Storage Devices
By designing the storage device of a multi -layer rack, the main platform supports the central area of the renovation wheel, and solves the problem of pollution and damage during the storage process of the renovation wheel, and achieves better protection and processing quality.
Patent Information
- Application Number
- CN202211612966.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-12-15
- Publication Date
- 2025-01-28
- Estimated Expiration
- 2042-12-15
AI Technical Summary
During storage, the trimming wheel is easily contaminated by dust during the equipment operation, and the suspension method can easily cause scratches on itself or with the equipment, causing damage and pollution, and affecting the processing quality.
A storage device, including a multi -layer shelf, is designed with a multi -layer shelf. Each layer is set on the main load platform that supports the central area of the middle of the wheel to avoid grinding particles and providing protection.
Through this method of storage, the renovation round is stored in a separate, horizontal, and semi -sealed environment, which effectively avoids pollution and damage, and improves processing quality.
Smart Images
Figure CN115781623B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of dressing wheel storage, and in particular to a storage device. Background Art
[0002] The function of the dressing wheel is to dress the polishing pad used in the double-sided polishing machine so as to better perform double-sided polishing on the silicon wafer. The material that plays a dressing role on the dressing wheel is the diamond particles plated on it, so special attention needs to be paid to its protection. The common storage method for the dressing wheel is to hang it on the equipment body or near the equipment. This type of storage has the following problems: ① Long-term exposure to the equipment without any protection measures, dust and debris during the operation of the equipment will cause it to be contaminated; ② Hanging on the equipment or other objects is extremely
[0003] It is easy to scratch itself or the equipment, causing damage to the dressing wheel, falling of diamond particles, scratches on the equipment, etc., which in turn affects the quality of the processing technology. Summary of the invention
[0004] In order to solve the above technical problems, the present invention provides a storage device to solve the problems of contamination or damage caused by improper storage of the dressing wheel.
[0005] In order to achieve the above-mentioned purpose, the technical solution adopted in the embodiment of the present invention is: a storage device for storing a dressing wheel, wherein the dressing wheel comprises a sleeved outer ring structure and an inner ring structure, and abrasive particles are arranged on at least one side surface of the outer ring structure; the storage device comprises a cabinet, and the cabinet comprises a multi-layer storage rack, and each layer of the storage rack comprises a bottom plate and a top plate, and a main bearing platform for supporting the middle area of the dressing wheel is arranged on the bottom plate.
[0006] The main bearing platform includes a first boss for supporting the inner ring structure, and a surface of the first boss away from the bottom plate is arranged parallel to the bottom plate.
[0007] Optionally, the main supporting platform includes a second boss stacked on the first boss, the first boss includes a first supporting surface exposed from the second boss, and the second boss can be inserted into the interior of the inner annular structure so that a side surface of the inner annular structure can be placed on the first supporting surface.
[0008] Optionally, in a direction parallel to the bottom plate, a shape of a cross section of the second boss matches a shape of a central hole of the inner annular structure.
[0009] Optionally, in a direction parallel to the bottom plate, a cross-sectional area of the second boss is smaller than a cross-sectional area of the central hole of the inner annular structure.
[0010] Optionally, the distance between the second boss and the top plate is greater than the thickness of the trimming wheel.
[0011] Optionally, the base plate is also provided with a plurality of auxiliary bearing platforms located on the periphery of the first boss, the plurality of auxiliary bearing platforms are used to support the outer annular structure, and the plurality of auxiliary bearing platforms include at least two first auxiliary bearing platforms located on opposite sides of the first boss.
[0012] Optionally, in a direction from the outer annular structure to the inner annular structure, the outer annular structure includes a first region and a second region which are sequentially arranged, the second region is arranged close to the inner annular structure, and the abrasive particles are arranged on the second region;
[0013] The auxiliary supporting platform includes a second supporting surface for supporting the first area.
[0014] Optionally, a plurality of limiting bosses are further provided on the bottom plate, and the plurality of limiting bosses are located on a side of the auxiliary supporting platform away from the first boss, and in a direction perpendicular to the bottom plate, a height of the limiting bosses is greater than a height of the auxiliary supporting platform.
[0015] Optionally, the auxiliary bearing platform and the limiting boss are an integrated structure.
[0016] Optionally, drainage holes are also provided on the bottom plate.
[0017] Optionally, the multi-layer rack includes adjacent first-layer racks and second-layer racks, the first-layer racks are arranged close to the top of the cabinet, and the orthographic projection of the drainage hole on the first-layer rack on the second-layer rack is located within the drainage hole on the second-layer rack.
[0018] Optionally, universal wheels are provided at the bottom of the cabinet.
[0019] The beneficial effects of the present invention are as follows: by providing a cabinet including multiple layers of racks, the dressing wheels are stored separately in each layer of the racks, and each layer of the racks is provided with a main supporting platform for supporting the middle area of the dressing wheel, thereby avoiding contact with the abrasive particles on the dressing wheel and avoiding damage to the abrasive particles. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 Schematic diagram showing a cabinet in an embodiment of the present invention Figure 1 ;
[0021] Figure 2 Schematic diagram showing a cabinet in an embodiment of the present invention Figure 2 ;
[0022] Figure 3Indicates the state of the dressing wheel placed on the shelf Figure 1 ;
[0023] Figure 4 Indicates the state of the dressing wheel placed on the shelf Figure 2 ;
[0024] Figure 5 A schematic diagram showing a main carrying platform in an embodiment of the present invention;
[0025] Figure 6 A schematic diagram showing an auxiliary bearing platform and a limiting boss in an embodiment of the present invention. DETAILED DESCRIPTION
[0026] In order to make the purpose, technical solution and advantages of the embodiment of the present invention clearer, the technical solution of the embodiment of the present invention will be clearly and completely described below in conjunction with the drawings of the embodiment of the present invention. Obviously, the described embodiment is a part of the embodiment of the present invention, not all of the embodiments. Based on the described embodiment of the present invention, all other embodiments obtained by ordinary technicians in this field belong to the scope of protection of the present invention.
[0027] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.
[0028] At present, the dressing wheels used in double-sided polishing machines are suspended on the equipment body. Due to the large number of hanging wheels (generally more than 3) and the spacing less than 5mm, friction between the dressing wheels is inevitable, which damages the diamond coating on the dressing wheels and affects the quality during processing; at the same time, the dressing wheels and the equipment are prone to scratches, which will cause the teeth of the dressing wheels to wear and the equipment to scratch, and it is easy to bring the coating on the surface of the dressing wheels into the equipment, causing secondary pollution. The dressing wheels are exposed and suspended around the equipment for a long time, and various particles in the workshop environment will pollute them, and introduce pollution when the polishing pad is put on the machine, affecting the correction quality.
[0029] refer to Figure 1-Figure 6In order to solve the above problems, the present embodiment provides a storage device for storing a dressing wheel 100, including a cabinet 1, wherein the cabinet 1 includes a multi-layer storage rack 11, each layer of the storage rack 11 includes a bottom plate 101 and a top plate, and a main supporting platform 2 for supporting the middle area of the dressing wheel 100 is provided on the bottom plate 101.
[0030] A dressing wheel 100 is supported on each layer of the storage rack 11, and only the middle area of the dressing wheel 100 is supported by the main supporting platform 2, while other areas outside the middle area are suspended, and the abrasive particles (such as diamond particles) on the dressing wheel 100 are arranged at the edge area of the dressing wheel 100, which effectively avoids the damage and falling of the abrasive particles. The dressing wheel 100 is stored in a separate, horizontal, semi-sealed environment, which well solves the problems of pollution control and protection of the dressing wheel 100.
[0031] Exemplarily, a door may be provided on the open side of the cabinet to be closed after the dressing wheel is placed, so that the dressing wheel placed in the cabinet is isolated from the outside world to prevent the dressing wheel from being contaminated.
[0032] In an exemplary embodiment, the dressing wheel 100 includes an outer annular structure 110 and an inner annular structure 120, and abrasive particles are disposed on at least one side of the outer annular structure 110;
[0033] The main support platform 2 includes a first boss 21 for supporting the inner ring structure 120 , and a surface of the first boss 21 away from the bottom plate 101 is arranged parallel to the bottom plate 101 .
[0034] The first bosses 21 arranged in parallel ensure that the dressing wheel 100 can be placed horizontally, thereby effectively protecting the dressing wheel 100 .
[0035] refer to Figure 4 and Figure 5 In an exemplary embodiment, the main supporting platform 2 includes a second boss 22 stacked on the first boss 21, the first boss 21 includes a first supporting surface exposed on the second boss 22, and the second boss 22 can be inserted into the interior of the inner annular structure 120 so that one side surface of the inner annular structure 120 can be placed on the first supporting surface.
[0036] The first boss 21 and the second boss 22 cooperate with each other to support the dressing wheel 100 and also play a role of limiting.
[0037] In an exemplary embodiment, in a direction parallel to the bottom plate 101, the cross-sectional shape of the second boss 22 matches the shape of the central hole of the inner annular structure 120, thereby ensuring that the dressing wheel 100 can be sleeved on the second boss 22 and avoiding damage to the dressing wheel 100.
[0038] In an exemplary embodiment, in a direction parallel to the bottom plate 101 , the cross-sectional area of the second boss 22 is smaller than the cross-sectional area of the central hole of the inner annular structure 120 , so that the dressing wheel 100 can be smoothly sleeved on the second boss 22 .
[0039] Exemplarily, both the first boss 21 and the second boss 22 are cylindrical structures, the diameter of the first boss 21 is 300 mm, and the diameter of the second boss 22 is 180 mm, but this is not limited to the present invention.
[0040] Exemplarily, the thickness of the first boss 21 and the second boss 22 may be the same or different. In some embodiments, the thickness of the first boss 21 and the second boss 22 is both 10 mm, but the present invention is not limited thereto.
[0041] In an exemplary embodiment, the distance between the second boss 22 and the top plate is greater than the thickness of the dressing wheel 100 , so as to facilitate storage of the dressing wheel 100 .
[0042] In an exemplary embodiment, a plurality of auxiliary supporting platforms 3 located on the periphery of the first boss 21 are also provided on the base plate 101, and the plurality of auxiliary supporting platforms 3 are used to support the outer annular structure 110, and the plurality of auxiliary supporting platforms 3 include at least two first auxiliary supporting platforms located on opposite sides of the first boss 21.
[0043] Exemplarily, the thickness of the auxiliary supporting platform 3 is the same as the thickness of the first boss 21, that is, the supporting surface of the auxiliary supporting platform 3 and the supporting surface of the first boss 21 are located on the same plane, and the auxiliary supporting platform 3 and the main supporting platform 2 cooperate to jointly support the dressing wheel, thereby increasing the stability of the dressing wheel.
[0044] Exemplarily, a plurality of the auxiliary bearing platforms 3 may be arranged at intervals to form an annular structure surrounding the periphery of the main bearing platform 2 , so as to enhance the bearing stability of the dressing wheel 100 .
[0045] refer to Figure 3In an exemplary embodiment, in a direction from the outer annular structure 110 to the inner annular structure 120, the outer annular structure 110 includes a first region 1002 and a second region 1001 which are sequentially arranged, the second region 1001 is arranged close to the inner annular structure 120, and the abrasive particles are arranged on the second region 1001;
[0046] The auxiliary supporting platform 3 includes a second supporting surface for supporting the first area 1002 .
[0047] The auxiliary support platform 3 supports the first region 1002 via the second support surface, thereby ensuring the stability of the dressing wheel 100 and avoiding damage to the abrasive particles.
[0048] Exemplarily, the second supporting surface is an arc-shaped structure that matches the shape of the outer annular structure to reduce the contact area between the second supporting surface and the dressing wheel 100 and prevent the second supporting surface from contacting the second region 1001 to damage the abrasive particles.
[0049] In an exemplary embodiment, a plurality of limiting bosses 4 are further provided on the base plate 101, and the plurality of limiting bosses 4 are located on a side of the auxiliary supporting platform 3 away from the first boss 21, and in a direction perpendicular to the base plate 101, a height of the limiting bosses 4 is greater than a height of the auxiliary supporting platform 3.
[0050] The setting of the limiting boss 4 can limit the position of the dressing wheel 100, reduce shaking, and thus reduce damage.
[0051] Exemplarily, the thickness of the limiting boss 4 is 20 mm, and the thickness of the auxiliary supporting platform 3 is 10 mm, but it is not limited thereto.
[0052] The shape formed by the side surfaces of the exemplary plurality of limiting bosses 4 close to the auxiliary bearing platform 3 is consistent with the shape of the outer side surface of the dressing wheel 100. For example, if the outer side surface of the outer ring structure of the dressing wheel 100 is circular, the shape formed by the side surfaces of the plurality of limiting bosses 4 close to the auxiliary bearing platform 3 is circular.
[0053] Exemplarily, an elastic film layer may be provided on the side surface of the limiting boss 4 close to the auxiliary bearing platform 3 to play a buffering role, thereby further avoiding damage to the dressing wheel 100 .
[0054] Exemplarily, the outer surface of the dressing wheel 100 is provided with a first concave-convex structure (refer to Figure 3), a second concave-convex structure consistent with the first concave-convex structure is arranged on the side of the limiting boss 4 close to the auxiliary supporting platform 3, and the concave part of the first concave-convex structure corresponds to the convex part of the second concave-convex structure, and the convex part of the first concave-convex structure corresponds to the concave part of the second concave-convex structure.
[0055] refer to Figure 6 In an exemplary embodiment, the auxiliary support platform 3 and the limiting boss 4 are an integrated structure, which simplifies the structural setting.
[0056] refer to Figure 4 In an exemplary embodiment, the bottom plate 101 is further provided with a drainage hole 5. When there is liquid attached to the dressing wheel 100, the liquid can be drained. For example, when the dressing wheel 100 is placed after cleaning, ultrapure water and other liquids may remain on the dressing wheel 100, which can be drained through the drainage hole 5 to keep the storage environment of the storage device dry.
[0057] Exemplarily, parameters such as the number of the drainage holes 5 , the aperture of the drainage holes 5 , and the setting position of the drainage holes 5 can be set according to actual needs as long as they do not affect the setting of the main supporting platform 2 , the auxiliary supporting platform 3 and the limiting boss 4 .
[0058] Exemplarily, the drainage hole 5 is disposed between the main loading platform 2 and the auxiliary loading platform 3 , and a plurality of the drainage holes 5 may be disposed on the bottom plate 101 of each layer of the storage rack 11 to improve the drainage effect.
[0059] In an exemplary embodiment, the multi-layer rack 11 includes adjacent first-layer racks and second-layer racks, the first-layer racks are arranged close to the top of the cabinet 1, and the orthographic projection of the drainage hole 5 on the first-layer rack on the second-layer rack is located within the drainage hole 5 on the second-layer rack.
[0060] Exemplarily, the area of the orthographic projection of the drainage hole 5 on the first-layer rack on the second-layer rack is larger than the area of the drainage hole 5 on the second-layer rack, thereby preventing the liquid discharged from the first-layer rack from falling into the periphery of the drainage hole 5 on the second-layer rack, thereby preventing liquid splashing and contaminating the dressing wheel 100.
[0061] For example, the line connecting the center point of the drainage hole 5 on the first shelf and the center point of the drainage hole 5 on the second shelf is perpendicular to the bottom plate 101.
[0062] In the direction of the bottom plate 101, the orthographic projection of the center point of the drainage hole 5 on the first shelf on the bottom plate 101 of the second shelf coincides with the center point of the drainage hole 5 on the second shelf. The liquid discharged from the drainage hole 5 on the first shelf is then discharged through the drainage hole 5 on the second shelf until it is discharged from the drainage hole 5 on the bottom shelf near the bottom of the cabinet 1. The drainage hole 5 on the bottom shelf is connected to a drainage pipe, which is connected to the liquid collection structure to effectively prevent liquid splashing.
[0063] In an exemplary embodiment, a universal wheel 12 is provided at the bottom of the cabinet 1.
[0064] The provision of the universal wheel 12 facilitates the movement of the cabinet 1 and the overall transportation of the trimming wheel 100 .
[0065] It is to be understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, but the present invention is not limited thereto.
[0066] Various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the protection scope of the present invention.
Claims
1. A storage device for storing a dressing wheel, characterized in that: The dressing wheel comprises an outer annular structure and an inner annular structure, and abrasive particles are arranged on at least one side of the surface of the outer annular structure; the storage device comprises a cabinet, and the cabinet comprises a multi-layer rack, and each layer of the rack comprises a bottom plate and a top plate, and a main bearing platform for supporting the middle area of the dressing wheel is arranged on the bottom plate; The main bearing platform comprises a first boss for supporting the inner annular structure, wherein a surface of the first boss away from the bottom plate is arranged parallel to the bottom plate; The bottom plate is also provided with a drainage hole; The multi-layer racks include adjacent first-layer racks and second-layer racks, the first-layer racks are arranged close to the top of the cabinet, and the orthographic projection of the drainage holes on the first-layer racks on the second-layer racks is located inside the drainage holes on the second-layer racks; The area of the orthographic projection of the drainage hole on the first-layer rack on the second-layer rack is smaller than the area of the drainage hole on the second-layer rack.
2. The storage device according to claim 1, characterized in that The main supporting platform includes a second boss stacked on the first boss, the first boss includes a first supporting surface exposed on the second boss, and the second boss can be inserted into the interior of the inner annular structure so that a side surface of the inner annular structure can be placed on the first supporting surface.
3. The storage device according to claim 2, characterized in that: In a direction parallel to the bottom plate, the shape of the cross section of the second boss matches the shape of the central hole of the inner annular structure; Furthermore, the cross-sectional area of the second boss is smaller than the cross-sectional area of the central hole of the inner annular structure.
4. The storage device according to claim 2, characterized in that: The distance between the second boss and the top plate is greater than the thickness of the dressing wheel.
5. The storage device according to claim 1, characterized in that: The bottom plate is also provided with a plurality of auxiliary bearing platforms located at the periphery of the first boss, the plurality of auxiliary bearing platforms are used to support the outer annular structure, and the plurality of auxiliary bearing platforms include at least two first auxiliary bearing platforms located on opposite sides of the first boss.
6. The storage device according to claim 5, characterized in that: In a direction from the outer annular structure to the inner annular structure, the outer annular structure includes a first region and a second region which are sequentially arranged, the second region is arranged close to the inner annular structure, and the abrasive particles are arranged on the second region; The auxiliary supporting platform includes a second supporting surface for supporting the first area.
7. The storage device according to claim 5, characterized in that: A plurality of limiting bosses are also provided on the bottom plate, and the plurality of limiting bosses are located on a side of the auxiliary bearing platform away from the first boss. In a direction perpendicular to the bottom plate, the height of the limiting bosses is greater than the height of the auxiliary bearing platform.
8. The storage device according to claim 7, characterized in that: The auxiliary bearing platform and the limiting boss are an integrated structure.
Citation Information
Patent Citations
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