Methods, apparatus and systems for measuring millimeter-wave and submillimeter-wave electric fields
By determining the incident wavelength to be measured, obtaining the electric field intensity value, and calculating the distribution function under the standing wave effect, the original electromagnetic field value can be deduced, thus solving the problem of the standing wave phenomenon affecting the measurement accuracy and improving the accuracy of millimeter wave and submillimeter wave electric field measurements.
Patent Information
- Application Number
- CN202210495387.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-05-07
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2042-05-07
AI Technical Summary
In traditional millimeter-wave and submillimeter-wave electric field measurement methods, the standing wave phenomenon generated by electromagnetic waves irradiating the wall affects the measurement accuracy and leads to large measurement errors.
By determining the wavelength of the incident wave to be measured, the electric field intensity value of the probe under test is obtained when it moves one wavelength along the incident direction. The electric field intensity distribution function under the standing wave effect is calculated, and the electric field intensity value is fitted to the distribution function to deduce the original value of the electromagnetic field when there is no standing wave effect.
It reduces interference from standing wave phenomena and improves the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
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Figure CN114878923B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of measurement technology, and in particular to a method, apparatus and system for measuring millimeter-wave and submillimeter-wave electric fields. Background Technology
[0002] Millimeter waves refer to electromagnetic waves with wavelengths on the order of millimeters, corresponding to frequencies ranging from tens of GHz to hundreds of GHz. Among them, electromagnetic waves with wavelengths of 10–1 mm are called millimeter waves; those with wavelengths of 1–0.1 mm are called submillimeter waves. The development of millimeter-wave field strength measurement instruments and equipment has been relatively slow due to technical difficulties, resulting in a relative lag in research on this technology. Precise measurement of electromagnetic field strength and polarization direction has significant research implications in communications, remote sensing, aerospace, and radar detection. Traditional measurements typically use dipole antennas as receiving instruments. However, before measurement, the dipole antenna probe needs to be calibrated in a standard electric field. The measurement of the standard electric field requires a calibrated probe, therefore, such calibration lacks an absolutely fixed standard, introducing significant calibration errors. It is generally believed that the minimum measurement value of the traditional electric dipole probe method is approximately 1 mV / cm, with measurement uncertainty ranging from 4% to 20% depending on the measured frequency. In modern technology, optical methods have reduced the minimum measurement value to 30 μV / cm, achieving a sensitivity of 1 mV·cm⁻¹Hz⁻¹ / ².
[0003] Currently, one method for detecting electromagnetic wave signals utilizes a quantum measurement system composed of Rydberg atoms and a laser system. The main method (using cesium atoms as an example) involves irradiating a cesium atom probe with a pump light of 509 nm and a probe laser of 852 nm to induce an EIT (Electromagnetically induced transparency) process. When microwaves of a suitable frequency irradiate the bubble, the absorption peaks of the EIT process split, and the amplitude of the microwave electric field intensity can be accurately analyzed from the split width. Cesium atom bubbles are typically made of quartz glass and filled with cesium atom vapor after vacuuming. Due to manufacturing limitations, the diameter of current cesium atom bubbles is usually around 1 cm. For this size of bubble, the standing wave effect formed by electromagnetic waves within the bubble can be ignored when measuring microwave fields below 10 GHz. However, when the wavelength of electromagnetic waves is in the range of 10 GHz to 500 GHz, the wavelength decreases, and the standing wave phenomenon generated by the electromagnetic waves irradiating the walls interferes with the optical field of the probe light being measured, affecting the accuracy of the electric field measurement. Summary of the Invention
[0004] Therefore, it is necessary to address the drawback that the standing wave phenomenon generated by electromagnetic waves irradiating the wall can interfere with the optical field of the probe light being measured at the end, thus affecting the accuracy of the electric field measurement. This paper proposes a method, device, and system for measuring electric fields in millimeter waves and submillimeter waves.
[0005] A method for measuring millimeter-wave and submillimeter-wave electric fields includes the following steps:
[0006] Determine the wavelength of the incident wave to be measured;
[0007] The electric field strength value of the probe under test is obtained when it moves along the incident direction of the incident wave to be tested by one wavelength.
[0008] Calculate the electric field intensity distribution function within the probe under test under standing wave effect;
[0009] The electric field intensity value is fitted to the electric field intensity distribution function to obtain the fitting result;
[0010] Based on the fitting results, the original value of the electromagnetic field when there is no standing wave effect is deduced and used as the measurement result.
[0011] The aforementioned method for measuring millimeter-wave and submillimeter-wave electric fields involves determining the wavelength of the incident wave, acquiring the electric field intensity value when the probe moves one wavelength along the incident direction of the wave, calculating the electric field intensity distribution function within the probe under standing wave effects, fitting the electric field intensity value to the distribution function, obtaining the fitting result, and finally retrieving the original value of the electromagnetic field without standing wave effects from the fitting result as the measurement result. Based on this, retrieving the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function can reduce interference caused by standing wave phenomena and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0012] In one embodiment, the process of obtaining the electric field intensity value of the probe under test at a distance of one wavelength when the probe moves along the electromagnetic wave incident direction includes the following steps:
[0013] Multiple electric field strength values are obtained by repeatedly controlling the probe under test to move in the direction of electromagnetic wave incident.
[0014] In one embodiment, the process of calculating the electric field intensity distribution function within the probe under test with standing wave effect includes the following steps:
[0015] The electric field intensity distribution function within the probe under test with standing wave effect was calculated using the electromagnetic field time-domain difference method.
[0016] In one embodiment, the process of fitting the electric field intensity value to the electric field intensity distribution function to obtain the fitting result includes the following steps:
[0017] The location of the maximum standing wave amplitude is determined by the electric field strength value and the radial coordinate of the probe under test.
[0018] The amplitude of the electric field strength to be measured is determined by performing a proportional conversion at the maximum standing wave amplitude.
[0019] The amplitude coefficient of the electric field intensity distribution function is determined based on the amplitude of the electric field intensity to be measured.
[0020] In one embodiment, the process of retrieving the original value of the electromagnetic field when there is no standing wave effect from the fitting result, as the measurement result, includes the following steps:
[0021] Based on the amplitude coefficient, the original electric field strength value is deduced and used as the measurement result.
[0022] In one embodiment, the probe under test is a Rydberg probe.
[0023] A millimeter-wave and submillimeter-wave electric field measurement device, comprising:
[0024] The wavelength determination module is used to determine the wavelength of the incident wave to be measured.
[0025] An intensity sampling module is used to acquire the electric field intensity value of the probe under test when the incident direction of the incident wave under test is moved by one wavelength.
[0026] The function calculation module is used to calculate the electric field intensity distribution function within the probe under test under standing wave effect.
[0027] The function fitting module is used to fit the electric field intensity value to the electric field intensity distribution function to obtain the fitting result;
[0028] The result calculation module is used to deduce the original value of the electromagnetic field when there is no standing wave effect based on the fitting result, and use it as the measurement result.
[0029] The aforementioned millimeter-wave and submillimeter-wave electric field measurement device, after determining the wavelength of the incident wave, acquires the electric field intensity value of the probe under test moving one wavelength along the incident direction of the incident wave. It then calculates the electric field intensity distribution function within the probe under the standing wave effect, fits the electric field intensity value to the electric field intensity distribution function, obtains the fitting result, and finally deduces the original value of the electromagnetic field without the standing wave effect based on the fitting result, using this as the measurement result. Based on this, deduces the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function, which can reduce interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0030] A computer storage medium storing computer instructions, which, when executed by a processor, implement the millimeter-wave and submillimeter-wave electric field measurement methods of any of the above embodiments.
[0031] The aforementioned computer storage medium, after determining the wavelength of the incident wave to be measured, acquires the electric field intensity value of the probe under test moving one wavelength along the incident direction of the incident wave, and calculates the electric field intensity distribution function within the probe under test with the standing wave effect. The electric field intensity value is then fitted to the electric field intensity distribution function to obtain the fitting result. Finally, the original value of the electromagnetic field without the standing wave effect is deduced from the fitting result, serving as the measurement result. Based on this, deducing the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function can reduce interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0032] A computer device includes a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the program, it implements the millimeter-wave and submillimeter-wave electric field measurement method of any of the above embodiments.
[0033] The aforementioned computer equipment, after determining the wavelength of the incident wave to be measured, acquires the electric field intensity value of the probe under test moving one wavelength along the incident direction of the incident wave, and calculates the electric field intensity distribution function within the probe under test with the standing wave effect. The electric field intensity value is then fitted to the electric field intensity distribution function to obtain the fitting result. Finally, the original value of the electromagnetic field without the standing wave effect is deduced from the fitting result, serving as the measurement result. Based on this, deducing the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function can reduce interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0034] A millimeter-wave and terahertz wave electric field measurement system includes a precision displacement stage and a data processing module;
[0035] Among them, the precision displacement stage is used to move the probe under test by one wavelength along the incident direction of the incident wave under test.
[0036] The data processing module is used to execute the millimeter-wave and submillimeter-wave electric field measurement methods of any of the above embodiments.
[0037] The aforementioned millimeter-wave and terahertz-wave electric field measurement system uses a precision displacement stage to move the probe under test by one wavelength along the incident direction of the incident wave. The data processing module then executes the millimeter-wave and submillimeter-wave electric field measurement methods. Based on this, the original value of the electromagnetic field can be derived from the fitting result of the electric field intensity distribution function, which can reduce the interference caused by standing wave phenomena and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements. Attached Figure Description
[0038] Figure 1 A flowchart of a method for measuring millimeter-wave and submillimeter-wave electric fields according to one embodiment;
[0039] Figure 2Flowchart of a millimeter-wave and submillimeter-wave electric field measurement method according to another embodiment;
[0040] Figure 3 A structural diagram of a millimeter-wave and submillimeter-wave electric field measurement device module according to one embodiment;
[0041] Figure 4 This is a structural diagram of a millimeter-wave and submillimeter-wave electric field measurement system module according to one embodiment. Detailed Implementation
[0042] To better understand the purpose, technical solution, and technical effects of this invention, the invention will be further explained and described below in conjunction with the accompanying drawings and embodiments. It should also be stated that the embodiments described below are only for explaining this invention and are not intended to limit this invention.
[0043] This invention provides a method for measuring millimeter-wave and submillimeter-wave electric fields.
[0044] Figure 1 Here is a flowchart of a millimeter-wave and submillimeter-wave electric field measurement method according to one embodiment, as follows: Figure 1 As shown, one embodiment of the millimeter-wave and submillimeter-wave electric field measurement method includes steps S100 to S104:
[0045] S100, determine the wavelength of the incident wave to be measured;
[0046] S101, obtain the electric field strength value of the probe under test moving along the incident direction of the incident wave under test by one wavelength;
[0047] S102, Calculate the electric field intensity distribution function inside the probe under test with standing wave effect;
[0048] S103, Fit the electric field intensity value to the electric field intensity distribution function to obtain the fitting result;
[0049] S104. Based on the fitting results, the original value of the electromagnetic field when there is no standing wave effect is deduced and used as the measurement result.
[0050] The incident wave to be measured is a millimeter wave or a submillimeter wave. The incident wave propagates along an incident direction, and its wavelength is measured and determined in advance using electromagnetic wave wavelength measurement methods to facilitate the acquisition of wavelength data.
[0051] The probe under test is a probe in a quantum measurement system used to measure electromagnetic wave signals. As a preferred implementation, a Rydberg probe is selected as the probe under test.
[0052] The probe under test is controlled to move along the incident direction of the incident wave by one wavelength, and the electric field strength value is obtained based on the measurement of the probe under test.
[0053] In one embodiment, Figure 2 Here is a flowchart of a millimeter-wave and submillimeter-wave electric field measurement method according to one embodiment, as follows: Figure 2 As shown, step S101, which involves obtaining the electric field intensity value of the probe under test at a distance of one wavelength from the incident electromagnetic wave, includes step S200:
[0054] S200, the probe under test is moved multiple times in the direction of electromagnetic wave incident to obtain multiple electric field strength values.
[0055] As a preferred implementation method, the probe under test is moved in the direction of electromagnetic wave incident more than 10 times to obtain more than 10 electric field intensity values, so as to improve the subsequent fitting effect.
[0056] In one embodiment, Figure 2 As shown, the process of calculating the electric field intensity distribution function within the probe under test with standing wave effect in step S102 includes step S201:
[0057] S201, the electric field intensity distribution function within the probe under test with standing wave effect is calculated using the electromagnetic field time-domain difference method.
[0058] Among them, the electric field intensity distribution function inside the probe can be calculated using FDTD (Finite Difference Time Domain) modesolution software or COMSO software after determining the size of the probe under test, the dielectric boundaries of each region, and the dielectric constant of the dielectric.
[0059] In one embodiment, Figure 2 As shown, the process of fitting the electric field intensity value to the electric field intensity distribution function in step S103 to obtain the fitting result includes steps S202 to S204:
[0060] S202, the location of the maximum standing wave amplitude is determined by the electric field strength value and the radial coordinate of the probe under test;
[0061] S203, perform proportional conversion at the maximum standing wave amplitude to determine the amplitude of the electric field strength to be measured;
[0062] S204, determine the amplitude coefficient of the electric field intensity distribution function based on the amplitude of the electric field intensity to be measured.
[0063] The electric field intensity distribution function within the probe under test is obtained by calculation (referring to the electromagnetic wave intensity along the diameter of the cross-section of the probe under test, along the propagation direction of the incident wave). The electric field intensity distribution function is a sine, cosine, or a combination of their Fourier series.
[0064] Taking the unknown sinusoidal distribution of electric field intensity as an example, if the calculated standing wave amplitude distribution function is E = E0sinr, where E0 is the location of the maximum standing wave amplitude, it is usually proportional to the amplitude E of the electric field intensity to be measured. i The scaling factor is related to factors such as frequency and probe physical dimensions. Since r is the radial coordinate, E0 is obtained by performing a sine function simulation using the measurement data, and then E is calculated using the scaling factor. i .
[0065] Based on the electric field strength value matching the above function form, the amplitude coefficient of the above function can be determined.
[0066] In one embodiment, Figure 2 As shown, step S104, which involves retrieving the original value of the electromagnetic field when there is no standing wave effect based on the fitting result, and using this as the measurement result, includes the following steps:
[0067] S205, based on the amplitude coefficient, the original electric field strength value is deduced and used as the measurement result.
[0068] The amplitude coefficient corresponds one-to-one with and is directly proportional to the amplitude value of the actual microwave field strength. After determining the amplitude coefficient, the actual field strength value, i.e., the original electric field strength value, is derived by working backward from the empirical proportional relationship.
[0069] The millimeter-wave and submillimeter-wave electric field measurement method of any of the above embodiments, after determining the wavelength of the incident wave to be measured, obtains the electric field intensity value when the probe to be measured moves one wavelength along the incident direction of the incident wave, calculates the electric field intensity distribution function within the probe to be measured under the standing wave effect, fits the electric field intensity value to the electric field intensity distribution function to obtain the fitting result, and finally deduces the original value of the electromagnetic field when there is no standing wave effect based on the fitting result, as the measurement result. Based on this, the original value of the electromagnetic field can be deduced from the fitting result of the electric field intensity distribution function, which can reduce the interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurement.
[0070] This invention also provides a millimeter-wave and submillimeter-wave electric field measurement device.
[0071] Figure 3 Figure 43 shows a structural diagram of a millimeter-wave and submillimeter-wave electric field measurement device module according to one embodiment. The millimeter-wave and submillimeter-wave electric field measurement device according to one embodiment includes module 100, module 101, module 102, module 103, and module 104.
[0072] Wavelength determination module 100 is used to determine the wavelength of the incident wave to be measured;
[0073] The intensity sampling module 101 is used to acquire the electric field intensity value of the probe under test when the incident direction of the incident wave under test is moved by one wavelength.
[0074] The function calculation module 102 is used to calculate the electric field intensity distribution function in the probe under test under the standing wave effect;
[0075] The function fitting module 103 is used to fit the electric field intensity value to the electric field intensity distribution function to obtain the fitting result;
[0076] The result calculation module 104 is used to deduce the original value of the electromagnetic field when there is no standing wave effect based on the fitting result, and use it as the measurement result.
[0077] The aforementioned millimeter-wave and submillimeter-wave electric field measurement device, after determining the wavelength of the incident wave, acquires the electric field intensity value of the probe under test moving one wavelength along the incident direction of the incident wave. It then calculates the electric field intensity distribution function within the probe under the standing wave effect, fits the electric field intensity value to the electric field intensity distribution function, obtains the fitting result, and finally deduces the original value of the electromagnetic field without the standing wave effect based on the fitting result, using this as the measurement result. Based on this, deduces the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function, which can reduce interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0078] This invention also provides a computer storage medium storing computer instructions that, when executed by a processor, implement the millimeter-wave and submillimeter-wave electric field measurement methods of any of the above embodiments.
[0079] Those skilled in the art will understand that all or part of the steps of the above method embodiments can be implemented by hardware related to program instructions. The aforementioned program can be stored in a computer-readable storage medium. When the program is executed, it performs the steps of the above method embodiments. The aforementioned storage medium includes various media capable of storing program code, such as mobile storage devices, random access memory (RAM), read-only memory (ROM), magnetic disks, or optical disks.
[0080] Alternatively, if the integrated units of this invention are implemented as software functional modules and sold or used as independent products, they can also be stored in a computer-readable storage medium. Based on this understanding, the technical solutions of the embodiments of this invention, or the parts that contribute to related technologies, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, terminal, or network device, etc.) to execute all or part of the methods of the various embodiments of this invention. The aforementioned storage medium includes various media capable of storing program code, such as mobile storage devices, RAM, ROM, magnetic disks, or optical disks.
[0081] Corresponding to the computer storage medium described above, one embodiment also provides a computer device, which includes a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor executes the program to implement any of the millimeter-wave and submillimeter-wave electric field measurement methods described in the above embodiments.
[0082] The aforementioned computer equipment, after determining the wavelength of the incident wave to be measured, acquires the electric field intensity value of the probe under test moving one wavelength along the incident direction of the incident wave, and calculates the electric field intensity distribution function within the probe under test with the standing wave effect. The electric field intensity value is then fitted to the electric field intensity distribution function to obtain the fitting result. Finally, the original value of the electromagnetic field without the standing wave effect is deduced from the fitting result, which is used as the measurement result. Based on this, deducing the original value of the electromagnetic field from the fitting result of the electric field intensity distribution function can reduce interference caused by the standing wave phenomenon and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0083] This invention also provides a millimeter-wave and terahertz wave electric field measurement system.
[0084] Figure 4 This is a structural diagram of a millimeter-wave and submillimeter-wave electric field measurement system module according to one embodiment, as shown below. Figure 4 As shown, a millimeter-wave and submillimeter-wave electric field measurement system according to one embodiment includes a precision displacement stage 1000 and a data processing module 1001.
[0085] Among them, the precision displacement stage 1000 is used to move the probe under test by one wavelength along the incident direction of the incident wave under test.
[0086] The data processing module 1001 is used to execute the millimeter-wave and submillimeter-wave electric field measurement method of any of the above embodiments.
[0087] The aforementioned millimeter-wave and terahertz-wave electric field measurement system uses a precision displacement stage to move the probe under test by one wavelength along the incident direction of the incident wave. The data processing module then executes the millimeter-wave and submillimeter-wave electric field measurement methods. Based on this, the original value of the electromagnetic field can be derived from the fitting result of the electric field intensity distribution function, which can reduce the interference caused by standing wave phenomena and improve the accuracy of millimeter-wave and submillimeter-wave electric field measurements.
[0088] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0089] The above embodiments merely illustrate several implementation methods of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.
Claims
1. A method for measuring millimeter-wave and submillimeter-wave electric fields, characterized in that, Including the following steps: Determine the wavelength of the incident wave to be measured; The electric field strength value of the probe under test is obtained when it moves along the incident direction of the incident wave to be tested by one wavelength. Calculate the electric field intensity distribution function within the probe under test under standing wave effect; The electric field intensity value is fitted to the electric field intensity distribution function to obtain the fitting result; Based on the fitting results, the original value of the electromagnetic field when there is no standing wave effect is deduced and used as the measurement result; The process of calculating the electric field intensity distribution function within the probe under test with standing wave effect includes the following steps: The electric field intensity distribution function within the probe under test with standing wave effect was calculated using the electromagnetic field time-domain difference method. The process of fitting the electric field intensity value to the electric field intensity distribution function to obtain the fitting result includes the following steps: The location of the maximum standing wave amplitude is determined by the electric field strength value and the radial coordinate of the probe under test. The amplitude of the electric field strength to be measured is determined by performing proportional conversion at the maximum standing wave amplitude. The amplitude coefficient of the electric field intensity distribution function is determined based on the amplitude of the electric field intensity to be measured; Based on the amplitude coefficient, the original electric field strength value is deduced and used as the measurement result.
2. The method for measuring millimeter-wave and submillimeter-wave electric fields according to claim 1, characterized in that, The process of obtaining the electric field intensity value of the probe under test when it moves one wavelength along the electromagnetic wave incident direction includes the following steps: Multiple electric field strength values are obtained by repeatedly controlling the probe under test to move in the direction of electromagnetic wave incident.
3. The method for measuring millimeter-wave and submillimeter-wave electric fields according to claim 1 or 2, characterized in that, The probe under test is a Rydberg probe.
4. A millimeter-wave and submillimeter-wave electric field measurement device, characterized in that, include: The wavelength determination module is used to determine the wavelength of the incident wave to be measured. An intensity sampling module is used to acquire the electric field intensity value of the probe under test when the incident direction of the incident wave under test is moved by one wavelength. The function calculation module is used to calculate the electric field intensity distribution function within the probe under test under standing wave effect. The function fitting module is used to fit the electric field intensity value to the electric field intensity distribution function to obtain the fitting result; The result calculation module is used to deduce the original value of the electromagnetic field when there is no standing wave effect based on the fitting result, and use it as the measurement result; The process of calculating the electric field intensity distribution function within the probe under test with standing wave effect includes the following steps: The electric field intensity distribution function within the probe under test with standing wave effect was calculated using the electromagnetic field time-domain difference method. The process of fitting the electric field intensity value to the electric field intensity distribution function to obtain the fitting result includes the following steps: The location of the maximum standing wave amplitude is determined by the electric field strength value and the radial coordinate of the probe under test. The amplitude of the electric field strength to be measured is determined by performing proportional conversion at the maximum standing wave amplitude. The amplitude coefficient of the electric field intensity distribution function is determined based on the amplitude of the electric field intensity to be measured; Based on the amplitude coefficient, the original electric field strength value is deduced and used as the measurement result.
5. A computer storage medium storing computer instructions thereon, characterized in that, When the computer instructions are executed by the processor, they implement the millimeter-wave and submillimeter-wave electric field measurement method as described in any one of claims 1 to 3.
6. A computer device, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that, When the processor executes the program, it implements the millimeter-wave and submillimeter-wave electric field measurement method as described in any one of claims 1 to 3.
7. A millimeter-wave and terahertz-wave electric field measurement system, characterized in that, Includes a precision displacement stage and a data processing module; The precision displacement stage is used to move the probe under test by one wavelength along the incident direction of the incident wave under test. The data processing module is used to execute the millimeter-wave and submillimeter-wave electric field measurement method according to any one of claims 1 to 3.
Citation Information
Patent Citations
Millimeter wave and terahertz wave electric field measurement method, device and system
CN112798875A