1 , R 2 , R 3 , R4 Independently selected from H, Cl and (CH2) n G, wherein G is independently selected from (O) m SO3M 3 、(O) m CO2M 3 、(O) m C(O)(R 5 )、(O) m CN and (O) m (R 5 ), wherein m is 0 or 1. In other aspects, the 2-pyridinol-N-oxide material is a 2-pyridinol-N-oxide material according to the above formula, wherein R 1 , R 2 , R 3 , R 4 Independently selected from H, SO3M 3 and CO2M 3 In other respects, R 1 , R 2 , R 3 , R 4 Independently selected from H, SO3M 3 and CO2M 3 , of which no more than one R 1 , R 2 , R 3 , R 4 For SO3M 3 or CO2M 3 .

[0050] In certain aspects, the 2-pyridinol-N-oxide material is a salt of a substituted or unsubstituted 2-pyridinol-N-oxide material. In these aspects, the hydrogen of the hydroxyl group in the 2-pyridinol-N-oxide material can be replaced by a suitable charge-balancing cation. In these aspects, non-limiting examples of cations replacing hydrogen include Na, Li + , K + , 1 / 2Mg 2+ or 1 / 2Ca 2+ , substituted ammonium (such as C1-C6 alkanolammonium, monoethanolamine (MEA), triethanolamine (TEA), diethanolamine (DEA)), or any mixture thereof. In certain aspects, in solution, the cation can dissociate with the 2-pyridinol-N-oxide or 1-hydroxy-2(1H)-pyridone anion.

[0051] In certain aspects, the 2-pyridinol-N-oxide material is a substituted or unsubstituted 2-pyridinol-N-oxide material. Salts useful herein include those formed from the multivalent metals barium, bismuth, strontium, copper, zinc, cadmium, zirconium, and mixtures thereof.

[0052] In some aspects, the 2-pyridinol-N-oxide material is selected from: 6-hydroxy-3-pyridinesulfonic acid, 1-oxide (CAS 191672-18-1); 2-pyridinol-1-oxide (CAS 13161-30-3); 2-hydroxy-4-pyridinecarboxylic acid, 1-oxide (CAS 13602-64-7); 5-ethoxy-2-pyridinol, 2-acetate, 1-oxide (CAS 51984-49-7); 1-(3-hydroxy-2-oxo-4-isoquinolinyl)-ethanone (CAS 65417-65-4); 6-hydroxy-3-pyridinecarboxylic acid, 1-oxide (CAS 90037-89-1); 2-methoxy-4-quinolinecarbonitrile, 1-oxide (CAS 379722-76-6); 2-pyridinecarboxylic acid, 6-hydroxy-, 1-oxide (CAS 1094194-45-2); 3-pyridinecarboxylic acid, 2-hydroxy-, 1-oxide (CAS 408538-43-2); 2-pyridinol, 3-nitro-, 1-oxide (CAS 282102-08-3); 3-pyridinepropionitrile, 2-hydroxy-, 1-oxide (193605-60-6); 3-pyridineethanol, 2-hydroxy-, 3-acetate, 1-oxide (CAS 193605-56-0); 2-pyridinol, 4-bromo-, 1-oxide (CAS 170875-41-9); 2-pyridinol, 4,6-dibromo-, 2-acetate, 1-oxide (CAS 170875-40-8); 2-pyridinol, 4,6-dibromo, 1-oxide (CAS 170875-38-4); 2-pyridinol, 4-(2-aminoethyl)-, 1-oxide (CAS 154403-93-7); 2-pyridinol, 5-(2-aminoethyl)-, 1-oxide (CAS 154403-92-6); 3-pyridinepropionic acid, α-amino-6-hydroxy-, 1-oxide (CAS 134419-61-7); 2-pyridinol, 3,5-dimethyl, 1-oxide (CAS 102074-62-4); 2-pyridinol, 3-methyl-, 1-oxide (CAS 99969-07-0); 2-pyridinol, 3,5-dinitro, 1-oxide (CAS 98136-47-1); 2-pyridinol, 3,5-dibromo-, 1-oxide (CAS 98136-29-9); 2-pyridinol, 4-methyl-6-(2-methylpropyl)-, 1-oxide (CAS 91408-77-4); 2-pyridinol, 3-bromo-4,6-dimethyl-, 1-oxide (CAS 91408-76-3); 2-pyridinol, 4,5,6-trimethyl-, 1-oxide (CAS 91408-75-2); 2-pyridinol, 6-heptyl-4-methyl-, 1-oxide (CAS 91408-73-0);2-Pyridinol, 6-(cyclohexylmethyl)-4-methyl-, 1-oxide (CAS 91408-72-9); 2-Pyridinol, 6-bromo-, 1-oxide (CAS 89284-00-4); 2-Pyridinol, 5-bromo-, 1-oxide (CAS 89283-99-8); 2-Pyridinol, 3,5-dichloro-4,6-difluoro-, 1-oxide (CAS 33693-37-7); 2-Pyridinol, 3,4,5,6-tetrachloro-, 1-oxide (CAS 32835-63-5); 2-Pyridinol, 6-methyl-, 1-oxide (CAS 14420-62-3); 2-Pyridinol, 5-nitro-, 1-oxide (CAS 14396-03-3); 2-pyridinol, 4-methyl-5-nitro-, 1-oxide (CAS 13602-77-2); 2-pyridinol, 4-chloro-5-nitro-, 1-oxide (CAS 13602-73-8); 2-pyridinol, 4-chloro-, 1-oxide (CAS 13602-65-8); 2-pyridinol, 4-nitro-, 1-oxide (CAS13602-63-6); and 2-pyridinol, 4-methyl-, 1-oxide (CAS 1952-64-3), and mixtures thereof. These materials are commercially available, for example, from Sigma-Aldrich (St. Louis, MO) and / or Aces Pharma (Branford, CT). ;

[0053] In certain aspects, the 2-pyridinol-N-oxide material is a 2-pyridinol-N-oxide material selected from the following: 2-hydroxypyridine-1-oxide; 3-pyridinecarboxylic acid, 2-hydroxy-, 1-oxide; 6-hydroxy-3-pyridinecarboxylic acid, 1-oxide; 2-hydroxy-4-pyridinecarboxylic acid, 1-oxide; 2-pyridinecarboxylic acid, 6-hydroxy-, 1-oxide; 6-hydroxy-3-pyridinesulfonic acid, 1-oxide; and mixtures thereof.

[0054] In certain aspects, the 2-pyridinol-N-oxide material is a 1-hydroxy-2(1H)-pyridone material selected from the following: 1-hydroxy-2(1H)-pyridone (CAS 822-89-9); 1,6-dihydro-1-hydroxy-6-oxo-3-pyridinecarboxylic acid (CAS 677763-18-7); 1,2-dihydro-1-hydroxy-2-oxo-4-pyridinecarboxylic acid (CAS 119736-22-0); 1,6-dihydro-1-hydroxy-6-oxo-2-pyridinecarboxylic acid (CAS 94781-89-2); 1-hydroxy-4-methyl-6-(2,4,4-trimethylpentyl)-2(1H)-pyridone (CAS 50650-76-5); 6-(cyclohexylmethyl)-1-hydroxy-4-methyl-2(1H)-pyridone (CAS 29342-10-7); 1-hydroxy-4,6-dimethyl-2(1H)-pyridone (CAS 29342-02-7); 1-hydroxy-4-methyl-6-(2,4,4-trimethylpentyl)-2-pyridone monoethanolamine (CAS 68890-66-4); 1-hydroxy-6-(octyloxy)-2(1H)-pyridone (CAS 162912-64-3); 1-hydroxy-4-methyl-6-cyclohexyl-2-pyridone ethanolamine salt (CAS 41621-49-2); 1-hydroxy-4-methyl-6-cyclohexyl-2-pyridone (CAS 29342-05-0); 6-ethoxy-1,2-dihydro-1-hydroxy-2-oxo-4-pyridinecarboxylic acid, methyl ester (CAS 36979-78-9); 1-hydroxy-5-nitro-2(1H)-pyridone (CAS 45939-70-6); and mixtures thereof. These materials are commercially available from, for example, Sigma-Aldrich (St. Louis, MO), Princeton Building Blocks (Monmouth Junction, NJ), 3B Scientific Corporation (Libertyville, IL), SynFine Research (Richmond Hill, ON), Ryan Scientific, Inc. (Mt. Pleasant, SC), and / or Aces Pharma (Branford, CT).

[0055] In certain aspects, the 2-pyridinol-N-oxide material is a 2-pyridinol-N-oxide material according to the formula:

[0056]

[0057] wherein X is an oxygen or sulfur moiety and R is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms. Such materials can be synthesized according to the procedure disclosed in US Pat. No. 5,675,013.

[0058] In certain aspects, the 2-pyridinol-N-oxide material is a 2-pyridinol-N-oxide material according to the formula:

[0059]

[0060] wherein R' and R" are independently hydrogen or a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms. Such materials can be synthesized according to the procedures disclosed in US 5,675,013. In certain aspects, the 2-pyridinol-N-oxide material is 1-hydroxy-4-methyl-6-(2,4,4-trimethylpentyl)-2-pyridone monoethanolamine salt.

[0061] In the present invention, the personal care composition may contain from about 0.1% to about 10% of a substituted or unsubstituted 2-pyridinol N-oxide material; from about 0.1% to about 4% octopirox olamine; from about 0.3% to about 3% of a substituted or unsubstituted 2-pyridinol N-oxide material; and from about 0.5% to about 2% of a substituted or unsubstituted 2-pyridinol N-oxide material.

[0062] In the present invention, applying a composition comprising an antimicrobial active, which may include an antifungal active or an anti-dandruff active, and a chelating agent to the scalp or skin, followed by exposure to the skin or scalp with electromagnetic radiation corresponding to the ultraviolet visible spectrum at a wavelength of 350nm to 500nm can provide excellent efficacy, with the additional benefit of stimulating or regulating or both stimulating and regulating hair growth or regeneration, or reducing or inhibiting hair loss, or making the hair appear thicker or fuller.

[0063] Fungal Growth Susceptibility Test

[0064] Cells are grown in a selected medium (usually a medium that requires respiration). For Malassezia furfur, the medium is modified Dixon medium (mDixon) (per liter: 36 g malt extract (Difco 0186-17), 20 g ox bile (provided by American Laboratories, Inc. of Omaha, Nebraska with batch number 03130792), 10 ml Tween 40 (Aldrich 27435-6), 6 g peptone (Difco 0118-17), 2 mL oleic acid (Baker 2114-01), and 2 mL glycerol (Sigma G-7893)). [Candida and YPG, Saccharomyces and YNB (without amino acids), to which we added 40 μg / ml uracil, histidine and methionine, and 130 μg / ml leucine and 2% ethanol and 0.1% yeast extract, respectively.] Conventional culture media can also be used for other microorganisms. The starting culture is prepared as follows: a fresh overnight culture that is not in the logarithmic phase is diluted 1:100 and incubated in a 250 mL shake flask (Corning, 431144) with 20 mL of culture medium at 31°C with shaking at 200 rpm-250 rpm for about 3 hours to ensure that the cells have returned to the growth phase. At this time, the test agent is added to the flask to provide the final concentration for the test. The cells are cultured with the test agent for 1 hour. At this time, the cells typically have an OD in the range of 0.25 to 0.8 at 600 nm. Generally, we isolated 2.5 OD*mL of cells calculated by dividing the desired OD*mL by the OD600 of the cells. These culture samples were centrifuged at 3200 rpm at room temperature (Beckman Coulter Allegra TM6KR centrifuge) for 10 minutes to precipitate cells. Pour out the supernatant, and invert the test tube on a folded paper towel to drain the remaining culture medium. Add 2.5 ml of PBS (Gibco, pH 7.4, without magnesium chloride or calcium chloride, 14190-144) and resuspend the cells. 1mL of cells are transferred to each of two 12-well plates (Falcon, polystyrene, 353043). One plate is stored in the dark, while the other plate is exposed to light with the plate covered on the plate. An exposure range of 10 minutes to 15 minutes is usually used, but optionally, the test has successfully tested longer and shorter times. When the light exposure is completed, the sample is mixed by slow vortexing or pipetting, and 0.65mL of each sample is transferred to 13mL of culture medium for shaking growth overnight at 31°C. The next morning, usually 18 hours later, the OD at 600nm is determined. Successful materials are those that show at least 50% growth reduction relative to dark samples after light exposure.

[0065] Fractional Inhibitor Concentration (FIC)

[0066] Fractional Inhibitor Concentration (FIC) is a common method used to evaluate the interaction of two antimicrobial chemicals. This is an effective method to show that the effect of using a combination of two treatments exceeds the effect expected by adding the effects of the individual treatments together (i.e., synergistic). In one embodiment of the present invention, FIC is used to determine the combined effect of a chemical and exposure to light on the growth and / or viability of Malassezia furfur in an in vitro system.

[0067] I. Method Overview :

[0068] 1. M. furfur CBS 7982 cells were exposed to different concentrations of antimicrobial active substances (eg ZPT, octopirox olamine) for a specified amount of time (eg 2 minutes to 3 hours).

[0069] 2. After exposure, the antimicrobial agent is washed away by centrifugation of the cells and a series of washes.

[0070] 3. The cells were then exposed to 409nm wavelength light for different lengths of time

[0071] 4. The cells are then grown overnight (eg 17 h) to determine the effect of the treatment on the viability and growth of the organism by measuring OD600.

[0072] II. Data Analysis :

[0073] 1. Growth inhibition was determined when the OD value obtained was ≤50% of the untreated control.

[0074] 2. Determine the minimum concentration of antimicrobial agent that inhibits growth

[0075] 3. Likewise, determine the shortest exposure time that provides growth inhibition

[0076] 4. Finally, determine the lowest concentration of antimicrobial agent combined with the shortest exposure time that provides growth inhibition

[0077] 5. Determine the FIC value using the following calculation:

[0078]

[0079] 6. Classify the combined effects of antimicrobial agents and light according to the following table:

[0080]

[0081] result

[0082] S. cerevisiae were exposed to light from an LED flash lamp of the indicated wavelengths as well as a painter's lamp / work lamp commonly found in hardware stores that provides a broad spectrum of wavelengths of light. The yeast had been pre-treated as indicated prior to light exposure.

[0083] Table 1

[0084] a. Effects of light and ZPT on S. cerevisiae BY4741 grown in YNB ethanol for 17 h

[0085]

[0086] Table 1 shows that ZPT-treated S. cerevisiae became sensitive to a flash light of 395 nm, but insensitive to the other two wavelengths of light.

[0087] Table 2

[0088] Malassezia furfur was incubated for 20 minutes under specified treatment conditions. Cell pellets were collected after centrifugation to remove most of the antifungal material. Cell pellets were suspended in PBS and treated with light (409nm, 1100 foot candles) for 10 minutes or stored in the dark for 10 minutes. The sample was then diluted to mDixon and subsequently grown by OD600nm indication.

[0089]

[0090]

[0091] Table 2 shows that, in the absence of light exposure, M. furfur showed some growth inhibition with ZPT treatment at 16 ppm to 32 ppm in the original flasks. Light had little effect on yeast that had not been previously treated with ZPT or octopirox. With increasing light, there was considerable growth inhibition by previous treatment with ZPT or octopirox.

[0092] Table 3

[0093] Malassezia furfur was incubated one hour with the hydroxymethyl octopirox olamine of indicated concentration, then by the cell pellet of 4OD*mL of centrifugal collection, most of antifungal materials were removed.Cell pellet was suspended in 4.2mLPBS, and 1mL sample was distributed in four 12-well plates, processed with light (409nm, 1200fc) for 1 minute, 10 minutes or 60 minutes or stored in the dark.As previously mentioned, 600uL diluted to 13mL mDixon and 50uL photolysis cell treatment samples diluted to 50uL mDixon were used, and three 40uL+360uL mDixon diluents were prepared. They were distributed on duplicate mDixon agar plates, and one group is shown in Table 3.

[0094]

[0095]

[0096] Where + = continuous fungal lawn, + / - = lawn with breaks to allow agar visualization, - = 0 to 5 colonies

[0097] Table 3 shows the experiment under 0 minute, 1 minute, 10 minutes and 60 minutes illumination using the oxymetazoline ethanolamine of 0ppm, 8ppm, 16ppm and 32ppm dosage.In this experiment, 8ppm original peptone ethanolamine does not keep Malassezia furfur overnight growth in the original sample, but 16ppm and 32ppm do.After photolysis, 0.6mL is added to 13mL fresh mDixon and grown overnight, but in addition, 50uL is added to 50uL mDixon, then the sample is diluted 3 times again, 40uL=>400uL, and each dilution of 10uL is plated in duplicate on mDixon agar plate.Plate shows that light has no effect on the control group without oxymetazoline ethanolamine, and has no effect for 8ppm oxymetazoline ethanolamine, however, 16ppm and 32ppm show that viable cells are less about 10 times, and light exposure is 1 minute, and longer exposure time shows that cells are less about 100 times.

[0098] Table 4

[0099] The enhancement of light exposure to oxime olamine was also observed in Candida albicans. Candida albicans cells were exposed to different concentrations of oxime olamine (as shown in the top row of the table) and then exposed to 409nm light for 15 minutes. The cells were then diluted as shown in the left column and inoculated on a plate. The resulting growth was then scored as described above. As can be seen from Table 4, in the case of 12ppm and 24ppm doses of oxime olamine, the addition of light resulted in complete inhibition of growth. The data show that the combination of light and iron chelators is a feasible method in various types of yeast and fungi.

[0100]

[0101] Table 5.

[0102] Dependence of photosensitivity on wavelength. Fresh overnight cultures were diluted 100-fold and grown for 3 hours to an OD of 0.16. M. furfur was treated at the indicated doses and incubated for an additional three hours. Cells were harvested by centrifugation, suspended in PBS, and exposed to an LED array at the indicated wavelength. Illumination was performed with 1200 foot candles for ten minutes. The cultures were then grown overnight in mDixon. N=1.

[0103]

[0104] Table 5 shows that photosensitivity of ZPT and octopirox olamine to the LED array of 409 nm light was observed, but photosensitivity to the LED array of 520 (green) and 595 (yellow) light was not observed.

[0105] Table 6.

[0106] The combination of ZPT and illumination demonstrates synergistic interaction. Malassezia furfur was incubated with different concentrations of ZPT for three hours. Cell pellets were collected by centrifugation so that most of the antifungal material was removed. Cell pellets were suspended in PBS, and 500uL samples were distributed in four 12-well plates, processed with light (409nm) for 2 minutes, 10 minutes or 60 minutes or stored in the dark. Then the samples were diluted in mDixon, incubated for 16 hours, and then measured growth by OD 600nm.

[0107]

[0108] As shown in the data in Table 6, the lowest concentration of ZPT that conferred growth inhibition was 10 ppm. The shortest length of light exposure to produce growth inhibition was >60 minutes. When applied in combination to provide growth inhibition, the lowest concentration and shortest light exposure time were 2.5 ppm and 2 minutes, respectively. Using the above formula, an FIC value of 0.28 was calculated. An FIC value of ≤0.5 indicates a synergistic effect, so the combination of ZPT and light is synergistic.

[0109] Table 7.

[0110] The combination of octopirox and illumination also shows synergistic interaction. Malassezia furfur was incubated with octopirox of varying concentrations for one hour. By centrifugal collection of cell pellets, most of the antifungal materials were removed. Cell pellets were suspended in PBS, and 500uL samples were distributed in four 12-well plates, processed with light (409nm) for 1 minute, 10 minutes or 60 minutes or stored in the dark. Then the sample was diluted in mDixon, incubated for 16 hours, and then measured growth by OD 600nm.

[0111]

[0112] As shown in the data in Table 7, the lowest concentration of hydroxymethyl octopirox olamine that conferred growth inhibition was 64ppm. The shortest length of time for light exposure to produce growth inhibition was>60 minutes. When combined to provide growth inhibition, the lowest concentration and the shortest light exposure time were 8ppm and 1min, respectively. Using the above formula, an FIC value of 0.14 was calculated. An FIC value of ≤0.5 indicates a synergistic effect, so the combination of hydroxymethyl octopirox olamine and light is a synergistic effect.

[0113] Table 8

[0114] The combination of cypermethrin and illumination also shows synergistic interaction. Malassezia furfur was incubated with cypermethrin of varying concentrations for one hour. By centrifugal collection of cell pellets, most of the antifungal materials were removed. The cell pellets were suspended in PBS, and 500uL samples were distributed in four 12-well plates, processed with light (409nm) for 1 minute, 10 minutes or 60 minutes or stored in the dark. Then the sample was diluted in mDixon, incubated for 27 hours, and then measured growth by OD 600nm.

[0115]

[0116] As shown in the data in Table 8, the lowest concentration of cypermethrin that conferred growth inhibition was >96 ppm. The shortest length of light exposure to produce growth inhibition was >60 minutes. When applied in combination to provide growth inhibition, the lowest concentration and shortest light exposure time were 6 ppm and 1 min, respectively. Using the above formula, an FIC value of 0.08 was calculated. An FIC value of ≤0.5 indicates a synergistic effect, so the combination of cypermethrin and light is a synergistic effect.

[0117] Table 9

[0118] The combination of HPNO (2-hydroxypyridine N-oxide) and illumination also shows synergistic interaction. Malassezia furfur was incubated with HPNO of varying concentrations for one hour. Cell pellets were collected by centrifugation so that most of the antifungal materials were removed. Cell pellets were suspended in PBS, and 500uL samples were distributed in four 12-well plates, processed with light (409nm) for 1 minute, 10 minutes or 60 minutes or stored in the dark. Then the sample was diluted in mDixon, incubated for 23 hours, and then measured growth by OD 600nm.

[0119]

[0120] As shown in the data in Table 9, the lowest concentration of HPNO that conferred growth inhibition was >480 ppm. The shortest length of light exposure to produce growth inhibition was >60 minutes. When applied in combination to provide growth inhibition, the lowest concentration and shortest light exposure time were 60 ppm and 1 min, respectively. Using the above formula, an FIC value of 0.14 was calculated. An FIC value of ≤0.5 indicates a synergistic effect, so the combination of HPNO and light is a synergistic effect.

[0121] Table 10

[0122] Protoporphyrin IX levels increase due to exposure to iron chelators. It is assumed that the molecular basis for the increased sensitivity to light at about 400nm after exposure to various iron chelators is due to the increased level of protoporphyrin IX (PPIX). As shown in Table 10, treatment of Malassezia furfur cells with increased concentrations of octopirox or ZPT causes an increase in PPIX levels, as measured by HPLC. PPIX absorbs light within the range of 400nm, and when light is absorbed, PPIX is converted into an excited triplet state that can react with triplet oxygen to generate singlet oxygen, or the excited porphyrin can generate ROS by a single electron process. These reactive species cause cell viability loss. This emphasizes the importance of the wavelength of light, which is important for seeing the synergistic beneficial effects of light and chelators.

[0123]

[0124] Table 11

[0125] Not all antifungals show synergy with light exposure. M. furfur cells were exposed to other antifungals that are not considered chelators (i.e., selenium sulfide (SeSx), sulfur, climbazole, and terbinafine). After treatment, the cells were then exposed to light, or not exposed to light. OD was measured to measure growth and to measure PPIX levels. As shown in the OD values ​​in Table 11, adding light to treatment with these non-chelating antifungals did not increase their efficacy. This can be partially explained by the fact that these antifungals do not act by a mechanism that increases PPIX levels, as seen in Table 11, PPIX levels do not change when treated with these antifungals.

[0126]

[0127] In the present invention, the method for treating the skin and scalp can be achieved by the following steps:

[0128] a. applying a composition to the scalp or skin, the composition comprising a scalp care active agent selected from the group consisting of: metal salts of pyrithione, octopirox olamine, one or more iron chelators having an AlogP value greater than or equal to 0.4, and mixtures thereof;

[0129] b. Exposing the scalp and skin to a wavelength of about 350 nm to about 500 nm, or 380 nm to about 450 nm; or about 400 nm to about 425 nm and about 0.1 mW / cm 2 About 1000 mW / cm 2 ; or about 0.3 mW / cm 2 About 200 mW / cm 2 ; or about 0.5 mW / cm 2 About 75 mW / cm 2 Electromagnetic radiation of a power of 1000 nm and lasting for a period of about 2 seconds to about 5 minutes; or about 10 seconds to about 2 minutes, or about 10 seconds to about 10 minutes; or about 2 seconds to about 15 minutes; or about 2 seconds to about 30 minutes.

[0130] Wherein the method results in at least a 50% reduction in fungal growth compared to a dark sample as measured by a fungal growth susceptibility test.

[0131] Non-limiting examples of a source of electromagnetic radiation applied to the scalp or skin may be a hat, cap, comb, brush, or wand.

[0132] Detergent surfactant

[0133] The present invention can be in the form of a shampoo, conditioner, or leave-on treatment. Shampoo compositions may contain one or more detersive surfactants that provide cleaning properties to the composition. The one or more detersive surfactants, in turn, may include anionic surfactants, amphoteric surfactants, or zwitterionic surfactants, or mixtures thereof. Various examples and descriptions of detersive surfactants are shown in U.S. Pat. No. 6,649,155; U.S. Patent Application Publication No. 2008 / 0317698; and U.S. Patent Application Publication No. 2008 / 0206355, which are incorporated herein by reference in their entirety.

[0134] The concentration of the detersive surfactant component in the shampoo composition should be sufficient to provide the desired cleaning and foaming performance, and generally ranges from about 2% to about 50%, about 5% to about 30%, about 8% to about 25%, about 10% to about 20%, about 5%, about 10%, about 12%, about 15%, about 17%, about 18%, or about 20% by weight.

[0135] Suitable anionic surfactants for use in the composition are alkyl sulfates and alkyl ether sulfates. Other suitable anionic surfactants are water-soluble salts of organic sulfuric acid reaction products. Other suitable anionic surfactants are the reaction products of fatty acids esterified with isethionates and neutralized with sodium hydroxide. Other similar anionic surfactants are described in U.S. Pat. Nos. 2,486,921; 2,486,922; and 2,396,278, which are incorporated herein by reference in their entirety.

[0136] Exemplary anionic surfactants for use in shampoo compositions include ammonium lauryl sulfate, ammonium laureth sulfate, triethylamine lauryl sulfate, triethylamine laureth sulfate, triethanolamine lauryl sulfate, triethanolamine laureth sulfate, monoethanolamine lauryl sulfate, monoethanolamine laureth sulfate, diethanolamine lauryl sulfate, diethanolamine laureth sulfate, sodium lauric acid monoglyceride sulfate, sodium lauryl sulfate, laureth 3, The anionic surfactant may be sodium lauryl sulfate, potassium lauryl sulfate, potassium laureth sulfate, sodium lauryl sarcosinate, sodium lauroyl sarcosinate, lauryl sarcosine, cocoyl sarcosine, ammonium cocoyl sulfate, ammonium lauroyl sulfate, sodium cocoyl sulfate, sodium lauroyl sulfate, potassium cocoyl sulfate, potassium lauryl sulfate, triethanolamine lauryl sulfate, triethanolamine lauryl sulfate, monoethanolamine cocoyl sulfate, monoethanolamine lauryl sulfate, sodium tridecylbenzene sulfonate, sodium dodecylbenzene sulfonate, sodium cocoyl isethionate, and combinations thereof. The anionic surfactant may be sodium lauryl sulfate or sodium laureth sulfate.

[0137] Suitable amphoteric or zwitterionic surfactants for use in the shampoo compositions herein include those known for use in shampoos or other personal care cleansing. The concentration of such amphoteric surfactants ranges from about 0.5% to about 20% by weight, and from about 1% to about 10% by weight. Non-limiting examples of suitable zwitterionic or amphoteric surfactants are described in U.S. Pat. Nos. 5,104,646 and 5,106,609, which are incorporated herein by reference in their entirety.

[0138] Suitable amphoteric detersive surfactants for use in shampoo compositions include those surfactants broadly described as derivatives of aliphatic secondary and tertiary amines in which the aliphatic radical may be straight or branched chain and in which one of the aliphatic substituents contains from about 8 to about 18 carbon atoms and one aliphatic substituent contains an anionic group such as a carboxylate, sulfonate, sulfate, phosphate, or phosphonate. Exemplary amphoteric detersive surfactants for use in the shampoo compositions of the present invention include cocoamphoacetate, cocoamphodiacetate, lauroamphoacetate, lauroamphodiacetate, and mixtures thereof.

[0139] Suitable zwitterionic detersive surfactants for use in the shampoo compositions include those surfactants broadly described as derivatives of aliphatic quaternary ammonium, phosphonium and sulfonium compounds, wherein the aliphatic radical may be straight chain or branched, and wherein one of the aliphatic substituents contains from about 8 to about 18 carbon atoms and one aliphatic substituent contains an anionic group such as carboxyl, sulfonate, sulfate, phosphate or phosphonate. In addition, zwitterionized species such as betaines may be selected.

[0140] Non-limiting examples of other anionic, zwitterionic, amphoteric surfactants or optional additional surfactants suitable for use in the shampoo compositions are described in McCutcheon's Emulsifiers and Detergents, 1989 Annual, published by MC Publishing Co., and in U.S. Pat. Nos. 3,929,678; 2,658,072; 2,438,091; 2,528,378, the entireties of which are incorporated herein by reference.

[0141] The shampoo compositions may also comprise a shampoo gel base, an aqueous carrier, and other additional ingredients as described herein.

[0142] Aqueous carrier

[0143] The shampoo composition comprises a first aqueous carrier. Thus, the formulation of the shampoo composition may be in the form of a pourable liquid (under ambient conditions). Thus, such compositions will typically comprise a first aqueous carrier, which is present in an amount of at least 20% by weight, from about 20% by weight to about 95% by weight, or from about 60% by weight to about 85% by weight. The first aqueous carrier may comprise water, or a miscible mixture of water and an organic solvent, and in one aspect may comprise water and minimal or insignificant concentrations of organic solvents, except for those otherwise incidentally incorporated into the composition as minor ingredients of other components.

[0144] The first aqueous carrier that can be used in the shampoo composition comprises water and aqueous solutions of lower alkyl alcohols and polyols. The lower alkyl alcohols that can be used herein are monohydric alcohols having 1 to 6 carbons, in one aspect, ethanol and isopropanol. The polyols that can be used herein include propylene glycol, hexylene glycol, glycerol, and propane diol.

[0145] Second aqueous carrier

[0146] The conditioner gel matrix of the conditioner composition comprises a second aqueous carrier. Thus, the formulation of the conditioner composition may be in the form of a pourable liquid (under ambient conditions). Thus, such compositions will typically comprise a second aqueous carrier, which is present in an amount of from about 20% by weight to about 95% by weight, or from about 60% by weight to about 85% by weight. The second aqueous carrier may comprise water, or a miscible mixture of water and an organic solvent, and in one aspect may comprise water and a minimal or insignificant concentration of an organic solvent, except for those incidentally incorporated into the composition as trace ingredients of other components.

[0147] Second aqueous carriers that can be used in the conditioner composition include water and aqueous solutions of lower alkyl alcohols and polyols. The lower alkyl alcohols that can be used herein are monohydric alcohols having 1 to 6 carbons, in one aspect, ethanol and isopropanol. The polyols that can be used herein include propylene glycol, hexylene glycol, glycerol, and propane diol.

[0148] Additional components

[0149] The shampoo compositions, conditioner compositions and / or leave-in treatments described herein may optionally contain one or more additional components known for use in hair care or personal care products, provided that the additional components are physically and chemically compatible with the essential components described herein, or do not unduly impair product stability, aesthetics or performance. Such additional components are most typically those described in reference books such as the "CTFA Cosmetic Ingredient Handbook" Second Edition (The Cosmetic, Toiletries, and Fragrance Association, Inc. 1988, 1992). Individual concentrations of such additional components may range from about 0.001% to about 10% by weight based on the weight of the hair care composition.

[0150] Non-limiting examples of additional components for use in hair care compositions include conditioning agents, natural cationic deposition polymers, synthetic cationic deposition polymers, anti-dandruff agents, particulates, suspending agents, paraffins, propellants, viscosity modifiers, dyes, nonvolatile solvents or diluents (water soluble and water insoluble), pearlescent aids, foam boosters, additional surfactants or nonionic co-surfactants, pediculicides, pH adjusters, fragrances, preservatives, proteins, skin active agents, sunscreens, ultraviolet light absorbers, and vitamins.

[0151] 1. Conditioning agent

[0152] The hair care composition may contain one or more conditioning agents. Conditioning agents include materials used to provide specific conditioning benefits to the hair. Conditioning agents useful in the hair care compositions of the present invention generally include water-insoluble, water-dispersible, non-volatile liquids that form emulsified liquid particles. Suitable conditioning agents for use in the hair care compositions are those that are generally characterized as silicones, organic conditioning oils, or combinations thereof, or those that otherwise form liquid, dispersed particles in an aqueous surfactant matrix.

[0153] One or more conditioning agents are present at a level of from about 0.01 wt. % to about 10 wt. %, from about 0.1 wt. % to about 8 wt. %, and from about 0.2 wt. % to about 4 wt. % by weight of the composition.

[0154] Silicone Conditioning Agent

[0155] Compositions of the present invention may include one or more silicone conditioning agents. Examples of silicones include polydimethylsiloxane, polydimethylsiloxane alcohol, cyclic siloxane, methylphenyl polysiloxane, and modified silicones with various functional groups, such as amino groups, quaternary ammonium salt groups, aliphatic groups, alcohol groups, carboxylic acid groups, ether groups, epoxy groups, sugar or polysaccharide groups, fluorine-modified alkyl groups, alkoxy groups, or combinations of such groups. Such silicones may be soluble or insoluble in aqueous (or non-aqueous) product carriers. In the case of insoluble liquid silicones, polymers may be in emulsified form with a droplet size of about 10 nanometers to about 30 microns.

[0156] Organic conditioning ingredients

[0157] The conditioning agent of the composition of the present invention may also include at least one organic conditioning material such as oil or wax, alone or in combination with other conditioning agents such as the above-mentioned silicones. The organic material may be non-polymeric, oligomeric or polymeric. It may be in the form of an oil or wax and may be added in a pure formulation or in a pre-emulsified form. Some non-limiting examples of organic conditioning materials include, but are not limited to: i) hydrocarbon oils; ii) polyolefins; iii) fatty esters; iv) fluorinated conditioning compounds; v) fatty alcohols; vi) alkyl glucosides and alkyl glucoside derivatives; vii) quaternary ammonium compounds; viii) polyethylene glycols and polypropylene glycols having a molecular weight of up to about 2,000,000, including those with the CTFA names PEG-20 200, PEG-400, PEG-600, PEG-1000, PEG-2M, PEG-7M, PEG-14M, PEG-45M, and mixtures thereof.

[0158] Beneficial Agents

[0159] The hair care composition may also contain one or more additional benefit agents. Benefit agents include materials selected from the group consisting of anti-dandruff agents, antifungal agents, anti-itch agents, antibacterial agents, antimicrobial agents, moisturizers, antioxidants, vitamins, fat-soluble vitamins, fragrances, whitening agents, enzymes, sensates, insect attractants, dyes, pigments, bleaching agents, and mixtures thereof.

[0160] The hair care compositions of the present invention may be in the form of typical hair care formulations. They may be in the form of solutions, dispersions, emulsions, powders, talcs, encapsulations, spheres, sponges, solid dosage forms, foams, and other delivery mechanisms. The compositions of the present invention may be hair tonics, leave-in hair products such as treatments, and styling products, rinse-off hair products such as shampoos, and treatment products; and any other form that may be applied to the hair.

[0161] Hair care compositions are generally prepared by conventional methods, such as methods known in the art for preparing compositions. Such methods generally include mixing the ingredients to a relatively homogeneous state in one or more steps, with or without heating, cooling, application of vacuum, etc. The composition is prepared so as to optimize stability (physical stability, chemical stability, photostability) and / or delivery of active materials. The hair care composition may be a single phase or single product, or the hair care composition may be separate phases or separate products. If two products are used, the products may be used together simultaneously or sequentially. Sequential use may occur over a short period of time, such as immediately after use of one product, or it may occur over a period of time exceeding several hours or days.

[0162] The dimensions and values ​​disclosed herein are not to be understood as being strictly limited to the exact numerical values ​​cited. Instead, unless otherwise indicated, each such dimension is intended to represent the stated value and a functionally equivalent range around that value. For example, a dimension disclosed as "40 mm" is intended to mean "about 40 mm".

[0163] Unless expressly excluded or otherwise limited, each document cited herein, including any cross-referenced or related patent or patent application and any patent application or patent to which this application claims priority or the benefit of, is hereby incorporated by reference in its entirety. The citation of any document is not an admission that it is prior art to any of the present invention disclosed or claimed herein, or an admission that it, by itself or in combination with any one or more of the references, proposes, suggests, or discloses any such invention. In addition, to the extent that any meaning or definition of a term in this invention conflicts with any meaning or definition of the same term in a document incorporated by reference, the meaning or definition assigned to that term in this invention shall govern.

[0164] Although specific embodiments of the present invention have been illustrated and described, it will be apparent to those skilled in the art that various other changes and modifications may be made without departing from the spirit and scope of the present invention. Therefore, it is intended that all such changes and modifications within the scope of the present invention be covered in the appended claims.

Claims

1. A method for treating skin for non-disease treatment purposes, comprising: a. applying a composition to the skin, the composition comprising a scalp care active selected from the group consisting of: 0.1-10% of 2-pyridinol-N-oxide, 0.10-5% of pyrithione or a polyvalent metal salt of pyrithione, 0.1% to 4% of octopirox olamine, and mixtures thereof; b. Exposing the skin to radiation having a wavelength of 409 nm to 425 nm and 0.1 mW / cm 2 Up to 1000 mW / cm 2 Power electromagnetic radiation and lasts for a period of 10 seconds to 2 minutes; wherein the antimicrobial treatment results in at least a 50% reduction in fungal growth compared to a dark colored sample as measured by a fungal growth susceptibility test.

2. The method of claim 1, wherein the method further comprises rinsing the composition from the skin with water.

3. The method of claim 1, wherein the method comprises leaving the composition on the skin.

4. The method of claim 1 or 2, wherein the composition comprises an aqueous carrier.

5. The method according to claim 1 or 2, wherein the power is 0.3 mW / cm 2 Up to 200 mW / cm 2 .

6. The method according to claim 1 or 2, wherein the power is 0.5 mW / cm 2 Up to 75 mW / cm 2 .

7. The method according to claim 1, 2 or 3, wherein the skin is the scalp.

8. A kit comprising a composition comprising a scalp care active selected from the group consisting of: 0.1-10% 2-pyridinol-N-oxide, 0.10-5% pyrithione or a polyvalent metal salt of pyrithione, 0.1% to 4% octopirox olamine, and mixtures thereof; and an electromagnetic radiation source having a wavelength of 409 nm to 425 nm and an intensity of 0.1 mW / cm 2 Up to 1000 mW / cm 2 and for a period of time of 10 seconds to 2 minutes; wherein the antimicrobial treatment results in at least a 50% reduction in fungal growth compared to the dark sample as measured by a fungal growth susceptibility test.

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