A plasma chemical vapor deposition device

Abstract

The present invention provides a plasma chemical vapor deposition device, including a workbench, a telescopic gas pressure rod is fixedly installed in the middle part of the workbench, a telescopic push rod is arranged at the upper end of the workbench directly behind the telescopic gas pressure rod, an L-shaped support column is arranged on the top side wall of the telescopic push rod, a support plate is also vertically installed on the workbench, a cross plate is symmetrically installed on the side wall of the support plate, a first slide groove is opened on the cross plate, a support leg connected to the workbench is arranged at the bottom of the cross plate, a rubber plug fixing device is also installed on the first slide groove, and a negative pressure extraction device is also arranged on the rubber plug fixing device, and the device also includes a chemical deposition reaction box. The plasma chemical vapor deposition device of the present invention can not only solve the problems of uneven placement and falling of objects in traditional technology and improve the work quality, but also ensure the uniformity of coating when chemical vapor deposition is performed on objects.

Description

Technical Field

[0001] The invention belongs to the technical field of vapor deposition equipment, and in particular relates to a plasma chemical vapor deposition device. Background Art

[0002] Chemical vapor deposition (CVD) is a semiconductor process for manufacturing thin films. Traditional chemical vapor deposition equipment usually includes a horizontally placed carrier and a gas supply head located above the carrier. The gas supply head provides reaction gas to one or more objects carried on the carrier. After the reaction gas reacts with the object, the desired thin film is formed on the object. Compared with coating and lamination, this process is simpler, not easy to break the film, the product only needs sampling quality inspection, and is suitable for seals of various complex shapes.

[0003] When the existing chemical vapor deposition device performs chemical vapor deposition on an object, the gas supply head needs to maintain a certain distance from the carrier and spray the reaction gas toward the carrier. However, when the gas supply head sprays the reaction gas to the object, part of the reaction gas that performs chemical vapor deposition on the edge of the object will diffuse to the surrounding side of the object, resulting in a significant difference in the deposition effect at the center of the object and the deposition effect at the edge of the object, which reduces the uniformity of the chemical vapor deposition of the object and further reduces the quality of the object's work.

[0004] Before coating the material, the object needs to be clamped and fixed to expose the position where the coating is required, so as to improve the coating effect of the seal and improve the production efficiency of the seal. In traditional devices, when the coated parts are fixed and placed, the coating parts often fall off from the clamping structure due to insufficient suction, reducing work efficiency.

[0005] Therefore, in order to solve the problem of uneven chemical vapor deposition caused by uneven placement and falling of objects in traditional technologies, a plasma chemical vapor deposition device is urgently needed to solve the existing problems. Summary of the invention

[0006] In view of this, the present invention aims at the deficiencies of the prior art and provides a plasma chemical vapor deposition device, which can not only solve the problems of uneven placement and falling objects in traditional technology and improve work quality, but also ensure the uniformity of the coating when chemical vapor deposition is performed on the objects.

[0007] In order to solve the above technical problems, the technical solution adopted by the present invention is: a plasma chemical vapor deposition device, including a workbench, a telescopic gas pressure rod is fixedly installed in the middle part of the workbench, a telescopic push rod is arranged directly behind the telescopic gas pressure rod and located at the upper end of the workbench, an L-shaped support column is arranged on the top side wall of the telescopic push rod, a support plate is also vertically installed on the workbench, a cross plate is symmetrically installed on the side wall of the support plate, a first slide groove is opened on the cross plate, a support leg connected to the workbench is arranged at the bottom of the cross plate, a rubber plug fixing device is also installed on the first slide groove, and a negative pressure extraction device is also arranged on the rubber plug fixing device, and the device also includes a chemical deposition reaction box.

[0008] The rubber plug fixing device includes a slide plate, and vacuum suction cups are symmetrically installed on the upper and lower sides of the slide plate. There are several vacuum suction cups, and the vacuum suction cups are regularly distributed horizontally and vertically. A ventilation pipe is connected between two adjacent horizontally distributed vacuum suction cups, and a suction and pressure pipe is fixedly installed on the left side of the vacuum suction cup. A pull-out handle is also provided on the side wall of the slide plate. The ventilation pipe is connected to the inside of the vacuum suction cup, so that the air inside the horizontally distributed vacuum suction cups is connected to each other.

[0009] The negative pressure extraction device includes a pressure extraction shell, a pressure extraction port is provided on the front side of the pressure extraction shell, a display screen is installed on the rear side of the pressure extraction shell, a pressure detector is provided inside the pressure extraction shell, the pressure detector is electrically connected to the display screen, and a switch button is also provided on the pressure extraction shell. The pressure extraction port on the negative pressure extraction device and the pressure extraction pipe on the slide work together to control the pressure change inside the vacuum suction cup, the pressure detector performs detection, and transmits the data to the display screen, so that the staff can record the data in time.

[0010] The chemical deposition reaction box is provided with a cabinet door, and a second chute is opened inside the chemical deposition reaction box. The second chute is vertically distributed in three pieces.

[0011] The bottom of the L-shaped support column and the top of the telescopic gas pressure rod are respectively provided with object placement plates, each of which has a round hole, and a layer of sponge is arranged around the round hole, and the two object placement plates are symmetrical up and down. The sponge protects the rubber plug.

[0012] The two side walls of the slide plate are arranged in an outward convex shape, and the first slide groove and the second slide groove are arranged in an inward convex shape. When installing, the convex part on the slide plate is completely wrapped inside the first slide groove or the second slide groove. With this design, the slide plate will be more fixedly clamped in the first slide groove or the second slide groove, and the structure is more stable.

[0013] The slide plate is arranged to be detachably connected and horizontally move in the first slide slot or the second slide slot, so as to facilitate placing the loaded and fixed rubber plug in a closed space for chemical vapor deposition.

[0014] A clamping ring is also provided at the top of the vacuum suction cup, and a layer of rubber pad is provided around the inner wall of the clamping ring. The material of the rubber pad is soft rubber. The diameter of the clamping ring is one centimeter larger than the crown of the rubber plug. At the same time, the rubber pad can protect the edge of the rubber plug crown to prevent the edge of the rubber plug crown from being damaged by collision with hard objects.

[0015] Furthermore, a sealed bearing is provided at the telescopic part of the telescopic gas pressure rod, which can prevent the internal lubricating oil from flowing out, and external dust, water and other impurities from penetrating into the bearing to corrode and damage the bearing, thereby ensuring the normal operation of the machine, reducing noise and protecting the environment.

[0016] Compared with the prior art, the beneficial effects of the present invention are as follows: First, through the cooperation of the vacuum suction cup and the ventilation pipe, the pressure inside the vacuum suction cup can be interconnected, so that multiple objects can be fixed while being neatly placed, which solves the problem of uneven chemical vapor deposition caused by uneven placement and falling of objects in traditional technology, and improves work quality.

[0017] Secondly, through the chemical deposition reaction box and the rubber plug fixing device, chemical vapor deposition can be performed on a large number of objects at one time, which solves the problem of small amount of objects in traditional chemical vapor deposition technology and improves work efficiency.

[0018] Thirdly, through the cooperation of the pressure extraction port, display screen and switch button in the negative pressure extraction device, several interconnected vacuum suction cups are subjected to pressure extraction. The display screen can transmit the data provided by the pressure detector, allowing the staff to check and record the pressure inside the vacuum suction cup in time, making it convenient to understand the work progress.

[0019] Fourthly, through the cooperation of the telescopic gas pressure rod, the telescopic push rod, the L-shaped support column, the support plate, the object placement plate and the round hole, the rubber plug can be better positioned. At the same time, the sponge arranged inside the round hole can protect the rubber plug head when the plug head is clamped to avoid damage to the plug head. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0021] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0022] Figure 2 It is a schematic diagram of the three-dimensional structure of the rubber plug fixing device of the present invention;

[0023] Figure 3 It is a schematic diagram of the three-dimensional structure of the negative pressure extraction device of the present invention;

[0024] Figure 4 It is a schematic diagram of the three-dimensional structure of the negative pressure extraction device of the present invention;

[0025] Figure 5 It is a schematic diagram of the three-dimensional structure of the chemical deposition reaction box of the present invention;

[0026] Figure 6 For the present invention Figure 1 A is a schematic diagram of the partially enlarged structure.

[0027] In the figure: 101, workbench; 102, telescopic gas pressure rod; 103, telescopic push rod; 104, L-shaped support column; 105, support plate; 106, horizontal plate; 107, first slide groove; 108, support leg; 109, cabinet door; 110, second slide groove; 111, object placement plate; 112, round hole; 201, slide plate; 202, vacuum suction cup; 203, ventilation pipe; 204, suction and pressure pipe; 205, pull-out handle; 206, clamp; 301, suction and pressure shell; 302, suction and pressure port; 303, display screen; 304, switch button. DETAILED DESCRIPTION

[0028] In order to better understand the present invention, the content of the present invention is further clearly set forth in conjunction with the embodiments below, but the protection content of the present invention is not limited to the following embodiments. In the following description, a large number of specific details are provided in order to provide a more thorough understanding of the present invention. However, it is obvious to those skilled in the art that the present invention can be implemented without one or more of these details.

[0029] like Figure 1-6 As shown, a plasma chemical vapor deposition device includes a workbench 101, a telescopic gas pressure rod 102 is fixedly installed in the middle part of the workbench 101, a telescopic push rod 103 located at the upper end of the workbench 101 is arranged directly behind the telescopic gas pressure rod 102, an L-shaped support column 104 is arranged on the top side wall of the telescopic push rod 103, a support plate 105 is also vertically installed on the workbench 101, a cross plate 106 is symmetrically installed on the side wall of the support plate 105, a first slide groove 107 is opened on the cross plate 106, a support leg 108 connected to the workbench 101 is arranged at the bottom of the cross plate 106, a rubber plug fixing device is also installed on the first slide groove 107, and a negative pressure extraction device is also arranged on the rubber plug fixing device. The device also includes a chemical deposition reaction box.

[0030] According to another embodiment of the present invention, Figure 2As shown, the rubber plug fixing device includes a slide plate 201, and vacuum suction cups 202 are symmetrically installed on the upper and lower sides of the slide plate 201. There are a plurality of vacuum suction cups 202, and the vacuum suction cups 202 are regularly distributed horizontally and vertically. A vent pipe 203 is connected between two adjacent horizontally distributed vacuum suction cups 202, and a suction and pressure pipe 204 is fixedly installed on the left side of the vacuum suction cup 202. A pull handle 205 is also provided on the side wall of the slide plate 201. The vent pipe 203 is connected to the inside of the vacuum suction cup 202, so that the air inside the horizontally distributed vacuum suction cups 202 is connected to each other.

[0031] According to another embodiment of the present invention, Figure 3-4 As shown, the negative pressure pumping device includes a pumping shell 301, a pumping port 302 is provided on the front side of the pumping shell 301, a display screen 303 is installed on the rear side of the pumping shell 301, a pressure detector is provided inside the pumping shell 301, the pressure detector is electrically connected to the display screen 303, and a switch button 304 is also provided on the pumping shell. The pumping port 302 on the negative pressure pumping device and the pumping tube 204 on the slide 201 work together to control the pressure change inside the vacuum suction cup 202, the pressure detector performs detection, and transmits the data to the display screen 303, so that the staff can record the data in time.

[0032] According to another embodiment of the present invention, Figure 5 As shown, the chemical deposition reaction box is provided with a cabinet door 109, and a second slide slot 110 is opened inside the chemical deposition reaction box.

[0033] According to another embodiment of the present invention, Figure 1 As shown, the bottom of the L-shaped support column 104 and the top of the telescopic gas pressure rod 102 are respectively provided with an object placement plate 111, a circular hole 112 is provided on the object placement plate 111, and a layer of sponge is arranged around the circular hole 112, and the two object placement plates are symmetrical up and down. The sponge protects the rubber plug.

[0034] According to another embodiment of the present invention, Figure 6 As shown, the two side walls of the slide plate 201 are arranged in an outward convex shape, and the first slide groove 107 and the second slide groove 110 are arranged in an inward convex shape. When installing, the convex part on the slide plate 201 is completely wrapped in the first slide groove 107 or the second slide groove 110. With this design, the slide plate 201 will be more fixedly clamped in the first slide groove 107 or the second slide groove 110, and the structure is more stable.

[0035] According to another embodiment of the present invention, Figure 2 As shown, the slide plate 201 is configured to be detachably connected and horizontally move in the first slide groove 107 or the second slide groove 110. It is convenient to place the loaded and fixed rubber plug in a closed space for chemical vapor deposition.

[0036] According to another embodiment of the present invention, Figure 2 As shown, a clamp ring 206 is also provided at the top of the vacuum suction cup 202, and a layer of rubber pad is provided around the inner wall of the clamp ring 206, and the material of the rubber pad is soft rubber. The diameter of the clamp ring 206 is one centimeter larger than the crown of the rubber plug, and the rubber pad can protect the edge of the rubber plug crown to prevent the edge of the rubber plug crown from being damaged by collision with hard objects.

[0037] According to another embodiment of the present invention, Figure 1 As shown, a sealed bearing is provided at the telescopic part of the telescopic gas pressure rod 102. This can prevent the internal lubricating oil from flowing out, and external dust, water and other impurities from penetrating into the bearing to corrode and damage the bearing, thereby ensuring the normal operation of the machine, reducing noise and protecting the environment.

[0038] When chemical vapor deposition is required on the rubber stopper, the telescopic gas pressure rod 102 and the telescopic push rod 103 are first started, the object placement plate 111 is moved vertically up and down, and adjusted to a suitable position, and the staff inserts the plug head of the rubber stopper into the round hole 112.

[0039] Then, the slide plate 201 is inserted as a whole into the first slide groove 107 until one side of the slide plate 201 contacts the side of the support plate 105, and then the telescopic pneumatic rod 102 and the telescopic push rod 103 are started to fix the crown part of the rubber plug on the round hole 112 in the retaining ring 206, and a negative pressure device is used to extract and pressurize the inside of the vacuum suction cup 202 so that the vacuum suction cup 202 can completely fix the rubber plug.

[0040] Then, the pull handle 205 is held, the rubber plug fixing device is moved to the chemical deposition reaction box, the slide plate 201 is inserted into the second slide groove 110 as a whole, and the cabinet door 109 is closed to carry out chemical vapor deposition.

[0041] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model rather than to limit it. Other modifications or equivalent substitutions made to the technical solution of the utility model by ordinary technicians in this field should be included in the scope of the claims of the utility model as long as they do not depart from the spirit and scope of the technical solution of the utility model.

Claims

1. A plasma chemical vapor deposition device, characterized in that: The invention comprises a workbench (101), wherein a telescopic pneumatic rod (102) is fixedly installed in the middle part of the workbench (101), a telescopic push rod (103) located at the upper end of the workbench (101) is arranged directly behind the telescopic pneumatic rod (102), an L-shaped support column (104) is arranged on the top side wall of the telescopic push rod (103), a support plate (105) is also vertically installed on the workbench (101), a cross plate (106) is symmetrically installed on the side wall of the support plate (105), a first slide groove (107) is opened on the cross plate (106), a support leg (108) connected to the workbench (101) is arranged at the bottom of the cross plate (106), a rubber plug fixing device is also installed on the first slide groove (107), and a negative pressure extraction device is also arranged on the rubber plug fixing device, and the device also comprises a chemical deposition reaction box; The rubber stopper fixing device comprises a slide plate (201), and vacuum suction cups (202) are symmetrically installed on the upper and lower sides of the slide plate (201), and a plurality of vacuum suction cups (202) are provided, and the vacuum suction cups (202) are regularly distributed in a horizontal and vertical manner, wherein a ventilation pipe (203) is connected between two adjacent horizontally distributed vacuum suction cups (202), and a suction and pressure pipe (204) is also fixedly installed on the left side of the vacuum suction cup (202), and a pull handle (205) is also provided on the side wall of the slide plate (201); The bottom of the L-shaped support column (104) and the top of the telescopic pneumatic rod (102) are respectively provided with an object placement plate (111), a circular hole (112) is provided on the object placement plate (111), a layer of sponge is arranged around the circular hole (112), and the two object placement plates (111) are symmetrical in upper and lower directions.

2. The plasma chemical vapor deposition device according to claim 1, characterized in that: The negative pressure extraction device comprises a vacuum shell (301), a vacuum port (302) is arranged on the front side of the vacuum shell (301), a display screen (303) is installed on the rear side of the vacuum shell (301), a pressure detector is arranged inside the vacuum shell (301), the pressure detector is electrically connected to the display screen (303), and a switch button (304) is also arranged on the vacuum shell.

3. The plasma chemical vapor deposition device according to claim 1, characterized in that: The chemical deposition reaction box is provided with a cabinet door (109), and a second slide groove (110) is opened inside the chemical deposition reaction box.

4. The plasma chemical vapor deposition device according to claim 1, characterized in that: The two side walls of the slide plate (201) are arranged in an outward convex shape, and the first slide groove (107) and the second slide groove (110) are arranged in an inward convex shape. When installing, the convex part on the slide plate (201) is completely wrapped inside the first slide groove (107) or the second slide groove (110).

5. The plasma chemical vapor deposition device according to claim 4, characterized in that: The slide plate (201) is configured to be detachably connected and to move horizontally in the first slide groove (107) or the second slide groove (110), so as to facilitate placing the loaded and fixed rubber plug in a closed space for chemical vapor deposition.

6. The plasma chemical vapor deposition device according to claim 1, characterized in that: A clamping ring (206) is also provided at the top of the vacuum suction cup (202), and a layer of rubber pad is provided around the inner wall of the clamping ring (206), and the material of the rubber pad is soft rubber.

7. The plasma chemical vapor deposition device according to claim 1, characterized in that: A sealed bearing is provided at the telescopic portion of the telescopic gas pressure rod (102).

Images