Magnetic field structure

Abstract

The present invention discloses a magnetic field structure, comprising: two magnetic poles which are arranged on a magnetic conduction loop and form a space for accommodating a component to be measured between the two magnetic poles; a magnetic field source for providing a magnetic field in the space; and an optical positioning element which is arranged in one of the two magnetic poles for optically positioning the component to be measured. The magnetic field structure of the present invention can simultaneously provide the functions of a strong magnetic field and precise positioning.

Description

Technical Field

[0001] The present invention relates to a magnetic field structure, and more particularly to a magnetic field structure with an optical positioning function. Background Art

[0002] The size of semiconductor components is becoming increasingly miniaturized, making the area of each electrode gradually smaller and the distance shorter. In addition, when performing electromagnetic property tests, a strong magnetic field must be applied, and an external probe is used to connect to a measuring instrument to capture the electromagnetic property parameters of the component to be tested. In this way, more precise positioning of the external probe is required to effectively perform magnetic detection.

[0003] In the prior art, the optical positioning element used for positioning the external probe is generally arranged above the component to be tested, and the magnetic pole for applying the strong magnetic field is also generally arranged above the component to be tested. When the functions of precise probe positioning and strong magnetic field application are required simultaneously, the magnetic pole and the optical positioning element will conflict with each other in space and cannot be used simultaneously.

[0004] To solve this problem, the following solutions are available: one is to obliquely arrange the optical positioning element on one side of the magnetic pole; the other is to move the magnetic pole away first when positioning the probe, then move in the optical positioning element, move away the optical positioning element after completing the probe positioning, and then move in the magnetic pole. However, the method of obliquely arranging the optical positioning element often causes angular parallax and difficulty in focusing the optical distance, making it impossible to accurately align, resulting in time-consuming measurements. Moreover, the optical positioning element can only introduce light sources for measurement from the small space beside the probe, increasing the difficulty of spatial configuration. In addition, the method of moving the magnetic pole and the optical positioning element may cause vibrations due to the movement of the magnetic pole and the optical positioning element, resulting in the displacement of the positioned probe, and may even damage the fine electrodes on the component to be tested. Summary of the Invention

[0005] The main object of the present invention is to provide a magnetic field structure that can simultaneously provide the functions of a strong magnetic field and precise positioning.

[0006] The magnetic field structure of the present invention includes: two magnetic poles, which are arranged on a magnetic conduction loop and are oppositely arranged to form a space for accommodating a component to be tested between the two magnetic poles; a magnetic field source for providing a magnetic field in the space; and an optical positioning element arranged in one of the two magnetic poles for optically positioning the component to be tested. Description of the Drawings

[0007] Figure 1A is an overall schematic diagram of the magnetic field structure of the present invention;

[0008] Figure 1B is Figure 1A a partial cross-sectional schematic diagram of the magnetic field structure;

[0009] Figure 2A Schematic three-dimensional view of the first embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0010] Figure 2B is Figure 2A Schematic cross-sectional view of the magnetic pole;

[0011] Figure 3A Schematic three-dimensional view of the second embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0012] Figure 3B is Figure 3A Schematic cross-sectional view of the magnetic pole;

[0013] Figure 4A Schematic three-dimensional view of the third embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0014] Figure 4B is Figure 4A Schematic cross-sectional view of the magnetic pole;

[0015] Figure 5A and Figure 5B is Figure 2A and Figure 2B Magnetic field simulation analysis diagrams of different embodiments of the magnetic poles;

[0016] Figure 6A and Figure 6B is Figure 3A and Figure 3B Magnetic field simulation analysis diagrams of different embodiments of the magnetic poles;

[0017] Figure 7A and Figure 7B is Figure 4A and Figure 4B Magnetic field simulation analysis diagrams of different embodiments of the magnetic poles;

[0018] Figure 8A Schematic three-dimensional view of the fourth embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0019] Figure 8B is Figure 8A Schematic cross-sectional view of the magnetic pole;

[0020] Figure 9A Schematic three-dimensional view of the fifth embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0021] Figure 9B is Figure 9A Schematic cross-sectional view of the magnetic pole;

[0022] Figure 10A Schematic three-dimensional view of the sixth embodiment of the magnetic pole in the magnetic field structure of the present invention;

[0023] Figure 10B Schematic cross-sectional view of the magnetic poles Figure 10A

[0024] Symbol description

[0025] 1: Magnetic field structure

[0026] 11, 12: Magnetic poles

[0027] 111, 111’: Accommodating holes

[0028] 1111, 1112, 1113, 1111’, 1112’, 1113’: Cylindrical structures

[0029] 112, 113: Step differences

[0030] 114: Magnetic axis

[0031] 13: Magnetic conduction circuit

[0032] 14: Coil

[0033] 15: Optical positioning element

[0034] 151: Optical axis

[0035] 16: Space

[0036] 2: Element to be measured

[0037] 3: Probe

[0038] 3’: Probe holder

[0039] 4: Measuring instrument

[0040] D1, D11, D11’, D12, D13, D2: Diameters. Specific implementation manners

[0041] The following describes the implementation manners of the present invention through specific embodiments. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification, and can also implement or apply it through other different specific embodiments.

[0042] Please refer to Figure 1A and Figure 1B , the magnetic field structure 1 of the present invention includes magnetic poles 11, 12, a magnetic conduction circuit 13, a magnetic field source, and an optical positioning element 15. The magnetic poles 11, 12 are respectively arranged at both ends of the magnetic conduction circuit 13, so that the magnetic poles 11, 12 are arranged opposite to each other, thereby forming a space 16 between the magnetic poles 11, 12, and the space 16 can accommodate an element to be measured 2.

[0043] ​In one embodiment, the magnetic poles 11 and 12 may be conical, for example, conical with a diameter gradually decreasing from 60 mm to 10 mm, or a combination where, as shown in Figure 2A and Figure 2B , a part is cylindrical (with a diameter D1 of 60 mm) and a part near one end of the device under test 2 is conical (tapering from a diameter D1 of 60 mm to a diameter D2 of 10 mm), so as to concentrate magnetic field lines and enhance the magnetic field. However, the present invention is not limited thereto. Figure 2A and Figure 2B The magnetic field source is used to provide a magnetic field in the space 16. In this embodiment, the magnetic field source may be, for example, an electromagnetic field generated by passing an electric current through a coil 14 surrounding the magnetic pole 12. In other embodiments, the magnetic field source may be a permanent magnetic field generated by a permanent magnet. The present invention is not limited to the above. After generating a magnetic field in the space 16, the electromagnetic characteristic parameters of the device under test 2 can be captured by the probe 3, the probe holder 3', and the measuring instrument 4.

[0044] The optical positioning element 15 may be disposed in one of the magnetic poles 11 and 12 to perform optical positioning on the device under test 2. Hereinafter, taking the optical positioning element 15 disposed in the magnetic pole 11 as an example for illustration, however, the present invention does not limit that the optical positioning element 15 can only be disposed in the magnetic pole 11, and it can also be disposed in the magnetic pole 12.

[0045] Specifically, the magnetic pole 11 may have a receiving hole 111 for receiving the optical positioning element 15. In the first embodiment, as shown in Figure 2A and Figure 2B , the receiving hole 111 is cylindrical and hollowed out. The receiving hole 111 has a diameter D11 at one end with a diameter D1 and penetrates to the other end with a diameter D2 to have a diameter D12. Among them, the diameter D11 is equal to the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D11 = diameter D12, and it is disposed through the magnetic pole 11 in a direction perpendicular to the device under test 2, so that both ends of the receiving hole 111 are exposed outside the magnetic pole 11, that is, both ends have openings. In the second embodiment, as shown in Figure 3A and Figure 3B , the receiving hole 111 may be conical and hollowed out, for example, conical with a diameter gradually decreasing from 30 mm with a diameter D11 to 5 mm with a diameter D12. The diameter D11 is greater than the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D12; and the diameter D1 ≥ diameter D11 > diameter D12. In a third embodiment, as shown in Figure 4A and Figure 4B ,

[0046] Specifically, the magnetic pole 11 may have a receiving hole 111 for receiving the optical positioning element 15. In the first embodiment, as shown in Figure 2A and Figure 2B , the receiving hole 111 is cylindrical and hollowed out. The receiving hole 111 has a diameter D11 at one end with a diameter D1 and penetrates to the other end with a diameter D2 to have a diameter D12. Among them, the diameter D11 is equal to the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D11 = diameter D12, and it is disposed through the magnetic pole 11 in a direction perpendicular to the device under test 2, so that both ends of the receiving hole 111 are exposed outside the magnetic pole 11, that is, both ends have openings. In the second embodiment, as shown in Figure 3A and Figure 3B , the receiving hole 111 may be conical and hollowed out, for example, conical with a diameter gradually decreasing from 30 mm with a diameter D11 to 5 mm with a diameter D12. The diameter D11 is greater than the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D12; and the diameter D1 ≥ diameter D11 > diameter D12. In a third embodiment, as shown in Figure 4A and Figure 4B , Figure 2A and Figure 2B shown, the receiving hole 111 is cylindrical and hollowed out. The receiving hole 111 has a diameter D11 at one end with a diameter D1 and penetrates to the other end with a diameter D2 to have a diameter D12. Among them, the diameter D11 is equal to the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D11 = diameter D12, and it is disposed through the magnetic pole 11 in a direction perpendicular to the device under test 2, so that both ends of the receiving hole 111 are exposed outside the magnetic pole 11, that is, both ends have openings. In the second embodiment, as shown in Figure 3A and Figure 3B , Figure 3A and Figure 3B shown, the receiving hole 111 may be conical and hollowed out, for example, conical with a diameter gradually decreasing from 30 mm with a diameter D11 to 5 mm with a diameter D12. The diameter D11 is greater than the diameter D12, and the diameter D1 ≥ diameter D2 ≥ diameter D12; and the diameter D1 ≥ diameter D11 > diameter D12. In a third embodiment, as shown in Figure 4A and Figure 4B , Figure 4A and Figure 4BAs shown, the accommodation hole 111 can be a hollow state with multiple cylindrical structures 1111, 1112, 1113 having at least one step difference 112, 113. For example, it can be a structure stacked by a cylindrical structure 1113 with a diameter D11 of 30 mm (close to one end of diameter D1), a cylindrical structure 1112 with a diameter D13 of 10 mm, and a cylindrical structure 1111 with a diameter D12 of 5 mm (close to one end of diameter D2). The cylindrical structure 1112 with diameter D13 is located between the cylindrical structure 1113 with diameter D11 and the cylindrical structure 1111 with diameter D12, and D1 > D11 > D13 > D12; and D1 ≥ D2 > D12. Since the accommodation hole 111 can be in different embodiments such as cylindrical, conical, multiple cylindrical structures 1111, 1112, 1113 having at least one step difference 112, 113, or a combination thereof, the embodiment of the accommodation hole 11 can be selected according to the size of the optical positioning element 15, making its configuration more flexible.

[0047] The above Figures 2A to 4B is an embodiment in which the accommodation hole 111 penetrates through the magnetic pole 11 and both ends of the accommodation hole 111 are exposed outside the magnetic pole 11 (both ends have openings). However, in other embodiments, such as Figures 8A to 10B shown in the fourth to sixth embodiments, the accommodation hole 111' can also have only one end exposed outside the magnetic pole 11 (one end has an opening), and the other end is located inside the magnetic pole 11 and not exposed outside the magnetic pole 11 (the other end is sealed). In the fourth embodiment, as Figure 8A and Figure 8B shown, the accommodation hole 111' is cylindrical and in a hollow state. The accommodation hole 111' is exposed at one end with diameter D2 and has a diameter D12, but is not exposed at the end with diameter D1 and is formed inside the magnetic pole 11. D11 is equal to D12, and the relationship is D1 ≥ D2 ≥ D11 = D12. In the fifth embodiment, as Figure 9A and Figure 9B shown, the accommodation hole 111' can be conical and in a hollow state, for example, a conical shape gradually expanding from a diameter D12 of 5 mm to a diameter D11'. Since the accommodation hole 111' is exposed at one end with diameter D2 and has a diameter D12 (one end has an opening), but is not exposed at the end with diameter D1 (the other end is sealed), the diameter D11' can be determined according to the position formed inside the magnetic pole 11. Specifically, it can be less than D11 in the second embodiment described above (i.e., less than 30 mm), D11' > D12, and the relationship is D1 ≥ D2 ≥ D12; and D1 > D11' > D12. In the sixth embodiment, as Figure 10A and Figure 10BAs shown, the receiving hole 111’ can be a hollow state with multiple cylindrical structures 1111’, 1112’, 1113’ having at least one step difference 112, 113. For example, it is a structure stacked by a cylindrical structure 1113’ with a diameter D11 of 30 mm (close to one end of diameter D1), a cylindrical structure 1112’ with a diameter D13 of 10 mm, and a cylindrical structure 1111’ with a diameter D12 of 5 mm (close to one end of diameter D2). The cylindrical structure 1112’ with a diameter D13 is located between the cylindrical structure 1113’ with a diameter D11 and the cylindrical structure 1111’ with a diameter D12. The cylindrical structure 1111’ is exposed at one end of diameter D2 and has a diameter D12 (with an opening at one end), but the cylindrical structure 1113’ is not exposed at one end of diameter D1 (the other end is sealed). There is a relationship that diameter D1 > diameter D11 > diameter D13 > diameter D12; and diameter D1 ≥ diameter D2 > diameter D12.

[0048] In one embodiment, as Figure 1B , the optical positioning element 15 can be a microscope, a camera, a video camera, a charge-coupled device (CCD), or a complementary metal oxide semiconductor device (CMOS), but the present invention is not limited thereto. Additionally, to enable the optical positioning element 15 to accurately position and avoid angular parallax, the optical axis for photographing the element under test 2 can be perpendicular to the surface of the element under test 2. In another embodiment, the optical axis 151 of the optical positioning element 15 can also be parallel or overlapping with the magnetic axis 114 of the magnetic pole 11, but the present invention is not limited thereto.

[0049] With the design of providing a receiving hole in the magnetic pole to accommodate the optical positioning element, the magnetic field structure of the present invention can simultaneously provide the functions of applying a strong magnetic field and precisely positioning the probe, thus having the effects of accelerating the precise alignment of the probe and rapidly detecting magnetic dynamics. The present invention now provides the following comparative examples and embodiments to confirm the above functions and effects of the present invention.

[0050] Comparative Example 1: It is a magnetic field structure in the prior art without an optical positioning element (nor a designed receiving hole). Taking the magnetic pole size gradually reduced from a diameter of 60 mm to a diameter of 10 mm, 2000 turns of coils, and a current of 4 A (Ampere), the magnetic field strength generated by Comparative Example 1 is 1.1 T (Tesla).

[0051] Comparative Example 2: It is a magnetic field structure with only a single magnetic pole in the prior art. Taking the magnetic pole size gradually decreasing from a diameter of 60 mm to a diameter of 10 mm, 2000 turns of the coil, and a current of 4 A as an example, the magnetic field strength generated by Comparative Example 2 is 0.47 T (Tesla). When the current is 5 A, 6 A, 7 A, 8 A, and 9 A, the magnetic field strengths are 0.57 T, 0.66 T, 0.74 T, 0.79 T, and 0.83 T respectively. Even when the current is increased to 10 A, the magnetic field strength can only reach 0.87 T and it is difficult to exceed 1 T.

[0052] First Embodiment: Its structure and setting parameters are the same as those of Comparative Example 1, but the magnetic pole 11 has a receiving hole 111 for accommodating the optical positioning element 15, such as Figure 1A and Figure 1B shown. The receiving hole 111 can be cylindrical as shown in Figure 2A and Figure 2B shown. Referring to Figure 5A and Figure 5B together, when the diameter D12 of the receiving hole 111 is 5 mm, the magnetic field is 1.07 T, and when the diameter D12 of the receiving hole 111 is 8 mm, the magnetic field is 0.98 T. In other embodiments, when the diameter D12 of the receiving hole 111 is 6, 7, 9, and 10 mm respectively, the magnetic fields are 1.05 T, 1.02 T, 0.94 T, and 0.89 T respectively. It can be seen that the increase in the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease. In one embodiment, the preferred implementation range of the diameter D12 of the receiving hole 111 of the present invention can be less than or equal to 8 mm, but the present invention is not limited thereto.

[0053] Second Embodiment: Its structure and setting parameters are the same as those of the First Embodiment, but the receiving hole 111 can be conical as shown in Figure 3A and Figure 3B shown. Referring to Figure 6A and Figure 6B together, when the diameter D11 of the receiving hole 111 is 30 mm and the diameter D12 is 5 mm, the magnetic field is 1.06 T, and when the diameter D11 of the receiving hole 111 is 33 mm and the diameter D12 is 8 mm, the magnetic field is 0.96 T. In other embodiments, when the diameter D11 of the receiving hole 111 is 31 mm and the diameter D12 is 6 mm, the magnetic field is 1.03 T; when the diameter D11 of the receiving hole 111 is 32 mm and the diameter D12 is 7 mm, the magnetic field is 1.00 T; when the diameter D11 of the receiving hole 111 is 34 mm and the diameter D12 is 9 mm, the magnetic field is 0.91 T; when the diameter D11 of the receiving hole 111 is 35 mm and the diameter D12 is 10 mm, the magnetic field is 0.86 T. It can be seen that the increase in the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease.

[0054] Third Embodiment: Its structure and setting parameters are the same as those of the first embodiment, but the accommodation hole 111 can be, for example, Figure 4A and Figure 4B a plurality of cylindrical structures 1111, 1112, 1113 having at least one step difference 112, 113 as shown. The diameter D11 of the cylindrical structure 1113 of the accommodation hole 111 is 30 mm, and the diameter D13 of the cylindrical structure 1112 is 15 mm. Please refer to Figure 7A and Figure 7B together. When the diameter D12 of the cylindrical structure 1111 of the accommodation hole 111 is 5 mm, the magnetic field is 1.07 T, and when the diameter D12 of the cylindrical structure 1111 of the accommodation hole 111 is 8 mm, the magnetic field is 0.98 T. In other embodiments, when the diameter D12 of the cylindrical structure 1111 of the accommodation hole 111 is 6, 7, 9, 10 mm respectively, the magnetic fields are 1.05 T, 1.02 T, 0.94 T, 0.89 T respectively. It can be seen that the increase of the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease.

[0055] Fourth Embodiment: Its structure and setting parameters are the same as those of the first embodiment, but the accommodation hole 111' can be an embodiment pattern in which one end thereof is not exposed outside the magnetic pole 11 as shown in Figure 8A and Figure 8B . When the diameter D12 of the accommodation hole 111' is 5 mm, the magnetic field is 1.07 T, and when the diameter D12 of the accommodation hole 111' is 8 mm, the magnetic field is 0.98 T. In other embodiments, when the diameter D12 of the accommodation hole 111' is 6, 7, 9, 10 mm respectively, the magnetic fields are 1.05 T, 1.02 T, 0.94 T, 0.89 T respectively. It can be seen that the increase of the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease, but whether the accommodation hole 111' penetrates the magnetic pole 11 has no obvious influence on the change of the magnetic field. In one embodiment, the preferred implementation range of the diameter D12 of the accommodation hole 111 of the present invention can be less than or equal to 8 mm, but the present invention is not limited thereto.

[0056] Fifth Embodiment: Its structure and setting parameters are the same as those of the second embodiment, but the accommodation hole 111' can be a conical shape as shown in Figure 9A and Figure 9B , but an embodiment pattern in which one end thereof is not exposed outside the magnetic pole 11. When the diameter D12 of the accommodation hole 111' is 5 mm, 6 mm, 7 mm, 8 mm, 9 mm, 10 mm respectively, the magnetic fields are 1.06 T, 1.04 T, 1.00 T, 0.96 T, 0.91 T, 0.86 T respectively. It can be seen that the increase of the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease, but whether the accommodation hole 111' penetrates the magnetic pole 11 has no obvious influence on the change of the magnetic field.

[0057] Sixth Embodiment: Its structure and set parameters are the same as those of the third embodiment, but the accommodation hole 111’ can be in an implementation state where the cylindrical structure 1113 shown in Figure 10A and Figure 10B is not exposed outside the magnetic pole 11. When the diameters D12 of the cylindrical structures 1111’ of the accommodation holes 111’ are 5mm, 6mm, 7mm, 8mm, 9mm, and 10mm respectively, the magnetic fields are 1.07T, 1.05T, 1.02T, 0.98T, 0.94T, and 0.89T respectively. It can be seen from this that the increase in the diameter D12 will cause magnetic saturation of the material at the front end of the magnetic pole 11, so the magnetic field will decrease, but whether the accommodation hole 111’ penetrates the magnetic pole 11 has no obvious effect on the change of the magnetic field.

[0058] From the results of the above Comparative Examples 1 and 2 and the First, Second, Third, Fourth, Fifth, and Sixth Embodiments, it can be seen that although the magnetic field of Comparative Example 1 can reach 1.1T, there is no optical positioning element provided and accurate positioning cannot be achieved. Comparative Example 2 has a single magnetic pole and can be provided with an optical positioning element, but the magnetic field magnitude is too low. Compared with Comparative Example 1, in the First Embodiment, although the accommodation hole 111 is provided in the magnetic pole 11 and may affect the magnetic field magnitude, in fact, by controlling the size of the diameter D12 of the accommodation hole 111, the magnetic field can be maintained at approximately the magnetic field magnitude of Comparative Example 1, so that the functions of providing a strong magnetic field and precise positioning of the probe can be provided simultaneously. In this embodiment, as shown in Figure 2A and Figure 2B , the ratio between the diameter D12 of the accommodation hole 111 and the diameter D2 of the end of the magnetic pole 11 close to the element to be measured 2 can be less than or equal to 0.8. For example, when the diameter D12 of the accommodation hole 111 is 8mm and the diameter D2 of the magnetic pole 11 is 10mm, the magnetic field at this time is 0.98T. In other embodiments, this ratio (D12 / D2) is preferably less than or equal to 0.5. For example, when the diameter D12 of the accommodation hole 111 is 5mm and the diameter D2 of the magnetic pole 11 is 10mm, the magnetic field at this time is 1.07T. This can prove that even if the accommodation hole 111 is provided in the magnetic pole 11, the magnetic field structure of the present invention can still provide a strong magnetic field of up to 1T.

[0059] In addition, compared with Comparative Example 1 in the Second and Third Embodiments, different implementation states of the accommodation hole 111 can still provide a strong magnetic field of up to 1T. Although the diameters of the accommodation holes 111 in the First, Second, and Third Embodiments gradually increase, which causes magnetic saturation of the material at the front end of the magnetic pole and results in a decrease in the magnetic field magnitude / intensity, the magnetic field can also be maintained above 1T by increasing the current, as long as the ratio (D12 / D2) between the diameter (such as the diameter D12 shown in Figures 3A to 4B ) of the accommodation hole 111 and the diameter D2 of the magnetic pole 11 is less than or equal to 0.8. The present invention is not limited thereto. In addition, the Fourth, Fifth, and Sixth Embodiments of the present invention are the same as the above First, Second, and Third Embodiments and can provide a strong magnetic field of up to 1T.

[0060] The above embodiments are only illustrative to explain the technical principles, features and effects of the present invention, and are not intended to limit the scope of implementation of the present invention. Any person of ordinary skill in the art can modify and change the above embodiments without departing from the spirit and scope of the present invention. However, any equivalent modifications and changes made by using the teachings of the present invention should still be covered by the claims. The scope of protection of the present invention shall be as listed in the claims.

Claims

1. A magnetic field structure, characterized in that, Comprising: Two magnetic poles, which are arranged on a magnetic conduction loop and are arranged opposite to each other to form a space for accommodating a component to be measured between the two magnetic poles; A magnetic field source, which is used to provide a magnetic field in the space; And An optical positioning element, which is arranged in one of the two magnetic poles and is used to perform optical positioning on the component to be measured; Wherein, one of the two magnetic poles has a receiving hole for accommodating the optical positioning element.

2. The magnetic field structure according to claim 1, wherein The receiving hole is arranged through one of the two magnetic poles in a direction perpendicular to the component to be measured, so that both ends of the receiving hole are exposed outside the one of the two magnetic poles.

3. The magnetic field structure according to claim 1, characterized in that, The receiving hole is arranged in one of the two magnetic poles in a direction perpendicular to the component to be measured, so that one end of the receiving hole is exposed outside the one of the two magnetic poles, and the other end of the receiving hole is sealed.

4. The magnetic field structure according to claim 1, characterized in that The ratio between the diameter of the receiving hole and the diameter of the end of the magnetic pole where the receiving hole is located and close to the component to be measured is less than or equal to 0.

8.

5. The magnetic field structure according to claim 4, wherein The ratio is less than or equal to 0.

5.

6. The magnetic field structure according to claim 1, characterized in that, The receiving hole is cylindrical, conical, a plurality of cylindrical structures with at least one step difference or a combination thereof.

7. The magnetic field structure according to claim 1, wherein The two magnetic poles are conical.

8. The magnetic field structure according to claim 1, characterized in that, The optical axis of the optical positioning element is perpendicular to the component to be measured.

9. The magnetic field structure according to claim 1, characterized in that, The optical axis of the optical positioning element is parallel or overlaps with the magnetic axis of the magnetic pole where the optical positioning element is located.

10. The magnetic field structure according to claim 1, characterized in that, The magnetic field source is an electromagnetic field generated after a coil is energized or a permanent magnetic field generated by a permanent magnet.

11. The magnetic field structure according to claim 1, characterized in that, The optical positioning element is a microscope, a camera, a video camera, a charge-coupled device or a complementary metal oxide semiconductor device.

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