A substrate processing device

Abstract

The present invention provides a substrate processing device, characterized in that it comprises: a vacuum lock chamber group for accommodating substrates; the vacuum lock chamber group is provided with one or more substrates; a process chamber group for processing the substrates; a transfer chamber located between the vacuum lock chamber group and the process chamber; the transfer chamber is provided with a first transfer mechanism and a second transfer mechanism; the first transfer mechanism and the second transfer mechanism are both used to load the substrates in the vacuum lock chamber group and move the substrates. The substrate processing device is used to continue to transfer substrates when one of the transfer mechanisms is damaged or regularly maintained, thereby avoiding production interruptions and helping to improve production capacity.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor equipment, and in particular to a substrate processing device. Background Art

[0002] At present, in semiconductor equipment, the device for transferring substrates needs regular maintenance after long-term operation. In mass production, damage to the substrate transfer mechanism or regular maintenance will delay a lot of time, resulting in production interruption, which is not conducive to improving production capacity. Therefore, a substrate processing device is urgently needed to improve the above problems. Summary of the invention

[0003] The object of the present invention is to provide a substrate processing device, which is used to continue to transport substrates when one of the transport mechanisms is damaged or requires regular maintenance, thereby avoiding production interruptions and helping to improve production capacity.

[0004] The present invention provides a substrate processing device, comprising: a vacuum lock chamber group, used to accommodate substrates; the vacuum lock chamber group is provided with one or more substrates; a process chamber group, used to process the substrates; a transfer chamber, located between the vacuum lock chamber group and the process chamber; the transfer chamber is provided with a first transfer mechanism and a second transfer mechanism; the first transfer mechanism and the second transfer mechanism are both used to load the substrates in the vacuum lock chamber group and move the substrates.

[0005] The beneficial effects of the substrate processing device of the present invention are: the substrates in the vacuum locking chamber group are loaded through the first conveying mechanism and the second conveying mechanism, and the substrates are moved to the process chamber; when the substrates are moved to the process chamber, the substrates are released; the loading of the substrates in the vacuum locking chamber group and the transfer of the substrates to the process chamber are achieved; when one conveying mechanism is damaged or undergoes regular maintenance, other conveying mechanisms can continue to work instead of the damaged or regularly maintained conveying mechanism, which is beneficial to improving the reliability of substrate transmission; in mass production, the first conveying mechanism and the second conveying mechanism simultaneously transfer the substrates, which is beneficial to improving production capacity.

[0006] Optionally, the transfer cabin is provided with a controller for controlling the movement of the first transfer mechanism and the second transfer mechanism. The beneficial effect is that when the first transfer mechanism fails to work properly, the second transfer mechanism replaces the first transfer mechanism to continue to transfer the substrate, thereby improving the reliability of substrate transfer and avoiding production stoppage.

[0007] Optionally, the controller is further used to control the first transmission mechanism and the second transmission mechanism to simultaneously transmit the substrate. The beneficial effect is that the substrate is transmitted simultaneously by the first transmission mechanism and the second transmission mechanism, which is conducive to improving production capacity.

[0008] Optionally, the transfer cabin is provided with a detection mechanism for detecting whether the first transfer mechanism and the second transfer mechanism are working normally. The beneficial effect is that the detection mechanism is used to detect whether the first transfer mechanism and the second transfer mechanism are working normally, thereby avoiding damage to the substrate caused by abnormal operation of the first transfer mechanism and the second transfer mechanism, which is conducive to safe production.

[0009] Optionally, the process chamber group includes a first process chamber and a second process chamber; the first process chamber is located at one side of the second process chamber, and the first process chamber and the second process chamber are used to process substrates independently. The beneficial effect is that by arranging the first process chamber at one side of the second process chamber, in conjunction with the first transmission mechanism and the second transmission mechanism, the production capacity is improved, the floor space required for the substrate processing device is reduced, and the cost is saved.

[0010] Optionally, the first transmission mechanism and the second transmission mechanism can transfer the substrates loaded thereon to each other. When the first transmission mechanism stops moving due to a fault, the adjacent second transmission mechanism can load the substrates loaded by the first transmission mechanism, thereby realizing the transfer of substrates between multiple transmission mechanisms and preventing the substrates from staying in the transmission cabin for a long time and affecting the production process.

[0011] Optionally, the transmission cabin is further provided with a lifting platform for lifting the first transmission mechanism and the second transmission mechanism. By controlling the lifting of the first transmission mechanism and the second transmission mechanism through the lifting platform, the first transmission mechanism and the second transmission mechanism can be lifted and lowered to adjust the height, thereby facilitating the expansion of the transmission range of the transmission mechanism.

[0012] Optionally, the transfer chamber is further provided with a guide mechanism for guiding the movement direction of the first transfer mechanism and the second transfer mechanism. When the first transfer mechanism and the second transfer mechanism or the lifting platform have positioning deviations after long-term operation, the guide mechanism can ensure that the first transfer mechanism and the second transfer mechanism can be aligned with the process chamber group and the vacuum lock chamber group to avoid damage to the substrate due to unstable loading.

[0013] Optionally, the transfer cabin is provided with a partition, and the partition is used to separate the transfer cabin into a plurality of independent transfer layers, and the transfer layer is provided with at least one of the first transfer mechanism or the second transfer mechanism. The transfer cabin is separated into a plurality of independent transfer layers by the partition, so that each independent cabin can independently transfer the substrate. When the substrate loaded by a certain transfer mechanism accidentally falls, it will not affect the normal operation of other transfer mechanisms, which is conducive to improving safety.

[0014] Optionally, the first transmission mechanism and the second transmission mechanism include a slide rail mechanism; the slide rail mechanism includes a guide rail, a slider and a loading part, one end of the guide rail is connected to the transmission cabin; the slider is used to drive the loading part to move along the guide rail; the loading part is used to load the substrate. The beneficial effect is that the substrate can be loaded and transmitted by the slide rail mechanism, which can adapt to different substrate processing environments.

[0015] Optionally, the slide rail mechanism further comprises a telescopic rod, and the telescopic rod is used to drive the loading part to rise and fall. The beneficial effect is that the telescopic rod is used to drive the loading part to rise and fall, so that the position of the slide rail mechanism for taking and placing the substrate can be expanded.

[0016] Optionally, a curved rail is provided on one side of the guide rail; at least one end of the curved rail is butted against the guide rail; and the curved rail cooperates with the slider. The beneficial effect is that the slider can be moved to another guide rail by cooperating with the curved rail, which facilitates the maintenance of the guide rail.

[0017] Optionally, the first transmission mechanism and the second transmission mechanism include a mechanical arm; one end of the mechanical arm is connected to the transmission cabin, and the other end of the mechanical arm is used to load the substrate. The beneficial effect is that the substrate can be loaded and transmitted by the mechanical arm to adapt to different substrate processing environments. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 A schematic diagram of a substrate processing device provided by the present invention;

[0019] Figure 2 A schematic diagram of another substrate processing device provided by the present invention;

[0020] Figure 3 A schematic diagram of a transmission cabin provided by the present invention;

[0021] Figure 4 A side view of another transmission cabin provided by the present invention;

[0022] Figure 5 A schematic diagram of a state of a substrate being transmitted by a substrate processing device provided by the present invention;

[0023] Figure 6 A schematic diagram of a substrate transfer state provided by the present invention;

[0024] Figure 7 A schematic diagram of the installation structure of the arc rail provided by the present invention;

[0025] Figure 8 A schematic diagram of the splicing state of the arc rail and the guide rail provided by the present invention;

[0026] Fig. 9 A schematic diagram of the installation structure of a robotic arm provided by the present invention.

[0027] Numbers in the figure:

[0028] 100, transmission cabin; 101, first transmission mechanism; 102, second transmission mechanism; 111, guide rail; 112, slider; 113, telescopic rod; 114, loading part; 115, substrate; 116, arc rail; 121, first partition; 122, second partition; 131, first transmission layer; 132, second transmission layer; 140, lifting platform; 150, guide mechanism; 161, first mechanical arm; 162, second mechanical arm; 170, detection mechanism; 180, controller;

[0029] 200, vacuum lock chamber group; 201, first lock chamber; 202, second lock chamber; 203, third lock chamber; 204, fourth lock chamber;

[0030] 301, first process chamber; 302, second process chamber;

[0031] 400, negative pressure mechanism;

[0032] 500. Positive and negative pressure conversion mechanism. DETAILED DESCRIPTION

[0033] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the present invention belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0034] Figure 1 A schematic diagram of a substrate processing device provided by the present invention.

[0035] In view of the problems existing in the prior art, the present invention provides a substrate processing device, such as Figure 1As shown, it includes: a vacuum lock chamber group 200, which is used to accommodate substrates 115. The vacuum lock chamber group 200 is provided with one or more substrates 115. A process chamber group is used to process the substrates 115. A transfer chamber 100 is located between the vacuum lock chamber group 200 and the process chamber group. The transfer chamber 100 is provided with a first transfer mechanism 101 and a second transfer mechanism 102. The first transfer mechanism 101 and the second transfer mechanism 102 are both used to load the substrates 115 in the vacuum lock chamber group and move the substrates 115.

[0036] In a specific embodiment, the left side of the transfer chamber 100 is connected to the process chamber group, and the right side of the transfer chamber 100 is connected to the vacuum lock chamber group 200. Exemplarily, the number of the vacuum lock chamber group 200 is 2, namely the first lock chamber 201 and the second lock chamber 202. The process chamber group includes a first process chamber 301 and a second process chamber 302. The number of the transmission mechanisms is 2, namely the first transmission mechanism 101 and the second transmission mechanism 102. The first transmission mechanism 101 loads the substrate 115 from the vacuum lock chamber group 200. Then the first transmission mechanism 101 moves the substrate 115 to the left and releases the substrate 115 into the process chamber group. During this process, the second transmission mechanism 102 is in a standby state. When the first transport mechanism 101 stops operating due to a malfunction, the second transport mechanism 102 starts operating, and the second transport mechanism 102 loads the substrate 115 from the vacuum lock chamber group 200 and then moves the substrate 115 to the left, releasing the substrate 115 into the process chamber group.

[0037] In other embodiments, the number of lock chambers in the vacuum lock chamber group 200 is Z. The number of process chambers in the process chamber group is X. The number of transmission mechanisms is Y, where X, Y and Z are all integers greater than 2.

[0038] In some embodiments, the transfer cabin 100 is provided with a controller 180 for controlling the movement of the first transfer mechanism 101 and the second transfer mechanism 102 .

[0039] It is worth noting that the controller 180 can be a control circuit, a control chip or other control devices capable of controlling the movement of the first transmission mechanism 101 and the second transmission mechanism 102 .

[0040] In some embodiments, the controller 180 is further used to control the first conveying mechanism 101 and the second conveying mechanism 102 to simultaneously convey the substrate.

[0041] It is worth noting that the first conveying mechanism 101 and the second conveying mechanism 102 can perform the same loading and releasing actions, and the first conveying mechanism 101 and the second conveying mechanism 102 can load the substrate 115 from the first locking chamber 201 and the second locking chamber 202. The first conveying mechanism 101 and the second conveying mechanism 102 can release the substrate 115 to the first process chamber 301 and the second process chamber 302.

[0042] In some specific embodiments, the first transport mechanism 101 and the second transport mechanism 102 take out the substrate 115 from the first process chamber 301 and release the substrate 115 to the second process chamber 302. This arrangement enables the substrate 115 to circulate within the process chamber group.

[0043] In some other specific embodiments, the first conveying mechanism 101 and the second conveying mechanism 102 take out the substrate 115 from the process chamber set, the first conveying mechanism 101 and the second conveying mechanism 102 move to the right, and release the substrate 115 into the vacuum lock chamber set 200. This arrangement can achieve storage of the substrate 115 after processing.

[0044] In some embodiments, the transfer cabin is provided with a detection mechanism 170 for detecting whether the first transfer mechanism 101 and the second transfer mechanism 102 are operating normally.

[0045] In some specific embodiments, the detection mechanism 170 is configured as a speed sensor. When the first transport mechanism 101 fails to work normally, the second transport mechanism 102 replaces the first transport mechanism 101 to continue transporting the substrate.

[0046] In other embodiments, the detection mechanism 170 may be a detection chip, a measuring device, or other mechanisms capable of sensing the movement state or working state of the first transmission mechanism 101 and the second transmission mechanism 102 .

[0047] In some embodiments, the process chamber group includes a first process chamber 301 and a second process chamber 302. The first process chamber 301 is located at one side of the second process chamber 302. The first process chamber 301 and the second process chamber 302 are used to process the substrate 115 independently.

[0048] In some specific embodiments, the first conveying mechanism 101 and the second conveying mechanism 102 operate simultaneously, and the first conveying mechanism 101 moves the substrate 115 in the first locking chamber 201 to the first process chamber 301. The second conveying mechanism 102 moves the substrate 115 in the second locking chamber 202 to the second process chamber 302. The first conveying mechanism 101 and the second conveying mechanism 102 may move the substrate 115 synchronously or asynchronously.

[0049] In other specific embodiments, the loading of the substrate 115 may be by adsorbing or clamping the substrate 115 , or by other loading methods that enable the substrate 115 to be attached to the first conveying mechanism 101 or the second conveying mechanism 102 .

[0050] In some other specific embodiments, the first transport mechanism 101 and the second transport mechanism 102 are further used to load the substrate 115 in the process chamber group and transport the substrate 115 to the vacuum lock chamber group 200, thereby realizing the reciprocating transport of the substrate 115 between the process chamber group and the vacuum lock chamber group 200.

[0051] Figure 2 A schematic diagram of another substrate processing device provided by the present invention.

[0052] In some embodiments, Figure 2 As shown, the transmission cabin 100 is further provided with a lifting platform 140 for lifting the first transmission mechanism 101 and the second transmission mechanism 102 .

[0053] In some embodiments, the transfer cabin 100 is further provided with a guide mechanism 150 for guiding the movement direction of the first transfer mechanism 101 and the second transfer mechanism 102 .

[0054] In a specific embodiment, the bottom end of the lifting platform 140 is fixedly connected to the bottom end of the transfer cabin 100, and the top end of the lifting platform 140 is fixedly connected to the first transfer mechanism 101. The lifting platform 140 can drive the first transfer mechanism 101 to rise and fall in the transfer cabin 100. The guide mechanism 150 is located at one side of the transfer cabin 100. The guide mechanism 150 is slidably connected to the first transfer mechanism 101, so that when the first transfer mechanism 101 approaches the first vacuum lock cabin group 200, it can only move horizontally along the guide mechanism 150.

[0055] It is worth noting that, in some embodiments, there may be multiple lifting platforms 140 , each used to drive multiple transmission mechanisms to lift and lower. There may be multiple guide mechanisms 150 , and the guide mechanisms 150 may be arranged on the left and right sides of the transmission cabin 100 .

[0056] Figure 3 A schematic diagram of a transmission cabin provided by the present invention.

[0057] In some embodiments, Figure 3As shown, the transmission cabin 100 is provided with a partition, and the partition is used to separate the transmission cabin 100 into a plurality of independent transmission layers. The transmission layer is provided with at least one of the first transmission mechanism 101 or the second transmission mechanism 102.

[0058] In a specific embodiment, the number of the partitions is multiple, such as a first partition 121 and a second partition 122. One side of the partition is detachably connected to the transfer cabin 100, and the transfer cabin 100 is divided into multiple independent transfer layers, such as a first transfer layer 131 and a second transfer layer 132, by the first partition 121 and the second partition 122. The transfer cabin 100 is arranged in a cubic shape. The first transfer layer 131 and the second transfer layer 132 are both arranged in a rectangular parallelepiped shape.

[0059] Figure 4 A side view of another transmission cabin provided by the present invention.

[0060] In some specific embodiments, Figure 4 As shown, the transfer cabin 100 is cylindrical, and a plurality of transfer mechanisms are symmetrically distributed in the transfer cabin 100 about the horizontal axis of the transfer cabin 100. The partition is flat and symmetrically arranged in the transfer cabin 100 about the horizontal axis of the transfer cabin 100. The partition divides the transfer cabin 100 into a plurality of transfer layers, and the transfer layers are arranged in a fan-shaped column.

[0061] It is worth noting that, in other embodiments, the partition may be fixedly connected to the transfer cabin 100. The transfer cabin 100 may be in other three-dimensional shapes, as long as it can accommodate the transfer mechanism and meet the requirements of the transfer mechanism loading the substrate 115. The partition may be in the shape of a curved plate, as long as it can separate the transfer cabin 100 into a plurality of transfer layers that penetrate the transfer cabin.

[0062] In some embodiments, the first transport mechanism and the second transport mechanism include a slide rail mechanism; the slide rail mechanism includes a guide rail 111, a slider 112 and a loading part 114, one end of the guide rail 111 is connected to the transport cabin; the slider 112 is used to drive the loading part 114 to move along the guide rail 111; the loading part 114 is used to load the substrate 115.

[0063] In some embodiments, the slide rail machine further includes a telescopic rod 113; the telescopic rod 113 is used to drive the loading part 114 to move up and down.

[0064] In some specific embodiments, the first transmission mechanism 101 and the second transmission mechanism 102 can be configured as a slide rail mechanism. The slide rail mechanism includes a guide rail 111, a slider 112, a telescopic rod 113 and a loading portion 114. One end of the guide rail 111 is fixedly connected to the transmission cabin 100. The slider 112 is used to drive the telescopic rod 113 and the loading portion 114 to slide along the guide rail 111. The telescopic rod 113 is used to drive the loading portion 114 to rise and fall. The loading portion 114 is used to load the substrate 115.

[0065] In some embodiments, the first transport mechanism and the second transport mechanism include a slide rail mechanism; the slide rail mechanism includes a loading part for loading the substrate. Loading and transporting the substrate by a robot arm or a slide rail mechanism can adapt to different substrate processing environments.

[0066] In some specific embodiments, the slide rail mechanism includes a guide rail 111, a slider 112, a telescopic rod 113 and a loading portion 114. One end of the guide rail 111 is fixedly connected to the transfer cabin 100, and the slider 112 is used to drive the telescopic rod 113 and the loading portion 114 to slide along the guide rail 111. The telescopic rod 113 is used to drive the loading portion 114 to rise and fall. The loading portion 114 is used to load the substrate 115.

[0067] Figure 5 A schematic diagram of the state of a substrate being transmitted by a substrate processing device provided by the present invention.

[0068] In other embodiments, Figure 5 As shown, the first transmission mechanism 101 and the second transmission mechanism 102 can be configured as a slide rail mechanism including a guide rail 111, a slider 112, a telescopic rod 113 and a loading part 114. The guide rail 111 is used for guiding. The slider 112 is used to drive the telescopic rod 113 and the loading part 114 to slide along the guide rail 111. The telescopic rod 113 is used to drive the loading part 114 to rise and fall. The loading part 114 can slide at one end of the telescopic rod 113 to facilitate adjustment of the position of clamping the substrate 115. The number of transmission mechanisms is at least 2. The guide rail 111 of the first transmission mechanism 101 located on the top side is fixedly connected to the top of the transmission cabin 100, and one side of the slider 112 is slidably connected to the guide rail 111. The other end of the slider 112 is fixedly connected to the telescopic rod 113. The telescopic rod 113 can be extended or shortened. The other end of the telescopic rod 113 is fixedly connected to the loading part 114. The loading part 114 is used to clamp the substrate 115.

[0069] In some embodiments, the first transport mechanism 101 and the second transport mechanism 102 are capable of transferring the loaded substrates 115 to each other.

[0070] Figure 6 A schematic diagram of the state of substrate transfer provided by the present invention.

[0071] In some specific embodiments, such as Figure 6 As shown, the substrate 115 loaded by the first conveying mechanism 101 is loaded by the second conveying mechanism 102. That is to say, after the first conveying mechanism 101 located on the top side is loaded with a substrate 115, during the conveying process, the first conveying mechanism 101 stops moving, the second conveying mechanism 102 located on the bottom side is unloaded and moves to the right side below the first conveying mechanism 101, the telescopic rod 113 of the second conveying mechanism 102 is extended, and the loading part 114 of the second conveying mechanism 102 loads the substrate 115, the loading part 114 of the first conveying mechanism 101 releases the substrate 115, the telescopic rod 113 of the second conveying mechanism 102 is shortened, and the second conveying mechanism 102 continues to move to the left to move the substrate 115 into the second process chamber 302. It is achieved that the conveying mechanism does not delay the conveying of the substrate 115 when it fails during the conveying process. It is worth noting that the loading part 114 is set as a suction cup, or other structure that can stably transport the substrate 115.

[0072] In some embodiments, a curved rail 116 is disposed on one side of the guide rail 111 ; at least one end of the curved rail 116 is connected to the guide rail 111 ; and the curved rail 116 cooperates with the slider 112 .

[0073] In some specific embodiments, one side of the transfer cabin 100 is rotatably connected to a curved rail 116, and the curved rail 116 has the same width as the guide rail 111. Both ends of the curved rail 116 can be engaged with the two guide rails 111, respectively, and one end of the loading portion 114 is slidably connected to one end of the telescopic rod 113.

[0074] In some other embodiments, the loading part 114 can be connected to the telescopic rod 113 in any manner. The arc rail 116 can be connected to the guide rail 111 in any manner. The loading part 114 can be configured as a clamp or other loading parts.

[0075] Figure 7 This is a schematic diagram of the installation structure of the arc rail provided by the present invention. Figure 8 A schematic diagram of the splicing state of the arc rail and the guide rail provided by the present invention.

[0076] In some specific embodiments, Figure 7 As shown, one side of the transfer cabin 100 is rotatably connected to an arc rail 116, and the arc rail 116 has the same width as the guide rail 111. The front end surface of the arc rail 116 is located in the same plane as the guide rail 111. When the arc rail 116 rotates downward, as shown in FIG. Figure 8As shown, the two ends of the arc rail 116 can be respectively engaged with the two guide rails 111, and the slider 112 of the first transmission mechanism 101 located on the top side can slide onto the guide rail 111 of the second transmission mechanism 102. At this time, the guide rail 111 of the first transmission mechanism 101 will not be blocked by the slider 112, which is convenient for maintenance. At the same time, the telescopic rod 113 of the second transmission mechanism 102 is extended, which can avoid collision between the loading parts 114 of the first transmission mechanism 101 and the second transmission mechanism 102. At this time, the loading part 114 of the second transmission mechanism 102 located on the right side can load the substrates 115 in the third locking chamber 203 and the fourth locking chamber 204 and transfer them to the first process chamber 301, and the loading part 114 of the first transmission mechanism 101 located on the left side can load the substrates 115 in the first locking chamber 201 and the second locking chamber 202 and transfer them to the second process chamber 302.

[0077] In some other specific embodiments, the telescopic rod 113 can rotate at least 180 degrees along the axis on which it is located. When the slider 112 slides to the right end of the guide rail 111, the loading unit 114 loads the substrate 115 in the third locking chamber 203. The slider 112 slides to the left along the guide rail 111, and the telescopic rod 113 rotates 180 degrees and extends at the same time, so that the wafer loaded by the loading unit 114 faces the left side. When the slider 112 slides to the left end of the guide rail 111, the loading unit 114 slides to the left along the top of the telescopic rod 113 to deliver the substrate 115 into the first process chamber 301.

[0078] In some other embodiments, the number of the guide rails 111 can be set to be multiple, and the guide rails 111 can be connected or disconnected with each other. When the multiple telescopic rods 113 move simultaneously, one telescopic rod 113 can be extended, another telescopic rod 113 can be shortened, or any other movement form.

[0079] In some embodiments, the first transmission mechanism 101 and the second transmission mechanism 102 can be configured as a mechanical arm or a slide rail machine. One end of the mechanical arm is fixedly connected to the transmission cabin 100 , and the other end of the mechanical arm is used to load the substrate 115 .

[0080] Fig. 9 A schematic diagram of the installation structure of a robotic arm provided by the present invention.

[0081] More specifically, Fig. 9As shown, the first transmission mechanism 101 and the second transmission mechanism 102 can be set as a mechanical arm, one end of which is fixedly connected to the inner side of the transmission chamber 100. The other end of the mechanical arm is used to load the substrate 115. The number of the mechanical arms is at least 2, for example, a first mechanical arm 161 and a second mechanical arm 162. The substrate 115 loaded by the first mechanical arm 161 can be loaded by the second mechanical arm 162. That is, after the first mechanical arm 161 loads a substrate 115, during the transmission, the first mechanical arm 161 stops moving, and the second mechanical arm 162 moves to the bottom of the first mechanical arm 161 without loading. The second mechanical arm 162 loads the substrate 115, the first mechanical arm 161 releases the substrate 115, and the second mechanical arm 162 continues to move to the left to move the substrate 115 into the second process chamber 302. It is achieved that the transmission of the substrate 115 is not delayed when the mechanical arm fails during transportation.

[0082] It is worth noting that the robot arm and the transfer chamber may be connected by sliding connection or other means. The robot arm may move the substrate 115 in such a way that the robot arm horizontally extends and retracts to drive the substrate to move into the process chamber group. Alternatively, the robot arm may drive the substrate to rotate into the process chamber group.

[0083] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.

Claims

1. A substrate processing device, characterized in that: include: A vacuum lock chamber assembly for accommodating substrates; The vacuum lock chamber assembly is provided with one or more substrates; A process chamber group, used for processing the substrate; The process chamber group comprises a first process chamber and a second process chamber; the first process chamber and the second process chamber are stacked in a direction perpendicular to the ground, and the first process chamber and the second process chamber are used to process substrates independently respectively; a transfer chamber, located between the vacuum lock chamber group and the process chamber; the transfer chamber is provided with a first transfer mechanism and a second transfer mechanism; the first transfer mechanism and the second transfer mechanism are both used to take out the substrate from the vacuum lock chamber group, move the substrate, and put it into the process chamber group, and / or take out the substrate from the process chamber group, move the substrate, and put it into the vacuum lock chamber group; The transmission cabin is provided with a partition, and the partition is used to separate the transmission cabin into a plurality of independent transmission layers; the transmission layer is provided with at least one of the first transmission mechanism or the second transmission mechanism; The first transmission mechanism and the second transmission mechanism include a slide rail mechanism; the slide rail mechanism includes a guide rail, a slider and a loading part, one end of the guide rail is connected to the transmission cabin; the slider is used to drive the loading part to move along the guide rail; the loading part is used to load the substrate; A curved rail is provided on one side of the guide rail; at least one end of the curved rail is butted against the guide rail; the curved rail is matched with the slider; The arc rail is rotatably connected to one side of the transmission cabin, and the arc rail has the same width as the guide rail; the front end surface of the arc rail is located in the same plane as the guide rail; when the arc rail rotates downward, the two ends of the arc rail can respectively engage with the two guide rails, and the slider of the first transmission mechanism located on the top side can slide onto the guide rail of the second transmission mechanism.

2. The substrate processing device according to claim 1, characterized in that: The transmission cabin is provided with a controller for controlling the movement of the first transmission mechanism and the second transmission mechanism.

3. The substrate processing device according to claim 2, characterized in that: The controller is also used to control the first transport mechanism and the second transport mechanism to transport the substrate simultaneously.

4. The substrate processing device according to claim 1, characterized in that: The transmission cabin is provided with a detection mechanism for detecting whether the first transmission mechanism and the second transmission mechanism are operating normally.

5. The substrate processing device according to claim 1 or 3, characterized in that: The first transport mechanism and the second transport mechanism are capable of transferring the loaded substrates to each other.

6. The substrate processing device according to claim 1 or 2, characterized in that: The transmission cabin is also provided with a lifting platform for lifting the first transmission mechanism and the second transmission mechanism.

7. The substrate processing device according to claim 1 or 2, characterized in that: The transmission cabin is also provided with a guiding mechanism for guiding the movement direction of the first transmission mechanism and the second transmission mechanism.

8. The substrate processing device according to claim 7, characterized in that: The slide rail machine also includes a telescopic rod; The telescopic rod is used to drive the loading part to move up and down.

9. The substrate processing device according to claim 1, characterized in that: The first transmission mechanism and the second transmission mechanism include a robotic arm; One end of the robotic arm is connected to the transfer cabin, and the other end of the robotic arm is used for loading the substrate.

Images