Process gas introduction assembly

Abstract

The application discloses a process gas introduction assembly, which comprises a vacuum connector main body, an air inlet pipeline is arranged on the upper end of the vacuum connector main body, and a vacuum connector inlet source mechanism is further arranged, the upper end of the vacuum connector inlet source mechanism is in sealing and fixed connection with the lower end of the vacuum connector main body, and the inside of the vacuum connector inlet source mechanism is communicated with the inside of the vacuum connector main body. The application solves the problem of pipeline blockage caused by the reaction between different sources from the root, accelerates the transmission rate of the source, and helps to improve the working efficiency of the whole device.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of vacuum semiconductor technology, and particularly relates to a process gas introduction assembly. BACKGROUND

[0002] Atomic layer deposition is a method (technology) for forming a deposition film by alternately passing gas phase precursors into a reactor and chemically adsorbing and reacting on a deposition substrate. When the precursors reach the surface of the deposition substrate, they will chemically adsorb on the surface and undergo surface reactions. The atomic layer deposition reactor needs to be cleaned with an inert gas between precursor pulses. Therefore, whether the deposition reaction precursor substance can be chemically adsorbed on the surface of the deposited material is the key to realizing atomic layer deposition.

[0003] The process of chemically adsorbing deposition reaction precursor substances on the surface of the deposited material is generally referred to as wafer reaction. Wafer reaction is generally connected to the source through a pipeline, and then the source is sent into the cavity along the path of the pipeline by the carrier gas, and the cavity is heated to allow the wafer to react with the source in a high-temperature environment. However, when two or more sources enter the cavity through the pipeline at the same time, the two sources or multiple sources will usually react before entering the cavity due to the lack of guidance, and over time, the reaction products will adhere to the pipeline, causing pipeline blockage and even affecting the wafer reaction results. Therefore, there is an urgent need in the existing society for a process gas introduction assembly that can guide the reaction gas into the reaction cavity without causing pipeline blockage and reaction contamination. SUMMARY

[0004] The purpose of the present application is to provide a process gas introduction assembly to solve the problems raised in the background art.

[0005] To achieve the above purpose, the present application provides the following technical solution: a process gas introduction assembly, comprising a vacuum connector main body, the upper end of the vacuum connector main body is provided with a gas inlet pipeline, further comprising a vacuum connector source inlet mechanism, the upper end of the vacuum connector source inlet mechanism is sealingly and fixedly connected with the lower end of the vacuum connector main body, and the inside of the vacuum connector source inlet mechanism is in communication with the inside of the vacuum connector main body.

[0006] Further, the inside of the vacuum connector main body is provided with a gas source transmission hole, the gas source transmission hole penetrates the bottom of the vacuum connector main body and is in communication with the gas inlet pipeline and the vacuum connector source inlet mechanism.

[0007] Further, a purge pipeline is further included, the purge pipeline is arranged on one side of the gas inlet pipeline, one end of the purge pipeline is in communication with the inside of the vacuum connector source inlet mechanism through a purge transmission hole, and the purge transmission hole is arranged in the inside of the vacuum connector main body.

[0008] Further, the air inlet pipeline comprises an A-source air inlet pipeline and a B-source air inlet pipeline, which are arranged on both sides of the upper end of the vacuum connector source mechanism, and the A-source air inlet pipeline and the B-source air inlet pipeline are communicated with the inside of the vacuum connector source mechanism through the air source transmission hole.

[0009] Further, the air source transmission hole comprises an A-source transmission hole and a B-source transmission hole, the A-source air inlet pipeline is communicated with the inside of the vacuum connector source mechanism through the A-source transmission hole, and the B-source air inlet pipeline is communicated with the inside of the vacuum connector source mechanism through the B-source transmission hole.

[0010] Further, the vacuum connector source mechanism comprises a vacuum connector transition plate and a source pipeline, the source pipeline is welded to the lower end of the vacuum connector transition plate, and the vacuum connector transition plate and the source pipeline are communicated with each other.

[0011] The A-source air inlet pipeline and the B-source air inlet pipeline are communicated with the source pipeline through the air source transmission hole and the vacuum connector transition plate, and the purge pipeline is communicated with the vacuum connector transition plate through the purge transmission hole.

[0012] Further, the vacuum connector transition plate is provided with an A-source through hole, a B-source through hole and a purge through hole, the A-source through hole is arranged on one side of the B-source through hole, and the purge through hole is annularly arranged on the outside of the A-source through hole and the B-source through hole.

[0013] The A-source air inlet pipeline is communicated with the A-source through hole, the B-source air inlet pipeline is communicated with the B-source through hole, and the purge pipeline is communicated with the purge through hole.

[0014] Further, the end of the A-source through hole and the B-source through hole is provided with a reaction source sealing ring channel, and the end of the purge through hole is provided with a purge sealing ring channel.

[0015] Further, the reaction source sealing ring channel is provided with a reaction source sealing ring, and the purge sealing ring channel is provided with a purge sealing ring.

[0016] Further, the source pipeline comprises an A-source pipeline and a B-source pipeline, the A-source pipeline and the B-source pipeline are parallel to each other, the A-source air inlet pipeline is communicated with the A-source pipeline, and the B-source air inlet pipeline is communicated with the B-source pipeline.

[0017] Technical effects and advantages of the present application:

[0018] (1) the process gas introduction assembly of the present application is provided with a plurality of gas inlet pipes and a plurality of gas source transmission channels, and each gas inlet pipe corresponds to a gas source transmission channel, and there is no any intersection between the gas inlet pipes and the gas inlet pipes, and between the gas source transmission channels and the gas source transmission channels, so that in the process of introducing a plurality of sources, the cross contamination between different sources is avoided, and the normal operation of the pipeline is ensured;

[0019] (2) the process gas introduction assembly of the present application is provided with a vacuum connecting piece source introduction mechanism, which can fully separate different sources during normal transmission, without any contact, thereby solving the problem of pipeline blockage caused by the reaction between different sources, and the outlet of the source pipeline is provided with a notch, which can accelerate the transmission rate of the source, thereby improving the overall working efficiency of the device;

[0020] (3) the process gas introduction assembly of the present application is provided with a blowing mechanism, which can isolate different sources by blowing gas during the transmission of different sources, and also can accelerate the transmission of the source in the pipeline, thereby helping to improve the overall transmission rate of the device. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 is a structural schematic view of the process gas introduction assembly of the present application;

[0022] Figure 2 is an exploded view of the process gas introduction assembly of the present application;

[0023] Figure 3 is a sectional view of the vacuum connecting piece main body (with load gas inlet pipe);

[0024] Figure 4 is a sectional view of the vacuum connecting piece main body (with inlet pipe);

[0025] Figure 5 is a partial bottom view of the vacuum connecting piece main body;

[0026] Figure 6 is a structural schematic view of the vacuum connecting piece source introduction mechanism of the present application;

[0027] Figure 7 is a top view of the vacuum connecting piece transition plate of the present application;

[0028] Component name corresponding to the label in the figure:

[0029] In the figure: 1, vacuum connector main body; 2, A source air inlet pipeline; 3, B source air inlet pipeline; 4, purge pipeline; 5, vacuum connector transition plate; 6, source inlet pipeline; 601, A source pipeline; 602, B source pipeline; 7, purge sealing ring; 8, reaction source sealing ring; 9, purge transmission channel; 10, A source transmission channel; 11, B source transmission channel; 12, A source through hole; 13, B source through hole; 14, purge through hole; 15, purge sealing ring channel; 16, reaction source sealing ring channel. DETAILED DESCRIPTION

[0030] The specific embodiments of the present application will be further described below with reference to the drawings. It should be noted that the description of these embodiments is used to help understand the present application, but does not constitute a limitation on the present application. In addition, the technical features involved in the various embodiments of the present application described below can be combined with each other as long as they do not conflict with each other.

[0031] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0032] In addition, the terms "first", "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can include at least one of the features explicitly or implicitly. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0033] Example 1

[0034] The present embodiment provides a process gas introduction assembly, referring to Figure 1 As can be seen from the figure, the process gas introduction assembly comprises a vacuum connector main body 1 and a vacuum connector source inlet mechanism, the lower end of the vacuum connector main body 1 is sealingly and fixedly connected with the upper end of the vacuum connector source inlet mechanism, and the inside of the vacuum connector main body 1 is communicated with the inside of the vacuum connector source inlet mechanism.

[0035] In the embodiment, the vacuum connector body 1 comprises an air inlet pipe and a gas source transmission channel, wherein the air inlet pipe is distributed at the upper end of the vacuum connector body 1 and is in communication with the gas source transmission channel. Meanwhile, the gas source transmission channel is arranged in the interior of the vacuum connector body 1 and penetrates the bottom of the vacuum connector body 1, and the gas source transmission channel is in communication with the interior of the vacuum connector source mechanism.

[0036] From Figure 1 It can be seen that the air inlet pipe comprises an A-source air inlet pipe 2 and a B-source air inlet pipe 3, wherein the A-source air inlet pipe 2 and the B-source air inlet pipe 3 are oppositely distributed at the two sides of the upper end of the vacuum connector body 1, and the interface directions of the two are opposite. Meanwhile, the upper end of the vacuum connector body 1 is also distributed with a purge pipe 4, wherein the purge pipe 4 is arranged between the A-source air inlet pipe 2 and the B-source air inlet pipe 3, and the interface direction of the purge pipe 4 is the same as that of the B-source air inlet pipe 3.

[0037] Specifically, the gas source transmission channel comprises an A-source transmission channel 10 and a B-source transmission channel 11, wherein the A-source transmission channel 10 and the B-source transmission channel 11 are arranged in the interior of the vacuum connector body 1, and a purge transmission channel 9 is also arranged in the interior of the vacuum connector body 1, wherein the purge transmission channel 9, the A-source transmission channel 10 and the B-source transmission channel 11 all penetrate the bottom of the vacuum connector body 1. In the embodiment, the A-source air inlet pipe 2 is in communication with the A-source transmission channel 10, the B-source air inlet pipe 3 is in communication with the B-source transmission channel 11, and the purge pipe 4 is in communication with the purge transmission channel 9.

[0038] Referring to Figure 3 , Figure 4 and Figure 5 , it can be seen from the figure that the purge transmission channel 9, the A-source transmission channel 10 and the B-source transmission channel 11 are parallel to each other, and there is no intersection between the three. It is worth noting that the purge transmission channel 9 is provided with three, wherein two of the purge transmission channels 9 are parallel to each other, and the two parallel purge transmission channels 9 are both in communication with the third purge transmission channel 9, and the lower ends of the two parallel purge transmission channels 9 both penetrate the bottom of the vacuum connector body 1 and are located at the lower end of the third purge transmission channel 9, and the third purge transmission channel 9 is located at the upper end of the two parallel purge transmission channels 9 and is in communication with the two parallel purge transmission channels 9.

[0039] It is worth noting that the two parallel purge transmission channels 9 are parallel to the A-source transmission channel 10 and the B-source transmission channel 11, and the plane where the third purge transmission channel 9 is located is perpendicular to the plane where the A-source transmission channel 10 is located or the plane where the B-source transmission channel 11 is located.

[0040] That is to say, in the process of the operation of the process gas introduction assembly, different sources will enter the A source transmission hole 10 and the B source transmission hole 11 through the A source gas inlet pipeline 2 and the B source gas inlet pipeline 3, respectively, and then enter the vacuum connector source inlet mechanism. Since the gas inlet pipeline and the source transmission hole are in a one-to-one corresponding connection relationship, there is no intersection between the gas inlet pipelines and the source transmission holes during the source transmission process, thereby avoiding cross contamination between different sources during the introduction of multiple sources and ensuring the normal operation of the pipeline.

[0041] Embodiment 2

[0042] Embodiment 2 is designed as a process gas introduction assembly, which has the same basic structure as embodiment 1, and the difference lies in that Figure 2 As can be seen from the figure, the vacuum connector source inlet mechanism includes a vacuum connector transition plate 5 and a source inlet pipeline 6. The upper end of the vacuum connector transition plate 5 is sealingly and fixedly connected to the lower end of the vacuum connector main body 1, that is, the upper end of the vacuum connector transition plate 5 is fixedly connected to the lower end of the vacuum connector main body 1 by bolts, and the upper end of the vacuum connector transition plate 5 is sealingly connected to the lower end of the vacuum connector main body 1 by a sealing assembly. At the same time, the source inlet pipeline 6 is welded to the lower end of the vacuum connector transition plate 5, and the vacuum connector transition plate 5 and the source inlet pipeline 6 are connected in communication. It is worth noting that the A source gas inlet pipeline 2, the A source transmission hole 10 and the source inlet pipeline 6 are in communication, the B source gas inlet pipeline 3, the B source transmission hole 11 and the source inlet pipeline 6 are also in communication, and the purge pipeline 4, the purge transmission hole 9 and the vacuum connector transition plate 5 are in communication.

[0043] Referring to Figure 6 As can be seen from the figure, the vacuum connector transition plate 5 is provided with an A source through hole 12, a B source through hole 13 and a purge through hole 14, and the A source through hole 12, the B source through hole 13 and the purge through hole 14 all penetrate the vacuum connector transition plate 5. The A source through hole 12 is arranged on one side of the B source through hole 13, and the A source through hole 12 and the B source through hole 13 are both arranged inside the purge through hole 14, and the purge through hole 14 is annularly distributed outside the A source through hole 12 and the B source through hole 13.

[0044] Specifically, the A source gas inlet pipeline 2 communicates with the A source through hole 12, the B source gas inlet pipeline 3 communicates with the B source through hole 13, and the purge pipeline 4 communicates with the purge through hole 14. That is to say, in the process of source transmission, the A source gas inlet pipeline 2 transmits the source to the A source through hole 12 through the A source transmission hole 10, and then transmits the source to the source inlet pipeline 6 through the A source through hole 12. The B source gas inlet pipeline 3 transmits the source to the B source through hole 13 through the B source transmission hole 11, and then transmits the source to the source inlet pipeline 6 through the B source through hole 13.

[0045] In the embodiment, different sources will be transmitted into A source transmission hole 10 and B source transmission hole 11 through A source inlet pipeline 2 and B source inlet pipeline 3, respectively, and then transmitted to A source through-hole 12 and B source through-hole 13 by A source transmission hole 10 and B source transmission hole 11. The sources are transmitted to the inlet pipeline 6 by A source through-hole 12 and B source through-hole 13, and finally transmitted into the reaction cavity by the inlet pipeline 6. It is worth noting that during the transmission of the source, the purge gas will enter the purge transmission hole 9 through the purge pipeline 4, and then be transmitted to the purge through-hole 14 by the purge transmission hole 9. Since the purge through-hole 14 is annularly distributed outside the A source through-hole 12 and the B source through-hole 13, the purge gas can drive the source to be transmitted during the transmission of the purge gas. That is, during the transmission of different sources, different sources can be isolated by the purge gas, and the transmission of the source in the pipeline can also be accelerated, thereby helping to improve the overall transmission rate of the device.

[0046] Embodiment 3

[0047] Embodiment 3 is designed as a process gas introduction assembly, which has the same basic structure as embodiment 2, and the difference is that Figure 2 、 Figure 6 and Figure 7 As can be seen from the figure, the end of the A source through-hole 12 and the B source through-hole 13 is provided with a reaction source sealing ring 16, and the end of the purge through-hole 14 is provided with a purge sealing ring 15. During the specific installation process, the reaction source sealing ring 8 is placed in the reaction source sealing ring 16 at the end of the A source through-hole 12 and the B source through-hole 13, and the carrier gas sealing ring 7 is placed in the purge sealing ring 15 at the end of the purge through-hole 14. After placing the carrier gas sealing ring 7 and the reaction source sealing ring 8, connecting the vacuum connector main body 1 and the vacuum connector transition plate 5 by bolts, and then introducing the gas source through the A source inlet pipeline 2, the gas source through the B source inlet pipeline 3 and the purge gas through the purge pipeline 4, the three will not produce any cross contamination during transmission, and also can ensure the smoothness of transmission, not only improve the gas introduction rate, but also ensure the safety of gas transmission.

[0048] Embodiment 4

[0049] Embodiment 4 is designed as a process gas introduction assembly, which has the same basic structure as embodiment 2, and the difference is that Figure 6As shown in the figure, the source inlet pipeline 6 comprises an A source pipeline 601 and a B source pipeline 602, and the A source pipeline 601 and the B source pipeline 602 are parallel to each other. In the embodiment, the A source pipeline 601 is connected with the A source inlet pipeline 2 through the A source transmission hole 10 and the A source through hole 12. The B source pipeline 602 is connected with the B source inlet pipeline 3 through the B source transmission hole 11 and the B source through hole 13. It is worth noting that the blowing through hole 14 is connected with the blowing pipeline through the blowing transmission hole 9.

[0050] Specifically, in the process of ensuring the normal transmission of the source, due to the arrangement of the A source pipeline 601 and the B source pipeline 602, the different sources can be fully separated and will not contact each other, thereby fundamentally solving the problem of pipeline blockage caused by the reaction between different sources. At the same time, the cut is arranged at the outlet of the source inlet pipeline, which can accelerate the transmission rate of the source, thereby improving the overall working efficiency of the device.

[0051] Although the embodiments of the present application have been shown and described above, it should be understood that the above-mentioned embodiments are exemplary and should not be construed as limiting the present application, and those skilled in the art can make changes, modifications, replacements and variations to the above-mentioned embodiments within the scope of the present application.

Claims

1. A process gas introduction assembly comprising a vacuum connection main body, an upper end portion of said vacuum connection main body being provided with a gas inlet duct, characterized in that, The vacuum connector source mechanism is sealingly and fixedly connected with the lower end of the vacuum connector body, and the inside of the vacuum connector source mechanism communicates with the inside of the vacuum connector body; the inside of the vacuum connector body is provided with a gas source transmission channel which penetrates the bottom of the vacuum connector body and communicates with the gas inlet pipeline and the vacuum connector source mechanism; the gas inlet pipeline includes an A source gas inlet pipeline and a B source gas inlet pipeline, and the A source gas inlet pipeline and the B source gas inlet pipeline both communicate with the inside of the vacuum connector source mechanism through the gas source transmission channel; the vacuum connector source mechanism includes a vacuum connector transition plate and a source pipeline, the source pipeline is welded to the lower end of the vacuum connector transition plate, and the vacuum connector transition plate and the source pipeline communicate with each other; the A source gas inlet pipeline and the B source gas inlet pipeline both communicate with the source pipeline through the gas source transmission channel and the vacuum connector transition plate, and the purge pipeline communicates with the vacuum connector transition plate through the purge transmission channel; the vacuum connector transition plate is provided with an A source through hole, a B source through hole and a purge through hole, the A source through hole is arranged on one side of the B source through hole, and the purge through hole is annularly distributed on the outside of the A source through hole and the B source through hole; the A source gas inlet pipeline communicates with the A source through hole, the B source gas inlet pipeline communicates with the B source through hole, and the purge pipeline communicates with the purge through hole; the end of the A source through hole and the B source through hole is provided with a reaction source sealing ring channel, and the end of the purge through hole is provided with a purge sealing ring channel; the reaction source sealing ring channel is provided with a reaction source sealing ring, and the purge sealing ring channel is provided with a purge sealing ring.

2. The process gas introduction assembly of claim 1, wherein, The A source gas inlet pipeline and the B source gas inlet pipeline are respectively arranged on both sides of the upper end of the vacuum connector source mechanism.

3. The process gas introduction assembly of claim 2, wherein, The gas source transmission channel includes an A source transmission channel and a B source transmission channel, the A source gas inlet pipeline communicates with the inside of the vacuum connector source mechanism through the A source transmission channel, and the B source gas inlet pipeline communicates with the inside of the vacuum connector source mechanism through the B source transmission channel.

4. The process gas introduction assembly of claim 3, wherein, The source pipeline includes an A source pipeline and a B source pipeline, the A source pipeline and the B source pipeline are parallel to each other, the A source gas inlet pipeline communicates with the A source pipeline, and the B source gas inlet pipeline communicates with the B source pipeline. The source pipeline includes an A source pipeline and a B source pipeline, the A source pipeline and the B source pipeline are parallel to each other, the A source gas inlet pipeline communicates with the A source pipeline, and the B source gas inlet pipeline communicates with the B source pipeline.

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