Optical proximity correction method and system, mask, device and storage medium

Abstract

An optical proximity correction method and system, mask, device, and storage medium. The correction method includes: providing multiple design graphics, the design graphics including the test graphics to be inspected; selecting the edge to be inspected in the test graphics as the edge to be selected; obtaining a search area corresponding to the edge to be selected outside the test graphics, the search area including a rectangular first search area with the edge to be selected as one of its sides, and fan-shaped second search areas located on both sides of the first search area and adjacent to the first search area, the center of the second search area coincides with the endpoint of the edge to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side of the first search area perpendicular to the edge to be selected; using the search area to perform a graphic search outside the test graphics to check whether other design graphics appear in the search area; when other design graphics appear in the search area, the edge to be selected is selected and used as the edge to be processed. The present invention facilitates more accurate edge selection operations.

Description

Technical Field

[0001] Embodiments of the present invention relate to the field of semiconductor manufacturing, and in particular to an optical proximity correction method and system, a mask, a device, and a storage medium. Background Art

[0002] To transfer a pattern from a mask to the surface of a silicon wafer, it typically requires an exposure step, a development step that follows the exposure step, and an etching step that follows the development step. During the exposure step, light passes through the light-transmitting areas of the mask onto the silicon wafer coated with photoresist, causing the photoresist to undergo a chemical reaction under the irradiation of light. During the development step, the different solubility of the developer in the sensitive and unsensitive photoresists is exploited to form a photoresist pattern, enabling the transfer of the pattern from the mask to the photoresist. In the etching step, the silicon wafer is etched based on the photoresist pattern formed in the photoresist layer, further transferring the mask pattern to the silicon wafer.

[0003] However, as device sizes continue to shrink, the discrepancy between the chip surface pattern and the original mask pattern increases after the photolithography process. To prevent inconsistencies between the chip pattern and the mask pattern caused by the optical proximity effect, the current solution is to perform optical proximity correction (OPC) on the mask pattern and then transfer the pattern based on the corrected mask pattern. During the OPC correction process, a mask manufacturing rule check is often required to ensure the final pattern convergence and mask production accuracy.

[0004] However, the correction accuracy of optical proximity correction still needs to be improved. Summary of the Invention

[0005] The problem solved by the embodiments of the present invention is to provide an optical proximity correction method and system, a mask, a device and a storage medium to improve the correction accuracy of optical proximity correction.

[0006] To solve the above problem, an embodiment of the present invention provides an optical proximity correction method, including: providing multiple design graphics, wherein the design graphics include a test graphic to be detected; selecting an edge to be detected in the test graphic as a to-be-selected edge; obtaining a search area corresponding to the to-be-selected edge outside the test graphic, wherein the search area includes a rectangular first search area with the to-be-selected edge as one of its sides, and a fan-shaped second search area located on both sides of the first search area and adjacent to the first search area, the center of the second search area coincides with the endpoint of the to-be-selected edge on the same side, and the central angle is 90 degrees, and the radius of the second search area is equal to the length of the side perpendicular to the to-be-selected edge in the first search area; using the search area to perform a graphic search on the outside of the test graphic to check whether other design graphics appear in the search area; when other design graphics appear in the search area, the to-be-selected edge is selected and used as the to-be-processed edge.

[0007] Correspondingly, an embodiment of the present invention also provides an optical proximity correction system, comprising: a graphic providing module for providing multiple design graphics, wherein the design graphics include a test graphic to be detected; a selection module for selecting an edge to be detected in the test graphic as a to-be-selected edge; a search area setting module for obtaining a search area corresponding to the to-be-selected edge outside the test graphic, wherein the search area includes a rectangular first search area with the to-be-selected edge as one of its sides, and a fan-shaped second search area located on both sides of the first search area and adjacent to the first search area, the center of the second search area coincides with the endpoint of the to-be-selected edge on the same side, and the central angle is 90 degrees, and the radius of the second search area is equal to the length of the side perpendicular to the to-be-selected edge in the first search area; a search module for using the search area to perform a graphic search on the outside of the test graphic to check whether other design graphics appear in the search area; and an edge selection module for selecting the to-be-selected edge when other design graphics appear in the search area, and using it as the to-be-selected edge to be processed.

[0008] Correspondingly, an embodiment of the present invention further provides a mask, including a pattern obtained by using the optical proximity correction method provided by an embodiment of the present invention.

[0009] Accordingly, an embodiment of the present invention also provides a device comprising at least one memory and at least one processor, wherein the memory stores one or more computer instructions, wherein the one or more computer instructions are executed by the processor to implement the optical proximity correction method provided in an embodiment of the present invention.

[0010] Correspondingly, an embodiment of the present invention further provides a storage medium, wherein the storage medium stores one or more computer instructions, and the one or more computer instructions are used to implement the optical proximity correction method provided by the embodiment of the present invention.

[0011] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0012] In the optical proximity correction method provided by an embodiment of the present invention, the search area includes a rectangular first search area with the side to be selected as one side, and a fan-shaped second search area located on both sides of the first search area and adjacent to the first search area. The center of the second search area coincides with the endpoint of the side to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side perpendicular to the side to be selected in the first search area. Then, any point on the arc side of the second search area and any point on the side of the first search area parallel to the side to be selected are equal to the distance from the side to be selected. Taking the equal distance as the search distance, the search area The search area is a collection of points whose distance from the edge to be selected is less than or equal to the search distance. Compared with a solution in which the search area only includes a rectangular search area, the search area of ​​the embodiment of the present invention covers the collection of points whose distance from the edge to be selected is less than or equal to the search distance, while reducing the probability of mistakenly covering points whose distance from the edge to be selected is greater than the search distance. This is conducive to more accurately determining whether other design figures appear in the search area, so as to determine whether the edge to be selected is used as the edge to be processed. This is conducive to more accurate edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 is a flow chart of an optical proximity correction method;

[0014] Figures 2 to 3 is a schematic diagram corresponding to each step in an optical proximity correction method;

[0015] Figure 4 is a flow chart of an embodiment of an optical proximity correction method of the present invention;

[0016] Figures 5 to 8 1 is a schematic diagram corresponding to each step in an embodiment of an optical proximity correction method of the present invention;

[0017] Figure 9 and Figure 10 is a schematic diagram corresponding to each step in another embodiment of the optical proximity correction method of the present invention;

[0018] Figure 11 is a functional block diagram of an embodiment of an optical proximity correction system of the present invention;

[0019] Figure 12 yes Figure 11 Functional block diagram of an embodiment of a middle search area setting module;

[0020] Figure 13 yes Figure 11 A functional block diagram of another embodiment of a middle search area setting module;

[0021] Figure 14 It is a hardware structure diagram of an embodiment of the device provided by the present invention. DETAILED DESCRIPTION

[0022] At present, the correction accuracy of optical proximity correction needs to be improved. This paper analyzes the reasons why the correction accuracy of optical proximity correction needs to be improved by combining an optical proximity correction method.

[0023] Figure 1 This is a flow chart of an optical proximity correction method. Figure 2 and Figure 3 , shows a schematic diagram corresponding to each step in the optical proximity correction method, the optical proximity correction method comprising:

[0024] refer to Figure 2 , Figure 2 3 is a schematic diagram corresponding to step SP1 . Step SP1 : providing a plurality of design graphics 10 , wherein the design graphics include test graphics 20 to be tested, and edges to be tested in the test graphics 20 are used as edges to be selected 11 .

[0025] refer to Figure 3 , Figure 3 : is a schematic diagram corresponding to step SP2, step SP2: setting a search distance a, obtaining a rectangular search area 30 corresponding to the side to be selected 11 outside the figure to be measured 20, the search area 30 having a first side 31 located on the straight line where the side to be selected 11 is located, the perpendicular bisector of the first side 31 coincides with the perpendicular bisector of the side to be selected 11, and the search area 30 also having a second side 32 parallel to the first side 31, and the step of forming the search area 30 includes: setting the coordinates (in, out, start, end) of the search area 30 to (0, a, a, a), wherein in represents the vertical distance between the first side 31 and the side to be selected 11, out represents the vertical distance between the second side 32 and the side to be selected 11, start represents the vertical distance between one of the third sides 33 and the endpoint of the side to be selected 11 on the same side, and end represents the vertical distance between the other third side 33 and the endpoint of the side to be selected 11 on the same side.

[0026] Continue to refer Figure 3 , Figure 3 It also includes a schematic diagram corresponding to step SP3, step SP3: using the search area 30 to perform a graphic search on the outside of the graphic to be tested 20 to check whether other design graphics 10 appear in the search area 30. When other design graphics 10 appear in the search area 30, the to-be-selected edge 11 is selected and used as the edge to be processed.

[0027] The search area 30 formed by using coordinates (in, out, start, end) as (0, a, a, a) is a rectangle. Although the vertical distance between the third side 33 and the endpoint of the to-be-selected side 11 on the same side, and the vertical distance between the second side 32 and the to-be-selected side 11 are both the search distance a, there is a point on the third side 33 and the second side 32 whose distance from the to-be-selected side 11 is greater than the search distance a. That is, there is a point in the search area 30 whose distance from the to-be-selected side 11 is greater than the search distance a. As a result, in the step of performing a graphic search on the outside of the to-be-tested graphic 20 using the search area 30, other design graphics 10 (such as Figure 3 As shown by the dotted circle in the middle, the edge to be selected 11 is mistakenly selected and used as the edge to be processed, resulting in poor accuracy of the edge selection operation in the optical proximity correction method, thereby affecting the correction accuracy of the optical proximity correction method.

[0028] In order to solve the above technical problems, an embodiment of the present invention provides an optical proximity correction method. Figure 4 , which shows a flow chart of an embodiment of the optical proximity correction method of the present invention.

[0029] In this embodiment, the optical proximity correction method includes the following basic steps:

[0030] Step SP1: providing a plurality of design patterns, wherein the design patterns include a pattern to be tested;

[0031] Step SP2: selecting an edge to be detected in the graph to be tested as an edge to be selected;

[0032] Step SP3: Obtaining a search area corresponding to the edge to be selected outside the figure to be measured, the search area including a rectangular first search area having the edge to be selected as one side, and sector-shaped second search areas located on both sides of the first search area and adjacent to the first search area, the center of the second search area coincides with the endpoint of the edge to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side of the first search area that is perpendicular to the edge to be selected;

[0033] Step SP4: using the search area to perform a graphic search outside the pattern to be tested to check whether other design patterns appear in the search area;

[0034] Step SP5: When other design figures appear in the search area, the edge to be selected is selected and used as the edge to be processed.

[0035] In this embodiment, any point on the arc edge of the second search area and any point on the side parallel to the to-be-selected side in the first search area are all at equal distances from the to-be-selected side. Taking the equal distance as the search distance, the search area is the collection of points whose distance from the to-be-selected side is less than or equal to the search distance. Compared to a scheme in which the search area only includes a rectangular search area, the search area of ​​this embodiment covers the collection of points whose distance from the to-be-selected side is less than or equal to the search distance while reducing the probability of mistakenly covering points whose distance from the to-be-selected side is greater than the search distance. This facilitates more accurate determination of whether other design figures appear in the search area, thereby determining whether the to-be-selected side is used as the side to be processed. This facilitates more precise edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method.

[0036] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0037] Figures 5 to 8 1 is a schematic diagram corresponding to each step in an embodiment of the optical proximity correction method of the present invention.

[0038] refer to Figure 5 , Figure 5 3 is a schematic diagram corresponding to step SP1 . Step SP1 is performed as follows: providing a plurality of design graphics 100 , wherein the design graphics 100 include test graphics 110 to be tested.

[0039] The design pattern 100 is a target pattern transferred onto a wafer. The design pattern 100 is also used as a reference for determining whether a to-be-selected edge is selected during subsequent pattern search.

[0040] In the semiconductor field, it is usually necessary to perform corresponding processing on the edges of the design graphic 100 according to the different environments in which the design graphic 100 is located. In this embodiment, during the optical proximity correction process, in order to transfer the design graphic 100 from the mask to the wafer surface, it is usually necessary to go through an exposure step, a development step performed after the exposure step, and an etching step performed after the development step. After the photolithography process and the etching process, the critical dimension of the graphic formed on the wafer has a deviation from the critical dimension of the design graphic 100. Therefore, each of the design graphics 100 needs to be detected according to the layout of the surrounding design graphics 100 to determine whether corresponding processing is required. For this reason, in this embodiment, the design graphic 100 includes a test graphic 110 to be detected.

[0041] It should be noted that, in this embodiment, Figure 5Only two design patterns 100 are shown. According to different process requirements, the number of the design patterns 100 is not limited to two.

[0042] refer to Figure 6 , Figure 6 3 is a schematic diagram corresponding to step SP2 , in which step SP2 is executed: an edge to be detected in the graph to be detected 110 is selected as an edge to be selected 111 .

[0043] The edges to be selected 111 are edges that are subsequently determined to be selected and processed.

[0044] It should be noted that the detection refers to detecting the surrounding environment within a certain range from the edge to be selected 111. Specifically, it is used to detect whether there are other design figures 100 within a certain range from the edge to be selected 111.

[0045] It should also be noted that each edge in the graph to be tested 110 needs to be tested. In this embodiment, the detailed description is given by taking the testing of one edge as an example, and therefore only one edge to be selected 111 is illustrated.

[0046] Combined with reference Figure 7 and Figure 8 , Figure 7 and Figure 8 3 is a schematic diagram corresponding to step SP3. Step SP3 is executed to obtain a search area 300 corresponding to the edge to be selected 111 outside the figure to be tested 110. The search area 300 includes a rectangular first search area 310 with the edge to be selected 111 as one side, and fan-shaped second search areas 320 located on both sides of the first search area 310 and adjacent to the first search area 310. The center of the second search area 320 coincides with the endpoint of the edge to be selected 111 on the same side, and the central angle is 90 degrees. The radius R of the second search area 320 is equal to the length D of the side of the first search area 310 that is perpendicular to the edge to be selected 111.

[0047] In this embodiment, any point on the arc edge of the second search area 320 and any point on the side parallel to the candidate edge 111 of the first search area 310 are all at equal distances from the candidate edge 111. Taking this equal distance as the search distance, the search area 310 is the collection of points whose distance from the candidate edge 111 is less than or equal to the search distance. Compared to a scheme in which the search area only includes a rectangular search area, the search area 300 of this embodiment covers the collection of points whose distance from the candidate edge 111 is less than or equal to the search distance while reducing the probability of mistakenly covering points whose distance from the candidate edge 111 is greater than the search distance. This facilitates more accurate determination of whether other design figures appear in the search area 300, thereby determining whether the candidate edge 111 will subsequently be used as an edge to be processed. This facilitates more precise edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method.

[0048] It should be noted that, since every edge of the test pattern 110 is tested, when testing the edge 111 to be selected, it is only necessary to use the straight line where the edge 111 is located as the boundary and test outside the test pattern 110 .

[0049] In this embodiment, the rectangular first search area 310 has the side to be selected 111 as one of its sides, the fan-shaped second search area 320 is adjacent to the first search area 310, and the center of the second search area 320 coincides with the endpoint of the side to be selected 111 on the same side, and the central angle is 90 degrees. Then, both of the second search areas 320 have a radial edge located on the straight line where the side to be selected 111 is located, so that the search area 300 is formed outside the figure to be tested 110.

[0050] It should be noted that the edge to be selected 111 is a line segment and has two endpoints. Therefore, the center of the second search area 320 coincides with the endpoint of the edge to be selected 111 on the same side, which means that the center of one of the second search areas 320 coincides with one of the endpoints of the edge to be selected 111, and the center of the other second search area 320 coincides with the other endpoint of the edge to be selected 111.

[0051] Specifically, refer to Figure 7 In the step of obtaining the search area 300 corresponding to the edge to be selected 111, the search area 300 is composed of a plurality of rectangular sub-search areas 200 (such as Figure 7, wherein each sub-search area 200 has a first side 210 located on the straight line where the to-be-selected side 111 is located, and the perpendicular bisector of the first side 210 coincides with the perpendicular bisector of the to-be-selected side 111. Each sub-search area 200 further has a second side 220 parallel to the first side 210, and the endpoints of each second side 220 are located on the arc edge of the second search area 320.

[0052] The step of directly forming the arc edge of the second search area 200 is too complicated and difficult to implement. Therefore, in this embodiment, the search area 300 is formed by superimposing a plurality of rectangular sub-search areas 200 .

[0053] For example, in actual operation, it is usually necessary to use specific software to detect the graphic to be tested 110. When the software can only support setting a rectangular search area, the search area 300 is formed by superimposing multiple rectangular sub-search areas 200, thereby improving the operational compatibility of obtaining the search area 300.

[0054] Moreover, the sub-search area 200 is a rectangle, and the sub-search area 200 can be formed by defining the positions of the four sides of the sub-search area 200 . Therefore, the step of forming the sub-search area 200 is relatively simple and easy to operate.

[0055] In this embodiment, each sub-search area 200 has a first side 210 located on the straight line where the to-be-selected side 111 is located. The perpendicular bisector of the first side 210 coincides with the perpendicular bisector of the to-be-selected side 111. Therefore, each sub-search area 200 is symmetrical about the perpendicular bisector. At the same time, each sub-search area 200 also has a second side 220 parallel to the first side 210. The endpoints of the second side 220 are both located on the arc edge of the second search area 320. Therefore, the endpoints of the second side 220 constitute the arc edge of the second search area 320, so that each sub-search area 200 can overlap to form the search area 300.

[0056] It should be noted that for the convenience of illustration, Figure 7 Only a part of the sub-search areas 200 are shown in the figure. In actual operation, a corresponding number of the sub-search areas 200 are formed according to the accuracy requirement of the search area 300 to be formed.

[0057] Continue to refer Figure 7Each of the sub-search areas 200 further has a third side 230 perpendicular to the first side 210 and the second side 220. The step of obtaining the search area 300 corresponding to the side to be selected 111 outside the pattern to be tested 110 includes: setting a search distance L, wherein the search distance L is equal to the vertical distance from the second side 220 farthest from the side to be selected 111 to the side to be selected 111.

[0058] The search distance L is a set distance for detecting the surrounding environment of the edge to be selected 111.

[0059] In this embodiment, the search distance L is the length D of the side perpendicular to the side to be selected 111 in the first search area 310 (e.g. Figure 8 As shown), since the second search area 320 is fan-shaped, the length D of the side perpendicular to the edge to be selected 111 in the first search area 310 is the vertical distance from the second side 220 farthest from the edge to be selected 111 to the edge to be selected 111. Therefore, the search distance L is equal to the vertical distance from the second side 220 farthest from the edge to be selected 111 to the edge to be selected 111.

[0060] It should be noted that the sub-search area 200 is rectangular. For the same sub-search area 200, the two sides perpendicular to the first side 210 and the second side 220 are of equal length and extend in the same direction. Therefore, the two sides perpendicular to the first side 210 and the second side 220 are both set to be the third sides 230. In other words, each sub-search area 200 has two third sides 230.

[0061] In this embodiment, the step of obtaining the search area 300 corresponding to the side to be selected 111 outside the pattern to be measured 110 further includes: determining a vertical distance S1 between adjacent second sides 220 according to the search distance L.

[0062] In this embodiment, the first sides 210 of the sub-search area 200 are all located on the straight line where the to-be-selected side 111 is located. Then, based on the search distance L, the vertical distance S1 of the adjacent second sides 220 is determined, that is, the length change of the third side 230 is determined. Therefore, the vertical distance S1 of the adjacent second sides 220 represents the graphic accuracy of the formed search area 300. The smaller the vertical distance S1 of the adjacent second sides 220, the higher the accuracy.

[0063] In this embodiment, the first search area 310 is rectangular, and the sub-search areas 200 are also rectangular, so the sub-search areas 200 include sub-search areas 200 that are consistent in shape and size with the first search area 310. Specifically, the first search area 310 is one of the sub-search areas 200.

[0064] As an example, the sub-search area 200 corresponding to the first search area 310 is the sub-search area 200 with the longest third side 230, and the lengths of the third sides 230 in the remaining sub-search areas 200 decrease arithmetic progression based on the length of the third side 230 with the longest length.

[0065] It should be noted that the vertical distance S1 between adjacent second edges 220 should not be too large. If the vertical distance S1 between adjacent second edges 220 is too large, the distance between the endpoints on the same side of the adjacent second edges 220 will be too large. If both endpoints of the second edges 220 are on the arc edge of the second search zone 320, the missing arc edge between the endpoints on the same side of the adjacent second edges 220 will be too long. As a result, the gap between the sub-search zones 200 corresponding to the adjacent second edges 220 at the arc edge will be too large, which can easily make it difficult for all the sub-search zones 200 to overlap to form a relatively complete fan-shaped second search zone 320. As a result, it is difficult for the search zone 300 to cover the set of points whose distance from the to-be-selected edge 111 is less than or equal to the search distance, affecting the accuracy of subsequent edge selection operations and, therefore, the correction accuracy of the optical proximity correction method. To this end, in this embodiment, the vertical distance S1 between adjacent second edges is greater than 0 and less than or equal to 1 nm.

[0066] It should also be noted that since the radius R of the second search area 320 is equal to the length D of the side perpendicular to the to-be-selected side 111 in the first search area 310, the radius R of the second search area 320 is also equal to the search distance L, and the first sides 210 are all located on the straight line where the to-be-selected side 111 is located, that is, the intersection point of the third side 230 and the first side 210 is all located on the radius side of the second search area 320. Therefore, in other embodiments, the vertical distance between adjacent third sides located on the same side of the to-be-selected side can also be determined based on the search distance.

[0067] In this embodiment, the step of obtaining the search area 300 corresponding to the edge to be selected 111 outside the pattern to be measured 110 further includes: determining the number m of the second edges 220 according to the search distance L and the vertical distance S1 between adjacent second edges 220 .

[0068] The search distance L is the maximum size of each of the third sides 230, and the vertical distance S1 between adjacent second sides 220 is the difference in the arithmetically decreasing lengths of the third sides 230. Therefore, based on the search distance L and the vertical distance S1 between adjacent second sides 220, that is, based on the maximum size of the third sides 230 and the difference in the arithmetically decreasing lengths of the third sides 230, the number of third sides 230, that is, the number m of the second sides 220, can be calculated.

[0069] In this embodiment, the number m of the second sides 220 is determined, that is, the number of the sub-search areas 200 is determined to be m. Specifically, when L / S1 is an integer, m=L / S1; when L / S1 is a decimal, m is the value of L / S1 rounded up plus 1.

[0070] Correspondingly, in other embodiments, the number of third sides located on the same side of the side to be selected may be determined based on the search distance and the vertical distance between adjacent third sides located on the same side of the side to be selected.

[0071] In this embodiment, the step of obtaining the search area 300 corresponding to the edge to be selected 111 outside the pattern to be tested 110 further includes: after determining the number m of the second edges 220, setting the coordinates (in, out, start, end) of each sub-search area 200 to (0, Ln×S1, (L 2 -(Ln×S1) 2 ) 1 / 2 ,(L 2 -(Ln×S1) 2 ) 1 / 2 ), wherein in represents the vertical distance between the first side 210 and the side to be selected 111, out represents the vertical distance between the second side 220 and the side to be selected 111, start represents the vertical distance between one of the third sides 230 and the endpoint of the side to be selected 111 on the same side, end represents the vertical distance between the other third side 230 and the endpoint of the side to be selected 111 on the same side, L represents the search distance, S1 represents the vertical distance between adjacent second sides 220, n is an integer and n={0,1,2,3…m-1}, and m represents the number of second sides 220.

[0072] It should be noted that the sub-search area 200 has two third sides 230, and the sub-search area 200 is symmetrical with the perpendicular bisector of the to-be-selected side 111. Then, start and end each represent the vertical distance between one of the third sides 230 and the endpoint of the to-be-selected side 111 on the same side, and start and end are equal. Start and end do not need to be fixedly corresponding to any of the two third sides 230.

[0073] It should also be noted that n is an integer and n={0, 1, 2, 3…m-1}, which means that n corresponds one-to-one to the integers from 0 to m-1.

[0074] In this embodiment, each sub-search area 200 is formed according to the coordinates (in, out, start, end), and no new coordinate definition is added. Instead, the original coordinate definition is used to form each sub-search area 200, which is beneficial to the operational compatibility of forming the search area 300.

[0075] In this embodiment, the first side 210 of each sub-search area 200 is located on the straight line where the edge to be selected 111 is located, so the vertical distance between the first side 210 and the edge to be selected 111 is 0, that is, in is 0.

[0076] In this embodiment, L represents the search distance, and S1 represents the vertical distance between adjacent second sides 220. That is, the maximum length of the third side 230 is L, and the difference of the length of the third side 230 that decreases arithmetically is S1. Then, in each sub-search area 200, the length of the third side 230 is Ln×S1. The sub-search area 200 is a rectangle, and the length of the third side 230 is the vertical distance between the second side 220 and the side to be selected 111. The vertical distance between the second side 220 and the side to be selected 111 is Ln×S1, that is, out is Ln×S1.

[0077] In this embodiment, the radius R of the second search area 320 is the distance between the endpoint of the third side 230 located on the arc edge and the endpoint of the to-be-selected side 111 on the same side. This distance is used as the hypotenuse, the third side 230 is used as one of the right-angled sides, and the perpendicular distance between the third side 230 and the endpoint of the to-be-selected side 111 on the same side is used as the other right-angled side to construct a right triangle. Therefore, according to the Pythagorean theorem, the perpendicular distance between the third side 230 and the endpoint of the to-be-selected side 111 on the same side is calculated to be (L 2 -(Ln×S1) 2 ) 1 / 2 , that is, both start and end are (L 2 -(Ln×S1) 2 ) 1 / 2 .

[0078] refer to Figure 8 , executing step SP4, using the search area 300 to perform a graphic search outside the to-be-tested graphic 110 to check whether other design graphics 100 appear in the search area 300.

[0079] The search area 300 covers the set of points whose distance from the edge to be selected 111 is less than or equal to the search distance. In this embodiment, it is detected whether other design graphics 100 appear in the area whose distance from the edge to be selected 111 is less than or equal to the search distance.

[0080] Specifically, in this embodiment, the step of performing a pattern search on the outside of the pattern to be tested 110 using the search area 300 includes performing a pattern search on the outside of the pattern to be tested 110 using the sub-search areas 200 to check whether other design patterns 100 appear in the sub-search areas 200 .

[0081] In this embodiment, the method further includes: executing step SP5, when other design graphics 100 appear in the search area 300, the to-be-selected edge 111 is selected and used as the to-be-processed edge.

[0082] When other design graphics 100 appear in the search area 300, the edge to be selected 111 may easily cause a large deviation between the graphic formed on the wafer and the design graphic 100 when it is subsequently formed on the wafer. In this case, the edge to be selected 111 needs to be subsequently corrected. Therefore, when other design graphics 100 appear in the search area 300, the edge to be selected 111 is selected and used as the edge to be processed.

[0083] In this embodiment, after the edge to be selected 111 is selected and used as the edge to be processed, the optical proximity correction method further includes: performing etching deviation compensation processing on the edge to be processed.

[0084] When other design graphics 100 appear in the search area 300, after the photolithography process and the etching process, the critical dimension of the graphics formed on the wafer has a deviation from the critical dimension of the graphics to be tested 110. By performing etching deviation compensation processing on the processed edge, the deviation that may be generated by the photolithography process and the etching process is pre-compensated to the graphics to be tested 110, thereby improving the matching degree between the graphics formed on the wafer after the photolithography and etching processes and the graphics to be tested 110.

[0085] In this embodiment, the step of compensating for the etching deviation includes: moving the edge to be processed by a preset distance along a direction perpendicular to the edge to be processed, thereby compensating for the etching offset.

[0086] In this embodiment, the etching offset can be obtained from experimental data, and the preset distance corresponds to the etching offset.

[0087] In this embodiment, after performing etching deviation compensation processing on the edge to be processed, the optical proximity correction method further includes: performing optical proximity effect correction processing on the pattern to be tested 110 .

[0088] After optical proximity correction is performed on the pattern to be tested 110 , the obtained pattern is used to make a mask, and then a photolithography process is performed using the mask to form a corresponding mask pattern on a wafer.

[0089] In this embodiment, when no other design pattern 100 appears in the search area 300, optical proximity effect correction processing is performed on the pattern to be tested 110, and the obtained pattern is used to make a mask, which is then used to perform a photolithography process to form a corresponding mask pattern on the wafer.

[0090] Figure 9and Figure 10 1 is a schematic diagram corresponding to each step in another embodiment of the optical proximity correction method of the present invention.

[0091] The differences between this embodiment and the above embodiment are as follows: the sub-search area is formed by determining the search distance and the vertical distance of the adjacent third side on the same side of the side to be selected.

[0092] Combined with reference Figure 9 and Figure 10 Each of the sub-search areas 201 further has a third side 231 perpendicular to the first side 211 and the second side 221. The step of obtaining the search area 301 corresponding to the side to be selected 113 outside the pattern to be tested 112 includes: setting a search distance L, wherein the search distance L is equal to the vertical distance from the second side 221 farthest from the side to be selected 113 to the side to be selected 113.

[0093] The search distance L is a set distance for detecting the surrounding environment of the edge to be selected 113.

[0094] In this embodiment, the search distance L is the length D of the side perpendicular to the side to be selected 113 in the first search area 311 (e.g. Figure 10 As shown), since the second search area 321 is fan-shaped, the length D of the side perpendicular to the edge to be selected 113 in the first search area 311 is the vertical distance from the second side 221 farthest from the edge to be selected 113 to the edge to be selected 113. Therefore, the search distance L is equal to the vertical distance from the second side 221 farthest from the edge to be selected 113 to the edge to be selected 113.

[0095] It should be noted that the sub-search area 201 is rectangular. For the same sub-search area 200, the two sides perpendicular to the first side 211 and the second side 221 are of equal length and extend in the same direction. Therefore, the two sides perpendicular to the first side 210 and the second side 221 are both set as the third sides 231. In other words, each sub-search area 201 has two third sides 231.

[0096] In this embodiment, the step of obtaining the search area 301 corresponding to the edge to be selected 113 outside the pattern to be measured 112 further includes: determining a vertical distance S2 of an adjacent third edge 231 located on the same side of the edge to be selected 113 according to the search distance L.

[0097] In this embodiment, the radius R of the second search area 321 is equal to the length D of the side perpendicular to the candidate side 113 in the first search area 311. Therefore, the radius R of the second search area 321 is also equal to the search distance L. Furthermore, all first sides 211 are located on the straight line where the candidate side 113 is located. Based on the search distance L, a vertical distance S2 of the adjacent third side 231 located on the same side of the candidate side 113 is determined. This means that the length change of the first side 211 is determined. Therefore, the vertical distance S2 of the adjacent third side 231 located on the same side of the candidate side 113 represents the graphical accuracy of the formed search area 301. The smaller the vertical distance S2 of the adjacent third side 231 located on the same side of the candidate side 113, the higher the accuracy.

[0098] In this embodiment, the first search area 311 is rectangular, and the sub-search area 201 is also rectangular, so the sub-search area 201 includes sub-search areas 201 that are consistent in shape and size with the first search area 311. Specifically, the first search area 311 is one of the sub-search areas 201.

[0099] As an example, the sub-search area 201 corresponding to the first search area 311 is the sub-search area 201 with the smallest first side 211 length, and the lengths of the first sides 211 in the remaining sub-search areas 201 increase arithmetic steps based on the length of the first side 211 with the smallest length.

[0100] It should be noted that the vertical distance S2 between adjacent third edges 231 located on the same side of the edge to be selected 113 should not be too large. If the vertical distance S2 between adjacent third edges 231 located on the same side of the edge to be selected 113 is too large, the distance between the endpoints on the same side of the adjacent second edges 221 will be too large. In addition, since the endpoints of the second edges 221 are both on the arc edge of the second search zone 321, the missing arc edge between the endpoints on the same side of the adjacent second edges 221 will be too long. As a result, the gaps between the sub-search zones 201 corresponding to the adjacent second edges 221 at the arc edge will be too large. This can easily make it difficult for all the sub-search zones 201 to overlap to form a relatively complete fan-shaped second search zone 321. As a result, it will be difficult for the search zone 301 to cover the set of points whose distance from the edge to be selected 113 is less than or equal to the search distance, affecting the accuracy of subsequent edge selection operations and thus the correction accuracy of the optical proximity correction method. To this end, in this embodiment, the vertical distance S2 between adjacent third edges 231 located on the same side of the to-be-selected edge 113 is greater than 0 and less than or equal to 1 nm.

[0101] In this embodiment, the step of obtaining the search area 301 corresponding to the side to be selected 112 outside the figure to be tested 111 further includes: determining the number m of third sides 231 located on the same side of the side to be selected 111 based on the search distance L and the vertical distance S1 of the adjacent third sides 231 located on the same side of the side to be selected 113.

[0102] The search distance L is the maximum size of the distance between the endpoint of the first side 211 and the endpoint of the side to be measured 113 on the same side. The vertical distance S2 of the adjacent third side 231 on the same side of the side to be selected 113 is the difference in the arithmetically increasing length of the first side 211. Therefore, based on the search distance L and the vertical distance S2 of the adjacent third side 231 on the same side of the side to be selected 113, that is, based on the maximum size of the distance between the endpoint of the first side 211 and the endpoint of the side to be measured 113 on the same side, and the difference in the arithmetically increasing length of the first side 211, the number of first sides 211, that is, the number m of third sides 231 on the same side of the side to be selected 111, can be calculated.

[0103] In this embodiment, the number m of the third edges 231 located on the same side of the to-be-selected edge 111 is determined, that is, the number of the sub-search areas 200 is determined to be m. Specifically, when L / S1 is an integer, m=L / S1; when L / S1 is a decimal, m is the value of L / S1 rounded up plus 1.

[0104] In this embodiment, the step of obtaining the search area 301 corresponding to the edge to be selected 112 outside the pattern to be tested 111 further includes: after determining the number m of the third edges 231 located on the same side of the edge to be selected 111, setting the coordinates (in, out, start, end) of each sub-search area 201 to (0, (L 2 -(n×S2) 2 ) 1 / 2 , n×S2, n×S2), where in represents the vertical distance between the first edge 211 and the edge to be selected 113, out represents the vertical distance between the second edge 221 and the edge to be selected 113, start represents the vertical distance between one of the third edges 231 and the endpoint of the edge to be selected 113 on the same side, end represents the vertical distance between the other third edge 231 and the endpoint of the edge to be selected 113 on the same side, L represents the search distance, S2 represents the vertical distance between the adjacent third edges 231 on the same side of the edge to be selected 113, n is an integer and n={0,1,2,3…m-1}, and m represents the number of third edges 231 on the same side of the edge to be selected.

[0105] It should be noted that the sub-search area 201 has two third sides 231, and the sub-search area 201 is symmetrical with the perpendicular bisector of the to-be-selected side 113. Then, start and end each represent the vertical distance between one of the third sides 231 and the endpoint of the to-be-selected side 113 on the same side, and start and end are equal. Start and end do not need to be fixedly corresponding to any of the two third sides 231.

[0106] It should also be noted that n is an integer and n={0, 1, 2, 3…m-1} or n=L / S2, which means that n corresponds one-to-one to integers from 0 to m-1 and L / S2.

[0107] In this embodiment, each sub-search area 201 is formed according to the coordinates (in, out, start, end), and no new coordinate definition is added. Instead, the original coordinate definition is used to form each sub-search area 201, which is beneficial to the operational compatibility of forming the search area 301.

[0108] In this embodiment, the first side 211 of each sub-search area 201 is located on the straight line where the edge to be selected 113 is located, so the vertical distance between the first side 210 and the edge to be selected 113 is 0, that is, in is 0.

[0109] In this embodiment, S2 represents the vertical distance between the adjacent third sides 231 located on the same side of the to-be-selected side 113. That is, the difference in the length of the first side 211 that increases arbitrarily is S2. Then, in each sub-search area 201, the vertical distance between the third side 231 and the endpoint of the to-be-selected side 113 on the same side is n×S2, that is, both start and end are n×S2.

[0110] In this embodiment, the radius R of the second search area 320 is the distance between the endpoint of the third side 231 located on the arc edge and the endpoint of the to-be-selected side 113 on the same side. The radius R of the second search area 320 is equal to the search distance L. The search distance L is used as the hypotenuse, the third side 231 is used as one of the right-angled sides, and the perpendicular distance between the third side 231 and the endpoint of the to-be-selected side 113 on the same side is used as the other right-angled side to construct a right triangle. Therefore, according to the Pythagorean theorem, the length of the third side 231 is calculated to be (L 2 -(n×S2) 2 ) 1 / 2 , the sub-search area 201 is a rectangle, then the length of the third side 231 is the vertical distance between the second side 221 and the side to be selected 113, then the vertical distance between the second side 221 and the side to be selected 113 is (L 2 -(n×S2) 2 ) 1 / 2 , that is, out is (L2 -(n×S2) 2 ) 1 / 2 .

[0111] For the specific description of the forming method described in this embodiment, reference can be made to the corresponding description in the aforementioned embodiments, which will not be repeated here.

[0112] Correspondingly, the present invention also provides an optical proximity correction system. Figure 11 is a functional block diagram of an embodiment of an optical proximity correction system of the present invention; Figure 12 yes Figure 11 Functional block diagram of an embodiment of a middle search area setting module.

[0113] In this embodiment, the optical proximity correction system 50 includes: a pattern providing module 501 for providing a plurality of design patterns, wherein the design patterns include a pattern to be tested; a selection module 502 for selecting an edge to be tested in the pattern to be tested as a to-be-selected edge; a search area setting module 503 for obtaining a search area corresponding to the to-be-selected edge outside the pattern to be tested, wherein the search area includes a rectangular first search area having the to-be-selected edge as one side, and sector-shaped second search areas located on both sides of the first search area and adjacent to the first search area, wherein the center of the second search area coincides with the endpoint of the selected edge on the same side, and the central angle is 90 degrees, and the radius of the second search area is equal to the length of the side of the first search area perpendicular to the to-be-selected edge; a search module 504 for using the search area to perform a pattern search outside the pattern to be tested to determine whether other design patterns appear in the search area; and an edge selection module 505 for selecting the to-be-selected edge as the edge to be processed when other design patterns appear in the search area.

[0114] The pattern providing module 501 is configured to provide a plurality of design patterns, wherein the design patterns include patterns to be tested.

[0115] The design pattern is a target pattern transferred onto the wafer, and the design pattern is also used as a reference benchmark for determining whether the edge to be selected is selected during subsequent pattern search.

[0116] In the semiconductor field, it is usually necessary to perform corresponding processing on the edges of the design graphics according to the different environments in which the design graphics are located. In this embodiment, during the optical proximity correction process, in order to transfer the design graphics from the mask to the wafer surface, it is usually necessary to go through an exposure step, a development step performed after the exposure step, and an etching step performed after the development step. After the photolithography process and the etching process, the critical dimensions of the graphics formed on the wafer deviate from the critical dimensions of the design graphics. Therefore, each of the design graphics needs to be detected according to the layout of the surrounding design graphics to determine whether corresponding processing is required. For this reason, in this embodiment, the design graphics include the graphics to be tested.

[0117] The selection module 502 is configured to select an edge to be detected in the graph to be detected as an edge to be selected.

[0118] The edges to be selected are edges that are subsequently determined to be selected and processed.

[0119] It should be noted that the detection refers to detecting the surrounding environment within a certain range from the side to be selected, specifically, detecting whether there are other design patterns within a certain range from the side to be selected.

[0120] It should also be noted that each edge in the graph to be tested needs to be tested. In this embodiment, the testing of one edge is taken as an example for detailed description.

[0121] A search area setting module 503 is configured to obtain a search area corresponding to the edge to be selected outside the figure to be tested, wherein the search area includes a rectangular first search area having the edge to be selected as one of its sides, and a sector-shaped second search area located on both sides of the first search area and adjacent to the first search area. The center of the second search area coincides with the endpoint of the edge to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side of the first search area that is perpendicular to the edge to be selected.

[0122] In this embodiment, any point on the arc edge of the second search area and any point on the side parallel to the to-be-selected side in the first search area are at equal distances from the to-be-selected side. Taking the equal distance as the search distance, the search area is the collection of points whose distance from the to-be-selected side is less than or equal to the search distance. Compared to a scheme in which the search area only includes a rectangular search area, the search area of ​​this embodiment covers the collection of points whose distance from the to-be-selected side is less than or equal to the search distance while reducing the probability of mistakenly covering points whose distance from the to-be-selected side is greater than the search distance. This facilitates more accurate determination of whether other design figures appear in the search area, thereby determining whether the to-be-selected side will be subsequently used as a side to be processed. This facilitates more accurate edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method.

[0123] It should be noted that, since each edge of the graph to be tested will be tested, when testing the edge to be selected, it is only necessary to use the straight line where the edge to be selected is located as the boundary and perform testing outside the graph to be tested.

[0124] In this embodiment, the rectangular first search area has the side to be selected as one of its sides, the fan-shaped second search area is adjacent to the first search area, and the center of the second search area coincides with the endpoint of the side to be selected on the same side, and the central angle is 90 degrees. Then, both of the second search areas have a radius side located on the straight line where the side to be selected is located, so that the search area is formed outside the figure to be tested.

[0125] It should be noted that the side to be selected is a line segment and has two endpoints. Therefore, the center of the second search area coincides with the endpoint of the side to be selected on the same side, which means that the center of one of the second search areas coincides with one endpoint of the side to be selected, and the center of the other second search area coincides with the other endpoint of the side to be selected.

[0126] In the search area setting module 503, the search area is composed of a plurality of rectangular sub-search areas superimposed on each other, wherein each sub-search area has a first side located on the straight line where the side to be selected is located, and the perpendicular bisector of the first side coincides with the perpendicular bisector of the side to be selected. Each sub-search area also has a second side parallel to the first side, and the endpoints of each second side are located on the arc edge of the second search area.

[0127] The step of directly forming the arc edge of the second search area is too complicated and difficult to implement. Therefore, in this embodiment, the search area is formed by superimposing multiple rectangular sub-search areas.

[0128] For example, in actual operation, it is usually necessary to use specific software to detect the graphics to be tested. When the software can only support setting a rectangular search area, the search area is formed by superimposing multiple rectangular sub-search areas, which improves the operational compatibility of obtaining the search area.

[0129] Moreover, the sub-search area is rectangular and can be formed by defining the positions of the four sides of the sub-search area. Therefore, the step of forming the sub-search area is relatively simple and easy to operate.

[0130] In this embodiment, each sub-search area has a first side located on the straight line on which the side to be selected lies, and the perpendicular bisector of the first side coincides with the perpendicular bisector of the side to be selected. Therefore, each sub-search area is symmetrical about the perpendicular bisector as its midline. Furthermore, each sub-search area also has a second side parallel to the first side, and endpoints of the second side are both located on an arc edge of the second search area. Therefore, the endpoints of the second sides constitute an arc edge of the second search area, so that each sub-search area can overlap to form the search area.

[0131] refer to Figure 12 , each of the sub-search areas further has a third side perpendicular to the first side and the second side, and the search area setting module 503 includes: a first distance setting unit 5031, used to set a search distance, and the search distance is equal to the vertical distance from the second side farthest from the side to be selected to the side to be selected.

[0132] The search distance is a set distance for detecting the surrounding environment of the edge to be selected.

[0133] In this embodiment, the search distance is the length of the side perpendicular to the edge to be selected in the first search area. Since the second search area is fan-shaped, the length of the side perpendicular to the edge to be selected in the first search area is the vertical distance from the second edge farthest from the edge to be selected to the edge to be selected. Therefore, the search distance is equal to the vertical distance from the second edge farthest from the edge to be selected to the edge to be selected.

[0134] It should be noted that the sub-search area is rectangular. For the same sub-search area, the two sides perpendicular to the first side and the second side are equal in length and extend in the same direction. Therefore, the two sides perpendicular to the first side and the second side are both third sides. In other words, each sub-search area has two third sides.

[0135] In this embodiment, the search area setting module 503 further includes: a second distance setting unit 5032, configured to determine a vertical distance between adjacent second sides according to the search distance.

[0136] In this embodiment, if the first sides of the sub-search areas are all located on the straight line where the to-be-selected side is located, the vertical distance between the adjacent second sides is determined based on the search distance, that is, the change in the length of the third side is determined. Therefore, the vertical distance between the adjacent second sides represents the graphic accuracy of the formed search area. The smaller the vertical distance between the adjacent second sides, the higher the accuracy.

[0137] In this embodiment, the first search area is rectangular, and the sub-search area is also rectangular, and the sub-search area includes sub-search areas with the same shape and size as the first search area. Specifically, the first search area is one of the sub-search areas.

[0138] As an example, the sub-search area corresponding to the first search area is the sub-search area with the longest third side, and the lengths of the third sides in the remaining sub-search areas decrease arithmetically based on the length of the third side with the longest length.

[0139] It should be noted that the vertical distance between adjacent second sides should not be too large. If the vertical distance between adjacent second sides is too large, the distance between the endpoints on the same side of the adjacent second sides will be too large. Furthermore, if both endpoints of the second sides are on the arc edge of the second search zone, the missing arc edge between the endpoints on the same side of the adjacent second sides will be too long. Consequently, the gaps between the sub-search zones corresponding to the adjacent second sides at the arc edge will be too large, which can easily make it difficult for all the sub-search zones to overlap to form a relatively complete fan-shaped second search zone. Consequently, the search zone will have difficulty covering the set of points whose distance from the edge to be selected is less than or equal to the search distance, affecting the accuracy of subsequent edge selection operations and, consequently, the correction accuracy of the optical proximity correction method. Therefore, in this embodiment, the vertical distance between adjacent second sides is greater than 0 and less than or equal to 1 nm.

[0140] It should also be noted that since the radius of the second search area is equal to the length of the side perpendicular to the side to be selected in the first search area, the radius of the second search area is also equal to the search distance, and the first sides are all located on the straight line where the side to be selected is located. In other words, the intersection point of the third side and the first side is all located on the radius side of the second search area. For this reason, in other embodiments, the vertical distance of the adjacent third sides located on the same side of the side to be selected can also be determined based on the search distance.

[0141] In this embodiment, the search area setting module 503 further includes: a first number setting unit 5033, configured to determine the number of second sides according to the search distance and a vertical distance between adjacent second sides.

[0142] The search distance is the maximum size of each of the third sides, and the vertical distance between adjacent second sides is the difference in the arbitrarily decreasing lengths of the third sides. Therefore, based on the search distance and the vertical distance between adjacent second sides, that is, based on the maximum size of the third sides and the difference in the arbitrarily decreasing lengths of the third sides, the number of third sides, that is, the number of the second sides, can be calculated.

[0143] In this embodiment, the number of second sides is determined, that is, the number of the sub-search areas is determined. Specifically, when the ratio of the search distance to the vertical distance of the adjacent second sides is an integer, the number of second sides is equal to the ratio of the search distance to the vertical distance of the adjacent second sides. When the ratio of the search distance to the vertical distance of the adjacent second sides is a decimal, the number of second sides is equal to the ratio of the search distance to the vertical distance of the adjacent second sides plus 1.

[0144] Correspondingly, in other embodiments, the number of third sides located on the same side of the side to be selected may be determined based on the search distance and the vertical distance between adjacent third sides located on the same side of the side to be selected.

[0145] In this embodiment, the search area setting module 503 further includes: a first coordinate setting unit 5034, which is used to set the coordinates (in, out, start, end) of each sub-search area to (0, Ln×S1, (L 2 -(Ln×S1) 2 ) 1 / 2 ,(L 2 -(Ln×S1) 2 ) 1 / 2 ), wherein in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between another third side and the endpoint of the side to be selected on the same side, L represents the search distance, S1 represents the vertical distance between the adjacent second sides, n is an integer and n={0,1,2,3…m-1}, and m represents the number of the second sides.

[0146] It should be noted that the sub-search area has two third sides, and the sub-search area is symmetrical with the perpendicular bisector of the side to be selected. Then, start and end each represent the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, and start and end are equal. Start and end do not need to be fixedly corresponding to any of the two third sides.

[0147] It should also be noted that n is an integer and n={0, 1, 2, 3…m-1}, which means that n corresponds one-to-one to the integers from 0 to m-1.

[0148] In this embodiment, each sub-search area is formed according to the coordinates (in, out, start, end), and no new coordinate definition is added. Instead, the original coordinate definition is used to form each sub-search area, which is beneficial to the operational compatibility of the search area.

[0149] In this embodiment, the first side of each sub-search area is located on the straight line where the to-be-selected side is located, and the vertical distance between the first side and the to-be-selected side is 0, that is, in is 0.

[0150] In this embodiment, L represents the search distance, and S1 represents the vertical distance between adjacent second sides. That is, the maximum length of the third side is L, and the difference of the length of the third side in an arithmetically decreasing manner is S1. Then, in each sub-search area, the length of the third side is Ln×S1. The sub-search area is a rectangle, and the length of the third side is the vertical distance between the second side and the side to be selected. The vertical distance between the second side and the side to be selected is Ln×S1, that is, out is Ln×S1.

[0151] In this embodiment, the radius of the second search area is the distance between the endpoint of the third side located on the arc side and the endpoint of the side to be selected on the same side. This distance is used as the hypotenuse, the third side is used as one of the right-angled sides, and the perpendicular distance between the third side and the endpoint of the side to be selected on the same side is used as the other right-angled side to construct a right triangle. Therefore, according to the Pythagorean theorem, the perpendicular distance between the third side and the endpoint of the side to be selected on the same side is calculated as (L 2 -(Ln×S1) 2 ) 1 / 2 , that is, both start and end are (L 2 -(Ln×S1) 2 ) 1 / 2 .

[0152] The search module 504 is configured to use the search area to perform a graphic search outside the pattern to be tested to check whether other design patterns appear in the search area.

[0153] The search area covers the set of points whose distance from the side to be selected is less than or equal to the search distance. In this embodiment, it is detected whether other design figures appear in the area where the side to be selected is less than or equal to the search distance.

[0154] Specifically, in this embodiment, the search module 504 is configured to use the sub-search areas to perform a pattern search on the outside of the pattern to be tested, to check whether other design patterns appear in the sub-search areas.

[0155] The edge selection module 505 selects the edge to be selected and used as the edge to be processed when other design graphics appear in the search area.

[0156] When other design graphics appear in the search area, the edge to be selected may easily cause a large deviation between the graphics formed on the wafer and the design graphics when it is subsequently formed on the wafer. In this case, the edge to be selected needs to be subsequently corrected. Therefore, when other design graphics appear in the search area, the edge to be selected is selected and used as the edge to be processed.

[0157] In this embodiment, the optical proximity correction system further includes: an etching deviation compensation module, configured to perform etching deviation compensation processing on the edge to be processed.

[0158] When other design patterns appear in the search area, after the photolithography and etching processes, the critical dimensions of the pattern formed on the wafer deviate from the critical dimensions of the pattern to be tested. By performing etching deviation compensation on the edge to be processed, the deviation that may be generated by the photolithography and etching processes is pre-compensated in the pattern to be tested, thereby improving the matching degree between the pattern formed on the wafer and the pattern to be tested after the photolithography and etching processes.

[0159] In this embodiment, the etching deviation compensation module is used to move the edge to be processed by a preset distance along a direction perpendicular to the edge to be processed, thereby compensating for the etching offset.

[0160] In this embodiment, the etching offset can be obtained from experimental data, and the preset distance corresponds to the etching offset.

[0161] In this embodiment, the optical proximity correction system may further include: an optical proximity correction module, configured to perform optical proximity effect correction on the pattern to be tested after performing etching deviation compensation on the edge to be processed.

[0162] After optical proximity correction is performed on the pattern to be tested, the obtained pattern is used to make a mask, and then a photolithography process is performed using the mask to form a corresponding mask pattern on a wafer.

[0163] In this embodiment, the optical proximity correction module is also used to perform optical proximity effect correction processing on the pattern to be tested when no other design patterns appear in the search area. The obtained pattern is used to make a mask plate, and the mask plate is used to perform a photolithography process to form a corresponding mask pattern on the wafer.

[0164] Figure 13 yes Figure 11 Functional block diagram of another embodiment of the middle search area setting module.

[0165] The differences between this embodiment and the above embodiment are as follows: in the search area setting module, the sub-search area is formed by determining the search distance and the vertical distance of the adjacent third side on the same side of the side to be selected.

[0166] refer to Figure 13 Each of the sub-search areas further has a third side perpendicular to the first side and the second side. The search area setting module 503 includes: a third distance setting unit 5035, configured to set a search distance, wherein the search distance is equal to a vertical distance from the second side farthest from the side to be selected to the side to be selected.

[0167] The search distance is a set distance for detecting the surrounding environment of the edge to be selected.

[0168] In this embodiment, the search distance is the length of the side perpendicular to the edge to be selected in the first search area. Since the second search area is fan-shaped, the length of the side perpendicular to the edge to be selected in the first search area is the vertical distance from the second edge farthest from the edge to be selected to the edge to be selected. Therefore, the search distance is equal to the vertical distance from the second edge farthest from the edge to be selected to the edge to be selected.

[0169] It should be noted that the sub-search area is rectangular. For the same sub-search area, the two sides perpendicular to the first side and the second side are equal in length and extend in the same direction. Therefore, the two sides perpendicular to the first side and the second side are both third sides. In other words, each sub-search area has two third sides.

[0170] In this embodiment, the search area setting module 503 further includes: a fourth distance setting unit 5036, configured to determine a vertical distance between adjacent third edges located on the same side of the edge to be selected according to the search distance.

[0171] In this embodiment, the radius of the second search area is equal to the length of the side perpendicular to the side to be selected in the first search area. Therefore, the radius of the second search area is also equal to the search distance. If all first sides are located on the straight line containing the side to be selected, the vertical distance of the adjacent third side located on the same side of the side to be selected is determined based on the search distance. In other words, the change in the length of the first side is determined. Thus, the vertical distance of the adjacent third side located on the same side of the side to be selected represents the graphical accuracy of the formed search area. The smaller the vertical distance of the adjacent third side located on the same side of the side to be selected, the higher the accuracy.

[0172] In this embodiment, the first search area is rectangular, and the sub-search area is also rectangular, and the sub-search area includes sub-search areas with the same shape and size as the first search area. Specifically, the first search area is one of the sub-search areas.

[0173] As an example, the sub-search area corresponding to the first search area is the sub-search area with the smallest first side length, and the lengths of the first sides in the remaining sub-search areas increase arithmetic progression based on the length of the first side with the smallest length.

[0174] It should be noted that the vertical distance between adjacent third sides located on the same side of the side to be selected should not be too large. If the vertical distance between adjacent third sides located on the same side of the side to be selected is too large, the distance between the endpoints on the same side of the adjacent second sides will be too large. Furthermore, if both endpoints of the second sides are on the arc edge of the second search zone, the missing arc edge between the endpoints on the same side of the adjacent second sides will be too long. Consequently, the gap between the sub-search zones corresponding to the adjacent second sides at the arc edge will be too large, which can easily make it difficult for all the sub-search zones to overlap to form a relatively complete fan-shaped second search zone. Consequently, the search zone will have difficulty covering the set of points whose distance from the side to be selected is less than or equal to the search distance, affecting the accuracy of subsequent side selection operations and, consequently, the correction accuracy of the optical proximity correction method. Therefore, in this embodiment, the vertical distance between adjacent third sides located on the same side of the side to be selected is greater than 0 and less than or equal to 1 nm.

[0175] In this embodiment, the search area setting module 503 further includes: a second number setting unit 5037, configured to determine the number of third sides located on the same side of the side to be selected based on the search distance and the vertical distance between the adjacent third sides located on the same side of the side to be selected.

[0176] The search distance is the maximum size of the distance between the endpoint of the first side and the endpoint of the side to be measured on the same side, and the vertical distance of the adjacent third side on the same side of the side to be selected is the difference in the arithmetically increasing length of the first side. Therefore, based on the search distance and the vertical distance of the adjacent third side on the same side of the side to be selected, that is, based on the maximum size of the distance between the endpoint of the first side and the endpoint of the side to be measured on the same side, and the difference in the arithmetically increasing length of the first side, the number of first sides, that is, the number of third sides on the same side of the side to be selected, can be calculated.

[0177] In this embodiment, the number of third sides located on the same side of the side to be selected, that is, the number of sub-search areas, is determined. Specifically, when the ratio of the search distance to the vertical distance of the adjacent third side located on the same side of the side to be selected is an integer, the number of second sides is equal to the ratio of the search distance to the vertical distance of the adjacent third side located on the same side of the side to be selected. When the ratio of the search distance to the vertical distance of the adjacent third side located on the same side of the side to be selected is a decimal, the number of second sides is equal to the ratio of the search distance to the vertical distance of the adjacent third side located on the same side of the side to be selected plus 1.

[0178] In this embodiment, the search area setting module 503 further includes: a second number setting unit 5038, which is used to determine the number of third edges located on the same side of the edge to be selected, and then set the coordinates (in, out, start, end) of each sub-search area to (0, (L 2 -(n×S2) 2 ) 1 / 2 , n×S2, n×S2), where in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between the other third side and the endpoint of the side to be selected on the same side, L represents the search distance, S2 represents the vertical distance between the adjacent third sides on the same side of the side to be selected, n is an integer and n={0,1,2,3…m-1}, and m represents the number of third sides on the same side of the side to be selected.

[0179] It should be noted that the sub-search area has two third sides, and the sub-search area is symmetrical with the perpendicular bisector of the side to be selected. Then, start and end each represent the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, and start and end are equal. Start and end do not need to be fixedly corresponding to any of the two third sides.

[0180] It should also be noted that n is an integer and n={0, 1, 2, 3…m-1} or n=L / S2, which means that n corresponds one-to-one to integers from 0 to m-1 and L / S2.

[0181] In this embodiment, each sub-search area is formed according to the coordinates (in, out, start, end), and no new coordinate definition is added. Instead, the original coordinate definition is used to form each sub-search area, which is beneficial to the operational compatibility of the search area.

[0182] In this embodiment, the first side of each sub-search area is located on the straight line where the to-be-selected side is located, and the vertical distance between the first side and the to-be-selected side is 0, that is, in is 0.

[0183] In this embodiment, S2 represents the vertical distance between the adjacent third side located on the same side of the to-be-selected side. That is, the difference in the length of the first side that increases arithmetic progression is S2. Then, in each of the sub-search areas, the vertical distance between the third side and the endpoint of the to-be-selected side on the same side is n×S2, that is, both start and end are n×S2.

[0184] In this embodiment, the radius R of the second search area is the distance between the endpoint of the third side located on the arc side and the endpoint of the side to be selected on the same side. The radius R of the second search area is equal to the search distance L. The search distance L is used as the hypotenuse, the third side is used as one of the right-angled sides, and the perpendicular distance between the third side and the endpoint of the side to be selected on the same side is used as the other right-angled side to construct a right triangle. Therefore, according to the Pythagorean theorem, the length of the third side is calculated as (L 2 -(n×S2) 2 ) 1 / 2 , the sub-search area is a rectangle, then the length of the third side is the vertical distance between the second side and the side to be selected, then the vertical distance between the second side and the side to be selected is (L 2 -(n×S2) 2 ) 1 / 2 , that is, out is (L 2 -(n×S2) 2 ) 1 / 2 .

[0185] Correspondingly, the present invention further provides a mask, comprising: a pattern obtained by using the optical proximity correction method provided by an embodiment of the present invention.

[0186] It can be seen from the above embodiment that the search area includes a rectangular first search area with the side to be selected as one of its sides, and a fan-shaped second search area located on both sides of the first search area and adjacent to the first search area. The center of the second search area coincides with the endpoint of the side to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side perpendicular to the side to be selected in the first search area. Then, the distance between any point on the arc side of the second search area and any point on the side of the first search area parallel to the side to be selected and the side to be selected is equal. The equal distance is used as the search distance, and the search area is the sum of the points whose distance from the side to be selected is less than or equal to the search distance. Compared with a solution in which the search area only includes a rectangular search area, the search area of ​​the embodiment of the present invention covers the set of points whose distance from the to-be-selected edge is less than or equal to the search distance, while reducing the probability of mistakenly covering points whose distance from the to-be-selected edge is greater than the search distance, which is conducive to more accurately judging whether other design graphics appear in the search area, so as to judge whether the to-be-selected edge is used as the edge to be processed, thereby facilitating more accurate edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method. Accordingly, after the mask pattern is formed on the wafer using a mask plate, the matching degree between the mask pattern formed on the wafer and the target pattern is improved.

[0187] The embodiment of the present invention further provides a device that can implement the optical proximity correction method provided by the embodiment of the present invention by loading the above optical proximity correction method in the form of a program. An optional hardware structure of the terminal device provided by the embodiment of the present invention can be as follows Figure 14 As shown, it includes: at least one processor 01, at least one communication interface 02, at least one memory 03 and at least one communication bus 04.

[0188] In this embodiment, the number of processor 01, communication interface 02, memory 03, and communication bus 04 is at least one, and the processor 01, communication interface 02, and memory 03 communicate with each other via the communication bus 04. The communication interface 02 can be an interface of a communication module for network communication, such as an interface of a GSM module. The processor 01 can be a central processing unit (CPU), or an application-specific integrated circuit (ASIC), or one or more integrated circuits configured to implement the embodiments of the present invention. The memory 03 can include a high-speed RAM memory, or can also include a non-volatile memory (NVM), such as at least one disk storage. The memory 03 stores one or more computer instructions, which are executed by the processor 01 to implement the optical proximity correction method provided in the embodiments of the present invention.

[0189] It should be noted that the above-mentioned terminal device may also include other devices (not shown) that may not be necessary for understanding the contents disclosed in the embodiments of the present invention; given that these other devices may not be necessary for understanding the contents disclosed in the embodiments of the present invention, the embodiments of the present invention will not introduce them one by one.

[0190] An embodiment of the present invention further provides a storage medium storing one or more computer instructions, wherein the one or more computer instructions are used to implement the optical proximity correction method provided by the embodiment of the present invention.

[0191] In the optical proximity correction method provided by an embodiment of the present invention, the search area includes a rectangular first search area with the side to be selected as one side, and a fan-shaped second search area located on both sides of the first search area and adjacent to the first search area. The center of the second search area coincides with the endpoint of the side to be selected on the same side, and the central angle is 90 degrees. The radius of the second search area is equal to the length of the side perpendicular to the side to be selected in the first search area. Then, any point on the arc side of the second search area and any point on the side of the first search area parallel to the side to be selected are equal to the distance from the side to be selected. Taking the equal distance as the search distance, the search area The search area is a collection of points whose distance from the edge to be selected is less than or equal to the search distance. Compared with a solution in which the search area only includes a rectangular search area, the search area of ​​the embodiment of the present invention covers the collection of points whose distance from the edge to be selected is less than or equal to the search distance, while reducing the probability of mistakenly covering points whose distance from the edge to be selected is greater than the search distance. This is conducive to more accurately determining whether other design figures appear in the search area, so as to determine whether the edge to be selected is used as the edge to be processed. This is conducive to more accurate edge selection in the optical proximity correction method, thereby improving the correction accuracy of the optical proximity correction method.

[0192] The embodiments of the present invention described above are combinations of elements and features of the present invention. Unless otherwise mentioned, the elements or features may be considered as optional. Each element or feature may be put into practice without being combined with other elements or features. In addition, the embodiments of the present invention may be constructed by combining some elements and / or features. The order of operations described in the embodiments of the present invention may be rearranged. Some configurations of any one embodiment may be included in another embodiment and may be replaced by the corresponding configuration of another embodiment. It is obvious to those skilled in the art that claims that do not have a clear reference relationship to each other in the appended claims may be combined into embodiments of the present invention, or may be included as new claims in amendments after submitting this application.

[0193] The embodiments of the present invention can be implemented by various means such as hardware, firmware, software or a combination thereof. In a hardware configuration, the method according to the exemplary embodiment of the present invention can be implemented by one or more application specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, etc. In a firmware or software configuration, the embodiments of the present invention can be implemented in the form of modules, processes, functions, etc. The software code can be stored in a memory unit and executed by a processor. The memory unit is located inside or outside the processor and can send data to the processor and receive data from the processor via various known means.

[0194] The above description of the disclosed embodiments will enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein, but is to be construed in the widest possible manner consistent with the principles and novel features disclosed herein.

[0195] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be based on the scope defined by the claims.

Claims

1. An optical proximity correction method, characterized in that: include: Providing a plurality of design patterns, wherein the design patterns include a pattern to be tested; Selecting an edge to be detected in the graph to be tested as an edge to be selected; Obtaining a search area corresponding to the edge to be selected outside the figure to be measured, the search area including a rectangular first search area having the edge to be selected as one side thereof, and sector-shaped second search areas located on both sides of the first search area and adjacent to the first search area, wherein the center of the second search area coincides with the endpoint of the edge to be selected on the same side, and the central angle is 90 degrees, and the radius of the second search area is equal to the length of a side of the first search area that is perpendicular to the edge to be selected; Using the search area to perform a graphic search outside the pattern to be tested to check whether other design patterns appear in the search area; When other design graphics appear in the search area, the edge to be selected is selected and used as the edge to be processed.

2. The optical proximity correction method according to claim 1, wherein: In the step of obtaining the search area corresponding to the edge to be selected, the search area is composed of a plurality of overlapping rectangular sub-search areas, wherein each of the sub-search areas has a first side located on the straight line on which the edge to be selected is located, a perpendicular bisector of the first side coincides with the perpendicular bisector of the edge to be selected, and each of the sub-search areas further has a second side parallel to the first side, with endpoints of the second side both located on an arc edge of the second search area; The step of using the search area to perform a pattern search on the outside of the pattern to be tested includes: using the sub-search areas to perform a pattern search on the outside of the pattern to be tested respectively, and checking whether other design patterns appear in the sub-search areas.

3. The optical proximity correction method according to claim 2, wherein: Each of the sub-search areas further has a third side perpendicular to the first side and the second side, and the step of obtaining the search area corresponding to the side to be selected outside the pattern to be measured includes: Setting a search distance, wherein the search distance is equal to a vertical distance from a second side farthest from the side to be selected to the side to be selected; determining a vertical distance between adjacent second sides according to the search distance; determining the number of second sides according to the search distance and the perpendicular distance between adjacent second sides; After determining the number of the second side, set the coordinates (in, out, start, end) of each sub-search area to (0, Ln×S1, (L 2 -(Ln×S1) 2 ) 1 / 2 ,(L 2 -(Ln×S1) 2 ) 1 / 2 ), wherein in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between another third side and the endpoint of the side to be selected on the same side, L represents the search distance, S1 represents the vertical distance between the adjacent second sides, n is an integer and n={0,1,2,3…m-1}, and m represents the number of the second sides.

4. The optical proximity correction method according to claim 2, wherein: Each of the sub-search areas further has a third side perpendicular to the first side and the second side, and the step of obtaining the search area corresponding to the side to be selected outside the pattern to be measured includes: Setting a search distance, wherein the search distance is equal to a vertical distance from a second side farthest from the side to be selected to the side to be selected; Determining, based on the search distance, a vertical distance between adjacent third sides located on the same side as the side to be selected; determining the number of third edges located on the same side of the edge to be selected based on the search distance and the vertical distance between adjacent third edges located on the same side of the edge to be selected; After determining the number of third edges on the same side of the edge to be selected, set the coordinates (in, out, start, end) of each sub-search area to (0, (L 2 -(n×S2) 2 ) 1 / 2 , n×S2, n×S2), where in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between the other third side and the endpoint of the side to be selected on the same side, L represents the search distance, S2 represents the vertical distance between the adjacent third sides on the same side of the side to be selected, n is an integer and n={0,1,2,3…m-1}, and m represents the number of third sides on the same side of the side to be selected.

5. The optical proximity correction method according to claim 3, wherein: In the step of determining the vertical distance between adjacent second sides, the vertical distance between adjacent second sides is greater than 0 and less than or equal to 1 nm.

6. The optical proximity correction method according to claim 4, wherein: In the step of determining the vertical distance between the adjacent third sides located on the same side of the side to be selected, the vertical distance between the adjacent third sides located on the same side of the side to be selected is greater than 0 and less than or equal to 1 nm.

7. The optical proximity correction method according to claim 1, wherein: After the edge to be selected is selected and used as the edge to be processed, the optical proximity correction method further includes: performing etching deviation compensation processing on the edge to be processed.

8. The optical proximity correction method according to claim 7, wherein: The etching deviation compensation process includes: moving the edge to be processed by a preset distance along a direction perpendicular to the edge to be processed.

9. The optical proximity correction method according to claim 8, wherein: The optical proximity correction method further comprises: performing optical proximity effect correction processing on the pattern to be tested when no other design pattern appears in the search area; Alternatively, after performing etching deviation compensation processing on the edge to be processed, the optical proximity correction method further includes: performing optical proximity effect correction processing on the pattern to be tested.

10. An optical proximity correction system, characterized in that: include: A graphics providing module, configured to provide a plurality of design graphics, wherein the design graphics include a test graphic to be tested; A selection module, configured to select an edge to be detected in the graph to be tested as an edge to be selected; a search area setting module, configured to obtain a search area corresponding to the edge to be selected outside the graph to be tested, the search area comprising a rectangular first search area having the edge to be selected as one side thereof, and sector-shaped second search areas located on both sides of the first search area and adjacent to the first search area, the center of the second search area coinciding with the endpoint of the edge to be selected on the same side, with a central angle of 90 degrees, and a radius of the second search area equal to the length of a side of the first search area perpendicular to the edge to be selected; A search module, configured to use the search area to perform a graphic search outside the graphic to be tested, to check whether other design graphics appear in the search area; The edge selection module is used to select the edge to be selected and use it as the edge to be processed when other design graphics appear in the search area.

11. The optical proximity correction system of claim 10, wherein: In the search area setting module, the search area is composed of a plurality of rectangular sub-search areas superimposed on each other, wherein each of the sub-search areas has a first side located on the straight line on which the side to be selected is located, and a perpendicular bisector of the first side coincides with the perpendicular bisector of the side to be selected; each of the sub-search areas also has a second side parallel to the first side, and endpoints of the second side are both located on an arc edge of the second search area; The search module is used to perform a pattern search on the outside of the pattern to be tested using the sub-search areas respectively to check whether other design patterns appear in the sub-search areas.

12. The optical proximity correction system of claim 11, wherein: Each of the sub-search areas further has a third side perpendicular to the first side and the second side, and the search area setting module includes: A first distance setting unit is configured to set a search distance, wherein the search distance is equal to a vertical distance from a second side farthest from the side to be selected to the side to be selected; a second distance setting unit, configured to determine a vertical distance between adjacent second sides according to the search distance; a first number setting unit, configured to determine the number of the second sides according to the search distance and a vertical distance between adjacent second sides; The first coordinate setting unit is used to set the coordinates (in, out, start, end) of each sub-search area to (0, Ln×S1, (L 2 -(Ln×S1) 2 ) 1 / 2 ,(L 2 -(Ln×S1) 2 )1 / 2), wherein in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between the other third side and the endpoint of the side to be selected on the same side, L represents the search distance, S1 represents the vertical distance between the adjacent second sides, n is an integer and n={0,1,2,3…m-1}, and m represents the number of the second sides.

13. The optical proximity correction system of claim 11, wherein: Each of the sub-search areas further has a third side perpendicular to the first side and the second side, and the search area setting module includes: a third distance setting unit, configured to set a search distance, wherein the search distance is equal to a vertical distance from a second side farthest from the side to be selected to the side to be selected; a fourth distance setting unit, configured to determine, based on the search distance, a vertical distance between adjacent third edges located on the same side of the edge to be selected; a second number setting unit, configured to determine the number of third sides located on the same side of the side to be selected based on the search distance and a vertical distance between adjacent third sides located on the same side of the side to be selected; The second coordinate setting unit is used to set the coordinates (in, out, start, end) of each sub-search area to (0, (L 2 -(n×S2) 2 ) 1 / 2 , n×S2, n×S2), where in represents the vertical distance between the first side and the side to be selected, out represents the vertical distance between the second side and the side to be selected, start represents the vertical distance between one of the third sides and the endpoint of the side to be selected on the same side, end represents the vertical distance between the other third side and the endpoint of the side to be selected on the same side, L represents the search distance, S2 represents the vertical distance between the adjacent third sides on the same side of the side to be selected, n is an integer and n={0,1,2,3…m-1}, and m represents the number of third sides on the same side of the side to be selected.

14. The optical proximity correction system of claim 10, wherein: The optical proximity correction system further includes an etching deviation compensation module, which is used to perform etching deviation compensation processing on the edge to be processed.

15. A mask, characterized in that: include: A pattern obtained using the optical proximity correction method according to any one of claims 1 to 9.

16. A terminal device, characterized in that: The optical proximity correction method comprises at least one memory and at least one processor, wherein the memory stores one or more computer instructions, wherein the one or more computer instructions are executed by the processor to implement the optical proximity correction method according to any one of claims 1 to 9.

17. A storage medium, characterized in that: The storage medium stores one or more computer instructions, and the one or more computer instructions are used to implement the optical proximity correction method according to any one of claims 1 to 9.

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