A device and method for correcting the material mountain of a TFT liquid crystal glass substrate kiln

Abstract

The present invention provides a device and method for correcting a pile of materials in a TFT liquid crystal glass substrate kiln. A feeding installation port is provided at the bottom of the front wall of the kiln, and a burner is connected to the center of the front wall of the kiln through an adjustment mechanism. A technician in the field observes the external structure of the pile of materials through an industrial television to determine whether it conforms to a preset pile structure. If it does not conform to the preset pile structure, the burner is aligned with the pile structure that does not conform to the preset structure through the adjustment mechanism to heat it until the pile of materials heats up and melts, thereby completing the correction. This replaces the method of shutting down the machine and manually discarding the pile of materials that do not conform to the preset structure in the prior art, solves the technical problems of shutdown and production stoppage and low efficiency caused by shutdown, greatly improves the consistency and stability of the pile of materials, and improves the production line process and quality.

Description

Technical Field

[0001] The invention belongs to the technical field of TFT glass substrate manufacturing, and specifically relates to a device and method for correcting a kiln material mountain of a TFT liquid crystal glass substrate. Background Art

[0002] In the production process of TFT liquid crystal glass substrates, the kiln is one of the most critical equipment. The kiln is responsible for melting the prepared glass batch materials, and through melting and homogenization in the kiln, it provides qualified glass liquid for the next process.

[0003] During the production process of TFT liquid crystal glass substrates, the kiln uses electrode bricks installed in the gaps between the pool wall bricks on both sides to directly contact the glass liquid for heating, and burners are installed on the breast walls on both sides of the kiln to heat the space above the liquid level of the kiln. Electric heating is the main method, supplemented by gas heating, to meet the process requirements of the kiln for melting qualified quality glass.

[0004] During the manufacturing process of TFT liquid crystal glass substrates, two spiral feeders are installed horizontally at the front of the kiln to continuously and stably feed glass batch materials into the kiln. Due to the continuous feeding of batch materials in the feeding area, the temperature of the front area of ​​the kiln will be reduced. Due to the influence of temperature and continuous feeding, a mountain of materials will be piled up in the front area of ​​the kiln, and finally two independent mountain of materials will be formed. Under normal circumstances, the mountain of materials on one side will tilt toward the pool wall bricks on the corresponding side, and the two mountain of materials will be distributed in an eight-shaped shape. Due to the high temperature at the rear of the kiln, the batch materials begin to melt. The height of the mountain of materials gradually decreases from the front wall side to the rear area until it is flush with the height of the glass liquid in the kiln. The front area of ​​the kiln is the area where the glass batch materials change from powder to liquid. Due to the generation of glass liquid, hot and cold convection will be formed in the front area of ​​the kiln. Due to the changes in feeding and melting state, the size and trend of the mountain of materials on both sides will be different. The difference between the mountain of materials on both sides will cause changes in the convection of the glass liquid in the kiln. The instability of the convection of the glass liquid will cause the poorly melted glass liquid to flow into the next process, thereby producing defects on the surface of the finished glass plate and causing a decrease in yield. Summary of the invention

[0005] In view of the problems existing in the prior art, the present invention provides a device and method for correcting the material mountain of a TFT liquid crystal glass substrate kiln, which can make the material mountain different and improve the yield rate of the product glass plate surface.

[0006] The present invention is achieved through the following technical solutions:

[0007] A TFT liquid crystal glass substrate kiln charge mountain correction device comprises a kiln front wall; a charging installation port is arranged at the bottom of the kiln front wall, and a burner is connected to the center of the kiln front wall through an adjustment mechanism.

[0008] Furthermore, the front wall of the kiln furnace is provided with a conical concave structure, and a burner is provided on the top of the conical concave structure.

[0009] Furthermore, the burner is a full oxygen natural gas burner.

[0010] Furthermore, the adjustment mechanism adopts a gantry module structure;

[0011] The gantry module structure is arranged on one side of the front wall of the kiln furnace, and the tail of the combustion gun is ball-jointed, and the gun body of the combustion gun penetrates the front wall of the kiln furnace.

[0012] Further, the gantry module structure includes a Y-axis motion structure and an X-axis motion structure;

[0013] The Y-axis motion structure is divided into two groups and arranged in parallel, each of which includes a Y-axis motion track, a Y-axis stepper motor and a Y-axis slider. The Y-axis motion track is rotatably sleeved with a Y-axis lead screw, the Y-axis stepper motor driving end is transmission-connected to the Y-axis lead screw, and the Y-axis slider is threadedly connected to the Y-axis lead screw;

[0014] The X-axis motion structure includes an X-axis motion track, an X-axis stepper motor and an X-axis slider. The X-axis motion track is rotatably sleeved with an X-axis lead screw. The driving end of the X-axis stepper motor is transmission-connected to the X-axis lead screw. The X-axis slider is threadedly connected to the X-axis lead screw.

[0015] A Y-axis slider is fixedly connected to both ends of the X-axis motion track.

[0016] Furthermore, the Y-axis motion structure is fixedly connected to the gantry module structure arranged on one side of the front wall of the kiln furnace, and the X-axis slider is connected to the tail of the burner through a ball hinge.

[0017] Furthermore, a high temperature resistant metal ring is provided at the contact point between the front wall of the kiln furnace and the body of the combustion gun.

[0018] Furthermore, the Y-axis motion structure and the X-axis motion structure are made of refractory materials.

[0019] Furthermore, there are two feeding installation ports, which are respectively arranged on both sides of the bottom of the front wall of the kiln furnace.

[0020] A method for correcting a TFT liquid crystal glass substrate kiln material mountain, comprising the following steps:

[0021] S1: Observe the appearance and structure of the material pile through industrial television to determine whether it conforms to the preset material pile structure;

[0022] S2: If the material pile structure does not conform to the preset structure, the burner is aligned with the material pile structure that does not conform to the preset structure through the adjustment mechanism to heat it until the material pile heats up and melts, and the correction is completed.

[0023] Compared with the prior art, the present invention has the following beneficial technical effects:

[0024] The present invention provides a device and method for correcting a pile of materials in a TFT liquid crystal glass substrate kiln. A feeding installation port is provided at the bottom of the front wall of the kiln, and a burner is connected to the center of the front wall of the kiln through an adjustment mechanism. A technician in the field observes the external structure of the pile of materials through an industrial television to determine whether it conforms to a preset pile structure. If it does not conform to the preset pile structure, the burner is aligned with the pile structure that does not conform to the preset structure through the adjustment mechanism to heat it until the pile of materials heats up and melts, thereby completing the correction. This replaces the method of shutting down the machine and manually discarding the pile of materials that do not conform to the preset structure in the prior art, solves the technical problems of shutdown and production stoppage and low efficiency caused by shutdown, greatly improves the consistency and stability of the pile of materials, and improves the production line process and quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a side view of a device for correcting a pile of materials in a kiln for a TFT liquid crystal glass substrate according to the present invention;

[0026] Figure 2 This is a front view of a TFT liquid crystal glass substrate kiln material mountain correction device of the present invention;

[0027] Figure 3 It is a schematic diagram of the adjustment mechanism of the present invention.

[0028] In the figure: 1. kiln front wall; 2. combustion gun; 3. Y-axis motion structure; 30. Y-axis motion track; 31. Y-axis stepper motor; 32. Y-axis slider; 4. feeding installation port; 5. X-axis motion structure; 50. X-axis motion track; 51. X-axis stepper motor; 52. X-axis slider. DETAILED DESCRIPTION

[0029] The present invention is further described in detail below in conjunction with specific embodiments, which are intended to explain the present invention rather than to limit it.

[0030] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0031] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units that are clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0032] The present invention provides a device for correcting the material mountain of a TFT liquid crystal glass substrate kiln. Figure 1 and Figure 2 As shown, it includes a furnace front wall 1; a charging installation port 4 is provided at the bottom of the furnace front wall 1, and a burner 2 is connected to the center of the furnace front wall 1 through an adjusting mechanism.

[0033] Preferably, the kiln front wall 1 is provided with a conical concave structure, and a burner 2 is provided on the top of the conical concave structure, so that technicians in this field can control the movement of the burner 2 through an adjustment mechanism without causing structural interference.

[0034] Preferably, the burner 2 adopts a full-oxygen natural gas burner, which can make the glass melting quality high. Compared with the traditional air-assisted combustion technology, it needs to exchange heat between flue gas and air through timed fire changing to recover part of the heat. During the fire changing period, the kiln temperature and kiln pressure will fluctuate, affecting the quality of the glass product.

[0035] Preferably, the adjustment mechanism adopts a gantry module structure; the gantry module structure is arranged on one side of the kiln front wall 1, and the tail of the combustion gun 2 is ball-hinged, and the gun body of the combustion gun 2 is arranged through the kiln front wall 1.

[0036] Further, such as Figure 3 As shown, the gantry module structure includes a Y-axis motion structure 3 and an X-axis motion structure 5; the Y-axis motion structure 3 is divided into two groups and arranged in parallel, each of which includes a Y-axis motion track 30, a Y-axis stepper motor 31 and a Y-axis slider 32, the Y-axis motion track 30 is rotatably sleeved with a Y-axis lead screw, the driving end of the Y-axis stepper motor 31 is transmission-connected to the Y-axis lead screw, and the Y-axis slider 32 is threadedly connected to the Y-axis lead screw;

[0037] The X-axis motion structure 5 includes an X-axis motion track 50, an X-axis stepper motor 51 and an X-axis slider 52. The X-axis motion track 50 is rotatably provided with an X-axis lead screw. The driving end of the X-axis stepper motor 51 is connected to the X-axis lead screw, and the X-axis slider 52 is threadedly connected to the X-axis lead screw. A Y-axis slider 32 is fixedly connected to each end of the X-axis motion track 50.

[0038] Furthermore, the Y-axis motion structure 3 is fixedly connected to the gantry module structure arranged on one side of the front wall 1 of the kiln furnace, and the X-axis slider 52 is connected to the tail of the burner 2 through a ball hinge.

[0039] Preferably, a high temperature resistant metal ring is provided at the contact point between the front wall 1 of the kiln furnace and the body of the burner 2, and the high temperature resistant metal ring is used as a fulcrum to support the swing of the burner 2, thereby increasing its service life.

[0040] Preferably, the Y-axis motion structure 3 and the X-axis motion structure 5 are made of refractory materials.

[0041] Preferably, there are two feeding installation ports 4, which are respectively arranged on both sides of the bottom of the kiln front wall 1; technical personnel in this field can compare the shapes of the feeding materials of the two seasoning installation ports 4 and make corrections according to the difference in the comparison results.

[0042] The present invention provides a method for correcting a TFT liquid crystal glass substrate kiln material mountain, comprising the following steps:

[0043] S1: Observe the appearance and structure of the material pile through industrial television to determine whether it conforms to the preset material pile structure;

[0044] S2: If the material pile structure does not conform to the preset structure, the burner 2 is adjusted to align with the material pile structure that does not conform to the preset structure and heat it until the material pile heats up and melts, and the correction is completed.

[0045] Specifically, the technical personnel in the field use the industrial television system to take a screenshot of the kiln material mountain every hour and the screenshot of the previous hour, and use computer-specific software to compare the images. When the degree of similarity in the comparison results is less than 85%, the control system will alarm to prompt the technical personnel in the field to confirm, and the technical personnel will manually compare the screenshots. When the technical personnel check the changes in the material mountain and need to intervene and correct them, according to the shape of the material mountain on the side that needs intervention, the angle and gas volume of the material mountain correction gun are started, and the corresponding material mountain correction is performed, and finally the material mountain on the side with abnormal changes is corrected to ensure the normal and stable shape of the material mountain.

[0046] Furthermore, those skilled in the art can control the tail of the burner gun 2 through the control program of the gantry module structure according to the position of the material mountain that needs to be heated, so that the muzzle of the burner gun 2 is aimed at the material mountain that needs to be heated. Specifically, when the Y-axis motion structure 3 is working, the Y-axis stepper motor 31 drives the Y-axis screw to rotate, and then the Y-axis slider 32 moves along the Y-axis screw, and then drives the X-axis motion track 50 to move along the Y-axis. The X-axis stepper motor 51 drives the X-axis screw to rotate, so that the X-axis slider 52 moves along the X-axis, thereby meeting the requirement that the muzzle of the burner gun 2 is aimed at the material mountain that needs to be heated. When the muzzle of the burner gun 2 is aimed at the material mountain that needs to be heated, the burner gun 2 is turned on to heat the material mountain until its external structure conforms to the normal form.

[0047] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A TFT liquid crystal glass substrate kiln material mountain correction device, characterized in that: The invention comprises a furnace front wall (1); a charging installation opening (4) is arranged at the bottom of the furnace front wall (1); a burner (2) is connected to the center of the furnace front wall (1) via an adjusting mechanism; a conical concave structure is arranged on the furnace front wall (1); a burner (2) is arranged on the top of the conical concave structure; there are two charging installation openings (4), which are arranged on both sides of the bottom of the furnace front wall (1); the adjusting mechanism adopts a gantry module structure, the gantry module structure is arranged on one side of the furnace front wall (1), and the tail of the burner (2) is ball-jointed, and the burner (2) is arranged with a gun body penetrating the furnace front wall (1).

2. According to claim 1, a TFT liquid crystal glass substrate kiln material mountain correction device is characterized in that: The burner (2) is a full oxygen natural gas burner.

3. According to claim 1, a TFT liquid crystal glass substrate kiln material mountain correction device is characterized in that: The gantry module structure comprises a Y-axis motion structure (3) and an X-axis motion structure (5); The Y-axis motion structure (3) is divided into two groups and arranged in parallel, each group comprising a Y-axis motion track (30), a Y-axis stepping motor (31) and a Y-axis slider (32); a Y-axis lead screw is rotatably sleeved on the Y-axis motion track (30); a driving end of the Y-axis stepping motor (31) is transmission-connected to the Y-axis lead screw; and the Y-axis slider (32) is threadedly connected to the Y-axis lead screw; The X-axis motion structure (5) comprises an X-axis motion track (50), an X-axis stepping motor (51) and an X-axis slider (52); an X-axis lead screw is rotatably sleeved on the X-axis motion track (50); a driving end of the X-axis stepping motor (51) is transmission-connected to the X-axis lead screw; and the X-axis slider (52) is threadedly connected to the X-axis lead screw; Two ends of the X-axis motion track (50) are respectively fixedly connected to a Y-axis slider (32).

4. According to claim 3, a TFT liquid crystal glass substrate kiln material mountain correction device is characterized in that: The Y-axis motion structure (3) is fixedly connected to the gantry module structure and is arranged on one side of the front wall (1) of the kiln furnace, and the X-axis slider (52) is connected to the tail of the burner (2) through a ball joint.

5. According to claim 3, a TFT liquid crystal glass substrate kiln material mountain correction device is characterized in that: A high temperature resistant metal ring is provided at the contact point between the front wall (1) of the kiln and the body of the combustion gun (2).

6. A TFT liquid crystal glass substrate kiln material mountain correction device according to claim 3, characterized in that: The Y-axis motion structure (3) and the X-axis motion structure (5) are made of refractory materials.

7. A method for correcting the material mountain of a TFT liquid crystal glass substrate kiln, characterized in that: A TFT liquid crystal glass substrate kiln material mountain correction device according to any one of claims 1 to 6 comprises the following steps: S1: Observe the appearance and structure of the material pile through industrial television to determine whether it conforms to the preset material pile structure; S2: If the material pile structure does not conform to the preset structure, the burner (2) is aligned with the material pile structure that does not conform to the preset structure through the adjustment mechanism to heat the material pile until the material pile is heated and melted, thus completing the correction.

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