Touch substrate, display substrate, and display device

Abstract

The present disclosure relates to a touch substrate, a display substrate, and a display device. The touch substrate includes: a plurality of first touch signal lines, a plurality of second touch signal lines, and a plurality of transparent photosensitive devices. The plurality of transparent photosensitive devices are arranged in an array along a first direction and a second direction, and are used to detect the light output brightness of a pixel; wherein the first direction and the second direction intersect. The first touch signal line extends along the first direction. A row of transparent photosensitive devices is coupled to a first touch signal line; the first touch signal line is configured to be multiplexed as a control signal line for the transparent photosensitive device. The second touch signal line extends along the second direction. A column of transparent photosensitive devices is coupled to a second touch signal line; the second touch signal line is configured to be multiplexed as a read signal line for the transparent photosensitive device. The above-mentioned touch substrate, display substrate, and display device can improve the aperture ratio of the display device while ensuring the brightness uniformity of the display device.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a touch substrate, a display substrate, and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) is widely used in the display field due to its advantages such as self-luminescence, high contrast and low power consumption.

[0003] In display devices using OLEDs as light-emitting devices, due to the inherent properties of the OLED's internal light-emitting materials, the OLEDs will age to varying degrees over time, resulting in a decrease in the uniformity of the display's brightness. Furthermore, as the display area of ​​the display device increases, the switching voltage of the driver transistor in the OLED's corresponding driver circuit is also susceptible to IR drop, resulting in a decrease in the uniformity of the display's brightness. Therefore, providing an internal and / or external compensation circuit for the OLED in the display device can compensate for the uniformity of the display's brightness.

[0004] However, when an external compensation circuit is installed in a display device for compensation, a light detection element is typically required to collect display brightness. Furthermore, to ensure high compensation accuracy and signal-to-noise ratio, the light detection element must have a large light-collecting area. This can easily lead to a low aperture ratio in the display device, hindering the improvement of the display's pixel density. Summary of the Invention

[0005] Based on this, it is necessary to provide a touch substrate, a display substrate, and a display device to improve the aperture ratio of the display device while ensuring the brightness uniformity of the display device.

[0006] According to one aspect of an embodiment of the present disclosure, a touch substrate is provided. The touch substrate includes: a plurality of first touch signal lines, a plurality of second touch signal lines, and a plurality of transparent photosensitive devices. The plurality of transparent photosensitive devices are arranged in an array along a first direction and a second direction, and are used to detect the brightness of light emitted by a pixel; wherein the first direction and the second direction intersect. The first touch signal line extends along the first direction. A row of transparent photosensitive devices is coupled to a first touch signal line; the first touch signal line is configured to be multiplexed as a control signal line for the transparent photosensitive device. The second touch signal line extends along the second direction. A column of transparent photosensitive devices is coupled to a second touch signal line; the second touch signal line is configured to be multiplexed as a read signal line for the transparent photosensitive device.

[0007] In the disclosed embodiments, a transparent photosensitive device is used as a light detection element to detect the brightness of pixel light output. This eliminates the need for the transparent photosensitive device to be positioned in non-pixel areas. Specifically, the transparent photosensitive device can be positioned in the pixel area, for example, directly above the pixel light output. This allows the transparent photosensitive device to have a larger light-collecting area, ensuring high compensation accuracy and signal-to-noise ratio. Furthermore, the transparent photosensitive device has high light transmittance and does not affect the aperture ratio of the touch substrate or the display device in which it is located. This helps increase the pixel density of the display device, thereby enhancing the display quality of the display device.

[0008] Furthermore, the control signal lines and readout signal lines of the transparent photosensitive device can be multiplexed by combining the first touch signal line and the second touch signal line. This simplifies the wiring design of the external signal lines of the transparent photosensitive device, thereby simplifying the fabrication process of the touch substrate and reducing the fabrication cost of the touch substrate.

[0009] In some embodiments, the transparent photosensitive device includes a transparent photosensitive transistor. In the embodiments of the present disclosure, the transparent photosensitive transistor is used as the light detection element, which can have good and stable electrical characteristics to achieve accurate detection of the brightness of the pixel light.

[0010] Optionally, the transparent photosensitive transistor includes: a stacked transparent photosensitive active layer, a gate dielectric layer, and a transparent gate electrode, and a transparent source electrode and a transparent drain electrode respectively coupled to the transparent photosensitive active layer. The transparent gate electrode is coupled to the first touch signal line, and the transparent source electrode and the transparent drain electrode are coupled to the second touch signal line.

[0011] In some embodiments, the touch substrate further comprises an insulating layer, wherein the transparent gate and the first touch signal line are located on the same side of the insulating layer, and the transparent source, the transparent drain, and the second touch signal line are located on a side of the insulating layer away from the transparent gate.

[0012] In some embodiments, the first touch signal line includes a first lead portion and a first overlapping portion located on different layers. The transparent gate is coupled to the first lead portion or the first overlapping portion. And / or, the second touch signal line includes a second lead portion and a second overlapping portion located on different layers. The transparent source and the transparent drain are coupled to the second lead portion or the second overlapping portion.

[0013] In some embodiments, the first touch signal line includes a metal signal line or a transparent signal line, and / or the second touch signal line includes a metal signal line or a transparent signal line.

[0014] In the embodiment of the present disclosure, the first touch signal line and / or the second touch signal line are metal signal lines, which can have a lower resistance value and better conductivity, so as to ensure the transmission accuracy of the signal.

[0015] In addition, the first touch signal line and / or the second touch signal line are transparent signal lines, which is beneficial for arranging part of the layer structure of the transparent photosensitive device in the same layer, thereby simplifying the preparation process of the transparent photosensitive device and reducing the preparation cost of the transparent photosensitive device.

[0016] In some embodiments, a plurality of first touch signal lines and a plurality of second touch signal lines intersect to form a grid; the transparent photosensitive devices are located in the meshes of the grid in a one-to-one correspondence, which helps to improve the space utilization rate of the touch substrate.

[0017] Optionally, the touch substrate further includes a plurality of sub-pixels. Each sub-pixel corresponds one-to-one to each mesh of the grid. A transparent photosensitive device is located on the light-emitting side of each sub-pixel. This allows for more accurate measurement of the light output brightness of each sub-pixel, ensuring excellent brightness uniformity across the touch substrate and the display device in which it resides.

[0018] According to another aspect of the present disclosure, a display substrate is provided. The display substrate includes an array substrate and a plurality of sub-pixels disposed on the array substrate. The sub-pixels include a light-emitting device and a transparent photosensitive device located on the light-emitting side of the light-emitting device. The light-emitting device includes a light-emitting layer. The transparent photosensitive device includes a transparent photosensitive transistor. The transparent photosensitive transistor includes a stacked transparent photosensitive active layer, a gate dielectric layer, and a transparent gate electrode, as well as a transparent source electrode and a transparent drain electrode, respectively coupled to the transparent photosensitive active layer. The transparent photosensitive active layer and the light-emitting layer have orthographic projections on the array substrate that at least partially overlap.

[0019] In the disclosed embodiments, a transparent photosensitive device is used as a light detection element to detect the brightness of light emitted by a pixel. This allows the placement of the transparent photosensitive device to be no longer restricted to non-pixel areas. This allows the transparent photosensitive device to have a larger light-collecting area. For example, the orthographic projections of the transparent photosensitive active layer and the light-emitting layer in the transparent photosensitive device on the array substrate overlap, ensuring high compensation accuracy and signal-to-noise ratio. Furthermore, the transparent photosensitive device has high light transmittance and does not affect the aperture ratio of the display substrate or the display device in which it is located. This helps to increase the pixel density of the display device, thereby enhancing the display quality of the display device.

[0020] According to another aspect of the present disclosure, a display device is provided, which includes the touch substrate or the display substrate described in some of the above embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiments below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present disclosure. The same reference numerals are used throughout the drawings to denote the same components. In the drawings:

[0022] Figure 1 is a schematic top view of a touch substrate or a display substrate in one embodiment of the present disclosure;

[0023] Figure 2 A schematic cross-sectional view of a partial structure of a touch control substrate according to an embodiment of the present disclosure;

[0024] Figure 3 A schematic cross-sectional view of a partial structure of another touch control substrate according to an embodiment of the present disclosure;

[0025] Figure 4 is a cross-sectional schematic diagram of a partial structure of another touch control substrate according to an embodiment of the present disclosure;

[0026] Figure 5 A schematic top view of a partial structure of another touch control substrate according to an embodiment of the present disclosure;

[0027] Figure 6 for Figure 5 A schematic cross-sectional view of a local structure of a touch control substrate is shown;

[0028] Figure 7 A schematic top view of a partial structure of another touch control substrate according to an embodiment of the present disclosure;

[0029] Figure 8 for Figure 7 A schematic cross-sectional view of a local structure of a touch control substrate is shown;

[0030] Figure 9 A schematic cross-sectional view showing a local structure of a substrate in one embodiment of the present disclosure;

[0031] Figure 10 FIG2 is a cross-sectional schematic diagram showing a local structure of another display substrate in an embodiment of the present disclosure.

[0032] The accompanying drawings in the specific implementation manner are as follows:

[0033] Substrate 01;

[0034] Array substrate 011, pixel defining layer 012, light emitting device 013, pixel encapsulation layer 014;

[0035] A first touch signal line and a control signal line 1;

[0036] A second touch signal line and a read signal line 2;

[0037] Transparent photosensitive device 3;

[0038] Transparent photosensitive active layer 31, gate dielectric layer 32, transparent gate 33, transparent source 34, transparent drain 35;

[0039] Insulating layer 02; flat layer 03. DETAILED DESCRIPTION

[0040] To facilitate understanding of the present disclosure, a more comprehensive description of the present disclosure will be provided below with reference to the accompanying drawings. The accompanying drawings illustrate preferred embodiments of the present disclosure. However, the present disclosure can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and comprehensive understanding of the disclosure.

[0041] It should be understood that although the terms "first", "second", etc. may be used herein to describe various elements, they do not indicate any order, quantity, or importance, but are merely used to distinguish different components. These terms are only used to distinguish one element from another. For example, without departing from the scope of this disclosure, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element. "Include" or "comprising" and similar words mean that the elements or objects that appear before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0042] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art in the art of the present disclosure. The terms used herein in the specification of the present disclosure are only for the purpose of describing specific embodiments and are not intended to limit the present disclosure.

[0043] As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0044] The term "coupling" as used herein may refer to a method of electrical connection for signal transmission. "Coupling" should be understood in a broad sense, for example, "coupling" may be a direct electrical connection or an indirect electrical connection via an intermediate medium.

[0045] References herein to "embodiments" mean that a particular feature, structure, or characteristic described in connection with the embodiments may be included in at least one embodiment of the present disclosure. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it constitute an independent or alternative embodiment that is mutually exclusive of other embodiments. It is understood, both explicitly and implicitly, by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0046] In the description of the embodiments of the present disclosure, the orientations or positional relationships indicated by technical terms such as "row" and "column" are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the embodiments of the present disclosure and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on the embodiments of the present disclosure.

[0047] In addition, to clearly illustrate the multiple layers and regions in the drawings, the thickness of each layer and each region are exaggerated in the drawings to clearly illustrate the relative positions of the layers and the distribution of the regions. When a portion of a layer, film, region, plate, etc. is described as being "above" or "on" another portion, this description includes not only the case where the portion is "directly above" the other portion, but also the case where there are other layers between the portions.

[0048] Organic Light Emitting Diodes (OLEDs) are widely used in the display field due to their advantages such as self-luminescence, high contrast, and low power consumption. In display devices that use OLEDs as light-emitting devices, due to the material properties of the luminescent material inside the OLEDs, the OLEDs will age to varying degrees over time, resulting in a decrease in the uniformity of the display brightness of the display device. In addition, as the display area of ​​the display device continues to increase, the switching voltage of the driving transistor in the corresponding driving circuit of the OLED is also easily affected by the IR voltage drop, resulting in a decrease in the uniformity of the display brightness of the display device. Therefore, providing an internal compensation circuit and / or an external compensation circuit for the OLED in the display device can compensate for the uniformity of the display brightness of the display device.

[0049] In some examples, the display device is provided with an external compensation circuit for compensating display brightness. The external compensation circuit is coupled to the light detection element and the driver chip. The external compensation circuit can generate a brightness compensation signal based on the display brightness sensed by the light detection element and transmit it to the driver chip. The driver chip can then control the OLED display based on the compensated drive voltage, thereby ensuring uniform display brightness across the display device.

[0050] However, the light detection element is located within the display area to collect the brightness of the light emitted by the corresponding sub-pixels within the display area. The light detection element often occupies part of the non-pixel area within the display area. Furthermore, to ensure high compensation accuracy and signal-to-noise ratio, the light detection element also requires a large light-collecting area. This can easily lead to a low aperture ratio of the display device, which is not conducive to improving the pixel density of the display device.

[0051] In order to solve the above problems, embodiments of the present disclosure provide a touch substrate, a display substrate, and a display device, which are used to improve the aperture ratio of the display device while ensuring the brightness uniformity of the display device.

[0052] See also Figure 1 The present disclosure provides a touch substrate including a plurality of first touch signal lines 1, a plurality of second touch signal lines 2, and a plurality of transparent photosensitive devices 3 arranged in an array.

[0053] The plurality of first touch signal lines 1 are arranged at intervals. The first touch signal lines 1 extend along a first direction. Optionally, the plurality of first touch signal lines 1 can be arranged in parallel.

[0054] The plurality of second touch signal lines 2 are arranged at intervals. The second touch signal lines 2 extend along the second direction. Optionally, the plurality of second touch signal lines 2 can be arranged in parallel.

[0055] Here, the first touch signal line 1 is, for example, a drive signal line Tx, and the second touch signal line 2 is, for example, a sensing signal line Rx. The first direction and the second direction intersect, for example, are perpendicular. The first direction is, for example, a row direction, and the second direction is, for example, a column direction. The spacing between adjacent first touch signal lines 1 and adjacent second touch signal lines 2 can be determined based on the area size of the minimum touch unit.

[0056] The transparent photosensitive devices 3 are arranged in rows along a first direction and in columns along a second direction perpendicular to the first direction, and are used to detect the light output brightness of the pixels. One transparent photosensitive device 3 can detect the light output brightness of one or more pixel units, or one transparent photosensitive device 3 can detect the light output brightness of one or more sub-pixels. A row of transparent photosensitive devices 3 is coupled to a first touch signal line 1. The first touch signal line 1 is configured to be multiplexed as a control signal line of the transparent photosensitive device 3. A column of transparent photosensitive devices 3 is coupled to a second touch signal line 2. The second touch signal line 2 is configured to be multiplexed as a read signal line of the transparent photosensitive device 3. The control signal line of the transparent photosensitive device 3 is used to transmit a control signal to the transparent photosensitive device 3 to control the working state of the transparent photosensitive device 3. The read signal line of the transparent photosensitive device 3 is used to read the pixel light output brightness signal sensed by the transparent photosensitive device 3.

[0057] Here, the transparent photosensitive device 3 is formed of a transparent material and has a high light transmittance. For example, the light transmittance of the transparent photosensitive device 3 is greater than 80%. The transparent photosensitive device 3 is used to detect the light output brightness of the pixel. The transparent photosensitive device 3 can be set on the light output side of the pixel, or it can be integrated into the pixel and located on the light output side of the light-emitting device in the pixel. Moreover, the transparent photosensitive device 3 can be set in a one-to-one correspondence with the sub-pixel, or one transparent photosensitive device 3 can be set to correspond to multiple sub-pixels, or the transparent photosensitive device 3 can be set in a one-to-one correspondence with the pixel unit, or one transparent photosensitive device 3 can be set to correspond to multiple pixel units. The embodiment of the present disclosure does not limit the size and setting position of the transparent photosensitive device 3, and is limited to the transparent photosensitive device 3 being able to accurately capture the light output brightness of the pixel.

[0058] It is understood that the transparent photosensitive device 3 can detect the brightness of the light emitted by the pixel on a regular or periodic basis. That is, the transparent photosensitive device 3 detects the brightness of the light emitted by the pixel during a preset or designated brightness detection phase. In this way, the first touch signal line 1 can be reused as a control signal line for the transparent photosensitive device 3 during the brightness detection phase, and the second touch signal line 2 can be reused as a read signal line for the transparent photosensitive device 3 during the brightness detection phase. This does not affect the use of the first touch signal line 1 and the second touch signal line 2 during the touch detection phase.

[0059] In the disclosed embodiment, the use of a transparent photosensitive device 3 as a light detection element to detect the brightness of pixel light output allows the placement of the transparent photosensitive device 3 to no longer be restricted to non-pixel areas. Specifically, the transparent photosensitive device 3 can be placed in the pixel area, for example, directly above the pixel light output. This allows the transparent photosensitive device 3 to have a larger light-collecting area, ensuring high compensation accuracy and signal-to-noise ratio. Furthermore, the transparent photosensitive device 3 has a high light transmittance and does not affect the aperture ratio of the touch substrate or the display device in which it is located. This helps increase the pixel density of the display device, thereby enhancing the display quality of the display device.

[0060] Furthermore, the control signal lines and readout signal lines of the transparent photosensitive device 3 can be multiplexed by the first touch signal line 1 and the second touch signal line 2. This simplifies the wiring design of the external signal lines of the transparent photosensitive device 3, thereby simplifying the fabrication process of the touch substrate and reducing the fabrication cost of the touch substrate.

[0061] Each of the first touch signal lines 1 and the second touch signal lines 2 can have a single-layer structure or a multi-layer stacked structure. Considering their conductivity, the single-layer structure or multi-layer stacked structure can be made of at least one conductive metal such as aluminum (Al), platinum (Pt), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), chromium (Cr), molybdenum (Mo), titanium (Ti), tungsten (W), or copper (Cu). Thus, the first touch signal lines 1 and the second touch signal lines 2 are metal signal lines, which can have low resistance and good conductivity, thereby ensuring signal transmission accuracy. Of course, the single-layer structure or multi-layer stacked structure can also be made of a transparent conductive material, such as indium tin oxide (ITO). This facilitates disposing a portion of the layer structure of the transparent photosensitive device on the same layer as the first touch signal lines 1 or the second touch signal lines 2, thereby simplifying the manufacturing process of the transparent photosensitive device and reducing the manufacturing cost of the transparent photosensitive device.

[0062] For example, each of the first touch signal line 1 and the second touch signal line 2 is a stacked layer of titanium (Ti) / aluminum (Al) / titanium (Ti).

[0063] In addition, please refer to Figure 2 The touch substrate further includes a substrate 01 . The first touch signal line 1 , the second touch signal line 2 and the transparent photosensitive device 3 are arranged on the substrate 01 .

[0064] Here, substrate 01 is, for example, a blank substrate on which no electronic devices or circuit structures are fabricated, such as a glass substrate or a flexible substrate. The flexible substrate is, for example, a polyimide (PI) substrate. Alternatively, substrate 01 is a display substrate or display panel on which electronic devices and / or circuit structures are fabricated, such as an array substrate, an opposing substrate, or an OLED display substrate. This is not limited in the presently disclosed embodiments.

[0065] In some embodiments of the present disclosure, please combine Figures 1 to 4 It is understood that the plurality of first touch signal lines 1 and the plurality of second touch signal lines 2 intersect to form a grid. Each mesh in the grid corresponds to a minimum touch unit. The area size of each mesh can be set according to actual needs. The transparent photosensitive devices 3 are positioned in a one-to-one correspondence within the mesh of the grid. This helps improve space utilization within the touch substrate.

[0066] In an example, see Figure 3 , the touch substrate also includes a plurality of sub-pixels. Specifically, the substrate 01 of the touch substrate is an OLED display substrate. The substrate 01 includes an array substrate 011, and a pixel defining layer 012 arranged on the array substrate 011. The pixel defining layer 012 has a plurality of openings, which are respectively used to define the pixel areas of the sub-pixels. The light-emitting device 013 is arranged in the corresponding opening, for example, an OLED using top emission. The light-emitting device 013 is coupled to the driving circuit in the array substrate 011 and can emit light under the drive of the driving circuit. The light output brightness of the light-emitting device 013 is the light output brightness of the corresponding sub-pixel. According to the display color of the sub-pixel, the light-emitting device 013 can correspond to a red light OLED, a green light OLED, a blue light OLED or a white light OLED.

[0067] In addition, a pixel encapsulation layer 014 is usually provided on the side of the light emitting device 013 facing away from the array substrate 011. The pixel encapsulation layer 014 can effectively encapsulate the light emitting device 013 to prevent water and oxygen from corroding the light emitting device 013, thereby affecting the service life and reliability of the light emitting device 013.

[0068] It can be understood that in some examples, the pixel encapsulation layer 014 can entirely cover the pixel definition layer 012 and the light emitting device 013 in each sub-pixel, for example Figure 3 In other examples, the pixel encapsulation layer 014 may also adopt a block structure to be correspondingly disposed in the opening of the pixel definition layer 012 to independently encapsulate the light emitting device 013, for example Figure 4 As shown in .

[0069] Each mesh in the grid corresponds to the pixel area of ​​a sub-pixel. The transparent photosensitive device 3 is disposed on the light-emitting side of the sub-pixel, for example, on the side of the pixel encapsulation layer 014 facing away from the light-emitting device 013. The transparent photosensitive device 3 can be integrated into the corresponding sub-pixel, thereby enabling more accurate measurement of the light-emitting brightness of each sub-pixel, ensuring good brightness uniformity across the touch substrate and the display device in which it resides.

[0070] In some embodiments, please refer to Figure 2 and Figure 3 , transparent photosensitive device 3 is a transparent photosensitive transistor. This allows transparent photosensitive device 3 to have good and stable electrical characteristics, facilitating accurate detection of pixel brightness. However, the structure of transparent photosensitive device 3 is not limited to this. For example, transparent photosensitive device 3 can also be a transparent photosensitive diode.

[0071] The structure of the transparent photosensitive transistor can be implemented in various ways. For example, the transparent photosensitive transistor is a top-gate thin film transistor. Alternatively, for example, the transparent photosensitive transistor is a bottom-gate thin film transistor.

[0072] For example, the transparent photosensitive transistor is a top-gate thin-film transistor. The transparent photosensitive transistor includes a stacked transparent photosensitive active layer 31, a gate dielectric layer 32, and a transparent gate electrode 33, as well as a transparent source electrode 34 and a transparent drain electrode 35 respectively coupled to the transparent photosensitive active layer 31. The transparent gate electrode 33 is coupled to the first touch signal line 1. The transparent source electrode 34 and the transparent drain electrode 35 are coupled to the second touch signal line 2.

[0073] Optionally, the transparent photosensitive active layer 31 is formed of a transparent oxide semiconductor material such as indium gallium zinc oxide (ICZO), indium zinc oxide (IZO), zinc tin oxide (ZTO), aluminum gallium nitride (AlGaN) or gallium nitride (GaN). The formation process of the transparent photosensitive active layer 31 includes a magnetron sputtering process or a deposition process. The transparent photosensitive active layer 31 can generate different numbers of photogenerated carriers under illumination of different brightness, so the current flowing through the transparent photosensitive transistor is also different. In the brightness detection stage, a control signal can be transmitted to the transparent photosensitive transistor through the control signal line of the transparent photosensitive device to turn on the transparent photosensitive transistor, and the current output from the drain of the transparent photosensitive transistor can be read through the read signal line of the transparent photosensitive device. Then, the light output brightness of the pixel can be detected based on the current of the transparent photosensitive transistor. The thickness of the transparent photosensitive active layer 31 can be selected and set according to actual needs.

[0074] In one example, the transparent photosensitive device 3 is integrated into the corresponding sub-pixel. The light-emitting device 013 in the sub-pixel includes a light-emitting layer. The transparent photosensitive active layer 31 at least partially overlaps with the orthographic projection of the light-emitting layer on the array substrate 011. For example, the orthographic projection of the light-emitting layer on the array substrate 011 overlaps with the orthographic projection of the transparent photosensitive active layer 31 on the array substrate 011. Alternatively, for another example, the orthographic projection of the light-emitting layer on the array substrate 011 lies within the orthographic projection of the transparent photosensitive active layer 31 on the array substrate 011. In this way, the transparent photosensitive active layer 31 can have a sufficiently large light-collecting area to ensure high compensation accuracy and signal-to-noise ratio, and also facilitates uniform light processing of the light signal emitted by the light-emitting layer.

[0075] Optionally, the gate dielectric layer 32 is formed of a transparent insulating material with a relatively high dielectric constant, such as a silicon oxide material, and the formation process thereof is, for example, a deposition process.

[0076] Optionally, the transparent gate 33 , the transparent source 34 and the transparent drain 35 are respectively formed of transparent conductive materials, such as indium tin oxide (ITO), and the formation process thereof is, for example, a magnetron sputtering process.

[0077] In one example, the transparent gate 33 is formed of doped polysilicon material.

[0078] It should be noted that, in some examples, the transparent source 34 and transparent drain 35 of the transparent phototransistor can be connected to metal traces located in the non-pixel area. Alternatively, the portions of the transparent source 34 and transparent drain 35 located in the non-pixel area can be formed of a metal material. This means that the transparent source 34 and transparent drain 35 of the transparent phototransistor can also include non-transparent portions.

[0079] It is worth mentioning that there are many ways to dispose the first touch signal lines 1 and the second touch signal lines 2 in the touch substrate.

[0080] In some embodiments, please refer to Figure 2 and Figure 3 The touch control substrate further includes an insulating layer 02. The insulating layer 02 has one or more layers, and the insulating layer 02 can be made of an organic insulating material or an inorganic insulating material.

[0081] Optionally, the organic insulating material is, for example, polyimide.

[0082] Optionally, the inorganic insulating material is, for example, silicon oxide, silicon nitride or silicon oxynitride.

[0083] In addition, the first touch signal line 1 is formed by patterning the first conductive layer, and the second touch signal line 2 is formed by patterning the second conductive layer. The first conductive layer and the second conductive layer are located on both sides of the insulating layer 02, respectively.

[0084] Based on this, optionally, the transparent gate 33 and the first touch signal line 1 can be located on the same side of the insulating layer 02 . The transparent source 34 , the transparent drain 35 and the second touch signal line 2 can be located on the side of the insulating layer 02 away from the transparent gate 33 .

[0085] In some examples, the first touch signal line 1 is a transparent signal line, and the transparent gate 33 can be provided in the same layer as the first touch signal line 1 and formed through a single patterning process. Furthermore, the transparent gate 33 can also serve as a portion of the first touch signal line 1 or as a touch electrode connected to the first touch signal line 1.

[0086] In some examples, the second touch signal line 2 is a transparent signal line. The transparent source electrode 34 and the transparent drain electrode 35 can be provided in the same layer as the second touch signal line 2 and formed through a single patterning process. Furthermore, the transparent source electrode 34 and the transparent drain electrode 35 can also function as part of the second touch signal line 2 or as a touch electrode connected to the second touch signal line 2.

[0087] In other embodiments, see Figure 5 and Figure 6 The first touch signal line 1 includes a first lead portion 11 and a first lap portion 12 located in different layers and interconnected. The transparent gate 11 is coupled to the first lead portion 11 or the first lap portion 12.

[0088] For example, the second touch signal line 2 and the first lead portion 11 can be formed by patterning the first conductive layer. The first overlapping portion 12 can be formed by patterning the second conductive layer. The first conductive layer and the second conductive layer are respectively located on either side of the insulating layer 02. Furthermore, the first lead portion 11 (i.e., the first conductive layer) is located on a side of the insulating layer 02 close to the transparent gate 33, and the transparent gate 33 is coupled to the first lead portion 11.

[0089] Based on this, optionally, the first conductive layer is a transparent conductive layer, and the transparent gate 33 can be provided in the same layer as the first conductive layer and formed through a single patterning process.

[0090] Optionally, the second conductive layer is a metal conductive layer, and the first overlapping portion 12 is a metal overlapping portion.

[0091] Optionally, the second conductive layer is a transparent conductive layer. The transparent source electrode 34 and the transparent drain electrode 35 can be provided in the same layer as the first overlapping portion 12 and formed through a single patterning process.

[0092] In some other embodiments, see Figure 7 and Figure 8 The second touch signal line 2 includes a second lead portion 21 and a second connecting portion 22 that are located in different layers and interconnected. A transparent source electrode 34 and a transparent drain electrode 35 are coupled to the second lead portion 21 or the second connecting portion 22 .

[0093] For example, the first touch signal line 1 and the second lead portion 21 can be formed by patterning the first conductive layer. The second overlapping portion 22 can be formed by patterning the second conductive layer. The first conductive layer and the second conductive layer are respectively located on either side of the insulating layer 02. Furthermore, the second overlapping portion 22 (i.e., the first conductive layer) is located on the side of the insulating layer 02 facing away from the transparent gate 33; the transparent source 34 and the transparent drain 35 are coupled to the second overlapping portion 22.

[0094] Based on this, optionally, the first conductive layer is a transparent conductive layer, and the transparent gate 33 can be provided in the same layer as the first conductive layer and formed through a single patterning process. In addition, the transparent gate 33 can be used as a part of the first touch signal line 1 or a touch electrode connected to the first touch signal line 1.

[0095] Optionally, the second conductive layer is a metal conductive layer, and the second overlapping portion 22 is a metal overlapping portion.

[0096] Optionally, the second conductive layer is a transparent conductive layer. The transparent source electrode 34 and the transparent drain electrode 35 can be provided in the same layer as the second overlapping portion 22 and formed by a single patterning process. Furthermore, the transparent source electrode 34 and the transparent drain electrode 35 can also serve as the second overlapping portion 22.

[0097] From the above, it can be understood that in some other embodiments, the first touch signal line 1 may be composed of a first lead portion 11 and a first overlapping portion 12 , and the second touch signal line 2 may be composed of a second lead portion 21 and a second overlapping portion 22 .

[0098] Based on this, optionally, the first lead portion 11 and the second overlapping portion 22 can be provided in the same layer and located on the side of the insulating layer 02 close to the transparent gate 33, so that the transparent gate 33 is coupled to the first lead portion 11. The first overlapping portion 12 and the second lead portion 21 can be provided in the same layer and located on the side of the insulating layer 02 away from the transparent gate 33, so that the transparent source 34 and the transparent drain 35 are coupled to the second lead portion 21.

[0099] In summary, the layer structure and connection relationship of the corresponding transparent phototransistor 3 can be adaptively adjusted according to the difference in structure between the first touch signal line 1 and the second touch signal line 2. This embodiment of the present disclosure does not limit this.

[0100] In addition, the cross-sectional views involved in the embodiments of the present disclosure only illustrate the layer structures of the transparent phototransistor and the first touch signal line and the second touch signal line, and do not show the connection relationship between them, nor do they limit the relative position relationship between them.

[0101] In some embodiments, see Figure 8 The touch control substrate further includes a planarization layer 03. The planarization layer 03 covers the exposed surfaces of the transparent photosensitive device 3 and the first and second touch signal lines 1 and 2, flattening the surface of the touch control substrate and providing insulation and protection for the transparent photosensitive device 3 and the first and second touch signal lines 1 and 2. The planarization layer 03 can be formed of a flexible organic material, such as polyimide (PI).

[0102] According to another aspect of the present disclosure, a display substrate is provided. Figure 9 The display substrate includes an array substrate 011 and a plurality of sub-pixels arranged on the array substrate 011. The sub-pixels include a light emitting device 013 and a transparent photosensitive device 3 located on the light emitting side of the light emitting device 013.

[0103] Here, electronic devices and / or circuit structures, such as a pixel driving circuit, are fabricated on the array substrate 011. The structure of the pixel driving circuit can be selected and configured according to actual needs.

[0104] Furthermore, the multiple sub-pixels on the array substrate 011 may also include sub-pixels that are not provided with transparent photosensitive devices 3. That is, not all sub-pixels need to be provided with transparent photosensitive devices 3. The placement of the transparent photosensitive devices 3 can be selected based on actual needs. The transparent photosensitive devices 3 can detect the brightness of the light output by the pixels on a regular or periodic basis. That is, the transparent photosensitive devices 3 detect the brightness of the light output by the pixels during a preset or designated brightness detection phase.

[0105] Please continue reading Figure 8 The display substrate further includes a pixel defining layer 012 and a pixel encapsulation layer 014 .

[0106] Pixel definition layer 012 has multiple openings, each used to define the pixel area of ​​a sub-pixel. Light-emitting device 013, such as an OLED, is disposed within the corresponding opening. Light-emitting device 013 is coupled to the pixel driving circuit in array substrate 011 and can emit light under the drive of the pixel driving circuit. Depending on the display color of the sub-pixel, light-emitting device 013 can correspond to a red OLED, a green OLED, a blue OLED, or a white OLED.

[0107] The pixel encapsulation layer 014 is located on the side of the light emitting device 013 away from the array substrate 011. The pixel encapsulation layer 014 can effectively encapsulate the light emitting device 013 to prevent water and oxygen from corroding the light emitting device 013, thereby affecting the service life and reliability of the light emitting device 013.

[0108] It can be understood that in some examples, the pixel encapsulation layer 014 can entirely cover the pixel definition layer 012 and the light emitting device 013 in each sub-pixel, for example Figure 9 In other examples, the pixel encapsulation layer 014 may also adopt a block structure to be correspondingly disposed in the opening of the pixel definition layer 012 to independently encapsulate the light emitting device 013, for example Figure 10 As shown in .

[0109] Furthermore, transparent photosensitive device 3 is formed of a transparent material and has a high light transmittance. For example, the light transmittance of transparent photosensitive device 3 is greater than 80%. Since the brightness of the light emitted by light-emitting device 013 is the brightness of the light emitted by the corresponding pixel, transparent photosensitive device 3 is disposed on the light-emitting side of light-emitting device 013 to directly detect the brightness of the light emitted by light-emitting device 013, i.e., the brightness of the light emitted by the pixel.

[0110] In the disclosed embodiment, the use of a transparent photosensitive device 3 as a light detection element to detect the brightness of light emitted by a pixel eliminates the need for its placement in non-pixel areas. Specifically, the transparent photosensitive device 3 can be integrated within a sub-pixel, for example, directly above the light-emitting device 013. This allows the transparent photosensitive device 3 to have a larger light-collecting area, ensuring high compensation accuracy and signal-to-noise ratio. Furthermore, the transparent photosensitive device 3 does not affect the aperture ratio of the display substrate or the display device in which it resides, thereby improving the pixel density of the display device and, consequently, the display quality of the display device.

[0111] It is necessary to add that Figure 1 and Figure 9 It is understood that the display substrate further includes: a plurality of control signal lines 1 arranged at intervals, and a plurality of readout signal lines 2 arranged at intervals. The control signal lines 1 extend in the row direction, and a row of transparent photosensitive devices 3 is coupled to a corresponding control signal line 1. The readout signal lines 2 extend in the column direction, and a column of transparent photosensitive devices 3 is coupled to a corresponding readout signal line 2.

[0112] Optionally, the control signal line 1 and the read signal line 2 can be obtained by patterning two conductive layers in the display substrate. Furthermore, the control signal line 1 and the read signal line can be metal signal lines or transparent conductive lines.

[0113] For example, each of the control signal line 1 and the read signal line 2 can have a single-layer structure or a multi-layer stacked structure. Considering their conductivity, the single-layer structure or multi-layer stacked structure can be made of at least one conductive metal such as aluminum (Al), platinum (Pt), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), chromium (Cr), molybdenum (Mo), titanium (Ti), tungsten (W), or copper (Cu). Thus, the control signal line 1 and the read signal line 2 can be made of metal signal lines, which can have low resistance and good conductivity, thereby ensuring signal transmission accuracy.

[0114] Of course, the single-layer structure or multi-layer stacked structure herein may be formed of a transparent conductive material, such as indium tin oxide (ITO). This facilitates disposing a portion of the layer structure of the transparent photosensitive device on the same layer as the control signal line 1 or the read signal line 2, thereby simplifying the fabrication process of the transparent photosensitive device and reducing the fabrication cost of the transparent photosensitive device.

[0115] Illustratively, each of the control signal line 1 and the read signal line 2 is a stacked layer of titanium (Ti) / aluminum (Al) / titanium (Ti).

[0116] In some embodiments, please refer to Figure 9 The transparent photosensitive device 3 includes a transparent photosensitive transistor. In this way, the transparent photosensitive device 3 can have good and stable electrical characteristics, which is conducive to achieving accurate detection of the brightness of the pixel light.

[0117] The structure of the transparent photosensitive transistor can be implemented in various ways. For example, the transparent photosensitive transistor is a top-gate thin film transistor. Alternatively, for example, the transparent photosensitive transistor is a bottom-gate thin film transistor.

[0118] For example, the transparent photosensitive transistor is a top-gate thin-film transistor. The transparent photosensitive transistor includes a stacked transparent photosensitive active layer 31, a gate dielectric layer 32, and a transparent gate electrode 33, as well as a transparent source electrode 34 and a transparent drain electrode 35 respectively coupled to the transparent photosensitive active layer 31. The transparent gate electrode 33 is coupled to the control signal line 1. The transparent source electrode 34 and the transparent drain electrode 35 are coupled to the read signal line 2.

[0119] Optionally, the transparent photosensitive active layer 31 is formed using a transparent oxide semiconductor material such as indium gallium zinc oxide (ICZO), indium zinc oxide (IZO), zinc tin oxide (ZTO), aluminum gallium nitride (AlGaN), or gallium nitride (GaN). The transparent photosensitive active layer 31 can be formed by a magnetron sputtering process or a deposition process. The transparent photosensitive active layer 31 can generate different numbers of photogenerated carriers under illumination conditions of different brightness. The thickness of the transparent photosensitive active layer 31 can be selected and set according to actual needs.

[0120] In some examples, the light-emitting device 013 includes a light-emitting layer. The transparent photosensitive active layer 31 at least partially overlaps with the orthographic projection of the light-emitting layer on the array substrate 011. For example, the orthographic projection of the light-emitting layer on the array substrate 011 overlaps with the orthographic projection of the transparent photosensitive active layer 31 on the array substrate 011. Alternatively, for another example, the orthographic projection of the light-emitting layer on the array substrate 011 lies within the orthographic projection of the transparent photosensitive active layer 31 on the array substrate 011. In this manner, the transparent photosensitive active layer 31 can have a sufficiently large light-collecting area to ensure high compensation accuracy and signal-to-noise ratio, while also facilitating uniform light processing of the light signal emitted by the light-emitting layer.

[0121] Optionally, the gate dielectric layer 32 is formed of a transparent insulating material with a relatively high dielectric constant, such as a silicon oxide material, and the formation process thereof is, for example, a deposition process.

[0122] Optionally, the transparent gate 33 , the transparent source 34 and the transparent drain 35 are respectively formed of transparent conductive materials, such as indium tin oxide (ITO), and the formation process thereof is, for example, a magnetron sputtering process.

[0123] In one example, the transparent gate 33 is formed of doped polysilicon material.

[0124] It should be noted that, in some examples, the transparent source 34 and transparent drain 35 of the transparent phototransistor can be connected to metal traces located in the non-pixel area. Alternatively, the portions of the transparent source 34 and transparent drain 35 located in the non-pixel area can be formed of a metal material. This means that the transparent source 34 and transparent drain 35 of the transparent phototransistor can also include non-transparent portions.

[0125] It is understood that the display substrate may further include a planar layer or other layer structure to cover the exposed surfaces of the transparent photosensitive device 3 and the control signal line 1 and the read signal line 2, thereby planarizing the surface of the display substrate and insulating and protecting the transparent photosensitive device 3 and the control signal line 1 and the read signal line 2. The planar layer may be formed of a flexible organic material, such as polyimide (PI).

[0126] According to another aspect of the present disclosure, a display device is provided. The display device includes the touch substrate or display substrate described in some of the aforementioned embodiments. The beneficial effects achieved by the display device provided in some embodiments of the present disclosure are similar to those achieved by the touch substrate or display substrate provided in some of the aforementioned embodiments, and are not further described here.

[0127] The display devices provided in some embodiments of the present disclosure may be any device used in the field of displaying images, whether moving (e.g., video) or fixed (e.g., still images), and whether textual or pictorial. More specifically, it is contemplated that the embodiments described may be implemented in a variety of display devices.

[0128] The above-mentioned display devices provided in some embodiments of the present disclosure include but are not limited to mobile phones, wireless devices, personal data assistants (Portable Android Device, abbreviated as PAD), handheld or portable computers, GPS (Global Positioning System) receivers / navigators, cameras, MP4 (full name MPEG-4 Part 14) video players, camcorders, television monitors, flat-panel displays, computer monitors, aesthetic structures (for example, for displays showing images of a piece of jewelry), etc.

[0129] In the case of using “including,” “having,” and “comprising” described herein, another component may be added unless a clear limiting term such as “only,” “consisting of,” etc. is used. Unless mentioned otherwise, a term in the singular form may include a plural form and should not be understood as having one number.

[0130] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0131] The above-described embodiments merely represent several implementation methods of the present disclosure. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that a person of ordinary skill in the art could make various modifications and improvements without departing from the spirit of the present disclosure, all of which fall within the scope of protection of the present disclosure. Therefore, the scope of protection of the present patent shall be determined by the appended claims.

Claims

1. A touch substrate, characterized in that: include: a plurality of first touch signal lines arranged at intervals; a plurality of second touch signal lines, arranged at intervals; A plurality of transparent photosensitive devices are arranged in an array along a first direction and a second direction for detecting light output brightness of pixels, wherein the first direction and the second direction intersect; Wherein, the first touch signal line extends along a first direction; a row of the transparent photosensitive devices is coupled to a corresponding first touch signal line; and the first touch signal line is configured to be multiplexed as a control signal line of the transparent photosensitive device; The second touch signal line extends along the second direction; a column of the transparent photosensitive devices is coupled to a corresponding second touch signal line; the second touch signal line is configured to be multiplexed as a read signal line of the transparent photosensitive device; The transparent photosensitive device includes a transparent photosensitive transistor, and one of the transparent photosensitive devices is used to detect the brightness of light emitted by one or more sub-pixels; the transparent photosensitive device is coupled to an external compensation circuit, which is coupled to a driver chip. The external compensation circuit can generate a brightness compensation signal based on the display brightness sensed by the transparent photosensitive device and transmit the signal to the driver chip; The touch substrate further includes a substrate; the first touch signal line, the second touch signal line and the transparent photosensitive device are arranged on the substrate; the substrate includes a blank base, a display substrate or a display panel.

2. The touch substrate according to claim 1, wherein: The transparent photosensitive transistor comprises: a transparent photosensitive active layer, a gate dielectric layer and a transparent gate electrode stacked together, and a transparent source electrode and a transparent drain electrode respectively coupled to the transparent photosensitive active layer; Wherein, the transparent gate is coupled to the first touch signal line; The transparent source electrode and the transparent drain electrode are coupled to the second touch signal line.

3. The touch substrate according to claim 2, wherein: The touch control substrate further includes an insulating layer; wherein, The transparent gate and the first touch signal line are located on the same side of the insulating layer; The transparent source electrode, the transparent drain electrode and the second touch signal line are located on a side of the insulating layer away from the transparent gate electrode.

4. The touch substrate according to claim 2, wherein: The first touch signal line includes: a first lead portion and a first lap portion located in different layers and interconnected; the transparent gate is coupled to the first lead portion or the first lap portion; And / or, the second touch signal line includes: a second lead portion and a second overlapping portion located in different layers and interconnected; the transparent source and the transparent drain are coupled to the second lead portion or the second overlapping portion.

5. The touch substrate according to claim 1, wherein: The first touch signal line includes a metal signal line or a transparent signal line; And / or, the second touch signal includes a metal signal line or a transparent signal line.

6. The touch substrate according to any one of claims 1 to 5, wherein: A plurality of the first touch signal lines and a plurality of the second touch signal lines intersect to form a grid; the transparent photosensitive devices are located in meshes of the grid in a one-to-one correspondence.

7. The touch substrate according to claim 6, wherein: The touch substrate further includes a plurality of sub-pixels; the sub-pixels correspond one-to-one to the meshes of the grid; and the transparent photosensitive device is located on the light-emitting side of the sub-pixels.

8. A display device, characterized in that: include: The touch substrate according to any one of claims 1 to 7.

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