Wafer baking apparatus

CN115472531BActive Publication Date: 2026-11-03NINGBO RUNHUA QUANXIN MICROELECTRONICS EQUIP CO LTD
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Patent Information

Application Number
CN202210949640.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-08-09
Publication Date
2026-11-03
Estimated Expiration
2042-08-09

AI Technical Summary

Technical Problem

Uneven airflow in wafer baking equipment leads to uneven surface temperature of the heating plate, affecting the quality of wafer baking.

Method used

A baking device was designed, which adopts a multi-layer air guide device. The air guide ports of each layer are staggered, and the air inlet and outlet are designed in opposite directions. Combined with the top cover and air guide components, the airflow in the containment space is uniform, ensuring that the exhaust gas is discharged evenly.

Benefits of technology

This achieves uniform surface temperature of the baking device, prevents wafer edges from lifting, and improves wafer baking effect and equipment stability.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present application relates to wafer baking technical field, specifically, it relates to a kind of wafer baking equipment, the present application solves the problem that the uneven exhaust of wafer baking equipment leads to the uneven surface temperature of heating disc problem, the present application embodiment provides a kind of baking equipment, and the baking equipment includes: baking device;Exhaust device, exhaust device and baking device body are detachably connected, exhaust device and baking device form accommodating space between, exhaust device is equipped with multiple layers of air guide device, each layer of air guide device is equipped with air guide port, and the air guide port of adjacent layer is staggered arrangement, and the air guide port of each layer is formed between accommodating space and gas outlet passage;Gas inlet, gas inlet is located at the side of exhaust device away from baking device, and it is communicated with accommodating space, gas enters accommodating space along first direction, and waste gas is generated after gas is heated by baking device;Wherein, gas outlet passage is along second direction setting, for discharging waste gas, and first direction and second direction are opposite.
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Description

Technical Field

[0001] This invention relates to the field of wafer baking technology, and more specifically, to a wafer baking apparatus. Background Technology

[0002] During the wafer manufacturing process, wafers often need to be placed in baking equipment. The appropriate temperature of the baking tray is used to physically or chemically transform the photoresist and other materials on the wafer. Currently, the exhaust of commonly used wafer baking equipment is uneven, which leads to uneven surface temperature of the heating tray and affects the quality of wafer baking. Summary of the Invention

[0003] The problem solved by this invention is the uneven temperature of the heating plate surface caused by uneven exhaust in wafer baking equipment.

[0004] To address the aforementioned problems, this invention provides a baking apparatus, comprising: a baking device; an exhaust device detachably connected to the baking device body, forming a receiving space between the exhaust device and the baking device, the exhaust device having multiple layers of air guides, each layer having an air guide port, adjacent layers of air guide ports being staggered, and the receiving space and the air guide ports of each layer forming an exhaust channel; an air inlet located on the side of the exhaust device away from the baking device and communicating with the receiving space, gas entering the receiving space along a first direction, and the gas generating exhaust gas after being heated by the baking device; wherein, the exhaust channel is arranged along a second direction for discharging exhaust gas, the first direction being opposite to the second direction.

[0005] Compared with existing technologies, the technical effects achieved by this solution are as follows: the air intake through the air inlet and the exhaust through the exhaust device achieve heat dissipation inside the containment space, ensuring that the baking device can bake the wafer smoothly and is easy to handle. The staggered arrangement of the multi-layer air guides ensures that the airflow into each air guide of the first layer of the containment space is consistent, improving the uniformity of exhaust gas discharge in the containment space, making the surface temperature of the baking device uniform, improving the baking effect of the wafer, and preventing the wafer edges from lifting and causing damage.

[0006] In one embodiment of the present invention, the number of air vents in each layer of the air guiding device gradually decreases along the second direction, and each air vent in the upper layer is located between two adjacent air vents in the lower layer.

[0007] Compared with existing technologies, the technical effects achieved by this technical solution are as follows: the staggered arrangement of the air guides requires the exhaust gas to flow within the air guide device of the first layer after passing through the first layer of air guides. The arrangement of each air guide in the upper layer between two adjacent air guides in the lower layer shortens the distance that the exhaust gas needs to travel from each air guide in the lower layer, ensuring uniform airflow.

[0008] In one embodiment of the present invention, the distance between each air vent on the upper layer and the distance between two adjacent air vents on the lower layer is the same.

[0009] Compared with existing technologies, the technical effects achieved by adopting this technical solution are as follows: the consistent distance between each air vent on the upper layer and the two adjacent air vents on the lower layer ensures that the amount of exhaust gas entering the two adjacent air vents is the same, thus ensuring that the airflow through each air vent on the same layer of the air guiding device is equal.

[0010] In one embodiment of the present invention, the baking equipment further includes: a top cover, which is connected to an exhaust device and has an air inlet located on the top cover; and an air outlet, which is located on the top cover and is connected to an exhaust channel, through which exhaust gas is discharged from the exhaust channel.

[0011] Compared with existing technologies, the technical effects achieved by adopting this technical solution are as follows: the air outlet and air inlet work together to achieve air exchange inside the containment space, and by controlling the amount of cold air entering and the amount of exhaust gas being emitted, the airflow direction inside the containment space is made uniform.

[0012] In one embodiment of the present invention, the air guiding device includes: a first connector, which is connected to the baking device; and a first air guiding assembly, which is connected to the first connector. The first air guiding assembly has a first protruding ridge on its inner side and a first air guide opening on the first protruding ridge. The first air guide opening is connected to the receiving space.

[0013] Compared with the prior art, the technical effects achieved by adopting this technical solution are as follows: the setting of the first connecting member increases the distance between the air guiding device and the baking device to form a accommodating space; the setting of the first air guiding component and the first connecting member being fixedly connected facilitates the disassembly and relocation of the exhaust device as a whole; and the setting of the first air guide port allows the exhaust gas generated in the accommodating space to move towards the air outlet.

[0014] In one embodiment of the present invention, the baking device includes: a base, an outer side of which is provided with a mounting groove, and a first connector is detachably connected to the mounting groove; a support column, which is connected to the base and is provided with a support plate; and a heating plate, which is placed on the support plate.

[0015] Compared with existing technologies, the technical effects achieved by this technical solution are as follows: the installation groove makes the installation of the first connector more stable, the support column increases the height of the heating plate in the second direction, and also makes the support plate more stable, thereby improving the stability of the baking device.

[0016] In one embodiment of the present invention, the air guiding device further includes: a second air guiding component, which is connected to the first air guiding component. The outer side of the second air guiding component is provided with a second protruding ridge, which extends toward the first air guiding component. The second protruding ridge is provided with a second air guiding port. There is a first gap between the first protruding ridge and the second protruding ridge, which facilitates the exhaust gas to enter the first gap from the receiving space through the first air guiding port. There are multiple second protruding ridges, and each second protruding ridge is provided with a second air guiding port. There is a second gap between adjacent second protruding ridges.

[0017] Compared with existing technologies, the technical effect achieved by adopting this technical solution is that the setting of the second air guide requires more frequent airflow distribution when the exhaust gas generated in the containment space moves towards the air outlet, making the airflow more balanced.

[0018] In one embodiment of the present invention, the exhaust device further includes: an air passage groove is provided on the side of the top cover near the heating plate, the air passage groove is connected to the second air guide port, and the air outlet is located in the air passage groove.

[0019] Compared with existing technologies, the technical effects achieved by adopting this technical solution are: the setting of the air passage provides a channel on the top cover that allows airflow, facilitating the discharge of exhaust gas.

[0020] In one embodiment of the present invention, the exhaust device further includes an air intake baffle, which is connected to the second air guide assembly and located on the side of the second air guide assembly away from the first air guide assembly. The air intake baffle is provided with a plurality of through holes, and a receiving space is formed between the heating plate and the air intake baffle.

[0021] Compared with existing technologies, the technical effects achieved by this technical solution are as follows: the setting of the first air intake baffle and the second air intake baffle allows the cold air to enter the containment space as evenly as possible, ensuring that the temperature of the heating plate surface is uniform when baking begins. During operation, the exhaust device maintains the temperature of the heating plate surface uniformly, thereby improving the baking effect of the baking equipment on wafers. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the overall structure of the baking equipment of the present invention;

[0023] Figure 2 This is a schematic diagram of the overall structure of the top cover of the present invention;

[0024] Figure 3 This is a schematic diagram showing the connection between the first connector and the first air guide assembly of the present invention.

[0025] Figure 4 This is a schematic diagram of the overall structure of the second air guide assembly of the present invention;

[0026] Figure 5 for Figure 4Top view;

[0027] Figure 6 for Figure 4 A bottom view;

[0028] Figure 7 This is a schematic diagram showing the connection between the air intake baffle and the air guide assembly of the present invention.

[0029] Figure 8 This is a schematic diagram of the specific structure of the intake baffle of the present invention;

[0030] Figure 9 This is a top view of the first air guide assembly of the present invention;

[0031] Figure 10 This is a schematic diagram of the specific structure of the baking device of the present invention;

[0032] Figure 11 This is a cross-sectional view of the baking equipment of the present invention.

[0033] Explanation of reference numerals in the attached figures:

[0034] 100 - Baking equipment; 110 - Top cover; 111 - Air outlet; 112 - Air inlet; 113 - Air passage groove; 114 - Cover plate; 120 - Accommodation space; 210 - First connector; 220 - First air guide assembly; 221 - First protruding ridge; 222 - First air guide port; 230 - Second air guide assembly; 231 - Second protruding ridge; 232 - Second air guide port; 240 - Air inlet baffle; 241 - First air inlet baffle; 242 - Second air inlet baffle; 300 - Baking device; 310 - Base; 320 - Mounting groove; 330 - Heating plate; 340 - Support column; D1 - First direction; D2 - Second direction. Detailed Implementation

[0035] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0036] [First Embodiment]

[0037] See Figures 1 to 11In one specific embodiment, a baking device 100 is provided, comprising: a baking apparatus 300; an exhaust device detachably connected to the baking apparatus 300 body, forming a receiving space 120 between the exhaust device and the baking apparatus 300, the exhaust device having multiple layers of air guides, each layer of air guides having an air guide port, adjacent layers of air guide ports being staggered, and the receiving space 120 and the air guide ports of each layer forming an exhaust channel; an air inlet 112, the air inlet 112 being located on the side of the exhaust device away from the baking apparatus 300 and communicating with the receiving space 120, gas entering the receiving space 120 along a first direction D1, and the gas generating exhaust gas after being heated by the baking apparatus 300; wherein, the exhaust channel is arranged along a second direction D2 for discharging exhaust gas, the first direction D1 being opposite to the second direction D2.

[0038] The baking device 300 is located on the placement surface, and the exhaust device is located above the baking device 300. The outer side of the baking device 300 is arc-shaped, and the outer side of the exhaust device is also arc-shaped. The outer side of the baking device 300 and the exhaust device are fixed. The inner side of the exhaust device is provided with multiple layers of air guide devices. The number of air guide ports on each layer of air guide devices gradually decreases along the second direction D2. At least one pair of air guide ports between adjacent layers of air guide devices are staggered. Gas enters the accommodating space 120 from the air inlet 112, is heated by the baking device 300, enters the exhaust device, and moves along the air guide ports on each layer of air guide devices in the second direction D2 until it leaves the baking device 100, thus completing the exhaust work of the baking device 100.

[0039] During operation, the exhaust device is separated from the baking device 300, and then the wafer is placed inside the baking device 300. Next, the exhaust device is reconnected to the baking device 300, and baking begins after it is fixed. After baking begins, cold air is introduced into the housing space 120 through the air inlet 112. The wafer will produce exhaust gas after baking. The exhaust gas contains harmful gases and particles, which need to be discharged. Because cold air is continuously entering from the direction of the air inlet 112, the harmful gases will enter the exhaust device under the action of air pressure. Then, according to the principle of hot air rising, it moves along the second direction D2. When it passes through the air guide of the first layer from the housing space 120, at least one pair of air guides cannot directly continue to enter through the air guide of the upper layer along the initial direction. Therefore, these blocked airflows will move between the two air guides until they reach the corresponding air guide of the upper layer before entering the air guide of the upper layer. As the number of layers increases, the number of air guides that can supply airflow decreases.

[0040] In related technologies, exhausting air directly through a simple vent will result in a fixed airflow direction during exhaust, which will affect the temperature uniformity of the baking tray surface.

[0041] The air intake and exhaust devices at the air inlet 112 facilitate heat dissipation within the containment space 120, ensuring that the baking device 300 can bake the wafers smoothly and easily. The staggered arrangement of the multi-layer air vents ensures that the airflow into each air vent of the first layer of the air venting device is consistent, improving the uniformity of exhaust gas discharge within the containment space 120. This results in a uniform surface temperature of the baking device 300, improving the baking effect of the wafers and preventing the wafer edges from lifting and causing damage.

[0042] [Second Embodiment]

[0043] See Figures 3 to 6 In one specific embodiment, the number of air vents in each layer of the air guiding device gradually decreases along the second direction D2, and each air vent in the upper layer is located between two adjacent air vents in the lower layer.

[0044] The number of air vents in the lower layer is twice the number of air vents in the upper layer. Each air vent in the upper layer is located between two adjacent air vents in the lower layer in the second direction D2. There is an arc-shaped air duct between two adjacent air vents. The gas can flow in the air duct to the air vent connected to the air vent of the upper layer, realizing the exhaust of the baking equipment 100. The number of air vents on the air vent closest to the accommodating space 120 is related to the number of layers of air vents. When the exhaust gas passes through the air vent of the first layer, it cannot directly enter the air vent of the upper layer. The exhaust gas needs to flow between two adjacent air vents. Because the air vent of the upper layer is between two adjacent air vents in the lower layer, when the exhaust gas of the lower layer enters the upper layer, it will flow to both sides to the nearest air vent of that layer, and then enter the upper layer, to avoid the airflow distance being too large, which would cause the airflow to be unstable.

[0045] Typically, the air guide device has four layers, arranged side by side and spaced apart along the second direction D2, with the number of holes being 16, 8, 4, and 2 respectively.

[0046] The staggered arrangement of the air vents requires the exhaust gas to flow within the air guiding device of the first layer after passing through the first layer of air vents. The arrangement of each air vent of the upper layer being located between two adjacent air vents of the lower layer shortens the distance that the exhaust gas needs to travel from each air vent of the lower layer, ensuring uniform airflow.

[0047] [Third Embodiment]

[0048] See Figure 2 In one specific embodiment, the distance between each air vent on the upper layer and the distance between each adjacent air vent on the lower layer is the same.

[0049] The circular air guide slots ensure that the distance between each air guide is consistent, and the air guide of the upper layer is located at the midpoint of two adjacent air guides of the lower layer in the second direction D2.

[0050] The consistent distance between each air vent on the upper layer and the adjacent air vent on the lower layer ensures that the amount of exhaust gas entering the two adjacent air vents is the same, thus ensuring that the airflow through each air vent on the same layer of the air guiding device is equal.

[0051] [Fourth Embodiment]

[0052] In one specific embodiment, the baking equipment 100 further includes: a top cover 110, which is connected to an exhaust device, and an air inlet 112 is provided on the top cover 110; and an air outlet 111, which is provided on the top cover 110 and is connected to an exhaust channel, through which exhaust gas is discharged from the exhaust channel.

[0053] The top cover 110 is fixedly connected to the exhaust device. The top cover 110 is circular. The air inlet 112 is located at the center of the top cover 110, and the air outlet 111 is located at the far end of the top cover 110. There is only one air outlet 111. When the exhaust gas in the exhaust device flows evenly in the air guide groove of each layer, the exhaust gas is discharged from the air outlet 111.

[0054] When the airflow inside the exhaust device is saturated, the amount of cold air entering through the air inlet 112 is controlled to be consistent with the amount of exhaust gas discharged, forming a dynamic balance and achieving uniformity of exhaust.

[0055] Preferably, the connection between the top cover 110 and the exhaust device includes one or more of the following: snap-fit, button, latch, and magnetic attraction.

[0056] The air outlet 111 works in conjunction with the air inlet 112 to achieve air exchange inside the containment space 120. By controlling the amount of cold air entering and the amount of exhaust gas being emitted, the airflow direction inside the containment space 120 is made uniform.

[0057] [Fifth Embodiment]

[0058] See Figure 3 In one specific embodiment, the air guiding device includes: a first connector 210, which is connected to the baking device 300; a first air guiding assembly 220, which is connected to the first connector 210, and the inner side of the first air guiding assembly 220 is provided with a first protruding ridge 221, and the first protruding ridge 221 is provided with a first air guide port 222; wherein, the first air guide port 222 is connected to the accommodating space 120.

[0059] The first connector 210 is annular, with its bottom connected to the baking device 300 and extending along the second direction D2. The first air guide assembly 220 is welded to the first connector 210. The first air guide assembly 220 is annular, with a first protruding ridge 221 extending towards the center of the ring from the inner side of the ring. The first protruding ridge 221 is also annular, and multiple first air guide ports 222 are provided on the first protruding ridge 221. The multiple first air guide ports 222 are evenly distributed relative to the center of the first air guide assembly 220. Normally, there are 16 first air guide ports 222.

[0060] The outer edge of the first air guide assembly 220 extends beyond the outer edge of the first connector 210. The distance between the outer edges facilitates the separation of the exhaust device from the baking device 300 and makes the exhaust device easier to remove.

[0061] Preferably, the size of the accommodating space 120 can be controlled according to the height of the first connector 210 in the second direction D2, and the first connector 210 of different heights can be selected according to different heating powers to increase the practicality of the first connector 210.

[0062] The first connector 210 increases the distance between the air guide device and the baking device 300 to form the accommodating space 120. The fixed connection between the first air guide assembly 220 and the first connector 210 facilitates the disassembly and relocation of the exhaust device as a whole. The first air guide port 222 allows the exhaust gas generated in the accommodating space 120 to move towards the air outlet 111.

[0063] [Sixth Embodiment]

[0064] See Figure 11 In one specific embodiment, the baking device 300 includes: a base 310, with an installation groove 320 on the outer side of the base 310, and a first connector 210 detachably connected to the installation groove 320; a support column 340 connected to the base 310, with a support plate on the support column 340; and a heating plate 330 placed on the support plate.

[0065] The base 310 is cylindrical, and the outer edge of the base 310 protrudes outward with a mounting groove 320. The width of the mounting groove 320 is adapted to the thickness of the first connector 210. The first connector 210 is inserted into the mounting groove 320 to complete the fixation. The support column 340 is located inside the base 310. There are three support columns 340, which are evenly distributed relative to the center of the bottom of the support base to increase the stability of the support plate. The heating plate 330 is circular, and the outer edge of the heating plate 330 fits against the outer edge of the support base. There is a distance between the outer edge of the heating plate 330 and the inner surface of the base 310 to facilitate the installation of the heating plate 330. The base 310 has a slot bent towards the mounting groove 320 on the side near the heating plate 330. This slot can also accommodate the exhaust gas generated by heating and help the exhaust gas enter the exhaust device under the action of air pressure.

[0066] The mounting slot 320 makes the installation of the first connector 210 more stable, and the support column 340 increases the height of the heating plate 330 in the second direction D2, making the support plate more stable and improving the stability of the baking device 300.

[0067] [Seventh Embodiment]

[0068] See Figures 4 to 7 In one specific embodiment, the air guiding device further includes: a second air guiding component 230, which is connected to the first air guiding component 220. The outer side of the second air guiding component 230 is provided with a second protruding rib 231, which extends toward the first air guiding component 220. The second protruding rib 231 is provided with a second air guiding port 232. There is a first gap between the first protruding rib 221 and the second protruding rib 231, which facilitates the exhaust gas from the receiving space 120 to enter the first gap through the first air guiding port 222. There are multiple second protruding ribs 231, and each second protruding rib 231 is provided with a second air guiding port 232. There is a second gap between adjacent second protruding ribs 231.

[0069] The second air guide assembly 230 is annular, and the second protruding rib 231 is provided on the outer surface of the annulus. The second protruding rib 231 has two layers. The second protruding rib 231 on the side closer to the heating plate 330 forms an air guide groove between the first protruding rib 221 and the two adjacent layers of second protruding rib 231. The second protruding rib 231 on the side away from the heating plate 330 forms an air guide groove between the top cover 110 and the exhaust gas moves to the exhaust port 111 along the second direction D2 through the second air guide port 232. Under normal circumstances, there are 8 air guide ports evenly distributed on the second protruding rib 231 on the side closer to the heating plate 330 and 4 air guide ports evenly distributed on the second protruding rib 231 on the side away from the heating plate 330. Each air guide port on the second protruding rib 231 on the side away from the heating plate 330 is located in the middle of two adjacent air guide ports on the second protruding rib 231 on the side closer to the heating plate 330.

[0070] The second air guide 232 is U-shaped, which makes the processing of the second air guide 232 more convenient.

[0071] The second air vent 232 is designed so that the exhaust gas generated in the containment space 120 needs to be distributed more often when moving towards the air outlet 111, making the air flow more balanced.

[0072] [Eighth Embodiment]

[0073] See Figure 2 In one specific embodiment, the top cover 110 is provided with an air passage groove 113 on the side near the heating plate 330. The air passage groove 113 is connected to the second air guide 232, and the air outlet 111 is located in the air passage groove 113.

[0074] The inner side of the top cover 110 is provided with an annular groove. A cover plate 114 is provided between the top cover 110 and the second air guide assembly 230. The size of the cover plate 114 fits the outer edge of the first air guide assembly 220. The cover plate 114 is provided with two through holes, both of which are connected to the second air guide port 232. The two through holes on the cover plate 114 are also connected to the air passage groove 113. An air passage is formed between the air passage groove 113 and the cover plate 114. When the exhaust gas enters the passage from the cover plate 114, it moves in the passage to the air outlet 111 and is discharged from the exhaust gas device.

[0075] The air passage 113 provides a channel for airflow on the top cover 110, facilitating the discharge of exhaust gas.

[0076] [Ninth Embodiment]

[0077] See Figure 7 and Figure 8 In one specific embodiment, the exhaust device further includes an air inlet baffle 240, which is connected to the second air guide assembly 230 and located on the side of the second air guide assembly 230 away from the first air guide assembly 220. The air inlet baffle 240 is provided with multiple through holes, and a receiving space 120 is formed between the heating plate 330 and the air inlet baffle 240.

[0078] There are two intake baffles 240, including a first intake baffle 241 and a second intake baffle 242. Each intake baffle 240 has multiple through holes. The second intake baffle 242 is larger than the first intake baffle 241. Both the first intake baffle 241 and the second intake baffle 242 are discs, and their centers are located on a straight line parallel to the first direction D1. There is a distance between the two discs to facilitate the movement of gas on the surface of the second intake baffle 242.

[0079] When cold air enters above the first intake baffle 241 through the air inlet 112, it moves towards the second intake baffle 242 through the through holes on the first intake baffle 241. Initially, the amount of cold air input is relatively large, entering through various through holes on the first intake baffle 241. Due to the staggered arrangement of the two intake baffles 240, the cold air cannot directly enter the receiving space 120 after reaching the second intake baffle 242. Therefore, it continues to move on the surface of the second intake baffle 242 and enters the receiving space 120 through the closest through hole.

[0080] The first air intake baffle 241 and the second air intake baffle 242 are designed to make the cold air as uniform as possible when it enters the accommodating space 120, ensuring that the surface temperature of the heating plate 330 is uniform when baking begins. During operation, the exhaust device keeps the surface temperature of the heating plate 330 uniform, improving the baking effect of the baking equipment 100 on the wafers.

[0081] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A wafer baking apparatus, characterized in that, The baking equipment includes: Baking equipment; The exhaust device is detachably connected to the baking device body. An accommodating space is formed between the exhaust device and the baking device. The exhaust device is provided with multiple layers of air guide devices. Each layer of air guide device is provided with an air guide port. The air guide ports of adjacent layers are staggered. An air outlet channel is formed between the accommodating space and the air guide ports of each layer. An air inlet is located on the side of the exhaust device away from the baking device and is connected to the accommodating space. Gas enters the accommodating space in a first direction and is heated by the baking device to produce exhaust gas. The exhaust channel is arranged along the second direction for discharging the exhaust gas, and the first direction is opposite to the second direction. A top cover, which is connected to the exhaust device, and an air inlet is located on the top cover; An air outlet is provided on the top cover and is connected to the air outlet channel. The exhaust gas is discharged from the air outlet channel through the air outlet. The air guiding device includes: A first connector is connected to the baking device. The first air guide assembly is connected to the first connector. The inner side of the first air guide assembly is provided with a first protruding ridge, and the first protruding ridge is provided with a first air guide port. The first air vent is connected to the accommodating space; The air guiding device also includes: The second air guide assembly is connected to the first air guide assembly. The outer side of the second air guide assembly is provided with a second protruding ridge, which extends toward the first air guide assembly. The second protruding ridge is provided with a second air guide opening. There is a first gap between the first protruding ridge and the second protruding ridge, which facilitates the exhaust gas to enter the first gap from the containment space through the first air guide.

2. The baking equipment according to claim 1, characterized in that, The number of air vents in each layer of the air guiding device gradually decreases along the second direction, and each air vent in the upper layer is located between two adjacent air vents in the lower layer.

3. The baking equipment according to claim 2, characterized in that, The distance between each air vent on the upper layer and the adjacent two air vents on the lower layer is the same.

4. The baking apparatus according to claim 1, wherein the baking device comprises: The base has a mounting groove on its outer side, and the first connector is detachably connected to the mounting groove. A support column is connected to the base, and a support plate is provided on the support column; A heating plate, which is placed on the support plate.

5. The baking equipment according to claim 4, characterized in that, The top cover has an air passage groove on the side near the heating plate. The air passage groove is connected to the second air guide port, and the air outlet is located in the air passage groove.

6. The baking equipment according to claim 5, characterized in that, There are multiple second protruding ridges, and each second protruding ridge is provided with a second air guide. There is a second gap between adjacent second protruding ridges.

7. The baking equipment according to claim 6, characterized in that, The exhaust system also includes: An air intake baffle is connected to the second air guide assembly and is located on the side of the second air guide assembly away from the first air guide assembly. The air intake baffle is provided with multiple through holes, and the heating plate and the air intake baffle form the receiving space.

Citation Information

Patent Citations

  • Disc cover structure for wafer baking unit

    CN114563933A