A vertical film-forming device with a multi-channel functional shaft that can extend into a cavity

Abstract

The present invention discloses a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity, which relates to the technical field of semiconductor production equipment. The main structure includes an intake chamber, a reaction chamber, a sleeve flow channel, a handling system, a base, a rotating chamber, and a rotating shaft; the rotating shaft is a hollow shaft, and a multi-channel functional shaft is coaxially arranged inside the rotating shaft; a lifting rod penetrates through the multi-channel functional shaft; one end of the multi-channel functional shaft extending into the base is provided with a plurality of openings. In the vertical film-forming device with a multi-channel functional shaft that can extend into a cavity in the present invention, an intake pipe is arranged inside the base, and a protective gas is introduced to separate the inside and outside of the base, which is more comprehensive and effective than covering parts. Keeping the protective gas in the base overflowing outward reduces the entry of external reaction gases into the base, thereby reducing the influence of external gases on the heating element in the base and extending its service life. At the same time, the stability of the thermal field during the film-forming process is ensured, and the replacement frequency is reduced, which can improve production efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor production equipment, and particularly to a vertical film forming device with a multi-channel functional shaft that can extend into a cavity. Background Art

[0002] A vertical film forming device is used to prepare semiconductor wafers. Reactive gases are introduced into the interior of the chamber and come into contact with the wafers that are rotating stably at high speed for epitaxial growth. During the process, the wafers on the surface of the substrate need to be heated to the reaction temperature. After the process is completed, to meet continuous production requirements, the substrate has a lifting function and is linked with an external transfer system to transport the substrate with the film formed out of the reaction chamber.

[0003] Patent document with publication number CN101426965A discloses the production of bulk single-crystalline silicon carbide. The bulk, low-impurity single-crystalline silicon carbide is grown on the crystal growth interface by depositing silicon-containing and carbon-containing vapor-phase substances. The silicon source vapor is provided by evaporating silicon and transporting the silicon vapor to the crystal growth crucible. The carbon vapor-phase substance is provided by a carbon source vapor (e.g., CN) or obtained by flowing the silicon source vapor over or through a solid-phase carbon source, e.g., flowing silicon vapor through a porous graphite or graphite particle layer.

[0004] However, the temperature uniformity inside its equipment is not high enough, which affects the final wafer quality. Summary of the Invention

[0005] To solve the above technical problems, the present invention provides a vertical film forming device with a multi-channel functional shaft that can extend into a cavity to improve the temperature uniformity inside the device.

[0006] To achieve the above object, the present invention provides the following solutions:

[0007] The present invention provides a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity, comprising an intake chamber, a reaction chamber, a sleeve channel, a handling system, a base, a rotating chamber, and a rotating shaft; the intake chamber is arranged at the top of the reaction chamber and is in communication with the reaction chamber; a sleeve is arranged inside the reaction chamber, and a base is arranged inside the sleeve, and the top of the base is used to support a wafer; the handling system is arranged on one side outside the reaction chamber and is used to take out the wafer on the top of the base; the rotating chamber is arranged below the reaction chamber, the rotating shaft is arranged inside the rotating chamber, and the top of the rotating shaft extends into the reaction chamber and is connected to the base; the rotating shaft is used to drive the base to rotate; a push rod seat is arranged inside the base, the bottom of the push rod seat is connected to the top of a lifting rod, the bottom of the lifting rod is connected to a driving mechanism, and an inner ring heating element and an outer ring heating element are coaxially arranged at the top of the push rod seat and at the same height below the wafer; the rotating shaft is a hollow shaft, and a multi-channel functional shaft is coaxially arranged inside the rotating shaft; the lifting rod penetrates through the multi-channel functional shaft; one end of the multi-channel functional shaft extending into the base is provided with a plurality of openings.

[0008] Optionally, the plurality of openings include a lifting rod opening arranged at the axis center of the multi-channel functional shaft, a sleeve is arranged between the lifting rod and the lifting rod opening, and at least one rubber ring is arranged below the sleeve between the lifting rod and the lifting rod opening; the sleeve is used to guide the lifting rod and prevent impurities from entering the lifting rod opening.

[0009] Optionally, the plurality of openings include electrode openings arranged offset from the axis center of the multi-channel functional shaft, a conductor is arranged inside the electrode openings, and the conductor is used to connect a power source to the inner ring heating element and the outer ring heating element.

[0010] Optionally, the conductor includes a molybdenum rod seat, a molybdenum nut, and a molybdenum screw; the bottom of the molybdenum screw is electrically connected to the power source, the top of the molybdenum screw extends to the electrode opening, the molybdenum nut is arranged inside the electrode opening and is threadedly connected to the top of the molybdenum screw; a molybdenum rod seat is also arranged inside the electrode opening, one end of the molybdenum rod seat is connected to the molybdenum screw, and the other end of the molybdenum rod seat is connected to the inner ring heating element and the outer ring heating element.

[0011] Optionally, the electrode opening includes an electrode axial hole along the axis of the multi-channel functional shaft and an electrode radial groove along the radius of the multi-channel functional shaft, the electrode axial hole is in communication with one end of the electrode radial groove, and both the molybdenum rod seat and the molybdenum nut are located inside the electrode radial groove.

[0012] Optionally, a quartz disk is provided on the top of the multi-channel functional axis. An installation groove is provided on the top of the quartz disk. The bottoms of the inner ring heating element and the outer ring heating element extend into the installation groove. A graphite bolt passes through the quartz disk to connect the molybdenum rod seat with the inner ring heating element and the outer ring heating element.

[0013] Optionally, the multiple openings include an air inlet opening provided at a position deviating from the axis of the multi-channel functional axis. An air inlet pipe is provided in the air inlet opening. The bottom of the air inlet pipe is connected to a gas source. The gas source passes a protective gas into the base through the air inlet pipe.

[0014] Optionally, the air inlet opening includes an air inlet axial hole along the axis of the multi-channel functional axis and an air inlet radial groove along the radius of the multi-channel functional axis. The air inlet axial hole communicates with one end of the air inlet radial groove. A limiting block is provided at the top end of the air inlet pipe. The limiting block is arranged in the air inlet radial groove.

[0015] Optionally, a quartz disk is provided on the top of the multi-channel functional axis. The top end of the air inlet pipe passes through the quartz disk.

[0016] Optionally, the rotating shaft is in transmission connection with a hollow motor.

[0017] The present invention has achieved the following technical effects compared with the prior art:

[0018] In the vertical film forming device with a multi-channel functional axis that can extend into the cavity in the present invention, an air inlet pipe is provided in the base to separate the inside and outside of the base by introducing a protective gas, which is more comprehensive and effective than covering parts for shielding. Keeping the protective gas in the base overflowing outward reduces the entry of external reaction gases into the base, thereby reducing the influence of external gases on the heating elements in the base and extending the service life. At the same time, it ensures the stability of the thermal field during the film forming process, reduces the replacement frequency, and improves production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0020] Figure 1 It is a schematic structural diagram of the vertical film forming device with a multi-channel functional axis that can extend into the cavity of the present invention;

[0021] Figure 2 It is a schematic structural diagram of the multi-channel functional axis in the vertical film forming device with a multi-channel functional axis that can extend into the cavity of the present invention;

[0022] Figure 3 This is a schematic cross-sectional structure diagram of a multi-channel functional shaft in a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to the present invention;

[0023] Figure 4 This is a schematic partial structure diagram of a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to the present invention;

[0024] Figure 5 This is a schematic enlarged partial structure diagram at position A in a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to the present invention;

[0025] Figure 6 This is a schematic enlarged partial structure diagram at position B in a vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to the present invention.

[0026] Explanation of reference numerals: 1, intake chamber; 2, reaction chamber; 3, sleeve flow channel; 4, handling system; 5, wafer; 6, base; 7, rotating chamber; 8, rotating shaft; 9, hollow motor; 10, multi-channel functional shaft; 11, fixing plate; 12, power supply; 13, driving mechanism; 14, gas source; 15, radiation thermometer; 16, inner ring heating element; 17, outer ring heating element; 18, graphite electrode; 19, push rod seat; 20, quartz disc; 21, PTFE sleeve; 22, lifting rod; 23, graphite bolt; 24, molybdenum rod seat; 25, molybdenum nut; 26, molybdenum screw; 27, rubber ring; 28, sleeve; 29, intake pipe. Detailed implementation manners

[0027] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0028] Such as Figures 1 to 6As shown in the figure, this embodiment provides a vertical film forming apparatus with a multi-channel functional shaft that can extend into a cavity, including an intake chamber 1, a reaction chamber 2, a sleeve flow channel 3, a handling system 4, a base 6, a rotating chamber 7, and a rotating shaft 8. The intake chamber 1 is disposed at the top of the reaction chamber 2 and is in communication with the reaction chamber 2. A sleeve is provided inside the reaction chamber 2, and a base 6 is provided inside the sleeve. The top of the base 6 is used to support the wafer 5. A handling system 4 is disposed on one side outside the reaction chamber 2, and the handling system 4 is used to take out the wafer 5 on the top of the base 6. A rotating chamber 7 is provided below the reaction chamber 2. The rotating shaft 8 is disposed inside the rotating chamber 7, and the top of the rotating shaft 8 extends into the reaction chamber 2 and is connected to the base 6. The rotating shaft 8 is used to drive the base 6 to rotate. A push rod seat 19 is provided inside the base 6. The bottom of the push rod seat 19 is connected to the top of a lifting rod 22, and the bottom of the lifting rod 22 is connected to a driving mechanism 13. An inner ring heating element 16 and an outer ring heating element are coaxially disposed at the top of the push rod seat 19 and at the same height below the wafer 5. The rotating shaft 8 is a hollow shaft, and a multi-channel functional shaft 10 is coaxially disposed inside the rotating shaft 8. The lifting rod 22 passes through the multi-channel functional shaft 10. One end of the multi-channel functional shaft 10 extending into the base 6 is provided with a plurality of openings.

[0029] In this specific embodiment, a radiation thermometer 15 is provided at the top of the intake chamber 1, and the radiation thermometer 15 is used to detect the temperatures of the middle and edge of the wafer.

[0030] The plurality of openings include a lifting rod opening provided at the axis of the multi-channel functional shaft 10. A sleeve 28 is provided between the lifting rod 22 and the lifting rod opening. Four rubber rings 27 are provided below the sleeve 28 between the lifting rod 22 and the lifting rod opening, and two rubber rings 27 are respectively provided at the upper and lower parts of the lifting rod 22. The sleeve 28 is used to guide the lifting rod 22 and prevent impurities from entering the lifting rod opening.

[0031] The plurality of openings include electrode openings provided at positions deviating from the axis of the multi-channel functional shaft 10. There are two electrode openings, and a conductor is provided inside the electrode openings. The conductor is used to connect the power supply 12 to the inner ring heating element 16 and the outer ring heating element.

[0032] The conductor includes a molybdenum rod seat 24, a molybdenum nut 25, and a molybdenum screw 26. The bottom of the molybdenum screw 26 is electrically connected to the power supply 12. The top of the molybdenum screw 26 extends to the electrode opening. The molybdenum nut 25 is disposed inside the electrode opening and is threadedly connected to the top of the molybdenum screw 26. A molybdenum rod seat 24 is also provided inside the electrode opening. One end of the molybdenum rod seat 24 is connected to the molybdenum screw 26, and the other end of the molybdenum rod seat 24 is connected to the inner ring heating element 16 and the outer ring heating element.

[0033] The electrode opening includes an electrode axial hole along the axis of the multi-channel functional axis 10 and an electrode radial groove along the radial direction of the multi-channel functional axis 10. The electrode axial hole communicates with one end of the electrode radial groove, and both the molybdenum rod base 24 and the molybdenum nut 25 are located in the electrode radial groove.

[0034] At the top of the multi-channel functional axis 10, there is a quartz disc 20. On the top of the quartz disc 20, there is an installation groove. The bottoms of the inner ring heating element 16 and the outer ring heating element extend into the installation groove. The graphite bolt 23 passes through the quartz disc 20 to connect the molybdenum rod base 24 with the inner ring heating element 16 and the outer ring heating element. More specifically, the power supply 12 is connected to the inner ring heating element 16 and the outer ring heating element through the graphite electrode 18. The bottom of the graphite electrode 18 passes through the quartz disc 20 through the graphite bolt 23 and is connected to the molybdenum rod base 24.

[0035] The multiple openings include air intake openings provided at a position deviating from the axis of the multi-channel functional axis 10. There are two air intake openings. An air intake pipe 29 is arranged in the air intake openings. The bottom of the air intake pipe 29 is connected to the gas source 14, and the gas source 14 passes the protective gas into the base 6 through the air intake pipe 29.

[0036] The air intake opening includes an air intake axial hole along the axis of the multi-channel functional axis 10 and an air intake radial groove along the radial direction of the multi-channel functional axis 10. The air intake axial hole communicates with one end of the air intake radial groove. A limiting block is provided at the top end of the air intake pipe 29, and the limiting block is arranged in the air intake radial groove.

[0037] At the top of the multi-channel functional axis 10, there is a quartz disc 20, and the top end of the air intake pipe 29 passes through the quartz disc 20.

[0038] The rotating shaft 8 is in transmission connection with a hollow motor 9. Specifically, a fixing plate 11 is provided at the bottom of the rotating chamber 7. The lifting rod 22, the air intake pipe 29, and the molybdenum screw rod 26 all pass through the fixing plate 11. Above the fixing plate 11, a hollow motor 9 is arranged in the middle of the rotating chamber 7. The rotor inside the hollow motor 9 is connected to the rotating shaft 8. The rotating shaft 8 is driven by the hollow motor 9 to drive the base 6 to rotate, so that the wafer 5 can be heated more evenly during the growth process, thereby improving the quality of the wafer 5.

[0039] A PTFE sleeve 21 is arranged between the bottom of the rotating shaft 8 and the fixing plate 11. The PTFE sleeve 21 and the sleeve 28 cooperate to keep the lifting rod 22 vertical and guide the lifting rod 22.

[0040] It should be noted that it is obvious to those skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, no matter from which point of view, the embodiments should be regarded as exemplary and non-restrictive, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims are included in the present invention, and any figure mark in the claims should not be regarded as limiting the claims involved.

[0041] The present specification uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only used to help understand the method and core idea of ​​the present invention. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A vertical film-forming device with a multi-channel functional shaft that can extend into a cavity, characterized in that, It includes an intake chamber, a reaction chamber, a sleeve flow channel, a handling system, a base, a rotating chamber, and a rotating shaft; the intake chamber is arranged at the top of the reaction chamber and is communicated with the reaction chamber; a sleeve is arranged inside the reaction chamber, a base is arranged inside the sleeve, and the top of the base is used to support the wafer; the handling system is arranged on one side outside the reaction chamber and is used to take out the wafer on the top of the base; the rotating chamber is arranged below the reaction chamber, the rotating shaft is arranged inside the rotating chamber, and the top of the rotating shaft extends into the reaction chamber and is connected to the base; the rotating shaft is used to drive the base to rotate; a push rod seat is arranged inside the base, the bottom of the push rod seat is connected to the top of a lifting rod, the bottom of the lifting rod is connected to a driving mechanism, and an inner ring heating element and an outer ring heating element are coaxially arranged at the top of the push rod seat and at the same height below the wafer; the rotating shaft is a hollow shaft, and a multi-channel functional shaft is coaxially arranged inside the rotating shaft; the lifting rod penetrates through the multi-channel functional shaft; one end of the multi-channel functional shaft extending into the base is provided with a plurality of openings. The plurality of openings include a lifting rod opening arranged at the axis center of the multi-channel functional shaft, a sleeve is arranged between the lifting rod and the lifting rod opening, and at least one rubber ring is arranged below the sleeve between the lifting rod and the lifting rod opening; the sleeve is used to guide the lifting rod and prevent impurities from entering the lifting rod opening. The plurality of openings include electrode openings arranged at positions deviating from the axis center of the multi-channel functional shaft, a conductor is arranged inside the electrode openings, and the conductor is used to connect the power supply to the inner ring heating element and the outer ring heating element. The plurality of openings include intake openings arranged at positions deviating from the axis center of the multi-channel functional shaft, an intake pipe is arranged inside the intake openings, the bottom of the intake pipe is connected to a gas source, and the gas source passes the intake pipe to introduce protective gas into the base. The intake openings include an intake axial hole along the axis of the multi-channel functional shaft and an intake radial groove along the radius of the multi-channel functional shaft, the intake axial hole is communicated with one end of the intake radial groove, and a limit block is arranged at the top end of the intake pipe and is arranged inside the intake radial groove.

2. The vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to claim 1, characterized in that, The conductor includes a molybdenum rod seat, a molybdenum nut, and a molybdenum screw; the bottom of the molybdenum screw is electrically connected to the power supply, the top of the molybdenum screw extends to the electrode opening, the molybdenum nut is arranged inside the electrode opening and is threadedly connected to the top of the molybdenum screw; the molybdenum rod seat is also arranged inside the electrode opening, one end of the molybdenum rod seat is connected to the molybdenum screw, and the other end of the molybdenum rod seat is connected to the inner ring heating element and the outer ring heating element.

3. The vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to claim 2, characterized in that, The electrode openings include an electrode axial hole along the axis of the multi-channel functional shaft and an electrode radial groove along the radius of the multi-channel functional shaft, the electrode axial hole is communicated with one end of the electrode radial groove, and both the molybdenum rod seat and the molybdenum nut are arranged inside the electrode radial groove.

4. The vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to claim 2, characterized in that, A quartz disk is provided at the top of the multi-channel functional shaft. An installation groove is provided at the top of the quartz disk. The bottoms of the inner ring heating element and the outer ring heating element extend into the installation groove. A graphite bolt penetrates through the quartz disk to connect the molybdenum rod seat with the inner ring heating element and the outer ring heating element.

5. The vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to claim 1, characterized in that, A quartz disk is provided at the top of the multi-channel functional shaft. The top end of the air inlet pipe penetrates through the quartz disk.

6. The vertical film-forming device with a multi-channel functional shaft that can extend into a cavity according to claim 1, characterized in that, The rotating shaft is in transmission connection with a hollow motor.

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