Pipe system and semiconductor apparatus

Abstract

The application provides a pipeline system and a semiconductor device, and relates to the technical field of semiconductor device manufacturing. The pipeline system comprises a first branch pipe, a first machine table is communicated with the rear end of the first branch pipe, a main pipe is communicated with the front end of the first branch pipe, the first machine table obtains required vacuum supply from the main pipe through the first branch pipe, and the front end of the first branch pipe communicated with the main pipe is further provided with a first protection valve; a bypass pipe is communicated with the first branch pipe, and the front end of the bypass pipe is located between the rear end of the first protection valve and the first machine table; a second vacuum pump is arranged at the rear end of the bypass pipe and is communicated with the first branch pipe through the bypass pipe, and a second protection valve is further arranged between the second vacuum pump and the front end of the bypass pipe. By adding the bypass pipe on the branch pipe connected with the machine table, the bypass pipe is connected with the vacuum pump, so that the vacuum supply of the machine table is ensured, and the damage of key devices in the machine table caused by vacuum supply interruption is reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor device manufacturing, in particular to a pipeline system and a semiconductor device. BACKGROUND

[0002] A vacuum system is an important component of a photolithography machine, which is used to ensure the stable transmission of a wafer and a mask inside the machine and the exposure precision. The vacuum system in the photolithography machine is generally provided by a factory vacuum pipeline. Once the pipeline has a vacuum abnormality or even a supply interruption, key devices inside the photolithography machine, such as a wafer holder and a TPR waterproof component (a Table covering plate is a hydrophobic protective plate used to prevent water used for exposure from flowing into the wafer holder), will be damaged. Moreover, the vacuum pipeline system is difficult to repair in a short time, and the photolithography machine will be shut down, resulting in a production interruption.

[0003] Therefore, the present application proposes a new pipeline system to avoid the vacuum abnormality or supply interruption of the machine, avoid the shutdown of the machine due to the vacuum abnormality or supply interruption, and reduce the damage to key devices. SUMMARY

[0004] The present application aims to provide a pipeline system and a semiconductor device to solve the problem of vacuum system supply interruption.

[0005] To solve the above technical problems, the present application provides a pipeline system, comprising:

[0006] A first branch pipe, a rear end of the first branch pipe being communicated with a first machine, a front end of the first branch pipe being communicated with a main pipe, the first machine obtaining required vacuum supply from the main pipe through the first branch pipe, and the front end of the first branch pipe being further provided with a first protection valve;

[0007] A bypass pipe, the bypass pipe being communicated with the first branch pipe, and a front end of the bypass pipe being located between a rear end of the first protection valve and the first machine;

[0008] A second vacuum pump, the second vacuum pump being arranged at a rear end of the bypass pipe and being communicated with the first branch pipe through the bypass pipe, and a second protection valve being further arranged between the second vacuum pump and the front end of the bypass pipe.

[0009] Preferably, the first protection valve is a check valve allowing gas flow from the first machine to the main pipe in one direction.

[0010] Preferably, the second protection valve is a check valve allowing gas flow from the first machine to the second vacuum pump in one direction.

[0011] Preferably, the first protection valve is a check valve allowing gas flow from the first machine to the main pipe in one direction, and the second protection valve is a check valve allowing gas flow from the first machine to the second vacuum pump in one direction, and the first protection valve and the second protection valve have different opening and closing states.

[0012] Preferably, the first protection valve has a pressure sensor monitoring the main pipe.

[0013] Preferably, the second vacuum pump is electrically connected to a backup power supply, and the backup power supply is powered by a backup power supply unit.

[0014] Preferably, the first branch pipe is connected to the first machine through a first branch pipe switch unit and a second branch pipe switch unit in sequence at the end after the bypass pipe is connected, and the bypass pipe is connected between the front end of the first branch pipe and the second protection valve, and a bypass pipe switch unit is further arranged.

[0015] Preferably, the system further comprises a first switch unit and a second switch unit arranged at both ends of the main pipe to control the opening and closing of the gas flow.

[0016] Preferably, the second switch unit is further connected to a first vacuum pump, and the first vacuum pump is electrically connected to a main power supply.

[0017] The application also provides a semiconductor device comprising the pipeline system.

[0018] In the pipeline system and semiconductor device provided by the application, a bypass pipe is added to the branch pipe connected to the machine, and the bypass pipe is connected to a vacuum pump to ensure vacuum supply of the machine, and check valves are arranged on the branch pipe and the bypass pipe, and the check valves can be opened and closed in a very short time, so as to facilitate rapid switching of the vacuum supply of the bypass pipe, and in the case of abnormality or interruption of the vacuum supply of the machine, the vacuum demand of the machine can be met in time, and damage to key devices in the machine caused by interruption of the vacuum supply is reduced. In addition, the vacuum pump of the bypass pipe is further connected to a backup power supply and a backup power supply unit, and in the case of failure, the backup unit and the backup power supply unit can be switched to ensure that the vacuum pump can supply vacuum for 24 hours without interruption. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a schematic diagram of an embodiment provided by the application.

[0020] In the drawings,

[0021] 10, main pipe; 11, first switch unit; 12, second switch unit; 13, first vacuum pump; 14, main power supply; 20, first branch pipe; 21, first protection valve; 22, first branch pipe switch unit; 23, second branch pipe switch unit; 24, first machine; 30, bypass pipe; 31, bypass pipe switch unit; 32, second protection valve; 33, second vacuum pump; 34, backup power supply; 35, backup power supply unit; 40, second branch pipe; 41, third branch pipe switch unit; 42, second machine. DETAILED DESCRIPTION

[0022] The pipe system and semiconductor equipment according to the present application will be further described below in conjunction with the accompanying drawings and specific embodiments. The advantages and features of the present application will be more apparent from the following description and claims. It should be noted that the accompanying drawings are very simplified and use non-precise proportions, only for the purpose of conveniently and clearly assisting the description of the embodiments of the present application.

[0023] The inventor has found that once the vacuum pipe system of the lithography machine is interrupted, not only the working hours will be wasted, but also the key components in the lithography machine will be damaged.

[0024] Therefore, the core idea of the present application is to connect a bypass pipe to the branch pipe for supplying vacuum to the lithography machine, so as to ensure the vacuum supply of the lithography machine when the vacuum supply of the main pipe is abnormal.

[0025] Specifically, please refer to Figure 1 which is a schematic diagram of an embodiment of the present application. A pipe system, as shown in Figure 1 , comprises:

[0026] A first branch pipe 20, a rear end of the first branch pipe 20 is communicated with a first machine 24, a front end of the first branch pipe 20 is communicated with a main pipe 10, the first machine 24 obtains the required vacuum supply from the main pipe 10 through the first branch pipe 20, and the front end of the first branch pipe 20 communicated with the main pipe 10 is further provided with a first protection valve 21.

[0027] A bypass pipe 30, which is communicated with the first branch pipe 20, and a front end of the bypass pipe 30 is located between a rear end of the first protection valve 21 and the first machine 24.

[0028] A second vacuum pump 33, which is arranged at a rear end of the bypass pipe 30 and communicated with the first branch pipe 20 through the bypass pipe 30, and a second protection valve 32 is further arranged between the second vacuum pump 33 and the front end of the bypass pipe 30.

[0029] In one embodiment, the bypass pipe 30 is connected to the first branch pipe 20 which is connected to the main pipe 10 and the first machine 24, the second protection valve 32 and the second vacuum pump 33 are arranged in sequence from the front end of the first branch pipe 20, when the vacuum supply of the main pipe 10 is interrupted, the first protection valve 21 is closed, the vacuum supply of the main pipe 10 is closed, and the second vacuum pump 33 supplies vacuum to the first machine 24 through the second protection valve 32.

[0030] Here, the end of the first branch pipe 20 connected to the main pipe 10 is the front end, and the end of the first branch pipe 20 connected to the first machine 24 is the rear end or the end, the end of the bypass pipe 30 connected to the first branch pipe 20 is the front end, and the end of the bypass pipe 30 away from the first branch pipe 20 is the rear end or the end.

[0031] Specifically, the first protection valve 21 is a check valve that allows gas flow from the first machine 24 to the main pipe 10 in one direction.

[0032] Specifically, the second protection valve 32 is a check valve that allows gas flow from the first machine 24 to the second vacuum pump 33 in one direction.

[0033] In one embodiment, check valves are installed on the first branch pipe 20 and the newly added bypass pipe 30, and the pressure holding capacity of the check valves is tested when they are installed, so that when the main pipe 10 is abnormal, the bypass pipe 30 can be switched in time to supply vacuum, and the vacuum in the pipeline is ensured.

[0034] Specifically, the first protection valve 21 is a check valve that allows gas flow from the first machine 24 to the main pipe 10 in one direction, the second protection valve 32 is a check valve that allows gas flow from the first machine 24 to the second vacuum pump 33 in one direction, and the opening and closing states of the first protection valve 21 and the second protection valve 32 are different.

[0035] In one embodiment, the first protection valve 21 and the second protection valve 32 are both check valves that allow gas to flow in one direction, maintaining the vacuum supply of the first machine 24. When the first protection valve 21 is in an open state, the second protection valve 32 is in a closed state, that is, when the main pipe 10 can normally supply vacuum, the vacuum supply of the bypass pipe 30 is closed; when the first protection valve 21 is in a closed state, the second protection valve 32 is in an open state, the vacuum supply of the main pipe 10 is stopped, and the bypass pipe 30 supplies vacuum, the working states of the first protection valve 21 and the second protection valve 32 are always different.

[0036] Specifically, the first protection valve 21 has a pressure sensor for monitoring the main pipe 10.

[0037] In an embodiment, the first protection valve 21 has a pressure sensor monitoring the main pipe 10, when the main pipe 10 normally supplies vacuum to the first machine table 24, if the pressure sensor monitors the change of the gas pressure inside the lumen of the main pipe 10 or the vacuum supply is interrupted, the working state of the first protection valve 21 and the second protection valve 32 is changed instantaneously, the first protection valve 21 is closed, the second protection valve 32 is opened, the bypass pipe switch unit 31 is controlled to be on, and the bypass pipe 30 is turned on to supply vacuum to the first machine table 24.

[0038] Specifically, the second vacuum pump 33 is electrically connected with a backup power supply 34, and the backup power supply 34 is powered by a backup power supply unit 35.

[0039] In an embodiment, the backup power supply 34 is an UPS (Uninterruptible Power Supply), and the backup power supply unit 35 is a diesel power supply unit, so that after the main pipe 10 fails, the diesel power supply unit can be switched to continue to supply power to the second vacuum pump 33, and is not affected by the power supply state of the factory.

[0040] Specifically, the first branch pipe 20 is connected to the first machine table 24 through the first branch pipe switch unit 22 and the second branch pipe switch unit 23 in sequence at the end after the bypass pipe 30 is connected, and the bypass pipe switch unit 31 is further arranged between the front end of the first branch pipe 20 and the second protection valve 32.

[0041] In an embodiment, the first branch pipe switch unit 22 and the second branch pipe switch unit 23 are used to control the conduction of the first branch pipe 20 on the first machine table 24, in the case that the first branch pipe 20 supplies vacuum to the first machine table 24, the first branch pipe switch unit 22 and the second branch pipe switch unit 23 are always opened to keep the first branch pipe 20 on, and in the case that the first protection valve 21 is closed, the second protection valve 32 is opened, and the bypass pipe 30 supplies vacuum to the first machine table 24, the bypass pipe switch unit 31 controls the bypass pipe 30 to be on.

[0042] Specifically, the first switch unit 11 and the second switch unit 12 for controlling the opening and closing of the gas flow are arranged at both ends of the main pipe 10.

[0043] In one embodiment, the first switch unit 11 is provided with a device (not shown) such as a vacuum pump for supplying vacuum to the main pipe 10 at one end away from the connection point of the main pipe 10 and the first branch pipe 20, when the vacuum pump connected with the first switch unit 11 is controlled to be closed, the first vacuum pump 13 maintains the vacuum state of the main pipe 10; when the first vacuum pump 13 connected with the second switch unit 12 fails, the second switch unit 12 is closed, and the vacuum pump ensures the vacuum supply of the main pipe 10. When the vacuum supply of the main pipe 10 is abnormal, the first branch pipe 20 with the bypass pipe 30 can maintain the vacuum supply through the second vacuum pump 33.

[0044] Specifically, the second switch unit 12 is further connected with the first vacuum pump 13, and the first vacuum pump 13 is electrically connected with the main power supply 14.

[0045] In one embodiment, the main power supply 14, i.e. the factory transformer set, supplies power to the first vacuum pump 13 to maintain the normal operation of the first vacuum pump 13.

[0046] In addition, the normally operating main pipe 10 is further connected with the second branch pipe 40, and the second branch pipe 40 is connected with the second machine table 42 requiring vacuum supply through the third branch pipe switch unit 41.

[0047] In one embodiment, as described above, the second switch unit 12 is further connected with the first vacuum pump 13, and the first vacuum pump 13 is electrically connected with the main power supply 14, in addition, another vacuum pump can be provided at the end of the first switch unit 11, and the vacuum pumps at both ends of the main pipe 10, if one of them fails, the other vacuum pump tries to maintain the vacuum of the main pipe 10. It can be understood that the effect of directly adding a vacuum supply device to the main pipe 10 is worse than that of adding a bypass pipe 30 to supply vacuum, therefore, compared with the first machine table 24, the second machine table 42 can be a machine table with low vacuum requirement.

[0048] The application further provides a semiconductor device comprising the pipeline system of any one of the above.

[0049] As can be seen from the above, in the pipeline system and the semiconductor device provided by the embodiments of the application, the bypass pipe is added to the branch pipe connecting the machine table, the bypass pipe is connected with the vacuum pump to ensure the vacuum supply of the machine table, and the check valve is arranged on the branch pipe and the bypass pipe, and the check valve can be opened and closed in a very short time, thereby facilitating the rapid switching of the vacuum supply of the bypass pipe, and timely meeting the vacuum demand of the machine table in the case of abnormal or interrupted vacuum supply of the machine table.

[0050] The above description is only a description of the preferred embodiments of the application, and does not limit the scope of the application in any way, and any modification or modification of the application by a person skilled in the art according to the above disclosure is within the protection scope of the claims.

Claims

1. A piping system, characterized by, The utility model relates to a vacuum pumping system, comprising: a first branch pipe, a first machine table is connected to the rear end of the first branch pipe, a main pipe is connected to the front end of the first branch pipe, the first machine table obtains required vacuum supply from the main pipe through the first branch pipe, the front end of the first branch pipe connected to the main pipe is also provided with a first protection valve; a bypass pipe is connected to the first branch pipe, and the front end of the bypass pipe is located between the rear end of the first protection valve and the first machine table; a second vacuum pump is arranged at the rear end of the bypass pipe and connected to the first branch pipe through the bypass pipe, and a second protection valve is arranged between the second vacuum pump and the front end of the bypass pipe; the first protection valve is a check valve allowing gas flow from the first machine table to the main pipe in one direction, the second protection valve is a check valve allowing gas flow from the first machine table to the second vacuum pump in one direction, the opening and closing states of the first protection valve and the second protection valve are different; the second vacuum pump is electrically connected to a backup power supply, the backup power supply is powered by a backup power supply unit, the backup power supply is a UPS, and the backup power supply unit is a diesel power supply unit.

2. The plumbing system of claim 1, wherein, The first protection valve is provided with a pressure sensor for monitoring the main pipe.

3. The plumbing system of claim 1, wherein, The end of the first branch pipe after connecting to the bypass pipe is sequentially connected to the first machine table through a first branch pipe switch unit and a second branch pipe switch unit, and the bypass pipe is also provided with a bypass pipe switch unit between the front end connected to the first branch pipe and the second protection valve.

4. The plumbing system of claim 1, wherein, Further comprising: first and second switch units for controlling the opening and closing of gas flow at both ends of the main pipe.

5. The plumbing system of claim 4, wherein, The second switch unit is also connected to a first vacuum pump, and the first vacuum pump is electrically connected to a main power supply.

6. A semiconductor device, characterized by comprising: The utility model relates to a vacuum pumping system, comprising: a first branch pipe, a first machine table is connected to the rear end of the first branch pipe, a main pipe is connected to the front end of the first branch pipe, the first machine table obtains required vacuum supply from the main pipe through the first branch pipe, the front end of the first branch pipe connected to the main pipe is also provided with a first protection valve; a bypass pipe is connected to the first branch pipe, and the front end of the bypass pipe is located between the rear end of the first protection valve and the first machine table; a second vacuum pump is arranged at the rear end of the bypass pipe and connected to the first branch pipe through the bypass pipe, and a second protection valve is arranged between the second vacuum pump and the front end of the bypass pipe; the first protection valve is a check valve allowing gas flow from the first machine table to the main pipe in one direction, the second protection valve is a check valve allowing gas flow from the first machine table to the second vacuum pump in one direction, the opening and closing states of the first protection valve and the second protection valve are different; the second vacuum pump is electrically connected to a backup power supply, the backup power supply is powered by a backup power supply unit, the backup power supply is a UPS, and the backup power supply unit is a diesel power supply unit. The first protection valve is provided with a pressure sensor for monitoring the main pipe. The end of the first branch pipe after connecting to the bypass pipe is sequentially connected to the first machine table through a first branch pipe switch unit and a second branch pipe switch unit, and the bypass pipe is also provided with a bypass pipe switch unit between the front end connected to the first branch pipe and the second protection valve. Further comprising: first and second switch units for controlling the opening and closing of gas flow at both ends of the main pipe. The second switch unit is also connected to a first vacuum pump, and the first vacuum pump is electrically connected to a main power supply.

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