A membrane moving mechanism for changing the diameter of a light beam in a photolithography machine

Abstract

The present application relates to a kind of diaphragm moving mechanism of photolithography machine changes light beam diameter, including support plate, recess is opened in the inside of support plate, first slider is slidably arranged in the inside of recess, and angle adjusting box is fixedly arranged at the end of first slider, and angle adjusting box is internally provided with angle adjusting structure, angle adjusting structure is used to adjust angle offset size, and horizontal plate is movably arranged at the end of angle adjusting box, the bottom of first slider is fixedly provided with connecting plate, connecting plate end is connected and is provided with diaphragm moving mechanism, diaphragm moving mechanism is used to move the position of diaphragm.The present application, by being provided with diaphragm moving mechanism, diaphragm can be moved, the situation that single position of diaphragm is heated to cause damage occurs is reduced, so that the time of replacing diaphragm in later period is reduced, maintenance cost in later period is reduced, and because angle adjusting structure is arranged, the horizontal angle of diaphragm is adjusted, different angle engraving needs can be coped with, so as to improve the applicability of device.

Description

Technical Field

[0001] This invention relates to the field of lithography machine technology, specifically to a film moving mechanism for changing the beam diameter in a lithography machine. Background Technology

[0002] In the production of integrated circuit chips, the exposure and transfer of the chip's design pattern onto photoresist on the silicon wafer surface is one of the most crucial steps, and the equipment used in this process is called a lithography machine. The lithography machine is the most critical piece of equipment in integrated circuit manufacturing. Many years ago, foreign countries proposed the concept of next-generation lithography and conducted extensive research on technologies such as extreme ultraviolet (EUV) lithography, electron beam projection lithography, and ion beam projection lithography. However, due to various reasons such as process technology, production efficiency, and cost, these technologies are still difficult to fully realize in practical applications. Currently, deep ultraviolet projection lithography equipment still dominates the market.

[0003] To improve the precision of lithography machines, diaphragms are typically installed in the light transmission system to constrain the beam size, thereby improving the machine's accuracy. However, during use, it has been found that because the light emitted by the lithography machine needs to be reduced in size by passing through perforations in the diaphragm, the light source is constantly shining on a certain gap in the diaphragm, causing the diaphragm to be damaged by high temperatures. This necessitates frequent diaphragm replacements, thus increasing production costs. Summary of the Invention

[0004] The purpose of this invention is to provide a film moving mechanism for changing the beam diameter in a lithography machine, which solves the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a film moving mechanism for changing the beam diameter in a lithography machine, comprising a support plate, a groove inside the support plate, a first slider slidably disposed inside the groove, an angle adjustment box fixedly disposed at the end of the first slider, an angle adjustment structure disposed inside the angle adjustment box, the angle adjustment structure being used to adjust the angle offset, a horizontal plate movably disposed at the end of the angle adjustment box, a groove on the surface of the horizontal plate, a second slider slidably disposed on the surface of the groove, a bracket fixedly disposed on the surface of the second slider, a clamping rod fixedly disposed at the end of the bracket, and a film being clamped between the clamping rods;

[0006] A connecting plate is fixedly provided at the bottom of the first slider, and a shifting mechanism is connected to the end of the connecting plate. The shifting mechanism is used to move the position of the diaphragm.

[0007] In a preferred embodiment of the present invention, a first limiting rod is provided inside the groove, and the first limiting rod is vertically welded to the bottom of the groove. A first slider is provided through the surface of the first limiting rod. A strip groove is provided at the bottom of the groove, and the strip groove is a through hole. The inner wall size of the strip groove is adapted to the size of the connecting plate.

[0008] In a preferred embodiment of the present invention, the angle adjustment structure includes a transmission rod that passes through the inner wall of the angle adjustment box and is fitted with a sealed bearing at the connection point with the angle adjustment box. The surface of the angle adjustment box is chamfered, and a turntable is fixedly provided at the end of the transmission rod. A handle is fixedly provided on the surface of the turntable and the surface of the handle is knurled.

[0009] In a preferred embodiment of the present invention, a worm is welded to the surface of the transmission rod, and a worm wheel is meshed on the surface of the worm. A rotating shaft is fixedly mounted on the central axis of the worm wheel, and the rotating shaft passes through the outer wall of the angle adjustment box. A horizontal plate is fixedly mounted at the end of the rotating shaft.

[0010] In a preferred embodiment of the present invention, a second limiting rod is fixedly provided inside the slide groove, and the second limiting rod slides through the surface of the second slider. A return spring is fixedly provided between the side wall of the second slider and the side wall of the slide groove, and the return spring is sleeved on the surface of the second limiting rod.

[0011] In a preferred embodiment of the present invention, a reinforcing rib is fixedly provided between the second slider and the clamping rod, and the reinforcing rib, the clamping rod and the bracket form a right-angled triangle. A pull plate is movably provided at the end of the clamping rod, and a second rubber pad is movably provided at the end of the pull plate. A first rubber pad is fixedly provided at the center of the horizontal plate. The first rubber pad and the second rubber pad are provided with mounting grooves on the surface of the clamping rod that are adapted to the size of the diaphragm. A push rod is fixedly provided at the end of the second rubber pad.

[0012] In a preferred embodiment of the present invention, the diaphragm moving mechanism includes a motor, a disk is fixedly disposed at the end of the output shaft of the motor, and the motor is welded to the side wall of the support plate. A protrusion is fixedly disposed on the outer edge of the disk, and a swing rod is movably disposed on the surface of the protrusion. The size of the swing rod is larger than the radius of the disk.

[0013] In a preferred embodiment of the present invention, a connecting rod is movably provided at the end of the swing arm, and a connecting plate is welded to the end of the connecting rod. A limiting seat is sleeved on the surface of the connecting rod, and the end of the limiting seat is welded to the side wall of the support plate. The limiting seat is n-shaped, and the two ends of the limiting seat are respectively opened on both sides of the strip groove.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0015] This invention discloses a film moving mechanism for changing the beam diameter in a lithography machine. By incorporating this film moving mechanism, the film can be moved, reducing the occurrence of damage caused by heat in a single location on the film. This reduces the need for subsequent film replacements, thereby reducing maintenance costs. Furthermore, the inclusion of an angle adjustment structure allows for adjustment of the horizontal angle of the film, meeting the needs of engraving at different angles and thus improving the applicability of the device. Attached Figure Description

[0016] Other features, objects, and advantages of the present invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0017] Figure 1 This is a three-dimensional structural schematic diagram (a) of a film moving mechanism for changing the beam diameter in a lithography machine according to the present invention.

[0018] Figure 2 This is an enlarged view at point A of the film moving mechanism for changing the beam diameter in a lithography machine according to the present invention.

[0019] Figure 3 This is an enlarged view at point B of the diaphragm moving mechanism for changing the beam diameter in a lithography machine according to the present invention.

[0020] Figure 4 This is an internal view of the diaphragm angle adjustment structure for changing the beam diameter in a lithography machine according to the present invention.

[0021] Figure 5 This is a schematic diagram (II) of the three-dimensional structure of a film for changing the beam diameter in a lithography machine according to the present invention.

[0022] In the diagram: 1. Support plate; 2. Groove; 3. First slider; 4. Angle adjustment box; 5. Turntable; 6. Handle; 7. Horizontal plate; 8. First rubber pad; 9. Diaphragm; 10. Second rubber pad; 11. Push rod; 12. Pull plate; 13. Clamping rod; 14. Reinforcing rib; 15. Bracket; 16. Second slider; 17. Slide groove; 18. Second limiting rod; 19. Return spring; 20. First limiting rod; 21. Chamfer; 22. Strip groove; 23. Connecting plate; 24. Connecting rod; 25. Swing rod; 26. Protrusion; 27. Disc; 28. Motor; 29. ​​Limiting seat; 30. Transmission rod; 31. Sealed bearing; 32. Worm gear; 33. Worm wheel; 34. Rotating shaft. Detailed Implementation

[0023] To make the technical means, creative features, objectives and effects of this invention easier to understand, the invention will be further described below in conjunction with specific embodiments.

[0024] In the description of this invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0025] Please see Figure 1-5 The present invention provides a technical solution: a film moving mechanism for changing the beam diameter in a lithography machine, comprising a support plate 1, a groove 2 inside the support plate 1, a first slider 3 slidably disposed inside the groove 2, an angle adjustment box 4 fixedly disposed at the end of the first slider 3, an angle adjustment structure inside the angle adjustment box 4 for adjusting the angle offset, a horizontal plate 7 movably disposed at the end of the angle adjustment box 4, a groove 17 on the surface of the horizontal plate 7, a second slider 16 slidably disposed on the surface of the groove 17, a bracket 15 fixedly disposed on the surface of the second slider 16, a clamping rod 13 fixedly disposed at the end of the bracket 15, and a film 9 clamped between the clamping rods 13, which can clamp the film 9 at this time.

[0026] A connecting plate 23 is fixedly installed at the bottom of the first slider 3, and a displacement mechanism is connected to the end of the connecting plate 23. The displacement mechanism is used to move the position of the diaphragm 9.

[0027] Please see Figure 1-5 In a specific embodiment, a first limiting rod 20 is provided inside the groove 2, and the first limiting rod 20 is vertically welded to the bottom of the groove 2. A first slider 3 is provided through the surface of the first limiting rod 20. A strip groove 22 is provided at the bottom of the groove 2, and the strip groove 22 is a through hole. The inner wall size of the strip groove 22 is adapted to the size of the connecting plate 23. The angle adjustment structure includes a transmission rod 30, which is provided through the inner wall of the angle adjustment box 4. A sealed bearing 31 is snapped at the connection between the transmission rod 30 and the angle adjustment box 4. The surface of the angle adjustment box 4 is chamfered. A turntable 5 is fixedly provided at the end of the transmission rod 30, and a handle 6 is fixedly provided on the surface of the turntable 5. The surface of the handle 6 is knurled, which facilitates the rotation of the turntable 5. The knurling treatment increases the friction of the device surface and improves the safety of rotation.

[0028] Please see Figure 1-5In this embodiment, a worm gear 32 is welded to the surface of the transmission rod 30, and a worm wheel 33 is meshed on the surface of the worm gear 32. A rotating shaft 34 is fixedly mounted on the central axis of the worm wheel 33, and the rotating shaft 34 passes through the outer wall of the angle adjustment box 4. A horizontal plate 7 is fixedly mounted at the end of the rotating shaft 34. A second limiting rod 18 is fixedly mounted inside the slide groove 17, and the second limiting rod 18 passes through the second slider 16 that slides on the surface. A return spring 19 is fixedly mounted between the side wall of the second slider 16 and the side wall of the slide groove 17, and the return spring 19 is sleeved on the surface of the second limiting rod 18. The structure of the worm wheel 33 and the worm gear 32 has a certain self-locking property, which can ensure that the diaphragm 9 can maintain a stable state after moving to a certain angle.

[0029] Please see Figure 1-5 In this embodiment, a reinforcing rib 14 is fixedly provided between the second slider 16 and the clamping rod 13, and the reinforcing rib 14, the clamping rod 13, and the bracket 15 form a right-angled triangle. A pull plate 12 is movably provided at the end of the clamping rod 13, and a second rubber pad 10 is movably provided at the end of the pull plate 12. A first rubber pad 8 is fixedly provided at the center of the horizontal plate 7. The first rubber pad 8 and the second rubber pad 10 are provided with mounting grooves on the surfaces of the clamping rod 13 that are adapted to the size of the diaphragm 9. A push rod 11 is fixedly provided at the end of the second rubber pad 10. The diaphragm moving mechanism includes a motor 28. A disk 27 is fixedly provided at the end of the output shaft of the motor 28, and the motor 28 is welded to the side wall of the support plate 1. A protrusion 26 is fixedly provided on the outer edge of the disk 27, and a swing rod 25 is movably provided on the surface of the protrusion 26. The size of the swing rod 25 is larger than the radius of the disk 27. A connecting rod 24 is movably provided at the end of the swing rod 25, and a connecting plate 23 is welded to the end of the connecting rod 24. A limiting seat 29 is sleeved on the surface of the connecting rod 24, and the end of the limiting seat 29 is welded to the side wall of the support plate 1. The limiting seat 29 is n-shaped, and its two ends are respectively opened on both sides of the strip groove 22. The return spring 19 will push the clamping rod 13 to start relative movement to clamp the diaphragm 9. Then, due to the relative movement of the clamping rod 13 and the offset of the pull plate 12, the second rubber pad 10 and the first rubber pad 8 move relative to each other, and finally fix the diaphragm 9 to the horizontal plane.

[0030] It should be noted that the present invention is a film moving mechanism for changing the beam diameter in a lithography machine. All components are general standard parts or parts known to those skilled in the art. Their structure and principle can be learned by those skilled in the art through technical manuals or conventional experimental methods.

[0031] Working principle: When the device is to be used, first install the diaphragm 9, and then move the push rod 11 outward with both hands. At this time, the pull plate 12 begins to move, and the end of the pull plate 12 will abut against the clamping rods 13 at both ends and move outward. At this time, the distance between the clamping rods 13 increases, and the diaphragm 9 is placed in. When the diaphragm 9 is installed inside the clamping rods 13, the push rod 11 is released. At this time, the clamping rods 13 will not be affected by external force, and the return spring 19 is in a compressed state. The return spring 19 will push the clamping rods 13 to start relative movement, clamping the diaphragm 9. Then, due to the relative movement of the clamping rods 13 and the offset of the pull plate 12, the second rubber pad 10 and the first rubber pad 8 move relative to each other, finally fixing the diaphragm 9 to the horizontal plane.

[0032] Next, if the angle of the diaphragm 9 needs to be adjusted, the operator first needs to manually turn the handle 6. The handle 6 will drive the turntable 5 to rotate at a certain angle. After the turntable 5 has rotated, the internal worm gear 32 will rotate, which will drive the worm wheel 33 to rotate. The worm wheel 33 is coaxially connected to the horizontal plate 7. At this time, the angle of the horizontal plate 7 changes, and the position of the horizontal plate 7 will begin to change, thereby achieving the effect of adjusting the angle of the diaphragm 9. The structure of the worm wheel 33 and worm gear 32 has a certain degree of self-locking, which can ensure that the diaphragm 9 can maintain a stable state after it has moved to a certain angle.

[0033] When the motor 28 is started, the output shaft begins to rotate, and the disc 27 also begins to rotate. The rotation of the disc 27 causes the position of the swing arm 25 to change, pulling the connecting rod 24 to move. Influenced by the limit seat 29, the connecting rod 24 moves up and down. The connecting rod 24 is connected to the diaphragm 9 through the connecting plate 23, and the diaphragm 9 begins to move up and down, ultimately achieving the effect of moving the diaphragm.

Claims

1. A film moving mechanism for changing the beam diameter in a photolithography machine, characterized in that: Includes a support plate (1), the support plate (1) has a groove (2) inside, a first slider (3) is slidably arranged inside the groove (2), and an angle adjustment box (4) is fixedly arranged at the end of the first slider (3), and an angle adjustment structure is arranged inside the angle adjustment box (4), the angle adjustment structure is used to adjust the size of the angle offset, and a horizontal plate (7) is movably arranged at the end of the angle adjustment box (4), a groove (17) is started on the surface of the horizontal plate (7), and a second slider (16) is slidably arranged on the surface of the groove (17), and a bracket (15) is fixedly arranged on the surface of the second slider (16), and a clamping rod (13) is fixedly arranged at the end of the bracket (15), and a diaphragm (9) is snapped between the clamping rods (13); A connecting plate (23) is fixedly provided at the bottom of the first slider (3), and a shifting mechanism is connected to the end of the connecting plate (23). The shifting mechanism is used to move the position of the diaphragm (9).

2. The film moving mechanism for changing the beam diameter in a lithography machine according to claim 1, characterized in that: The groove (2) is provided with a first limiting rod (20), and the first limiting rod (20) is vertically welded to the bottom of the groove (2). A first slider (3) is provided through the surface of the first limiting rod (20). A strip groove (22) is provided at the bottom of the groove (2), and the strip groove (22) is a through hole. The inner wall size of the strip groove (22) is adapted to the size of the connecting plate (23).

3. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 1, characterized in that: The angle adjustment structure includes a transmission rod (30), which is installed through the inner wall of the angle adjustment box (4) and is connected to the angle adjustment box (4) with a sealed bearing (31). The surface of the angle adjustment box (4) is chamfered (21). A turntable (5) is fixedly installed at the end of the transmission rod (30), and a handle (6) is fixedly installed on the surface of the turntable (5). The surface of the handle (6) is knurled.

4. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 3, characterized in that: The transmission rod (30) is welded with a worm (32), and a worm wheel (33) is meshed on the surface of the worm (32). A rotating shaft (34) is fixedly installed on the central axis of the worm wheel (33), and the rotating shaft (34) passes through the outer wall of the angle adjustment box (4). A horizontal plate (7) is fixedly installed at the end of the rotating shaft (34).

5. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 1, characterized in that: A second limiting rod (18) is fixedly installed inside the slide groove (17), and the second limiting rod (18) passes through the second slider (16) that slides on the surface. A reset spring (19) is fixedly installed between the side wall of the second slider (16) and the side wall of the slide groove (17), and the reset spring (19) is sleeved on the surface of the second limiting rod (18).

6. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 1, characterized in that: A reinforcing rib (14) is fixedly provided between the second slider (16) and the clamping rod (13), and the reinforcing rib (14), the clamping rod (13) and the bracket (15) form a right triangle. A pull plate (12) is movably provided at the end of the clamping rod (13), and a second rubber pad (10) is movably provided at the end of the pull plate (12). A first rubber pad (8) is fixedly provided at the center of the horizontal plate (7). The first rubber pad (8) and the second rubber pad (10) and the clamping rod (13) have mounting grooves that are adapted to the size of the diaphragm (9). A push rod (11) is fixedly provided at the end of the second rubber pad (10).

7. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 1, characterized in that: The displacement mechanism includes a motor (28), a disk (27) is fixedly provided at the end of the output shaft of the motor (28), and the motor (28) is welded to the side wall of the support plate (1). A protrusion (26) is fixedly provided on the outer edge of the disk (27), and a swing rod (25) is movably provided on the surface of the protrusion (26). The size of the swing rod (25) is larger than the radius of the disk (27).

8. The film moving mechanism for changing the beam diameter in a photolithography machine according to claim 7, characterized in that: The end of the swing rod (25) is movably provided with a connecting rod (24), and the end of the connecting rod (24) is welded with a connecting plate (23). A limiting seat (29) is sleeved on the surface of the connecting rod (24), and the end of the limiting seat (29) is welded to the side wall of the support plate (1). The limiting seat (29) is n-shaped, and the two ends of the limiting seat (29) are respectively opened on both sides of the strip groove (22).

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