Auxiliary processing device and processing method for electrostatic chuck ceramic plate

Abstract

The present invention discloses an auxiliary processing device and a processing method for an electrostatic chuck ceramic plate, which belongs to the technical field of electrostatic chucks. The auxiliary processing device for the electrostatic chuck ceramic plate comprises a hollow vessel with an opening, wherein a lower supporting ceramic plate and an upper supporting ceramic plate are provided in the vessel, wherein the lower supporting ceramic plate is arranged below the upper supporting ceramic plate, and the upper supporting ceramic plate is slidably connected to the vessel, and the electrostatic chuck ceramic plate is processed by the auxiliary processing device, and the processing method comprises the following steps: step 1, placing the electrostatic chuck ceramic plate to be processed between the upper supporting ceramic plate and the lower supporting ceramic plate; step 2, adding a first counterweight or a second counterweight according to the size and thickness of the electrostatic chuck ceramic plate; step 3, after the electrostatic chuck ceramic plate is placed, placing the entire auxiliary processing device in a ceramic sintering device to sinter the electrostatic chuck ceramic plate.

Description

Technical Field

[0001] The present invention relates to the technical field of electrostatic chucks, and in particular to an auxiliary processing device and a processing method for an electrostatic chuck ceramic plate. Background Art

[0002] The electrostatic chuck includes a ceramic plate and a metal base, which are bonded together to form the electrostatic chuck. The upper and lower surfaces of the ceramic plate must have high flatness requirements. The ceramic plate is prone to bending during sintering, making the electrostatic chuck ceramic plate unable to be used normally. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to provide an auxiliary processing device and a processing method for an electrostatic chuck ceramic plate, which can reduce the bending of the electrostatic chuck ceramic plate during sintering.

[0004] In order to solve the above technical problems, the technical solution of the present invention is:

[0005] On the one hand, the present invention provides an auxiliary processing device for an electrostatic chuck ceramic plate, comprising a hollow vessel with an opening, in which a lower supporting ceramic plate and an upper supporting ceramic plate are provided, the lower supporting ceramic plate is arranged below the upper supporting ceramic plate, and the upper supporting ceramic plate is slidably connected to the vessel.

[0006] Preferably, a lower positioning hole is provided on the lower supporting ceramic plate, and a lower positioning pin that cooperates with the lower positioning hole is provided on the bottom of the inner side of the vessel.

[0007] Preferably, the lower supporting ceramic plate is in the shape of a disc, and the side wall of the lower supporting ceramic plate does not contact the inner wall of the container.

[0008] Preferably, the upper supporting ceramic plate is in the shape of a disc, and a plurality of limiting members are provided on the lower side wall of the upper supporting ceramic plate, and the distance between any one of the limiting members and the central axis of the upper supporting ceramic plate is equal.

[0009] Preferably, the minimum distance between any one of the limiting members and the central axis of the upper supporting ceramic plate is greater than the diameter of the lower supporting ceramic plate.

[0010] Preferably, a limiting groove is provided on the side wall of the vessel, and an upper limiting piece that cooperates with the limiting groove is provided on the upper supporting ceramic plate.

[0011] Preferably, the limiting groove includes a first vertical groove, a second vertical groove and a transverse groove, one end of the transverse groove is connected to the first vertical groove, the other end of the transverse groove is connected to the second vertical groove, the first vertical groove is arranged parallel to the second vertical groove, the first vertical groove is arranged on the upper side of the second vertical groove, and the first vertical groove is an open groove.

[0012] Preferably, the upper limit member is provided with a first counterweight member, and the first counterweight member is detachably connected to the upper limit member.

[0013] Preferably, a second counterweight is provided on the upper supporting ceramic plate, and the second counterweight is detachably connected to the upper supporting ceramic plate.

[0014] Another aspect of the present invention provides a method for processing an electrostatic chuck ceramic plate, wherein the electrostatic chuck ceramic plate is processed using the auxiliary processing device for the electrostatic chuck ceramic plate described above, and the processing method comprises the following steps:

[0015] Step 1: placing the electrostatic chuck ceramic plate to be sintered between the upper supporting ceramic plate and the lower supporting ceramic plate;

[0016] Step 2: adding the first counterweight or the second counterweight according to the size and thickness of the ceramic plate for the electrostatic chuck;

[0017] Step 3: After the electrostatic chuck ceramic plate is placed, the entire auxiliary processing device is placed in a ceramic sintering device to sinter the electrostatic chuck ceramic plate.

[0018] By adopting the above technical solution, by setting up an upper supporting ceramic plate and a lower supporting ceramic plate, when the electrostatic chuck ceramic plate is sintered, the electrostatic chuck ceramic plate is placed between the upper supporting ceramic plate and the lower supporting ceramic plate, and then placed in the ceramic sintering equipment for firing. Under the action of the upper supporting ceramic plate and the lower supporting ceramic plate, the two sides of the electrostatic chuck ceramic plate can remain flat after firing, thereby reducing the bending of the electrostatic chuck ceramic plate during the sintering process. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a structural schematic diagram of the auxiliary processing device for electrostatic chuck ceramic plate of the present invention;

[0020] Figure 2 The figure is a schematic cross-sectional view of the auxiliary processing device for electrostatic chuck ceramic plates according to the present invention. DETAILED DESCRIPTION

[0021] The following is a further description of specific embodiments of the present invention in conjunction with the accompanying drawings. It should be noted that the description of these embodiments is intended to facilitate understanding of the present invention and does not constitute a limitation of the present invention. In addition, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

[0022] like Figure 1 and Figure 2 As shown, Figure 1This is a schematic structural diagram of the auxiliary processing device for electrostatic chuck ceramic plates of the present invention. Figure 2 The figure is a schematic cross-sectional view of the auxiliary processing device for an electrostatic chuck ceramic plate according to the present invention, comprising a hollow vessel 1 having an opening, wherein a lower supporting ceramic plate 3 and an upper supporting ceramic plate 2 are provided in the vessel 1, wherein the lower supporting ceramic plate 3 is disposed below the upper supporting ceramic plate 2, and the upper supporting ceramic plate 2 is slidably connected to the vessel 1;

[0023] The upper supporting ceramic plate 2 is a processed ceramic plate, and its surface in contact with the electrostatic chuck ceramic plate is flat. The lower supporting ceramic plate 3 is also a processed ceramic plate, and its surface in contact with the electrostatic chuck ceramic plate is flat. When the electrostatic chuck ceramic plate that needs to be sintered enters the ceramic plate sintering equipment, the electrostatic chuck ceramic plate is first placed between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, and then placed in the ceramic plate sintering equipment for firing. Under the action of the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, the sintered electrostatic chuck ceramic plate will not have a surface bending situation;

[0024] The upper supporting ceramic plate 2 and the lower supporting ceramic plate 3 are both ceramic, which can withstand high temperatures and will not deform when entering the ceramic plate sintering equipment, ensuring that the surface that fits with the electrostatic chuck ceramic plate can be flat;

[0025] The container 1 can be made of quartz glass, which is resistant to high temperatures and can be easily put into the ceramic plate sintering equipment without deformation. In other implementations of this embodiment, the container 1 can also be made of ceramic material.

[0026] The lower supporting ceramic plate 3 can be placed at the bottom of the inner side of the vessel 1. The upper supporting ceramic plate 2 is slidably connected to the vessel 1. When in use, the electrostatic chuck ceramic plate to be sintered is first placed on the lower supporting ceramic plate 3, and then the upper supporting ceramic plate 2 is placed on the electrostatic chuck ceramic plate.

[0027] A lower positioning hole is provided on the lower supporting ceramic plate 3, and a lower positioning pin 7 is provided on the bottom of the inner side of the vessel 1 to cooperate with the lower positioning hole. The position of the lower supporting ceramic plate 3 can be limited by the cooperation between the lower positioning hole and the lower positioning pin 7;

[0028] The lower supporting ceramic plate 3 is in the shape of a disc, and the side wall of the lower supporting ceramic plate 3 does not contact the inner wall of the vessel 1. The shape of the electrostatic chuck is generally disc-shaped, so the lower supporting ceramic plate 3 can be set to be disc-shaped. There is a certain distance between the side wall of the lower supporting ceramic plate 3 and the inner wall of the vessel 1. During the sintering process of the electrostatic chuck ceramic plate, heat can better enter the vessel 1, so that the electrostatic chuck ceramic plate is heated more evenly, and the electrostatic chuck ceramic plate is better sintered;

[0029] The upper supporting ceramic plate 2 is in the shape of a disc, and a plurality of limiting members 6 are provided on the lower side wall of the upper supporting ceramic plate 2, and the distance between any limiting member 6 and the central axis of the upper supporting ceramic plate 2 is equal. The limiting member 6 is used to limit the position of the electrostatic chuck ceramic plate to prevent the electrostatic chuck ceramic plate from falling out between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3. When the electrostatic chuck ceramic plate is placed between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, the limiting member 6 can contact the outer side wall of the lower supporting ceramic plate 3, or there can be a certain distance between the lower supporting ceramic plate 3; the number of limiting members 6 can be three or four, and can be evenly distributed along the circumference of the upper supporting ceramic plate 2, and the angles formed between any two adjacent limiting members 6 are equal. The limiting member 6 can be rod-shaped and connected to the upper supporting ceramic plate 2. The limiting member 6 can also be ceramic fired. In other implementation manners of this embodiment, the limiting member 6 can also be plate-shaped;

[0030] The minimum distance between any one of the limit members 6 and the central axis of the upper supporting ceramic plate 2 is greater than the diameter of the lower supporting ceramic plate 3. The limit member 6 has a certain distance from the lower supporting ceramic plate 3, which can prevent the electrostatic chuck ceramic plate from falling out of the space between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, and can also avoid affecting the sintering process of the electrostatic chuck ceramic plate;

[0031] A limiting groove is provided on the side wall of the vessel 1, and an upper limiting member 4 cooperating with the limiting groove is provided on the upper supporting ceramic plate 2. Through the cooperation of the upper limiting member 4 and the limiting groove, the upper supporting ceramic plate 2 can be moved in the direction of approaching and not approaching the lower supporting ceramic plate 3. On the one hand, it can be used when placing and removing the electrostatic chuck ceramic plate, which is convenient for placing the electrostatic chuck ceramic plate that needs to be sintered and removing the electrostatic chuck ceramic plate after sintering. On the other hand, it can meet the sintering requirements of electrostatic chuck ceramic plates of different sizes.

[0032] The limiting groove includes a first vertical groove 10, a second vertical groove 12 and a transverse groove 11. One end of the transverse groove 11 is connected to the first vertical groove 10, and the other end of the transverse groove 11 is connected to the second vertical groove 12. The first vertical groove 10 is arranged in parallel with the second vertical groove 12. The first vertical groove 10 is arranged on the upper side of the second vertical groove 12. The first vertical groove 10 is an open groove. The first vertical groove 10 and the second vertical groove 12 are both arranged in the up and down directions, and the transverse groove 11 can be arranged in the left and right directions. The connection between the transverse groove 11 and the first vertical groove 10 and the connection between the transverse groove 11 and the second vertical groove 12 are both chamfered, so that the upper limit member 4 can smoothly enter the transverse groove from the first vertical groove 10 11, and then enters the second vertical groove 12. The first vertical groove 10 is arranged on the upper side of the second vertical groove 12. During installation, the upper limit member 4 first enters the first vertical groove 10, then enters the transverse groove 11, and finally enters the second vertical groove 12. The first vertical groove 10 is an open groove with an upper end being open. The upper limit member 4 can directly enter the first vertical groove 10. By providing the transverse groove 11 and the second vertical groove 12, when the entire auxiliary processing device is tilted, the upper limit member 4 is also difficult to fall out of the limiting groove, thereby preventing the electrostatic chuck ceramic plate from falling out. During normal sintering of the electrostatic chuck ceramic plate, the upper limit member 4 is in a state of cooperation with the second vertical groove 12;

[0033] The upper limit member 4 is provided with a first counterweight member 5, which is detachably connected to the upper limit member 4. The upper limit member 4 can be a round rod or a square rod arranged on the side wall of the upper supporting ceramic plate 2, and the number thereof is equal to the number of the limiting grooves. The first counterweight block can be a first ceramic block with a hole, and the hole of the first ceramic block directly cooperates with the upper limit member 4. When in use, the first counterweight member 5 is inserted into the upper limit member 4 and then the upper limit member 4 is snapped into the limiting groove;

[0034] A second counterweight 9 is provided on the upper supporting ceramic plate 2, and the second counterweight 9 is detachably connected to the upper supporting ceramic plate 2. The second counterweight 9 can be a second ceramic block with a hole. A top limit pin 8 that cooperates with the hole of the second ceramic block can be provided on the upper surface of the upper supporting ceramic plate 2. The axis of the top limit pin 8 can coincide with the central axis of the upper supporting ceramic plate 2. The weight of the second counterweight 9 can be selected as needed. When in use, each upper limit member 4 needs to be installed with the second counterweight 9 at the same time or the second counterweight 9 is not installed at the same time, so that the force on the electrostatic chuck ceramic plate is more uniform;

[0035] Another aspect of the present invention provides a method for processing an electrostatic chuck ceramic plate, wherein the electrostatic chuck ceramic plate is processed using the auxiliary processing device described above, and the processing method comprises the following steps:

[0036] Step 1: Place the electrostatic chuck ceramic plate to be sintered between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3;

[0037] Step 2: Add a first counterweight 5 or a second counterweight 9 according to the size and thickness of the ceramic plate used for the electrostatic chuck;

[0038] Step 3: After the electrostatic chuck ceramic plate is placed, the entire auxiliary processing device is placed in a ceramic sintering device to fire the electrostatic chuck ceramic plate. After firing, the electrostatic chuck ceramic plate is not prone to bending.

[0039] By setting an upper supporting ceramic plate 2 and a lower supporting ceramic plate 3, when the electrostatic chuck ceramic plate is sintered, the electrostatic chuck ceramic plate is placed between the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, and then placed in a ceramic sintering device for firing. Under the action of the upper supporting ceramic plate 2 and the lower supporting ceramic plate 3, the two sides of the electrostatic chuck ceramic plate can remain flat after firing, thereby reducing the bending of the electrostatic chuck ceramic plate during the sintering process.

[0040] The embodiments of the present invention are described in detail above with reference to the accompanying drawings, but the present invention is not limited to the described embodiments. It is apparent to those skilled in the art that various changes, modifications, substitutions, and variations to these embodiments may be made without departing from the principles and spirit of the present invention, and these changes and modifications still fall within the scope of protection of the present invention.

Claims

1. An auxiliary processing device for electrostatic chuck ceramic plates, characterized by: A hollow vessel with an opening is provided in the vessel, wherein a lower supporting ceramic plate and an upper supporting ceramic plate are provided in the vessel, wherein the lower supporting ceramic plate is arranged below the upper supporting ceramic plate, and the upper supporting ceramic plate is slidably connected to the vessel; The lower supporting ceramic plate is in the shape of a disc, and the side wall of the lower supporting ceramic plate does not contact the inner side wall of the vessel; The upper supporting ceramic plate is in the shape of a disc, and a plurality of limiting members are provided on the lower side wall of the upper supporting ceramic plate, and the distance between any of the limiting members and the central axis of the upper supporting ceramic plate is equal; The minimum distance between any one of the limiting members and the central axis of the upper supporting ceramic plate is greater than the diameter of the lower supporting ceramic plate; A limiting groove is provided on the side wall of the vessel, and an upper limiting member cooperating with the limiting groove is provided on the upper supporting ceramic plate; The limiting groove includes a first vertical groove, a second vertical groove and a transverse groove, one end of the transverse groove is connected to the first vertical groove, and the other end of the transverse groove is connected to the second vertical groove, the first vertical groove is arranged parallel to the second vertical groove, the first vertical groove is arranged on the upper side of the second vertical groove, and the first vertical groove is an open groove.

2. The auxiliary processing device for electrostatic chuck ceramic plate according to claim 1, characterized in that: A lower positioning hole is provided on the lower supporting ceramic plate, and a lower positioning pin that matches the lower positioning hole is provided on the bottom of the inner side of the vessel.

3. The auxiliary processing device for electrostatic chuck ceramic plate according to claim 2, characterized in that: The upper limit member is provided with a first counterweight member, and the first counterweight member is detachably connected to the upper limit member.

4. The auxiliary processing device for electrostatic chuck ceramic plate according to claim 3, characterized in that: A second counterweight is provided on the upper supporting ceramic plate, and the second counterweight is detachably connected to the upper supporting ceramic plate.

5. A method for processing a ceramic plate for an electrostatic chuck, characterized in that: The electrostatic chuck ceramic plate is processed using the auxiliary processing device according to claim 4, and the processing method includes the following steps: Step 1: placing the electrostatic chuck ceramic plate to be sintered between the upper supporting ceramic plate and the lower supporting ceramic plate; Step 2: adding the first counterweight or the second counterweight according to the size and thickness of the ceramic plate for the electrostatic chuck; Step 3: After the electrostatic chuck ceramic plate is placed, the entire auxiliary processing device is placed in a ceramic sintering device to sinter the electrostatic chuck ceramic plate.

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