A method, device, equipment and medium for calibrating the position of a sensor

Abstract

The present invention discloses a method, device, equipment and medium for calibrating the position of a sensor. The method for calibrating the position of the sensor includes: after the current pattern array moves into the sensor field of view, calibrating the focal plane of the sensor; after calibrating the focal plane of the sensor, obtaining a partial map of the pattern array captured by the sensor and determining a target feature pattern that matches the partial map of the pattern array; determining a position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtaining the nominal position of the substrate of the target feature pattern on the substrate; and determining horizontal calibration data that matches the current pattern array according to the position to be calibrated and the nominal position of the substrate. The technical solution of the embodiment of the present invention improves the efficiency of sensor position calibration and reduces the labor cost.

Description

Technical Field

[0001] The present invention relates to the technical field of calibration, and particularly to a method, device, equipment and medium for calibrating the position of a sensor. Background Art

[0002] Concepts such as "Moore's Law" have led to continuous improvement of the process technology nodes in the IC (Integrated Circuit Chip) industry. Among them, lithography technology is one of the main technologies supporting the continuous development of ICs. In the process of lithography, the integration of overlay equipment requires calibration of the sensor position to ensure the chip yield.

[0003] When calibrating the sensor position, due to the mutual influence of calibration contents, it depends on manual operation, and a large range of markers need to be searched during calibration, resulting in the problems of low calibration efficiency and high labor cost in the existing sensor position calibration. Summary of the Invention

[0004] The present invention provides a method, device, equipment and medium for calibrating the position of a sensor to solve the problems of low calibration efficiency and high labor cost of the sensor position calibration.

[0005] According to one aspect of the present invention, there is provided a method for calibrating the position of a sensor, including:

[0006] After the current pattern array moves into the sensor field of view, calibrate the sensor focal plane;

[0007] After the sensor focal plane is calibrated, obtain a local map of the pattern array captured by the sensor, and determine a target feature pattern that matches the local map of the pattern array;

[0008] Determine the position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate;

[0009] According to the position to be calibrated and the nominal position of the substrate, determine horizontal calibration data that matches the current pattern array; the horizontal calibration data is used to describe the horizontal offset of the calibrated sensor.

[0010] According to another aspect of the present invention, there is provided a device for calibrating the position of a sensor, including:

[0011] A focal plane calibration module, configured to calibrate the sensor focal plane after the current pattern array moves into the sensor field of view;

[0012] A target feature pattern determination module, configured to obtain a local map of the pattern array captured by the sensor and determine a target feature pattern that matches the local map of the pattern array after the sensor focal plane is calibrated;

[0013] A position determination module, configured to determine a position to be calibrated when a target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate;

[0014] A horizontal calibration data determination module, configured to determine horizontal calibration data matching the current pattern array according to the position to be calibrated and the nominal position of the substrate; the horizontal calibration data is used to describe the horizontal calibration offset of the sensor.

[0015] According to another aspect of the present invention, there is provided an electronic device, including:

[0016] At least one processor; and

[0017] A memory communicatively connected to the at least one processor; wherein,

[0018] The memory stores a computer program executable by the at least one processor, and the computer program is executed by the at least one processor so that the at least one processor can execute the sensor position calibration method according to any embodiment of the present invention.

[0019] According to another aspect of the present invention, there is provided a computer-readable storage medium storing computer instructions for implementing the sensor position calibration method according to any embodiment of the present invention when executed by a processor.

[0020] The technical solution of the embodiment of the present invention moves the current pattern array to the sensor field of view and calibrates the sensor focal plane. Then, after the sensor focal plane is calibrated, a partial view of the pattern array captured by the sensor is obtained, and a target feature pattern matching the partial view of the pattern array is determined. Thus, the position to be calibrated when the target feature pattern is located at the center of the sensor field of view is determined, and the nominal position of the target feature pattern on the substrate is obtained. Further, according to the position to be calibrated and the nominal position of the substrate, horizontal calibration data matching the current pattern array is determined. This solution determines horizontal calibration data matching the current pattern array based on the position to be calibrated and the nominal position of the substrate after the sensor focal plane is calibrated, which can ensure that, on the premise of clear imaging in the sensor field of view, data for compensating the observation error is determined based on the position to be calibrated and the nominal position of the substrate, that is, horizontal calibration data matching the current pattern array is obtained. Therefore, after the sensor is position-calibrated based on the horizontal calibration data, the sensor can accurately observe the image of the required observation position, avoiding observation errors, solving the problems of low calibration efficiency and high labor cost existing in the existing sensor position calibration, improving the efficiency of sensor position calibration, and reducing the labor cost.

[0021] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present invention, nor is it used to limit the scope of the present invention. Other features of the present invention will become readily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0023] Figure 1 is a flowchart of a method for calibrating the position of a sensor provided in the first embodiment of the present invention;

[0024] Figure 2 is a relationship diagram between an exposure field and a pattern array provided in the first embodiment of the present invention;

[0025] Figure 3 is a schematic diagram of pattern elements in a pattern array provided in the first embodiment of the present invention;

[0026] Figure 4 is a flowchart of a method for calibrating the position of a sensor provided in the second embodiment of the present invention;

[0027] Figure 5 is a schematic diagram of the position calibration process of a sensor provided in the second embodiment of the present invention;

[0028] Figure 6 is a schematic structural diagram of a device for calibrating the position of a sensor provided in the third embodiment of the present invention;

[0029] Figure 7 shows a schematic structural diagram of an electronic device that can be used to implement the embodiments of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0030] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0031] It should be noted that the terms "current" and "target" in the description, claims and the above-mentioned drawings of the present invention are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present invention described here can be implemented in an order other than those illustrated or described here. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0032] Embodiment 1

[0033] Figure 1 is a flowchart of a sensor position calibration method provided in Embodiment 1 of the present invention. This embodiment is applicable to the situation of efficiently calibrating the position of a sensor. This method can be executed by a sensor position calibration device, which can be implemented in the form of hardware and / or software, and the sensor position calibration device can be configured in an electronic device. As Figure 1 shown, the method includes:

[0034] S110. After the current pattern array moves into the sensor's field of view, calibrate the sensor's focal plane.

[0035] Among them, the sensor's field of view can be used to represent the visual field range of the sensor. The current pattern array can be a pattern array that moves into the visual field range of the sensor. Optionally, a pattern array can be fabricated in each exposure field on a silicon wafer substrate, and the pattern elements that make up the pattern array can be composed of rectangles and preset patterns within the rectangles. The sensor's focal plane can be the focal plane where the camera in the sensor can form a clear image.

[0036] Figure 2 is a relationship diagram of an exposure field and a pattern array provided in Embodiment 1 of the present invention. As Figure 2 shown, a pattern array can be fabricated in one exposure field on a silicon wafer substrate (abbreviated as the substrate), Figure 2 The specific composition of the pattern elements in the pattern array is not shown in.

[0037] Figure 3It is a schematic diagram of a pattern element in a pattern array provided in the first embodiment of the present invention. There is a characteristic pattern at the center of each pattern element that makes up the pattern array. In addition to the characteristic pattern, the pattern element also includes a position information pattern. Among them, the characteristic pattern can be a hollow "+" pattern, and the position information pattern can be a hollow "x" pattern, a two-dimensional code, or the like. The position information pattern can be a pattern different from the characteristic pattern, or can be a number, a letter, or a Chinese character. Generally, the size of the pattern array is determined by the mechanical assembly error to ensure that the pattern array can be within the sensor's field of view. The size of the pattern element is determined by the size of the sensor's field of view to ensure that at least one characteristic pattern and at most 4 (which can be adjusted according to specific circumstances) characteristic patterns are captured within the sensor's field of view.

[0038] Among them, the position information pattern can be used to identify the position information of the pattern element in the pattern array. Optionally, the number of characteristic patterns can be used to represent the position information of the pattern element in the pattern array, or the graphic features of the position information pattern can be used to represent the position information of the pattern element in the pattern array.

[0039] In the embodiment of the present invention, the current pattern array can be moved under the sensor's field of view, and the sensor's focal plane can be calibrated according to the clarity of the image captured by the sensor's field of view, so that the sensor can clearly capture the pattern elements in the current pattern array.

[0040] S120. After the sensor's focal plane is calibrated, obtain a partial view of the pattern array captured by the sensor and determine the target characteristic pattern that matches the partial view of the pattern array.

[0041] Among them, the partial view of the pattern array can be a partial image of the current pattern array captured by the sensor's field of view. The target characteristic pattern can be the characteristic pattern at the center position of a pattern element in the partial view of the pattern array. A characteristic pattern is arranged at the center of each pattern element for calibrating the sensor's position.

[0042] In the embodiment of the present invention, after the sensor's focal plane is calibrated, the characteristic pattern in the partial view of the pattern array captured by the sensor can be determined. When the pattern elements in the partial view of the pattern array are not unique, the sensor can identify multiple characteristic patterns from the various pattern elements in the partial view of the pattern array, and then screen out one characteristic pattern from the multiple characteristic patterns according to the matching algorithm as the target characteristic pattern that matches the partial view of the pattern array. When the pattern element in the partial view of the pattern array is unique, the sensor can identify one characteristic pattern from the pattern element and use this identified characteristic pattern as the target characteristic pattern that matches the partial view of the pattern array.

[0043] S130. Determine the position to be calibrated when the target feature pattern is located at the center of the sensor's field of view, and obtain the nominal position of the target feature pattern on the substrate.

[0044] Among them, the position to be calibrated can be the position on the substrate corresponding to the center of the sensor's field of view when the target feature pattern is located at the center of the sensor's field of view. The nominal position of the substrate can be used to represent the position of the target feature pattern on the substrate.

[0045] In the embodiment of the present invention, the target feature pattern can be made to be located at the center of the sensor's field of view by moving the workbench carrying the substrate. When the target feature pattern is located at the center of the sensor's field of view, the position on the substrate corresponding to the center of the sensor's field of view is determined according to the position information pattern matching the target feature pattern, the position to be calibrated is obtained, and the nominal position of the target feature pattern on the substrate is obtained.

[0046] S140. Determine the horizontal calibration data matching the current pattern array according to the position to be calibrated and the nominal position of the substrate.

[0047] Among them, the horizontal calibration data can be used to describe the horizontal offset of the calibrated sensor, that is, the distance for calibrating the sensor to capture the pattern at a specific position on the substrate. The horizontal offset can include the lateral (horizontal) offset and the longitudinal (vertical) offset in the two-dimensional coordinates of the plane parallel to the horizontal plane where the substrate is located.

[0048] In the embodiment of the present invention, the position deviation between the nominal position of the substrate and the position to be calibrated on the substrate can be calculated, and then the calculated position deviation is used as the horizontal calibration data matching the current pattern array, so that automatic position calibration can be performed when the sensor observes the pattern at a specific position on the substrate according to the horizontal offset, enabling the sensor to accurately align with the pattern at a specific position on the substrate and avoiding observation errors.

[0049] Generally, sensor calibration occurs during the device integration stage and after the device replaces the hardware, so the efficiency of sensor calibration will directly affect the efficiency of device integration and recovery. Since this solution can quickly and automatically perform sensor focal plane calibration and position calibration on the sensor, only the target feature pattern matching the local map of the pattern array needs to be determined, and there is no need for manual intervention to search for large-scale markers, which can improve the efficiency of device integration and recovery.

[0050] In the technical solution of the embodiment of the present invention, by moving the current pattern array to the sensor field of view and calibrating the sensor focal plane, after the sensor focal plane is calibrated, a partial map of the pattern array captured by the sensor is obtained, and a target feature pattern matching the partial map of the pattern array is determined, so as to determine the position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the substrate of the target feature pattern on the substrate. Further, according to the position to be calibrated and the nominal position of the substrate, the horizontal calibration data matching the current pattern array is determined. After the sensor focal plane is calibrated in this solution, based on the position to be calibrated and the nominal position of the substrate, the horizontal calibration data matching the current pattern array is determined, which can ensure that, on the premise of clear imaging in the sensor field of view, based on the position to be calibrated and the nominal position of the substrate, the data for compensating the observation error is determined, that is, the horizontal calibration data matching the current pattern array is obtained. Thus, after the sensor is position-calibrated based on the horizontal calibration data, the sensor can accurately observe the image of the required observation position, avoid the observation error, solve the problems of low calibration efficiency and high labor cost existing in the existing sensor position calibration, improve the efficiency of sensor position calibration, and reduce the labor cost.

[0051] Embodiment 2

[0052] Figure 4 It is a flowchart of a sensor position calibration method provided by Embodiment 2 of the present invention. This embodiment is specific based on the above embodiment and gives a specific optional implementation manner for making the target feature pattern located at the center of the sensor field of view before determining the position to be calibrated when the target feature pattern is located at the center of the sensor field of view. As Figure 4 shown, the method includes:

[0053] S210. After the current pattern array is moved to the sensor field of view, calibrate the sensor focal plane.

[0054] S220. After the sensor focal plane is calibrated, obtain a partial map of the pattern array captured by the sensor, and determine a target feature pattern matching the partial map of the pattern array.

[0055] S230. Generate a workbench adjustment instruction according to the position of the target feature pattern in the sensor field of view.

[0056] Among them, the workbench adjustment instruction may be an instruction to move the substrate position on the workbench to align the center of the sensor field of view with the target feature pattern.

[0057] In the embodiment of the present invention, according to the position of the target feature pattern in the sensor field of view, the position that the substrate on the workbench needs to be adjusted when aligning the center of the sensor field of view with the target feature pattern can be determined, and then a workbench adjustment instruction is generated according to the position that the substrate needs to be adjusted.

[0058] S240. Adjust the position of the substrate on the workbench through the workbench adjustment instruction so that the target feature pattern is located at the center of the sensor field of view.

[0059] In an embodiment of the present invention, the position of the substrate can be adjusted by the workbench according to the workbench adjustment instruction, so that the center of the sensor field of view is aligned with the target feature pattern, that is, the target feature pattern is located at the center of the sensor field of view.

[0060] S250. Determine the position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate.

[0061] In an alternative embodiment of the present invention, determining the position to be calibrated when the target feature pattern is located at the center of the sensor field of view may include: when the target feature pattern is located at the center of the sensor field of view, obtaining the horizontal position of the vertical projection of the sensor field of view center on the substrate; taking the horizontal position of the vertical projection of the sensor field of view center on the substrate as the position to be calibrated when the target feature pattern is located at the center of the sensor field of view.

[0062] Among them, the horizontal position may be the position in the two-dimensional coordinate system on the horizontal plane of the substrate.

[0063] In an embodiment of the present invention, when the center of the sensor field of view is aligned with the target feature pattern, the horizontal position of the projection point on the substrate when the center of the sensor field of view is vertically projected onto the substrate can be further obtained, and then the horizontal position of the vertical projection of the sensor field of view center on the substrate is taken as the position to be calibrated when the target feature pattern is located at the center of the sensor field of view.

[0064] In an alternative embodiment of the present invention, before obtaining the horizontal position of the vertical projection of the sensor field of view center on the substrate, it may further include: obtaining the sensor pose adjustment parameter; adjusting the position of the sensor field of view center according to the sensor pose adjustment parameter, and obtaining the sensor pose field data; calibrating the sensor pose according to the sensor pose field data.

[0065] Among them, the sensor position adjustment parameter may be preset data for determining the current pose state of the sensor. Optionally, the sensor position adjustment parameter may include, but is not limited to, data for horizontally shifting the sensor field of view left by a preset distance, horizontally shifting right by a preset distance, horizontally shifting up by a preset distance, and / or horizontally shifting down by a preset distance. The sensor pose field data may be image data captured by the sensor within the field of view range after adjusting the position according to the sensor position adjustment parameter.

[0066] In an embodiment of the present invention, in order to ensure that the sensor is in a normal rotation posture state, sensor rotation posture adjustment parameters can be preset in advance. Then, according to the sensor rotation posture adjustment parameters, the position of the base is adjusted by using the workbench to realize the adjustment of the center position of the sensor field of view. After that, after the center position of the sensor field of view is adjusted, sensor rotation posture field data is obtained. Then, the sensor rotation posture field data is analyzed, and the posture of the sensor is calibrated according to the offset between the current rotation posture of the sensor and the normal rotation posture.

[0067] S260. Determine horizontal calibration data matching the current pattern array according to the position to be calibrated and the nominal position of the base.

[0068] In an alternative embodiment of the present invention, obtaining the nominal position of the base of the target feature pattern may include: determining a target position information pattern matching the target feature pattern; determining the target array position of the target feature pattern in the current pattern array according to the target position information pattern; and determining the nominal position of the base of the target feature pattern in the base according to the target array position.

[0069] Among them, the target position information pattern and the target feature pattern belong to the same pattern element. The target position information pattern may be a pattern arranged in the pattern element to which the target feature pattern belongs except the target feature pattern. The target array position may be the array position of the pattern element to which the target feature pattern belongs in the current pattern array. For example, the current pattern array is a 3*3 pattern array, that is, it includes 3 rows and 3 columns of pattern elements. The array position of the pattern element in the upper left corner of the current pattern array is (1,1), and the array position of the pattern element in the central area of the current pattern array is (2,2).

[0070] Exemplarily, m target position information patterns are evenly placed horizontally in the pattern element, and n target position information patterns are evenly placed vertically. Assume that the reflectivity of the target position information pattern in the x-th row and y-th column is significantly different from that of other target position information patterns. Then, the array position of the pattern element can be determined according to the row number and column number of the target position information patterns with different reflectivities. Assume that the reflectivity of the target position information pattern in the 1st row and 1st column is significantly different from that of other target position information patterns. Then, the target array position of the target feature pattern in the current pattern array can be determined as (1,1). It can be understood that when the target position information pattern is a number or a Chinese character, the target array position of the target feature pattern in the current pattern array can be obtained by direct reading.

[0071] In an embodiment of the present invention, it is possible to determine a target position information pattern that belongs to the same pattern element as the target feature pattern, that is, to determine a target position information pattern that matches the target feature pattern, and further obtain the array position of the pattern element identified by the target position information pattern, so as to obtain the target array position of the target feature pattern in the current pattern array, and thus query the nominal position of the target feature pattern on the substrate according to the target array position.

[0072] In an alternative embodiment of the present invention, the sensor position calibration method may further include: sequentially moving a plurality of pattern arrays into the sensor field of view, and obtaining horizontal calibration data that matches each pattern array; calculating horizontal equilibrium calibration data according to the horizontal calibration data that matches each pattern array; and calibrating the position of the sensor according to the horizontal equilibrium calibration data.

[0073] Among them, the horizontal equilibrium calibration data can be used to represent the mean value of each horizontal calibration data.

[0074] In an embodiment of the present invention, a plurality of pattern arrays can be sequentially moved into the sensor field of view, and according to the sensor position calibration method in any embodiment, the horizontal calibration data that matches each pattern array can be respectively determined. Then, the horizontal calibration data that matches each pattern array is added up and averaged to obtain horizontal equilibrium calibration data, so as to calibrate the position of the sensor based on the horizontal equilibrium calibration data.

[0075] In an alternative embodiment of the present invention, calibrating the position of the sensor according to the horizontal equilibrium calibration data may include: obtaining the nominal position of the target pattern array on the substrate; and calibrating the position of the sensor according to the nominal position of the target pattern array on the substrate and the horizontal equilibrium calibration data.

[0076] Among them, the target pattern array may be a pattern array that the sensor needs to accurately observe. The nominal position of the target pattern array on the substrate may be the position of the center of the target pattern array on the substrate.

[0077] In an embodiment of the present invention, after determining the target pattern array that the sensor needs to accurately observe, the nominal position of the target pattern array on the substrate can be obtained, so as to determine the movement path of the substrate on the workbench according to the nominal position of the target pattern array on the substrate, the horizontal equilibrium calibration data, and the position to be calibrated. Then, according to the movement path of the substrate, the workbench is used to move the substrate to the final position to achieve the position calibration of the sensor.

[0078] Optionally, the movement path of the sensor when the center of the sensor is aligned with the nominal position of the target pattern array on the substrate can be determined according to the nominal position of the target pattern array on the substrate, the horizontal equilibrium calibration data, and the position to be calibrated, so as to move the position of the sensor according to the movement path of the sensor to achieve the position calibration of the sensor.

[0079] Figure 5 It is a schematic diagram of a position calibration process of a sensor provided in the second embodiment of the present invention. As Figure 5 shown, the center position of the pattern array can be calculated first, and then the center position of the pattern array can be used as the nominal position of the substrate target. Then, the focal plane calibration and rotation attitude calibration of the sensor are performed. Then, the horizontal calibration data matching the current pattern array is determined. According to the horizontal calibration data matching the current pattern array, the nominal position of the substrate target, and the position to be calibrated, the position of the sensor is calibrated.

[0080] The technical solution of the embodiment of the present invention calibrates the focal plane of the sensor after the current pattern array moves into the sensor field of view. Then, after the focal plane calibration of the sensor, a partial map of the pattern array captured by the sensor is obtained, and a target feature pattern matching the partial map of the pattern array is determined. Thus, according to the position of the target feature pattern in the sensor field of view, a workbench adjustment instruction is generated. Further, through the workbench adjustment instruction, the position of the substrate on the workbench is adjusted so that the target feature pattern is located at the center of the sensor field of view, and the position to be calibrated when the target feature pattern is located at the center of the sensor field of view is determined, and the nominal position of the substrate of the target feature pattern is obtained. Thus, according to the position to be calibrated and the nominal position of the substrate, the horizontal calibration data matching the current pattern array is determined. This solution determines the horizontal calibration data matching the current pattern array based on the position to be calibrated and the nominal position of the substrate after the focal plane calibration of the sensor. It can ensure that, on the premise of clear imaging in the sensor field of view, the data for compensating the observation error is determined based on the position to be calibrated and the nominal position of the substrate, that is, the horizontal calibration data matching the current pattern array is obtained. Thus, after the position of the sensor is calibrated based on the horizontal calibration data, the sensor can accurately observe the image of the required observation position, avoid observation errors, solve the problems of low calibration efficiency and high labor cost existing in the existing sensor position calibration, improve the efficiency of sensor position calibration, and reduce the labor cost.

[0081] Embodiment 3

[0082] Figure 6 It is a schematic structural diagram of a sensor position calibration device provided in the third embodiment of the present invention. As Figure 6 shown, the device includes a focal plane calibration module 310, a target feature pattern determination module 320, a position determination module 330, and a horizontal calibration data determination module 340, wherein,

[0083] The focal plane calibration module 310 is configured to calibrate the focal plane of the sensor after the current pattern array moves into the sensor field of view;

[0084] A target feature pattern determination module 320, configured to obtain a local map of a pattern array captured by a sensor after the sensor focal plane is calibrated, and determine a target feature pattern that matches the local map of the pattern array;

[0085] A position determination module 330, configured to determine a position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate;

[0086] A horizontal calibration data determination module 340, configured to determine horizontal calibration data that matches the current pattern array according to the position to be calibrated and the nominal position of the substrate; the horizontal calibration data is used to describe the horizontal calibration offset of the sensor.

[0087] The technical solution of the embodiment of the present invention moves the current pattern array to the sensor field of view and calibrates the sensor focal plane. Then, after the sensor focal plane is calibrated, a local map of the pattern array captured by the sensor is obtained, and a target feature pattern that matches the local map of the pattern array is determined. Thus, the position to be calibrated when the target feature pattern is located at the center of the sensor field of view is determined, and the nominal position of the target feature pattern on the substrate is obtained. Further, according to the position to be calibrated and the nominal position of the substrate, the horizontal calibration data that matches the current pattern array is determined. This solution determines the horizontal calibration data that matches the current pattern array based on the position to be calibrated and the nominal position of the substrate after the sensor focal plane is calibrated, which can ensure that, on the premise of clear imaging in the sensor field of view, data for compensating for the observation error is determined based on the position to be calibrated and the nominal position of the substrate, that is, the horizontal calibration data that matches the current pattern array is obtained. Therefore, after the sensor is position-calibrated based on the horizontal calibration data, the sensor can accurately observe the image of the required observation position, avoid observation errors, solve the problems of low calibration efficiency and high labor cost existing in the existing sensor position calibration, improve the efficiency of sensor position calibration, and reduce the labor cost.

[0088] Optionally, the sensor position calibration device further includes a substrate position adjustment module, configured to generate a workbench adjustment instruction according to the position of the target feature pattern in the sensor field of view; and adjust the position of the substrate on the workbench through the workbench adjustment instruction so that the target feature pattern is located at the center of the sensor field of view.

[0089] Optionally, the position determination module 330 includes a position-to-be-calibrated determination unit, configured to obtain the horizontal position of the vertical projection of the center of the sensor field of view on the substrate when the target feature pattern is located at the center of the sensor field of view; and use the horizontal position of the vertical projection of the center of the sensor field of view on the substrate as the position to be calibrated when the target feature pattern is located at the center of the sensor field of view.

[0090] Optionally, the position determination module 330 includes a substrate nominal position acquisition unit, configured to determine a target position information pattern that matches the target feature pattern; determine a target array position of the target feature pattern in the current pattern array according to the target position information pattern; and determine a substrate nominal position of the target feature pattern on the substrate according to the target array position.

[0091] Optionally, the sensor position calibration device further includes a sensor attitude calibration module, configured to obtain a sensor rotation and pose adjustment parameter; adjust a sensor field of view center position according to the sensor rotation and pose adjustment parameter, and obtain sensor rotation and pose field data; and calibrate the sensor attitude according to the sensor rotation and pose field data.

[0092] Optionally, the sensor position calibration device further includes a data acquisition unit, a horizontal equilibrium calibration data calculation unit, and a sensor position calibration unit. The data acquisition unit is configured to sequentially move a plurality of pattern arrays into a sensor field of view, and obtain horizontal calibration data that matches each pattern array. The horizontal equilibrium calibration data calculation unit is configured to calculate horizontal equilibrium calibration data according to the horizontal calibration data that matches each pattern array. The sensor position calibration unit is configured to calibrate the position of the sensor according to the horizontal equilibrium calibration data.

[0093] Optionally, the sensor position calibration unit is specifically configured to obtain a substrate target nominal position of a target pattern array on the substrate; and calibrate the position of the sensor according to the substrate target nominal position and the horizontal equilibrium calibration data.

[0094] The sensor position calibration device provided by an embodiment of the present invention can execute the sensor position calibration method provided by any embodiment of the present invention, and has function modules and beneficial effects corresponding to the execution of the method.

[0095] Embodiment 4

[0096] Figure 7 FIG. shows a schematic structural diagram of an electronic device that can be used to implement an embodiment of the present invention. The electronic device is intended to represent various forms of digital computers, such as, a laptop computer, a desktop computer, a workbench, a personal digital assistant, a server, a blade server, a mainframe computer, and other suitable computers. The electronic device can also represent various forms of mobile devices, such as, a personal digital processor, a cellular phone, a smart phone, a wearable device (such as a helmet, glasses, a watch, etc.) and other similar computing devices. The components shown herein, their connections and relationships, and their functions are merely illustrative, and are not intended to limit the implementation of the present invention described and / or claimed herein.

[0097] As Figure 7As shown, the electronic device 10 includes at least one processor 11 and a memory communicatively connected to the at least one processor 11, such as a read-only memory (ROM) 12, a random access memory (RAM) 13, etc. The memory stores a computer program executable by the at least one processor. The processor 11 can perform various appropriate actions and processes according to the computer program stored in the read-only memory (ROM) 12 or the computer program loaded from the storage unit 18 into the random access memory (RAM) 13. In the RAM 13, various programs and data required for the operation of the electronic device 10 can also be stored. The processor 11, the ROM 12, and the RAM 13 are connected to each other via a bus 14. An input / output (I / O) interface 15 is also connected to the bus 14.

[0098] Multiple components in the electronic device 10 are connected to the I / O interface 15, including: an input unit 16, such as a keyboard, a mouse, etc.; an output unit 17, such as various types of displays, speakers, etc.; a storage unit 18, such as a magnetic disk, an optical disc, etc.; and a communication unit 19, such as a network card, a modem, a wireless communication transceiver, etc. The communication unit 19 allows the electronic device 10 to exchange information / data with other devices via a computer network such as the Internet and / or various telecommunication networks.

[0099] The processor 11 can be various general-purpose and / or special-purpose processing components with processing and computing capabilities. Some examples of the processor 11 include, but are not limited to, a central processing unit (CPU), a graphics processing unit (GPU), various dedicated artificial intelligence (AI) computing chips, various processors running machine learning model algorithms, a digital signal processor (DSP), and any appropriate processor, controller, microcontroller, etc. The processor 11 executes the various methods and processes described above, such as the sensor position calibration method.

[0100] In some embodiments, the sensor position calibration method can be implemented as a computer program tangibly embodied in a computer-readable storage medium, such as the storage unit 18. In some embodiments, part or all of the computer program can be loaded and / or installed onto the electronic device 10 via the ROM 12 and / or the communication unit 19. When the computer program is loaded into the RAM 13 and executed by the processor 11, one or more steps of the sensor position calibration method described above can be executed. Alternatively, in other embodiments, the processor 11 can be configured to execute the sensor position calibration method by any other appropriate means (e.g., by means of firmware).

[0101] The various embodiments of the systems and techniques described above in this specification can be implemented in digital electronic circuitry, integrated circuit systems, field programmable gate arrays (FPGAs), application specific integrated circuits (ASICs), application specific standard products (ASSPs), systems-on-chip (SOCs), complex programmable logic devices (CPLDs), computer hardware, firmware, software, and / or combinations thereof. These various embodiments can include: being implemented in one or more computer programs that are executable and / or interpretable on a programmable system including at least one programmable processor, which may be a special-purpose or general-purpose programmable processor that receives data and instructions from, and transmits data and instructions to, a storage system, at least one input device, and at least one output device.

[0102] The computer programs for implementing the methods of the present invention can be written in any combination of one or more programming languages. These computer programs can be provided to a processor of a general purpose computer, special purpose computer, or other programmable data processing apparatus, such that the computer programs, when executed by the processor, cause the functions / operations specified in the flowchart and / or block diagram to be implemented. The computer programs can be executed entirely on the machine, partly on the machine, as a stand-alone software package partly on the machine and partly on a remote machine or entirely on the remote machine or server.

[0103] In the context of the present invention, a computer-readable storage medium can be a tangible medium that can contain or store a computer program for use by or in connection with an instruction execution system, apparatus, or device. The computer-readable storage medium can include, but is not limited to, electronic, magnetic, optical, electromagnetic, infrared, or semiconductor systems, apparatus, or devices, or any suitable combination of the foregoing. Alternatively, the computer-readable storage medium can be a machine-readable signal medium. More specific examples of the machine-readable storage medium would include an electrical connection based on one or more wires, a portable computer diskette, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or Flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing.

[0104] To provide interaction with a user, the systems and techniques described herein can be implemented on an electronic device having: a display device for displaying information to the user (e.g., a CRT (cathode ray tube) or LCD (liquid crystal display) monitor); and a keyboard and a pointing device (e.g., a mouse or a trackball) through which the user can provide input to the electronic device. Other kinds of devices can also be used to provide interaction with the user; for example, the feedback provided to the user can be any form of sensory feedback (e.g., visual feedback, auditory feedback, or tactile feedback); and input from the user can be received in any form (including acoustic input, voice input, or tactile input).

[0105] The systems and techniques described herein can be implemented in a computing system including backend components (e.g., as a data server), or a computing system including middleware components (e.g., an application server), or a computing system including frontend components (e.g., a user computer having a graphical user interface or a web browser through which the user can interact with an implementation of the systems and techniques described herein), or a computing system including any combination of such backend components, middleware components, or frontend components. The components of the system can be interconnected to each other by digital data communication in any form or medium (e.g., a communication network). Examples of communication networks include: local area network (LAN), wide area network (WAN), blockchain network, and the Internet.

[0106] The computing system can include a client and a server. The client and the server are generally far from each other and usually interact through a communication network. The relationship between the client and the server is created by computer programs running on the respective computers and having a client-server relationship with each other. The server can be a cloud server, also known as a cloud computing server or a cloud host, which is a host product in the cloud computing service system, and solves the defects of difficult management and weak business scalability existing in traditional physical hosts and VPS services.

[0107] It should be understood that the various forms of processes shown above can be used, with steps reordered, added, or deleted. For example, the steps recited in the present invention can be executed in parallel, sequentially, or in a different order, as long as the desired results of the technical solution of the present invention can be achieved, and no limitation is made herein.

[0108] The above specific embodiments do not constitute a limitation on the protection scope of the present invention. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A method for calibrating the position of a sensor, characterized in that, including: After the current pattern array moves into the sensor field of view, calibrate the sensor focal plane; After the sensor focal plane is calibrated, obtain a local map of the pattern array captured by the sensor, and determine a target feature pattern that matches the local map of the pattern array; Determine the position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate; According to the position to be calibrated and the nominal position of the substrate, determine the horizontal calibration data that matches the current pattern array; The horizontal calibration data is used to describe the horizontal offset for calibrating the sensor; Wherein, the obtaining the nominal position of the target feature pattern on the substrate includes: Determine a target position information pattern that matches the target feature pattern; According to the target position information pattern, determine the target array position of the target feature pattern in the current pattern array; According to the target array position, determine the nominal position of the target feature pattern on the substrate.

2. The method according to claim 1, wherein Before determining the position to be calibrated when the target feature pattern is located at the center of the sensor field of view, it further includes: Generate a workbench adjustment instruction according to the position of the target feature pattern in the sensor field of view; Through the workbench adjustment instruction, adjust the position of the substrate on the workbench so that the target feature pattern is located at the center of the sensor field of view.

3. The method according to claim 2, characterized in that The determining the position to be calibrated when the target feature pattern is located at the center of the sensor field of view includes: When the target feature pattern is located at the center of the sensor field of view, obtain the horizontal position of the vertical projection of the center of the sensor field of view on the substrate; Use the horizontal position of the vertical projection of the center of the sensor field of view on the substrate as the position to be calibrated when the target feature pattern is located at the center of the sensor field of view.

4. The method according to claim 3, characterized in that, Before obtaining the horizontal position of the vertical projection of the center of the sensor field of view on the substrate, it further includes: Obtain the sensor rotation attitude adjustment parameter; According to the sensor rotation attitude adjustment parameter, adjust the position of the center of the sensor field of view and obtain the sensor rotation attitude field data; Calibrate the sensor attitude according to the sensor rotation attitude field data.

5. The method according to claim 1, characterized in that, It further includes: Sequentially move multiple pattern arrays into the sensor field of view, and obtain the horizontal calibration data that matches each pattern array; Calculate the horizontal balanced calibration data according to the horizontal calibration data that matches each pattern array; Calibrate the position of the sensor according to the horizontal balanced calibration data.

6. The method according to claim 5, characterized in that, The calibrating the position of the sensor according to the horizontal balanced calibration data includes: Obtain the nominal target position of the target pattern array on the substrate; Calibrate the position of the sensor according to the nominal target position of the substrate and the horizontal balanced calibration data.

7. A sensor position calibration device, characterized in that, including: A focal plane calibration module, configured to calibrate the sensor focal plane after the current pattern array moves into the sensor field of view; A target feature pattern determination module, configured to obtain a local map of the pattern array captured by the sensor and determine a target feature pattern that matches the local map of the pattern array after the sensor focal plane is calibrated; A position determination module, configured to determine a position to be calibrated when the target feature pattern is located at the center of the sensor field of view, and obtain the nominal position of the target feature pattern on the substrate; A horizontal calibration data determination module, configured to determine horizontal calibration data matching the current pattern array according to the position to be calibrated and the nominal position of the substrate; the horizontal calibration data is used to describe the horizontal calibration offset of the sensor; Wherein, the position determination module includes a nominal position acquisition unit of the substrate, configured to determine a target position information pattern matching the target feature pattern; and determine the target array position of the target feature pattern in the current pattern array according to the target position information pattern; Determine the nominal position of the target feature pattern on the substrate according to the target array position.

8. An electronic device, characterized in that, The electronic device includes: At least one processor; and A memory communicatively connected to the at least one processor; wherein, The memory stores a computer program executable by the at least one processor, and the computer program is executed by the at least one processor, so that the at least one processor can execute the sensor position calibration method according to any one of claims 1-6.

9. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores computer instructions, and the computer instructions are used to implement the sensor position calibration method according to any one of claims 1-6 when executed by a processor.

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