A langmuir probe fixing assembly and a plasma measuring assembly in a vacuum chamber

Abstract

This invention discloses a Langmuir probe fixing assembly for a vacuum chamber, relating to the field of nuclear fusion device technology. The probe fixing assembly includes a probe array disk and an insulating mounting structure. An array aperture platform is provided in the center of the probe array disk, and the array aperture platform is used to pass through corresponding probe array needles. One end face of the probe array disk is detachably connected to one end of the insulating mounting structure, and the other end of the insulating mounting structure is used to be fixedly connected to the inner wall of the vacuum chamber. This allows for changes in the layout of the probe array according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters. A plasma measurement assembly includes a probe array box and the aforementioned Langmuir probe fixing assembly for a vacuum chamber. One end of the probe array box is provided with probe array needles, and the end of the probe array box with the probe array needles is fixedly connected to the probe array disk.

Description

Technical Field

[0001] This invention relates to the field of nuclear fusion device technology, specifically to a Langmuir probe fixing assembly and a plasma measurement assembly in a vacuum chamber. Background Technology

[0002] For nuclear fusion reactors, measuring plasma parameters near the vacuum chamber walls is a routine requirement for all types of plasma devices. By measuring these plasma parameters, the plasma discharge conditions of the nuclear fusion reactor can be evaluated and feedback controlled. Especially for tokamak magnetic confinement fusion experimental devices, plasma parameter measurement is fundamental to studying the physical mechanisms of plasma confinement and transport during discharge operation. Furthermore, during glow discharge cleaning, plasma parameter measurement effectively assists in assessing the degree of cleaning of the vacuum chamber walls by the glow discharge.

[0003] A typical method for measuring plasma parameters is to use a Langmuir probe (hereinafter referred to as "probe"), which can be further divided into three types based on the measurement method:

[0004] 1. Saturated flow probe:

[0005] By applying a constant negative bias voltage to ground on the probe, an ion sheath layer forms on the probe surface, repelling electrons and attracting ions. When the bias voltage is high enough, the probe current saturates; this current is the saturation ion current. .

[0006] 2. Floating potential probe:

[0007] The probe is suspended in plasma, and its potential relative to ground is its suspension potential. .

[0008] 3. Dual probe pair:

[0009] A constant bias voltage is applied between the two probes, placing one probe in the ion saturation region and the other in the transition region. The voltages of the two probes relative to ground are measured as V+ and V-, respectively, and the plasma saturation ion current can also be measured. .

[0010] Based on the probe principle, combined with the effective measurement area S of the probe, the sampling resistance R, and the ion sound velocity... The parameters related to plasma and electrostatics can be calculated as follows: Electron temperature: ;density Plasma potential A pair of saturated current probes arranged circumferentially along the tokamak, facing upstream and downstream respectively, can form a circumferential Mach probe pair to measure the saturated ion current facing upstream and downstream respectively. and Using the ratio of the two It can be used to measure the circumferential Mach number.

[0011] Currently, all types of plasma devices are equipped with electrostatic probes fixed to the device wall. However, most of these probes can only measure a few plasma parameters, and the arrangement of the probe array is fixed, as is the measurement capability for plasma parameters. When experiments have different requirements for plasma parameter measurements, it is necessary to replace the entire set of fixed probes, which not only increases the workload of measurement but also increases costs because a corresponding set of probes is needed for each measurement capability. Summary of the Invention

[0012] To address the technical problem that electrostatic probes in existing nuclear fusion reactor vacuum chambers are fixed and inconvenient to replace, this invention provides a Langmuir probe fixing assembly and a plasma measurement assembly for a vacuum chamber. This assembly can change the layout of the probe array according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters.

[0013] This invention is achieved through the following technical solution:

[0014] In a first aspect, the present invention provides a Langmuir probe fixing assembly for a vacuum chamber, comprising a probe array disk and an insulating mounting structure; the probe array disk is provided with an array hole platform in the middle, the array hole platform being used to pass through the corresponding probe array needles; one end face of the probe array disk is detachably connected to one end of the insulating mounting structure, and the other end of the insulating mounting structure is used to be fixedly connected to the inner wall of the vacuum chamber.

[0015] The present invention provides a Langmuir probe fixing assembly for a vacuum chamber, wherein an array aperture platform is provided in the middle of the probe array disk, and the probe array needles can be directly inserted into the array aperture platform. One end face of the probe array disk is detachably connected to one end of the insulating mounting structure. The Langmuir probe can be fixed in the vacuum chamber simply by fixing the other end of the insulating mounting structure to the inner wall of the vacuum chamber.

[0016] Since the probe array disk and the insulating mounting structure are detachably connected, the probe array disk can be disassembled and replaced with the corresponding probe array disk and probe array body according to the experimental measurement requirements. Thus, the layout of the probe array can be flexibly changed by simply changing the probe array dial.

[0017] Meanwhile, the probe array disk is fixedly connected to the vacuum chamber through an insulating mounting structure, which can electrostatically isolate the Langmuir probe from the vacuum chamber wall, preventing the probe array disk from being grounded and thus generating a large potential difference with the plasma, which would affect the probe array's measurement of the plasma.

[0018] Therefore, the Langmuir probe fixing assembly in the vacuum chamber provided by the present invention can change the layout of the probe array according to different experimental needs, reduce the workload and economic cost of replacing the probe as a whole, and improve the probe's ability to measure plasma parameters.

[0019] In an optional embodiment, the probe array disk is fixed to the end of the insulating mounting structure by bolts, so that the connection between the probe array disk and the insulating mounting structure can withstand the high temperature, high magnetic field and high vacuum environment in the vacuum chamber, ensuring that the probe array disk can be quickly removed from the insulating mounting structure.

[0020] In an optional embodiment, the insulating mounting structure includes multiple metal support rods, the space enclosed by the support rods being able to accommodate the probe array box. An insulating gasket is provided at the end of each support rod facing the probe array disk. Using metal support rods as the supporting structure of the insulating mounting structure not only allows it to withstand the harsh working environment within a vacuum, but also facilitates fixing the insulating mounting structure to the side wall of the vacuum chamber and serves as grounding. The probe array disk is insulated from the support rods via the insulating gasket.

[0021] In an optional embodiment, the insulating installation structure further includes a fixing ring, with the middle of the plurality of support rods fixedly connected to the fixing ring, and the plurality of support rods being evenly distributed along the circumference of the fixing ring. On the one hand, connecting the plurality of support rods through the fixing ring can improve the structural strength and installation stability of the insulating installation structure, and on the other hand, it also facilitates the installation of the electromagnetic shield.

[0022] In an optional embodiment, the fixing ring is provided with a shielding mounting block made of metal, and the shielding mounting block is provided with a wire hole for threading the cable of the electromagnetic shielding device, so as to facilitate the installation of the electromagnetic shielding device. At the same time, the mounting block can also provide electromagnetic shielding protection for the cable of the electromagnetic shielding device.

[0023] In an optional embodiment, two shield mounting blocks are provided, and the two shield mounting blocks are arranged radially symmetrically about the fixing ring to ensure the stability of the shield installation.

[0024] In an optional embodiment, both the support rod and the fixing ring are made of stainless steel to ensure that they can withstand the high temperature and high magnetic field intensity environment inside the vacuum chamber.

[0025] Secondly, the present invention provides a plasma measurement assembly for a vacuum chamber, including a probe array box and the aforementioned vacuum chamber Langmuir probe fixing assembly; one end of the probe array box is provided with a probe array needle body, the end of the probe array box with the probe array needle body is fixedly connected to the probe array disk, and the probe array needle body passes through the array aperture stage; wherein, the probe array box is located within the insulating mounting structure.

[0026] The vacuum chamber plasma measurement assembly provided by this invention features a probe array box with one end of the probe array needles fixedly connected to a probe array disk. The probe array needles pass through the array aperture stage. Furthermore, because the probe array disk and the insulating mounting structure are detachably connected, the probe array disk can be disassembled and replaced with the corresponding probe array disk and probe array body according to experimental measurement requirements. This allows for flexible changes to the probe array layout simply by replacing the probe array dial. The probe array disk, fixedly connected to the vacuum chamber via the insulating mounting structure, effectively isolates the Langmuir probe from the vacuum chamber wall via electrostatics, preventing the probe array disk from grounding and generating a large potential difference with the plasma, which could affect the probe array body's measurement of the plasma.

[0027] Therefore, the vacuum chamber plasma measurement component provided by the present invention can change the layout of the probe array according to different experimental requirements, reduce the workload and economic cost of replacing the probe as a whole, and improve the probe's ability to measure plasma parameters.

[0028] In an optional embodiment, the probe array box includes an insulator, the probe array needles are fixed to the insulator, and the insulating outer casing is provided with a metal sleeve to provide radiation protection against high temperature and high magnetic field intensity to the probe array box through the metal sleeve.

[0029] In an optional embodiment, the metal sleeve is made of stainless steel to ensure that it can withstand the high temperature and high magnetic field intensity environment inside the vacuum chamber.

[0030] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0031] 1. The Langmuir probe fixing assembly in the vacuum chamber provided by this invention has an array aperture platform in the middle of the probe array disk, through which the probe array needles can be directly inserted. One end of the probe array disk is detachably connected to one end of the insulating mounting structure. Only the other end of the insulating mounting structure needs to be fixedly connected to the inner wall of the vacuum chamber. According to the experimental measurement requirements, the probe array disk can be disassembled and replaced with the corresponding probe array disk and probe array body. Thus, the layout of the probe array can be flexibly changed by simply replacing the probe array dial. At the same time, the probe array disk is fixedly connected to the vacuum chamber through the insulating mounting structure, which can play a role in electrostatic isolation between the Langmuir probe and the vacuum chamber wall, avoiding the probe array disk from grounding and generating a large potential difference with the plasma, which would affect the measurement of plasma by the probe array body. Therefore, the layout of the probe array can be changed according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters.

[0032] 2. The Langmuir probe fixing assembly in the vacuum chamber provided by this invention has a probe array box in which one end of the probe array body is fixedly connected to the probe array disk, and the probe array body passes through the array aperture stage. At the same time, since the probe array disk is detachably connected to the insulating mounting structure, the probe array disk can be disassembled and replaced with the corresponding probe array disk and probe array body according to the experimental measurement requirements. Thus, the layout of the probe array can be flexibly changed by simply replacing the probe array dial. The probe array disk is fixedly connected to the vacuum chamber through the insulating mounting structure, which can play a role in electrostatic isolation between the Langmuir probe and the vacuum chamber wall, avoiding the probe array disk from grounding and generating a large potential difference with the plasma, which would affect the measurement of plasma by the probe array body. Therefore, the layout of the probe array can be changed according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters. Attached Figure Description

[0033] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0034] In the attached diagram:

[0035] Figure 1 This is a schematic diagram of the structure of the plasma measurement component in the vacuum chamber according to an embodiment of the present invention;

[0036] Figure 2 This is a schematic diagram of the probe array disk in an embodiment of the present invention;

[0037] Figure 3 This is a schematic diagram of the insulating mounting structure according to an embodiment of the present invention;

[0038] Figure 4 This is a schematic diagram of the probe array box according to an embodiment of the present invention.

[0039] The attached diagram shows the markings and corresponding component names:

[0040] 10-Probe array disk, 11-Array aperture platform, 20-Insulating mounting structure, 21-Support rod, 22-Insulating gasket, 23-Fixing ring, 24-Shielding mounting block, 30-Probe array box, 31-Probe array needle body, 32-Insulator, 33-Metal sleeve, 34-Annular pad. Detailed Implementation

[0041] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0042] In the description of the embodiments of this application, the indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship that the product of this application is usually placed in when in use, or the orientation or positional relationship that is commonly understood by those skilled in the art. It is only for the convenience of describing this application and simplifying the description, and is not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this application.

[0043] In the description of this invention, unless otherwise explicitly specified and limited, the terms "set up," "have," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0044] Example 1

[0045] Combination Figure 1This embodiment provides a Langmuir probe fixing assembly for a vacuum chamber, including a probe array disk 10 and an insulating mounting structure 20; the probe array disk 10 has an array hole platform 11 in the middle, which is used to pass through the corresponding probe array needles 31; one end face of the probe array disk 10 is detachably connected to one end of the insulating mounting structure 20, and the other end of the insulating mounting structure 20 is used to fix it to the inner wall of the vacuum chamber.

[0046] Combination Figure 2 Specifically, the layout of the array stage holes on the probe array disk 10 is determined according to the installed probe array body, and is usually a typical three-step probe layout structure. Typically, the diameter of the probe array disk of a Langmuir probe in a vacuum chamber is 20mm to 80mm.

[0047] Combination Figure 3 The insulating mounting structure 20 includes multiple metal support rods 21. The space enclosed by the multiple support rods 21 can accommodate the probe array box 30. An insulating pad 22 is provided at the end of each support rod 21 facing the probe array disk 10. Using metal support rods 21 as the supporting structure of the insulating mounting structure 20 not only allows it to withstand the harsh working environment inside the vacuum chamber, but also facilitates the fixing of the insulating mounting structure 20 to the side wall of the vacuum chamber and serves as grounding. The probe array disk 10 is insulated from the support rods 21 by the insulating pad 22.

[0048] Based on this, the insulating installation structure 20 also includes a fixing ring 23, with the middle of the plurality of support rods 21 fixedly connected to the fixing ring 23, and the plurality of support rods 21 are evenly distributed around the fixing ring 23. On the one hand, the fixing ring 23 connects the plurality of support rods 21, which can improve the structural strength and installation stability of the insulating installation structure 20, and on the other hand, it also facilitates the installation of electromagnetic shielding devices.

[0049] The fixing ring 23 is provided with a metal shielding mounting block 24, which has a wire hole for threading the cable of the electromagnetic shielding device to facilitate the installation of the electromagnetic shielding device. At the same time, the mounting block can also provide electromagnetic shielding protection for the cable of the electromagnetic shielding device.

[0050] Typically, there are two shield mounting blocks 24, which are arranged radially symmetrically about the fixing ring 23 to ensure the stability of the shield installation.

[0051] Specifically, both the support rod 21 and the fixing ring 23 are made of stainless steel to ensure that they can withstand the high temperature and high magnetic field intensity environment inside the vacuum chamber.

[0052] It should be noted that, in this embodiment, the insulating mounting structure 20 is composed of stainless steel support legs (support rods 21), stainless steel rings (fixed rings 23), electromagnetic shielding connectors (shielding mounting blocks 24), and ceramic insulating sheets (insulating pads 22). Figure 3 As shown, there are four stainless steel support legs, each with a diameter of 4mm to 8mm and a length of 140mm to 200mm, and their bottoms are connected to the wall of the vacuum chamber; the outer diameter of the stainless steel ring is 20mm to 80mm, and it is connected to the middle section of the stainless steel support leg; the electromagnetic shielding connector is 20mm to 40mm high and is connected to the stainless steel ring; there are four ceramic insulating sheets, each with a diameter of 4mm to 8mm and a length of 10mm to 20mm.

[0053] The connection between the probe array disk 10 and the insulating mounting structure 20 can be achieved through pinning, screwing, or snap-fitting. In this embodiment, the probe array disk 10 is fixed to the end of the insulating mounting structure 20 by bolts, so that the connection between the probe array disk 10 and the insulating mounting structure 20 can withstand the high temperature, high magnetic field, and high vacuum environment inside the vacuum chamber, ensuring that the probe array disk 10 can be quickly removed from the insulating mounting structure 20.

[0054] The Langmuir probe fixing assembly in the vacuum chamber provided in this embodiment allows the probe array needle body 31 to be directly inserted into the array aperture stage 11 during use. One end face of the probe array disk 10 is detachably connected to one end of the insulating mounting structure 20. The Langmuir probe can be fixed in the vacuum chamber simply by fixing the other end of the insulating mounting structure 20 to the inner wall of the vacuum chamber.

[0055] Since the probe array disk 10 and the insulating mounting structure 20 are detachably connected, the probe array disk 10 can be disassembled and replaced with the corresponding probe array disk 10 and probe array body according to the experimental measurement requirements. Thus, the layout of the probe array can be flexibly changed by simply replacing the probe array dial.

[0056] Meanwhile, the probe array disk 10 is fixedly connected to the vacuum chamber through the insulating mounting structure 20, which can play the role of electrostatic isolation between the Langmuir probe and the vacuum chamber wall, avoiding the probe array disk 10 from being grounded and thus generating a large potential difference with the plasma, which would affect the probe array's measurement of the plasma.

[0057] In summary, the Langmuir probe fixing assembly in the vacuum chamber provided in this embodiment can change the layout of the probe array according to different experimental needs, reduce the workload and economic cost of replacing the entire probe, and improve the probe's ability to measure plasma parameters.

[0058] Example 2

[0059] Combination Figure 1This embodiment provides a plasma measurement assembly for a vacuum chamber, including a probe array box 30 and the aforementioned vacuum chamber Langmuir probe fixing assembly; one end of the probe array box 30 is provided with a probe array needle body 31, and one end of the probe array box 30 with the probe array needle body 31 is fixedly connected to the probe array disk 10, and the probe array needle body passes through the array aperture stage 11; wherein, the probe array box 30 is located within the insulating mounting structure 20.

[0060] Combination Figure 4 Specifically, the probe array box 30 includes an insulator 32, the probe array needle body 31 is fixed on the insulator 32, and the insulating outer sleeve is provided with a metal sleeve 33 to provide radiation protection against high temperature and high magnetic field intensity for the probe array box 30 through the metal sleeve 33.

[0061] The metal sleeve 33 is made of stainless steel to ensure that it can withstand the high temperature and high magnetic field intensity environment inside the vacuum chamber.

[0062] In addition, an annular pad 34 is provided between the metal sleeve 33 and the insulator 32 to fix the insulator 32 inside the metal sleeve 33.

[0063] It should be noted that, in this embodiment, the probe array box 30 is composed of a stainless steel outer casing (metal sleeve 33), a polytetrafluoroethylene gasket (annular gasket 34), a boron nitride insulator 32, connecting terminals, and probe array needles 31; specifically:

[0064] The probe array needle body 31 has a tip diameter of 2mm to 4mm and a length of 3mm to 10mm, a bottom diameter of 2mm to 4mm and a length of 4mm to 10mm, and an internal threaded hole at the bottom of the probe with a diameter of 1mm to 3mm and a depth of 3mm to 8mm.

[0065] The connecting terminal is connected to the probe array needle body 31. The top diameter is 1mm to 3mm and the length is 3mm to 8mm. It has an external thread that matches the internal thread at the bottom of the needle. The middle diameter is 2mm to 4mm and the length is 1mm to 3mm. The bottom diameter is 2mm to 4mm and the length is 3mm to 10mm.

[0066] The boron nitride insulating support is mainly composed of probe array needles 31 and connecting terminals, which are connected as a whole and insulate each part from the others. The boron nitride insulating support has a cuboid structure with a length of 100-150mm, a width of 20mm-50mm, and a height of 10mm-30mm. There is a cuboid protrusion at the front end with a length of 5mm-12mm, a width of 10mm-12mm, and a height of 14mm-20mm.

[0067] The polytetrafluoroethylene gasket has a hollow cuboid structure, with a length of 100-150mm, a width of 20mm-50mm, and a height of 1mm-3mm. The edge of the hollow structure is 2mm-5mm away from the outer edge of the gasket.

[0068] The stainless steel jacket is a cuboid structure used to house the polytetrafluoroethylene gasket and the boron nitride insulating support, forming the probe array box 30 and connected to the bottom of the probe array disk 10. It is 120-180mm long, 20mm-50mm wide, and 17mm-35mm high, with internal slots of 100-150mm long, 20mm-50mm wide, and 15mm-33mm high.

[0069] In summary, the vacuum chamber plasma measurement assembly provided in this embodiment has a probe array box 30 in which one end of the probe array needle body 31 is fixedly connected to the probe array disk 10, and the probe array needle body is inserted into the array aperture stage 11. At the same time, since the probe array disk 10 is detachably connected to the insulating mounting structure 20, the probe array disk 10 can be disassembled and replaced with the corresponding probe array disk 10 and probe array body according to the experimental measurement requirements. Thus, the layout of the probe array can be flexibly changed by simply replacing the probe array dial.

[0070] The probe array disk 10 is fixedly connected to the vacuum chamber through the insulating mounting structure 20, which can play the role of electrostatic isolation between the Langmuir probe and the vacuum wall, avoiding grounding of the probe array disk 10 and thus generating a large potential difference with the plasma, which would affect the measurement of the plasma by the probe array.

[0071] Therefore, the vacuum chamber plasma measurement component provided in this embodiment can change the layout of the probe array according to different experimental requirements, reduce the workload and economic cost of replacing the probe as a whole, and improve the probe's ability to measure plasma parameters.

[0072] The specific embodiments described above further illustrate the purpose, technical solution, and beneficial effects of the present invention. It should be understood that the above description is only a specific embodiment of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A Langmuir probe fixing assembly in a vacuum chamber, characterized by, The probe array disc (10) and the insulating mounting structure (20) are provided. The array hole platform (11) is used for penetrating the corresponding probe array needle body (31). One end of the probe array disc (10) is detachably connected with one end of the insulating mounting structure (20), and the other end of the insulating mounting structure (20) is used for fixedly connecting with the inner wall of the vacuum chamber.

2. The Langmuir probe fixation assembly within a vacuum chamber according to claim 1, characterized in that, The probe array disc (10) is fixed on the end of the insulating mounting structure (20) by bolts.

3. The Langmuir probe fixation assembly within a vacuum chamber according to claim 1, characterized in that, The insulating mounting structure (20) comprises a plurality of support rods (21) made of metal, and a space surrounded by the plurality of support rods (21) can accommodate the probe array box (30).

4. The Langmuir probe fixation assembly within a vacuum chamber according to claim 3, characterized in that, The support rods (21) are fixedly connected with the fixing ring (23) at the middle portions of the plurality of support rods (21), and the plurality of support rods (21) are evenly distributed along the circumference of the fixing ring (23).

5. The Langmuir probe fixation assembly within a vacuum chamber according to claim 4, characterized in that, The fixing ring (23) is provided with a shield mounting block (24) made of metal, and the shield mounting block (24) is provided with a threading hole for penetrating the cable of an electromagnetic shield.

6. The Langmuir probe fixation assembly within a vacuum chamber according to claim 5, characterized in that, The shield mounting block (24) is provided with two shield mounting blocks (24) which are symmetrically arranged about the radial direction of the fixing ring (23).

7. The Langmuir probe fixation assembly within a vacuum chamber according to claim 4, characterized in that, The support rods (21) and the fixing ring (23) are made of stainless steel.

8. A plasma measurement assembly within a vacuum chamber, characterized by, The probe array box (30) and the Langmuir probe fixing assembly in the vacuum chamber are provided. One end of the probe array box (30) is provided with the probe array needle body (31), and the end of the probe array box (30) provided with the probe array needle body (31) is fixedly connected with the probe array disc (10), and the probe array needle body (31) penetrates the array hole platform (11). The probe array box (30) is located in the insulating mounting structure (20).

9. The vacuum-chamber end plasma measurement assembly of claim 8, wherein, The probe array box (30) comprises an insulator (32), the probe array needle body (31) is fixed on the insulator (32), and the insulator (32) is sleeved with a metal sleeve (33).

10. The vacuum-chamber end plasma measurement assembly of claim 9, wherein, The metal sleeve (33) is made of stainless steel.

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