A device for detecting the sheet resistance of battery chips of a G12 high-power component

Abstract

The present invention discloses a device for detecting the sheet resistance of battery wafers of a G12 high-power component, which includes a detection table. Above the detection table, a detection mechanism is provided. The detection mechanism includes a lifting component and a probe. A positioning mechanism is provided on the detection table, and the positioning mechanism has a square positioning area; the detection mechanism has two working positions; the detection table is connected with a rotating mechanism, and the rotating mechanism drives the detection table to rotate horizontally and at intervals by 90° around the center of the positioning area in a fixed direction. Before detection, the device for detecting the sheet resistance of battery wafers of the G12 high-power component fixes the silicon wafer through the positioning mechanism to prevent deviation and affect the accuracy of the silicon wafer uniformity detection. Moreover, through the cooperation of the lifting component and the rotating mechanism, the probe only needs to be adjusted once to perform sheet resistance tests on five positions of the silicon wafer, shortening the length of the probe translation path, thereby improving the detection efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of sheet resistance detection, and particularly relates to a device for detecting the sheet resistance of battery wafers of G12 high-power components. Background Art

[0002] Sheet resistance is one of the important indicators for measuring whether the diffusion quality meets the process requirements. In the large-scale production process of solar cell wafers, the diffused silicon wafers need to be tested for the sheet resistance at five positions (i.e., the center and four corners of the silicon wafer) to inspect the diffusion quality, and then determine the maximum and minimum values of the sheet resistance at the five positions. By dividing the difference between the two by the sum of the two, the uniformity of the diffused silicon wafer is obtained.

[0003] In the prior art, a sheet resistance tester is usually used to detect the sheet resistance at five positions of the silicon wafer. The probe moves between these five positions of the silicon wafer and is detected in the order of positions such as Figure 1 abcde as described. The moving path of the probe is long and the movement is frequent, resulting in low detection efficiency of the device. In addition, the sheet resistance tester in the prior art is only applicable to the test of single-specification silicon wafers and has poor compatibility. Moreover, during the test, the silicon wafer is prone to sliding, resulting in the deviation of the test position of the silicon wafer and affecting the detection accuracy of the uniformity of the silicon wafer. Therefore, it is necessary to improve the existing sheet resistance detection device. Summary of the Invention

[0004] Aiming at the above-mentioned prior art, the technical problem to be solved by the present invention is: to overcome the deficiencies of the prior art and provide a device for detecting the sheet resistance of battery wafers of G12 high-power components with high detection efficiency, strong compatibility and high detection accuracy.

[0005] To solve the above technical problem, the technical solution of the present invention is: a device for detecting the sheet resistance of battery wafers of G12 high-power components, including a detection table, a detection mechanism is arranged above the detection table, the detection mechanism includes a lifting component and a probe connected in sequence from top to bottom, a positioning mechanism is arranged on the detection table, the positioning mechanism has a square positioning area, and the positioning area is horizontally arranged between the probe and the detection table; the detection mechanism has two working positions, the probe in the first working position is directly above the center of the positioning area, and the probe in the second working position is directly above one of the corners of the positioning area; the detection table is connected with a rotating mechanism, and the rotating mechanism drives the detection table to rotate horizontally and at intervals of 90° around the center of the positioning area in a fixed direction.

[0006] When the sheet resistance detection device of the above technical solution is in use, the silicon wafer is placed in the positioning area of the positioning mechanism, and the positioning mechanism is used to position the silicon wafer to prevent position deviation during the detection process. This is beneficial to ensuring the accuracy of the silicon wafer uniformity detection. Before the detection, if the detection mechanism is in the first working position, the lifting assembly drives the probe to move downward to detect the sheet resistance at the center position of the silicon wafer. Then, the lifting assembly drives the probe to move upward. Then, the detection mechanism moves to the second working position, and the lifting assembly drives the probe to move downward to detect the sheet resistance at one of the corners of the silicon wafer. After that, the lifting assembly drives the probe to move upward, and at the same time, the rotating mechanism drives the detection table to rotate 90°, thereby driving the silicon wafer to rotate 90°. After the probe is aligned with one of the other three corners of the silicon wafer, the lifting assembly drives the probe to move downward to detect the sheet resistance at this position of the silicon wafer. Then, the rotating mechanism drives the silicon wafer to rotate 90° in the original rotation direction through the detection table, and at the same time, the lifting assembly operates in cooperation to drive the probe to move up and down to detect the remaining two corners of the silicon wafer. Before the detection, if the detection mechanism is in the second position, according to the above working method, the lifting assembly and the rotating mechanism operate in cooperation to drive the probe to detect the sheet resistance at the four corners of the silicon wafer in sequence. Then, the detection mechanism moves to the first position, and the lifting assembly drives the probe to move downward to detect the sheet resistance at the center of the silicon wafer. Before the test, the square resistance detection device positions the silicon wafer through the positioning mechanism to prevent the silicon wafer from sliding and shifting, improving the accuracy of the silicon wafer uniformity detection. During the test, the detection mechanism moves once, and in cooperation with the rotation of the silicon wafer, the sheet resistance of five positions of the silicon wafer can be tested, reducing the number of translations of the probe and shortening the translation path length of the probe, thereby improving the efficiency of the sheet resistance detection.

[0007] Preferably, the positioning mechanism includes four positioning members, and the four positioning members respectively correspond to and are adjacent to the four side edges of the positioning area.

[0008] By adopting the above technical solution, the four positioning members enclose a silicon wafer positioning area, thereby standardizing and fixing the placement position of the silicon wafer on the detection table to prevent the position deviation of the silicon wafer during the detection process from affecting the accuracy of the silicon wafer diffusion uniformity detection.

[0009] Preferably, the positioning member includes a roller, the axis of the roller is parallel to the side edge of the corresponding positioning area, and the roller is rotatably arranged around its axis.

[0010] By adopting the above technical solution, the friction between the silicon wafer and the positioning member is reduced by the rotatably arranged roller, thereby reducing the wear of the silicon wafer.

[0011] Preferably, a plurality of positioning mechanisms are provided, the center lines of the positioning areas of each positioning mechanism coincide, and the corresponding side edges are parallel; in two adjacent positioning areas, the outer positioning area is higher than the inner positioning area, and the height difference between the two is less than the thickness of the silicon wafer.

[0012] By adopting the above technical solution, not only can the device position silicon wafers of different specifications and sizes, but also when positioning, the inner positioning mechanism adjacent to the positioning mechanism can support the silicon wafer from four sides, thereby providing good support for the silicon wafer, ensuring that the silicon wafer is in a fixed horizontal state, and further improving the accuracy of the uniformity detection of the silicon wafer.

[0013] Preferably, the detection mechanism is slidably arranged above the detection table in the horizontal direction.

[0014] By adopting the above technical solution, the moving path length of the probe during detection can be further shortened, which is beneficial to improving the detection efficiency.

[0015] Preferably, a slide bar is arranged above the detection table, the lifting assembly is connected with a sliding member, the sliding member is slidably matched with the slide bar, the sliding member is made of a magnetophilic material, and a first electromagnet and a second electromagnet are arranged on the slide bar.

[0016] By adopting the above technical solution, by controlling one of the first electromagnet and the second electromagnet to be energized and the other to be de-energized, the sliding member can be moved towards the energized first electromagnet or second electromagnet, so that the detection mechanism has a first working position and a second working position. Under the two working positions, the sheet resistance of the center and four corners of the silicon wafer are respectively detected, so as to detect the uniformity of the diffusion of the silicon wafer.

[0017] Preferably, the first electromagnet is fixedly connected to the slide bar, the second electromagnet is slidably matched with the slide bar, and the second electromagnet is connected with a locking member for locking it on the slide bar.

[0018] By adopting the above technical solution, the second electromagnet has different working positions, and thus the sliding position of the sliding member can be controlled, so that the detection mechanism can detect the sheet resistance of the four corners of silicon wafers of different specifications, thereby improving the compatibility of the detection device.

[0019] Preferably, a jack is opened on the second electromagnet, a plurality of positioning holes are opened on the slide bar along its length direction, the positioning holes correspond to the positioning mechanisms one by one, the locking member is a plug pin, and the jack is plugged and matched with one of the positioning holes through the plug pin.

[0020] By adopting the above technical solution, the bolt is passed through the through hole on the second electromagnet and inserted into one of the positioning holes, thereby locking the position of the second electromagnet on the slide bar, and further fixing the position of the sliding member, realizing the adjustment of the second working position of the detection mechanism.

[0021] Preferably, marks are provided on the slide bar, and the marks correspond to the positioning holes one by one.

[0022] By adopting the above technical solution, when adjusting the second working position of the detection mechanism, it is convenient for the operator to identify the size of the silicon wafer applicable to the device at the current position.

[0023] Preferably, a suction cup is provided between the detection table and the positioning area, the suction cup faces the positioning area and is communicated with an air pump.

[0024] By adopting the above technical solution, before detection, the air pump extracts the air in the suction cup to form a negative pressure in the suction cup, adsorbing and fixing the silicon wafer in the upper positioning area, further preventing the silicon wafer from sliding and shifting.

[0025] Preferably, a negative pressure tube is further provided on the detection table, the negative pressure tube is disposed opposite to the positioning area, a piston plate adapted to it is provided in the negative pressure tube, the piston plate is fixedly connected to the suction cup, and the negative pressure tube is communicated with the air pump.

[0026] By adopting the above technical solution, while adsorbing and fixing the silicon wafer, the air pump extracts the air in the negative pressure tube, causing the piston plate to move downward, and then driving the silicon wafer to move downward through the suction cup, ensuring that silicon wafers of different sizes are within the positioning area of the positioning mechanism applicable to them.

[0027] Preferably, an elastic member is further provided in the negative pressure tube, and both ends of the elastic member are respectively connected to the piston plate and the inner wall of the negative pressure tube.

[0028] By adopting the above technical solution, when adsorbing the silicon wafer, the elastic member is used to inhibit the downward movement of the piston plate, reducing the occurrence of situations such as the piston plate continuing to move downward after the silicon wafer enters the positioning area, resulting in the suction cup detaching from the lower surface of the silicon wafer.

[0029] Preferably, a limiting member is further fixedly provided in the negative pressure tube, and the limiting member is located on the side of the piston plate facing the positioning area.

[0030] By adopting the above technical solution, after the sheet resistance of the silicon wafer at five positions is detected, the air pump inflates the negative pressure tube and the suction cup, driving the silicon wafer to move upward, facilitating the removal of the silicon wafer. At the same time, the piston plate moves upward, and the limiting member is used to limit the sliding range of the piston plate to prevent the piston plate from detaching from the negative pressure tube.

[0031] In summary, compared with the prior art, the sheet resistance detection device for the G12 high-power component of the present invention fixes the silicon wafer through the positioning mechanism before detection to prevent deviation and affect the accuracy of the silicon wafer uniformity detection. Moreover, through the cooperation of the lifting component and the rotating mechanism, the probe position only needs to be adjusted once to perform sheet resistance tests on five positions of the silicon wafer, shortening the length of the probe translation path, thereby improving the detection efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is a schematic diagram of the detection sequence of the sheet resistance of a silicon wafer in the prior art;

[0033] Figure 2 is a schematic diagram of the detection sequence of the sheet resistance of the first silicon wafer of the present invention;

[0034] Figure 3 is a schematic diagram of the detection sequence of the sheet resistance of the second silicon wafer of the present invention;

[0035] Figure 4 is a schematic structural diagram of Embodiment 1 of the present invention;

[0036] Figure 5 is a top view of Embodiment 1 of the present invention;

[0037] Figure 6 is a schematic structural diagram of Embodiment 2 of the present invention;

[0038] Figure 7 is a top view of Embodiment 2 of the present invention;

[0039] Figure 8 is a schematic structural diagram of Embodiment 3 of the present invention;

[0040] Figure 9 is Figure 8 an enlarged view of part A of

[0041] Figure 10 is a cross-sectional view of the connection structure between the slide bar and the second electromagnet in Embodiment 3 of the present invention;

[0042] Figure 11 is a schematic structural diagram of Embodiment 4 of the present invention;

[0043] Figure 12 is Figure 11 an enlarged view of part B of

[0044] In the figure: 1. Detection table, 2. Detection mechanism, 2a. Lifting component, 2b. Probe, 2-a. First working position, 2-b. Second working position, 2c. Sliding member, 3. Positioning mechanism, 3-1. Positioning area, 3a. Positioning member, 3aa. Roller, 3ab. Bracket, 4. Rotating mechanism, 5. Slide bar, 5-1. Positioning hole, 5-2. Mark, 6. First electromagnet, 7. Second electromagnet, 7-1. Jack, 8. Locking member, 9. Suction cup, 10. Air pump, 11. Negative pressure pipe, 12. Piston plate, 13. Elastic member, 14. Limiting member, 15. Base, 16. Pillar, 17. Rotating motor, 18. Electric push rod, 19. Silicon wafer, 20. Rotating arm, 21. Corrugated hose, 22. Connecting plate. Detailed implementation mode

[0045] The following combines the accompanying drawings and embodiments to further describe the specific implementation mode of the present invention. The following embodiments are only used to more clearly illustrate the technical solution of the present invention and cannot be used to limit the protection scope of the present invention.

[0046] Embodiment 1

[0047] As Figure 4 and Figure 5 shown, the sheet resistance detection device for the battery cells of the G12 high-power component in Embodiment 1 includes a base 15. Above the base 15, a rotating mechanism 4 is fixed. The rotating mechanism 4 is a motor, and the top of its output end is fixedly connected with a horizontally arranged detection table 1. Above the detection table 1, a positioning mechanism 3 is fixed. The positioning mechanism 3 includes four positioning members 3a. The positioning members 3a are horizontally arranged horizontal bars, and the length directions of two adjacent positioning members 3a are perpendicular to each other, and the four positioning members 3a enclose a square positioning area 3-1 (as Figure 5 shown). The rotating mechanism 4 drives the detection table 1 to horizontally and intermittently rotate 90° around the center of the positioning area 3-1 in a fixed direction; Above the base 15, two pillars 16 are fixed to support the horizontal slide bar 5. Below the slide bar 5, a rotating motor 17 is fixed. The output end of the rotating motor 17 is fixedly connected with a rotating arm 20. Below the end of the rotating arm 20, a detection mechanism 2 is fixed. The detection mechanism 2 is located above the detection table 1. The detection mechanism 2 includes a lifting component 2a and a probe 2b connected in sequence from top to bottom. Among them, the lifting component 2a is a cylinder (as Figure 4 shown); The rotating motor 17 drives the detection mechanism 2 to rotate through the rotating arm 20, so that the rotating mechanism 2 has two working positions. When the detection mechanism 2 is in the first working position 2-a, the probe 2b is directly above the center of the positioning area 3-1. When it is in the second working position 2-b, the probe 2b is directly above one of the corners of the positioning area 3-1 (as Figure 5 shown).

[0048] When using this sheet resistance detection device, place the silicon wafer 19 in the positioning area 3-1 enclosed by four positioning members 3a, and make the four positioning members 3a respectively abut against the four side edges of the silicon wafer 19, so as to fix the position of the silicon wafer 19 on the detection table 1, and avoid the silicon wafer 19 sliding and shifting during detection, which affects the accuracy of the diffusion uniformity detection of the silicon wafer 19. After the silicon wafer 19 is placed, if the detection mechanism 2 is located at the first working position 2-a at this time, then perform the sheet resistance detection in the order as Figure 2 shown. That is, first, the lifting assembly 2a drives the probe 2b to descend to detect the sheet resistance at the center position of the silicon wafer 19, and then the lifting assembly 2a drives the probe 2b to move upward. Then, the rotation motor 17 drives the detection mechanism 2 to rotate horizontally by 180° through the rotating arm 20, so that the detection mechanism 2 is in the second working position 2-b. At this time, the probe 2b is directly above one of the corners of the silicon wafer 19. Then, the lifting assembly 2a drives the probe 2b to move downward. After detecting the sheet resistance at this position, the lifting assembly 2a drives the probe 2b to move upward. The rotating mechanism 4 drives the detection table 1 to rotate horizontally and at intervals by 90° around the center of the positioning area 3-1, so that the probe 2b is directly above one of the other three corners of the silicon wafer 19 at this time. Then, sequentially perform the sheet resistance tests on the remaining three corners; if the detection mechanism 2 is located at the second working position 2-b at this time, after the detection mechanism 2 detects the sheet resistance of one of the corners of the silicon wafer 19, the rotating mechanism 4 drives the detection table 1 to rotate at intervals by 90°, and cooperates with the lifting assembly 2a to drive the probe 2b to move up and down, so as to achieve Figure 3 shown, sequentially perform the sheet resistance tests on the four corners of the silicon wafer 19. Then, the rotation motor 17 is started, and the detection mechanism 2 is adjusted to the first working position 2-a through the rotating arm 20. At the first working position 2-a, the lifting assembly 2a drives the probe 2b to move downward to perform the sheet resistance test on the center position of the silicon wafer 19. According to the above operation steps, the detection mechanism 2 adjusts its position once, and cooperates with the rotating mechanism 4 to drive the silicon wafer 19 to rotate horizontally and at intervals by 90° around its center, so as to achieve the sheet resistance tests on the five positions of the four corners and the center of the silicon wafer 19, reduce the translation times of the probe 2b, shorten the translation path of the probe 2b, and improve the detection efficiency of the diffusion uniformity of the silicon wafer 19; moreover, before detection, the positioning mechanism 3 fixes the position of the silicon wafer 19 in the horizontal direction to prevent the silicon wafer 19 from sliding and shifting during detection. In this way, the accuracy of the diffusion uniformity detection is guaranteed.

[0049] Embodiment 2

[0050] As Figure 6 and Figure 7As shown, the sheet resistance detection device for the G12 high-power component in Embodiment 2 is based on Embodiment 1. The difference is that the positioning member 3a includes a roller 3aa and a bracket 3ab that rotatably supports the roller 3aa around its axis. The bracket 3ab is in an inverted U shape, and its two ends are fixed above the detection table 1. The roller 3aa is sleeved on the central part of the bracket 3ab. The positioning mechanism 3 has adjacent rollers 3aa with their axis lines perpendicular to each other, and four positioning members 3a enclose a square positioning area 3-1. There are four positioning mechanisms 3, and the center lines of the positioning areas 3-1 of each positioning mechanism 3 coincide and the corresponding sides are parallel. In two adjacent positioning areas 3-1, the outer positioning area 3-1 is higher than the inner positioning area 3-1, and the height difference between the two is less than the thickness of the silicon wafer. The detection mechanism 2 is slidably arranged above the detection table 1. An electric push rod 18 is fixed below the slide bar 5, and the output end of the electric push rod 18 is fixedly connected to the lifting component 2a, thereby driving the detection mechanism 2 to move to the first working position 2-a or the second working position 2-b.

[0051] When the sheet resistance detection device of this embodiment positions the silicon wafer 19, the roller 3a arranged in a rolling manner is used to abut against the side of the silicon wafer 19, reducing the wear on the silicon wafer 19. And there are multiple positioning mechanisms 3, which can form positioning areas of different sizes, so as to position silicon wafers 19 of different specifications and sizes, improving the applicability and further enhancing its compatibility. And in the positioning areas formed by adjacent positioning mechanisms 3, the inner positioning area is lower than the outer positioning area. On the one hand, the outer positioning area is used to place and fix the horizontal position of the silicon wafer 19. On the other hand, the roller 3aa in the inner positioning mechanism can stably support the silicon wafer 19, making the silicon wafer 19 at a horizontal angle, further ensuring the accuracy of the sheet resistance detection at five positions of the silicon wafer 19, thereby improving the accuracy of the silicon wafer diffusion uniformity detection. In addition, in this embodiment, the electric push rod 18 is used to drive the detection mechanism 2 to move to the first working position 2-a or the second working position 2-b, so that the detection mechanism 2 adjusts its position by translation above the detection table 1, thereby shortening the translation path of the probe 2b and improving the efficiency of the silicon wafer 19 diffusion uniformity test.

[0052] It should be noted that in this embodiment, according to production needs, the number of the positioning mechanisms 3 can also be set to other multiples to meet the needs of the uniformity detection of silicon wafers of different specifications and enhance the compatibility.

[0053] Embodiment 3

[0054] As Figure 8 、 Figure 9 and Figure 10As shown in the figure, the sheet resistance detection device for the battery cells of the G12 high-power component in Embodiment 3 is based on Embodiment 2. The difference is that a sliding member 2c is fixedly connected to the upper part of the lifting component 2a. The sliding member 2c is a sliding sleeve that slidably cooperates with the slide bar 5. The sliding member 2c is made of iron. A first electromagnet 6 is fixed on the slide bar 5. A second electromagnet 7 is also slidably arranged on the slide bar 5. A jack 7-1 is opened on the second electromagnet 7. Four positioning holes 5-1 are opened along the length direction of the slide bar 5. The positioning holes 5-1 correspond to the positioning mechanisms 3 one by one. The second electromagnet 7 is connected with a locking member 8 that locks it on the slide bar 5. The jack 7-1 is inserted and cooperated with one of the positioning holes 5-1 through a pin. Four marks 5-2 are also arranged on the slide bar 5. The marks 5-2 correspond to the positioning holes 5-1 one by one. A suction cup 9 is fixed above the detection table 1. The suction cup 9 faces the positioning area 3-1. An air pump 10 is fixed below the detection table 1. The suction cup 9 is communicated with the air pump 10.

[0055] In this embodiment, the second electromagnet 7 can move along the length direction of the slide bar 5. When the jack 7-1 on the second electromagnet 7 corresponds to one of the positioning holes 5-1, the locking member 8 is passed through the jack 7-1 and the positioning hole 5-1, and the position of the second electromagnet 7 on the slide bar 5 can be fixed. When the first electromagnet 6 is powered on and the second electromagnet 7 is powered off, the sliding member 2c made of iron can be moved to contact the first electromagnet 6, driving the lifting component 2a and the probe 2b to translate, so as to adjust the detection mechanism 2 to the first working position 2-a to detect the sheet resistance of the central position of the silicon wafer 19. When the first electromagnet 6 is powered off and the second electromagnet 7 is powered on, the sliding member 2c can be moved to contact the second electromagnet 6, driving the lifting component 2a and the probe 2b to translate, so as to adjust the detection mechanism 2 to the second working position 2-b. There are four positioning holes 5-1, corresponding to the four positioning mechanisms 3, so as to be applicable to the adjustment of the position of the positioning mechanism 3 when detecting the sheet resistance of silicon wafers 19 with different specifications and sizes. The marks 5-2 on the slide bar 5 help the operator to determine the size specifications of the silicon wafers 19 corresponding to different positioning holes 5-1 during adjustment, avoiding confusion. When adjusting the working position of the detection mechanism 2 in this embodiment, only by controlling the power-on and power-off states of the first electromagnet 6 and the second electromagnet 7, the precise adjustment of the position of the detection mechanism 2 can be realized. In addition, after the silicon wafer 19 is placed, the air pump 10 is started, and air is pumped through the suction cup 9, so that the suction cup 9 attracts the silicon wafer 19 to move downward, which is beneficial for the silicon wafer 19 to enter the positioning area 3-1 of the positioning mechanism 3. After the sheet resistance detection is completed, the air pump 10 is started, and air is blown into the suction cup 9 to blow the silicon wafer 19 upward, so as to facilitate the operator to take out the silicon wafer 19.

[0056] It should be noted that in this embodiment, the manufacturing material of the sliding member 2c is not limited to iron, and other ferromagnetic materials such as nickel or cobalt can also be selected; the number of the positioning cards 5-1 is the same as the number of the positioning mechanisms 3, so that the two can correspond to each other one by one.

[0057] Example 4

[0058] like Figure 11 and Figure 12 As shown, the battery cell square resistance detection device of the G12 high-power component of Example 4 is based on Example 3, with the difference that a suction cup 9 is arranged between the detection platform 1 and the positioning area 3-1, the suction cup 9 faces the positioning area 3-1 and is connected to the air pump 10 through the corrugated hose 21, and a vertically arranged negative pressure tube 11 is also fixed on the detection platform 1, the negative pressure tube 11 is arranged opposite to the positioning area 3-1, and a piston plate 12 matched with the negative pressure tube 11 is arranged in the negative pressure tube 11, the piston plate 12 is fixedly connected to the suction cup 9 through the connecting plate 22, and the negative pressure tube 11 is connected to the air pump 10; an elastic member 13 is also arranged in the negative pressure tube 11, the elastic member 13 is a spring, which is in a compressed state, and its two ends are respectively connected to the piston plate 12 and the bottom of the negative pressure tube 11; a limiting member 14 is also fixedly arranged in the negative pressure tube 11, and the limiting member 14 is located on the side of the piston plate 12 opposite to the positioning area 3-1.

[0059] In this embodiment, since the suction cup 9 is connected to the corrugated hose 21, the height of the suction cup 9 can be adjusted. The piston plate 12 is pushed upward by the compressed spring, so that the piston plate 12 drives the suction cup 9 to move upward through the connecting plate 22. When the silicon wafer 19 is placed, the silicon wafer 19 falls on the suction cup 9 and directly contacts the suction cup 9, thereby increasing the adsorption force of the suction cup 9 on the silicon wafer 19; when the air pump 10 is running, the air pump 10 also draws air in the negative pressure tube 11, so that the piston plate 12 moves downward, drives the suction cup 9 to move downward through the connecting plate 22, and moves the silicon wafer 19 downward. The position of the positioning mechanism 3 is adjusted by the roller 3aa in the positioning mechanism 3, so that the silicon wafer 19 falls into the positioning area 3-1 of the positioning mechanism 3, and the position of the silicon wafer 19 is fixed during the block resistance detection. At this time, the compressed spring inhibits the downward movement of the piston plate 12 to prevent the piston plate 12 from driving the suction cup 9 to separate from the lower surface of the silicon wafer 19. After the block resistance test is completed, the air pump 10 supplies air to the negative pressure tube 11 , and the limiter 14 can limit the sliding range of the piston plate 12 to prevent the piston plate 12 from escaping from the negative pressure tube 11 .

[0060] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the technical principles of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A device for detecting the sheet resistance of battery chips of a G12 high-power component, comprising a detection table (1), above which a detection mechanism (2) is arranged. The detection mechanism (2) includes a lifting component (2a) and a probe (2b) connected in sequence from top to bottom. It is characterized in that: A positioning mechanism (3) is arranged on the detection table (1). The positioning mechanism (3) has a square positioning area (3-1), and the positioning area (3-1) is horizontally arranged between the probe (2b) and the detection table (1). The detection mechanism (2) has two working positions. The probe (2b) at the first working position (2-a) is directly above the center of the positioning area (3-1), and the probe (2b) at the second working position (2-b) is directly above one of the corners of the positioning area (3-1). The detection table (1) is connected with a rotating mechanism (4). The rotating mechanism (4) drives the detection table (1) to horizontally and intermittently rotate 90° around the center of the positioning area (3-1) in a fixed direction. The positioning mechanism (3) includes four positioning members (3a), and the four positioning members (3a) respectively correspond to and are adjacent to the four side edges of the positioning area (3-1). The positioning member (3a) includes a roller (3aa), the axis line of the roller (3aa) is parallel to the side edge of the corresponding positioning area (3-1), and the roller (3aa) is arranged to roll around its axis line.

2. The device for detecting the sheet resistance of battery chips of a G12 high-power component according to claim 1, It is characterized in that: A plurality of positioning mechanisms (3) are arranged. The center lines of the positioning areas (3-1) of each positioning mechanism (3) coincide and the corresponding side edges are parallel. Among two adjacent positioning areas (3-1), the outer positioning area (3-1) is higher than the inner positioning area (3-1), and the height difference between the two is less than the thickness of the silicon wafer.

3. The device for detecting the sheet resistance of battery chips of a G12 high-power component according to claim 2, It is characterized in that: The detection mechanism (2) is slidably arranged above the detection table (1). A slide bar (5) is arranged above the detection table (1). The lifting component (2a) is connected with a sliding member (2c), and the sliding member (2c) is slidably matched with the slide bar (5). The sliding member (2c) is made of a magnetophilic material, and a first electromagnet (6) and a second electromagnet (7) are arranged on the slide bar (5).

4. The device for detecting the sheet resistance of battery chips of a G12 high-power component according to claim 3, It is characterized in that: The first electromagnet (6) is fixedly connected with the slide bar (5), the second electromagnet (7) is slidably matched with the slide bar (5), and the second electromagnet (7) is connected with a locking member (8) for locking it on the slide bar (5).

5. The device for detecting the sheet resistance of battery chips of a G12 high-power component according to claim 4, It is characterized in that: The second electromagnet (7) is provided with a jack (7-1). The slide bar (5) is provided with a plurality of positioning holes (5-1) along its length direction. The positioning holes (5-1) correspond to the positioning mechanism (3) one by one. The locking member (8) is a bolt, and the jack (7-1) is in plug-in fit with one of the positioning holes (5-1) through the bolt.

6. The device for detecting the sheet resistance of a battery cell of a G12 high-power component according to claim 5, characterized in that: a mark (5-2) is provided on the slide bar (5), and the mark (5-2) corresponds to the positioning hole (5-1) one by one.

7. The device for detecting the sheet resistance of a battery cell of a G12 high-power component according to any one of claims 1 to 6, characterized in that: a suction cup (9) is arranged between the detection table (1) and the positioning area (3-1). The suction cup (9) faces the positioning area (3-1) and is communicated with an air pump (10).

8. The device for detecting the sheet resistance of a battery cell of a G12 high-power component according to claim 7, characterized in that: a negative pressure pipe (11) is further arranged on the detection table (1). The negative pressure pipe (11) is arranged opposite to the positioning area (3-1). A piston plate (12) adapted to it is arranged in the negative pressure pipe (11). The piston plate (12) is fixedly connected to the suction cup (9). The negative pressure pipe (11) is communicated with the air pump (10). An elastic member (13) is further arranged in the negative pressure pipe (11). Two ends of the elastic member (13) are respectively connected to the piston plate (12) and the inner wall of the negative pressure pipe (11). A limiting member (14) is fixedly arranged in the negative pressure pipe (11). The limiting member (14) is located on the side of the piston plate (12) facing the positioning area (3-1).

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