Bias device and substrate processing equipment

Abstract

The present invention relates to a bias device and a substrate processing device, wherein the bias device comprises a bias power supply and a bias device. The bias power supply is provided with an electrode. The bias device is used to electrically connect to the electrode of the bias power supply, and to conduct the electric potential of the bias power supply electrode to an energized object. Specifically, the energized object is a substrate or a carrier. Further, the bias device is accommodated in an inner cavity so as to contact the energized object at a processing station. More specifically, the bias power supply has a positive electrode and a negative electrode, and the bias device conducts the electric potential of the negative electrode to the energized object. Under the elastic force of the elastic member, the movable conductor pushes the wheel body assembly, thereby pushing the wheel body assembly to the surface of the energized object, so that the movable conductor, the wheel body assembly and the surface of the energized object maintain stable contact, so that the energized object can always be a part of the overall electrode, ensuring that the processing process for the substrate remains stable.

Description

Technical Field

[0001] The present invention relates to the technical field of substrate processing, and in particular to a bias device and substrate processing equipment. Background Art

[0002] The substrate may need to undergo a variety of treatments before leaving the factory to meet the needs of the application. For example, glass, as a substrate, undergoes surface roughening treatment before leaving the factory to produce an anti-glare effect on the surface of the glass.

[0003] In some process steps, since an electric field is needed to move plasma or other particles relative to a substrate, an energized object such as a substrate or a carrier that carries the substrate needs to maintain electrical contact with a bias device so that the substrate forms part of the overall electrode.

[0004] Then, when the substrate needs to move relative to the bias device, it is difficult to maintain good contact between the substrate or the carrier and the bias device, which may cause the substrate to separate from the overall electrode, affecting the stability of the process. Summary of the invention

[0005] Based on this, it is necessary to provide a bias device and substrate processing equipment to address the problem that when the substrate needs to move relative to the bias device, it is difficult to maintain good contact between the substrate or carrier and the bias device, which may cause the substrate to separate from the overall electrode.

[0006] A biasing device, comprising:

[0007] A first bracket, used for connecting the support part;

[0008] a wheel assembly, movably connected to the first bracket and capable of moving relative to the first bracket in a predetermined direction; and

[0009] The conductive component comprises a movable conductor, an elastic member and a flexible conductor; the movable conductor is movably connected to the first bracket and can move relative to the first bracket along the predetermined direction; the elastic member is connected to the movable conductor and generates elastic force on the movable conductor so that the movable conductor is pressed against the wheel body component from the back side; the flexible conductor is connected to the movable conductor; the flexible conductor is also electrically connected to the electrode of the bias power supply.

[0010] In the above-mentioned bias device, when the energized object moves along the moving path, the wheel assembly contacts the energized object. The wheel assembly, the movable conductor and the flexible conductor are respectively conductive and in an electrically connected relationship. When the flexible conductor is electrically connected to the bias power supply electrode, the potential of the energized object can be kept consistent with the potential of the bias power supply electrode. Since the wheel assembly is movably connected to the first bracket and can move relative to the first bracket in a predetermined direction, when the predetermined direction is perpendicular to the moving path, the wheel assembly can adapt to the position change of the energized object in the direction perpendicular to the moving path. Under the elastic force of the elastic member, the movable conductor pushes the wheel assembly, thereby pushing the wheel assembly to the surface of the energized object, so that the movable conductor, the wheel assembly and the surface of the energized object maintain stable contact. In the case of the position change of the movable conductor, the flexible conductor maintains electrical connection with the movable conductor through the reserved length, so that the energized object can always be a part of the overall electrode, ensuring that the processing technology for the substrate remains stable.

[0011] In one embodiment, the conductive component further includes an end cap electrically connected to the flexible conductor; the end cap is connected to the first bracket.

[0012] In one embodiment, the first bracket includes a main frame and a locking piece detachably connected to the main frame; the main frame is provided with a through slot, and the movable conductor is movably arranged in the through slot; the end cap is accommodated in the locking piece.

[0013] In one embodiment, the biasing device further includes a second bracket having insulating properties; the first bracket is connected to the second bracket to be connected to the supporting portion through the second bracket.

[0014] In one embodiment, one of the first bracket and the second bracket is provided with a first adjustment hole, and the other is provided with a first mounting hole; the positions of the first adjustment hole and the first mounting hole match to allow a fastener to pass through.

[0015] In one embodiment, the second bracket is provided with a second adjustment hole; the position of the second adjustment hole matches with the second mounting hole provided on the support portion to pass a fastener.

[0016] In one embodiment, the first bracket is provided with a limiting groove; the wheel body assembly includes a wheel axle and a main wheel body connected to the wheel axle, and the wheel axle is passed through the limiting groove; the length of the limiting groove is greater than the diameter of the wheel axle; and the movable conductor is supported against the wheel axle.

[0017] In one embodiment, the wheel body assembly includes a wheel axle passing through the first bracket; both ends of the wheel axle are respectively connected to the main wheel bodies.

[0018] In one embodiment, the biasing device further includes a cover; the first bracket is accommodated in the cover; and the wheel assembly is at least partially exposed from the cover.

[0019] A substrate processing device includes a bias device. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A three-dimensional schematic diagram of a substrate processing device according to an embodiment of the present invention;

[0021] Figure 2 for Figure 1 The three-dimensional schematic diagram of the substrate processing equipment shown in another angle;

[0022] Figure 3 for Figure 2 A partial schematic diagram of a substrate processing apparatus is shown, with some wall panels hidden;

[0023] Figure 4 for Figure 3 A three-dimensional schematic diagram of a bias device in a substrate processing apparatus shown;

[0024] Figure 5 is an exploded schematic diagram of the biasing device shown in FIG4;

[0025] Figure 6 for Figure 5 A partial schematic diagram of the biasing device shown;

[0026] Figure 7 for Figure 5 A partial schematic diagram of the biasing device shown;

[0027] Figure 8 for Figure 7 An enlarged view of the biasing device at A shown;

[0028] Fig. 9 for Figure 4 The biasing device shown is a three-dimensional schematic diagram after being assembled with a cover body.

[0029] Reference numerals: 100, substrate processing device; 20, cavity device; 21, inner cavity; 22, top plate; 23, bottom plate; 24, wall plate; 25, reserved opening; 26, through opening; 30, moving device; 31, guide wheel; 40, plasma generating device; 50, biasing device; 51, first bracket; 511, main frame; 512, through groove; 513, locking member; 514, first adjustment hole; 515, limit Fixed groove; 52, wheel body assembly; 521, wheel axle; 522, main wheel body; 53, conduction assembly; 531, movable conductor; 532, elastic member; 533, flexible conductor; 534, end cap; 535, abutment portion; 54, second bracket; 541, first mounting hole; 542, second adjustment hole; 543, flat plate portion; 544, vertical plate portion; 55, fastener; 56, cover body; 57, insulating protective piece. DETAILED DESCRIPTION

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.

[0031] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0032] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0033] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0034] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0035] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only implementation method.

[0036] The technical solution provided by the embodiments of the present invention is described below in conjunction with the accompanying drawings.

[0037] Combination Figures 1 to 3 As shown, the present invention provides a substrate processing device 100 .

[0038] In some embodiments, the substrate processing device 100 can perform material removal processing, cleaning processing, or etching processing on the substrate. Figure 3 As shown, the substrate processing device 100 may have one or more inner chambers 21. After entering the inner chamber 21, the substrate may be cleaned, etched or otherwise processed. When the substrate processing device 100 has one inner chamber 21, the substrate processing device 100 may allow the substrate to enter or leave the inner chamber 21 by material transfer. When the substrate processing device 100 has multiple inner chambers 21, the substrate processing device 100 may also allow the substrate to enter another inner chamber 21 while leaving one inner chamber 21 by material transfer.

[0039] Further, the substrate includes glass, or other materials with composition or properties close to glass. The substrate may be in the form of a plate or a sheet. More specifically, in the cleaning process, the substrate processing device 100 may use an inert gas source or other cleaning gas source to perform plasma cleaning on the surface to be processed of the substrate to be processed. More specifically, in the etching process, the substrate processing device 100 may use an inert gas source and a fluorine-containing gas source or other etching gas source to perform plasma etching on the surface to be processed of the substrate.

[0040] In some embodiments, in combination Figure 2 and Figure 3 As shown, the substrate processing device 100 includes a cavity device 20, and the cavity device 20 is used to form at least a portion of the boundary of the inner cavity 21. Another portion of the boundary of the inner cavity 21 can be formed by other devices. Further, a processing station is provided in the inner cavity 21. When the substrate needs to be processed, a carrier carrying one or more substrates moves to the processing station. More specifically, the carrier can pass through the processing station along a predetermined path. More specifically, in combination Figure 3 As shown, the cavity device 20 includes a top plate 22, a bottom plate 23 and a wall plate 24. The top plate 22 is used to form the top of the cavity device 20, and the bottom plate 23 is used to form the bottom. The two wall plates 24 are arranged horizontally with the plate surface facing each other, and the upper side of the wall plate 24 is connected to the top plate 22, and the lower side is connected to the bottom plate 23. Further, one of the wall plates 24 is provided with a reserved opening 25. Further, in combination Figure 2 As shown, another wall plate 24 is formed with a through opening 26 for allowing the substrate to enter the inner cavity 21 .

[0041] In some embodiments, in combination Figure 3 As shown, the substrate processing device 100 includes a moving device 30, which is used to perform material transfer processing and drive the substrate to move relative to the inner cavity 21. Specifically, the moving device 30 includes a plurality of rotatable guide wheels 31 and a driving device for driving the guide wheels 31 to rotate. The guide wheels 31 can be arranged in the inner cavity 21, and the carrier is carried by the guide wheels 31. When the guide wheels 31 rotate, the carrier moves in the inner cavity 21 under the action of the guide wheels 31.

[0042] In some embodiments, in combination Figure 1 and Figure 3As shown, the substrate processing equipment 100 includes a plasma generating device 40, and the plasma generating device 40 is used to generate plasma. In one embodiment, the plasma is used to clean the surface of the substrate. In another embodiment, the plasma is used to etch the surface of the substrate. Further, after the plasma generating device 40 is installed to cover the reserved opening 25 or is embedded in the reserved opening 25, the plasma generating device 40 can form another part of the boundary of the inner cavity 21. More specifically, after the inner cavity 21 is evacuated, a vacuum environment is formed in the inner cavity 21, and the substrate is subjected to corresponding process treatment in the inner cavity 21.

[0043] In some embodiments, in combination Figure 3 As shown, the substrate processing equipment 100 includes a bias power supply and a bias device 50. The bias power supply is provided with an electrode. The bias device 50 is electrically connected to the electrode of the bias power supply and transmits the potential of the electrode of the bias power supply to the powered object. Specifically, the powered object is a substrate or a carrier. Further, the bias device 50 is accommodated in the inner cavity 21 so as to contact the powered object at the processing station. More specifically, the bias power supply has a positive electrode and a negative electrode, and the bias device 50 transmits the potential of the negative electrode to the powered object.

[0044] In some embodiments, in combination Figure 4 and Figure 6 As shown, the biasing device 50 includes: a first bracket 51, a wheel assembly 52 and a conductive assembly 53. The first bracket 51 is used to connect the support portion. The wheel assembly 52 is movably connected to the first bracket 51 and can move relative to the first bracket 51 in a predetermined direction. Figure 6 and Figure 7 As shown, the conducting component 53 includes a movable conductor 531, an elastic member 532 and a flexible conductor 533. The movable conductor 531 is movably connected to the first bracket 51 and can move relative to the first bracket 51 in a predetermined direction. The elastic member 532 is connected to the movable conductor 531 and generates elastic force on the movable conductor 531, so that the movable conductor 531 is held against the wheel body component 52 from the back side. The flexible conductor 533 is connected to the movable conductor 531. The flexible conductor 533 is also electrically connected to the electrode of the bias power supply.

[0045] Specifically, when the energized object moves along the moving path, the wheel assembly 52 contacts the energized object. The wheel assembly 52, the movable conductor 531 and the flexible conductor 533 are respectively conductive and in an electrically connected relationship. When the flexible conductor 533 is electrically connected to the bias power supply electrode, the potential of the energized object can be kept consistent with the potential of the bias power supply electrode. Since the wheel assembly 52 is movably connected to the first bracket 51 and can move relative to the first bracket 51 in a predetermined direction, when the predetermined direction is perpendicular to the moving path, the wheel assembly 52 can adapt to the position change of the energized object in the direction perpendicular to the moving path. The movable conductor 531 pushes the wheel assembly 52 under the elastic force of the elastic member 532, thereby pushing the wheel assembly 52 to the surface of the energized object, so that the movable conductor 531, the wheel assembly 52 and the surface of the energized object maintain stable contact. When the movable conductor 531 changes position, the flexible conductor 533 maintains electrical connection with the movable conductor 531 by reserving a length, so that the object to be energized can always be a part of the overall electrode, ensuring that the processing technology for the substrate remains stable.

[0046] The movable conductor 531 is pressed against the wheel assembly 52 from the back side. The back side can be understood as the part of the wheel assembly 52 facing away from the object being energized. When the movable conductor 531 is pressed against this part of the wheel assembly 52, a force directed toward the object being energized can be generated on the wheel assembly 52. ​​It can also be understood that the pressing force generated by the movable conductor 531 on the wheel assembly 52 can make the wheel assembly 52 move closer to the object being energized. Specifically, in combination with Figure 3 As shown, the support portion includes a portion of the wall plate 24 of the cavity device 20 or a frame strip portion of the cavity device 20 .

[0047] The flexible conductor 533 maintains electrical connection with the movable conductor 531 by reserving a length, which can be understood as maintaining a low resistance state between the flexible conductor 533 and the movable conductor 531 so that current can flow therebetween.

[0048] In some embodiments, in combination Figures 6 to 8As shown, the conductive component 53 also includes an end cap 534 electrically connected to the flexible conductor 533. The end cap 534 is connected to the first bracket 51. Specifically, when the end cap 534 is conductive, as long as the end cap 534 is connected to the first bracket 51, it can be ensured that the movable conductor 531 can maintain electrical connection with the first bracket 51 when it moves to any position along the predetermined direction. Since the first bracket 51 is conductive, after the end cap 534 is connected to the first bracket 51, the flexible conductor 533 can be electrically connected to the electrode of the bias power supply through the end cap 534, the first bracket 51 and the cable member connected to the first bracket 51 in sequence. In one embodiment, one end of the flexible conductor 533 is welded to the end cap 534, and the other end is welded to the movable conductor 531. Further, the length of the flexible conductor 533 meets the range of motion of the movable conductor 531, so that the movable conductor 531 is always in contact with the wheel body component 52. In one embodiment, the elastic member 532 is a compression spring, and when the flexible conductor 533 is fully straightened, the elastic member 532 is still in a compressed state. More specifically, the first bracket 51 is electrically connected to the negative electrode of the bias power supply through a cable member. In one embodiment, the movable conductor 531 includes a carbon brush to reduce the resistance to the wheel assembly 52.

[0049] Furthermore, when the movable direction of the movable conductor 531 is limited by the first bracket 51, one end of the elastic member 532 abuts against the movable conductor 531, and the other end abuts against the end cap 534. For the portion of the first bracket 51 used to abut against the end cap 534 and the portion of the wheel assembly 52 used to abut against the movable conductor 531, if the maximum distance between the two is the first distance. Under the limitation of the flexible conductor 533, assuming that the maximum distance between the end of the movable conductor 531 away from the end cap 534 and the end cap 534 is the maximum length, if the maximum length is greater than the first distance, it can be ensured that the end cap 534 can be kept against the first bracket 51 under the action of the elastic member 532, and there is no need to perform additional fixing treatment on the end cap 534 and the first bracket 51.

[0050] In some embodiments, in combination Figures 6 to 8As shown, the first bracket 51 includes a main frame 511 and a locking member 513 detachably connected to the main frame 511. The main frame 511 is provided with a through slot 512, and the movable conductor 531 is movably arranged in the through slot 512. The end cap 534 is accommodated in the locking member 513. Specifically, the locking member 513 is hollow to accommodate the end cap 534. The internal space of the locking member 513 is connected to the through slot 512. Since the main frame 511 and the locking member 513 are detachably connected, after the movable conductor 531 is worn, the conductive component 53 can be taken out and replaced by removing the locking member 513. In one embodiment, the locking member 513 is threadedly connected to the main frame 511. Further, the end cap 534 has more than two abutting portions 535, and the abutting portions 535 are used to abut against the inner wall of the locking member 513 to prevent the end cap 534 from reducing the contact area with the first bracket 51 due to flipping, thereby avoiding the increase of resistance. More specifically, the two abutting portions 535 are oppositely distributed along the center of the end cap 534 .

[0051] In some embodiments, in combination Figure 6 As shown, the first bracket 51 is provided with a limiting groove 515. Figure 6 and Figure 7 As shown, the wheel assembly 52 includes a wheel axle 521 and a main wheel body 522 connected to the wheel axle 521, and the wheel axle 521 is inserted into the limiting groove 515. In the dimension parallel to the predetermined direction, the length of the limiting groove 515 is greater than the diameter of the wheel axle 521. The movable conductor 531 is supported on the wheel axle 521. Specifically, in combination with Figure 6 As shown, the predetermined direction is parallel to the direction of arrow F1. Since the length of the limiting groove 515 is greater than the diameter of the axle 521, when the width of the limiting groove 515 is not less than the diameter of the axle 521, the axle 521 moves along the predetermined direction under the limitation of the inner walls on both sides of the width direction of the limiting groove 515, so as to adapt to the position change of the energized object and keep the main wheel body 522 in contact with the energized object. The width direction of the limiting groove 515 is perpendicular to the direction of arrow F1. Specifically, the axle 521 is electrically connected to the main wheel body 522. More specifically, the axle 521 and the main wheel body 522 are respectively made of conductive materials. Further, the through groove 512 is connected to the limiting groove 515, and the movable conductor 531 can penetrate into the limiting groove 515 under the limitation of the through groove 512 to resist the axle 521. Under the elastic force of the elastic member 532, the movable conductor 531 pushes the axle 521 and the main wheel body 522 toward the direction close to the energized object.

[0052] In some embodiments, in combination Figure 4 and Figure 7As shown, the wheel assembly 52 includes an axle 521 that passes through the first bracket 51. The two ends of the axle 521 are respectively connected to the main wheel body 522. Specifically, the limiting groove 515 is set through, and the penetration direction of the limiting groove 515 is perpendicular to the predetermined direction. By connecting the main wheel body 522 at both ends of the axle 521, the contact area between the wheel assembly 52 and the powered object is increased through the contact between the two main wheel bodies 522 and the powered object, which is beneficial to reduce the resistance. Specifically, combined with Figure 6 As shown, on the cross section parallel to the predetermined direction, the edge of the axle 521 is circular, so when the axle 521 rotates relative to the movable conductor 531, the axle 521 and the conductor can maintain uniform contact. Further, the movable conductor 531 is provided with an arc surface, which is used to contact the axle 521, thereby increasing the contact area between the movable conductor 531 and the axle 521. When the edge of the main wheel body 522 is also circular, it can allow the energized object to move while being pressed against the main wheel body 522, and the main wheel body 522 has rolling friction on the surface of the energized object, and rolling friction also occurs between the axle 521 and the movable conductor 531. Since the predetermined direction is perpendicular to the surface of the energized object and points from the movable conductor 531 to the surface of the energized object, and since the wheel body assembly 52 is between the movable conductor 531 and the surface of the energized object, when the energized object moves along the moving path, the surface of the energized object and the main wheel body 522 can maintain contact. In one embodiment, the wheel axle 521 is integrally formed with one of the main wheel bodies 522 , and the wheel axle 521 and the other main wheel body 522 are fixed by a fastener 55 .

[0053] In some embodiments, in combination Figure 4 and Figure 7 As shown, the bias device 50 also includes an insulating second bracket 54. The first bracket 51 is connected to the second bracket 54 to be connected to the support portion through the second bracket 54. Specifically, in some cases, it is necessary to keep the first bracket 51 and the support portion insulated. For example, when the support portion is a cavity device 20, or a conductive component fixedly connected to the cavity device 20, since the cavity device 20 needs to be grounded to ensure the safety of the operator, the support portion is in a grounded state. Since the first bracket 51 is electrically connected to the negative electrode of the bias power supply, the first bracket 51 and the support portion cannot be electrically connected, otherwise a short circuit problem will be caused. The first bracket 51 is connected to the support portion through an insulating second bracket 54, so that the first bracket 51 can be kept in a fixed installation state relative to the support portion, and a short circuit between the first bracket 51 and the support portion can be avoided. In another embodiment, the first bracket 51 can also be adhered to the support portion through an insulating pad.

[0054] In some embodiments, in combination Figure 4 and Figure 7As shown, one of the first bracket 51 and the second bracket 54 is provided with a first adjustment hole 514, and the other is provided with a first mounting hole 541. The positions of the first adjustment hole 514 and the first mounting hole 541 match to penetrate the fastener 55. Specifically, the first adjustment hole 514 is a waist-shaped hole, and the first mounting hole 541 is a screw hole. In one embodiment, the first adjustment hole 514 is provided on the first bracket 51, more specifically, it is provided on the main frame 511. The first mounting hole 541 is provided on the second bracket 54. After the fastener 55 penetrates into the first adjustment hole 514 from the side of the first bracket 51 facing away from the second bracket 54, the fastener 55 is threadedly penetrated into the first mounting hole 541. Before tightening the fastener 55, since the length direction of the first adjustment hole 514 is parallel to the predetermined direction, the distance of the first bracket 51 relative to the support portion can be adjusted in the predetermined direction to ensure that the wheel assembly 52 can reach the position range of the energized object. Further, the first bracket 51 is provided with at least two first adjustment holes 514, and the two first adjustment holes 514 are arranged in parallel, so that the first bracket 51 can move relative to the second bracket 54 in a straight line direction. After the fastener 55 is tightened, the first bracket 51 and the second bracket 54 can be kept fixed. In another embodiment, the first adjustment hole 514 is provided in the second bracket 54. The first mounting hole 541 is provided in the first bracket 51.

[0055] In some embodiments, in combination Figure 4 As shown, the second bracket 54 is provided with a second adjustment hole 542. The position of the second adjustment hole 542 cooperates with the second mounting hole provided on the support portion to pass the fastener 55. Specifically, the second adjustment hole 542 is a waist-shaped hole, and the second mounting hole is a screw hole. After the fastener 55 is passed through the second adjustment hole 542 from the side of the second bracket 54 facing away from the support portion, the fastener 55 is threadedly passed through the second mounting hole. Before tightening the fastener 55, the extension direction of the second adjustment hole 542 is perpendicular to the predetermined direction, so that the relative position between the first bracket 51 and the support portion can be adjusted in a direction perpendicular to the predetermined direction. In one embodiment, in combination with Figure 7 As shown, the second bracket 54 includes a flat plate portion 543 and a vertical plate portion 544 , and the flat plate portion 543 is vertically disposed with respect to the vertical plate portion 544 . More specifically, the first mounting hole 541 is disposed on the flat plate portion 543 , and the second adjustment hole 542 is disposed on the vertical plate portion 544 .

[0056] In some embodiments, in combination Figure 4 and Figure 5As shown, the biasing device 50 further includes an insulating protective member 57, which cooperates with the second bracket 54 to surround the end of the cable member connected to the first bracket 51 to prevent the exposed metal part of the cable member from being short-circuited with the ground terminal. Further, the fastener 55 is connected to a metal end of the cable member and is passed through the first adjustment hole 514. More specifically, the insulating protective member 57 and the second bracket 54 are fixedly connected by the fastener 55. The fastener 55 includes a screw.

[0057] In some embodiments, in combination Fig. 9 As shown, the biasing device 50 also includes a cover 56. The first bracket 51 is accommodated in the cover 56. The wheel assembly 52 is at least partially exposed to the cover 56. Specifically, the cover 56 reduces the area of ​​the first bracket 51 or the wheel assembly 52 exposed to the vacuum environment, thereby preventing the plasma from being consumed extra due to contact with the first bracket 51 or the wheel assembly 52, or preventing the first bracket 51 or the wheel assembly 52 from being affected by the plasma and shortening the service life. Further, the cover 56 is connected to the support portion, and a gap is provided between the cover 56 and the first bracket 51 and the wheel assembly 52, so as to facilitate the cover 56 to cover the first bracket 51 and the wheel assembly 52 from different angles. More specifically, the second bracket 54 is accommodated in the cover 56.

[0058] In one embodiment, when the wheel assembly 52 moves to different positions along a predetermined direction, the proportion of the wheel assembly 52 exposed from the cover 56 changes, and a portion of the wheel assembly 52 remains exposed from the cover 56 and abuts against the powered object, thereby avoiding contact between the powered object and the cover 56. More specifically, the cover 56 can be made of an insulating material. In another embodiment, the wheel assembly 52 can be completely exposed from the cover 56, and when a powered object abuts, it can shrink into the cover 56. In yet another embodiment, the range of motion of the wheel assembly 52 is outside the cover 56.

[0059] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0060] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A biasing device, characterized in that: include: A first bracket, used for connecting the support part; A wheel assembly, movably connected to the first bracket and capable of moving relative to the first bracket in a predetermined direction; and A conducting component, comprising a movable conductor, an elastic member and a flexible conductor; the movable conductor is movably connected to the first bracket and can move relative to the first bracket along the predetermined direction; The elastic member is connected to the movable conductor and generates elastic force on the movable conductor, so that the movable conductor is held against the wheel assembly from the back side; the flexible conductor is connected to the movable conductor; the flexible conductor is also electrically connected to an electrode of a bias power supply; The conductive component also includes an end cap electrically connected to the flexible conductor; the end cap is connected to the first bracket; the first bracket includes a main frame and a locking member detachably connected to the main frame; the main frame is provided with a through slot, and the movable conductor is movably inserted into the through slot; the end cap is accommodated in the locking member; the elastic member is located between the end cap and the movable conductor.

2. The biasing device according to claim 1, characterized in that The end cap has abutment portion, and the abutment portion is used to abut against the inner wall of the locking member.

3. The biasing device according to claim 1, characterized in that The biasing device further includes a second bracket having an insulating property; the first bracket is connected to the second bracket to be connected to the supporting portion through the second bracket.

4. The biasing device according to claim 3, characterized in that One of the first bracket and the second bracket is provided with a first adjustment hole, and the other is provided with a first mounting hole; the positions of the first adjustment hole and the first mounting hole are matched to allow a fastener to pass through.

5. The biasing device according to claim 3, characterized in that The second bracket is provided with a second adjustment hole; the position of the second adjustment hole matches with the second mounting hole provided on the support portion so as to pass a fastener.

6. The biasing device according to claim 3, characterized in that The biasing device further includes an insulating shield connected to the second bracket to surround an end of the cable member connected to the first bracket.

7. The biasing device according to claim 1, characterized in that The first bracket is provided with a limiting groove; the wheel body assembly includes a wheel axle and a main wheel body connected to the wheel axle, and the wheel axle is passed through the limiting groove; in the dimension parallel to the predetermined direction, the length of the limiting groove is greater than the diameter of the wheel axle, and the movable conductor is supported against the wheel axle.

8. The biasing device according to claim 1, characterized in that The wheel body assembly comprises a wheel axle penetrating through the first bracket; two ends of the wheel axle are respectively connected to main wheel bodies.

9. The biasing device according to claim 1, characterized in that The biasing device further comprises a cover body; the first bracket is accommodated in the cover body; and the wheel body assembly is at least partially exposed outside the cover body.

10. A substrate processing device, characterized in that: Comprising a biasing device as claimed in any one of claims 1 to 9.

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