Transport equipment, transport method and transport system

Abstract

The transport equipment includes a plurality of robots and a mobile buffer. The plurality of robots are fixed in a transport chamber having a reduced pressure atmosphere and transport substrates, and the transport chamber includes a side wall provided with a plurality of processing chambers arranged in a horizontal orientation. The mobile buffer is capable of holding the substrate and moving along a track along the arrangement direction of the processing chambers. The robot includes a first robot and a second robot. The first robot is fixed to a load lock chamber and a processing chamber closest to the load lock chamber, i.e., a first processing chamber, and a position where the first robot can transport the substrate. The second robot is fixed to a position where the second robot can exchange substrates with at least one second processing chamber different from the first processing chamber. The mobile buffer moves between the side wall and the robot in a top view, and passes through a position where the first robot and the substrate are exchangeable and a position where the second robot and the substrate are exchangeable.

Description

Technical Field

[0001] The present disclosure relates to a conveying device, a conveying method and a conveying system. Background Art

[0002] Conventionally, there is known a transfer apparatus in which a robot having a hand for transferring a substrate is provided in a transfer chamber having a reduced pressure atmosphere, and the substrate is transferred to a processing chamber provided on a side wall of the transfer chamber.

[0003] For example, a substrate processing device has been proposed in which a substrate is transported to a plurality of processing chambers provided on a side wall of a transport chamber by a movable robot that moves in the transport chamber by being driven by a linear motor (see, for example, Patent Document 1).

[0004] Prior art literature

[0005] Patent Literature

[0006] [Patent Document 1] Japanese Unexamined Patent Publication No. 2008-028179 Summary of the invention

[0007] Technical Problems to be Solved by the Invention

[0008] However, in the above-mentioned related art, there is a concern that since the robot is a movable robot, the cost may increase, and the usability may be reduced due to the complicated moving mechanism. Since the reduction in usability leads to a reduction in substrate transfer efficiency, there is room for improvement from the viewpoint of improving the substrate transfer efficiency before and after processing.

[0009] An advantage of one aspect of an embodiment is to provide a transfer device, a transfer method, and a transfer system capable of improving substrate transfer efficiency.

[0010] Solution to the problem

[0011] The conveying equipment embodiment includes a plurality of robots and a mobile buffer. The plurality of robots are fixed in a conveying chamber with a reduced pressure atmosphere and convey substrates. The conveying chamber includes a side wall having a plurality of processing chambers arranged in a horizontal orientation. The mobile buffer is configured to hold the substrate and move along a track along the arrangement direction of the plurality of processing chambers. The robot includes a first robot and a second robot. The first robot is fixed at a position suitable for moving the substrate into and out of the load lock chamber and the first processing chamber. The first processing chamber is the processing chamber closest to the load lock chamber among the plurality of processing chambers. The second robot is fixed at a position suitable for moving the substrate into and out of at least one second processing chamber different from the first processing chamber in the plurality of processing chambers. The mobile buffer is configured to move between the side wall and the robot in a top view and pass through a position suitable for moving the substrate into and out of the first robot and a position suitable for moving the substrate into and out of the second robot.

[0012] A conveying method according to one aspect of an embodiment uses a plurality of robots and a mobile buffer. A plurality of robots are fixed in a conveying chamber having a reduced pressure atmosphere and convey substrates. The conveying chamber includes a side wall having a plurality of processing chambers arranged in a horizontal orientation. The mobile buffer is configured to hold the substrate and move along a track along the arrangement direction of the processing chambers. The robot includes a first robot and a second robot. The first robot is fixed at a position suitable for moving the substrate into and out of a load lock chamber and a first processing chamber. The first processing chamber is the processing chamber closest to the load lock chamber among a plurality of processing chambers. The second robot is fixed at a position suitable for moving the substrate into and out of at least one second processing chamber different from the first processing chamber among a plurality of processing chambers. The mobile buffer is configured to move between the side wall and the robot in a top view and pass through a position suitable for moving the substrate into and out of the first robot and a position suitable for moving the substrate into and out of the second robot. The conveying method includes moving the substrate into and out of the mobile buffer by the first robot and the second robot.

[0013] A conveying system according to one aspect of an embodiment includes a conveying chamber, a plurality of robots and a mobile buffer. The conveying chamber includes a side wall having a plurality of processing chambers arranged in a horizontal orientation and has a reduced pressure atmosphere. A plurality of robots are fixed in the chamber of the conveying chamber and convey substrates. The mobile buffer is configured to hold the substrate and move along a track along the arrangement direction of the processing chamber. The robot includes a first robot and a second robot. The first robot is fixed at a position suitable for moving the substrate into and out of a load lock chamber and a first processing chamber. The first processing chamber is the processing chamber closest to the load lock chamber among the plurality of processing chambers. The second robot is fixed to a position suitable for moving the substrate into and out of at least one second processing chamber different from the first processing chamber in the plurality of processing chambers. The mobile buffer is configured to move between the side wall and the robot in a top view and pass through a position suitable for moving the substrate into and out of the first robot and a position suitable for moving the substrate into and out of the second robot.

[0014] Beneficial Effects of the Invention

[0015] According to an aspect of an embodiment, a conveying device, a conveying method, and a conveying system capable of improving the conveying efficiency of a substrate can be provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic top view showing an overview of a conveying system according to an embodiment.

[0017] Figure 2A is a top view schematically showing a first arrangement example of a load lock chamber.

[0018] Figure 2B is a top view schematically showing a second arrangement example of the load lock chamber.

[0019] Figure 3A This is a top view of the transport system.

[0020] Figure 3B This is a first side view of the transport system.

[0021] Figure 3C This is a perspective view of the transport system.

[0022] Figure 4 is a second schematic side view of the transport system.

[0023] Figure 5A It is a three-dimensional diagram of the movable buffer.

[0024] Figure 5B is a side view of the moving buffer.

[0025] Fig. 6A is a top view schematically illustrating a first example configuration of a robot.

[0026] Figure 6B is a top view schematically illustrating a second example configuration of the robot.

[0027] Figure 6C is a top view schematically illustrating a third example configuration of the robot.

[0028] Fig.6D is a top view schematically illustrating a fourth example configuration of the robot.

[0029] Figure 7 is a schematic side view of a robot and a moving buffer according to a modified example.

[0030] Fig. 8A is a perspective view showing a multi-stage moving buffer.

[0031] Figure 8B is a side view showing a multi-stage moving buffer.

[0032] Fig. 9A It is a top view of the conveying system according to a modified example.

[0033] Fig. 9B It is a side view of the conveying system according to a modification.

[0034] Fig. 9C It is a perspective view of a conveying system according to a modified example.

[0035] Fig.10 is a second schematic side view of the conveying system according to the modification.

[0036] Fig.11 It is a three-dimensional diagram of a floor-standing mobile buffer.

[0037] Fig.12 It is a block diagram showing the structure of the transport equipment.

[0038] Fig.13A This is a first flowchart showing a processing procedure executed by the transport equipment.

[0039] Fig. 13B This is a second flowchart showing the processing procedure executed by the transport equipment.

[0040] Fig.14 is a schematic top view showing a first modification of the robot arrangement.

[0041] Fig.15 is a schematic top view showing a second modification of the robot arrangement.

[0042] Fig.16 is a schematic top view showing a third modification of the robot arrangement. DETAILED DESCRIPTION

[0043] The following is a detailed description of the embodiments of the conveying equipment, conveying method and conveying system disclosed in the present application in conjunction with the accompanying drawings. The present invention is not limited to the following embodiments.

[0044] In the following embodiments, expressions such as "orthogonal", "horizontal", "vertical", "parallel", "center", and "symmetrical" are used, but these conditions do not have to be strictly met. That is, the above various expressions allow deviations in manufacturing accuracy, installation accuracy, processing accuracy, detection accuracy, etc.

[0045] First, refer to Figure 1 The outline of the transport system 1 according to the present embodiment will be described. Figure 1 It is a top view schematically showing the conveying system 1 according to the embodiment. Figure 1 The transport system 1 is schematically shown as viewed from above.

[0046] Figure 1 A three-dimensional orthogonal coordinate system is shown, in which, for convenience of explanation, the Z axis is defined as a positive direction in a vertical upward direction, the X axis is defined as a direction along the side wall 100sw of the transfer chamber 100, and the Y axis is defined as a normal direction of the side wall 100sw. The side wall 100sw is provided with a plurality of process chambers PC. Such an orthogonal coordinate system may be shown in other drawings used in the following description. Figure 1 The center line CL corresponding to the front of the process chamber PC is shown. The center line CL is a normal line to the side wall 100sw and corresponds to a line passing through the center of the substrate W (see the dotted circle) in the process chamber PC (along the Figure 1 The Y-axis line in the figure).

[0047] like Figure 1 As shown, outside the transfer chamber 100, the side wall 100sw is provided with a plurality of processing chambers PC for processing the substrate W under a reduced pressure atmosphere. Here, the processing performed on the substrate W by the processing chamber PC includes a film forming process (such as CVD (Chemical Vapor Deposition)) and an etching process. Generally, the environment of the reduced pressure atmosphere can be referred to as "vacuum". Figure 1 One side of the double line in the illustrated process chamber PC corresponds to an opening that can be opened and closed.

[0048] Like the processing chamber PC, the interior of the transfer chamber 100 has a reduced pressure atmosphere, a plurality of robots 10 and a moving buffer 110 are provided in the interior, and the transfer unit cooperates with the unit to transfer the substrate W. The robot 10 is a substrate transfer mechanism that transfers the substrate W (such as placing the substrate W into the processing chamber PC or taking the substrate W out of the processing chamber PC), and is, for example, a horizontally articulated robot (scalar robot).

[0049] Here, the robot 10 is fixed to the bottom wall 100f of the transfer chamber 100 (see Figure 4 ) and the like, and is different from a "mobile robot" that travels or moves in the interior of the transfer room 100. As described above, since the robot 10 does not move in the interior of the transfer room 100, it is easy to supply power to the robot 10, which contributes to a clean working environment in the transfer room 100.

[0050] Next, the load lock chamber LL (see FIG. Figure 2A The processing chamber PC of the load lock chamber LL is referred to as the first processing chamber PC1, and the processing chamber PC other than the first processing chamber PC1 is referred to as the second processing chamber PC2. In addition, in the following description, the robot 10 closest to the load lock chamber LL is referred to as the "first robot 10-1", and the robot 10 fixed at a position suitable for moving at least the substrate W into and out of at least one second processing chamber PC2 is referred to as the "second robot 10-2". Figure 1 A turning area 10rt corresponding to the minimum turning radius of the robot 10 is shown.

[0051] The moving buffer 110 is a buffer for temporarily holding the substrate W, and moves between the side wall 100sw and the robot 10 in the horizontal orientation D1 along the side wall 100sw. For example, the moving buffer 110 is driven contactlessly by a linear motor or the like. Figure 1 , the track 120 of the mobile buffer 110 is shown for reference. Here, since Figure 1 The illustrated sidewall 100sw is straight in a top view, and the horizontal orientation D1 and the track 120 are straight, but when the sidewall 100sw is curved in a top view, the horizontal orientation D1 and the track 120 may also be curved along the sidewall 100sw.

[0052] In addition, the moving buffer 110 moves between the side wall 100sw and the robot 10 in a plan view, and passes through a position suitable for moving the substrate W into and out of the first robot 10-1 (see Figure 1 and a position suitable for moving the substrate W into and out of the second robot 10-2 (see Figure 1 As described above, the mobile buffer 110 moves between the side wall 100sw and the robot 10, and moves within a range in which the substrate W can be moved in and out of each robot 10. Therefore, the robot 10 that moves the substrate W in and out of the processing chamber PC can easily cooperate with the mobile buffer 110, and the efficiency of substrate transfer can be improved. Figure 1A case where the position P1 and the position P2 are located in front of the robot 10 is shown, but they are not necessarily located in front of the robot 10 and may be located close to (near) the robot 10 to the extent that they are accessible from the robot 10 .

[0053] exist Figure 1 In the embodiment, the rail 120 is described as being between the side wall 100sw and the robot 10, but the position of the rail 120 is not limited. That is, the rail 120 may be located at a position overlapping with the rotation area 10rt of the robot 10 in a top view, or may be located at a position farther from the side wall 100sw than the robot 10. On the other hand, as Figure 1 As shown, the moving trajectory of the mobile buffer 110 overlaps with the turning area 10rt of the robot 10. This makes it possible to reduce the width of the transfer chamber 100.

[0054] Here, the “movement trajectory of the upper unit” refers to the area through which the shape of the mobile buffer 110 passes in a top view (an area extending along the moving direction of the mobile buffer 110). The “movement trajectory of the mobile buffer 110” may be an area through which the substrate W held by the mobile buffer 110 passes (an area extending along the moving direction of the mobile buffer 110).

[0055] The robot 10 transfers the substrate W between the mobile buffer 110 and the processing chamber PC by moving in cooperation with the mobile buffer 110. Specifically, when the robot 10 places the substrate W into the processing chamber PC, the mobile buffer 110 holding the unprocessed substrate W moves near the robot 10. The robot 10 obtains the unprocessed substrate W from the mobile buffer 110 and places the obtained unprocessed substrate W into the processing chamber PC.

[0056] When the robot 10 takes out the substrate W from the processing chamber PC, the empty (not holding the substrate W) moving buffer 110 moves near the robot 10. The robot 10 takes out the processed substrate W from the processing chamber PC and delivers the taken out processed substrate W to the moving buffer 110.

[0057] like Figure 1 As shown, if each of the plurality of robots 10 is disposed in front of the processing chamber PC, then preferably, the mobile buffer 110 may also stop in front of the processing chamber PC (referring to Figure 1 In this way, the moving distance of the substrate W can be minimized when the substrate W is loaded and unloaded relative to the processing chamber PC by the robot 10, and the handling efficiency can be improved. In addition, since the operation of the robot 10 can be simplified, the structure of the robot 10 can also be simplified and the cost can be reduced.

[0058] In this way, by using the movable moving buffer 110 as a buffer, the weight of the object to be moved can be reduced and the moving mechanism can be simplified compared to the case where the robot 10 is a movable type. As a result, since the operation rate of the moving mechanism is increased, the availability of the transfer of the substrate W can be improved, and the transfer efficiency of the substrate W can be improved.

[0059] In recent years, due to the multi-layering of semiconductors formed on substrates W, the processing time of substrates W in each processing chamber PC tends to be longer, and the number of processing chambers PC per transfer chamber 100 needs to be increased to increase the number of substrates W processed per unit time.

[0060] Therefore, such a demand can be met by improving the transfer efficiency of the substrate W in the transfer chamber 100 (such as the transfer system 1). In addition, since the robot 10 is fixed, the height of the transfer chamber 100 can be reduced and the volume of the transfer chamber 100 can be reduced. Therefore, the running cost of the transfer chamber 100 can be reduced.

[0061] Although Figure 1 Only a portion of the transfer chamber 100 is shown, but reference will be made later. Figure 3A etc. describe an example arrangement of the processing chamber PC, the robot 10, the moving buffer 110, etc. in the entire transfer chamber 100. Figure 4 etc. describe configuration examples of the robot 10 and the moving buffer 110 .

[0062] Although Figure 1 The robot 10 shown can also access load lock chambers corresponding to the entrance and exit of the substrate W in the transfer chamber 100 , but there are various variations in the shape of the top surface of the transfer chamber 100 and the arrangement of the load lock chambers and the process chambers PC.

[0063] Therefore, the following will refer to Figure 2A and Figure 2B An example of the arrangement of the load lock chamber is described. In the case of a load lock chamber with a built-in robot, as long as the built-in robot can transfer the substrate W by moving the buffer 110, Figure 1 The robot 10 shown in FIG. 1 need not be able to access the load lock chamber. Figure 1 As shown, the device including the robot 10 and the mobile buffer 110 may be referred to as a transport device 5. The robot 10 may be referred to later. Fig. 6A and Figure 6B The single-arm robot described or referenced later Figure 6C and 6D Description of the dual-arm robot.

[0064] Figure 2A and Figure 2B2 is a top view schematically showing arrangement examples 1 and 2 of the load lock chamber LL. Figure 2A and 2B , Figure 1 The robot 10 and the moving buffer 110 shown in FIG. 1 are omitted. Figure 2A and 2B The transfer chamber 100 is shown as having a rectangular shape in a plan view and the processing chambers PC are arranged on the long sides of the rectangle. As described above, by arranging the processing chambers PC on the long sides of the rectangular transfer chamber 100, the transfer chamber 100 can be flexibly expanded even if the number of processing chambers PC increases.

[0065] exist Figure 2A and Figure 2B , the side wall 100sw corresponding to the long side of the rectangle (see Figure 1 ) are described as the first side wall 100sw1 and the second side wall 100sw2, and the side wall 100sw corresponding to the short side is described as the third side wall 100sw3 and the fourth side wall 100sw4. Figure 2A and Figure 2B One load lock chamber LL and one or two second process chambers PC2 are shown in FIG. 1 , but two or more load lock chambers LL or three or more second process chambers PC2 may be provided. Figure 1 In the description, the process chamber PC closest to the load lock chamber LL is referred to as a first process chamber PC1, and the process chambers PC other than the first process chamber PC1 are referred to as second process chambers PC2.

[0066] Figure 2A 1 shows a case where a load lock chamber LL is provided in the side wall 100sw where a plurality of process chambers PC are provided. Figure 2A The case where a plurality of process chambers PC are disposed in the first side wall 100sw1 is shown, but a plurality of process chambers PC may be disposed in the second side wall 100sw2. Here, the load lock chamber LL changes the internal pressure between the reduced pressure atmosphere and the atmospheric pressure atmosphere. For example, when the substrate W (see Figure 1 ) is transported from the outside into the transfer chamber 100, the internal pressure of the load lock chamber LL is adjusted to the atmospheric pressure, and the first port, which is the outward opening of the load lock chamber LL, is opened. After closing the first port, the internal pressure of the load lock chamber LL is adjusted to the reduced pressure atmosphere, and the second port, which is the opening on the transfer chamber 100 side, is opened.

[0067] Figure 2BThe case where the load lock chamber LL is provided in the third side wall 100sw3 (short side) adjacent to the first side wall 100sw1 (long side) where the plurality of process chambers PC are provided is shown. The load lock chamber LL may be provided in the fourth side wall 100sw4. Therefore, the load lock chamber LL may be located in the side wall 100sw different from the side wall 100sw where the process chambers PC are located. Although Figure 2B A case where the load lock chamber LL is provided in the third side wall 100sw3 is shown, but it may be provided in the fourth side wall 100sw4.

[0068] Although Figure 2A and Figure 2B The transfer chamber 100 is shown to have a rectangular shape in a plan view, but Figure 1 The transfer system 1 shown in FIG. 1 is applicable to a case where the transfer chamber 100 has another shape such as a polygon or a circle. Hereinafter, the configuration of the transfer system 1 will be described in more detail.

[0069] Figure 3A is a top view of the conveying system 1 according to the embodiment. Figure 3A As shown, five processing chambers PC are provided at each of the first side wall 100sw1 and the second side wall 100sw2 parallel to each other, so that the five processing chambers PC and the five processing chambers PC face each other. The third side wall 100sw3 connecting the first side wall 100sw1 and the second side wall 100sw2 is provided with two load lock chambers LL (load lock chamber LL1 and load lock chamber LL2). Figure 3A The case where the third side wall 100sw3 is bent toward the outdoor side is shown, but it may be parallel to the fourth side wall 100sw4 without being bent.

[0070] Here, in the first side wall 100swl, the process chamber PC closest to the load lock chamber LL1 is the first process chamber PC1, and in the second side wall 100sw2, the process chamber PC closest to the load lock chamber LL2 is the first process chamber PC1. The other process chamber PC is the second process chamber PC2.

[0071] A plurality of robots 10 are arranged at an intermediate position between the first side wall 100swl and the second side wall 100sw2. Figure 3A In the illustrated case, one first robot 10 - 1 and two second robots 10 - 2 are arranged.

[0072] In particular, the first robot 10-1 is arranged at a middle position of the opposite first processing chamber PC1. The first robot 10-1 then accesses the load lock chamber LL1, the load lock chamber LL2, and the two first processing chambers PC1. Here, the first robot 10-1 corresponds to the first processing chamber PC1 to be referred to later. Figure 6C and Fig.6DA dual-arm robot 10C is described.

[0073] Each of the two second robots 10-2 is arranged at the middle position of the opposite second processing chamber PC2 and the middle position of the adjacent second processing chamber PC2. Then, each of the two second robots 10-2 accesses four second processing chambers PC2. Here, the second robot 10-2 corresponds to the second processing chamber PC2 to be referred to later. Figure 6B A multi-degree-of-freedom robot 10B is described.

[0074] In addition, when accessing each of the two adjacent second processing chambers PC2, the second robot 10-2 is configured to move the hand along the moving direction of the moving buffer 110 while keeping the hand in a posture facing the second processing chamber PC2. In other words, each of the second robots 10-2 moves the substrate W into and out of the two adjacent second processing chambers PC2 from the front. In this way, since a plurality of processing chambers PC are accessed without changing the direction of the hand, the operation of the robot 10 can be simplified and the substrate W can be quickly transported.

[0075] like Figure 3A As shown, the first robot 10-1 transfers the substrate W between the moving buffer 110, the processing chamber PC, and the load lock chamber LL (see Figure 1 ). In this way, the robot 10 in the transfer chamber 100 can also access the load lock chamber LL, so it is not necessary to provide a built-in robot in the load lock chamber LL, and the load lock chamber LL can be reduced in size.

[0076] like Figure 3A As shown, the transfer chamber 100 has a symmetrical shape with respect to a “symmetry line” parallel to the first side wall 100sw1 and the second side wall 100sw2 . Figure 3A The moving buffer 110 shown is a "side-by-side buffer" in which two substrates W can be placed side by side in the moving direction (in the direction along the X-axis). Figure 5A The details of this are described in detail in FIG. 110. The mobile buffer 110 may be a "multi-level buffer", which will be referred to later. Fig. 8A etc. to describe it.

[0077] The first side wall 100swl and the second side wall 100sw2 are straight in a top view, and are provided with five processing chambers PC arranged in a horizontal orientation. A plurality of robots 10 are provided along the arrangement direction of the plurality of processing chambers PC. The mobile buffer 110 moves along a rail 120 fixed to the top surface of the transfer chamber 100, etc. Figure 4The configuration of the moving buffer 110 and the rail 120 is described. Hereinafter, "-1" may be added to the moving buffer 110 and the rail 120 located close to the first sidewall 100sw1, and "-2" may be added to the moving buffer 110 and the rail 120 close to the second sidewall 100sw2.

[0078] The first mobile buffer 110-1 moves between the first side wall 100swl and the robot 10. As described above, the first rail 120-1 may not be disposed between the first side wall 100swl and the robot 10. That is, if the first mobile buffer 110-1 moves between the first side wall 100sw1 and the robot 10, the position of the first rail 120-1 does not matter.

[0079] The second mobile buffer 110-2 moves between the second side wall 100sw2 and the robot 10. As described above, the second rail 120-2 may not be provided between the second side wall 100sw2 and the robot 10. That is, if the second mobile buffer 110-2 moves between the second side wall 100sw2 and the robot 10, the position of the second rail 120-2 does not matter.

[0080] As described above, by providing two movable buffers 110 (the first movable buffer 110-1 and the second movable buffer 110-2) and inserting the robot 10 therebetween, the robot 10 can use the movable buffer 110 closer to the processing chamber PC, and can shorten the moving distance of the substrate W accompanying the transport of the substrate W. Therefore, the transport efficiency of the substrate W can be improved.

[0081] like Figure 3A As shown, each robot 10 includes a hand on which the substrate W is placed and an arm that moves the hand by at least a rotation operation. Here, the arm of the robot 10 can rotate without interfering with the first side wall 100sw1 and the second side wall 100sw2. In other words, the arm of the robot 10 is long enough not to interfere with the first side wall 100sw1 and the second side wall 100sw2. That is, the robot 10 can access four processing chambers PC or two processing chambers PC and two load lock chambers LL while suppressing the width of the transfer chamber 100.

[0082] More specifically, the second robot 10-2 is fixed to a position in the side wall 100sw where the substrate W can be moved into and out of two adjacent processing chambers PC (in Figure 3A The middle position between two adjacent processing chambers PC2). Figure 3AAs shown, the second robot 10 - 2 accesses a total of four process chambers PC2 including two adjacent process chambers PC2 of the first side wall 100sw1 and two adjacent process chambers PC2 of the second side wall 100sw2 .

[0083] In addition, the moving trajectory of the moving buffer 110 overlaps with the hand of the robot 10 facing the processing chamber PC. Figure 3A As shown, in the second robot 10-2, the hand facing the processing chamber PC overlaps with the movement trajectory of the first mobile buffer 110-1 and the movement trajectory of the second mobile buffer 110-2. Note that the robot 10 may be arranged so that the hand oriented toward the processing chamber PC overlaps with one of the trajectories of the first mobile buffer 110-1 and the second mobile buffer 110-2. Even in this case, the width of the transfer chamber 100 may be made smaller than that in the case where they do not overlap with each other.

[0084] Here, the moving buffer 110 moves to the lower side of the hand of the robot 10, which has transferred the processed substrate W from the processing chamber PC to the chamber of the transfer chamber 100, and receives the substrate W. The robot 10 transfers the substrate W to the moving buffer 110 by lowering the hand which has been raised to a position higher than the substrate W. In this way, interference between the moving buffer 110 and the robot 10 can be prevented and the substrate W can be efficiently transferred.

[0085] like Figure 3A As shown, the first side wall 100sw1 and the second side wall 100sw2 are respectively provided with relative processing chambers PC, and each robot 10 transfers the substrate W through the relative processing chambers PC. As described above, the transfer chamber 100 has a shape symmetrical about a line parallel to the moving direction of the mobile buffer 110. In addition, each robot 10 is fixed so that the center of rotation is located at an intermediate position between the moving trajectory of the first mobile buffer 110-1 and the moving trajectory of the second mobile buffer 110-2. In this way, it becomes easy to share or change (divert) the teaching information of the robot 10, and it becomes possible to reduce the cost required for the teaching of the robot 10.

[0086] Next, refer to Figure 3B describe Figure 3A The side view of the transport system 1 is shown. Figure 3B It is a first side view of the transport system 1 . Figure 3B Viewed from the second side wall 100sw2 Figure 3A The side view of the transport system 1 is shown. In addition, the first rail 120-1 is hidden behind the second rail 120-2 and is therefore not shown. Figure 3B In FIG. 1 , the outer wall of the transfer chamber 100 is indicated by a dotted line. Figure 3BIn the Figure 3A The configuration elements shown in , so redundant descriptions will be omitted or simplified.

[0087] like Figure 3B As shown, the rail 120 is provided on the top surface of the transfer chamber 100, and the mobile buffers 110 (the first mobile buffer 110-1 and the second mobile buffer 110-2) are provided to be suspended from the rail 120. In addition, the buffer detection sensors Sb1 are provided on the side wall of the transfer chamber 100 in a horizontal orientation with intervals therebetween. Figure 3B Five sensors are shown in FIG, but the number of sensors is not limited.

[0088] The mobile buffer 110 is provided with a buffer detection sensor Sb2 at a height corresponding to the buffer detection sensor Sb1. The buffer detection sensor Sb (a collection of the buffer detection sensor Sb1 and the buffer detection sensor Sb2) is a non-contact position sensor and detects the position of the mobile buffer 110 in the transfer chamber 100. Figure 3B , an opening 101 provided on the side wall of the transfer chamber 100 is indicated by a dotted line. For example, the opening 101 is provided at a position lower than the moving buffer 110. The robot 10 moves the hand facing the opening 101 forward to pass through the opening 101 and access the processing chamber PC or the load lock chamber LL.

[0089] like Figure 3B As shown, the moving buffer 110 is moved to a position higher than the robot 10 in a hand-down posture. By providing the moving buffer 110 in this manner, interference with the robot 10 can be avoided. When the robot 10 moves the substrate W in and out of the moving buffer 110, the hand rises to access the moving buffer 110.

[0090] Next, refer to Figure 3C Describes a scene viewed from above Figure 3A The shape of the transport system 1 is shown. Figure 3C 1 is a perspective view of the transport system 1. Figure 3C In FIG. 1 , the top wall and the side walls of the transfer chamber 100 are indicated by dotted lines. Figure 3C In the Figure 3A and Figure 3B For the structural elements shown in , redundant descriptions will be omitted or only brief descriptions will be given below.

[0091] like Figure 3CAs shown, two rails 120 (a first rail 120-1 and a second rail 120-2) are fixed to the top wall of the transfer room 100. A first mobile buffer 110-1 is suspended on the first rail 120-1, and a second mobile buffer 110-2 is suspended on the second rail 120-2. Each mobile buffer 110 moves along the rails 120. Each robot 10 is fixed to the bottom wall of the transfer room 100.

[0092] Next, refer to Figure 4 A configuration example of the robot 10 and the moving buffer 110 is described. Figure 4 It is a second side view of the transport system 1 . Figure 4 Viewed from the fourth side wall 100sw4 Figure 3A A side view of the transport system 1 shown in FIG. Figure 4 , the second robot 10 - 2 closest to the fourth side wall 100sw4 is shown as the robot 10 .

[0093] First, a configuration example of the second robot 10-2 will be described. Figure 4 As shown, the second robot 10 - 2 includes an arm 11 , a hand 12 , a lifting mechanism 15 , a flange F, and a base B. The arm 11 includes a first arm 11 a and a second arm 11 b .

[0094] The base B of the second robot 10-2 passes through the bottom wall 100f of the transfer room 100 and protrudes to the outside of the transfer room 100. In addition, the flange F supports the second robot 10-2 through the bottom surface 100fi of the bottom wall 100f and maintains the airtightness of the transfer room 100. As described above, by making the base B of the second robot 10-2 protrude from the transfer room 100, the volume of the transfer room 100 can be reduced. In addition, the second robot 10-2 can be easily powered and accessed from the outside of the transfer room 100.

[0095] The lifting mechanism 15 rotatably supports the base end side of the first arm 11a around the first rotation axis AH1, and moves up and down along the lifting axis AV. The lifting mechanism 15 itself can rotate around the first rotation axis AH1. The first arm 11a supports the proximal end of the second arm 11b at the distal end so as to be rotatable around the second rotation axis AH2. The second arm 11b supports the proximal end of the hand 12 at the distal end so as to be rotatable around the third rotation axis AH3. For example, as Figure 1 and Figure 3A As shown, the hand 12 has a fork portion whose tip side is bifurcated, and supports the substrate W on the upper surface side. The hand 12 can hold a plurality of substrates W in a plurality of stages.

[0096] Here, the first arm 11a, the second arm 11b, and the hand 12 corresponding to the horizontal arm rotate independently around the first rotation axis AH1, the second rotation axis AH2, and the third rotation axis AH3, respectively. Therefore, the second robot 10-2 can access the adjacent processing chamber PC in the first side wall 100sw1 or the second side wall 100sw2. In the case where the second robot 10-2 is set in front of each processing chamber PC, the second arm 11b and the hand 12 can be configured to rotate according to the rotation of the first arm 11a around the first rotation axis AH1.

[0097] If the first arm 11a, the second arm 11b, and the hand 12 are configured to rotate independently, there are three drive sources (actuators), and if the second arm 11b and the hand 12 are configured to rotate according to the rotation of the first arm 11a, there are one or two drive sources. Note that the second robot 10-2 also requires a drive source to raise and lower the lifting mechanism 15.

[0098] like Figure 4 As shown, the first arm 11a, the second arm 11b, and the hand 12 corresponding to the horizontal arm can rotate without interfering with the first side wall 100sw1 and the second side wall 100sw2. In particular, the length of the hand 12 of the second robot 10-2 is less than the "transportation room width", which means the distance between the first side wall 100sw1 and the second side wall 100sw2. In addition, as Figure 4 As shown, the hand 12 is longer than half the width of the transfer chamber. As described above, according to the second robot 10-2, the width of the transfer chamber 100 can be narrowed to be close to the length of the hand 12. Therefore, the volume of the transfer chamber 100 can be reduced.

[0099] Figure 3A The first robot 10-1 shown in the above is a robot having Figure 4 The second robot 10-2 shown is a so-called dual-arm robot with two sets of arms 11 and hands 12. Although there are variations in the axis configuration of each robot 10 (the first robot 10-1 and the second robot 10-2), reference will be made later. Fig. 6A , Figure 6B , Figure 6C and Fig.6D Describe the details.

[0100] Next, a configuration example of the moving buffer 110 will be described. Since two moving buffers 110 are provided symmetrically with respect to the first rotation axis AH1 of the robot 10, the second rail 120-2 and the second moving buffer 110-2 provided on the second side wall 100sw2 side will be described below as an example.

[0101] like Figure 4As shown, the second moving buffer 110-2 includes a moving unit 111, a column 112, and a holding portion 113 corresponding to the buffer. The moving unit 111 is driven to move by a driving unit 120a fixed to a rail 120 of the transfer chamber 100. The column 112 is coupled to the moving unit 111. The holding portion 113 is supported by the column 112 and supports the substrate W in a horizontal orientation.

[0102] Here, the moving unit 111 corresponds to a mover in a moving magnet type linear motor. Therefore, hereinafter, the "moving unit 111" may be referred to as the "motor 111". The linear motor is not limited to a moving magnet type, but may also be an induction type. In this embodiment, a moving magnet type (i.e., a case where the mover 111 includes a magnet MG as a permanent magnet) will be described, but the mover 111 may be formed of a material that moves when an induced current flows.

[0103] The second rail 120-2 includes a drive unit 120a, a guide 120b, and a tank 120c. The drive unit 120a corresponds to a stator in a linear motor. Therefore, hereinafter, the "drive unit 120a" may be referred to as a "stator 120a". In this embodiment, a case where the movable buffer 110 moves relative to the rail 120 by the driving force of the linear motor will be described. The linear motor may be a contact type or a non-contact type, such as a magnetic suspension type or an air suspension type. The guide 120b is a supporting member that guides linear motion or curved motion within a plane such as a horizontal plane. In Figure 4 In the illustrated case, two guides 120b are provided so that the driving unit 120a is located between the two guides 120b, and the two guides 120b guide the second moving buffer 110-2 to move linearly in the direction along the X-axis. The number of the guides 120b may be one.

[0104] As described above, the moving unit 111 of the second moving buffer 110-2 is driven in a non-contact manner by the stator 120a included in the second rail 120-2. For example, the stator 120a is formed by molding a winding with a resin or the like and covering the surface of the mold with a film-like metal. This metal film is the above-mentioned can 120c, and the gas generated by the resin or the like gathers inside. In this way, the second moving buffer 110-2 is driven in a non-contact manner by the moving magnet system, thereby facilitating the cleaning of the transfer chamber 100. In addition, since power can be supplied to the stator 120a via the top wall 100c of the transfer chamber 100, this also facilitates the cleaning of the transfer chamber 100.

[0105] like Figure 4As shown, when the substrate W is held by the first moving buffer 110 - 1 , the robot 10 receives the substrate W by raising the hand 12 . On the contrary, if the substrate W is held by the hand 12 , the robot 10 transfers the substrate W to the moving buffer 110 by lowering the hand 12 .

[0106] The position of the moving unit 111 in the top view can be detected by the change of the current or voltage of the stator 120a in the rail 120, or by the combination of the scale SC provided in the top wall 100c in the transfer chamber 100 and the scale head SH provided in the moving unit 111. Figure 4 As shown, the scale SC and the scale head SH are arranged to face each other with a space therebetween. That is, the scale SC and the scale head SH are non-contact position sensors. The scale SC extends in the extending direction of the second rail 120-2 (the direction along the X-axis).

[0107] Here, although Figure 4 The case where the moving buffer 110 is a ceiling-suspended type is shown, but it may be a floor-standing type. When the moving buffer 110 is a floor-standing type, the driving unit 120a of the rail 120 is fixed to the bottom wall 100f of the transfer chamber 100. Fig. 9A etc. describe the floor-standing mobile buffer 110 .

[0108] Next, refer to Figure 5A and Figure 5B Describe in more detail Figure 4 A mobile buffer 110 is shown. Figure 5A is a perspective view of the mobile buffer 110, and Figure 5B is a side view of the movable buffer 110 . Figure 5A Corresponding to the perspective view of the first movable buffer 110 - 1 viewed obliquely from below, Figure 5B This corresponds to a side view of the first moving buffer 110 - 1 as seen from the negative X-axis direction side.

[0109] like Figure 5A As shown, the moving unit 111 has a magnet MG on the top surface side. Here, the magnet MG extends in the moving direction (the direction along the X axis) of the moving buffer 110. The column 112 is connected to the first side wall 100sw1 (see FIG. 1 ) in the moving unit 111. Figure 4 ) and is located at the robot 10 (see Figure 1 ) outside the rotation region 10rt. In addition, the holding portion 113 is supported by the columnar object 112 on the proximal side in a posture where the distal end side is away from the first side wall 100sw1.

[0110] like Figure 5AAs shown, the first mobile buffer 110-1 is a side-by-side buffer capable of holding the substrate W arranged in a horizontal orientation along the moving direction. In this way, by using the mobile buffer 110 as a side-by-side buffer, the height of the transfer chamber 100 can be kept low. In addition, when the mobile buffer 110 is a side-by-side buffer, one of the two substrate placement positions can be moved in front of the robot 10 or the like. Therefore, the substrate W can be quickly moved in and out of the robot 10. That is, the horizontal operation of the mobile buffer 110 and the operation of the robot 10 are coordinated with each other, so that the efficiency of substrate handling can be improved.

[0111] Specifically, the holding portion 113 has three support members 113a extending in a horizontal orientation to respectively support the edges of the substrate W, and the middle support member 113a among the three support members 113a is shorter than the two end support members 113a among the three support members 113a. In this way, by shortening the middle support member 113a, the robot 10 (see Figure 4 ) In the top view, the substrate W can be transferred not only from the front but also from an inclined direction.

[0112] For example, even if the hand 12 (see Figure 4 ) directly near Figure 5A The hand 12 does not interfere with the middle support member 113a for the substrate W on the left side (negative X-axis direction side) shown. Figure 5A The substrate W on the right side (the positive direction side of the X-axis) shown in the figure can be accessed by the hand 12 from the negative direction side of the X-axis.

[0113] like Figure 5B As shown, the mobile unit 111 has a recessed portion, the top surface of which is recessed to cover the Figure 4 The rail 120 shown in FIG. 1 is provided with a magnet MG in the recess. The scale head SH is provided on the side surface outside the recess. The column 112 has an upper end supported by the moving unit 111 and extending vertically downward, and a lower end supporting the holding portion 113.

[0114] Here, in Figure 5B In the case of the first movable buffer 110-1 shown in FIG. 1 , the back side (the positive direction side of the Y axis) is the first side wall 100sw1 (see FIG. 1 ). Figure 4 ). That is, the pillar 112 extends in the vertical direction (the direction along the Z axis) along the first side wall 100sw1. The holding portion 113 supported by the pillar 112 protrudes toward a direction away from the first side wall 100sw1, and supports the substrate W on the top surface side.

[0115] Next, refer to FIG. 6A to FIG. 6D A configuration example of the robot 10 is described. Fig. 6A , Figure 6B , Figure 6C and Fig.6D 1 is a top view schematically showing Examples 1 , 2 , 3 , and 4 of the robot 10 .

[0116] Fig. 6A The robot 10 shown is an RθZ robot 10A, which is a robot having three degrees of freedom (one degree of freedom in vertical orientation and two degrees of freedom in horizontal orientation). Fig. 6A 10A, but they may not be coaxial. The first arm 11a, the second arm 11b, and the hand 12 as horizontal arms cooperate to move the substrate center CW in the radial direction of the first rotation axis AH1 while maintaining the posture of the hand 12. The first rotation axis AH1 corresponds to the rotation center of the RθZ robot 10A.

[0117] That is, by the driving force and transmission mechanism that rotates the first arm 11a around the first rotation axis AH1, the second arm 11b and the hand 12 rotate around the second rotation axis AH2 and the third rotation axis AH3, respectively. Examples of the transmission mechanism include a belt, a gear, and a connecting rod mechanism. In addition, the "substrate center CW" refers to the center position of the substrate W when the hand 12 holds the substrate W in the normal position.

[0118] Therefore, the RθZ robot 10A changes the distance r from the first rotation axis AH1 to the substrate center CW while keeping the angle θ of the straight line passing through the first rotation axis AH1, the third rotation axis AH3, and the substrate center CW constant. Here, the angle θ may be any angle. Therefore, the RθZ robot 10A is a three-degree-of-freedom robot 10 having one degree of freedom in the vertical orientation and two degrees of freedom in the horizontal orientation. Hereinafter, the RθZ robot 10A may be referred to as an "RθZ robot".

[0119] By using the RθZ robot 10A (as an RθZ robot) as the robot 10, the cost of the robot 10 can be reduced compared to the case where the robot 10 has four or more degrees of freedom. When the RθZ robot 10A is used as the robot 10, the RθZ robot 10A is disposed in front of the process chamber PC or the load lock chamber LL. In other words, by arranging the robot 10 in front of the process chamber PC or the load lock chamber LL, the robot 10 can be an Rθz robot having three degrees of freedom.

[0120] Figure 6B The robot 10 shown is a multi-degree-of-freedom robot 10B, which is a robot having four or more degrees of freedom including one degree of freedom in a vertical orientation and three or more degrees of freedom in a horizontal orientation. Figure 6B Although shown as coaxial in FIG, they may not be coaxial. Fig. 6AIn the RθZ robot 10A shown in FIG, the first arm 11a, the second arm 11b and the hand 12 as horizontal arms rotate independently about the first rotation axis AH1, the second rotation axis AH2 and the third rotation axis AH3 respectively. The first rotation axis AH1 corresponds to the rotation center of the multi-degree-of-freedom robot 10B.

[0121] As described above, since the multi-degree-of-freedom robot 10B has at least one redundant axis in the horizontal orientation, the substrate center CW can move along an arbitrary path. Therefore, when the multi-degree-of-freedom robot 10B is used as the robot 10, the multi-degree-of-freedom robot 10B does not need to be disposed in front of the process chamber PC or the load lock chamber LL. In other words, even if the robot 10 is not disposed in front of the process chamber PC or the load lock chamber LL, the substrate W can be moved into and out of the process chamber PC or the load lock chamber LL.

[0122] Figure 6C The robot 10 shown is a Fig. 6A The dual-arm robot 10C is shown as having two horizontal arms of the RθZ robot 10A. In other words, the dual-arm robot 10C has two arms, each arm having two degrees of freedom in a horizontal orientation, and the dual-arm robot 10C also has one degree of freedom in a vertical orientation.

[0123] Specifically, the base ends of the two first arms 11a are supported by a support P, which moves up and down along the lifting axis AV and rotates around the rotation axis AHO. Figure 6C Shows Fig. 6A The horizontal arm of the RθZ robot 10A shown is a double arm, but Figure 6B The horizontal arm of the illustrated multi-degree-of-freedom robot 10B may be a double-arm.

[0124] Here, although Fig. 6A The case where the hands 12 of each of the two arms overlap each other when viewed in the direction of the Z axis is shown, but they may not overlap each other. Each arm changes the distance r from the rotation axis AH0 to the substrate center CW while keeping the angle θ of the straight line passing through the rotation axis AH0, the third rotation axis AH3, and the substrate center CW constant. Note that Figure 6C The vertical relationship of the arms in the two arms shown may be reversed. The rotation axis AHO corresponds to the center of rotation of the dual-arm robot 10C.

[0125] Fig.6D The dual-arm robot 10D shown is Figure 6C A modified example of the dual-arm robot 10C is shown. Fig.6D The dual-arm robot 10D shown is Figure 6CThe dual-arm robot 10C shown differs in that the two first rotation axes AH1 in the two arms are coaxial with the lifting axis AV and the support P is omitted. The rotation axis AH1 corresponds to the rotation center of the dual-arm robot 10D.

[0126] Here, each of the two arms changes the distance r from the rotation axis AH0 to the substrate center CW while keeping the angle θ of the straight line passing through the first rotation axis AH1, the third rotation axis AH3, and the substrate center CW constant. In this way, by making the two first rotation axes AH1 coaxial and omitting the support P, the dual-arm robot 10D can be made compact and the volume of the transport chamber 100 can be reduced. Note that Fig.6D The vertical relationship of the arms in the two arms shown in can be reversed.

[0127] Then, in Figure 4 A modified example of setting a lifting mechanism in the mobile buffer 110 is shown in FIG. Figure 7 The description is made with the lifting mechanism omitted from the robot 10 . Figure 7 1 is a side view schematically showing a modified example of the robot 10 and the moving buffer 110. Here, Figure 7 The robot 10 and the mobile buffer 110 shown are the robot 10 without the lifting mechanism and the mobile buffer 110 with the lifting mechanism. Figure 4 Different points.

[0128] like Figure 7 As shown, in the robot 10, from Figure 4 The robot 10 shown in the figure omits the lifting axis AV and the lifting mechanism 15. By omitting the lifting axis AV and the lifting mechanism 15, the height of the base B is suppressed to be lower than Figure 4 The height of the robot 10 is shown. On the other hand, the mobile buffer 110 includes a lifting column 112s, which moves vertically up and down along the lifting axis AL.

[0129] As described above, by omitting the lifting mechanism from the robot 10, the height of the transfer chamber 100 can be reduced. In addition, the usability of the robot 10 can be increased by simplifying the configuration of the robot 10.

[0130] The driving source (actuator) for driving the lifting column 112s is supplied with direct current by contactless power supply via the rail 120. In this way, when contactless power supply is applied to the mobile buffer 110, not only the driving source but also a sensor (such as a weight sensor or an optical sensor) and a device (such as a wireless communication camera) can be mounted on the mobile buffer 110.

[0131] Therefore, when the substrate W is placed on the moving buffer 110, the presence, shape, weight, position, etc. of the substrate W can be detected. Note that the cost of a DC power source is lower than that of an AC power source, which contributes to cost reduction.

[0132] like Figure 7 As shown, when the substrate W is held by the first moving buffer 110-1, the first moving buffer 110-1 extends the column 112 and lowers the holding portion 113, thereby transferring the substrate W to the hand 12 of the robot 10. Conversely, when the substrate W is held by the hand 12 of the robot 10, the holding portion 113 rises from below the substrate W to pick up the substrate W.

[0133] Furthermore, if Figure 7 and Figure 4 As shown, one of the robot 10 and the mobile buffer 110 has a lifting mechanism, and the hand 12 of the robot 10 and the mobile buffer 110 do not interfere with each other in the lifting operation at the position where the substrate W is transferred. Therefore, since the robot 10 or the mobile buffer 110 does not need to perform an interference avoidance operation in a horizontal orientation, the transfer efficiency of the substrate W can be improved.

[0134] Although the case where the mobile buffer 110 is a parallel buffer has been described, the mobile buffer 110 may be a multi-stage buffer. Fig. 8A and Figure 8B A case where the move buffer 110 is a multi-stage buffer is described. Fig. 8A is a perspective view showing a multi-stage moving buffer 110, and Figure 8B is a side view showing the multi-stage moving buffer 110 .

[0135] Fig. 8A and Figure 8B The viewing direction and Figure 5A and Figure 5B The same viewing direction. Fig. 8A and Figure 8B The same reference numerals are assigned to Figure 5A and Figure 5B The configuration elements shown in , and therefore, in the following description, redundant descriptions will be omitted or only brief descriptions will be given.

[0136] like Fig. 8A As shown, the first moving buffer 110-1 is a multi-stage buffer capable of holding two substrates W at two stages. Fig. 8A and Figure 8B 2 shows two stages of the multi-stage buffer, but the number of stages may be three or more. In this way, according to the multi-stage mobile buffer 110, the mobile buffer 110 can be made compact in a plan view, and can help make the transfer chamber 100 compact.

[0137] Specifically, the holding portion 113 has two supporting members 113a, which respectively protrude in a horizontal orientation and support the edges of the substrate W. Even when the hand 12 (see Figure 4 ) When moving up and down, the interval between the two supports 113a is also large enough to prevent interference. In this way, by providing a space between the two supports 113a, the robot 10 can transfer the substrate W by raising and lowering the hand 12 in a posture facing the mobile buffer 110.

[0138] Here, in Fig. 8A and Figure 8B In the case of the first movable buffer 110-1 shown in FIG. 1 , the back side (the positive direction side of the Y axis) is the first side wall 100sw1 (see FIG. 1 ). Figure 4 ). That is, the column 112 extends in a vertical orientation (in the direction of the Z axis) along the first side wall 100sw1. The holding portions 113 supported by the column 112 are arranged in the vertical direction (in the direction of the Z axis). Each holding portion 113 extends in a direction away from the first side wall 100sw1 and supports the substrate W on the top surface side.

[0139] Although the case where the moving buffer 110 is a ceiling-suspended type has been described, the moving buffer 110 may be a floor-standing type. FIG. 9A to FIG. 11 The case where the mobile buffer 110 is a floor-standing type is described. Respectively, Figures 9A to 9C Corresponds to FIG. 3A to FIG. 3C , Fig.10 Corresponds to Figure 4 ,and Fig.11 Corresponds to Figure 5A In addition, in the following description, FIG. 3A to FIG. 5A The same reference numerals are given to the illustrated constituent elements, and redundant descriptions of matters already described will be omitted or simplified.

[0140] Fig. 9A 1 is a top view schematically showing a conveying system 1 according to a modified example. Fig. 9A Corresponding to Figure Figure 3A , but omits the process chamber PC and each load lock chamber LL. Fig. 9A As shown, the rail 120 is fixed to the bottom surface of the transfer chamber 100, and the moving buffer 110 moves on the rail 120 on the bottom surface, which is similar to Figure 3A The transport system 1 shown is different.

[0141] Here, the mobile buffer 110 is in the hand 12 of the robot 10 (see Figure 4 ) to align with Figure 3A The substrate W is transferred in the same manner as the transfer system 1 shown in FIG. Figure 6C or Fig.6D The dual-arm robot 10C or the dual-arm robot 10D shown in FIG. 1 and the second robot 10-2 is Figure 6B The multi-degree-of-freedom robot 10B shown in FIG. Figure 3A The same as in the conveying system 1 shown in FIG.

[0142] Although Fig. 9A A side-by-side arrangement of mobile buffers 110 is shown, but a Fig. 8A The multi-stage moving buffer 110 is shown in FIG.

[0143] Next, refer to Fig. 9B describe Fig. 9A The side shape of the conveying system 1 shown in FIG. Fig. 9B 2 is a side view schematically showing a transport system 1 according to a modified example. Fig. 9B As shown in FIG. , the track 120 and Figure 3B The transfer system 1 shown in FIG. 1 is different in that it is provided on the bottom surface of the transfer chamber 100 .

[0144] Note that the substrate W placed on the moving buffer 110 is moved to a position higher than the robot 10 in a posture where the hand 12 is lowered, as shown in FIG. Figure 3B As described above, even when the moving buffer 110 is a floor-standing type, the placement position of the substrate W can be set to a position higher than the robot 10 in the posture in which the hand 12 is lowered.

[0145] Next, refer to Fig. 9C Describes a scene viewed from above Fig. 9A The shape of the conveying system 1 shown in FIG. Fig. 9C 1 is a perspective view of the transport system 1. Fig. 9C Corresponds to Figure 3C ,but Figure 3C Side walls and a bottom wall are shown which are not shown.

[0146] like Fig. 9C As shown in Figure 3C The transfer system 1 shown in FIG. 1 is different in that two rails 120 (a first rail 120-1 and a second rail 120-2) are fixed to the bottom wall of the transfer chamber 100. The first moving buffer 110-1 is provided on the first rail 120-1, and the second moving buffer 110-2 is provided on the second rail 120-2. Since the second rail 120-2 is hidden by the side wall, its description is omitted.

[0147] Next, refer to Fig.10 A configuration example of the robot 10 and the moving buffer 110 is described. Fig.101 is a second schematic side view of the transport system 1 according to the modified example. Figure 4 On the other hand, the mobile buffer 110 is the same as Figure 4 The illustrated movement buffer 110 differs in that the vertical orientation is reversed and the column 112 is lengthened so that the support position of the holder 113 is higher than the robot 10 .

[0148] like Fig.10 As shown, the column 112 is Figure 4 The column 112 shown in FIG. 1 is long, and supports the holding portion 113 at a higher position than the robot 10 .

[0149] like Figure 4 As shown, when the substrate W is held by the first moving buffer 110-1, the robot 10 receives the substrate W by raising the hand 12. Conversely, when the substrate W is held by the hand 12, the robot 10 transfers the substrate W to the moving buffer 110 by lowering the hand 12 that has been raised to a position higher than the substrate W.

[0150] Next, refer to Fig.11 describe Fig.10 A mobile buffer 110 is shown. Fig.11 It is a perspective view of the floor-standing mobile buffer 110 . Fig.11 is corresponding to Figure 5A , but with Figure 5A The difference between the directional diagrams is that the first mobile buffer 110 - 1 is viewed obliquely from above.

[0151] like Fig.11 As shown, the moving unit 111 supports the column 112 on the top surface side. The column 112 is connected to the moving unit 111 closer to the first side wall 100sw1 (see Fig.10 ) and in the robot 10 (see Figure 1 ) outside the rotation region 10rt. In addition, the holding portion 113 is supported by the columnar object 112 on the proximal side in a posture in which the distal end side is oriented away from the first side wall 100sw1.

[0152] like Fig.11 As shown, the mobile buffer 110 and Figure 5A The illustrated moving buffer 110 is similar in that it can hold two substrates W in a horizontal orientation along the moving direction, but it can be seen that there are pads for supporting the substrates W on the top surface of the holding portion 113 .

[0153] Next, refer to Fig.12 describe Figure 1 The structure of the transport equipment 5 shown. Fig.12 is a block diagram showing the structure of the conveying device 5. Fig.12 As shown, the transfer device 5 includes a robot 10, a moving buffer 110, and a controller 20. The robot 10 and the moving buffer 110 are connected to the controller 20. The load lock chamber LL and the process chamber PC are also connected to the controller 20 and can exchange information.

[0154] The controller 20 includes a control unit 21 and a storage unit 22. The control unit 21 includes an acquisition unit 21a and an operation control unit 21b. The storage unit 22 stores teaching information 22a. Fig.12 One controller 20 is shown in the figure to simplify the description, but a plurality of controllers 20 may be used. In this case, a host controller bundled with the controller may be provided. For example, the controller to which the robot 10 is connected and the controller to which the mobile buffer 110 is connected may be separated from each other, and a host controller bundled with the controller may be provided.

[0155] Here, the controller 20 includes, for example, a computer having a central processing unit (CPU), a read-only memory (ROM), a random access memory (RAM), a hard disk drive (HDD), input / output ports, and various circuits, etc. For example, the CPU of the computer functions as an acquisition unit 21a and an operation control unit 21b of the control unit 21 by reading and executing a program stored in the ROM.

[0156] At least one or both of the acquisition unit 21a and the operation control unit 21b may be configured by hardware such as an application specific integrated circuit (ASIC) or a field programmable gate array (FPGA).

[0157] The storage unit 22 corresponds to, for example, a RAM or a HDD. The RAM and the HDD can store the teaching information 22a. The controller 20 can obtain the above-mentioned program and various types of information via a portable recording medium or another computer connected via a wired or wireless network. In addition, as described above, the controller 20 can be configured as a plurality of devices that can communicate with each other, or can be configured as a hierarchical device that can communicate with an upper device or a lower device.

[0158] The control unit 21 acquires trigger information such as an access request from the load lock chamber LL or the process chamber PC and controls the operation of the robot 10 and the moving buffer 110. When the controller 20 includes a plurality of units, the control unit 21 may also perform a process of synchronizing the plurality of controllers 20.

[0159] The acquisition unit 21a acquires trigger information such as an access request from the load lock chamber LL or the processing chamber PC. Then, the acquisition unit 21a determines the operation timing and operation content of the robot 10 and the mobile buffer 110 based on the acquired information, and notifies the determined operation timing and operation content to the operation control unit 21b.

[0160] For example, the acquisition unit 21a acquires the time when the substrate W is transported from the outside into the load lock chamber LL, and instructs the operation control unit 21b to cooperatively operate the robot 10 and the moving buffer 110 based on the acquired time. In addition, the acquisition unit 21a acquires the time when the processing of the substrate W is completed from the processing chamber PC, and instructs the operation control unit 21b to cooperatively operate the robot 10 and the moving buffer 110 based on the acquired time.

[0161] The operation control unit 21b operates the robot 10 and the mobile buffer 110 based on the instructions from the acquisition unit 21a and the teaching information 22a. In addition, the operation control unit 21b performs feedback control while using an encoder value in an actuator such as a rotary motor or a linear motor as a power source for the robot 10 and the mobile buffer 110, thereby improving the operation accuracy of the robot 10 and the mobile buffer 110.

[0162] The teaching information 22a is information created in a teaching phase for teaching operations of the robot 10 and the moving buffer 110, and includes a program for defining an operation path of the robot, etc. Figure 3A As shown in FIG. 1 , when the robots are arranged at regular positions such as line-symmetrical positions, the teaching data can be shared or exchanged. Therefore, according to the conveying device 5 , the labor and cost for generating the teaching information 22 a including the teaching data can be suppressed.

[0163] Next, refer to Fig.13A and Fig. 13B Description by Figure 3A An example of a process performed by the transport device 5 is shown. Fig.13A and Fig. 13B 1 and 2 are first and second flowcharts showing the processing procedures performed by the transport device 5. Note that Fig.13A Mainly shows Figure 3A The cooperative processing between the first robot 10-1 and the mobile buffer 110 shown, and Fig. 13B A cooperative process between the second robot 10 - 2 and the mobile buffer 110 is shown.

[0164] First, we will describe Fig.13A .like Fig.13A As shown, the mobile buffer 110 moves to the vicinity of the first robot 10-1 (step S101). The first robot 10-1 receives the processed substrate W from the mobile buffer 110 in one arm (step S102), and transports the unprocessed substrate W from the load lock chamber LL to the transfer chamber 100 in another arm (step S103).

[0165] In addition, the first robot 10-1 transfers the processed substrate W received from the mobile buffer 110 in step S102 to the load lock chamber by one arm (step S104). In addition, the first robot 10-1 transfers the unprocessed substrate W received from the load lock chamber LL in step S103 to the mobile buffer 110 by another arm (step S105).

[0166] The moving buffer 110 that has received the unprocessed substrate W moves to the vicinity of the second robot 10 - 2 (step S106 ), and the second robot 10 - 2 receives the unprocessed substrate W from the moving buffer 110 (step S107 ) and ends the process.

[0167] Although Fig.13A Although a case where each process is sequentially executed for easy understanding of the description is shown, processes that can be executed in parallel can be executed in parallel. Fig.13A A case is shown in which the first robot 10 - 1 delivers the unprocessed substrate W to the second robot 10 - 2 through the moving buffer 110 , but the first robot 10 - 1 may transport the unprocessed substrate W from the load lock chamber LL to the process chamber PC.

[0168] Next, we will describe Fig. 13B .exist Fig. 13B In the embodiment, it is assumed that an unprocessed substrate W is placed in one of the placement positions in the moving buffer 110, and the process starts from a state where another one of the placement positions is empty. Fig. 13B As shown, when the acquisition unit 21a of the controller 20 obtains the processing completion notification of the substrate W in the processing chamber PC (step S201), the mobile buffer 110 moves to the first retract position to avoid interfering with the second robot 10-2 (step S202), and the second robot 10-2 transports the processed substrate W from the processing chamber PC to the transfer chamber 100 (step S203).

[0169] Subsequently, the moving buffer 110 moves to the first transfer position for receiving the processed substrate W (step S204 ). Then, the second robot 10 - 2 delivers the processed substrate W to the moving buffer 110 (step S205 ).

[0170] When the mobile buffer 110 moves from the first transfer position to the second transfer position, the second robot 10-2 avoids interfering with the mobile buffer 110 only by the lifting and lowering operation of the hand 12 (step S206). That is, when the mobile buffer 110 moves from the first transfer position to the second transfer position, the second robot 10-2 avoids interfering with the mobile buffer 110 by the lifting and lowering operation of the hand 12 without changing the position or orientation of the hand 12 in the top view.

[0171] When the mobile buffer 110 moves to the second transfer position to deliver the unprocessed substrate W (step S207), the second robot 10-2 obtains the unprocessed substrate W from the mobile buffer 110 (step S208). The mobile buffer 110 moves to the second retracted position to avoid interfering with the second robot 10-2 (step S209), and the second robot 10-2 transports the unprocessed substrate W from the transfer chamber 100 to the processing chamber PC (step S210), ending the process.

[0172] The first transfer position and the second transfer position may be the same position or different positions. For example, when the mobile buffer 110 is Figure 3A When the buffer 110 is parallel to each other, the first transfer position and the second transfer position can be offset by the distance between the centers of the two substrate placement areas. Fig. 8A When the multi-stage buffer is used as shown in FIG. 1 , the first transfer position and the second transfer position may be the same position. The first fallback position and the second fallback position may be the same position or different positions.

[0173] Next, refer to Figures 14 to 16 A modified example of the arrangement of the robot 10 in the transfer room 100 is described. Figures 14 to 16 : are schematic top views showing Modifications 1 to 3 of the robot arrangement.

[0174] like Fig.14 As shown, in the transfer system 1, two processing chambers PC are provided for each of the first side wall 100sw1 and the second side wall 100sw2. The two processing chambers PC and the two processing chambers PC face each other. The third side wall 100sw3 is provided with a load lock chamber LL. The fourth side wall 100sw4 is provided with two processing chambers PC.

[0175] One first robot 10-1 is arranged on the third side wall 100sw3 side of the transfer chamber 100, and two second robots 10-2 are arranged on the fourth side wall 100sw4 side. Here, the first robot 10-1 is located in front of the load lock chamber LL, the first processing chamber PC1 of the first side wall 100sw1, and the first processing chamber PC1 of the second side wall 100sw2. The two second robots are located in front of the second processing chamber PC2 of the first side wall 100sw1 and the second side wall 100sw2.

[0176] Therefore, the first side wall 100sw1 and the second side wall 100sw2 of the transfer chamber 100 are respectively provided with opposite processing chambers PC. Each robot 10 (the first robot 10-1 and the second robot 10-2) moves the substrate W into and out of the opposite processing chamber PC. In the transfer system 1, each robot 10, each mobile buffer 110, each processing chamber PC and the load lock chamber LL are arranged symmetrically about the symmetry line between the first side wall 100sw1 and the second side wall 100sw2.

[0177] Here, the first mobile buffer 110-1 is provided between each robot 10 and the first side wall 100sw1, and the second mobile buffer 110-2 is provided between each robot 10 and the second side wall 100sw2. That is, when viewed from the direction along the moving direction of the mobile buffer 110, the first mobile buffer 110-1, the second robot 10-2, the second robot 10-2, and the second mobile buffer 110-2 are arranged in this order between the first side wall 100sw1 and the second side wall 100sw2. Therefore, even if any one of the two mobile buffers 110 stops or any one of the two second robots 10-2 stops, the conveyance of the substrate W can be continued, so that the availability of the conveyance of the substrate W can be increased.

[0178] By the way, although Fig.14 The case where one load lock chamber LL is provided in the third side wall 100sw3 which is a straight line in a top view is shown, but a plurality of load lock chambers LL may be provided on a radial line relative to the rotation center of the first robot 10-1. Fig.15 A case where a plurality of load lock chambers LL are provided in the third side wall 100sw3 is described.

[0179] Fig.15 The conveying system 1 shown in Fig.14 The illustrated transfer system 1 is different in that the third side wall 100sw3 has a shape curved toward the outside of the transfer chamber 100, and two load lock chambers LL are provided in the third side wall 100sw3. Each load lock chamber LL is provided in front of the first robot 10-1.

[0180] Therefore, the first robot 10-1 can access the two load lock chambers LL and the two first process chambers PC1, respectively. Therefore, even if any one of the two load lock chambers LL stops, the transfer of the substrate W can continue, thereby increasing the availability of the transfer of the substrate W. It should be noted that each robot 10, each mobile buffer 110, each process chamber PC, and each load lock chamber LL are arranged so that the transfer system 1 is symmetrical about the symmetry line between the first side wall 100sw1 and the second side wall 100sw2, which is similar to Fig.14The conveying system 1 shown.

[0181] exist Fig.14 and Fig.15 , the number of the first robots 10-1 accessing the load lock chamber LL is one, but the number of the first robots 10-1 may be two. Therefore, hereinafter, reference will be made to Fig.16 A case is described where the number of the first robots 10 - 1 is two and a total of four robots 10 including two second robots 10 - 2 are arranged in the transfer room 100 .

[0182] Fig.16 The transfer system 1 shown is square in a top view and symmetrical about a symmetry line of a first side wall 100sw1 and a second side wall 100sw2 facing each other and a symmetry line of a third side wall 100sw3 and a fourth side wall 100sw4 facing each other. Each of the two first robots 10-1 is arranged in front of the load lock chamber LL and the first processing chamber PC1. In addition, each of the two second robots 10-2 is arranged in front of the second processing chamber PC2.

[0183] Here, the first moving buffer 110-1 is provided between each robot 10 and the first side wall 100sw1, and the second moving buffer 110-2 is provided between each robot 10 and the second side wall 100sw2. Fig.16 In the transport system 1 shown, since the transport paths of the substrates W are formed into two systems, one on the first side wall 100sw1 side and the other on the second side wall 100sw2 side, the availability of transport of the substrates W can be improved.

[0184] That is, even when the robot 10 , the moving buffer 110 , the processing chamber PC, or the load lock chamber LL on the first side wall 100sw1 or the second side wall 100sw2 is stopped, processing of the substrate W can be continued. Therefore, the availability of the transfer system 1 can be improved.

[0185] As described above, the conveying equipment 5 according to the embodiment includes a plurality of robots 10 and a mobile buffer 110. The plurality of robots 10 are fixed in a chamber of the conveying chamber 100 in a reduced pressure atmosphere, and convey the substrate W. The conveying chamber 100 includes a side wall 100sw, and the side wall 100sw includes a plurality of processing chambers PC arranged in a horizontal orientation. The mobile buffer 110 is configured to hold the substrate W and move along a track 120 along the arrangement direction of the plurality of processing chambers PC. The robot 10 includes a first robot 10-1 and a second robot 10-2. The first robot 10-1 is fixed at a position where the load lock chamber LL and the first processing chamber PC1 can be transferred together with the substrate W. The first processing chamber PC1 is the processing chamber PC closest to the load lock chamber LL among the plurality of processing chambers PC. The second robot 10-2 is fixed at a position where the substrate W can be transferred through at least one second processing chamber PC2 different from the first processing chamber PC1 among the plurality of processing chambers PC. The moving buffer 110 is configured to move between the side wall 100sw and the robot 10 in a plan view and pass through a position suitable for moving the substrate W into and out of the first robot 10 - 1 and a position suitable for moving the substrate W into and out of the second robot 10 - 2 .

[0186] As described above, in the transport device, the robot is fixed, the buffer as a place where the substrate is placed is movable, and the substrate is transported by the coordinated operation of the robot and the mobile buffer, so that the weight of the transport target can be reduced. As a result, the moving mechanism can be simplified, and the operation rate of the transport mechanism can be increased, thereby improving the availability of substrate transport. Therefore, the substrate transport efficiency can be improved.

[0187] Additional advantages and modifications will readily occur to those skilled in the art. Therefore, the broader aspects of the present invention are not limited to the specific details and representative embodiments shown and described. Therefore, various modifications may be made without departing from the spirit or scope of the overall inventive concept defined by the appended claims and their equivalents.

[0188] Reference Mark List

[0189] 1. Transport system

[0190] 5. Transport equipment

[0191] 10. Robot

[0192] 10-1 First Robot

[0193] 10-2 Second Robot

[0194] 10A Rθz robot

[0195] 10B Multi-degree-of-freedom robot

[0196] 10C Dual-arm robot

[0197] 10D Dual-Arm Robot

[0198] 10rt rotation area

[0199] 11 Arm

[0200] 11a First Arm

[0201] 11b Second Arm

[0202] 12 hands

[0203] 15 Lifting mechanism

[0204] 20 Controller

[0205] 21 Control unit

[0206] 21a Acquisition Unit

[0207] 21b Operation control unit

[0208] 22 Storage Units

[0209] 22a Teaching Information

[0210] 100 moving room

[0211] 100c Top Wall

[0212] 100f bottom wall

[0213] 100fi bottom surface

[0214] 100sw side wall

[0215] 100sw1 First side wall

[0216] 100sw2 Second side wall

[0217] 100sw3 Third side wall

[0218] 100sw4 Fourth side wall

[0219] 101 Opening

[0220] 110 Mobile buffer

[0221] 110-1 First moving buffer

[0222] 110-2 Second mobile buffer

[0223] 111 Mobile unit (mover)

[0224] 112 Column

[0225] 112s Lifting Column

[0226] 113 Holding part (buffer)

[0227] 113a Support

[0228] 120 tracks

[0229] 120-1 First Track

[0230] 120-2 Second Track

[0231] 120a drive unit (stator)

[0232] 120b Guide

[0233] 120c can

[0234] AH1 First axis of rotation

[0235] AH2 Second axis of rotation

[0236] AH3 Third axis of rotation

[0237] AL Lifting Axis

[0238] AV lifting axis

[0239] B Base

[0240] CL Center Line

[0241] CW Substrate Center

[0242] F Flange

[0243] LL Load Lock Chamber

[0244] MG Magnet

[0245] PC Processing Room

[0246] PC1 First Processing Chamber

[0247] PC2 Second Processing Chamber

[0248] Sb buffer detection sensor

[0249] SC Ruler

[0250] SH scale head

[0251] W substrate

Claims

1. A conveying device, the conveying device being arranged in a conveying room, the conveying room having a reduced pressure atmosphere and comprising a side wall extending along an arrangement direction, the conveying device comprising: a first robot secured to a first robot position in the transfer chamber and configured to move substrates into and out of a first chamber disposed outside the transfer chamber; a second robot secured to a second robot position in the transfer chamber and configured to move the substrate into and out of a second chamber disposed on the side wall outside the transfer chamber; as well as A mobile buffer, wherein the mobile buffer is configured to: holding the substrate; and moving along a movement trajectory extending along the arrangement direction and located between the side wall and each of the first robot position and the second robot position, The movement trajectory includes a first position for moving the substrate into and out of the first robot and a second position for moving the substrate into and out of the second robot.

2. The conveying equipment according to claim 1, wherein: The transfer chamber further includes a second side wall facing the side wall, Wherein, each of the first robot and the second robot comprises: a hand configured to enable the substrate to be placed on the hand; and an arm configured to move the hand at least through a rotational motion, and Wherein, the arm is configured to rotate without interfering with the side wall and the second side wall.

3. The conveying equipment according to claim 1, wherein: The side wall is further provided with a third chamber, the third chamber being adjacent to the second chamber along the arrangement direction, and Wherein, the second robot is configured to move the substrate into and out of the second chamber and the third chamber.

4. The conveying equipment according to claim 2, wherein: Each of the first robot and the second robot is configured so that a circular area corresponding to a minimum rotation radius of the hand and the arm about a rotation center of the rotation motion overlaps with a movement trajectory of the moving buffer in a plan view.

5. The conveying equipment according to claim 2, wherein: The moving buffer is configured such that a moving trajectory of the moving buffer overlaps with a hand facing the side wall in a top view.

6. The conveying equipment according to claim 5, wherein: The moving buffer is configured to move under a hand carrying a processed substrate and receive the processed substrate from the hand.

7. The conveying equipment according to claim 1, wherein: The transfer chamber further includes a second side wall facing the side wall, The second robot is configured to move the substrate into and out of the second chamber and an opposite side chamber disposed outside the transfer chamber on the second side wall.

8. The transport device according to claim 7, further comprising a second mobile buffer, wherein the second mobile buffer is configured as: holding the substrate; and The robot moves along a second movement trajectory extending along the arrangement direction and located between the second side wall and each of the first robot position and the second robot position.

9. The conveying equipment according to claim 1, wherein: The transfer chamber further includes a second side wall facing the side wall, wherein the first chamber is disposed on the side wall outside the transfer chamber, and The first robot is configured to move the substrate into and out of the first chamber and an opposite side chamber disposed outside the transfer chamber on the second side wall.

10. The conveying equipment according to claim 2, wherein: Each of the first robot and the second robot is fixed so that a rotation center of the rotating motion is located at a middle position between the side wall and the second side wall in a plan view.

11. The conveying equipment according to claim 1, wherein: The mobile buffer comprises: a moving unit configured to be moved by an actuator; a column connected to the moving unit; and A holding portion is supported by the column and is configured to hold the substrate in a horizontal orientation.

12. The conveying equipment according to claim 11, wherein: The transfer chamber also includes a top wall and a bottom wall, and Wherein, the actuator is fixed to the top wall or the bottom wall.

13. The conveying equipment according to claim 12, wherein: The actuator is fixed to the top wall, and Wherein, each of the first robot and the second robot is fixed to the bottom wall.

14. The conveying equipment according to claim 11, wherein: The column is positioned between the side wall and the moving track, and The holding portion is supported by the column and extends away from the side wall to form a top surface for supporting the substrate.

15. The conveying equipment according to claim 3, wherein: The second robot is configured to move a hand along the arrangement direction while keeping the hand facing the side wall in a plan view.

16. The conveying equipment according to claim 2, wherein: The length of the hand of the second robot is greater than half of the distance between the side wall and the second side wall and less than the distance between the side wall and the second side wall.

17. The conveying equipment according to claim 1, wherein: The moving buffer is configured to hold a plurality of substrates simultaneously.

18. The conveying equipment according to claim 17, wherein: The moving buffer is a side-by-side buffer configured to hold a plurality of substrates arranged along the arrangement direction.

19. The conveying equipment according to claim 18, wherein: The side-by-side buffer has: two end supports, the two end supports being arranged along the arrangement direction, and a central support, said central support being positioned between said two end supports along said arrangement direction, wherein each of the two end supports and the central support extend away from the side wall, and Wherein, the central support is shorter than the two end supports.

20. The conveying equipment according to claim 17, wherein: The moving buffer is a multi-stage buffer configured to hold a plurality of substrates arranged in a vertical direction.

21. The transporting device according to claim 2, further comprising: a lifter configured to change a relative height between the moving buffer and the hand, wherein the moving buffer and each of the first robot and the second robot are configured such that if the hand is in a position for moving the substrate in and out of the moving buffer, the hand does not interfere with the moving buffer even regardless of the relative height.

22. The conveying equipment according to claim 21, wherein: The motion buffer is configured as: moving to a first retracted position to avoid interfering with a working hand, the working hand being a hand holding a processed substrate; After the working hand moves into the transfer chamber, the moving buffer moves from the first retracted position to a first transfer position to receive the processed substrate from the working hand. After receiving the processed substrate from the working hand, the mobile buffer moves to a second transfer position to deliver an unprocessed substrate to the working hand, and Wherein, the lifter is further configured to change the relative height to avoid interference between the working hand and the mobile buffer when the mobile buffer moves from the first transfer position to the second transfer position.

23. The conveying equipment according to claim 22, wherein: The moving buffer is configured to move to a second retracted position to avoid interfering with the moving of the working hand out of the transfer chamber after the working hand receives the unprocessed substrate at the second transfer position.

24. The conveying equipment according to claim 23, wherein: The lifter is also configured to raise and lower the working hand to change the relative height.

25. The conveying equipment according to claim 2, wherein: The first robot is a dual-arm robot, and the dual-arm robot comprises: a first arm unit including the hand and the arm; and A second arm unit includes a second hand and a second arm.

26. The conveying equipment according to claim 25, wherein: The first robot is configured to move a plurality of substrates into and out of the first chamber through the first arm unit and the second arm unit.

27. The conveying equipment according to claim 26, wherein: The first robot is configured as: receiving the processed substrate from the moving buffer by the first arm unit; loading an unprocessed substrate from the first chamber into the transfer chamber by the second arm unit, unloading the processed substrate into the first chamber through the first arm unit; and The unprocessed substrate is transferred to the moving buffer by the second arm unit.

28. The transporting device according to claim 8, further comprising: another robot, the another robot being fixed to another robot position in the transfer chamber and being configured to move the substrate into and out of the second moving buffer, Wherein, when viewed from a direction along the arrangement direction, the first moving buffer, the second robot position, the other robot position, and the second moving buffer are sequentially arranged in order from the side wall to the second side wall.

29. A method for transferring a substrate in a transfer chamber having a reduced pressure atmosphere and comprising a side wall extending along an arrangement direction, the method comprising the steps of: The first robot fixed at the first robot position in the transfer chamber loads the substrate from a first chamber disposed outside the transfer chamber into the transfer chamber; moving the mobile buffer to a receiving position along a movement trajectory between the side wall and the first robot position; transferring the substrate to the moving buffer located at the receiving position by the first robot; Move the moving buffer holding the substrate from the receiving position to the delivering position along the moving track; receiving the substrate from the moving buffer located at the transfer position by a second robot fixed at a second robot position in the transfer chamber, wherein the moving trajectory is located between the side wall and the second robot position; as well as The second robot transfers the substrate from the transfer chamber to a second chamber located outside the transfer chamber on the side wall.

30. The method of claim 29, wherein: The method further comprises the following steps: The first robot transfers the substrate from the transfer chamber to another chamber provided on the side wall outside the transfer chamber.

31. A conveying system, comprising: a transfer chamber including side walls and having a reduced pressure atmosphere, wherein the side walls extend along an arrangement direction; a first robot fixed at a first robot position in the transfer chamber and configured to move substrates into and out of a first chamber disposed outside the transfer chamber; a second robot fixed at a second robot position in the transfer chamber and configured to move the substrate into and out of a second chamber disposed on the side wall outside the transfer chamber; and a moving buffer located on a moving trajectory extending along the arrangement direction between the side wall and each of the first robot position and the second robot position, the moving buffer being configured to: holding the substrate; and Moving along the moving trajectory, The movement trajectory includes a first position for moving the substrate into and out of the first robot and a second position for moving the substrate into and out of the second robot.

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