Photoresist, display panel and manufacturing method of display panel

Abstract

The present invention relates to a photoresist, a display panel, and a method for manufacturing a display panel. The photoresist is obtained by introducing metal spheres with high reflectivity into a transparent colloid, thereby endowing the transparent colloid with light reflection properties. Since the reflectivity of the metal spheres is much higher than that of commonly used reflective materials, such as scattering particles like titanium dioxide, the photoresist has strong light reflection ability and can reflect rather than absorb the light emitted by the quantum dot film layer, thus improving the light utilization efficiency and further enhancing the brightness of the quantum dot display panel.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and particularly relates to a photoresist, a display panel, and a method for manufacturing a display panel. Background Art

[0002] According to different light-emitting mechanisms, quantum dot displays can be classified into two types: photoluminescence display and electroluminescence display. Currently, photoluminescence quantum dot displays have developed relatively maturely, and in particular, displays represented by quantum dot backlight films have entered the market. Due to the advantages of quantum dot materials such as narrow full-width at half-maximum, high fluorescence quantum efficiency (PLQY), and adjustable emission wavelength, the display image quality is excellent and the color gamut is relatively high. Different from quantum dot backlights, quantum dot color filter technology is a new generation of quantum dot display mode. It mainly combines red and green quantum dot color filters with blue OLED, mini LED, or micro LED backlights, and uses short-wave blue light to excite red or green quantum dots to generate corresponding red or green light, thereby realizing full-color display.

[0003] This quantum dot color filter technology requires depositing quantum dot ink in a pixel-defined area by means such as inkjet printing. Since quantum dot ink has fluidity, it is necessary to fabricate a dam or bank structure (Bank) to confine the ink within the target area. Currently, most of the used materials are black Bank materials, which can completely absorb the red and green light excited by quantum dots, resulting in relatively large brightness loss. Summary of the Invention

[0004] The object of the present invention is to solve the problem of brightness loss caused by existing dams.

[0005] To achieve the above object, the present invention provides a photoresist, which comprises the following components by weight percentage: metal spheres: 1-10 wt%, hydrophobic agent: 0.1-2 wt%, flame retardant: 0.5-2 wt%, dispersant: 0.5-5 wt%, surfactant: 0.5-2 wt%, monomer: 5-20 wt%, polysiloxane: 1-10 wt%, photoinitiator: 0.1-2 wt%, photoacid generator: 0.1-2 wt%, solvent: 40-60 wt%, and additive: 0.1-2 wt%.

[0006] Optionally, the metal spheres are micron-sized metal spheres, and the metal spheres are silver spheres or aluminum spheres.

[0007] Optionally, the hydrophobic agent is fluorosilane, and the fluorosilane is any one of perfluorooctyltrichlorosilane, perfluorodecyltrichlorosilane, or perfluorododecyltrichlorosilane.

[0008] Optionally, the flame retardant is a halogenated phosphate ester flame retardant, and the halogenated phosphate ester flame retardant is any one of tris(2-chloropropyl) phosphate, tris(2-chloroethyl) phosphate, tris(2-bromopropyl) phosphate, or tetra(2-chloroethyl) ethylenediphosphate.

[0009] Optionally, the dispersant is any one of polyvinylpyrrolidone, sodium dodecylbenzenesulfonate, cetyltrimethylammonium bromide, polyvinyl alcohol, or sodium dodecylsulfonate.

[0010] Optionally, the monomer is an acrylic acid monomer, and the acrylic acid monomer is any one of methyl acrylate, ethyl acrylate, butyl acrylate, cyclohexyl acrylate, lauryl acrylate, or isooctyl acrylate.

[0011] Optionally, the photoacid generator is a sulfonium salt.

[0012] Optionally, the solvent is propylene glycol monomethyl ether acetate.

[0013] To achieve the above object, the present invention further provides a display panel, including: a color filter substrate and an array substrate disposed opposite to each other; the color filter substrate includes: a first substrate; a color resist layer disposed on the first substrate, the color resist layer includes a plurality of color resists arranged in an array, the color resists include a red color resist, a green color resist, and a blue color resist, and a black matrix is disposed between adjacent two color resists; a pixel definition layer disposed on the color resist layer, the pixel definition layer includes a plurality of pixel units arranged in an array, one pixel unit corresponds to one color resist, and a barrier rib is disposed between adjacent two pixel units, the barrier rib is formed by the photoresist according to any one of claims 1 to 8, a red quantum dot film layer is disposed in the pixel unit corresponding to the red color resist, and a green quantum dot film layer is disposed in the pixel unit corresponding to the green color resist; the array substrate includes a second substrate, a driving film layer is disposed on the second substrate, and a plurality of LED chips for emitting blue light are disposed on the driving film layer in an array, the LED chips correspond to the color resists one by one, and the driving film layer drives the LED chips to emit blue light.

[0014] To achieve the above object, the present invention further provides a method for manufacturing a display panel, including:

[0015] Manufacturing a color filter substrate:

[0016] Providing a first substrate;

[0017] Forming a black matrix layer on the surface of the first substrate;

[0018] Forming a plurality of first vias arranged in an array on the surface of the black matrix layer;

[0019] A color resistor is formed in the first via hole, and the color resistor includes a red color resistor, a green color resistor, and a blue color resistor;

[0020] A photoresist layer is formed on the black matrix layer, and the photoresist layer is formed by the photoresist according to any one of claims 1 to 8;

[0021] A second via hole corresponding to the first via hole is formed on the photoresist layer;

[0022] Red quantum dot ink is inkjet printed in the second via hole corresponding to the red color resistor to form a red quantum dot film layer;

[0023] Green quantum dot ink is inkjet printed in the second via hole corresponding to the green color resistor to form a green quantum dot film layer;

[0024] Fabricate an array substrate:

[0025] Provide a second substrate;

[0026] A driving film layer is formed on the second substrate;

[0027] A light-emitting layer is formed on the driving film layer, and the light-emitting layer includes a plurality of LED chips arranged in an array, and one LED chip corresponds to one second via hole;

[0028] Bond and attach the color filter substrate and the array substrate.

[0029] The beneficial effect of the present invention is that the present invention provides a photoresist, a display panel, and a method for manufacturing a display panel. The photoresist imparts light reflection performance to the transparent colloid by introducing metal spheres with high reflectivity into the transparent colloid. Since the reflectivity of the metal spheres is much higher than that of common reflective materials, such as scattering particles like titanium dioxide, the photoresist has strong light reflection ability and can reflect rather than absorb the light emitted by the quantum dot film layer, thereby improving the light utilization efficiency and further enhancing the brightness of the quantum dot display panel. Description of the Drawings

[0030] The following combines the drawings and describes the specific embodiments of the present invention in detail, and the technical solutions and other beneficial effects of the present invention will be obvious.

[0031] Figure 1 It is a schematic structural diagram of a display panel in an exemplary embodiment of the present invention;

[0032] Figure 2 It is a schematic structural diagram of a color filter substrate in an exemplary embodiment of the present invention;

[0033] Figures 3a to 3g It is a schematic preparation process diagram of a display panel in an exemplary embodiment of the present invention;

[0034] Figure 4 It is a flowchart of a method for manufacturing a display panel in an exemplary embodiment of the present invention;

[0035] The component numbers in the figure are as follows:

[0036] 100, display panel; 110, color filter substrate; 111, first substrate; 112, color resist layer; 112a, first via hole; 1121, color resist; 1122, black matrix; 113, pixel definition layer; 113a, second via hole; 1131a, red quantum dot film layer; 1131b, green quantum dot film layer; 1132, barrier wall; 120, array substrate; 121, second substrate; 122, driving film layer; 1221, driving thin film transistor; 123, light emitting layer; 1231, LED chip. Detailed implementation manners

[0037] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0038] The photoresist provided by the present invention endows the transparent colloid with light reflection performance by introducing metal spheres with high reflectivity into the transparent colloid. Since the reflectivity of the metal spheres is much higher than that of common reflection materials, such as scattering particles like titanium dioxide, etc., the reflective ability of the photoresist is strong, and it can reflect rather than absorb the light emitted by the quantum dot film layer, thereby improving the light utilization efficiency and further enhancing the brightness of the quantum dot display panel. As a typical application, the photoresist can be used as the barrier wall of the pixel definition layer of the display panel. For example, as the barrier wall of the pixel definition layer on the color filter substrate in the quantum dot display panel to define and form a plurality of pixel units arranged in an array. The quantum dot display panel can be applied to a mobile terminal, and the mobile terminal includes a terminal body and a quantum dot display panel. The mobile terminal can be: a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, or any other product or component with a display function.

[0039] In one embodiment of the present invention, the photoresist comprises the following components by weight percentage: metal spheres: 1 - 10 wt%, water repellent: 0.1 - 2 wt%, flame retardant: 0.5 - 2 wt%, dispersant: 0.5 - 5 wt%, surfactant: 0.5 - 2 wt%, monomer: 5 - 20 wt%, polysiloxane: 1 - 10 wt%, photoinitiator: 0.1 - 2 wt%, photoacid generator: 0.1 - 2 wt%, solvent: 40 - 60 wt%, and additive: 0.1 - 2 wt%.

[0040] Among them, the metal balls are micron-sized metal balls, the metal balls are silver balls or aluminum balls, and the particle size of the metal balls is greater than 1 μm, which plays a role in reflecting visible light waves.

[0041] The hydrophobic agent is fluorosilane, and the fluorosilane is any one of perfluorooctyltrichlorosilane, perfluorodecyltrichlorosilane or perfluorododecyltrichlorosilane. The hydrophobic agent is selected from fluorine-containing materials, which plays a role in hydrophobic ink and is beneficial to the printing of quantum dot ink.

[0042] The flame retardant is a halogenated phosphate ester flame retardant, and the halogenated phosphate ester flame retardant is any one of tris(2-chloropropyl) phosphate, tris(2-chloroethyl) phosphate, tris(2-bromopropyl) phosphate or tetra(2-chloroethyl) ethylenediphosphate.

[0043] The dispersant is any one of polyvinylpyrrolidone, sodium dodecylbenzenesulfonate, cetyltrimethylammonium bromide, polyvinyl alcohol or sodium dodecylsulfonate. The combined use of the dispersant and the surfactant improves the dispersion of the metal balls in the colloid, thereby enhancing the light reflection effect.

[0044] Optionally, the monomer is an acrylic monomer, and the acrylic monomer is any one of methyl acrylate, ethyl acrylate, butyl acrylate, cyclohexyl acrylate, lauryl acrylate and isooctyl acrylate. The selection of the acrylic monomer plays a role in cross-linking polymerization to form a dense film.

[0045] The photoacid generator is sulfonium salt. The solvent is propylene glycol monomethyl ether acetate. The solvent mainly plays a role in dissolving and adjusting the viscosity. The main function of the photoinitiator is to initiate the polymerization reaction of the monomer under light irradiation.

[0046] The above components are mixed and stirred according to the ratio to prepare the photoresist. The photoresist provided by the embodiment of the present invention is a photopolymerizable photoresist, which generates free radicals under the action of light. The free radicals further initiate the polymerization of the monomer, and finally generate a polymer, having the characteristic of forming a positive image.

[0047] Refer to Figure 1 and Figure 2 Moreover, the present invention also provides a display panel. The display panel 100 includes a color filter substrate 110 and an array substrate 120, and the color filter substrate 110 and the array substrate 120 are disposed opposite to each other.

[0048] The color film substrate 110 includes a first substrate 111, and a color resist layer 112 and a pixel definition layer 113 stacked on the first substrate 111. The color resist layer 112 includes a plurality of color resists 1121 arranged in an array. A black matrix 1122 is provided between two adjacent color resists 1121. The color resists 1121 include a red color resist R, a green color resist G, and a blue color resist B, and the colors of any three adjacent color resists 1121 are different from each other. The pixel definition layer 113 includes a plurality of pixel units 1131 arranged in an array. One pixel unit 1131 corresponds to one color resist 1121. A barrier rib 1132 is provided between two adjacent pixel units 1131. The barrier rib 1132 is formed of the photoresist as described above. A red quantum dot film layer 1131a is provided in the pixel unit 1131 corresponding to the red color resist R, and a green quantum dot film layer 1131b is provided in the pixel unit 1131 corresponding to the green color resist G.

[0049] The array substrate 120 includes a second substrate 121, and a driving film layer 122 and a light-emitting layer 123 stacked on the second substrate 121. The light-emitting layer 123 includes a plurality of LED chips 1231 arranged in an array. One LED chip 1231 corresponds to one color resist 1121. The driving film layer 122 drives the LED chip 1231 to emit blue light.

[0050] In this embodiment, the driving film layer 122 includes a plurality of driving thin film transistors 1221, and one driving thin film transistor 1221 drives one LED chip 1231 to emit blue light.

[0051] For the LED chip 1231 corresponding to the red color resist R, the blue light emitted by the LED chip 1231 excites the red quantum dot film layer 1131a corresponding to the red color resist R, and the red quantum dot film layer 1131a emits red light under the excitation of blue light; for the LED chip 1231 corresponding to the green color resist G, the blue light emitted by the LED chip 1231 excites the green quantum dot film layer 1131b corresponding to the green color resist G, and the green quantum dot film layer 1131b emits green light under the excitation of blue light; at the position of the pixel unit corresponding to the blue color resist B, it is left blank to expose the blue color resist B for the blue light emitted by the LED chip 1231 corresponding to the blue color resist B to pass through.

[0052] In this embodiment, referring to Figure 1 , since the barrier rib 1132 of the pixel definition layer 113 is formed of the photoresist as described above, the metal balls in the barrier rib 1132 will reflect rather than absorb the blue light, red light, and green light incident on the barrier rib 1132, so that the reflected blue light, red light, and green light are emitted through the opening between two adjacent barrier ribs 1132. These reflected lights can enhance the blue light, red light, or green light directly emitted through the opening between two adjacent barrier ribs 1132, improve the light extraction efficiency, and thus improve the brightness.

[0053] In the existing quantum dot color filter substrate, the light barrier is made of a black material, which will absorb blue light, green light, and red light incident on the light barrier. Only part of the directly incident blue light, green light, and red light will not be absorbed and will be emitted, resulting in low light extraction efficiency.

[0054] Among them, referring to Figure 1 , the height of the light barrier 1132 is higher than the height of the red quantum dot film layer 1131a, the height of the light barrier 1132 is higher than the height of the green quantum dot film layer 1131b, and the cross-sectional shape of the light barrier 1132 is square or trapezoidal.

[0055] Referring to Figures 3a to 3g and Figure 4 , the method for manufacturing the display panel provided by the present invention includes the following steps:

[0056] S100. Manufacturing the color filter substrate 110:

[0057] S101. Providing the first substrate 111;

[0058] S102. Forming a black matrix layer on the surface of the first substrate 111;

[0059] S103. Forming a plurality of first vias 112a arranged in an array on the surface of the black matrix layer;

[0060] S104. Forming color resist 1121 in the first via 112a, and the color resist 1121 includes red color resist R, green color resist G, and blue color resist B;

[0061] S105. Forming a photoresist layer on the black matrix layer, and the photoresist layer is formed by the photoresist described in any one of claims 1 to 8;

[0062] S106. Forming a second via 113a corresponding to the first via 112a on the photoresist layer;

[0063] S107. Inkjet printing red quantum dot ink in the second via 113a corresponding to the red color resist R to form a red quantum dot film layer 1131a;

[0064] S108. Inkjet printing green quantum dot ink in the second via 113a corresponding to the green color resist G to form a green quantum dot film layer 1131b;

[0065] S200. Manufacturing the array substrate 120:

[0066] S201. Providing the second substrate 121;

[0067] S202. Forming a driving film layer 122 on the second substrate 121;

[0068] S203. Form a light-emitting layer 123 on the driving film layer 122. The light-emitting layer 123 includes a plurality of LED chips 1231 arranged in an array, and one LED chip 1231 corresponds to one second via 113b.

[0069] S300. Align, bond and attach the color filter substrate 110 and the array substrate 120.

[0070] Among them, the step of dividing the black matrix layer into a plurality of black matrices 1122 by the first via 112a and forming a color resistor 112 in the first via 112a are respectively formed by a yellow light process. The second via 113a is formed on the surface of the photoresist layer by a photolithography process, and the photoresist between two adjacent second vias 113a forms the barrier wall 1132. The red quantum dot ink printed by inkjet is cured to form a red quantum dot film layer 1131a, and the green quantum dot ink printed by inkjet is cured to form a green quantum dot film layer 1131b.

[0071] The driving film layer 122 includes a plurality of driving thin-film transistors 1221, and the driving thin-film transistors 1221 drive the LED chips 1231 to emit blue light.

[0072] The above is only the preferred embodiment of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present invention, a plurality of improvements and modifications can be made, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A photoresist, characterized in that, The photoresist is applied to the retaining walls of the pixel definition layer of a display panel; the photoresist comprises components in the following weight percentages: metal spheres: 1-10 wt%, water repellent: 0.1-2 wt%, flame retardant: 0.5-2 wt%, dispersant: 0.5-5 wt%, surfactant: 0.5-2 wt%, monomer: 5-20 wt%, polysiloxane: 1-10 wt%, photoinitiator: 0.1-2 wt%, photoacid generator: 0.1-2 wt%, solvent: 40-60 wt%, and additive: 0.1-2 wt%; The particle size of the metal spheres is greater than 1 μm, and the metal spheres are silver spheres or aluminum spheres.

2. The photoresist according to claim 1, characterized in that, The water repellent is fluorosilane, and the fluorosilane is any one of perfluorooctyltrichlorosilane, perfluorodecyltrichlorosilane or perfluorododecyltrichlorosilane.

3. The photoresist according to claim 1, characterized in that, The flame retardant is a halogenated phosphate ester flame retardant, and the halogenated phosphate ester flame retardant is any one of tris(2-chloropropyl) phosphate, tris(2-chloroethyl) phosphate, tris(2-bromopropyl) phosphate or tetra(2-chloroethyl) ethylenediphosphate.

4. The photoresist according to claim 1, characterized in that, The dispersant is any one of polyvinylpyrrolidone, sodium dodecylbenzenesulfonate, cetyltrimethylammonium bromide, polyvinyl alcohol or sodium dodecylsulfonate.

5. The photoresist according to claim 1, characterized in that, The monomer is an acrylic monomer, and the acrylic monomer is any one of methyl acrylate, ethyl acrylate, butyl acrylate, cyclohexyl acrylate, lauryl acrylate and isooctyl acrylate.

6. The photoresist according to claim 1, wherein The photoacid generator is sulfonium salt.

7. The photoresist according to claim 1, wherein The solvent is propylene glycol monomethyl ether acetate.

8. A display panel, characterized in that, Comprising: A color filter substrate and an array substrate which are oppositely arranged; The color filter substrate comprises: A first substrate; A color resist layer disposed on the first substrate, the color resist layer comprising a plurality of color resists arranged in an array, the color resists including a red color resist, a green color resist and a blue color resist, and a black matrix is disposed between adjacent two color resists; A pixel definition layer disposed on the color resist layer, the pixel definition layer comprising a plurality of pixel units arranged in an array, one pixel unit corresponding to one color resist, a retaining wall is disposed between adjacent two pixel units, the retaining wall is formed by the photoresist according to any one of claims 1-7, a red quantum dot film layer is disposed in the pixel unit corresponding to the red color resist, and a green quantum dot film layer is disposed in the pixel unit corresponding to the green color resist; The array substrate comprises a second substrate, a driving film layer is disposed on the second substrate, and a plurality of LED chips for emitting blue light and arranged in an array are disposed on the driving film layer, the LED chips corresponding to the color resists one by one, and the driving film layer drives the LED chips to emit blue light.

9. A manufacturing method of a display panel, characterized in that, Comprising: Fabricating a color filter substrate: Providing a first substrate; Forming a black matrix layer on the surface of the first substrate; Forming a plurality of first vias arranged in an array on the surface of the black matrix layer; Forming color resists in the first vias, the color resists including a red color resist, a green color resist and a blue color resist; Forming a photoresist layer on the black matrix layer, the photoresist layer being formed by the photoresist according to any one of claims 1-7; Forming second vias corresponding to the first vias on the photoresist layer; In the second vias corresponding to the red color resist, inkjet print red quantum dot ink to form a red quantum dot film layer; In the second vias corresponding to the green color resist, inkjet print green quantum dot ink to form a green quantum dot film layer; Fabricate an array substrate: Provide a second substrate; Form a driving film layer on the second substrate; Form a light-emitting layer on the driving film layer, the light-emitting layer includes a plurality of LED chips arranged in an array, and one LED chip corresponds to one second via; Align, bond and attach the color filter substrate and the array substrate.

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