Integrated device and method for heat recovery and impurity filtration and cleaning of silicon wafer cleaning machine

Abstract

The present invention discloses an integrated device and method for heat energy recovery and impurity filtering and cleaning of a silicon wafer cleaning machine. Water flowing out of the overflow pipe enters the interior of the second connecting pipe through the first connecting pipe, and the movable filter screen and the fixed filter screen filter impurities in the overflow water. When impurities need to be cleaned, the rotating plate drives all the driving rods to revolve, pushes the driving rail, moves all the racks, and rotates all the gears and the rotating shaft to reel in and stretch each movable filter screen. The mesh size of each movable filter screen becomes larger until they are the same size as the mesh size of the fixed filter screen and overlap, and the meshes do not block each other, thereby flushing the filter screen. The present invention can recover the heat energy of the high-temperature water overflowing from the heating and cleaning tank by arranging a heat exchanger, heat the incoming water by the recovered heat energy, filter the overflow water discharged from the overflow pipe by the impurity filtering and cleaning mechanism, and conveniently clean the impurities filtered on the filter screen by adjusting the size of the filter mesh.

Description

Technical Field

[0001] The present invention belongs to the field of silicon wafers for solar photovoltaic cells, and specifically relates to a cleaning machine for cleaning silicon wafer impurities during the silicon wafer production process, in particular to a heat recovery and impurity filtering device installed on the cleaning machine. Background Art

[0002] Silicon wafers used in solar photovoltaic cells must be rigorously cleaned, as surface contamination from particles and metallic impurities can seriously affect the quality of the cells. The purpose of cleaning is to remove surface contaminants, including both organic and inorganic matter. These impurities can exist in atomic or ionic form, or in the form of thin films or particles. Currently, silicon wafer cleaning methods include physical and chemical cleaning. Both physical and chemical cleaning methods generate heat during the cleaning process, raising the temperature of the wastewater. To enhance the cleaning effect, some physical methods heat the water or increase the ambient temperature of the cleaning machine. Finally, the silicon wafers are rinsed with high-purity deionized water, then heated, dried, or spun to achieve a clean surface.

[0003] Chinese Patent Publication No. 207238646U, entitled "A Silicon Wafer Cleaning Tank," discloses a silicon wafer cleaning tank that connects an inner tank with an outer tank via an overflow port. Heating tubes are evenly distributed across the bottom of the inner tank, and PLC control maintains a constant water temperature within the tank to improve cleaning quality. However, this silicon wafer cleaning tank has the following problems: 1. Excess heat energy in the tank is wasted and cannot be recovered. 2. Cleaned impurities are directly discharged into the wastewater, making them untreatable.

[0004] In order to reduce the power consumption required to heat the cleaning tank to the set temperature, some devices will install a heat exchanger on the cleaning tank to recover the excess heat energy in the overflow water of the cleaning tank. However, a new problem arises: due to the large amount of impurities in the overflow water, it is easy to damage the heat exchanger. Even if the impurities are filtered through the filter, the impurities on the filter are difficult to clean, and the process is increased, resulting in poor results. Summary of the Invention

[0005] 1. Technical issues

[0006] The purpose of the present invention is to solve the problems of heat energy recovery and impurity cleaning difficulty in the existing silicon wafer cleaning process, and propose an integrated heat energy recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine. The present invention also proposes a heat energy recovery and impurity filtering and cleaning method for the device.

[0007] 2. Technical solution

[0008] In order to solve the above problems, the integrated device for heat energy recovery and impurity filtering and cleaning of the silicon wafer cleaning machine described in the present invention adopts the following technical solution: it includes a heat exchanger, a first water inlet pipe connected to an external water source is connected to the inlet of the second water inlet pipe through the heat exchanger, and the outlet of the second water inlet pipe is connected to the inlet of the overflow pipe through the heating cleaning tank of the silicon wafer cleaning machine, and the outlet of the overflow pipe is connected to the inlet of the first connecting pipe, and at least two movable filters and one fixed filter are arranged between the outlet of the first connecting pipe and the inlet of the second connecting pipe. The outlet of the second connecting pipe is connected to the heat exchanger, and the central axes of the first connecting pipe and the second connecting pipe are collinear and the movable filter and the fixed filter are sealed and connected. The fixed filter is fixed and stacked with the movable filter, and all movable filters can slide back and forth in a direction perpendicular to the central axes of the first connecting pipe and the second connecting pipe; a sewage pipe is connected to the pipe wall of the second connecting pipe, and a first sealing valve is arranged on the sewage pipe, and a sealing valve is arranged on the second connecting pipe between the sewage pipe and the heat exchanger. There is a second sealing valve; a rotatable positioning rod is provided directly above and directly below the connection between the first connecting pipe and the second connecting pipe, and at least two rotating shafts are provided above the first connecting pipe and along the axial direction of the first connecting pipe, and the central axes of the rotating shafts and the positioning rods are perpendicular to the central axes of the first connecting pipe and the second connecting pipe in space; each movable filter is first wound around a rotating shaft, and then together bypasses the first positioning rod above and passes between the first connecting pipe and the second connecting pipe, and then together bypasses the second positioning rod 1 below and is fixedly connected to the tension reinforcement; all the rotating shafts are connected to a synchronous filter adjustment component, which can drive each rotating shaft to rotate at different speeds; all the movable filters are made of elastic material, the mesh on the fixed filter is larger than the mesh on all the movable filter screens, the mesh of the movable filter wound on the rotating shaft with the fastest rotation speed is the smallest, and the mesh of the movable filter wound on the rotating shaft with the slowest rotation speed is the largest.

[0009] The synchronous filter adjustment assembly consists of a rotating plate, at least two driving rods, at least two driving rails, at least two gears and at least two racks, each rotating shaft is coaxially fixed with a gear, each gear is meshed with a rack below it, all racks have the same structure and are separated up and down, each rack is fixedly connected to a driving rail at the end near the inlet of the first connecting pipe, along the axial direction of the first connecting pipe, all driving rails are arranged at equal intervals, and the upper and lower heights are flush, all driving rails have waist-shaped tracks, each driving rail is connected to a driving rod in the waist-shaped track, the driving rod can slide up and down along the waist-shaped track, each driving rod is commonly connected to a rotating plate, the rotating plate is long, one end of which is above the rotating shaft and the rotating plate can rotate around its one end, along the length direction of the rotating plate, the rotating plate is fixedly connected to each driving rod at equal intervals; the rack meshed with the gear on the rotating shaft near the outlet of the first connecting pipe is located at the bottom, and the rack meshed with the gear on the rotating shaft near the inlet of the first connecting pipe is located at the top.

[0010] The method for realizing heat recovery and impurity filtering and cleaning by using the integrated device comprises the following steps:

[0011] Step A: The water flowing out of the overflow pipe enters the interior of the second connecting pipe through the first connecting pipe. The movable filter and the fixed filter filter impurities in the overflow water. The meshes of all the movable filters are in the original state and the central axes of the meshes are collinear with the central axes of the meshes of the fixed filters. The rotating plate is in a horizontal state, the driving rod is at the uppermost position of the driving rail, and the tension bar is in an unstressed state.

[0012] Step B: When impurities need to be cleaned, the heating cleaning tank stops heating, the second sealing valve is closed, the first sealing valve is opened, and the rotating plate is rotated. The rotating plate drives all the driving rods to revolve, pushes the driving rail, moves all the racks, and rotates all the gears and rotating shafts to reel in each movable filter screen;

[0013] Step C: Under the tension of the tension bars, each movable filter is stretched, and the mesh of each movable filter becomes larger, until the mesh of each movable filter is the same size as the mesh of the fixed filter and overlaps with it, and the meshes on the fixed filter and the movable filter do not block each other, locking the rotating plate.

[0014] Step D: The water entering from the first water inlet pipe passes through the second water inlet pipe, the heating cleaning tank with stopped heating, and the overflow pipe to rinse the filter screen, and the impurities flushed out are discharged through the sewage pipe.

[0015] Furthermore, after the flushing is completed, the rotating plate is unfastened and rotated in the opposite direction to reset it, the tension reinforcement drives the movable filter to reset, the first sealing valve is closed and the second sealing valve is opened, and the heating of the heating cleaning tank is started.

[0016] Furthermore, the filtered water enters the heat exchanger and is discharged through the outlet pipe after releasing heat energy; the water entering the heat exchanger from the first water inlet pipe is heated by the heat energy inside the heat exchanger, and the heated water enters the heating and cleaning tank through the second water inlet pipe.

[0017] 3. Technical Effect

[0018] Compared with the prior art, the advantages of the present invention are:

[0019] (1) The present invention can recover the heat energy in the high-temperature water overflowing from the heating and cleaning tank by providing a heat exchanger, and heat the water entering the first water inlet pipe by using the recovered heat energy, thereby reducing the power consumption required to heat the heating and cleaning tank to a set temperature.

[0020] (2) The present invention filters the overflow water discharged from the overflow pipe by setting an impurity filtering and cleaning mechanism, thereby filtering out impurities in the overflow water, which can effectively reduce the damage rate of the heat exchanger caused by impurities entering the interior of the heat exchanger.

[0021] (3) The present invention can more conveniently clean the impurities filtered on the filter screen after use by adjusting the size of the filter mesh, thereby reducing the difficulty of cleaning the impurities on the filter screen. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments:

[0023] Figure 1 This is a schematic diagram of the working state of the integrated device for heat recovery and impurity filtration and cleaning of the silicon wafer cleaning machine of the present invention;

[0024] Figure 2 for Figure 1 An enlarged structural diagram of the impurity filtering and cleaning mechanism;

[0025] Figure 3 for Figure 2 The main cross-sectional view of

[0026] Figure 4 for Figure 2 A magnified rear isometric view of the impurity filter cleaning process;

[0027] Figure 5 for Figure 3 An enlarged left view of the overlapping portion of the fixed filter 12 and the movable filter 13 in the initial state;

[0028] Figure 6 for Figure 5 FIG. 1 is a diagram showing the state of the active filter 13 after stretching.

[0029] Description of the numbers in the figure:

[0030] 1. Heating and cleaning tank; 2. Heat exchanger; 3. First water inlet pipe; 4. Second water inlet pipe; 5. Overflow pipe; 6. Water outlet pipe; 7. Shell; 8. First connecting pipe; 9. Second connecting pipe; 10. Drain pipe; 11. Sealing valve; 12. Fixed filter; 13. Movable filter; 14. Positioning rotating rod; 15. Rotating shaft; 16. Gear; 17. Rack; 18. Drive rail; 19. Rotating plate; 20. Driving rod; 21. Insert rod; 22. Return spring; 23. Sector plate; 24. Positioning socket; 25. Sealing ring; 26. Tension bar. DETAILED DESCRIPTION

[0031] See also Figure 1 As shown, the silicon wafer cleaning machine uses a heated cleaning tank 1 to clean silicon wafers. The integrated device described in the present invention has a heat exchanger 2, which is located next to the heated cleaning tank 1. The heated cleaning tank 1 is connected to the heat exchanger 2 via an overflow pipe 5. The heat exchanger 2 is provided with two inlets and two outlets. The first inlet is connected to the overflow pipe 5, and the second inlet is connected to an external water source via a first water inlet pipe 3. The first outlet is connected to the heated cleaning tank via a second water inlet pipe 4, and the second outlet is connected to a water outlet pipe 6. Inside the heat exchanger 2, the first water inlet pipe 3 is connected to the second water inlet pipe 4 through the heat exchanger 2, and the overflow pipe 5 is connected to the water outlet pipe 6 through the heat exchanger 2.

[0032] In order to improve the cleaning efficiency of silicon wafers, multiple parallel heating cleaning tanks 1 are used. The multiple parallel heating cleaning tanks 1 are connected to each other through an overflow pipe 5. The overflow pipe 5 connects the multiple heating cleaning tanks 1, and the heat exchanger 2 is connected to each heating cleaning tank 1 or one of the heating cleaning tanks 1 through the second water inlet pipe 4.

[0033] When the heated cleaning tank 1 is operating to clean the silicon wafers, the heated high-temperature liquid enters the inlet of the overflow pipe 5, enters the interior of the heat exchanger 2 through the outlet of the overflow pipe 5, releases heat energy inside the heat exchanger 2, and is discharged through the outlet pipe 6. At the same time, low-temperature pure water enters the heat exchanger 2 through the outlet of the first water inlet pipe 3, absorbs heat energy inside the heat exchanger 2, and is sent to the interior of the heated cleaning tank 1 through the second water inlet pipe 4. Therefore, by recovering the heat energy in the high-temperature water overflowing from the heated cleaning tank 1 and using the recovered heat energy to heat the pure water entering the first water inlet pipe 3, the power consumption required to heat the heated cleaning tank 1 to the set temperature can be reduced.

[0034] A filtering and cleaning mechanism is provided between the heat exchanger 2 and the overflow pipe 5. The overflow pipe 5 is connected to the heat exchanger 2 via the filtering and cleaning mechanism, and is used to filter the overflow water discharged from the overflow pipe 5, and filter out impurities in the overflow water before it enters the heat exchanger 2, so as to prevent impurities from entering the heat exchanger 2 and causing damage to the heat exchanger 2.

[0035] See also Figure 2 and Figure 3 As shown, the filtering and cleaning mechanism includes a stationary housing 7, which is fixedly connected to the outer shell of the heat exchanger 2 or the housing of the silicon wafer cleaning machine. Housing 7 is provided with a first connecting pipe 8 and a second connecting pipe 9, arranged horizontally, with their central axes collinear. Externally, the inlet of the first connecting pipe 8 is connected to the outlet of the overflow pipe 5, while the outlet of the second connecting pipe 9 is connected to the inlet of the heat exchanger 2. Internally, between the outlet of the first connecting pipe 8 and the inlet of the second connecting pipe 9, a fixed filter 12 and a movable filter 13 are stacked together. The fixed filter 12 is on the side of the second connecting pipe 9, while the movable filter 13 is on the side of the first connecting pipe 8. The first connecting pipe 8 and the second connecting pipe 9 are respectively abutted against the movable filter 13 and the fixed filter 12. The fixed filter 12 is stationary and fixedly connected to the inner wall of the housing 7, perpendicular to the first connecting pipe 8 and the second connecting pipe 9. The mesh size of the fixed filter 12 is fixed and cannot be changed. The movable filter 13 is slidably connected between the first connecting tube 8 and the second connecting tube 9, and can slide up and down in a direction perpendicular to the central axis of the first connecting tube 8 and the second connecting tube 9. There are at least two movable filters 13, and all movable filters 13 are made of elastic material. When the movable filter 13 is stretched by force, its mesh will become larger.

[0036] In order to ensure the sealing between the first connecting pipe 8 and the second connecting pipe 9 and the fixed filter screen 12 and the movable filter screen 13, two sealing rings 25 are installed between the outlet of the first connecting pipe 8 and the inlet of the second connecting pipe 9. One sealing ring 25 is connected to the first connecting pipe 8, and the other sealing ring 25 is connected to the second connecting pipe 9. The two sealing rings 25 are transitionally matched with the movable filter screen 13 and the fixed filter screen 12 respectively. The sealing rings 25 can effectively seal the connection between the fixed filter screen 12 and the movable filter screen 13, and seal the gap between the first connecting pipe 8 and the movable filter screen 13 and between the second connecting pipe 9 and the fixed filter screen 12.

[0037] Outside the housing 7, the wall of the second connecting pipe 9 is connected to a drain pipe 10. A first sealing valve 11 is provided on the drain pipe 10 to control the discharge of sewage in the second connecting pipe 9 from the drain pipe 10. A second sealing valve 11 is provided on the second connecting pipe 9 between the drain pipe 10 and the heat exchanger 2 to control the flow of filtered water in the second connecting pipe 9 into the heat exchanger 2.

[0038] Inside the housing 7, a positioning rod 12 is located directly above and below the connection between the first and second connecting tubes 8, 9. The two positioning rods 12 have identical structures and are symmetrically arranged vertically relative to the central axes of the first and second connecting tubes 8, 9. The central axes of the two positioning rods 12 are perpendicular to the central axes of the first and second connecting tubes 8, 9 in space. One end of each positioning rod 12 is connected to the inner wall of the housing 7 via a bearing, allowing for rotation. Next to the first positioning rod 12, above the first connecting tube 8, and along the axis of the first connecting tube 8, at least two rotation shafts 15 are located. All rotation shafts 15 have identical structures and heights, are horizontally arranged, and are evenly spaced along the central axis of the first connecting tube 8. The central axes of all rotation shafts 15 are parallel to the central axes of the positioning rods 12, and the highest points of all rotation shafts 15 are flush with the highest points of the positioning rods 12.

[0039] The number of rotating shafts 15 is the same as the number of movable filters 13. One movable filter 13 is wound around a corresponding rotating shaft 15. Each movable filter 13 is first wound around a corresponding rotating shaft 15, then wound together around the first positioning rotating rod 12 above, then vertically downward through the connection between the first connecting tube 8 and the second connecting tube 9, wound around the second positioning rotating rod 12 below, and finally fixedly connected to a horizontal tension bar 26, which is in turn fixedly connected to the inner wall of the shell 7. The tension bar 26 is rectangular. One tension bar 26 can be used to fix and adhere all movable filters 13 to one tension bar 26; alternatively, at least two tension bars 26 can be used to fix and adhere one movable filter 13 to one tension bar 26, and all tension bars 26 are fixedly connected to the inner wall of the shell 7. In this way, the movable filter 13 is wound as a whole into a non-closed U-shape, with the opening of the U facing the inlet of the first connecting tube 8. The tension rib 26 is located on the lower side of the housing 7 and below the first connecting pipe 8 . It is made of a highly elastic material and has an elastic force much greater than that of the movable filter 13 , thereby enabling the movable filter 13 to rebound.

[0040] See also Figure 4 As shown, Figure 3 Each rotating shaft 15 passes through a corresponding through-hole in the housing 7 and extends outside the housing 7. Outside the housing 7, all rotating shafts 15 are connected to a synchronized filter adjustment assembly. This synchronized filter adjustment assembly drives all rotating shafts 15 to rotate synchronously, each at a different speed.

[0041] The synchronized filter adjustment assembly comprises a rotating plate 19, at least two drive rods 20, at least two drive rails 18, at least two gears 16, and at least two racks 17. The number of drive rods 20, drive rails 18, gears 16, and racks 17 is the same as the number of movable filters 13. Outside the housing 7, a gear 16 is coaxially fixed to each rotating shaft 15. Each gear 16 meshes with a horizontally arranged rack 17. All racks 17 have the same structure, are arranged horizontally, and are separated into vertical sections. The rack 17 meshing with the gear 16 on the rotating shaft 15 near the outlet of the first connecting pipe 8 is located at the bottom, while the rack 17 meshing with the gear 16 on the rotating shaft 15 near the inlet of the first connecting pipe 8 is located at the top. In other words, the racks 17 are arranged sequentially from top to bottom, from the inlet to the outlet of the first connecting pipe 8, without contact or interference. All racks 17 have the same horizontal length. In order to provide support and make the rack 17 more reliable when moving, a horizontal slide groove is provided on the inner wall of the housing 7, and a slide corresponding to the slide groove is provided on the side wall of the rack 17. When the rack 17 moves, it moves along the slide groove on the housing 7.

[0042] Each rack 17 is fixedly connected to a drive rail 18 at its end near the inlet of the first connecting pipe 8. All drive rails 18 are arranged at equal intervals along the direction from the inlet to the outlet of the first connecting pipe 8 and are flush with each other. The racks 17 are connected to the side walls of the drive rails 18.

[0043] All drive rails 18 are arranged vertically, each with a waist-shaped structure, featuring a closed waist-shaped track in the middle. The length of each waist-shaped track of the drive rails 18 is oriented vertically. Each waist-shaped track of the drive rails 18 is connected to a drive rod 20. The drive rods 20 are arranged horizontally, with their central axes aligned and parallel to the central axes of the rotating shaft 15. The outer diameter of the drive rods 20 matches the inner diameter of the waist-shaped track, allowing them to slide up and down along the waist-shaped track. Each drive rod 20 is slidably connected to a corresponding drive rail 18 at its end near the housing 7, and each drive rod 20 is connected to a rotating plate 19 at its end away from the housing 7. The rotating plate 19 is elongated, with one rotating end and the other free end. The rotating end of the rotating plate 19 is rotatably connected to the housing 7 via a bearing, serving as the rotation center of the rotating plate 19. The rotation center of the rotating plate 19 is above the rotating shaft 15, and the rotating plate 19 rotates in a vertical plane. Along the length of the turntable 19, the turntable 19 is fixedly connected to each drive rod 20 at equal intervals. Thus, when the turntable 19 rotates, the radius between each drive rod 20 and the turntable 19's rotation center is different. The radius between the drive rod 20 closest to the inlet of the first connecting pipe 8 and the turntable 19's rotation center is the largest, and vice versa. That is, the radius between the drive rod 20 and the turntable 19's rotation center decreases in the direction from the inlet to the outlet of the first connecting pipe 8. The turntable 19's rotation center is aligned with the center of the upper end of the drive rail 18. When all the drive rods 20 are at the uppermost end of the drive rail 18, the turntable 19 is in a horizontal position, which is also the initial state of the synchronous filter adjustment assembly.

[0044] The other free end of the rotating plate 19 is fixedly connected to the self-locking assembly, which can fix the rotation angle of the rotating plate 19 and lock the rotating plate 19 so that it does not rotate. When the rotating plate 19 rotates, the other free end thereof rotates downward from the highest position.

[0045] The synchronous filter adjustment assembly functions to synchronously rotate multiple movable filters 13, achieving different rotational speeds. To operate the synchronous filter adjustment assembly, connect the rotating plate 19 to the manual wrench and manually rotate the rotating plate 19. This rotation drives all the drive rods 20 in orbit, with the center of revolution being the rotation center of the rotating plate 19. As the drive rods 20 revolve, they push each slidably connected drive rail 18, thereby driving each rack 17 to move horizontally. This rack 17 moves toward the outlet of the first connecting pipe 8. This horizontal movement of the rack 17 rotates the meshing gear 16, which in turn drives all the rotating shafts 15 to rotate. Because each driving rod 20 is spaced at a different distance from the rotation center of the rotating plate 19, the distance it pushes the rack 17 is also different. The farther the driving rod 20 is from the rotation center of the rotating plate 19, the greater the distance it pushes the rack 17. Specifically, the driving rod 20 closest to the inlet of the first connecting pipe 8 pushes the rack 17 the greatest distance, meaning the topmost rack 17 moves the longest distance horizontally. Along the central axis of the first connecting pipe 8, the distance pushed by the driving rod 20 on the rack 17 gradually decreases, with the bottommost rack 17 moving the shortest distance horizontally. The horizontal distances of the racks 17 decrease from top to bottom. Thus, the racks 17 drive the corresponding gears 16 to rotate, causing each gear 16 and the rotating shaft 15 to rotate at different speeds. The rotation speed of the rotating shaft 15 decreases from the inlet to the outlet of the first connecting pipe 8. Accordingly, when the driven active filter 13 rotates, the active filter 13 wound around different rotating shafts 15 rotates at different speeds. When the rotating shaft 15 rotates, the movable filter screen 13 is wound up at different speeds, and the movable filter screen 13 is stretched upward.

[0046] like Figure 5 and Figure 6 As shown, an adjustable combined filter screen is formed by a fixed filter screen 12 and a movable filter screen 13. The mesh size of the fixed filter screen 12 is larger than the mesh size of all the movable filter screens 13. The mesh size of each movable filter screen 13 is different. The mesh size of the movable filter screen 13 wound around the rotating shaft 15 with the fastest rotation speed is the smallest, and the mesh size of the movable filter screen 13 wound around the rotating shaft 15 with the slowest rotation speed is the largest. In the initial state, during normal use, the movable filter screen 13 is in an unstretched state, and the mesh size of all the movable filter screens 13 and the mesh size of the fixed filter screen 12 are staggered, effectively reducing the mesh size of the combined filter screen, as shown in FIG. Figure 5 In the structure shown, the mesh of the combined filter is the smallest at this time, and the filtering effect is the best. When it is necessary to flush the impurities on the filter, each movable filter 13 is stretched by the synchronous filter adjustment component to increase the mesh of each movable filter 13, and finally increase it to the same mesh as the fixed filter 12, as shown in FIG. Figure 6In the state shown, the movable filter 13 no longer blocks the mesh of the fixed filter 12, allowing the mesh size to return to its normal size, i.e., the mesh size of the fixed filter 12. Impurities on the filter can now be flushed. After flushing is complete, the synchronized filter adjustment assembly is released, and all movable filters 13 are reset under the elastic force of the tension bar 26.

[0047] The device of the present invention can match the rotation angle of the rotating shaft 15 with the mesh size of the movable filter 13 after stretching and the mesh size of the fixed filter 12 by selecting a movable filter 13 with an appropriate mesh size. The mesh size of the fixed filter 12 is preferably diamond-shaped; the mesh size of the movable filter 13 is preferably square, which becomes diamond-shaped after stretching.

[0048] See also Figure 4 The other free end of the rotating plate 19 is connected to a self-locking assembly, which is used to lock the position of the rotating plate 19 after the rotating plate 19 completes its rotation. The adjustable self-locking assembly includes a rod 21 and a fan-shaped plate 23. The fan-shaped plate 23 is fixedly connected to the housing 7. The fan-shaped plate 23 is parallel to the rotating plate 19, and the plate surface of the fan-shaped plate 23 faces the other free end of the rotating plate 19. A plurality of positioning holes 24 are formed along the circumference of the fan-shaped plate 23, and the positioning holes 24 are adapted to fit the rod 21. The rod 21 is perpendicular to the fan-shaped plate 23. One end of the rod 21 can be inserted into the positioning hole 24, and the other end of the rod 21 is fixedly connected to the free end of the rotating plate 19. A return spring 22 is connected to the outer surface of the rod 21. The return spring 22 can drive the rod 21 to move toward the fan-shaped plate 23, so that the rod 21 is inserted into the positioning hole 24. When the rotating plate 19 rotates, the insertion rod 21 is pulled out of the positioning socket 24. At the same time, the return spring 22 is compressed. The rotating plate 19 is then rotated to adjust the rotation angle of the rotating plate 19. After the adjustment is completed, the insertion rod 21 is inserted into the corresponding positioning socket 24 to fix it. The elasticity of the return spring 22 itself reinforces the insertion rod 21. Therefore, by adjusting the rotation angle of the rotating plate 19, the rotation angle of the rotating shaft 15 is also adjusted, so that the mesh size of the stretched movable filter 13 can be adjusted to be consistent with the mesh size of the fixed filter 12. Through reasonable size design, the impurity filtering and cleaning mechanism of the present invention can be realized.

[0049] When the integrated device described herein is in operation, water entering through the first water inlet pipe 3 enters the heat exchanger 2, where it is heated by the heat energy within the heat exchanger 2. The heated pure water then enters the heating and cleaning tank 1 through the second water inlet pipe 4. As the silicon wafers are cleaned in the heating and cleaning tank 1, the water is heated. The high-temperature water enters the impurity filtering mechanism through the overflow pipe 5, and after being filtered, it enters the interior of the heat exchanger 2. After releasing heat energy within the heat exchanger 2, it is discharged through the outlet pipe 6. In this way, by recovering the heat energy of the high-temperature water overflowing from the heating and cleaning tank 1 and using this recovered heat energy to heat the water entering the first water inlet pipe 3, the power consumption required to heat the heating and cleaning tank 1 to the set temperature can be reduced.

[0050] While heat energy is being recovered, the water flowing out of the overflow pipe 5 enters the impurity filtering and cleaning mechanism. It first enters the interior of the second connecting pipe 9 through the first connecting pipe 8, and then enters the interior of the heat exchanger 2 through the second connecting pipe 9. During the flow, the adjustable filter screen will filter the impurities in the overflow water. During filtering, all movable filter screens 13 are in an unstretched state, the mesh of the movable filter screen 13 is in its original state, and the mesh center axis of all movable filter screens 13 is collinear with the mesh center axis of the fixed filter screen 13. The mesh of the movable filter screen 13 wound around the fastest rotating shaft 15 is the smallest, and the mesh of the movable filter screen 13 wound around the slowest rotating shaft 15 is the largest. In addition, the rotating plate 19 is in a horizontal state, the driving rod 20 is at the top of the driving rail 18, the insertion rod 21 is inserted into a positioning socket 24 at the top, and the tension bar 26 is in an unstressed state.

[0051] When it is necessary to clean the impurities filtered on the filter screen, the heating and cleaning tank 1 stops heating, the sealing valve 11 on the second connecting pipe 9 is closed, that is, the second sealing valve 11 is closed, the channel entering the heat exchanger 2 is closed, and then the sealing valve 11 on the drain pipe 10 is opened, and then the plug rod 21 is pulled out from the inside of the positioning socket 24, and the rotating plate 19 is rotated downward to adjust the angle of the rotating plate 19. The rotation of the rotating plate 19 can drive all the driving rods 20 to revolve. When the driving rods 20 revolve, they will push the corresponding driving rails 18, so that the driving rails 18 drive the racks 17 to move horizontally. When the racks 17 move horizontally, it will drive the gears 16 meshing with them to rotate, so that the gears 16 drive the rotating shaft 15 to rotate together, thereby completing the winding of each movable filter screen 13.

[0052] When each movable filter 13 is reeled in, the tension of the tension bars 26 causes the movable filter 13 to stretch. The mesh of each movable filter 13 is stretched and deformed, becoming the same size as the mesh of the fixed filter 12 and overlapping with it. This prevents the meshes of the fixed filter 12 and the movable filter 13 from obstructing each other, and the mesh reaches its maximum size. At this point, the central axis of the mesh of all movable filters 13 remains collinear with the central axis of the mesh of the fixed filter 13. At this point, the insertion rod 21 is precisely located in one of the positioning holes 24. Inserting the insertion rod 21 into the positioning hole 24 locks the rotating plate 19, thereby preventing the movable filter 13 from stretching any further.

[0053] Water entering from the first water inlet pipe 3 flows sequentially through the second water inlet pipe 4, the deactivated heating and cleaning tank 1, and the overflow pipe 5, flushing impurities from the filter screen. The flushed impurities are then discharged through the drain pipe 10. After flushing is complete, the plug rod 21 is removed, the lock on the rotating plate 19 is unlocked, and the rotating plate 19 is rotated in the opposite direction to reset it. The tensile force generated by the deformation of the tensioning ribs 26 drives the movable filter screen 13 to reset, and the plug rod 21 is also reset. Next, the first sealing valve 11 on the drain pipe 10 is closed, and the second sealing valve 11 on the second connecting pipe 9 is opened, starting the heating and cleaning tank 1.

[0054] The above description is merely a preferred embodiment of the present invention; however, the scope of protection of the present invention is not limited thereto. Any person skilled in the art who, within the technical scope disclosed in the present invention, makes equivalent substitutions or modifications based on the technical solutions and improved concepts of the present invention shall be covered by the scope of protection of the present invention.

Claims

1. A heat recovery and impurity filtering and cleaning integrated device for a silicon wafer cleaning machine, comprising a heat exchanger (2), characterized in that: The first water inlet pipe (3) connected to the external water source is connected to the inlet of the second water inlet pipe (4) through the heat exchanger (2). The outlet of the second water inlet pipe (4) is connected to the inlet of the overflow pipe (5) through the heating cleaning tank (1) of the silicon wafer cleaning machine. The outlet of the overflow pipe (5) is connected to the inlet of the first connecting pipe (8). At least two movable filters (13) and one fixed filter (12) are provided between the outlet of the first connecting pipe (8) and the inlet of the second connecting pipe (9). The outlet of the second connecting pipe (9) is connected to the heat exchanger (2). The first connecting pipe (8) and the second connecting pipe (9) are connected. The central axis of the first connecting pipe (8) and the second connecting pipe (9) are collinear and sealed to connect the movable filter screen (13) and the fixed filter screen (12). The fixed filter screen (12) is fixed and stacked together with the movable filter screen (13). All movable filter screens (13) can slide back and forth in a direction perpendicular to the central axis of the first connecting pipe (8) and the second connecting pipe (9). A sewage pipe (10) is connected to the pipe wall of the second connecting pipe (9). A first sealing valve is provided on the sewage pipe (10). A second sealing valve is provided on the second connecting pipe (9) between the sewage pipe (10) and the heat exchanger (2). A rotatable positioning rod (14) is provided just above and just below the connection of the connecting pipe (9), and at least two rotating shafts (15) are provided above the first connecting pipe (8) and along the axial direction of the first connecting pipe (8). The central axes of the rotating shafts (15) and the positioning rods (14) are vertically orthogonal to the central axes of the first connecting pipe (8) and the second connecting pipe (9) in space; each movable filter (13) is first wound around a rotating shaft (15), then passes through the first positioning rod above, passes between the first connecting pipe (8) and the second connecting pipe (9), and then is wound around the rotating shaft (15). The movable filters (13) are made of elastic material, the mesh of the fixed filter (12) is larger than the mesh of all movable filters (13), the mesh of the movable filter (13) wound around the fastest rotating shaft (15) is the smallest, and the mesh of the movable filter (13) wound around the slowest rotating shaft (15) is the largest.

2. The integrated heat recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine according to claim 1 is characterized by: The synchronous filter adjustment assembly is composed of a rotating plate (19), at least two driving rods (20), at least two driving rails (18), at least two gears (16) and at least two racks (17). Each rotating shaft (15) is coaxially fixed with a gear (16), each gear (16) is meshed with a rack (17) below it, all racks (17) have the same structure and are arranged in upper and lower parts, each rack (17) is fixedly connected to a driving rail (18) at the end near the inlet of the first connecting pipe (8), and all driving rails (18) are arranged at equal intervals along the axial direction of the first connecting pipe (8). All driving rails (18) have waist-shaped tracks. A driving rod (20) is connected to each waist-shaped track of each driving rail (18), and the driving rod (20) can slide up and down along the waist-shaped track. Each driving rod (20) is commonly connected to a rotating plate (19). The rotating plate (19) is long and has one end above the rotating shaft (15). The rotating plate (19) can rotate around one end. Along the length direction of the rotating plate (19), the rotating plate (19) is fixedly connected to each driving rod (20) at equal intervals; the rack (17) meshing with the gear (16) on the rotating shaft (15) near the outlet of the first connecting pipe (8) is located at the bottom, and the rack (17) meshing with the gear (16) on the rotating shaft (15) near the inlet of the first connecting pipe (8) is located at the top.

3. The integrated heat recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine according to claim 1 is characterized by: The other end of the rotating plate (19) is connected to a self-locking component, and when the rotating plate (19) rotates, the self-locking component can lock the rotating plate (19).

4. The integrated heat recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine according to claim 3 is characterized by: The self-locking assembly comprises an insert rod (21) and a fixed sector plate (23), wherein a plurality of positioning holes (24) are provided on the sector plate (23) along the circumferential direction, one end of the insert rod (21) can be inserted into the positioning hole (24), and the other end is fixedly connected to the other end of the rotating plate (19), and a return spring (22) is externally connected to the insert rod (21).

5. The integrated device for heat recovery and impurity filtration and cleaning of a silicon wafer cleaning machine according to claim 1, characterized in that: The tension bar (26) is rectangular, and all the movable filters (13) are fixedly attached to one tension bar (26); or one movable filter (13) is fixedly attached to one tension bar (26).

6. The integrated heat recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine according to claim 1, characterized in that: The two positioning rotating rods (14) have the same structure and are symmetrically distributed up and down relative to the central axis of the first connecting tube (8) and the second connecting tube (9). One end of each positioning rotating rod (14) is connected to the inner wall of the shell (7) through a bearing; all the rotating shafts (15) have the same structure and height and are arranged at equal intervals; the highest points of all the rotating shafts (15) are flush with the highest points of the positioning rotating rods (14).

7. The integrated heat recovery and impurity filtering and cleaning device for a silicon wafer cleaning machine according to claim 1, characterized in that: Two sealing rings (25) are provided between the outlet of the first connecting pipe (8) and the inlet of the second connecting pipe (9), one sealing ring (25) being connected to the first connecting pipe (8) and the other sealing ring (25) being connected to the second connecting pipe (9), and the two sealing rings (25) are respectively sealedly connected to the movable filter screen (13) and the fixed filter screen (12).

8. A method for realizing heat recovery and impurity filtration and cleaning using the integrated device according to claim 2, characterized in that The following steps are involved: Step A: The water flowing out of the overflow pipe (5) enters the interior of the second connecting pipe (9) through the first connecting pipe (8), and the movable filter (13) and the fixed filter (12) filter the impurities in the overflow water. The meshes of all the movable filters (13) are in the original state and the central axes of the meshes are collinear with the central axes of the meshes of the fixed filter (12). The rotating plate (19) is in a horizontal state, the driving rod (20) is at the uppermost position of the driving rail (18), and the tension bar (26) is in an unstressed state. Step B: When impurities need to be cleaned, the heating cleaning tank (1) stops heating, the second sealing valve is closed, the first sealing valve is opened, and the rotating plate (19) is rotated. The rotating plate (19) drives all the driving rods (20) to revolve, pushing the driving rail (18), all the racks (17) to move, all the gears (16) and the rotating shaft (15) to rotate, and each movable filter (13) is wound up; Step C: Under the tension of the tension bar (26), each movable filter (13) is stretched, and the mesh of each movable filter (13) becomes larger until the mesh of each movable filter (13) is the same size as the mesh of the fixed filter (12) and overlaps with each other, and the meshes on the fixed filter (12) and the movable filter (13) do not block each other, and the rotating plate (19) is locked and does not move; Step D: The water entering from the first water inlet pipe (3) passes through the second water inlet pipe (4), the heating and cleaning tank (1), and the overflow pipe (5) to rinse the filter screen, and the impurities flushed out are discharged through the sewage pipe (10).

9. The method for heat recovery and impurity filtering and cleaning according to claim 8, characterized in that: In step D, after the flushing is completed, the rotating plate (19) is unfastened and rotated in the opposite direction to reset it, the tension bar (26) drives the movable filter (13) to reset, the first sealing valve is closed and the second sealing valve is opened, and the heating cleaning tank (1) is started to heat.

10. The method for heat recovery and impurity filtering and cleaning according to claim 8, characterized in that: In step A, the filtered water enters the interior of the heat exchanger (2), releases heat energy, and is discharged through the water outlet pipe (6); the water entering the heat exchanger (2) from the first water inlet pipe (3) is heated by the heat energy inside the heat exchanger (2), and the heated water enters the heating and cleaning tank (1) through the second water inlet pipe (4).

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