Transmissive structures and methods of making the same

Abstract

The application relates to a transmission structure and a preparation method thereof. The transmission structure comprises a plurality of first transmission units and a plurality of second transmission units, a difference between a first transmission phase of a transmission electromagnetic wave of the first transmission unit and a second transmission phase of a transmission electromagnetic wave of the second transmission unit is the same or similar within a preset frequency band, and the plurality of first transmission units and the plurality of second transmission units are arranged in disorder in a plane; the first transmission unit has a first base body, a first medium block is arranged in the first base body, and a thickness of the first base body between the first medium block and an electromagnetic wave injection surface of the first transmission unit is a non-zero first thickness; and a corresponding second transmission unit has a second base body, a second medium block and a non-zero second thickness, the second thickness and the first thickness are configured so that the first transmission unit and the second transmission unit can have a larger reflected electromagnetic wave phase difference in a wider frequency range.

Description

Technical Field

[0001] This invention relates to the field of electromagnetic wave imaging technology, and in particular to a transmission structure and its fabrication method. Background Technology

[0002] The invention and use of glass have greatly facilitated people's lives, and it has become an irreplaceable material in our daily lives. Ordinary transparent glass has a smooth and flat surface, such as the window glass of ordinary building exteriors and car windshields. Both transmitted and reflected light from these ordinary glasses can form images. For example, we can see objects outside through glass from inside. When the outdoor light is weak, people inside can also see the reflection (virtual image) of objects on the glass. On the other hand, when there is an unsuitable brightness distribution in the surrounding environment, this brightness distribution can also cause light pollution through glass reflection, leading to visual fatigue or discomfort.

[0003] Traditionally, light pollution can be addressed by creating a rough, uneven structure on the glass surface (such as frosted glass) to diffuse light. However, since neither transmitted nor reflected light forms an image when light shines on such a structure, people cannot obtain information through transmitted light, which can easily cause inconvenience to their lives.

[0004] On the other hand, Chinese invention patent CN110854539B proposes a transmission structure that allows incident light to undergo diffuse reflection on the surface, essentially avoiding specular reflection of incident light on the glass surface, while maintaining the transmitted light wavefront unchanged. Glass made with this transmission structure can eliminate light pollution caused by unsuitable brightness distribution due to specular reflection, while also keeping the transmitted light wavefront largely undisturbed, thus allowing people to still obtain information through the transmitted light. However, this type of transmission structure can only achieve the above effects within a narrow frequency band and is not suitable for the fabrication of macroscopic products. Summary of the Invention

[0005] Therefore, it is necessary to provide an improved transmission structure to address the problem of the narrow operating frequency band of traditional transmission structures.

[0006] A transmission structure includes a plurality of first transmission units and a plurality of second transmission units, wherein the transmission phase of the electromagnetic wave of the first transmission unit is... The transmission phase of the electromagnetic wave of the second transmission unit The difference within the preset frequency band satisfies The plurality of first transmission units and the plurality of second transmission units are arranged randomly on one surface, and the electromagnetic wave incident surfaces of the plurality of first transmission units and the plurality of second transmission units together form the electromagnetic wave incident surface of the transmission structure; wherein...

[0007] The first transmission unit has a first substrate, within which a first dielectric block is disposed. The thickness of the first substrate between the first dielectric block and the electromagnetic wave incident surface of the first transmission unit is a non-zero first thickness. The second transmission unit has a second substrate, within which a second dielectric block is disposed. The thickness of the second substrate between the second dielectric block and the electromagnetic wave incident surface of the second transmission unit is a non-zero second thickness, which is different from the first thickness. When an electromagnetic wave is incident on the first and second transmission units, the transmitted electromagnetic wave of the first transmission unit possesses a first transmission phase. The transmitted electromagnetic wave of the second transmission unit has a second transmission phase. First transmission phase Second transmission phase Within the preset frequency band The reflected electromagnetic wave from the first substrate is a first reflected electromagnetic wave, and the reflected electromagnetic wave from the first dielectric block is a second reflected electromagnetic wave; the first thickness is configured such that the reflected electromagnetic wave from the first transmission unit has a first reflection phase, at least through the interference of the first and second reflected electromagnetic waves. The reflected electromagnetic wave from the second substrate is a third reflected electromagnetic wave, and the reflected electromagnetic wave from the second dielectric block is a fourth reflected electromagnetic wave; the second thickness is configured such that the reflected electromagnetic wave from the second transmission unit possesses a second reflection phase, at least through the interference of the third and fourth reflected electromagnetic waves. First reflection phase and the second reflection phase Within the preset frequency band, satisfy

[0008] In the aforementioned transmission structure, both the first and second thicknesses are non-zero, and the second and first thicknesses can be used to adjust the first reflection phase by interfering with the reflected electromagnetic waves. Second reflection phase Within the preset frequency band Thus, the transmission structure composed of these two types of randomly arranged transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, the transmission phase of the electromagnetic waves of different transmission units in the above transmission structure satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with transparent substrate materials. Furthermore, by controlling the first and second thicknesses to achieve the above effects, the fabrication difficulty and complexity of the transmission structure can be reduced, thereby facilitating the fabrication of macroscopic products of transmission structures.

[0009] In one embodiment, the first thickness is configured such that the reflection coefficient of the reflected electromagnetic wave from the first transmission unit is a real number at a reference frequency, the reference frequency being located within the preset frequency band; and the second thickness is configured such that the first reflection phase... and the second reflection phase Satisfy at the reference frequency

[0010] In one embodiment, the second thickness is configured to make the first reflection phase and the second reflection phase The absolute value of the difference is π at the reference frequency.

[0011] In one embodiment, the preset frequency band includes at least a portion of the visible light frequency band and / or at least a portion of the infrared light frequency band.

[0012] In one embodiment, the first thickness d1 ranges from 30nm to 120nm, and the second thickness d2 ranges from 110nm to 290nm.

[0013] In one embodiment, the first thickness d1 ranges from 40nm to 80nm, and the second thickness d2 ranges from 130nm to 160nm.

[0014] In one embodiment, the first substrate and the second substrate are made of the same material; and / or, the first dielectric block and the second dielectric block are made of the same material; and / or, the first dielectric block and the second dielectric block have the same thickness.

[0015] In one embodiment, the materials of the first substrate and the second substrate both include at least one of dielectric and semiconductor, and the materials of the first dielectric block and the second dielectric block both include at least one of metal, dielectric, and semiconductor.

[0016] In one embodiment, the materials of both the first dielectric block and the second dielectric block include at least one of copper, silver, gold, aluminum, platinum, silicon, and graphene.

[0017] In one embodiment, when the first dielectric block is made of metal, the first dielectric block has a preset thickness, the preset thickness being less than or equal to the skin depth of the metal; and / or, when the second dielectric block is made of metal, the second dielectric block has a preset thickness, the preset thickness being less than or equal to the skin depth of the metal.

[0018] This application also provides a transmission structure.

[0019] A transmission structure includes: a substrate having an electromagnetic wave incident surface, comprising a plurality of randomly distributed first transmission portions and a plurality of second transmission portions; wherein each first transmission portion contains a first dielectric block to form a first transmission unit, and the thickness of the substrate between the first dielectric block and the electromagnetic wave incident surface is a non-zero first thickness; each second transmission portion contains a second dielectric block to form a second transmission unit, and the thickness of the substrate between the second dielectric block and the electromagnetic wave incident surface is a non-zero second thickness, the second thickness being different from the first thickness;

[0020] When electromagnetic waves are incident on the first transmission unit and the second transmission unit...

[0021] The transmitted electromagnetic wave of the first transmission unit has a first transmission phase. The transmitted electromagnetic wave of the second transmission unit has a second transmission phase. First transmission phase and the second transmission phase Within the preset frequency band

[0022] The reflected electromagnetic wave from the first transmission section is a first reflected electromagnetic wave, and the reflected electromagnetic wave from the first dielectric block is a second reflected electromagnetic wave; the first thickness is configured such that the reflected electromagnetic wave from the first transmission unit has a first reflection phase, at least through the interference of the first and second reflected electromagnetic waves. The reflected electromagnetic wave from the second transmission section is a third reflected electromagnetic wave, and the reflected electromagnetic wave from the second dielectric block is a fourth reflected electromagnetic wave; the second thickness is configured such that the reflected electromagnetic wave from the second transmission unit possesses a second reflection phase, at least through the interference of the third and fourth reflected electromagnetic waves. First reflection phase and the second reflection phase Within the preset frequency band, satisfy

[0023] The aforementioned transmission structure has a first thickness and a second thickness that are different and both are non-zero. By rationally configuring the first and second thicknesses, the interference of electromagnetic waves can be used to adjust the first reflection phase. Second reflection phase Within the preset frequency band This allows the aforementioned transmission structure to achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminates specular reflection of the surrounding environment. Simultaneously, the transmission phase of the electromagnetic waves from different transmission units in the aforementioned transmission structure satisfies… This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with transparent substrate materials. Furthermore, by controlling the first and second thicknesses to achieve the above effects, the fabrication difficulty and complexity of the transmission structure can be reduced, thereby facilitating the fabrication of macroscopic products of transmission structures.

[0024] This application also provides a method for preparing the transmission structure as described above.

[0025] A method for fabricating a transmission structure includes: providing a first substrate having an electromagnetic wave incident surface and having a plurality of first transmission regions and a plurality of second transmission regions; forming a patterned first dielectric layer on the first substrate, the patterned first dielectric layer comprising a plurality of first dielectric blocks, each first dielectric block corresponding to each of the first transmission regions; forming a second substrate on the first substrate and the patterned first dielectric layer; forming a patterned second dielectric layer on the second substrate, the patterned second dielectric layer comprising a plurality of second dielectric blocks, each second dielectric block corresponding to each of the second transmission regions, and in a direction perpendicular to the electromagnetic wave incident surface, the first dielectric blocks have a first projection on the electromagnetic wave incident surface, the second dielectric blocks have a second projection on the electromagnetic wave incident surface, the second projections and the first projections are randomly distributed and have no overlapping portion; and forming a third substrate on the second substrate and the patterned second dielectric layer.

[0026] The first substrate, the second substrate, and the third substrate are made of the same material. The first transmission region and at least the first dielectric block, the second substrate portion, and the third substrate portion therecorrespond to it form the first transmission unit. The second transmission region and at least the second substrate portion, the second dielectric block, and the third substrate portion therecorrespond to it form the second transmission unit.

[0027] The above-mentioned method for fabricating the transmission structure can employ deposition and etching processes to produce the aforementioned transmission structure. Furthermore, this method facilitates the rational and convenient configuration of the first thickness, the second thickness, and the thicknesses of the first dielectric block and the second dielectric block, thereby utilizing electromagnetic wave interference to adjust the first reflection phase. Second reflection phase Within the preset frequency band Thus, the transmission structure obtained from the disordered first and second transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, it also helps to ensure that the transmission phase of the transmitted electromagnetic waves from the first and second transmission units satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with transparent substrates.

[0028] In one embodiment, in the first transmission unit, the thickness of the first substrate ranges from 30 nm to 120 nm; in the second transmission unit, the total thickness of the first substrate and the second substrate ranges from 110 nm to 290 nm.

[0029] In one embodiment, in the first transmission unit, the thickness of the first substrate ranges from 40 nm to 80 nm; in the second transmission unit, the total thickness of the first substrate and the second substrate ranges from 130 nm to 160 nm.

[0030] This application also provides another method for preparing the transmission structure as described above.

[0031] A method for fabricating a transmission structure includes: providing a first substrate having an electromagnetic wave incident surface; forming a photoresist layer with a first pattern on the first substrate, the photoresist layer with the first pattern including a plurality of first dielectric holes, and a portion of the first substrate corresponding to the first dielectric holes forming a first transmission region; forming first dielectric blocks in the first dielectric holes; at least removing the photoresist layer with the first pattern; forming a patterned first dielectric layer from the plurality of first dielectric blocks on the first substrate; forming a second substrate on the first substrate and the patterned first dielectric layer; and forming a photoresist layer with a second pattern on the second substrate. The photoresist layer with a second pattern includes a plurality of second dielectric holes, and the first substrate portion corresponding to the second dielectric holes is a second transmission region; a second dielectric block is formed in the second dielectric holes; in a direction perpendicular to the electromagnetic wave incident surface, the first dielectric block has a first projection on the electromagnetic wave incident surface, and the second dielectric block has a second projection on the electromagnetic wave incident surface, the second projection and the first projection are randomly distributed and have no overlapping portion; at least the photoresist layer with the second pattern is removed; the plurality of second dielectric blocks on the second substrate form a patterned second dielectric layer; a third substrate is formed on the second substrate and the patterned second dielectric layer;

[0032] The first substrate, the second substrate, and the third substrate are made of the same material. The first transmission region and at least the first dielectric block, the second substrate portion, and the third substrate portion therecorrespond to it form the first transmission unit. The second transmission region and at least the second substrate portion, the second dielectric block, and the third substrate portion therecorrespond to it form the second transmission unit.

[0033] The above-mentioned method for fabricating the transmission structure can employ deposition and etching processes to produce the aforementioned transmission structure. Furthermore, this method facilitates the rational and convenient configuration of the first thickness, the second thickness, and the thicknesses of the first dielectric block and the second dielectric block, thereby utilizing electromagnetic wave interference to adjust the first reflection phase. Second reflection phase Within the preset frequency band Thus, the transmission structure obtained from the disordered first and second transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, it also helps to ensure that the transmission phase of the transmitted electromagnetic waves from the first and second transmission units satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with a transparent substrate.

[0034] This application also provides a membrane.

[0035] A membrane comprising the transmission structure as described above.

[0036] The aforementioned film can achieve the effect of the wavefront of the transmitted wave remaining basically undisturbed and the reflected wave forming diffuse reflection over a wide frequency range. Furthermore, the aforementioned flexible film can essentially eliminate specular reflection on the surrounding environment. In particular, when the film is flexible, it can be applied to the surface of objects with different surface shapes (such as planes, curved surfaces, etc.), thereby helping to broaden the application range of the transmission structure.

[0037] This application also provides a screen.

[0038] A screen comprising the transmissive structure as described above.

[0039] The aforementioned screen can image electromagnetic waves carrying complete image information projected onto the screen's projection surface (real image) and cause diffuse reflection over a wide frequency range. This allows the projected electromagnetic waves to be reflected in all directions, and the screen can essentially eliminate specular reflections to the surrounding environment. Consequently, an observer located on the screen's reflection side can observe a clear image from all directions. Simultaneously, the screen ensures that the wavefront of the transmitted electromagnetic waves is not disturbed when the electromagnetic waves reflected by an object pass through it. This concentrates the energy of the transmitted electromagnetic waves on the transmission side, which helps the observer capture the complete wavefront information of the transmitted electromagnetic waves from the screen's transmission side, thus enabling clear identification of the object.

[0040] This application also provides a projection system.

[0041] A projection system includes: a screen as described above; and a projection device configured to project light carrying image information onto the screen to display an image.

[0042] The aforementioned projection system can, over a wide frequency range, cause electromagnetic waves carrying complete image information projected by the projection device onto the screen to form a real image on the projection surface of the screen and undergo diffuse reflection, thereby reflecting the projected electromagnetic waves in all directions. Furthermore, the screen can essentially eliminate specular reflections to the surrounding environment, allowing an observer located on the screen's reflection side to observe a clear image from all directions. Simultaneously, the electromagnetic waves reflected by an object can pass through the screen and retain the object's complete transmitted electromagnetic wavefront information, thus facilitating clear object identification by the observer on the screen's transmission side. In particular, considering that the aforementioned screen can also possess a certain degree of transparency, the aforementioned projection system can be used as a head-up display device for automobiles.

[0043] This application also provides a type of glass.

[0044] A glass comprising the transmission structure as described above.

[0045] The aforementioned glass can cause electromagnetic waves carrying complete image information projected onto the glass to form a real image on the projection surface of the glass and undergo diffuse reflection within a wide frequency range. This allows the projected electromagnetic waves to be reflected in all directions. Furthermore, the glass can essentially eliminate specular reflections to the surrounding environment, thus allowing an observer on the reflecting side of the glass to observe a clear image from all directions. At the same time, the wavefront of the electromagnetic waves transmitted through the glass is not disturbed, resulting in energy concentration of the transmitted electromagnetic waves on the transmission side. This facilitates the observer capturing the complete wavefront information of the transmitted electromagnetic waves from the transmission side of the glass, thereby enabling clear identification of the object on that side.

[0046] In one embodiment, the electromagnetic wave transmittance of the glass is less than or equal to a preset value.

[0047] This application also provides a vehicle.

[0048] A vehicle includes: a vehicle body; and glass as described above, disposed on the vehicle body.

[0049] The aforementioned vehicles can eliminate light pollution caused by specular reflection on the glass surface within the visible light frequency range, without reducing the transparency of the glass, allowing people inside the vehicle to still clearly see the outside scenery; furthermore, the glass transmittance mentioned above is not high (usually below 50%), which helps to protect the privacy of the people inside the vehicle.

[0050] In one embodiment, the glass includes a windshield, the windshield includes a projection section; and a projection device disposed inside the vehicle body and configured to project light carrying image information onto the projection section to display an image. Attached Figure Description

[0051] To more clearly illustrate the technical solutions in the embodiments of this specification or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this specification. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0052] Figure 1 This is a spectrum diagram of the reflected phase difference of electromagnetic waves from two transmission units in the prior art.

[0053] Figure 2 This is a schematic diagram of the structure of two transmission units according to an embodiment of this application;

[0054] Figure 3 for Figure 2 A schematic diagram of the disordered arrangement of the two transmission units in the embodiment shown.

[0055] Figure 4 The diagram shows the relationship between the reflected phase of the electromagnetic wave of the transmission unit in an embodiment of this application and the substrate thickness between the embedded layer and the electromagnetic wave incident surface of the transmission unit, as well as the wavelength of the incident electromagnetic wave.

[0056] Figure 5 A schematic diagram of the operation of a transmission structure with heat insulation effect according to an embodiment of this application is shown;

[0057] Figure 6 The transmission phase curves of two transmission units in the visible light band of a specific embodiment 1 of this application are shown;

[0058] Figure 7The reflection phase curves of two transmission units in the visible light band of a specific embodiment 1 of this application are shown;

[0059] Figure 8 The reflection phase difference curves of the two transmission units in the visible light band of a specific embodiment 1 of this application are shown;

[0060] Figure 9 The reflectance curves of two transmission units in the visible light band of a specific embodiment 1 of this application are shown;

[0061] Figure 10 The transmittance curves of two transmission units in the visible light band of a specific embodiment 1 of this application are shown;

[0062] Figure 11 Figures (a) to (e) show the far-field energy distribution diagrams and corresponding comparison diagrams when electromagnetic waves of different wavelengths are incident on Embodiment 1 of this application;

[0063] Figure 12 The transmittance curves of two transmission units in the infrared light band of a specific embodiment 1 of this application are shown;

[0064] Figure 13 The reflection phase difference curves of the two transmission units in the visible light band of a specific embodiment 2 of this application are shown;

[0065] Figure 14 The reflection phase difference curves of the two transmission units in the visible light band of a specific embodiment 3 of this application are shown;

[0066] Figure 15 The reflection phase difference curves of the two transmission units in the infrared light band of specific embodiment 4 of this application are shown;

[0067] Figure 16 This is a schematic diagram of the screen structure according to an embodiment of this application;

[0068] Figure 17 This is a schematic diagram of the structure of a projection system according to an embodiment of this application;

[0069] Figure 18 This is a schematic diagram of the structure of a vehicle according to an embodiment of this application;

[0070] Figure 19 This is a schematic diagram of the fabrication process of a transmission structure according to an embodiment of this application. Detailed Implementation

[0071] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0072] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0073] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0074] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0075] The transmission structure proposed in Chinese invention patent CN110854539B can only achieve a large electromagnetic wave reflection phase difference between two transmission units within a relatively narrow frequency band, such as 0.6π to 1.4π (or -1.4π to -0.6π), and further 0.8π to 1.2π (or -1.2π to -0.8π). In particular, the transmission structure of the above patent can only achieve a electromagnetic wave reflection phase difference of π (or -π) between two transmission units at a single frequency point.

[0076] Specifically, for comparison, this application Figure 1 The above-mentioned patent is shown. Figure 14 The illustrated embodiment shows the spectrum of the reflected phase difference of the electromagnetic waves from the two transmission units. The dotted line indicates the variation of the reflected phase of the electromagnetic wave from transmission unit 1 with frequency, the dashed line indicates the variation of the reflected phase of the electromagnetic wave from transmission unit 2 with frequency, and the solid black line indicates the variation of the reflected phase difference between transmission units 1 and 2 with frequency. It can be seen that transmission units 1 and 2 only satisfy a reflected phase difference of 0.6π to 1.4π in the frequency range of 360THz to 520THz (corresponding to approximately 577nm to 833nm). Furthermore, transmission units 1 and 2 only satisfy a reflected phase difference of 0.8π to 1.2π in the frequency range of 440THz to 460THz. In particular, transmission units 1 and 2 achieve a substantially constant reflected phase difference of π only near a single frequency point (i.e., 430THz). Therefore, it can be seen that existing transmission structures have difficulty achieving the effect of maintaining the wavefront of the transmitted wave basically undisturbed and the reflected wave forming diffuse reflection over a wide frequency range.

[0077] To address the aforementioned issues, this application provides a transmission structure that enables the wavefront of the transmitted wave to remain largely undisturbed over a wide frequency range, while the reflected wave undergoes diffuse reflection and essentially eliminates specular reflections on the surrounding environment.

[0078] like Figure 2 and Figure 3 As shown, the transmission structure 1000 of this application includes a plurality of first transmission units 100 and a plurality of second transmission units 200. The plurality of first transmission units 100 and the plurality of second transmission units 200 are randomly arranged in one surface. The first transmission unit 100 has a first substrate 110, and a first dielectric block 120 is disposed inside the first substrate 110. The thickness of the first substrate 110 between the first dielectric block 120 and the electromagnetic wave incident surface P1 of the first transmission unit 100 is a non-zero first thickness. The second transmission unit 200 has a second substrate 210, and a second dielectric block 220 is disposed inside the second substrate 210. The thickness of the second substrate 210 between the second dielectric block 220 and the electromagnetic wave incident surface P2 of the second transmission unit 200 is a non-zero second thickness, which is different from the first thickness. When the electromagnetic wave is incident on the first transmission unit 100 and the second transmission unit 200, the first transmission phase of the transmitted electromagnetic wave of the first transmission unit 100 is... The second transmission phase of the transmitted electromagnetic wave of the second transmission unit 200 Within the preset frequency band The preset frequency band can be the operating frequency band of the transmission structure 1000. Within the operating frequency band, the transmission structure 1000 can ensure that the wavefront of the transmitted wave is basically undisturbed while the reflected wave forms diffuse reflection, and can basically eliminate specular reflection of the transmission structure 1000. Optionally, the bandwidth of the preset frequency band can be smaller than the bandwidth of the operating frequency band of the transmission structure 1000, that is, the preset frequency band can be located within the operating frequency band of the transmission structure 1000.

[0079] The electromagnetic wave incident surfaces P1 of multiple first transmission units 100 and the electromagnetic wave incident surfaces P2 of multiple second transmission units 200 together form the electromagnetic wave incident surface of the transmission structure 1000. In other words, the multiple first transmission units 100 and the multiple second transmission units 200 should be arranged randomly without intervals. In other words, adjacent first transmission units 100 and second transmission units 200 should be arranged in surface contact.

[0080] Furthermore, by controlling the transmission phase (first transmission phase) of the electromagnetic wave of the first transmission unit 100 and the transmission phase (second transmission phase) of the electromagnetic wave of the second transmission unit 200, the following conditions are met: This allows electromagnetic waves reflected from an object on one side of the transmission structure 1000 to pass through without disturbance of the wavefront, thus concentrating the energy of the transmitted electromagnetic waves on the transmission side. This facilitates the human eye or visual devices in capturing the complete wavefront information of the transmitted electromagnetic waves reflected by the object, enabling clear identification of objects behind the transmission structure. Specifically, the transmission phase difference between the electromagnetic waves of the two transmission units can be 0, 0.1π, 0.2π, 0.3π, 0.4π, and 0.5π. In particular, by controlling the optical path difference of the electromagnetic waves through the first transmission unit 100 and the second transmission unit 200 to meet a certain range, the transmission phase of the electromagnetic waves of the two transmission units can satisfy the aforementioned relationship. Optionally, when the first transmission unit 100 and the second transmission unit 200 are configured such that the optical path lengths of the electromagnetic waves through the first transmission unit 100 and the second transmission unit 200 are substantially the same, the transmission phases of the first transmission unit 100 and the second transmission unit 200 can be considered substantially the same. Therefore, when the dielectric constant and permeability of the first substrate 110 and the second substrate 210 are similar, and the dielectric constant, permeability, and thickness of the first dielectric block 120 and the second dielectric block 220 are also similar, it can be considered that the optical path length of the electromagnetic wave passing through the first transmission unit 100 and the second transmission unit 200 is basically the same. Consequently, the phase difference between the transmitted electromagnetic waves of the first transmission unit 100 and the second transmission unit 200 can basically satisfy the following conditions. In this context, "similar" can be considered as the relative permittivity of the second substrate 210 being within ±0.5 of the relative permittivity of the first substrate 110. For example, if the permittivity of glass and solid acetic acid (or yellow phosphorus or hard rubber) is similar (both have relative permittivity around 4.1), then glass can be used as the first substrate and solid acetic acid (or yellow phosphorus or hard rubber) as the second substrate. The selection of materials for the second dielectric block 220 and the first dielectric block 120 can be similar to the above, and will not be elaborated here.

[0081] Optionally, a plurality of first transmission units 100 and a plurality of second transmission units 200 are configured to... Figure 3 The sequence shown is randomly arranged within one surface. Understandably, the positions of the first transmission unit 100 and the second transmission unit 200 can also be interchanged. Of course, the transmission structure can also be arranged using other random sequences. Figure 3 The arrangement sequence shown is for illustrative purposes only. Furthermore, the arrangement surface of the plurality of first transmission units 100 and the plurality of second transmission units 200 can be a plane, a curved surface, or a bent surface; this application does not limit the shape of the arrangement surface.

[0082] Optionally, the first dielectric block 120 can be disposed within the first substrate 110 in the form of a film layer structure, and the second dielectric block 220 can be disposed within the second substrate 210 in the form of a film layer structure, which simplifies the fabrication of the transmission unit. Optionally, the first dielectric block 120 divides the first substrate 110 into upper and lower parts, and the second dielectric block 220 divides the second substrate 210 into upper and lower parts, which also facilitates the fabrication of the transmission unit and helps to achieve effective heat insulation when the material of the embedded layer is selected as a metal or other material that can block infrared radiation. Optionally, the electromagnetic wave incident surface of the first dielectric block 120 is parallel to the electromagnetic wave incident surface of the first transmission unit 100, and the electromagnetic wave incident surface of the second dielectric block 220 is parallel to the electromagnetic wave incident surface of the second transmission unit 200, which facilitates the formation of the first dielectric block 120 and the second dielectric block 220, and also makes it easier to set the size of the first thickness and the second thickness.

[0083] Optionally, the first substrate 110 can be any one of a prism, cuboid, cube, pyramid, or frustum, and the second substrate 210 can also be any one of a prism, cuboid, cube, pyramid, or frustum. This facilitates the selection and fabrication of different types of first substrates 110 and second substrates 210, and consequently facilitates the fabrication of different types of transmission structures 1000 to meet different fabrication requirements. For example, when the first substrate 110 and the second substrate 210 are hexagonal prisms, it helps to enhance the structural stability of the transmission structure 1000.

[0084] By properly configuring the first thickness and the second thickness, when electromagnetic waves are incident on the first transmission unit 100 and the second transmission unit 200, the first reflection phase of the reflected electromagnetic waves in the first transmission unit 100 can be adjusted. The second reflection phase of the reflected electromagnetic wave of the second transmission unit 200 The difference within the preset frequency band satisfies This helps the transmission structure 1000 to achieve a larger phase difference between the reflected electromagnetic waves of the first transmission unit 100 and the second transmission unit 200 over a wider frequency range.

[0085] Specifically, the reflected electromagnetic wave of the first transmission unit 100 can be represented as the coherent superposition (i.e., interference between the first and second reflected electromagnetic waves) of the reflected electromagnetic wave generated on the electromagnetic wave incident surface of the first substrate 110 and the reflected electromagnetic wave generated on the electromagnetic wave incident surface of the first dielectric block 120. Similarly, the reflected electromagnetic wave of the second transmission unit 200 can be represented as the coherent superposition (i.e., interference between the third and fourth reflected electromagnetic waves) of the reflected electromagnetic wave generated on the electromagnetic wave incident surface of the second substrate 210 and the reflected electromagnetic wave generated on the electromagnetic wave incident surface of the second dielectric block 220. Typically, there is a one-way phase difference between the reflected electromagnetic waves of the first transmission unit 100 and the second transmission unit 200 that varies with frequency. However, since the first thickness of the first transmission unit 100 and the second thickness of the second transmission unit 200 are different, when the frequency of the incident electromagnetic wave changes, the phase change rate of the reflected electromagnetic wave (second reflected electromagnetic wave) of the first dielectric block 120 is different from that of the reflected electromagnetic wave (fourth reflected electromagnetic wave) of the second dielectric block 220. Therefore, by reasonably configuring the second and first thicknesses and using interference, the reflection phases of the reflected electromagnetic waves (i.e., the first and third reflected electromagnetic waves) of the first substrate 110 and the second substrate 210 can correct the first and second reflection phases. This ultimately helps to achieve the effect that the one-way phase difference between the first and second reflection phases remains essentially unchanged with frequency within a certain frequency range. In other words, by reasonably configuring the first and second thicknesses, the coherent superposition between the reflected electromagnetic waves can be used to weaken or cancel the change in the one-way phase difference with frequency, ultimately achieving the effect that the reflected electromagnetic waves of the two transmission units have a large and essentially constant phase difference in the target frequency band.

[0086] In some embodiments, the first thickness and the second thickness can be configured such that the reflection phase difference of the electromagnetic waves from the first transmission unit 100 and the second transmission unit 200 satisfies a preset frequency band. And it remains essentially constant around 0.6π, 0.7π, 0.8π, 0.9π, 1.0π, 1.1π, 1.2π, 1.3π, or 1.4π. This allows the transmission structure 1000 to significantly disperse the energy of the reflected electromagnetic waves in all directions over a wide frequency range, achieving diffuse reflection, essentially eliminating specular reflection on the surrounding environment, concentrating the transmitted wave energy, and ensuring the transmitted wave wavefront is largely undisturbed. Optionally, the phase difference between the reflected electromagnetic waves of the first transmission unit 100 and the second transmission unit 200 is essentially constant at π. This helps the transmission structure 1000 to stably achieve more pronounced diffuse reflection, essentially eliminate specular reflection on the surrounding environment, concentrate the transmitted wave energy, and ensure the transmitted wave wave front is largely undisturbed over a wide frequency range. Figure 4 As shown, when the first thickness of the first transmission unit 100 is 70 nm and the second thickness of the second transmission unit 200 is 160 nm, the first reflection phase of the reflected electromagnetic wave of the first transmission unit 100 is... The second reflection phase of the reflected electromagnetic wave of the second transmission unit 200 The absolute value of the difference is within the range of the preset constant π ± 0.1π, and the wavelength range of the corresponding working frequency band is 400nm~800nm.

[0087] In the aforementioned transmission structure 1000, both the first and second thicknesses are non-zero, and the second and first thicknesses can be used to adjust the first reflection phase by interfering with the reflected electromagnetic waves. Second reflection phase Within the preset frequency band Thus, the transmission structure 1000, composed of these two types of randomly arranged transmission units, can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; simultaneously, the transmission phase of the electromagnetic waves of different transmission units in the aforementioned transmission structure 1000 satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with transparent substrate materials. Furthermore, by controlling the first and second thicknesses to achieve the above effects, the fabrication difficulty and complexity of the aforementioned transmission structure 1000 can be reduced, thereby facilitating the fabrication of macroscopic products of transmission structures.

[0088] It is understandable that adding a period of 2nπ (where n is a non-zero integer) to the aforementioned transmission phase difference and reflection phase difference will not affect the performance of the transmission structure 1000.

[0089] In some embodiments, the first thickness is configured such that the reflection coefficient of the reflected electromagnetic wave of the first transmission unit 100 at a reference frequency is a real number, and the reference frequency is located within a preset frequency band; and the second thickness is configured such that the first reflection phase... Second reflection phase Satisfy at the reference frequency When an electromagnetic wave is incident from an optically less dense medium to an optically denser medium, the reflected electromagnetic wave experiences a half-wave loss (i.e., the vibration direction of the reflected electromagnetic wave leaving the reflection point is opposite to the vibration direction of the incident electromagnetic wave arriving at the incident point). Therefore, considering that the background medium is usually an optically less dense medium (such as air), while the first substrate 110 and the second substrate 210 are usually optically denser media (such as silicon, glass, etc.), when primarily considering the reflected electromagnetic wave (which experiences half-wave loss) at the electromagnetic wave incident surfaces of the first substrate 110 and the second substrate 210, the above arrangement is more conducive to ensuring the first reflection phase. Second reflection phase It can be achieved over a wide frequency range. The effect. It is understood that, in other embodiments, the second thickness may be configured such that the reflection coefficient of the second transmission element 200 at the reference frequency is real, while the first thickness is configured such that the first reflection phase... Second reflection phase Satisfy at the reference frequency The technical effects corresponding to the two descriptions above are the same. For ease of description, the smaller of the first thickness and the second thickness is taken as the first thickness in each embodiment of this application.

[0090] Optionally, the reference frequency can be selected as the center frequency near the middle of the expected operating frequency band (e.g., halfway between the two). For example, if the expected operating frequency band is f1 to f2, the reference frequency could be (f1+f2) / 2 to simplify calculations and facilitate adjustment of the actual operating frequency band. On the other hand, since the reflection coefficient is a complex number, it can be determined using the expression for the reflection coefficient in electromagnetism. It is understood that the phrase "making the reflection coefficient of the first transmission unit 100 at the reference frequency a real number" in this application means that the reflection phase of the electromagnetic wave of the first transmission unit 100 at the reference frequency (i.e., The reflection coefficient is 0 or ±kπ, where k is a non-zero integer. It should be noted that in practical applications, considering the slight absorption inherent in the material itself, it is usually difficult to make the reflection coefficient of the first transmission unit 100 at the reference frequency completely real. Therefore, when the imaginary part of the reflection coefficient is extremely small, that is, close to 0 (e.g., the value of the imaginary part is less than 0.01, and further less than 0.001), it should still be considered to meet the reflection coefficient requirements proposed in this application.

[0091] In addition, according to the formula Where m is an integer, it can be seen that in the structure of the above transmission unit, the change in the difference between the second thickness and the first thickness (|d1-d2|) corresponds to the difference in the reflection phase of the electromagnetic waves of the first transmission unit 100 and the second transmission unit 200. The change in thickness allows for the adjustment of the first reflection phase by appropriately configuring the second and first thicknesses. Second reflection phase The difference satisfies the following at the reference frequency. This facilitates the transmission structure 1000 to achieve the first reflection phase over a wide frequency range near the reference frequency. Second reflection phase satisfy The effect is that, at the reference frequency, the reflected phase difference of the electromagnetic waves from the two transmission units can be any one of 0.8π, 0.9π, 1.0π, 1.1π, or 1.2π.

[0092] Optionally, the first substrate 110 and the second substrate 210 are made of the same material. Optionally, the first dielectric block 120 and the second dielectric block 220 are made of the same material. Optionally, the first dielectric block 120 and the second dielectric block 220 have the same thickness. These settings simplify the process of determining the second thickness and the first thickness. Figure 4 As shown, Figure 4 This paper presents a curve showing the relationship between the reflected phase of an electromagnetic wave in a transmission unit, where the substrate is silicon dioxide, the embedded layer is 25 nm thick, and the embedded layer is made of gold, and the substrate thickness (dc) between the embedded layer and the electromagnetic wave incident surface of the transmission unit, and the wavelength of the incident electromagnetic wave. The horizontal axis represents the wavelength of the electromagnetic wave incident on the transmission structure 1000, in nanometers, and the vertical axis represents the phase of the reflected electromagnetic wave, in degrees. It can be seen that when the first thickness is controlled to be 40 nm and the second thickness to be 160 nm, the corresponding wavelength range satisfying the reflection phase difference of 0.6π to 1.4π (corresponding to 108 degrees to 252 degrees) is 600 nm to 1300 nm. The corresponding reference frequency is approximately 1150 nm. At the reference frequency, the second reflection phase of the reflected electromagnetic wave from the second transmission unit 200 is near 0, and the reflection coefficient of the reflected electromagnetic wave from the second transmission unit 200 is approximately a real number. Simultaneously, the first reflection phase... Second reflection phase The absolute value of the difference is around 0.8π; when the first thickness is controlled to be 70nm and the second thickness to be 160nm, the corresponding wavelength range that satisfies the reflection phase difference being between 0.6π and 1.4π is at least 400nm to 1140nm; it can be seen that the reference frequency is approximately 650nm, at which point the first reflection phase of the reflected electromagnetic wave of the first transmission unit 100 is near 0, the reflection coefficient of the reflected electromagnetic wave of the first transmission unit 100 is approximately a real number, and the first reflection phase... Second reflection phase The absolute value of the difference is located near π. Therefore, compared with the prior art, the transmission structure 1000 of this application is significantly more advantageous in having a wider operating frequency range.

[0093] Depend on Figure 4 It can also be seen that the preset frequency band includes at least a portion of the visible light frequency band and / or at least a portion of the infrared light frequency band. It should be noted that the visible light frequency band described in this application ranges from 400nm to 760nm, and the infrared light frequency band ranges from 760nm to 1mm. When the preset frequency band includes at least a portion of the visible light frequency band, the transmission structure 1000 can be used to manufacture building glass curtain walls, automotive glass, etc., thereby helping to avoid the harm of urban light pollution; when the preset frequency band includes at least a portion of the infrared light frequency band, the transmission structure 1000 can be used to manufacture infrared projectors.

[0094] Furthermore, the second thickness is configured to make the first reflection phase... Second reflection phase The absolute value of the difference is π at the reference frequency. Similarly, in other embodiments, when the second thickness is configured such that the reflection coefficient of the reflected electromagnetic wave of the second transmission unit 200 at the reference frequency is a real number, the corresponding first thickness can be configured such that the first reflection phase is... Second reflection phase The absolute value of the difference is π at the reference frequency. The technical effects corresponding to the two statements above are consistent. This is beneficial for the transmission structure 1000 to stably achieve more pronounced diffuse reflection, essentially eliminate specular reflection on the surrounding environment, concentrate transmitted wave energy, and ensure that the transmitted wave wavefront is basically undisturbed within a wide frequency range. For example... Figure 4 As shown, when the first thickness is 70nm and the second thickness is 160nm, the first reflection phase... Second reflection phase The absolute value of the difference is close to π at the reference frequency of 630nm, and the wavelength range of the corresponding operating frequency band is 400nm to 800nm.

[0095] In some embodiments, the reflectivity R1 of the first transmission unit 100 and the reflectivity R2 of the second transmission unit 200 are substantially the same or identical within a preset frequency band. This facilitates a more uniform energy distribution of the reflected electromagnetic waves in the reflection-side space, thereby further improving the uniformity of diffuse reflection light distribution. In some embodiments, the transmittance T1 of the first transmission unit 100 and the transmittance T2 of the second transmission unit 200 are the same within a preset frequency band. This facilitates a more uniform energy distribution of the transmitted electromagnetic waves in the transmission-side space, thereby improving the quality of transmission imaging.

[0096] In some embodiments, the first thickness d1 ranges from 30nm to 120nm, and the second thickness d2 ranges from 110nm to 290nm. For example, d1 can be any one of 30nm, 50nm, 70nm, 90nm, 110nm, and 120nm, and d2 can be any one of 110nm, 140nm, 170nm, 200nm, 240nm, 280nm, and 290nm. By controlling the first thickness d1 and the second thickness d2 to meet the above ranges, it is helpful to form a transmission structure 1000 that meets the reflection phase difference requirements over a wider frequency range in the visible light band and / or infrared band. Furthermore, if the first thickness d1 ranges from 40nm to 80nm and the second thickness d2 ranges from 130nm to 160nm, it is beneficial to control the operating frequency band of the transmission structure 1000 within the visible light band, meeting the application needs of everyday life such as glass curtain walls and automotive glass.

[0097] In some embodiments, the first substrate 110 and the second substrate 210 are made of the same material, and the first dielectric block 120 and the second dielectric block 220 are both of the same thickness and material. This arrangement facilitates the rapid determination of appropriate first thickness d1 and second thickness d2 to achieve the broadband reflection and diffuse reflection effect of the transmission structure 1000, thereby reducing manufacturing costs. For example, the first substrate 110 and the second substrate 210 can both be made of glass or solid acetic acid, and the first dielectric block 120 and the second dielectric block 220 can both be made of metal or dielectric, etc.

[0098] In some embodiments, the materials of the first substrate 110 and the second substrate 210 may include at least one of dielectric and semiconductor, such as silicon (Si), silicon dioxide (SiO2), silicon nitride (SiN), gallium nitride (GaN), titanium dioxide (TiO2), and optical plastics. The optical plastics may include transparent plastics such as polymethyl methacrylate (PMMA, commonly known as plexiglass), polystyrene (PS), polycarbonate (PC), styrene-acrylonitrile (AS or SAN), styrene-methyl methacrylate copolymer (MS), poly4-methyl-1-pentene (trade name TPX), and transparent polyamide. The materials of the first dielectric block 120 and the second dielectric block 220 may both include at least one of metal and non-metal. Non-metals may include at least one of dielectric and semiconductor (such as silicon, graphene, etc.). Silicon nitride (SiN), gallium nitride (GaN), and titanium dioxide (TiO2) are materials with low absorption in the visible light band, while silicon (Si) is a material with high absorption in the visible light band. In this way, the transmission structure 1000 of this application can be prepared using many materials commonly found in nature, which helps to reduce the difficulty of material selection for the transmission structure 1000 and thus reduce the preparation cost.

[0099] Preferably, when the first dielectric block 120 and the second dielectric block 220 are made of metal, such as at least one of copper, silver, gold, aluminum, and platinum, this is beneficial in that the embedded layer can maintain its sheet-like structure even when it is processed to be very thin (e.g., at the nanometer scale). Furthermore, as... Figure 5 As shown, it can effectively suppress the transmittance of electromagnetic waves in the infrared light band, thereby isolating the thermal radiation of the infrared band and solving the problem of temperature rise caused by the transmission of infrared light. For example, when the first substrate 110 and the second substrate 210 are made of glass, and the first dielectric block 120 and the second dielectric block 220 are made of metal, the transmission structure 1000 is preferably used to manufacture building glass curtain walls or automotive glass, so that in addition to preventing light pollution and not affecting the vision of people inside the house or vehicle, it can also make the house or vehicle warm in winter and cool in summer.

[0100] Optionally, the first dielectric block 120 and the second dielectric block 220 are made of gold to achieve better broadband diffuse reflection, basically eliminate specular reflection on the surrounding environment, concentrate transmitted wave energy, and ensure that the transmitted wave wavefront is not disturbed. Of course, from the perspective of manufacturing cost, other metal materials can also be selected, and this application does not limit this.

[0101] It should be noted that in some embodiments, the transmittance of the transmission structure 1000 is less than or equal to 50%. Therefore, when the illuminance on both sides of the transmission structure 1000 is not significantly different, the privacy of people on one side of the transmission structure 1000 can be effectively guaranteed. For example, when the aforementioned transmission structure 1000 is applied to the side and rear windows of a vehicle, it is difficult for people outside the vehicle to see the situation inside the vehicle during the day, thus ensuring privacy to a certain extent. At the same time, people inside the vehicle can clearly observe the road environment outside through the side and rear windows. Similarly, when the aforementioned transmission structure 1000 is applied to the glass curtain wall of a building, it is difficult for people outside the building to see the situation inside the building during the day, thus ensuring the privacy of people inside the building. At the same time, people inside the building can clearly observe the view outside the building through the glass curtain wall, thereby ensuring a wide field of vision inside the building.

[0102] Optionally, in other embodiments, the transmittance of the first transmission unit 100 and the second transmission unit 200 can be appropriately reduced, or an anti-reflective coating or an anti-reflective coating can be provided on the electromagnetic wave incident surface and / or electromagnetic wave emitting surface of the transmission structure to further reduce the illuminance inside the room or vehicle, thereby better protecting the privacy of people inside the room or vehicle. Of course, when the transmission structure 1000 is used to prepare a display screen for displaying goods or corporate image, the above-mentioned scheme of reducing transmittance is not necessary. Therefore, users can choose to customize transmission structure products that meet the required effects according to actual conditions to meet the application needs of different scenarios.

[0103] In some embodiments, when both the first dielectric block 120 and the second dielectric block 220 are made of metal, both the first dielectric block 120 and the second dielectric block 220 have a preset thickness, wherein the preset thickness is less than or equal to the skin depth of the metal. Skin depth refers to the thickness at which most of the charge resides when it propagates within a conductor, and its calculation formula can be expressed as follows: Where δ represents the skin depth, σ0 represents the conductivity of the conductor, ω represents the electromagnetic wave frequency, and μ0 represents the free magnetic permeability. In the visible light band, the skin depth of a typical metal is approximately 100 nm. When the preset thickness of the metal is less than its skin depth at its operating frequency, electromagnetic waves can pass through the metal, exhibiting a certain degree of transmittance.

[0104] Furthermore, the thickness of the first dielectric block 120 ranges from 10 nm to 100 nm; the thickness of the second dielectric block 220 also ranges from 10 nm to 100 nm. For example, the thickness of both the first dielectric block 120 and the second dielectric block 220 can be 10 nm, 20 nm, 40 nm, 60 nm, 80 nm, or 100 nm. By controlling the thickness of the first dielectric block 120 and the second dielectric block 220 to meet the above ranges, it is beneficial to achieve a balance between ensuring the isolation of infrared thermal radiation, reducing the fabrication difficulty, and ensuring a certain electromagnetic wave transmittance. When the thickness is less than 10 nm, quantum effects may occur during fabrication, leading to increased fabrication difficulty of the transmission structure 1000 and a deterioration in the effect of isolating infrared thermal radiation; while when the thickness is greater than 100 nm, the electromagnetic wave transmittance of the transmission structure 1000 is easily reduced, approaching 0.

[0105] In some embodiments, the transmission structure 1000 further includes at least one protective layer (not shown in the figure), which may be disposed on the electromagnetic wave incident surface and / or electromagnetic wave emitting surface of the transmission structure 1000. By providing a protective layer, it is beneficial to protect the transmission structure 1000, thereby avoiding damage to the transmission structure 1000 from external forces to a certain extent.

[0106] Specific embodiments of the transmission structure applicable to the above-described embodiments are further described below with reference to the accompanying drawings. Specific Implementation Example 1

[0108] The following is for reference Figures 2 to 12 The transmission structure 1000 of Embodiment 1 of this application is described.

[0109] Figure 2 A schematic diagram of the structure of two transmission units in the transmission structure 1000 is shown. Figure 3 A schematic diagram of the arrangement of two transmission units is shown. It can be seen that the first transmission unit 100 and the second transmission unit 200 are arranged randomly on one surface. The first transmission unit 100 has an electromagnetic wave incident surface P1, and the second transmission unit 200 has an electromagnetic wave incident surface P2. The first transmission unit 100 contains a first dielectric block 120. The thickness of the first substrate 110 between the top surface of the first dielectric block 120 and the electromagnetic wave incident surface P1 is a non-zero first thickness d1. The second transmission unit 200 contains a second dielectric block 220. The thickness of the second substrate 210 between the top surface of the second dielectric block 220 and the electromagnetic wave incident surface P2 is a non-zero second thickness d2. The second thickness d2 is different from the first thickness d1.

[0110] In this embodiment, both the first substrate 110 and the second substrate 210 are made of glass (silicon dioxide, SiO2), and both the first dielectric block 120 and the second dielectric block 220 are made of gold (Au). Furthermore, both the first dielectric block 120 and the second dielectric block 220 have a thickness of 25 nm. Therefore, [the following is a continuation of the previous sentence, but the translation is incomplete]. Figure 4 As can be seen, when the first thickness d1 is 70nm and the second thickness d2 is 160nm, the first transmission unit 100 and the second transmission unit 200 can make the absolute value of the phase difference of the reflected light of visible light with wavelengths in the range of 400nm to 750nm close to π, such as within the range of π ± 0.1π. This allows the transmission structure 1000 to have good diffuse reflection, essentially eliminate specular reflection of the surrounding environment, concentrate transmitted wave energy, and have a basically undisturbed wavefront across a wide frequency range. In this embodiment, the reference frequency is approximately 630nm. In this embodiment, the specular reflectivity of the transmission structure 1000 to the surrounding environment can be reduced to less than or equal to 1%.

[0111] Furthermore, this application Figures 6 to 10 The transmission phase diagram, reflection phase diagram, reflection phase difference diagram, reflectivity diagram, and transmittance diagram of the electromagnetic waves from the first transmission unit 100 and the second transmission unit 200 are shown respectively when the first thickness d1 is 70 nm and the second thickness d2 is 160 nm in this embodiment. Figure 6 As shown, the transmission phases of the electromagnetic waves from the first transmission unit 100 (solid line) and the second transmission unit 200 (dashed line) are the same or similar in the visible light frequency band, with a maximum phase difference of about 18°; Figure 7 and Figure 8 As shown, the reflected phases of the electromagnetic waves from the first transmission unit 100 and the second transmission unit 200 differ by approximately 180° or -180° in the visible light frequency band; for example... Figure 9 As shown, the reflectivities of the first transmission unit 100 and the second transmission unit 200 are quite similar in the visible light band, with a maximum difference of about 20%; Figure 10 As shown, the transmittance of the first transmission unit 100 and the second transmission unit 200 is also quite similar in the visible light band, with a maximum difference of about 20%.

[0112] Furthermore, this application Figure 11 Figures (a) through (e) also show electromagnetic waves with wavelengths of 400 nm, 500 nm, 600 nm, 700 nm, and 800 nm incident on the transmission structure 1000 of this embodiment (i.e., Figure 11The image shows the far-field energy distribution of a novel type of glass. The first transmission unit 100 and the second transmission unit 200 are arranged in the xy plane, and an electromagnetic wave is incident on the transmission structure 1000 along the -z direction. It can be seen that electromagnetic waves of various wavelengths undergo diffuse reflection at the electromagnetic wave incident surface of the transmission structure 1000. The reflected electromagnetic waves are dispersed in various directions on the reflection side of the transmission structure 1000, while the transmitted electromagnetic waves retain the wavefront of the incident electromagnetic wave on the transmission side of the transmission structure 1000. This ensures that the energy of the transmitted electromagnetic wave remains concentrated in the -z principal direction, thus maintaining the propagation direction of the incident electromagnetic wave.

[0113] As a comparison Figure 11 Electromagnetic waves with wavelengths of 400 nm, 500 nm, 600 nm, 700 nm, and 800 nm incident on homogeneous glass (i.e., Figure 11 The image shows the far-field energy distribution of the control glass. It can be seen that electromagnetic waves of various wavelengths undergo specular reflection at the electromagnetic wave incident surface of the uniform glass. The energy of the reflected electromagnetic waves is concentrated in the z-direction on the reflecting side of the uniform glass. Meanwhile, the transmitted electromagnetic waves retain the wavefront of the incident electromagnetic waves on the transmitting side of the transmission structure 1000, ensuring that the energy of the transmitted electromagnetic waves remains concentrated in the -z principal direction, thus maintaining the propagation direction of the incident electromagnetic waves.

[0114] On the other hand, since both the first dielectric block 120 and the second dielectric block 220 in this embodiment are made of gold, the transmittance of electromagnetic waves in the infrared light band can be effectively suppressed, and thermal radiation in the infrared band can be isolated. Figure 5 As shown. Specifically, Figure 12 The diagram shows the transmittance as a function of wavelength when electromagnetic waves are incident on the first transmission unit 100 (solid line) and the second transmission unit 200 (dashed line). It can be seen that the transmittance of electromagnetic waves in the infrared band is at most less than 30%, and the transmittance gradually decreases with increasing wavelength, eventually approaching 0. In existing technologies, such as the transmission structure 600 in the aforementioned patent CN110854539B, even if each block is made of metal, the transmittance in the infrared band is still higher than 80%, resulting in poor heat insulation. Specific Implementation Example 2

[0116] The following is for reference Figure 13 The transmission structure 1000 of Embodiment 2 of this application is described. In this embodiment, for the sake of brevity, descriptions similar to those in Embodiment 1 are omitted.

[0117] In this embodiment, both the first substrate 110 and the second substrate 210 are made of silicon nitride (SiN), and both the first dielectric block 120 and the second dielectric block 220 are made of gold (Au). Furthermore, both the first dielectric block 120 and the second dielectric block 220 have a thickness of 50 nm. Figure 13As can be seen, when the first thickness d1 is 70nm and the second thickness d2 is 130nm, the first transmission unit 100 and the second transmission unit 200 can make the absolute value of the phase difference of the reflected light of visible light with wavelengths in the range of 400nm to 750nm close to π, such as within the range of π ± 0.1π. This allows the transmission structure 1000 to have good diffuse reflection, essentially eliminate specular reflection of the surrounding environment, concentrate transmitted wave energy, and have a basically undisturbed transmitted wave front across a wide frequency range. In this embodiment, the reference frequency is approximately 650nm. Specific Implementation Example 3

[0119] The following is for reference Figure 14 The transmission structure 1000 of Embodiment 3 of this application is described. In this embodiment, for the sake of brevity, descriptions similar to those in Embodiment 1 are omitted.

[0120] In this embodiment, both the first substrate 110 and the second substrate 210 are made of glass (silicon dioxide, SiO2), and both the first dielectric block 120 and the second dielectric block 220 are made of silicon (Si), with a thickness of 25 nm for both. Figure 14 As can be seen, when the first thickness d1 is 80nm and the second thickness d2 is 160nm, the first transmission unit 100 and the second transmission unit 200 can make the absolute value of the phase difference of the reflected light of visible light with wavelengths in the range of 400nm to 750nm close to π, such as within the range of π ± 0.1π. This allows the transmission structure 1000 to have good diffuse reflection, essentially eliminate specular reflection of the surrounding environment, concentrate transmitted wave energy, and ensure that the transmitted wave wavefront is not disturbed over a wide frequency range. In this embodiment, the reference frequency is approximately 600nm. At this time, the second reflection phase is near -π, and the reflection coefficient of the reflected electromagnetic wave of the second transmission unit 200 is a real number. Specific Implementation Example 4

[0122] The following is for reference Figure 15 The transmission structure 1000 of Embodiment 4 of this application is described. In this embodiment, for the sake of brevity, descriptions similar to those in Embodiment 1 are omitted.

[0123] In this embodiment, both the first substrate 110 and the second substrate 210 are made of glass (silicon dioxide, SiO2), and both the first dielectric block 120 and the second dielectric block 220 are made of gold (Au). Furthermore, both the first dielectric block 120 and the second dielectric block 220 have a thickness of 25 nm. Figure 15As can be seen, when the first thickness d1 is 120nm and the second thickness d2 is 290nm, the first transmission unit 100 and the second transmission unit 200 can make the absolute value of the phase difference of the reflected light of infrared light with wavelengths in the range of 800nm ​​to 1500nm close to π, such as within the range of π ± 0.1π. This allows the transmission structure 1000 to have good diffuse reflection, essentially eliminate specular reflection of the surrounding environment, concentrate transmitted wave energy, and ensure that the transmitted wave front is not disturbed over a wide frequency range. In this embodiment, the reference frequency is approximately 1000nm.

[0124] This application also provides a method for preparing the above-mentioned transmission structure 1000. Specifically, the preparation method includes:

[0125] S110. Determine the reference frequency based on the operating frequency band of the transmission structure. The reference frequency is located within the operating frequency band.

[0126] The reference frequency can be selected as the frequency near the middle of the expected operating frequency band (such as halfway). For example, if the expected operating frequency band is f1 to f2, the reference frequency can be (f1+f2) / 2 to simplify the calculation and facilitate the adjustment of the actual operating frequency band.

[0127] S120. Provide a plurality of first transmission units. Each first transmission unit has a first substrate. A first dielectric block is disposed in the first substrate. The substrate thickness between the first dielectric block and the electromagnetic wave incident surface of the first transmission unit is a non-zero first thickness. The first thickness is configured such that the reflection coefficient of the reflected electromagnetic wave of the first transmission unit at the reference frequency is a real number.

[0128] S130. Provide a plurality of second transmission units. Each second transmission unit has a second substrate. A second dielectric block is disposed in the second substrate. The substrate thickness between the second dielectric block and the electromagnetic wave incident surface of the second transmission unit is a non-zero second thickness, which is different from the first thickness.

[0129] When an electromagnetic wave is incident on the first transmission unit and the second transmission unit, the transmitted electromagnetic wave in the first transmission unit has a first transmission phase. The transmitted electromagnetic wave of the second transmission unit has a second transmission phase. First transmission phase Second transmission phase Within the preset frequency band The first thickness is configured such that the reflected electromagnetic waves of the first transmission unit acquire a first reflection phase through the interference of the reflected electromagnetic waves from the first substrate and the first dielectric block. The second thickness is configured such that the second transmission unit's reflected electromagnetic wave acquires a second reflection phase, at least through the interference of the reflected electromagnetic waves from the second substrate and the second dielectric block. First reflection phase Second reflection phase Satisfy at the reference frequency

[0130] S140. A plurality of first transmission units and a plurality of second transmission units are arranged randomly on a surface, and the electromagnetic wave incident surfaces of the plurality of first transmission units and the electromagnetic wave incident surfaces of the plurality of second transmission units together form the electromagnetic wave incident surface of the transmission structure.

[0131] The above-described method for fabricating a transmission structure, by rationally configuring a non-zero first and second thickness, can correspondingly utilize the interference of electromagnetic waves to adjust the first reflection phase. Second reflection phase Within the preset frequency band Thus, the transmission structure obtained by the disordered arrangement of the first and second transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, because the transmission phase of the electromagnetic waves of different transmission units satisfies Therefore, the wavefront of the transmitted wave can be kept largely undisturbed, and for transmission structures with transparent substrate materials, it also has low haze. In addition, by controlling the first and second thicknesses to achieve the above effects, it is beneficial to reduce the difficulty and complexity of the fabrication of the above transmission structure, thereby facilitating the fabrication of macroscopic products of transmission structures.

[0132] In some embodiments, the method further includes: further adjusting the second thickness to adjust the first reflection phase. Second reflection phase The absolute value of the difference is π at the reference frequency.

[0133] In some implementations, the preset frequency band includes at least a portion of the visible light frequency band and / or at least a portion of the infrared light frequency band.

[0134] In some implementations, the first thickness d1 ranges from 30 nm to 120 nm, and the second thickness d2 ranges from 110 nm to 290 nm.

[0135] In some implementations, the first thickness d1 ranges from 40 nm to 80 nm, and the second thickness d2 ranges from 130 nm to 160 nm.

[0136] The effects of the above-described embodiments are basically the same as those described in the aforementioned transmission structure 1000, and will not be repeated here.

[0137] This application also provides another transmission structure (see reference). Figure 19The transmission structure 2000 includes: a substrate having an electromagnetic wave incident surface, comprising a plurality of randomly distributed first transmission portions and a plurality of second transmission portions; wherein, each first transmission portion contains a first dielectric block to form a first transmission unit, and the thickness of the substrate between the first dielectric block and the electromagnetic wave incident surface is a non-zero first thickness; each second transmission portion contains a second dielectric block to form a second transmission unit, and the thickness of the substrate between the second dielectric block and the electromagnetic wave incident surface is a non-zero second thickness, the second thickness being different from the first thickness;

[0138] When electromagnetic waves are incident on the first transmission unit and the second transmission unit

[0139] The transmitted electromagnetic wave of the first transmission unit has a first transmission phase. The transmitted electromagnetic wave of the second transmission unit has a second transmission phase. First transmission phase Second transmission phase Within the preset frequency band

[0140] The reflected electromagnetic wave from the first transmission section is a first reflected electromagnetic wave, and the reflected electromagnetic wave from the first dielectric block is a second reflected electromagnetic wave; the first thickness is configured such that the reflected electromagnetic wave from the first transmission unit has a first reflection phase, at least through the interference of the first and second reflected electromagnetic waves. The reflected electromagnetic wave from the second transmission section is a third reflected electromagnetic wave, and the reflected electromagnetic wave from the second dielectric block is a fourth reflected electromagnetic wave; the second thickness is configured such that the reflected electromagnetic wave from the second transmission unit possesses a second reflection phase, at least through the interference of the third and fourth reflected electromagnetic waves. First reflection phase and the second reflection phase Within the preset frequency band, satisfy

[0141] The aforementioned transmission structure has a first transmission section and a second transmission section with random distribution. The first thickness of the first dielectric block and the second thickness of the second dielectric block are different and both are non-zero thicknesses. By reasonably configuring the first thickness and the second thickness, the interference of electromagnetic waves can be used to adjust the first reflection phase. Second reflection phase Within the preset frequency band This allows the aforementioned transmission structure to achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminates specular reflection of the surrounding environment. Simultaneously, the transmission phase of the electromagnetic waves from different transmission units in the aforementioned transmission structure satisfies… This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with transparent substrate materials. Furthermore, by controlling the first and second thicknesses to achieve the above effects, the fabrication difficulty and complexity of the transmission structure can be reduced, thereby facilitating the fabrication of macroscopic products of transmission structures.

[0142] In some embodiments, the first thickness is configured such that the reflection coefficient of the reflected electromagnetic wave from the first transmission unit is a real number at a reference frequency, the reference frequency being within a preset frequency band; and the second thickness is configured such that the first reflection phase... Second reflection phase Satisfy at the reference frequency

[0143] In some embodiments, the second thickness is configured to make the first reflection phase Second reflection phase The absolute value of the difference is π at the reference frequency.

[0144] In some implementations, the preset frequency band includes at least a portion of the visible light frequency band and / or at least a portion of the infrared light frequency band.

[0145] In some implementations, the first thickness d1 ranges from 30 nm to 120 nm, and the second thickness d2 ranges from 110 nm to 290 nm.

[0146] In some implementations, the first thickness d1 ranges from 40 nm to 80 nm, and the second thickness d2 ranges from 130 nm to 160 nm.

[0147] In some embodiments, the substrate material may include at least one of dielectric and semiconductor, such as at least one of silicon (Si), silicon dioxide (SiO2), silicon nitride (SiN), gallium nitride (GaN), titanium dioxide (TiO2), and optical plastic. The materials of the first dielectric block and the second dielectric block may both include at least one of metal, dielectric, and semiconductor, such as at least one of copper, silver, gold, aluminum, platinum, silicon, and graphene.

[0148] The above embodiments have the same effect on the transmission structure as those described in the aforementioned transmission structure 1000, and will not be repeated here.

[0149] This application also provides a method for preparing a transmission structure 2000, such as... Figure 19 As shown, the preparation method includes:

[0150] S210. A first substrate 50 is provided, the first substrate having an electromagnetic wave incident surface P, and the first substrate 50 includes a plurality of first transmission regions 300' (the 1st, 4th, 5th and 7th small blocks from the left) and a plurality of second transmission regions 400' (the 2nd, 3rd and 6th small blocks from the left);

[0151] S220. A patterned first dielectric layer is formed on the first substrate 50. The patterned first dielectric layer includes a plurality of first dielectric blocks 320. Each first dielectric block 320 corresponds one-to-one with each first transmission region 300'. The thickness of the first substrate 50 between the first dielectric block 320 and the electromagnetic wave incident surface P is a first thickness d1.

[0152] A first dielectric block 320 is formed on the side of each first transmission region 300' away from the electromagnetic wave incident surface P. Specifically, a first dielectric material layer 320' can be deposited first through a deposition process, and then the first dielectric material layer 320' can be etched using a mask and photoresist to form a patterned first dielectric layer on the side of the first substrate 50 away from the electromagnetic wave incident surface P.

[0153] S230, A second substrate 60 is formed on the first substrate 50 and the patterned first dielectric layer, wherein the second substrate 60 and the first substrate 50 are made of the same material;

[0154] Specifically, the second substrate 60 can also be formed on the side away from the electromagnetic wave incident surface P of the first substrate 50 and the patterned first dielectric layer by a deposition process;

[0155] S240, A patterned second dielectric layer is formed on the second substrate 60. The patterned second dielectric layer includes a plurality of second dielectric blocks 420. Each second dielectric block 420 corresponds one-to-one with each second transmission region 400'. The thickness of the first substrate 50 and the second substrate 60 between the second dielectric block 420 and the electromagnetic wave incident surface P is the second thickness d2.

[0156] That is, a second dielectric block 420 is formed on the side of the second substrate 60 corresponding to each second transmissive part 400' away from the electromagnetic wave incident surface P; specifically, a second dielectric material layer 420' can be deposited first by a deposition process, and then the second dielectric material layer 420' can be etched using a mask and photoresist to form a patterned second dielectric layer on the side of the second substrate 60 away from the electromagnetic wave incident surface P.

[0157] S250, a third substrate 70 is formed on the second substrate 60 and the patterned second dielectric layer, wherein the third substrate 70 and the second substrate 60 are made of the same material;

[0158] Specifically, the third substrate 70 can also be formed on the side away from the electromagnetic wave incident surface P of the second substrate 60 and the patterned second dielectric layer by a deposition process; by forming the third substrate 70, it is beneficial to planarize the surface of the transmission structure 200, which in turn is beneficial to engineering adaptation and application.

[0159] Wherein, along the normal direction of the electromagnetic wave incident surface P, the first dielectric block 320 has a first projection on the electromagnetic wave incident surface P, and the second dielectric block 420 has a second projection on the electromagnetic wave incident surface P, with no overlap between the first projection and the second projection; the first transmission region 300' and its corresponding first dielectric block 320, a portion of the second substrate 60 and a portion of the third substrate 70 can form a first transmission unit 300, and the second transmission region 400' and its corresponding portion of the second substrate 60, the second dielectric block 420 and a portion of the third substrate 70 can form a second transmission unit 400;

[0160] Furthermore, when electromagnetic waves are incident on the first transmission unit 300 and the second transmission unit 400, the transmitted electromagnetic waves of the first transmission unit 300 have a first transmission phase. The transmitted electromagnetic wave of the second transmission unit 400 has a second transmission phase. First transmission phase Second transmission phase Within the preset frequency band The first thickness d1 is configured such that the first transmission unit 300, at least through the interference of the electromagnetic wave reflected by the electromagnetic wave incident surface P and the first dielectric block 320, enables the reflected electromagnetic wave of the first transmission unit 300 to possess a first reflection phase. The second thickness d2 is configured such that the second transmission unit 400, at least through the interference of the electromagnetic wave reflected from the electromagnetic wave incident surface P and the second dielectric block 420, gives the reflected electromagnetic wave of the second transmission unit 400 a second reflection phase. First reflection phase Second reflection phase Within the preset frequency band

[0161] Ultimately, a transmission structure 2000 can be formed that enables the wavefront of the transmitted wave to remain largely undisturbed over a wide frequency range, while the reflected wave forms diffuse reflection and essentially eliminates specular reflection on the surrounding environment.

[0162] The phase condition in the above preparation method can be met through simulation and experimental detection. The setting and thickness control of the dielectric layer can be achieved by performing deposition and photolithography on the substrate. The substrate material can be glass, and the materials of the two dielectric layers can be metals (such as gold, silver, aluminum, etc.), which facilitates the preparation of the transmission structure 2000.

[0163] In some embodiments, in the first transmission unit 300, the thickness of the first substrate 50 ranges from 30 nm to 120 nm; in the second transmission unit, the total thickness of the first substrate 50 and the second substrate 60 ranges from 110 nm to 290 nm.

[0164] In some embodiments, in the first transmission unit 300, the thickness of the first substrate 50 ranges from 40 nm to 80 nm; in the second transmission unit, the total thickness of the first substrate 50 and the second substrate 60 ranges from 130 nm to 160 nm.

[0165] The effects of the above embodiments on the transmission structure 2000 are the same as those described in the aforementioned transmission structure 1000, and will not be repeated here.

[0166] This application also provides another method for fabricating a transmission structure 2000 (not shown in the figure), the method comprising: providing a first substrate having an electromagnetic wave incident surface; forming a photoresist layer having a first pattern on the first substrate, the photoresist layer having the first pattern including a plurality of first dielectric holes, the portion of the first substrate corresponding to the first dielectric holes being a first transmission region; forming a first dielectric block in the first dielectric holes; at least removing the photoresist layer having the first pattern; forming a patterned first dielectric layer from the plurality of first dielectric blocks on the first substrate; forming a second substrate on the first substrate and the patterned first dielectric layer; forming a second substrate on the second substrate. A photoresist layer with a second pattern is formed, the photoresist layer with the second pattern including a plurality of second dielectric holes, and a first substrate portion corresponding to the second dielectric holes is a second transmission region; a second dielectric block is formed in the second dielectric holes; in a direction perpendicular to the electromagnetic wave incident surface, the first dielectric block has a first projection on the electromagnetic wave incident surface, and the second dielectric block has a second projection on the electromagnetic wave incident surface, the second projection and the first projection are randomly distributed and have no overlapping portion; at least the photoresist layer with the second pattern is removed; the plurality of second dielectric blocks on the second substrate form a patterned second dielectric layer; a third substrate is formed on the second substrate and the patterned second dielectric layer;

[0167] The first substrate, the second substrate, and the third substrate are made of the same material. The first transmission region and at least the first dielectric block, the second substrate portion, and the third substrate portion thereon form a first transmission unit. The second transmission region and at least the second substrate portion, the second dielectric block, and the third substrate portion thereon form a second transmission unit.

[0168] Optionally, when forming the patterned first dielectric layer, a first dielectric material layer can be deposited on the photoresist layer with the first pattern and on the first transmission region, thereby forming a first dielectric block within the first dielectric hole. The shape of the first dielectric block can be determined by the shape of the first dielectric hole; for example, the first dielectric hole can be a circular hole, a square hole, or a triangular hole, and correspondingly, the first dielectric block can be a circular dielectric block, a square dielectric block, or a triangular dielectric block. Further, when removing the photoresist layer, the first dielectric material layer above the photoresist layer can be removed first by a polishing process, and then the photoresist layer can be removed by a corresponding process and solvent. In other embodiments, the photoresist layer and the first dielectric material layer on the photoresist layer can be removed simultaneously to simplify the removal steps.

[0169] Optionally, when forming the patterned second dielectric layer, a second dielectric material layer can be deposited first on the photoresist layer with the second pattern and on the second transmission region, thereby forming a second dielectric block within the second dielectric hole. The shape of the second dielectric block can be determined by the shape of the second dielectric hole; for example, the second dielectric hole can be a circular hole, a square hole, or a triangular hole, and correspondingly, the second dielectric block can be a circular dielectric block, a square dielectric block, or a triangular dielectric block. Furthermore, when removing the photoresist layer, the second dielectric material layer above the photoresist layer can also be removed first by a polishing process, and then the photoresist layer can be removed by a corresponding process and solvent. In other embodiments, the photoresist layer and the second dielectric material layer on the photoresist layer can be removed simultaneously to simplify the removal steps.

[0170] The above-mentioned method for fabricating the transmission structure can employ deposition and etching processes to produce the aforementioned transmission structure. Furthermore, this method facilitates the rational and convenient configuration of the first thickness, the second thickness, and the thicknesses of the first dielectric block and the second dielectric block, thereby utilizing electromagnetic wave interference to adjust the first reflection phase. Second reflection phase Within the preset frequency band Thus, the transmission structure obtained from the disordered first and second transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, it also helps to ensure that the transmission phase of the transmitted electromagnetic waves from the first and second transmission units satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with a transparent substrate.

[0171] This application also provides another method for fabricating a transmission structure 2000 (not shown in the figure), the method comprising: providing a first substrate having an electromagnetic wave incident surface; forming a plurality of first dielectric grooves on the first substrate, the first substrate portion corresponding to the first dielectric grooves being a first transmission region; forming a first dielectric block in the first dielectric grooves; forming a second substrate on the first substrate and the first dielectric block; forming a plurality of second dielectric grooves on the second substrate, the first substrate portion corresponding to the second dielectric grooves being a second transmission region; forming a second dielectric block in the second dielectric grooves, wherein in a direction perpendicular to the electromagnetic wave incident surface, the first dielectric block has a first projection on the electromagnetic wave incident surface, and the second dielectric block has a second projection on the electromagnetic wave incident surface, the second projection and the first projection being randomly distributed and having no overlapping portion; and forming a third substrate on a second substrate and a patterned second dielectric layer.

[0172] The first substrate, the second substrate, and the third substrate are made of the same material. The first transmission region and at least the first dielectric block, the second substrate portion, and the third substrate portion thereon form a first transmission unit. The second transmission region and at least the second substrate portion, the second dielectric block, and the third substrate portion thereon form a second transmission unit.

[0173] The above-mentioned method for fabricating the transmission structure can employ deposition and etching processes to produce the aforementioned transmission structure. Furthermore, this method facilitates the rational and convenient configuration of the first thickness, the second thickness, and the thicknesses of the first dielectric block and the second dielectric block, thereby utilizing electromagnetic wave interference to adjust the first reflection phase. Second reflection phase Within the preset frequency band Thus, the transmission structure obtained from the disordered first and second transmission units can achieve diffuse reflection of the reflected wave over a wide frequency range and essentially eliminate specular reflection of the transmission structure on the surrounding environment; at the same time, it also helps to ensure that the transmission phase of the transmitted electromagnetic waves from the first and second transmission units satisfies This ensures that the wavefront of the transmitted wave remains largely undisturbed, and also provides low haze for transmission structures with a transparent substrate.

[0174] It should be noted that when the operating frequency band of the transmission structure is in the visible light or near-infrared band, since the size of the transmission structure is basically on the nanometer or micrometer scale, the aforementioned photolithography process is usually used to fabricate the transmission structure to ensure product quality. However, when the operating frequency band of the transmission structure is in the far-infrared or microwave band, since the size of the transmission structure becomes larger, for example, on the millimeter or centimeter scale, the printed circuit method can also be used to fabricate the transmission structure to balance product quality and manufacturing cost. Therefore, those skilled in the art can choose the appropriate fabrication method based on factors such as process conditions, cost, and product quality, and this application does not impose any restrictions on this.

[0175] In real life, people can see the mirror image of an object through a smooth surface. This is because when light emitted / reflected by an object strikes a smooth surface, specular reflection occurs. The reflected light, carrying information about the object, enters the human eye, allowing the observer to see a virtual image of the object at its mirror position. However, the situation is completely different for rough surfaces, or disordered surfaces such as those in the transmission structure proposed in Chinese invention patent CN110854539B. When light emitted / reflected by an object strikes a rough / disordered surface, diffuse reflection occurs. This means the reflected light is scattered randomly in all directions of the reflecting space, losing the object information it carries. Therefore, the diffusely reflected light entering the retina is disordered, and when the human eye focuses on the mirror position of the object, it cannot see a complete and / or clear virtual image. However, the human eye can see a rough surface when it focuses on it. For example, the human eye cannot see the mirror image of an object in front of frosted glass (the object and the human eye are on the same side of the frosted glass), but it can see the frosted glass. At this time, when an external image is projected onto the rough surface, the human eye can see the real image formed by the external image on the rough surface.

[0176] Therefore, on the one hand, diffuse reflection cannot form a mirror image (virtual image); on the other hand, diffuse reflection can be used for projection imaging (real image). Taking a movie theater screen as an example, the screen has a rough projection surface. The projector projects light carrying image information onto the screen, illuminating it. Different positions on the screen surface display different colors and brightness, thus forming an image across the entire screen. Moreover, because the light on the illuminated screen undergoes diffuse reflection, viewers in all directions on the reflective side of the screen can clearly see the image projected onto the screen surface. Therefore, utilizing the transmission structure with a wide operating frequency band of this application, which achieves that the wavefront of the transmitted wave is essentially undisturbed while the reflected wave forms diffuse reflection and essentially eliminates specular reflection on the surrounding environment, a device for projection imaging that does not disturb the wavefront of the transmitted wave can be prepared.

[0177] The following will introduce several application examples based on the transmission structure function of this application. It should be understood that the examples here are only for the convenience of those skilled in the art to understand the technical effects of the transmission structure of this application, and do not limit the specific application scope of the transmission structure of this application.

[0178] Example 1

[0179] like Figure 16As shown, this application also provides a screen 10, including the transmissive structure 1000 as described above. Optionally, the transmissive structure 1000 can be periodically arranged in the display area of ​​the screen 10 to shorten the manufacturing time of the screen 10. In particular, this arrangement is preferred when the size of the display area is large. Of course, the transmissive structure 1000 can also be non-periodically arranged in the display area of ​​the screen 10 to improve the overall diffuse reflection effect of the display area. In particular, this arrangement is preferred when the size of the display area is small. Those skilled in the art can select the above arrangement method according to the actual situation to achieve the purpose of balancing the diffuse reflection effect of the display area and controlling the manufacturing complexity and manufacturing time of the screen 10.

[0180] The aforementioned screen can, within a wide frequency range, image (real image) of electromagnetic waves carrying complete image information projected onto the projection surface of the screen 10 and cause diffuse reflection, thereby reflecting the projected electromagnetic waves in all directions. Furthermore, the screen 10 can essentially eliminate specular reflections to the surrounding environment, allowing an observer located on the reflection side of the screen 10 to observe a clear image from all directions. Simultaneously, it ensures that the wavefront of the transmitted electromagnetic waves transmitted through the screen 10 is not disturbed, thus concentrating the energy of the transmitted electromagnetic waves on the transmission side. This facilitates the observer capturing the complete transmitted electromagnetic wavefront information of the object on the transmission side of the screen 10, thereby enabling clear identification of the object.

[0181] Example 2

[0182] like Figure 17 As shown, this application also provides a projection system, including: a screen 10 as described above; and a projection device 20 configured to project light carrying image information onto the screen 10 to display an image. Since the transmission structure 1000 operates in a wide frequency band, for example, covering the entire visible light band, the image projected by the projection device 20 can be either black and white or color, further improving the projection imaging effect of the transmission structure in the prior art.

[0183] The aforementioned projection system can, over a wide frequency range, cause electromagnetic waves carrying complete image information projected by the projection device 20 onto the screen 10 to form a real image on the projection surface of the screen and undergo diffuse reflection. Furthermore, the screen 10 can essentially eliminate specular reflections to the surrounding environment, thereby reflecting the projected electromagnetic waves in all directions. As a result, an observer located on the reflection side of the screen 10 can observe a clear image from all directions. Simultaneously, the electromagnetic waves reflected by an object can pass through the screen 10 and retain the complete wavefront information of the transmitted electromagnetic waves, which is beneficial for the observer to clearly identify the object on the transmission side of the screen 10. In particular, considering that the aforementioned screen 10 can also have a certain degree of transparency, the aforementioned projection system can be used as a head-up display device for automobiles.

[0184] Example 3

[0185] This application provides a glass including the transmission structure 1000 as described above. Optionally, the transmission structure 1000 can be periodically arranged in part or all of the glass to shorten the glass manufacturing time. For example, when the size of the arrangement area is large, it can be arranged in this periodic manner. Of course, the transmission structure 1000 can also be non-periodically arranged in part or all of the glass to improve the overall diffuse reflection effect of the arrangement area. For example, when the size of the arrangement area is small, it can be arranged in this non-periodic manner. Those skilled in the art can select the above arrangement method according to the actual situation to achieve the purpose of balancing the diffuse reflection effect of the arrangement area and controlling the manufacturing complexity and manufacturing time of the glass. The structural schematic diagram of the above glass can be referred to the structural schematic diagram of the aforementioned screen 10, and will not be repeated here.

[0186] The aforementioned glass can cause electromagnetic waves carrying complete image information projected onto the glass to form a real image on the projection surface of the glass and undergo diffuse reflection within a wide frequency range. This allows the projected electromagnetic waves to be reflected in all directions. Furthermore, the glass can essentially eliminate specular reflections to the surrounding environment, thus allowing an observer on the reflecting side of the glass to observe a clear image from all directions. At the same time, the wavefront of the electromagnetic waves transmitted through the glass is not disturbed, resulting in energy concentration of the transmitted electromagnetic waves on the transmission side. This facilitates the observer capturing the complete wavefront information of the transmitted electromagnetic waves from the transmission side of the glass, thereby enabling clear identification of the object on that side.

[0187] Optionally, the aforementioned glass can be used to manufacture building glass curtain walls, shop window glass, or automotive glass, thereby helping to simultaneously reduce light pollution, not affect the view of people inside the house or vehicle, and make the house or vehicle warm in winter and cool in summer.

[0188] In some embodiments, the electromagnetic wave transmittance of the glass is less than or equal to a preset value. Specifically, the electromagnetic wave transmittance of the glass can be less than or equal to 50%, thereby reducing the illuminance inside the room or vehicle when the illuminance on both sides of the transmission structure 1000 is not significantly different. This makes it more difficult for people outside the room or vehicle to see the scene inside, thus ensuring the privacy of people inside the room or vehicle to a certain extent, without affecting their ability to observe the scene outside. In other embodiments, the transmittance of the first transmission unit 100 and the second transmission unit 200 can be appropriately reduced, for example, by reducing the transmittance to less than or equal to 50%. Optionally, an anti-reflection film or an anti-reflection film (not shown) can be applied to the electromagnetic wave incident surface and / or electromagnetic wave emitting surface of the glass. However, this method can easily introduce additional specular reflection, reducing the diffuse reflection effect of the glass.

[0189] Example 4

[0190] like Figure 18 As shown, this application also provides a vehicle 30, including: a vehicle body 31; and glass as described above, disposed on the vehicle body 31. Optionally, the glass includes side window glass 33 and rear window glass 34 of the vehicle.

[0191] With the above settings, the vehicle 30 can eliminate light pollution caused by specular reflection on the glass surface within the visible light frequency band, without reducing the transparency of the glass, so that people inside the vehicle can still clearly see the outside scenery; and the glass transmittance mentioned above is not high (usually less than 50%), which helps to protect the privacy of the people inside the vehicle.

[0192] In some embodiments, the glass also includes a windshield 32, which includes a projection unit; and a projection device, disposed inside the vehicle body 31, configured to project light carrying image information onto the projection unit to display an image. Figure 18 For example, the projection device can be located on the side of the vehicle body 31 near the bottom of the windshield 32, which facilitates better projection of images onto the projection section of the windshield 32. This arrangement allows for the installation of a head-up display, enabling the projection of vehicle driving information onto the windshield 32 without reducing the fog level, ensuring the user can still clearly see the road conditions and guaranteeing driving safety. Furthermore, when not driving, the windshield 32 can be used as a large screen to display projected images or videos, fully expanding its functionality (creating a car theater), enhancing the vehicle's technological feel, and providing a superior user experience.

[0193] Example 5

[0194] This application provides a film including the transmission structure 1000 as described above. Optionally, the film may be a flexible film, which may include: a flexible substrate; and the transmission structure 1000 as described above, disposed on the flexible substrate. The introduction of the flexible substrate does not introduce additional specular reflection. Optionally, the material of the flexible substrate may be the same as the materials of the aforementioned first substrate and second substrate. Optionally, the material of the flexible substrate may be at least one selected from polyvinyl alcohol (PVA), polyester (PET), polyimide (PI), and polyethylene naphthalate (PEN).

[0195] The aforementioned flexible film can achieve the effect of keeping the wavefront of transmitted waves largely undisturbed and the reflected waves diffusely reflected over a wide frequency range, while essentially eliminating specular reflections on the surrounding environment. In particular, due to the characteristics of the flexible film, it can be applied to the surfaces of objects with different shapes (such as flat surfaces, curved surfaces, etc.), thereby broadening the application range of transmission structures. For example, the aforementioned flexible film can be applied to the surface of a mobile phone display screen. Existing mobile phone displays include curved screens, waterfall screens, etc., so the aforementioned flexible screen can fit well with these displays, thereby improving the specular reflection or glare problems of the mobile phone display screen on environmental objects.

[0196] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0197] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A transmission structure, comprising a plurality of first transmission units and a plurality of second transmission units, the plurality of first transmission units and the plurality of second transmission units are arranged in disorder in a plane, and an electromagnetic wave incidence plane of the plurality of first transmission units and an electromagnetic wave incidence plane of the plurality of second transmission units jointly form an electromagnetic wave incidence plane of the transmission structure; characterized in that, the first transmission unit has a first base body, a first dielectric block is arranged inside the first base body, a thickness of the first base body between the first dielectric block and the electromagnetic wave incidence plane of the first transmission unit is a first thickness which is not zero; and, the second transmission unit has a second base body, a second dielectric block is arranged inside the second base body, a thickness of the second base body between the second dielectric block and the electromagnetic wave incidence plane of the second transmission unit is a second thickness which is not zero, and the second thickness is different from the first thickness; wherein, when electromagnetic waves are incident to the first transmission unit and the second transmission unit, the electromagnetic waves are transmitted through the first transmission unit and the second transmission unit. 2.The transmission structure according to claim 1, characterized in that, the first thickness is configured to make a reflection coefficient of a reflected electromagnetic wave of the first transmission unit at a reference frequency be a real number, and the reference frequency is located in the preset frequency band. And, the preset frequency band comprises at least part of a visible light frequency band and / or at least part of an infrared light frequency band. The first thickness d1 is in a range of 30nm to 120nm, and the second thickness d2 is in a range of 110nm to 290nm. The first thickness d1 is in a range of 40nm to 80nm, and the second thickness d2 is in a range of 130nm to 160nm. The transmitted electromagnetic wave of the first transmission unit has a first transmission phase The transmitted electromagnetic wave of the second transmission unit has a second transmission phase The optical path difference of the electromagnetic wave passing through the first transmission unit and the second transmission unit makes the first transmission phase and the second transmission phase satisfies the first base body reflects electromagnetic waves as a first reflected electromagnetic wave, the first dielectric block reflects electromagnetic waves as a second reflected electromagnetic wave; the first thickness is configured to endow the first transmissive unit with a first reflection phase at least by interference of the first reflected electromagnetic wave and the second reflected electromagnetic wave the second substrate reflects electromagnetic waves as third reflected electromagnetic waves, and the second dielectric block reflects electromagnetic waves as fourth reflected electromagnetic waves; and the second thickness is configured to provide the second transmissive unit with a second reflection phase by at least interference of the third reflected electromagnetic waves and the fourth reflected electromagnetic waves the first reflection phase and the second reflection phase satisfies 7.The transmission structure according to claim 1, characterized in that, the first base body and the second base body are made of the same material; and / or, the first dielectric block and the second dielectric block are made of the same material; and / or, the first dielectric block and the second dielectric block have the same thickness. The first base body and the second base body are made of at least one of a dielectric and a semiconductor, and the first dielectric block and the second dielectric block are made of at least one of a metal, a dielectric and a semiconductor. The first dielectric block and the second dielectric block are made of at least one of copper, silver, gold, aluminum, platinum, silicon and graphene. the second thickness is configured to cause the first reflection phase and the second reflection phase is satisfied at the reference frequency 3. The transmissive structure of claim 2, wherein, the second thickness is configured such that an absolute value of a difference between the first reflection phase and the second reflection phase is π at the reference frequency.

4. The transmissive structure according to any of claims 1-3, characterized in that, When the first dielectric block is made of a metal, the first dielectric block has a preset thickness which is less than or equal to a skin depth of the metal; and / or, when the second dielectric block is made of a metal, the second dielectric block has a preset thickness which is less than or equal to a skin depth of the metal.

5. The transmissive structure of claim 4, wherein, It comprises:

6. The transmissive structure of claim 5, wherein, a base body having an electromagnetic wave incidence plane, comprising a plurality of first transmission units and a plurality of second transmission units which are arranged in disorder; wherein, each of the first transmission units is provided with a first dielectric block to form a first transmission unit, and a thickness of the base body between the first dielectric block and the electromagnetic wave incidence plane is a first thickness which is not zero. ​ ​ 8. The transmissive structure of claim 1, wherein, ​ 9. The transmissive structure of claim 8, wherein, ​ 10. The transmissive structure of claim 8, wherein, ​ 11. A transmissive structure, characterized in that, ​ ​ ​ ​ Each of the second transmission units is formed by a second medium block disposed in each of the second transmission regions, and a thickness of the substrate between the second medium block and the electromagnetic wave incidence surface is a second thickness different from the first thickness. When electromagnetic waves are incident on the first transmission units and the second transmission units, The transmitted electromagnetic wave of the first transmission unit has a first transmission phase The transmitted electromagnetic wave of the second transmission unit has a second transmission phase The optical path difference of the electromagnetic wave passing through the first transmission unit and the second transmission unit makes the first transmission phase And the second transmission phase In a preset frequency band The reflected electromagnetic wave of the first transmission part is a first reflected electromagnetic wave, and the reflected electromagnetic wave of the first dielectric block is a second reflected electromagnetic wave; the first thickness is configured to at least pass through interference of the first reflected electromagnetic wave and the second reflected electromagnetic wave to make the reflected electromagnetic wave of the first transmission unit have a first reflection phase The reflected electromagnetic wave of the second transmission part is a third reflected electromagnetic wave, and the reflected electromagnetic wave of the second dielectric block is a fourth reflected electromagnetic wave; the second thickness is configured to at least pass through interference of the third reflected electromagnetic wave and the fourth reflected electromagnetic wave to make the reflected electromagnetic wave of the second transmission unit have a second reflection phase The first reflection phase And the second reflection phase In the preset frequency band 12. A method of producing a transmissive structure as claimed in claim 11, characterized in that The method comprises: providing a first substrate having the electromagnetic wave incidence surface, and the first substrate having a plurality of first transmission regions and a plurality of second transmission regions; forming a patterned first medium layer on the first substrate, the patterned first medium layer comprising a plurality of the first medium blocks, each of the first medium blocks corresponding to each of the first transmission regions; forming a second substrate on the first substrate and the patterned first medium layer; forming a patterned second medium layer on the second substrate, the patterned second medium layer comprising a plurality of the second medium blocks, each of the second medium blocks corresponding to each of the second transmission regions, and in a direction perpendicular to the electromagnetic wave incidence surface, the first medium blocks have first projections on the electromagnetic wave incidence surface, and the second medium blocks have second projections on the electromagnetic wave incidence surface, the second projections being distributed in disorder and without overlapping with the first projections; forming a third substrate on the second substrate and the patterned second medium layer; wherein the first substrate, the second substrate, and the third substrate are made of the same material, the first transmission regions and at least the first medium blocks corresponding thereto, the second substrate portions, and the third substrate portions form the first transmission units, and the second transmission regions and at least the second medium blocks corresponding thereto, the second substrate portions, and the third substrate portions form the second transmission units.

13. The method according to claim 12, wherein in the first transmission units, a thickness of the first substrate ranges from 30 nm to 120 nm; in the second transmission units, a total thickness of the first substrate and the second substrate ranges from 110 nm to 290 nm.

14. The method according to claim 13, wherein in the first transmission units, a thickness of the first substrate ranges from 40 nm to 80 nm; in the second transmission units, a total thickness of the first substrate and the second substrate ranges from 130 nm to 160 nm.

15. A method of making a transmissive structure as claimed in claim 11, characterized in that, The method comprises: providing a first substrate having an electromagnetic wave incidence surface; forming a photoresist layer having a first pattern on the first substrate, the photoresist layer having the first pattern comprising a plurality of first medium holes, and the first substrate portions corresponding to the first medium holes being first transmission regions; forming the first medium blocks in the first medium holes; removing at least the photoresist layer having the first pattern, and the first medium blocks on the first substrate forming a patterned first medium layer; forming a second substrate on the first substrate and the patterned first medium layer; forming a photoresist layer with a second pattern on the second substrate, the photoresist layer with the second pattern comprising a plurality of second dielectric holes, the first substrate part corresponding to the second dielectric holes being a second transmission area; forming the second dielectric blocks in the second dielectric holes; in a direction perpendicular to the electromagnetic wave incidence plane, the first dielectric blocks have a first projection on the electromagnetic wave incidence plane, the second dielectric blocks have a second projection on the electromagnetic wave incidence plane, the second projection being distributed in disorder with the first projection and having no overlapping part with the first projection; removing at least the photoresist layer with the second pattern; the plurality of second dielectric blocks on the second substrate form a patterned second dielectric layer; forming a third substrate on the second substrate and the patterned second dielectric layer; wherein the first substrate, the second substrate and the third substrate are made of the same material, the first transmission area and at least the first dielectric block corresponding thereto, the second substrate part and the third substrate part form the first transmission unit, the second transmission area and at least the second substrate part corresponding thereto, the second dielectric block and the third substrate part form the second transmission unit.

16. A film characterized in that, The transmission structure according to any one of claims 1-11.

17. A screen, characterized by The transmission structure according to any one of claims 1-11.

18. A projection system, characterized by The transmission structure according to any one of claims 1-11. The screen according to claim 17. The screen according to claim 17. The projection device is configured to project light rays carrying image information to the screen to display an image.

19. A glass characterized by, The transmission structure according to any one of claims 1-11.

20. A vehicle characterized by The vehicle comprises a vehicle body and the glass according to claim 19.

21. The vehicle according to claim 20, wherein The glass comprises a windshield, and the windshield comprises a projection part. The projection device is configured to project light rays carrying image information to the projection part to display an image.

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