Nanoimprint template and method for manufacturing the same

Abstract

The present invention discloses a nanoimprint template and a method for manufacturing the same. The nanoimprint template comprises a substrate and a unit structure formed on the substrate. The substrate comprises: a base (1), a first microstructure array layer (2), a first bonding layer (4), a first flexible layer (11) and a base layer (13). The first microstructure array layer comprises a plurality of first microstructures, and the plurality of first microstructures are separated by first cavities (3). The first bonding layer (4) is arranged above the first microstructure array layer (2) and is bonded to the upper surface of the first microstructure array layer (2) at low temperature. The first insertion layer (5) is arranged on the first bonding layer. The first flexible layer (11) is arranged above the first insertion layer. The base layer (13) is arranged above the first flexible layer (11). The nanoimprint template of the present invention can effectively reduce stress problems generated during the template manufacturing process and the use process.

Description

Technical Field

[0001] The invention relates to nanoimprint technology, in particular to a nanoimprint template and a preparation process thereof. Background Art

[0002] As one of the core technologies leading the future scientific and technological revolution, nanotechnology has attracted great attention from the scientific and industrial communities. In the 1990s, the "Nanostructure Laboratory of the University of Minnesota" in the United States proposed and demonstrated a new technology called "nanoimprinting", which has the unique advantages of high resolution, low cost and mass production, and has become one of the most promising micro-nanostructure manufacturing technologies.

[0003] Nanoimprinting is mainly divided into hot embossing and UV embossing. Hot embossing is the earliest developed nanoimprinting technology, but because it requires high temperature and high pressure, the surface structure and material of the imprinting template are prone to thermal expansion, which leads to large dimensional errors of the imprinted structure and difficulties in alignment, overprinting and demolding.

[0004] Currently, nanoimprint researchers want to try a low-cost and long-term use template that generates low stress during use. In the existing technical solutions, in order to eliminate the stress effect during the template manufacturing process and the imprinting process, a spring layer structure is used, but the effect is not ideal and the product cost is high.

[0005] The information disclosed in this background technology section is only intended to enhance the understanding of the overall background of the invention and should not be regarded as an acknowledgment or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art. Summary of the invention

[0006] The object of the present invention is to provide a nanoimprint template, which can effectively reduce the stress and strain generated during template manufacturing and imprinting processes.

[0007] To achieve the above-mentioned purpose, an embodiment of the present invention provides a nanoimprint template. The nanoimprint template includes a substrate and a unit structure formed on the substrate. The substrate includes: a substrate, a first microstructure array layer, a first bonding layer, a first insertion layer, a first flexible layer and a base layer. The first microstructure array layer is formed on the substrate, and the first microstructure array layer includes a plurality of first microstructures, and the plurality of first microstructures are separated by a first cavity. The first bonding layer is arranged above the first microstructure array layer and is bonded to the upper surface of the first microstructure array layer at low temperature. The first insertion layer is arranged on the first bonding layer. The first flexible layer is arranged above the first insertion layer. The base layer is arranged above the first flexible layer, and the upper surface of the base layer is used to form the unit structure.

[0008] In one or more embodiments of the present invention, the nanoimprint template also includes: a second bonding layer, arranged on the first insertion layer; a second insertion layer, arranged on the upper surface of the second bonding layer and low-temperature bonded to the second bonding layer; a second microstructure array layer, formed on the upper surface of the second insertion layer, the second microstructure array layer includes a plurality of second microstructures, and the plurality of second microstructures are separated by second cavities; and a third insertion layer, low-temperature bonded to the upper surface of the second microstructure array layer.

[0009] In one or more embodiments of the present invention, the first flexible layer is bonded to the upper surface of the third insertion layer at low temperature. In addition, the lower surface of the base layer may be provided with a second flexible layer, the lower surface of which is plated with the first flexible layer. The second flexible layer may be composed of graphene.

[0010] In one or more embodiments of the present invention, the first microstructure array layer has a graphene layer and a Ti / Au alloy layer.

[0011] Another aspect of the present invention provides a method for manufacturing a nanoimprint template, characterized in that it includes the following steps: forming a substrate; forming a first microstructure array layer on the substrate through an etching process, the first microstructure array layer including a plurality of first microstructures, and the plurality of first microstructures are separated by first cavities; low-temperature bonding the first microstructure array layer to a first bonding layer on the upper surface; forming a first insertion layer on the upper surface of the first bonding layer; forming a first flexible layer above the first insertion layer; and forming a base layer on the first flexible layer, the upper surface of the base layer being used to form a unit structure.

[0012] In one or more embodiments of the present invention, the manufacturing method further includes the following steps: forming a second bonding layer on the upper surface of the first insertion layer; forming a second microstructure array layer on the upper surface of the second insertion layer by an etching process, the second microstructure array layer comprising a plurality of second microstructures, the plurality of second microstructures being separated by second cavities; low-temperature bonding the upper surface of the second microstructure array layer (8) to the third insertion layer; and low-temperature bonding the second insertion layer (7) to the second bonding layer.

[0013] In one or more embodiments of the present invention, the first flexible layer is bonded to the upper surface of the third insertion layer at low temperature.

[0014] In one or more embodiments of the present invention, the manufacturing method further includes the following steps: disposing a second flexible layer on the lower surface of the base layer, the lower surface of the second flexible layer being plated with the first flexible layer, and the second flexible layer is composed of graphene.

[0015] In one or more embodiments of the present invention, the lateral dimensions of the first microstructure / the second microstructure and the first cavity / the second cavity are both between 1.0 micrometer and 20 micrometers.

[0016] Compared with the prior art, the nanoimprint template according to the embodiment of the present invention forms a cavity structure on the substrate, which can advantageously offset the stress generated during the template manufacturing and use process. Furthermore, by using a double-layer cavity array structure and using a flexible layer as a medium, various stresses and strains can be effectively offset. In addition, by using a low-temperature bonding connection method between multiple layers, the template avoids high-temperature connection during the manufacturing process, reducing the generation of stress and strain. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 Schematic diagram of the structure of a nanoimprint template according to one embodiment of the present invention.

[0018] Description of main reference numerals:

[0019] 1-substrate, 2-first microstructure layer, 3-first cavity, 4-first bonding layer, 6-second bonding layer. DETAILED DESCRIPTION

[0020] The specific implementation modes of the present invention are described in detail below in conjunction with the accompanying drawings, but it should be understood that the protection scope of the present invention is not limited by the specific implementation modes.

[0021] Unless explicitly stated otherwise, throughout the specification and claims, the term “comprise” or variations such as “include” or “comprising”, etc., will be understood to include the stated elements or components but not to exclude other elements or components.

[0022] As described in the background technology, existing nanoimprint templates cannot effectively overcome the stress and strain generated during template manufacturing and template use. The nanoimprint template according to an embodiment of the present invention effectively alleviates the stress problem of the nanoimprint template by forming a cavity on the substrate and using flexible materials.

[0023] like Figure 1 As shown, a nanoimprint template according to an embodiment of the present invention includes a substrate and a unit structure 13 formed on the substrate. The substrate includes a base 1. The base 1 may be, but is not limited to, quartz, ceramic, and other materials. A thin film may be sputtered on the base 1 by a process such as magnetron sputtering. A layer of graphene is first coated on the surface of the thin film, and then a layer of alloy is plated on the surface of the graphene, such as a Ti / Au alloy coating.

[0024] Next, a two-dimensional or three-dimensional mask distribution is formed on the surface of the above-mentioned coating by processes such as photolithography and etching, Au is etched away with iodine and KI solution, Ti is etched away with HF solution, and graphene is etched by RIE, thereby forming a first microstructure array layer 2. The first microstructure array layer 2 includes a plurality of first microstructures, and the plurality of first microstructures are separated by first cavities 3. The arrangement of the cavity 3 can effectively reduce the stress and strain generated in the production process.

[0025] The upper surface of the first microstructure array layer 2 is bonded with a first bonding layer 4 by a process such as low temperature bonding. The material of the first bonding layer 4 can be a symmetrical material structure such as Ni / Au, Ti / Au, etc. Due to the low temperature bonding, the manufacturing process of the template is prevented from being at high temperature for a long time, so the stress caused by the process such as high temperature bonding can be effectively avoided, and the large strain generated after the template returns to normal temperature under the high temperature production process can be avoided.

[0026] The upper surface of the first bonding layer 4 is provided with a first insertion layer 5. The material of the first insertion layer 5 can be silicon or nickel or other materials, and the upper surface of the first insertion layer 5 can be provided with a second bonding layer 6. In other words, the upper and lower surfaces of the first insertion layer 5 can both be provided with low-temperature bonding layers, which can be achieved by processes such as sputtering and thermal evaporation.

[0027] In one embodiment, in order to more effectively alleviate the stress problem, a second microstructure array with a cavity structure may be provided. Specifically, a second insertion layer 7 may be formed on the upper surface of the second bonding layer 6 and the second insertion layer 7 may be bonded to the second bonding layer 6 at low temperature. The second insertion layer 7 may have a second microstructure array.

[0028] In terms of manufacturing process, a second microstructure array layer 8 can be first formed on the upper surface of the second insertion layer 7 (for example, a silicon base material) through an etching process. The second microstructure array layer 8 includes a plurality of second microstructures, and the plurality of second microstructures are separated by second cavities 9. The formation process can be similar to the process of the first microstructure array layer 2, which will not be repeated here.

[0029] Then, the second insertion layer 7 with the second microstructure array layer 8 is bonded to the second bonding layer 6, thereby forming a substrate with a double-layer cavity array structure as a stress relief area.

[0030] In one embodiment, a third insertion layer 10 may be further formed on the upper surface of the second microstructure array layer 8 and preferably, the upper surface of the second microstructure array layer 8 and the third insertion layer 10 are bonded together at low temperature.

[0031] In order to reduce the stress generated during the use of the nanoimprint template, in one embodiment of the present invention, one or more layers of flexible materials can be used as an intermediate layer to reduce the stress and strain during the imprinting process. Specifically, a first flexible layer 11 can be arranged above the third insertion layer 10, or a first flexible layer 11 and a second flexible layer 12 can be arranged on the third insertion layer 10. In one embodiment, the second flexible layer (12) can be composed of graphene, and the first flexible layer can be bonded to the upper surface of the third insertion layer 10 at low temperature. Through this structure, the symmetrical structure of the flexible layer can be used to effectively reduce the generation of stress.

[0032] In the case of only one flexible layer, the base layer 13 can be disposed on the first flexible layer 11, or in the case of two flexible layers, the base layer 13 can be disposed on the second flexible layer. The upper surface of the base layer 13 is used to form a unit structure, that is, an embossed pattern.

[0033] In summary, according to the nanoimprint template of the embodiment of the present invention, a cavity structure is formed on the substrate 1, which can advantageously offset the stress generated during the template manufacturing and use. Further, by using a double-layer cavity array structure and using a flexible layer as a medium, various stresses and strains can be effectively offset. In addition, by using a low-temperature bonding connection method between multiple layers, the template avoids high-temperature connection during the manufacturing process, reducing the generation of stress and strain.

[0034] The foregoing description of specific exemplary embodiments of the present invention is for the purpose of illustration and demonstration. These descriptions are not intended to limit the present invention to the precise form disclosed, and it is clear that many changes and variations can be made based on the above teachings. The purpose of selecting and describing the exemplary embodiments is to explain the specific principles of the present invention and its practical application, so that those skilled in the art can realize and utilize various different exemplary embodiments of the present invention and various different selections and changes. The scope of the present invention is intended to be limited by the claims and their equivalents.

Claims

1. A nanoimprint template, comprising a substrate and a unit structure formed on the substrate, characterized in that: The substrate comprises: Base (1); A first microstructure array layer (2) is formed on the substrate, the first microstructure array layer comprising a plurality of first microstructures, wherein the plurality of first microstructures are separated by first cavities (3); A first bonding layer (4) is arranged above the first microstructure array layer (2) and is bonded to the upper surface of the first microstructure array layer (2) at low temperature; A first insertion layer (5) is arranged on the first bonding layer (4); a first flexible layer (11) disposed above the first insertion layer; and A base layer (13) is arranged above the first flexible layer (11), and the upper surface of the base layer is used to form the unit structure.

2. The nanoimprint template according to claim 1, wherein: Also includes: A second bonding layer (6) is disposed on the first insertion layer (5); A second insertion layer (7) is arranged on the upper surface of the second bonding layer (6) and is bonded to the second bonding layer at low temperature; A second microstructure array layer (8) formed on the upper surface of the second insertion layer, the second microstructure array layer comprising a plurality of second microstructures, wherein the plurality of second microstructures are separated by second cavities; as well as The third insertion layer (10) is bonded to the upper surface of the second microstructure array layer (8) at low temperature.

3. The nanoimprint template according to claim 2, characterized in that: The first flexible layer (11) is bonded to the upper surface of the third insertion layer (10) at low temperature.

4. The nanoimprint template according to claim 1, wherein: A second flexible layer (12) is provided on the lower surface of the base layer (13), and the lower surface of the second flexible layer (12) is plated with the first flexible layer (11).

5. The nanoimprint template according to claim 4, characterized in that: The second flexible layer (12) is made of graphene.

6. The nanoimprint template according to claim 1, wherein: The first microstructure array layer (2) comprises a graphene layer and a Ti / Au alloy layer.

7. A method for manufacturing a nanoimprint template, characterized in that: The following steps are involved: forming a substrate (1); Forming a first microstructure array layer (2) on the substrate by an etching process, the first microstructure array layer comprising a plurality of first microstructures, wherein the plurality of first microstructures are separated by first cavities; Bonding the upper surface of the first microstructure array layer (2) to the first bonding layer (4) at low temperature; forming a first insertion layer (5) on the upper surface of the first bonding layer (4); forming a first flexible layer (11) above the first insertion layer (5); and A base layer (13) is formed on the first flexible layer (11), and the upper surface of the base layer is used to form a unit structure.

8. The manufacturing method according to claim 7, characterized in that: The following steps are also included: forming a second bonding layer (6) on the upper surface of the first insertion layer; forming a second microstructure array layer (8) on the upper surface of the second insertion layer (7) by an etching process, the second microstructure array layer comprising a plurality of second microstructures, wherein the plurality of second microstructures are separated by second cavities (9); bonding the upper surface of the second microstructure array layer (8) to the third insertion layer (10) at low temperature; and The second insertion layer (7) and the second bonding layer (6) are bonded together at low temperature.

9. The manufacturing method according to claim 8, characterized in that: The first flexible layer (11) is bonded to the upper surface of the third insertion layer (10) at low temperature.

10. The manufacturing method according to claim 7, characterized in that: The following steps are also included: A second flexible layer (12) is arranged on the lower surface of the base layer (13), the lower surface of the second flexible layer (12) is plated with the first flexible layer (11), and the second flexible layer (12) is composed of graphene.

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