Vacuum pump, rotating body and stationary wing of vacuum pump and manufacturing method thereof

Abstract

The present invention provides a vacuum pump, a rotating body and a stationary blade of the vacuum pump, and a manufacturing method thereof, which are suitable for avoiding the high temperature of parts that do not need to be heated, such as electrical components that control the drive of the rotating body, and efficiently heating parts that need to be heated, such as a thread groove pump stator, in the vacuum pump, thereby reducing the accumulation of reaction products. The rotating body (4) includes a first cylindrical body (4A) constituting a thread groove pump mechanism and a second cylindrical body (4B) constituting a turbomolecular pump mechanism, and is configured such that a plurality of moving blades (6) are arranged in multiple stages on the outer peripheral surface of the second cylindrical body (4B), and at least a portion of the inner surface of the cylinder constituted by the inner surface (S1) of the first cylindrical body (4A) and the inner surface (S2) of the second cylindrical body (4B) and the outer surface (Q1) of the first cylindrical body (4A) are configured as a low-emissivity portion having an emissivity lower than that of the outer surface of the moving blade (6).

Description

Technical Field

[0001] The present invention relates to a vacuum pump, a rotating body and a stationary wing of the vacuum pump, and a manufacturing method thereof, which are used as a processing chamber in a semiconductor manufacturing device, a flat panel display manufacturing device, a solar panel manufacturing device, a gas exhaust mechanism of other closed chambers, etc. Background Art

[0002] Conventionally, as such a vacuum pump, for example, a vacuum pump described in Patent Document 1 or Patent Document 2 is known. Figure 3 (c), in the conventional vacuum pump described in Patent Document 1, the upper surface of a moving blade (12) is configured as a high emissivity portion (high emissivity region), and the moving blade (12) is specifically the lowest moving blade (12), while the lower surface of the same moving blade (lowest moving blade) is configured as a low emissivity portion (low emissivity region). This is because by reducing the heat radiation from the thread groove pump stator (cylindrical stator 22) to the lowest moving blade (12), it is easy to achieve a high temperature of the thread groove pump stator (cylindrical stator 22), thereby reducing the accumulation of reaction products in the thread groove pump stator (cylindrical stator 22).

[0003] However, in order to obtain a moving wing (12) having a high emissivity portion and a low emissivity portion as described above, for example, when the high emissivity portion is set by a chemical solution, in order to protect the low emissivity portion (the lower surface of the lowest moving wing (12)) from the chemical solution, it is necessary to shield the lower surface (low emissivity portion) of the lowest moving wing with a shielding component.

[0004] However, according to the vacuum pump described in Patent Document 1, it is difficult to shield the lower surface (low emissivity portion) of the lowest-stage moving blade (12) with a shielding member as described above in the structure of the moving blade (12), and there is a problem caused by poor shielding, that is, the original range (lower surface of the lowest-stage moving blade (12)) that is expected to be configured as a low emissivity portion is locally configured as an undesirable high emissivity portion. In this case, it is easy to transfer heat from the thread groove pump stator (cylindrical stator 22) to the lowest-stage moving blade (12) side via the undesirable high emissivity portion, so it is difficult to heat the portion where the accumulation of reaction products is expected to be reduced by local high temperature, that is, the thread groove pump stator (cylindrical stator 22), and there is a problem that the accumulation of reaction products in the thread groove pump stator cannot be sufficiently reduced.

[0005] In addition, Patent Document 1 does not disclose or suggest what degree of emissivity the inner surface of the rotating body (pump rotor 10) has. If the emissivity of the inner surface of the rotating body (pump rotor 10) is high, the heat of the rotating body (pump rotor 10) is radiated to the components inside the rotating body (pump rotor 10), making it more difficult to achieve the high temperature of the thread groove pump stator, that is, the part that needs to be heated, and the electrical components located inside the rotating body (pump rotor 10), such as the magnetic bearings supporting the rotating body and the motor driving the rotating body, will be heated, and it is also expected that the electrical components will malfunction, the pump will fail, and other problems will occur.

[0006] Patent Document 1: Japanese Patent Application Publication No. 2015-229949.

[0007] Patent document 2: Japanese Patent Application Publication No. 2005-320905. Summary of the invention

[0008] The present invention is made in view of the above situation, and its purpose is to provide a vacuum pump, a rotating body and a stationary blade of a vacuum pump and a manufacturing method thereof, which are suitable for avoiding the high temperature of parts that do not need to be heated, such as electrical components that control the drive of the rotating body, and efficiently heating the parts that need to be heated in the vacuum pump, such as the stator of a threaded groove pump, thereby reducing the accumulation of reaction products.

[0009] In order to achieve the above-mentioned purpose, the first present invention is a vacuum pump, which utilizes the rotation of a rotating body to suck and exhaust gas, and the above-mentioned vacuum pump is characterized in that the above-mentioned rotating body has a first cylindrical body constituting a thread groove pump mechanism part and a second cylindrical body constituting a turbomolecular pump mechanism part, and a plurality of moving wings are arranged in multiple stages on the outer peripheral surface of the above-mentioned second cylindrical body, and at least a portion of the inner surface of the cylinder constituted by the inner surface of the above-mentioned first cylindrical body and the inner surface of the above-mentioned second cylindrical body, and the outer surface of the above-mentioned first cylindrical body are constituted as a low-emissivity part whose emissivity is smaller than that of the outer surface of the above-mentioned moving wings.

[0010] In the above-mentioned first present invention, it can also be characterized by the following content: an intermediate portion exists between the above-mentioned low emissivity portion and the high emissivity portion arranged adjacent to the low emissivity portion, and the intermediate portion has an emissivity greater than the emissivity of the above-mentioned low emissivity portion and smaller than the emissivity of the above-mentioned high emissivity portion.

[0011] In the above-mentioned first present invention, it can also be characterized by the following content: the above-mentioned middle portion is located within the design range of one of the design ranges of the above-mentioned high emissivity portion and the above-mentioned low emissivity portion, so that the design range of the other side is only composed of the above-mentioned high emissivity portion or the above-mentioned low emissivity portion that does not include the above-mentioned middle portion.

[0012] In the first present invention, the inner surface of the second cylindrical body may be configured as a high emissivity portion having a higher emissivity than the low emissivity portion.

[0013] In the first present invention, the end surface of the first cylindrical body may be configured as a high emissivity portion having a higher emissivity than the low emissivity portion.

[0014] In the first present invention, the end surface of the first cylindrical body may be configured as a low emissivity portion having a lower emissivity than the high emissivity portion.

[0015] In the first present invention, the following may be a feature: a surface of the lowest-stage moving blade among the moving blades is configured as the low-emissivity portion.

[0016] In the first present invention, the following may be a feature: in the lowermost moving blade among the moving blades, the low emissivity portion is formed on a surface facing a fixing member of the thread groove pump mechanism.

[0017] In the first present invention, a shielding member may be arranged between the lowest-level moving blade among the moving blades and a fixing member of the thread groove pump mechanism, and the low emissivity portion may be formed on the shielding member.

[0018] In the aforementioned first present invention, it may also be characterized by the following contents: a stationary blade is provided between the above-mentioned moving blades in the pump axial direction, the above-mentioned stationary blade has an outer rim, the above-mentioned outer rim is used to be supported at the outer peripheral portion of the outer rim and / or near the outer peripheral portion, and at least one of the upper and lower surfaces and the outer peripheral surface of the above-mentioned outer rim constitutes the above-mentioned low emissivity portion.

[0019] In the above-mentioned first present invention, it can also be characterized by the following content: a stationary blade is provided between the above-mentioned moving blades in the pump axial direction of the above-mentioned moving blades, and the above-mentioned stationary blade has an outer rim, and the above-mentioned outer rim is used to be supported at the outer peripheral portion of the outer rim and / or near the outer peripheral portion. The above-mentioned outer rim is formed into a ring shape as a whole by docking and joining a plurality of rim parts, and the docking surfaces of the above-mentioned rim parts constitute the above-mentioned low emissivity portion.

[0020] In the first present invention, the low emissivity portion may be characterized in that the low emissivity portion has a multilayer structure in which a second low emissivity portion is stacked on a first low emissivity portion.

[0021] The second present invention is a method for manufacturing a rotating body of a vacuum pump, wherein the rotating body of the vacuum pump comprises a first cylindrical body constituting a thread groove pump mechanism portion and a second cylindrical body constituting a turbomolecular pump mechanism portion, and a plurality of moving wings are arranged in multiple stages on the outer peripheral surface of the second cylindrical body. The method for manufacturing the rotating body of a vacuum pump is characterized in that the method for manufacturing the rotating body of a vacuum pump comprises the following steps: a protection step for protecting at least a portion of the inner surface of the cylinder constituted by the inner surface of the first cylindrical body and the inner surface of the second cylindrical body and / or the outer surface of the first cylindrical body so as not to be subjected to high emissivity surface treatment; and a surface treatment step for subjecting the rotating body to the high emissivity surface treatment after the protection step.

[0022] In the second present invention, the rotating body may include a through hole for fastening and connecting the first cylindrical body or the second cylindrical body to the rotating shaft, and the protecting step includes a process of sealing the through hole.

[0023] In the above-mentioned second present invention, it can also be characterized by the following content: there is a fastening and connecting step before the above-mentioned protection step, the above-mentioned rotating body has a plurality of through holes for fastening and connecting the above-mentioned first cylindrical body or the above-mentioned second cylindrical body to the rotating shaft, and the above-mentioned fastening and connecting step is the following step: inserting the end of the above-mentioned rotating shaft into one of the through holes located on the rotation center line of the above-mentioned rotating body from the inner surface side of the above-mentioned rotating body, and then inserting and fastening the fastening and connecting bolts into the other through holes, thereby fastening and connecting the above-mentioned second cylindrical body to the above-mentioned rotating shaft, and the above-mentioned protection step includes the step of installing a protective cover on the end portion of the above-mentioned rotating shaft inserted in the above-mentioned fastening and connecting step.

[0024] In the aforementioned second present invention, the following contents may also be used as a feature: the protective cover has a function of preventing the high-emissivity surface treatment from being applied to the inner surface side of the rotating body through the gap between the fastening bolts and the through holes, and a function of preventing the corrosive products of the rotating shaft and the fastening bolts caused by the corrosive gas from flowing out of the vacuum pump.

[0025] The third present invention is a method for manufacturing a rotating body of a vacuum pump, wherein the rotating body of the vacuum pump comprises a first cylindrical body constituting a thread groove pump mechanism portion and a second cylindrical body constituting a turbomolecular pump mechanism portion, a plurality of moving wings are arranged in multiple stages on the outer circumferential surface of the second cylindrical body, and a through hole is provided for fastening and connecting the first cylindrical body or the second cylindrical body to a rotating shaft. The method for manufacturing the rotating body of the vacuum pump is characterized in that the through hole is processed after a high emissivity surface treatment is performed on the outer surface of the rotating body.

[0026] In the above-mentioned second and third present inventions, the following content can also be used as a feature: the outer rim of the stationary wing provided between the above-mentioned moving wings is formed into an annular shape as a whole by docking and joining a plurality of rim components, and the above-mentioned high emissivity surface treatment is performed on the above-mentioned stationary wing in a state in which the above-mentioned rim components are docked and joined, so that the docking surface of the above-mentioned rim components becomes a state having an emissivity lower than the high emissivity portion formed on the surface of the above-mentioned stationary wing by utilizing the above-mentioned high emissivity surface treatment.

[0027] In the second and third present inventions, the following may be a feature: when the high emissivity surface treatment is performed, the outer surface of the first cylindrical body is protected by an acid-resistant shielding member.

[0028] In the second and third present inventions described above, the protection step may include a step of protecting with an acid-resistant shielding member.

[0029] In the second and third present inventions described above, the shielding member may be made of a rubber material containing fluorine.

[0030] The fourth present invention is a method for manufacturing a rotating body of a vacuum pump, wherein the rotating body of the vacuum pump comprises a first cylindrical body constituting a thread groove pump mechanism portion and a second cylindrical body constituting a turbomolecular pump mechanism portion, and a plurality of moving wings are arranged in multiple stages on the outer peripheral surface of the second cylindrical body. The method for manufacturing the rotating body of the vacuum pump is characterized in that the method for manufacturing the rotating body of the vacuum pump comprises the following steps: a first surface treatment step of performing a low emissivity surface treatment on at least a portion of the entire outer peripheral surface of the rotating body that is desired to be configured as a low emissivity portion; a shielding step of shielding the low emissivity surface layer formed by the low emissivity surface treatment in the first surface treatment step of the portion that is desired to be configured as the low emissivity portion; and a second surface treatment step of performing a high emissivity surface treatment on the entire rotating body that has been shielded by the shielding step.

[0031] In the aforementioned fourth present invention, it can also be characterized by the following contents: the above-mentioned first surface treatment process is the following process: preparing a treatment tank filled with a low-emissivity surface treatment liquid, immersing at least a portion of the above-mentioned outer peripheral surface of the above-mentioned rotating body that is expected to constitute the above-mentioned low-emissivity portion in the treatment tank, thereby performing the above-mentioned low-emissivity surface treatment on the portion, and the above-mentioned second surface treatment process is the following process: preparing a treatment tank filled with a high-emissivity surface treatment liquid, immersing the entire above-mentioned rotating body masked by the above-mentioned masking process in the treatment tank, thereby performing the above-mentioned high-emissivity surface treatment on the above-mentioned rotating body.

[0032] In the fourth aspect of the present invention, the shielding member may have elasticity such that it can deform in accordance with a concavo-convex shape caused by the surface roughness of the shielded surface.

[0033] Another aspect of the present invention is a rotating body characterized by being used for the above vacuum pump, or a stationary blade characterized by being used for the above vacuum pump.

[0034] According to the present invention, as described above, at least a portion of the inner surface of the cylinder in the rotating body is configured as a low emissivity portion having a lower emissivity than the outer surface of the moving blade. Therefore, a vacuum pump can be provided that reduces the amount of heat radiated to the outer surface of the rotating body from the following portion, which is a component located outside the rotating body, such as a thread groove pump stator, which particularly needs to be heated in the vacuum pump, thereby being able to efficiently heat the portion that needs to be heated, and being suitable for reducing the accumulation of reaction products by heating the portion.

[0035] In addition, in the present invention, as described above, the amount of heat radiation from the rotating body to the inside thereof is reduced, so that the electrical components located on the inside of the rotating body (for example, magnetic bearings supporting the rotating body, motors for rotating the rotating body, etc.) which are expected to avoid high temperatures can be maintained at a relatively low temperature, and erroneous operations, pump failures, etc. caused by overheating of the electrical components can be effectively reduced.

[0036] Furthermore, in the present invention that adopts a protection process, when a high-emissivity surface treatment is applied to the outer surface of the rotating body, the inner surface of the rotating body is protected from being subjected to the high-emissivity surface treatment, and the inner surface of the rotating body can be constructed as a low-emissivity portion. Therefore, this can also achieve the aforementioned effect, that is, the effect of efficiently making the following part high in temperature, which is a part located on the outside of the rotating body and which particularly needs to be high in temperature in a vacuum pump. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 It is a cross-sectional view of a vacuum pump to which the present invention is applied.

[0038] Figure 2 It is composed Figure 1 An explanatory diagram showing the range of the low emissivity portion and the high emissivity portion in the rotating body of the vacuum pump.

[0039] Figure 3 This is an explanatory diagram of a process (first example) of obtaining a high emissivity portion by plating.

[0040] Figure 4 This is an explanatory diagram of the process of obtaining a high emissivity portion by plating treatment (second example).

[0041] Figure 5This is an explanatory diagram of the process of obtaining a high emissivity portion by plating treatment (third example).

[0042] Figure 6 It is an explanatory diagram of the structure near the boundary between the low emissivity portion and the high emissivity portion (boundary structure).

[0043] Figure 7 This is an explanatory diagram of an example in which the surface of the lowest-stage moving blade is configured as a low-emissivity portion.

[0044] Figure 8 This is an explanatory diagram of an example in which a member serving as a heat insulating member having a low emissivity portion is interposed between a lowermost stage moving blade and a fixed member facing the moving blade.

[0045] Fig. 9 This is an explanatory diagram of an example in which at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim is configured as a low emissivity portion.

[0046] Fig.10 It is an explanatory diagram of an example in which the butting surfaces of a plurality of rim members are configured as low-emissivity portions.

[0047] Fig.11 This is an explanatory diagram of an example in which the high emissivity portion is the uppermost layer of a multi-layer structure.

[0048] Fig.12 It is an explanatory diagram of the surface roughness of the shielding member and the shielded surface.

[0049] Fig.13 It is an explanatory diagram of a state where an elastic shielding member is attached to a shielded surface. DETAILED DESCRIPTION

[0050] Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the attached drawings.

[0051] Figure 1 is a cross-sectional view of a vacuum pump to which the present invention is applied, Figure 2 It is composed Figure 1 An explanatory diagram of the range of the low emissivity portion and the high emissivity portion in the rotating body of the vacuum pump P.

[0052] Figure 1 The vacuum pump P is a compound pump having a turbomolecular mechanism Pt and a thread groove pump mechanism Ps as a gas exhaust mechanism, and is used, for example, as a gas exhaust mechanism for processing chambers in semiconductor manufacturing equipment, flat panel display manufacturing equipment, solar panel manufacturing equipment, and other closed chambers.

[0053] exist Figure 1In the vacuum pump P, the outer casing 1 is formed into a substantially cylindrical shape with a bottom by integrally connecting a cylindrical pump casing C and a pump base B in the cylindrical axial direction thereof by a fastening member.

[0054] The upper end side of the pump housing C (at Figure 1 The pump base B is provided with a gas exhaust port 2. The gas intake port 1A is opened as a gas intake port 1A, and a gas exhaust port 2 is provided on the pump base B. The gas intake port 1A is connected to a closed chamber (not shown) which is in a high vacuum state, such as a processing chamber of a semiconductor manufacturing device, and the gas exhaust port 2 is connected to an auxiliary pump (not shown).

[0055] A cylindrical stator column 3 is provided in the central part of the pump housing C. The stator column 3 is erected on the pump base B, a rotating body 4 is provided on the outside of the stator column 3, and various electrical components such as a magnetic bearing MB as a mechanism for supporting the rotating body 4 in its radial and axial directions, and a drive motor MT as a mechanism for rotationally driving the rotating body 4 are built into the inside of the stator column 3. In addition, the magnetic bearing MB and the drive motor MT are well known, so the detailed description of their specific structures is omitted.

[0056] The rotor 4 is rotatably disposed on the pump base B and is covered by the pump base B and the pump casing C.

[0057] The rotating body 4 is a substantially cylindrical shape surrounding the outer circumference of the stator column 3, and is formed by connecting two cylindrical bodies (in the middle) with different diameters by a connecting portion 4C. Figure 1 The vacuum pump P has a structure in which a first cylindrical body 4A constituting a thread groove pump mechanism portion Ps and a second cylindrical body 4B constituting a turbomolecular pump mechanism portion Pt are connected in the axial direction thereof, a structure in which a fastening connection portion 4D for fastening the second cylindrical body 4B to a rotating shaft 4 described later is provided on the inner surface of the second cylindrical body 4B, and a structure in which a plurality of moving blades 6 described later are arranged in multiple stages on the outer peripheral surface of the second cylindrical body 4B.

[0058] A rotating shaft 41 is provided inside the rotating body 4, and the rotating shaft 41 is integrally fastened to the second cylindrical body 4B via a fastening portion 4D. As a specific fastening structure of such a rotating shaft 41, Figure 1 In the vacuum pump P, a plurality of through holes H1 and H2 (see FIG. 1 ) for fastening and fastening the second cylindrical body 4B to the rotating shaft 41 are provided in the fastening and fastening portion 4D. Figure 2 ).

[0059] Moreover, after the end of the rotating shaft 41 is inserted by press-fitting into a through hole located on the rotation center line of the rotating body 4 among these multiple through holes H1 and H2 (hereinafter referred to as the "center through hole H1"), the fastening bolt BT is inserted and fastened relative to the other through holes located around the center through hole H1 (hereinafter referred to as the "surrounding through holes H2"), thereby fastening and connecting the second cylindrical body 4B and the rotating shaft 41 as a whole.

[0060] Furthermore, the assembly by inserting the rotating shaft 41 into the through hole H1 as described above is not limited to the press-fitting as described above, and may be an assembly by shrink fit, shrink fit, or a clearance fit structure.

[0061] In addition, Figure 1 In the vacuum pump P, the rotating shaft 41 is supported by the magnetic bearing MB built into the stator column 3, and the rotating shaft 41 is rotationally driven by the drive motor MT built into the stator column 3, so that the rotating body 4 has a structure that is supported by magnetic force at a predetermined position in its axial direction and radial direction while rotating around the rotation center (the center of the rotating shaft 41). In the case of this structure, the rotating shaft 41, the magnetic bearing MB, and the drive motor MT function as a support and drive mechanism for the rotating body 4. Other structures different from this can also be used to support and rotationally drive the rotating body 4 in a manner that it can rotate around its axis.

[0062] Figure 1 The vacuum pump P includes gas flow paths R1 and R2 as a mechanism for sucking gas from the gas suction port 1A by the rotation of the rotating body 4 around the rotating shaft 41 and exhausting the sucked gas to the outside from the gas exhaust port 2 .

[0063] As one embodiment of the gas flow paths R1 and R2, Figure 1 In the vacuum pump P, the intake side gas flow path R1 of the front half of the gas flow paths R1 and R2 (on the upstream side of the connection portion 4C of the rotating body 4) is formed by a plurality of movable wings 6 provided on the outer peripheral surface of the rotating body 4 and a plurality of stationary wings 7 fixed to the inner peripheral surface of the pump housing C via a spacer 9. In addition, as for the exhaust side gas flow path R2 of the rear half (on the downstream side of the connection portion 4C of the rotating body 4), a threaded groove-shaped flow path is formed by utilizing the outer peripheral surface of the rotating body 4 (specifically, the outer peripheral surface of the first cylindrical body 4A) and the threaded groove pump stator 8 opposed thereto.

[0064] If the structure of the air intake side gas flow path R1 is described in more detail, Figure 1In the vacuum pump P, a plurality of moving blades 6 constituting the suction side gas flow path R1 are arranged radially around the pump axis (for example, the rotation center of the rotating body 4). On the other hand, a plurality of stationary blades 7 constituting the suction side gas flow path R1 are arranged and fixed to the inner circumference of the pump housing C via spacers 9 in a manner positioned in the pump radial direction and the pump axial direction, and are arranged radially around the pump axis.

[0065] Moreover, in Figure 1 The vacuum pump P is configured such that the moving blades 6 and the stationary blades 7 arranged radially as described above are alternately arranged in multiple stages in the pump axial direction to form a suction side gas flow path R1.

[0066] In the air intake side gas flow path R1 constituted by the above structure, the rotating body 4 and the plurality of moving wings 6 are rotated at high speed as a whole by starting the driving motor MT, so that the moving wings 6 impart downward momentum to the gas molecules incident from the gas intake port 1A. Then, the gas molecules with such downward momentum are sent to the moving wing side of the next stage by the stationary wings 7. By repeating the above-mentioned motion imparting and sending actions to the gas molecules in multiple stages, the gas molecules on the gas intake port side are exhausted in a manner that they sequentially move in the direction of the exhaust side gas flow path R2 through the air intake side gas flow path R1.

[0067] Next, the structure of the exhaust side gas flow path R2 will be described in more detail. Figure 1 In the vacuum pump P, the threaded groove pump stator 8 constituting the exhaust side gas flow path R2 is an annular fixed component surrounding the downstream side outer peripheral surface of the rotating body 4 (specifically, the outer peripheral surface of the first cylindrical body 4A. The same applies hereinafter), and its inner peripheral surface side is arranged opposite to the downstream side outer peripheral surface of the rotating body 4 (specifically, the outer peripheral surface of the first cylindrical body 4A) with a predetermined gap therebetween.

[0068] The thread groove pump stator 8 has a thread groove 8A formed on its inner circumference. The thread groove 8A changes in a tapered shape with its depth decreasing downward and is cut in a spiral shape from the upper end to the lower end of the thread groove pump stator 8 .

[0069] Moreover, in Figure 1 In the vacuum pump P, the downstream outer peripheral surface of the rotating body 4 is opposed to the thread groove pump stator 8 having the thread groove 8A, so that the exhaust side gas flow path R2 is formed into a thread groove-shaped gas flow path. As another embodiment different from this, although the figure is omitted, for example, a structure in which the thread groove 8A is provided on the downstream outer peripheral surface of the rotating body 4 to form the exhaust side gas flow path R2 as described above can also be adopted.

[0070] In the exhaust side gas flow path R2 formed by the above structure, if the rotating body 4 is rotated by starting the driving motor MT, gas flows in from the intake side gas flow path R1, and the inflowing gas is exhausted in the form of being compressed from the transition flow to the viscous flow while being transferred by utilizing the drag effect of the thread groove 8A and the downstream side outer peripheral surface of the rotating body 4.

[0071] If you refer to Figure 2 , then in Figure 1 In the vacuum pump P, at least a portion of the inner surface of the rotating body 4 (in Figure 2 In the example, the entire inner surface S1 and the inner surface S2) and the outer surface Q1 of the first cylindrical body 4A are both configured as a low-emissivity portion EM1 having a lower emissivity than the outer surface of the moving wing 6. Specifically, the inner surface of the rotating body 4 is a cylindrical inner surface composed of the inner surface S1 of the first cylindrical body 4A and the inner surface S2 of the second cylindrical body 4B. In addition, in the present embodiment, the inner surface S3 of the fastening connection portion 4D is also configured as a low-emissivity portion EM1 having a lower emissivity than the outer surface of the moving wing 6.

[0072] If based on Figure 1 In the case of the vacuum pump P, at least a portion of the inner surface of the cylinder in the rotating body 4 is formed as the low emissivity portion EM1 as described above. Therefore, the heat radiated from the portion that particularly needs to be heated to a high temperature in the vacuum pump P, such as the thread groove pump stator 8, to the outer surface of the rotating body 4 is reduced, so that the portion that needs to be heated to a high temperature can be efficiently heated to a high temperature, which is suitable for reducing the accumulation of reaction products by heating the portion to a high temperature.

[0073] In addition, if according to Figure 1 For the vacuum pump P, as mentioned above, the amount of heat radiated from the rotating body 4 to the inside thereof is reduced, so that parts located on the inside of the rotating body 4, such as electrical components (for example, magnetic bearings MB supporting the rotating body 4, motor MT for rotationally driving the rotating body 4, etc.) that are desired to be avoided from being heated can be maintained at a relatively low temperature, and erroneous operation and pump failure of the electrical components due to overheating can be effectively reduced.

[0074] The low emissivity portion EM1 includes a portion obtained without any surface treatment (for example, plating treatment) that changes the emissivity of heat, that is, a portion having the original emissivity of the material constituting the first or second cylindrical body 4A, 4B or the fastening connection portion 4D (non-plated type), and a portion having emissivity obtained by forming a low emissivity plating layer through a plating treatment such as nickel alloy plating (plated type), etc.

[0075] In addition, the low emissivity portion EM1 may also be formed in a multilayer structure in which a second low emissivity portion is stacked on a first low emissivity portion. Such a multilayer low emissivity portion can be obtained by, for example, performing a nickel alloy plating process on the plated surface to form a base layer (first low emissivity portion), and further performing a nickel alloy plating process on the base layer to provide a nickel alloy plating layer (second low emissivity portion).

[0076] The entire surface of the rotating body 4 is constituted by a portion other than the low emissivity portion EM1 described above, and the portion other than the low emissivity portion EM1 described above is, for example, the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the moving blade 6. Such a high emissivity portion EM2 can be obtained by, for example, a high emissivity surface treatment using a high emissivity plating solution.

[0077] Alternatively, the surface of the rotating body 4 can be oxidized by immersing the rotating body 4 in an acid.

[0078] The high emissivity portion EM2 may be plated with nickel oxide, for example. Here, if the heat dissipation properties of no plating, nickel alloy plating, and nickel oxide plating are compared, the magnitude relationship thereof becomes the following magnitude relationship of heat dissipation properties.

[0079] ・The relationship between heat dissipation and size

[0080] Nickel oxide plating > Nickel alloy plating > No plating (base material)

[0081] As described above, the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the moving blade 6 are configured as the high emissivity portion EM2 because heat dissipation from the rotating body 4 to the exterior body 1 is improved to reduce thermal expansion deformation and creep failure of the moving blade 6 .

[0082] [Description of the First Manufacturing Method of Rotating Body 4]

[0083] Figure 3 It is composed Figure 1 An explanatory diagram of a first method for manufacturing a rotating body of a vacuum pump.

[0084] As a first method for manufacturing the rotating body 4 having the low emissivity portion EM1 and the high emissivity portion EM2 as described above, the rotating body 4 can be manufactured by performing the protection step and the surface treatment step described later after completing its machining (for example, forming the moving blades 6 by cutting).

[0085] The protection step is a step of protecting a portion desired to be configured as the low emissivity portion EM1 (specifically, at least a portion of the inner surface of the cylinder consisting of the inner surface S1 of the first cylindrical body 4A and the inner surface S2 of the second cylindrical body 4B, and the outer surface Q1 of the first cylindrical body 4A) from being subjected to high emissivity surface treatment.

[0086] The surface treatment step is a step of performing high emissivity surface treatment on the rotating body 4 after the protection step.

[0087] The protection process can also be Figure 3 In this way, the desired low emissivity portion ME1 (see Figure 2 ) part.

[0088] The shielding part MSK1 prevents the high emissivity surface treatment from being applied to the outer surface Q1 of the first cylindrical body 4A which is expected to be configured as the low emissivity portion ME1, and closes the lower end opening of the first cylindrical body 4A, thereby preventing the high emissivity surface treatment from being applied to the inner surface of the cylinder which is expected to be configured as the low emissivity portion ME1 and is composed of the inner surface S1 of the first cylindrical body 4A and the inner surface S2 of the second cylindrical body 4B.

[0089] In addition, the protection process includes Figure 3 The upper end opening of the second cylindrical body 4B is closed by using a shielding member MSK2 or a shielding jig (not shown) to indirectly block the plurality of through holes (H1, H2) (hereinafter referred to as "through hole blocking process").

[0090] The through-hole blocking treatment prevents high-emissivity surface treatment from being applied to a portion that is desired to be configured as the low-emissivity portion ME1 , specifically, the cylindrical inner surface composed of the inner surface S1 of the first cylindrical body 4A and the inner surface S2 of the second cylindrical body 4B.

[0091] In the surface treatment step, the entire rotating body 4 is immersed in a plating tank PB filled with a high-radioactivity plating solution or an acidic solution, thereby subjecting the outer surface of the rotating body 4 except for the masked treatment portion to high-radioactivity surface treatment.

[0092] [Description of the Second Manufacturing Method of Rotating Body 4]

[0093] Figure 4 It is composed Figure 1 An explanatory diagram of a second method for manufacturing a rotating body of a vacuum pump.

[0094] The second manufacturing method is different from the first manufacturing method described above only in the through-hole plugging process in the protection step. Other points are the same as the first manufacturing method, so detailed description thereof is omitted.

[0095] If you refer to Figure 4 , the through-hole plugging process in the protection step in the second manufacturing method directly plugs all the through-holes (H1, H2) by using the cover member LID to close one or both ends of the through-holes (H1, H2). Figure 3 The difference in the protection step is that a portion of the upper end opening of the rotating body 4 is not subjected to the protection treatment, and the cover member LID can be fixed using the existing through holes (H1, H2).

[0096] [Description of the Third Manufacturing Method of Rotating Body 4]

[0097] Figure 5 It is composed Figure 1 An explanatory diagram of a third method for manufacturing a rotating body of a vacuum pump.

[0098] As a third method for manufacturing the rotating body 4 having the low emissivity portion EM1 and the high emissivity portion EM2 as described above, the rotating body 4 can be manufactured by sequentially providing a fastening step, a protecting step, and a plating step after machining thereof.

[0099] In the first or second manufacturing method described above, before the rotating shaft 41 is attached to the rotating body 4, the outer surface of the rotating body 4 is subjected to a high emissivity surface treatment. Figure 5 In the third manufacturing method, while the second cylindrical body 4B is tightly connected to the rotating shaft 41, that is, while the rotating shaft 41 is installed on the rotating body 4, the entire rotating body 4 is immersed in a plating tank PB filled with a high-radioactivity plating solution or an acidic solution, thereby performing a high-radioactivity surface treatment on the rotating body 4.

[0100] The fastening step in the third manufacturing method is to press the distal end of the rotating shaft 41 into the central through hole H1 among the plurality of through holes (H1, H2) from the inner surface side of the rotating body 4, and then insert the fastening bolts BT into the peripheral through holes H2 and fasten them, thereby fastening the second cylindrical body 4B to the rotating shaft 41.

[0101] A part of the protection process in the third manufacturing method is different from the protection process in the first manufacturing method described above. Specifically, the part of the protection process is a through-hole plugging process. Figure 5 In the protection step in the third manufacturing method, as an example of through-hole plugging treatment, a protective cover PC is installed on the distal end of the rotating shaft 41 pressed in by the fastening step, thereby protecting the inner surface of the rotating body 4 from being subjected to high-emissivity surface treatment.

[0102] In addition, since the plating step in the third manufacturing method is the same as the plating step in the first manufacturing method, the detailed description thereof is omitted.

[0103] However, the protective cover PC installed as described above functions as a mechanism for preventing the inner surface of the rotating body 4 from being subjected to a high-emissivity surface treatment via the gap between the through holes (H1, H2) and the fastening bolts BT. In addition, the protective cover PC installed as described above is not removed after the vacuum pump P is assembled, but exists as a component of the vacuum pump, thereby functioning as a mechanism for preventing the rotating shaft 41 and the fastening bolts BT from being corroded by corrosive gases, and also preventing the corrosive substances from flowing out of the vacuum pump P when being corroded.

[0104] [Description of the Fourth Manufacturing Method of Rotating Body 4]

[0105] In the first to third manufacturing methods described above, a plurality of through holes (H1, H2) are formed on the rotating body 4, and then the rotating body 4 is immersed in a plating tank filled with a high-radioactive plating solution or an acidic solution, thereby performing a high-radioactive surface treatment on the outer surface of the rotating body 4. In contrast, the fourth manufacturing method processes (forms) a plurality of through holes (H1, H2) after performing the high-radioactive surface treatment.

[0106] Therefore, according to the fourth manufacturing method, since the plurality of through holes (H1, H2) do not exist at the stage of performing the high emissivity surface treatment, it is not necessary to seal the through holes (H1, H2) during the high emissivity surface treatment (through hole sealing treatment).

[0107] [Description of the Fifth Manufacturing Method of Rotating Body 4]

[0108] When the outer surface Q1 of the first cylindrical body 4A in the rotating body 4 is configured as the plated low emissivity portion EM1 , the plated low emissivity portion EM1 is, for example, a low emissivity plating layer formed by plating treatment such as nickel alloy plating.

[0109] On the other hand, nickel oxide is provided as the high emissivity portion EM2 on the outer surface of the rotating body 4 such as the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the moving blade 6 as the high emissivity portion EM2.

[0110] Therefore, in order to manufacture the rotating body 4 having the low emissivity portion EM1 and the high emissivity portion EM2 as described above, a so-called partial plating process is performed to form a low emissivity plating layer and a high emissivity layer. Regarding specific aspects of the partial plating process, the following [partial plating process (part 1)] and [partial plating process (part 2)] are considered.

[0111] [Partial plating (Part 1)]

[0112] The partial plating treatment (part 1) includes four steps: (1-1) a first masking step, (1-2) a first plating step, (1-3) a second masking step, and (1-4) a second plating step.

[0113] (1-1) First masking step

[0114] In the first shielding step, a portion of the entire outer surface of the rotating body 4 that is desired to be configured as the low emissivity portion EM1 is shielded and protected by a first shielding member.

[0115] (1-2) First plating step (first surface treatment step)

[0116] In the first plating step, a plating tank filled with a low-emissivity plating solution is prepared as a treatment tank filled with a low-emissivity surface treatment solution, and the entire rotating body 4 shielded in the first shielding step is immersed in the plating tank (treatment tank), so that only the portion desired to be configured as the low-emissivity portion EM1 is subjected to low-emissivity surface treatment (plating treatment in this example). Thereafter, the first shielding member is removed from the rotating body 4.

[0117] (1-3) Second masking step

[0118] In the second masking step, the low emissivity surface treatment layer formed by the low emissivity surface treatment in the first plating step (in this example, the low emissivity plated layer formed by the aforementioned plating treatment) is masked and protected by the second masking member.

[0119] (1-4) Second plating treatment step (second surface treatment step)

[0120] In the second plating treatment step, a plating tank filled with high and low emissivity plating solutions is prepared as a treatment tank filled with high emissivity surface treatment solution, and the entire rotating body 4 shielded by the second shielding step is immersed in the plating tank (treatment tank), that is, the entire rotating body 4 shielded by the second shielding step is subjected to high emissivity surface treatment, thereby subjecting the portion (other than the shielding treatment implementation portion) desired to be configured as the high emissivity portion EM2 to high emissivity surface treatment. Thereafter, the second shielding member is removed.

[0121] Here, the plating process is used to form the low emissivity portion EM1 or the high emissivity portion EM2 , but the present invention is not limited thereto, and any method that can form the low emissivity portion EM1 or the high emissivity portion EM2 may be applied.

[0122] [Partial plating (Part 2)]

[0123] The partial plating treatment (part 1) includes three steps: (2-1) a first plating step, (2-2) a first masking step, and (2-3) a second plating step.

[0124] (2-1) First plating step (first surface treatment step)

[0125] In the first plating step, a plating tank filled with a low-emissivity plating solution is prepared as a treatment tank filled with a low-emissivity surface treatment solution, and only the portion of the overall outer surface of the rotating body 4 that is desired to be configured as the low-emissivity portion EM1, that is, the lower half of the rotating body 4 (specifically, the first cylindrical body 4A), is immersed in the plating tank (treatment tank), thereby only the lower half of the rotating body 4 (the portion of the overall outer surface of the rotating body 4 that is desired to be configured as the low-emissivity portion EM1) is subjected to low-emissivity surface treatment.

[0126] (2-2) Masking process

[0127] In the masking step, the low emissivity plating layer formed by the low emissivity surface treatment in the first plating step, that is, the lower half of the rotating body 4 is protected by a masking member or the like.

[0128] (2-3) Second plating step (second surface treatment step)

[0129] In the second plating step, a plating tank filled with a high-radioactive plating solution is prepared as a treatment tank filled with a high-radioactive surface treatment solution, and the entire rotating body 4 shielded in the shielding step is immersed in the plating tank (treatment tank), thereby performing a high-radioactive surface treatment on the entire outer surface of the rotating body 4. Thereafter, the second shielding member is removed.

[0130] Here, the plating treatment is used to form the low emissivity portion EM1 or the high emissivity portion EM2, but the present invention is not limited thereto, and any method that forms the low emissivity portion EM1 or the high emissivity portion EM2 can be applied. For example, in the case of a nickel oxide plating layer as a high emissivity surface treatment, the nickel alloy plating layer as the low emissivity portion can be left intact as long as the portion as the low emissivity portion is shielded and not subjected to the high emissivity treatment.

[0131] [Description of the boundary structure between the low emissivity portion and the high emissivity portion]

[0132] Figure 6 It is an explanatory diagram of the structure near the boundary portion between the low emissivity portion EM1 and the high emissivity portion EM2 (boundary structure).

[0133] If you refer to Figure 6, there is an intermediate portion EM3 having an emissivity greater than that of the low emissivity portion EM1 and smaller than that of the high emissivity portion EM2 between the low emissivity portion EM1 and the high emissivity portion EM2 disposed adjacent thereto.

[0134] The high emissivity portion EM1 and the low emissivity portion EM2 are configured to be within a pre-designed (set) range (hereinafter referred to as the "design range"). However, in the previously described process, for example, there is a case where the lower surface side of the shielding member MSK1 is subjected to a high emissivity surface treatment. In this case, the intermediate portion EM3 is formed as described above. At this time, by making the intermediate portion EM3 located in the design range A1 and A2 of the low emissivity portion EM1 and the high emissivity portion EM2, the high emissivity portion EM2 is placed within the design range A2. Figure 5 In the example, the low emissivity portion EM1 is within the design range A1), thereby making the other design range (in Figure 5 In the example, the design range A2 of the high emissivity portion EM2 is composed of only the high emissivity portion EM2 or the low emissivity portion EM1 (within the Figure 5 In the example, the high emissivity portion EM2 is used. In addition, whether a certain design range A1 or A2 is composed of only the high emissivity portion EM2 or the low emissivity portion EM1 can be appropriately adjusted as needed by shifting the position of the shielding member MSK1.

[0135] The middle portion EM3 here refers to a portion having an emissivity distribution rather than a uniform emissivity due to the emissivity of the original low emissivity portion EM1 and the high emissivity portion EM2 and the method of high emissivity surface treatment.

[0136] [Other embodiments of the low emissivity portion and the high emissivity portion]

[0137] In adopting Figure 2 The rotating body 4 Figure 1 In the vacuum pump P, the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the moving blade 6 are configured as the high emissivity portion EM2, thereby increasing the amount of heat radiation from the second cylindrical body 4B toward the outer body 1. Therefore, although not shown in the figure, the inner surface S2 of the second cylindrical body 4B can be configured as the high emissivity portion EM2 having a higher emissivity than the low emissivity portion EM1, thereby increasing the amount of heat radiation from the stator column 3 toward the second cylindrical body 4B to reduce overheating of the stator column 3.

[0138] exist Figure 2In the rotating body 4, the end surface S4 of the first cylindrical body 4A is also configured as the low emissivity portion EM1, but instead of this, the end surface S4 may be configured as the high emissivity portion EM2 having a higher emissivity than the low emissivity portion EM1. According to this structure, the amount of heat radiated from the end surface S4 of the first cylindrical body 4A toward the pump base B increases, thereby improving the heat dissipation of the rotating body 4 as a whole.

[0139] Figure 7 This is an explanatory diagram of an example in which the surface of the lowest-stage moving blade is configured as a low-emissivity portion.

[0140] exist Figure 2 In the rotating body 4, the surfaces of all the moving wings 6 are constituted as the high emissivity portion EM2, but this can also be replaced by, for example Figure 7 As shown in FIG. 1 , the surface of the lowest-stage moving blade 6E among the plurality of moving blades 6 is configured to include a low-emissivity portion EM1 having a lower emissivity than the high-emissivity portion EM2 .

[0141] According to this structure, the amount of heat radiated from the fixed component (specifically, the thread groove pump stator 8) facing the lowest-stage moving blade 6E toward the lowest-stage moving blade 6E is reduced, thereby effectively reducing overheating of the moving blade 6. Compared with only forming the surface facing the thread groove pump stator 8 of the entire surface of the lowest-stage moving blade 6E as the low-emissivity portion EM1, such a moving blade overheating reduction effect can be obtained more effectively, and a complicated shielding process such as shielding only the facing surface can be omitted.

[0142] Figure 8 This is an explanatory diagram of an example in which a member serving as a heat insulating member having a low emissivity portion is interposed between a lowermost stage moving blade and a fixed member facing the moving blade.

[0143] Instead of configuring the surface of the lowest-stage moving wing 6E as the low-emissivity portion EM1 as described above, Figure 8 As shown, a member (in the case of the lowermost stage moving blade 6E) which is a heat insulating member having a low emissivity portion is interposed between the lowermost stage moving blade 6E and the fixed member (specifically, the screw groove pump stator 8) facing the moving blade 6E. Figure 8 In the example of FIG. 7 , the structure of the lowest fixed wing 7E) in which the surface is formed as the low emissivity portion EM1 can also obtain the above-mentioned moving wing overheat reduction effect.

[0144] Fig. 9 This is an explanatory diagram of an example in which at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim is configured as a low emissivity portion. Fig.10 It is an explanatory diagram of an example in which the butting surfaces of a plurality of rim members are configured as low-emissivity portions.

[0145] Figure 1The vacuum pump P is structured such that radially arranged moving blades 6 and stationary blades 7 are alternately arranged in multiple stages along the pump axis direction as described above, that is, stationary blades 7 are provided between the moving blades 6 in the pump axis direction among the plurality of moving blades 6. Fig. 9 As shown, the outer rim 10 holds the outer peripheral end 7A, and the inner rim 11 holds the inner peripheral end 7B. Figure 1 ) is a structure that clamps the outer peripheral portion of the outer rim 10 or the vicinity of the outer peripheral portion and is fixed (supported) to the inner peripheral surface of the pump housing C.

[0146] According to the above-mentioned fixing structure of the stationary blade 7, the heat of the stationary blade 7 is dissipated to the outer body 1 side by heat conduction through the outer rim 10 and the spacer 9. Therefore, in order to improve the thermal conductivity of the heat dissipation path, it is preferable to Fig. 9 As shown, at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim 10 (in Fig. 9 In the example, the outer peripheral surface of the outer rim 10 is formed as a low emissivity portion EM1 composed of a nickel alloy plating layer or the like formed without plating or by a nickel alloy plating process.

[0147] When it is desired to configure the contact portion of the outer peripheral surface of the outer rim 10 that contacts the spacer 9 as the low emissivity portion EM1, for example, a shielding member composed of a rubber ring or the like is attached to the outer peripheral surface of the outer rim 10 in a state where the stationary blades 7 are butted and joined, and the high emissivity surface treatment is performed in this state. In this case, the stationary blades 7 become the object of the high emissivity surface treatment, while the contact portion of the outer peripheral surface of the outer rim 10 that has been subjected to the shielding treatment that contacts the spacer 9 becomes the object of the non-high emissivity surface treatment, that is, the state of no plating, and thus is configured as a low emissivity portion having a lower emissivity than the stationary blades 7.

[0148] In addition, refer to Fig. 9 The outer rim 10 is formed by placing a plurality of rim components (in Fig. 9 In the example, two semicircular arc-shaped rim members 10A and 10B (see Fig.10 ) are butted and joined to form an annular shape as a whole, and the butt surfaces S5 of the plurality of rim components 10A and 10B are preferably as follows Fig.10 As shown in the figure, the low emissivity portion EM1 is constituted by a nickel alloy plating layer or the like formed without plating or by a nickel alloy plating process.

[0149] According to such a configuration, for example, when heat is concentratedly accumulated in one rim member 10A, overheating of the one rim member 10A can be effectively reduced by dispersing the concentrated heat toward the other rim member 10B.

[0150] As a method of configuring the butting surface S5 of the rim members 10A and 10B as the low emissivity portion EM1 as described above, for example, a method of subjecting the stationary blade 7 to a high emissivity surface treatment in a state where a plurality of rim members 10A and 10B are butted and joined to each other may be considered.

[0151] According to this method, since the high emissivity surface treatment is not performed between the butting surfaces S5 of the rim members 10A and 10B, the butting surfaces S5 have a lower emissivity than the high emissivity portion EM2 formed on the surface of the stationary blade 7 by the high emissivity surface treatment.

[0152] When the low emissivity portion EM1 is formed of a nickel alloy plating layer and the high emissivity portion EM2 is formed of nickel oxide, the Figure 6 As shown, after the nickel alloy plating treatment is applied to the plated surface to form the low emissivity portion EM1 composed of the nickel alloy plating layer Me1, the high emissivity portion EM2 composed of the nickel oxide Me2 is formed by oxidizing the surface of the nickel alloy plating layer Me1 with a chemical solution. In this case, the high emissivity portion EM2 composed of the nickel oxide Me2 has a structure formed on the low emissivity portion EM composed of the nickel alloy plating layer Me1.

[0153] Fig.11 This is an explanatory diagram of an example in which the high emissivity portion is the uppermost layer of a multi-layer structure.

[0154] The high emissivity portion EM2 described above may also be Fig.11 As shown, after forming a base layer Me0 composed of nickel alloy plating on the plated surface, a low emissivity portion EM1 composed of a nickel alloy plating layer Me1 is further formed on the base layer Me0, and then the surface of the nickel alloy plating layer Me1 is oxidized by a chemical solution (acid) to form a high emissivity portion EM2 composed of nickel oxide Me2. In this case, the high emissivity portion EM2 composed of nickel oxide Me2 is a structure formed on the nickel alloy plating layer Me1, that is, provided in the uppermost layer of the multi-layer structure (in the case of this embodiment, a two-layer structure).

[0155] As an advantage in this case, the gap at the boundary between the low-emissivity portion EM1 and the high-emissivity portion EM2 that is easily generated in the partial plating method (the first and second methods) can be prevented, and the reduction in corrosion resistance to corrosive gas can be prevented. In addition, the number of pinholes generated in the low-emissivity portion EM2 can be reduced.

[0156] [Explanation of shielding parts]

[0157] Fig.12 is an illustration of the surface roughness of the shielding member and the shielded surface. Fig.13It is an explanatory diagram of a state where an elastic shielding member is attached to a shielded surface.

[0158] Since the solution used in the high emissivity surface treatment in the first to fifth manufacturing methods described above is acidic, an acid-resistant material is preferably used as the shielding member MSK1 used in the high emissivity surface treatment. A material having acid resistance is a fluorine-containing rubber material.

[0159] If you refer to Fig.12 , the shielding member MSK1 and the shielded surface (in the example of the figure, the outer surface of the first cylindrical body 4A) have inherent surface roughness SR1 and SR2, respectively. Therefore, when the shielding member MSK1 is mounted on the shielded surface, it is inevitable that a gap G1 will be generated between the shielding member MSK1 and the shielded surface due to the unevenness caused by the surface roughness, and there is a possibility that the high emissivity surface treatment is applied to the gap G1. Therefore, the shielding member MSK1 preferably has elasticity that can be deformed to imitate the uneven shape caused by the surface roughness of the shielded surface.

[0160] If you refer to Fig.13 , the elastic shielding member MSK1 as described above is formed into a ring shape, and the inner diameter of the shielding member MSK1 is set to be smaller than the outer diameter of the first cylindrical body 4A. If such a shielding member MSK1 is mounted on the outer surface of the first cylindrical body 4A, the shielding member MSK1 that is elastically deformed and enlarged during the mounting generates tension on the entire shielding member MSK1 due to the restoring force that wants to return to the original state, and the surface pressure caused by the tension is generated on the entire shielding member MSK1, so that the shielding member MSK1 is deformed to imitate the concave and convex shape caused by the surface roughness of the shielded surface (the outer surface of the first cylindrical body 4A), and the gap G1 as described above becomes smaller, which can reduce the situation of performing low-emissivity surface treatment and high-emissivity surface treatment on unnecessary parts.

[0161] Furthermore, the above-described embodiments may be used in combination.

[0162] The present invention is not limited to the above-described embodiments, and many modifications can be made by a person having ordinary knowledge in the art within the technical concept of the present invention.

[0163] [Explanation of Reference Numerals]

[0164] 1 outer body

[0165] 1A Gas inlet

[0166] 2 Gas exhaust port

[0167] 3 Stator column

[0168] 4 Rotating body

[0169] 41 Rotation axis

[0170] 4A 1st cylinder

[0171] 4B Second cylinder

[0172] 4C Connection

[0173] 4D fastening joint

[0174] 6 Moving Wing

[0175] 6E Lowest level moving wing

[0176] 7 static wing

[0177] 8 thread groove pump stator

[0178] 8A thread groove

[0179] 9 Spacers

[0180] 10 Outer rim

[0181] 10A, 10B Rim parts

[0182] 11 Inner rim

[0183] A1 Design range of low emissivity part

[0184] A2 Design range of high emissivity part

[0185] B Pump base

[0186] BT fastening bolt

[0187] C Pump housing

[0188] G1 Gap caused by surface roughness

[0189] EM1 Low emissivity unit

[0190] EM2 High emissivity unit

[0191] EM3 Middle

[0192] H1 through hole (center through hole)

[0193] H2 through hole (surrounding through hole)

[0194] LID Cover Assembly

[0195] MSK1, MSK2 shielding parts

[0196] MB Magnetic Bearings

[0197] MT drive motor

[0198] Me0 Basal layer

[0199] Me1 Nickel alloy coating

[0200] Me2 Nickel Oxide

[0201] P Vacuum Pump

[0202] PB Plating Tanks

[0203] PC protective cover

[0204] R Gas flow path

[0205] R1 Suction side gas flow path

[0206] R2 Exhaust side gas flow path

[0207] Q1 The outer surface of the first cylinder

[0208] Q2 The outer surface of the second cylinder

[0209] Q3 External surface of the rotor

[0210] R1, R2 gas flow path

[0211] S Inner surface of the rotating body

[0212] S1 Inner surface of the first cylinder

[0213] S2 Inner surface of the second cylinder

[0214] S3 Inner surface of the fastening joint

[0215] S4 End surface of the first cylindrical body

[0216] S5 Butt surface of outer rim.

Claims

1. A vacuum pump, which uses the rotation of a rotating body to inhale and exhaust gas, wherein the vacuum pump is characterized in that: The rotating body comprises: a first cylindrical body constituting a screw groove pump mechanism, a second cylindrical body constituting a turbomolecular pump mechanism having a plurality of moving blades arranged in multiple stages on the outer peripheral surface, and a through hole for fastening and connecting to the rotating shaft. The inner surface of the cylinder formed by the inner surface of the first cylindrical body and the inner surface of the second cylindrical body, and the outer surface of the first cylindrical body constitute a low emissivity portion having a lower emissivity than the surface of the moving blade. The through hole has a contact surface that contacts a cover member that blocks the through hole, and the contact surface contacts the cover member to block the high-radiation surface treatment liquid from entering the through hole. The outer surface of the second cylindrical body and the surface of the moving wing are subjected to high-radiation surface treatment to provide a high-radiation portion, so that the contact surface and the inner surface of the cylinder are configured as a low-radiation portion having a lower radiation rate than the surface of the moving wing, and the cover member is made of a rubber material containing fluorine.

2. A method for manufacturing a rotating body of a vacuum pump, comprising manufacturing the rotating body of the vacuum pump, the rotating body of the vacuum pump comprising: a first cylindrical body constituting a screw groove pump mechanism, a second cylindrical body having a plurality of moving blades arranged in multiple stages on the outer peripheral surface and constituting a turbomolecular pump mechanism, and a through hole for fastening and connecting to a rotating shaft, wherein the method for manufacturing the rotating body of the vacuum pump comprises the following steps: a protecting step of blocking the through hole having a contact surface with the cover member by using a cover member in order to protect the inner surface of the cylinder formed by the inner surface of the first cylindrical body and the inner surface of the second cylindrical body from being subjected to high-emissivity surface treatment, thereby blocking the entry of the high-emissivity surface treatment liquid into the through hole; and a surface treatment step of performing the high emissivity surface treatment on the outer surface of the second cylindrical body and the moving wing after the protection step; The cover member is made of a rubber material containing fluorine.

3. A method for manufacturing a rotating body of a vacuum pump, comprising manufacturing the rotating body of the vacuum pump, the rotating body of the vacuum pump comprising: a first cylindrical body constituting a screw groove pump mechanism, a second cylindrical body having a plurality of moving blades arranged in multiple stages on the outer peripheral surface and constituting a turbomolecular pump mechanism, a through hole for fastening to a rotating shaft, a cylindrical inner surface constituted by the inner surface of the first cylindrical body and the inner surface of the second cylindrical body, and an outer surface of the first cylindrical body constituting a low emissivity portion having an emissivity lower than that of the surface of the moving blades, The method for manufacturing the rotating body of the vacuum pump is characterized in that the method for manufacturing the rotating body of the vacuum pump comprises the following steps: a first protection step of blocking the through hole having a contact surface with the cover member with a cover member in order to protect the inner surface of the cylinder from being subjected to high-emissivity surface treatment, thereby blocking the high-emissivity surface treatment liquid from entering the through hole; a second protection step of protecting the outer surface of the first cylindrical body by using an acid-resistant shielding member; and A surface treatment step is to perform the high emissivity surface treatment on the outer surface of the second cylindrical body and the moving blade after the first protection step and the second protection step.

4. The method for manufacturing a rotary body of a vacuum pump according to claim 3, characterized in that: The shielding member is made of a rubber material containing fluorine.

5. The method for manufacturing a rotary body of a vacuum pump according to claim 3, characterized in that: The shielding member has elasticity to deform in accordance with the concavo-convex shape caused by the surface roughness of the shielded surface.

6. The method for manufacturing a rotary body of a vacuum pump according to claim 4, characterized in that: The shielding member has elasticity to deform in accordance with the concavo-convex shape caused by the surface roughness of the shielded surface.

7. The method for manufacturing a rotary body of a vacuum pump according to claim 3, characterized in that: The cover member is made of a rubber material containing fluorine.

8. The method for manufacturing a rotary body of a vacuum pump according to claim 3, wherein: Include: A first surface treatment step comprises preparing a treatment tank filled with a low-emissivity surface treatment liquid, immersing at least a portion of the entire outer peripheral surface of the rotating body that is desired to be formed into the low-emissivity portion in the treatment tank, thereby subjecting the portion to the low-emissivity surface treatment; In the second surface treatment step, a treatment tank filled with a high emissivity surface treatment liquid is prepared, and the outer peripheral surface of the rotating body subjected to the first protection step and the second protection step is immersed in the treatment tank, thereby subjecting the rotating body to the high emissivity surface treatment.

9. The method for manufacturing a rotary body of a vacuum pump according to claim 8, characterized in that: The shielding member has elasticity to deform in accordance with the concavo-convex shape caused by the surface roughness of the shielded surface.

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