Magnetron target coupling and support apparatus

Abstract

A magnetron target coupling and support device is involved. According to various embodiments, a magnetron target coupling (301) comprises a target coupling flange (702), a shaft (808) rigidly coupled on one end side with the target coupling flange (702) and having a first linear bearing component (8081) on the side opposite the target coupling flange (702), a communication interface (704) having a first communication electrode (704a) and a second communication electrode (704b) electrically coupled with one another, wherein the second communication electrode (704b) is rigidly fixed at the target coupling flange (702) on the side opposite the shaft (808), wherein the target coupling flange (702) is arranged between the first communication electrode (704a) and the second communication electrode (704b), wherein the first communication electrode (704a) is supported such that it is displaced towards and / or away from the second communication electrode (704b).

Description

TECHNICAL FIELD

[0001] Various embodiments relate to a magnetron target coupling and a support device. BACKGROUND

[0002] Generally, a workpiece or substrate can be processed, for example machined, coated, heated, etched and / or structurally changed. A method for coating a substrate is, for example, cathodic atomization, so-called sputtering, which is of the type of physical vapor deposition (PVD). For example, one or more layers can be deposited on a substrate by means of sputtering, i.e. by means of a sputtering process. To this end, a gas forming a plasma can be ionized by means of a cathode, wherein the material to be deposited (target material) can be atomized by means of the plasma formed here. The atomized target material can then be directed to the substrate, where it can be deposited and form a layer.

[0003] A modification of cathodic atomization is sputtering by means of a magnetron, so-called magnetron sputtering, or so-called reactive magnetron sputtering. Here, the formation of a plasma can be supported by means of a magnetic field. The magnetic field can be generated by a magnet system and penetrates a cathode, also referred to as a magnetron cathode, so that at the target material surface (target surface) a toroidal plasma channel, so-called orbit, can be constituted in which a plasma can be formed.

[0004] The spatial distribution of the plasma and the atomization rate associated therewith depends very sensitively on the spatial distribution of the magnetic field. The magnet system therefore has a particular significance for various process characteristics, such as process stability, reproducibility, target utilization and uniformity. In this context, there is a fundamental need for improvements, such as simplification of the magnet system and / or reduction of disturbing influences. SUMMARY

[0005] One aspect of various embodiments can intuitively lie in providing a communication with the adjustable magnetic field. By means of the adjustment of the magnetic field, the atomization of the target material can be influenced, for example so that as uniform a molecularized sputtering and / or coating as possible can be carried out. In connection therewith, it has been intuitively recognized that the components used for the communication, for this purpose, are subjected to various disturbances, which make the communication with the magnet system or the adjustment of the magnetic field difficult.

[0006] According to various embodiments, a continuous assembly in the form of a magnetron target coupling is provided, which has an axially adjustable communication interface. The communication interface can provide a communicative coupling of the magnet system with the support device, so that the magnet system can be better controlled. Intuitively, the axially adjustable communication interface enables a better compensation of tolerances and thermal expansions. This reduces disturbances of the communication with the magnet system.

[0007] Optionally, the communication interface is designed for contactless communication with the magnet system or the support device, which reduces wear or avoids moving sliding contacts. BRIEF DESCRIPTION OF DRAWINGS

[0008] The drawings show

[0009] Figure 1 , Figure 2 and Figure 4 magnet systems according to various embodiments, respectively, in various views;

[0010] Figure 3A , Figure 5 and Figure 10 sputter devices according to various embodiments, respectively, in different schematic views, and Figure 3B a magnet system of a sputter device;

[0011] Figure 6 a housing cover of a magnet system according to various embodiments, in a schematic cross-sectional view;

[0012] Figure 7 and Figure 12 magnetron target couplings according to various embodiments, respectively, in various schematic views;

[0013] Figure 8 and Figure 13 communication assemblies according to various embodiments, respectively, in different schematic views;

[0014] Figure 9 a support device according to various embodiments, in a schematic cross-sectional view; and

[0015] Figure 11 a rotational support of a support device according to various embodiments, in a schematic perspective view. DETAILED DESCRIPTION

[0016] In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which are shown by way of illustration specific embodiments in which the application can be practiced. In this regard, directional terminology, such as "upper", "lower", "front", "back", "leading", "trailing", etc., is used with reference to the orientation of the Figure(s) being described. Because components of embodiments can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and not limitation. It is to be understood that other embodiments can be utilized and structural or logical changes can be made without departing from the scope of the present application. It is to be understood that features described herein with reference to different exemplary embodiments can be combined together where appropriate. Therefore, the following detailed description is not to be taken in a limiting sense and the scope of the present application is defined by the appended claims.

[0017] Within the scope of the present description, the terms "connected", "coupled", and "coupling" are used to describe both direct and indirect (e.g. ohmic and / or conductive, e.g. conductive connection) connections, direct or indirect couplings, and direct or indirect couplings. In the drawings, wherever appropriate, identical or similar elements are provided with the same reference signs.

[0018] According to various embodiments, the term "coupled" or "coupling" can be understood as (e.g. mechanical, hydrostatic, thermal and / or electrical) e.g. direct or indirect connection and / or interaction. For example, elements can be coupled to each other along an interaction chain along which interaction, e.g. fluid (then also referred to as fluidically guiding coupling), can be exchanged. For example, two elements coupled to each other can exchange interaction, e.g. mechanical, hydrostatic, thermal and / or electrical interaction, with each other. Coupling of vacuum components, e.g. valves, pumps, chambers, etc., to each other can comprise that they are fluidically coupled to each other. According to various embodiments, "coupling" can be understood as mechanical (e.g. substantial or physical) coupling, e.g. by means of direct substantial contact. A coupling can be designed for transmitting mechanical interaction, e.g. force, torque, etc.

[0019] Herein, the term "support device" denotes a device designed for supporting (e.g. guidingly positioning and / or holding) one component or more than one component. The support device can have, for example, one or more than one support for each component which is supported by means of the support device, to support (e.g. guidingly position and / or hold) the component. Each support of the support device can be designed to provide one or more than one degree of freedom (e.g. one or more than one translational degree of freedom and / or one or more than one rotational degree of freedom) for the component, according to which the component can move. Examples of supports include radial supports, axial supports, radial thrust supports, linear supports (also referred to as linear guiding devices).

[0020] The term "sputtering" denotes atomizing a material (also referred to as coating material or target material) by means of a plasma, which is provided as so-called target material. Thus, the atomized components of the target material separate from one another and can, for example, accumulate to form a layer. Sputtering can be carried out by means of a so-called sputter device, which can have a magnet system (the sputter device is then also referred to as a magnetron). For sputtering, the magnetron can be arranged in a vacuum process treatment chamber, so that sputtering can be carried out in a vacuum. To this end, the environmental conditions (process conditions) within the vacuum process treatment chamber (e.g. pressure, temperature, gas composition, etc.) can be set or adjusted during sputtering. For example, the vacuum process treatment chamber can be designed airtight, dust-tight and / or vacuum-tight, so that a gas atmosphere having a predetermined composition or a predetermined pressure (e.g. according to a predetermined value) can be provided within the vacuum process treatment chamber. For example, an ion formation gas (process gas) or a gas mixture (e.g. composed of a process gas and a reaction gas) can be provided in the process treatment chamber. For example, in reactive magnetron sputtering, the atomized material can react with a reaction gas (e.g. having oxygen, nitrogen and / or carbon), and the reaction products (e.g. dielectrics) formed thereby can be separated.

[0021] Sputtering can be carried out by means of a so-called tube-shaped magnetron, in which a tube-shaped target (also referred to as tube-shaped target or tube-shaped cathode) having a target material rotates axially around the magnet system. Sputtering of the target material can be influenced by means of adjusting the magnet system or by means of changing the magnetic field generated thereby, with which the spatial distribution with which the target material is dislodged is changed.

[0022] The tube-shaped cathode and the magnet system can be supported by means of a support device (also referred to as target support device), which can support the tube-shaped cathode in a manner rotatable relative to the magnet system. The support device can have, for example, one or more than one end block, wherein each end block of the support device holds an end section of the tube-shaped cathode or of the magnet system. The support device (e.g. one or more end blocks thereof) can also provide a supply to the tube-shaped cathode (e.g. supply of electrical power, rotational movement and / or cooling fluid).

[0023] According to various embodiments, an end block of the sputter device (then also referred to as drive end block) can have a drive train for transmitting a rotational movement to the tubular cathode, which can be coupled with a drive, for example. Alternatively or additionally, an end block of the sputter device (also referred to as media end block) can be designed for the delivery and discharge of a cooling fluid (e.g. a water-based mixture), which can be guided through the cathode.

[0024] However, it is also possible to use just one end block (also referred to as compact end block), which has a drive train and a fluid line, which in turn jointly provide the functionality of a drive end block and a media end block. For example, the side of the tubular target opposite the compact end block can be free to extend (i.e. freely suspended), which is referred to as cantilevered configuration, or be supported by means of a support block.

[0025] The magnet system can be multipolar, i.e. have a plurality of magnetic poles. A first magnetic pole (also referred to as outer pole) of the plurality of magnetic poles can extend along a path closed on itself (also referred to as loop path), and a second magnetic pole can be arranged within an area enclosed by the loop path (also referred to as inner pole). For example, the loop path can be elliptical. Each magnetic pole can have a plurality of sequentially arranged magnets (then also referred to as a row of magnets or magnet row), each of which is magnetized or has a magnetization. For example, each magnetic pole can have at least 10 (e.g. at least 100) magnets per meter. For example, two or more magnet rows arranged between end pieces of the magnet system can substantially provide an intermediate area of the magnet system (intuitively, a row of inner poles, one magnet row on each side of the inner poles, outer poles). Typically, the outer poles and the inner poles can have a certain spacing from each other and / or differ from each other in their magnetization direction and / or their number of magnets.

[0026] The magnet system, for example its magnetic bar, can optionally have a plurality of sequentially arranged and / or spatially separated (e.g. multipolar) segments (also referred to as magnet system or magnet system group), two of which (also referred to as reversal segments or end pieces) are arranged at the end sides of the magnet system (intuitively at the ends of the magnet system), and one or more optional segments (also referred to as intermediate pieces) are arranged between the end pieces. Therein, exemplary reference is made to a magnet system having a plurality of magnet system groups, wherein the content of the description in this regard can also apply to a magnet system without segmentation, or the description with regard to a magnet system group can similarly apply to a plurality of magnet system groups, and vice versa.

[0027] According to various embodiments, the term "spring-elastic" can be understood with reference to an object which can be deformed against a restoring force (also referred to as flexible). The deformability can be provided in that the spring-elastic object has or is made of an elastic material, for example has or is made of an elastomer. Alternatively or additionally, the deformability, for example the stretchability, can be provided in that the spring-elastic object has or is made of a material with a high strength, for example a bending strength, for example spring steel. The deformability, for example the stretchability, indicates the ability of the object to be deformed against a restoring force from an initial state, for example an initial shape, in the case of a mechanical load, to return to the initial state, for example without damage, in the case of the disappearance of the load. Using the initial state x, for example the extension x, the deformation Δx, for example the change in extension Δx, in relation to the initial state, for example the initial shape, the proportion ε, i.e. ε = Δx / x, also indicates the relative deformability (in relation to the extension, also referred to as elongation). According to various embodiments, the spring-elastic object, for example the gas guide structure, can be designed for a relative deformability of more than about 10%, for example about 25%, for example about 50%, for example about 75%.

[0028] In the following, the function and structure of the magnet system and the sputter device are first explained in order to simplify the understanding of the provided magnetron target coupler.

[0029] It is proposed here a communication interface which is designed for length compensation, for example in that the communication interface has two communication electrodes which are electrically coupled to one another, the spacing of the communication electrodes from one another being variably designed, for example by means of a linear bearing, such that the communication electrodes can perform an axial relative movement to one another. This configuration is useful when the bearing electrodes are rigidly coupled to the bearing frame, although this is not necessarily necessary. Alternatively or additionally, the spacing between the bearing electrodes and the bearing frame can be variably designed, for example by means of a linear bearing, for example such that the bearing electrodes and the bearing frame can perform an axial relative movement to one another. The two communication electrodes of the communication interface which are electrically coupled to one another can then, but not necessarily must, be rigidly coupled to one another.

[0030] It can thus be understood that the description herein with respect to the relative movement of the two communication electrodes which are electrically coupled to one another can similarly apply to the bearing electrodes. More generally, the communication electrodes, which directly oppose the bearing electrodes, and / or the bearing electrodes are supported such that the spacing of the bearing electrodes from one another changes by less than the path when the magnetron target coupler is displaced by a path with respect to the bearing frame. In a similar manner, length compensation can be implemented at the target end which opposes the communication interface, for example when an axial relative movement between the four electrodes is not feasible.

[0031] Figure 1A magnet system 100 according to various embodiments is illustrated in schematic detail, e.g. shown in a view along a direction 101 (also referred to as reference direction 101) in which the magnet system 100 extends longitudinally. For example, the magnet system can have a length (extension along the reference direction 101) of more than about 0.5 m (meter) and / or less than about 6 m, e.g. in a range of about 2 m to about 5 m, and / or more than 3 m.

[0032] The magnet system 100 can have a plurality of magnets 104 and a carrying mechanism 160 designed for carrying the magnets 104 of the magnet system 100. The carrying mechanism 160 can have at least one (i.e. one or more than one) carrier 102, 202 (also referred to as magnet carrier), a first carrier 102 (also referred to as first magnet carrier or system carrier) of the magnet carriers being designed for carrying one or more than one magnet system group 150 (e.g. its magnets 104) of the magnet system 100.

[0033] The magnet system 100 can have, for example, one or more than one magnet system group 150 per system carrier 102, e.g. a plurality of magnet system groups 150 per system carrier 102. Each magnet system group 150 can have a plurality (e.g. three or more) of magnets 104 and can optionally be designed in an adjustable manner. At least two magnets 104 of each magnet system group 150 can differ from each other in their magnetization direction.

[0034] Each magnet system group 150 designed in an adjustable manner can have an adjustment device 150s, e.g. (e.g. partially) arranged between and / or coupling the system carrier 102 and / or the magnets 104 of the magnet system group 150 to each other. The adjustment device 150s can be designed for changing the spatial distribution of the magnetic field 120 generated by the magnet system group 150, e.g. by changing the spatial distribution (e.g. position and / or alignment) of the magnet(s) 104 of the magnet system group 150. For example, the adjustment device 150s can be a component of the carrying mechanism 160 and can be designed for changing the spatial position and / or alignment of at least one magnet of the magnet system 100.

[0035] An exemplary component of the adjustment device 150s has a support device 116 (also referred to as group support device) and / or an actuator 106. The adjustment device 150s (e.g. its group support device 116 and / or actuator 106) can couple the magnet 104 or each magnet 104 of the magnet system group 150 to the system carrier 102. The group support device 116 can provide one or more translational degrees of freedom 111 for the magnet 104, wherein a first translational degree of freedom 111 can be along the reference direction 101 and / or one or more than one second translational degree of freedom 111 can be transverse to the reference direction 101.

[0036] Furthermore, the carrier mechanism 160, e.g. of each magnet system group 150, can have a second carrier 202 (also referred to as second magnet carrier or group carrier) which couples a plurality of magnets 104 (see also Figure 2 ) to each other and / or to the adjustment device 150s. In this case, the group or each group carrier 202 can be magnetic (thus providing a so-called return carrier), and the system carrier 102 can be non-magnetic.

[0037] The actuator 106 can be designed for mechanically moving the magnet 104 (also referred to as actuation process) according to one or more translational degrees of freedom 111. To this end, the actuator 106 can be coupled with the magnet 104 and / or the system carrier 102, such that upon adjustment of the actuator 106, the orientation (i.e. alignment and / or position) of the magnet 104 relative to the system carrier 102 can be changed, e.g. according to a target state.

[0038] To generate the movement, the actuator 106 can have an electromechanical converter (e.g. an electric motor or a piezoelectric actuator). The electromechanical converter can be designed for generating a translational movement (e.g. in the case of a linear electric motor) or for generating a rotational movement (e.g. in the case of a rotary electric motor). To transmit the movement to the magnet 104, the actuator 106 can optionally have a gear (also referred to as actuator gear).

[0039] To provide the actuator 106 with electric power (also referred to as supply power) and / or to deliver communication signals to the actuator 106, the actuator 106 can be coupled with one or more electric lines 108. In principle, the communication signals and the supply power can be delivered together via the lines 108, but this is not mandatory. These communication signals and the supply power can also be delivered via lines 108 separate from each other.

[0040] Figure 2 A magnet system 100 according to various embodiments 200 is shown in a schematic perspective view, wherein the magnet system 100 has a plurality of spatially separated magnet rows 204a, 204i which are fixed on a common group carrier 202 (e.g. magnetically coupled therewith). Each magnet row 204a, 204i can have a plurality of magnet rows arranged in succession with the same magnetization direction. At least the intermediate magnet row 204i, which is arranged between two magnets of the outer magnet rows 204a, can extend longitudinally along the reference direction 101.

[0041] Figure 3A A sputter device 300 according to various embodiments is shown in a schematic side view or cross-sectional view, and Figure 3B A magnet system 100 of the sputter device 300 is shown in a schematic detail view 300b.

[0042] The sputter device 300 can have a support device 350 (also referred to as target support device) for rotatably supporting the tubular target 302 (also referred to as tubular target). The target support device 350 can have one or more end blocks 312a, 312b, wherein the tubular target 302 is rotatably supported, e.g. rotatable about a rotation axis 311, by means of the end blocks 312a, 312b and / or can be supplied by means of the end blocks. To this end, the target support device 350, e.g. each end block 312a, 312b, can have one or more corresponding rotary bearings 950 (see also Figure 9 ).

[0043] The target support device 350 can have one rotary bearing 950 per end block 312a, 312b, e.g. one magnetron target coupler 301 coupled with the rotary bearing 950. The magnetron target coupler 301 is designed to hold the target 302 and the magnet system 100 such that the target 302 can be rotated about the magnet system 100. For example, the magnetron target coupler 301 can have a target interface flange 702 (see Figure 7 ) rotatably supported by means of the rotary bearing 950 and the tubular target 302 can be coupled with the target interface flange. The rotation axis 311 can be along the reference direction 101 or can be along an axis of the magnetron target coupler 301.

[0044] The first end block 312a of the target support device 350 can be designed as a drive end block 312a, i.e. having a drive train 302a for rotating the tubular target 302. The second end block 312b or the first end block 312a of the target support device 350 can be designed as a media end block 312b, i.e. for conveying and conducting out a cooling fluid, e.g. with water, and / or for supplying the tubular cathode 302 with electrical power. The cooling fluid can be guided through the tubular target 302.

[0045] The drive train 302a can be coupled with or have a drive device, e.g. a motor, arranged outside the drive end block 312a. Torque can be coupled into the tubular target 302 by means of the drive train 302a to drive a rotational movement of the tubular target 302.

[0046] Furthermore, the sputter device 300 can have a magnet system 100 held by means of the support device 350, e.g. positionally fixed and / or rotationally fixed with respect to the direction of gravity. For example, a fixed alignment with respect to the direction of gravity is maintained while the tubular target 302 is rotated (about the magnet system 100).

[0047] The support device 350 can have one rotatably supported target interface flange 702 (see Figure 7) by means of which the tubular target 302 can be coupled, for example to the drive train 302a and / or to a cooling fluid supply (for example with one or more fluid lines). For example, the target interface flange (see Figure 7 ) can be designed for detachable connection with the target 302, so that the tubular target 302 can be installed and removed. The target coupler 301, for example its target interface flange 702, can optionally be penetrated by a stationary support by means of which the magnet system 100 can be supported.

[0048] In the detail view 300b, two magnet system groups 150 are exemplarily shown, wherein each magnet system group has a group carrier 202; has a plurality of magnets 104, which are coupled to one another by means of the group carrier 202 (for example magnetically); and has an electric actuator 106, which is designed for adjusting the position of the group carrier 202 or of the magnets 104 relative to the system carrier 102 and / or relative to one another in response to an electrical communication signal delivered to the electric actuator 106. The actuator 106 has for example an electric motor 106m and optionally an adjusting gear 106g. The adjusting gear 106g can couple the motor 106m with the group carrier 202.

[0049] Optionally, the magnet system 100 can have a generator 308, which is designed for delivering electrical power (also referred to as supply power) or a supply voltage to each actuator 106. To this end, the line 108 can have one or more supply lines 108b, which couple the generator 308 with each actuator 106.

[0050] Furthermore, the magnetron target coupler 301 can have a communication interface 704, which electrically couples (for example galvanically decoupled and / or capacitively coupled) at least one of the end blocks 312a, 312b with the line 108, for example its communication line 108a. For example, the communication interface 704 of the communication line 108a can couple in a communication signal from the end block.

[0051] Figure 4A magnet system 100 according to various embodiments 400 is illustrated in a schematic side view or cross-sectional view, wherein the magnet system 100 has a (e.g. fluid-tight, e.g. vacuum-tight) chamber 406 (also referred to as system chamber 406) with a housing 406g, e.g. of a tube shape, and one or more than one cover 406d (also referred to as interface cover 406d or housing cover 406d). The or each cover 406d can be designed for closing (e.g. fluid-tight, e.g. vacuum-tight) in an end side (e.g. from or in a direction of the reference direction 101). Optionally, at least one housing cover 406d of the system chamber 406 can be designed for supplying (then also referred to as supply cover) the or each magnet system group 150 of the magnet system 100, e.g. with a communication signal and / or with power or voltage. To this end, the supply cover 406d can have, for example, a transmission stage 804, a generator 308, a communication electrode 406e and / or a rotational feedthrough, as described in more detail in Figure 6

[0052] Figure 5 A sputter device 300 according to various embodiments 500 is illustrated in a schematic interconnection diagram. Here, six actuators 106 of a magnet system 100 are schematically illustrated, wherein the number thereof can also be greater or less than six. Optionally, the sputter device 300 can have a control device 806 (e.g. for drive control), which generates a communication signal.

[0053] It is understood that a communication between the control device 806 and the actuators 106 of the magnet system 100 can take place by means of the communication signal, e.g. bidirectional (i.e. back and forth) or unidirectional (i.e. only from the control device 806 to the actuators 106). In other words, the communication signal can be a carrier of information transfer between the control device 806 and the actuators 106.

[0054] The communication signal can intuitively be an electrical signal by means of which information (also referred to as communication) can be transmitted, e.g. instructions or control data, measurement data, requests and / or responses. The communication by means of the communication signal can take place on a physical level by means of an exchange of electrical power. The communication on the physical level can take place by means of a physical transmitter. The communication by means of the communication signal can take place on a logical level by means of an exchange of information. The logical level of the communication can take place by means of a data processing, which can be implemented and / or operated by means of a processor and / or a program, for example. For example, the exchange of electrical power between the transmitters can be modulated in accordance with the information to be transmitted.

[0055] ​For example, the communication can be based on messages (i.e. message-based) in accordance with a communication protocol (e.g. a network protocol). For example, a fieldbus network protocol can be used as the communication protocol. For example, a USB bus network protocol (Universal Serial Bus - USB) can be used as the communication protocol. Of course, other communication protocols can be used, which can be proprietary, for example.

[0056] The information transmitted from the control device 806 to the actuator 106 can represent a target state that the actuator 106 should assume, for example. The information transmitted from the actuator 106 to the control device 806 can represent an actual state of the actuator 106 or a receipt confirmation, for example.

[0057] The communication line 108a can be coupled with the communication interface 704. The communication interface 704 can be designed for exchanging communication signals between the control device 806 and the one or more actuators 106. In other words, the communication interface 704 can be designed for forwarding communication signals. This can be done by means of optical coupling, inductive coupling and / or capacitive coupling, typically. These couplings enable a more reliable communication. Intuitively, the optical, inductive and / or capacitive forwarding of the communication signals can cause a galvanic isolation between the actuator 106 and the control device 806. This galvanic isolation suppresses electrical interference effects in the operation of the magnet system 100.

[0058] The communication interface 704 can be designed for non-contact communication (e.g. information transmission) between stationary and moving parts across multiple media spaces and at the same time for length compensation, which will be explained in more detail later.

[0059] Optionally, the communication interface 704 can be designed such that the one or more communication channels are interrupted (or broken) and established (i.e. closed) in the clock of the rotational movement of the tubular target, for example alternatingly. This causes a clocked communication (i.e. in the clock of the rotational movement) in accordance with the rotational movement of the target. This clocking enables a more reliable communication. Intuitively, therefore, interference effects resulting from the rotational movement of the tubular target 302 can be systematic, which simplifies their filtering out.

[0060] It can be understood that this clocked communication can be implemented on a physical level of the communication and / or on a logical level of the communication. For example, the ohmic, optical, inductive and / or capacitive coupling can be physically interrupted (i.e. broken) and re-established (i.e. closed) in the clock of the rotational movement of the tubular target, for example alternatingly. Alternatively or additionally, the logical communication (e.g. the sending and / or receiving of data or entire messages) can be clocked such that the logical communication is interrupted and re-established.

[0061] The generator 308 can be designed to generate a supply voltage in operation of the tube-shaped target 302, for example at a target rated rotational speed. The supply voltage can be applied at all actuators 106 or individually at the actuators 106 by means of a multiplexer, always only one of which is actuated. If one of the actuators 106 is actuated, the actuators 106 can accordingly receive electrical power from the generator 308, which is applied for adjusting the magnetic field.

[0062] The magnet system 100 can optionally have one or more sensors 816, which are designed to detect an actual state of a sputter process, for example a coating process, provided by means of the sputter device 300 and / or a magnetic field of the magnet system 100, also referred to as a process state. The control device 806 can be designed to actuate the actuators 106 on the basis of the process state. For example, the actuation of the actuators 106 can be carried out on the basis of a preset target state, such that, for example, a difference between the process state and the target state is reduced.

[0063] Various exemplary embodiments of the housing cover 406g are discussed below, which simplify the embodiments of the power process and / or the communication described herein.

[0064] Figure 6 A housing cover 406d of a magnet system 100 according to various embodiments 600 is illustrated in a schematic cross-sectional view. Generally, the housing cover 406d has a (one-piece or multi-piece) mechanical carrier as a base body 802, which carries components for electronic communication and for electrical power supply.

[0065] The components for electrical power supply have a transmission stage 804, a generator 308, and a rotational feedthrough 850 coupling the transmission stage 804, for example its generator wheel 708, with the generator 308. The components for electronic communication have a communication interface 704 and an electrical interface 862, which are coupled with each other, for example conductively.

[0066] In an exemplary embodiment of the base body 802, the base body can have a flange 802p and a (for example peg-shaped) support device 802v extending away from the flange 802p and / or being conductive. The support device 802v and the flange 802p can be coupled with each other, for example rigidly and / or conductively.

[0067] The base body 802, also referred to as a cover base body, is arranged at least partially, for example at least its flange 802p, between the transmission stage 804 and the generator 308. The rotational feedthrough 850 allows an exchange of rotational motion through a through opening of the base body 802, for example its flange 802p.

[0068] In the exemplary embodiment of the electrical interface 862, the electrical interface can have one or more interface terminals and / or be coupled with one or more electrical communication lines 108a. Alternatively or additionally, the electrical interface 862 can be electrically coupled, preferably ohmically coupled, with the cover electrode 406e, for example by means of the base body 802, e.g. its flange 802p and / or its support device 802v.

[0069] The drive-side transmission wheel 718 can be supported at the base body 802, e.g. at its support device 802v, by means of a rotational bearing 851. Alternatively or additionally, the rotational feedthrough 850 can have a shaft 850w which is supported at the base body 802, e.g. at its flange 802p, by means of a rotational bearing 851.

[0070] If the transmission stage is internally toothed, its drive-side transmission wheel 718 has an inner ring gear 718 (see also Figure 12 ). The inner ring gear 718 intuitively provides a recess in which the generator wheel 708 can be arranged. This saves space.

[0071] The provided magnetron target coupler 301 is explained in the following and with reference to exemplary embodiments thereof. It is understood that the magnetron target coupler 301 can also be provided as a single component, e.g. detached from the support device 350 and / or the magnet system 100.

[0072] Figure 7 A magnetron target coupler 301 according to various embodiments 700 is shown in a schematic cross-sectional view.

[0073] The magnetron target coupler 301 has a flange 702 (also referred to as target interface flange 702) and a communication interface 704. The communication interface 704 has a first electrode 704a (also referred to as first communication electrode 704a) and a second electrode 704b (also referred to as second communication electrode 704b), which are electrically coupled with each other, e.g. by means of the electrical lines 710 of the communication interface 704 and / or ohmically coupled.

[0074] The target coupler flange 702 can be penetrated, e.g. along the axis 808a of the shaft, by a through opening 702o through which the electrical lines 710 extend. For example, a seal 702d, e.g. an O-ring seal, can be arranged in the through opening 702o, which abuts against the target coupler flange 702 and the electrical lines 710.

[0075] In the exemplary embodiment or in an alternative exemplary embodiment thereof, the or each communication electrode 704a, 704b, e.g. composed of an electrically conductive material, e.g. of a metal, is disk-shaped and / or plate-shaped or used as a plate electrode, e.g. as a capacitor plate, for capacitive communication. For example, the first communication electrode 704a and / or the second communication electrode 704b can have or be composed of a disk, a ring or a section thereof.

[0076] In the exemplary embodiment or in an alternative exemplary embodiment thereof, the or each communication electrode 704a, 704b, e.g. composed of an electrically conductive material, e.g. of a metal, is disk-shaped and / or plate-shaped or used as a plate electrode, e.g. as a capacitor plate, for capacitive communication. For example, the first communication electrode 704a and / or the second communication electrode 704b can have or be composed of a disk, a ring or a section thereof.

[0077] The magnetron target coupling 301 further has a shaft 808 rigidly coupled with the target coupling flange 702.

[0078] The shaft 808 can extend along a shaft axis 808a of the shaft, e.g. through the first communication electrode 704a. The shaft 808 has a first linear bearing part 8081, e.g. a ring, on a side opposite to the target coupling flange 702. Figure 9 The first linear bearing part 8081 can be designed to be spliced together with a second linear bearing part 8181 (see Fig. 8) to form a linear bearing 918, also referred to as a shaft accommodating bearing, e.g. a rotatably supported linear bearing.

[0079] The first communication electrode 704a can be arranged between the linear bearing part 8081 and the target coupling flange 702.

[0080] The second communication electrode 704b can be rigidly mounted at the target coupling flange 702 and / or the shaft 808, e.g. at least partially sunk into the target coupling flange 702 or at least arranged in a recess of the target coupling flange 702, e.g. on a side of the target coupling flange 702 opposite to the shaft. This increases compactness of the assembly.

[0081] According to various embodiments, the first communication electrode 704a is carried by means of a bearing device 714, also referred to as an electrode bearing device 714. The electrode bearing device 714 can have at least one linear bearing providing at least one translational degree of freedom for the first communication electrode 704a, e.g. with respect to the second communication electrode, the shaft 808 and / or the target coupling flange 702. The translational degree of freedom 714t can for example be along a shaft axis 808a of the shaft 808 or a reference direction 101.

[0082] Intuitively, the translational degree of freedom 714t enables that the (e.g. rotatably supported) communication electrode 704a can be axially displaced to compensate for tolerances and thermal expansion. This reduces disturbances in communication with the magnet system 100.

[0083] For example, the electrode support device 714 can be designed such that the first communication electrode 704a can be displaced towards and / or away from the second communication electrode or target coupler flange 702, e.g. along an axis of the shaft 808. Alternatively or additionally, the first communication electrode 704a is supported such that it can be displaced relative to the shaft 808.

[0084] The target coupler flange 702 can optionally have a sealing face 706 facing away from the first communication electrode 704a. The sealing face 706 (e.g. having a groove for accommodating a seal) can for example abut an elastomer seal, e.g. accommodated in the groove. For example, the second communication electrode 704b can be surrounded by the sealing face 706.

[0085] Additional exemplary embodiments of components of the magnetron target coupler 301 are discussed below.

[0086] In exemplary embodiments of the electrical line 710, the electrical line can have or be formed by a metal consisting of one or more than one pin 710s (also referred to as contact pin) and a socket 710b (also referred to as contact socket) in which the contact pin 710s is accommodated. The pin can for example be displaceably supported relative to the first communication electrode 704a by means of a linear bearing and / or be rigidly designed. This avoids additional cables.

[0087] In exemplary embodiments of the electrode support device 714, the electrode support device can have a spring-elastic element 714f (e.g. a spring) coupling the first communication electrode 704a and the second communication electrode 704b to each other. If the spring-elastic element 714f is deformed (e.g. stretched and / or compressed), it can generate a restoring force in the opposite direction of the deformation. The harder the elastic element 714f, i.e. the larger its spring constant, the larger the restoring force (measured at constant deformation) can be.

[0088] According to various embodiments, the spring-elastic element 714f can have or be formed by an elastic material, e.g. a plastic, e.g. an elastomer, a polymer or a copolymer, e.g. a rubber, a silicone, a silicone rubber, a fluorinated silicone rubber, a natural rubber or another suitable (e.g. soft and / or vacuum-compatible) plastic. For example, the polymer or copolymer can have silicon. According to various other embodiments, the elastic material can be metallic, e.g. a steel (e.g. spring steel) or another metal, a metal alloy or an intermetallic compound.

[0089] In an exemplary embodiment of the spring-elastic element 714f, it can have a plurality of turns, for example in the form of a helical spring or a volute spring (see also below Figure 8 ). This is less complex and inexpensive. More generally, the spring-elastic element 714f can have one or more springs, for example metal springs and / or plastic springs, for example in the form of a disc spring, a helical torsion spring, a torsion spring, a leaf spring or other spring forms.

[0090] The restoring force provided by means of the spring-elastic element 710s can overcome a movement (translation) of the first communication electrode 704a out of an initial position and / or along the translational degree of freedom 714t. In the initial position, the restoring force can be zero, or the first communication electrode 704a can be pressed against a stop by the restoring force.

[0091] In an exemplary embodiment of the spring-elastic element 710f, the spring-elastic element can be pre-tensioned. The restoring force can then be designed to press the first communication electrode 704a against a stop. The stop can be fixed at the shaft 808 and / or can be part of the encapsulation of the first communication electrode 704a, for example.

[0092] In an exemplary embodiment of the linear bearing part 8081, the linear bearing part provides a first path section 808t along which the shaft 808 can be displaced. To this end, the linear bearing part 8081 can have an extension along the shaft axis 808a which is equal to or greater than the first path section 808t. The first path section 808t can be about 1 centimeter (cm) or more, for example about 2 cm or more, for example about 4 cm or more, for example about 5 cm or more, for example.

[0093] In this exemplary embodiment or an alternative exemplary embodiment of the linear bearing part 8081, the linear bearing part has a torque strut. The torque strut can be designed to suppress a rotation of the linear bearing part 8081, for example when the linear bearing part 8081 provides a shaft receiving bearing. The torque strut can be implemented by means of a profiled circumferential surface of the linear bearing part 8081, for example. An example thereof has one or more grooves as torque strut and / or one or more teeth as torque strut which extend longitudinally along the shaft axis 808a, for example for the first path section 808t or more. For example, the linear bearing part 8081 can have a ring, for example a toothed ring, as torque strut which has an extension along the shaft axis 808a which corresponds approximately to the first path section 808t or more, for example up to the target coupler flange 702.

[0094] In the exemplary embodiment of the electrode support device 714, the electrode support device can provide the first communication electrode 704a with a second travel section 714t, which the first communication electrode 704a can displace (e.g., along the translational degree of freedom 714t) by (e.g., relative to the shaft 808) the second travel section. The second travel section 714t can be at least 10% of the first travel section 808t, such as at least 25% of the first travel section 808t, such as at least 50% of the first travel section 808t, such as at least 75% of the first travel section 808t, such as at least 90% of the first travel section 808t. For example, the second travel section 714t and the first travel section 808t can be identical. This improves the operation of the magnetron target coupler 301.

[0095] In the exemplary embodiment of the communication interface 704, the communication interface is separated from the target coupler flange 702 and / or the shaft 808, such as galvanically separated and / or separated by means of a dielectric. This improves the signal transmission.

[0096] In this exemplary embodiment or an alternative exemplary embodiment of the communication interface 704, the first communication electrode 704a and / or the second communication electrode 704b is encapsulated, such as by means of a dielectric. This improves the galvanic separation and / or its service life.

[0097] Figure 8 A communication assembly 800 according to various embodiments is shown in a schematic cross-sectional view with a magnetron target coupler 301 and a housing cover 406d mounted thereat, such as as part of a sputter device 300.

[0098] The shaft 808 can be rotatably supported or have a shaft axis 808a, which the shaft is rotatably supported around. Alternatively or additionally, the target coupler flange 702 can be rotatably supported relative to the housing cover 406d, such as its cover electrode 406e. To this end, the magnetron target coupler 301 can have a mounting structure 814, such as a mounting structure extending along the shaft axis 808a and / or provided in the shaft 808, which is rotatably supported relative to the shaft 808 and / or supported by the shaft 808.

[0099] The mounting structure 814 can be designed to match the housing cover 406d, such that the housing cover can be fixed at the mounting structure 814, such as at its base body 802, such as at its support device 802v.

[0100] According to various embodiments, the cover 406d can have a fourth communication electrode 406e, also referred to as a cover electrode, which is coupled, such as ohmically coupled, to the actuator 106 of the magnet system 100.

[0101] For example, the cover electrode 406e can be disposed proximate the second communication electrode 704b, e.g., directly opposite and / or at a distance spacing 903 (also referred to as a second electrode-to-electrode spacing) from the second communication electrode. The second electrode-to-electrode spacing 903 may, for example, be approximately equal to the first electrode-to-electrode spacing 903. The second electrode-to-electrode spacing 903 may, alternatively or additionally, be less than about 1 cm, e.g., less than about 0.5 centimeters, e.g., less than about 0.25 centimeters. This improves communication.

[0102] The cover electrode 406e and the second communication electrode 704b can be capacitively coupled to one another such that they enable a communication path between the control device 806 and the magnet system 100, e.g., its actuator 106.

[0103] According to various embodiments, the cover electrode 406e and / or the support electrode 904 can be fixedly supported in position. The communication interface 704, e.g., its first communication electrode 704a and / or its second communication electrode 704b, can be rotatably supported relative thereto, e.g., about an axis 808a of the shaft and / or concentrically with the support electrode 904.

[0104] The first communication electrode 704a can have a spacing 961 (also referred to as an electrode-to-flange spacing) from the target coupler flange 702. The electrode-to-flange spacing can be greater than the first electrode-to-electrode spacing 901 and / or greater than the second electrode-to-electrode spacing 903, e.g., a sum thereof. The electrode-to-flange spacing can be greater than the first leg 714t. Intuitively, the electrode-to-flange spacing can serve to provide free space for displacement of the first communication electrode 704a. The space of the electrode-to-flange spacing 961 intuitively serves as a free space for tolerance and length expansion.

[0105] Figure 9 The support device 350 according to various embodiments 900 is illustrated in a schematic cross-sectional view, e.g., in a manner to view the end block 312a, in which the support device 350, e.g., its end block 312, has a frame 912 (also referred to as a support frame 912). For example, the frame 912 can have or consist of an end block housing. Further, the support device 350 has the magnetron target coupler 301, which is only partially shown.

[0106] The support device 350, e.g. its end block 312a, has a hinge 952 carried by means of a support frame 912, which has a rotational support 950 and a second linear support part 8181 rotatably supportable by means of the rotational support 950. The second linear support part 8181 can be designed for being spliced together with the first linear support part 8081, e.g. plugged into each other, to form a shaft accommodating support 918, such that the shaft accommodating support 918 is a rotatably supportable linear support. The shaft accommodating support 918 can be rotatably supportable by means of the rotational support 950 around the axis of the shaft 808a. The shaft accommodating support 918 can provide the shaft 808 with a translational degree of freedom along the first path section 808t.

[0107] Further, the support device 350 can have a support electrode 904, also referred to as third communication electrode 904, which is rigidly coupled with the frame 912, e.g. mounted thereat, e.g. at least partially sunk into the frame 912, or at least arranged in a recess of the frame 912. This increases the compactness of the assembly.

[0108] For example, the support electrode 904 can be arranged in the vicinity of the first communication electrode 704a, e.g. directly opposite and / or at a distance 901, also referred to as first electrode-electrode distance, from the first communication electrode. The first electrode-electrode distance 901 may, for example, be smaller than the first path section 808t and / or the second path section 714t, also referred to as adjustment path 714t. The first electrode-electrode distance 901 may, for example, be less than about 1 cm, e.g. less than about 0.5 cm, e.g. less than about 0.25 cm. This improves the communication.

[0109] For example, the first electrode-electrode distance 901 can be constant with respect to the first communication electrode 704a along the axis of the shaft 808a and / or according to the displacement of the translational degree of freedom, which improves the communication. This may, for example, be achieved by means of a stop 962, which is described in more detail later.

[0110] The support electrode 904 and the first communication electrode 704a can be capacitively coupled with each other, such that the first communication electrode and the support electrode enable a communication path between the control device 806 and the magnet system 100, e.g. its actuator 106.

[0111] The support electrode 904 can be designed electrically isolated from the communication electrode 704a and / or from the frame 912. For example, the support electrode 904 can be encapsulated, e.g. dielectrically encapsulated, e.g. by means of a dielectric encapsulation. This improves the electrical isolation and / or its service life.

[0112] Figure 10A sputter device 300 according to various embodiments 1000 is illustrated in schematic detail, wherein the sputter device has multiple cavities separated from each other.

[0113] The frame 912 can have a first cavity 10A which in operation has a first (e.g. atmospheric) pressure A. A second cavity 10B can be provided between the first communication electrode 704a and the second communication electrode 704 and in operation has a vacuum (e.g. pressure B).

[0114] The pressure B can be lower than the pressure A and / or lower than 0.3 mbar, e.g. in a range from about 10 mbar to about 1 mbar (then also referred to as coarse vacuum) or less, e.g. in a range from about 1 mbar to about 10 -3 mbar (then also referred to as fine vacuum range) or less, e.g. in a range from about 10 -3 mbar to about 10 -7 mbar (then also referred to as high vacuum range) or less.

[0115] A third cavity 10C which in operation has a cooling fluid and / or a pressure C can be provided within the target 302, e.g. between the target and the magnet system 100 and / or between the second communication electrode 704b and the cover electrode 406e. For example, the pressure C can be greater than the pressure A.

[0116] A fourth cavity 10D which in operation has a fourth (e.g. atmospheric) pressure D can be provided within the magnet system 100, e.g. in the interior of the housing 406d (also referred to as housing interior space). Optionally, the fourth (e.g. atmospheric) pressure D and the first pressure A can be different from each other, i.e. they do not necessarily have to be the same.

[0117] According to various embodiments, the support device 350 (e.g. an end block thereof) can have a seal separating the first cavity 10A from the second cavity 10B. Alternatively or additionally, the magnetron target coupler 301 (e.g. a target coupler flange 702 thereof) can have a target seal 702d separating the second cavity 10B from the third cavity 10C. Alternatively or additionally, the magnet system 100 (e.g. a cover 406d thereof) can have a seal separating the third cavity 10C from the fourth cavity 10D.

[0118] A communication path between the control device 806 and the magnet system 100 (e.g. to an actuator 106 thereof) can stretch through the first cavity 10A, the second cavity 10B, the third cavity 10C and / or the fourth cavity 10D, e.g. from atmosphere to vacuum to water to atmosphere.

[0119] In the exemplary embodiment of the target coupler flange 702, the target coupler flange can be multi-piece, e.g. with a first flange part 702a (e.g. with an aperture) and a second flange part 702b, between which an annular gap is formed. The target can be accommodated (e.g. clamped) in the annular gap, e.g. held in a force-fit and / or form-fit manner. For example, the two flange parts 702a, 702b can form a clamping device (also referred to as a target clamp) for clamping the target 302 in a manner that fits together. Furthermore, an additional target seal 712d can be applied against the sealing surface 706, e.g. arranged in the annular gap and / or between the two flange parts 702a, 702b.

[0120] The second linear bearing part 8181 can have a fifth cavity 808h in which the first linear bearing part 8081 is accommodated.

[0121] Figure 11 The support device 350 according to various embodiments 1100 is shown in a schematic detail view (in a manner that the bearing electrode 904 is observed), in which the bearing electrode 904 is designed annularly and / or disc-shaped, e.g. in the form of a ring.

[0122] Figure 12 The magnetron target coupler 301 according to various embodiments 1200 is shown in a schematic perspective view (in a manner that the first communication electrode 704a is observed), in which the first communication electrode 704a is designed in a segmented and / or disc-shaped manner, e.g. in the form of a ring segment. Optionally, the first communication electrode 704a can be embedded in a dielectric.

[0123] Figure 13 The communication assembly 1300 according to various embodiments is shown in a schematic cutaway perspective view, with the magnetron target coupler 301, the housing cover 406d and the bearing electrode 904, e.g. as part of a sputter device 300.

[0124] In exemplary embodiments, one or more (e.g. each) of the communication electrodes 704a, 704b, 904, 406d is designed such that it forms a circular surface element around the axis of the shaft 808a and is a full or partial surface of a ring (see also Figure 11 and Figure 12 ). Alternatively or additionally, each communication electrode 704a, 704b, 904 is electrically isolated from the component of the flange or frame 912 with which it is in abutment.

[0125] The rotating second communication electrode 704b provides an electrical (e.g. capacitive) coupling by means of which the axially displaceable first communication electrode 704a is electrically coupled with the magnet system 100, e.g. with its cover electrode 406e, wherein the electrical coupling is electrically insulated from the cooling fluid (e.g. water) and / or bridges the cooling fluid (e.g. contactlessly). The electrical coupling between them can be designed in a sealed manner, e.g. sealed between vacuum and water.

[0126] The electrical interface 862 of the cover 406d, which is electrically coupled with the cover electrode 406e, is electrically coupled with one or more actuators 106 of the magnet system 100, e.g. by means of the supply line 108b. The electrical coupling between the electrical interface 862 and the cover electrode 406e can be designed in a sealed manner, e.g. sealed between the cooling fluid and the atmosphere.

[0127] The means which is coupled on the target side to the target coupling flange 702 can have tolerances and assembly tensions. The axially displaceable bearing of the first communication electrode 704a enables a better compensation of the tolerances and thermal expansions. This reduces disturbances of the communication with the magnet system 100.

[0128] The first communication electrode 704a can be pressed against the optional stop 962 by means of a provided restoring force or by means of a spring-elastic element 714f (e.g. with one or more springs). This improves the stability of the first electrode-electrode gap 901.

[0129] According to various embodiments, the first communication electrode 704a and the second communication electrode 704b are electrically coupled with each other. The electrical coupling between the first and the second communication electrode can be designed such that the first and the second communication electrode can be held in any orientation of the first communication electrode 704a and the second communication electrode 704b relative to each other. This reduces disturbances of the communication with the magnet system 100. The electrical coupling between them can also be designed in a sealed manner such that the first and the second communication electrode seal the second cavity 10B against the third cavity 10C and / or exchange communication signals between the second cavity 10B and the third cavity 10C. The electrical coupling between the first and the second communication electrode can in one advantageous embodiment be provided by means of the contact socket 710b and the contact pin 710s.

[0130] For example, the contact pin 710s can be moved into or out of the contact socket 710b. Alternatively, also an electrically conductive spring-elastic element can be arranged in the contact socket 710b, which presses against the contact pin 710s with its restoring force. This improves the electrical contact between the contact pin 710s and the contact socket 710b. Alternatively or additionally, the contact pin 710s can have a sliding surface against which the contact pin can lie in a planar manner against the contact socket 710b.

[0131] For example, the contact pin 710s and the contact socket 710b can be electrically separated from the target coupler flange 702.

[0132] Optionally, a target seal 702d can be provided between the contact pin 710s and the target coupler flange 702.

[0133] The outer two communication electrodes (the support electrode 904 and the lid electrode 406e) can each be electrically coupled with an electrical interface 862. For example, a first electrical interface 862 can be electrically coupled, preferably ohmically coupled, with the lid electrode 406e, for example by means of the base body 802, e.g. its flange 802p and / or its support device 802v. For example, a second electrical interface 872 (see Figure 9 ) is electrically coupled, preferably ohmically coupled, with the support electrode 904.

[0134] Various examples are described below with respect to the foregoing description and the illustrations shown in the drawings.

[0135] Example 1 is a magnetron target coupler comprising: a target coupler flange (e.g. for coupling a target, e.g. a tubular target); a shaft rigidly coupled (e.g. at an end side) with the target coupler flange (e.g. extending along an axis of the shaft away from the target coupler flange and / or towards an end block side) and having a first linear support member (e.g. a ring) on a side opposite to the target coupler flange or at an end section facing away from the target coupler flange; a communication interface having a first communication electrode (e.g. a left inner disc) and a second communication electrode (e.g. a right inner disc), the first communication electrode being preferably provided between the first linear support member and the target coupler flange, the second communication electrode and the first communication electrode being electrically coupled (ohmically coupled) with each other; wherein the second communication electrode is rigidly coupled (e.g. fixed at) at the target coupler flange (e.g. on a side facing away from the shaft or at least its linear support member), wherein the target coupler flange is provided between the first communication electrode and the second communication electrode; wherein the first communication electrode is preferably supported (e.g. by means of a linear support) in such a way (e.g. movably with respect to the shaft and / or rotationally resistant with respect to the shaft) that the first electrode can be displaced towards and / or away from the second communication electrode (e.g. along an axis of the shaft), or is rigidly coupled with the shaft and / or with the second communication electrode.

[0136] Example 2 is the magnetron target coupler according to example 1, wherein the first communication electrode and / or the second communication electrode has a plate and / or is encapsulated.

[0137] Example 3 is the magnetron target coupler according to example 1 or 2, further comprising: a spring elastic element (e.g. having one or more than one spring) coupling the first communication electrode and the second communication electrode with each other in such a way that the first communication electrode can be displaced towards the second communication electrode against a restoring force of the spring elastic element.

[0138] Example 4 is the magnetron target coupler according to one of the examples 1 to 3, further comprising a mechanical stop limiting a section from which the first and second communication electrodes can move away from each other; wherein the stop is preferably rigidly coupled with the shaft or the first communication electrode; and / or wherein the spring elastic element preferably presses the first communication electrode against the stop or the stop against the support device.

[0139] Example 5 is the magnetron target coupler according to one of the examples 1 to 4, wherein the section along which the first communication electrode can be displaced towards the second communication electrode (e.g. along the axis of the shaft) is greater than or equal to 50% of the extension of the linear support member parallel to this section.

[0140] Example 6 is the magnetron target coupler according to one of the examples 1 to 5, wherein the linear support member has a torque strut.

[0141] Example 7 is the magnetron target coupler of example 6, wherein the torque strut extends longitudinally towards the target coupler flange and / or has a gear ring (e.g. an outer gear ring).

[0142] Example 8 is the magnetron target coupler according to one of the examples 1 to 7, wherein the first communication electrode has a cut-out (e.g. a through opening) through which the shaft extends.

[0143] Example 9 is the magnetron target coupler according to one of the examples 1 to 8, further comprising a linear support by means of which the first communication electrode is displaceably supported.

[0144] Example 10 is the magnetron target coupler according to one of the examples 1 to 9, wherein the flange has one or more than one seal preferably surrounding the second communication electrode.

[0145] Example 11 is the magnetron target coupler according to one of the examples 1 to 10, wherein the first communication electrode is arranged between the first linear support member and the target coupler flange.

[0146] Example 12 is the magnetron target coupler according to one of the examples 1 to 11, wherein the communication interface is electrically isolated from the target coupler flange and / or the shaft.

[0147] Example 13 is the magnetron target coupler according to one of the examples 1 to 12, wherein the first communication electrode or the packaging of the first communication electrode has a through opening through which the shaft extends.

[0148] Example 14 is the magnetron target coupler according to one of the examples 1 to 13, wherein the second communication electrode has a through opening exposing a mounting structure (preferably for mounting a magnet system) which is preferably rotatably supported with respect to the shaft.

[0149] Example 15 is the magnetron target coupler according to one of the examples 1 to 14, wherein the first communication electrode and / or the second communication electrode has and / or consists of a condenser plate and / or a pole electrode.

[0150] Example 16 is the magnetron target coupler according to one of the examples 1 to 15, wherein the target coupler flange is multi-piece, for example designed such that the target coupler flange provides the annular gap for accommodating the target in a way that the target coupler flange is put together.

[0151] Example 17 is a support device comprising: a frame; a magnetron target coupler according to any one of the examples 1 to 16; a rotary support member and a second linear support member part carried by means of the frame, the second linear support member part being rotatably supported by means of the rotary support member and being designed for forming a linear support in a way that the first linear support member part of the magnetron target coupler is put together, such that the magnetron target coupler is provided with a translational degree of freedom along an axis of rotation of the rotary support member or along an axis of the shaft; a third communication electrode, the third communication electrode being arranged such that, when the linear support is formed, the third communication electrode is directed towards the first communication electrode of the magnetron target coupler (for example, capacitively coupled therewith and / or electrically isolated therefrom); wherein the third communication electrode is preferably rigidly coupled with the frame (for example, when preferably supporting the first communication electrode such that the first communication electrode can be displaced towards and / or away from the second communication electrode) or is supported (for example, by means of the linear support) such that the third communication electrode can be displaced towards and / or away from the frame (for example, when the first communication electrode is rigidly coupled with the shaft and / or with the second communication electrode).

[0152] Example 18 is a support device (e.g. according to example 17), comprising: a frame; a magnetron target coupling (e.g. according to one of examples 1 to 16); the magnetron target coupling having: a target coupling flange (e.g. for coupling a target, e.g. a tube-shaped target); a shaft, which is rigidly coupled (e.g. at an end side) with the target coupling flange (e.g. extends along a shaft axis away from the target coupling flange and / or towards an end block side) and has a first linear bearing part (e.g. a race) on a side opposite to the target coupling flange or at an end section facing away from the target coupling flange; a communication interface, having a first communication electrode (e.g. a left inner disk) and a second communication electrode (e.g. a right inner disk), the first communication electrode is preferably arranged between the first linear bearing part and the target coupling flange, the second communication electrode and the first communication electrode are electrically coupled (ohmically coupled) to each other; wherein preferably the second communication electrode is rigidly coupled (e.g. fixed) at the target coupling flange (e.g. on a side facing away from the shaft or at least its linear bearing part), wherein preferably the target coupling flange is arranged between the first communication electrode and the second communication electrode; the support device further comprising: a rotary bearing and a second linear bearing part carried by means of the frame, the second linear bearing part is rotatably supported by means of the rotary bearing and is designed for forming a linear bearing with the first linear bearing part of the magnetron target coupling in a manner that the magnetron target coupling is provided with a translational degree of freedom along a rotary axis of the rotary bearing or along an axis of the shaft; a third communication electrode, which is arranged such that the third communication electrode is directed towards the first communication electrode of the magnetron target coupling (e.g. capacitively coupled and / or galvanically isolated therefrom) when the linear bearing is formed, and / or the third communication electrode is arranged at a certain distance (e.g. measured along the rotary axis) from the first communication electrode when the linear bearing is formed; wherein the first communication electrode and / or the third communication electrode is preferably supported (at least by means of one or more translational bearings) such that a change of the distance is less than the path (e.g. less than 50% of the path) or is essentially constant or is at least invariant with respect to a displacement of the magnetron target coupling according to the translational degree of freedom (e.g. a displacement by a certain path).

[0153] Example 19 is a support device according to example 17 or 18, wherein the second support device has a cavity designed to accommodate the first linear bearing part.

[0154] Example 20 is a sputter device, having: a support device according to one of examples 17 to 19, which preferably has one or more end blocks for rotatably supporting a sputter target by means of a magnetron target coupling; an optional magnet system supported position fixedly (e.g. with respect to the support device and / or with respect to the direction of gravity) within the sputter target by means of the support device.

[0155] Example 21 is the sputter device according to example 20, the support device further having: a stationary support carrying the magnet system and / or coupled with the magnet system through the magnetron target coupling, e.g. through its shaft.

[0156] Example 22 is the sputter device according to example 20 or 21, wherein the shaft has a through opening into which the stationary support extends.

[0157] Example 23 is the sputter device according to one of examples 20 to 22, the magnet system having: a (e.g. non-magnetic) housing having a housing interior; a (e.g. non-magnetic) magnet carrier arranged in the housing interior and supported by means of the housing, preferably positionally fixed with respect to the housing; a (e.g. non-magnetic) housing cover forming a fluid-tight chamber in a manner that the housing and the housing cover fit together; wherein the housing cover has a fourth communication electrode directly opposite the second communication electrode (e.g. capacitively coupled with and / or galvanically isolated from the second communication electrode) and optionally has a transmission stage, a generator, and a rotational feedthrough coupling the transmission stage with the generator.

Claims

1. Magnetron target coupling (301) comprising: • a target coupling flange (702) for coupling a tubular target; • a shaft (808) rigidly coupled with the target coupling flange (702) and having a first linear bearing component (8081) at an end section opposite the target coupling flange (702); • a communication interface (704) having a first communication electrode (704a) and a second communication electrode (704b) electrically coupled with each other, the first communication electrode being arranged between the first linear bearing component (8081) and the target coupling flange (702), • wherein the target coupling flange (702) is rigidly coupled with the second communication electrode (704b) and arranged between the first communication electrode (704a) and the second communication electrode (704b); • wherein the first communication electrode (704a) is supported such that it can be displaced towards and / or away from the second communication electrode (704b).

2. Magnetron target coupling (301) according to claim 1, • wherein the first communication electrode (704a) and / or the second communication electrode (704b) has a plate and / or is encapsulated.

3. Magnetron target coupling (301) according to claim 1 or 2, further comprising: • a spring elastic element (714f) coupling the first communication electrode (704a) and the second communication electrode (704b) with each other such that the first communication electrode (704a) can be displaced towards the second communication electrode (704b) against a restoring force of the spring elastic element.

4. Magnetron target coupling (301) according to claim 1 or 2, wherein a section of the first communication electrode (704a) that can be displaced towards the second communication electrode (704b) is at least 50% of an extension of the first linear bearing component (8081) parallel to the section.

5. Magnetron target coupling (301) according to claim 1 or 2, wherein the first linear bearing component (8081) has a torque strut.

6. Magnetron target coupling (301) according to claim 1 or 2, wherein the first communication electrode (704a) has an aperture through which the shaft (808) extends.

7. Magnetron target coupling (301) according to claim 1 or 2, wherein the communication interface (704) is electrically isolated from the target coupling flange (702) and / or the shaft (808).

8. Magnetron target coupling (301) according to claim 1 or 2, further comprising: a linear bearing by means of which the first communication electrode (704a) is supported in a displaceable manner.

9. The magnetron target coupling (301) according to claim 1 or 2, wherein the second communication electrode (704b) has a through opening exposing a mounting structure for mounting a magnet system, the mounting structure being supported in a rotatable manner with respect to the shaft (808).

10. A support apparatus (350) comprising: • a frame (912); • a magnetron target coupling (301) according to any one of claims 1 to 9; • a rotary bearing (950) and a second linear bearing part (8181) carried by means of the frame (912), the second linear bearing part being rotatably supported by means of the rotary bearing (950) and being designed to form a linear bearing in a manner that is spliced together with the first linear bearing part (8081) of the magnetron target coupling (301) such that the magnetron target coupling (301) is provided with a translational degree of freedom along an axis of rotation (808a) of the rotary bearing; • a third communication electrode (904) arranged such that, when the linear bearing is formed, the third communication electrode is directed towards the first communication electrode of the magnetron target coupling (301), wherein the third communication electrode (904) is rigidly coupled with the frame (912).

11. A support apparatus (350) comprising: • a frame (912); • a magnetron target coupling (301), the magnetron target coupling (301) having: • a target coupling flange (702) for coupling a tubular target; • a shaft (808) rigidly coupled with the target coupling flange (702) and having a first linear bearing part (8081) at an end section opposite the target coupling flange (702); • a communication interface (704) having a first communication electrode (704a) arranged between the first linear bearing part (8081) and the target coupling flange (702); the support apparatus (350) further comprising: • a rotary bearing (950) and a second linear bearing part (8181) carried by means of the frame (912), the second linear bearing part being rotatably supported by means of the rotary bearing (950) and being designed to form a linear bearing in a manner that is spliced together with the first linear bearing part (8081) of the magnetron target coupling (301) such that the magnetron target coupling (301) is provided with a translational degree of freedom along an axis of rotation (808a) of the rotary bearing; • a third communication electrode (904) arranged such that, when the linear bearing is formed, the third communication electrode is directed towards and arranged at a distance from a communication electrode of the magnetron target coupling (301). • wherein said first communication electrode (704a) and / or said third communication electrode (904) are supported such that a change in said distance is less than a path segment when said magnetron target coupler (301) is displaced relative to said frame (912) according to said translational degree of freedom.

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