Liquid organic micro-atomization evaporation coating system

Abstract

The application relates to the technical field of organic material evaporation coating, in particular to a liquid organic material micron-level atomization evaporation coating system, which comprises a single storage device, a liquid flow control device, a magnetostrictive type booster pump device, a micron-level atomization device and an evaporation source device, wherein the single storage device is connected with the liquid flow control device through pipelines; the liquid flow control device is connected with the magnetostrictive type booster pump device through pipelines and an electromagnetic valve; the magnetostrictive type booster pump device is connected with the micron-level atomization device through pipelines; and the micron-level atomization device is connected with the evaporation source device through pipelines. The application can prepare an organic material thin film with uniform and controllable thickness and smooth and flat surface, and can continuously produce the evaporation coating, and has the advantages of simple structure, convenient use and high thin film preparation efficiency.

Description

Technical Field

[0001] This application relates to the field of organic evaporation coating technology, and more specifically, to a liquid organic micron-level atomization evaporation coating system. Background Technology

[0002] With the development of industries such as display technology, lithium-ion batteries, and perovskite solar cells, the demand for polymer thin films is increasing. Polymer thin films are widely used due to their low density, low cost, ease of processing, non-toxicity, biocompatibility, and chemical resistance. Common preparation methods for polymer thin films include vacuum-assisted filtration (VAF), solution casting (DC), hot pressing (HP), layer-by-layer self-assembly, electrospinning, and electrochemical deposition.

[0003] However, these preparation processes are usually exposed to the atmospheric environment, and dust, air or solvents will inevitably remain in the polymer film. These residues will cause defects such as dents and protrusions in the polymer film, which will seriously affect the quality of the polymer film. In addition, most polymer organic films are prepared by wet coating, which is thick and cannot be precisely controlled. Therefore, there is an urgent need for a micron-level organic film evaporation deposition system to prepare organic films with uniform thickness.

[0004] Ultrasonic atomization is a method that uses ultrasound to transform liquid solutions into micron-sized particles. It is commonly used in medicine to turn liquid medicines into fine droplets for easier absorption by the human body. Furthermore, ultrasonic atomization technology often atomizes water molecules, releasing a large number of negative oxygen ions. These ions can react electrostatically with smoke, dust, and other particles floating in the air, causing them to settle. At the same time, it can effectively remove harmful substances such as PM2.5, purifying the air and reducing the occurrence of diseases.

[0005] In the field of organic evaporation coating, liquid monomers are usually used as precursors. However, liquid precursors often have a certain viscosity, and the macromolecules are linked to each other by chemical bonds. They often appear in the form of droplets on the substrate surface. After polymerizing droplet-shaped organic monomers using methods such as thermosetting technology, ion source polymerization technology or ultraviolet curing, an uneven polymer film appears on the substrate surface, which significantly affects its light transmittance, water permeability and oxygen permeability. Summary of the Invention

[0006] This application provides a liquid organic micron-level atomization evaporation coating system. The viscous liquid organic monomer is preheated and then fed into an atomizer through a pressurization system. The liquid monomer is atomized into micron-level droplets using a piezoelectric oscillating plate and then introduced into a vacuum evaporation source. The molecular-sized liquid monomer is then sprayed onto the surface of a base film using vacuum flash evaporation technology.

[0007] To achieve the above objectives, this application provides a liquid organic micron-level atomization evaporation coating system, comprising a single-unit storage device, a liquid flow control device, a magnetostrictive booster pump device, a micron-level atomization device, and an evaporation source device, wherein: the single-unit storage device is connected to the liquid flow control device via pipelines; the liquid flow control device is connected to the magnetostrictive booster pump device via pipelines and a solenoid valve; the magnetostrictive booster pump device is connected to the micron-level atomization device via pipelines; the micron-level atomization device is connected to the evaporation source device via pipelines; a first carrier gas booster device is connected to the top of the single-unit storage device, and a constant temperature heating device is provided on the side; a second carrier gas booster device is connected to the bottom of the evaporation source device, a temperature-controllable heating plate is provided on the side, and a base film slit is provided on the top.

[0008] Furthermore, the liquid flow control device enables continuous adjustment of the liquid monomer flow rate within a speed range of 0.1-10 ml / min.

[0009] Furthermore, the magnetostrictive booster pump device includes a booster pump and an alternating magnetic field, wherein: the booster pump has a double-layer structure, the outer layer is a hollow sphere structure, and the inner layer is a solid sphere made of volumetric magnetostrictive material; the alternating magnetic field is arranged around the outside of the booster pump.

[0010] Furthermore, the micron-level atomization device includes an ultrathin metal substrate and a piezoelectric ceramic, with the piezoelectric ceramic tightly attached to the surface of the ultrathin metal substrate; the surface of the ultrathin metal substrate is provided with multiple conical holes for jet atomization.

[0011] Furthermore, the ultrathin metal substrate is circular with a diameter of 18-22 mm; the cone angle of the conical hole is 50° and the diameter is 18-22 μm; the piezoelectric ceramic is annular with an outer diameter of 16-20 mm and an inner diameter of 6-10 mm.

[0012] Furthermore, the evaporation source device is installed in a vacuum system, and a gas distribution plate is installed inside.

[0013] Furthermore, the base film slit is located at the top of the evaporation source device, with a width of 1 mm and a length the same as the width of the coating.

[0014] Furthermore, the first carrier gas pressurization device contains argon gas; the second carrier gas pressurization device contains either argon gas or nitrogen gas.

[0015] Furthermore, it also includes a uniformly moving base membrane, which is positioned above the base membrane slit.

[0016] Furthermore, a uniform array of ultraviolet light sources is set above the uniformly moving base film, and its light power is continuously adjustable.

[0017] The present invention provides a liquid organic material micron-level atomization evaporation coating system, which has the following beneficial effects:

[0018] This application can prepare organic thin films with uniform and controllable thickness and smooth and flat surfaces. It can also prepare thin films with different liquid monomers. The prepared thin films have good quality and excellent performance. They can be continuously mass-produced by evaporation deposition. The structure is simple, easy to use, and the preparation efficiency of the thin films is high. Attached Figure Description

[0019] The accompanying drawings, which form part of this application, are used to provide a further understanding of the application and to make other features, objects, and advantages of the application more apparent. The illustrative embodiments and descriptions of this application are used to explain the application and do not constitute an undue limitation of the application. In the drawings:

[0020] Figure 1 This is a schematic diagram of a liquid organic micron-level atomization evaporation coating system provided according to an embodiment of this application;

[0021] In the figure: 1-Single storage device, 2-Liquid flow control device, 3-Magnetostrictive booster pump device, 31-Booster pump, 32-Alternating magnetic field, 4-Micron-level atomization device, 41-Ultra-thin metal substrate, 42-Piezoelectric ceramic, 43-Conical hole, 5-Evaporation source device, 6-Solenoid valve, 7-First carrier gas booster device, 8-Second carrier gas booster device, 9-Base film slit, 10-Base film. Detailed Implementation

[0022] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort should fall within the scope of protection of the present application.

[0023] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate for the embodiments of this application described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0024] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0025] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0026] In addition, the term "multiple" should mean two or more.

[0027] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0028] like Figure 1 As shown, this application provides a liquid organic micron-level atomization evaporation coating system, including a single-unit storage device 1, a liquid flow control device 2, a magnetostrictive booster pump 31 device 3, a micron-level atomization device 4, and an evaporation source device 5, wherein: the single-unit storage device 1 is connected to the liquid flow control device 2 through a pipeline; the liquid flow control device 2 is connected to the magnetostrictive booster pump 3 through a pipeline and a solenoid valve 6; the magnetostrictive booster pump 3 is connected to the micron-level atomization device 4 through a pipeline; the micron-level atomization device 4 is connected to the evaporation source device 5 through a pipeline; a first carrier gas booster device 7 is connected to the top of the single-unit storage device 1, and a constant temperature heating device is provided on the side; a second carrier gas booster device 8 is connected to the bottom of the evaporation source device 5, a temperature-controllable heating plate is provided on the side, and a base film slit 9 is provided on the top.

[0029] Specifically, due to the viscosity of organic liquid monomers and the chemical bonds between molecules, large droplets are easily formed on the substrate during the preparation of organic thin films. The resulting organic thin films after polymerization and solidification are uneven and have poor thickness uniformity. To address this issue, the liquid organic micron-level atomization evaporation coating system provided in this application can preheat the viscous liquid organic monomers and input them into the atomizer through a pressurization system. The liquid monomers are atomized into micron-level droplets using a piezoelectric oscillating plate and introduced into a vacuum evaporation source. The molecular-shaped liquid monomers are then sprayed onto the surface of the base film 10 using vacuum flash evaporation technology. The monomer storage device 1 is mainly used to store liquid monomers and transport them to subsequent devices. To ensure the viscous organic monomers have a certain molecular activity, a constant-temperature heating device is installed on the side of the monomer storage device 1 to preheat the liquid monomers and bring them to a certain active state. Because the liquid monomers have a certain viscosity, they are subject to shear forces from the pipe and container walls when flowing into the pipeline, making uniform flow difficult. Therefore, a through-hole is designed at the top of the monomer storage device 1, and a first carrier gas pressurization device 7 is connected to it via a pipeline. An inert gas that does not participate in the reaction is introduced to increase the pressure inside the monomer storage device 1, making it easier for the liquid monomers to flow in the pipeline. The liquid flow control device 2 is mainly used to precisely control the flow rate of the liquid monomers. The magnetostrictive booster pump device 3 is mainly used to ensure continuous and uniform flow of the liquid monomers between the pipelines and various devices. The meter-level atomizing device 4 is mainly used to disperse the continuously flowing liquid monomers to achieve atomization, preventing the liquid monomers from agglomerating and solidifying on the organic film, thus causing unevenness in the organic film. The evaporation source device 5 uses vacuum flash evaporation technology to transform the atomized droplet-shaped monomers into molecular state, which is then sprayed through the base film slit 9 at the top of the evaporation source device 5 onto the uniformly moving base film 10 above, thus realizing the preparation of organic thin films. In order to uniformly and quickly spray the gaseous monomers from the base film slit 9 at the top of the evaporation source device 5, a second carrier gas pressurization device 8 is connected to the bottom of the evaporation source device 5, which also introduces inert gas to increase the internal pressure of the evaporation source device 5, so that the gaseous monomers can be sprayed out quickly. In order to fully flash atomize the micron-sized monomer droplets inside the evaporation source device 5, a temperature-controllable continuous and uniform heating plate is set on the side of the evaporation source device 5 to continuously heat and flash the droplet-shaped monomers into molecular state, thereby increasing their chemical activity.

[0030] Furthermore, the liquid flow control device 2 enables continuous adjustment of the liquid monomer flow rate within a range of 0.1-10 ml / min. The liquid flow control device 2 can precisely control the flow rate of the liquid monomer entering the subsequent devices. Through the solenoid valve 6 on the downstream pipeline and the liquid flow control device 2, different monomer flow parameters can be set to precisely control the amount of liquid precursor participating in the reaction.

[0031] Furthermore, the magnetostrictive booster pump device 3 includes a booster pump 31 and an alternating magnetic field 32. The booster pump 31 has a double-layer structure: an outer hollow sphere and an inner solid sphere made of volumetric magnetostrictive material. The alternating magnetic field 32 surrounds the entire booster pump 31. The magnetostrictive booster pump device 3 utilizes the volume change generated by the volumetric magnetostrictive material under a magnetic field to create a pressure difference, increasing the pressure of the liquid in the pipeline and increasing its flow rate. The booster pump 31 has a double-layer structure: an outer hollow sphere and an inner solid sphere made of volumetric magnetostrictive material. After the alternating magnetic field 32 is applied externally, the volume of the solid sphere inside the booster pump 31 changes according to the characteristics of the magnetostrictive material, thereby increasing the flow rate of the viscous liquid monomer entering the booster pump 31, overcoming the shear stress generated by the pipe wall, and allowing it to flow uniformly and rapidly into the next device.

[0032] Furthermore, the micron-level atomization device 4 includes an ultrathin metal substrate 41 and a piezoelectric ceramic 42, with the piezoelectric ceramic 42 tightly attached to the surface of the ultrathin metal substrate 41. The surface of the ultrathin metal substrate 41 is provided with multiple conical holes 43 for spray atomization. To ensure a smooth and uniform surface of the vapor-deposited organic film, preventing unevenness caused by droplet aggregation and solidification, the micron-level atomization device 4 is used to atomize the liquid monomer into micron-sized droplets. The micron-level atomization device 4 primarily employs piezoelectric atomization, with an internal alternating electric field. An external ultrasonic transducer converts 220V AC mains power into a low-voltage, high-frequency AC signal, which acts on both sides of the piezoelectric ceramic 42. The piezoelectric effect converts electrical energy into mechanical energy, inducing vibration to atomize the monomer. During operation, the piezoelectric ceramic 42 is tightly attached to the surface of the ultrathin metal substrate 41. Under the high-frequency alternating electric field, the piezoelectric ceramic 42 drives the ultrathin metal substrate 41 to vibrate at high frequency by utilizing the inverse piezoelectric effect, breaking up the continuously flowing liquid monomers and achieving atomization. Multiple conical holes 43 are provided on the surface of the ultrathin metal substrate 41. By utilizing the deformation of the conical holes 43, the volume of the conical holes 43 changes, generating a pressure difference, and atomization is achieved by spraying.

[0033] Furthermore, the ultrathin metal substrate 41 is circular with a diameter of 18-22 mm; the conical hole 43 has a cone angle of 50° and a diameter of 18-22 μm; the piezoelectric ceramic 42 is annular with an outer diameter of 16-20 mm and an inner diameter of 6-10 mm. In this embodiment, the ultrathin metal substrate 41 is circular, preferably with a diameter of 20 mm; the number of conical holes 43 on the surface of the ultrathin metal substrate 41 is preferably 400; the cone angle of the conical hole 43 is 50° and the diameter is preferably 20 μm; the piezoelectric ceramic 42 is annular with an outer diameter of 18 mm and an inner diameter of 8 mm.

[0034] Furthermore, the evaporation source device 5 is set in a vacuum system and has a gas distribution plate inside. The evaporation source device 5 is mainly used to form atomized micron-sized droplets into molecular-level monomers. The gas distribution plate inside can mix the gaseous monomers evenly. The entire evaporation source device 5 is in a vacuum system. After the micron-sized droplets enter the evaporation source device 5, they will quickly form molecular-sized monomers through vacuum flash evaporation technology.

[0035] Furthermore, the base film slit 9 is located at the top of the evaporation source device 5, with a width of 1 mm and a length the same as the coating width. The base film slit 9 is mainly used for the ejection of gaseous monomers, enabling them to be deposited on the surface of the base film 10 above, forming a uniform and smooth organic film.

[0036] Furthermore, the first carrier gas pressurization device 7 contains argon gas; the second carrier gas pressurization device 8 contains either argon or nitrogen gas. Argon gas is introduced into the monomer storage device 1 through the first carrier gas pressurization device 7 to increase the pressure within the monomer storage device 1, making it easier for the liquid monomer to flow in the pipeline; argon or nitrogen gas is introduced into the evaporation source device 5 through the second carrier gas pressurization device 8 to increase the pressure within the evaporation source device 5, allowing the gaseous monomer to be rapidly ejected from the base film slit 9.

[0037] Furthermore, it also includes a uniformly moving base film 10, which is positioned above the base film slit 9.

[0038] Furthermore, a uniform array of ultraviolet light sources is provided above the uniformly moving base film 10, and its light power is continuously adjustable.

[0039] Specifically, in order to prevent the gaseous monomers ejected from the base film slit 9 at the top of the evaporation source device 5 from being drawn away by the vacuum system, a base film 10 that moves continuously and uniformly is provided in the upper space of the base film slit 9. A uniform array of ultraviolet light sources is designed in the upper space of the base film 10, and its light power is continuously adjustable, so as to solidify the molecular gaseous monomers attached to the surface of the base film 10 into a continuous and uniform organic film.

[0040] The present application will be described in more detail below with reference to specific embodiments:

[0041] First, tripropylene glycol diacrylate (TPGDA) and photoinitiator TPO were mixed in a ratio of 125:1. The liquid monomer was added to monomer storage device 1, and the device cavity was evacuated to 10°C. -1Pa level; then the heating system of the vacuum system evaporation source device 5 is turned on, so that the internal temperature of the evaporation source device 5 reaches 240℃, and the carrier gas inside the evaporation source device 5 is pressurized at a flow rate of 300 sccm of high-purity Ar; the power of the ultraviolet light source is set to 60% of the total power, and the ultraviolet curing system is turned on; inert gas Ar is introduced into the monomer storage device 1, and the solenoid valve 6 is opened. The liquid monomer flow rate is set to 1 ml / min through the liquid flow control device 2 (the flow rate is adjustable from 1 to 10 ml / min), the magnetostrictive booster pump device 3 is started, the power of the micron-level atomizing device 4 is set to 6W and started; the base film 10 drive is turned on and its speed is set to 1 m / min.

[0042] Using the above method, polyacrylate organic films with a thickness of 2.0-2.1 μm and a uniform, smooth surface can be prepared. The films exhibit good adhesion to the substrate, and no large polymer agglomerates, bubbles, cracks, or other defects are observed within the films. This demonstrates that the liquid organic micron-level atomization evaporation coating system provided in this application can prepare organic films with uniform and controllable thickness and a smooth, flat surface. It features a simple structure, ease of use, and high efficiency in organic film preparation.

[0043] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A liquid organic material micron-level atomization evaporation coating system, characterized in that, It includes a single storage device, a liquid flow control device, a magnetostrictive booster pump device, a micron-level atomizing device, and an evaporation source device, wherein: The individual storage device is connected to the liquid flow control device via a pipeline; The liquid flow control device is connected to the magnetostrictive booster pump device via pipelines and solenoid valves; The magnetostrictive booster pump is connected to the micron-level atomizing device via a pipeline; The micron-level atomizing device is connected to the evaporation source device via a pipeline; The top of the single storage device is connected to a first carrier gas pressurization device, and a constant temperature heating device is provided on the side. The bottom of the evaporation source device is connected to a second carrier gas pressurization device, the side is provided with a temperature-controllable heating plate, and the top is provided with a base film slit. The magnetostrictive booster pump device includes a booster pump and an alternating magnetic field, wherein: The booster pump has a double-layer structure, with an outer hollow sphere and an inner solid sphere made of volumetric magnetostrictive material. The alternating magnetic field is arranged around the exterior of the booster pump assembly; The micron-level atomizing device includes an ultrathin metal substrate and a piezoelectric ceramic, with the piezoelectric ceramic tightly attached to the surface of the ultrathin metal substrate; the surface of the ultrathin metal substrate is provided with multiple conical holes for jet atomization; The ultrathin metal substrate is circular with a diameter of 18-22 mm; the cone angle of the conical hole is 50° and the diameter is 18-22 μm; the piezoelectric ceramic is annular with an outer diameter of 16-20 mm and an inner diameter of 6-10 mm.

2. The liquid organic micron-level atomization evaporation coating system according to claim 1, characterized in that, The liquid flow control device enables continuous adjustment of the liquid monomer flow rate within a speed range of 0.1-10 ml / min.

3. The liquid organic micron-level atomization evaporation coating system according to claim 1, characterized in that, The evaporation source device is installed in a vacuum system and has a gas distribution plate inside.

4. The liquid organic micron-level atomization evaporation coating system according to claim 3, characterized in that, The base film slit is located at the top of the evaporation source device, with a width of 1 mm and a length the same as the width of the coating.

5. The liquid organic micron-level atomization evaporation coating system according to claim 1, characterized in that, The first carrier gas pressurization device contains argon gas; the second carrier gas pressurization device contains either argon gas or nitrogen gas.

6. The liquid organic micron-level atomization evaporation coating system according to claim 4, characterized in that, It also includes a uniformly moving base film, which is disposed above the base film slit.

7. The liquid organic micron-level atomization evaporation coating system according to claim 6, characterized in that, A uniform array of ultraviolet light sources is also provided above the uniformly moving base film, and its light power is continuously adjustable.

Images