Reflector unit and film forming apparatus
Patent Information
- Application Number
- CN202210959960.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-08-12
- Filing Date
- 2022-08-11
- Publication Date
- 2026-08-18
- Estimated Expiration
- 2042-08-11
AI Technical Summary
但是,根据反射器、腔室的形状及将它们固定的方法,受到来自部件的热传导及其自身的温度分布的影响,在腔室上发生较大的应力
[0018] The reflector unit and film-forming device according to this technical solution can effectively suppress heat conduction into the cavity and suppress the occurrence of stress.
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Figure CN115704107B_ABST
Abstract
Description
[0001] Related applications
[0002] This application claims priority to Japanese Patent Application No. 2021-131789 (filed on August 12, 2021). This application incorporates the entire contents of that basic application by reference. Technical Field
[0003] This invention relates to a reflector unit and a film-forming apparatus. Background Technology
[0004] Traditionally, epitaxial growth techniques are used in the manufacturing processes of semiconductor devices such as power devices, where a single-crystal thin film (e.g., SiC) is vapor-grown on a substrate to form an epitaxial film. In the film deposition apparatus used for epitaxial growth, a substrate is placed inside a chamber maintained at atmospheric or reduced pressure. While the substrate is rotated and heated, a raw material gas and a dopant gas are supplied into the chamber. This causes a thermal decomposition reaction of the raw material gas and a hydrogen reduction reaction on the surface of the substrate, resulting in the formation of an epitaxial film on the substrate.
[0005] If the annular top plate, which connects to the feed gas inlet and forms the upper part of the chamber, is heated by radiant or conductive heat, significant stress will occur within the chamber. To suppress this stress application to the chamber, a reflector unit is provided on the inner circumference of the top plate.
[0006] It is important that the structure near the gas inlet section suppresses radiation and heat conduction, while also facilitating maintenance by keeping the chamber open to maintain the structure. However, depending on the shape of the reflector and the chamber, and the method of fixing them, significant stress occurs in the chamber due to heat conduction from the components and its own temperature distribution. Summary of the Invention
[0007] The purpose of this invention is to provide a reflector unit and film-forming device that can effectively suppress heat conduction into the chamber and suppress the occurrence of stress.
[0008] The reflector unit of this technical solution includes: a cylindrical first reflector component, which has a first engaging portion on its outer peripheral side for being supported by a film-forming chamber, and a first mounting portion on its inner peripheral side; and a cylindrical second reflector component, which is disposed inside the first reflector component and has a second engaging portion on its outer peripheral side for engaging with the first mounting portion and being supported by the first reflector component.
[0009] Alternatively, the position of the first engaging part in the vertical direction and the phase in the horizontal direction may differ from that of the second engaging part.
[0010] Alternatively, at least one of the first engaging portion, the first mounting portion, and the second engaging portion may be partially and substantially equally arranged at at least three locations in the circumferential direction.
[0011] Alternatively, the second reflector component may also have a second mounting portion on its inner circumference side, and the reflector unit may have a cylindrical third reflector component, which is disposed on the inner side of the second reflector component and has a third engaging portion on its outer circumference side for engaging with the second mounting portion and being supported by the second reflector component.
[0012] Alternatively, it may also include a first heat insulation portion disposed between the first mounting portion and the second engaging portion.
[0013] Alternatively, in the first and second reflector components mentioned above, components with a SiC film or a TaC film formed on carbon can be used.
[0014] Alternatively, it may also include a second heat insulation portion that is disposed in the space between the first reflector component and the second reflector component and has a generally cylindrical shape.
[0015] The film-forming apparatus of this technical solution includes: a chamber having a top plate with an opening at the top, which houses a substrate for film-forming processing; a gas supply unit disposed above the chamber, which supplies raw material gas to the substrate through the opening in the top plate; a heater for heating the substrate; and a reflector unit disposed in the opening in the top plate.
[0016] Alternatively, the aforementioned reflector unit may be engaged with and fixed to the aforementioned top plate.
[0017] Alternatively, the reflector unit may be fixed to the mounting portion installed on the gas supply unit.
[0018] The reflector unit and film-forming device according to this technical solution can effectively suppress heat conduction into the cavity and suppress the occurrence of stress. Attached Figure Description
[0019] Figure 1 This is a cross-sectional view showing a structural example of the film-forming apparatus according to the first embodiment.
[0020] Figure 2 This is a cross-sectional view showing a structural example of a reflector unit and its surroundings.
[0021] Figure 3 This is a cross-sectional view showing a structural example of the first reflector unit.
[0022] Figure 4 This is a top view showing an example of the structure of a reflector component.
[0023] Figure 5 It is along Figure 4 A cross-sectional view along line B-B.
[0024] Figure 6 This is a side view showing an example of the structure of a reflector component.
[0025] Figure 7 This is a top view showing structural examples of other reflector components.
[0026] Figure 8 It is along Figure 7 A cross-sectional view along line B-B.
[0027] Figure 9 This is a side view showing an example of the structure of other reflector components.
[0028] Figure 10 This is a cross-sectional view showing a structural example of the first reflector unit in the second embodiment.
[0029] Figure 11 This is a cross-sectional view showing a structural example of the first reflector unit, a modified example of the first embodiment.
[0030] Figure 12 This is a cross-sectional view showing a structural example of the first reflector unit in the third embodiment.
[0031] Figure 13 This is a cross-sectional view showing a more detailed structural example of the first reflector unit.
[0032] Figure 14 This is a diagram showing a structural example of the first support component.
[0033] Figure 15 This is a diagram showing a structural example of the first support component.
[0034] Figure 16 This is a diagram showing a structural example of the first support component.
[0035] Figure 17 This is a diagram showing a structural example of the second support component.
[0036] Figure 18 This is a diagram showing a structural example of the second support component.
[0037] Figure 19 This is a perspective view showing a structural example of the first and second support components that are joined together.
[0038] Figure 20 This is a cross-sectional view showing another structural example of the first and second support components that are joined together.
[0039] Figure 21This is a top view showing another structural example of the first and second support components that are joined together. Detailed Implementation
[0040] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. These embodiments are not intended to limit the invention. The drawings are schematic or conceptual, and the proportions of the parts, etc., are not necessarily identical to reality. In the specification and drawings, the same reference numerals are used for elements identical to those described with respect to previously presented figures, and detailed descriptions are appropriately omitted.
[0041] (First Embodiment)
[0042] Figure 1 This is a cross-sectional view showing a structural example of the film-forming apparatus 10 according to the first embodiment. The film-forming apparatus 10 includes a chamber 13, a liner 20, cooling sections 31, 32, and 35, a gas supply section 12, an exhaust section 50, a receiver 60, a support section 70, a rotating mechanism 80, a lower heater 90, an upper heater 95, and a reflector unit 100.
[0043] The chamber 13 is made of a generally cylindrical metal, such as stainless steel. The pressure inside the chamber 13 can be adjusted by a vacuum pump (not shown) connected to the exhaust section 50.
[0044] The gas supply section 12 above the chamber 13 is provided with a nozzle N for supplying gas and a first cooling section 31 and a second cooling section 32. The process gas supplied from the nozzle N, including raw material gas, carrier gas, and dopant gas, is kept cool by the first cooling section 31 and the second cooling section 32.
[0045] The chamber 13 is capable of housing the substrate W for film formation. The chamber 13 is equipped with a receiver 60, a rotating mechanism 80, a lower heater 90, and an upper heater 95. Gas supplied from the nozzle N reacts on the surface of the heated substrate W, forming an epitaxial film on the substrate W. This epitaxial film is, for example, a SiC film.
[0046] The liner 20 is a hollow cylindrical component that covers and protects the inner wall of the chamber 13, such as carbon material coated with SiC. The liner 20 inhibits the accumulation of byproducts on the inner wall of the chamber 13.
[0047] Cooling sections 31 and 32 are provided on the gas supply section 12, and are, for example, flow paths for a coolant (e.g., water). By the flow of the coolant in the flow path, the cooling sections 31 and 32 suppress the temperature rise of the gas caused by heat from the upper heater 95 or the lower heater 90 within the gas supply section 12 and around the nozzle N of the gas supply section 12.
[0048] Cooling section 35 is provided in chamber 13, and like cooling sections 31 and 32, it is a flow path for coolant (e.g., water). Cooling section 35 is configured to prevent heat from the upper heater 95 or the lower heater 90 from heating chamber 13.
[0049] The gas supply unit 12 is disposed above the chamber 13 facing the surface of the substrate W, and has a plurality of nozzles N. The gas supply unit 12 supplies raw material gas, dopant gas and carrier gas into the chamber 13 through the nozzles N.
[0050] The exhaust section 50 is located at the bottom of the chamber 13, and exhausts the remaining gas and reaction byproducts used in the film formation process to the outside of the chamber 13.
[0051] The receiver 60 is an annular component capable of supporting the substrate W, and is formed of a material such as SiC (silicon carbide) or carbon. The support portion 70 is a cylindrical component capable of supporting the receiver 60, and is also made of carbon, for example, the same material as the receiver 60. The support portion 70 is connected to the rotation mechanism 80 and is configured to be rotatable by the rotation mechanism 80. The support portion 70 allows the substrate W and the receiver 60 to rotate together. The receiver 60 and the support portion 70 are formed of materials with heat resistance of 1700°C or higher, such as SiC (silicon carbide), TaC (tantalum carbide), or carbon coated with TaC, other than carbon.
[0052] The lower heater 90 is located below the receiver 60 and inside the support portion 70. The lower heater 90 heats the substrate W from below. The upper heater 95 is located along the side of the chamber 13 and heats the interior of the chamber 13 to prevent the temperature of the substrate W from dropping. The upper heater 95 is located below the reflector unit 100. While the rotating mechanism 80 rotates the substrate W at a high speed of, for example, 900 rpm or more, the lower heater 90 and the upper heater 95 heat the substrate W to a high temperature of 1500°C or more. As a result, the substrate W can be heated uniformly.
[0053] The reflector unit 100 is disposed inside the annular top plate 110 located at the upper part of the chamber 13, and is made of carbon, for example. The reflector unit 100 reflects heat from the lower heater 90 and the upper heater 95 downwards and suppresses heat conduction into the chamber 13. This prevents the temperature of the gas supply section 12 and the upper part of the chamber 13 from rising excessively. For example, besides carbon, the reflector unit 100 is preferably made of a material with heat resistance of 1700°C or higher, such as SiC (silicon carbide), TaC (tantalum carbide), W (tungsten), or Mo (molybdenum). The reflector unit 100 has a structure in which multiple thin plates are separated at predetermined intervals to reflect heat efficiently. A more detailed structure of the reflector unit 100 will be described later.
[0054] Figure 2This is a cross-sectional view showing an example of the structure of the reflector unit 100 and its surroundings. The gas supply unit 12 is omitted from the illustration.
[0055] The reflector unit 100 is located in the upper part of the chamber 13 (i.e., directly below the gas supply unit 12), and includes a first reflector unit 100a and a second reflector unit 100b.
[0056] The first reflector unit 100a is mounted on a top plate 110 located on the upper part of the chamber 13. The top plate 110 constitutes the upper part of the chamber 13. The top plate 110 is an annular component arranged approximately concentrically with the chamber 13, and is made of a metal such as stainless steel. The top plate 110 is configured such that the lower part of its inner peripheral portion C has a predetermined curvature from a approximately vertical direction to a approximately horizontal direction. As a result, stress concentration caused by heat during the film formation process is suppressed and concentrated on the lower part of the inner peripheral portion C of the top plate 110.
[0057] Furthermore, in order to suppress the heat generated by the film-forming process and protect the chamber 13, a reflector unit 100 is provided on the inner circumferential side of the top plate 110.
[0058] The top plate 110 has multiple protrusions 110a on its inner wall surface. The first reflector unit 100a is supported by its own weight on the protrusions 110a via a cover (hereinafter referred to as the cover) 103 of the top plate (described later), without the use of bolts or other fasteners. The first reflector unit 100a is composed of multiple reflector parts. Each of the multiple reflector parts has a generally cylindrical shape and is arranged in a block-like manner on the inner peripheral portion C of the top plate 110 by interlocking or being supported.
[0059] On the other hand, the second reflector unit 100b is mounted on the inner wall surface of the chamber 13, which extends in a generally horizontal direction. The second reflector unit 100b is configured in such a way that multiple reflector parts are overlapped, and is fastened to the chamber 13 by means of bolts or the like via retaining members.
[0060] Figure 3 This is a cross-sectional view showing a structural example of the first reflector unit 100a. Let the circumferential direction of the cylindrical shape of the first reflector unit 100a be D3, the radial direction be D2, and the direction orthogonal to D3 and D2 be D1. D1 is the vertical direction (vertical top or vertical bottom). Figure 3 This represents a cross-section of the first reflector unit 100a positioned radially (D2). Furthermore, these directions do not need to be strictly vertical or horizontal, and some degree of error is permissible.
[0061] A cover 103 covers the inner wall of the chamber 13 on the inner circumferential portion C of the top plate 110 located between the gas supply section 12 and the chamber 13. The cover 103 is provided along the curved surface of the inner circumferential portion C of the top plate 110. The cover 103 is provided, for example, to prevent the adhesion of reaction byproducts to the top plate.
[0062] The cover 103 is generally annular along the inner wall of the chamber 13. The cover 103 has multiple engaging portions 103a. These engaging portions 103a are formed, for example, by providing multiple notches on a flange formed on the upper outer periphery of the cover 103, and engage with protrusions 110a provided on the inner periphery of the top plate 110. Thus, the cover 103, by its own weight, is supported by the protrusions 110a via the engaging portions 103a, covering the inner periphery of the top plate. A heat-resistant material, such as quartz, is used, for example, in the cover 103.
[0063] The cover 103 has a diameter slightly smaller than the inner diameter of the top plate 110 so as to cover the inner circumferential surface of the top plate 110. On the other hand, the outer diameter of the engaging portion 103a is larger than the inner diameter of the inscribed circle of the protrusion 110a so that the engaging portion 103a is engaged with the protrusion 110a. With this configuration, the cover 103 can be fixed in a state that covers the inner circumferential surface of the top plate 110.
[0064] The cover 103 engages with and is supported by a plurality of protrusions 110a provided on the inner peripheral portion C of the top plate 110. The protrusions 110a are provided to project radially from the inner wall of the top plate 110. The protrusions 110a are integrally formed with the top plate 110 and are made of the same metal as the top plate 110, such as stainless steel. Alternatively, the protrusions 110a may be separate from the top plate 110. In this case, the protrusions 110a can be simply bonded or welded to the side wall of the top plate 110, for example.
[0065] The first reflector unit 100a includes reflector parts 101_1, 101_2, 102_1, 102_2, and 104.
[0066] The reflector part 101_1, serving as the first reflector part, has a generally cylindrical shape, covering the inner peripheral portion C of the top plate 110. That is, the reflector part 101_1 is arranged such that its sidewalls cover the inner peripheral portion C of the top plate 110 in both the vertical direction (D1) and the circumferential direction (D3). Furthermore, reflector parts 101_1, 102_1, 101_2, 102_2, and 104 are made of heat-resistant materials such as carbon, SiC-coated carbon, or TaC-coated carbon. Reflector parts 101_1, 102_1, 101_2, 102_2, and 104 may also be made of materials on which a SiC film or a TaC film is formed.
[0067] In a radial (D2) cross-section, reflector part 101_1 has an outwardly projecting engagement portion 101a_1 at its upper end, serving as a first engagement portion, and an inwardly projecting mounting portion 101b_1 at its lower end, serving as a first mounting portion. The engagement portion 101a_1 engages with the upper part of a protrusion 110a provided on the inner peripheral portion C of the top plate 110 via the engagement portion 103a of the cover 103, and is supported by the protrusion 110a. The mounting portion 101b_1 protrudes inward to mount reflector part 102_1, which serves as a second reflector part. Thus, reflector part 101_1 has an engagement portion 101a_1 at its upper end and a mounting portion 101b_1 at its lower end. Thus, the reflector part 101_1 is supported by its own weight and engages with the protrusion 110a of the top plate 110, and the reflector part 102_1 can be mounted and supported by the mounting part 101b_1.
[0068] The portion 101_1a of the reflector part 101_1 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of the cover 103, so that it can enter the inside of the cover 103. On the other hand, the diameter of the outer circle of the engaging portion 101a_1 is slightly larger than the inner diameter of the cover 103 or the inner circle of the protrusion 110a, so that the engaging portion 101a_1 is engaged with the cover 103 or the protrusion 110a. With this configuration, the reflector part 101_1 can be mounted in a state that covers the inner peripheral portion C of the top plate 110 and the inner peripheral surface of the cover 103.
[0069] The engaging portion 101a_1 prevents heat radiation from above from entering between the reflector part 101_1 and the cover 103, thus preventing the reflector part 101_1 and the cover 103 from being directly heated by heat radiation. The mounting portion 101b_1 prevents heat radiation from below from entering between the reflector part 101_1 and the reflector part 102_1, thus preventing the reflector parts 101_1 and 102_1 from being directly heated by heat radiation. Furthermore, the engaging portion 101a_1 prevents process gas from above from entering between the reflector part 101_1 and the cover 103, thus preventing deposits from adhering to the reflector part 101_1 and the cover 103. Therefore, the reflectivity of the reflector part 101_1 and the cover 103 can be maintained. The mounting portion 101b_1 prevents process gas from below from entering between the reflector part 101_1 and the reflector part 102_1, thus preventing deposits from adhering to the reflector parts 101_1 and 102_1. Therefore, the reflectivity of thermal radiation of reflector parts 101_1 and 102_1 can be maintained.
[0070] The reflector part 102_1, which is the second reflector part, has a generally cylindrical shape in such a way that it covers the inner peripheral portion C of the top plate 110. That is, the reflector part 102_1 is arranged such that its sidewalls cover the inner surface of the reflector part 101_1 in the vertical direction (D1) and the circumferential direction (D3).
[0071] In a radial (D2) cross-section, reflector part 102_1 has an inwardly protruding mounting portion 102b_1 at the top, serving as a second mounting portion, and an outwardly protruding engaging portion 102a_1 at the bottom, serving as a second engaging portion. The engaging portion 102a_1 engages with and is supported by the mounting portion 101b_1 of reflector part 101. The mounting portion 102b_1 protrudes inwardly to mount reflector part 101_2. Thus, reflector part 102_1 has a mounting portion 102b_1 at the top and an engaging portion 102a_1 at the bottom. Therefore, reflector part 102_1 is supported by its own weight and engaged with the mounting portion 101b_1 of reflector part 101_1, and is able to mount and support reflector part 101_2.
[0072] The portion 102_1a extending in the vertical direction (D1) of reflector part 102_1 has an outer diameter slightly smaller than the inner diameter of reflector part 101_1, so that it can enter the inner side of reflector part 101_1. On the other hand, the diameter of the outer circle of the engaging portion 102a_1 is slightly larger than the diameter of the inner circle of the mounting portion 101b_1 of reflector part 101_1, so that the engaging portion 102a_1 is engaged with the mounting portion 101b_1 of reflector part 101_1. With this configuration, reflector part 102_1 is mounted in a state that covers the inner peripheral surface of reflector part 101_1.
[0073] The reflector part 102_1 has a protrusion 102c_1 protruding radially (D2) outward at its upper end and a protrusion 102d_1 protruding radially (D2) inward at its lower end. The protrusion 102c_1 prevents heat radiation from above from entering between reflector parts 101_1 and 102_1, thus preventing them from being directly heated by heat radiation. The protrusion 102d_1 prevents heat radiation from below from entering between reflector parts 102_1 and 101_2, thus preventing them from being directly heated by heat radiation. Furthermore, the protrusion 102c_1 prevents process gas from above from entering between reflector parts 101_1 and 102_1, thus preventing deposits from adhering to them. Therefore, the reflectivity of thermal radiation from reflector parts 101_1 and 102_1 can be maintained. The protrusion 102d_1 prevents process gas from below from entering between reflector parts 102_1 and 101_2, and prevents deposits from adhering to reflector parts 102_1 and 101_2. Therefore, the reflectivity of thermal radiation from reflector parts 102_1 and 101_2 can be maintained.
[0074] Furthermore, the engaging portion 102a_1 and the mounting portion 102b_1 also have the same function as the protrusions 102c_1 and 102d_1. That is, the engaging portion 102a_1 prevents heat radiation from below from entering between the reflector part 101_1 and the reflector part 102_1. The mounting portion 102b_1 prevents heat radiation from above from entering between the reflector part 102_1 and the reflector part 101_2. Furthermore, the engaging portion 102a_1 prevents process gas from below from entering between the reflector part 101_1 and the reflector part 102_1. The mounting portion 102b_1 prevents process gas from above from entering between the reflector part 102_1 and the reflector part 101_2.
[0075] Reflector part 101_2, which is the third reflector part, has essentially the same cross-sectional structure as reflector part 101_1. Reflector part 101_2 has a generally cylindrical shape in its inner peripheral portion C, which covers the inner wall of the chamber 13. Reflector part 101_2 is arranged such that its sidewalls cover the inner peripheral portion C of the top plate 110 in both the generally vertical direction (D1) and the circumferential direction (D3).
[0076] In a radial (D2) cross-section, reflector part 101_2 has an engaging portion 101a_2 protruding outward from the upper periphery and a mounting portion 101b_2 protruding inward from the lower periphery. The engaging portion 101a_2 engages with and is supported by the mounting portion 102b_1 of reflector part 102_1 adjacent to it on the outside. The mounting portion 101b_2 of reflector part 101_2 protrudes inward from the lower periphery to mount reflector part 102_2. Thus, reflector part 101_2 has an engaging portion 101a_2 at the upper end and a mounting portion 101b_2 at the lower end. Therefore, reflector part 101_2 is supported by its own weight through engagement with the mounting portion 102b_1 of reflector part 102_1, and is able to mount and support reflector part 102_2.
[0077] The portion 101_2a of the reflector part 101_2 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of the reflector part 102_1, so that it can enter the inner side of the reflector part 102_1. On the other hand, the diameter of the outer circle of the engaging portion 101a_2 of the reflector part 101_2 is slightly larger than the diameter of the inner circle of the mounting portion 102b_1 of the reflector part 102_1, so that the engaging portion 101a_2 is engaged with the mounting portion 102b_1 of the reflector part 102_1. With this configuration, the reflector part 101_2 can be mounted in a state that covers the reflector part 102_1.
[0078] The engaging portion 101a_2 has the same function as the engaging portion 101a_1, suppressing heat radiation from above from entering between the reflector part 102_1 and the reflector part 101_2. The mounting portion 101b_2 has the same function as the mounting portion 101b_1, suppressing heat radiation from below from entering between the reflector part 101_2 and the reflector part 102_2. Furthermore, the engaging portion 101a_2 suppresses process gas from above from entering between the reflector part 102_1 and the reflector part 101_2. The mounting portion 101b_2 suppresses process gas from below from entering between the reflector part 101_2 and the reflector part 102_2. Thus, the engaging portion 101a_2 and the mounting portion 101b_2 can achieve the same effect as the engaging portion 101a_1 and the mounting portion 101b_1.
[0079] Reflector part 102_2 has essentially the same cross-sectional structure as reflector part 102_1. Reflector part 102_2 has a generally cylindrical shape in the inner peripheral portion C of the top plate 110 such that it covers the inner wall of the chamber 13. Reflector part 102_2 is arranged such that its sidewalls cover the inner surface of reflector part 102_1 in the vertical direction (D1) and circumferential direction (D3).
[0080] In a radial (D2) cross-section, reflector part 102_2 has a mounting portion 102b_2 protruding radially inward at its upper end and a engaging portion 102a_2 extending radially outward at its lower end. The engaging portion 102a_2 of reflector part 102_2 engages with and is supported by the mounting portion 101b_2 of reflector part 101_2. The mounting portion 102b_2 of reflector part 102_2 protrudes radially inward to mount reflector part 104. Thus, reflector part 102_2 has a mounting portion 102b_2 at its upper end and an engaging portion 102a_2 at its lower end in a main body extending in the vertical direction (D1). Thus, the reflector part 102_2 is supported by its own weight and engages with the mounting part 101b_2 of the reflector part 101_2, and is able to mount and support the reflector part 104.
[0081] The portion 102_2a of the reflector part 102_2 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of the reflector part 101_2, so that it can enter the inner side of the reflector part 101_2. On the other hand, the diameter of the outer circle of the engaging portion 102a_2 of the reflector part 102_2 is slightly larger than the diameter of the inner circle of the mounting portion 101b_2 of the reflector part 101_2, so that the engaging portion 102a_2 is engaged with the mounting portion 101b_2 of the reflector part 101_2. With this configuration, the reflector part 102_2 can be mounted in a state that covers the inner peripheral surface of the reflector part 101_2.
[0082] The reflector part 102_2 has a protrusion 102c_2 protruding radially (D2) outward at its upper end and a protrusion 102d_2 protruding radially (D2) inward at its lower end. The protrusion 102c_2 prevents heat radiation from above from entering between the reflector parts 101_2 and 102_2, thus preventing them from being directly heated by heat radiation. The protrusion 102d_2 prevents heat radiation from below from entering between the reflector parts 102_2 and 104, thus preventing them from being directly heated by heat radiation. Furthermore, the protrusion 102c_2 prevents process gas from above from entering between the reflector parts 101_2 and 102_2, preventing deposits from adhering to them. Therefore, the reflectivity of the reflector parts 101_2 and 102_2 can be maintained. The protrusion 102d_2 prevents process gas from entering between reflector part 102_2 and reflector part 104 from below, and prevents deposits from adhering to reflector parts 102_2 and 104. As a result, the reflectivity of thermal radiation of reflector parts 102_2 and 104 can be maintained.
[0083] Furthermore, the engaging portion 102a_2 and the mounting portion 102b_2 also have the same function as the protrusions 102c_2 and 102d_2. That is, the engaging portion 102a_2 prevents heat radiation from below from entering between the reflector part 101_2 and the reflector part 102_2. The mounting portion 102b_2 prevents heat radiation from above from entering between the reflector part 102_2 and the reflector part 104. Furthermore, the engaging portion 102a_2 prevents process gas from below from entering between the reflector part 101_2 and the reflector part 102_2. The mounting portion 102b_2 prevents process gas from above from entering between the reflector part 102_2 and the reflector part 104.
[0084] The reflector part 104 has a generally cylindrical shape on the inner peripheral portion C of the top plate 110, such that it covers the inner wall of the reflector part 102_2. The reflector part 104 may also be made of a material on which a SiC film or a TaC film is formed on a carbon material, for example. However, since the reflector part 104 is the innermost reflector part of the first reflector unit 100a, it is preferable to make it of a material on which a SiC film is formed on a carbon material.
[0085] The reflector part 104 has a locking portion 104a protruding radially (D2) outward at its upper end. The locking portion 104a of the reflector part 104 engages with the mounting portion 102b_2 of the reflector part 102_2 adjacent to it on its outer side and is supported by the mounting portion 102b_2. Thus, the reflector part 104 has the locking portion 104a at the upper end of its main body extending in the vertical direction (D1). As a result, the reflector part 104 can be supported by its own weight engaging with the mounting portion 102b_2 of the reflector part 102_2.
[0086] The portion 104a_a of the reflector part 104 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of the reflector part 102_2, so that it can enter the inner side of the reflector part 102_2. On the other hand, the diameter of the outer circle of the engaging portion 104a is slightly larger than the diameter of the inner circle of the mounting portion 102b_2 of the reflector part 102_2, so that the engaging portion 104a is engaged with the mounting portion 102b_2 of the reflector part 102_2. With this configuration, the reflector part 104 can be mounted in a state that covers the inner peripheral surface of the reflector part 102_2.
[0087] The engaging portion 104a has the same function as the engaging portion 101a_2, suppressing heat radiation from above from entering between the reflector part 102_2 and the reflector part 104. Furthermore, the engaging portion 104a suppresses process gas from above from entering between the reflector part 102_2 and the reflector part 104. Thus, the engaging portion 104a achieves the same effect as the engaging portion 101a_2.
[0088] Thus, the first reflector unit 100a of this embodiment is composed of reflector parts 101_1, 101_2, 102_1, 102_2, and 104. The reflector parts 101_1, 101_2, 102_1, 102_2, and 104 are continuously engaged and arranged starting from the protrusion 110a of the top plate 110. Consequently, among the reflector parts 101_1, 101_2, 102_1, 102_2, and 104, the radially outer reflector part supports the radially inner reflector part. Therefore, in this embodiment, it is not necessary to use fastening tools such as bolts for fixing. Since fastening tools such as bolts are not used, heat conduction via fastening tools is suppressed. Furthermore, since fastening tools such as bolts are not used, the disassembly and installation of the first reflector unit 100a are simpler, and maintenance becomes easier. Furthermore, the number of parts constituting the first reflector unit 100a is reduced.
[0089] Furthermore, in order to secure them with fastening tools, fastening holes need to be formed in the reflector parts 101_1, 101_2, 102_1, 102_2, 104 and the top plate 110, and they are then fastened with fastening tools. In this case, mechanical stress is applied to the first reflector unit 100a and the top plate 110. If such mechanical stress is applied to the top plate 110 in addition to thermal stress, the chamber 13 is easily damaged. In contrast, since the first reflector unit 100a of this embodiment does not use fastening tools, it is possible to suppress the application of mechanical stress to the top plate 110, i.e., the chamber 13.
[0090] Furthermore, reflector components 101_1, 101_2, 102_1, 102_2, and 104 extend in the vertical direction (D1) and are arranged in a block-like manner in the radial direction (D2). Thus, the first reflector unit 100a can effectively reflect thermal radiation arriving from a generally horizontal direction. Furthermore, the second reflector unit 100b is composed of reflector components arranged overlapping in the vertical direction (D1). Therefore, thermal radiation from below the upper heater 95 or the lower heater 90 is effectively reflected by the second reflector unit 100b. Thus, reflector units 100a and 100b can suppress heat conduction to the top plate 110 and suppress excessive heating caused by thermal radiation. Therefore, damage to the chamber 13 caused by thermal stress can be suppressed.
[0091] Although reflector parts 101_1 and 101_2 have different diameters, Figure 3 The cross-sections shown have approximately equal shapes. Furthermore, although reflector parts 102_1 and 102_2 differ in diameter, they... Figure 3 The cross-sections shown have approximately equal shapes. Therefore, in the first reflector unit 100a, a plurality of first reflector parts 101_1, 101_2 and a plurality of second reflector parts 102_1, 102_2 are arranged alternately in a radially overlapping manner. The number of the first and second reflector parts located between the cover 103 and the reflector parts 104 is not particularly limited, and can be either less than two or more than two, respectively.
[0092] In this embodiment, the engaging portion 101a_1 of reflector part 101_1 contacts the engaging portion 103a of cover 103, the engaging portion 102a_1 of reflector part 102_1 contacts the mounting portion 101b_1 of reflector part 101_1, the mounting portion 102b_1 of reflector part 102_1 contacts the engaging portion 101a_2 of reflector part 101_2, the mounting portion 101b_2 of reflector part 101_2 contacts the engaging portion 102a_2 of reflector part 102_2, and the mounting portion 102b_2 of reflector part 102_2 contacts the engaging portion 104a of reflector part 104. However, in other parts, cover 103, reflector parts 101_1, 102_1, 101_2, 102_2, and 104 do not contact each other. Therefore, the contact surfaces of adjacent reflector components are located at the ends of each reflector component, separated in the vertical direction (D1) (at different heights in the vertical direction), and arranged in a zigzag pattern, staggered from each other. Thus, the heat conduction path from the innermost reflector component 104 located in the first reflector unit 100a to the top plate 110 is as follows: Figure 3 The dashed arrow A1 indicates that the length has increased. By lengthening the heat conduction path in this way, the heat from the reflector part 104 is less likely to be conducted to the top plate 110. As a result, the first reflector unit 100a is able to effectively block heat radiation from the horizontal direction, protecting the top plate 110 from heat damage.
[0093] Figure 4 This is a top view showing a structural example of reflector part 101_1. Figure 5 It is along Figure 4 A cross-sectional view along line B-B. Figure 6 This is a side view showing a structural example of reflector part 101_1. (Refer to...) Figures 4-6The structure of reflector component 101_1 is described below. Although the diameters of other reflector components 101_2 are different, their structures are essentially the same as those of reflector component 101_1, so their descriptions are omitted. Reflector component 101_1 is, for example, made of a material on which a SiC or TaC film has been formed.
[0094] like Figure 4 As shown, the reflector component 101_1 includes a flange 101b_11 that protrudes radially (D2) and is provided on the entire circumferential direction (D3) on its inner side, and a plurality of mounting portions 101b_1 that protrude vertically (D1) from the flange 101b_11. That is, the mounting portions 101b_1 are provided on the flange 101b_11 of the reflector component 101_1. The plurality of mounting portions 101b_1 are as follows: Figure 4 As shown, the components are not located on the entire inner periphery of the reflector part 101_1, but are arranged locally and approximately evenly at four points on its inner periphery. The mounting part 101b_1 only needs to be able to stably support the reflector part 101_1, and only needs to be arranged approximately evenly at at least three points.
[0095] If multiple mounting portions 101b_1 are provided on the entire inner periphery of the reflector part 101_1, the engaging portion 102a_1 of the reflector part 102_1 contacts the flange 101b_11, and the contact area between them increases. In this case, the thermal conductivity between the reflector part 101_1 and the reflector part 102_1 becomes relatively high. Therefore, the thermal blocking effect of the first reflector unit 100a decreases.
[0096] Therefore, multiple mounting portions 101b_1 are partially protruding from the flange 101b_11, and engaging portions 102a_1 are engaged with the multiple mounting portions 101b_1. This reduces the contact area between reflector part 101_1 and reflector part 102_1. On the other hand, to stably support reflector part 102_1, the multiple mounting portions 101b_1 are preferably arranged approximately equally on the inner periphery of reflector part 101_1 and connected to the mounting portions 101b_1 with sufficient strength.
[0097] On the other hand, reflector part 101_1 such Figure 5 and Figure 6 As shown, a engaging portion 101a_1 protruding radially (D2) is provided on the outer side of the end opposite to the mounting portion 101b_1. That is, the engaging portion 101a_1 also serves as a flange of the reflector part 101_1. The engaging portion 101a_1 can also be provided on the entire outer periphery of the reflector part 101_1. In this case, simply... Figure 3The engaging portion 103a of the cover 103 and the mounting portion 101b_1 can be arranged approximately equally in a localized manner. Therefore, even if the engaging portion 101a_1 is provided on the entire outer periphery of the reflector part 101_1, the contact area with the engaging portion 103a can be reduced.
[0098] Figure 7 This is a top view showing a structural example of other reflector parts 102_1. Figure 8 It is along Figure 7 A cross-sectional view along line B-B. Figure 9 This is a side view showing a structural example of another reflector part 102_1. (Refer to...) Figures 7-9 The structure of reflector part 102_1 is described below. Although the diameter of reflector part 102_2 is different, its structure is essentially the same as that of reflector part 102_1, so its description is omitted. Reflector part 102_1 is, for example, made of a material on which a SiC film or a TaC film has been formed.
[0099] like Figure 7 As shown, the reflector part 102_1 has a plurality of mounting portions 102b_1 protruding radially (D2) from its inner side. The plurality of mounting portions 102b_1 are as follows: Figure 7 As shown, the components are not disposed on the entire inner periphery of the reflector part 101_2, but rather locally and approximately evenly distributed at, for example, four locations on its inner periphery. The mounting part 102b_1 only needs to be able to stably support the reflector part 101_2, and only needs to be distributed approximately evenly at at least three locations.
[0100] If multiple mounting portions 102b_1 are provided on the entire inner periphery of the reflector part 101_2, the contact area with the engaging portion 101a_2 of the reflector part 101_2 may become larger. In this case, the thermal conductivity between the reflector part 101_2 and the reflector part 102_1 becomes relatively high. Therefore, the thermal blocking effect of the first reflector unit 100a decreases.
[0101] Therefore, in order to reduce the contact area with the engaging portion 101a_2, the plurality of mounting portions 102b_1 are preferably provided locally and have a small area. On the other hand, in order to stably support the reflector part 101_2, the plurality of mounting portions 102b_1 are preferably arranged approximately equally on the inner periphery of the reflector part 101_2 and connected to the mounting portion 102b_1 with sufficient strength.
[0102] On the other hand, reflector component 102_1, such as Figure 8 As shown, a protrusion 102d_1 protruding radially (D2) is provided on the inner side of the end opposite to the mounting portion 102b_1. The protrusion 102d_1 is as follows... Figure 7As shown, it is preferable to provide the protrusion 102d_1 on the entire inner periphery of the reflector part 102_1. The protrusion 102d_1 does not contact other reflector parts, but is provided to suppress heat radiation from entering between the reflector part 102_1 and the reflector part 101_2. Therefore, by providing the protrusion 102d_1 on the entire inner periphery of the reflector part 102_1, the entry of heat radiation can be effectively suppressed. As a result, the heat shielding effect of the first reflector unit 100a is improved.
[0103] like Figure 8 and Figure 9 As shown, the reflector part 102_1 has a locking portion 102a_1 protruding radially (D2) on its outer side. The locking portion 102a_1 can also be provided on the entire outer periphery of the reflector part 101_2. In this case, simply... Figure 3 The mounting portion 101b_1 of the reflector part 101_1 and the mounting portion 102b_1 can be arranged approximately equally in a localized manner. Therefore, even if the engaging portion 102a_1 is provided on the entire outer periphery of the reflector part 101_2, the contact area with the mounting portion 101b_1 can be reduced.
[0104] like Figure 8 and Figure 9 As shown, the reflector part 102_1 has a protrusion 102c_1 that protrudes radially (D2) on the outer side of the end opposite to the engaging part 102a_1. The protrusion 102c_1 is preferably as follows: Figure 7 As shown, the protrusion 102c_1 is provided on the entire outer periphery of the reflector part 102_1. The protrusion 102c_1 does not contact other reflector parts, but is provided to suppress heat radiation from entering between the reflector part 102_1 and the reflector part 101_1. Therefore, by providing the protrusion 102c_1 on the entire outer periphery of the reflector part 102_1, the entry of heat radiation can be effectively suppressed. As a result, the heat shielding effect of the first reflector unit 100a is improved.
[0105] Furthermore, in this embodiment, reflector parts 101_1, 102_1 and 101-2, 102-2, 104 can also be continuous cylinders. However, they can also be as follows: Figure 4 , Figure 7 As shown, a portion of the reflector has a slit (cut-in section) SL. The slit SL absorbs the thermal expansion or contraction of the reflector components, thus suppressing the thermal stress acting on the reflector components themselves.
[0106] Furthermore, in the above embodiment, the mounting portion 101b_1 of the reflector part 101_1 is partially arranged in the circumferential direction, and the engaging portion 102a_1 of the reflector part 102_1 that contacts the mounting portion 101b_1 is provided all over the circumference. However, it is also possible to do the opposite, with the mounting portion 101b_1 provided all over the circumference and the engaging portion 102a_1 provided only partially in the circumferential direction.
[0107] Alternatively, both the mounting portion 101b_1 and the engaging portion 102a_1 can be partially disposed in the circumferential direction. In this case, it is necessary to configure them so that the mounting portion 101b_1 and the engaging portion 102a_1 are in approximately equal contact in the circumferential direction.
[0108] That is, the engaging portions 101a_1, 101a_2 or the mounting portions 101b_1, 101b_2 need only be arranged at least three times, approximately equally, in the circumferential direction of the reflector parts 101_1, 101_2. Similarly, the engaging portions 102a_1, 102a_2 or the mounting portions 102b_1, 102b_2 need only be arranged at least three times, approximately equally, in the circumferential direction of the reflector parts 102_1, 102_2. This reduces the contact area between adjacent reflector parts and decreases the contact area with the mounting portion 101b_1.
[0109] The engaging portions 103a and 104a of the cover 103 and reflector component 104 can also be arranged approximately equally at at least three locations in the circumferential direction. This reduces the contact area between the cover 103 and the top plate 110, and the contact area between the reflector component 104 and the reflector component 102_2. This further improves the heat-blocking effect of the first reflector unit 100a. By arranging the engaging portions 103a approximately equally, the cover 103 can stably support the other reflector components 101_1, 102_1, 101_2, 102_2, and 104. At this time, the phases of each engaging portion 101a_1, 101a_2, 103a, 104a, and mounting portions 101b_1 and 101b_2 can be different, as long as they can support the reflectors on the inner circumferential side. With this structure, the heat conduction path of the top plate 110 can be increased, protecting the top plate 110 from heat damage.
[0110] In addition, such as Figure 3As shown, the first reflector unit 100a may also include heat insulation members 101e_1, 102e_1, 101e_2, and 102e_2 provided at the contact portions between adjacent reflector components. For example, heat insulation member 101e_1 is provided between the mounting portion 101b_1 and the engaging portion 102a_1. Heat insulation member 102e_1 is provided between the mounting portion 102b_1 and the engaging portion 101a_2. Heat insulation member 101e_2 is provided between the mounting portion 101b_2 and the engaging portion 102a_2. Heat insulation member 102e_2 is provided between the mounting portion 102b_2 and the engaging portion 104a.
[0111] In this way, the heat insulation components 101e_1, 102e_1, 101e_2, and 102e_2 can further suppress heat conduction at the contact points between adjacent reflector components. As a result, the heat-blocking effect of the first reflector unit 100a can be further improved.
[0112] (Second Implementation)
[0113] Figure 10 This is a cross-sectional view showing a structural example of the first reflector unit 100a according to the second embodiment. In the second embodiment, reflector parts 201_1 to 201_4 have approximately the same cross-sectional shape. The engaging portions 201a_1 to 201a_4 and 104a of reflector parts 201_1 to 201_4 are at approximately the same height, and the mounting portions 201b_1 to 201b_4 are also at approximately the same height. Other structures in the second embodiment may be the same as the corresponding structures in the first embodiment.
[0114] The first reflector unit 100a includes reflector parts 201_1 to 201_4, 104, and cover 103.
[0115] Reflector parts 201_1 to 201_4 each have a structure where the engaging portion 102a_1 is omitted from the reflector part 102_1 of the first embodiment. For example, in a radial (D2) cross-section, reflector parts 201_1 to 201_4 each have mounting portions 201b_1 to 201b_4 extending radially (D2) inward at their upper ends, and engaging portions 201a_1 to 201a_4 extending radially (D2) outward. Engaging portions 201a_1 to 201a_4 engage with cover 103 and mounting portions 201b_1 to 201b_3, respectively. Mounting portions 201b_1 to 201b_4 extend radially (D2) inward, mounting engaging portions 201a_2 to 201a_4 and 104a, respectively, and supporting reflector parts 201_2 to 201_3 and 104. The engaging parts 201a_1 to 201a_4, 104 and the mounting parts 201b_1 to 201b_4 have the same functions and effects as the engaging parts 101a_2 and the mounting parts 102b_1 in the first embodiment.
[0116] Reflector parts 201_1 to 201_4 each have a protrusion 201c_1 to 201c_4 extending radially (D2) inward at their lower ends. The protrusions 201c_1 to 201c_4 prevent heat radiation from below from entering between reflector parts 201_1 to 201_4 and 104, and prevent reflector parts 201_1 to 201_4 and 104 from being directly heated by heat radiation. The protrusions 201c_1 to 201c_4 also prevent process gases from below from entering between reflector parts 201_1 to 201_4 and 104, and prevent deposits from adhering to reflector parts 201_1 to 201_4 and 104.
[0117] Although the diameters of reflector parts 201_1 to 201_4 differ, they are... Figure 10 The cross-sections shown have approximately equal shapes. Therefore, in the first reflector unit 100a of the second embodiment, a plurality of reflector parts 201_1 to 201_4 are arranged in a layered manner in the radial direction. The number of reflector parts 201_1 to 201_4 arranged between the cover 103 and the reflector parts 104 is not particularly limited; it can be either less than four or more than four.
[0118] In this embodiment, the engaging portion 201a_1 of reflector component 201_1 contacts the cover 103; the engaging portion 201a_2 of reflector component 201_2 contacts the mounting portion 201b_1 of reflector component 201_1; the mounting portion 201b_2 of reflector component 201_2 contacts the engaging portion 201a_3 of reflector component 201_3; the mounting portion 201b_3 of reflector component 201_3 contacts the engaging portion 201a_4 of reflector component 201_4; and the mounting portion 201b_4 of reflector component 201_4 contacts the engaging portion 104a of reflector component 104. The contact positions of the engaging portions 201a_1 to 201a_4 and 104a with the mounting portions 201b_1 to 201b_4 are at approximately the same height. However, in the remaining parts, the cover 103, reflector parts 201_1 to 201_4, and 104 do not contact each other. Therefore, although the contact surfaces of adjacent reflector parts are not separated as in the first embodiment, the area of their contact surfaces is limited. The heat conduction path of the first reflector unit 100a is as follows: Figure 10 The dashed arrow A2 indicates that it is shorter. However, because the contact area between adjacent reflector parts is small, the heat from reflector part 104 is not easily conducted to the top plate 110. As a result, the first reflector unit 100a effectively blocks heat radiation from the generally horizontal direction, protecting the top plate 110 from heat damage.
[0119] In addition, the structures of each reflector component 201_1 to 201_4 are as follows: Figures 7-9 The engaging part 102a_1 is omitted in the reflector part 102_1. Therefore, the structure of each reflector part 201_1 to 201_4 is obtained by referring to Figures 7-9 Since it is easy to understand, its diagram is omitted.
[0120] In addition, such as Figure 10 As shown, the first reflector unit 100a may also include heat insulation members 201e_1 to 201e_4 provided on the contact portion between adjacent reflector components. For example, heat insulation members 201e_1 to 201e_4 are respectively provided between the mounting portions 201b_1 to 201b_4 and the engaging portions 201a_1 to 201a_4. In this way, the heat insulation members 201e_1 to 201e_4 can further suppress heat conduction at the contact portion between adjacent reflector components. As a result, the heat shielding effect of the first reflector unit 100a can be further improved.
[0121] (Modified Example)
[0122] Figure 11This is a cross-sectional view showing a structural example of the first reflector unit 100a, a modified example of the first embodiment. In the modified example, it also includes heat insulation members 300_1 to 300_4 disposed in the space between adjacent reflector parts. The heat insulation members 300_1 to 300_4 are each generally cylindrical. In addition, these heat insulation members 300_1 to 300_4 may also have slits, or may be divided into multiple parts.
[0123] For example, heat insulation component 300_1 is disposed in the space between reflector component 101_1 and reflector component 102_1. Heat insulation component 300_2 is disposed in the space between reflector component 102_1 and reflector component 101_2. Heat insulation component 300_3 is disposed in the space between reflector component 102_1 and reflector component 101_2. Heat insulation component 300_4 is disposed in the space between reflector component 101_2 and reflector component 102_2.
[0124] In the heat insulation components 300_1 to 300_4, materials with low thermal conductivity, such as those used after graphite coating of carbon fiber molded heat insulation components, are employed. As a result, the first reflector unit 100a can effectively block heat radiation from the horizontal direction, and more effectively protect the top plate 110 from heat damage.
[0125] The other structures in this modification can be the same as those in the corresponding structure of the first embodiment. Therefore, this modification can also achieve the same effects as the first embodiment.
[0126] The heat insulation components 300_1 to 300_4 in this modified example can also be applied to the second embodiment.
[0127] (Third Implementation)
[0128] Figure 12 This is a cross-sectional view showing a structural example of the first reflector unit 100a according to the third embodiment. In the third embodiment, the support method of the first reflector unit 100a differs from that in the embodiments described above. The first reflector unit 100a is supported by first and second support members 400 and 410, which are fixed by the connecting member 501, via a mounting portion 108 mounted on the gas supply unit 12. The mounting portion 108 is a generally annular component along the inner edge of the top plate 110. In the mounting portion 108, for example, in addition to carbon, Hastelloy, or quartz, it is preferably formed of a material with heat resistance of 700°C or higher, such as SiC (silicon carbide), TaC (tantalum carbide), W (tungsten), Mo (molybdenum), or a material on which a SiC film or TaC film has been formed on carbon.
[0129] The first reflector unit 100a is located below the mounting portion 108. Thus, the mounting portion 108 protects the gas supply portion 12 from heat damage emitted from the first reflector unit 100a. Furthermore, it prevents deposits from adhering to the inner wall of the chamber 13, maintaining the reflectivity of the inner wall. Alternatively, the mounting portion 108 can be omitted, and the gas supply portion 12 can be directly fixed to the support members 400, 410, and the gas supply portion 12.
[0130] Figure 13 This is a cross-sectional view showing a more detailed structural example of the first reflector unit 100a. The first reflector unit 100a includes reflector parts 101_1 to 107, a first support member 400, and a second support member 410.
[0131] The first and second support members 400 and 410 are joined together by the connecting member 500. Furthermore, the first support member 400 is connected to the upper part of the gas supply section 12 via the connecting members 510 and 520 through the mounting portion 108. The connecting members 500, 510, and 520 are, for example, bolts or other connecting components.
[0132] The first support member 400 is fixed to the upper part of the chamber 13. The second support member 410 is fixed to the first support member 400 and supported by the first support member 400. Furthermore, the second support member 410 mounts and supports the cover 105 and the reflector part 106 on its upper surface. The cover 105 and the reflector part 106 support other reflector parts 101_1, 102_1, 101_2, and 107. Thus, the first and second support members 400 and 410 can support the entire first reflector unit 100a and are mounted relative to the chamber 13 and the top plate 110. In addition, in the third embodiment, since the reflector unit is not mounted on the protrusion 110a, the protrusion 110a can also be omitted.
[0133] The first reflector unit 100a, the first and second support members 400 and 410, and the connecting members 510 and 520 are preferably made of materials with heat resistance of 700°C or higher, such as SiC (silicon carbide), TaC (tantalum carbide), W (tungsten), Mo (molybdenum), or materials on which a SiC film or a TaC film has been formed on carbon.
[0134] Figures 14-16 This is a diagram showing a structural example of the first support member 400. Figure 14 This is a cross-sectional view taken from the side of the first support member 400. Figure 15 This is a cross-sectional view taken from the front of the first support member 400. Figure 16 This is a top view of the first support member 400. Additionally, Figure 14 Indicates along Figure 15 and Figure 16The cross section of line A-A.
[0135] The first support member 400 includes a main body 401 and protrusions 402 and 403. The main body 401 is a plate-shaped member extending in the D1 direction. The protrusion 402 is provided at one end of the main body (plate-shaped member) 401 in a substantially orthogonal direction (+D2 direction). The protrusion 403 is provided at the other end of the main body (plate-shaped member) 401 in a substantially orthogonal direction (-D2 direction) opposite to the protrusion 402. The main body 401 and the protrusions 402 and 403 are preferably formed integrally.
[0136] The protrusion 402 has an opening 404 through which the connecting member 500 passes. The protrusion 403 has an opening 405 through which the connecting member 510 passes. The openings 404 and 405 may be, for example, nuts that correspond to bolts on the connecting members 500 and 510 and are tightened onto them. The protrusion 403 also has a notch 406. By inserting a portion of the connecting member 520 into the notch 406, the connecting members 510 and 520 fix the orientation of the first support member 400 relative to the top plate 110.
[0137] Figure 17 and Figure 18 This is a diagram showing a structural example of the second support member 410. Figure 17 This is a cross-sectional view taken from the side of the first support member 400. Figure 18 This is a top view of the first support member 400. Additionally, Figure 17 Indicates along Figure 18 The cross section of line A-A.
[0138] The second support member 410 is a generally square plate-shaped member. An opening 412 is provided on the second support member 410 to allow the connecting member 500 to pass through. The opening 412 is, for example, oblong or generally elliptical in shape, with its minor diameter formed slightly larger than the threaded portion so that the threaded portion of the connecting member 500 can pass through.
[0139] Figure 19 This is a perspective view showing a structural example of the first and second support members 400 and 410 that are joined together. The opening 412 of the second support member 410 communicates with the opening 404 of the first support member 400, and the connecting member 500 passes through it. By tightening the connecting member 500 relative to the opening 404 of the first support member 400, the second support member 410 is fastened and fixed between the connecting member 500 and the first support member 400. Because the opening 412 of the second support member 410 has an elongated oval shape or a generally elliptical shape, the relative position of the second support member 410 relative to the first support member 400 can be changed in the D2 direction.
[0140] The first and second support components 400 and 410 having such a structure are as follows: Figure 8 As shown, they are mounted on the upper surface of the inner wall of the chamber 13. The number of the first and second support members 400 and 410 is preferably large enough to adequately support the first reflector unit 100a, but on the other hand, it is preferably small enough to suppress heat conduction from the first reflector unit 100a to the top plate 110. Therefore, the number of the first and second support members 400 and 410 is set to be sufficient to adequately support the first reflector unit 100a and to suppress heat conduction from the first reflector unit 100a to the top plate 110 as much as possible. For example, the number of the first and second support members 400 and 410 is at least three. Of course, the number of the first and second support members 400 and 410 can also be four or more.
[0141] Furthermore, the mounting positions of the first and second support members 400 and 410 are preferably arranged approximately equally on the inner periphery of the top plate 110 in order to support the first reflector unit 100a substantially equally and to distribute the heat conduction from the first reflector unit 100a to the top plate 110 substantially equally.
[0142] Furthermore, in the third embodiment, by providing the cover 105, the cover 103 of the top plate 110 can be omitted. The first support member 400 does not contact the protrusion 110a and the top plate 110. As a result, the first support member 400 can further suppress heat conduction from the first reflector unit 100a to the top plate 110.
[0143] Refer again Figure 8 The structure of the first reflector unit 100a will be described in more detail below. The first reflector unit 100a includes reflector parts 101_1 to 107. The structures of reflector parts 101_1, 102_1, and 101_2 can be the same as those in the first embodiment. Therefore, the description of reflector parts 101_1, 102_1, and 101_2 is omitted.
[0144] The cover 105 is generally cylindrical in shape so as to cover the inner peripheral portion C of the top plate 110. That is, the cover 105 is arranged such that its sidewalls cover the inner peripheral portion C of the top plate 110 in both the vertical direction (D1) and the circumferential direction (D3).
[0145] The cover 105 extends approximately in a straight line in the D1 direction in the radial (D2) section and is supported from the bottom surface by the second support member 410. With the first and second support members 400, 410 installed at 3 locations on the inner periphery of the top plate 110, the cover 105 is supported at 3 locations by the 3 first and second support members 400, 410.
[0146] The cover 105 can prevent the support components 400, 410 and the top plate 110 from being directly heated by thermal radiation from the reflector parts 106, 101_1, 102_1, 101_2 and 107. In addition, the cover 105 can prevent process gases from contacting the support components 400, 410 and the top plate 110 and causing deposits to adhere.
[0147] The reflector part 106 is generally cylindrical in shape, covering the inner peripheral portion C of the top plate 110. The reflector part 106 is arranged such that its sidewalls cover the inner surface of the cover 105 in the vertical direction (D1) and the circumferential direction (D3).
[0148] In a radial (D2) cross-section, the reflector part 106 has an inwardly protruding mounting portion 106b at the top and an outwardly protruding engaging portion 106a at the bottom. The engaging portion 106a engages with and is supported by the second support member 410. The mounting portion 106b protrudes inwardly to mount the reflector part 101_1. Thus, the reflector part 106 has a mounting portion 106b at the top and an engaging portion 106a at the bottom. Consequently, the reflector part 106 is supported by its own weight and engages with the second support member 410, and is able to mount and support the reflector part 101_1.
[0149] The portion of the reflector part 106 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of the cover 105, so that it can enter the inside of the cover 105. On the other hand, the outer circle of the engaging portion 106a is positioned further outward than the inner end of the second support member 410, so that the engaging portion 106a engages with the second support member 410. With this configuration, the reflector part 106 is mounted in a state that covers the inner circumferential surface of the cover 105.
[0150] The reflector part 106 also has a protrusion 106c protruding radially (D2) inward at its lower end. The protrusion 106c prevents heat radiation from below from entering between the reflector part 106 and the reflector part 101_1, and prevents the reflector parts 106 and 101_1 from being directly heated by heat radiation. Furthermore, the protrusion 106c prevents process gas from below from entering between the reflector parts 106 and 101_1, and prevents deposits from adhering to the reflector parts 106 and 101_1. Thus, the reflectivity of the reflector parts 106 and 101_1 can be maintained.
[0151] Furthermore, the engaging portion 106a and the mounting portion 106b also have the same function as the protruding portion 106c. That is, the engaging portion 106a prevents heat radiation from below from entering between the cover 105 and the reflector part 106. The mounting portion 106b prevents heat radiation from above from entering between the reflector part 106 and the reflector part 101_1. Moreover, the engaging portion 106a prevents process gas from below from entering between the cover 105 and the reflector part 106. The mounting portion 106b prevents process gas from above from entering between the reflector part 106 and the reflector part 101_1.
[0152] The structure and function of reflector parts 101_1, 102_1, and 101_2 are the same as those in the first embodiment, so their description is omitted here.
[0153] The reflector part 107 has a generally cylindrical shape on the inner peripheral portion C of the top plate 110, such that it covers the inner wall of the reflector part 101_2. The reflector part 107 may be, for example, a material on which a SiC film or a TaC film has been formed on a carbon material. However, since the reflector part 107 is the innermost reflector part of the first reflector unit 100a, it is preferably made of a material on which a SiC film is formed on a carbon material.
[0154] The reflector part 107 has a engaging portion 107a protruding radially (D2) outward at its lower end. The engaging portion 107a of the reflector part 107 engages with and is supported by the mounting portion 101b_2 of the reflector part 101_2 adjacent to it on its outer side. Thus, the reflector part 107 has the engaging portion 107a at the lower end of its main body extending in the vertical direction (D1). As a result, the reflector part 107 can be engaged with and supported by the mounting portion 101b_2 of the reflector part 101_2 by its own weight.
[0155] The portion of reflector part 107 extending in the vertical direction (D1) has an outer diameter slightly smaller than the inner diameter of reflector part 101_2, so that it can enter the inner side of reflector part 101_2. On the other hand, the diameter of the outer circle of the engaging portion 107a is slightly larger than the diameter of the inner circle of the mounting portion 101b_2 of reflector part 101_2, so that the engaging portion 107a is engaged with the mounting portion 101b_2 of reflector part 101_2. With this configuration, reflector part 107 can be mounted in a state that covers the inner peripheral surface of reflector part 101_2.
[0156] The reflector part 107 also has a protrusion 107b at its upper end that protrudes radially (D2) outward. The protrusion 107b prevents heat radiation from above from entering between the reflector part 107 and the reflector part 101_2, and prevents the reflector parts 107 and 101_2 from being directly heated by heat radiation. Furthermore, the protrusion 107b prevents process gas from above from entering between the reflector parts 107 and 101_2, and prevents deposits from adhering to the reflector parts 107 and 101_2. Thus, the reflectivity of the reflector parts 107 and 101_2 can be maintained.
[0157] The engaging portion 107a has the same function as the protrusion 107b, suppressing heat radiation from below from entering between the reflector part 101_2 and the reflector part 107. Furthermore, the engaging portion 107a suppresses process gas from below from entering between the reflector part 101_2 and the reflector part 107. Thus, the engaging portion 107a achieves the same effect as the protrusion 107b.
[0158] Furthermore, the number of groups of reflector parts 101_1, 102_1, and 101_2 located between reflector part 106 and reflector part 107 is not particularly limited, and can be two or more.
[0159] The other structures in the third embodiment can be the same as those in the corresponding structures of the first embodiment. Therefore, the third embodiment can also achieve the same effects as the first embodiment. Furthermore, the support method of the third embodiment can also be applied to conventional stacked reflectors that are stacked in the Z direction.
[0160] (Modified Example)
[0161] Figure 20 This is a sectional view taken from the side, showing another structural example of the first support member 400 that is joined together. Figure 21 This is a top view showing another structural example of the first support member 400 that is being joined. Additionally, the support member 410 can be connected with... Figure 10 The structure shown is the same.
[0162] In this modified example, the protrusion 403 has a plurality of openings 405a, 405b, and 407. The openings 405a and 405b can be, for example, nuts that correspond to the bolts of the connecting members 510a and 510b and are tightened thereon. The support members 400 and 410 are mounted to the upper surface of the inner wall of the chamber 13 via the connecting members 510a and 510b through the plurality of openings 405a and 405b. This allows the support members 400 and 410 to be more securely fixed relative to the chamber 13.
[0163] By fitting the connecting component 520 into the opening 407, the connecting components 510a, 510b, and 520 fix the orientation of the support component 400 relative to the top plate 110.
[0164] The other structures of the first support member 400 in this modification can be the same as the corresponding structures of the first support member 400 in the third embodiment. Therefore, this modification can achieve the same effects as the third embodiment.
[0165] Several embodiments of the present invention have been described, but these embodiments are merely illustrative and not intended to limit the scope of the invention. These embodiments can be implemented in a wide variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included within the scope or spirit of the invention, and are included within the scope of the invention as described in the claims and its equivalents.
[0166] Explanation of reference numerals in the attached figures
[0167] 10 Film-forming apparatus; 12 Gas supply unit; 13 Chamber, C Connection area; 12 Gas supply unit, N Nozzle; 90 Lower heater; 95 Upper heater; 100 Reflector unit; 100a First reflector unit; 100b Second reflector unit; 110 Top plate; 110a Protrusion; 101_1, 101_2, 102_1, 102_2, 104, 106, 107, 210_1~201_4 Reflector parts; 105 cover; 101a_1, 101a_2, 102a_1, 102a_2 engaging parts; 101b_1, 101b_2, 102b_1, 102b_2 mounting parts; 103, 105 covers; 400, 410 support parts; 401 main body; 402, 403 protrusions; 404, 405, 412 openings; 406 notch; 500, 510, 520 connecting parts.
Claims
1. A reflector unit, characterized in that, have: The cylindrical first reflector part has a first engaging part on its outer periphery for being supported in the film-forming chamber, and a first mounting part on its inner periphery. A cylindrical second reflector component is disposed inside the first reflector component. It has a second engaging portion on its outer periphery for engaging with the first mounting portion and being supported by the first reflector component, and a second mounting portion on its inner periphery. The cylindrical second reflector component is disposed to cover the inner periphery of the cylindrical first reflector component. A cylindrical third reflector component is disposed inside the second reflector component, and has a third engaging portion on its outer periphery for engaging with the second mounting portion and being supported by the second reflector component. The first reflector component, the second reflector component, and the third reflector component are arranged in a block-like pattern in the radial direction. The vertical height position of the contact surface between the first mounting part and the second engaging part is different from the vertical height position of the contact surface between the second mounting part and the third engaging part.
2. The reflector unit as claimed in claim 1, characterized in that, At least one of the vertical position and horizontal phase of the first engaging part is different from that of the second engaging part.
3. The reflector unit as claimed in claim 1, characterized in that, At least one of the aforementioned first engaging portion, the aforementioned first mounting portion, and the aforementioned second engaging portion is partially and equally disposed at at least three locations in the circumferential direction.
4. The reflector unit as claimed in claim 1, characterized in that, It also includes a first heat insulation part disposed between the first mounting part and the second engaging part.
5. The reflector unit as claimed in claim 1, characterized in that, In the first reflector component and the second reflector component described above, a component with a SiC film or a TaC film formed on carbon is used.
6. The reflector unit as claimed in claim 1, characterized in that, It also has a space disposed between the first reflector part and the second reflector part and has a cylindrical second heat insulation part.
7. A film-forming apparatus, characterized in that, have: The chamber has an open top plate at the top to house the substrate for film formation processing. A gas supply unit is provided above the chamber and supplies raw material gas to the substrate through the opening in the top plate. A heater is used to heat the aforementioned substrate; and The reflector unit of claim 1 is disposed at the opening in the top plate.
8. The film-forming apparatus as described in claim 7, characterized in that, The aforementioned reflector unit is engaged with and fixed to the aforementioned top plate.
9. The film-forming apparatus as described in claim 7, characterized in that, The aforementioned reflector unit is fixed to the mounting portion installed on the aforementioned gas supply unit.
Citation Information
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