Substrate processing apparatus and substrate processing method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2022-06-22
- Publication Date
- 2026-07-24
Smart Images
Figure CN115692244B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a substrate processing apparatus and a substrate processing method. Background Technology
[0002] Typically, substrate processing apparatuses are used to perform predetermined processing techniques, such as chemical treatment of substrates, in order to manufacture semiconductors, displays, and the like. A substrate processing apparatus includes an inkjet head that ejects chemical solution onto the substrate and a reservoir (main tank) that stores the chemical solution supplied to the inkjet head.
[0003] Furthermore, the substrate processing apparatus can be configured such that the inkjet head can move in the horizontal direction while spraying liquid onto the substrate, and the liquid reservoir can be configured to move together with the inkjet head in the same direction.
[0004] Furthermore, in the recent manufacturing of display components, liquids containing nanoparticles are processed. If the nanoparticles settle into the reservoir, defective products may be produced. Therefore, efforts are being made to develop technologies to prevent liquid particles from settling into the reservoir.
[0005] On the other hand, while technologies are being developed to prevent the liquid from settling in the storage tank (main tank), improvements to buffer tanks that supply liquid to multiple storage tanks are insufficient. Summary of the Invention
[0006] The technical problem to be solved by the present invention is to provide a substrate processing apparatus and a substrate processing method that can prevent the sedimentation of pharmaceutical particles stored in a buffer tank.
[0007] The technical problems of this invention are not limited to those described above. Those skilled in the art can clearly understand other technical problems not mentioned in the following description.
[0008] An aspect of the substrate processing apparatus of the present invention for solving the above-mentioned technical problems includes: a main tank for storing a liquid for supplying to an inkjet head; and a buffer tank having a space for storing the liquid for supplying to the main tank, and including: a first outlet for discharging the liquid; a first inlet forming a closed path with the first outlet to allow the liquid to circulate without passing through the main tank and for the liquid to flow into; a second outlet for supplying the liquid to the main tank; and a bottom surface including a first vertex and a second vertex spaced apart from the first vertex, wherein the first outlet is located closer to the first vertex than the second vertex, and the first inlet is located closer to the second vertex than the first vertex.
[0009] The buffer tank may include: a first wall surface connected to the bottom surface; a second wall surface connected to the bottom surface and opposite to the first wall surface; and a top surface connected to the first wall surface and the second wall surface and opposite to the bottom surface, wherein the bottom surface may be inclined such that the first vertex is located below the second vertex, the first outlet may be formed on the bottom surface, and the first inlet may be formed on the first wall surface or the second wall surface and disposed at a position higher than the first outlet.
[0010] The first wall may include: a first face connected to the first vertex; a second face connected to the second vertex; and a first curved surface connecting the first face and the second face to each other.
[0011] The second wall may include: a third surface connected to the first vertex; a fourth surface connected to the second vertex; and a second curved surface connecting the third surface and the fourth surface to each other.
[0012] The first outlet may be located closer to the edge where the bottom surface meets the third surface than the second outlet, thus being positioned below the second outlet.
[0013] The second outlet can be configured as multiple, and at least one of the second outlets can be formed on the bottom surface, and can be formed at a position closer to the first vertex than the second vertex.
[0014] The buffer tank may further include a second inlet for the liquid medicine to flow into, so that the liquid medicine fills the buffer tank, wherein the second inlet may be located on the same side as the first inlet.
[0015] The first outlet may be larger than the second outlet, and may be formed such that the difference between its cross-sectional area and the cross-sectional area of the first inlet is less than 10%, or may be formed to be the same size as the first inlet.
[0016] The inkjet head, the main tank, and the buffer tank can be arranged sequentially from bottom to top, so that the liquid medicine is supplied from the buffer tank to the main tank due to gravity, and the liquid medicine is supplied from the main tank to the inkjet head due to gravity.
[0017] Another aspect of the substrate processing apparatus of the present invention for solving the above-mentioned technical problems includes: a main tank for storing a liquid for supplying to an inkjet head; and a buffer tank having a space for supplying the liquid to the main tank, and including: a bottom surface having a first vertex and a second vertex diagonally opposite to the first vertex, and connected to a curved surface adjacent to the first vertex and the second vertex and thus diagonally opposite to each other; a first outlet for discharging the liquid; a first inlet forming a closed path with the first outlet to circulate the liquid and for allowing the liquid to flow in; and a second outlet for supplying the liquid to the main tank.
[0018] The curved surface can have a rounding radius of 15mm to 90mm.
[0019] The first exit can be located closer to the first vertex than the second vertex, and the first entrance can be located closer to the second vertex than the first vertex.
[0020] An aspect of the substrate processing method of the present invention for solving the above-mentioned technical problems includes: providing a substrate processing apparatus including a buffer tank, wherein the buffer tank includes: a bottom surface having a first vertex and a second vertex diagonally opposite to the first vertex, and connected to a curved surface adjacent to the first vertex and the second vertex and thus diagonally opposite to each other, and inclined such that the first vertex is located below the second vertex; a first outlet for discharging a liquid; a first inlet forming a closed path with the first outlet to circulate the liquid and for allowing the liquid to flow in; and a second outlet for supplying the liquid to a main tank, wherein the main tank supplies the liquid to an inkjet head; the step of discharging the liquid from the first outlet; the step of the discharged liquid flowing into the buffer tank through the first inlet; and the step of the flowing liquid moving along the curved surface or toward the first outlet, thereby generating a flow of the liquid within the buffer tank.
[0021] The steps of generating the flow of the liquid medicine may include: setting the first outlet closer to the first vertex than the second vertex, and setting the first inlet closer to the second vertex than the first vertex, so that the liquid medicine flows diagonally from the first inlet toward the first outlet.
[0022] The method may further include a step of opening the second outlet after the step of generating the flow of the liquid medicine.
[0023] The method may further include the step of closing the second outlet when the water level in the main tank is above a preset range.
[0024] Specific details of other embodiments are included in the detailed description and accompanying drawings. Attached Figure Description
[0025] Figure 1 This is a schematic diagram illustrating a substrate processing apparatus according to some embodiments of the present invention.
[0026] Figure 2 This is a schematic diagram illustrating the buffer tank of a substrate processing apparatus according to some embodiments of the present invention.
[0027] Figure 3 It is shown Figure 2 The diagram shows the first variation of part A.
[0028] Figure 4 It is shown Figure 2 The diagram shows the second variation of part A.
[0029] Figure 5 This is a perspective view showing the buffer tank of a substrate processing apparatus according to an embodiment of the present invention.
[0030] Figure 6 It shows along Figure 5 A diagram showing the shape intercepted perpendicular to the major axis.
[0031] Figure 7 It is shown Figure 5 A diagram showing the shape of the lower part of the object.
[0032] Figure 8 This is a diagram illustrating the flow of a liquid medicine in a buffer tank of a substrate processing apparatus according to an embodiment of the present invention.
[0033] Figure 9 This is a flowchart illustrating a substrate processing method according to an embodiment of the present invention.
[0034] Explanation of reference numerals in the attached figures
[0035] 10: Substrate processing device; 20: Inkjet head
[0036] 30: Main tank; 100: Buffer tank
[0037] 110: Bottom surface; 120: First wall surface
[0038] 130: Second wall surface 140: Top surface
[0039] 150: First Exit 160: First Entrance
[0040] 170: Second Exit 180: Second Entrance Detailed Implementation
[0041] Preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings. The advantages and features of the present invention, as well as methods for achieving these advantages and features, will be explained below with reference to the accompanying drawings. Figure 1 The invention becomes clear from the detailed description of the embodiments. However, the invention is not limited to the embodiments disclosed below, but can be implemented in many different forms. These embodiments are provided only to make the disclosure of the invention complete and to fully inform those skilled in the art of the scope of the invention, which is defined only by the scope of the claims. Throughout the specification, the same reference numerals refer to the same constituent elements.
[0042] When an element or layer is referred to as "on" or "above" another element or layer, it includes not only that it is directly above another element or layer, but also that other layers or elements are in between. Conversely, when an element is referred to as "directly" on or directly above another element, it indicates that there are no other elements or layers in between.
[0043] Although the terms "first," "second," etc., are used to describe various elements, constituent elements, and / or parts, these elements, constituent elements, and / or parts are obviously not limited by these terms. These terms are only used to distinguish one element, constituent element, and / or part from another element, constituent element, and / or part. Therefore, the first element, first constituent element, or first part mentioned below can obviously also be a second element, second constituent element, or second part within the technical concept of the present invention.
[0044] The terminology used in this specification is for illustrative purposes and is not intended to limit the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise. The terms "comprises" and / or "comprising" as used in this specification do not exclude the presence or addition of one or more other constituent elements, steps, operations, and / or components in addition to those mentioned.
[0045] Figure 1 This is a schematic diagram illustrating a substrate processing apparatus according to some embodiments of the present invention, and Figure 2 This is a schematic diagram illustrating the buffer tank of a substrate processing apparatus according to some embodiments of the present invention. Furthermore, Figure 3 and Figure 4 It is shown Figure 2 The diagram shows the first and second variations of Part A.
[0046] at the same time, Figures 5 to 7 This is a diagram illustrating the buffer tank of a substrate processing apparatus according to an embodiment of the present invention, and Figure 8This is a diagram illustrating the flow of a liquid medicine through a buffer tank of a substrate processing apparatus according to an embodiment of the present invention.
[0047] Reference Figures 1 to 8 According to an embodiment of the present invention, the substrate processing apparatus 10 may include an inkjet head 20, a main tank 30, and a buffer tank 100.
[0048] The inkjet head 20 can receive liquid from the main tank 30 and spray the liquid onto the substrate C. For example, the inkjet head 20 may include multiple nozzles for spraying liquid onto the substrate C, and the configuration of the inkjet head 20 may be varied.
[0049] Furthermore, although not shown in the figure, the inkjet head 20 can be connected to a head operating unit (not shown) to uniformly eject the liquid ink onto the substrate C. The head operating unit can easily move the inkjet head 20 in the X, Y, and Z axis directions. That is, the head operating unit can adjust the height of the inkjet head 20 not only in the vertical direction but also move the inkjet head 20 in the horizontal direction. Such a head operating unit may include components such as a gantry and a motor, and the operating mechanism of the head operating unit can use known technology, therefore its description is omitted.
[0050] Meanwhile, the inkjet head 20 can move together with the main tank 30, thus minimizing the length of the supply line 21 from the main tank 30 to the inkjet head 20. Therefore, the problem of complete or partial blockage of the supply line 21 due to particle aggregation or sedimentation in the liquid can be minimized, and the resulting process defects can be minimized, but not limited to this, and various variations are possible.
[0051] Furthermore, the inkjet head 20, main tank 30, and buffer tank 100 can be arranged sequentially from bottom to top. Therefore, the ink can be supplied from the buffer tank 100 to the main tank 30 by gravity. Simultaneously, the ink can be supplied from the main tank 30 to the inkjet head 20 by gravity; however, various modifications can be made depending on the configuration.
[0052] The main tank 30 can store the liquid for supplying to the inkjet head 20, and more than one can be provided. Furthermore, as mentioned above, the main tank 30 can be located above the inkjet head 20 to allow liquid to be supplied to the inkjet head 20 without the use of additional devices such as pumps.
[0053] However, in the process of ink ejection, the ink is not always supplied from the main tank 30 to the inkjet head 20, so it is necessary to block the flow of ink caused by gravity. For this purpose, a pressure regulating unit 40 can be connected to the main tank 30, which can regulate the pressure inside the main tank 30.
[0054] Here, the liquid medicine supply method of the pressure regulating unit 40 is as follows: the pressure regulating unit 40 can simply block the liquid medicine supply by creating a negative pressure inside the main tank 30, and perform the liquid medicine supply by creating a positive pressure inside the main tank 30.
[0055] Because the main tank 30 supplies the ink directly to the inkjet head 20, it is difficult for the main tank 30 to be filled with ink during the ink coating operation. This is because, as mentioned above, a positive pressure needs to be maintained when ink is supplied from the main tank 30 to the inkjet head 20. Therefore, when ink needs to be filled, the main tank 30 can be disconnected from the inkjet head 20.
[0056] The buffer tank 100 may have a space for storing the liquid medicine to be supplied to the main tank 30, and the liquid medicine can be filled independently of the main tank 30, which needs to maintain a negative pressure state, through an external or other tank. Furthermore, one buffer tank 100 may be connected to multiple main tanks 30. For example, the buffer tank 100 may have a capacity 10% larger than that of a single main tank 30.
[0057] In particular, in the buffer tank 100 of this embodiment, the liquid medicine can be circulated so that the flow of the liquid medicine can be formed independently of the operation of spraying the liquid medicine onto the substrate C, thereby minimizing or preventing the problem of liquid medicine particle sedimentation.
[0058] The buffer tank 100 can simply include a first outlet 150 for discharging the medicine and a first inlet 160 for inflowing the medicine. In this case, the first outlet 150 and the first inlet 160 can form a closed path without passing through the main tank 30, thereby allowing the medicine to circulate independently of the medicine sprayed out of the main tank 30.
[0059] This buffer tank 100 can have a shape that expands the space compared to a cylinder and further prevents sedimentation problems compared to a structure that only achieves drug circulation. Exemplarily, the buffer tank 100 can have a cuboid shape so that its capacity is not significantly different from the required storage capacity of existing buffer tanks, and can have a structure with two edges exemplarily formed on a curved surface (which could be a first curved surface 123 and a second curved surface 133) having a rounded machining radius (45 mm) of 45 mm in a plan view. Furthermore, 45 R, 15 R, and 90 R described in this embodiment can refer to having rounded machining radii of 45 mm, 15 mm, and 90 mm, respectively.
[0060] Specifically, the buffer tank 100 may include a bottom surface 110, a first wall surface 120, a second wall surface 130, a top surface 140, a first outlet 150, a first inlet 160, a second outlet 170, and a second inlet 180.
[0061] First, the bottom surface 110 can be inclined to allow the liquid medicine to flow from one side (which may be the area adjacent to the second surface 122) to the other side (which may be the area adjacent to the third surface 131), thereby guiding the flow of the liquid medicine.
[0062] For example, the bottom surface 110 may have a structure in which multiple plates are connected to each other so that the liquid medicine can gather on the other side of the bottom surface. The multiple plates may include a central plate 110A disposed at the center, a left side plate 110B disposed to the left of the central plate 110A, and a right side plate 110C disposed to the right of the central plate 110A. Here, the central plate 110A may be inclined downward from one side to the other. In addition, the left side plate 110B and the right side plate 110C may be formed to open out from the central plate 110A, thereby having a structure in which the liquid medicine gathers towards the central plate 110A.
[0063] Simultaneously, the bottom surface 110 may include a first vertex 111 and a second vertex 112, with the second vertex 112 spaced apart from and diagonally opposite the first vertex 111. Therefore, compared to a structure where the cross-section of the buffer tank 100 forms a circle—that is, compared to the radius of a circle—the buffer tank 100 can form a space where a diagonal of the bottom surface 110 extends to the space between the first vertex 111 and the second vertex 112. Thus, the buffer tank 100 can ensure sufficient space for storing the medicinal liquid.
[0064] Furthermore, the bottom surface 110 can be inclined, so that the first vertex 111 is located below the second vertex 112. However, when the bottom surface 110 has a structure of multiple plates, the first vertex 111 and the second vertex 112 can be positioned opposite the vertices of the top surface 140. Alternatively, the vertices of the central plate 110A can form the first vertex 111 and the second vertex 112. Alternatively, these vertices can be combined, so that each of the first vertex 111 and the second vertex 112 can be composed of multiple vertices. For example, the two vertices of the right plate 110C can form the first vertex 111, and the two vertices of the left plate 110B can form the second vertex 112. In general, various variations are possible.
[0065] The first wall surface 120, together with the second wall surface 130, forms the circumferential wall of the buffer tank 100, and can be connected to the bottom surface 110, and at least a portion thereof can form a curved surface. Exemplarily, the first wall surface 120 may include a first surface 121, a second surface 122, and a first curved surface 123.
[0066] For example, the first face 121 can be composed of a single face and can be connected to the first vertex 111. The second face 122 can be set as a face perpendicular to the first face 121 and can be connected to the second vertex 112.
[0067] Furthermore, the first curved surface 123 can connect the first surface 121 and the second surface 122 to each other, and can have a rounding radius (15R to 90R) of 15mm to 90mm to form a shape that prevents the flow of the liquid medicine from forming a dead zone. For example, the first curved surface 123 can have a rounding radius (45R) of 45mm. Further details will be referenced later. Figure 8 The flow of the liquid medicine is described due to the circularized machining structure of the first curved surface 123 with a radius of 45 mm.
[0068] The second wall surface 130 is formed in the circumferential wall of the buffer tank 100, which is the only circumferential wall other than the first wall surface 120. It can be opposite to the first wall surface 120 and can be connected to the bottom surface 110. Exemplarily, the second wall surface 130 may include a third surface 131, a fourth surface 132 and a second curved surface 133.
[0069] For example, the third face 131 can be set as a face opposite to the second face 122 and can be connected to the first vertex 111. The fourth face 132 can be set as a face opposite to the first face 121 and can be connected to the second vertex 112.
[0070] Furthermore, the second surface 133 can connect the third surface 131 and the fourth surface 132 to each other, and can have a rounding radius (15R to 90R) of 15mm to 90mm, similar to the first surface 123. Similar to the first surface 123, but unlike the formation of dead zones in a structure formed at right angles, this second surface 133 can, like the first surface 123, form a shape that reduces or eliminates dead zones to facilitate the flow of the liquid.
[0071] The first wall surface 120 and the second wall surface 130 are connected to each other to form the circumferential wall of the buffer tank 100. Therefore, edges E2 and E3 can be formed at the point where the first wall surface 120 and the second wall surface 130 meet (see reference). Figure 2 ).
[0072] However, as Figures 3 to 5 As shown, edges E2 and E3 can be chamfered to create an obtuse angle at the connection point, or formed as a smooth connection surface such as a curved surface, to prevent the first wall surface 120 and the second wall surface 130 from meeting at a right angle. Therefore, the angles of edges E2 and E3 can be enlarged compared to right angles, thus minimizing or preventing the adsorption of drug particles.
[0073] Furthermore, all edges mentioned in this specification refer to the location where two surfaces, such as the first wall 120 and the second wall 130, meet, and are therefore not limited to lines formed by meeting at right angles. At the same time, all edges formed in the buffer tank 100 of this embodiment may obviously not form right angles but beveled shapes, thereby forming obtuse angles at the connection points or forming smooth connection surfaces such as curved surfaces.
[0074] Furthermore, edges such as E2 and E3 where the two surfaces of the first wall 120 and the second wall 130 meet can have a rounding radius (5R) of less than 5 mm, thereby distinguishing them from the first surface 123 and the second surface 133 which have a rounding radius of more than 15 mm.
[0075] In other words, edges such as E2 and E3 can be rounded to have a radius of less than 5 mm, thereby creating sufficient space in the buffer tank 100 while forming a smooth connecting surface that prevents particle adsorption, and this is done independently of the flow of the liquid. In contrast, the first curved surface 123 and the second curved surface 133 can be structures in which a portion of the buffer tank 100 is rounded to have a radius of more than 15 mm to prevent dead zones from forming during the flow of the liquid, and are therefore different from each other.
[0076] Furthermore, the edges such as E2 and E3 are rounded to have a radius of 5 mm or less because, as described in this embodiment, dead-zone-free liquid flow occurs at the first vertex 111 and the second vertex 112 on the edges such as E2 and E3 due to inflow and outflow pressures. Therefore, it is not necessary to form a radius of curvature of more than 15 mm in the region of the edges such as E2 and E3, but it is preferable to form a radius of curvature of less than 5 mm to increase the volume.
[0077] The top surface 140 can be connected to the first wall surface 120 and the second wall surface 130, and can be opposite to the bottom surface 110. Furthermore, unlike the bottom surface 110, the top surface 140 may not guide the liquid, and therefore may not form an inclined surface but be parallel to the ground. However, it is not limited to this, and various variations can be made depending on the changes in its configuration.
[0078] The first outlet 150 is configured for the circulation of the medicinal liquid and can be formed on the bottom surface 110. Furthermore, the first outlet 150 can be formed closer to the first vertex 111 than the second vertex 112. Therefore, the first outlet 150 can easily discharge the medicinal liquid moving along the bottom surface 110 to the other side, thus allowing the medicinal liquid to flow smoothly.
[0079] Simultaneously, the first outlet 150 can be located closer to the edge E1 where the bottom surface 110 and the third surface 131 meet than the second outlet 170, thus being positioned below the second outlet 170. Even if the medicine is not discharged through the second outlet 170, the first outlet 150 can still discharge the medicine at a position below the second outlet 170. Therefore, even if no medicine is supplied to the main tank 30, the medicine can be discharged through the first outlet 150 at a position below the second outlet 170. Thus, the medicine can flow smoothly, allowing the medicine to flow without dead zones around the second outlet 170.
[0080] Furthermore, the first outlet 150 can be configured to be larger than a second outlet 170. Therefore, the amount of medicine discharged through the first outlet 150 can be greater than the amount discharged through a second outlet 170, and thus the circulation of medicine can proceed smoothly without being affected by the supply of medicine to the main tank 30; however, this is merely an example.
[0081] Furthermore, the first outlet 150 can be configured such that the difference between its cross-sectional area and the cross-sectional area of the first inlet 160 is less than 10%, or it can be configured to be the same size as the first inlet 160. Therefore, even if no liquid medicine is supplied to the main tank 30, the amounts of liquid medicine supplied through the first inlet 160 and discharged through the first outlet 150 can be the same or similar, thus maintaining a certain level of liquid medicine within the buffer tank 100. However, this is merely an example, and the diameters of the first outlet 150 and the first inlet 160 can be varied depending on the configuration.
[0082] Furthermore, the first outlet 150 can be positioned closer to the first vertex 111 than the second vertex 112. Since discharge pressure can be generated by the discharge of liquid from the first outlet 150, liquid stagnation can be prevented. Therefore, the edge where the first vertex 111 is located can also be rounded to have a radius of less than 5 mm to ensure space in the buffer tank 100.
[0083] The first inlet 160 is configured for the circulation of the medicinal liquid and can be formed on the first wall surface 120 or the second wall surface 130, and preferably on the second surface 122 of the first wall surface 120. Furthermore, the first inlet 160 can be positioned above the first outlet 150 and can be positioned adjacent to the second vertex 112 relative to the first vertex 111. Therefore, the medicinal liquid supplied through the first inlet 160 naturally moves downwards within the buffer tank 100 due to gravity and is discharged through the first outlet 150, thus allowing the medicinal liquid to flow smoothly.
[0084] Furthermore, since the first inlet 160 is a configuration for the inflow of medicinal liquid, it can be the location where the flow of medicinal liquid begins. This first inlet 160 can also be configured to connect with the bottom surface 110 on the second surface 122. Furthermore, the first inlet 160 can be located at the boundary region between the bottom surface 110 and the second surface 122, thus allowing for... Figure 6 The example shown is located in the ridge region. For instance, the first inlet 160 may not extend from bottom to top, but rather extend in the second surface 122 in a direction parallel to the ground or parallel to the bottom surface 110. Furthermore, since an inflow pressure can be generated at the first inlet 160 due to the inflow of the liquid, the liquid flowing in through the first inlet 160 may be ejected in a direction parallel to the bottom surface 110 rather than ejected in an upward direction.
[0085] Furthermore, since inflow pressure is formed at the first inlet 160, dead zones can be prevented from forming around the second vertex 112. Therefore, the periphery of the first inlet 160 does not need to be curved, so the second vertex 112 at the location of the first inlet 160 can be rounded to have a radius of less than 5 mm to expand the space of the buffer tank 100.
[0086] The first outlet 150 and the first inlet 160 can be diagonally positioned, thus reducing the number of dead zones from four to two, compared to the case where dead zones form at the four vertices in a buffer tank 100 with a quadrilateral horizontal cross-section. Here, as described above, since the first curved surface 123 and the second curved surface 133 are provided in the remaining two regions spaced apart from the first outlet 150 and the first inlet 160, no dead zones will appear in the remaining regions besides the first outlet 150 and the first inlet 160, thereby preventing the buffer tank 100 from generating dead zones overall.
[0087] Meanwhile, the first outlet 150 and the first inlet 160 can be located on or connected to the bottom surface 110, thereby enabling the circulation of the liquid medicine on the bottom surface 110. Therefore, in the buffer tank 100 where the water level needs to be sensitively adjusted, the sloshing of the liquid medicine can be prevented.
[0088] Furthermore, a circulation line 151 can be provided between the first outlet 150 and the first inlet 160 to circulate the liquid medicine through the first outlet 150 and the first inlet 160. Additionally, a pump 152 can be provided on the circulation line 151. Therefore, although the circulation line 151 can be made longer than the supply line 21, forced flow caused by the pump 152 can prevent particles from settling on the circulation line 151. Various modifications are also possible, such as providing a filter or flow meter between the outlet of the pump 152 and the first inlet 160.
[0089] The second outlet 170 is a component for supplying / discharging liquid medicine to the main tank 30, and at least one second outlet 170 may be formed on the bottom surface 110. For example, as Figure 7 As shown, four second outlets 170 can be provided, the same number as the main tanks 30. Therefore, there can be various variations, such as the number of second outlets 170 being able to vary depending on the number of main tanks 30.
[0090] Furthermore, by way of example, the second outlet 170 can be formed at a position closer to the first vertex 111 than the second vertex 112, thus forming at a lower position on the inclined bottom surface 110. Therefore, the residual amount of medicine in the buffer tank 100 can be minimized, and the medicine can be discharged not only through the first outlet 150 but also through the second outlet 170, thereby allowing the medicine to flow smoothly.
[0091] Furthermore, the second outlet 170 can be opened only when supplying liquid to the main tank 30. Therefore, as described above, the second outlet 170 can be closed during the liquid coating operation of the inkjet head 20. Thus, the main tank 30 can maintain negative pressure, and the buffer tank 100 can also be filled during the liquid coating operation.
[0092] The second inlet 180 allows liquid medicine to flow in from an external or other container, so that the buffer container 100 can receive liquid medicine from an external or other container and be filled. Exemplarily, the second inlet 180 can be located on the same surface as the first inlet 160, and thus can be formed on the second surface 122 of the first wall surface 120. This is to allow the flow of liquid medicine to naturally form in a direction inclined along the bottom surface 110, but is not limited thereto.
[0093] As described above, in the buffer tank 100, the flow of the liquid medicine according to the discharge pressure and the inflow pressure is formed on the entire bottom surface 110. Therefore, not only can the sedimentation of particles be reduced by the flow of the liquid medicine, but dead zones can also be avoided, thereby further reducing the sedimentation of particles.
[0094] Furthermore, the flow of the liquid medicine in the circularized machining structure with a radius of 45 mm of the unspecified first surface 123 and second surface 133 is as follows.
[0095] like Figure 8 As shown, the liquid medicine flowing into the buffer tank 100 through the first inlet 160 can form a flow A that is discharged through the first outlet 150. At this time, the liquid medicine can also be adjacent to the second curved surface 133 so that the flow of the liquid medicine is guided according to the shape of the second curved surface 133.
[0096] Simultaneously, the liquid medicine flowing into the buffer tank 100 through the first inlet 160 can form a swirling flow instead of being discharged through the first outlet 150, thus creating a B-flow. At this time, the liquid medicine can also be adjacent to the first curved surface 123, so that the flow of the liquid medicine is guided according to the shape of the first curved surface 123.
[0097] However, in addition to Figure 8 In addition to the 45mm rounding radius shown, the first surface 123 and the second surface 133 can also have rounding radii of curvature in the range of 15mm to 90mm, as described above. Here, when the first surface 123 and the second surface 133 exemplarily have rounding radii of curvature as large as 90mm, the volume (storage capacity of the buffer tank 100) is reduced, and therefore, it may not produce... Figure 8 The B-flow shown forms a swirl flow.
[0098] Furthermore, even if no B-flow is generated, if a dead-zone-free liquid flow is generated at the bottom surface 110, particle sedimentation may not occur. Therefore, the liquid flow may generate only an A-flow without generating a B-flow. Thus, various modifications are possible to generate a dead-zone-free liquid flow at the bottom surface 110, with structures that generate both A-flow and B-flow or only A-flow.
[0099] On the other hand, if the radii of curvature of the first surface 123 and the second surface 133 are less than 15 mm, there will be no effect or very little effect due to the discharge pressure and inflow pressure, which may result in a dead zone. Therefore, it is preferable to perform a rounding process to form a radius of 15 mm or more. Furthermore, if the radii of curvature of the first surface 123 and the second surface 133 exceed 90 mm, it may be difficult to form the required volume due to excessive curvature.
[0100] Therefore, in this embodiment, the curvature radius of the first surface 123 and the second surface 133 can be in the range of 15mm to 90mm, and preferably can be formed with a rounded processing radius of 45mm to minimize or prevent particle sedimentation caused by dead zones, while making the storage capacity of the buffer tank 100 meet the capacity required in the substrate processing apparatus 10.
[0101] According to the above embodiment, the substrate processing apparatus 10 can prevent the sedimentation of liquid particles by circulating the liquid in the buffer tank 100, thereby minimizing or preventing the generation of defective products.
[0102] In particular, when the liquid medicine is discharged from the first outlet 150, a discharge pressure is generated, and when the liquid medicine flows in from the first inlet 160, an inflow pressure is generated, thereby creating a flow of liquid medicine on the bottom surface 110 where liquid medicine particles may settle, thus reducing particle settling. At the same time, since the first outlet 150 and the first inlet 160 are diagonally positioned, compared to the case where dead zones are formed at the four edges of the buffer tank 100 with a quadrilateral horizontal cross section, dead zones are not formed at the first outlet 150 and the first inlet 160, so the number of dead zones can be reduced from four to two.
[0103] Furthermore, in the other two areas where dead zones may form, namely the areas where the first exit 150 and the first entrance 160 are not provided, the presence of the first curved surface 123 and the second curved surface 133 minimizes the dead zones where the liquid stagnates.
[0104] The substrate processing method using the substrate processing apparatus 10 of this embodiment will be described below with reference to the accompanying drawings. Since the configuration of the substrate processing apparatus 10 is the same as that described above, repeated content will be omitted.
[0105] Figure 9 This is a flowchart illustrating a substrate processing method according to an embodiment of the present invention.
[0106] Reference Figure 9 The substrate processing method of this embodiment may include: step S110 of providing a substrate processing apparatus for using the substrate processing apparatus 10 mentioned above; step S120 of discharging the liquid from the first outlet 150; step S130 of the discharged liquid flowing into the buffer tank 100 through the first inlet 160; step S140 of the liquid flowing in moving along the curved surface (first curved surface 123 and second curved surface 133) or toward the first outlet 150, thereby generating a flow of liquid in the buffer tank 100; step S150 of closing the second outlet 170 when the water level of the main tank 30 is above a preset range; and step S160 of opening the second outlet 170 when the water level of the main tank 30 is below the preset range.
[0107] First, a substrate processing apparatus 10 (S110) can be provided.
[0108] As described above, the substrate processing apparatus 10 may include an inkjet head 20, a main tank 30, and a buffer tank 100. Furthermore, the substrate processing apparatus 10 can uniformly spray liquid medication through the inkjet head 20.
[0109] However, simply spraying the solution uniformly may not be enough to prevent the generation of defective products. That is, since it is necessary for the particles in the solution to be sprayed uniformly onto the substrate C, it is necessary to prevent the solution from settling inside the buffer tank 100. For this purpose, the substrate processing apparatus 10 of this embodiment can be provided.
[0110] In the provided substrate processing apparatus 10, the liquid medicine can be discharged from the first outlet 150 (S120).
[0111] As described above, the first outlet 150 can be located closer to the first vertex 111 than the second vertex 112. Therefore, at the vertex adjacent to the first outlet 150 (the first vertex 111) of the quadrilateral buffer tank 100, the sedimentation of the liquid can be prevented by the discharge pressure of the liquid, thus avoiding the formation of a dead zone.
[0112] Then, the liquid medicine discharged through the first outlet 150 can flow through the circulation line 151 and into the buffer tank 100 through the first inlet 160 (S130).
[0113] Here, due to the inflow pressure generated at the first inlet 160 due to the inflow of the liquid, sedimentation of the liquid around the first inlet 160 can be prevented. Therefore, similarly to the first outlet 150, a dead zone can be avoided at the vertex (second vertex 112) of the four vertices of the buffer tank 100 adjacent to the first inlet 160.
[0114] Furthermore, the liquid in the buffer tank 100 can circulate via the circulation line 151 through the first outlet 150 and the first inlet 160. At this time, the liquid circulating in the buffer tank 100 can form a closed path including the buffer tank 100, thus allowing circulation without passing through the main tank 30. Therefore, the liquid in the buffer tank 100 can circulate independently of the liquid ejected from the main tank 30, thereby preventing liquid sedimentation in the buffer tank 100 regardless of whether the inkjet head 20 and the main tank 30 are operating.
[0115] Meanwhile, the liquid medicine circulating through the first outlet 150 and the first inlet 160 can move along the curved surface (first curved surface 123 and second curved surface 133) or toward the first outlet 150, thereby generating a flow of liquid medicine within the buffer tank 100 (S140).
[0116] As described in the description of the substrate processing apparatus 10, the flow of the liquid medicine may include a flow moving diagonally from the first inlet 160 toward the first outlet 150 (see reference). Figure 8 (A flow).
[0117] Meanwhile, a first curved surface 123 and a second curved surface 133 are provided in the area adjacent to the first outlet 150 and the first inlet 160. In particular, due to the 45mm rounded processing radius, no dead zone is generated. Therefore, the flow of the medicine liquid can be formed integrally on the bottom surface 110 of the buffer tank 100.
[0118] Furthermore, based on the rounding radius of the first surface 123 and the second surface 133, as described above, the liquid medicine entering from the first inlet 160 can not be discharged through the first outlet 150, but instead form a swirl flow, thereby forming a B-flow (see reference). Figure 8 ).
[0119] On the other hand, as described above, step S140 can be performed independently of the step of discharging the medicine from the main tank 30. That is, step S140 can be performed independently of closing / opening the second outlet 170.
[0120] However, when the liquid in the main tank 30 is depleted, it needs to be refilled. Therefore, a step to supply the main tank 30 with the liquid used to prevent sedimentation via step 140 can be performed. However, since the main tank 30 is not always supplied with liquid, this can be done through the following steps.
[0121] First, when the water level in the main tank 30 is above the preset range, the second outlet 170 can be closed (S150).
[0122] Here, the water level within the preset range can be set by taking into account the size of the main tank 30 and the process time, etc.
[0123] When a sensor (not shown) detects that the liquid level exceeds a preset level, it is necessary to prevent the liquid from overflowing from the main tank 30 or to prevent unnecessary supply of liquid to the main tank 30. For this purpose, the second outlet 170 of the buffer tank 100 can be closed to disconnect the buffer tank 100 from the main tank 30. Closing the second outlet 170 can be achieved using a control valve or similar means, and various modifications can be made depending on the configuration.
[0124] On the other hand, when the water level in the main tank 30 is lower than the preset range, the second outlet 170 can be opened (S160).
[0125] When the second outlet 170 is opened by adjustment of a control valve or the like, the main tank 30 can be connected to the buffer tank 100, thereby supplying the medicine from the buffer tank 100. At this time, the medicine in the buffer tank 100 can form a continuous circulation state.
[0126] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, those skilled in the art should understand that the present invention can be implemented in other specific forms without changing its technical concept or essential features. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.
Claims
1. A substrate processing apparatus, comprising: The main tank stores the liquid chemicals used to supply the inkjet head; as well as A buffer tank, forming a space for storing the liquid medicine supplied to the main tank, and comprising: The first outlet is for discharging the liquid medicine; The first inlet forms a closed path with the first outlet to allow the liquid medicine to circulate without passing through the main tank, and to allow the liquid medicine to flow in; A second outlet is provided for supplying the liquid medicine to the main tank; and The bottom surface includes a first vertex and a second vertex spaced apart from the first vertex. The first exit is located closer to the first vertex than the second vertex. The first entry point is located closer to the second vertex than the first vertex.
2. The substrate processing apparatus according to claim 1, wherein, The buffer tank includes: The first wall surface is connected to the bottom surface; The second wall surface is connected to the bottom surface and is opposite to the first wall surface; and The top surface is connected to the first and second wall surfaces and is opposite to the bottom surface. The bottom surface is inclined so that the first vertex is below the second vertex. The first outlet is formed on the bottom surface, and The first inlet is formed on the first wall or the second wall and is located at a position higher than the first outlet.
3. The substrate processing apparatus according to claim 2, wherein, The first wall surface includes: The first face is connected to the first vertex; The second face connects to the second vertex; and A first curved surface connects the first surface and the second surface to each other.
4. The substrate processing apparatus according to claim 2, wherein, The second wall surface includes: The third face connects to the first vertex; The fourth face connects to the second vertex; and The second surface connects the third and fourth surfaces to each other.
5. The substrate processing apparatus according to claim 4, wherein, The first outlet is closer to the edge where the bottom surface meets the third surface than the second outlet, and is thus positioned below the second outlet.
6. The substrate processing apparatus according to claim 1, wherein, The second outlet is configured as a plurality of outlets, at least one of which is formed on the bottom surface and is located closer to the first vertex than the second vertex.
7. The substrate processing apparatus according to claim 1, wherein, The buffer tank also includes: The second inlet allows the liquid medicine to flow in, so that the liquid medicine fills the buffer tank. The second entrance is located on the same surface as the first entrance.
8. The substrate processing apparatus according to claim 1, wherein, The first outlet is formed to be larger than the second outlet, and the difference between its cross-sectional area and the cross-sectional area of the first inlet is less than 10%, or it is formed to be the same size as the first inlet.
9. The substrate processing apparatus according to claim 1, wherein, The inkjet head, the main tank, and the buffer tank are arranged sequentially from bottom to top, so that the liquid medicine is supplied from the buffer tank to the main tank due to gravity, and the liquid medicine is supplied from the main tank to the inkjet head due to gravity.
10. A substrate processing apparatus, comprising: The main tank stores the liquid chemicals used to supply the inkjet head; as well as A buffer tank, forming a space for supplying the medicine solution to the main tank, and comprising: The bottom surface has a first vertex and a second vertex diagonally opposite to the first vertex, and is connected to a curved surface that is adjacent to the first vertex and the second vertex and thus diagonally opposite to each other; The first outlet is for discharging the liquid medicine; A first inlet, forming a closed path with the first outlet to allow the liquid medicine to circulate and to allow the liquid medicine to flow in; and The second outlet is used to supply the liquid medicine to the main tank.
11. The substrate processing apparatus according to claim 10, wherein, The curved surface has a rounding radius of 15mm to 90mm.
12. The substrate processing apparatus according to claim 10, wherein, The first exit is located closer to the first vertex than the second vertex, and The first entry point is located closer to the second vertex than the first vertex.
13. A substrate processing method, comprising: The step of providing a substrate processing apparatus including a buffer tank, wherein the buffer tank includes: The bottom surface has a first vertex and a second vertex diagonally opposite to the first vertex, and is connected to a curved surface that is adjacent to the first vertex and the second vertex and thus diagonally opposite to each other, and is inclined so that the first vertex is below the second vertex; The first outlet is for discharging the medicinal liquid; A first inlet, forming a closed path with the first outlet to allow the liquid medicine to circulate and to allow the liquid medicine to flow in; and The second outlet is used to supply the liquid medicine to the main tank, wherein the main tank supplies the liquid medicine to the inkjet head; The step of discharging the liquid medicine from the first outlet; The step of the discharged medicine flowing into the buffer tank through the first inlet; and The step of the inflowing liquid medicine moving along the curved surface or toward the first outlet to generate the flow of the liquid medicine within the buffer tank.
14. The substrate processing method according to claim 13, wherein, The steps for generating the flow of the drug solution include: The first outlet is configured to be closer to the first vertex than the second vertex, and the first inlet is configured to be closer to the second vertex than the first vertex, thereby allowing the liquid medicine to flow diagonally from the first inlet toward the first outlet.
15. The substrate processing method according to claim 13, further comprising: The second outlet is opened after the step of generating the flow of the liquid medicine.
16. The substrate processing method according to claim 15, further comprising: The second outlet is closed when the water level in the main tank is above a preset range.