Chemical Polishing Reagent, Its Preparation Method and Application

Abstract

The present application relates to a chemical polishing reagent, a preparation method thereof, and an application thereof. The chemical polishing reagent comprises the following components in parts by mass: 0.8 to 15 parts of an alkaline reagent, 0.05 to 0.5 parts of a surfactant, and 83.5 to 99.05 parts of a polyol solvent. In the above chemical polishing reagent, a polyol organic solvent is used. When the chemical polishing reagent is used for microcrack elimination processing of glass, the temperature of the chemical polishing reaction system can be higher, enhancing the polishing ability of the chemical polishing reagent for the product. During the heating process, the polyol reacts with the alkaline reagent to generate an organic base. The organic base can enhance the corrosiveness of the chemical polishing reagent to glass, thereby achieving a better chemical polishing effect on the glass, eliminating microcracks to enhance the strength of the glass.

Description

Technical Field

[0001] This application relates to the technical field of chemical polishing, and particularly to a chemical polishing reagent, a preparation method thereof, and an application thereof. Background Art

[0002] At present, electronic products such as tablet computers and mobile phones pursue thinness and lightness, and the thickness of the glass cover plate is getting thinner and thinner. In order to reduce the drop damage of the glass cover plate, the glass cover plate needs to have higher strength. Glass is a brittle material, and there are many factors affecting its strength. Among them, the existence of surface microcracks has a great impact on the strength of glass. After the glass undergoes processes such as cutting, CNC processing, and polishing, a large number of microcracks will be generated on its surface. The existence of these microcracks will significantly reduce the strength of the glass. Therefore, eliminating these microcracks is an effective method to improve the strength of glass. At present, due to the existence of microcracks, the strength of traditional glass is relatively low. Summary of the Invention

[0003] Based on this, it is necessary to provide a chemical polishing reagent, a preparation method thereof, and an application thereof. This chemical polishing reagent can remove microcracks and improve the strength of glass.

[0004] In a first aspect, this application provides a chemical polishing reagent, including the following components in parts by mass:

[0005] 0.8 parts to 15 parts of an alkaline reagent, 0.05 parts to 0.5 parts of a surfactant, and

[0006] 83.5 parts to 99.05 parts of a polyol solvent.

[0007] In some embodiments, the polyol solvent includes one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol;

[0008] and / or, the alkaline reagent includes one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, and magnesium hydroxide;

[0009] and / or, the surfactant includes at least one of isooctyl alcohol polyoxyethylene ether phosphate and rapid penetrant T.

[0010] In some embodiments, it further includes 0.1 part to 1 part of an impurity remover in parts by mass.

[0011] In some embodiments, the impurity remover includes one or more of sodium citrate, sodium tetraborate, disodium ethylenediaminetetraacetate, and sodium gluconate.

[0012] In a second aspect, this application provides a preparation method of a chemical polishing reagent, including:

[0013] Mixing the alkaline reagent, the surfactant, and the polyol solvent.

[0014] In a third aspect, the present application provides a glass processing method, including:

[0015] Chemically polishing the glass to be treated with any of the above chemical polishing reagents or the chemical polishing reagent prepared by the above preparation method.

[0016] In some embodiments, the temperature of the chemical polishing is 60°C to 150°C.

[0017] In some embodiments, the time of the chemical polishing is 10 min to 120 min.

[0018] In some embodiments, it further includes subjecting the chemically polished glass to condensation dehydration treatment.

[0019] In some embodiments, the condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, baking condensation dehydration, and silane coupling agent condensation dehydration.

[0020] In a fourth aspect, the present application provides a glass processed by any of the above chemical polishing reagents or the chemical polishing reagent prepared by the above preparation method; or processed by any of the above glass processing methods.

[0021] In the above chemical polishing reagent, a polyol organic solvent is used as the solvent. When using this chemical polishing reagent to perform microcrack elimination processing on the glass, the temperature of the chemical polishing reaction system can be higher, enhancing the polishing ability of the chemical polishing reagent for the product. At the same time, when using a polyol organic solvent, during the chemical polishing process, the polyol reacts with the basic reagent to generate an organic base, and the organic base can enhance the corrosiveness of the chemical polishing reagent to the glass, thereby achieving a better chemical polishing effect on the glass, eliminating microcracks to enhance the strength of the glass. The surfactant can reduce the surface tension of the solution, increase the permeability and dispersibility of the solution when using this chemical polishing reagent to chemically polish the glass sample, thereby reducing the possibility of the chemical polishing product depositing on the glass surface.

[0022] In the above glass processing method, using the above chemical polishing reagent to process the glass has a good effect on eliminating glass microcracks, and the glass obtained by processing has a high strength. Detailed Embodiments

[0023] To make the above objects, features, and advantages of the present application more obvious and understandable, the following provides a detailed description of the specific embodiments of the present application. Many specific details are set forth in the following description to fully understand the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present application. Therefore, the present application is not limited by the specific embodiments disclosed below.

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terms used in the specification of this application are for the purpose of describing specific embodiments only and are not intended to limit this application. The term "and / or" as used herein includes any and all combinations of one or more of the related listed items.

[0025] An embodiment of this application provides a chemical polishing reagent, which includes the following components in parts by mass:

[0026] 0.8 to 15 parts of an alkaline reagent, 0.05 to 0.5 parts of a surfactant, and

[0027] 83.5 to 99.05 parts of a polyol solvent. In the above chemical polishing reagent, a polyol organic solvent is used as the solvent. When using this chemical polishing reagent to perform microcrack elimination processing on glass, the temperature of the chemical polishing reaction system can be higher, enhancing the polishing ability of the chemical polishing reagent for the product. At the same time, when using a polyol organic solvent, during the polishing process, the polyol reacts with the alkaline reagent to generate an organic base. The organic base can enhance the corrosiveness of the chemical polishing reagent to glass, thereby achieving a better chemical polishing effect on the glass, eliminating microcracks, and enhancing the strength of the glass. The surfactant can reduce the surface tension of the solution, increase the permeability and dispersibility of the solution when using this chemical polishing reagent to perform chemical polishing on a glass sample, thereby reducing the possibility of the deposition of chemical polishing products on the glass surface.

[0028] In some embodiments, the polyol solvent includes one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol;

[0029] and / or, the alkaline reagent includes one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, and magnesium hydroxide;

[0030] and / or, the surfactant includes at least one of isooctyl alcohol polyoxyethylene ether phosphate and penetrant T.

[0031] In some embodiments, the polyol solvent includes one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol.

[0032] In some embodiments, the alkaline reagent includes one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, and magnesium hydroxide.

[0033] In some embodiments, the surfactant includes at least one of isooctyl alcohol polyoxyethylene ether phosphate and penetrant T.

[0034] In some embodiments, the polyol solvent includes one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol; the basic reagent includes one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, and magnesium hydroxide; the surfactant includes at least one of isooctyl alcohol polyoxyethylene ether phosphate and penetrant T.

[0035] In some embodiments, it further includes 0.1 to 1 part by mass of an impurity removing agent. The impurity removing agent can reduce the influence of impurities in the reaction system on the chemical polishing effect when using the chemical polishing reagent to chemically polish the glass sample.

[0036] In some embodiments, the impurity removing agent includes one or more of sodium citrate, sodium tetraborate, disodium ethylenediaminetetraacetate, and sodium gluconate.

[0037] In some of these embodiments, the raw materials of the chemical polishing reagent are the following components in parts by mass:

[0038] 0.8 to 15 parts of the basic reagent, 0.05 to 0.5 part of the surfactant, 0.1 to 1 part of the impurity removing agent, and 83.5 to 99.05 parts of the polyol solvent. In the above chemical polishing reagent, a polyol organic solvent is used as the solvent, and the solvent does not contain water. This chemical polishing reagent is an anhydrous polishing reagent. When using this chemical polishing reagent to process the glass to eliminate microcracks, the temperature of the chemical polishing reaction system can be higher, enhancing the polishing ability of the chemical polishing reagent for the product. At the same time, when using a polyol organic solvent, during the chemical polishing process, the polyol reacts with the basic reagent to generate an organic base, and the organic base can enhance the corrosiveness of the chemical polishing reagent to the glass, thereby achieving a better chemical polishing effect on the glass, eliminating microcracks to enhance the strength of the glass. At the same time, hydrofluoric acid or concentrated sulfuric acid is not used for polishing in this chemical polishing reagent, avoiding the risk of harm to the human body when using hydrofluoric acid or concentrated sulfuric acid for polishing.

[0039] In some of these embodiments, the raw materials of the chemical polishing reagent are the following components in mass percentages:

[0040] 0.8% to 15% of the basic reagent, 0.05% to 0.5% of the surfactant, 0.1% to 1% of the impurity removing agent, and 83.5% to 99.05% of the polyol solvent.

[0041] Another embodiment of the present application provides a preparation method of a chemical polishing reagent, including:

[0042] Mix the basic reagent, the surfactant, and the polyol solvent.

[0043] In some of these embodiments, a method for preparing a chemical polishing reagent includes: mixing an alkaline reagent, a surfactant, an impurity removing agent, and a polyol solvent.

[0044] Another embodiment of the present application provides a glass processing method, including:

[0045] Performing chemical polishing on the glass to be treated using any of the above chemical polishing reagents or the chemical polishing reagent prepared by the above preparation method.

[0046] In some of these embodiments, performing chemical polishing on the glass using any of the above chemical polishing reagents or the chemical polishing reagent prepared by the above preparation method includes: heating the chemical polishing reagent to the use temperature and then corroding the glass surface.

[0047] In some of these embodiments, the temperature of chemical polishing is 60°C to 150°C. When the temperature of chemical polishing is too low, the generation of organic base is poor, and the corrosion effect of the chemical polishing reagent on the glass is poor; when the temperature of chemical polishing is too high, the volatilization of the solvent is too fast, and the chemical polishing effect is poor. Within this temperature range of chemical polishing, the corrosion effect of the chemical polishing reagent on the glass is good, and the strength of the obtained glass is high. Optionally, the temperature of chemical polishing is 60°C, 65°C, 70°C, 75°C, 80°C, 85°C, 90°C, 95°C, 100°C, 105°C, 110°C, 115°C, 120°C, 125°C, 130°C, 135°C, 140°C, 145°C or 150°C.

[0048] In some of these embodiments, the time of chemical polishing is 10 min to 120 min. When the time of chemical polishing is too short, the corrosion effect of the chemical polishing reagent on the glass is not obvious, and the glass strengthening effect is poor; when the time of chemical polishing is too long, the chemical polishing reagent corrodes the glass excessively, resulting in a decrease in glass strength. Within this time range of chemical polishing, the corrosion effect of the chemical polishing reagent on the glass is good, and the glass strength enhancement effect is good. Optionally, the time of chemical polishing is 10 min, 15 min, 20 min, 25 min, 30 min, 35 min, 40 min, 45 min, 50 min, 55 min, 60 min, 65 min, 70 min, 75 min, 80 min, 85 min, 90 min, 95 min, 100 min, 105 min, 110 min, 115 min or 120 min.

[0049] In some of these embodiments, before chemical polishing, it further includes successively performing blanking, CNC processing, polishing processing, and toughening processing on the sample to obtain the glass to be treated.

[0050] In some of these embodiments, it further includes performing condensation dehydration treatment on the glass after chemical polishing.

[0051] In some of these embodiments, the condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, baking condensation dehydration, and silane coupling agent condensation dehydration.

[0052] In some of these embodiments, the concentration of sulfuric acid in the sulfuric acid condensation dehydration is 50% to 98%. Optionally, the concentration of sulfuric acid in the sulfuric acid condensation dehydration is 50%, 52%, 54%, 56%, 58%, 60%, 65%, 70%, 75%, 80%, 85%, 90%, 92%, 94%, 96%, or 98%.

[0053] In some of these embodiments, the treatment temperature of the sulfuric acid condensation dehydration is 70°C to 90°C. Optionally, the treatment temperature of the sulfuric acid condensation dehydration is 70°C, 72°C, 74°C, 76°C, 78°C, 80°C, 82°C, 84°C, 86°C, 88°C, or 90°C.

[0054] In some of these embodiments, the temperature of the baking condensation dehydration is 250°C to 300°C. Optionally, the temperature of the baking condensation dehydration is 250°C, 260°C, 270°C, 280°C, 290°C, or 300°C.

[0055] In some of these embodiments, the glass to be treated includes at least one of soda-lime glass, high-aluminum glass, and glass-ceramics.

[0056] Another embodiment of the present application provides a glass, which is processed by the chemical polishing reagent prepared by any of the above chemical polishing reagents or the preparation method described above; or is processed by any of the above glass processing methods.

[0057] The following are specific embodiments

[0058] Example 1

[0059] In this embodiment, the chemical polishing reagent includes the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0060] The glass processing steps in this embodiment are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and tempering processing, and the tempered glass sample is chemically polished using this chemical polishing reagent. The chemical polishing time is 60 minutes, and the chemical polishing temperature is 60°C. In this embodiment, the glass sample is a Corning glass-ceramics plate of 165.74×74.35 mm. The glass samples used in the following examples and comparative examples are the same as those in Example 1.

[0061] Example 2

[0062] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0063] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and toughening. The chemically toughened glass sample is chemically polished using this chemical polishing reagent. The chemical polishing time is 60 min, and the chemical polishing temperature is 90 °C.

[0064] Example 3

[0065] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0066] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and toughening. The chemically toughened glass sample is chemically polished using this chemical polishing reagent. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C.

[0067] Example 4

[0068] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0069] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and toughening. The chemically toughened glass sample is chemically polished using this chemical polishing reagent. The chemical polishing time is 60 min, and the chemical polishing temperature is 150 °C.

[0070] Example 5

[0071] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0072] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and toughening. The chemically toughened glass sample is chemically polished using this chemical polishing reagent. The chemical polishing time is 30 min, and the chemical polishing temperature is 120 °C.

[0073] Example 6

[0074] In this embodiment, the chemical polishing reagent comprises the following components in mass percentage: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0075] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemically polished reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 120 min, and the chemical polishing temperature is 120 °C.

[0076] Example 7

[0077] In this embodiment, the chemical polishing reagent comprises the following components in mass percentage: 3% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 96.3% ethylene glycol.

[0078] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemically polished reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C.

[0079] Example 8

[0080] In this embodiment, the chemical polishing reagent comprises the following components in mass percentage: 15% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 84.3% ethylene glycol.

[0081] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemically polished reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C.

[0082] Example 9

[0083] In this embodiment, the chemical polishing reagent comprises the following components in mass percentage: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% glycerol.

[0084] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemically polished reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C.

[0085] Example 10

[0086] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0087] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemical polishing reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C. After chemical polishing, the glass is subjected to dehydration condensation post-treatment. The method of dehydration condensation post-treatment is to soak the chemically polished glass in 70% sulfuric acid at 70 °C for 30 min.

[0088] Example 11

[0089] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0090] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemical polishing reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C. After chemical polishing, the glass is subjected to dehydration condensation post-treatment. The method of dehydration condensation post-treatment is to bake the chemically polished glass at 280 °C for 30 min.

[0091] Example 12

[0092] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0093] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing processing, and toughening processing. The chemical polishing reagent is used to chemically polish the glass sample after toughening processing. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C. After chemical polishing, the glass is subjected to dehydration condensation post-treatment. The method of dehydration condensation post-treatment is to soak the chemically polished glass in 10% tetraethyl orthosilicate at 70 °C for 30 min.

[0094] Example 13

[0095] In this embodiment, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, and 91.8% ethylene glycol.

[0096] In this embodiment, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment. The chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 120 °C.

[0097] Comparative Example 1

[0098] The chemically polished reagent in this comparative example includes the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0099] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment. The chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 30 °C.

[0100] Comparative Example 2

[0101] The chemically polished reagent in this comparative example includes the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0102] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment. The chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 180 °C.

[0103] Comparative Example 3

[0104] The chemically polished reagent in this comparative example includes the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0105] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment. The chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 5 min, and the chemical polishing temperature is 60 °C.

[0106] Comparative Example 4

[0107] The chemically polished reagent in this comparative example includes the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0108] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment, and the chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 150 min, and the chemical polishing temperature is 60 °C.

[0109] Comparative Example 5

[0110] The chemically polished reagent in this comparative example includes the following components by mass percentage: 0.5% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 98.8% ethylene glycol.

[0111] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment, and the chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 60 °C.

[0112] Comparative Example 6

[0113] The chemically polished reagent in this comparative example includes the following components by mass percentage: 20% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 79.3% ethylene glycol.

[0114] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment, and the chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 60 °C.

[0115] Comparative Example 7

[0116] The chemically polished reagent in this comparative example includes the following components by mass percentage: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% ethylene glycol.

[0117] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing treatment, and tempering treatment, and the chemically polished reagent is used to chemically polish the tempered glass sample. The chemical polishing time is 60 min, and the chemical polishing temperature is 98 °C.

[0118] Comparative Example 8

[0119] In this comparative example, the chemical polishing reagent comprises the following components in mass percentages: 8% sodium hydroxide, 0.2% isooctyl polyoxyethylene ether phosphate, 0.5% sodium gluconate, and a mixed solvent of 91.3% glycerol and water (where the mass ratio of glycerol to water is glycerol: water = 95:5).

[0120] In this comparative example, the glass processing steps are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and tempering. The chemically polished reagent is used to chemically polish the tempered glass sample. The time for chemical polishing is 60 minutes, and the temperature for chemical polishing is 120 °C.

[0121] Comparative Example 9

[0122] In this comparative example, the glass sample was not chemically polished using a chemical polishing reagent. The glass processing steps in this comparative example are as follows: The glass sample is successively subjected to blanking, CNC processing, polishing, and tempering.

[0123] For Examples 1 to 13 and Comparative Examples 1 to 9, the types and mass percentages of the alkaline reagents, the types and mass percentages of the surfactants, the types and mass percentages of the impurity removers, the types and mass percentages of the polyol organic solvents, the time and temperature of chemical polishing, and the method of condensation dehydration are shown in Table 1 below:

[0124] Table 1

[0125]

[0126]

[0127]

[0128] The processed glass samples in Examples 1 to 13 and Comparative Examples 1 to 9 were tested. A static pressure testing machine was used for surface strength testing, and the surface strength of the processed glass samples was characterized by the force borne by the sample rupture. The test results are shown in Table 2 below:

[0129] Table 2

[0130]

[0131]

[0132] The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.

[0133] The above-described embodiments merely represent several implementation manners of the present application. The description thereof is relatively specific and detailed, but it should not be construed as a limitation on the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several modifications and improvements can still be made, and these all fall within the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the appended claims, and the specification can be used to explain the content of the claims.

Claims

1. A glass processing method, characterized in that, Comprising: Chemically polishing the glass to be treated with a chemical polishing reagent to eliminate cracks and enhance the strength of the glass; the chemical polishing reagent is an anhydrous polishing reagent, comprising the following components in parts by mass: 0.8 to 15 parts of an alkaline reagent, 0.05 to 0.5 parts of a surfactant, and 83.5 to 99.05 parts of a polyol solvent; the temperature of the chemical polishing is 120°C to 150°C; the time of the chemical polishing is 60 min to 120 min; Performing condensation dehydration treatment on the chemically polished glass.

2. The glass processing method according to claim 1, characterized in that, The polyol solvent includes one or more of ethylene glycol, glycerol, and polyethylene glycol; And / or, the alkaline reagent includes one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, and magnesium hydroxide; And / or, the surfactant includes at least one of isooctyl polyoxyethylene ether phosphate and rapid penetrant T.

3. The glass processing method according to any one of claims 1 to 2, characterized in that It further includes 0.1 to 1 part by mass of an impurity remover.

4. The glass processing method according to claim 3, characterized in that, The impurity remover includes one or more of sodium citrate, sodium tetraborate, disodium ethylenediaminetetraacetate, and sodium gluconate.

5. The glass processing method according to claim 1, characterized in that, The preparation method of the chemical polishing reagent includes: Mixing the alkaline reagent, the surfactant, and the polyol solvent.

6. The glass processing method according to claim 1, wherein, The condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, baking condensation dehydration, and silane coupling agent condensation dehydration.

7. A glass, characterized in that, Obtained by the glass processing method according to any one of claims 1 to 5.

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