Double-sided roll-to-roll laser direct writing exposure machine

Abstract

The application provides a double-sided roll-to-roll laser direct writing exposure machine, which comprises unwinding and winding devices for conveying a substrate, and a tensioning device for tensioning and suspending the substrate, wherein the tensioning device comprises a supporting mechanism for supporting the suspended middle part of the substrate through a plurality of supporting rods arranged in an exposure area; an adsorption device arranged in a non-exposure area for adsorbing and fixing the substrate; and a side clamping mechanism arranged at the side of the substrate for clamping the substrate; and end clamping mechanisms are arranged at the unwinding end and the winding end of the supporting rods, so that the substrate is clamped all the time during the exposure process, and vibration and displacement of the roll-type substrate caused by the movement of a precision motion platform during the exposure process are avoided, so as to affect the exposure precision.

Description

Technical Field

[0001] This invention relates to the field of laser direct writing exposure technology, and specifically to a double-sided roll-to-roll laser direct writing exposure machine. Background Technology

[0002] Traditional double-sided exposure machines use glass supports underneath the substrate to ensure it is flat and within the focal depth range of the exposure lens for optimal exposure. While glass supports meet the exposure requirements, dust and dirt inevitably accumulate on the glass, and cleaning is difficult during the exposure process, leading to a decrease in product yield.

[0003] The latest double-sided exposure machines use unwinding and rewinding machines on both sides to tighten and straighten the substrate roll, keeping it suspended in the air. This avoids the dust and dirt that can occur with glass supports. However, since the substrate is a soft material, the suspended portion in the middle is generally quite long. Under its own weight, it inevitably sags and deforms at the center of the suspension, affecting accuracy. Furthermore, vibrations are unavoidable during platform movement. Without any fixing measures during exposure, the vibrations from platform movement and the substrate's own minute vibrations will all affect exposure accuracy. Summary of the Invention

[0004] This invention provides a double-sided roll-to-roll laser direct writing exposure machine that can reduce vibration and displacement of roll-to-roll substrates during the exposure process.

[0005] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:

[0006] A double-sided roll-to-roll laser direct-write exposure machine includes an unwinding device and a rewinding device for conveying a substrate, and a tensioning device for tensioning and suspending the substrate, the tensioning device comprising:

[0007] A support mechanism that supports the suspended middle portion of the substrate via multiple support rods positioned within the exposure area; and

[0008] An end clamping mechanism is installed at both ends of the conveying direction of multiple support rods, which clamps the feeding end and the receiving end of the substrate respectively.

[0009] Furthermore, the end clamping mechanism includes an upper roller and a lower roller arranged vertically, and a clamping cylinder for driving the upper and lower rollers to clamp.

[0010] The present invention can further improve the tensioning effect by clamping the side of the substrate. The tensioning device also includes a side clamping mechanism for clamping the side of the substrate. The side clamping mechanism includes a round rod and fixed seats installed at both ends of the round rod. One of the fixed seats is provided with a swing cylinder for driving the round rod to rotate. Multiple clamping blocks for clamping the side of the substrate are provided on the round rod along its length.

[0011] The support mechanism can also be tightened by adsorbing the substrate. The support mechanism also includes an adsorption mechanism set in the non-exposure area. The adsorption surface of the adsorption mechanism is on the same horizontal plane as the support surface of the multiple support rods.

[0012] As can be seen from the above technical solutions, the present invention has the following beneficial effects:

[0013] 1) A support rod is installed in the middle of the suspended substrate. The feeding end and receiving end of the support rod are respectively equipped with end clamping mechanisms so that the substrate is always clamped during the exposure process, avoiding vibration and displacement of the roll substrate due to the movement of the precision motion platform during the exposure process, which would affect the exposure accuracy.

[0014] 2) An adsorption mechanism is set in the non-exposure area. When the substrate is laid flat on the support mechanism, the adsorption mechanism will tightly adsorb the substrate onto the surface of the support rod. On the one hand, it improves the flatness of the substrate surface and effectively ensures the consistency between the substrate exposure surface and the focal plane of the exposure lens. On the other hand, it allows the substrate to have an additional layer of protection on the basis of the end clamping mechanism, avoiding the substrate from generating slight vibrations and displacements. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the overall structure of the double-sided roll-to-roll laser direct-write exposure machine of the present invention;

[0016] Figure 2 This is a schematic diagram of the tensioning device in the present invention;

[0017] Figure 3 This is a schematic diagram of the end clamping mechanism in this invention;

[0018] Figure 4 This is a schematic diagram of the side clamping mechanism in this invention. Detailed Implementation

[0019] A preferred embodiment of the present invention will now be described in detail with reference to the accompanying drawings.

[0020] like Figure 1As shown, the double-sided roll-to-roll laser direct writing exposure machine of the present invention includes an upper exposure assembly 10, a lower exposure assembly 20 and a tensioning device 30 located in the middle exposure station, and an unwinding device 40 and a rewinding device 50 located on both sides of the exposure station. The upper exposure assembly 10 and the lower exposure assembly 20 are arranged above and below the tensioning device. The tensioning device 30 is used to tension and suspend the substrate, so that the substrate is in a taut and straightened state. The unwinding device 40 and the rewinding device 50 allow the substrate to pass through the exposure station, and the upper and lower exposure assemblies complete the exposure of the pattern.

[0021] like Figure 2 As shown, the tensioning device 30 is used to straighten and clamp the substrate to prevent the substrate from moving slightly during the exposure process. The present invention achieves the tensioning effect during exposure by supporting the suspended part in the middle of the substrate and clamping and straightening the ends and sides of the substrate.

[0022] The tensioning device 30 includes a support mechanism 31, which supports the suspended middle part of the substrate through multiple support rods 311, and end clamping mechanisms 32 disposed at both ends of the multiple support rods 311 in the conveying direction, which clamp the feeding end and receiving end of the substrate respectively. The multiple support rods 311 are disposed in the exposure area, that is, between the upper and lower exposure mechanisms.

[0023] To avoid obstructing the lower light path, the multiple support rods 311 need to move once during the exposure process. The support mechanism 31 includes a horizontally arranged guide rail 312, on which multiple support rods 311 are slidably connected. Each support rod has a contact surface that contacts the bottom of the substrate. A drive mechanism 313 is installed on one side of the guide rail. This drive mechanism can drive the multiple support rods 311 to move stepwise along the guide rail 312, allowing the upper and lower exposure mechanisms to expose a complete pattern. The drive mechanism 313 that moves the support rods can be driven by a cylinder or a motor (not limited to these). In this embodiment, a motor drive is used, which ensures smooth and stable movement without generating unnecessary vibrations or impacts, thus avoiding any impact on the stability of the substrate.

[0024] like Figure 3As shown, the end clamping mechanism 32 includes an upper roller 321 and a lower roller 322 arranged vertically, and a clamping cylinder for driving the upper and lower rollers to clamp together. The upper and lower rollers clamp the feeding end and receiving end of the substrate by merging. The clamping cylinders used in this invention include a first clamping cylinder 323 and a second clamping cylinder 324 for driving the upper roller, and a third clamping cylinder 325 and a fourth clamping cylinder 326 for driving the lower roller. The upper and lower rollers are respectively provided with a first mounting plate 327 and a second mounting plate 328. The first clamping cylinder 323 and the third clamping cylinder 325 are respectively provided on both sides of the first mounting plate 327, and the second clamping cylinder 324 and the fourth clamping cylinder 326 are respectively provided on both sides of the second mounting plate 328.

[0025] To ensure the substrate remains firmly attached to the multiple support rods 311 during exposure, this invention incorporates adsorption mechanisms in the non-exposure area. Specifically, two adsorption mechanisms 33 and 35 are positioned between the two end clamping mechanisms 32 and the multiple support rods 311. Each adsorption mechanism has a supporting plane with multiple adsorption holes. The substrate on the support platform is adsorbed through a vacuum, and the adsorption surface must be level with the supporting surfaces of the multiple support rods to ensure the flatness of the substrate during exposure. Adsorption mechanism 33 is located closer to the unwinding device 40, and adsorption mechanism 35 is located closer to the rewinding device 50. The two adsorption planes are designed to be as large as possible, covering the entire non-exposure area, thereby generating greater adsorption force and ensuring the substrate remains stably attached to the support rods 311 during exposure. Simultaneously, this effectively prevents minor movement of the substrate caused by friction between the substrate and the support rods when the support rods 311 move.

[0026] The present invention employs a side clamping mechanism 34 to clamp the sides of the substrate. Two side clamping mechanisms are mounted on the support mechanism 31 via fixing seats 341. Figure 4 As shown, the side clamping mechanism 34 includes a round rod 342 and fixed seats 341 mounted at both ends of the round rod. One of the fixed seats is equipped with a swing cylinder 343 for driving the round rod to rotate. Multiple clamping blocks 344 for clamping the sides of the substrate are arranged along the length of the round rod 342. The clamping blocks 344 are fixed to the round rod 342 by torsion springs 345. During the exposure process, the substrate is constantly clamped on both sides by the clamping blocks 344, which enhances the stability of the substrate from the side, based on the adsorption mechanism, and avoids minor vibrations and movement of the substrate during the exposure process.

[0027] The side clamping mechanism 34 is driven by the swing cylinder 343. During the exposure process, the clamping block 344 clamps the side of the substrate. After one exposure frame is completed, the clamping block 344 is driven by the swing cylinder 343 to release the substrate. The substrate is then pulled towards the winding device side by the unwinding device 40 and the winding device 50 on both sides, completing one exposure frame. The clamping block 344 is fixed to the round rod 342 by the torsion spring 345. The round rod is fixed to the rotation axis of the swing cylinder 343 and swings synchronously with the swing cylinder. The torsion spring acts as an elastic buffer device, ensuring that multiple clamping blocks can tightly clamp the substrate.

[0028] The tensioning device 30 also includes a lifting assembly 36, which is used to adjust the height of multiple support rods 311 so that the substrate height is at the focal surface of the upper and lower exposure assemblies.

[0029] The above-described embodiments are merely preferred embodiments of the present invention and are not intended to limit the scope of the present invention. Various modifications and improvements made by those skilled in the art to the technical solutions of the present invention without departing from the spirit of the present invention should fall within the protection scope defined by the claims of the present invention.

Claims

1. A double-sided roll-to-roll laser direct-write exposure machine, comprising an unwinding device and a rewinding device for conveying a substrate, and a tensioning device for tensioning and suspending the substrate, characterized in that, The tensioning device includes: A support mechanism that supports the suspended middle portion of the substrate via multiple support rods positioned within the exposure area; and An end clamping mechanism is provided at both ends of the conveying direction of multiple support rods, which clamps the feeding end and the receiving end of the substrate respectively; The tensioning device also includes a side clamping mechanism for clamping the side of the substrate. The side clamping mechanism includes a round rod and fixed seats installed at both ends of the round rod. One of the fixed seats is provided with a swing cylinder for driving the round rod to rotate. Multiple clamping blocks for clamping the side of the substrate are provided on the round rod along its length. The support mechanism also includes an adsorption mechanism disposed in the non-exposure area, wherein the adsorption surface of the adsorption mechanism is on the same horizontal plane as the support surface of the multiple support rods.

2. The double-sided roll-to-roll laser direct-write exposure machine according to claim 1, characterized in that, The end clamping mechanism includes an upper roller and a lower roller arranged vertically, and a clamping cylinder for driving the upper and lower rollers to clamp together.

3. The double-sided roll-to-roll laser direct-write exposure machine according to claim 2, characterized in that, The clamping cylinder includes a first clamping cylinder and a second clamping cylinder for driving the upper roller to move, and a third clamping cylinder and a fourth clamping cylinder for driving the lower roller to move. The upper and lower rollers are respectively provided with a first mounting plate and a second mounting plate at both ends. The first clamping cylinder and the third clamping cylinder are respectively provided on both sides of the first mounting plate, and the second clamping cylinder and the fourth clamping cylinder are respectively provided on both sides of the second mounting plate.

4. The double-sided roll-to-roll laser direct-write exposure machine according to claim 1, characterized in that, The clamping block is fixed to the round rod by a torsion spring.

5. The double-sided roll-to-roll laser direct-write exposure machine according to claim 1, characterized in that, The support mechanism also includes a drive mechanism that can drive multiple support rods to move in a stepping motion along the guide rail.

6. The double-sided roll-to-roll laser direct-write exposure machine according to claim 1, characterized in that, The tensioning device is provided with an upper exposure component and a lower exposure component distributed above and below it.

7. The double-sided roll-to-roll laser direct-write exposure machine according to claim 6, characterized in that, The tensioning device also includes a lifting assembly, which is used to adjust the height of multiple support rods so that the substrate height is at the focal surface of the upper and lower exposure assemblies.

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