A remote plasma source dissociation chamber assembly

Abstract

The application discloses a remote plasma source dissociation cavity assembly and relates to the technical field of plasma source dissociation cavities.The cavity assembly is centrally wrapped with a circular annular tubular chamber, and comprises a metal shell, a magnetic tank structure and a fixing buckle structure.The metal shell is in the shape of a circular annular ring formed by splicing a plurality of arc-shaped shells, and an insulating partition plate is arranged between the gap formed between the two adjacent arc-shaped shells.The magnetic tank structure comprises a holding plate, a scraping plate and a central limiting sleeve.The fixing buckle structure comprises a trapezoidal plate, an upper connecting scraping edge and a lower connecting scraping edge.The application solves the problem of the small arc of the rectangular corner of the remote plasma source cavity and reduces the impact damage of the moving spiral plasma source to the cavity caused by uneven magnetic field distribution.The metal shell structure as a heat dissipation structure is exquisite and has high heat dissipation efficiency, and the fixing buckle structure is used for fixing, so that the metal shell structure is convenient to disassemble and assemble and the labor and time costs are saved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of plasma source dissociation cavities, and particularly relates to a remote plasma source dissociation cavity assembly. BACKGROUND

[0002] In the current field of semiconductor production, a remote plasma source synthesizes plasma outside a reaction zone by using a plasma source, and the plasma is introduced into the reaction zone under the action of airflow, electric field, magnetic field and the like, and is commonly used for surface modification, chamber cleaning, film etching and plasma-assisted deposition, and specifically comprises a remote plasma source dissociation cavity composed of a chamber, a gas inlet, a gas outlet, a magnetic core and an ignition port. The remote plasma source is used for atomic-level cleaning of a process cavity of a general semiconductor device, fluorine-containing compounds are used as raw material gas of fluorine into the chamber, and under the action of an alternating electric field and a magnetic field, the raw material gas is dissociated and releases fluorine radicals, and active ions F- enter a process chamber and react with contaminated materials in the process chamber, such as silicon oxide and silicon nitride, and the generated gaseous new substances are pumped out of the process chamber by a vacuum pump, so as to ensure the cleaning of the process chamber.

[0003] The existing remote plasma source dissociation cavity has the following disadvantages: (1) the structure is complex, the accessories are numerous, and the chamber is not easy to assemble, and the outer surface of the chamber made of hard aluminum material is easily damaged, which greatly reduces the service life of the chamber; (2) the magnetic cores of the chamber outer sleeve are separated, which causes uneven magnetic field distribution, so that the motion arc of the plasma is small, the magnetic field constraint is weak, the plasma is in contact with the inner wall of the chamber too much, the service life of the chamber is reduced, the dust particle pollution of the remote plasma source chamber is reduced, the cleaning ability is reduced, and the yield of chip production is reduced; (3) the chamber adopts a multi-segment splicing structure, which reduces the air tightness of the chamber and cannot guarantee the sterility of the internal clean environment, so the cleaning ability of the chamber to dust particle pollution is reduced, and the rectangular outer shell of the chamber, the corner has a small corner arc, which is not conducive to the movement of the plasma. Therefore, in view of the above problems, it is of great significance to provide a remote plasma source dissociation cavity assembly. SUMMARY

[0004] The application provides a remote plasma source dissociation cavity assembly, which solves the above problems.

[0005] To solve the above technical problems, the application is realized by the following technical scheme:

[0006] The remote plasma source dissociation cavity assembly of the application comprises a chamber wrapped with a circular annular tube, and a gas inlet and a gas outlet are arranged at two ends of the chamber.

[0007] The cavity assembly comprises a metal shell wrapped around the outer circumferential side of the chamber in the form of two halves, two symmetrically arranged magnetic tank structures wrapped around the outside of the metal shell after being attached, and a plurality of fixing buckle structures installed on the outside of the magnetic tank structure for fixing the metal shell and the magnetic tank structure to form an integral whole with the chamber.

[0008] The metal shell adopts a circular ring shape spliced by a plurality of arc-shaped shells, and an insulating partition plate is installed between the gap formed between the two adjacent arc-shaped shells. One side of the metal shell is provided with a containing groove in half containment cooperation with the outer circumferential side of the chamber, and two ends of the containing groove are provided with clamping limiting notches in half containment cooperation with the gas inlet and the gas outlet, respectively.

[0009] The magnetic tank structure comprises a holding plate, a scraping plate arranged around one side of the holding plate for wrapping the metal shell, and a center limiting sleeve arranged at the center position of the holding plate for wrapping the metal shell together with the scraping plate. The other side of the holding plate is provided with a limiting groove matched with the fixing buckle structure, and the scraping plate is provided with a notch groove between the adjacent two limiting grooves.

[0010] The fixing buckle structure comprises a trapezoidal plate, an upper connecting scraping edge arranged on the upper bottom edge of the trapezoidal plate, and a lower connecting scraping edge arranged on the lower bottom edge of the trapezoidal plate. Two limiting grooves at two opposite positions on the surface of the two magnetic tank structures after being attached are respectively installed with one fixing buckle structure, and are fixed by connecting bolts respectively passing through the connecting holes on the upper connecting scraping edge and the lower connecting scraping edge, so as to realize the connection of the buckles.

[0011] Further, the two clamping limiting notches arranged oppositely on the metal shell correspond to a pair of opposite notch grooves on the scraping plate, so that the gas inlet and the gas outlet are exposed.

[0012] Further, the outer surface of the metal shell is provided with a circular groove coaxially arranged with the center hole, and a high-voltage ignition coil and a high-frequency magnetic field coil are installed in the circular groove coaxially.

[0013] Further, the high-frequency magnetic field coil and the high-voltage ignition coil are compressed by the magnetic tank structure attached to the circular groove.

[0014] Further, the holding plate, the scraping plate and the center limiting sleeve of the magnetic tank structure form a compression chamber to compress the insulating partition plate in the gap and the metal shell on both sides, and the fixing buckle structure installed on the limiting groove is opposite to the gap.

[0015] Further, the insulating barrier plate is composed of two spliced plate bodies, a circular through hole is arranged at the overall center position of the insulating barrier plate, and symmetrically arranged rectangular openings for the high-voltage ignition coil and the high-frequency magnetic field coil are arranged on each spliced plate body.

[0016] Further, the diameter of the circular through hole is consistent with the outer diameter of the chamber, and the insulating barrier plate is compressed by the compression chamber of the magnetic tank structure.

[0017] Further, the number of the insulating barrier plate is consistent with that of the arc-shaped shell of the metal shell.

[0018] The present application has the following advantages over the prior art:

[0019] 1. The magnetic tank structure of the present application is wrapped outside the circular annular tubular chamber, and the magnetic tank structure and the chamber are arranged with a high-voltage ignition coil and a high-frequency magnetic field coil, so that the magnetic field is uniformly distributed. The wrapped magnetic tank structure is used to manufacture the magnetic field control plasma to make spiral motion in the inner wall of the chamber. The wrapped magnetic tank magnetic field is uniformly distributed, which solves the problem of insufficient and defects of the rectangular corner radius of the remote plasma source chamber, and reduces the impact damage of the moving spiral plasma source to the chamber caused by uneven distribution of the magnetic field.

[0020] 2. The metal shell and the chamber of the present application are both circular annular structures, and the chamber has fewer split parts, which is beneficial to the movement of plasma in the alternating magnetic field. The circular annular metal shell reduces the contact probability of plasma with the chamber wall when moving inside the chamber, and solves the bad influence of the dissociation chamber on the loss, cleanliness and dissociation rate. The chamber is a circular annular tubular structure, which is beneficial to the movement of plasma in the alternating magnetic field. The metal shell structure as a heat dissipation structure is exquisite and has high heat dissipation efficiency.

[0021] 3. The magnetic tank structure and the metal shell of the present application are fixed by a fixed buckle structure, which is convenient for disassembly and assembly, and saves labor and time cost.

[0022] Of course, implementing any product of the present application does not necessarily need to achieve all the advantages described above. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiment description. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creating laborious work.

[0024] Figure 1 It is a structure schematic view of the remote plasma source dissociation chamber assembly combined with the chamber of the present application.

[0025] Figure 2 for Figure 1 A schematic diagram of the structure from the perspective of point A;

[0026] Figure 3 for Figure 1 Main view of the structure;

[0027] Figure 4 for Figure 1 Top view of the structure;

[0028] Figure 5 for Figure 4 AA section view in the middle;

[0029] Figure 6 for Figure 5 Main view of the structure;

[0030] Figure 7 This is a schematic diagram of the cavity structure;

[0031] Figure 8 This is a schematic diagram of the structure formed after two magnetic can structures are attached together.

[0032] Figure 9 for Figure 8 Main view of the structure;

[0033] Figure 10 This is a structural diagram of a single magnetic can;

[0034] Figure 11 for Figure 1 A schematic diagram of the structure after removing the magnetic can structure and the fixing buckle structure;

[0035] Figure 12 for Figure 11 Top view of the structure after removing the chambers;

[0036] Figure 13 for Figure 12 A schematic diagram of the structure after removing the high-voltage ignition coil, the high-frequency magnetic field coil, and an arc-shaped shell;

[0037] Figure 14 for Figure 13 A structural diagram from a C-angle perspective;

[0038] Figure 15 for Figure 13 A schematic diagram of the structure after removing a metal outer shell;

[0039] Figure 16 for Figure 15 Main view of the structure;

[0040] Figure 17 For insulating barrier plates inFigure 1 distribution position relation diagram in FIG. 1;

[0041] Figure 18 is Figure 17 structure front view of FIG. 1;

[0042] Figure 19 is Figure 17 structure schematic diagram of single insulation barrier plate in FIG. 1;

[0043] Figure 20 isdistribution position relation diagram in FIG. 1; Figure 1

[0044] Figure 21 isstructure schematic diagram of single fixed buckle structure in FIG. 1; Figure 20

[0045] Figure 22 isstructure schematic diagram of D view angle in FIG. 1; Figure 21

[0046] Figure 23 isstructure schematic diagram of existing RPS;

[0047] Figure 24 isstructure schematic diagram of existing cavity;

[0048] Figure 25 isstructure schematic diagram of E view angle in FIG. 1; Figure 24

[0049] Figure 26 isstructure schematic diagram after removing fixed buckle and bolt in FIG. 1; Figure 24

[0050] Figure 27 is structure schematic diagram after removing magnetic core in FIG. 1; Figure 26

[0051] Figure 28 is structure front view of FIG. 1; Figure 27

[0052] In the drawings, the component list represented by each mark is as follows:

[0053] 1-chamber, 101-inlet, 102-outlet, 2-magnetic tank structure, 201-holding plate, 202-scraping plate, 203-notch groove, 204-center limiting sleeve, 205-limiting groove, 3-metal shell, 301-holding limiting notch, 302-center hole, 303-circular annular groove, 304-clamping gap, 305-circular annular groove, 4-fixed buckle structure, 401-trapezoidal plate, 402-upper connecting scraping edge, 403-connecting hole, 404-lower connecting scraping edge, 5-insulation barrier plate, 501-circular through hole, 502-rectangular opening, 6-high-voltage ignition coil, 7-high-frequency magnetic field coil. DETAILED DESCRIPTION

[0054] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of the present application.

[0055] In the description of the present application, it should be understood that the terms "two ends", "outer", "peripheral side", "exterior", "one side", "adjacent", "surface", "outer surface", "coaxial center" and the like indicate the orientation or positional relationship, which are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the components or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present application.

[0056] As shown in Figures 23-26 , it is a structural diagram of an existing remote plasma source model, which includes a power supply and a remote plasma source cavity. The power supply provides a 400 KHz, 15 KW alternating current signal for the remote plasma source cavity, so that the remote plasma source cavity forms an alternating magnetic field to accelerate particles. Ar (argon) is introduced through the gas inlet, and NF3 gas is introduced after successful ignition to perform dissociation and cleaning in the cavity.

[0057] As shown in Figures 27-28 , it is a structural diagram of an existing dissociation cavity. The remote plasma source device is installed above the process gas inlet of a semiconductor thin film device, and is pumped to a vacuum state by the gas outlet of the device process chamber. Ar (argon) is introduced, and the remote plasma source cavity is filled with dilute argon. The remote plasma source ignites the argon in the cavity, and the argon forms a plasma gas, which is maintained in a plasma state by the alternating magnetic field generated by the remote plasma source cavity. At this time, NF3 (nitrogen trifluoride) or other cleaning process gas is introduced into the remote plasma source cavity to perform dissociation. The dissociated gas ions enter the device process chamber to perform cleaning process reaction, and then other generated gases are pumped out of the device process chamber through the gas outlet. In this way, the dissociation and cleaning effects in the remote plasma source cavity are achieved.

[0058] As can be seen from the drawings, the structure of the existing dissociation cavity includes a chamber, an air inlet, an air outlet, a magnetic core and an ignition port; the existing remote plasma source cavity has many structural parts, high-precision alignment is required for assembly to ensure the air tightness inside the cavity, and time and labor costs are increased; therefore, it is of great significance to provide a remote plasma source dissociation cavity assembly for solving the above problems, and the technical scheme is as follows.

[0059] Please refer to Figures 1-22 The remote plasma source dissociation cavity assembly of the present application is provided with a chamber 1 wrapped with a circular ring-shaped tube in the center, and an air inlet 101 and an air outlet 102 are arranged at both ends of the chamber 1 respectively;

[0060] The cavity assembly comprises a metal shell 3 wrapped around the outer circumferential side of the chamber 1 in the form of two halves, two symmetrically arranged magnetic pot structures 2 wrapped around the outside of the metal shell 3 after being attached, and a plurality of fixing buckle structures 4 installed on the outside of the magnetic pot structure 2 for fixing the metal shell 3 and the magnetic pot structure 2 to form an integral whole with the chamber 1;

[0061] In the specific embodiment, the metal shell 3 is in the shape of a circular ring formed by splicing four arc-shaped shells, and an insulating partition plate 5 is installed between the gap 304 formed between the two adjacent arc-shaped shells; one side of the metal shell 3 is provided with a containing groove 303 in half containment cooperation with the outer circumferential side of the chamber 1, and the two ends of the containing groove 303 are provided with clamping limiting notches 301 in half containment cooperation with the air inlet 101 and the air outlet 102 respectively;

[0062] The magnetic pot structure 2 adopts a magnetically conductive magnetic core as shown in Figures 8-9 The magnetic pot structure 2 comprises a holding plate 201, a scraping plate 202 arranged around one side of the holding plate 201 for wrapping the metal shell 3, and a center limiting sleeve 204 arranged at the center position of the holding plate 201 for wrapping the metal shell 3 together with the scraping plate 202; the other side of the holding plate 201 is provided with a limiting groove 205 matched with the fixing buckle structure 4, and the scraping plate 202 is provided with a notch groove 203 between the adjacent two limiting grooves 205;

[0063] The fixing buckle structure 4 comprises a trapezoidal plate 401, an upper connecting scraping edge 402 arranged on the upper bottom edge of the trapezoidal plate 401, and a lower connecting scraping edge 404 arranged on the lower bottom edge of the trapezoidal plate 401; one fixing buckle structure 4 is installed on each of the limiting grooves 205 at two opposite positions on the surface of the two magnetic pot structures 2 after being attached, and is fixed by connecting bolts passing through the connecting holes 403 on the upper connecting scraping edge 402 and the lower connecting scraping edge 404 respectively, so as to realize the connection of the buckles.

[0064] Wherein, the two clamping limit notches 301 on the metal shell 3 are arranged oppositely and correspond to a pair of oppositely arranged notch grooves 203 on the scraper 202, so that the air inlet 101 and the air outlet 102 are exposed.

[0065] Wherein, the outer surface of the metal shell 3 is provided with a circular groove 305 coaxially arranged with the center hole 302, and the high-voltage ignition coil 6 and the high-frequency magnetic field coil 7 are coaxially arranged in the circular groove 305; two ignition terminals are arranged on the high-voltage ignition coil 6; two magnetic field coil output terminals are arranged on the high-frequency magnetic field coil 7; the ignition terminals and the magnetic field coil output terminals are exposed through the lead-in grooves on the surface of the metal shell 3.

[0066] Wherein, the high-frequency magnetic field coil 7 and the high-voltage ignition coil 6 are pressed by the magnetic tank structure 2 which is in close contact with the circular groove 305.

[0067] Wherein, the clamping plate 201, the scraper 202 and the center limiting sleeve 204 of the magnetic tank structure 2 form a pressing chamber to press the insulating barrier plate 5 and the metal shell 3 on both sides in the gap 304, and the fixed buckle structure 4 installed on the limiting groove 205 is opposite to the gap 304.

[0068] Wherein, the insulating barrier plate 5 is composed of two spliced plate bodies, a circular through hole 501 is formed in the overall center position of the insulating barrier plate 5, and a rectangular opening 502 is symmetrically formed on each spliced plate body on both sides for the high-voltage ignition coil 6 and the high-frequency magnetic field coil 7 to pass through.

[0069] Wherein, the diameter of the circular through hole 501 is consistent with the outer diameter of the chamber 1, and the insulating barrier plate 5 is pressed by the pressing chamber of the magnetic tank structure 2.

[0070] Wherein, the number of the arc-shaped shells of the insulating barrier plate 5 and the metal shell 3 is consistent, specifically four, and arranged circumferentially.

[0071] The magnetic tank structure 2 of the technical solution is used to replace the original structure of the sleeve magnetic core, the high-voltage ignition coil 6 is placed between the magnetic core and the cavity, the high-frequency magnetic field coil 7 is sleeved on the metal shell 3 which acts as a heat sink, the magnetic field distribution of the chamber 1 is uniform, the damage of the hard anode film on the inner wall of the chamber 1 caused by the movement of the spiral plasma due to uneven magnetic field distribution is reduced, and the pollution caused by dust particles in the cavity is reduced.

[0072] The reason for using this principle is that the charged particles make spiral motion in the magnetic field, and the motion of the plasma in a strong magnetic field is constrained near the magnetic induction lines, so the plasma can only move longitudinally along the magnetic induction lines and cannot cross laterally, and only when the plasma collides, the lateral motion is suppressed. The technical scheme adopts a magnetic mirror device, when the lateral motion of the plasma is suppressed, the longitudinal motion is reflected by the magnetic mirror, but if the longitudinal motion speed is too large, the plasma will escape from both sides, and by adding a magnetic field outside the tokamak device, the plasma escape caused by the too large longitudinal motion speed can be avoided, thereby reducing the probability of collision between the plasma and the inner wall of the cavity when the plasma makes spiral motion in the cavity, thereby protecting the cavity.

[0073] In the embodiment, the chamber 1 is specifically replaced by a circular ring metal heat dissipation plate structure, i.e., a metal shell 3, to replace the original polygonal structure of the cavity. The circular ring metal shell 3 reduces the cavity wear caused by the shape problem on the one hand, and reduces the manufacturing cost and assembly difficulty on the other hand. The design of the external magnetic tank structure 2 makes the internal magnetic field distribution of the cavity more uniform, reduces the contact between the moving plasma in the chamber 1 and the inner wall of the cavity, and solves the impact damage of the moving plasma to the anodized film of the inner wall of the cavity.

[0074] Test steps:

[0075] Step one: install the prepared dissociation cavity on the test bench and perform a leak test, install an inlet valve and an outlet valve on the gas inlet 101 and the gas outlet 102 respectively, open the gas valve for testing, vacuumize, then close the outlet valve, and observe the change in the gas pressure in the dissociation chamber 1;

[0076] Step two: install the prepared dissociation cavity on the test bench and perform a leak test, install an inlet valve and an outlet valve on the gas inlet 101 and the gas outlet 102 respectively, open the gas valve for testing, vacuumize, then close the outlet valve, and observe the change in the gas pressure in the dissociation chamber 1;

[0077] Step three: measure the power, increase the volume of the given gas, and observe the changes in the power of the test bench, the bus voltage, and the three-phase current;

[0078] Step four: functional measurement;

[0079] Step five: measure the data;

[0080] The existing remote plasma source cavity measurement data: (N2 is the amount of nitrogen gas, FWD is the input power, and REV is the reflected power):

[0081] N2 mTorr )]]> FWD (w) REV (w) 0 226 89 1000 5115 42 5000 9477 31 8000 11787 26

[0082] The measurement data of the technical scheme of the present application:

[0083] N2 mTorr )]]> FWD (w) REV (w) 0 256 79 1000 5471 35 5000 9863 27 8000 12557 20

[0084] The above design solves the problem of the small arc of the rectangular corner of the remote plasma source cavity and the damage caused by the impact of the moving spiral plasma source on the cavity due to uneven magnetic field distribution. The remote plasma source designed this time will be a major breakthrough in the field of semiconductor process equipment, providing a convenient and development direction for the service life and cleanliness of the remote plasma source cavity in the future.

[0085] The technical solution is that the magnetic tank structure 2 is wrapped outside the cavity 1, the high-pressure ignition head between the magnetic tank structure 2 and the cavity 1 is connected by an ignition coil, high-frequency magnetic field coils 7 are distributed between the magnetic tank structure 2 and the cavity 1, the magnetic field is uniformly distributed, the magnetic tank structure 2 is fixed by a fixed buckle structure, which is convenient for disassembly and assembly, and saves labor and time cost. The remote plasma source cavity of the technical solution has fewer split parts, and the metal heat sink is a circular ring structure, which is beneficial to the movement of the plasma in the alternating magnetic field. The technical solution uses a wrapped magnetic tank structure 2 to manufacture a magnetic field to control the spiral movement of the plasma on the inner wall of the cavity. The wrapped magnetic tank magnetic field is uniformly distributed, reducing the impact damage to the inner wall of the cavity 1 caused by uneven distribution of the magnetic field.

[0086] The design realizes a wrapped magnetic tank structure of the remote plasma source cavity. The circular ring-shaped metal shell 3 reduces the contact probability of the plasma with the cavity wall when moving inside the cavity, and solves the bad influence of the dissociation cavity on wear, cleanliness, and dissociation rate; the cavity 1 is a circular ring-shaped tubular structure, which is beneficial to the movement of the plasma in the alternating magnetic field. The metal shell 3 as a heat dissipation structure has a delicate structure and can be designed with a water cooling structure, with high heat dissipation efficiency. In the future, the demand and design of the cavity process in the semiconductor industry have broken through the old ideas and concepts, and have ushered in opportunities for innovation and development.

[0087] The preferred embodiments of the above disclosed application are only used to help explain the application. The preferred embodiments do not describe all the details and do not limit the application to the specific embodiments described. Obviously, many modifications and changes can be made according to the content of the specification. The embodiments are selected and described in detail in order to better explain the principles and practical applications of the application, so that those skilled in the art can well understand and utilize the application. The application is limited by the claims and their entire scope and equivalents.

Claims

1. A remote plasma source dissociation cavity assembly, a circular annular tube is wrapped around the center of the cavity (1), the cavity (1) is provided with an air inlet (101) and an air outlet (102) at both ends, characterized in that: the cavity assembly comprises a metal shell (3) wrapped around the outer circumferential side of the cavity (1) in the form of two halves, two symmetrically arranged magnetic tank structures (2) wrapped around the outside of the metal shell (3) after being attached, and a plurality of fixing buckle structures (4) installed on the outside of the magnetic tank structure (2) for fixing the metal shell (3) and the magnetic tank structure (2) to form an integral whole with the cavity (1); the metal shell (3) is in the form of a circular annulus spliced by a plurality of arc-shaped shells, and an insulating partition plate (5) is installed between the gap (304) formed between the two adjacent arc-shaped shells; one side of the metal shell (3) is provided with a containing groove (303) in half containment with the outer circumferential side of the cavity (1), and the two ends of the containing groove (303) are provided with clamping limiting notches (301) in half containment with the air inlet (101) and the air outlet (102), respectively; the magnetic tank structure (2) comprises a clamping plate (201), a scraping plate (202) arranged around one side of the clamping plate (201) for wrapping the metal shell (3), and a center limiting sleeve (204) arranged at the center position of the clamping plate (201) for wrapping the metal shell (3) together with the scraping plate (202); the other side of the clamping plate (201) is provided with a limiting groove (205) matched with the fixing buckle structure (4), and the scraping plate (202) is provided with a notch groove (203) between the adjacent two limiting grooves (205); the fixing buckle structure (4) comprises a trapezoidal plate (401), an upper connecting scraping edge (402) arranged on the upper base of the trapezoidal plate (401), and a lower connecting scraping edge (404) arranged on the lower base of the trapezoidal plate (401); after being attached, one fixing buckle structure (4) is respectively installed on the limiting grooves (205) at two opposite positions on the surface of the two magnetic tank structures (2), and is fixed by connecting bolts respectively passing through the connecting holes (403) on the upper connecting scraping edge (402) and the lower connecting scraping edge (404), realizing the connection of the buckles; the two clamping limiting notches (301) oppositely arranged on the metal shell (3) correspond to a pair of oppositely arranged notch grooves (203) on the scraping plate (202), so that the air inlet (101) and the air outlet (102) are exposed; a circular annular groove (305) coaxial with the center hole (302) is arranged on the outer surface of the metal shell (3), and a high-voltage ignition coil (6) and a high-frequency magnetic field coil (7) are installed in the circular annular groove (305); two ignition terminals are arranged on the high-voltage ignition coil (6); two magnetic field coil output terminals are arranged on the high-frequency magnetic field coil (7); the ignition terminals and the magnetic field coil output terminals are respectively exposed through the lead-in grooves on the surface of the metal shell (3). ​ The insulating barrier plate (5) is composed of two spliced plate bodies, a circular through hole (501) is arranged at the overall center position of the insulating barrier plate (5), and symmetrical rectangular openings (502) for allowing the high-voltage ignition coil (6) and the high-frequency magnetic field coil (7) to pass through are arranged on each spliced plate body.

2. A remote plasma source dissociation chamber assembly as defined in claim 1, wherein, The high-frequency magnetic field coil (7) and the high-voltage ignition coil (6) are compressed by the magnetic tank structure (2) which is fitted with the circular annular groove (305).

3. A remote plasma source dissociation chamber assembly as defined in claim 1, wherein, The holding plate (201), the scraper (202) and the center limiting sleeve (204) of the magnetic tank structure (2) form a compression chamber to compress the insulating barrier plate (5) and the metal shell (3) on both sides in the gap (304), and the fixed buckle structure (4) installed on the limiting groove (205) is opposite to the gap (304).

4. The remote plasma source dissociation chamber assembly of claim 1, wherein, The diameter of the circular through hole (501) is consistent with the outer diameter of the cavity (1), and the insulating barrier plate (5) is compressed by the compression chamber of the magnetic tank structure (2).

5. The remote plasma source dissociation chamber assembly of claim 1, wherein, The number of the arc-shaped shells of the insulating barrier plate (5) and the metal shell (3) is consistent.

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