Glass-based transparent nanoelectrical heating plate and method of making the same

Abstract

The application relates to a glass-based transparent nanometer electrothermal plate and a preparation method thereof. The outer side of the transparent conductive layer forms a clearance, the first electrode and the second electrode are arranged on the upper surface of the transparent conductive layer, the first electrode and the second electrode are arranged on two edges of the transparent conductive layer, a division area is further arranged in the interior of the transparent conductive layer, a cutting channel is arranged around the division area, the upper surface of the transparent conductive layer and the cutting channel are further covered with an insulating layer, and the division area is insulated from the remaining area of the transparent conductive layer.

Description

Technical Field

[0001] This invention relates to the field of household products, and more particularly to a glass-based transparent nano-thermal plate and its preparation method. Background Technology

[0002] Home heating is crucial for winter living in high-latitude regions. With the evolving energy supply situation, electric heating has become an essential method. Existing ceramic-heated fan heaters and electric radiators suffer from drawbacks such as large footprint, difficulty in achieving a slim design, and inability to integrate with interior décor. Glass is a key interior decoration material, widely used in interior design and partitions. Glass-based transparent electric heating panels can be installed on interior walls or partitions when not powered, serving as a decorative element, and providing heating when powered, thus fulfilling both heating and decorative purposes. However, due to the large size of glass-based transparent electric heating panels, existing products suffer from inconsistent resistance values ​​during mass production, leading to fluctuating heating capacity and power consumption. Summary of the Invention

[0003] In view of this, it is necessary to provide a glass-based transparent nanothermal plate with high consistency and its preparation method. To solve the above technical problems, the technical solution of the present invention is: a glass-based transparent nanothermal plate, comprising a glass substrate, a transparent conductive layer, a first electrode, and a second electrode. The transparent conductive layer is disposed on the surface of the glass substrate, and the area of ​​the transparent conductive layer is smaller than the area of ​​the glass substrate, thereby forming a clearance area on the outer side of the transparent conductive layer. The first electrode and the second electrode are disposed on the upper surface of the transparent conductive layer, and are disposed at two edges of the transparent conductive layer. A segmented area is also disposed inside the transparent conductive layer, and a cutting channel is disposed around the segmented area. The cutting channel surrounds the segmented area. An insulating layer is also covered on the upper surface of the transparent conductive layer and inside the cutting channel. The segmented area is insulated from the remaining areas of the transparent conductive layer.

[0004] A method for preparing a glass-based transparent nanothermal plate, the method comprising:

[0005] S101: Plasma cleaning of the glass substrate surface to remove organic matter;

[0006] S102: Dissolve tin chloride and antimony chloride in ethanol to form tin chloride solution and antimony chloride solution respectively. Then, add the antimony chloride solution dropwise to the tin chloride solution with a concentration of 2 mol / L to form a mixed solution with an antimony ion to tin ion ratio of 0.2 at% to 1 at%. Stir the mixed solution at 70 degrees Celsius for 1 hour, let it stand for 10 hours, and then filter to obtain the precursor solution.

[0007] S103: Cover the surface of the glass substrate with a mask plate, the mask plate covering the clearance area;

[0008] S104: Heat the glass substrate to 450 degrees Celsius, spray the precursor solution onto the surface of the glass substrate using a spray pyrolysis method to form a transparent conductive layer, remove the mask, sinter the glass substrate at a high temperature of 550~600 degrees Celsius for 30 minutes, and then cool it to room temperature.

[0009] S105: Apply silver paste to the corresponding positions of the first and second electrodes, then bake at 150 degrees Celsius for 10 minutes, and then sinter at 850~900 degrees Celsius;

[0010] S106: Measure the resistance value between the first electrode and the second electrode, and draw the cutting path in the transparent conductive layer to form a segmented area. Adjust the size of the segmented area by drawing the cutting path multiple times to adjust the resistance value.

[0011] S107: Weld wires onto the first electrode and the second electrode respectively;

[0012] S108: An insulating layer is deposited on the back side of a glass substrate, the insulating layer covering the upper surface of the transparent conductive layer and the cleavage.

[0013] The step of covering the glass substrate surface with a mask plate, the mask plate covering the clearance area, also includes...

[0014] The mask is a metal plate, and the mask is in the shape of a square with a hollow area in the middle. The area of ​​the hollow area is the same as the area of ​​the transparent conductive layer. The lower surface of the mask is in close contact with the surface of the glass substrate.

[0015] The method of spraying the precursor solution onto the glass substrate surface using a spray pyrolysis method further includes,

[0016] When the precursor solution is sprayed onto the surface of the glass substrate, the precursor solution is ultrasonically atomized into small droplets, mixed with compressed air, and sprayed out under the action of airflow.

[0017] The process of applying silver paste to the corresponding positions of the first and second electrodes also includes...

[0018] The silver paste is applied by screen printing and is disposed on the upper surface of the transparent conductive layer.

[0019] The step of drawing the cutting path in the transparent conductive layer to form the segmented area also includes,

[0020] The laser cutting method is used to draw the cutting path on the transparent conductive layer. The laser draws a closed cutting path on the transparent conductive layer, and the area enclosed by the cutting path forms a segmented area.

[0021] The step of drawing the cutting path in the transparent conductive layer to form the segmented area also includes,

[0022] The cutting channel is formed on the transparent conductive layer by chemical etching. The etching solution etches a closed-out cutting channel on the transparent conductive layer, and the area enclosed by the cutting channel forms a segmentation area.

[0023] The deposition of an insulating layer on the back side of the glass substrate further includes,

[0024] The insulating layer deposited on the back of the glass substrate is made of silicon oxide, and the insulating layer is deposited by atomic layer deposition or plasma-enhanced chemical vapor deposition.

[0025] Step S104 can be repeated multiple times to increase the thickness of the transparent conductive layer.

[0026] The step of welding wires onto the first electrode and the second electrode respectively also includes,

[0027] The wires are soldered to the first electrode and the second electrode.

[0028] Compared with the prior art, the present invention has the following advantages: First, by using a mask, a clearance area is directly formed during the process of spraying the precursor solution onto the surface of the glass substrate, eliminating the need for subsequent processing, simplifying the process and improving production efficiency; Second, by forming a segmented area through the enclosed area of ​​the cutting channel, the actual conductive area of ​​the transparent conductive layer is changed, thereby adjusting the resistance; Finally, by depositing an insulating layer on the back of the glass substrate, short circuits are avoided, improving the overall reliability.

[0029] To make the above and other objects, features and advantages of the present invention more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0030] Figure 1 This is a schematic cross-sectional view of the glass-based transparent nanothermal plate according to Embodiment 1 of the present invention.

[0031] Figure 2 This is a top view schematic diagram of the glass-based transparent nano-thermal plate of Embodiment 1 of the present invention. Detailed Implementation

[0032] To further illustrate the technical means and effects of the present invention in achieving its intended purpose, the following detailed description of the specific implementation methods, structures, features, and effects of the present invention, in conjunction with the accompanying drawings and preferred embodiments, is provided below. Example 1

[0033] Please refer to Figures 1 to 2A glass-based transparent nano-electric heating plate is provided, comprising a glass substrate 1, a transparent conductive layer 2, a first electrode 3, and a second electrode 4. The transparent conductive layer is disposed on the surface of the glass substrate, and the area of ​​the transparent conductive layer is smaller than the area of ​​the glass substrate, thereby forming a clear area 5 on the outer side of the transparent conductive layer. The first electrode 3 and the second electrode 4 are disposed on the upper surface of the transparent conductive layer 2, and the first electrode 3 and the second electrode 4 are disposed at the two edges of the transparent conductive layer 2. A segmentation area 6 is also provided inside the transparent conductive layer 2, and a cutting channel 7 is provided around the segmentation area 6. The cutting channel 7 surrounds the segmentation area 6. An insulating layer 8 is also covered on the upper surface of the transparent conductive layer 2 and inside the cutting channel 7. The segmentation area 6 is insulated from the rest of the transparent conductive layer 2.

[0034] A method for preparing a glass-based transparent nanothermal plate, the method comprising:

[0035] S101: Plasma cleaning of the surface of glass substrate 1 to remove organic matter from the surface;

[0036] S102: Dissolve tin chloride and antimony chloride in ethanol to form tin chloride solution and antimony chloride solution respectively. Then, add the antimony chloride solution dropwise to the tin chloride solution with a concentration of 2 mol / L to form a mixed solution with an antimony ion to tin ion ratio of 0.2 at%. Stir the mixed solution at 70 degrees Celsius for 1 hour, let it stand for 10 hours, and then filter to obtain the precursor solution.

[0037] S103: Cover the surface of the glass substrate 1 with a mask plate, the mask plate covering the clearance area;

[0038] S104: Heat the glass substrate to 450 degrees Celsius, spray the precursor solution onto the surface of the glass substrate 1 using a spray pyrolysis method to form a transparent conductive layer 2, remove the mask, sinter the glass substrate 1 at 550 degrees Celsius for 30 minutes, and then cool it to room temperature.

[0039] S105: Apply silver paste to the corresponding positions of the first electrode 3 and the second electrode 4, then bake at 150 degrees Celsius for 10 minutes, and then sinter at 850 degrees Celsius.

[0040] S106: Measure the resistance value between the first electrode 3 and the second electrode 4, and draw the cutting path 7 in the transparent conductive layer 2 to form the segmentation area 6. Adjust the size of the segmentation area 6 by drawing the cutting path 7 multiple times to adjust the resistance value.

[0041] S107: Weld wires 9 onto the first electrode 3 and the second electrode 4 respectively;

[0042] S108: An insulating layer 8 is deposited on the back side of the glass substrate 1, the insulating layer 8 covering the upper surface of the transparent conductive layer 2 and the cut-out 7.

[0043] The step of covering the surface of the glass substrate 1 with a mask plate, the mask plate covering the clearance area 5, also includes...

[0044] The mask is a metal plate, and the mask is in the shape of a square with a hollow area in the middle. The area of ​​the hollow area is the same as the area of ​​the transparent conductive layer. The lower surface of the mask is in close contact with the surface of the glass substrate.

[0045] The method of spraying the precursor solution onto the glass substrate surface using a spray pyrolysis method further includes,

[0046] When the precursor solution is sprayed onto the surface of the glass substrate, the precursor solution is ultrasonically atomized into small droplets, mixed with compressed air, and sprayed out under the action of airflow.

[0047] The process of applying silver paste to the corresponding positions of the first electrode 3 and the second electrode 4 also includes...

[0048] The silver paste is applied by screen printing and is disposed on the upper surface of the transparent conductive layer 2.

[0049] The step of drawing the cutting path 7 in the transparent conductive layer 2 to form the segmentation area 6 also includes,

[0050] The laser cutting method is used to draw the cutting path 7 on the transparent conductive layer. The laser draws a closed cutting path on the transparent conductive layer, and the area enclosed by the cutting path 7 forms a segmented area 6.

[0051] The deposition of an insulating layer on the back side of the glass substrate 1 also includes,

[0052] The insulating layer 8 deposited on the back side of the glass substrate 1 is made of silicon oxide, and the insulating layer 8 is deposited by atomic layer deposition or plasma-enhanced chemical vapor deposition.

[0053] Step S104 can be repeated multiple times to increase the thickness of the transparent conductive layer 2.

[0054] The step of welding wires 9 onto the first electrode 3 and the second electrode 4 respectively also includes,

[0055] The wire 9 is soldered to the first electrode 3 and the second electrode 4. Example 2

[0056] A method for preparing a glass-based transparent nanothermal plate, the method comprising:

[0057] S101: Plasma cleaning of the surface of glass substrate 1 to remove organic matter from the surface;

[0058] S102: Dissolve tin chloride and antimony chloride in ethanol to form tin chloride solution and antimony chloride solution respectively. Then, add the antimony chloride solution dropwise to the tin chloride solution with a concentration of 2 mol / L to form a mixed solution with a ratio of antimony ions to tin ions of 1 at%. Stir the mixed solution at 70 degrees Celsius for 1 hour, let it stand for 10 hours, and then filter to obtain the precursor solution.

[0059] S103: Cover the surface of the glass substrate 1 with a mask plate, the mask plate covering the clearance area;

[0060] S104: Heat the glass substrate 1 to 450 degrees Celsius, spray the precursor solution onto the surface of the glass substrate 1 using a spray pyrolysis method to form a transparent conductive layer 2, remove the mask, sinter the glass substrate 1 at 600 degrees Celsius for 30 minutes, and then cool it to room temperature.

[0061] S105: Apply silver paste to the corresponding positions of the first electrode 3 and the second electrode 4, then bake at 150 degrees Celsius for 10 minutes, and then sinter at 900 degrees Celsius.

[0062] S106: Measure the resistance value between the first electrode 3 and the second electrode 4, and draw the cutting path 7 in the transparent conductive layer 2 to form the segmentation area 6. Adjust the size of the segmentation area 6 by drawing the cutting path 7 multiple times to adjust the resistance value.

[0063] S107: Weld wires 9 onto the first electrode 3 and the second electrode 4 respectively;

[0064] S108: An insulating layer 8 is deposited on the back side of the glass substrate 1, the insulating layer 8 covering the transparent conductive layer 2 and the upper surface of the dicing.

[0065] The step of drawing the cutting path 7 in the transparent conductive layer 2 to form the segmentation area 6 also includes,

[0066] The cutting channel 7 is formed on the transparent conductive layer 2 by chemical etching. The etching solution etches a closed-out cutting channel 7 on the transparent conductive layer 2, and the area enclosed by the cutting channel 7 forms a segmentation area 6.

[0067] The rest is the same as in Example 1. Example 3

[0068] A method for preparing a glass-based transparent nanothermal plate, the method comprising:

[0069] S101: Plasma cleaning of the surface of glass substrate 1 to remove organic matter from the surface;

[0070] S102: Dissolve tin chloride and antimony chloride in ethanol to form tin chloride solution and antimony chloride solution respectively. Then, add the antimony chloride solution dropwise to the tin chloride solution with a concentration of 2 mol / L to form a mixed solution with an antimony ion to tin ion ratio of 0.5 at%. Stir the mixed solution at 70 degrees Celsius for 1 hour, let it stand for 10 hours, and then filter to obtain the precursor solution.

[0071] S103: Cover the surface of the glass substrate 1 with a mask plate, the mask plate covering the clearance area;

[0072] S104: Heat the glass substrate 1 to 450 degrees Celsius, spray the precursor solution onto the surface of the glass substrate 1 using a spray pyrolysis method to form a transparent conductive layer 2, remove the mask, sinter the glass substrate 1 at 570 degrees Celsius for 30 minutes, and then cool it to room temperature.

[0073] S105: Apply silver paste to the corresponding positions of the first electrode 3 and the second electrode 4, then bake at 150 degrees Celsius for 10 minutes, and then sinter at 880 degrees Celsius.

[0074] S106: Measure the resistance value between the first electrode 3 and the second electrode 4, and draw the cutting path 7 in the transparent conductive layer 2 to form the segmentation area 6. Adjust the size of the segmentation area 6 by drawing the cutting path 7 multiple times to adjust the resistance value.

[0075] S107: Weld wires onto the first electrode 3 and the second electrode 4 respectively;

[0076] S108: An insulating layer 8 is deposited on the back side of the glass substrate 1, the insulating layer 8 covering the transparent conductive layer 2 and the upper surface of the dicing.

[0077] The rest is the same as in Example 1.

[0078] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications or alterations to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present invention. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention without departing from the scope of the present invention shall still fall within the scope of the present invention.

Claims

1. A method for preparing a glass-based transparent nano-thermal plate, characterized in that, The glass-based transparent nano-electric heating plate comprises a glass substrate, a transparent conductive layer, a first electrode, and a second electrode. The transparent conductive layer is disposed on the surface of the glass substrate, and its area is smaller than that of the glass substrate, thus forming a clearance area on the outer side of the transparent conductive layer. The first and second electrodes are disposed on the upper surface of the transparent conductive layer, and at its two edges. A segmented area is also disposed inside the transparent conductive layer, and a cutting channel is disposed around the segmented area. The cutting channel surrounds the segmented area. An insulating layer covers the upper surface of the transparent conductive layer and the cutting channel. The segmented area is insulated from the remaining areas of the transparent conductive layer. The method includes: S101: Plasma cleaning of the glass substrate surface to remove organic matter; S102: Dissolve tin chloride and antimony chloride in ethanol to form tin chloride solution and antimony chloride solution respectively. Then, add the antimony chloride solution dropwise to the tin chloride solution with a concentration of 2 mol / L to form a mixed solution with an antimony ion to tin ion ratio of 0.2 at% to 1 at%. Stir the mixed solution at 70 degrees Celsius for 1 hour, let it stand for 10 hours, and then filter to obtain the precursor solution. S103: Cover the surface of the glass substrate with a mask plate, the mask plate covering the clearance area; S104: Heat the glass substrate to 450 degrees Celsius, spray the precursor solution onto the surface of the glass substrate using a spray pyrolysis method to form a transparent conductive layer, remove the mask, sinter the glass substrate at a high temperature of 550~600 degrees Celsius for 30 minutes, and then cool it to room temperature. S105: Apply silver paste to the corresponding positions of the first and second electrodes, then bake at 150 degrees Celsius for 10 minutes, and then sinter at 850~900 degrees Celsius; S106: Measure the resistance value between the first electrode and the second electrode, and draw the cutting path in the transparent conductive layer to form a segmented area. Adjust the size of the segmented area by drawing the cutting path multiple times to adjust the resistance value. S107: Weld wires onto the first electrode and the second electrode respectively; S108: An insulating layer is deposited on the back side of a glass substrate, the insulating layer covering the upper surface of the transparent conductive layer and the cleavage.

2. The method for preparing a glass-based transparent nano-thermal plate according to claim 1, characterized in that, The step of covering the glass substrate surface with a mask plate, the mask plate covering the clearance area, also includes... The mask is a metal plate, and the mask is in the shape of a square with a hollow area in the middle. The area of ​​the hollow area is the same as the area of ​​the transparent conductive layer. The lower surface of the mask is in close contact with the surface of the glass substrate.

3. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The method of spraying the precursor solution onto the glass substrate surface using a spray pyrolysis method further includes, When the precursor solution is sprayed onto the surface of the glass substrate, the precursor solution is ultrasonically atomized into small droplets, mixed with compressed air, and sprayed out under the action of airflow.

4. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The process of applying silver paste to the corresponding positions of the first and second electrodes also includes... The silver paste is applied by screen printing and is disposed on the upper surface of the transparent conductive layer.

5. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The step of drawing the cutting path in the transparent conductive layer to form the segmented area also includes, The laser cutting method is used to draw the cutting path on the transparent conductive layer. The laser draws a closed cutting path on the transparent conductive layer, and the area enclosed by the cutting path forms a segmented area.

6. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The step of drawing the cutting path in the transparent conductive layer to form the segmented area also includes, The cutting channel is formed on the transparent conductive layer by chemical etching. The etching solution etches a closed-out cutting channel on the transparent conductive layer, and the area enclosed by the cutting channel forms a segmentation area.

7. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The deposition of an insulating layer on the back side of the glass substrate further includes, The insulating layer deposited on the back of the glass substrate is made of silicon oxide, and the insulating layer is deposited by atomic layer deposition or plasma-enhanced chemical vapor deposition.

8. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, Step S104 can be repeated multiple times to increase the thickness of the transparent conductive layer.

9. The method for preparing a glass-based transparent nanothermal plate according to claim 2, characterized in that, The step of welding wires onto the first electrode and the second electrode respectively also includes, The wires are soldered to the first electrode and the second electrode.

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