Storage system and control method
Through the artificial intelligence-driven dynamic controller and independent gas supply system, the problem of EUV mask contamination during storage and transportation is solved, efficient contamination control and safety assurance are achieved, and the lithography quality and operator safety are improved.
Patent Information
- Application Number
- CN202210037472.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-08-30
- Filing Date
- 2022-01-13
- Publication Date
- 2025-09-05
- Estimated Expiration
- 2042-01-13
AI Technical Summary
During the semiconductor manufacturing process, EUV masks are easily contaminated during storage and transportation, resulting in a decline in lithography quality. Existing technologies make it difficult to effectively control the hydrocarbon and oxygen concentrations in the storage environment, affecting the mask's patterning capability and operator safety.
An AI-driven dynamic controller controls the gas supply and flow in the storage space through an independent gas supply system and independent return air design, including the use of N2 gas to reduce hydrocarbon concentrations and maintain appropriate oxygen concentrations and humidity to ensure operator safety.
It effectively reduces the contamination of EUV masks, improves the quality of lithography, reduces the risks caused by gas leakage, ensures the safety of operators, and improves the stability of the storage environment.
Smart Images

Figure CN115494747B_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to a storage system and a control method. Background Art
[0002] In order to produce semiconductor devices and semiconductor substrates, silicon wafers, which are the raw materials of semiconductor devices, must go through a series of complex and precise process steps. Often, in order to complete this process sequence, the wafer must be physically transported from one manufacturing equipment to another. In these manufacturing equipment, various processes such as diffusion, ion implantation, chemical vapor deposition, photolithography, etching, physical vapor deposition, and chemical mechanical polishing are performed on the wafer. In order to efficiently move wafers between different manufacturing equipment in a semiconductor fabrication plant (commonly referred to as a "fab") in a process sequence, multiple wafers are housed in a front-opening unified pod (FOUP) and an automated material handling system (AMHS) is implemented in the fab to move the FOUP from one manufacturing equipment to another.
[0003] In some cases, an overhead hoist transport (OHT) is part of the AMHS in a fab. The OHT transports FOUPs by traveling on overhead rails and directly into the load ports of stockers or other process equipment. For example, the transported wafers can be stored in extreme ultraviolet light (EUV) pod storage prior to further processing. Summary of the Invention
[0004] According to an embodiment of the present invention, a storage system includes: a storage box configured to store one or more masks, the storage box being contained in a storage box; a controller operably coupled to the storage system, the controller being configured to control at least one of the airflow supply entering the storage box, the hydrocarbon concentration in the storage box, the oxygen concentration in the storage box, the humidity in the storage box, the pressure in the storage box, or the temperature in the storage box; an artificial intelligence training circuit operably connected to the controller, the artificial intelligence training circuit being configured to recognize multiple data patterns of at least one of the airflow supply entering the storage box, the hydrocarbon concentration in the storage box, the oxygen concentration in the storage box, the humidity in the storage box, the pressure in the storage box, or the temperature in the storage box; and automated machinery configured to move the storage box into and out of the storage box.
[0005] According to an embodiment of the present invention, a method includes: operably coupling a controller to one or more storage units; using the controller to control at least one of the airflow supply entering the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity within the storage unit, the pressure within the storage unit, or the temperature in the storage unit; operably connecting an artificial intelligence training circuit to the controller; and using the artificial intelligence training circuit to identify multiple data patterns of at least one of the airflow supply entering the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity within the storage unit, the pressure within the storage unit, or the temperature in the storage unit.
[0006] According to an embodiment of the present invention, a method includes: supplying a first gas to a storage device configured to store one or more substrates; detecting a humidity level of the storage device; increasing the supply of the first gas to the storage device in response to the detected humidity level of the storage device being higher than a threshold level; detecting a hydrocarbon concentration within the storage device; and increasing the supply of the first gas to the storage device in response to the detected hydrocarbon concentration within the storage device being higher than a threshold concentration, wherein the first gas includes nitrogen. BRIEF DESCRIPTION OF THE DRAWINGS
[0007] The various aspects of the present disclosure will be best understood by reading the following detailed description in conjunction with the accompanying drawings. It should be noted that, in accordance with standard practice in the industry, the various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or decreased for clarity of discussion.
[0008] Figure 1is a perspective diagram of a stocker system with an artificial intelligence (AI)-driven dynamic controller, according to some embodiments.
[0009] Figure 2 is an EUV lithography process flow according to some embodiments.
[0010] Figure 3A is a side view of a stocker system and process for safety interlock according to some embodiments.
[0011] Figure 3B is a flow chart of a safety interlock process according to some embodiments.
[0012] Figure 4 is a schematic diagram of a stocker system according to some embodiments.
[0013] Figure 5A According to some embodiments, Figure 4 A view of the AA side of the depositor system.
[0014] Figure 5B According to some embodiments, Figure 4 A view of the depositor system from the BB side.
[0015] Figure 5C According to some embodiments, Figure 4 View of the CC side of the depositor system.
[0016] Figure 6 is a diagram of a font system illustrating airflow within the font, according to some embodiments.
[0017] Figure 7 is a block diagram of an AI-driven dynamic controller according to some embodiments.
[0018] Figure 8 is a dynamic control flow of an AI-driven dynamic controller according to some embodiments.
[0019] Figure 9 is a flow chart of a method of controlling conditions within a storage system according to the present disclosure.
[0020] [Explanation of Symbols]
[0021] 100: Storage System
[0022] 101: EUV box storage / depositor
[0023] 110: Multi-box structure
[0024] 120: Multi-box sorting machine
[0025] 130: AI-driven dynamic controller / controller / dynamic controller
[0026] 200: EUV process flow
[0027] 210, 220, 230, 240, 250, 260, 270, 280, 360, 370, 380, 910, 920, 930, 940, 950: Steps
[0028] 310: Entry System
[0029] 320: Oxygen cylinder detection module / oxygen cylinder detection assembly
[0030] 330: Operator mask and pipe scanning module / Operator mask and pipe scanning assembly
[0031] 340: Operator ID scanning module / Operator ID scanning assembly
[0032] 410: Robotic Crane
[0033] 420: EUV box
[0034] 430: Automatic Input / Output Interface / Automatic I / O
[0035] 440: OHT
[0036] 450: Raised floor
[0037] 460: Manual port / entrance door
[0038] 470: External air conditioning box / air source
[0039] 480: Fan filter unit / filter assembly
[0040] 490: Dry cooling coil
[0041] 500: air curtain
[0042] 510: Manual port
[0043] 520: Exhaust pipe
[0044] 530: Independent return air boundary / independent return air space
[0045] 540: Waffle
[0046] 550: Opening
[0047] 560: O2 sensor / oxygen sensor
[0048] 570: Pressure sensor
[0049] 580: Hydrocarbon detection sensor / Hydrocarbon sensor
[0050] 590: Air supply
[0051] 600: Direction
[0052] 610, 620, 630: Arrow / direction
[0053] 710: Hydrocarbon detection assembly / Hydrocarbon detection module
[0054] 720: Oxygen concentration detection module / oxygen concentration detection assembly
[0055] 730: Humidity detection module / humidity detection assembly
[0056] 740: Pressure detection module / pressure detection assembly
[0057] 750: Temperature regulation assembly / temperature control module
[0058] 760: AI training circuit / AI training module / AI training assembly
[0059] 805: Valve
[0060] 810: Hygrometer
[0061] 900: Method DETAILED DESCRIPTION
[0062] The following disclosure provides many different embodiments or examples for implementing the different features of the present invention. Specific examples of components and arrangements are set forth below to simplify the present disclosure. Of course, these are merely examples and are not intended to be limiting. For example, in the following description, forming a first feature on or on a second feature may include an embodiment in which the first feature and the second feature are formed to be in direct contact, and may also include an embodiment in which an additional feature may be formed between the first feature and the second feature so that the first feature and the second feature may not be in direct contact. In addition, the present disclosure may reuse reference numbers and / or letters in various examples. This repetition is for the sake of simplicity and clarity and does not, by itself, indicate the relationship between the various embodiments and / or configurations discussed.
[0063] Furthermore, for ease of description, spatially relative terms, such as "below," "beneath," "lower," "above," and "upper," may be used herein to describe the relationship of one element or feature to another element or feature as illustrated in the figures. These spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein should be interpreted accordingly.
[0064] One or more embodiments of the present disclosure relate to an EUV storage system or storage system for workpieces (e.g., masks, reticles, etc.). In some embodiments, a storage according to the present disclosure is used to store EUV masks. EUV masks are used to pattern features on wafers or substrates (e.g., silicon). In some embodiments, EUV masks are stored in an EUV box or a storage device for storing EUV masks. Insufficient supply of N2 gas (nitrogen) to the EUV box increases the likelihood of contamination of the EUV masks stored in the EUV box. That is, when the EUV box storage is in the storage, it is beneficial to supply N2 gas to the EUV box because this will reduce contamination of the EUV mask, which will help improve the lithography quality on the substrate (e.g., a silicon substrate). Failure to supply N2 gas to the desired threshold level in the EUV box may allow material (e.g., moisture) to precipitate on the EUV mask when it is stored in the EUV box. In some cases, when an EUV cassette containing an EUV mask is transferred to an EUV tool for the exposure process, the ability of the EUV mask to pattern features within critical dimension limits may be degraded due to material precipitation on the EUV mask.
[0065] N2 gas can also be used to reduce or control the concentration of hydrocarbons in the environment of the EUV box storage unit where the EUV box is stored or held. Reducing or controlling the concentration of hydrocarbons in such an environment is desirable because the presence of hydrocarbons may damage or affect the EUV mask (e.g., EUV mask quality) or other aspects of the EUV lithography process or equipment. For example, hydrocarbon particles may coat or deposit on the EUV mask, thereby changing and / or damaging the EUV mask and adversely affecting the exposure results through the EUV mask. Therefore, the presence of hydrocarbons and other gases in the EUV box may cause the EUV mask to produce patterns with different critical dimensions between each wafer on multiple wafers. Therefore, according to embodiments of the present disclosure, it is beneficial to reduce the concentration of hydrocarbons in the EUV box storage system by using N2 gas.
[0066] Another aspect of the present disclosure includes a dynamic controller operably coupled to the stocker system 100. In some embodiments, the dynamic controller is driven by artificial intelligence (AI) technology, which allows the dynamic controller to intelligently control the supply and flow of gases within the stocker system 100. Furthermore, the dynamic controller can change the type of gas supplied to the storage area or stocker, control the pressure within the storage area, and control the humidity within the storage area. Because N2 gas can be hazardous to operators (e.g., engineers) working within the stocker system environment, controlling the various gases supplied within the stocker environment is beneficial. The AI-driven controller can automatically control the type and amount of gas supplied to the storage space to ensure operator safety. In one or more embodiments, the storage space includes an EUV cassette containing EUV masks. Because increasing the amount of N2 gas supplied to the storage space may cause a decrease in the concentration of O2 gas in the storage space, the controller controls the mass flow of gas (e.g., nitrogen and / or oxygen) via a mass flow control device (MFC) (or other device for controlling nitrogen or air flow) to automatically control the supply of N2 gas to the storage system or individual storage spaces / cells.
[0067] In some embodiments, multiple EUV box storage devices are located in a location within the fab adjacent to an area where other expensive EUV lithography tools are located. One of the benefits of the storage system 100 according to the present disclosure is that an air supply subsystem is provided for the storage device 101 that stores EUV boxes, the EUV boxes including EUV masks to be used by EUV lithography equipment, and the air supply subsystem is independent of the air supply systems of other EUV lithography equipment. According to an embodiment of the present disclosure, this independent air supply system is separated from the area where other EUV lithography equipment in the fab is located. Utilizing an air supply system that is independent of the air supply systems of other EUV lithography equipment, and which may be located in an area of the fab that is different from the area where other EUV lithography equipment is located, reduces the risk of an incident (e.g., a fire or gas leak) occurring in the area of the fab where the air supply system for the EUV box storage system is located, which would adversely affect the air supply systems of other EUV lithography equipment, and vice versa. In some embodiments, the independent air supply subsystem of the stocker system 100 includes a make-up air unit (MAU), a fan filter unit (FFU), and a dry cooling coil (DCC) to maintain an independent air return design, which separates the air supply system of the stocker system 100 from the air supply system of other EUV tools. The stocker system provides the additional benefit of protecting the EUV tool. Other technical advantages of the present disclosure are further described in conjunction with the accompanying drawings.
[0068] Figure 1 is a perspective view of a portion of a stocker system 100 including an artificial intelligence (AI) driven dynamic controller, according to some embodiments.
[0069] refer to Figure 1 The stocker system 100 includes a multi-cassette rack 110 and a multi-cassette sorter 120. The multi-cassette rack 110 includes a multi-cassette port and a multi-cassette overhead transport port (hereinafter referred to as an "OHT port" or "multi-cassette OHT port"), not shown. The multi-cassette rack 110 and the multi-cassette sorter 120 are contained in a stocker (stocker 101 in FIG. 3 ).
[0070] According to some embodiments described herein, stocker system 100 is integrated into an existing AMHS in a wafer fab.
[0071] According to some embodiments described herein, stocker system 100 provides temporary storage for various types of cassettes, including cassettes containing EUV masks, semiconductor workpieces, or substrates, while the cassettes are in operation with different tools and equipment in a wafer fab.
[0072] In one or more embodiments, the storage system 100 is operatively coupled to an AI-driven dynamic controller (also referred to as a controller) 130. In other embodiments, the AI-driven dynamic controller 130 can be implemented within the storage system 100.
[0073] The controller 130 may include any circuits, features, components, assemblies of electronic components, etc., configured to perform the various operations of the data collection and control features described herein. For example, the controller 130 may include any processor-based or microprocessor-based system, including systems using microcontrollers, reduced instruction set computing (RISC), application specific integrated circuits (ASIC), field-programmable gate arrays (FPGA), graphics processing units (GPU), logic circuits, and any other circuits or processors capable of performing the functions described herein.
[0074] In some embodiments, controller 130 may be included in or otherwise implemented by processing circuitry such as a microprocessor, microcontroller, integrated circuit, chip, microchip, or the like.
[0075] The controller 130 may also include a memory. Various AI algorithms and instructions related to implementing the AI features described herein may be stored in the memory. The memory may include a random access memory (RAM), a read-only memory (ROM), a hard drive, or a removable storage drive such as an optical drive or a solid-state drive (e.g., flash RAM). The memory may also be other similar devices for loading computer programs or other instructions into a computer or processor. In some embodiments, the memory may also be operably coupled to the controller 130 and may not be included in the controller 130.
[0076] In some embodiments, the stocker system 100 includes an EUV cassette stocker (also referred to as a stocker) 101 or an EUV cassette stocker. These EUV cassette stockers or EUV cassette stockers are examples of storage spaces (or storage units) for storing one or more masks (e.g., EUV masks). In some embodiments, EUV masks are stored in individual EUV cassettes, and individual EUV cassettes are stored in the EUV cassette stocker 101 of the stocker system 100.
[0077] Figure 2 is an EUV process flow according to some embodiments.
[0078] The EUV process flow 200 involves applying an EUV process to a substrate or wafer. Initially, at step 210, a plurality of EUV cassettes (including at least one EUV mask stored therein) are transferred to an EUV cassette stocker using an OHT port. The OHT can transfer the plurality of EUV cassettes between the EUV cassette stocker and an EUV system (an EUV process system that performs an EUV process). At step 220, the OHT port transfers the plurality of EUV cassettes from the EUV cassette stocker, where the plurality of EUV cassettes are stored. At step 230, the plurality of EUV cassettes are moved from the EUV stocker to the EUV system, where the plurality of EUV masks are used for the EUV process. In the EUV system, the EUV masks are removed from the EUV cassettes and used in an EUV tool, where a substrate placed in the EUV system is patterned using a photolithography process. After the photolithography process at step 230 is completed, the EUV masks are returned to the EUV cassette. At step 240, the OHT transfers the EUV cassettes with the used EUV masks to the EUV cassette stocker. At step 250, multiple EUV boxes including multiple EUV masks, whether used or unused, can be transferred using the OHT for EUV mask inspection. At step 260, an inspection is performed to verify whether the EUV mask meets quality requirements, such as critical dimension standards. At step 270, a determination is made as to whether the EUV mask meets quality requirements. If it is determined that the EUV mask does not meet quality requirements, the process proceeds to step 280. If it is determined that the EUV mask meets quality requirements, the EUV mask is returned to the EUV box. When the EUV mask fails the EUV mask inspection performed at step 270, the EUV mask undergoes an electron beam operation (EBO) at step 280. The EBO process is intended to repair EUV masks that fail the EUV mask inspection.
[0079] In one or more embodiments, a controller 130 operably connected to the EUV cassette stocker 101 (e.g., a subset of the stocker system 100 ) can control internal components within the EUV cassette stocker 101 to ensure a safety interlock process is in place. Furthermore, the controller 130 can control the OHT port to automate the storage process and the transfer process. Furthermore, the controller 130 is configured to control the gas supplied within the EUV cassette stocker. For example, the controller 130 can control the type of gas supplied to the EUV cassette stocker 101 (e.g., N2, O2, etc.), the pressure level maintained within the EUV cassette stocker 101, the temperature within the EUV cassette stocker 101, the humidity within the EUV cassette stocker 101, hydrocarbon detection within the EUV cassette stocker 101, and the like. The controller 130 is also configured to ensure that one or more operators working within the EUV cassette stocker 101 operate under safe conditions. Furthermore, in some embodiments, the controller 130 controls air circulation within the EUV cassette stocker 101.
[0080] In one or more embodiments, a hydrocarbon sensor can be installed in the EUV cassette stocker 101 of the stocker system 100. For example, instead of installing a hydrocarbon sensor in each EUV cassette, one or more hydrocarbon sensors can be located at various locations within the stocker 101. Such hydrocarbon sensors are configured to detect the concentration of hydrocarbons in the stocker 101. As explained in more detail below, the detected hydrocarbon concentration is utilized to ensure that the hydrocarbon concentration in the stocker 101 remains at a desired low level. In alternative embodiments, hydrocarbon sensors can be provided in each EUV cassette to determine the hydrocarbon concentration in each EUV cassette.
[0081] In some embodiments, when a plurality of substrates (e.g., EUV masks) are stored within the EUV cassette stocker (e.g., at step 220), a controller 130 operatively connected to the EUV cassette stocker 101 causes one or more of the aforementioned functions to be performed or controlled. Furthermore, in one or more embodiments, the operation of the controller 130 may be assisted by AI technology. Details of the operation of the AI-driven dynamic controller 130 are further described below.
[0082] Figure 3A is a side view of a stocker system and process for safety interlocking, according to some embodiments.
[0083] exist Figure 3A, a side view of the stocker system 100 is shown. Before an operator can enter the stocker system 100, the controller 130 initiates an automatic safety interlock process that may be driven by AI technology.
[0084] The stocker system 100 includes access Figure 5AThe inlet system 310 includes an independent air return boundary (also referred to as an independent return air space) 530 in the storage system 100. In some embodiments, the inlet system 310 may be referred to as a safety interlock assembly or a safety interlock subsystem. The inlet system 310 includes an oxygen cylinder detection module (or oxygen cylinder detection assembly 320) configured to check the oxygen level contained in the cylinder (or oxygen supply) used by the operator as an oxygen source when the operator enters the storage system 100. In one embodiment, the oxygen cylinder detection assembly includes an oxygen pressure detector for detecting the pressure within the oxygen cylinder. The inlet system 310 also includes an operator mask and piping scanning module 330 (or operator mask and piping scanning assembly 330). The operator mask and piping scanning assembly 330 is configured to scan the operator mask and the oxygen delivery pipe or conduit for the operator mask for proper operation before the operator, wearing the operator mask and oxygen cylinder, enters the storage system 100. The access system 310 also includes an operator identifier scanning module 340 (or operator identifier scanning assembly 340). The operator identifier scanning assembly 340 is configured to scan the operator ID of an operator entering the storage system 100. The operator identifier scanning assembly 340 ensures that at least two operators enter the storage system 100 simultaneously. The access system 310 ensures the safety of operators entering the storage system 100 while the storage system 100 is in operation by ensuring that an appropriate oxygen supply is available and that the oxygen masks worn by the operators are functioning properly. For example, if at least one of the operations of the oxygen cylinder detection assembly 320, the operator mask and tubing scanning assembly 330, and the operator identifier scanning assembly 340 is not performed and the result of the verification is positive, the operator entering the storage system 100 may experience oxygen deprivation and the physiological risks associated with oxygen deprivation upon entering the storage system 100. For example, if the oxygen pressure detector (or oxygen sensor) senses that the pressure of the O2 cylinder is lower than the level required to supply sufficient oxygen to the operator (e.g., less than 5 MPa), the operator may suffer from oxygen deficiency after entering the storage system 100. Therefore, the oxygen pressure in the oxygen cylinder to be used by the operator is detected so that the pressure in the oxygen cylinder is equal to or higher than 5 MPa. Here, the threshold level of oxygen pressure is selected to be 5 MPa. However, in other embodiments, based on various different settings, the threshold level can be different values, such as higher or lower than 5 MPa.
[0085] Figure 3Bis a flow chart of a safety interlock process according to some embodiments. The safety interlock process is operated by a controller 130 incorporated into the depositor system 100. The controller 130 is operably coupled to the entry system 310 and controls the operation of the entry system 310 to ensure safety for operators entering the depositor system 100. In some embodiments, the safety interlock assembly may be included in the controller 130. However, other variations and arrangements may be implemented. For example, in this case, the safety interlock assembly may be part of the entry system 310 operably connected to the controller 130.
[0086] according to Figure 3B In an embodiment, at step 360, an operator may request entry into the storage system 100 (e.g., including the EUV box storage 101) through the entrance system 310. At step 370, the oxygen cylinder detection assembly 320 may then inspect the oxygen cylinder using an oxygen pressure detector. The operator mask and pipe scanning assembly 330 may inspect the operator mask and oxygen delivery pipe to check whether the mask and / or pipe are functioning properly and are leak-free. The operator identifier scanning assembly 340 scans the operator ID of the operator entering the storage system 100. When the number of operators entering the storage system 100 is two or more, the entrance system 310 may grant entry. The above inspection procedures are all performed at step 370. In some embodiments, the order of the inspection procedures may be different from the above order. For example, the operator identifier scanning assembly 340 may be operated first, then the oxygen cylinder detection assembly 320 may be operated, and finally the operator mask and oxygen pipe scanning assembly 330 may be operated. While the sequence of checks can be performed in a variety of orders, if any one of the checks fails, the request to enter the storage system 100 will be denied, and the check sequence may have to be performed multiple times. For example, if the oxygen cylinder detection assembly 320 detects that the oxygen pressure is less than 5 MPa, oxygen can be added to the oxygen cylinder so that the oxygen pressure is greater than or equal to 5 MPa. In another example, if only a single operator is identified by the operator identifier scanning assembly 340, then the operator may need to wait for another operator to join before the entry system 310 allows multiple operators to enter the storage system 100. In yet another example, if the oxygen mask and oxygen line scan indicates that the oxygen mask and / or oxygen line are not functioning properly, the operator will need to repair the oxygen mask and / or oxygen line or wear a different oxygen mask and / or oxygen line before retesting.
[0087] If all check procedures are checked and the result is positive, then at step 380 , the entry system 310 unlocks the door and allows multiple operators to enter the storage system 100 .
[0088] Figure 4is a schematic diagram of a stocker system according to some embodiments. Figure 4 A simplified view of the storage system 100 is shown. Figure 5A A view of the stocker system 100 from the AA side is depicted. Figure 5B The following describes a view of the stocker system 100 as seen from the BB side. Figure 5C A view of the stocker system 100 from the CC side is depicted.
[0089] like Figure 5B As shown, the stocker system 100 includes a robotic crane 410. The robotic crane 410 is configured to transfer a plurality of EUV cassettes 420 within the stocker 101. For example, in the stocker system 100, it may be beneficial to transfer the plurality of EUV cassettes 420 via the robotic crane 410. Furthermore, automating the transfer within the stocker system 100 may also be beneficial for operator safety and quality reasons. The size of the robotic crane 410 and EUV cassettes 420 may depend on the height of the cleanroom.
[0090] The stocker system 100 includes an automatic input / output interface (or automatic I / O) 430. The automatic I / O 430 is used to control an interface process for transferring a plurality of EUV cassettes 420 between an AMHS system (eg, OHT 440) and the stocker system 100.
[0091] In some embodiments, the automated I / O 430 is located at a height above a raised floor 450. For example, the automated I / O 430 may be at least 2 meters above the raised floor 450. Maintaining a height of 2 meters above the raised floor 450 allows operators to safely operate within the stocker system 100 without colliding with or interfering with the OHT 440 that transfers EUV cassettes 420 to and from the automated I / O 430. Additionally, the OHT 440 may operate at a similar or higher height than the automated I / O, allowing the OHT 440 to freely transfer and hover within the stocker system 100.
[0092] like Figure 5A As shown, the stocker 101 includes a manual port 460 where an operator manually removes or supplies an EUV cassette 420 from or to the stocker 101. The height of the manual port 460 relative to the raised floor 450 can vary and be selected to accommodate the operator using the manual port 460. For example, the top surface of the manual port 460 can be approximately 70 cm from the top surface of the raised floor 450.
[0093] The storage system 100 includes a Make-up Air Unit (MAU) 470, a Fan Filter Unit (FFU) 480, and a Dry Cooling Coil (DCC) 490. The MAU 470 (or air source 470) is configured to supply fresh air to the storage 101. The FFU 480 (or filter assembly 480) is configured to filter the fresh air received from the MAU and supply it to the storage 101. The DCC 490 is configured to control the temperature of the gas supplied to the storage 101 in the storage system 100. One feature of the MAU 470 and the FFU 480 is to control the oxygen concentration in the storage 101 so that the O2 concentration in the storage system 100 remains above a threshold level or within a threshold range. For example, in some embodiments of the present disclosure, the oxygen concentration threshold range is approximately 19.5% to 21%. For example, if the oxygen concentration detection assembly 720 (in Figure 7 If the oxygen concentration sensing assembly 470 senses that the O2 concentration is less than the range (e.g., less than 19.5% oxygen concentration in the storage system 100), the oxygen concentration sensing assembly controls the MAU 470 and the FFU 480 to increase the air flow in an effort to increase the oxygen concentration in the storage system 100. The air flow through the MAU 470 and the FFU 480 can be increased to increase the O2 supply until the O2 concentration within the storage system 100 enters the threshold range.
[0094] The DCC 490 controls the temperature within the storage units 101 of the storage system 100 so that the temperature remains within a specific temperature range. For example, in some embodiments, the DCC 490 controls the temperature within the storage units 101 to approximately 23°C ± 2°C. If the temperature within the storage units 101 of the storage system 100 falls below or rises above this range, the DCC 490 provides cooling to lower the temperature within the storage units 101 to approximately 23°C ± 2°C, or provides heating to increase the temperature within the storage units 101 to approximately 23°C ± 2°C.
[0095] The stocker system 100 implements an independent return air design (including the MAU 470, FFU 480, and DCC 490) so that it does not share a return air system with EUV tools located near the stocker system 100. For example, in the event of a fire or smoke or other hazardous situation, it is beneficial for the stocker system 100 and the other EUV tools to have independent and distinct return air systems. This is in part because if the EUV stocker catches fire or generates smoke or other airborne particulate material, the smoke or particulate material will easily be transferred to other EUV tools via the shared air system. Therefore, one or more advantages of the stocker system 100 according to the present disclosure is that it is implemented with an independent return air system that is different from the air systems supporting other nearby EUV tools.
[0096] As part of the independent return air system according to some embodiments of the present disclosure, an air curtain 500 is used for the automated I / O 430 and the OHT 440. For example, the OHT 440 transfers the EUV cassette 420 to the automated I / O 430, which in turn transfers the EUV cassette 420 to the stocker system 100. By using the air curtain 500 at the entrance of the automated I / O 430 into the stocker system 100, the air curtain 500 prevents or minimizes the entry of unwanted materials in gaseous or particulate form into the stocker system 100 during the transfer of the EUV cassette 420 to the stocker system 100. In addition, the air curtain 500 prevents N2 from leaking from the stocker. For example, if a physical door were used instead of the air curtain 500, the transfer performance of the OHT entering and exiting the stocker might be affected due to the opening and closing time of the physical door. Using the air curtain 500 can reduce the transfer time delay caused by having to wait for the physical door to open and close, and can reduce or prevent N2 leakage.
[0097] like Figure 5C As shown, the stocker system 100 includes a manual port (or entry door) 460 that an operator uses to manually transfer the EUV cassette 420 into the stocker system 100. In some embodiments, the manual port 510 is also designed to prevent N2 from leaking from the stocker system 100, for example by providing a gas, such as a gas curtain.
[0098] like Figure 5A and 5BAs shown, an exhaust duct 520 can be used to dilute the N2 concentration if necessary. For example, the exhaust duct 520 is used to enhance downward flow and reduce the N2 concentration in the stocker environment. In one or more embodiments, an N2 supply duct system is installed for each shelf of the stocker. After N2 gas is supplied to and used in each EUV box in the stocker, N2 gas may leak from each EUV box. A portion of the leaked N2 gas flows into the independent return air space 530. For example, N2 gas is processed by the DCC 490 and FFU 480 and then mixed with fresh air from the MAU 470 before being provided to the stocker environment. Another portion of the N2 gas flows out of the stocker system 100 through the exhaust duct 520, resulting in a dilution of the N2 concentration. One function of the exhaust duct is to allow N2 gas in the stocker environment to continuously leave the FAB. At the same time, the MAU 470 provides fresh air to the stocker system, which can dilute the N2 concentration in the stocker.
[0099] As described above, the stocker system 100 includes an isolated return air boundary 530. In some embodiments, the isolated return air boundary 530 is located outside the stocker 101. The isolated return air boundary surrounds the stocker 101 and forms a gas return plenum between the exterior of the stocker 101 and the isolated return air boundary. The isolated return air boundary 530 is implemented between the MAU 470 and a waffle 540 (e.g., a waffle-shaped support structure). The isolated return air boundary 530 is used to isolate the stocker system 100 and prevent gas from the stocker system 100 from mixing with the air supply from the surrounding EUV tool area (e.g., areas outside the isolated return air boundary 530 where other EUV tools and equipment are located). In some embodiments, the isolated return air boundary 530 may have one or more openings 550 for connecting to the MAU 470 to receive the air supply. In one or more embodiments, the openings 550 may include valves for directing the air flow.
[0100] Multiple O2 sensors 560 are located at different locations within the storage system 100 to detect O2 concentrations. Additional O2 sensors 560 can be added at different locations. In some embodiments, a set of O2 sensors 560 is placed for every 1 cubic meter of storage 101 of the storage system 100. In addition, as Figure 5A 、 5B As shown in Figures 5C and 5C, a plurality of pressure sensors 570 may be located at various locations within the storage container 101 of the storage system 100 to detect the pressure within the storage container 101. These pressure sensors 570 enable determination of the pressure differential between the interior of the storage system 100 and the exterior of the storage system 100. For example, maintaining a positive pressure within the storage system 100 relative to the environment exterior to the storage system 100 may be beneficial.
[0101] As described, in one or more embodiments, a controller is operably coupled to the storage container 101 or storage space of the storage container system 100, and the controller is configured to control at least one of the air or other air flow supplied to the storage space, the hydrocarbon concentration in the storage space, the oxygen concentration within the storage space, the humidity within the storage space, the pressure within the storage space, or the temperature within the storage space.
[0102] Figure 6 is a diagram of the font system 100 illustrating fonts and airflow within the font system 100, according to some embodiments.
[0103] Figure 6 Shows the Figure 5A AA side view of the storage system 100. N2 gas is supplied to each EUV box stored in multiple racks of the storage system 101. An independent return air boundary 530 surrounds the area of the storage system 101. By surrounding an area larger than the storage system 101, the independent return air boundary 530 is able to recirculate some of the airflow within the storage system 101. The N2 gas supplied to each EUV box may leak from the box. The leaked N2 gas flows in the direction of arrow 610. Here, part of the N2 gas is sent out through the exhaust pipe 520, which may cause the N2 concentration in the independent return air boundary 530 to be diluted. The remaining part of the N2 gas is supplied in the direction of arrow 620 and supplied to the DCC 490. Thereafter, the N2 gas is directed in the direction of arrow 630, where it is mixed with the air supplied from the MAU 470. The MAU 470 supplies fresh air or other oxygen-containing gas into the independent return air boundary 530 through one or more openings 550 in the independent return air boundary 530. The air is then supplied to the storage 101 along with N2 gas through an air supplier 590. In some embodiments, the air supplier 590 is an FFU that filters the air from the MAU before delivering the filtered air to the storage. The air received from the MAU 470 and the DCC is transmitted to the storage 101 in a direction 600 through the air supplier 590, as shown in FIG. Figure 6 After the air is delivered to the storage container 101, it flows downward and leaves the storage container 101 in direction 610. This cycle can be repeated.
[0104] In the storage system 100 , the system includes a plurality of oxygen sensors 560 , a plurality of pressure sensors 570 , and a plurality of hydrocarbon detection sensors 580 at one or more locations to measure oxygen concentration, pressure within the storage, and hydrocarbon concentration within the storage, respectively.
[0105] Depending on the current state of the air, the exhaust pipe 520 can release the gas to the environment outside the storage system 100 to dilute the concentration of N2 gas and other gases. The remaining air (including N2 gas, O2 gas and other gases) can circulate in direction 620, such as Figure 6 As shown. Furthermore, as previously described, the N2 gas supplied to each EUV box in the stocker can be used for purging and may subsequently leak naturally from each EUV box. A portion of this N2 gas may then flow into the exhaust duct 520 and a portion may flow into the independent return air boundary 530, as shown by arrow 620.
[0106] The controller 130 of the storage system 100 includes a temperature regulation assembly ( Figure 7 The temperature control module 750 in the storage system 100 is operatively connected to the DCC 490. When the temperature control assembly 750 detects that the temperature in the storage container 101 of the storage system 100 is outside the desired temperature range (e.g., 23°C ± 2°C), the temperature control assembly 750 controls the DCC 490 so that the DCC 490 heats or cools the air in the independent return air boundary 530 to maintain the temperature in the storage container 101 within the desired range. After the air is heated (or cooled), the air is heated (or cooled) Figure 6 The air is supplied in the direction 630 shown and enters the air supply 590. The independent return air boundary 530 of the stocker system 100 supports independent control of the air flow temperature and separates the air flow within the stocker system 100 from the air flow systems of other EUV tools.
[0107] Figure 7 is a block diagram of an AI-driven dynamic controller according to some embodiments.
[0108] In one or more embodiments of the present disclosure, the AI-driven dynamic controller 130 is configured to detect hydrocarbon concentrations in the reservoir 101 via the hydrocarbon detection assembly 710 (or hydrocarbon detection module 710 ). Hydrocarbons present in the reservoir 101 that are transferred to a subsequent EUV tool may damage the EUV mask stored therein. For example, hydrocarbon particles may coat or deposit on the EUV mask. If such EUV masks damaged by hydrocarbons are used in an EUV tool, substrates (or wafers) processed using these damaged EUV masks will be adversely affected, for example, patterned features will not meet critical dimension standards. Therefore, it is advantageous to detect hydrocarbon levels in the reservoir and take measures to reduce the detected hydrocarbon concentration. For example, in some embodiments, the hydrocarbon detection assembly 710 detects the hydrocarbon concentration within the reservoir 101 and determines whether it exceeds a threshold level. In some embodiments, the threshold level may be 10 ppm. If the hydrocarbon concentration in storage container 101 is greater than 10 ppm, the flow rate of the N2 gas supply may be increased to reduce the hydrocarbon concentration to less than 10 ppm. Here, the threshold level for the hydrocarbon concentration is selected to be 10 ppm. However, in other embodiments, the threshold level may be less than 10 ppm or greater than 10 ppm based on various configurations.
[0109] The AI-driven dynamic controller 130 is configured to detect the oxygen concentration within the storage system 100 via the oxygen concentration detection module 720 (or oxygen concentration detection assembly 720). The oxygen concentration detection assembly 720 ensures that the O2 concentration is controlled within a selected level of O2 concentration within the storage system 100. For example, if the oxygen concentration detection assembly 720 senses that the O2 concentration is less than an oxygen threshold range, which may be between 19.5% and 21%, the oxygen concentration detection assembly 720 controls the MAU to increase airflow. The airflow can be increased by the MAU to increase the O2 supply until the O2 concentration is within the threshold range.
[0110] The AI-driven dynamic controller 130 is configured to detect the humidity in the storage system 100 through a humidity detection module 730 (or humidity detection assembly 730). The humidity detection assembly 730 included in the controller 130 is operably coupled to one or more humidity sensors to ensure that the humidity level is controlled at a selected level (e.g., a threshold level) in the storage system 100. If the humidity level exceeds a predetermined threshold level, the EUV mask is affected (e.g., the surface of the EUV mask may be damaged). For example, if the humidity detection assembly 730 detects that the humidity in the storage 101 is greater than about 10%, the humidity detection assembly 730 controls (e.g., increases) the N2 gas supply flow rate so that the humidity drops below 10%.
[0111] The AI-driven dynamic controller 130 is configured to detect the pressure in the storage system 100 through the pressure detection module 740 (or the pressure detection assembly 740). The pressure detection assembly 740 is operably coupled to the pressure sensor to ensure that the pressure is controlled so that the pressure of the storage system 100 is higher than the pressure of the clean room (e.g., the room outside the storage system 100). For example, if the pressure of the storage system 100 is less than a threshold level (e.g., the pressure of the clean room), any unwanted external foreign matter, particles present in the clean room may flow into the storage system 100. Therefore, if the pressure of the storage system 100 is less than the pressure of the clean room, the pressure detection assembly 740 controls the airflow through the MAU so that the pressure of the storage system 100 becomes higher than the pressure of the clean room.
[0112] In some embodiments, the controller 130 also includes an oxygen cylinder detection assembly 320, an operator mask and duct scanning assembly 330, and an operator identifier scanning assembly 340. However, in other embodiments, the oxygen cylinder detection assembly 320, the operator mask and duct scanning assembly 330, and the operator identifier scanning assembly 340 may be part of a separate microprocessor and may not necessarily be included in the controller 130, which is operably coupled to the controller 130.
[0113] The AI-driven dynamic controller 130 includes a temperature regulation module 750 (or temperature regulation assembly 750). In some embodiments, the temperature regulation assembly 750 may not be included in the controller 130, but may be operably coupled to the controller 130 to perform the temperature regulation function of the assembly.
[0114] Because the controller 130 is driven by AI algorithms and techniques, the controller 130 includes an AI training circuit 760 (or AI training module 760) capable of training the system to employ one or more artificial intelligence techniques. "Artificial intelligence" is used herein broadly to describe any computational intelligence system and method that can learn knowledge (e.g., based on training data and further based on actual measurement data) and use the learned knowledge to adjust an approach to solving one or more problems, for example, by making inferences based on received inputs (e.g., measurements (measurement data) received by the storage system 100). Artificial intelligence machines can employ, for example, neural networks, deep learning, convolutional neural networks, Bayesian program learning, and pattern recognition techniques to solve problems such as determining condition requirements within the storage system 100 and dynamically addressing conditions within the storage system 100 (e.g., N2 concentration and flow, hydrocarbon concentration, pressure level, O2 concentration, temperature, humidity level, air flow rate, etc.) using AI techniques. Furthermore, artificial intelligence may include any one or a combination of the following computational techniques: constraint programming, fuzzy logic, classification, conventional artificial intelligence, symbolic manipulation, fuzzy set theory, evolutionary computation, cybernetics, data mining, approximate reasoning, derivative-free optimization, decision trees, and / or soft computing. Utilizing one or more computational intelligence techniques, the controller 130 may learn to automatically determine and apply safe and optimized conditions for production in the storage system 100.
[0115] For training purposes, various training inputs may also be provided to the AI training circuitry 760. The training inputs may include, for example, gas flow rate supply data, gas composition data, pressure data, air circulation rate data, oxygen concentration data, humidity data, hydrocarbon concentration data, temperature data, and other various data measured in the storage system 100. This training data may initially be manually input to the AI training circuitry 760, but after some training process, the AI training circuitry 760 will further learn and improve based on actual measurement data collected during the operation of the storage system 100.
[0116] In some embodiments, using the training data, the AI training circuit 760 can implement an iterative training process. The training can be based on a variety of learning rules or training algorithms. For example, the learning rules can include one or more of the following: back-propagation, real-time recurrent learning, pattern-by-pattern learning, supervised learning, unsupervised learning, semi-supervised learning, reinforcement learning, self-learning, feature learning, sparse dictionary learning, anomaly detection, interpolation, weighted sum, reinforcement learning, temporal difference learning, and / or recording learning.
[0117] An exemplary training algorithm that can be used in the AI training assembly 760 is the backpropagation learning algorithm, which is a common method for training artificial neural networks. Backpropagation generally includes two stages: propagation and weight update. In the propagation stage, the input of the training pattern is propagated forward through the neural network to generate the propagated output activation. The propagated output activation is then propagated backward through the neural network using the training pattern target to generate the increments of all output and hidden neurons (i.e., the difference between the input and output values). In the weight update stage, for each weight synapse, the following steps are generally performed: the first step is to multiply its output increment and input activation to obtain the gradient of the weight; the second step is to subtract the ratio (percentage) of the gradient from the weight. Repeat the propagation and weight update stages as needed until the network performance is satisfactory.
[0118] In one or more embodiments, the AI training circuit 760 can identify various patterns related to gas supply, storage automation, transfer automation, operator safety, independent return air, and safety interlocks as described above. The AI-driven dynamic controller 130 can further improve the operation of the storage system 100 because it can better recognize these patterns through training by the AI training circuit 760.
[0119] For example, in one or more embodiments, the AI training circuit 760 is operably connected to the controller (or included in the controller), and the AI training circuit 760 can identify data patterns of at least one of a gas flow supply rate to the storage space, a nitrogen flow supply rate to the EUV box, a hydrocarbon concentration in the storage space, an oxygen concentration in the storage space, a humidity in the storage space, a pressure in the storage space, or a temperature in the storage space.
[0120] Figure 8 is an example of a dynamic control flow of the AI-driven dynamic controller 130 according to some embodiments.
[0121] In a storage system 100 (e.g., an EUV box storage 101), an inspection system is used to check at least one or more of hydrocarbon concentration, O2 concentration, pressure level, humidity level, N2 concentration, N2 flow rate, or gas flow rate within the storage 101. If these factors are checked and meet the required conditions, the substrate in the EUV box is transferred to the EUV scanner using EUV automatic radical transportation (ART). Examples of EUV ART include, but are not limited to, AMHS, OHT, mobile robot (MR), automated guided vehicle (AGV), rail guided vehicle (RGV), etc. In one or more embodiments, the EUV ART supports the transfer of EUV boxes between the storage and the EUV tool. After the scanning process of the EUV tool including the EUV mask is completed, the EUV mask in the EUV box is used for the EUV process. In some embodiments, the controller of the storage system 100 can automatically control the above-mentioned automated machinery based on the pattern recognized by the AI training circuit 760 (for example, fluctuations in the measured values of at least one of the air flow supply entering the storage space, the hydrocarbon concentration within the storage space, the oxygen concentration within the storage space, the humidity within the storage space, the pressure within the storage space, or the temperature within the storage space over a period of time).
[0122] In the storage container 101, pure N2 gas (PN2) is provided at 800 through one or more valves 805. According to an embodiment of the present disclosure, in order to improve storage quality (for example, to minimize degradation due to oxidation or to minimize contamination of EUV masks in respective EUV boxes), a high amount of N2 gas is initially supplied to respective EUV boxes. After a period of time, the large amount of N2 gas supplied to the EUV box is controlled and maintained at a lower flow rate (L / min) than the previous large amount of supply. The controller can dilute the pure nitrogen gas by mixing it with air. The supply is dynamically controlled by the controller 130, taking into account various specifications of the EUV box storage and the storage environment. According to various settings and parameters, the controller will control the gas supply level and gas supply duration to the EUV box to improve the storage quality of the EUV box storage. For example, if the humidity of the combination of pure nitrogen and air supplied to each EUV box rises above a predetermined amount (e.g., 10%), the controller will increase the flow rate of nitrogen supplied to the stocker 101 until the humidity returns to the desired level and / or may reduce the flow rate of the air combined with the pure nitrogen.
[0123] exist Figure 8In the example, a humidity meter 810 senses the humidity level of the purge gas delivered to or exiting each EUV cassette. The mass flow control (MFC) system 820 distributes the gas based on the piping design. During the purge process within the EUV cassette, some purge gas leaks from the cassette. When the humidity of the purge gas is detected to be above 10%, or the oxygen concentration is detected to be below 19.5%, and the pressure of the stocker 101 is detected to be lower than the ambient pressure outside the stocker system 100, the dynamic controller 130 controls the MAU 470 to increase the gas flow rate entering the stocker system 100 and increase the flow rate of N2 gas (as previously mentioned, one benefit of N2 gas is that it reduces humidity). Increasing the gas flow rate entering the stocker system 100 can increase the pressure within the stocker system 100. Increasing the gas flow rate entering the stocker system 100 will either increase or decrease the oxygen concentration within the stocker 101, depending on the current oxygen concentration within the stocker 101. The FFU 480 filters fresh air and supplies it to the depositor.
[0124] According to some embodiments, a hydrocarbon sensor 580 is used to detect hydrocarbon concentration within the storage system 100. In one or more embodiments, the hydrocarbon sensor 580 is installed in an EUV cassette located in the storage cassette 101 of the storage system 100. The hydrocarbon sensor 580 is configured to detect hydrocarbon concentration within the EUV cassette. When the hydrocarbon concentration is above approximately 10 ppm, a controller operably coupled to the EUV cassette signals a gas flow supply to supply nitrogen gas to the EUV cassette. The increase in nitrogen gas reduces the hydrocarbon concentration within the EUV cassette. Once the hydrocarbon concentration is below approximately 10 ppm, the controller can maintain the nitrogen gas level supplied to the EUV cassette. When the hydrocarbon concentration is below approximately 10 ppm, the controller can maintain, increase, or decrease the nitrogen gas flow rate to meet other gas requirements within the EUV cassette and storage cassette 101. For example, N2 gas is also used to reduce humidity within the EUV cassette. Therefore, when the hydrocarbon concentration remains at a desired low level, the nitrogen gas flow can be increased or decreased based on other factors, such as humidity. As mentioned earlier, adding nitrogen helps reduce humidity in the EUV box.
[0125] According to some embodiments, after being processed by DCC 490, a portion of the gas exiting the storage unit 101 is returned to the storage unit. DCC 490 controls the temperature of the gas flowing through DCC 490. The temperature of the gas flowing through DCC 490 is controlled so that the temperature within the storage unit 101 remains within a desired range, for example, approximately 23°C ± 2°C. If the temperature within the storage unit 101 falls below or rises above this range, DCC 490 cools the gas in the independent return air boundary 530 to lower its temperature, thereby lowering the temperature within the storage unit 101, or heats the gas in the independent return air boundary 530 to increase its temperature, thereby increasing the temperature within the storage unit 101. A portion of the gas exiting the storage unit 101 in direction 610 is conveyed to the environment outside the storage unit system 100 via exhaust duct 520. In some embodiments, the oxygen concentration of the gas within the storage unit 101 is additionally or alternatively determined by the gas exhausted from the storage unit 101 in direction 610 or by the gas exhausted via exhaust duct 520.
[0126] According to the stocker system 100 implementing the AI-driven dynamic controller 130, safety conditions are dynamically adjusted to meet the required conditions. This also eliminates the need for an operator in the EUV area. Furthermore, the stocker system 100 can provide safety interlocks, independent air / gas supply, and independent return air flow. Those skilled in the art will readily appreciate the further technical advantages of one or more embodiments of the present disclosure.
[0127] Figure 9 is a flow chart of a method of controlling conditions within a storage system according to one or more embodiments of the present disclosure.
[0128] Method 900 includes supplying a first gas to a storage space configured to store one or more substrates (at step 910). In some embodiments, the first gas is nitrogen, the storage space is an EUV cassette, and the substrate is an EUV mask. Method 900 includes detecting a humidity level of the storage space (at step 920). Method 900 includes increasing the supply of the first gas to the storage space in response to the detected humidity level of the storage space being above a threshold level (at step 930). Method 900 includes detecting a hydrocarbon concentration within a container in which a plurality of storage spaces are stored (at step 940). Method 900 includes increasing the supply of the first gas to the storage space in response to the detected hydrocarbon concentration within the storage space being above a threshold concentration (at step 950).
[0129] In other embodiments, the method includes detecting a pressure level within the storage space. The method may further include increasing a flow rate of the second gas into the storage space in response to the pressure level within the storage space being lower than a pressure level outside the storage space.
[0130] In yet other embodiments, the method includes detecting an oxygen concentration within the storage space. The method may further include increasing a flow rate of the third gas into the storage space in response to the oxygen concentration of the storage space being below a threshold oxygen concentration.
[0131] One or more embodiments of the present disclosure provide a storage system. The storage system includes a storage space configured to store one or more substrates. The storage system also includes a controller operably coupled to the storage space. In some embodiments, the controller is configured to control at least one of the airflow supply entering the storage space, the hydrocarbon concentration in the storage space, the oxygen concentration in the storage space, the humidity in the storage space, the pressure in the storage space, or the temperature in the storage space. The storage system also includes an artificial intelligence training circuit operably connected to the controller. In some embodiments, the artificial intelligence training circuit is configured to recognize multiple data patterns of at least one of the airflow supply entering the storage space, the hydrocarbon concentration in the storage space, the oxygen concentration in the storage space, the humidity in the storage space, the pressure in the storage space, or the temperature in the storage space. The storage system also includes automated machinery configured to automatically transfer one or more substrates into and out of the storage space.
[0132] One or more embodiments of the present disclosure also provide an EUV storage system. The EUV storage system includes one or more storage units configured to store one or more workpieces (e.g., EUV masks). The EUV storage system also includes a controller operably coupled to the one or more storage units. In some embodiments, the controller is configured to control at least one of the airflow supply entering the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity in the storage unit, the pressure in the storage unit, or the temperature in the storage unit. The EUV storage system also includes an artificial intelligence training circuit operably connected to the controller. In some embodiments, the artificial intelligence training circuit is configured to recognize multiple data patterns of at least one of the airflow supply entering the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity in the storage unit, the pressure in the storage unit, or the temperature in the storage unit.
[0133] One or more embodiments of the present disclosure also provide a method. The method includes supplying a first gas into a storage space configured to store one or more substrates. The method includes detecting a humidity level in the storage space. The method also includes increasing the supply of the first gas to the storage space in response to the detected humidity level in the storage space being above a threshold level. The method also includes detecting a hydrocarbon concentration in the storage space. The method includes increasing the supply of the first gas to the storage space in response to the detected hydrocarbon concentration in the storage space being above a threshold concentration. In some embodiments, the first gas includes nitrogen.
[0134] In some embodiments, the present disclosure relates to a storage system comprising: a storage box configured to store one or more masks, the storage box being contained in a storage box; a controller operably coupled to the storage system, the controller being configured to control at least one of an airflow supply entering the storage box, a hydrocarbon concentration in the storage box, an oxygen concentration in the storage box, a humidity within the storage box, a pressure within the storage box, or a temperature within the storage box; an artificial intelligence training circuit operably connected to the controller, the artificial intelligence training circuit being configured to identify multiple data patterns of at least one of the airflow supply entering the storage box, the hydrocarbon concentration in the storage box, the oxygen concentration in the storage box, the humidity within the storage box, the pressure within the storage box, or the temperature within the storage box; and automated machinery configured to move the storage box into and out of the storage box. In some embodiments, the plurality of data patterns include fluctuations in measured values over a time period regarding at least one of the airflow supply to the storage cartridge, the hydrocarbon concentration in the storage cartridge, the oxygen concentration in the storage cartridge, the humidity within the storage cartridge, the pressure within the storage cartridge, or the temperature within the storage cartridge. In some embodiments, the storage system further comprises: a hydrocarbon detection assembly configured to detect the hydrocarbon concentration in the storage cartridge, wherein the controller is configured to maintain the hydrocarbon concentration in the storage cartridge below approximately 10 ppm by controlling the airflow supply comprising nitrogen to the storage cartridge in response to the hydrocarbon concentration detected by the hydrocarbon detection assembly. In some embodiments, the storage system further comprises: a safety interlock assembly operably coupled to the controller, the safety interlock assembly comprising: an oxygen pressure detector configured to detect the pressure of the oxygen supply; an operator equipment scanning assembly configured to determine whether the equipment of an operator entering the storage system is functioning properly; and an operator identifier scanning assembly configured to scan an identification of an operator entering the storage system. In some embodiments, the storage system further comprises: an independent air supply subsystem operably coupled to the controller, the independent air supply subsystem comprising: an air source configured to supply air to the storage system; a filter assembly configured to filter the air supplied from the air source before supplying the air to the storage; a temperature regulation assembly configured to regulate the temperature of the gas flowing into the storage; and one or more oxygen sensors configured to detect the oxygen concentration in the storage, wherein the controller controls the air supply so that the oxygen concentration in the gas storage box increases.In some embodiments, in response to the one or more oxygen sensors detecting that the oxygen concentration in the storage cartridge is below a threshold level, the controller controls the flow rate of air from the air source to the storage cartridge to increase the oxygen concentration in the storage cartridge. In some embodiments, the temperature regulation assembly is configured to regulate the temperature of the gas flowing into the storage cartridge so that the temperature of the storage cartridge is between approximately 21°C and approximately 25°C. In some embodiments, in response to detecting that the temperature in the storage cartridge is below approximately 21°C or above approximately 25°C, the temperature regulation assembly heats the gas flowing into the storage cartridge so that the temperature of the gas rises above 21°C or cools the gas flowing into the storage cartridge so that the temperature of the gas falls below 25°C. In some embodiments, the storage cartridge system further comprises a humidity sensor configured to detect a humidity level in the storage cartridge, the humidity sensor being operably coupled to the controller, wherein the controller is configured to regulate the flow of nitrogen gas into the storage cartridge when the humidity level falls below a threshold level. In some embodiments, the storage container system further comprises a pressure sensor configured to detect a pressure level within the storage container, the pressure sensor being operably coupled to the controller, wherein the controller is configured to regulate the flow of air from the air source to the storage container when the pressure level detected in the storage container is below a threshold level.
[0135] In some embodiments, the present disclosure relates to a method comprising: operably coupling a controller to one or more storage units; using the controller to control at least one of an airflow supply entering the storage unit, a hydrocarbon concentration in the storage unit, an oxygen concentration in the storage unit, a humidity within the storage unit, a pressure within the storage unit, or a temperature within the storage unit; operably connecting an artificial intelligence training circuit to the controller; and using the artificial intelligence training circuit to identify multiple data patterns of at least one of the airflow supply entering the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity within the storage unit, the pressure within the storage unit, or the temperature in the storage unit. In some embodiments, the method further comprises: operably coupling an independent air supply subsystem to the controller; supplying air to the storage unit using an air source of the independent air supply subsystem; filtering the air supplied by the air source using a filter assembly of the independent air supply subsystem before supplying the air to the storage unit; regulating the temperature of the gas flowing into the storage unit using a temperature regulation assembly of the independent air supply subsystem; detecting the oxygen concentration in the storage unit using one or more oxygen sensors of the independent air supply subsystem; and controlling the air source using the controller to increase the oxygen concentration in the storage unit. In some embodiments, the method further comprises: increasing the oxygen concentration in the storage unit by controlling the flow rate of air from the air source using the controller in response to the one or more oxygen sensors detecting that the oxygen concentration in the storage unit is below a threshold level. In some embodiments, the method further comprises: operably coupling a humidity sensor to the controller; detecting the humidity level in the storage unit using the humidity sensor; and regulating the flow of nitrogen gas into the storage unit when the humidity level is below the threshold level. In some embodiments, the method further includes: operably coupling a pressure sensor to the controller; detecting a pressure level within the storage unit using the pressure sensor; and regulating the air flow from the air source to the storage unit when the detected pressure level is below a threshold level.
[0136] In some embodiments, the present disclosure relates to a method comprising: supplying a first gas to a storage device configured to store one or more substrates; detecting a humidity level in the storage device; increasing the supply of the first gas to the storage device in response to the humidity level in the storage device being detected to be above a threshold level; detecting a hydrocarbon concentration within the storage device; and increasing the supply of the first gas to the storage device in response to the hydrocarbon concentration in the storage device being detected to be above a threshold concentration, wherein the first gas comprises nitrogen. In some embodiments, the method further comprises: detecting a pressure level within the storage device; and increasing the flow rate of a second gas to the storage device in response to the pressure level within the storage device being below a pressure level outside the storage device. In some embodiments, the method further comprises: detecting an oxygen concentration within the storage device; and increasing the flow rate of a third gas to the storage device in response to the oxygen concentration in the storage device being below a threshold oxygen concentration, wherein the third gas comprises oxygen.
[0137] The features of several embodiments are summarized above so that those skilled in the art can better understand the various aspects of the present disclosure. Those skilled in the art will understand that they can easily use this disclosure as a basis for designing or modifying other processes and structures to implement the same purposes and / or achieve the same advantages as the embodiments described herein. Those skilled in the art will also recognize that these equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions, and modifications herein without departing from the spirit and scope of the present disclosure.
Claims
1. A storage system comprising: a storage box configured to store one or more masks, the storage box being contained in the stocker; a controller operably coupled to the storage cartridge system, the controller configured to control at least one of an airflow supply into the storage cartridge, a hydrocarbon concentration in the storage cartridge, an oxygen concentration in the storage cartridge, a humidity within the storage cartridge, a pressure within the storage cartridge, or a temperature within the storage cartridge; an artificial intelligence training circuit operatively connected to the controller, the artificial intelligence training circuit configured to recognize a plurality of data patterns of at least one of the airflow supply into the storage cartridge, the hydrocarbon concentration in the reservoir, the oxygen concentration in the storage cartridge, the humidity within the storage cartridge, the pressure within the storage cartridge, or the temperature within the storage cartridge; an automated machine configured to move the storage boxes into and out of the storage container; as well as a safety interlock assembly operably coupled to the controller, wherein the safety interlock assembly is an inlet system into an independent return air boundary of the store system and the safety interlock assembly comprises: an operator equipment scanning assembly configured to determine whether equipment of an operator entering the font system is functioning properly, wherein the equipment is an operator mask and an oxygen delivery tube or conduit for the operator mask; and An operator identifier scanning assembly is configured to scan an identification of an operator entering the stocker system.
2. The storage system of claim 1 , wherein the controller is further configured to automatically control the automated machinery based on the plurality of data patterns identified by the artificial intelligence training circuit.
3. The storage system of claim 1 , wherein the plurality of data patterns include fluctuations in measured values over a time period of at least one of the airflow supply into the storage box, the hydrocarbon concentration in the storage box, the oxygen concentration in the storage box, the humidity within the storage box, the pressure within the storage box, or the temperature within the storage box.
4. The storage system of claim 1 , further comprising: a hydrocarbon detection assembly configured to detect the concentration of hydrocarbons in the storage container, The controller is configured to maintain a hydrocarbon concentration in the storage container below about 10 ppm by controlling the supply of the gas flow comprising nitrogen into the storage cartridge in response to the hydrocarbon concentration detected by the hydrocarbon detection assembly.
5. The storage system of claim 1 , wherein the safety interlock assembly further comprises: An oxygen pressure detector is configured to detect the pressure of an oxygen supply within an oxygen cylinder used as an oxygen source by an operator accessing the font system.
6. The storage system of claim 5, wherein the oxygen pressure detector is configured to detect whether the pressure of the oxygen supply is above about 5 MPa.
7. The storage system of claim 1 , further comprising: An independent air supply subsystem operably coupled to the controller, the independent air supply subsystem comprising: an air source configured to supply air to the font system; a filter assembly configured to filter the air supplied from the air source before supplying the air to the font; a temperature regulating assembly configured to regulate the temperature of the gas flowing into the font; and one or more oxygen sensors configured to detect the oxygen concentration in the storage container, The controller controls the gas supply to increase the oxygen concentration in the storage box.
8. The storage system of claim 7, wherein: In response to the one or more oxygen sensors detecting that the oxygen concentration in the storage cartridge is below a threshold level, the controller controls the flow rate of air from the air source to the storage cartridge to increase the oxygen concentration in the storage cartridge.
9. The storage system of claim 7, wherein: The temperature regulation assembly is configured to regulate the temperature of the gas flowing into the font such that the temperature of the font is between about 21°C and about 25°C.
10. The storage system of claim 9, wherein: In response to detecting that the temperature in the storage container is lower than about 21°C or higher than about 25°C, the temperature regulation assembly heats the gas flowing into the storage container so that the temperature of the gas rises above 21°C or cools the gas flowing into the storage container so that the temperature of the gas drops below 25°C.
11. The storage system of claim 1 , further comprising: a humidity sensor configured to detect a humidity level in the storage container, the humidity sensor being operatively coupled to the controller, The controller is configured to adjust the flow of nitrogen gas into the storage box when the humidity level is below a threshold level.
12. The storage system of claim 7, further comprising: a pressure sensor configured to detect a pressure level within the container, the pressure sensor being operatively coupled to the controller, The controller is configured to regulate the flow of air from the air source to the font when a pressure level detected in the font is below a threshold level.
13. A control method comprising: operatively coupling the controller to one or more storage units in the storage system; controlling, using the controller, at least one of a supply of airflow into the storage unit, a hydrocarbon concentration in the storage unit, an oxygen concentration in the storage unit, a humidity within the storage unit, a pressure within the storage unit, or a temperature within the storage unit; operatively connecting an artificial intelligence training circuit to the controller; identifying, using the artificial intelligence training circuit, a plurality of data patterns of at least one of the airflow supply into the storage unit, the hydrocarbon concentration in the storage unit, the oxygen concentration in the storage unit, the humidity within the storage unit, the pressure within the storage unit, or the temperature within the storage unit; determining whether equipment of an operator entering the font system is functioning properly, wherein the equipment is an operator mask and an oxygen delivery tube or conduit for the operator mask; and An identification of an operator entering the stocker system is scanned.
14. The control method according to claim 13, further comprising: operatively coupling an independent air supply subsystem to the controller; supplying air to the storage unit using the air source of the independent air supply subsystem; filtering the air supplied by the air source using a filter assembly of the independent air supply subsystem before supplying the air to the storage unit; regulating the temperature of the gas flowing into the storage unit using the temperature regulating assembly of the independent gas supply subsystem; detecting the oxygen concentration in the storage unit using one or more oxygen sensors of the independent gas supply subsystem; as well as The air source is controlled by using the controller to increase the oxygen concentration in the storage unit.
15. The control method according to claim 14, further comprising: In response to the one or more oxygen sensors detecting that the oxygen concentration in the storage unit is below a threshold level, the oxygen concentration in the storage unit is increased by controlling the flow rate of air from the air source using the controller.
16. The control method according to claim 14, further comprising: operatively coupling a humidity sensor to the controller; detecting a humidity level in the storage unit using the humidity sensor; as well as When the humidity level is below a threshold level, the flow of nitrogen gas into the storage unit is adjusted.
17. The control method according to claim 14, further comprising: operatively coupling a pressure sensor to the controller; detecting the pressure level in the storage unit using the pressure sensor; as well as When the detected pressure level is below a threshold level, air flow from the air source to the storage unit is adjusted.
18. A control method comprising: supplying a first gas to a storage device in the stocker system configured to store one or more substrates; detecting a humidity level of the storage device; In response to the humidity level of the storage device being detected to be above a threshold level, increasing the supply of the first gas to the storage device; detecting a hydrocarbon concentration in the storage device; In response to detecting that the hydrocarbon concentration within the storage device is greater than a threshold concentration, increasing the supply of the first gas to the storage device; determining whether equipment of an operator entering the font system is functioning properly, wherein the equipment is an operator mask and an oxygen delivery tube or conduit for the operator mask; and Scanning the identification of the operator entering the stocker system, The first gas includes nitrogen.
19. The control method according to claim 18, further comprising: detecting a pressure level within the storage device; as well as In response to the pressure level within the storage device being lower than the pressure level outside the storage device, the flow rate of a second gas to the storage device is increased.
20. The control method according to claim 18, further comprising: detecting the oxygen concentration in the storage device; increasing a flow rate of a third gas to the storage device in response to the oxygen concentration of the storage device being below a threshold oxygen concentration, The third gas includes oxygen.
Citation Information
Patent Citations
Exposure Apparatus
US20040055177A1
Lithographic apparatus and device manufacturing method
US20040105080A1
Patterning device cooling systems in a lithographic apparatus
US20180196360A1
Humidity control in semiconductor systems
US20180286726A1
Indexable side storage POD apparatus, heated side storage POD apparatus, systems, and methods
US20180374733A1