Embroidery position correction method, device, system, apparatus and product

Abstract

The application discloses an embroidery position correction method, device, system, equipment and product. The method comprises the following steps: obtaining a first embroidery pattern of a first embroidery plate and an i-th embroidery pattern of an i-th embroidery plate, i is a positive integer greater than or equal to 2, wherein the i-th embroidery plate starts to be embroidered after moving an (i-1)th distance after the (i-1)th embroidery plate ends; determining a position offset according to position information of the first embroidery pattern of the first embroidery plate and position information of the i-th embroidery pattern of the i-th embroidery plate; and determining an i-th distance corresponding to the i-th embroidery plate according to a first distance and the position offset. The method can improve the accuracy of embroidery.

Description

TECHNICAL FIELD

[0001] The present disclosure relates generally to the sewing field, specifically to the computer embroidery field, and particularly to an embroidery position correction method, device and medium. BACKGROUND

[0002] In the prior art, an embroidery device can embroider beads (or gold pieces) on a pattern on a cloth surface, and the beads match the pattern to increase the three-dimensional effect of the pattern.

[0003] Specifically, a plurality of groups of patterns are present on the cloth, and the patterns in each group are the same. An embroidery frame of the embroidery device can fix the cloth, and the embroidery frame is inside a group of patterns, thereby completing an edition of embroidery. Then the embroidery frame can release the cloth first, and the embroidery frame moves along the arrangement direction of each group of patterns, and the embroidery frame fixes the cloth again, and the embroidery frame is inside another group of patterns, thereby completing another edition of embroidery. This is repeated until the embroidery of the last group of patterns is completed.

[0004] However, since the tightness of the cloth is different during each edition of embroidery, when the cloth is fixed in the embroidery frame and the beads are embroidered, the position of the beads may not match the position of the pattern, reducing the accuracy of the embroidery and seriously affecting the embroidery effect of the pattern. SUMMARY

[0005] Therefore, it is necessary to provide an embroidery position correction method, device, system, equipment and product to improve the accuracy of embroidery.

[0006] In a first aspect, an embroidery position correction method is provided, which comprises:

[0007] obtaining a first embroidery pattern of a first edition of embroidery and an i-th embroidery pattern of an i-th edition of embroidery, i being a positive integer greater than or equal to 2, wherein the i-1-th edition of embroidery is moved by an i-1-th distance after the end of the i-1-th edition of embroidery, and the i-th edition of embroidery starts to embroider;

[0008] determining a position offset according to the first embroidery pattern of the first edition of embroidery and the i-th embroidery pattern of the i-th edition of embroidery;

[0009] determining an i-th distance corresponding to the i-th edition of embroidery according to the first distance and the position offset.

[0010] In a second aspect, an embroidery position correction device is provided, which comprises:

[0011] an obtaining unit configured to obtain a first embroidery pattern of a first edition of embroidery and an i-th embroidery pattern of an i-th edition of embroidery, wherein the i-1-th edition of embroidery is moved by an i-1-th distance after the end of the i-1-th edition of embroidery, and the i-th edition of embroidery starts to embroider;

[0012] The offset determination unit is used to determine the position offset based on the first embroidery pattern of the first embroidery plate and the i-th embroidery pattern of the i-th embroidery plate;

[0013] The distance determination unit is used to determine the i-th distance corresponding to the i-th embroidery pattern based on the first distance and the position offset.

[0014] Thirdly, an embroidery system is provided, which includes: an embroidery pattern conveying device and an embroidery device;

[0015] An embroidery conveying device for feeding an embroidery plate into an embroidery device, and the steps of performing the method of the first aspect and any possible implementation thereof.

[0016] An embroidery device for receiving an embroidery pattern and performing embroidery operations on the pattern.

[0017] Fourthly, a computer device is provided, including a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that, when the processor executes the program, it implements the steps of the method described in the first aspect and any possible implementation of the first aspect.

[0018] Fifthly, a computer program product is provided, the computer program product including instructions, which, when executed, implement the steps of the method described in the first aspect and any possible implementation of the first aspect.

[0019] In the prior art, embroidery devices can embroider beads (or sequins) onto patterns on the surface of fabric, matching the beads with the patterns to enhance the three-dimensional effect of the patterns.

[0020] Specifically, multiple sets of patterns are presented on the fabric, each set containing the same pattern. The embroidery frame of the embroidery device holds the fabric in place, containing one set of patterns, thus completing one embroidery pattern. Then, the embroidery frame can release the fabric, moving along the arrangement of each set of patterns. The frame then holds the fabric again, containing another set of patterns, thus completing another embroidery pattern. This process is repeated until the last set of patterns is completed. The completion of one set of patterns is defined as completing one embroidery pattern.

[0021] However, because the tightness of the fabric varies in each embroidery, when the fabric is fixed to the embroidery frame and the beads are embroidered, the position of the beads may not match the position of the pattern, which reduces the accuracy of the embroidery and seriously affects the embroidery effect.

[0022] Compared to existing methods, the method of this application can determine a second distance for the embroidery frame movement based on the positional offset corresponding to the first distance and the positional information of the first and second embroidery patterns; a third distance for the embroidery frame movement can be determined based on the positional offset corresponding to the first distance and the positional information of the first and third embroidery patterns; a fourth distance for the embroidery frame movement can be determined based on the positional offset corresponding to the first distance and the positional information of the first and fourth embroidery patterns, and so on. In other words, the second (third, fourth, etc.) distances can be adjusted based on the positional offsets to obtain the second (third, fourth, etc.) distances. Because the second (third, fourth, etc.) distances are the embroidery frame movement distances after positional correction, the deviation between the position of the embroidery (e.g., the position of the bead) and the position of the pattern can be reduced, meaning the position of the bead and the position of the pattern can be more closely matched. Therefore, using the method of this application can improve the accuracy of embroidery. Attached Figure Description

[0023] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0024] Figure 1 This is an application scenario diagram of the embroidery position correction method provided in the embodiments of this application;

[0025] Figure 2 A flowchart of the embroidery position correction method provided in the embodiments of this application;

[0026] Figure 3 Another flowchart of the embroidery position correction method provided in the embodiments of this application;

[0027] Figure 4 Another flowchart of the embroidery position correction method provided in the embodiments of this application;

[0028] Figure 5 Another flowchart of the embroidery position correction method provided in the embodiments of this application;

[0029] Figure 6 A schematic diagram illustrating the embroidery pattern and the moving distance of the embroidery pattern provided in the embodiments of this application;

[0030] Figure 7 This is a schematic diagram of the embroidery position correction device provided in the embodiments of this application;

[0031] Figure 8 This is a structural block diagram of a computer device provided in an embodiment of this application. Detailed Implementation

[0032] The present application will now be described in further detail with reference to the embodiments and accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.

[0033] It should be noted that, unless otherwise specified, the embodiments and features of the embodiments in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0034] In the prior art, embroidery devices can embroider beads (or sequins) onto patterns on the surface of fabric, matching the beads with the patterns to enhance the three-dimensional effect of the patterns.

[0035] Specifically, multiple sets of patterns are presented on the fabric, each set containing the same pattern. The embroidery frame of the embroidery device holds the fabric in place, containing one set of patterns, thus completing one embroidery pattern. Then, the embroidery frame can release the fabric, moving along the arrangement of each set of patterns. The frame then holds the fabric again, containing another set of patterns, thus completing another embroidery pattern. This process is repeated until the last set of patterns is completed. The completion of one set of patterns is defined as completing one embroidery pattern.

[0036] However, because the tightness of the fabric varies in each embroidery, when the fabric is fixed to the embroidery frame and the beads are embroidered, the position of the beads may not match the position of the pattern, which reduces the accuracy of the embroidery and seriously affects the embroidery effect.

[0037] The embroidery position correction method provided in this application can be applied to... Figure 1 In the application scenarios shown. Figure 1 The application scenario shown includes a lower frame 10, a table 20, an embroidery frame 30, a main beam 40, a machine head 50, an image acquisition device 60, a fabric feeding mechanism 70, and a fabric receiving mechanism 80.

[0038] Except for the image acquisition device 60, the other devices can be collectively referred to as embroidery devices.

[0039] Specifically, the fabric feeding mechanism 70 is used to output the fabric, and the fabric feeding mechanism 70 and the fabric receiving mechanism 80 are embroidery conveying devices.

[0040] The embroidery device can receive fabric and embroider it with beads (or, sequins).

[0041] The image acquisition device can take pictures of the fabric to obtain the position information of the pattern on the fabric, and then determine the moving distance of the embroidery frame based on the picture results.

[0042] Previous text Figure 1An application scenario diagram of this application is presented. In another embodiment of this application, an embroidery position correction method is described. Figure 2 A flowchart illustrating the embroidery position correction method provided in this application embodiment. See also... Figure 2 The method includes:

[0043] Step 201: Obtain the first embroidery pattern of the first embroidery pattern and the i-th embroidery pattern of the i-th embroidery pattern, where i is a positive integer greater than or equal to 2. After the (i-1)-th embroidery pattern is completed, move the (i-1)-th distance, and start embroidery on the i-th embroidery pattern.

[0044] It is understood that the i-th embroidery pattern can be any one of the second, third, fourth, ..., i-th embroidery patterns. The patterns on each embroidery pattern are completely identical. For example, the patterns on each embroidery pattern include a circle, a five-pointed star, and a regular pentagon.

[0045] The i-th embroidery pattern can be any one of the second, third, fourth, ..., i-th embroidery patterns. The i-th embroidery pattern can be any one of the above-mentioned circles, pentagrams, and regular pentagons. The (i-1)-th embroidery pattern has the same shape as the i-th embroidery pattern.

[0046] After the first embroidery pattern is completed, the embroidery frame moves a first distance to the area corresponding to the second embroidery pattern, and begins embroidery of the second embroidery pattern. After the second embroidery pattern is completed, the embroidery frame moves a second distance to the area corresponding to the third embroidery pattern, and begins embroidery of the third embroidery pattern. This cycle continues until the area corresponding to the i-th embroidery pattern is reached, at which point embroidery of the i-th embroidery pattern begins.

[0047] Step 202: Determine the position offset based on the position information of the first embroidery pattern of the first embroidery plate and the position information of the i-th embroidery pattern of the i-th embroidery plate;

[0048] The position information of the first embroidery pattern can be the two-dimensional coordinates from the center position of the first embroidery pattern to the embroidery frame, or the two-dimensional coordinates from the point corresponding to the starting position of the first embroidery pattern to the embroidery frame.

[0049] The position information of the i-th embroidery pattern can be the two-dimensional coordinates from the center position of the i-th embroidery pattern to the embroidery frame, or the two-dimensional coordinates from the point corresponding to the starting position of the i-th embroidery pattern to the embroidery frame.

[0050] The position offset is used to characterize the positional deviation between the first embroidery pattern and the i-th embroidery pattern. For example, the positional deviation can be Δ, where Δ = Δy = 20.

[0051] In one possible implementation, if the first embroidery pattern is a circular embroidery pattern with two-dimensional coordinates (40, 20), and the second embroidery pattern is a circular embroidery pattern with two-dimensional coordinates (40, 10), then the positional offset between the first and second embroidery patterns can be determined as Δ = Δy = 2 * (20 - 10) = 20.

[0052] Step 203: Determine the i-th distance corresponding to the i-th embroidery plate based on the first distance and the position offset.

[0053] Where i = 2, the second distance is the distance the embroidery frame moves from the end of the second embroidery to the area corresponding to the third embroidery. For example, the second distance d2 can be 80.

[0054] In one possible implementation, if the first distance d1 is 100 and the position offset Δ = Δy = 20, then the embroidery plate conveying device can determine the second distance as d2 = d1 - Δ = 100 - 20 = 80.

[0055] In existing techniques, the embroidery frame holds the fabric in place, completing the first embroidery pattern. Then, the embroidery frame can release the fabric, move a first distance, and then hold the fabric in place again to complete the second embroidery pattern. The embroidery frame moves a second distance, and then holds the fabric in place again to complete the third embroidery pattern. This process is repeated until the final embroidery pattern is completed.

[0056] However, because the tightness of the fabric varies in each embroidery, when the fabric is fixed to the embroidery frame and the beads are embroidered, the position of the beads may not match the position of the pattern, which reduces the accuracy of the embroidery and seriously affects the embroidery effect.

[0057] Compared to existing methods, the method of this application can determine a second distance for the embroidery frame movement based on the positional offset corresponding to the first distance and the positional information of the first and second embroidery patterns; a third distance for the embroidery frame movement can be determined based on the positional offset corresponding to the first distance and the positional information of the first and third embroidery patterns; and a fourth distance for the embroidery frame movement can be determined based on the positional offset corresponding to the first distance and the positional information of the first and fourth embroidery patterns. In other words, the second (third, fourth) distances can be adjusted based on the positional offsets to obtain the second (third, fourth) distances. Because the second (third, fourth) distances are the embroidery frame movement distances after positional correction, the deviation between the position of the embroidery (e.g., the position of the bead) and the position of the pattern can be reduced, meaning the position of the bead and the position of the pattern can be more closely matched. Therefore, using the method of this application can improve the accuracy of embroidery.

[0058] The embodiments described above introduced an embroidery position correction method. Another embodiment of this application describes how to specifically determine the position offset. For example, the specific implementation of the step described above, "determining the position offset based on the position information of the first embroidery pattern of the first embroidery plate and the position information of the i-th embroidery pattern of the i-th embroidery plate," includes... Figure 3 Steps:

[0059] Step 301: Determine the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern;

[0060] The starting position is determined by those skilled in the art based on the shape of the embroidery pattern, and the selection of the starting position determines the efficiency of the embroidery. The starting position can be the geometric center of the pattern or a point on the edge of the pattern.

[0061] If the starting position of the first embroidery pattern is used to represent the geometric center of the first embroidery pattern. For example, the geometric center of the first embroidery pattern can be the center (x1, y1) of a circular embroidery pattern, where (x1, y1) = (40, 20).

[0062] If the starting position of the i-th embroidery pattern is used to characterize the geometric center of the i-th embroidery pattern. For example, the i-th embroidery pattern can be a circular pattern on the i-th embroidery board that has the same relative position on the fabric as the circular pattern on the first embroidery board. If i = 2, the center position of the second embroidery pattern can be the center (x2, y2) of the circular pattern on the second embroidery board, where (x2, y2) = (40, 10).

[0063] Step 302: Determine the position offset based on the offset between the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern.

[0064] In one possible implementation, the starting position of the embroidery is set as the center position. If the center position of the first embroidery pattern is (x1, y1), (x1, y1) = (40, 20), and the center position of the i-th embroidery pattern is (x2, y2), (x2, y2) = (40, 10), then the position offset can be Δ = Δy = 2(y1 - y2) = 2(20 - 10) = 20.

[0065] The embodiments described above illustrate how to determine the position offset. Another embodiment of this application describes another approach to determining the position offset. For example, the specific implementation of the step described above, "determining the position offset based on the offset between the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern," includes... Figure 4 Steps:

[0066] Step 401: Determine the offset between the starting position of the first embroidery pattern and the starting position of the second embroidery pattern in the first direction; the first direction is the direction in which the embroidery plate is fed into the embroidery device.

[0067] The first direction refers to the direction in which each embroidery pattern is fed into the embroidery device. For example, the direction in which the embroidery pattern enters the embroidery device could be the y-axis direction.

[0068] The offset in the first direction is the positional offset in the direction in which the embroidery pattern is fed into the embroidery device. For example, it could be Δy = 20.

[0069] In one possible implementation, if the center position of the first embroidery pattern is (x1, y1) and is (40, 20), and the center position of the second embroidery pattern is (x2, y2) and is (40, 10), the position offset can be (△x, △y) = (0, 2*(20-10)) = (0, 20), then the offset in the y-axis direction can be △y = 20.

[0070] Step 402: Determine the position offset based on the offset in the first direction.

[0071] In one possible implementation, if the offset in the first direction is Δy = 20, then Δy = 20 can be used as the position offset, that is, the offset between the center position of the first embroidery pattern and the center position of the second embroidery pattern in the first direction is used as the position offset.

[0072] The embodiments described above introduced another method for determining the position offset. In another embodiment of this application, a method for determining the center position of the first embroidery pattern and the center position of the second embroidery pattern is described. For example, the specific implementation of the steps described above involving "determining the starting position of the first embroidery pattern and the starting position of the second embroidery pattern" includes... Figure 5 Steps:

[0073] Step 501: Obtain the first position information sent by the image acquisition device, and determine the starting position of the first embroidery pattern based on the first position information; the first position information is determined by the image acquisition device based on the image of the first embroidery pattern, and the image of the first embroidery pattern is acquired by the image acquisition device before the embroidery device performs embroidery operation on the first embroidery pattern.

[0074] The first position information is determined by the image acquisition device based on the image of the first embroidery pattern. For example, the first position information may include information about the center position of the first embroidery pattern. The image of the first embroidery pattern is acquired by the image acquisition device before the embroidery device performs embroidery operations on the first embroidery pattern. For example, the image of the first embroidery pattern may be an image captured by the image acquisition device.

[0075] Step 502: Obtain the i-th position information sent by the image acquisition device, and determine the starting position of the i-th embroidery pattern based on the i-th position information; the i-th position information is determined by the image acquisition device based on the image of the i-th embroidery pattern, and the image of the i-th embroidery pattern is acquired by the image acquisition device before the embroidery device performs the embroidery operation on the i-th embroidery pattern.

[0076] The i-th position information is determined by the image acquisition device based on the starting position of the i-th embroidery pattern. For example, the i-th position information could be information including the center position of the i-th embroidery pattern. The image of the i-th embroidery pattern is acquired by the image acquisition device before the embroidery device performs the embroidery operation on the i-th embroidery pattern. For example, the image of the second embroidery pattern could be an image captured by the image acquisition device.

[0077] The embodiments described above illustrate how to determine the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern. In another embodiment of this application, the method for determining the i-th distance is described. For example, the steps described above involving determining the i-th distance corresponding to the i-th embroidery pattern based on the first distance and the position offset include:

[0078] The i-th distance is determined based on the difference between the first distance and the position offset.

[0079] In one possible implementation, if the first distance is d1 = 100 and the position offset is Δy = 20, then the difference between the first distance 100 and the position offset 20 is 80. 80 can be used as the second distance, that is, when the second embroidery plate is fed into the embroidery device and moves the second distance 80, the third embroidery plate is fed into the embroidery device.

[0080] The embodiments described above illustrate how the i-th distance is determined. Another embodiment of this application describes an embroidery position correction method. Figure 6 A schematic diagram illustrating the embroidery pattern and its movement distance provided in an embodiment of this application. See also... Figure 6 It can be combined Figure 6 The method for correcting the position of embroidery is described in detail.

[0081] Understandable Figure 6 There are four versions of the design, from left to right: Version 1, Version 2, Version 3, and Version 4. Taking Version 1 as an example, it includes a five-pointed star, a pentagon, and a circle. When embroidering the first version—that is, embroidering beads or sequins on the five-pointed star, pentagon, and circle—you can embroider the circle first, and then embroider the pentagon and star. Since all versions of the design are identical, the relative positions of the five-pointed star, pentagon, and circle are fixed. When the embroidery position of the circle is accurate, the embroidery positions of the pentagon and star are also accurate.

[0082] It should be noted that the first version of the pattern here is equivalent to the first embroidery pattern in the previous embodiments of this application, the second version of the pattern is equivalent to the second embroidery pattern in the previous embodiments of this application, and the third version of the pattern is equivalent to the third embroidery pattern in the previous embodiments of this application.

[0083] The circle in the first version pattern here corresponds to the first embroidery pattern of the first embroidery version in the previous embodiments of this application.

[0084] First, before embroidering the first pattern, the image acquisition device can take a picture of the first pattern to obtain the center position of the circular embroidery pattern as A(40,20), which is the two-dimensional coordinate from the center of the circular embroidery pattern to the inside of the embroidery frame. This center position A is accurate, meaning the embroidered beads on the circle coincide with the center, so the center of the beads and the center of the circle are in the same position. Since the relative distance between the centers of the two circles in the first and second patterns is known, the distance the embroidery frame needs to move after the first pattern is completed can be determined as d1, where d1 = 100. Therefore, moving d1 allows the embroidery device to embroider the second pattern.

[0085] It should be noted that the image acquisition device here is equivalent to the image acquisition device in the previous embodiments of this application. The circular embroidery pattern acquired by taking a picture here is equivalent to the first embroidery pattern in the previous embodiments of this application. The center position (40, 20) of the circular embroidery pattern acquired by taking a picture here is equivalent to the starting position of the first embroidery pattern in the previous embodiments of this application. The distance the embroidery frame moves after the first pattern is completed is equivalent to the first distance the first embroidery plate moves in the previous embodiments of this application.

[0086] Secondly, before embroidering the second pattern, the image acquisition device can take a picture of the second pattern and obtain the center position of the circular embroidery pattern as B(40,10), which is the two-dimensional coordinate from the center of the circular embroidery pattern to the inner side of the embroidery frame. This center position B is different from the center position A, meaning the embroidered beads on the circle do not coincide with the center of the circle. Therefore, the center positions of the beads and the circle are not the same. Thus, by adjusting the movement distance of the second pattern, the center position C in the third pattern can be corrected compared to the center position A. Since the first distance d1 of the first pattern is known, the distance the embroidery frame moves after the second pattern is completed can be determined as d2 based on the first distance d1 and the position offset Δy between the center position A in the first pattern and the center position B in the second pattern. d2 = d1 - 2*(20-10) = 100 - 2*(20-10) = 80. Therefore, the frame can be moved by 80, so that the embroidery device can embroider the third pattern.

[0087] It should be noted that the distance the embroidery frame moves after the second version of the pattern is completed is equivalent to the second distance the second embroidery pattern moves in the previous embodiment of this application.

[0088] Third, when the embroidery of the third version of the pattern is completed, the image acquisition device can take a picture of the third version of the pattern and obtain the center position of the circular embroidery pattern as C(40,22), which is the two-dimensional coordinate from the center of the circular embroidery pattern to the inner side of the embroidery frame. The center position C here is different from the center position A, that is, the embroidered beads on the circle do not coincide with the center of the circle, so the center position of the embroidered beads and the center position of the circle are not the same. Therefore, by adjusting the moving distance of the third version of the pattern, the center position D in the fourth version of the pattern can be corrected compared with the center position A. Since the first distance d1 of the first pattern is known, the position offset Δy between the first distance d1 and the center position B of the second pattern and the center position C of the third pattern can be used to determine the distance the embroidery frame moves after the third pattern is completed. d3 = d2 - 2*(10-22) = 100 - 2*(-12) = 104. Therefore, the frame can be moved by 104 so that the embroidery device can embroider the fourth pattern.

[0089] It should be noted that the distance the embroidery frame moves after the third version of the pattern is completed is equivalent to the third distance the third embroidery pattern moves in the previous embodiment of this application.

[0090] Fourth, when the fourth version of the pattern is completed, the image acquisition device can take a picture of the fourth version of the pattern and obtain the center position of the circular embroidery pattern as D(40,20), which is the two-dimensional coordinate from the center of the circular embroidery pattern to the inner side of the embroidery frame. The center position D here is more accurate than the center position A, that is, the embroidered beads on the circle coincide with the center of the circle, so the center of the embroidered beads and the center of the circle are in the same position.

[0091] It should be noted that when the center of the bead and the circle in the fourth version of the pattern are in the same position, the calculation method for the embroidery frame movement distance in the first three steps is followed when embroidering the next version of the pattern. This increases the number of versions where the bead and circle overlap in the completed embroidery, thus completing the correction of the embroidery position.

[0092] The embodiments described above introduced an embroidery position correction method. In another embodiment of this application, an embroidery position correction device is described. Figure 7 This is a schematic diagram of the embroidery position correction device provided in an embodiment of this application. The device includes: an acquisition unit 701, an offset determination unit 702, and a distance determination unit 703. Wherein:

[0093] The acquisition unit 701 is used to acquire the first embroidery pattern of the first embroidery pattern and the i-th embroidery pattern of the i-th embroidery pattern, where i is a positive integer greater than or equal to 2. After the i-1th embroidery pattern is completed, it moves an i-1 distance and the i-th embroidery pattern begins to be embroidered.

[0094] The offset determination unit 702 is used to determine the position offset based on the first embroidery pattern of the first embroidery plate and the i-th embroidery pattern of the i-th embroidery plate;

[0095] The distance determination unit 703 is used to determine the i-th distance corresponding to the i-th embroidery pattern based on the first distance and the position offset.

[0096] In one embodiment, the offset determination unit 702 is specifically used to determine the starting position of the first embroidery pattern and the starting position of the second embroidery pattern.

[0097] The position offset is determined based on the offset between the starting position of the first embroidery pattern and the starting position of the second embroidery pattern.

[0098] In one embodiment, the offset determining unit 702 is specifically used to determine the offset between the starting position of the first embroidery pattern and the starting position of the second embroidery pattern in a first direction; the first direction is the direction in which the embroidery plate is fed into the embroidery device.

[0099] The position offset is determined based on the offset in the first direction.

[0100] In one embodiment, the offset determination unit 702 is used to acquire first position information sent by the image acquisition device and determine the starting position of the first embroidery pattern according to the first position information; the first position information is determined by the image acquisition device based on the image of the first embroidery pattern, and the image of the first embroidery pattern is acquired by the image acquisition device before the embroidery device performs embroidery operation on the first embroidery pattern.

[0101] The image acquisition device sends the i-th position information, and the starting position of the i-th embroidery pattern is determined based on the i-th position information. The i-th position information is determined by the image acquisition device based on the image of the i-th embroidery pattern, which is acquired by the image acquisition device before the embroidery device performs the embroidery operation on the i-th embroidery pattern.

[0102] In one embodiment, the distance determination unit 703 is specifically configured to determine the i-th distance based on the difference between the first distance and the position offset.

[0103] This application also provides an embroidery system, which includes: an embroidery plate conveying device and an embroidery device; the embroidery conveying device is used to feed an embroidery plate into the embroidery device, and the aforementioned method embodiment for embroidery position correction;

[0104] An embroidery device for receiving an embroidery pattern and performing embroidery operations on the pattern.

[0105] The embroidery system also includes an image acquisition device, which is used to acquire an image of the embroidery pattern before the embroidery device performs embroidery operations on the embroidery pattern, and to determine the starting position of the embroidery pattern on the embroidery pattern based on the image of the embroidery pattern.

[0106] In one embodiment, a computer device is provided. Figure 8 A structural block diagram of a computer device provided in an embodiment of this application. See also... Figure 8 The computer device includes a memory and a processor. The memory stores a computer program, and the processor executes the computer program to implement the aforementioned embroidery position correction method embodiment.

[0107] This application also provides a computer-readable storage medium storing a computer program, which, when executed by a processor, implements the aforementioned embroidery position correction method embodiment.

[0108] This application provides a computer program product including instructions that, when executed, cause the method described in this application to be performed. For example, it can execute... Figure 2 The steps of the embroidery position correction method are shown.

[0109] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium. When executed, the computer program can include the processes of the embodiments of the above methods. Any references to memory, storage, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, or optical storage, etc. Volatile memory can include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM), etc.

[0110] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0111] The above embodiments merely illustrate several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A method for correcting the position of embroidery, characterized in that, The method includes: Get the first embroidery pattern of the first embroidery pattern and the i-th embroidery pattern of the i-th embroidery pattern, where i is a positive integer greater than or equal to 2. The patterns on each embroidery pattern are exactly the same. After the i-1th embroidery pattern is finished, move the i-1th distance and start embroidery on the i-th embroidery pattern. After the first embroidery pattern is finished, move the first distance and start embroidery on the second embroidery pattern. Determining the position offset based on the position information of the first embroidery pattern of the first embroidery pattern and the position information of the i-th embroidery pattern of the i-th embroidery pattern includes: determining the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern, wherein the first embroidery pattern is acquired by an image acquisition device before the embroidery device performs embroidery operations on the first embroidery pattern, and the image of the i-th embroidery pattern is acquired by the image acquisition device before the embroidery device performs embroidery operations on the i-th embroidery pattern; determining the position offset based on the offset between the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern in a first direction, wherein the first direction is the direction in which each embroidery pattern is fed into the embroidery device. The i-th distance corresponding to the i-th embroidery pattern is determined based on the difference between the first distance and the position offset. The embroidery frame moves a distance of the first distance d1 after the first pattern is completed. The first distance d1 is the relative distance between the first and second patterns that have the same shape and corresponding positions.

2. The method according to claim 1, characterized in that, Determining the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern includes: The first position information sent by the image acquisition device is acquired, and the starting position of the first embroidery pattern is determined based on the first position information; the first position information is determined by the image acquisition device based on the image of the first embroidery pattern. The image acquisition device sends the i-th position information, and the starting position of the i-th embroidery pattern is determined based on the i-th position information; the i-th position information is determined by the image acquisition device based on the image of the i-th embroidery pattern.

3. An embroidery position correction device, characterized in that the device comprises: The acquisition unit is used to acquire the first embroidery pattern of the first embroidery plate and the i-th embroidery pattern of the i-th embroidery plate, where i is a positive integer greater than or equal to 2. The patterns on each embroidery plate are completely identical. After the i-1th embroidery plate is finished, it moves i-1 distance and the i-th embroidery plate starts embroidery. After the first embroidery plate is finished, it moves 1 distance and the second embroidery plate starts embroidery. An offset determination unit is used to determine a position offset based on the first embroidery pattern of the first embroidery pattern and the i-th embroidery pattern of the i-th embroidery pattern, including: determining the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern, wherein the first embroidery pattern is acquired by an image acquisition device before the embroidery device performs an embroidery operation on the first embroidery pattern, and the image of the i-th embroidery pattern is acquired by the image acquisition device before the embroidery device performs an embroidery operation on the i-th embroidery pattern; and determining the position offset based on the offset between the starting position of the first embroidery pattern and the starting position of the i-th embroidery pattern in a first direction, wherein the first direction is the direction in which each embroidery pattern is fed into the embroidery device. The distance determination unit is used to determine the i-th distance corresponding to the i-th embroidery pattern based on the difference between the first distance and the position offset. The distance the embroidery frame moves after the first pattern is completed is the first distance d1. The first distance d1 is the relative distance between the first pattern and the second pattern that have the same shape and corresponding position.

4. An embroidery system, characterized in that, The system includes: a fabric conveying device and an embroidery device; The fabric conveying device is used to feed an embroidery plate into the embroidery device and to perform the method described in any one of claims 1-2; An embroidery device for receiving the fabric and performing embroidery operations on the fabric.

5. The system according to claim 4, characterized in that, The embroidery system also includes: an image acquisition device. The image acquisition device is used to acquire an image of the fabric before the embroidery device performs embroidery on the fabric, and to determine the starting position of the embroidery pattern of the embroidery plate based on the image of the fabric.

6. A computer device, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that, When the processor executes the program, it implements the embroidery position correction method as described in any one of claims 1-2.

7. A computer program product, comprising instructions, characterized in that, When the instruction is executed, it implements the embroidery position correction method as described in any one of claims 1-2.

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