A three-dimensional detection device for vacuum target sputtering deposition quality

Abstract

The present invention discloses a three-dimensional detection device for the sputtering deposition quality of a vacuum target, comprising: a detection device, comprising a support assembly, a quartz crystal microbalance assembly; a first driving mechanism is installed on the support assembly, the first driving mechanism is used to drive the quartz crystal microbalance assembly to rotate; the quartz crystal microbalance assembly is rotatably connected to the support assembly; a target material adjustment device, comprising a turntable mechanism, a tilting mechanism, and a target material mounting plate; the tilting mechanism is installed on the turntable mechanism, the target material mounting plate is rotatably connected to the tilting mechanism, the turntable mechanism is used to drive the target material mounting plate to rotate horizontally, and the tilting mechanism is used to adjust the inclination angle of the target material mounting plate. The present invention can realize three-dimensional sputtering area detection of different ion bombardment incident angles, with simple processing, reliable operation, and stable data acquisition. By collecting the sputtering amount in three-dimensional space, the three-dimensional overall characteristics of the sputtering deposition phenomenon can be described.

Description

Technical Field

[0001] The invention relates to the field of space electric propulsion sputtering deposition, in particular to a three-dimensional detection device for the sputtering deposition quality of a vacuum target. Background Art

[0002] Space electric thrusters are widely used in deep space exploration and long-term on-orbit satellite missions due to their long-term operation advantages. They usually work for thousands to tens of thousands of hours. Due to the working principle of electric thrusters, sputtering deposition of materials is inevitable, that is, high-speed ions bombard the materials of the internal components of the electric thrusters, bombarding the materials out, causing significant corrosion loss of the electric thruster components that have been running for a long time, resulting in a decrease in the service life of the electric thrusters. Therefore, the sputtering deposition phenomenon in electric thrusters is an important research field in space electric propulsion. For example, Hall thrusters and ion thrusters, which are the mainstream applications in electric thrusters, sputtering deposition is the key factor causing their thruster failure. Among them, the failure cause of Hall thrusters is that the wall material of the discharge chamber is corroded by high-speed ion bombardment, causing the performance of its thrusters to decline to failure; the failure of ion thrusters can be divided into two aspects. First, due to the bombardment of ions on the gate components inside the thruster, the original structure is corroded and damaged, causing structural failure and electron backflow, and ultimately leading to a decline in thruster performance or even overall failure. Secondly, the grid material that falls off after ion bombardment and sputtering is deposited at the screen grid position, causing the local potential of the screen grid to change, or even short-circuit the circuit, reducing the ion extraction capability and reducing the performance and life of the thruster. Therefore, it is very necessary to use professional system equipment to study and detect this sputtering deposition phenomenon.

[0003] At present, the electric propulsion sputtering deposition detection system on the ground is established in a vacuum chamber. The system provides an ion beam with the same working parameters and a target material with the same properties under quasi-space conditions to detect the sputtering deposition phenomenon of ions on materials. The study of this phenomenon uses the quartz crystal microbalance method (QCM). This method is to suspend a quartz crystal microbalance above the target material to detect the sputtering particles of the target material bombarded by ions. The numerous sputtering particles sputtered by the target material will form a three-dimensional spherical sputtering area above the target material. In order to obtain the sputtering deposition information of the three-dimensional spherical area more comprehensively and accurately, it is necessary to design a detection device for the three-dimensional sputtering deposition quality of vacuum targets. Summary of the invention

[0004] The object of the present invention is to provide a three-dimensional detection device for the sputtering deposition quality of a vacuum target, aiming to solve or improve at least one of the above-mentioned technical problems.

[0005] To achieve the above object, the present invention provides the following solution: The present invention provides a three-dimensional detection device for the sputtering deposition quality of a vacuum target, comprising:

[0006] The detection device comprises a support assembly and a quartz crystal microbalance assembly; the support assembly is provided with a first driving mechanism, the first driving mechanism is used to drive the quartz crystal microbalance assembly to rotate; the quartz crystal microbalance assembly is rotatably connected to the support assembly;

[0007] The target material adjustment device comprises a turntable mechanism, a tilting mechanism, and a target material mounting plate; the tilting mechanism is mounted on the turntable mechanism, the target material mounting plate is rotatably connected to the tilting mechanism, the turntable mechanism is used to drive the target material mounting plate to rotate horizontally, and the tilting mechanism is used to adjust the inclination angle of the target material mounting plate;

[0008] Wherein, the output end of the quartz crystal microbalance component faces the target material mounting plate.

[0009] Preferably, the quartz crystal microbalance assembly comprises a mounting rod rotatably connected to the support assembly, and a quartz crystal microbalance is mounted on the mounting rod.

[0010] Preferably, the support assembly and the turntable mechanism are both mounted on a base; the support assembly comprises:

[0011] A support cover is fixedly connected to the base, and a first slide groove is provided on the top thereof. A first rack is slidably connected in the first slide groove, and the first rack is drivingly connected to the first driving mechanism;

[0012] A first support base, fixedly connected to the top of the support cover;

[0013] The first stepped shaft and the second stepped shaft are both rotatably connected to the first support seat; the first stepped shaft is located above the second stepped shaft; the first stepped shaft and the second stepped shaft are driven by a belt;

[0014] A mounting boss, fixedly connected to one end of the first stepped shaft, wherein the mounting boss is detachably connected to the mounting rod via a fixing member;

[0015] The first gear is fixedly connected to the second stepped shaft and meshes with the first rack for transmission.

[0016] Preferably, the turntable mechanism comprises:

[0017] A base tube is rotatably connected to the base, and a second gear is circumferentially fixedly connected to the outer wall of the base tube;

[0018] A turntable, fixedly connected to the top of the base tube;

[0019] A slide plate is slidably connected to the base, and a second rack which is meshed with the second gear is fixedly connected to the slide plate;

[0020] The second driving mechanism is installed on the base and is drivingly connected to the slide plate.

[0021] Preferably, the tipping mechanism comprises:

[0022] A bottom plate is mounted on the turntable through a plurality of support rods, a third slide groove is provided on the bottom plate, and a third rack is slidably connected in the third slide groove;

[0023] A second support seat is fixedly connected to the bottom plate; the target mounting plate is rotatably connected to the second support seat;

[0024] A third stepped shaft is rotatably connected to the second support seat, a third gear is circumferentially fixed to the outer wall of the third stepped shaft, and the third gear is meshed with the third rack for transmission; the third stepped shaft and the target mounting plate are driven by a belt;

[0025] The third driving mechanism is mounted on the base plate and is drivingly connected to the third rack.

[0026] Preferably, the first driving mechanism, the second driving mechanism and the third driving mechanism have the same structure;

[0027] The first driving mechanism comprises an electric push rod and a connecting rod; one end of the connecting rod is fixedly connected to the output end of the electric push rod; the electric push rods of the first driving mechanism and the second driving mechanism are both installed on the base, and the electric push rod of the third driving mechanism is installed on the bottom plate;

[0028] One end of the three connecting rods away from the electric push rod is fixedly connected to the first rack, the slide plate and the third rack respectively.

[0029] Preferably, a pull-rod type displacement sensor is installed on one side of the fixed end of the electric push rod, and the pull rope of the pull-rod type displacement sensor is fixedly connected to the connecting rod.

[0030] Preferably, sensors are installed on the first stepped shaft, the turntable and the target mounting plate, and a sensing switch is provided on one side of the sensor. The three sensing switches are respectively installed on the first supporting seat, the base and the second supporting seat.

[0031] Preferably, rotating shafts are fixedly connected to both sides of the target mounting plate, the target mounting plate is rotatably connected to the second supporting seat via the two rotating shafts, and the third stepped shaft and the rotating shaft are driven.

[0032] Preferably, a second sliding groove is provided on the base, and the sliding plate is slidably connected in the second sliding groove.

[0033] The present invention discloses the following technical effects:

[0034] The present invention is based on the detection demand of a three-dimensional spherical sputtering area generated by sputtering particles after ion bombardment of a target material. The target material to be tested is installed by a target material mounting plate; the target material mounting plate is driven to rotate along a horizontal plane by a turntable mechanism, and the target material mounting plate is driven to tilt and rotate by a tilting mechanism, so as to realize horizontal rotation and tilting rotation of the target material to be tested; a microbalance component is driven to rotate by a first driving mechanism, so as to realize three-dimensional sputtering area detection with adjustable ion bombardment incident angle; by collecting the sputtering deposition amount of sputtering particles in three-dimensional space, the three-dimensional overall characteristics of the sputtering deposition phenomenon can be depicted; the present invention adopts a mechanical structure, and has the advantages of simple processing, reliable operation and stable data collection. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0036] Figure 1 It is a schematic structural diagram of a three-dimensional detection device for sputtering deposition quality of a vacuum target according to the present invention;

[0037] Figure 2 for Figure 1 A partial enlarged view of middle A;

[0038] Figure 3 for Figure 1 A partial enlarged view of B

[0039] Figure 4 It is a structural schematic diagram of the support assembly in the present invention;

[0040] Figure 5 It is a structural schematic diagram of the overturning mechanism in the present invention;

[0041] Among them, 1. target mounting plate; 2. mounting rod; 3. quartz crystal microbalance; 4. base; 5. support cover; 6. first slide groove; 7. first rack; 8. first support seat; 81. first base; 82. first pressure cover; 83. second pressure cover; 9. first stepped shaft; 10. second stepped shaft; 11. mounting boss; 12. first gear; 13. base tube; 14. second gear; 15. turntable; 16. slide plate; 17. second rack ; 18. Bottom plate; 19. Support rod; 20. Third slide groove; 21. Third rack; 22. Second support seat; 221. Second base; 222. Third pressure cover; 223. Fourth pressure cover; 23. Third stepped shaft; 24. Electric push rod; 25. Connecting rod; 26. Pull-rope displacement sensor; 27. Sensor; 28. Induction switch; 29. ​​Rotating shaft; 30. Second slide groove; 31. Pulley; 32. Synchronous belt; 33. Third gear. DETAILED DESCRIPTION

[0042] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0043] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0044] Reference Figure 1-5 The present invention provides a three-dimensional detection device for the sputtering deposition quality of a vacuum target, comprising:

[0045] The detection device comprises a support assembly and a quartz crystal microbalance assembly; a first driving mechanism is installed on the support assembly, and the first driving mechanism is used to drive the quartz crystal microbalance assembly to rotate; the quartz crystal microbalance assembly is rotatably connected to the support assembly; the quartz crystal microbalance assembly is used to detect a target material to be detected;

[0046] Target adjusting device, including a turntable mechanism, an overturning mechanism, and a target mounting plate 1; the overturning mechanism is installed on the turntable mechanism, and the target mounting plate 1 is rotatably connected to the overturning mechanism. The turntable mechanism is used to drive the target mounting plate 1 to rotate horizontally, and the overturning mechanism is used to adjust the inclination angle of the target mounting plate 1; realizing rotation with two degrees of freedom; the target mounting plate 1 is used to mount the target to be measured; based on the need for detecting the three-dimensional spherical sputtering area generated by sputtered particles after ion bombarding the target, the turntable mechanism drives the target mounting plate to rotate along the horizontal plane, and the overturning mechanism drives the target mounting plate 1 to overturn and rotate, realizing the horizontal rotation and overturning rotation of the target to be measured. The overturning rotation is used to adjust the incident angle of ion bombarding the target, facilitating the detection of the influence of different ion bombarding incident angles on the sputtering deposition phenomenon; the horizontal rotation is used to rotate different positions within the three-dimensional sputtering area to the circumferential plane where the quartz crystal microbalance component moves, enabling the quartz crystal microbalance component to detect different positions within the sputtering area; driving the quartz crystal microbalance component to rotate through the first driving mechanism to realize the detection of the three-dimensional sputtering area with different ion bombarding incident angles; through the acquisition of the sputtering deposition mass in three-dimensional space, the three-dimensional overall characteristics of the sputtering deposition phenomenon are depicted; the present invention is composed of a mechanical structure, with simple processing, reliable operation, and stable data acquisition;

[0047] Wherein, the output end of the quartz crystal microbalance component faces the target mounting plate 1.

[0048] Further optimized solution, the quartz crystal microbalance component includes a mounting rod 2 rotatably connected to the support component, and a quartz crystal microbalance 3 is installed on the mounting rod 2; the output end of the first driving mechanism is drivingly connected to the mounting rod 2 through a bolt; the mounting rod 2 is a cylindrical rod with a right angle, and a balance mounting boss is fixedly connected to one end of the mounting rod 2 away from the support component; the quartz crystal microbalance 3 is fixedly connected to the balance mounting boss through a thread pair;

[0049] With such a setting, by driving the mounting rod 2 to rotate through the first driving component, the quartz crystal microbalance 3 is driven to make a circular motion, detecting the sputtering area above the target to be measured on the target mounting plate 1, and broadening the detection range.

[0050] Further optimized solution, both the support component and the turntable mechanism are installed on the base 4; the support component includes:

[0051] A support cover 5, fixedly connected to the base 4, with a first chute 6 opened at the top, a first rack 7 is slidably connected in the first chute 6, and the first rack 7 is drivingly connected to the first driving mechanism; the support cover 5 is in a U shape, and the opening faces the base 4, and the bottom of the support cover 5 is installed on the base 4 through a bolt; the first driving mechanism drives the first rack 7 to make a reciprocating slide along the first chute 6;

[0052] The first support seat 8 is fixedly connected to the top of the support cover 5; the first support seat 8 includes two first glands 82, two second glands 83, and two first bases 81; the two first bases 81 are installed side by side on the top surface of the support cover 5, and the first slide groove 6 is opened between the two first bases 81; the two first glands 82 are respectively installed on the top walls of the two first bases 81; the two second glands 83 are respectively fixedly connected to the top walls of the two first glands 82; the first gland 82, the second gland 83, the first base 81, and the support cover 5 are all fixed by bolts;

[0053] The first step shaft 9 and the second step shaft 10 are both rotatably connected to the first support seat 8; the first step shaft 9 is located above the second step shaft 10; the first step shaft 9 and the second step shaft 10 are belt-driven through a pulley assembly; the pulley assembly includes two pulleys 31 and a synchronous belt 32; the synchronous belt 32 is sleeved on the two pulleys 31; the two pulleys 31 are respectively installed on the first step shaft 9 and the second step shaft 10; the first step shaft 9 and the second step shaft 10 are both four-section, including a shaft head section, a shaft shoulder section and a shaft neck located at two ends The shaft head section of the second stepped shaft 10 is provided with a pulley 31 and a first gear 12, the shaft shoulder section completes the axial positioning of the first gear 12, and the two shaft neck sections are installed on the two first bases 81 and the two first glands 82 through rolling bearings to complete the axial positioning of the second stepped shaft 10; the shaft head section of the first stepped shaft 9 is provided with another pulley 31, the shaft shoulder section completes the axial positioning of the pulley 31, and the two shaft neck sections are installed on the two second glands 83 and the two first glands 82 through rolling bearings to complete the axial positioning of the first stepped shaft 9;

[0054] The mounting boss 11 is fixedly connected to one end of the first stepped shaft 9, and the mounting boss 11 is detachably connected to the mounting rod 2 through a fixing piece; a through hole and a plurality of threaded holes are provided on the mounting boss 11, and a plurality of circular through holes are provided on the mounting rod 2, the fixing piece is threadedly connected and fixed to the mounting boss 11, and the mounting rod 2 passes through the through hole of the mounting boss 11 and the through hole of the fixing piece, and is threadedly connected to the threaded hole of the fixing piece; the mounting rod 2 and the mounting boss 11 can be disassembled and assembled through the threaded pair and the fixing piece; the position of the mounting rod 2 and the mounting boss 11 can be adjusted, and then the distance between the quartz crystal microbalance 3 and the target material can be adjusted;

[0055] The first gear 12 is fixedly connected to the second stepped shaft 10 and meshes with the first rack 7 for transmission; a keyway is provided on the second stepped shaft 10, and the first gear 12 is installed in the keyway; in this arrangement, the first rack 7 is driven to slide back and forth along the first slide groove 6 by the first driving mechanism, thereby driving the first gear 12 to rotate, thereby driving the first stepped shaft 9 to rotate, and the second stepped shaft 10 is driven to rotate through the pulley assembly, thereby driving the mounting boss 11 and the mounting rod 2 to rotate, thereby realizing the rotation of the quartz crystal microbalance 3.

[0056] Further optimization scheme, the turntable mechanism includes:

[0057] The base tube 13 is rotatably connected to the base 4, and a second gear 14 is fixedly connected to the outer wall of the base tube 13 in the circumferential direction; the base tube 13 has a three-section structure, and the top of the upper section is fixedly connected to the turntable 15 by bolts; a keyway is provided on the side wall of the upper section, and the second gear 14 is installed in the keyway, and the middle end is a cylindrical structure as a transition section; a circular groove is provided below the lower section for installing a rolling bearing to realize the rotatable connection between the base tube 13 and the base 4, and the upper section of the rolling bearing is inserted into the circular groove of the lower section of the base tube 13, and the lower section is inserted into the circular groove provided on the base 4, so that the rolling bearing is between the base tube 13 and the base 4, so that the base tube 13 can perform relative rotational movement in the horizontal plane relative to the base 4;

[0058] The turntable 15 is fixedly connected to the top of the base tube 13; the turntable 15 is a circular turntable, and the tilting mechanism is fixedly installed on the turntable 15;

[0059] The slide plate 16 is slidably connected to the base 4. The slide plate 16 is fixedly connected to the second gear 14. The second gear 14 is meshed with the second rack 17 for transmission. The slide plate 16 is an L-shaped slide plate. The second rack 17 is mounted on the slide plate 16 by bolts.

[0060] The second driving mechanism is installed on the base 4 and is drivingly connected to the slide plate 16; a second slide groove 30 is provided on the base 4, and the slide plate 16 is slidably connected in the second slide groove 30; in this arrangement, the slide plate 16 is driven to slide along the second slide groove 30 by the second driving mechanism, and the second gear 14 is driven to rotate by the second rack 17 on the slide plate 16, thereby driving the base tube 13 and the turntable 15 to rotate, so as to realize the rotation of the target material to be measured on the horizontal plane.

[0061] Further optimization scheme, the overturning mechanism includes:

[0062] The bottom plate 18 is mounted on the turntable 15 through a plurality of support rods 19. A third slide groove 20 is provided on the bottom plate 18. A third rack 21 is slidably connected in the third slide groove 20. The bottom plate 18 is in the shape of a rectangular plate, and the four corners of the rectangular plate are set as round chamfers.

[0063] The second support seat 22 is fixedly connected to the bottom plate 18; the target mounting plate 1 is rotatably connected to the second support seat 22; the second support seat 22 includes a second base 221, a third pressure cover 222, and a fourth pressure cover 223; the two second bases 221 are installed side by side on the top surface of the bottom plate 18, and the third slide 20 is opened between the two second bases 221; the two third pressure covers 222 are respectively installed on the top walls of the two second bases 221; the two fourth pressure covers 223 are respectively fixedly connected to the top walls of the two third pressure covers 222; the third pressure cover 222, the fourth pressure cover 223, the second base 221, and the bottom plate 18 are all fixed by bolt connection;

[0064] The third stepped shaft 23 is rotatably connected to the second support seat 22. A third gear 33 is circumferentially fixed on the outer wall of the third stepped shaft 23. The third gear 33 is meshed with the third rack 21 for transmission. The third stepped shaft 23 and the target mounting plate 1 are driven by a belt. A rotating shaft 29 is fixed on both sides of the target mounting plate 1. The target mounting plate 1 is rotatably connected to the two third pressure covers 222 and the fourth pressure cover 223 of the second support seat 22 through two rotating shafts 29 and rolling bearings, and the third stepped shaft 23 and the rotating shaft 29 are driven by a belt. One of the rotating shafts 29 passes through and extends out of the third pressure cover 222, and a pulley 31 is installed on the rotating shaft 29.

[0065] The third stepped shaft 23 has a three-section structure, including a shaft body section and shaft head sections at two ends; the shaft body section has a diameter larger than the shaft head section, and the shaft body section is used to achieve axial positioning of the third stepped shaft 23 and the third gear 33; the two shaft head sections are mounted on two second bases 221 and two third glands 222 through rolling bearings, one of the shaft head sections penetrates and extends out of the second base 221, and a pulley 31 is mounted on the shaft head section; the pulley 31 on the rotating shaft 29 and the pulley 31 on the shaft head section are provided with a synchronous belt 32;

[0066] The third driving mechanism is installed on the base plate 18 and is drivingly connected to the third rack 21. With this arrangement, the third rack 21 is driven by the third driving mechanism to slide along the third slide groove 20, thereby driving the third gear 33 to rotate, driving the third stepped shaft 23 to rotate, and driving the rotating shaft 29 to rotate through the pulley 31 and the synchronous belt 32, thereby driving the target mounting plate 1 and the target to be measured to perform overturning motion.

[0067] According to a further optimization scheme, the first drive mechanism, the second drive mechanism and the third drive mechanism have the same structure;

[0068] The first driving mechanism includes an electric push rod 24 and a connecting rod 25; one end of the connecting rod 25 is fixedly connected to the output end of the electric push rod 24; the electric push rods 24 of the first driving mechanism and the second driving mechanism are both installed on the base 4, and the electric push rod 24 of the first driving assembly is arranged below the support cover 5 and is installed on the base 4 through a "X"-shaped and a "π"-shaped fixing frame; the electric push rod 24 of the third driving mechanism is installed on the bottom plate 18;

[0069] The ends of the three connecting rods 25 away from the electric push rod 24 are respectively fixed to the first rack 7, the slide plate 16, and the third rack 21; the connecting rod 25 includes a plurality of mutually perpendicular connecting rods, and the plurality of connecting rods are fixedly installed by threaded nuts to transmit the movement of the electric push rod 24; the connecting rods are fixed to the first rack 7, the slide plate 16, and the third rack 21 by screwing;

[0070] The electric push rod 24 includes a motor and a telescopic push rod fixed to the output shaft of the motor. The telescopic push rod is square, and the end away from the motor is cylindrical with a first through hole. The end of the connecting rod close to the electric push rod 24 passes through the first through hole and can be fixed by screwing in a nut. The telescopic push rod is driven by the motor to perform telescopic movement, and the telescopic movement is transmitted to the first rack 7, the slide plate 16, and the third rack 21 through the connecting rod 25, driving the first rack 7, the slide plate 16, and the third rack 21 to move forward and backward along the first slide groove 6, the second slide groove 30, and the third slide groove 20.

[0071] Further optimizing the scheme, a pull-wire displacement sensor 26 is installed on one side of the fixed end of the electric push rod 24, and the pull wire of the pull-wire displacement sensor 26 is fixedly connected to the connecting rod 25; the pull-wire displacement sensor 26 senses the displacement of the pull wire through the movement of the pull wire, and the pull-wire displacement sensor 26 corresponding to the first driving mechanism and the third driving mechanism is fixed to the base 4 by a threaded pair through a right-angle fixing frame; the pull-wire displacement sensor 26 corresponding to the second driving mechanism is fixed to the bottom plate 18 by a threaded pair through a right-angle fixing frame;

[0072] The pull-rope displacement sensor 26 includes a driving device and a pull-rope box; the driving device is installed on a right-angle fixing frame and is cylindrical; the pull-rope box is installed on the driving device, the pull-rope box is rectangular, and one end of the pull-rope box is a pull-rope head, which is fixed to the connecting rod 25 through a flexible rope; when the connecting rod 25 is pushed by the telescopic push rod and the pull rope is pulled at the same time, the telescopic amount of the push rod can be obtained through the sensor in the driving device, which is convenient for manual control to adjust the telescopic amount of the electric push rod 24.

[0073] A further optimization scheme is that sensors 27 are installed on the first step shaft 9, the turntable 15 and the target material mounting plate 1, and a sensing switch 28 is provided on one side of the sensor 27. The three sensing switches 28 are respectively installed on the first support seat 8, the base 4 and the second support seat 22; in this way, the first step shaft 9, the turntable 15 and the target material mounting plate 1 are limited in their rotational position through the cooperation between the sensor 27 and the sensing switch 28. When the rotational position of the first step shaft 9, the turntable 15 and the target material mounting plate 1 exceeds the sensing range of the sensing switch 28, the sensing switch 28 responds accordingly and transmits the switching signal to the outside through the signal cable to avoid the rotation exceeding the limit position, which causes interference and collision of the internal parts of the equipment. The specific working principle of the sensing switch 28 and the sensor 27 is the existing technology and will not be repeated here.

[0074] Working principle:

[0075] The present invention drives three connecting rods 25 to perform telescopic motion through three electric push rods 24, thereby driving the first rack 7, the slide plate 16, and the third rack 21 to move forward and backward along the first slide groove 6, the second slide groove 30, and the third slide groove 20;

[0076] The first gear 12 is driven to rotate by the first rack 7, so as to drive the first stepped shaft 9 to rotate, and the second stepped shaft 10 is driven to rotate by the pulley assembly, so as to drive the mounting boss 11 and the mounting rod 2 to rotate, so as to realize the rotation of the quartz crystal microbalance 3, and realize the detection function of the quartz crystal microbalance on the sputtering area within the rotating circular surface;

[0077] The second gear 14 is driven to rotate by the second rack 17 on the slide 16, and then the base tube 13 and the turntable 15 are driven to rotate, so as to drive the target material to be measured to rotate on the horizontal plane; different positions in the three-dimensional sputtering area can be rotated into the circumferential surface of the quartz crystal microbalance 3, so that the quartz crystal microbalance 3 can detect different positions in the sputtering area;

[0078] The third gear 33 is driven to rotate by the third rack 21, and the third stepped shaft 23 is driven to rotate, and the rotating shaft 29 is driven to rotate by the pulley 31 and the synchronous belt 32, thereby driving the target mounting plate 1 and the target to be tested to perform an overturning rotation motion, thereby adjusting the incident angle of ions bombarding the target, so as to facilitate the detection of the influence of different bombardment incident angles on the sputtering deposition phenomenon;

[0079] The present invention describes the three-dimensional overall characteristics of the sputtering deposition phenomenon by collecting the sputtering deposition quality in three-dimensional space; the present invention adopts a mechanical structure, has simple processing, reliable operation and stable data collection.

[0080] In the description of the present invention, it should be understood that the terms "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0081] The embodiments described above are only descriptions of the preferred modes of the present invention, and are not intended to limit the scope of the present invention. Without departing from the design spirit of the present invention, various modifications and improvements made to the technical solutions of the present invention by ordinary technicians in this field should all fall within the protection scope determined by the claims of the present invention.

Claims

1. A three-dimensional detection device for the sputtering deposition quality of a vacuum target, characterized in that: include: A detection device, including a support assembly and a quartz crystal microbalance assembly; A first driving mechanism is installed on the support assembly, and the first driving mechanism is used to drive the quartz crystal microbalance assembly to rotate; the quartz crystal microbalance assembly is rotatably connected to the support assembly; A target material adjustment device comprises a turntable mechanism, a tilting mechanism, and a target material mounting plate (1); the tilting mechanism is mounted on the turntable mechanism, the target material mounting plate (1) is rotatably connected to the tilting mechanism, the turntable mechanism is used to drive the target material mounting plate (1) to rotate horizontally, and the tilting mechanism is used to adjust the inclination angle of the target material mounting plate (1); Wherein, the output end of the quartz crystal microbalance component faces the target material mounting plate (1); The quartz crystal microbalance assembly comprises a mounting rod (2) rotatably connected to the support assembly, and a quartz crystal microbalance (3) is mounted on the mounting rod (2); The support assembly and the turntable mechanism are both mounted on a base (4); the support assembly comprises: A support cover (5) is fixedly connected to the base (4), and a first slide groove (6) is provided at the top thereof. A first rack (7) is slidably connected in the first slide groove (6), and the first rack (7) is drivingly connected to the first driving mechanism; A first support seat (8) fixedly connected to the top of the support cover (5); The first stepped shaft (9) and the second stepped shaft (10) are both rotatably connected to the first support seat (8); the first stepped shaft (9) is located above the second stepped shaft (10); the first stepped shaft (9) and the second stepped shaft (10) are driven by a belt; A mounting boss (11) is fixedly connected to one end of the first stepped shaft (9), and the mounting boss (11) is detachably connected to the mounting rod (2) via a fixing member; A first gear (12) is fixedly connected to the second stepped shaft (10) and meshes with the first rack (7) for transmission; The turntable mechanism comprises: A base tube (13) is rotatably connected to the base (4), and a second gear (14) is circumferentially fixedly connected to the outer wall of the base tube (13); A rotating disk (15) is fixedly connected to the top of the base tube (13); A slide plate (16) is slidably connected to the base (4), and a second rack (17) is fixedly connected to the slide plate (16) and meshes with the second gear (14). A second driving mechanism is mounted on the base (4) and is drivingly connected to the slide plate (16); The overturning mechanism comprises: A bottom plate (18) is mounted on the rotating disk (15) via a plurality of support rods (19); a third sliding groove (20) is provided on the bottom plate (18); a third rack (21) is slidably connected in the third sliding groove (20); A second support seat (22) is fixedly connected to the base plate (18); the target mounting plate (1) is rotatably connected to the second support seat (22); A third stepped shaft (23) is rotatably connected to the second support seat (22); a third gear (33) is circumferentially fixedly connected to the outer wall of the third stepped shaft (23); the third gear (33) is meshed with the third rack (21) for transmission; the third stepped shaft (23) and the target material mounting plate (1) are belt-driven; a third driving mechanism is mounted on the base plate (18) and is drivingly connected to the third rack (21); The first driving mechanism, the second driving mechanism and the third driving mechanism have the same structure; The first driving mechanism comprises an electric push rod (24) and a connecting rod (25); one end of the connecting rod (25) is fixedly connected to the output end of the electric push rod (24); the electric push rods (24) of the first driving mechanism and the second driving mechanism are both mounted on the base (4), and the electric push rod (24) of the third driving mechanism is mounted on the bottom plate (18); One end of the three connecting rods (25) away from the electric push rod (24) is respectively fixed to the first rack (7), the slide plate (16), and the third rack (21).

2. The three-dimensional detection device for sputtering deposition quality of a vacuum target according to claim 1 is characterized in that: A pull-rod type displacement sensor (26) is installed on one side of the fixed end of the electric push rod (24), and the pull rope of the pull-rod type displacement sensor (26) is fixedly connected to the connecting rod (25).

3. The three-dimensional detection device for sputtering deposition quality of a vacuum target according to claim 2, characterized in that: The first stepped shaft (9), the turntable (15) and the target mounting plate (1) are all equipped with sensors (27), one side of the sensor (27) is provided with a sensing switch (28), and the three sensing switches (28) are respectively equipped on the first supporting seat (8), the base (4) and the second supporting seat (22).

4. The three-dimensional detection device for sputtering deposition quality of a vacuum target according to claim 3 is characterized in that: Rotating shafts (29) are fixedly connected to both sides of the target material mounting plate (1); the target material mounting plate (1) is rotatably connected to the second support seat (22) via the two rotating shafts (29); and the third stepped shaft (23) and the rotating shaft (29) are driven.

5. The three-dimensional detection device for sputtering deposition quality of a vacuum target according to claim 4 is characterized in that: The base (4) is provided with a second sliding groove (30), and the slide plate (16) is slidably connected in the second sliding groove (30).

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