Display panel, preparation method thereof and display device

Abstract

The application discloses a display panel and a preparation method thereof and a display device. The display panel comprises a substrate and a planar layer covering the substrate, wherein a plurality of convex columns are arranged on the planar layer; a pixel definition layer is arranged on the planar layer, and a plurality of pixel openings are defined on the pixel definition layer, wherein the orthographic projection of the pixel openings on the substrate does not overlap with the orthographic projection of the convex columns on the substrate; and the pixel definition layer covers the convex columns in a conformal manner. The convex columns are prepared on the planar layer, and a plurality of hierarchical structures on the planar layer cover the convex columns in a conformal manner to form support column structures. The support columns after the conformal covering have the same shape as the convex columns, and a continuous hierarchical structure is formed on the surface of the convex columns. The shape of the support columns can be formed without patterning, the preparation of the display panel can be simplified, and the display effect is improved.

Description

Technical Field

[0001] This application generally relates to the field of display technology, and specifically to a display panel and its manufacturing method, and a display device. Background Technology

[0002] In existing display panel manufacturing processes, a pixel boundary layer (PDL) pattern is typically formed on a substrate. The PDL pattern has multiple openings that expose the anode. After the PDL pattern is formed, support pillars (PS) need to be fabricated on it. During PS fabrication, organic photosensitive materials are coated onto the substrate. These organic photosensitive materials are also coated onto the anode. Since the anode is located within the openings of the PDL, it is in a hole-like structure. After the exposure and development process to fabricate the isolation pillars, organic photosensitive materials can easily remain on the anode in the pixel area, which will affect the performance of the display panel and reduce its yield.

[0003] Therefore, in the existing technology, forming a PDL+PS structure requires two masking processes, which increases the cost of the product. Summary of the Invention

[0004] In view of the above-mentioned defects or deficiencies in the prior art, it is desirable to provide a display panel and its manufacturing method and display device, which can simplify the manufacturing of the display panel and improve the display effect.

[0005] In a first aspect, this application provides a display panel, including:

[0006] A substrate and a planarization layer covering the substrate, wherein a plurality of protrusions are provided on the planarization layer;

[0007] A pixel defining layer is disposed on the planarization layer, the pixel defining layer defining a plurality of pixel openings, the orthographic projection of the pixel openings on the substrate and the orthographic projection of the protrusion on the substrate do not overlap; the pixel defining layer conformally covers the protrusion.

[0008] Optionally, the transmittance of the pixel defining layer is less than the transmittance of the planarization layer.

[0009] Optionally, the pixel defining layer is a light-shielding material.

[0010] Optionally, the planarization layer is a positive photosensitive material, and the pixel defining layer is a negative photosensitive material.

[0011] Optionally, it also includes:

[0012] A light-emitting functional layer is disposed on the pixel defining layer. The light-emitting functional layer includes at least one common layer and a light-emitting layer. The common layer conformally covers the protrusion, and the light-emitting layer is located within the pixel opening.

[0013] Optionally, the height of the first surface of the common layer at the location of the boss to the substrate is greater than the height of the second surface of the common layer at other locations besides the boss to the substrate.

[0014] Optionally, the light-emitting layer forms multiple sub-pixels of different colors, with at least two adjacent sub-pixels of different colors corresponding to the same protrusion.

[0015] Optionally, the display panel includes a display area and a non-display area, and the display panel further includes an encapsulation layer, which includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer stacked at the position corresponding to the display area.

[0016] Optionally, the protrusion is disposed between the display area and the non-display area, and the pixel defining layer conformally covers the protrusion to form an isolation pillar, the isolation pillar being used to define the coverage area of ​​the organic encapsulation layer.

[0017] Optionally, the encapsulation layer includes a first inorganic encapsulation layer and a second inorganic encapsulation layer stacked at the location corresponding to the non-display area, and the first inorganic encapsulation layer and the second inorganic encapsulation layer are in contact on the side surface of the isolation pillar away from the display area.

[0018] Optionally, the pixel defining layer extends from the display area through the surface of the boss to the non-display area, and the display panel further includes a passivation layer disposed on the side of the isolation pillar away from the display area, the passivation layer being disposed on the side of the pixel defining layer away from the substrate.

[0019] Optionally, the display panel includes at least one isolation groove disposed on the side of the isolation pillar away from the display area. The isolation groove includes a first groove disposed on the pixel defining layer and a second groove disposed on the passivation layer. The orthographic projection of the first groove on the substrate at least covers the orthographic projection of the second groove on the substrate.

[0020] Optionally, the inner wall of the isolation groove is covered with the first inorganic encapsulation layer and the second inorganic encapsulation layer, and the first inorganic encapsulation layer and the second inorganic encapsulation layer are disposed in contact with each other on the inner wall of the isolation groove.

[0021] Secondly, this application provides a method for manufacturing a display panel, used to manufacture a display panel as described in any of the above descriptions, the method comprising:

[0022] Provide substrates;

[0023] A planarization layer is formed on the substrate, and the planarization layer is patterned to form a plurality of protrusions;

[0024] A pixel defining layer is formed on the planar layer, and the pixel defining layer is patterned to form a plurality of pixel openings. The orthographic projection of the pixel openings on the substrate does not overlap with the orthographic projection of the protrusion on the substrate. The pixel defining layer conformally covers the protrusion.

[0025] Thirdly, this application provides a display device including a display panel as described in any of the above.

[0026] The technical solutions provided by the embodiments of this application may include the following beneficial effects:

[0027] The display panel, its manufacturing method, and display device provided in this application embodiment are achieved by fabricating bosses on a planar layer, and then covering the bosses with multiple hierarchical structures on the planar layer to form support pillar structures. The support pillars after the hierarchical covering have the same shape as the bosses, and a continuous hierarchical structure is formed on the surface of the bosses. The shape of the support pillars can be formed without patterning, which can simplify the manufacturing of the display panel and improve the display effect. Attached Figure Description

[0028] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0029] Figure 1 This is a structural diagram of a display panel manufacturing process in the prior art;

[0030] Figure 2 A schematic diagram of the structure of a display panel provided for an embodiment of this application;

[0031] Figure 3 A top view of a display panel provided for an embodiment of this application;

[0032] Figure 4 A top view of another display panel provided for an embodiment of this application;

[0033] Figure 5 A schematic diagram of the structure of a display panel provided for an embodiment of this application;

[0034] Figure 6 A schematic diagram of the structure of another display panel provided for an embodiment of this application;

[0035] Figure 7 A flowchart illustrating a method for manufacturing a display panel, provided as an embodiment of this application;

[0036] Figure 8 A schematic diagram of the structure of a display panel provided for an embodiment of this application;

[0037] Figure 9 This is a schematic diagram of another display panel structure provided for an embodiment of this application. Detailed Implementation

[0038] The present application will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.

[0039] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0040] The present application will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.

[0041] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0042] In existing display panel manufacturing processes, a pixel boundary layer (PDL) pattern is typically formed on the substrate. This PDL pattern has multiple openings that expose the anode, such as... Figure 1 As shown in (I), after creating the pixel boundary layer graphic, support pillars (PS) are then created on the pixel boundary layer graphic, as follows. Figure 1 As shown in (II); after forming the support pillars, a light-emitting functional layer is subsequently formed above the pixel definition layer, as follows. Figure 1 As shown in (III). Therefore, forming the PDL+PS structure requires two masking processes.

[0043] Please see details. Figure 2 This application provides a display panel, including:

[0044] A substrate 1 and a planarization layer 2 covering the substrate 1, wherein a plurality of protrusions 3 are provided on the planarization layer 2;

[0045] A pixel defining layer 4 is disposed on the planarization layer 2, and a plurality of pixel openings 5 ​​are defined on the pixel defining layer 4. The orthographic projection of the pixel openings 5 ​​on the substrate 1 does not overlap with the orthographic projection of the protrusion 3 on the substrate 1. The pixel defining layer 4 covers the protrusion 3 in a conformal manner.

[0046] In this embodiment, by setting a protrusion 3 on the planarization layer 2, and then covering the surface of the protrusion 3 with a pixel defining layer 4, a support pillar 11 with the same shape as the protrusion 3 is formed, which can effectively support the subsequent fabrication of the display panel layer structure. The support pillar 11 formed in this way can avoid the need for multiple coating, exposure, and development processes required by the existing PDL+PS formation scheme, and at the same time avoid the easy residue of organic photosensitive material on the anode 6 in the pixel area, which can simplify the fabrication of the display panel and improve the display effect.

[0047] It is understood that in the embodiments of this application, multiple hierarchical structures on the upper layer 2 conformally cover the boss 3 to form a support column 11 structure. The support column 11 after conformal coverage has the same shape as the boss 3. At the same time, a continuous hierarchical structure is formed on the surface of the boss 3, and the shape of the support column 11 can be formed without patterning.

[0048] In this embodiment, the substrate 1 is a thin-film transistor array substrate, wherein the substrate 1 includes a pixel driving circuit, gate lines, data lines, power lines, etc., for driving organic light-emitting elements. Typically, the pixel driving circuit for each sub-pixel includes a driving transistor, a switching transistor, a capacitor, etc., and is electrically connected to the corresponding gate lines, data lines, and power lines.

[0049] In this embodiment, the driving transistor can be a top-gate structure, a bottom-gate structure, or a dual-gate structure; this application is not limited in this regard. This embodiment uses a top-gate structure as an example, wherein the top-gate driving transistor includes an active layer, a gate insulating layer, a gate layer, an interlayer dielectric layer (ILD), a source / drain metal layer 7, and a passivation layer, which are sequentially stacked. The source or drain of this driving transistor is electrically connected to the anode 6 of the organic light-emitting element.

[0050] In this embodiment, since the TFTs and electrodes on the substrate 1 use metals with high electrical conductivity, these metal electrodes or metal wires have strong reflective capabilities. When light shines on these metal electrodes and metal wires, specular reflection occurs, affecting the display quality. Furthermore, since the planarization layer 2 of the display panel generally uses transparent or nearly transparent organic materials, external light can directly enter the display panel and reach the substrate 1, causing display problems.

[0051] In order to reduce the reflection problem caused by metal traces, etc., in this embodiment of the application, the transmittance of the pixel defining layer 4 is less than the transmittance of the planarization layer 2. By reducing the transmittance of the pixel defining layer 4 disposed on the planarization layer 2, the amount of external light incident from the pixel defining layer 4 to the planarization layer 2 and reaching the substrate 1 can be reduced, thereby reducing the reflection problem caused by metal traces, etc.

[0052] Preferably, the pixel defining layer 4 is a light-shielding material. In addition to reducing metallic reflection from the substrate 1, the pixel defining layer 4 also serves to shield against light, preventing color mixing between adjacent pixels and increasing the viewing angle of the display panel. For example, an organic black pigment can be added to an organic material. This organic black pigment can be, for example, lactam-based organic black, RGB black, RVB black, etc.

[0053] In existing technologies, the pixel defining layer 4 is typically formed using a patterning process. The forming material of the pixel defining layer 4 mainly includes a light-transmitting photosensitive resin, allowing light to penetrate the pixel defining layer 4 material during exposure. Then, through processes such as development, the pattern of the pixel defining layer 4 is formed. To form a pixel defining layer 4 with light-shielding properties, a light-shielding material can be selected as the forming material. However, this would make it difficult for light to penetrate the light-shielding pixel defining layer 4 material during exposure, resulting in incomplete exposure and preventing the formation of the desired pixel defining layer 4 pattern.

[0054] Therefore, in order to form the pattern of the pixel defining layer 4, in this embodiment, the pixel defining layer 4 is a negative photosensitive material. It should be noted that in this embodiment, the material of the planarization layer 2 can be either a positive or negative photosensitive material. This embodiment uses a negative photosensitive material for the planarization layer 2 as an example for illustrative purposes.

[0055] Since the pixel defining layer 4 is a photosensitive material, there is no need to coat the pixel defining layer 4 with photoresist during the patterning process. It is only necessary to expose the pixel defining layer 4 and develop the exposed pixel defining layer 4 to form the pixel defining layer 4.

[0056] In this embodiment, the pixel defining layer 4 is a negative photosensitive material. At this time, after developing the exposed pixel defining layer 4, the areas in the pixel defining layer 4 that are not illuminated by light (i.e., the corresponding areas that form the pixel opening 5) can be removed, while the areas in the pixel defining layer 4 that are refracted by light (i.e., the other corresponding areas besides the pixel opening 5) cannot be removed.

[0057] In this embodiment, the pixel defining layer 4 is formed by adding organic black pigment to a negative photosensitive material to form a negative adhesive layer with light-shielding properties. The pixel opening 5 area is formed by the negative adhesive layer with light-shielding properties. This can avoid the material residue caused by using positive light-shielding materials, which makes it difficult for light to penetrate the light-shielding pixel defining layer 4. This simplifies the manufacturing of the display panel and improves the display effect.

[0058] The display panel in this embodiment can be an active-matrix display panel, such as an organic light-emitting diode (OLED) display panel, an active-matrix organic light-emitting diode (AMOLED) display panel, a passive-matrix organic light-emitting diode (AMOLED) display panel, a quantum dot organic light-emitting diode (QLED) display panel, etc.

[0059] The display panel in this application embodiment can also be a liquid crystal display panel. This application does not limit the type of display panel. It can be a vertical electric field type liquid crystal display panel, such as a twisted nematic (TN) type liquid crystal display panel or a multi-domain vertical alignment (MVA) type liquid crystal display panel. It can also be a horizontal electric field type liquid crystal display panel, such as a fringe field switching (FFS) type liquid crystal display panel or an in-plane switching (IPS) type liquid crystal display panel.

[0060] It should be noted that the arrangement of the protrusion 3 in this embodiment forms the support column 11, which can be applied to organic light-emitting display panels and liquid crystal display panels. The support column 11 is used to support the mask used in the fabrication process of each film layer in the organic light-emitting diode process, and can also serve to support the liquid crystal layer in the liquid crystal display panel embodiment. In this embodiment, an OLED display panel is used as an example for illustrative purposes.

[0061] The display panel described in this embodiment further includes:

[0062] A light-emitting functional layer is disposed on the pixel defining layer 4. The light-emitting functional layer includes at least one common layer 9 and a light-emitting layer 10. The common layer 9 covers the boss 3 in a conformal manner, and the light-emitting layer 10 is located inside the pixel opening 5.

[0063] It is understood that the light-emitting functional layer in this application embodiment can adopt various existing OLED structures. Exemplarily, the light-emitting functional layer includes a hole injection layer (HIL), a hole transport layer (HTL), an emitting layer (EML), a hole blocking layer (HBL), an electron transport layer (ETL), and an electron injection layer (EIL) arranged sequentially from the anode 6 to the cathode. Among them, EML is a non-common layer 9, and the other layers are common layers 9.

[0064] The light-emitting layer 10 forms a plurality of sub-pixels with different colors. In the embodiments of this application, the sub-pixels include red (R) sub-pixels, green (G) sub-pixels, and blue (B) sub-pixels, but the present invention is not limited thereto. The sub-pixels can also be described as a first sub-pixel, a second sub-pixel, and a third sub-pixel, and the first, second, and third sub-pixels can also be cyan, magenta, and yellow. In addition, the pixels can also include white sub-pixels.

[0065] In this embodiment, the protrusion 3 forms a support pillar 11 by conformally covering the pixel defining layer 4, the common layer 9, etc., on top of the protrusion 3. To provide better support during the fabrication of the light-emitting layer 10, the height of the first surface of the common layer 9 at the location of the protrusion 3 from the substrate 1 is greater than the height of the second surface of the common layer 9 at other locations besides the protrusion 3 from the substrate 1.

[0066] It should also be noted that this application does not limit the shape of the support pillar 11; its cross-sectional shape in the direction parallel to the substrate 1 can be circular, elliptical, trapezoidal, or other shapes. Similarly, this application does not limit the size of the support pillar 11. In one possible embodiment of this application, the display panel is arrayed with multiple sub-pixels, the number of support pillars 11 is the same as the number of sub-pixels, and the support pillars 11 corresponding to sub-pixels of the same color are located on the same side of the pixel opening 5.

[0067] In the manufacturing process of the support pillar 11, unavoidable process deviations cause differences in the height of the support pillar 11, resulting in an excessively high density or an excessive number of support pillars, which increases the variability in the fabrication of the support pillars 11. Conversely, if the density or number of support pillars is too low, the support for the mask in subsequent process stages will be insufficient or the support points will be uneven, leading to mask skewness and affecting the accuracy of the organic light-emitting diode process.

[0068] Preferably, the support pillars 11 are evenly distributed on the display panel, resulting in good support and ensuring the process accuracy of each area. In some possible embodiments, to reduce manufacturing errors and the area occupied by the support pillars 11, the number of support pillars 11 can be reduced, allowing multiple adjacent pixels to share the same support pillar 11, thus ensuring the yield of the sub-pixel evaporation process and guaranteeing the display effect.

[0069] Therefore, in this embodiment, at least two adjacent sub-pixels of different colors correspond to the same protrusion 3. It is understood that the arrangement of sub-pixels may vary depending on their color, and this application does not limit this. In some embodiments, adjacent sub-pixels of different colors may be a first sub-pixel and a second sub-pixel, such as... Figure 3 As shown, the first sub-pixel and the second sub-pixel correspond to the same protrusion 3; in other embodiments, adjacent sub-pixels of different colors can also be the first sub-pixel, the second sub-pixel, and the third sub-pixel, such as... Figure 4 As shown, the first sub-pixel, the second sub-pixel, and the third sub-pixel correspond to the same protrusion 3. In specific applications, the number of sub-pixels sharing the same protrusion 3 is determined according to the device or application scenario.

[0070] It should be noted that, in the embodiments of this application, the arrangement of sub-pixels in each pixel unit is not limited. The arrangement of sub-pixels can be strip-shaped, island-shaped, mosaic-shaped, or triangular. The shape of each sub-pixel can be polygonal, such as quadrilateral or hexagonal; it can also be non-polygonal, such as circular or elliptical. The embodiments of this invention do not limit this.

[0071] Optionally, the display panel further includes an encapsulation layer 12, which prevents external water and oxygen from entering the interior of the display panel through the opening area, thus avoiding damage to the display function caused by water and oxygen intrusion. The display panel includes a display area A1 and a non-display area A2. The encapsulation layer 12 includes a first inorganic encapsulation layer 13, an organic encapsulation layer 14, and a second encapsulation layer 15 sequentially formed on the light-emitting layer 10 at the location corresponding to the display area A1.

[0072] In another embodiment of this application, the protrusion is disposed between the display area A1 and the non-display area A2, and the protrusion 3 forms an isolation pillar 16 by conformally covering the pixel defining layer 4 and the light-emitting functional layer on the protrusion 3, such as Figure 5 As shown. The isolation pillar 16 is used to isolate the organic encapsulation layer 14 in the encapsulation layer 12 to form a coverage area defining the organic encapsulation layer 14. The encapsulation layer 12 is flush with the upper surface of the display area A1 on the side away from the substrate 1.

[0073] The display panel is divided into a display area A1 and an isolation area. By forming isolation pillars 16 in the isolation area, the organic light-emitting layer 10 and the cathode layer can be blocked while the encapsulation layer 12 is covered. At the same time, a shielding part is formed on the isolation pillars 16, so that the structure formed by the isolation pillars 16 can block the organic layer and the cathode layer, and can also enhance the effect of blocking the extension of the encapsulation layer 12.

[0074] In this embodiment, the isolation area can be located between the display area A1 and the opening area, or it can be located between the display area A1 and the non-display area A2. This embodiment is not limited in this respect. The opening area can be used to form a camera component, etc. The opening area can also be provided with one or more isolation grooves 8. Multiple isolation grooves 8 can be arranged sequentially and at intervals on the non-display area to prevent moisture intrusion and improve the encapsulation effect of the opening area.

[0075] The isolation pillar 16 includes a first side surface 17 near the display area A1, a second side surface 18 away from the display area A1, and a top surface 19 located between the first side surface 17 and the second side surface 18. A first inorganic encapsulation layer 13 conformally covers the first side surface 17, the top surface 19, and the second side surface 18, extending to the opening area (or non-display area A2). The upper surface of the organic encapsulation layer 14 may be flush with or nearly flush with the upper surface of the isolation pillar 16. A second inorganic encapsulation layer 15 extends from the display area A1 through the top surface 19, along the second side surface 18, and to the opening area. The encapsulation layer 12 includes the first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 stacked at a location corresponding to the non-display area A2, with the first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 contacting the side surface of the isolation pillar away from the display area.

[0076] To form an effective encapsulation structure, the isolation trench 8 consists of two or more film layers, with the upper layer forming an eave and the lower layer forming an undercut concave shape. Generally, the upper layer is an inorganic layer or a metal, alloy, or organic layer, and the lower layer is an organic layer or an inorganic layer, etc.

[0077] For example, such as Figure 6As shown, in this application, the isolation trench 8 is formed by two layers: a pixel defining layer 4 and a passivation layer 26, which are stacked together. The passivation layer 26 is disposed on the side of the pixel defining layer 4 away from the substrate 1. The isolation trench 8 includes a first groove 24 located on the pixel defining layer 4 and a second groove 25 located on the passivation layer 26. The orthographic projection of the first groove 24 on the substrate 1 at least covers the orthographic projection of the second groove 25 on the substrate 1. That is, the projection area of ​​the first groove 24 on the substrate is larger than the projection area of ​​the second groove 25 on the substrate. This creates a shielding structure between the inner and outer walls of the isolation trench 8, preventing the light-emitting layer from covering the bottom of the groove and thus breaking it off. This forms a structure that blocks the light-emitting layer, preventing water and oxygen from invading the display area of ​​the display panel along the organic light-emitting layer and affecting the stability of the display panel.

[0078] In some embodiments, the first groove 24 and the second groove 25 can be formed by having an etching selectivity of the passivation layer 26 that is less than the etching selectivity of the pixel defining layer 4. The passivation layer 26 is etched to the portion corresponding to the non-display area A2, so that the passivation layer 26 forms a second groove 25 exposing the pixel defining layer 4. Etching fluid is then brought into contact with the pixel defining layer 4 through the second groove 25 to form a first groove 24 communicating with the second groove 25.

[0079] In some embodiments, the pixel defining layer uses a negative photosensitive material. Areas in the pixel defining layer 4 that are not illuminated by light (i.e., the corresponding areas forming the first groove 24) can be removed, while areas in the pixel defining layer 4 that are refracted by light (i.e., other corresponding areas besides the first groove 24) cannot be removed. In this embodiment, the passivation layer uses a transparent material, which can effectively achieve the concave shape of the isolation groove without controlling the etching selectivity. The structure of the second groove 25 can be formed using etching or laser methods, such as dry etching.

[0080] In addition, in this embodiment, the pixel defining layer 4 uses a negative photosensitive material with added organic black pigment to form a negative adhesive layer with light-shielding properties, thereby reducing the reflection problem of metal traces in the non-display area A2 or the opening area.

[0081] In this embodiment, the organic encapsulation layer 14 is blocked by the isolation pillar 16 and does not cover the entire isolation pillar 16. The first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 are in contact on the top surface 19 and the second side surface 18 of the isolation pillar 16. The contact between the first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 effectively extends the moisture entry path and improves the isolation effect. The first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 on the inner sidewall of the isolation groove 8 are continuously arranged, and the first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 are in contact with the inner sidewall of the isolation groove. The continuously arranged first inorganic encapsulation layer 13 and the second inorganic encapsulation layer 15 can form a stable integral structure, which can effectively cover and support the sidewall of the isolation groove 8, further reducing the probability of the isolation groove 8 breaking or cracking.

[0082] In this embodiment, the display panel further includes an FMLOC layer 20 (Flexible Multi-Layer On Cell) and a color filter layer 21 disposed on the side of the encapsulation layer 12 away from the substrate. The color filter layer 21 includes a plurality of color filters 22 and a black matrix 23; the plurality of color filters 22 are arranged in an array; the black matrix 23 separates the plurality of color filters 22. Typically, the color filters may include a red filter, a green filter, and a blue filter, with each color filter 22 corresponding to a sub-pixel of the same color. By utilizing the plurality of color filters 22 and the black matrix 23, the light transmittance of the display panel is improved while preventing at least a portion of the reflected light from the external ambient light from escaping outside the display panel, thereby improving the display effect of the display device and reducing the power consumption of the display device.

[0083] like Figure 7 As shown, this application also provides a method for manufacturing a display panel, used to manufacture a display panel as described in any of the above descriptions, the method comprising:

[0084] S01, Provide substrate 1;

[0085] S02, A planarization layer 2 is formed on the substrate 1, and the planarization layer 2 is patterned to form a plurality of protrusions 3;

[0086] S03. A pixel defining layer 4 is formed on the planarization layer 2, and the pixel defining layer 4 is patterned to form a plurality of pixel openings 5. The orthographic projection of the pixel openings 5 ​​on the substrate 1 does not overlap with the orthographic projection of the protrusion 3 on the substrate 1. The pixel defining layer 4 covers the protrusion 3 in a conformal manner.

[0087] Step S01 includes a method for forming a thin-film transistor on a substrate, the method comprising an active layer, a gate insulating layer, a gate layer, an interlayer dielectric layer (IDL), and a source / drain metal layer 7 sequentially stacked on the substrate.

[0088] In an optional embodiment of this application, in step S02, the planarization layer 2 is a positive photosensitive material, and the patterning of the planarization layer 2 forms a plurality of protrusions 3, such as... Figure 8 As shown, the method includes:

[0089] S201. The positive photosensitive material is covered on the substrate 1 to form a first material layer; the first material layer includes a first region D1 corresponding to the location of the protrusion 3 and a second region D2 corresponding to the location other than the protrusion 3.

[0090] S202, Expose the second region D2 of the first material layer using the first mask;

[0091] S203. Develop the first material layer to remove the first material layer in the second region D2 to form a plurality of protrusions 3.

[0092] In an optional embodiment of this application, in step S03, the pixel defining layer 4 is a negative photosensitive material, and the pixel defining layer 4 is patterned to form a plurality of pixel openings 5, such as... Figure 9 As shown, the method includes:

[0093] S301. The negative photosensitive material is covered on the planar layer 2 to form a second material layer. The second material layer includes a third region D3 corresponding to the location of the pixel opening 5 and a fourth region D4 corresponding to the location other than the pixel opening 5.

[0094] S302. Expose the fourth region D4 of the second material layer using the second mask;

[0095] S303. Develop the second material layer to remove the second material layer in the third region D3 to form multiple pixel openings 5.

[0096] Based on the same inventive concept, this application provides a display device, including a display panel as described above. The specific structure of the display panel has been described in detail in the above embodiments and will not be repeated here. The display device in this application can be a television, or a PC, smartphone, tablet computer, e-book reader, MP3 (Moving Picture Experts Group Audio Layer III) player, MP4 (Moving Picture Experts Group Audio Layer IV) player, portable computer, or other devices with display functions.

[0097] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0098] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0099] Unless otherwise defined, the technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. The terminology used herein is for descriptive purposes only and is not intended to limit the invention. Terms such as “set” appearing herein can refer to either a component being directly attached to another component or a component being attached to another component via an intermediary. A feature described in one embodiment herein may be applied, alone or in combination with other features, to another embodiment, unless that feature is not applicable in that other embodiment or is otherwise stated.

[0100] The present invention has been described through the above embodiments; however, it should be understood that the above embodiments are for illustrative purposes only and are not intended to limit the present invention to the described embodiments. Those skilled in the art will understand that many variations and modifications can be made based on the teachings of the present invention, and all such variations and modifications fall within the scope of protection claimed by the present invention.

Claims

1. A display panel, characterized in that, include: A substrate and a planarization layer covering the substrate, wherein a plurality of protrusions are provided on the planarization layer; A pixel defining layer is disposed on the planarization layer, the pixel defining layer defining a plurality of pixel openings, the orthographic projection of the pixel openings on the substrate and the orthographic projection of the protrusion on the substrate do not overlap; the pixel defining layer conformally covers the protrusion; A pixel-defining layer covers the surface of the boss shape, forming a support column with the same shape as the boss. The pixel defining layer is a light-shielding material; The orthographic projection of the pixel opening on the substrate and the orthographic projection of the protrusion on the substrate are spaced apart in the horizontal direction, and the pixel defining layer covers the portion of the planar layer located in the spaced area, the side surface of the protrusion, and the top surface. The display panel includes a display area and a non-display area, and the display panel also includes an encapsulation layer, which includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer stacked at the position corresponding to the display area. The protrusion includes a first protrusion disposed between the display area and the non-display area, and a second protrusion disposed in the display area, wherein the pixel defining layer conformally covers the first protrusion to form an isolation pillar.

2. The display panel according to claim 1, characterized in that, The transmittance of the pixel-defining layer is less than that of the planarization layer.

3. The display panel according to claim 1, characterized in that, The planarization layer is a positive photosensitive material, and the pixel defining layer is a negative photosensitive material.

4. The display panel according to claim 1, characterized in that, Also includes: A light-emitting functional layer is disposed on the pixel defining layer. The light-emitting functional layer includes at least one common layer and a light-emitting layer. The common layer conformally covers the protrusion, and the light-emitting layer is located within the pixel opening.

5. The display panel according to claim 4, characterized in that, The height of the first surface of the common layer at the location of the boss to the substrate is greater than the height of the second surface of the common layer at other locations besides the boss to the substrate.

6. The display panel according to claim 4, characterized in that, The light-emitting layer forms multiple sub-pixels of different colors, and at least two adjacent sub-pixels of different colors correspond to the same protrusion.

7. The display panel according to claim 1, characterized in that, The isolation pillars are used to define the coverage area of ​​the organic encapsulation layer.

8. The display panel according to claim 1, characterized in that, The encapsulation layer includes a first inorganic encapsulation layer and a second inorganic encapsulation layer stacked at the location corresponding to the non-display area, and the first inorganic encapsulation layer and the second inorganic encapsulation layer are in contact on the side surface of the isolation pillar away from the display area.

9. The display panel according to claim 1, characterized in that, The pixel defining layer extends from the display area through the surface of the boss to the non-display area. The display panel also includes a passivation layer disposed on the side of the isolation pillar away from the display area. The passivation layer is disposed on the side of the pixel defining layer away from the substrate.

10. The display panel according to claim 9, characterized in that, The display panel includes at least one isolation groove on the side of the isolation pillar away from the display area. The isolation groove includes a first groove disposed on the pixel defining layer and a second groove disposed on the passivation layer. The orthogonal projection of the first groove on the substrate at least covers the orthogonal projection of the second groove on the substrate.

11. The display panel according to claim 10, characterized in that, The inner wall of the isolation groove is covered with the first inorganic encapsulation layer and the second inorganic encapsulation layer, and the first inorganic encapsulation layer and the second inorganic encapsulation layer are in contact with each other on the inner wall of the isolation groove.

12. A method for manufacturing a display panel, characterized in that, The method for preparing a display panel as described in any one of claims 1-11 includes: Provide substrates; A planarization layer is formed on the substrate, and the planarization layer is patterned to form a plurality of protrusions; A pixel defining layer is formed on the planar layer, and the pixel defining layer is patterned to form a plurality of pixel openings. The orthographic projection of the pixel openings on the substrate does not overlap with the orthographic projection of the protrusion on the substrate. The pixel defining layer conformally covers the protrusion. The orthographic projection of the pixel opening on the substrate and the orthographic projection of the protrusion on the substrate form a gap region in the horizontal direction. The pixel defining layer covers the portion of the planar layer located in the gap region, the side surface of the protrusion, and the top surface. The display panel includes a display area and a non-display area, and an encapsulation layer is formed at the position corresponding to the display area. The encapsulation layer includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer stacked together. A first protrusion is formed between the display area and the non-display area, and a second protrusion is formed in the display area. The pixel defining layer is conformally covered on the first protrusion to form an isolation pillar.

13. A display device, characterized in that, Includes the display panel as described in any one of claims 1-11.

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