Metal mesh conductive film, manufacturing method thereof and touch display panel

Abstract

The application relates to a metal grid conductive film, a manufacturing method thereof and a touch display panel. The metal grid conductive film comprises a substrate, a first metal grid pattern and a second metal grid pattern. The substrate has a first region, a second region and a splicing region. The first metal grid pattern is arranged in the first region and the splicing region and comprises a plurality of first metal lines arranged in parallel and a plurality of second metal lines arranged in parallel. The first metal lines are connected with the second metal lines in a cross manner. The second metal grid pattern is arranged in the second region and the splicing region and comprises a plurality of third metal lines arranged in parallel and a plurality of fourth metal lines arranged in parallel. The third metal lines are connected with the fourth metal lines in a cross manner. In the splicing region, the first metal lines are connected with the fourth metal lines in a cross manner, and the third metal lines are connected with the second metal lines in a cross manner, so that the first metal grid pattern and the second metal grid pattern are spliced to form a grid pattern. The metal grid conductive film can guarantee the visual effect of the touch display panel.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of metal mesh conductive film, and particularly relates to a metal mesh conductive film, a manufacturing method thereof and a touch display panel. BACKGROUND

[0002] The metal mesh conductive film includes a substrate and a metal mesh arranged on one side of the substrate, and is commonly used as a touch sensing layer in a touch display panel. Compared with an ITO (indium tin oxide) conductive film, the metal mesh conductive film has smaller resistance and faster touch response speed, and is suitable for a large-size touch display panel.

[0003] In the related art, the metal mesh pattern is manufactured through a photolithography process. Due to the limitation of equipment size, a plurality of small-size photomasks are usually used for multiple exposure splicing to form a large-size exposure pattern, and then a large-size metal mesh pattern is formed on the substrate. In the current metal mesh conductive film, due to the influence of the alignment deviation during splicing, the pattern in the splicing area is prone to have obvious difference from the pattern in the normal area, thereby affecting the visual effect of the touch display panel. SUMMARY

[0004] Therefore, it is necessary to provide a metal mesh conductive film, a manufacturing method thereof and a touch display panel to ensure the visual effect of the touch display panel.

[0005] According to a first aspect of the present application, an embodiment of the present application provides a metal mesh conductive film, comprising:

[0006] a substrate having a first area, a second area and a splicing area located between the first area and the second area;

[0007] a first metal mesh pattern arranged on one side of the substrate and located in the first area and the splicing area; the first metal mesh pattern comprises a plurality of first metal lines arranged in parallel and a plurality of second metal lines arranged in parallel; the first metal lines extend along a first direction, and the second metal lines extend along a second direction; the first metal lines and the second metal lines are cross-connected; and

[0008] a second metal mesh pattern arranged on one side of the substrate and located in the second area and the splicing area; the second metal mesh pattern comprises a plurality of third metal lines arranged in parallel and a plurality of fourth metal lines arranged in parallel; the third metal lines extend along the first direction, and the fourth metal lines extend along the second direction; the third metal lines and the fourth metal lines are cross-connected;

[0009] The first direction and the second direction intersect, the arrangement density of the first metal line and the second metal line in the splicing area is less than the arrangement density of the first metal line and the second metal line in the first area; the arrangement density of the third metal line and the fourth metal line in the splicing area is less than the arrangement density of the third metal line and the fourth metal line in the second area.

[0010] In the splicing area, the first metal line and the fourth metal line are cross-connected, and the third metal line and the second metal line are cross-connected, so that the first metal mesh pattern and the second metal mesh pattern are spliced to form a mesh pattern.

[0011] In one of the embodiments, in the splicing area, the first metal line and the third metal line are arranged alternately, and the second metal line and the fourth metal line are arranged alternately.

[0012] In one of the embodiments, the line distance of the first metal line and the second metal line in the first area is equal to a first preset line distance, and the line distance of the first metal line and the second metal line in the splicing area is equal to a second preset line distance.

[0013] The line distance of the third metal line and the fourth metal line in the second area is equal to the first preset line distance, and the line distance of the third metal line and the fourth metal line in the splicing area is equal to the second preset line distance.

[0014] The ratio of the second preset line distance to the first preset line distance is 2.

[0015] In one of the embodiments, the first metal line and the second metal line form a plurality of first mesh units in the first area, and form a plurality of second mesh units and first irregular units in the splicing area.

[0016] The third metal line and the fourth metal line form a plurality of the first mesh units in the second area, and form a plurality of the second mesh units and second irregular units in the splicing area.

[0017] The second mesh units formed by the first metal line and the second metal line in the splicing area and the second mesh units formed by the third metal line and the fourth metal line in the splicing area can be spliced to form the mesh pattern; the first irregular units and the second irregular units can be spliced to form the mesh pattern.

[0018] The first mesh unit and the second mesh unit are similar quadrilaterals, and the similarity ratio of the first mesh unit and the second mesh unit is 2.

[0019] In one of the embodiments, the first mesh unit and the second mesh unit are in a diamond shape.

[0020] In one of the embodiments, the line width of the first metal line and the second metal line in the first region is greater than the line width of the first metal line and the second metal line in the splicing region.

[0021] The line width of the third metal line and the fourth metal line in the second region is greater than the line width of the third metal line and the fourth metal line in the splicing region.

[0022] According to a second aspect of the present application, the embodiments of the present application further provide a touch display panel, comprising a touch sensing layer, the touch sensing layer being configured as the above-mentioned metal mesh conductive film.

[0023] According to a third aspect of the present application, the embodiments of the present application further provide a manufacturing method of a metal mesh conductive film, used for manufacturing the above-mentioned metal mesh conductive film.

[0024] The manufacturing method comprises:

[0025] providing a photoresist plate, the photoresist plate comprising the substrate, the metal layer and the photoresist layer which are sequentially stacked;

[0026] forming a first exposure pattern corresponding to the first metal mesh pattern and a second exposure pattern corresponding to the second metal mesh pattern on the photoresist layer;

[0027] developing, etching and removing the photoresist plate, so that the metal layer forms the first metal mesh pattern and the second metal mesh pattern on one side of the substrate.

[0028] In one of the embodiments, the forming of the first exposure pattern corresponding to the first metal mesh pattern and the second exposure pattern corresponding to the second metal mesh pattern on the photoresist layer specifically comprises:

[0029] positioning a first photomask relative to the photoresist plate through a first alignment mark on the photoresist plate, and exposing the photoresist plate through the first photomask to form the first exposure pattern;

[0030] positioning a second photomask relative to the photoresist plate through a second alignment mark on the photoresist plate, and exposing the photoresist plate through the second photomask to form the second exposure pattern.

[0031] In one of the embodiments, the first alignment mark and the second alignment mark are the same alignment mark.

[0032] In one embodiment, before forming the first exposure pattern corresponding to the first metal mesh pattern and the second exposure pattern corresponding to the second metal mesh pattern on the photoresist layer, the method further includes:

[0033] The first alignment mark and the second alignment mark are formed on the photoresist plate.

[0034] In the aforementioned conductive metal mesh film, electrical connections are achieved through the cross-connection of metal lines in the splicing area. This ensures reliable connections while maintaining the pattern in the splicing area as consistent as possible with the pattern in the regular area. Since the connections between the first and second metal lines, and between the third and fourth metal lines in the splicing area, are formed by a single exposure pattern, they are unaffected by alignment deviations. Alignment deviations only affect the connections between the first and fourth metal lines, and between the second and third metal lines, thus reducing the impact of alignment deviations on the pattern in the splicing area and ensuring the visual effect of the touch display panel. Furthermore, the connections between the first and second metal lines, and between the third and fourth metal lines in the splicing area, also ensure a larger number of connection points, reducing the risk of touch function failure and improving product yield. Attached Figure Description

[0035] Figure 1 This is a schematic diagram of the structure of the metal mesh conductive film in one embodiment of this application;

[0036] Figure 2 for Figure 1 A schematic diagram of the structure of the first metal mesh pattern in the metal mesh conductive film shown;

[0037] Figure 3 for Figure 1 A schematic diagram of the structure of the second metal mesh pattern in the metal mesh conductive film shown;

[0038] Figure 4 This is a schematic diagram of the structure of the metal mesh conductive film in another embodiment of this application;

[0039] Figure 5 for Figure 4 A schematic diagram of the structure of the first metal mesh pattern in the metal mesh conductive film shown;

[0040] Figure 6 for Figure 4 A schematic diagram of the structure of the second metal mesh pattern in the metal mesh conductive film shown;

[0041] Figure 7 This is a schematic diagram of the structure of the metal mesh conductive film in another embodiment of this application;

[0042] Figure 8 for Figure 7Structure diagram of the first metal mesh pattern in the metal mesh conductive film shown in the figure;

[0043] Figure 9 For Figure 7 Structure diagram of the second metal mesh pattern in the metal mesh conductive film shown in the figure;

[0044] Figure 10 Structure diagram of the first metal line in an embodiment of the present application;

[0045] Figure 11 Flow diagram of the manufacturing method of the metal mesh conductive film in an embodiment of the present application;

[0046] Figure 12 Alignment diagram of the photoresist plate and the first mask and the second mask in an embodiment of the present application;

[0047] Figure 13 For Figure 12 Structure diagram of the first mask in the figure;

[0048] Figure 14 For Figure 12 Structure diagram of the second mask in the figure.

[0049] Explanation of reference signs:

[0050] 10, substrate A, first area

[0051] B, second area C, splicing area

[0052] 20, first metal mesh pattern 21, first metal line

[0053] 211, first main body part 212, first extension part

[0054] 22, second metal line 30, second metal mesh pattern

[0055] 31, third metal line 32, fourth metal line

[0056] m1, first mesh unit m2, second mesh unit

[0057] 100, photoresist plate 200, first mask

[0058] 210, first light shielding structure 220, first alignment structure

[0059] 300, second mask 310, second light shielding structure

[0060] 320, second alignment structure DETAILED DESCRIPTION

[0061] In order to make the above objectives, features and advantages of the present application more clear and understandable, the detailed description of the embodiments of the present application is made below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, the present application can be practiced in many different ways from what is described herein, and should not be construed as being limited to the embodiments set forth herein, but should be understood to include all possible embodiments that can be made within the scope of the present application.

[0062] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and therefore should not be construed or implied to indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the present application.

[0063] In addition, the terms "first", "second", "third" and the like are used only for descriptive purposes, and should not be construed as indicating or implying relative importance or implying a specific number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise explicitly specified and limited.

[0064] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integral; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through intermediate medium, or it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0065] In the present application, unless otherwise explicitly specified and limited, the first feature is "on" or "under" the second feature, which can be direct contact between the first and second features, or indirect contact between the first and second features through intermediate medium. Moreover, the first feature "above", "above" and "above" the second feature can be directly above or obliquely above the first feature, or only indicate that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature can be directly below or obliquely below the first feature, or only indicate that the horizontal height of the first feature is less than that of the second feature.

[0066] It is to be understood that where an element such as a layer, region or substrate is described as being "on" or "connected" to another element, it can be directly on or connected to the other element or intervening elements can be present. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0067] Figure 1 A structure diagram of a metal mesh conductive film in an embodiment of the present application is shown; Figure 2 A structure diagram of a metal mesh conductive film in an embodiment of the present application is shown; Figure 1 A structure diagram of a first metal mesh pattern in the metal mesh conductive film is shown; Figure 3 A structure diagram of a metal mesh conductive film in an embodiment of the present application is shown; Figure 1 A structure diagram of a second metal mesh pattern in the metal mesh conductive film is shown.

[0068] Referring to Figures 1 to 3 , an embodiment of the present application provides a metal mesh conductive film, which includes a substrate 10, a first metal mesh pattern 20 and a second metal mesh pattern 30. The substrate 10 has a first region A, a second region B and a joint region C between the first region A and the second region B. The first metal mesh pattern 20 is disposed on one side of the substrate 10 and located in the first region A and the joint region C. The first metal mesh pattern 20 includes a plurality of first metal lines 21 arranged in parallel and a plurality of second metal lines 22 arranged in parallel. The first metal lines 21 extend in a first direction (a direction in the figure), the second metal lines 22 extend in a second direction (b direction in the figure), and the first metal lines 21 and the second metal lines 22 are connected in cross. The second metal mesh pattern 30 is disposed on one side of the substrate 10 and located in the second region B and the joint region C. The second metal mesh pattern 30 includes a plurality of third metal lines 31 arranged in parallel and a plurality of fourth metal lines 32 arranged in parallel. The third metal lines 31 extend in the first direction, the fourth metal lines 32 extend in the second direction, and the third metal lines 31 and the fourth metal lines 32 are connected in cross.

[0069] Wherein the first direction and the second direction intersect, the arrangement density of the first metal lines 21 and the second metal lines 22 in the joint region C is less than the arrangement density of the first metal lines 21 and the second metal lines 22 in the first region A. The arrangement density of the third metal lines 31 and the fourth metal lines 32 in the joint region C is less than the arrangement density of the third metal lines 31 and the fourth metal lines 32 in the second region B. In the joint region C, the first metal lines 21 and the fourth metal lines 32 are connected in cross, and the third metal lines 31 and the second metal lines 22 are connected in cross, so that the first metal mesh pattern 20 and the second metal mesh pattern 30 are jointed to form a mesh pattern.

[0070] In some embodiments of the related technology, the first metal mesh pattern and the second metal mesh pattern are spliced by overlapping points in the splicing area to realize electrical connection of the lines. Considering the influence of alignment deviation during splicing, the size of the overlapping points needs to be increased to ensure the connection reliability, but too large overlapping points will affect the visual effect of the touch display panel. In the metal mesh conductive film of the embodiments of the present application, the lines are cross-connected in the splicing area C to realize electrical connection of the lines, which ensures the connection reliability while keeping the pattern of the splicing area C consistent with the pattern of the normal area (i.e. the first area A and the second area B) as much as possible, thereby ensuring the visual effect of the touch display panel.

[0071] In some other embodiments of the related technology, the first metal mesh pattern has only one kind of metal line arranged in parallel in the splicing area, the second metal mesh pattern has only another kind of metal line arranged in parallel in the splicing area, and the extension directions of the two kinds of metal lines intersect. In the ideal case where there is no alignment deviation, the pattern of the splicing area can be consistent with the pattern of the normal area. However, in the actual case where there is alignment deviation, the connection of all metal lines in the splicing area is affected by the alignment deviation, which leads to a significant difference between the pattern of the splicing area and the pattern of the normal area, affecting the visual effect of the touch display panel. At the same time, the insufficient number of connection points between the metal lines in the splicing area also increases the risk of failure of the touch function, resulting in low product yield.

[0072] In the metal mesh conductive film of the embodiments of the present application, the connection of the first metal line 21 and the second metal line 22 and the connection of the third metal line 31 and the fourth metal line 32 in the splicing area C are formed by a single exposure pattern, which is not affected by the alignment deviation. The alignment deviation only affects the connection of the first metal line 21 and the fourth metal line 32 and the connection of the second metal line 22 and the third metal line 31, thereby reducing the influence of the alignment deviation on the pattern of the splicing area C, to ensure the visual effect of the touch display panel. In addition, the connection of the first metal line 21 and the second metal line 22 and the connection of the third metal line 31 and the fourth metal line 32 in the splicing area C also ensure a large number of connection points, reduce the risk of failure of the touch function, and improve the product yield.

[0073] Continuing to refer to Figure 1In some embodiments, in the splicing area C, the first metal wires 21 and the third metal wires 31 are arranged alternately, and the second metal wires 22 and the fourth metal wires 32 are arranged alternately. In this way, in the splicing area C, the number of the first metal wires 21, the second metal wires 22, the third metal wires 31 and the fourth metal wires 32 is approximately equal and arranged uniformly. In one aspect, the uniformity of the arrangement helps to reduce the difference between the pattern of the splicing area C and the pattern of the normal area, thereby ensuring the visual effect of the touch display panel. In another aspect, in the case that the total number of the metal wires in the splicing area C is constant, the approximately equal number of the four kinds of metal wires can maximize the number of the connection points of the first metal wires 21 and the fourth metal wires 32 and the second metal wires 22 and the third metal wires 31, thereby improving the connection reliability of the first metal mesh pattern 20 and the second metal mesh pattern 30.

[0074] As an optional implementation, referring to Figure 2 , the line distance H11 and H21 of the first metal wires 21 and the second metal wires 22 in the first area A is equal to the first preset line distance. The line distance H12 and H22 of the first metal wires 21 and the second metal wires 22 in the splicing area C is equal to the second preset line distance. The line distance H31 and H41 of the third metal wires 31 and the fourth metal wires 32 in the second area B is equal to the first preset line distance, and the line distance H32 and H42 of the third metal wires 31 and the fourth metal wires 32 in the splicing area C is equal to the second preset line distance. The ratio of the second preset line distance to the first preset line distance is 2. In this way, in the splicing area C, the distance between the adjacent first metal wires 21 and the third metal wires 31, and the distance between the adjacent second metal wires 22 and the fourth metal wires 32 can be close to the first preset line distance, which helps to reduce the difference between the pattern of the splicing area C and the pattern of the normal area, thereby ensuring the visual effect of the touch display panel.

[0075] Figure 4 Fig. 2 shows a structure schematic diagram of a metal mesh conductive film in another embodiment of the present application; Figure 5 Fig. 3 shows a structure schematic diagram of a first metal mesh pattern in the metal mesh conductive film shown in Fig. 2; Figure 4 Fig. 4 shows a structure schematic diagram of a second metal mesh pattern in the metal mesh conductive film shown in Fig. 2. Figure 6 Fig. 5 shows a structure schematic diagram of a metal mesh conductive film in another embodiment of the present application; Figure 4 Fig. 6 shows a structure schematic diagram of a first metal mesh pattern in the metal mesh conductive film shown in Fig. 5;

[0076] Fig. 7 shows a structure schematic diagram of a second metal mesh pattern in the metal mesh conductive film shown in Fig. 5. Figures 4 to 6In some embodiments, the first metal line 21 and the second metal line 22 form a plurality of first mesh units m1 in the first area A and a plurality of second mesh units m2 and a first irregular unit in the splicing area C. The third metal line 31 and the fourth metal line 32 form a plurality of first mesh units m1 in the second area B and a plurality of second mesh units m2 and a second irregular unit in the splicing area C. The second mesh units m2 formed by the first metal line 21 and the second metal line 22 in the splicing area C and the second mesh units m2 formed by the third metal line 31 and the fourth metal line 32 in the splicing area C can be spliced to form a mesh pattern, and the first irregular unit and the second irregular unit can be spliced to form a mesh pattern. The first mesh unit m1 and the second mesh unit m2 are similar quadrilaterals, and the similarity ratio of the first mesh unit m1 and the second mesh unit m2 is 2.

[0077] In this way, the shape of the second mesh unit m2 is the same as that of the first mesh unit m1, and the plurality of second mesh units m2, the first irregular unit and the second irregular unit can be spliced to form a plurality of mesh patterns which are the same as or similar to the first mesh unit m1, which helps to reduce the difference between the pattern of the splicing area C and the pattern of the regular area, thereby ensuring the visual effect of the touch display panel. Optionally, the shape of the first mesh unit m1 and the second mesh unit m2 is a rhombus.

[0078] Figure 7 A structure schematic diagram of a metal mesh conductive film in another embodiment of the present application is shown; Figure 8 A structure schematic diagram of a metal mesh conductive film in another embodiment of the present application is shown; Figure 7 A structure schematic diagram of a first metal mesh pattern in the metal mesh conductive film is shown; Figure 9 A structure schematic diagram of a first metal mesh pattern in the metal mesh conductive film is shown; Figure 7 A structure schematic diagram of a second metal mesh pattern in the metal mesh conductive film is shown.

[0079] Referring to Figures 7 to 9 In some embodiments, Figure 4 The metal mesh pattern shown in the above embodiment can still be applicable to the splicing arrangement mode after being rotated by 90 degrees.

[0080] Figure 10 A structure schematic diagram of a first metal line in an embodiment of the present application is shown.

[0081] In some embodiments, the line width of the first metal line 21 and the second metal line 22 in the first area A is greater than the line width of the first metal line 21 and the second metal line 22 in the splicing area C. The line width of the third metal line 31 and the fourth metal line 32 in the second area B is greater than the line width of the third metal line 31 and the fourth metal line 32 in the splicing area C. Since the splicing area C is prone to change in mesh density due to alignment offset, reducing the line width of each metal line in the splicing area C helps to reduce the influence of the change in mesh density on the visual effect.

[0082] For example, referring to Figure 10 Some first metal wires 21 extend from the first area A to the splicing area C, and the first metal wires 21 include a first main body part 211 and a first extension part 212 connected to the first main body part 211, and the line width W11 of the first main body part 211 is greater than the line width W12 of the first extension part 212. The second metal wires 22 extending from the first area A to the splicing area C, and the third metal wires 31 and the fourth metal wires 32 extending from the second area B to the splicing area C are the same, and are not described here.

[0083] Based on the same inventive concept, the embodiment of the present application also provides a touch display panel, which comprises a touch sensing layer configured as the above-mentioned metal mesh conductive film to ensure the visual effect of the touch display panel.

[0084] Figure 11 It is a flowchart of the manufacturing method of the metal mesh conductive film in an embodiment of the present application.

[0085] Based on the same inventive concept, the embodiment of the present application also provides a manufacturing method of a metal mesh conductive film, which is used to manufacture the above-mentioned metal mesh conductive film. The manufacturing method comprises the following steps:

[0086] S101, providing a photoresist plate. The photoresist plate comprises a substrate, a metal layer and a photoresist layer which are sequentially stacked.

[0087] S102, forming a first exposure pattern corresponding to the first metal mesh pattern and a second exposure pattern corresponding to the second metal mesh pattern on the photoresist layer.

[0088] S103, developing, etching and removing the photoresist plate to form the first metal mesh pattern and the second metal mesh pattern on the substrate side of the metal layer.

[0089] In the above-mentioned manufacturing method, the first exposure pattern and the second exposure pattern are spliced to form a larger exposure pattern, and then a large-size metal mesh pattern is formed on the substrate, so that a large-size metal mesh conductive film is formed by using a small-size device. The first exposure pattern ensures the connection of the first metal wires 21 and the second metal wires 22 in the splicing area C, and the second exposure pattern ensures the connection of the third metal wires 31 and the fourth metal wires 32 in the splicing area C. The alignment deviation only affects the connection of the first metal wires 21 and the fourth metal wires 32 and the connection of the second metal wires 22 and the third metal wires 31, thereby reducing the influence of the alignment deviation on the pattern of the splicing area C, so as to ensure the visual effect of the touch display panel.

[0090] Figure 12 The alignment of the photoresist plate with the first mask and the second mask in an embodiment of the present application is shown.Figure 13 It shows Figure 12 A schematic diagram of the structure of the first photomask in the middle; Figure 14 It shows Figure 12 A schematic diagram of the structure of the second photomask.

[0091] In some embodiments, see Figures 12 to 14 The photoresist plate 100 is provided with a first alignment mark and a second alignment mark. The first photomask 200 is provided with a first light-shielding structure 210 for forming a first exposure pattern and a first alignment structure 220 for aligning with the first alignment mark. The second photomask 300 is provided with a second light-shielding structure 310 for forming a second exposure pattern and a second alignment structure 320 for aligning with the second alignment mark.

[0092] Step S102 specifically includes positioning the first photomask 200 relative to the photoresist plate 100 using a first alignment mark on the photoresist plate 100, and exposing the photoresist plate 100 through the first photomask 200 to form a first exposure pattern. Positioning the second photomask 300 relative to the photoresist plate 100 using a second alignment mark on the photoresist plate 100, and exposing the photoresist plate 100 through the second photomask 300 to form a second exposure pattern. In this way, both the first photomask 200 and the second photomask 300 can be positioned relative to the photoresist plate 100, thereby reducing the alignment deviation between the first and second exposure patterns during splicing.

[0093] In some embodiments, prior to step S102, a first alignment mark and a second alignment mark are formed on a photoresist substrate. For example, the first alignment mark and the second alignment mark may be formed by drilling, photolithography, or printing.

[0094] Specifically Figures 12 to 14 In the illustrated embodiment, the first alignment mark and the second alignment mark are the same alignment mark 110. That is, the first alignment structure 220 of the first photomask 200 and the second alignment structure 320 of the second photomask 300 share the alignment mark 110. Thus, when the first photomask 200 is exposed and the second photomask 300 is replaced for exposure, since the alignment mark 110 is shared, the machine does not need to move the photoresist plate 100. Therefore, the material transfer accuracy of the machine is eliminated, and the alignment deviation of the first and second exposed patterns during splicing mainly depends on the alignment accuracy of the equipment, thereby further reducing the alignment deviation of the first and second exposed patterns during splicing.

[0095] In summary, in the above metal mesh conductive film, the electrical connection of the circuit is realized by the cross connection of each metal line in the splicing area C, while ensuring the reliability of the connection, the pattern of the splicing area C and the pattern of the conventional area can be kept consistent as much as possible. Since the connection of the first metal line 21 and the second metal line 22 and the connection of the third metal line 31 and the fourth metal line 32 in the splicing area C are formed by a single exposure pattern, they are not affected by the alignment deviation. The alignment deviation only affects the connection of the first metal line 21 and the fourth metal line 32 and the connection of the second metal line 22 and the third metal line 31, thereby reducing the influence of the alignment deviation on the pattern of the splicing area C, to ensure the visual effect of the touch display panel.

[0096] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described, but it should be considered that any combination of the technical features is within the scope of the present disclosure as long as the combination does not result in contradictions.

[0097] The above-described embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the patent scope. It should be noted that for those skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the protection scope of the present application. Therefore, the protection scope of the present patent should be subject to the appended claims.

Claims

1. A metal mesh conductive film, characterized by, The application relates to a substrate with a first region, a second region and a joint region between the first region and the second region; a first metal mesh pattern arranged on one side of the substrate and located in the first region and the joint region; the first metal mesh pattern comprises a plurality of first metal lines arranged in parallel and a plurality of second metal lines arranged in parallel; the first metal lines extend in a first direction and the second metal lines extend in a second direction; the first metal lines and the second metal lines are connected in cross; and a second metal mesh pattern arranged on one side of the substrate and located in the second region and the joint region; the second metal mesh pattern comprises a plurality of third metal lines arranged in parallel and a plurality of fourth metal lines arranged in parallel; the third metal lines extend in the first direction and the fourth metal lines extend in the second direction; the third metal lines and the fourth metal lines are connected in cross; wherein the first direction and the second direction intersect, the arrangement density of the first metal lines and the second metal lines in the joint region is smaller than the arrangement density of the first metal lines and the second metal lines in the first region; the arrangement density of the third metal lines and the fourth metal lines in the joint region is smaller than the arrangement density of the third metal lines and the fourth metal lines in the second region; in the joint region, the first metal lines and the fourth metal lines are connected in cross and the third metal lines and the second metal lines are connected in cross, so that the first metal mesh pattern and the second metal mesh pattern are jointed to form a mesh pattern; the line distance of the first metal lines and the second metal lines in the first region is equal to a first preset line distance and the line distance of the first metal lines and the second metal lines in the joint region is equal to a second preset line distance; the line distance of the third metal lines and the fourth metal lines in the second region is equal to the first preset line distance and the line distance of the third metal lines and the fourth metal lines in the joint region is equal to the second preset line distance; wherein the ratio of the second preset line distance to the first preset line distance is 2; in the joint region, the first metal lines and the third metal lines are arranged alternately and the second metal lines and the fourth metal lines are arranged alternately; the first metal lines and the second metal lines form a plurality of first mesh units in the first region and a plurality of second mesh units and first irregular units in the joint region; the third metal lines and the fourth metal lines form a plurality of the first mesh units in the second region and a plurality of the second mesh units and second irregular units in the joint region; wherein the second mesh units formed by the first metal lines and the second metal lines in the joint region and the second mesh units formed by the third metal lines and the fourth metal lines in the joint region can be jointed to form the mesh pattern; and the first irregular units and the second irregular units can be jointed to form the mesh pattern. ​ ​ ​ ​ ​ ​ ​ ​ ​ 2. The metal grid conductive film according to claim 1, wherein ​ 3. The metal grid conductive film according to claim 1, wherein ​ ​ ​ The first grid unit and the second grid unit are similar quadrilaterals, and a similarity ratio of the first grid unit and the second grid unit is 2.

4. The metal grid conductive film according to claim 3, wherein The first grid unit and the second grid unit are rhombuses.

5. The metal grid conductive film of claim 1, wherein, The line width of the first metal line and the second metal line in the first region is greater than the line width of the first metal line and the second metal line in the splicing region. The line width of the third metal line and the fourth metal line in the second region is greater than the line width of the third metal line and the fourth metal line in the splicing region. 6.A touch display panel, characterized in that, The metal grid conductive film comprises a touch sensing layer configured as any one of claims 1-5.

7. A method of fabricating a metal grid conductive film, characterized by, A method for manufacturing the metal grid conductive film as any one of claims 1-5. The manufacturing method comprises: providing a photoresist plate, wherein the photoresist plate comprises the substrate, the metal layer and the photoresist layer stacked in sequence; forming a first exposure pattern corresponding to the first metal grid pattern and a second exposure pattern corresponding to the second metal grid pattern on the photoresist layer; developing, etching and removing the photoresist plate to form the first metal grid pattern and the second metal grid pattern on the substrate side of the metal layer.

8. The method of manufacturing according to claim 7, wherein, The forming of the first exposure pattern corresponding to the first metal grid pattern and the second exposure pattern corresponding to the second metal grid pattern on the photoresist layer specifically comprises: positioning a first mask relative to the photoresist plate through a first alignment mark on the photoresist plate, and exposing the photoresist plate through the first mask to form the first exposure pattern; positioning a second mask relative to the photoresist plate through a second alignment mark on the photoresist plate, and exposing the photoresist plate through the second mask to form the second exposure pattern.

9. The method of manufacturing according to claim 8, wherein, The first alignment mark and the second alignment mark are the same alignment mark.

10. The method of manufacturing according to claim 8, wherein, The method further comprises, before the forming of the first exposure pattern corresponding to the first metal grid pattern and the second exposure pattern corresponding to the second metal grid pattern on the photoresist layer: forming the first alignment mark and the second alignment mark on the photoresist plate.

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