A system for clearing residual liquid in a pipeline

Abstract

The present disclosure provides a system for clearing residual liquid in a pipeline. The present disclosure sequentially arranges a multi-stage clearing device starting from the sampling port of the target pipeline. The central control device sequentially controls each stage of the clearing device to clear the residual liquid of the corresponding target clearing section starting from the first-stage clearing device. After each target clearing section is processed, the next clearing device is started to clear the next target clearing section. By means of step-by-step clearing, it is avoided that a large amount of clearing time and a large amount of high-pressure gas are wasted due to the overly long clearing pipeline. It is ensured that the residual liquid can be efficiently cleared in each target clearing section, ultimately reducing the total clearing time of the target pipeline and improving the total clearing efficiency. At the same time, during the cleaning process, both the effectiveness of the clearing is taken into account and a large amount of waste of high-pressure gas is avoided.

Description

Technical Field

[0001] The present disclosure relates to the field of cleaning technologies, and more particularly, to a system for cleaning residual liquid in a pipeline. Background Art

[0002] Among many groundwater pollutants, organic pollutants are the difficulties and key points in treatment. After organic pollutants enter groundwater, they usually pollute groundwater in the form of non-aqueous phase liquids (English full name: Non-aqueous Phase Liquids, abbreviated as NAPLs). Among them, those with a density smaller than water and floating on the surface are called light non-aqueous phase liquids (English full name: Light Non-Aqueous Phase Liquid, abbreviated as LNAPL), and those with a density larger than water and sinking to the bottom are called dense non-aqueous phase liquids (English full name: Dense Non-Aqueous Phase Liquid, abbreviated as DNAPL). Due to the fact that the specific gravity of NAPLs pollutants is larger or smaller than that of water, the migration movement laws and pollution diffusion paths in groundwater are very complex. Conducting real-time sampling and on-line monitoring of NAPLs in the groundwater of high-risk areas is of great significance for effectively preventing groundwater pollution and ensuring the safety of groundwater environmental quality.

[0003] Currently, it is possible to sample and detect groundwater through an automated system. However, after each sampling, a lot of residual liquid will be left in the system pipeline, and these residual liquids often affect the accuracy of the next sampling and detection. Therefore, before the next sampling, it is necessary to thoroughly and cleanly remove the residual liquid in the system pipeline. However, currently, the removal of residual liquid usually adopts two steps: First, input cleaning liquid from the starting end of the pipeline to decompose the pollutants in the residual liquid, and then collect the decomposed liquid from the end; Second, input high-pressure gas from one end of the pipeline to remove the remaining decomposed liquid in the pipeline, and then collect the remaining decomposed liquid from the end.

[0004] However, this method mainly judges the removal effect of residues through manual experience. Especially in the second step, when the front end of the pipeline has been cleared and the rear end remains uncleared, high-pressure gas still needs to be input from the starting end of the pipeline, wasting a lot of ineffective time. At the same time, this way of inputting high-pressure gas relying solely on experience also wastes a lot of high-pressure gas.

[0005] Therefore, the present disclosure provides a system for cleaning residual liquid in a pipeline to solve one of the above technical problems. Summary of the Invention

[0006] The purpose of the present disclosure is to provide a system for cleaning residual liquid in a pipeline, which can solve at least one of the above-mentioned technical problems. The specific solutions are as follows:

[0007] According to specific embodiments of the present disclosure, in a first aspect, the present disclosure provides a system for clearing residual liquid in a pipeline, including: a target pipeline, a plurality of clearing devices, and a central control device;

[0008] The target pipeline includes multiple connected target clearing segments, and a connection hole penetrating the side wall of the corresponding target clearing segment is provided at the starting position of each target clearing segment;

[0009] Each clearing device is detachably connected to the connection hole of the corresponding target clearing segment; each clearing device includes: a support plate, a gas guide pipe, an electric flow regulating valve, and a humidity sensor;

[0010] The support plate has a shape matching the shape of the connection hole of the corresponding target clearing segment and is detachably connected to the connection hole;

[0011] The gas guide pipe penetrates the support plate, the input port of the gas guide pipe is fixedly connected to the output port of the electric flow regulating valve, and the output port of the gas guide pipe faces the clearing direction of the residual liquid in the corresponding target clearing segment;

[0012] The electric flow regulating valve is configured to control the flow rate of high-pressure gas input into the gas guide pipe;

[0013] The humidity sensor is arranged on the support plate in the corresponding target clearing segment and is arranged before the output port of the gas guide pipe in the clearing direction, and is configured to measure the humidity value in the target pipeline;

[0014] The central control device is respectively communicatively connected to the electric flow regulating valve, the humidity sensor, and the gas flow sensor in each clearing device, and is configured to: in the clearing direction, gradually control the electric flow regulating valve of each clearing device to input high-pressure gas into the corresponding target clearing segment through the gas guide pipe; when the current clearing device clears the current target clearing segment, obtain the humidity value collected by the humidity sensor of the next clearing device; when the humidity value is less than or equal to a preset first humidity threshold, close the electric flow regulating valve of the current clearing device, and control the electric flow regulating valve of the next clearing device to input high-pressure gas into the next target clearing segment through the gas guide pipe.

[0015] Optionally, each clearing device further includes a gas flow sensor; the gas flow sensor is arranged on the support plate in the corresponding target clearing segment and is arranged after the output port of the gas guide pipe in the clearing direction, and is configured to measure the flow rate value of high-pressure gas in the target pipeline;

[0016] The central control device is communicatively connected to the gas flow sensors in each cleaning device respectively, and is further configured to: when the current cleaning device cleans the current target cleaning section, obtain a first gas flow value collected by the gas flow sensor of the current cleaning device; when the first gas flow value is less than or equal to a preset gas safety flow threshold, control the electric flow regulating valve of the current cleaning device to gradually increase the gas flow of the high-pressure gas periodically step by step.

[0017] Optionally, the central control device is configured to control the electric flow regulating valve of the current cleaning device to gradually increase the gas flow of the high-pressure gas periodically step by step when the first gas flow value is less than or equal to a preset gas safety flow threshold, including:

[0018] When gradually increasing the gas flow of the high-pressure gas periodically step by step, the humidity sensor of the next cleaning device obtains a first average humidity value in the current cycle and a second average humidity value in the previous cycle at the last acquisition time point in the current cycle.

[0019] Based on the first average humidity value, the second average humidity value and a preset increase cycle time period, obtain the relative humidity change rate of the current period.

[0020] When the relative humidity change rate of the current period is less than or equal to a preset relative humidity change rate threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow of the high-pressure gas.

[0021] Optionally, the central control device is further configured to:

[0022] When the relative humidity change rate of the current period is greater than a preset relative humidity change rate threshold, obtain a flow difference between the preset gas safety flow threshold and the second gas flow value.

[0023] When the flow difference is less than or equal to a preset warning threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow of the high-pressure gas.

[0024] Optionally, the central control device is further configured to:

[0025] When the difference is greater than a preset warning threshold, control the electric flow regulating valve of the current cleaning device to increase the high-pressure gas to the gas flow of the next cycle.

[0026] Optionally, the central control device is further configured to: when the current cleaning device cleans the current target cleaning section, obtain the humidity value collected by the humidity sensor of the next cleaning device; when the humidity value is less than or equal to a preset second humidity threshold, control the electric flow regulating valve of the current cleaning device to gradually reduce the flow rate of the high-pressure gas periodically until the humidity value is less than or equal to a preset first humidity threshold, where the preset second humidity threshold is greater than the preset first humidity threshold.

[0027] Optionally, the central control device is configured to control the electric flow regulating valve of the current cleaning device to gradually reduce the flow rate of the high-pressure gas periodically until the humidity value is less than or equal to a preset first humidity threshold, including:

[0028] When gradually reducing the gas flow rate of the high-pressure gas periodically, obtain the last humidity value collected by the humidity sensor of the next cleaning device in the current period;

[0029] When the last humidity value in the current period is less than or equal to a preset third humidity threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow rate of the high-pressure gas until the humidity value is less than or equal to a preset first humidity threshold, where the preset third humidity threshold is less than the preset second humidity threshold and greater than the preset first humidity threshold.

[0030] Optionally, each cleaning device further includes a deflector plate, which is fixedly connected to the support plate in the corresponding target cleaning section and is arranged between the outlet of the air duct and the humidity sensor, and is configured to deflect the high-pressure gas and the residual liquid flowing in the cleaning direction to flow through the outlet of the air duct through a diversion port on one side of the target pipeline.

[0031] Optionally, the deflector plate is configured to extend obliquely towards the opposite side of the outlet of the air duct, and form a diversion port with the inner wall of the target pipeline on the opposite side of the outlet of the air duct, and is configured to limit the flow direction of the high-pressure gas input into the corresponding target cleaning section from the outlet of the air duct.

[0032] Optionally, a gas-liquid separator is further arranged at the end of the target cleaning section of the last stage of the target pipeline.

[0033] The above solution of the embodiment of the present disclosure has at least the following beneficial effects compared with the prior art:

[0034] The present disclosure provides a system for clearing residual liquid in a pipeline. The present disclosure sequentially arranges a multi-stage clearing device starting from the sampling port of the target pipeline. The central control device sequentially controls each stage of the clearing device to clear the residual liquid in the corresponding target clearing section starting from the first-stage clearing device. After each target clearing section is processed, the next clearing device is started to clear the next target clearing section. By means of step-by-step clearing, it is possible to avoid wasting a large amount of clearing time and a large amount of high-pressure gas caused by an overly long clearing pipeline. It ensures that the residual liquid can be efficiently cleared in each target clearing section, ultimately reducing the total clearing time of the target pipeline and improving the total clearing efficiency. At the same time, during the cleaning process, both the effectiveness of the cleaning is taken into account and a large amount of waste of high-pressure gas is avoided. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 FIG. shows a schematic diagram of a system for clearing residual liquid in a pipeline according to an embodiment of the present disclosure;

[0036] Figure 2 FIG. shows a cross-sectional view of a clearing device and a target pipeline according to an embodiment of the present disclosure;

[0037] DESCRIPTION OF THE REFERENCE NUMERALS

[0038] 1 - target pipeline, 2 - clearing device, 3 - central control device, 4 - gas-liquid separator, 5 - gas collection container, 6 - residual liquid collection container;

[0039] 21 - support plate, 22 - gas guide pipe, 23 - electric flow regulating valve, 24 - humidity sensor, 25 - gas flow sensor, 26 - guide plate, 27 - guide port, 28 - clearing direction;

[0040] 221 - input port of the gas guide pipe, 222 - output port of the gas guide pipe. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0041] In order to make the objectives, technical solutions, and advantages of the present disclosure clearer, the present disclosure will be further described in detail below with reference to the accompanying drawings. Apparently, the described embodiments are only a part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present disclosure.

[0042] The terms used in the embodiments of the present disclosure are only for the purpose of describing specific embodiments and are not intended to limit the present disclosure. The singular forms "a", "the", and "said" used in the embodiments of the present disclosure and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. "Plural" generally includes at least two.

[0043] It should be understood that the term "and / or" used herein is merely a description of the associated relationship of associated objects, indicating that there can be three relationships. For example, A and / or B can represent three situations: A exists alone, A and B exist simultaneously, and B exists alone. Additionally, the character " / " in this text generally represents an "or" relationship between the preceding and following associated objects.

[0044] It should be understood that although terms such as first, second, and third may be used to describe in the embodiments of the present disclosure, these descriptions should not be limited to these terms. These terms are only used to distinguish the descriptions. For example, without departing from the scope of the embodiments of the present disclosure, the first can also be referred to as the second, and similarly, the second can also be referred to as the first.

[0045] Depending on the context, the words "if", "when" as used herein can be interpreted as "when...", "while...", "in response to determining", or "in response to detecting". Similarly, depending on the context, the phrase "if determined" or "if detected (stated condition or event)" can be interpreted as "when determined", "in response to determining", "when detecting (stated condition or event)", or "in response to detecting (stated condition or event)".

[0046] It should also be noted that the term "comprising", "including", or any other variant thereof is intended to cover non-exclusive inclusion, such that a commodity or device comprising a series of elements not only includes those elements but also includes other elements not explicitly listed, or further includes elements inherent to such commodity or device. Without further limitation, an element defined by the statement "comprising one..." does not exclude the existence of additional identical elements in the commodity or device comprising the said element.

[0047] It should be particularly noted that symbols and / or numbers existing in the specification, if not marked in the accompanying drawing description, are not reference numerals.

[0048] The optional embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings.

[0049] Embodiment 1

[0050] For the embodiment provided by the present disclosure, that is, an embodiment of a system for clearing residual liquid in a pipeline.

[0051] The embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings.

[0052] The present disclosure provides a system for clearing residual liquid in a pipeline, including: a target pipeline 1, a plurality of clearing devices 2, and a central control device 3, as Figure 1 shown.

[0053] In a non-aqueous liquid monitoring system, it is used to collect environmental samples in groundwater, send the environmental samples into the sample collector of the sample monitoring device for automatic detection, and then discharge the detected environmental samples into the sample recovery device. The target pipeline 1 refers to the pipeline section from collecting environmental samples in groundwater to the sample collector of the sample monitoring device.

[0054] The target pipeline 1 includes multiple connected target cleaning sections, and a connection hole penetrating the side wall of the corresponding target cleaning section is provided at the starting position of each target cleaning section. For example, the target pipeline 1 is divided into multiple connected target cleaning sections: A-level section, B-level section, and C-level section. The A-level section is connected to the B-level section, and the B-level section is connected to the C-level section. For pipelines that are easy to clean (such as a straight pipeline), the length of the target cleaning section is set relatively long; for pipelines that are difficult to clean (such as pipelines with corners or equipment (sample collector) in the target cleaning section), the length of the target cleaning section is set relatively short. To avoid right angles in the target cleaning section, the right angle position can be set as the termination position and starting position of two connected target cleaning sections. Figure 1 The thick solid line represents the target pipeline 1, and the pipeline between two adjacent cleaning devices 2 is the target cleaning section.

[0055] In some specific embodiments, a gas-liquid separator 4 is further provided at the end of the last target cleaning section of the target pipeline 1. For example, as Figure 1 shown, the high-pressure gas and residual liquid removed are separated by the gas-liquid separator 4. The high-pressure gas is collected in the gas collection container 5, and the residual liquid is collected in the residual liquid collection container 6. This is beneficial for the reuse of the high-pressure gas and the environmental protection treatment of the residual liquid, avoiding further damage to the environment.

[0056] Each cleaning device 2 is detachably connected to the connection hole of the corresponding target cleaning section. As Figure 2 shown, each cleaning device 2 includes: a support plate 21, a gas guide pipe 22, an electric flow regulating valve 23, and a humidity sensor 24.

[0057] In the embodiment of the present disclosure, the target pipeline 1 is divided into multiple connected target cleaning sections, and a cleaning device 2 is provided for each target cleaning section to clean the target pipeline 1 in sections.

[0058] The support plate 21 has a shape matching the shape of the connection hole of the corresponding target cleaning section and is detachably connected to the connection hole.

[0059] To facilitate the maintenance of the cleaning device 2, in the embodiments of the present disclosure, the cleaning device 2 is detachably connected to the connection hole of the corresponding target cleaning section through the support plate 21, and the support plate 21 is hermetically connected to the connection hole of the corresponding target cleaning section to ensure that the high-pressure gas does not leak from the connection. For example, if the shape of the connection hole is circular, the shape of the support plate 21 is also circular that matches the connection hole; the support plate 21 can be threadedly connected to the connection hole or can be a snap connection, and the embodiments of the present disclosure are not limited thereto.

[0060] The air duct 22 penetrates through the support plate 21. The input port 221 of the air duct 22 is fixedly connected to the output port of the electric flow regulating valve 23, and the output port 222 of the air duct 22 faces the cleaning direction 28 of the residual liquid in the corresponding target cleaning section, as Figure 2 shown. Since the cleaning device 2 is for cleaning the residual liquid in the present target cleaning section, therefore, the high-pressure gas output from the output port 222 of the air duct 22 is sprayed towards the present target cleaning section to reduce the flow rate of the high-pressure gas flowing in the opposite direction and avoid the loss of the flow rate of the high-pressure gas in the cleaning direction 28, thereby improving the cleaning efficiency.

[0061] The electric flow regulating valve 23 is configured to control the flow rate of the high-pressure gas input into the air duct 22. For example, the electric flow regulating valves 23 are all connected to the cleaning input pump, and the cleaning input pump transports the high-pressure gas to each electric flow regulating valve 23.

[0062] The humidity sensor 24 is arranged on the support plate 21 in the corresponding target cleaning section and is arranged before the output port 222 of the air duct 22 in the cleaning direction 28, as Figure 1 shown, and is configured to measure the humidity value in the target pipeline 1.

[0063] In some specific embodiments, each cleaning device 2 further includes a deflector 26. The deflector 26 is fixedly connected to the support plate 21 in the corresponding target cleaning section and is arranged between the output port 222 of the air duct 22 and the humidity sensor 24, and is configured to deflect the high-pressure gas and the residual liquid flowing in the cleaning direction 28 to flow through the output port 222 of the air duct 22 through the diversion port 27 on one side of the target pipeline 1. The deflector 26 can be inclined on the support plate 21 or perpendicular to the support plate 21, and the diversion port 27 can be arranged on any side of the target pipeline 1, and the embodiments of the present disclosure are not limited thereto. On the one hand, it can further reduce the flow of the high-pressure gas in the direction opposite to the cleaning direction 28; on the other hand, it enables the high-pressure gas and the residual liquid in the present target cleaning section to flow into the subsequent target cleaning section and does not affect the sampling of groundwater through the target pipeline 1.

[0064] In some other specific embodiments, as Figure 2As shown, the deflector 26 is configured to extend obliquely towards the opposite side of the outlet 222 of the gas guide pipe 22, and form a diversion port 27 with the inner wall of the target pipeline 1 on the opposite side of the outlet 222 of the gas guide pipe 22, which is configured to restrict the flow direction of the high-pressure gas input from the outlet 222 of the gas guide pipe 22 to the corresponding target cleaning section. After the deflector 26 extends obliquely towards the opposite side of the outlet 222 of the gas guide pipe 22, a relatively high-pressure space can be formed around the outlet 222 of the gas guide pipe 22, so that the residual liquid retained in this space can be quickly removed, solving the problem of incomplete cleaning.

[0065] The central control device 3 is respectively communicatively connected to the electric flow regulating valve 23, the humidity sensor 24 and the gas flow sensor 25 in each cleaning device 2, and is configured to: on the cleaning direction 28, gradually control the electric flow regulating valve 23 of each cleaning device 2 to input high-pressure gas to the corresponding target cleaning section through the gas guide pipe 22; when the current cleaning device 2 cleans the current target cleaning section, obtain the humidity value collected by the humidity sensor 24 of the next cleaning device 2; when the humidity value is less than or equal to the preset first humidity threshold, close the electric flow regulating valve 23 of the current cleaning device 2, and control the electric flow regulating valve 23 of the next cleaning device 2 to input high-pressure gas to the next target cleaning section through the gas guide pipe 22.

[0066] The next target cleaning section refers to the next target cleaning section adjacent to the current target cleaning section; the next cleaning device 2 refers to the cleaning device 2 on the next target cleaning section adjacent to the current target cleaning section.

[0067] In the embodiments of the present disclosure, multiple cleaning devices 2 are sequentially arranged starting from the sampling port of the target pipeline 1, and the central control device 3 sequentially controls each level of cleaning device 2 to clean the residual liquid of the corresponding target cleaning section starting from the first-level cleaning device 2. After each target cleaning section is processed, the next cleaning device 2 is started to clean the next target cleaning section. By means of step-by-step cleaning, the waste of a large amount of cleaning time and a large amount of high-pressure gas caused by too long a cleaning pipeline is avoided. It is ensured that the residual liquid can be efficiently cleaned in each target cleaning section, ultimately reducing the total cleaning time of the target pipeline 1 and improving the total cleaning efficiency.

[0068] In some specific embodiments, each cleaning device 2 further includes a gas flow sensor 25. The gas flow sensor 25 is arranged on the tray 21 in the corresponding target cleaning section, and is arranged after the outlet 222 of the gas guide pipe 22 in the cleaning direction 28, and is configured to measure the flow value of the high-pressure gas in the target pipeline 1.

[0069] The central control device 3 is communicatively connected to the gas flow sensors 25 in each of the cleaning devices 2 respectively, and is further configured to: when the current cleaning device 2 cleans the current target cleaning section, obtain a first gas flow value collected by the gas flow sensor 25 of the current cleaning device 2; when the first gas flow value is less than or equal to a preset gas safety flow threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to gradually increase the gas flow of the high-pressure gas periodically step by step.

[0070] The preset gas safety flow threshold is set to the maximum gas flow value that the target pipeline 1 can safely withstand. For example, the preset gas safety flow threshold is 0.1 m 3 / h, and the first gas flow value collected by the gas flow sensor 25 of the current cleaning device 2 is 0.01 m 3 / h, which is less than the preset gas safety flow threshold of 0.1 m 3 / h, then the gas flow of the high-pressure gas is gradually increased periodically step by step, with an increase of 0.01 m 3 / h in each cycle. The time period for each cycle is 10 s. In the first cycle, the gas flow value is increased to 0.02 m 3 / h, and in the second cycle, the gas flow value is increased to 0.03 m 3 / h, and in the third cycle, the gas flow value is increased to 0.04 m 3 / h, and so on, until the gas flow value is increased to 0.1 m 3 / h in the last cycle. In this specific embodiment, by the method of gradually increasing the gas flow of the high-pressure gas periodically step by step, the uncertainty of manual cleaning is avoided, the safety of the pressurization process is ensured, and at the same time, increasing the gas flow to the preset gas safety flow threshold can achieve the purpose of rapid cleaning, thereby improving the cleaning efficiency.

[0071] In some other specific embodiments, the central control device 3 is configured to, when the first gas flow value is less than or equal to the preset gas safety flow threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to gradually increase the gas flow of the high-pressure gas periodically step by step, including: when gradually increasing the gas flow of the high-pressure gas periodically step by step, the humidity sensor 24 of the next cleaning device 2 obtains a first average humidity value of the humidity sensor 24 of the next cleaning device 2 and a second average humidity value of the previous cycle at the last acquisition time point of the current cycle; obtaining a current periodic relative humidity change rate based on the first average humidity value, the second average humidity value and the preset increase cycle time period; when the current periodic relative humidity change rate is less than or equal to a preset relative humidity change rate threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to maintain the current gas flow of the high-pressure gas.

[0072] The previous cycle refers to the cycle immediately preceding the current cycle.

[0073] In this specific embodiment, when gradually increasing the gas flow rate of the high-pressure gas periodically, if the relative humidity change rate between two adjacent cycles within the target cleaning section is detected to be less than or equal to the preset relative humidity change rate threshold, it indicates that increasing the gas flow rate of the high-pressure gas has limited impact on humidity change. Thus, the continuous increase of the high-pressure gas flow rate is stopped, and the current high-pressure gas flow rate is maintained to avoid wasting high-pressure gas. For example, continuing the above example, if the current cycle is the fifth cycle and the previous cycle is the fourth cycle, in the fifth cycle, if the first average humidity value of the humidity sensor 24 of the next cleaning device 2 in the current cycle is 10%, and the second initial humidity value in the fourth cycle is 10.3%; the relative humidity change rate of the fifth cycle = (10.3% - 10%) / 10s = 0.03%; if the preset relative humidity change rate threshold is 0.05%, and the relative humidity change rate of the fifth cycle 0.03% is less than 0.05%, then the electric flow regulating valve 23 of the current cleaning device 2 is controlled to maintain the current gas flow rate of the high-pressure gas, so that the second gas flow rate value collected by the gas flow sensor 25 of the current cleaning device 2 is maintained at 0.06m 3 / h.

[0074] In some other specific embodiments, the central control device 3 is further configured to: when the relative humidity change rate of the current cycle is greater than the preset relative humidity change rate threshold, obtain the flow difference between the preset gas safety flow rate threshold and the second gas flow rate value; when the flow difference is less than or equal to the preset warning threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to maintain the current gas flow rate of the high-pressure gas.

[0075] For example, if the preset gas safety flow rate threshold is 0.105m 3 / h, the preset warning threshold is 0.008m 3 / h, and each cycle is increased by 0.01m 3 / h. When the flow rate value of the high-pressure gas is gradually increased periodically to 0.1m 3 / h, the obtained flow difference = 0.105 m 3 / h - 0.1m 3 / h = 0.005m 3 / h, which is less than the preset warning threshold of 0.008m 3 / h. If the flow rate value is continuously increased to 0.11m 3 / h, it will exceed the preset gas safety flow rate threshold of 0.105 m 3 / h. Therefore, control the electric flow regulating valve 23 of the current cleaning device 2 to maintain the current gas flow rate of the high-pressure gas, so that the gas flow rate value collected by the gas flow sensor 25 of the current cleaning device 2 remains at 0.1 m 3 / h.

[0076] In some other specific embodiments, the central control device 3 is further configured to: when the difference is greater than a preset warning threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to increase the high-pressure gas to the gas flow rate of the next cycle.

[0077] The next cycle refers to the next cycle immediately adjacent to the current cycle.

[0078] For example, continuing the above example, if when the flow rate value of the high-pressure gas is increased step by step periodically to 0.06 m 3 / h, the obtained flow difference = 0.105 m 3 / h - 0.06 m 3 / h = 0.099 m 3 / h, which is greater than the preset warning threshold of 0.008 m 3 / h, then continue to increase the flow rate value to 0.07 m of the next cycle 3 / h.

[0079] In some specific embodiments, the central control device 3 is further configured to: when the current cleaning device 2 clears the current target cleaning section, obtain the humidity value collected by the humidity sensor 24 of the next cleaning device 2; when the humidity value is less than or equal to a preset second humidity threshold, control the electric flow regulating valve 23 of the current cleaning device 2 to gradually reduce the flow rate of the high-pressure gas periodically until the humidity value is less than or equal to a preset first humidity threshold, where the preset second humidity threshold is greater than the preset first humidity threshold.

[0080] When the humidity value is less than or equal to the preset second humidity threshold, it indicates that the cleaning work on the current target cleaning section is approaching completion, so the flow rate of the high-pressure gas for the current target cleaning section is gradually reduced, thus saving high-pressure gas.

[0081] For example, the preset first humidity threshold is 3%, and the preset second humidity threshold is 5%. When the current cleaning device 2 clears the current target cleaning section, the humidity value collected by the humidity sensor 24 of the next cleaning device 2 is 4.9%, which is less than the preset second humidity threshold of 5%; control the electric flow regulating valve 23 of the current cleaning device 2 to gradually reduce the flow rate of the high-pressure gas periodically until the humidity value is less than or equal to the preset first humidity threshold of 3%.

[0082] In some other specific embodiments, the central control device 3 is configured to control the electric flow regulating valve 23 of the current cleaning device 2 to gradually reduce the flow rate of the high-pressure gas periodically until the humidity value is less than or equal to a preset first humidity threshold, including: when gradually reducing the gas flow rate of the high-pressure gas periodically, obtaining the last humidity value collected by the humidity sensor 24 of the next cleaning device 2 in the current period; when the last humidity value in the current period is less than or equal to a preset third humidity threshold, controlling the electric flow regulating valve 23 of the current cleaning device 2 to maintain the current gas flow rate of the high-pressure gas until the humidity value is less than or equal to the preset first humidity threshold, where the preset third humidity threshold is less than the preset second humidity threshold and greater than the preset first humidity threshold.

[0083] Wherein, the preset third humidity threshold is less than the preset second humidity threshold and greater than the preset first humidity threshold.

[0084] The initial humidity value of the current period refers to the first humidity value collected in the current period.

[0085] For example, continuing the above example, the preset third humidity threshold is 3.6%. When gradually reducing the gas flow rate of the high-pressure gas periodically, the last humidity value collected by the humidity sensor 24 of the next cleaning device 2 in the current period is 3.5%, which is less than the preset third humidity threshold of 3.6%. Then, control the electric flow regulating valve 23 of the current cleaning device 2 to maintain the current gas flow rate of the high-pressure gas until the humidity value is less than or equal to the preset first humidity threshold of 3%.

[0086] This specific embodiment not only avoids wasting high-pressure gas but also ensures effective removal of the residual liquid.

[0087] In the embodiments of the present disclosure, a multi-stage cleaning device 2 is sequentially arranged starting from the sampling port of the target pipeline 1. The central control device 3 sequentially controls each stage of the cleaning device 2 to remove the residual liquid in the corresponding target cleaning section starting from the first-stage cleaning device 2. After each target cleaning section is processed, the next cleaning device 2 is started to perform the cleaning work on the next target cleaning section. By means of step-by-step cleaning, it is avoided that a long cleaning pipeline causes a large amount of cleaning time and a large amount of high-pressure gas to be wasted. It is ensured that the residual liquid can be efficiently removed in each target cleaning section, ultimately reducing the total cleaning time of the target pipeline 1 and improving the total cleaning efficiency. At the same time, during the cleaning process, both the effectiveness of cleaning and the large waste of high-pressure gas are taken into account.

[0088] Finally, it should be noted that the embodiments in this specification are described in a progressive manner. Each embodiment focuses on the differences from other embodiments. For the same or similar parts among the embodiments, reference can be made to each other. For the systems or devices disclosed in the embodiments, since they correspond to the methods disclosed in the embodiments, the descriptions are relatively simple. For the relevant parts, reference can be made to the descriptions in the method part.

[0089] The above embodiments are only used to illustrate the technical solutions of the present disclosure, rather than to limit them; although the present disclosure has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present disclosure.

Claims

1. A system for clearing residual liquid in a pipeline, characterized in that, Including: A target pipeline, a plurality of cleaning devices, and a central control device; The target pipeline includes multiple connected target cleaning segments, and a connection hole penetrating the side wall of the corresponding target cleaning segment is provided at the starting position of each target cleaning segment; Each cleaning device is detachably connected to the connection hole of the corresponding target cleaning segment; each cleaning device includes: a support plate, a gas guide pipe, an electric flow control valve, and a humidity sensor; The support plate has a shape matching that of the connection hole of the corresponding target cleaning segment and is detachably connected to the connection hole; The gas guide pipe penetrates the support plate, the input port of the gas guide pipe is fixedly connected to the output port of the electric flow control valve, and the output port of the gas guide pipe faces the cleaning direction of the residual liquid in the corresponding target cleaning segment; The electric flow control valve is configured to control the flow rate of high-pressure gas input into the gas guide pipe; The humidity sensor is arranged on the support plate in the corresponding target cleaning segment and is arranged before the output port of the gas guide pipe in the cleaning direction, and is configured to measure the humidity value in the target pipeline; The central control device is respectively communicatively connected to the electric flow control valve, the humidity sensor, and the gas flow sensor in each cleaning device, and is configured to: in the cleaning direction, gradually control the electric flow control valve of each cleaning device to input high-pressure gas into the corresponding target cleaning segment through the gas guide pipe; when the current cleaning device cleans the current target cleaning segment, obtain the humidity value collected by the humidity sensor of the next cleaning device; when the humidity value is less than or equal to a preset first humidity threshold, close the electric flow control valve of the current cleaning device, and control the electric flow control valve of the next cleaning device to input high-pressure gas into the next target cleaning segment through the gas guide pipe; The central control device is further configured to: when the current cleaning device cleans the current target cleaning segment, obtain the humidity value collected by the humidity sensor of the next cleaning device; when the humidity value is less than or equal to a preset second humidity threshold, control the electric flow control valve of the current cleaning device to gradually reduce the flow rate of high-pressure gas periodically until the humidity value is less than or equal to the preset first humidity threshold, where the preset second humidity threshold is greater than the preset first humidity threshold.

2. The system according to claim 1, wherein Each cleaning device further includes a gas flow sensor; the gas flow sensor is arranged on the support plate in the corresponding target cleaning segment and is arranged after the output port of the gas guide pipe in the cleaning direction, and is configured to measure the flow rate value of high-pressure gas in the target pipeline; The central control device is respectively communicatively connected to the gas flow sensors in each cleaning device, and is further configured to: when the current cleaning device cleans the current target cleaning segment, obtain the first gas flow rate value collected by the gas flow sensor of the current cleaning device; when the first gas flow rate value is less than or equal to a preset gas safety flow threshold, control the electric flow control valve of the current cleaning device to gradually increase the gas flow rate of high-pressure gas periodically.

3. The system according to claim 2, wherein The central control device is configured to, when the first gas flow value is less than or equal to a preset gas safety flow threshold, control the electric flow regulating valve of the current cleaning device to gradually increase the gas flow of the high-pressure gas periodically, including: When gradually increasing the gas flow of the high-pressure gas periodically, the humidity sensor of the next cleaning device obtains the first average humidity value of the humidity sensor of the next cleaning device in the current cycle and the second average humidity value of the previous cycle at the last acquisition time point in the current cycle; Based on the first average humidity value, the second average humidity value and a preset increasing cycle time period, obtain the relative humidity change rate of the current period; When the relative humidity change rate of the current period is less than or equal to a preset relative humidity change rate threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow of the high-pressure gas.

4. The system according to claim 3, wherein The central control device is further configured to: When the relative humidity change rate of the current period is greater than the preset relative humidity change rate threshold, at the last time point collected by the humidity sensor of the next cleaning device in the current cycle, the humidity sensor of the next cleaning device obtains the second gas flow value at the last acquisition time point in the current cycle; Based on the preset gas safety flow threshold and the second gas flow value, obtain a flow difference; When the flow difference is less than or equal to a preset warning threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow of the high-pressure gas.

5. The system according to claim 4, wherein The central control device is further configured to: When the difference is greater than the preset warning threshold, control the electric flow regulating valve of the current cleaning device to increase the high-pressure gas to the gas flow of the next cycle.

6. The system according to claim 1, wherein The central control device is configured to control the electric flow regulating valve of the current cleaning device to gradually reduce the flow of the high-pressure gas periodically until the humidity value is less than or equal to a preset first humidity threshold, including: When gradually reducing the gas flow of the high-pressure gas periodically, obtain the last humidity value collected by the humidity sensor of the next cleaning device in the current cycle; When the last humidity value of the current cycle is less than or equal to a preset third humidity threshold, control the electric flow regulating valve of the current cleaning device to maintain the current gas flow of the high-pressure gas until the humidity value is less than or equal to the preset first humidity threshold, where the preset third humidity threshold is less than the preset second humidity threshold and greater than the preset first humidity threshold.

7. The system according to any one of claims 1-6, characterized in that Each cleaning device further includes a deflector plate, which is fixedly connected to the tray in the corresponding target cleaning section and is arranged between the outlet of the air duct and the humidity sensor, and is configured to deflect the high-pressure gas and the residual liquid flowing in the cleaning direction to the diversion port on one side of the target pipeline and flow through the outlet of the air duct.

8. The system according to claim 7, wherein The deflector plate is configured to extend obliquely towards the opposite side of the outlet of the air duct and form a diversion port with the inner wall of the target pipeline on the opposite side of the outlet of the air duct, and is configured to limit the flow direction of the high-pressure gas input into the corresponding target cleaning section from the outlet of the air duct.

9. The system according to claim 1, wherein A gas-liquid separator is also provided at the end of the target cleaning section of the last stage of the target pipeline.

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