Torque pump and device for supplying chemical liquid

Abstract

The present invention relates to a torque pump and a device for supplying a chemical liquid. Specifically, the present invention provides a pump for supplying a liquid. The pump comprises: a tubular member having a hose connected to a chemical liquid inlet and a chemical liquid outlet, and a cylindrical roller configured to wind the hose. The tubular member is configured to discharge the chemical liquid by causing a volume change caused by the hose being wound around the roller; and a driver configured to provide a rotational force to cause the hose to wind around the roller.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2021-0184207 filed in the Korean Intellectual Property Office on December 21, 2021, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present invention relates to a torsion pump and a device for supplying chemical liquid using the torsion pump. Background Art

[0004] To manufacture semiconductor devices or liquid crystal displays, various processes such as photolithography, etching, ashing, ion implantation, thin film deposition, and cleaning are performed on substrates. Among these processes, a liquid handling process for supplying liquid onto the substrate is performed.

[0005] Generally, a liquid treatment process is a process of discharging a treatment liquid from a nozzle and treating a substrate with the liquid.

[0006] Various pumps are used in chemical liquid supply equipment for liquid processing. Among them, micropumps are difficult to apply to microprocessing facilities (e.g., ArF and EUV facilities) because stagnant photosensitive solutions (PR) can cause many particles due to poor chemical replacement rates. Summary of the Invention

[0007] The present invention is directed to providing a torsion pump and a device for supplying chemical liquid capable of improving a chemical replacement rate.

[0008] The present invention is also directed to providing a torsion pump and an apparatus for supplying a chemical liquid capable of reducing their sizes.

[0009] The objects of the present invention are not limited thereto, and other objects not mentioned will be clearly understood from the following description by those of ordinary skill in the art.

[0010] An exemplary embodiment of the present invention provides a torsion pump comprising: a tubular member having a hose connected to a chemical liquid inlet and a chemical liquid outlet, and a cylindrical roller configured to wind the hose, and the tubular member is configured to discharge the chemical liquid through a volume change caused by contraction of the hose wound around the roller; and a driver configured to provide a rotational force so that the hose is wound around the roller.

[0011] According to an exemplary embodiment, the tubular member includes: a first flange configured to support one end of the roller; and a second flange configured to support the other end of the roller, and one end of the hose is connected to the first flange, the other end of the hose is connected to the second flange, and the second flange is connected to the driver and rotates.

[0012] According to an exemplary embodiment, the first flange is provided with a chemical liquid inlet and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and the second flange is provided with a chemical liquid outlet and a second internal flow path connecting the chemical liquid outlet and the other end of the hose.

[0013] According to an exemplary embodiment, the tubular member is provided with a plurality of hoses, and the plurality of hoses are wound in the same direction, and the plurality of hoses are supplied with chemical liquids from different chemical liquid sources, and the plurality of hoses are merged into one hose before discharging the chemical liquids to the chemical liquid outlet.

[0014] According to an exemplary embodiment, the hose is arranged to be wound around the drum in a coil shape.

[0015] According to an exemplary embodiment, the hose is wound around the drum in a coil shape by a winding operation of the driver.

[0016] According to an exemplary embodiment, the torque pump further includes a sealing housing disposed between the first flange and the second flange such that the drum and the hose are isolated from an external environment.

[0017] According to an exemplary embodiment, the interior of the sealing housing is filled with an incompressible fluid, and the sealing housing is provided in the form of a bellows.

[0018] According to an exemplary embodiment, the drum is made of a flexible material, provides an inner space connecting the chemical liquid inlet and the chemical liquid outlet, and is twisted by rotation of the second flange to discharge the chemical liquid through a volume change caused by the twisting.

[0019] According to an exemplary embodiment, the driver further includes a compensating member configured to compensate for a vertical length deformation caused by a twisting operation of the tubular member.

[0020] According to an exemplary embodiment, the compensating member includes a ball screw, and the second flange is rotatable and movable up and down on the ball screw.

[0021] Another exemplary embodiment of the present invention provides an apparatus for supplying a chemical liquid, the apparatus comprising: a pump configured to supply the chemical liquid to a nozzle, the nozzle discharging the chemical liquid to a substrate; a trap tank in which the chemical liquid supplied from the pump to the nozzle is temporarily stored; a bottle containing the chemical liquid stored in the trap tank; a filter disposed on a path for supplying the chemical liquid from the trap tank to the pump, the pump comprising: a tubular member having at least one hose connected to a chemical liquid inlet and a chemical liquid outlet and a cylindrical roller configured to wind the hose, the tubular member being configured to discharge the chemical liquid by a volume change caused by contraction of the hose wound around the roller; and a driver configured to provide a rotational force so that the hose is wound around the roller.

[0022] According to an exemplary embodiment, the tubular member includes: a first flange configured to support one end of the roller; and a second flange configured to support the other end of the roller, and one end of the hose is connected to the first flange, the other end of the hose is connected to the second flange, and the second flange is connected to the driver and rotates.

[0023] According to an exemplary embodiment, the first flange is provided with a chemical liquid inlet and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and the second flange is provided with a chemical liquid outlet and a second internal flow path connecting the chemical liquid outlet and the other end of the hose.

[0024] According to an exemplary embodiment, the hose is configured to be wound around the drum in a coil shape, or the hose is configured to be wound around the drum in a coil shape by a winding operation of a driver.

[0025] According to an exemplary embodiment, the apparatus for supplying the chemical liquid further includes a sealing housing provided between the first flange and the second flange such that the drum and the hose are isolated from an external environment.

[0026] According to an exemplary embodiment, the interior of the sealing housing is filled with an incompressible fluid, and the sealing housing is provided in the form of a bellows.

[0027] According to an exemplary embodiment, the drum is made of a flexible material, provides an inner space connecting the chemical liquid inlet and the chemical liquid outlet, and is twisted by rotation of the second flange to discharge the chemical liquid through a volume change caused by the twisting.

[0028] According to an exemplary embodiment, the driver further includes a compensating member configured to compensate for vertical length deformation caused by a twisting operation of the tubular member.

[0029] Another exemplary embodiment of the present invention provides a torsion pump, comprising:

[0030] A tubular member having a hose connected to a chemical liquid inlet and a chemical liquid outlet, and a cylindrical roller configured to wind the hose, and the tubular member is configured to discharge the chemical liquid by a volume change caused by the contraction of the hose wound around the roller; and a driver configured to provide a rotational force so that the hose is wound around the roller, and the tubular member includes: a first flange configured to support one end of the roller; and a second flange configured to support the other end of the roller, and the second flange is connected to the driver and rotates, and the torque pump also includes a sealed housing provided between the first flange and the second flange so that the roller and the hose are isolated from the external environment, one end of the hose is connected to the first flange, and the other end of the hose is connected to the second flange, the first flange is provided with the chemical liquid inlet, and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and the second flange is provided with the chemical liquid outlet, and a second internal flow path connecting the chemical liquid outlet and the other end of the hose.

[0031] According to the exemplary embodiment of the present invention, the chemical replacement rate can be improved.

[0032] Further, according to the exemplary embodiment of the present invention, a torque pump can be reduced.

[0033] The effects of the present invention are not limited to the above-mentioned effects, and effects not mentioned will be clearly understood from the specification and the accompanying drawings by those skilled in the art. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 is a perspective view schematically showing a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0035] Figure 2 To show Figure 1 A cross-sectional view of a substrate processing apparatus including a coating block or a developing block.

[0036] Figure 3 for Figure 1 A top view of a substrate processing apparatus.

[0037] Figure 4 2 is a diagram showing an embodiment of a hand of a transfer robot.

[0038] Figure 5 To schematically show Figure 3 A top view of one embodiment of a thermal processing chamber, Figure 6 for Figure 5Front view of the thermal processing chamber.

[0039] Figure 7 FIG. 1 is a cross-sectional view illustrating one embodiment of a liquid processing chamber in which a processing liquid is supplied to a rotating substrate W to process the substrate W with the liquid.

[0040] Figure 8 for Figure 7 A top view of a liquid processing chamber. Figure 9 To show Figure 3 A perspective view of an embodiment of a transfer robot.

[0041] Figure 10 FIG2 is a structural diagram showing a liquid supply unit.

[0042] Figure 11 To show Figure 10 View of the pump shown.

[0043] Figure 12 To show Figure 11 A perspective view of the pump is shown.

[0044] Figure 13 is a graph showing the volume change of the hose due to the winding operation.

[0045] Figure 14 A front view of a second embodiment of a pump is shown.

[0046] Figure 15 It is a cross-sectional perspective view of a tubular component.

[0047] Figure 16A and 16B To show Figure 11 A view of a first modified embodiment of a tubular member is shown.

[0048] Figure 17 and 18 It is a view showing a second modified embodiment of the pump.

[0049] Figure 19 and 20 2 is a view showing a third embodiment of a pump.

[0050] Figure 21 To show Figure 19 A diagram of a modified embodiment of the pump is shown.

[0051] Figure 22 2 is a view showing a fourth embodiment of a pump.

[0052] Figure 23 2 is a view showing a fifth embodiment of a pump. DETAILED DESCRIPTION

[0053] Other advantages and features of the present invention and methods for achieving them will become apparent with reference to the embodiments and drawings described in detail below. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only this embodiment is intended to complete the disclosure of the present invention and the general knowledge of the field to which the present invention belongs. The present invention is provided to fully convey the scope of the present invention to those skilled in the art, and the present invention is limited only by the scope of the claims.

[0054] Unless otherwise defined, all terms (including technical or scientific terms) used herein have the same meanings as generally accepted by the general art in the prior art to which the present invention belongs. Terms defined by general dictionaries may be interpreted as having the same meanings as in the relevant description and / or text of this application, and even if not clearly defined herein, will not be conceptualized or interpreted too formally. The terms used herein are only for the purpose of describing specific embodiments and are not intended to limit the present invention.

[0055] In this specification, the singular also includes the plural, unless otherwise expressly stated in the phrase. It should also be understood that when used herein, the terms "comprise," "comprising," "include," and / or "including" specify the presence of stated features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0056] The apparatus in one embodiment of the present invention is described as being used to perform a photolithography process on a substrate (such as a semiconductor wafer or a flat panel display panel), but this is for ease of explanation and the present invention may also be used in other apparatus that use pumps to supply chemical liquids to process substrates.

[0057] In the following, reference will be made to Figures 1 to 22 Exemplary embodiments of the present invention are described.

[0058] Figure 1 FIG2 is a perspective view schematically showing a substrate processing apparatus according to an exemplary embodiment of the present invention. Figure 2 To show Figure 1 A cross-sectional view of a substrate processing apparatus including a coating block or a developing block, and Figure 3 for Figure 1 A top view of a substrate processing apparatus.

[0059] Reference Figures 1 to 3 , a substrate processing apparatus 10 according to an embodiment of the present invention includes an index module 100 , a processing module 300 , and an interface module 500 .

[0060] According to an exemplary embodiment, the index module 100, the processing module 300, and the interface module 500 are sequentially arranged in a row. Hereinafter, the direction in which the index module 100, the processing module 300, and the interface module 500 are arranged is referred to as a first direction 12, a direction perpendicular to the first direction 12 when viewed from the top is referred to as a second direction 14, and a direction perpendicular to both the first direction 12 and the second direction is referred to as a third direction 16.

[0061] The index module 100 transfers the substrate W from the container F containing the substrate W therein to the processing module 300 and contains the processed substrate W in the container F. The longitudinal direction of the index module 100 is arranged in the second direction 14. The index module 100 has a load port 110 and an index frame 130. The load port 110 is arranged on the opposite side of the processing module 300 based on the index frame 130. The container F containing the substrate W therein is placed on the load port 110. A plurality of load ports 110 may be provided, and the plurality of load ports 110 may be arranged along the second direction 14.

[0062] A sealed container F such as a front opening unified pod (FOUP) may be used as the container F. The container F may be placed on the load port 110 by an operator or a conveying device (not shown) such as an overhead conveyor, an overhead transporter, or an automated guided vehicle.

[0063] The index robot 132 is provided inside the index frame 130. A guide rail 136 whose longitudinal direction is provided in the second direction 14 may be provided inside the index frame 130, and the index robot 132 may be provided to be movable on the guide rail 136. The index robot 132 includes a hand on which the substrate W is placed, and the hand is provided to move forward and backward, rotate about the third direction 16, and move in the third direction 16.

[0064] The processing module 300 can perform a coating process and a developing process on the substrate W. The processing module 300 can receive the substrate W accommodated in the container F to perform a substrate processing process. The processing module 300 has a coating block 300a and a developing block 300b. The coating block 300a performs a coating process on the substrate W, and the developing block 300b performs a developing process on the substrate W. A plurality of coating blocks 300a are provided, and the plurality of coating blocks 300a are provided to be stacked on each other. A plurality of developing blocks 300b are provided, and the plurality of developing blocks 300b are provided to be stacked on each other. According to Figure 1In an exemplary embodiment, two coating blocks 300a and two developing blocks 300b are provided. The coating block 300a can be provided below the developing block 300b. According to an exemplary embodiment, the two coating blocks 300a can perform the same process and can be provided with the same structure. In addition, the two developing blocks 300b can perform the same process and can be provided with the same structure.

[0065] Reference Figure 3 The coating block 300a includes a heat treatment chamber 320, a transfer chamber 350, a liquid treatment chamber 360, and buffer chambers 312 and 316. The heat treatment chamber 320 performs a heat treatment process on the substrate W. The heat treatment process may include a cooling process and a heating process. The liquid treatment chamber 360 supplies liquid to the substrate W to form a liquid film. The liquid film may be a photoresist film or an antireflection film. The transfer chamber 350 transfers the substrate W between the heat treatment chamber 320 and the liquid treatment chamber 360 in the coating block 300a.

[0066] The longitudinal direction of the transfer chamber 350 may be set to be parallel to the first direction 12. The transfer robot 900 is provided in the transfer chamber 350. The transfer robot 900 transfers substrates between the thermal treatment chamber 320, the liquid treatment chamber 360, and the buffer chambers 312 and 316. According to one embodiment, the transfer robot 900 has a hand in which the substrate W is placed, and the hand may be set to move forward and backward, rotate about the third direction 16, and move in the third direction 16. A guide rail 356 is provided in the transfer chamber 350, the longitudinal direction of the guide rail being set to be parallel to the first direction 12, and the transfer robot 900 may be provided to be movable on the guide rail 356.

[0067] Figure 4 2 is a diagram showing an embodiment of a hand of a transfer robot.

[0068] Reference Figure 4 The hand 910 includes a hand body 910a and supporting fingers 910b. The hand body 910a is formed in a generally horseshoe shape with an inner diameter larger than the diameter of the substrate. However, the shape of the hand body 910a is not limited thereto. The supporting fingers 910b are mounted inwardly in four areas including the front end of the hand body 910a. A vacuum flow path (not shown) is formed in the hand body 910a. The vacuum flow path (not shown) is connected to a vacuum pump via a vacuum line.

[0069] Return to reference Figures 1 to 3 , a plurality of heat treatment chambers 320 are provided. The heat treatment chambers 320 are arranged in the first direction 12 . The heat treatment chambers 320 are provided at one side of the transfer chamber 350 .

[0070] Figure 5 To schematically show Figure 3 A top view of one embodiment of a thermal processing chamber, and Figure 6 for Figure 5 Front view of the thermal processing chamber.

[0071] Reference Figure 5 and Figure 6 The heat treatment chamber 320 has a shell 321 , a cooling unit 322 , a heating unit 323 and a transfer plate 324 .

[0072] The housing 321 is configured to be substantially in the shape of a rectangular parallelepiped. An entrance (not shown) is formed on the side wall of the housing 321, through which the substrate W is transported in and out. The entrance can remain open. A door (not shown) can be configured to selectively open and close the entrance. A cooling unit 322, a heating unit 323, and a transfer plate 324 are provided in the housing 321. The cooling unit 322 and the heating unit 323 are arranged in the second direction 14. According to an embodiment, the cooling unit 322 can be provided closer to the transfer chamber 350 than the heating unit 323.

[0073] The cooling unit 322 includes a cooling plate 322a. When viewed from the top, the cooling plate 322a may have a generally circular shape. The cooling plate 322a is provided with a cooling member 322b. According to an exemplary embodiment, the cooling member 322b may be formed inside the cooling plate 322a and may be provided as a flow path for a cooling fluid to flow through.

[0074] The heating unit 323 has a heating plate 323a, a cover 323c and a heater 323b. When viewed from the top, the heating plate 323a has a substantially circular shape. The heating plate 323a has a diameter larger than the diameter of the substrate W. The heater 323b is installed in the heating plate 323a. The heater 323b can be set as a heating resistor, and an electric current is applied to the heating resistor. A lifting pin 323e capable of vertically driving in the third direction 16 is provided in the heating plate 323a. The lifting pin 323e receives the substrate W from a conveying device outside the heating unit 323 and places the substrate W downward on the heating plate 323a, or lifts the substrate W from the heating plate 323a and conveys it downward to a conveying device outside the heating unit 323. According to one embodiment, three lifting pins 323e can be provided. The cover 323c has an internal space, the lower part of which is open.

[0075] The cover 323c is provided on the upper portion of the heating plate 323a and is moved in the vertical direction by the driver 323d. The space where the cover 323c is moved to form the cover 323c and the heating plate 323a is provided as a heating space for heating the substrate W.

[0076] The transfer plate 324 is configured to be substantially disk-shaped and has a diameter corresponding to the diameter of the substrate W. A notch 324b is formed in the edge of the transfer plate 324. The notch 324b may have a shape corresponding to the protrusion 3543 formed in the hand 354 of the transfer robot 352. Furthermore, the notches 324b are configured to have a number corresponding to the number of protrusions 3543 formed in the hand 354 and are formed at positions corresponding to the protrusions 3543. When the upper and lower positions of the hand 354 and the transfer plate 324 change at a position where the hand 354 and the transfer plate 324 are vertically aligned, the substrate W is transferred between the hand 354 and the transfer plate 324. The transfer plate 324 is mounted on a guide rail 3249 and can be moved along the guide rail 3249 between the first area 3212 and the second area 3214 by a driver 324c. A plurality of slit-shaped guide grooves 324a are provided in the transfer plate 324. The guide grooves 324a extend from one end portion of the transfer plate 324 to the interior of the transfer plate 324. The longitudinal directions of the guide grooves 324a are arranged along the second direction 14, and the guide grooves 324a are spaced apart from each other in the first direction 12. The guide grooves 324a prevent the transfer plate 324 and the lift pins 323e from interfering with each other when the substrate W is transferred between the transfer plate 324 and the heating unit 323.

[0077] The substrate W is cooled while the transfer plate 324 on which the substrate W is placed contacts the cooling plate 2642. The transfer plate 324 is made of a material having high thermal conductivity so that heat transfer is appropriately performed between the cooling plate 322a and the substrate W. According to one embodiment, the transfer plate 324 may be made of a metal material.

[0078] The heating unit 323 provided in some thermal processing chambers 320 may improve the adhesion rate of the photoresist on the substrate by supplying gas during heating of the substrate W. According to one embodiment, the gas may be hexamethyldisilane (HMDS) gas.

[0079] Return to reference Figures 1 to 3, a plurality of liquid processing chambers 360 are provided. Some of the liquid processing chambers 360 can be arranged to be stacked on each other. The liquid processing chambers 360 are arranged on one side of the transfer chamber 350. The liquid processing chambers 360 are arranged side by side in the first direction 12. Some of the liquid processing chambers 360 are arranged in a position adjacent to the index module 100. Hereinafter, the liquid processing chamber 360 arranged adjacent to the index module 100 is referred to as the front liquid processing chamber 362. The other liquid processing chambers 360 are arranged in a position adjacent to the interface module 500. Hereinafter, the liquid processing chamber 360 arranged adjacent to the interface module 500 is referred to as the rear liquid processing chamber 364.

[0080] The front liquid processing chamber 362 applies a first liquid onto the substrate W, and the rear liquid processing chamber 364 applies a second liquid onto the substrate W. The first liquid and the second liquid can be different types of liquids. According to an exemplary embodiment, the first liquid is an anti-reflection film, and the second liquid is a photoresist. The photoresist can be applied to the substrate W coated with the anti-reflection film. Optionally, the first liquid can be a photoresist, and the second liquid can be an anti-reflection film. In this case, the anti-reflection film can be applied to the substrate W coated with the photoresist. Optionally, the first liquid and the second liquid can be the same type of liquid, and both the first liquid and the second liquid can be photoresists.

[0081] The developing block 300 b has the same structure as the coating block 300 a , and a liquid processing chamber provided in the developing block 300 b supplies a developing solution onto the substrate.

[0082] The interface module 500 connects the processing module 300 to the external exposure equipment 700. The interface module 500 has an interface frame 510, an additional process chamber 520, an interface buffer 530, and an interface robot 550.

[0083] A fan filter unit for forming a downward flow therein can be provided in the upper end of the interface frame 510. An additional process chamber 520, an interface buffer 530, and an interface robot 550 are provided inside the interface frame 510. The additional process chamber 520 can perform a predetermined additional process before the substrate W on which the process is completed in the coating block 300a is fed into the exposure device 700. Optionally, the additional process chamber 520 can perform a predetermined additional process before the substrate W on which the process is completed in the exposure device 700 is fed into the developing block 300b. According to an exemplary embodiment, the additional process may include an edge exposure process for exposing an edge area of ​​the substrate W, an upper surface cleaning process for cleaning the upper surface of the substrate W, or a lower surface cleaning process for cleaning the substrate W. A plurality of additional process chambers 520 are provided, and the plurality of additional process chambers 520 can be arranged to be stacked on top of each other. All of the additional process chambers 520 can be arranged to perform the same process. Optionally, some of the additional process chambers 520 can be arranged to perform different processes.

[0084] The interface buffer 530 provides a space for the substrate W transferred between the coating block 300a, the additional process chamber 520, the exposure device 700, and the developing block 300b to temporarily stay during the transfer. A plurality of interface buffers 530 may be provided, and the plurality of interface buffers 530 may be arranged to be stacked on each other.

[0085] According to an exemplary embodiment, based on an extension line in a longitudinal direction of the transfer chamber 350 , the additional process chamber 520 may be disposed on one side, and the interface buffer 530 may be disposed on the other side.

[0086] The interface robot 550 transfers substrates W between the coating block 300a, the additional process chamber 520, the exposure device 700, and the development block 300b. The interface robot 550 may have a transfer hand for transferring substrates W. The interface robot 550 may be configured as one or more robots. According to an exemplary embodiment, the interface robot 550 includes a first robot 552 and a second robot 554. The first robot 552 may be configured to transfer substrates W between the coating block 300a, the additional process chamber 520, and the interface buffer 530, the second robot 554 may be configured to transfer substrates W between the interface buffer 530 and the exposure device 700, and the third robot 554 may be configured to transfer substrates W between the interface buffer 530 and the development block 300b.

[0087] Each of the first robot 552 and the second robot 554 includes a transfer hand on which the substrate W is placed, and the hand may be configured to move forward and backward, rotate about an axis parallel to the third direction 16 , and move in the third direction 16 .

[0088] The structure of the liquid processing chamber will be described in detail below. Hereinafter, the liquid processing chamber provided in the coating block will be described as an example. Furthermore, the liquid processing chamber will be described as a chamber for applying photoresist on a substrate W. However, the liquid processing chamber may also be a chamber for forming a film (such as a protective film or an antireflection film) on the substrate W. Furthermore, the liquid processing chamber may be a chamber for developing the substrate W by supplying a developer to the substrate W.

[0089] Figure 7 is a cross-sectional view showing one embodiment of a liquid processing chamber in which a processing liquid is supplied to a rotating substrate W to process the substrate W with the liquid, and Figure 8 for Figure 7 A top view of a liquid processing chamber.

[0090] Reference Figure 7 and Figure 8 The liquid processing chamber 1000 includes a housing 1100 , a first processing unit 1201 a , a second processing unit 1201 b , a liquid supply unit 1400 , a discharge unit 1600 , and a controller 1800 .

[0091] The housing 1100 is configured in a rectangular columnar shape having an internal space. Openings 1101a and 1101b are formed at one side of the housing 1100. The openings 1101a and 1101b serve as passages through which substrates W are carried in and out. The openings 1101a and 1101b are provided with doors 1103a and 1103b, and the doors 1103a and 1103b open and close the openings 1101a and 1101b.

[0092] A fan filter unit 1130 that supplies a downward flow to the inner space thereof is provided on an upper wall of the housing 1100. The fan filter unit 1130 has a fan through which outside air is introduced into the inner space and a filter that filters the outside air.

[0093] The first processing unit 1201a and the second processing unit 1201b are disposed in the inner space of the housing 1100. The first processing unit 1201a and the second processing unit 1201b are arranged in one direction. Hereinafter, the direction in which the first processing unit 1201a and the second processing unit 1201b are arranged is referred to as a unit arrangement direction, and in Figure 11 The X-axis direction is shown.

[0094] The first processing unit 1201 a includes a first processing container 1220 a and a first supporting unit 1240 a .

[0095] The first processing container 1220a has a first inner space 1222a. The first inner space 1222a is provided so that an upper portion thereof is open.

[0096] The first support unit 1240a supports the substrate W in the first interior space 1222a of the first processing container 1220a. The first support unit 1240a includes a first support plate 1242a, a first drive shaft 1244a, and a first driver 1246a. The upper surface of the first support plate 1242a is configured to be circular. The first support plate 1242a has a diameter smaller than that of the substrate W. The first support plate 1242a is configured to support the substrate W using vacuum pressure. Optionally, the first support plate 1242a may include a mechanical clamping structure for supporting the substrate W. The first drive shaft 1244a is coupled to the central portion of the bottom surface of the first support plate 1242a and is provided with a first driver 1246a that supplies rotational force to the first drive shaft 1244a. The first driver 1246a may be a motor.

[0097] The second processing unit 1201b includes a second processing container 1220b and a second supporting unit 1240b having a second supporting plate 1242b, a second driving shaft 1244b and a second driver 1246b. The second processing container 1220b and the second supporting unit 1240b have substantially the same structure as the first processing container 1220a and the first supporting unit 1240a.

[0098] The liquid supply unit 1400 supplies liquid to the substrate W. The liquid supply unit 1400 includes a first nozzle 1420a, a second nozzle 1420b, and a treatment liquid nozzle 1440. The first nozzle 1420a supplies liquid to the substrate W disposed in the first support unit 1240a, and the second nozzle 1420b supplies liquid to the substrate W disposed in the second support unit 1240b. The first nozzle 1420a and the second nozzle 1420b can be configured to supply the same type of liquid. According to an exemplary embodiment, the first nozzle 1420a and the second nozzle 1420b can supply a rinsing liquid for cleaning the substrate W. For example, the rinsing liquid can be water. As another example, the first nozzle 1420a and the second nozzle 1420b can supply a removal liquid for removing photoresist from the edge region of the substrate W. For example, the removal liquid can be a diluent. Each of the first nozzle 1420a and the second nozzle 1420b can rotate relative to its rotation axis between a process position and a standby position. The process position is a position where liquid is discharged onto the substrate W, and the standby position is a position where liquid is not discharged onto the substrate W and the first nozzle 1420 a and the second nozzle 1420 b are on standby, respectively.

[0099] The processing liquid nozzle 1440 supplies processing liquid to the substrate W disposed in the first support unit 1240a and the substrate W disposed in the second support unit 1240b. The processing liquid may be photoresist. The nozzle driver 1448 drives the processing liquid nozzle 1440 so that the processing liquid nozzle 1440 moves along the guide 1442 between a first process position, a standby position, and a second process position. The first process position is a position for supplying processing liquid to the substrate W supported by the first support unit 1240a, and the second process position is a position for supplying processing liquid to the substrate W supported by the second support unit 1240b. The standby position is a position for standby in the standby port 1444 provided between the first processing unit 1201a and the second processing unit 1201b when photoresist is not discharged from the processing liquid nozzle 1440.

[0100] The gas-liquid separation plate 1229a may be disposed in the inner space 1201a of the first process container 1220a. The gas-liquid separation plate 1229a may be disposed to extend upward from the bottom wall of the first process container 1220a. The gas-liquid separation plate 1229a may be disposed in a ring shape.

[0101] According to an exemplary embodiment, the exterior of the gas-liquid separator plate 1229a can be configured as a discharge space for discharging liquid, and the interior of the gas-liquid separator plate 1229a can be configured as a discharge space for discharging atmospheric air. A discharge line 1228a for discharging the treated liquid is connected to the bottom wall of the first processing vessel 1220a. The discharge line 1228a discharges the treated liquid introduced between the sidewall of the first processing vessel 1220a and the gas-liquid separator plate 1229a to the exterior of the first processing vessel 1220a. The airflow flowing into the space between the sidewall of the first processing vessel 1220a and the gas-liquid separator plate 1229a is introduced into the gas-liquid separator plate 1229a. In this process, the treated liquid contained in the airflow is discharged from the discharge space to the exterior of the first processing vessel 1220a via the discharge line 1228a, and the airflow is introduced into the discharge space of the first processing vessel 1220a.

[0102] Although not shown in the drawings, a lifting actuator for adjusting the relative height between the first supporting plate 1242 a and the first processing container 1220 a may also be provided.

[0103] Figure 9 To show Figure 3 A perspective view of an embodiment of a transfer robot.

[0104] In the following, Figure 9 The manipulator 900 will be described as Figure 3 However, instead, the transfer robot may be an index robot, and may alternatively be another robot provided in the substrate processing apparatus 1 .

[0105] See also Figure 9 , the transfer robot 900 may include a robot body 902 , a horizontal drive 930 , and a vertical drive 940 .

[0106] The robot body 902 may include a hand 910 capable of moving forward and backward (in the X direction) and rotating (in the θ direction) by supporting a substrate, and a hand driver 920 including a base supporting the hand 910 .

[0107] The hand driver 920 moves the hand 910 horizontally, and the hand 910 is driven individually by the hand driver 920. The hand driver 920 includes a connecting arm 912 connected to an internal driving unit (not shown), and the hand 910 is installed in one end of the connecting arm 912. In the present embodiment, the transfer robot 900 includes two hands 910, but the number of hands 910 can be increased according to the process efficiency of the substrate processing system 10. A rotating unit (not shown) is installed below the hand driver 920. The rotating unit is coupled to the hand driver 920 and rotates to rotate the hand driver 920. Therefore, the hand 910 rotates together.

[0108] The horizontal driver 930 and the vertical driver 940 are installed in a body frame 990 .

[0109] The body frame 990 may be provided in the form of a plurality of frames coupled to each other. The body frame (990) may include an upper horizontal driver 930a and a lower horizontal driver 930b for guiding the manipulator body in the Y direction, a vertical auxiliary frame 992 vertically erected between the upper horizontal driver 930a and the lower horizontal driver 930b, a horizontal auxiliary frame 993 extending parallel to the lower horizontal driver 930b to form the shape of the body frame 990, and a coupling auxiliary frame 994 forming the side shape of the body frame 990 by coupling the upper horizontal driver 930a and the lower horizontal driver 930b to the ends of the horizontal auxiliary frame 993.

[0110] In this way, since the main body frame 990 is constructed by combining the plurality of auxiliary frames 992 , 993 , and 994 , its rigidity is enhanced, and its durability of fully maintaining its shape even when used for a long time is enhanced.

[0111] As described above, horizontal drivers 930a and 930b are drive guides for moving the robot body 902 in the aforementioned Y direction, and are coupled to opposite front ends of the vertical driver 940. Specifically, in the horizontal drivers 930a and 930b, a horizontal drive (not shown) including a conveyor belt is specifically built into the inner surface of the lower horizontal driver 930b. Therefore, the robot body 902 moves horizontally along the horizontal drivers 930a and 930b by driving the conveyor belt.

[0112] The vertical drive 940 is a type of drive unit for moving the robot body 902 in the Z direction, and is coupled to the upper horizontal drive 930b and the lower horizontal drive 930a. Therefore, the robot body 902 can be guided and moved in the Y direction by the horizontal drives 930b and 930a, and can also be guided and moved in the Z direction by the vertical drive 940. In other words, the robot body 902 can move in an inclined direction corresponding to the sum of the Y and Z directions.

[0113] Meanwhile, since the vertical driver 940 is composed of a plurality of vertical frames spaced apart from each other, for example, two vertical frames, the robot body 902 can freely enter and exit the space between the two frames.

[0114] A vertical direction drive (hereinafter referred to as a vertical drive) including a conveyor belt is built into a vertical frame 950 of the vertical drive 940 .

[0115] Figure 10 FIG2 is a structural diagram showing a liquid supply unit.

[0116] Reference Figure 10 , the liquid supply unit 1400 may include a nozzle 1420, a liquid containing member 1410, a liquid supply line 1430, a collection tank 1450, a pump 2000, a filter 1460 and a purge line 1470. Herein, the nozzle may include Figure 7 14. The first nozzle 1420a, the second nozzle 1420b and the treatment liquid nozzle 1440 are shown in FIG.

[0117] The liquid supply line 1430 connects the nozzle 1420 to the liquid holding member 1410. A collection tank 1450, a pump 2000, and a filter 1460 are installed between the nozzle 1420 and the liquid holding member 1410. The liquid holding member 1410 has a storage space for holding the treatment liquid. The liquid holding member 1410 can be a bottle in which the treatment liquid is held. The treatment liquid can be a photosensitive liquid containing fluorine (F).

[0118] Bubbles of the treatment liquid flowing through the liquid supply line 1430 may be removed from the collection tank 1450. The collection tank 1450 is provided between the nozzle 1420 and the liquid containing member 1410 in the liquid supply line 1430.

[0119] The pump 2000 squeezes the liquid supply line 1430 so that the treatment liquid flowing through the liquid supply line 1430 is supplied toward the nozzle 1420. The pump 2000 is provided downstream of the collection tank 1450 in the liquid supply line 1430. According to an exemplary embodiment, the pump 2000 can discharge the treatment liquid in the tube by applying a torsional force to the tube to cause a volume change of the tube.

[0120] The filter 1500 filters impurities from the treatment liquid flowing through the liquid supply line 1200. The filter 1500 is provided between the collection tank 1300 and the pump 2000 in the liquid supply line 1200. The filter 1500 may be provided in the liquid supply line 1200 closer to the pump 2000 than the collection tank 1300. When the treatment liquid passes through the filter 1500, impurities are filtered from the treatment liquid.

[0121] The purge line 1470 is connected to the liquid supply line 1200 so that the process liquid passing through the pump 2000 is returned to the collection tank 1300 .

[0122] Figure 11 To show Figure 10 The view of the pump shown, Figure 12 To show Figure 11 A perspective view of the pump is shown, and Figure 13 is a graph showing the volume change of the hose due to the winding operation.

[0123] Reference Figures 11 to 13 The pump 2000 may include a tubular member 2100 and a driver 2900. The pump 2000 uses a method of discharging the treatment liquid from the tubular member 2100 by applying a torsional force to the tubular member 2100 to cause a volume change of the tubular member 2100.

[0124] For example, the tubular member 2100 may include a flexible hose 2140 , a cylindrical drum 2110 configured to wrap the hose thereon, a first flange 2120 provided in one end of the drum 2110 , and a second flange 2130 provided in the other end of the drum 2110 .

[0125] Hose 2140 is wound around drum 2110 by an externally applied rotational force, causing the hose's volume to change. Hose 2140 can be made of a flexible polymer material. Hose 2140 can be made of any material, as long as it can be flattened while being wound around drum 2110 when an external force is applied to it. Preferably, hose 2140 is manufactured to have an elastic restoring force, allowing it to return to its original state when the externally applied force is released. Hose 2140 can be manufactured without an elastic restoring force. This is because hose 2140 can return to its original state by twisting it using an externally applied force. However, if hose 2140 is manufactured to have an elastic restoring force and can return to its original state on its own, the load of the externally applied force can be reduced. Therefore, hose 2140 is preferably manufactured to have an elastic restoring force.

[0126] The opposite end of the hose 2140 is open so that the treatment fluid can enter and leave the hose. One end of the hose is connected to the first flange 2120, while the other end of the hose 2140 is connected to the second flange 2130.

[0127] The first flange 2120 may have an inlet 2122 formed to introduce the treatment liquid into the hose. The first flange 2120 may be provided with a first flow path 2124 connecting the inlet 2122 and the upper end of the hose 2140.

[0128] The second flange 2130 may have an outlet 2132 for discharging the treatment fluid from the hose. The second flange 2130 may be provided with a second flow path 2134 connecting the outlet 2132 and the lower end of the hose 2140.

[0129] The first flange 2120 can be fixed to a separate structure so that rotation is not allowed. The second flange 2130 can be connected to the driver 2900 to receive the rotational force and be rotated. Although not shown, the second flange 2130 may include an inner flange that rotates through the rotation axis 2920 and an outer flange having an outlet 2132. The outer flange may be provided with a bearing between the inner flange and the outer flange so that even when the inner flange rotates, the outer flange cannot rotate, and the second flow path may be provided to the inner flange and the outer flange. Due to this structure, it is possible to prevent the liquid supply line 1430 connected to the discharge port 2132 from twisting when the second flange 2130 rotates.

[0130] The hose 2140 may be provided in a coiled state around the drum 2110, but the present invention is not limited thereto. However, if the hose 2140 is initially loosely wound around the drum 2110, the volume of the hose 2140 can be rapidly changed when the driver 2900 winds the hose 2140, allowing for a stable winding operation. The number of windings of the hose may vary.

[0131] Driver 2900 can provide rotational force to cause hose 2140 to wrap around drum 2110. Driver 2900 can be a motor. Driver 2900 can include a speed reducer for speed adjustment. Driver 2900 is connected to second flange 2130. The rotational force of driver 2900 is provided to second flange 2130. When the second flange rotates, the lower end of the hose rotates together. In this case, the drum does not rotate. For the winding operation of hose 2140, driver 2900 can transmit the rotational force to the second flange, and can simultaneously deform according to the change in hose length. For example, the rotation axis 2920 of driver 2900 can be configured in a ball screw manner. Second flange 2130 can be connected to the rotation axis 2920 using a ball screw structure to achieve rotation and vertical movement.

[0132] According to the present invention, since the motor force of the driver 2900 is transmitted as a force to directly wrap the hose 2140 around the drum 2110, no additional equipment is required to change the direction of the force, thereby reducing the size of the pump.

[0133] The pump having the above-described structure operates as follows.

[0134] In a state where the inlet 2122 is opened and the outlet 2132 is closed as a suction operation of the pump 2100, when the hose 2140 returns to its original state, the treatment liquid is introduced into the hose 2140 through the inlet 212. In a state where the inlet 2122 is closed and the outlet 2132 is opened as a discharge operation of the pump 2100, when the hose 2140 rotates, the hose 2140 is flattened, and the treatment liquid filled in the hose is discharged through the outlet 2132.

[0135] Since the pump 2000 having the above structure is manufactured by twisting the hose 2140, it is possible to discharge a large amount of chemical liquid with a low rotation torque in a small space and with a small rotation amount.

[0136] Figure 14 is a front view showing a second embodiment of the pump, and Figure 15 It is a cross-sectional perspective view of a tubular component.

[0137] like Figure 14 and Figure 15As shown, the pump 2000a includes a tubular member 2100a and a driver 2900a, and the tubular member 2100a and the driver 2900a are configured to Figure 11 The configurations and functions of the tubular member 2100 and the driver 2900 of the pump 2000 shown in FIG. 2 are substantially the same as those of the embodiment 2. Hereinafter, the second embodiment will be described based on the differences from the present embodiment.

[0138] In an example of the present invention, the tubular member 2100a is characterized in that it has a sealed housing 2300. The sealed housing 2300 can be arranged between the first flange 2120 and the second flange 2130, so that the hose 2140 and the roller 2110 are isolated from the external environment. The sealed housing 2300 can prevent the chemical liquid from leaking to the outside of the pump when it is discharged from the hose 2140. For example, the sealed housing 2300 can be arranged in a cylindrical shape. The sealed housing 2300 can be filled with an incompressible fluid inside. The incompressible fluid can be an inert gas (e.g., nitrogen) or a liquid. The incompressible fluid filled in the sealed housing 2300 blocks moisture penetration. One end of the sealed housing 2300 can be fixed to the first flange 2120, and the other end of the sealed housing 2300 can be connected to the second flange 2130, and a bearing (not shown) can be arranged therebetween. (When the second flange rotates, the sealed housing is prevented from rotating).

[0139] Figure 16A and 16B To show Figure 11 A view of a first modified embodiment of a tubular member is shown.

[0140] exist Figure 16A and 16B In the embodiment, the tubular member 21b may include two or three hoses 2140, and the hoses 2140 are wound around the drum 2110 in the same direction so as not to overlap with each other.

[0141] Figure 17 and 18 It is a view showing a second modified embodiment of the pump.

[0142] Reference Figure 17 and Figure 18 The pump 2000c includes a tubular member 2100c and a driver 2900c, and the tubular member 2100c and the driver 2900c are configured to Figure 11 The configuration and function are the same as those of the tubular member 2100 and the driver 2900 of the illustrated pump 2000. Hereinafter, a second modified example will be described based on differences from the present embodiment.

[0143] In this modified embodiment, the hose 2140c may be provided on the drum 2110 in an unwound state rather than a pre-wound state. During the discharge operation of the chemical liquid of the pump, the hose is wound around the drum by the driver, and during the suction operation of the chemical liquid of the pump, the hose is wound around the drum. Figure 17 Shown unwound.

[0144] Figure 19 and 20 2 is a view showing a third embodiment of a pump.

[0145] Reference Figure 19 and Figure 20 The pump 2000d includes a tubular member 2100d and a driver 2900d, and the tubular member 2100d and the driver 2900d are configured to Figure 11 The tubular member 2100 and the driver 2900 of the illustrated pump 2000 have substantially the same configuration and function. Hereinafter, the third embodiment will be described based on differences from the present embodiment.

[0146] According to the third embodiment, the roller 2110d of the tubular member 2100d can be made of a flexible material. The roller 2110d can provide an internal space (called a pump chamber 2118) connecting the chemical liquid inlet 2122 and the chemical liquid outlet 2132. The roller 2110d is twisted by the rotation of the second flange 2130d, and the chemical liquid can be discharged by the volume change caused by the twisting of the roller 2110d. The hose 2140d is not used to supply the chemical liquid, but is used to squeeze the roller 2110d. However, the hose 2140d can also be used to supply the chemical liquid, such as Figure 11 If the hose 2140d is used to supply the chemical liquid, both ends of the hose 2140d may be connected to the first flow path 2124d of the first flange 2120d and the second flow path 2134d of the second flange 2130.

[0147] Figure 21 To show Figure 19 A diagram of a modified embodiment of the pump is shown.

[0148] Reference Figure 21The lower end of the hose 2140e can be fixed to a separate rotating ring 2150. The rotating ring 2150 can be mounted on the upper surface of the second flange 2130e and can rotate around the axis of the roller 2110e. The rotating ring 2150 can be rotated by a driver 2900e. The driver 2900e can rotate the rotating ring 2150 via a power transmission device 2197 such as a gear. In this case, the second flange 2130e and the roller 2110e rotate. In this modified embodiment, only the hose 2140e can rotate independently to surround and squeeze the roller 2110e.

[0149] Figure 22 2 is a view showing a fourth embodiment of a pump.

[0150] Reference Figure 22 The sealed housing 2300f of the pump 2000f can be configured in the form of a bellows. In this case, the sealed housing 2300f can be provided to allow the bellows joint 2310 (i.e., the middle portion) to rotate. When the hose 2140f is twisted by the driver 2900f, the total length of the hose changes. To compensate for this change, the driver 2900f can include a compensating member 2990. The compensating member 2990 can be configured in the form of a ball screw. The second flange 2130f can rotate and move up and down on the ball screw.

[0151] Figure 23 2 is a view showing a fifth embodiment of a pump.

[0152] Reference Figure 23 The tubular member 2100g of the pump 2000g may include three hoses 2140-1, 2140-2, and 2140-3, and each hose may receive a treatment liquid from a different chemical supply source P1, P2, and P3, respectively. One end of the three hoses 2140-1, 2140-2, and 2140-3 is connected to the first flange 2120, and the other ends of the three hoses 2140-1, 2140-2, and 2140-3 are merged into one and then connected to the second flange 2130.

[0153] The first flange 2120 may have inlets 2122-1, 2122-2, and 2122-3 for introducing the treatment liquid into each hose. Although not shown, the first flange 2120 may provide a flow path connecting the inlets 2122-1, 2122-2, and 2122-3 to the hoses 2140-1, 2140-2, and 2140-3. The second flange 2130 may have an outlet 2132 through which the mixed treatment liquid from the hoses 2140-1, 2140-2, and 2140-3 is discharged.

[0154] The foregoing detailed description illustrates the present invention. Further, the above content shows and describes exemplary embodiments of the present invention, and the present invention can be used in various other combinations, modifications and environments. That is, the foregoing content can be modified or amended within the scope of the inventive concept disclosed in this specification, the scope equivalent to the inventive concept disclosed herein and / or the technology or knowledge in the art. The foregoing exemplary embodiments describe the best state of the technical spirit of the present invention, and various changes required in the specific application fields and uses of the present invention are possible. Therefore, the above detailed description of the present invention is not intended to limit the present invention to the disclosed exemplary embodiments. Further, the appended claims should also be interpreted as including other exemplary embodiments.

Claims

1. A torque pump, comprising: a tubular member having a hose communicating with a chemical liquid inlet and a chemical liquid outlet, and a cylindrical roller configured to wind the hose, and configured to discharge the chemical liquid by a volume change caused by contraction of the hose wound around the roller; as well as a driver configured to provide a rotational force so that the hose is wound around the drum, Wherein, the tubular component comprises: a first flange configured to support one end of the drum; and a second flange configured to support the other end of the drum, wherein one end of the hose is connected to the first flange, and the other end of the hose is connected to the second flange, and The second flange is connected to the driver and rotates, The first flange is fixed to a separate structure so that rotation is not allowed, and the second flange includes an inner flange and an outer flange configured to rotate, the outer flange being provided with a bearing therebetween so that the outer flange cannot rotate even when the inner flange rotates.

2. The torque pump according to claim 1, wherein: The first flange is provided with the chemical liquid inlet and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and The second flange is provided with the chemical liquid outlet and a second internal flow path connecting the chemical liquid outlet and the other end of the hose.

3. The torque pump according to claim 2, wherein: The tubular member is provided with a plurality of hoses, and the plurality of hoses are wound in the same direction, and The plurality of hoses are supplied with chemical liquid from different chemical liquid sources, and the plurality of hoses are merged into one hose before discharging the chemical liquid to the chemical liquid outlet.

4. The torque pump according to claim 1, wherein: The hose is configured to be wound around the drum in a coil shape.

5. The torque pump according to claim 1, wherein: The hose is wound around the drum in a coil shape by a winding operation of the driver.

6. The torque pump according to claim 1, wherein: The torque pump further includes a sealing housing disposed between the first flange and the second flange so as to isolate the roller and the hose from an external environment.

7. The torque pump according to claim 6, wherein: The interior of the sealing shell is filled with incompressible fluid, and the sealing shell is provided in the form of a bellows.

8. The torque pump according to claim 1, wherein: The roller is made of a flexible material, and The drum provides an inner space connecting the chemical liquid inlet and the chemical liquid outlet, and the drum is twisted by the rotation of the second flange. The chemical liquid can be discharged through a volume change caused by the twisting.

9. The torque pump according to claim 1, wherein: The driver further includes a compensating member configured to compensate for vertical length deformation caused by a twisting operation of the tubular member.

10. The torque pump according to claim 9, wherein: The compensating member includes a ball screw, and The second flange is capable of rotating and moving up and down on the ball screw.

11. A device for supplying a chemical liquid, the device comprising: a pump configured to supply a chemical liquid to a nozzle, and the nozzle discharges the chemical liquid to a substrate; a collecting tank in which the chemical liquid to be supplied from the pump to the nozzle is temporarily stored; a bottle containing the chemical liquid stored in the collection tank; a filter provided on a path for supplying the chemical liquid from the collection tank to the pump; Wherein, the pump comprises: a tubular member having at least one hose and a cylindrical roller, at least one of the hoses being in communication with a chemical liquid inlet and a chemical liquid outlet, the roller being configured to wind the hose, and the tubular member being configured to discharge the chemical liquid by a volume change caused by contraction of the hose wound around the roller; and a driver configured to provide a rotational force so that the hose is wound around the drum, Wherein, the tubular component comprises: a first flange configured to support one end of the drum; and a second flange configured to support the other end of the drum, wherein one end of the hose is connected to the first flange, and the other end of the hose is connected to the second flange, and The second flange is connected to the driver and rotates, The first flange is fixed to a separate structure so that rotation is not allowed, and the second flange includes an inner flange and an outer flange configured to rotate, the outer flange being provided with a bearing therebetween so that the outer flange cannot rotate even when the inner flange rotates.

12. The device for supplying a chemical liquid according to claim 11, wherein The first flange is provided with the chemical liquid inlet and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and The second flange is provided with the chemical liquid outlet and a second internal flow path connecting the chemical liquid outlet and the other end of the hose.

13. The device for supplying a chemical liquid according to claim 11, wherein The hose is configured to be wound around the drum in a coil shape, or the hose is configured to be wound around the drum in a coil shape by a winding operation of the driver. 14 . The device for supplying chemical liquid according to claim 11 , further comprising a sealing housing provided between the first flange and the second flange so as to isolate the drum and the hose from an external environment.

15. The device for supplying a chemical liquid according to claim 14, wherein The interior of the sealing housing is filled with incompressible fluid, and the sealing housing is provided in the form of a bellows.

16. The device for supplying a chemical liquid according to claim 11, wherein The roller is made of a flexible material, and The drum provides an inner space connecting the chemical liquid inlet and the chemical liquid outlet, and the drum is twisted by the rotation of the second flange. The chemical liquid can be discharged through a volume change caused by the twisting.

17. The device for supplying a chemical liquid according to claim 11, wherein The driver further includes a compensating member configured to compensate for vertical length deformation caused by a twisting operation of the tubular member.

18. A torque pump, comprising: a tubular member having a hose and a cylindrical roller, the hose being in communication with a chemical liquid inlet and a chemical liquid outlet, the roller being provided for winding the hose, and the tubular member being configured to discharge the chemical liquid by a volume change caused by contraction of the hose wound around the roller; as well as a driver configured to provide a rotational force so that the hose is wound around the drum, Wherein, the tubular component comprises: a first flange configured to support one end of the drum; and a second flange configured to support the other end of the drum, the second flange being connected to the driver and then rotating, and The torque pump further includes a sealed housing, which is disposed between the first flange and the second flange to isolate the roller and the hose from the external environment. wherein one end of the hose is connected to the first flange, and the other end of the hose is connected to the second flange, The first flange is provided with the chemical liquid inlet and a first internal flow path connecting the chemical liquid inlet and one end of the hose, and The second flange is provided with the chemical liquid outlet and a second internal flow path, the second internal flow path connecting the chemical liquid outlet and the other end of the hose, The first flange is fixed to a separate structure so that rotation is not allowed, and the second flange includes an inner flange and an outer flange configured to rotate, the outer flange being provided with a bearing therebetween so that the outer flange cannot rotate even when the inner flange rotates.

Images