Spray plate and treatment device

Abstract

The present invention relates to a spray plate and a processing device. The spray plate includes a plate body, and a gas distribution system is formed inside the plate body. The gas distribution system includes a main air inlet passage, a transition passage, and a spray passage. The process gas first enters the interior of the plate body through the main air inlet passage, then enters the spray passage after being relayed by the transition passage, and finally is introduced into the processing cavity from the spray holes on the air outlet surface. The transition passage can play a buffering role to avoid the direct influence of the air pressure fluctuation in the main air inlet passage on the air pressure in the spray passage. Therefore, the air pressure in the spray passage can maintain good consistency. As a result, after being relayed by the transition passage, the gas flow rates ejected from various regions of the air outlet surface are more balanced, thereby improving the uniformity of the distribution of the process gas in the processing cavity. In addition, the present invention also provides a spraying method.

Description

Technical Field

[0001] The present invention relates to the technical field of vacuum coating, and particularly to a spray plate and a processing device. Background Art

[0002] In the process of industrial production, it is usually necessary to spray a specific process gas into a processing chamber through a spray plate to promote a corresponding reaction, so as to achieve a specific production purpose. For example, atomic layer deposition (ALD) technology is a thin film deposition technology based on surface chemical vapor reaction, which can deposit substances in the form of a single atomic layer on the surface of a substrate, and can accurately control the thickness and uniformity of the deposited thin film within the atomic layer thickness range. Due to its superiority, atomic layer deposition technology has been widely used in the fields of semiconductors, photovoltaic cells, etc. When an atomic layer deposition coating device performs a coating operation, it is necessary to first introduce a process gas into the reaction chamber through a spray plate, so as to initiate a coating reaction.

[0003] However, due to structural limitations, there are significant differences in the gas flow rates in different regions of the existing spray plate, resulting in poor uniformity of the distribution of the process gas entering the processing chamber. For the atomic layer deposition coating process, uneven distribution of the process gas will lead to poor uniformity of the coating thickness. Summary of the Invention

[0004] Based on this, it is necessary to provide a spray plate, a spraying method and a processing device that can improve the uniformity of the distribution of the process gas in the processing chamber for the above problems.

[0005] A spray plate includes a plate body having an air outlet surface. A gas distribution system is formed in the plate body. The gas distribution system includes a main air inlet channel, a transition channel and a spray channel. The spray channel is formed with a plurality of spray holes extending to the air outlet surface along its extending direction, and the spray channel is communicated with the main air inlet channel through the transition channel.

[0006] In one embodiment, a plurality of the transition channels and the spray channels are provided, and the plurality of transition channels and the spray channels correspond to each other one by one. Each spray channel is communicated with the corresponding transition channel through a plurality of connection channels, and the plurality of connection channels are spaced apart along the extending direction of the spray channel. The main air inlet channel is sequentially communicated with the plurality of transition channels.

[0007] In one embodiment, each spray channel is strip-shaped and extends along a first direction, and the plurality of spray channels are spaced apart along a second direction perpendicular to the first direction.

[0008] In one embodiment, each of the transition channels is elongated and extends along the first direction, and each of the transition channels is spaced from the corresponding spray channel in a third direction perpendicular to the first direction and the second direction.

[0009] In one embodiment, the main intake channel is elongated and extends along the second direction.

[0010] In one embodiment, the main intake channel is sequentially communicated with the middle parts of a plurality of the transition channels.

[0011] In one embodiment, the connection point of the main intake channel and each of the transition channels is offset towards one end of the transition channel relative to the midpoint of the transition channel.

[0012] In one embodiment, the inner diameter of the transition channel on the side facing away from the midpoint at the connection point is smaller than the inner diameter of the transition channel on the side facing towards the midpoint at the connection point.

[0013] In one embodiment, the connection point of the main intake channel and each of the transition channels is located at the midpoint of the transition channel.

[0014] In one embodiment, the number of the connection channels on both sides of the connection point along the first direction is the same.

[0015] In one embodiment, air inlets are provided at both ends of the main intake channel in the extending direction.

[0016] In one embodiment, the main intake channel includes an introduction channel, a diversion channel extending along the first direction, and two outlet channels extending along the second direction. The introduction channel is communicated with the middle part of the diversion channel, the two outlet channels are respectively communicated with both ends of the diversion channel, and one of the outlet channels is sequentially communicated with one end of a plurality of the transition channels, and the other outlet channel is sequentially communicated with the other end of a plurality of the transition channels.

[0017] In one embodiment, the connection point of the introduction channel and the diversion channel is offset towards one end of the diversion channel relative to the midpoint of the diversion channel.

[0018] In one embodiment, the inner diameter of the diversion channel on the side facing away from the midpoint at the connection point is smaller than the inner diameter of the diversion channel on the side facing towards the midpoint at the connection point.

[0019] In one embodiment, the connection point of the introduction channel and the diversion channel is located at the midpoint of the diversion channel.

[0020] In one embodiment, two inlet channels and two diversion channels are provided. The two diversion channels are distributed at both ends of the plate body along the second direction. One end of the two outlet channels communicates with both ends of one of the diversion channels, and the other end of the two outlet channels communicates with both ends of the other diversion channel.

[0021] In one embodiment, at least two of the gas distribution systems are provided in the plate body, and the spray channels of at least two of the gas distribution systems are alternately arranged along the second direction.

[0022] A processing device includes a spray plate and a processing cavity as described in any one of the above preferred embodiments. The spray plate is installed in the processing cavity and the air outlet surface faces the inside of the processing cavity.

[0023] For the above spray plate and processing device, the process gas first enters the interior of the plate body through the main inlet channel, then enters the spray channel after being transferred through the transition channel, and finally is introduced into the processing cavity from the air outlet surface through the spray holes. The transition channel can play a buffering role to avoid the air pressure in the spray channel being directly affected by the air pressure fluctuation in the main inlet channel. Therefore, the air pressure in the spray channel can maintain good consistency. As a result, after being transferred through the transition channel, the gas flow rates ejected from each area of the air outlet surface are more balanced, thereby improving the uniformity of the distribution of the process gas in the processing cavity.

[0024] A spraying method includes the steps of:

[0025] Introduce the process gas into the transition channel through the main inlet channel;

[0026] The process gas is introduced into the spray channel communicating with the transition channel after being transferred through the transition channel;

[0027] The process gas entering the spray channel is transported along the spray channel and sprayed onto the processing cavity through a plurality of spray holes distributed along the extension direction of the spray channel.

[0028] For the above spraying method, the process gas is first introduced into the transition channel through the main inlet channel and enters the spray channel after being transferred through the transition channel. The transition channel can play a buffering role to avoid the air pressure in the spray channel being directly affected by the air pressure fluctuation in the main inlet channel. Therefore, the air pressure in the spray channel can maintain good consistency. As a result, after being transferred through the transition channel, the gas flow rates ejected from the spray holes are more balanced, thereby improving the uniformity of the distribution of the process gas in the processing cavity. Description of the Drawings

[0029] To more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the accompanying drawings required for the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other accompanying drawings can also be obtained based on these drawings.

[0030] Figure 1 Schematic diagram of a partial structure of a processing device in a preferred embodiment of the present invention;

[0031] Figure 2 is Figure 1 Front perspective view of the spray plate in the shown processing device;

[0032] Figure 3 is Figure 2 Schematic diagram of the gas distribution system in the shown spray plate;

[0033] Figure 4 Front perspective view of the spray plate in another embodiment of the present invention;

[0034] Figure 5 is Figure 4 Schematic diagram of the gas distribution system of the shown spray plate;

[0035] Figure 6 Schematic diagram of the process flow of a spray method in an embodiment of the present invention. Detailed implementation manners

[0036] To make the above objects, features, and advantages of the present invention more clearly understood, the following will provide a detailed description of the specific implementation manners of the present invention with reference to the accompanying drawings. Many specific details are set forth in the following description to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below.

[0037] In the description of the present invention, it should be understood that the orientation or positional relationships indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. are based on the orientation or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation of the present invention.

[0038] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise specifically defined.

[0039] In the present invention, unless otherwise clearly defined and limited, terms such as "mounted", "connected", "coupled", "fixed", etc. shall be construed in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements or the interaction relationship between two elements, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0040] In the present invention, unless otherwise clearly defined and limited, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature.

[0041] It should be noted that when an element is referred to as "fixed to" or "disposed on" another element, it may be directly on the other element or there may also be an intermediate element. When an element is considered to be "connected" to another element, it may be directly connected to the other element or there may be an intermediate element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation.

[0042] Please refer to Figure 1 , the present invention provides a processing device 10 and a shower plate 100. Among them, the processing device 10 includes a shower plate 100 and a processing cavity 200.

[0043] A vacuum can be formed inside the processing chamber 200, and the spraying plate 100 has an air outlet surface (not labeled in the figure). The spraying plate 100 is installed in the processing chamber 200, and the air outlet surface faces the inner side of the processing chamber 200. Process gas can be introduced into the spraying plate 100 and then sprayed into the processing chamber 200 through the spraying holes 1231 on the air outlet surface, so that a reaction occurs inside the processing chamber 200. For example, an aluminum oxide film is deposited on the surface of a silicon wafer.

[0044] Specifically, in this embodiment, the processing device 10 is an atomic layer deposition coating device, so a coating reaction can occur after the process gas enters the processing chamber 200. Obviously, the processing device 10 can also be applied to other fields.

[0045] Please refer to Figure 2 and Figure 3 , the spraying plate 100 in the preferred embodiment of the present invention includes a plate body 110 and a gas distribution system 120.

[0046] The plate body 110 is generally formed of a metal material, and its outer contour matches the contour of the processing chamber 200. The above-mentioned air outlet surface is formed on one side of the plate body 110. The gas distribution system 120 can introduce and distribute the process gas, and finally spray the process gas into the processing chamber 200 through the spraying holes 1231. Since at least two kinds of process gas are required during coating, the gas distribution system 120 is provided with at least two (generally two), and the at least two gas distribution systems 120 are independent of each other and have the same structure.

[0047] Furthermore, each gas distribution system 120 includes a main intake channel 121, a transition channel 122, and a spraying channel 123.

[0048] The plate body 110 can be an integrally formed structure, and the flow channel structure of the gas distribution system 120 can be machined inside the plate body 110 by drilling. In addition, the plate body 110 can also be composed of two parts spliced together. After processing grooves on the two parts that make up the plate body 110 and then combining them, the flow channel structure of the gas distribution system 120 can also be obtained.

[0049] The main intake passage 121 has an air inlet that can be connected to a gas source to introduce process gas. The spray passages 123 are evenly distributed within the plate body 110, and multiple spray holes 1231 extending to the air outlet surface are formed along the extending direction of the spray passages 123. The spray passage 223 is connected to the main intake passage 121 through the transition passage 122. Therefore, the process gas introduced into the plate body 110 by the main intake passage 121 can enter the spray passage 123 after being transferred through the transition passage 122 and is finally sprayed into the processing cavity 200 through the spray holes 1231. The transition passage 122 can play a buffering role to prevent the air pressure in the spray passage 123 from being directly affected by the air pressure fluctuation in the main intake passage 121. Thus, the air pressure in the spray passage 123 can maintain good consistency. Therefore, the flow velocity consistency of the process gas ejected from each area of the air outlet surface is good, and the gas flow rate is more balanced, which can improve the uniformity of the distribution of the process gas in the processing cavity 200 and further improve the uniformity of the coating film thickness.

[0050] Specifically, in this embodiment, multiple transition passages 122 and multiple spray passages 123 are provided, and the multiple transition passages 122 and spray passages 123 correspond to each other one by one. Each spray passage 123 is connected to the corresponding transition passage 122 through multiple connecting passages 124. The multiple connecting passages 124 are spaced apart along the extending direction of the spray passage 123, and the main intake passage 121 is sequentially connected to the multiple transition passages 122.

[0051] For example, if there are ten transition passages 122, there are also ten spray passages 123. The multiple connecting passages 124 between the spray passage 123 and the transition passage 122 can be equally spaced or non-equally spaced. The connecting passages 124 can also be set to three, four, five or other numbers according to actual needs. The multiple spray passages 123 can make the process gas spray more evenly, and the multiple transition passages 122 transfer the process gas respectively, which can ensure that each spray passage 123 can obtain process gas with a comparable flow rate. Moreover, the multiple connecting passages 124 can enable the process gas in the transition passage 122 to enter the spray passage 123 from multiple different positions at the same time, so that the distribution of the process gas in the spray passage 123 is also more uniform.

[0052] The spray passage 123 can be in the shape of a long strip, an arc or a wavy shape, etc. Considering the complexity of the forming process, the spray passage 123 in this embodiment is in the shape of a long strip and extends along the first direction. The first direction refers to Figure 2 the left-right direction shown, that is, the width direction of the plate body 110. Moreover, the multiple spray passages 123 are spaced apart along the second direction perpendicular to the first direction. The second direction refers to Figure 2The up-down direction shown is the length direction of the plate body 110. The distances between adjacent two spray channels 123 are substantially the same. By arranging the multiple spray channels 123 at intervals in the second direction, the uniform distribution of the multiple spray channels 123 in the plate body 110 can be achieved.

[0053] Furthermore, in this embodiment, each transition channel 122 is strip-shaped and extends in the first direction, and each transition channel 122 and the corresponding spray channel 123 are arranged at intervals in the third direction perpendicular to the first direction and the second direction. The third direction refers to Figure 2 the direction perpendicular to the drawing plane shown, that is, the thickness direction of the plate body 110. With such an arrangement, the space of the plate body 110 in the thickness direction can be reasonably utilized, which is convenient for arranging at least two gas distribution systems 120 in the plate body 110. Moreover, since the transition channel 122 is parallel to the spray channel 123, the distance between the transition channel 122 and the corresponding spray channel 123 remains unchanged in the extending direction of the transition channel 122 and the spray channel 123. Therefore, when transferring the process gas, the process gas in the transition channel 122 can enter the corresponding spray channel 123 more evenly.

[0054] Please refer to again Figure 2 , in this embodiment, the spray channels 123 of at least two gas distribution systems 120 are arranged alternately in the second direction. Specifically, there is a spray channel 123 of another gas distribution system 120 between two spray channels 123 belonging to the same gas distribution system 120. In this way, at least two different types of process gases can be evenly distributed and fully reacted in the processing cavity 200, which is beneficial to further improving the uniformity of the distribution of the process gas in the processing cavity 200.

[0055] Please refer to again Figure 3 , in this embodiment, the main intake channel 121 is strip-shaped and extends in the second direction. In this way, the flow path of the process gas from the main intake channel 121 to each transition channel 122 is short, which is beneficial to quickly reaching the transition channel 122 by the process gas and reducing the flow velocity difference of the process gas when entering each transition channel 122 due to the too long flow path.

[0056] Furthermore, in this embodiment, the main intake channel 121 is sequentially communicated with the middle parts of multiple transition channels 122. After the process gas enters the transition channel 122 from the main intake channel 121, it will be shunted from the middle to both ends of the transition channel 122, so that the process gas is more evenly distributed in the transition channel 122, thereby improving the uniformity of the process gas in the spray channel 123 and finally improving the uniformity of the distribution of the process gas in the processing cavity 200.

[0057] Specifically, the connection between the main intake passage 121 and the transition passage 122 is generally located between two connecting pipes 124. In this embodiment, on both sides of the connection between the main intake passage 121 and the transition passage 122 along the first direction, the number of connecting passages 124 is the same. For example, if the transition passage 122 is connected to the corresponding spray passage 123 through four connecting passages 124, then two connecting passages 124 are respectively distributed on both sides of the connection between the main intake passage 121 and the transition passage 122. In this way, the process gas in the transition passage 122 can enter the corresponding spray passage 123 more evenly.

[0058] In addition, in this embodiment, air inlets are provided at both ends of the main intake passage 121 in the extending direction. Therefore, when introducing the process gas into the gas distribution system 120, two airflows can be introduced simultaneously from both ends of the main intake passage 121, and the two airflows can flow towards multiple transition passages 122 simultaneously. In this way, the difference in gas flow velocity at the connection between the main intake passage 121 and multiple transition passages 122 can be further reduced, and the pressure consistency in multiple transition passages 122 is higher, which helps to further improve the uniformity of the distribution of the process gas in the processing chamber 200.

[0059] In order to enable at least two gas distribution systems 120 to be distributed in the plate body 110, the main intake passage 121 usually deviates towards one side along the width direction of the plate body 110 (i.e., is not centered). Specifically, in this embodiment, the connection between the main intake passage 121 and each transition passage 122 deviates towards one end of the transition passage 122 relative to the midpoint of the transition passage 122.

[0060] Furthermore, in this embodiment, the inner diameter of the transition passage 122 on the side facing away from the midpoint at the connection is smaller than the inner diameter on the side facing towards the midpoint at the connection.

[0061] That is to say, in the extending direction of the transition passage 122, the inner diameters at different positions are different. Taking Figure 2 as an example, if the connection between the main intake passage 121 and the transition passage 122 of one gas distribution system 120 deviates to the left relative to the midpoint of the transition passage 122, then the inner diameter on the left side of the transition passage 122 is smaller than that on the right side. The side with a larger inner diameter can obtain a larger flow rate. In this way, a more uniform distribution of the process gas in the transition passage 122 can be achieved.

[0062] Obviously, in other embodiments, through optimizing the layout, the connection between the main intake passage 121 and each transition passage 122 can also be located at the midpoint of the transition passage 122.

[0063] Please refer to Figure 4 and Figure 5, in another embodiment, the main intake channel 121 includes an introduction channel 1211, a diversion channel 1212, and an outlet channel 1213.

[0064] The introduction channel 1211 has an air inlet and can realize the introduction of process gas. The diversion channel 1212 extends in a first direction, and the middle part of the introduction channel 1211 communicates with the diversion channel 1212. There are two outlet channels 1213, both of the two outlet channels 1213 extend in a second direction, and the two outlet channels 1213 are respectively communicated with both ends of the diversion channel 1212. Further, one of the outlet channels 1213 is sequentially communicated with one end of a plurality of transition channels 122, and the other outlet channel 1213 is sequentially communicated with the other end of the plurality of transition channels 122.

[0065] Specifically, the two outlet channels 1213 are distributed on the left and right sides of the plate body 110 Figure 4 as shown. The outlet channel 1213 on the left is communicated with the left ends of the plurality of transition channels 122, and the outlet channel 1213 on the right is communicated with the right ends of the plurality of transition channels 122. After the process gas is introduced through the introduction channel 1211, it is split in the diversion channel 1212 and divided into two airflows. The two split airflows respectively enter the transition channels 122 from both ends of the transition channels 122 through the two outlet channels 1213. In this way, the uniformity of the process gas can be further improved.

[0066] Further, in this embodiment, there are two introduction channels 1211 and two diversion channels 1212. The two diversion channels 1212 are distributed at both ends of the plate body 110 along the second direction. One end of the two outlet channels 1213 is communicated with both ends of one of the diversion channels 1212, and the other end of the two outlet channels 1213 is communicated with both ends of the other diversion channel 1212. In this way, the airflows of the two paths of process gas can be simultaneously introduced into the gas distribution system 120 through the two introduction channels 1211. Therefore, the difference in gas flow velocity at the connection between the main intake channel 121 and the plurality of transition channels 122 can be further reduced, and the consistency of the air pressure in the plurality of transition channels 122 is higher, which helps to further improve the uniformity of the distribution of the process gas in the processing chamber 200.

[0067] Similarly, in order for at least two gas distribution systems 120 to be distributed within the plate body 110, the introduction channel 1211 is usually offset towards one side along the width direction of the plate body 110 (i.e., not centered). Specifically, in this embodiment, the connection between the introduction channel 1211 and the diversion channel 1212 is offset towards one end of the diversion channel 1212 relative to the midpoint of the diversion channel 1212.

[0068] Further, in this embodiment, the inner diameter of the diversion channel 1212 on the side facing away from the midpoint at the connection is smaller than that on the side facing towards the midpoint at the connection.

[0069] That is to say, in the extending direction of the diversion channel 1212, the inner diameters at different positions are different. Taking Figure 4 the shown as an example, if the connection of the introduction channel 1211 of one gas distribution system 120 and the diversion channel 1212 is offset to the left relative to the midpoint of the diversion channel 1212, then the inner diameter on the left side of the diversion channel 1212 is smaller than that on the right side. The side with a larger inner diameter can obtain a larger flow rate. In this way, a more uniform distribution of the process gas in the diversion channel 1212 can be achieved, so that the two outlet channels 1213 can obtain process gases with comparable flow rates.

[0070] Obviously, in other embodiments, by optimizing the layout, the connection of the introduction channel 1211 and the diversion channel 1212 can also be located at the midpoint of the diversion channel 1212.

[0071] For the above-mentioned spray plate 100 and the processing device 10, the process gas first enters the interior of the plate body 110 through the main intake channel 121, then passes through the transition channel 122 for transfer and enters the spray channel 123, and finally is introduced into the processing cavity 200 from the air outlet surface through the spray holes 1231. The transition channel 122 can play a buffering role to avoid the direct influence of the air pressure fluctuation in the main intake channel 121 on the air pressure in the spray channel 123. Therefore, the air pressure in the spray channel 123 can maintain good consistency. As a result, after being transferred through the transition channel 122, the gas flow rates ejected from various regions of the air outlet surface are more balanced, thereby improving the uniformity of the distribution of the process gas in the processing cavity 200.

[0072] In addition, the present invention also provides a spraying method, which can be realized by means of the above-mentioned spray plate 100 or other spraying devices.

[0073] Please refer to Figure 6 together. The spraying method in an embodiment of the present invention includes steps S201 to S203.

[0074] Among them:

[0075] Step S201: Introduce the process gas into the transition channel through the main intake channel.

[0076] Step S202: After being transferred through the transition channel, the process gas is introduced into the spray channel communicating with the transition channel.

[0077] Step S203: The process gas entering the spray channel is transported along the spray channel and sprayed onto the processing cavity through a plurality of spray holes distributed along the extending direction of the spray channel.

[0078] The main intake passage has an air inlet, which can be connected to a gas source to achieve the introduction of process gas. A plurality of spray holes are formed along the extending direction of the spray passage, and the spray passage is connected to the main intake passage through a transition passage. Therefore, the process gas introduced into the plate body by the main intake passage can be introduced into the spray passage after passing through the transition passage, and finally sprayed into the processing cavity through the spray holes. The transition passage can play a buffering role to avoid the direct influence of the air pressure fluctuation in the main intake passage on the air pressure in the spray passage. Therefore, the air pressure in the spray passage can maintain good consistency. As a result, the velocity consistency of the process gas ejected from the spray holes is better, and the gas flow rate is more balanced, thereby improving the uniformity of the distribution of the process gas in the processing cavity.

[0079] The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.

[0080] The above-described embodiments only represent several implementation manners of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the invention patent should be subject to the appended claims.

Claims

1. A spray plate, comprising a plate body having an air outlet surface, wherein a gas distribution system is formed in the plate body, and is characterized in that, The gas distribution system includes a main intake channel, a transition channel, and a spray channel. The spray channel is formed with a plurality of spray holes extending to the air outlet surface along its extending direction, and the spray channel is communicated with the main intake channel through the transition channel; A plurality of the transition channels and the spray channels are provided, and the plurality of transition channels and the spray channels correspond to each other one by one. Each spray channel is communicated with the corresponding transition channel through a plurality of connection channels. The plurality of connection channels are spaced apart along the extending direction of the spray channel. The main intake channel is sequentially communicated with the plurality of transition channels; Each spray channel is strip-shaped and extends along a first direction, and the plurality of spray channels are spaced apart along a second direction perpendicular to the first direction; The main intake channel includes an introduction channel, a diversion channel extending along the first direction, and two export channels extending along the second direction. The introduction channel is communicated with the middle of the diversion channel. The two export channels are respectively communicated with the two ends of the diversion channel. And one of the export channels is sequentially communicated with one ends of the plurality of transition channels, and the other export channel is sequentially communicated with the other ends of the plurality of transition channels.

2. The spray plate according to claim 1, characterized in that, Each transition channel is strip-shaped and extends along the first direction, and each transition channel and the corresponding spray channel are spaced apart along a third direction perpendicular to the first direction and the second direction.

3. The shower plate according to claim 1, characterized in that, The connection position of the introduction channel and the diversion channel is offset from the midpoint of the diversion channel towards one end of the diversion channel.

4. The shower plate according to claim 3, characterized in that, The inner diameter of the diversion channel on the side of the connection position facing away from the midpoint is smaller than the inner diameter of the diversion channel on the side of the connection position facing towards the midpoint.

5. The shower plate according to claim 1, characterized in that, The connection position of the introduction channel and the diversion channel is located at the midpoint of the diversion channel.

6. The shower plate according to claim 1, characterized in that, Two introduction channels and two diversion channels are provided. The two diversion channels are distributed at both ends of the plate body along the second direction. One ends of the two export channels are communicated with the two ends of one of the diversion channels, and the other ends of the two export channels are communicated with the two ends of the other diversion channel.

7. The shower plate according to claim 1, wherein, At least two of the gas distribution systems are arranged in the plate body, and the spray channels of the at least two gas distribution systems are alternately arranged along the second direction.

8. A processing device, characterized in that, It includes a spray plate and a processing cavity according to any one of claims 1 to 7 above. The spray plate is installed in the processing cavity and the air outlet surface faces the inner side of the processing cavity.

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