A clean room for semiconductor factories

Abstract

The present application discloses a clean room for semiconductor manufacturing plants, belonging to the technical field of clean rooms. The clean room comprises a clean workspace, comprising a clean work area for high-precision processing and a processing service area for semiconductor pre-processing. A partition is provided between the clean work area and the processing service area, wherein curtains are provided at intervals within the partition. The curtains are arranged along the length of the partition, and filter assemblies for filtering air are provided on both sides of the adjacent curtains, each of which is spaced apart from each other. The filter assemblies include a first filter and a second filter arranged at intervals along the partition. A first ventilation system for conveying clean air is provided in both the clean work area and the processing service area, and a second ventilation system for conveying clean air is provided in the partition. The present application has the effect of improving the air cleanliness within the clean room.

Description

Technical Field

[0001] The present application relates to the technical field of clean rooms, and in particular to a clean room used in semiconductor factories. Background Art

[0002] Semiconductors, materials with electrical conductivity between conductors and insulators at room temperature, are widely used in consumer electronics, communications systems, and medical equipment. Cleanrooms are typically used to manufacture semiconductor products. Cleanrooms effectively control factors that affect production processes, such as air cleanliness, temperature, humidity, and airflow within the room or factory, meeting the semiconductor industry's stringent requirements for a safe and environmentally friendly operating environment.

[0003] In related technologies, a cleanroom typically consists of a large clean space equipped with a fresh air delivery system and an exhaust system. From top to bottom, the large clean space comprises a structured space, a clean space, and a circulation space. The large clean space also has a central aisle and at least one production aisle. Partitions surround the production aisle, creating an independent clean microenvironment between the structured space and the clean space located within the aisle. At least one ventilation duct is installed beneath the ceiling of the aisle, forming a return air channel for the clean microenvironment.

[0004] Regarding the above-mentioned related technologies, the inventor believes that when workers move semiconductor products, they need to enter the production aisle from the working area of ​​the clean room many times. A small amount of exhaust gas or corrosive gas in the working area can easily adhere to the surface of the workers' clothing, and then as the workers enter the production aisle or other clean areas, there is a possibility of affecting the cleanliness of the air in the clean space. Summary of the Invention

[0005] In order to improve the air cleanliness in a clean room, the present application provides a clean room for a semiconductor factory.

[0006] The present application provides a clean room for semiconductor factories using the following technical solutions:

[0007] A clean room for a semiconductor factory includes a clean studio, the clean studio including a clean work area for high-precision processing and a processing service area for semiconductor pre-process processing. A partition area is provided between the clean work area and the processing service area, and curtains are provided at intervals in the partition area. The curtains are arranged along the length direction of the partition area, and filter components for filtering air are provided on both sides of adjacent curtains away from each other. The filter components include a first filter mesh and a second filter mesh arranged at intervals along the partition area. A first ventilation system for conveying clean air is provided in both the clean work area and the processing service area, and a second ventilation system for conveying clean air is provided in the partition area.

[0008] By adopting the above technical solution, the setting of the curtain prevents the air in the clean working area and the processing service area from circulating with each other, and the curtain cooperates with the first filter and the second filter to form an independent space in the partition area. When the operator enters the partition area from the clean working area or the processing service area, the operator first enters the independent space in the partition area through the filter assembly. At this time, the first ventilation system cooperates with the second ventilation system to facilitate the cleaning of the operator, thereby preventing exhaust gas or corrosive gas from being brought into the partition area as the operator moves, thereby ensuring the cleanliness of the air in the large clean space outside.

[0009] Preferably, the filter assembly further includes a first guide frame and a second guide frame installed at intervals in the partition area, the first guide frame being slidably provided along its length direction with a plurality of first positioning frames for installing the first filter screen, the second guide frame being slidably provided along its length direction with a plurality of second positioning frames for installing the second filter screen, and the adjacent sides of the first filter screen and the second filter screen overlap.

[0010] By adopting the above technical solution, the setting of the first positioning frame and the second positioning frame makes it convenient for the operator to replace the first filter and the second filter. The setting of the first guide frame and the second guide frame enables the operator to move the first positioning frame and the second positioning frame respectively, thereby facilitating the operator to freely enter the separation area.

[0011] Preferably, a ceiling panel is installed on the inner top surface of the clean studio, a base is provided on the inner bottom surface of the clean studio, a first mounting groove is provided on the ceiling panel, a second mounting groove corresponding to the first mounting groove is provided on the base, the first guide frame includes a first guide rod installed on the inner end surface of the first mounting groove and a second guide rod installed on the inner end surface of the second mounting groove, the second guide frame includes a third guide rod installed on the inner end surface of the first mounting groove and a fourth guide rod installed on the inner end surface of the second mounting groove, the first guide rod and the third guide rod are arranged side by side, and the second guide rod and the fourth guide rod are arranged side by side.

[0012] By adopting the above technical solution, the arrangement of the first mounting groove and the second mounting groove facilitates the accommodation of the first guide frame and the second guide frame, thereby helping to reduce the possibility of exhaust gas or corrosive gas in the clean working area or processing service area penetrating into the separation area through the gap between the first guide frame, the second guide frame and the top surface or inner floor of the clean working area.

[0013] Preferably, a collecting cavity is provided in the base, and a plurality of air inlet holes for communicating with the collecting cavity are provided on the upper surface of the base located in the separation area. An exhaust fan for discharging the gas in the collecting cavity is provided in the base, and a negative pressure fan for communicating with the collecting cavity is provided on the exhaust fan, and an air filter is installed between the negative pressure fan and the exhaust fan.

[0014] By adopting the above technical solution, when the staff enters the independent space of the separation area, the second ventilation system uses the incoming clean air to blow the impurity air carried by the staff downward, and at the same time the negative pressure fan accelerates the flow of air, so that the impurity air quickly enters the collection cavity. Then the setting of the cavity filter is conducive to filtering impurities in the air, so that it is convenient for the operator to use the exhaust fan to remove the filtered air, thereby forming air flow in the separation area.

[0015] Preferably, the clean working area and the processing service area are both provided with a plurality of partition components for separating the space, and the partition components include a transverse plate installed on the base and a longitudinal plate fixedly connected to the transverse plate, and the length directions of the transverse plate and the longitudinal plate are perpendicular to each other.

[0016] By adopting the above technical solution, the setting of the horizontal plate is conducive to separating the space of the clean working area and the processing service area, and the cooperation of the longitudinal plate and the horizontal plate is conducive to constructing independent spaces within the clean working area and the processing service area, thereby avoiding the exhaust gas directly impacting the first filter and the second filter, thereby reducing the overflow of air in the clean working area and the processing service area.

[0017] Preferably, the first ventilation system includes an exhaust box arranged in the ceiling panel and a ventilation pipe for connecting to a high-pressure air source, the ventilation pipe is connected to the exhaust box, and a first air outlet pipe and a second air outlet pipe are installed in the exhaust box at intervals, and the first air outlet pipe and the second air outlet pipe are both installed with chemical filters for filtering the air, the inner bottom surface of the first air outlet pipe is provided with a first exhaust hole for blowing air toward the direction close to the separation area, and the inner bottom surface of the second air outlet pipe is provided with a second exhaust hole for blowing air toward the direction away from the separation area.

[0018] By adopting the above technical solution, the air flow enters the exhaust box through the ventilation pipe, part of the air flow enters the first outlet pipe, and the other part of the air flow enters the second outlet pipe. The air flow entering the first outlet pipe is discharged through the first exhaust hole, so that the air close to the separation area enters the air circulation in the independent space within the separation area; and then the air flow of the second outlet pipe is discharged through the second exhaust hole, thereby reducing the possibility of gas in the combined space of the horizontal plate and the longitudinal plate to circulate outward.

[0019] Preferably, a ventilation cavity is provided on the portion of the base located in the clean working area and the processing service area, ventilation holes are provided on the inner top surface of the ventilation cavity, and a through channel for communicating with the exhaust box is provided in the longitudinal plate, and the through channel is connected to the ventilation cavity.

[0020] By adopting the above technical solution, the gas entering the second air outlet pipe in the exhaust box is discharged through the second exhaust hole, and then enters the ventilation cavity through the ventilation hole. The gas in the ventilation cavity enters the exhaust box again through the through channel, and then enters the circulation again after being filtered by the chemical filter, thereby reducing losses.

[0021] Preferably, the ventilation duct is provided with a plurality of connecting pipes for connecting to the exhaust box, the end of the longitudinal plate located in the exhaust box is fixedly connected to a wind shield, the wind shield corresponds one-to-one to the connecting pipe, and the end of the longitudinal plate located in the exhaust box is connected to the exhaust pipe on both sides, and the exhaust pipe is arranged at an angle.

[0022] By adopting the above technical solution, on the one hand, the setting of the wind shield reduces the speed of the high-pressure airflow and realizes the diversion of the airflow. On the other hand, the setting of the wind shield and the air outlet pipe can prevent the high-pressure airflow from rushing into the through channel, so that the gas in the ventilation cavity can enter the exhaust box, thereby realizing air circulation.

[0023] In summary, this application includes at least one of the following beneficial technical effects:

[0024] 1. The curtain prevents air from flowing between the clean work area and the processing service area. The curtain, together with the first and second filters, forms an independent space within the partition. When an operator enters the partition from the clean work area or processing service area, the operator first passes through the filter assembly and enters the independent space within the partition. At this time, the first ventilation system cooperates with the second ventilation system to help clean the operator, thereby preventing exhaust gas or corrosive gas from being brought into the partition as the operator moves, thereby ensuring the cleanliness of the air in the large clean space outside.

[0025] 2. When workers enter the independent space of the separation zone, the second ventilation system uses the incoming clean air to blow the impurity air carried by the workers downward. At the same time, the negative pressure fan accelerates the flow of air, so that the impurity air quickly enters the collection cavity. Then, the cavity filter is set to filter impurities in the air, making it convenient for operators to use the exhaust fan to remove the filtered air, thereby forming air flow in the separation zone;

[0026] 3. The gas entering the second air outlet pipe in the exhaust box is discharged through the second exhaust hole, and then enters the ventilation cavity through the ventilation hole. The gas in the ventilation cavity enters the exhaust box again through the through channel, and then enters the circulation again after being filtered by the chemical filter to reduce loss. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a schematic structural diagram of a clean room for a semiconductor factory according to an embodiment of the present application.

[0028] Figure 2 Schematic diagram of the internal structure of the clean room of the embodiment of the present application.

[0029] Figure 3 yes Figure 2 Enlarged schematic diagram of point A in the middle.

[0030] Explanation of the accompanying symbols: 1. Clean studio; 11. Clean work area; 12. Processing service area; 13. Partition area; 14. Ceiling board; 15. Base; 16. First mounting slot; 17. Second mounting slot; 18. Accommodation slot; 19. Ventilation cavity; 191. Ventilation hole; 2. Curtain; 3. Filter assembly; 31. First guide frame; 311. First guide rod; 312. Second guide rod; 32. Second guide frame; 321. Third guide rod; 322. Fourth guide rod; 33. First filter screen; 34. Second filter screen; 35. First positioning frame; 36. First Second positioning frame; 4. First ventilation system; 41. Exhaust box; 42. Ventilation duct; 43. First air outlet duct; 44. Second air outlet duct; 45. Chemical filter; 46. First exhaust hole; 47. Second exhaust hole; 48. Connecting pipe; 5. Partition assembly; 51. Horizontal plate; 52. Longitudinal plate; 53. Through passage; 54. Wind shield; 55. Exhaust duct; 6. Second ventilation system; 61. Air inlet duct; 62. Third air outlet duct; 63. Third exhaust hole; 64. Collecting cavity; 65. Air inlet; 66. Negative pressure fan; 67. Exhaust fan; 68. Air filter. DETAILED DESCRIPTION

[0031] The following is combined with Figure 1-3 This application is described in further detail.

[0032] The present application discloses a clean room for a semiconductor factory. Figure 1 、 Figure 2The clean room used in semiconductor factories includes a cleanroom 1, which can be divided into a clean work area 11, a processing service area 12, and a partition area 13. The clean work area 11 is used for high-precision semiconductor processing, the processing service area 12 is used for semiconductor pre-processing, and the partition area 13 is located between the processing service area 12 and the clean work area 11 and is used to store other equipment and facilitate staff movement.

[0033] Reference Figure 1 、 Figure 3 The inner top surface of the clean studio 1 is fixedly connected to a ceiling panel 14, which covers the entire clean studio 1. The inner bottom surface of the clean studio 1 is fixedly connected to a base 15, which covers the entire clean studio 1. A first mounting groove 16 is provided on the bottom surface of the ceiling panel 14 located in the partition area 13. The length direction of the first mounting groove 16 is consistent with the length direction of the ceiling panel 14. There are two first mounting grooves 16, and the two first mounting grooves 16 are arranged at intervals. A second mounting groove 17 is provided on the upper surface of the base 15. The length direction of the second mounting groove 17 is consistent with the length direction of the first mounting groove 16. There are two second mounting grooves 17, and the two second mounting grooves 17 correspond one-to-one to the two first mounting grooves 16.

[0034] Reference Figure 1 、 Figure 2 A curtain 2 is installed in the partition area 13. The length direction of the curtain 2 is consistent with the length direction of the first installation groove 16. The curtain 2 is set between the two first installation grooves 16. There are two curtains 2, and the two curtains 2 correspond one-to-one with the two first installation grooves 16. Filter components 3 are installed on the sides of adjacent curtains 2 away from each other, and the filter components 3 correspond one-to-one with the first installation grooves 16.

[0035] Reference Figure 1 、 Figure 3A single filter assembly 3 includes a first guide frame 31, a second guide frame 32, a first filter screen 33, and a second filter screen 34. The first guide frame 31 includes a first guide rod 311 and a second guide rod 312. The first guide rod 311 is positioned within the first mounting slot 16. The length of the first guide rod 311 coincides with the length of the first mounting slot 16, and the end of the first guide rod 311 is fixedly connected to the inner end surface of the first mounting slot 16. The second guide rod 312 is positioned within the second mounting slot 17. The length of the second guide rod 312 coincides with the length of the first guide rod 311. A first positioning frame 35 is mounted between the first guide rod 311 and the second guide rod 312. The first positioning frame 35 slidably engages with the first guide rod 311 and the second guide rod 312, respectively. Multiple first positioning frames 35 are provided, spaced apart along the length of the first guide rod 311. The first filter screen 33 is mounted on the first positioning frame 35. The provision of the first positioning frame 35 facilitates operator replacement of the first filter screen 33.

[0036] Reference Figure 1 、 Figure 2 The second guide frame 32 includes a third guide rod 321 and a fourth guide rod 322. The third guide rod 321 is positioned within the first mounting slot 16 and is parallel to the first guide rod 311. The end of the third guide rod 321 is fixedly connected to the inner end surface of the first mounting slot 16, and the third guide rod 321 and the first guide rod 311 are spaced apart horizontally. The fourth guide rod 322 is positioned within the second mounting slot 17 and is parallel to the second guide rod 312. The end of the fourth guide rod 322 is fixedly connected to the inner end surface of the second mounting slot 17. The fourth guide rod 322 corresponds one-to-one with the third guide rod 321. A second positioning frame 36 is disposed between the third and fourth guide rods 321 and 322, respectively. Multiple second positioning frames 36 are provided, spaced apart along the length of the third guide rod 321. The second filter 34 is mounted on the second positioning frame 36 . The first filter 33 and the second filter 34 are both used to filter impurities in the air. The first filter 33 and the second filter 34 are arranged alternately, and their edges overlap.

[0037] Reference Figure 2 、 Figure 3A first ventilation system 4 is provided in the clean work area 11 and the processing service area 12. The first ventilation system 4 includes an exhaust box 41 and a ventilation duct 42. The exhaust box 41 is a hollow box, and the length direction of the exhaust box 41 is consistent with the length direction of the first mounting groove 16. The exhaust box 41 is provided in the ceiling panel 14. The ceiling panel 14 is provided with a receiving groove 18 for installing the exhaust box 41, and the bottom surface of the exhaust box 41 is flush with the bottom surface of the ceiling panel 14. There are two exhaust boxes 41, one exhaust box 41 is provided in the clean work area 11, and the other exhaust box 41 is provided in the processing service area 12. The ventilation duct 42 is installed in the ceiling panel 14. There are two ventilation ducts 42, and the two ventilation ducts 42 correspond to the two exhaust boxes 41 one by one. A plurality of connecting pipes 48 are arranged at intervals on the ventilation duct 42, one end of the connecting pipe 48 is connected to the ventilation duct 42, and the other end of the connecting pipe 48 is connected to the exhaust box 41.

[0038] Reference Figure 3 A first air outlet pipe 43 and a second air outlet pipe 44 are provided in the exhaust box 41. The length direction of the first air outlet pipe 43 is consistent with the length direction of the exhaust box. The second air outlet pipe 44 and the first air outlet pipe 43 are parallel to each other, and the first air outlet pipe 43 and the second air outlet pipe 44 are arranged at intervals. The first air outlet pipe 43 and the second air outlet pipe 44 are both integrally formed with the exhaust box 41.

[0039] Reference Figure 3 Chemical filters 45 are installed on the upper surfaces of the first and second air outlet ducts 43, 44. Multiple chemical filters 45 are provided, spaced apart. These filters 45 are used to filter the air entering the first and second air outlet ducts 43, 44. A first exhaust hole 46 is defined on the inner bottom surface of the first air outlet duct 43. The first air outlet duct 43 communicates with the outside world through the first exhaust hole 46. The first exhaust hole 46 is tilted, with the end of the first exhaust hole 46 facing away from the first air outlet duct 43, toward the partition 13. A second exhaust hole 47 is defined on the inner bottom surface of the second air outlet duct 44. The second air outlet duct 44 communicates with the outside world through the second exhaust hole 47. The second exhaust hole 47 is tilted, with the end of the second air outlet duct 44 facing away from the partition 13.

[0040] Reference Figure 2 、 Figure 3A partition assembly 5 is provided in both the clean work area 11 and the processing service area 12. The partition assembly 5 includes a transverse plate 51 and a longitudinal plate 52. The bottom surface of the transverse plate 51 is fixedly connected to the upper surface of the base 15, and the upper surface of the transverse plate 51 is fixedly connected to the bottom surface of the ceiling plate 14. There are multiple transverse plates 51, and the multiple transverse plates 51 are arranged at intervals. There are multiple longitudinal plates 52, and the longitudinal plates 52 correspond to the transverse plates 51 one by one. The longitudinal plates 52 are provided on the side of the transverse plate 51 close to the partition area 13, and the longitudinal plates 52 are fixedly connected to the transverse plate 51. The bottom surface of the longitudinal plate 52 is fixedly connected to the upper surface of the base 15. The length direction of the longitudinal plate 52 is perpendicular to the length direction of the transverse plate 51, and the length direction of the longitudinal plate 52 is consistent with the length direction of the exhaust box 41. The top of the longitudinal plate 52 extends into the exhaust box 41, and the longitudinal plate 52 is located between the first air outlet duct 43 and the second air outlet duct 44.

[0041] Reference Figure 2 、 Figure 3 The base 15 is located inside the clean working area 11 and the processing service area 12, and a ventilation cavity 19 is provided inside the ventilation cavity 19. A ventilation hole 191 is provided on the inner top surface of the ventilation cavity 19. There are multiple ventilation holes 191, and the multiple ventilation holes 191 are arranged in a matrix. The ventilation cavity 19 is connected to the outside world through the ventilation holes 191. A through channel 53 is provided inside the longitudinal plate 52, and the through channel 53 is arranged vertically. One end of the through channel 53 is connected to the ventilation cavity 19, and the other end of the through channel 53 is connected to the exhaust box 41. A windshield 54 is provided on the top of the longitudinal plate 52 located in the exhaust box 41. The windshield 54 is fixedly connected to the longitudinal plate 52, and the length direction of the windshield 54 is consistent with the length direction of the longitudinal plate 52. An air outlet pipe 55 is penetrated on the two side walls of the longitudinal plate 52 located in the exhaust box 41. The through channel 53 is connected to the outside world through the air outlet pipe 55, and the air outlet pipe 55 is arranged obliquely downward.

[0042] Reference Figure 2 、 Figure 3 A second ventilation system 6 is provided within the partition 13. The second ventilation system 6 includes an air inlet duct 61 and a third air outlet duct 62. The air inlet duct 61 is embedded within the ceiling panel 14. The length of the air inlet duct 61 coincides with the length of the ventilation duct 42, and the air inlet duct 61 is connected to an external air source. The third air outlet duct 62 is provided within the ceiling panel 14 and is connected to the air inlet duct 61. The inner bottom surface of the third air outlet duct 62 is provided with a plurality of third air exhaust holes 63. The plurality of third air exhaust holes 63 are arranged in a matrix and vertically. The third air outlet duct 62 is connected to the outside world through the third air exhaust holes 63.

[0043] Reference Figure 2 、 Figure 3The base 15, located within the partition 13, defines a collection cavity 64. Multiple air inlet holes 65 are defined on the inner top surface of the collection cavity 64, connecting the collection cavity 64 to the outside world through the air inlet holes 65. A negative pressure fan 66 is installed within the base 15. One end of the negative pressure fan 66 is connected to the collection cavity 64, and the other end of the negative pressure fan 66 is attached to an air filter 68. An exhaust fan 67 is embedded within the base 15, located below the collection cavity 64 and connected to the air filter 68.

[0044] The implementation principle of a clean room for a semiconductor factory in an embodiment of the present application is as follows: the setting of the curtain 2 prevents the air in the clean working area 11 and the processing service area 12 from circulating with each other, and the curtain 2 cooperates with the first filter 33 and the second filter 34 to form an independent space in the partition area. When the operator enters the partition area 13 from the clean working area 11 or the processing service area 12, the operator first enters the independent space in the partition area 13 through the filter component 3. At this time, the first ventilation system 4 cooperates with the second ventilation system 6 to facilitate the cleaning of the operator, thereby preventing exhaust gas or corrosive gas from being brought into the partition area 13 as the operator moves, thereby ensuring the cleanliness of the air in the large clean space outside.

[0045] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A clean room for a semiconductor plant, comprising a clean studio (1), wherein the clean studio (1) comprises a clean work area (11) for high-precision processing and a processing service area (12) for semiconductor pre-process processing, wherein a partition area (13) is provided between the clean work area (11) and the processing service area (12), and wherein: Curtains (2) are arranged at intervals in the partition area (13), and the curtains (2) are arranged along the length direction of the partition area (13). Filter components (3) for filtering air are arranged on both sides of the adjacent curtains (2) that are away from each other. The filter components (3) include a first filter (33) and a second filter (34) arranged at intervals along the partition area (13). A first ventilation system (4) for conveying clean air is provided in both the clean working area (11) and the processing service area (12), and a second ventilation system (6) for conveying clean air is provided in the partition area (13); The filter assembly (3) further comprises a first guide frame (31) and a second guide frame (32) installed at intervals in the partition area (13); the first guide frame (31) is provided with a plurality of first positioning frames (35) for installing the first filter screen (33) while sliding along its length direction; the second guide frame (32) is provided with a plurality of second positioning frames (36) for installing the second filter screen (34) while sliding along its length direction; and the adjacent sides of the first filter screen (33) and the second filter screen (34) overlap; A ceiling panel (14) is installed on the inner top surface of the clean studio (1), a base (15) is provided on the inner bottom surface of the clean studio (1), a first mounting groove (16) is provided on the ceiling panel (14), a second mounting groove (17) corresponding to the first mounting groove (16) is provided on the base (15), the first guide frame (31) includes a first guide rod (311) installed on the inner end surface of the first mounting groove (16) and a second guide rod (312) installed on the inner end surface of the second mounting groove (17), the second guide frame (32) includes a third guide rod (321) installed on the inner end surface of the first mounting groove (16) and a fourth guide rod (322) installed on the inner end surface of the second mounting groove (17), the first guide rod (311) and the third guide rod (321) are arranged side by side, and the second guide rod (312) and the fourth guide rod (322) are arranged side by side; A plurality of partitioning assemblies (5) for separating spaces are provided in the clean work area (11) and the processing service area (12), wherein the partitioning assemblies (5) include a transverse plate (51) mounted on the base (15) and a longitudinal plate (52) fixedly connected to the transverse plate (51), wherein the longitudinal directions of the transverse plate (51) and the longitudinal plate (52) are perpendicular to each other; The first ventilation system (4) comprises an exhaust box (41) arranged in the ceiling panel (14) and a ventilation pipe (42) for communicating with a high-pressure air source, the ventilation pipe (42) being connected to the exhaust box (41), a first air outlet pipe (43) and a second air outlet pipe (44) being installed in the exhaust box (41) at intervals, a chemical filter (45) for filtering air being installed on both the first air outlet pipe (43) and the second air outlet pipe (44), a first air outlet hole (46) for blowing air toward the direction close to the partition area (13) being provided on the inner bottom surface of the first air outlet pipe (43), and a second air outlet hole (47) for blowing air toward the direction away from the partition area (13) being provided on the inner bottom surface of the second air outlet pipe (44); A ventilation cavity (19) is provided on the portion of the base (15) located in the clean working area (11) and the processing service area (12), a ventilation hole (191) is provided on the inner top surface of the ventilation cavity (19), and a through passage (53) for communicating with the exhaust box (41) is provided in the longitudinal plate (52), and the through passage (53) is communicated with the ventilation cavity (19); The ventilation pipe (42) is provided with a plurality of connecting pipes (48) for connecting with the exhaust box (41); a wind shield (54) is fixedly connected to the end of the longitudinal plate (52) located in the exhaust box (41); the wind shield (54) corresponds one-to-one to the connecting pipe (48); the end of the longitudinal plate (52) located in the exhaust box (41) is connected with an air outlet pipe (55) on both sides; the air outlet pipe (55) is arranged obliquely.

2. A clean room for a semiconductor plant according to claim 1, characterized in that: A collecting cavity (64) is provided in the base (15), and a plurality of air inlet holes (65) for communicating with the collecting cavity (64) are provided on the upper surface of the base (15) located in the partition area (13). An exhaust fan (67) for discharging gas in the collecting cavity (64) is provided in the base (15), and a negative pressure fan (66) for communicating with the collecting cavity (64) is provided on the exhaust fan (67). An air filter (68) is installed between the negative pressure fan (66) and the exhaust fan (67).

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