Nano bubble formation system and formation method

Abstract

The present invention discloses a nanobubble formation system, comprising a rapid bubble classification unit, a gas displacement unit, a liquid injection unit, a gas input unit, a gas dispersion unit, a bubble miniaturization unit, a temperature control unit, a pressure control unit, and a system control unit. The gas displacement unit, the liquid injection unit, the gas input unit, and the bubble miniaturization unit are respectively connected to the rapid bubble classification unit via pipelines; the gas input unit is connected to the gas dispersion unit via a pipeline; the gas dispersion unit is connected to the bubble miniaturization unit; the temperature control unit controls the temperature of the nanobubble formation system; the pressure control unit controls the pressure of the internal liquid of the nanobubble formation system by changing the volume of a first cavity; and the system control unit controls the operation of the nanobubble formation system. The system of the present invention can be used for both scientific research in related fields and in related practical processes, providing strong technical support for basic research and applications related to nanobubbles.

Description

Technical Field

[0001] The present invention belongs to the field of nanotechnology and relates to a method for generating nanobubbles, and more specifically to a method for forming nanobubbles with controllable particle size and uniformity. Background Art

[0002] Generally speaking, nanobubbles are bubbles smaller than 500nm. Strictly speaking, nanobubbles are smaller than 100nm. Compared to ordinary large bubbles, nanobubbles have larger surface area and higher stability, offering unique application prospects in advanced fields such as cell culture and disease diagnosis and treatment. Currently, the mainstream method for generating nanobubbles is gas-liquid mixing. This method has wide applicability, but the process of forming nanobubbles from gas-liquid mixing is often accompanied by the generation of a large number of microbubbles. After the microbubbles disappear, the remaining bubbles in the solution are nanobubbles. This method has low nanobubble production efficiency, poor controllability of nanobubble size and uniformity, and the bubble size cannot reach true nanometer scale (<100nm). Therefore, how to avoid the generation of micronized bubbles during nanobubble formation, achieve controllable particle size and uniformity, and achieve true nanometer scale (<100nm) is a technical challenge that urgently needs to be addressed in the field of nanobubble research. Summary of the Invention

[0003] In order to overcome the above-mentioned defects in the prior art, the present invention proposes a method for producing a high-concentration (>10 8 The nanobubble dispersion with uniform particle size and small size (particles concentrated below 100 nm) provides strong technical support for basic and applied research related to nanobubbles.

[0004] The nanobubble formation system proposed in the present invention comprises a rapid bubble classification unit, a gas displacement unit, a liquid injection unit, a gas input unit, a bubble miniaturization unit, a temperature control unit, a pressure control unit, and a system control unit. The gas displacement unit, liquid injection unit, gas input unit, and bubble miniaturization unit are each connected to the rapid bubble classification chamber via a pipeline, the gas input unit is connected to the gas dispersion unit via a pipeline, and the gas dispersion unit is connected to the bubble miniaturization unit. The temperature control unit regulates the temperature of the nanobubble formation system; the pressure control unit regulates the pressure of the nanobubble formation system by changing the volume of the first chamber; and the system control unit regulates the operation of the nanobubble formation system.

[0005] The present invention proposes a nanobubble forming system, comprising:

[0006] The bubble rapid classification unit 1 is used to quickly classify the micronized bubbles obtained by the bubble miniaturization unit 6. Large bubbles float up and re-condense into a continuous phase gas, which enters the gas input unit 4. The classified bubble dispersion enters the gas dispersion unit 5 and cooperates with the bubble miniaturization unit 6 to form nanobubbles.

[0007] The gas replacement unit 2 is used to replace the air in the first cavity 11, the second cavity 63, the gas dispersion unit 5, the No. 3 pipeline 41, the No. 4 pipeline 45, and the No. 5 pipeline 66 with a specific gas (such as N2, O2, H2, SF6, etc.). The first cavity 11 and the second cavity 63 are connected through the gas dispersion unit 5;

[0008] Liquid injection unit 3, used to inject pure water (or aqueous solution) into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66;

[0009] The gas input unit 4 is used to input specific gases (such as N2, O2, H2, SF6, etc.) into the first cavity 11, the second cavity 63, the gas dispersion unit 5, the No. 3 pipeline 41, the No. 4 pipeline 45 and the No. 5 pipeline 66;

[0010] The bubble miniaturization unit 6 is used to further refine the bubble dispersion obtained in the gas dispersion unit 5 and cooperate with the bubble rapid classification unit 1 to form nanobubbles;

[0011] A temperature control unit 7 is used to control the temperature of the pure water (or aqueous solution) in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66;

[0012] The pressure control unit 8 regulates and controls the pressure of the pure water (or aqueous solution) in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66 by changing the volume of the first cavity 11;

[0013] The system control unit 9 is used to control the operation of the gas replacement unit 2, the liquid injection unit 3, the gas input unit 4, the bubble miniaturization unit 6, the temperature control unit 7 and the pressure control unit 8.

[0014] In the nanobubble forming system proposed by the present invention,

[0015] The bubble rapid classification unit 1 includes: a first cavity 11, which is used to quickly classify the miniaturized bubbles obtained by the bubble miniaturization unit 6, the obtained gas enters the gas input unit 4, and the obtained bubble dispersion enters the gas dispersion unit 5; a rigid blade 12, which is used to promote the rapid classification of bubbles of different sizes in the first cavity 11; a flexible wall 13, which cooperates with the mechanical part 81 of the pressure control unit 8 to regulate the volume of the first cavity 11; a first one-way solenoid valve 14, which is used to discharge the air in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the pipeline.

[0016] Furthermore, the rigid blades are Figure 2 Arranged in a cross pattern.

[0017] The gas replacement unit includes: a No. 1 pipeline 21, which is used to connect the first cavity 11 and the high-pressure cylinder 23; a second one-way solenoid valve 22, which is used to control the gas in the high-pressure cylinder 23 to enter the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the pipeline; the high-pressure cylinder 23 is used to replace the air in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the pipeline with a specific gas (such as N2, O2, H2, SF6, etc.).

[0018] Furthermore, the pressure of the high-pressure steel cylinder 23 is between 10 atm and 50 atm; preferably, it is 20 atm.

[0019] The liquid injection unit 3 includes: a No. 2 pipeline 31, which is used to connect the liquid supply part 33 and the first cavity 11; a third one-way solenoid valve 32, which is used to control the pure water (or aqueous solution) in the liquid supply part 33 to enter the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipeline 66; the liquid supply part 33 is used to inject pure water (or aqueous solution) into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipeline 66.

[0020] The liquid supply part 33 in the liquid injection unit 3 further includes: a liquid reservoir 331, which is used to store pure water (or aqueous solution); a No. 1 driver 332, which is used to inject the pure water (or aqueous solution) in the liquid reservoir into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipeline 66.

[0021] The gas input unit 4 includes: a No. 3 pipeline 41, which is used to connect the gas supply part 44 and the first cavity 11; a fourth one-way solenoid valve 42, which is used to control the gas in the first cavity 11 to enter the gas storage tank 441; and a fifth one-way solenoid valve 43, which is used to control the gas in the gas supply part 44 to enter the gas dispersion unit 5.

[0022] The gas supply part 44 in the gas input unit 4 further includes: a gas reservoir 441, which is used to store gas; a second driver 442, which is used to pressurize the gas in the gas reservoir 441, the third pipeline 41 and the fourth pipeline 45 to the same pressure as the liquid in the first cavity 11 and the second cavity 63.

[0023] The bubble miniaturization unit 6 includes: a bubble refiner 61 for further refining the bubble dispersion obtained in the gas dispersion unit 5; a second chamber 63, in which the bubble dispersion obtained in the gas dispersion unit 5 is further refined; a one-way valve 65 for controlling the flow of liquid from the second chamber 63 into the first chamber 11; a fifth pipe 66 for connecting the first chamber 11 and the second chamber 63; a sixth one-way solenoid valve 62 for controlling the output of the nanobubble dispersion in the first chamber 11, the second chamber 63, and the pipe; and a terminal processor 64 for further homogenizing the nanobubble dispersion.

[0024] Furthermore, the bubble refiner 61 includes a colloid mill, a homogenizer, a vortex pump, an emulsifier, and the like.

[0025] Furthermore, the colloid mill has a rotation speed of 3000-15000 rpm; the homogenizer has a rotation speed of 3000-20000 rpm; the vortex pump is a multi-stage vortex pump (1-5 stages) with a rotation speed of 2000-10000 rpm; and the emulsifier has a rotation speed of 3000-30000 rpm.

[0026] The temperature control unit 7 includes: a heat exchange part 71, which is used to exchange heat between the constant temperature liquid and the liquid in the first cavity 11, maintaining the temperature of the liquid in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipeline 66; a constant temperature box 72, which is used to maintain the temperature of the constant temperature liquid.

[0027] Furthermore, the temperature control sensitivity of the thermostat 72 is 0.1-0.5°C, preferably 0.1°C.

[0028] The pressure control unit 8 includes: a mechanical part 81, which is used to adjust the volume of the first cavity 11; a pressure sensor 82, which is placed in the first cavity 11 and is used to detect the pressure of the liquid in the first cavity 11; and a mechanical controller 83, which is used to control the mechanical part 81 so that the liquid in the first cavity 11 reaches a specific pressure (1 to 5 atm).

[0029] Furthermore, the sensitivity of the pressure sensor is 0.1 to 0.2 atm, preferably 0.1 atm.

[0030] The system control unit 9 is used to control the operation of the gas replacement unit 2 , the liquid injection unit 3 , the gas input unit 4 , the bubble miniaturization unit 6 , the temperature control unit 7 and the pressure control unit 8 .

[0031] Based on the above system, the present invention also proposes a method for generating nanobubbles, comprising the following steps:

[0032] Step 1: System connection. Connect all parts of the system as required.

[0033] Step 2: Gas Replacement. System control unit 9 is turned on. First, the first one-way solenoid valve 14, the third one-way solenoid valve 32, and the sixth one-way solenoid valve 62 are closed. The second one-way solenoid valve 22, the fourth one-way solenoid valve 42, and the fifth one-way solenoid valve 43 are opened. A specific gas (e.g., N2, O2, H2, SF6, etc.) is then filled into first chamber 11, second chamber 63, gas dispersion unit 5, pipeline No. 3, pipeline No. 45, and pipeline No. 5, 66 to a certain pressure. Then, the first one-way solenoid valve 14 is opened to release the gas.

[0034] Furthermore, the certain pressure is generally between 2 and 10 atm, preferably 3 atm.

[0035] Furthermore, the above operation is cycled 2 to 5 times, preferably 3 times.

[0036] Step 3: Reagent preparation: A certain volume of a specific gas (such as N2, O2, H2, SF6, etc.) and a certain volume of pure water (or aqueous solution) are stored in the gas reservoir 441 and the liquid reservoir 331 respectively.

[0037] Furthermore, the volume ratio of the certain volume of gas to the certain volume of water is 1:100 to 20:100, preferably 10:100.

[0038] Step 4: Liquid Injection. The system control unit 9 is turned on. First, the second one-way solenoid valve 22, the third one-way solenoid valve 32, the fourth one-way solenoid valve 42, the fifth one-way solenoid valve 43, and the sixth one-way solenoid valve 62 are closed. The first one-way solenoid valve 14 is opened. Next, the third one-way solenoid valve 32 is opened, and the liquid injection unit 3 is activated. Driver No. 1 332 is used to inject the pure water (or aqueous solution) stored in the liquid reservoir 331 into the first cavity 11, the second cavity 63, the gas dispersion unit 5, and the No. 5 pipe 66. Once the liquid is fully injected, the first one-way solenoid valve 14 is closed, and the remaining pure water (or aqueous solution) in the liquid reservoir 331 is continuously injected into the first cavity 11 until the pure water (or aqueous solution) is completely injected, so that the liquid therein reaches a certain pressure.

[0039] Furthermore, the certain pressure is generally 1 to 5 atm, preferably 2 atm.

[0040] Step 5: Constant temperature of the system. Turn on the system control unit 9 and operate the temperature control unit 7 to keep the pure water (or aqueous solution) in the system constant temperature for a certain period of time at a certain temperature.

[0041] Furthermore, the certain temperature is generally 5-50°C, preferably 30°C.

[0042] Furthermore, the certain time is generally 10 to 30 minutes, preferably 20 minutes.

[0043] Step 6: System liquid pressure control: Turn on the system control unit 9 and operate the pressure control unit 8 to adjust the pressure of the pure water (or aqueous solution) in the system to a certain value at any time.

[0044] Furthermore, the certain pressure value generally refers to the pressure maintained when the first cavity 11 and the second cavity 63 are injected with liquid, which is generally 1 to 5 atm, preferably 2 atm.

[0045] Step 7: System gas pressure control: Turn on the system control unit 9 and operate the second driver 442 to pressurize the gas in the gas reservoir 441 to the same pressure as the system liquid.

[0046] Furthermore, the system liquid pressure value is generally between 1 and 5 atm, preferably 2 atm.

[0047] Step 8: Nanobubble Formation: Turn on the system control unit 9, operate the bubble refiner 61, open the fourth and fifth one-way solenoid valves 42 and 43, and activate the gas input unit 4. Using the negative pressure effect, the gas in the gas reservoir 441 is drawn into the gas dispersion unit 5, dispersing the gas in the liquid to form a bubble dispersion. The bubble dispersion then enters the bubble minimization unit 6 for further refinement. The refined bubble dispersion then enters the rapid bubble classification unit 1, where the bubbles are rapidly classified. Large bubbles coalesce into gas and enter the gas input unit 4. Under the coordinated action of each system unit, the gas forms nanobubbles in the pure water (or aqueous solution) over a period of time.

[0048] The certain time is 1 to 10 minutes;

[0049] Furthermore, the certain time is generally 1 to 10 minutes; preferably, 5 minutes.

[0050] Step nine: Turn on the system control unit 9 , open the sixth one-way solenoid valve 62 , and output the nanobubble dispersion through the terminal processor 64 .

[0051] The particle size of the nanobubbles prepared according to the above method is 60-100 nm.

[0052] The beneficial effects of the present invention are as follows: compared with the prior art, (1) the present invention can prepare nanobubbles with a particle size of less than 100 nm; (2) the present invention can prepare nanobubbles in one step without the interference of micron bubbles; (3) the present invention is fast and efficient and can generally be completed in a few minutes; (4) the nanobubbles obtained by the present invention have the characteristics of controllable particle size, high concentration and good uniformity; (5) the present invention provides strong technical support for basic research related to nanobubbles, as well as applied research in new materials, breeding, disease diagnosis and treatment, etc.

[0053] This invention solves the challenge of rapidly producing nanobubbles in water in a single step, as well as the problems of low nanobubble number density and poor controllability. The nanobubble formation system provided by this invention can be used for both scientific research in related fields (producing nanobubbles with high number density, good uniformity, and stability) and practical applications (adjustable nanobubble uniformity and stability), providing strong technical support for basic research and applications related to nanobubbles. BRIEF DESCRIPTION OF THE DRAWINGS

[0054] Figure 1 It is an operational flow chart of the system in the present invention.

[0055] Figure 2 It is a structural schematic diagram of the bubble rapid classification unit in the present invention.

[0056] Figure 3 It is a structural schematic diagram of the gas replacement unit in the present invention.

[0057] Figure 4 It is a structural schematic diagram of the liquid injection unit in the present invention.

[0058] Figure 5 It is a structural schematic diagram of the liquid supply part in the liquid injection unit of the present invention.

[0059] Figure 6 It is a structural schematic diagram of the gas input unit in the present invention.

[0060] Figure 7 It is a structural schematic diagram of the gas supply part in the gas input unit of the present invention.

[0061] Figure 8 It is a schematic diagram of the structure of the gas dispersion unit in the present invention.

[0062] Figure 9 It is a schematic structural diagram of the bubble miniaturization unit in the present invention.

[0063] Figure 10 It is a structural schematic diagram of the temperature control unit in the present invention.

[0064] Figure 11It is a structural diagram of the pressure control unit in the present invention.

[0065] Figure 1-11 middle:

[0066] 1- Bubble rapid classification unit, first cavity (11), rigid blade (12), flexible wall (13), first one-way solenoid valve (14);

[0067] 2-Gas replacement unit, No. 1 pipeline (21), second one-way solenoid valve (22), high-pressure cylinder (23);

[0068] 3-Liquid injection unit, No. 2 pipeline (31), third one-way solenoid valve (32), liquid supply part (33)-liquid reservoir (331) No. 1 driver (332);

[0069] 4-gas input unit, No. 3 pipeline (41), fourth one-way solenoid valve (42), fifth one-way solenoid valve (43), gas supply part (44) - gas reservoir (441), No. 2 driver (442), No. 4 pipeline (45), pressure gauge (46);

[0070] 5-gas dispersion unit, water inlet end (51), air inlet end (52), water outlet end (53);

[0071] 6- bubble micronizing unit, bubble micronizer (61), sixth one-way solenoid valve (62), second cavity (63), one-way valve (65), fifth pipeline (66), terminal processor (64);

[0072] 7- Temperature control unit, heat exchange part (71), constant temperature box (72);

[0073] 8- Pressure control unit, mechanical part (81), pressure sensor (82), mechanical controller (83).

[0074] 9-System control unit

[0075] Figure 12 This is the NTA characterization of bubble particle size distribution of sample 1 in Example 1 of the present invention.

[0076] Figure 13 This is the NTA characterization of the bubble particle size distribution of sample 2 in Example 1 of the present invention.

[0077] Figure 14 This is a TEM image of the sheet-like PS structure prepared using nitrogen nanobubbles as a template in Example 2 of the present invention.

[0078] Figure 15 This is a TEM image of hollow PS spheres prepared using nitrogen nanobubbles as a template in Example 3 of the present invention. DETAILED DESCRIPTION

[0079] The invention is further described in detail with reference to the following specific examples and accompanying drawings. The processes, conditions, experimental methods, etc. for implementing the present invention, except for those specifically mentioned below, are common knowledge and common common sense in the art and are not particularly limited by the present invention.

[0080] In the following examples, the bubble characterization method used is nanoparticle tracking technology (NTA), and the characterization instrument involved is Malvern's nanosight LM14. The instrument has a matching sample cell and cover, which are cleaned with deionized water before use. The characterization environment is room temperature and normal pressure.

[0081] The present invention proposes a nanobubble formation system, comprising: a bubble rapid classification unit 1, a gas replacement unit 2, a liquid injection unit 3, a gas input unit 4, a gas dispersion unit 5, a bubble miniaturization unit 6, a temperature control unit 7, a pressure control unit 8 and a system control unit 9; wherein,

[0082] The bubble rapid classification unit 1 comprises: a first chamber 11 for rapidly classifying the micronized bubbles obtained by the bubble miniaturization unit 6, wherein large bubbles float up and recondense into a continuous phase gas, entering the gas input unit 4, and the classified bubble dispersion enters the gas dispersion unit 5;

[0083] The bubble miniaturization unit 6 cooperates with the bubble rapid classification unit 1 to form nanobubbles, including: a second cavity 63, in which the bubbles obtained in the gas dispersion unit 5 are further refined;

[0084] The gas replacement unit 2 is used to replace the air in the first cavity 11, the second cavity 63, the gas dispersion unit 5, the No. 3 pipe 41, the No. 4 pipe 45, and the No. 5 pipe 66 with a specific gas; the first cavity 11 is connected to the gas dispersion unit 5; the first cavity 11 and the second cavity 63 are connected through the No. 5 pipe 66;

[0085] The liquid injection unit 3 is used to inject pure water or aqueous solution into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66;

[0086] A gas input unit 4 is used to input a specific gas into the gas dispersion unit 5;

[0087] The gas dispersion unit 5 is used to disperse the gas in the gas input unit 4 into bubbles to form a bubble dispersion liquid;

[0088] A temperature control unit 7 is used to control the temperature of the pure water or aqueous solution in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66;

[0089] The pressure control unit 8 regulates the pressure of the pure water or aqueous solution in the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the fifth pipeline 66 by changing the volume of the first cavity 11;

[0090] The system control unit 9 is used to control the operation of the gas replacement unit 2, the liquid injection unit 3, the gas input unit 4, the gas dispersion unit 5, the bubble miniaturization unit 6, the temperature control unit 7 and the pressure control unit 8.

[0091] Example 1 Preparation of pure water nitrogen nanobubbles

[0092] Sample 1

[0093] (1) System connection and reagent preparation: All parts of the system are connected as required;

[0094] (2) Gas replacement: Open the system control unit 9. First, close the first one-way solenoid valve 14, the third one-way solenoid valve 32, and the sixth one-way solenoid valve 62. Open the second one-way solenoid valve 22, the fourth one-way solenoid valve 42, and the fifth one-way solenoid valve 43. Fill the first chamber 11, the second chamber 63, the gas dispersion unit 5, the No. 3 pipe 41, the No. 4 pipe 45, and the No. 5 pipe 66 with N2 gas to a pressure of 3 atm. Then, open the first one-way solenoid valve 14 to release the gas. This operation is repeated three times.

[0095] (3) Reagent preparation: 6 mL of nitrogen and 120 mL of pure water were stored in the gas reservoir 441 and the liquid reservoir 331, respectively.

[0096] (4) Water injection: Open the system control unit 9, first close the second one-way solenoid valve 22, the third one-way solenoid valve 32, the fourth one-way solenoid valve 42, the fifth one-way solenoid valve 43 and the sixth one-way solenoid valve 62, open the first one-way solenoid valve 14, then open the third one-way solenoid valve 32, start the liquid injection unit 3, and use the No. 1 driver 332 to inject the pure water stored in the liquid reservoir 331 into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipe 66; after the liquid is filled, close the first one-way solenoid valve 14, and continue to inject the remaining pure water in the liquid reservoir 331 into the first cavity 11 until the pure water (a total of 120 mL) is injected, so that the water pressure therein reaches a certain level of 2 atm;

[0097] (5) Constant temperature of the system: Turn on the system control unit 9, operate the temperature control unit 7, and keep the pure water in the system at a constant temperature of 30°C for 20 minutes;

[0098] (6) System liquid pressure control: Turn on the system control unit 9, operate the pressure control unit 8, and adjust the pure water pressure in the system to maintain at 2 atm at any time;

[0099] (7) System gas pressure control: Turn on the system control unit 9 and operate the second driver 442 to pressurize the gas in the gas reservoir 441 to the same pressure as the water in the system, which is 2 atm.

[0100] (8) Formation of Nanobubbles: Turn on the system control unit 9, operate the bubble refiner 61, open the fourth one-way solenoid valve 42 and the fifth one-way solenoid valve 43, start the gas input unit 4, and use the negative pressure effect to draw N2 from the gas reservoir 441 into the gas dispersion unit 5, so that N2 is dispersed in the liquid to form an N2 bubble dispersion liquid. The N2 bubble dispersion liquid enters the bubble miniaturization unit 6 for further refinement. The refined N2 dispersion liquid enters the bubble rapid classification unit 1, where rapid bubble classification is achieved. Large N2 bubbles condense into gas and enter the gas input unit 4. Under the synergistic effect of each unit in the system, within 3 minutes, N2 forms nanobubbles in pure water.

[0101] (9) Turn on the system control unit 9, open the sixth one-way solenoid valve 62, and output the N2 nanobubble dispersion through the terminal processor 64. The nanobubble NTA analysis results are as follows: Figure 12 shown.

[0102] Sample 2

[0103] (1) System connection and reagent preparation: All parts of the system are connected as required;

[0104] (2) Gas replacement: Open the system control unit 9. First, close the first one-way solenoid valve 14, the third one-way solenoid valve 32, and the sixth one-way solenoid valve 62. Open the second one-way solenoid valve 22, the fourth one-way solenoid valve 42, and the fifth one-way solenoid valve 43. Fill the first chamber 11, the second chamber 63, the gas dispersion unit 5, the No. 3 pipe 41, the No. 4 pipe 45, and the No. 5 pipe 66 with N2 gas to a pressure of 3 atm. Then, open the first one-way solenoid valve 14 to release the gas. This operation is repeated three times.

[0105] (3) Reagent preparation: 12 mL of nitrogen and 120 mL of pure water were stored in the gas reservoir 441 and the liquid reservoir 331, respectively.

[0106] (4) Water injection: Open the system control unit 9, first close the second one-way solenoid valve 22, the third one-way solenoid valve 32, the fourth one-way solenoid valve 42, the fifth one-way solenoid valve 43 and the sixth one-way solenoid valve 62, open the first one-way solenoid valve 14, then open the third one-way solenoid valve 32, start the liquid injection unit 3, and use the No. 1 driver 332 to inject the pure water stored in the liquid reservoir 331 into the first cavity 11, the second cavity 63, the gas dispersion unit 5 and the No. 5 pipe 66; after the liquid is filled, close the first one-way solenoid valve 14, and continue to inject the remaining pure water in the liquid reservoir 331 into the first cavity 11 until the pure water (a total of 120 mL) is injected, so that the water pressure therein reaches a certain level of 2 atm;

[0107] (5) Constant temperature of the system: Turn on the system control unit 9, operate the temperature control unit 7, and keep the pure water in the system at a constant temperature of 30°C for 20 minutes;

[0108] (6) System liquid pressure control: Turn on the system control unit 9, operate the pressure control unit 8, and adjust the pure water pressure in the system to maintain at 2 atm at any time;

[0109] (7) System gas pressure control: Turn on the system control unit 9 and operate the second driver 442 to pressurize the gas in the gas reservoir 441 to the same pressure as the water in the system, which is 2 atm.

[0110] (8) Formation of Nanobubbles: Turn on the system control unit 9, operate the bubble refiner 61, open the fourth one-way solenoid valve 42 and the fifth one-way solenoid valve 43, start the gas input unit 4, and use the negative pressure effect to draw N2 from the gas reservoir 441 into the gas dispersion unit 5, so that N2 is dispersed in the liquid to form an N2 bubble dispersion liquid. The N2 bubble dispersion liquid enters the bubble miniaturization unit 6 for further refinement. The refined N2 dispersion liquid enters the bubble rapid classification unit 1, where rapid bubble classification is achieved. Large N2 bubbles condense into gas and enter the gas input unit 4. Under the synergistic effect of each unit in the system, within 5 minutes, N2 forms nanobubbles in pure water.

[0111] (9) Turn on the system control unit 9, open the sixth one-way solenoid valve 62, and output the N2 nanobubble dispersion through the terminal processor 64. The nanobubble NTA analysis results are as follows: Figure 13 shown.

[0112] Example 2 Preparation of sheet polystyrene with the assistance of nitrogen nanobubbles

[0113] In a 50ml conical flask, 16.5mL of nanobubble water (sample 2) was injected, and 0.016g of CTAB was added and mixed evenly; then, a composite initiator (0.018g KPS, 0.012g NaHSO3), 11mL of ethanol, and 1.08mL of styrene were added, stirred at 300rpm, and reacted at 25℃ for 5h. The obtained flake polystyrene is shown in FIG. Figure 14 .

[0114] Example 3 Preparation of Hollow Polystyrene Spheres Using Nitrogen Nanobubble Templates

[0115] In a 50ml conical flask, 16.5mL of nanobubble water (sample 2) was injected, followed by the addition of composite initiator (0.018g KPS, 0.012g NaHSO3), 11mL of ethanol, and 1.08mL of styrene. Ultrasonication was performed for 10min, followed by stirring at 300rpm and reaction at 25℃ for 3h. The obtained styrene hollow spheres were shown in Figure 2. Figure 15 .

[0116] The protection content of the present invention is not limited to the above embodiments. Without departing from the spirit and scope of the invention, changes and advantages that can be thought of by those skilled in the art are included in the present invention and are protected by the appended claims.

Claims

1. A nanobubble forming system, characterized in that: include: A bubble rapid classification unit (1), a gas replacement unit (2), a liquid injection unit (3), a gas input unit (4), a gas dispersion unit (5), a bubble miniaturization unit (6), a temperature control unit (7), a pressure control unit (8) and a system control unit (9); wherein, The bubble rapid classification unit (1) comprises: a first cavity (11) for rapidly classifying the micronized bubbles obtained by the bubble micronization unit (6); large bubbles float up and re-condense into a continuous phase gas, which enters the gas input unit (4); and the classified bubble dispersion enters the gas dispersion unit (5); The bubble miniaturization unit (6) cooperates with the bubble rapid classification unit (1) to form nanobubbles, and comprises: a second cavity (63) in which the bubbles obtained in the gas dispersion unit (5) are further refined; The gas replacement unit (2) is used to replace the air in the first cavity (11), the second cavity (63), the gas dispersion unit (5), the No. 3 pipe (41), the No. 4 pipe (45) and the No. 5 pipe (66) with a specific gas; the first cavity (11) is connected to the gas dispersion unit (5); the first cavity (11) and the second cavity (63) are communicated through the No. 5 pipe (66); The liquid injection unit (3) is used to inject pure water or aqueous solution into the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the fifth pipeline (66); The gas input unit (4) is used to input specific gas into the gas dispersion unit (5); The gas input unit (4) comprises: a No. 3 pipeline (41) for connecting the gas supply portion (44) and the first cavity (11), a No. 4 pipeline (45) for connecting the gas supply portion (44) and the gas dispersion unit (5), and a pressure gauge (46) for indicating the gas pressure in the gas input unit (4) and the No. 3 pipeline (41) and the No. 4 pipeline (45); a fourth one-way solenoid valve (42), used to control the gas in the first cavity (11) to enter the gas supply portion (44); a fifth one-way solenoid valve (43) for controlling the gas from the gas supply portion (44) to enter the gas dispersion unit (5); a gas supply portion (44) for collecting gas in the first cavity (11) and inputting the gas into the gas dispersion unit (5); The gas dispersion unit (5) is used to disperse the gas in the gas input unit (4) into bubbles to form a bubble dispersion liquid; The temperature control unit (7) is used to control the temperature of the pure water or aqueous solution in the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the fifth pipeline (66); The pressure control unit (8) regulates the pressure of the pure water or aqueous solution in the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the fifth pipeline (66) by changing the volume of the first cavity (11); The system control unit (9) is used to control the operation of the gas replacement unit (2), the liquid injection unit (3), the gas input unit (4), the gas dispersion unit (5), the bubble miniaturization unit (6), the temperature control unit (7) and the pressure control unit (8).

2. The nanobubble forming system according to claim 1, wherein: The bubble rapid classification unit (1) comprises: Rigid blades (12) arranged in a cross-shaped manner to promote rapid classification of the bubble dispersion in the first chamber (11); A flexible wall (13) that cooperates with a mechanical portion (81) of a pressure control unit (8) to regulate the volume of the first cavity (11); The first one-way solenoid valve (14) is used to discharge the gas in the first cavity (11), the second cavity (63), the gas dispersion unit (5), the third pipeline (41), the fourth pipeline (45) and the fifth pipeline (66).

3. The nanobubble forming system according to claim 1, wherein: The gas replacement unit (2) comprises: a first pipeline (21) for connecting the first cavity (11) and the high-pressure cylinder (23); A second one-way solenoid valve (22) is used to control the gas in the high-pressure cylinder (23) to enter the first cavity (11), the second cavity (63), the gas dispersion unit (5), the third pipeline (41), the fourth pipeline (45) and the fifth pipeline (66); The high-pressure steel cylinder (23) is used to replace the air in the first cavity (11), the second cavity (63), the gas dispersion unit (5), the No. 3 pipeline (41), the No. 4 pipeline (45) and the No. 5 pipeline (66) with a specific gas; the pressure of the high-pressure steel cylinder (23) is between 10 atm and 50 atm.

4. The nanobubble forming system according to claim 1, wherein: The liquid injection unit (3) comprises: a second pipe (31) for connecting the liquid supply portion (33) and the first cavity (11); a third one-way solenoid valve (32) for controlling the pure water or aqueous solution in the liquid supply portion (33) to enter the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the fifth pipeline (66); The liquid supply part (33) is used to inject pure water or aqueous solution into the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the fifth pipeline (66).

5. The nanobubble forming system according to claim 4, wherein: The liquid supply part (33) includes: a liquid reservoir (331) for storing pure water or aqueous solution; a No. 1 driver (332) for injecting the pure water or aqueous solution in the liquid reservoir (331) into the first cavity (11), the second cavity (63), the gas dispersion unit (5) and the No. 5 pipeline (66).

6. The nanobubble forming system according to claim 1, wherein: The gas supply part (44) includes: a gas storage container (441) for storing gas; The second driver (442) is used to pressurize the gas in the gas reservoir (441), the third pipeline (41) and the fourth pipeline (45) to the same pressure as the liquid in the first chamber (11) and the second chamber (63).

7. The nanobubble forming system according to claim 1, wherein: The bubble miniaturization unit (6) comprises: a bubble refiner (61) for further refining the bubble dispersion obtained in the gas dispersion unit (5); a sixth one-way solenoid valve (62) for controlling the output of the nanobubble dispersion in the first cavity (11), the second cavity (63) and the system pipeline; A fifth pipe (66) for connecting the first cavity (11) and the second cavity (63); a one-way valve (65) for controlling the flow of liquid from the second cavity (63) into the first cavity (11); a terminal processor (68) for further homogenizing the nanobubble dispersion; The bubble refiner (61) includes a colloid mill, a homogenizer, a vortex pump, and an emulsifier; the colloid mill has a rotation speed of 3000 to 15000 rpm; the homogenizer has a rotation speed of 3000 to 20000 rpm; the vortex pump is a multi-stage vortex pump with a rotation speed of 2000 to 10000 rpm; the emulsifier has a rotation speed of 3000 to 30000 rpm.

8. The nanobubble forming system according to claim 1, wherein: The temperature control unit (7) includes: a heat exchange portion (71) for exchanging heat between the constant temperature liquid and the liquid in the first cavity (11), thereby maintaining the temperature of the liquid in the first cavity (11), the second cavity (63), the gas dispersion unit (5), and the system pipeline; The thermostat (72) is used to maintain the temperature of the thermostat liquid, and the temperature control sensitivity is 0.1-0.5°C.

9. The nanobubble forming system according to claim 1, wherein: The pressure control unit (8) comprises: a mechanical part (81) for adjusting the volume of the first cavity (11); A pressure sensor (82) is disposed in the first cavity (11) and is used to detect the pressure of the liquid in the first cavity (11), wherein the sensitivity of the pressure sensor is 0.1 to 0.2 atm; The mechanical controller (83) is used to control the mechanical part (81) so that the liquid in the first cavity (11) reaches a specific pressure.

10. The nanobubble forming system according to claim 1, wherein: The system control unit (9) is used to control the operation of the gas replacement unit (2), the liquid injection unit (3), the gas input unit (4), the bubble miniaturization unit (6), the temperature control unit (7) and the pressure control unit (8).

11. A method for forming nanobubbles, characterized in that: The steps include: Step 1: Connecting the various parts of the nanobubble forming system according to any one of claims 1 to 10; Step 2: Gas replacement: Open the system control unit (9), first, close the first one-way solenoid valve (14), the third one-way solenoid valve (32) and the sixth one-way solenoid valve (62), open the second one-way solenoid valve (22), the fourth one-way solenoid valve (42) and the fifth one-way solenoid valve (43), fill the first cavity (11), the second cavity (63), the gas dispersion unit (5), the third pipe (41), the fourth pipe (45) and the fifth pipe (66) with the specific gas to 2 to 10 atm, then open the first one-way solenoid valve (14) to release the gas; the step 2 operation steps are repeated 2 to 5 times; Step 3: Reagent preparation: storing a specific gas and pure water or an aqueous solution at a volume ratio of 1:100 to 30:100 in a gas reservoir (441) and a liquid reservoir (331) respectively; Step 4: Liquid injection: Open the system control unit (9), first, close the second one-way solenoid valve (22), the third one-way solenoid valve (32), the fourth one-way solenoid valve (42), the fifth one-way solenoid valve (43) and the sixth one-way solenoid valve (62), open the first one-way solenoid valve (14), then open the third one-way solenoid valve (32), start the liquid injection unit (3), use the No. 1 driver (332) to inject the pure water or aqueous solution stored in the liquid reservoir (331) into the first cavity (11), the second cavity (63), the gas dispersion unit (5), and the No. 5 pipe (66), after the liquid is filled, close the first one-way solenoid valve (14), and continue to inject the remaining pure water or aqueous solution in the liquid reservoir (331) into the first cavity (11) until the pure water or aqueous solution is completely injected, so that the liquid therein reaches 1 to 5 atm; Step 5: Constant temperature of the system: Turn on the system control unit (9), operate the temperature control unit (7), and keep the pure water or aqueous solution in the system constant temperature at 5 to 50° C. for 10 to 30 minutes; Step 6: System liquid pressure control: Turn on the system control unit (9), operate the pressure control unit (8), and adjust the pressure of the pure water or aqueous solution in the system to 1-5 atm at any time; Step 7: System gas pressure control: Turn on the system control unit 9 and operate the second driver (442) to pressurize the gas in the gas reservoir (441) to the same pressure value as the system liquid, which is 1 to 5 atm; Step 8: Formation of nanobubbles: Turn on the system control unit (9), operate the bubble refiner (61), open the fourth one-way solenoid valve (42) and the fifth one-way solenoid valve (43), start the gas input unit (4), and use the negative pressure effect to suck the gas in the gas storage (441) into the gas dispersion unit (5), so that the gas is dispersed in the liquid to form a bubble dispersion liquid. The bubble dispersion liquid enters the bubble miniaturization unit (6) for further refinement. The refined bubble dispersion liquid enters the bubble rapid classification unit (1), and the bubble rapid classification is achieved in the bubble rapid classification unit (1). Large bubbles condense into gas and enter the gas input unit (4). Under the synergistic effect of each unit of the system, within 1 to 10 minutes, the gas forms nanobubbles in pure water or aqueous solution. Step nine: Turn on the system control unit (9), open the sixth one-way solenoid valve (62), and output the nanobubble dispersion through the terminal processor (64).

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